JPH11234082A - Surface acoustic wave device - Google Patents

Surface acoustic wave device

Info

Publication number
JPH11234082A
JPH11234082A JP4883198A JP4883198A JPH11234082A JP H11234082 A JPH11234082 A JP H11234082A JP 4883198 A JP4883198 A JP 4883198A JP 4883198 A JP4883198 A JP 4883198A JP H11234082 A JPH11234082 A JP H11234082A
Authority
JP
Japan
Prior art keywords
layer
acoustic wave
electrode
wave device
gold
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4883198A
Other languages
Japanese (ja)
Inventor
Yutaka Yamakoshi
豊 山越
Keiichi Nakanishi
圭一 中西
Hiroshi Shimizu
浩 清水
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toko Inc
Original Assignee
Toko Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toko Inc filed Critical Toko Inc
Priority to JP4883198A priority Critical patent/JPH11234082A/en
Publication of JPH11234082A publication Critical patent/JPH11234082A/en
Pending legal-status Critical Current

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  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)

Abstract

PROBLEM TO BE SOLVED: To improve the strength and durability of an electrode of a surface acoustic wave device which is mounted on a substrate by the flip-chip bonding by providing a chromium layer and a nickel layer, formed on the surface of a chrome layer on the surface of an aluminum electrode pad and forming a gold electrode layer on the surface of the nickel layer. SOLUTION: An inter digital electrode and a pad (aluminum film) 11 that is used for connection to an external circuit are formed on the surface of a piezoelectric substrate 10 of crystal, etc., in the processes of evaporation, etching, etc. A chromium layer 12 is formed similarly on the surface of the pad 11 as a 1st barrier layer, and a nickel layer 13 is formed on the layer 12 as a 2nd barrier layer. Then a gold layer 14 is formed on the surface of both layers 12 and 13, which are stacked on each other as an oxidization preventing film of both layers 12 and 13. The thickness of the layer 14 is made small compared with other layers. Then by forming a gold bump is formed on the surface of the layer 14, the adhesion force between the bump and an electrode pad is reinforced.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、表面弾性波装置の
電極構造に係るもので、特に、フェイスダウンボンディ
ングによって基板に搭載されてパッケージされる表面弾
性波装置に関するものである。
The present invention relates to an electrode structure of a surface acoustic wave device, and more particularly to a surface acoustic wave device mounted on a substrate and packaged by face-down bonding.

【0002】[0002]

【従来の技術】表面弾性波装置の分野においてもチップ
化、小型化の要求は高まっており、基板表面にフェイス
ダウンボンディングをすることが検討され、バンプを電
極パッド上に形成する方法が検討され、実用化されつつ
ある。表面弾性波素子のインターデジタル電極はアルミ
ニウムまたはアルミニウム合金が用いられ、金バンプ等
によって基板上の配線導体と接続される。
2. Description of the Related Art In the field of surface acoustic wave devices, demands for chip formation and miniaturization are increasing. Face down bonding on a substrate surface has been studied, and a method of forming bumps on electrode pads has been studied. Is being put to practical use. The interdigital electrode of the surface acoustic wave element is made of aluminum or an aluminum alloy, and is connected to a wiring conductor on the substrate by a gold bump or the like.

【0003】下地のアルミニウム電極と金バンプとを直
接接触させると異種金属化合物が形成されて組成変化が
生じ、機械的な接着強度等の品質の劣化と同時に電気的
特性の劣化も生じ易くなる。そこで、バリア層として遷
移金属もしくはそれと金、白金、パラジウム等とで多層
とし、その表面にバンプを形成するのが一般的である。
例えば、特開平8-307192号公報には、アルミニウムの表
面に上記金属層を形成し、その上に金バンプを形成する
技術が示されている。
When a base aluminum electrode and a gold bump are brought into direct contact with each other, a dissimilar metal compound is formed, which causes a change in composition. As a result, quality such as mechanical adhesive strength is deteriorated and electrical characteristics are also likely to deteriorate. Therefore, it is general that the barrier layer is made of a transition metal or a multilayer of gold, platinum, palladium or the like, and bumps are formed on the surface thereof.
For example, Japanese Patent Application Laid-Open No. 8-307192 discloses a technique in which the above-described metal layer is formed on the surface of aluminum, and a gold bump is formed thereon.

【0004】しかしながら、そのような構成ではバリア
ー膜の硬度が高くなり、バンプ形成の際の電力、荷重等
の条件設定が難しくなる。条件を強く設定すると膜に損
傷が生じ易くなり、逆に弱くすると接着強度の低下の現
象が生じる。また、次工程のフリップチップボンディン
グにおいて、熱圧着、超音波併用の熱圧着においてバリ
ア膜の突き抜けが生じ易くなる。
[0004] However, in such a configuration, the hardness of the barrier film becomes high, and it becomes difficult to set conditions such as electric power and load at the time of bump formation. When the conditions are set to be strong, the film is likely to be damaged, and when the conditions are set to be weak, the phenomenon of a decrease in adhesive strength occurs. In the flip chip bonding in the next step, the barrier film easily penetrates in thermocompression bonding and thermocompression bonding using ultrasonic waves.

【0005】[0005]

【発明が解決しようとする課題】本発明は、バンプ形成
時およびボンディング時において、機械的な強度を充分
に保つとともに、組成変化を生ぜずに安定した品質を維
持することが可能な電極構造を得るものである。
SUMMARY OF THE INVENTION The present invention provides an electrode structure capable of maintaining sufficient mechanical strength during bump formation and bonding and maintaining stable quality without causing a change in composition. What you get.

【0006】[0006]

【課題を解決するための手段】本発明は、バリア層を2
層にすることによって、上記の課題を解決するものであ
る。
According to the present invention, a barrier layer having two layers is provided.
The above problem is solved by forming a layer.

【0007】すなわち、アルミニウムによるインターデ
ジタル電極とそれらと外部回路とを接続するための電極
パッドを具え、電極パッドと接続されたバンプによって
フェイスダウンボンディングされる表面弾性波装置にお
いて、アルミニウムの電極パッドの表面の全部または一
部にクロム層と、そのクロム層の表面に形成されたニッ
ケル層を具え、そのニッケル層の表面に金の電極層が形
成されたことに特徴を有するものである。
That is, in a surface acoustic wave device having interdigital electrodes made of aluminum and electrode pads for connecting them to an external circuit, and being face-down bonded by bumps connected to the electrode pads, in the surface acoustic wave device, A chromium layer is provided on all or a part of the surface, and a nickel layer is formed on the surface of the chromium layer. The gold electrode layer is formed on the surface of the nickel layer.

【0008】[0008]

【発明の実施の形態】本発明による表面弾性波素子の電
極は次の4層から成る。 アルミニウム下地層 クロムバリア層 ニッケルバリア層 金表面層
DESCRIPTION OF THE PREFERRED EMBODIMENTS The electrodes of a surface acoustic wave device according to the present invention are composed of the following four layers. Aluminum underlayer Chromium barrier layer Nickel barrier layer Gold surface layer

【0009】さらに、バンプの形成位置をアルミニウム
膜が存在しない位置まで引き出すことによって、バリア
層の突き抜けを生じにくくすることができる。
Further, by extending the bump formation position to a position where the aluminum film does not exist, penetration of the barrier layer can be suppressed.

【0010】[0010]

【実施例】以下、図面を参照して、本発明の実施例につ
いて説明する。
Embodiments of the present invention will be described below with reference to the drawings.

【0011】図1は、本発明の実施例を示す、正面断面
図である。水晶等の圧電性基板10の表面にインターデジ
タル電極(図示しない)とともに、外部回路との接続用
のパッド11を蒸着等とエッチングの工程によって形成す
る。このアルミニウム膜11の厚みは 800〜 15000Å程度
とする。
FIG. 1 is a front sectional view showing an embodiment of the present invention. An interdigital electrode (not shown) and a pad 11 for connection to an external circuit are formed on the surface of a piezoelectric substrate 10 such as a quartz crystal by vapor deposition and etching. The thickness of this aluminum film 11 is about 800 to 15,000 mm.

【0012】このアルミニウム膜11の表面に第一のバリ
ア層としてクロム層12を同様の手段により形成する。こ
のクロム層12の厚みは1000〜4000Å程度とする。そし
て、その上に第二のバリア層としてニッケル層13を形成
する。ニッケル層13の厚みは2000〜 10000Å程度とす
る。
On the surface of this aluminum film 11, a chromium layer 12 is formed as a first barrier layer by the same means. The thickness of the chromium layer 12 is about 1000 to 4000 mm. Then, a nickel layer 13 is formed thereon as a second barrier layer. The thickness of the nickel layer 13 is set to about 2000-10000 mm.

【0013】2層に形成されたバリア層12、13の表面に
薄い金の膜14を形成することにより、バリア層の酸化防
止膜となる。この金層14の厚みは 500〜1500Å程度と、
他の層に比較すると薄くなっている。この金層14の表面
に金バンプを形成すれば、バンプと電極パッドとの密着
力を強くすることができる。なお、バンプを構成する材
料は金でなくてもよい。
By forming a thin gold film 14 on the surfaces of the barrier layers 12 and 13 formed as two layers, the barrier layer becomes an antioxidant film. The thickness of this gold layer 14 is about 500 to 1500 mm,
It is thinner than other layers. If a gold bump is formed on the surface of the gold layer 14, the adhesion between the bump and the electrode pad can be increased. Note that the material forming the bumps may not be gold.

【0014】図2は、本発明の他の実施例を示す正面断
面図である。基板20の表面にアルミニウム層21、クロム
層22、ニッケル層23、金層24を形成することは同じであ
るが、上側の3層を形成する位置がアルミニウム層21の
位置からずらしてある。この場合、バンプをアルミニウ
ムが下に存在しない位置に形成することができ、それに
よってバンプ材料とアルミニウムとの金属化合物がより
形成されにくくなる。
FIG. 2 is a front sectional view showing another embodiment of the present invention. The formation of the aluminum layer 21, the chromium layer 22, the nickel layer 23, and the gold layer 24 on the surface of the substrate 20 is the same, except that the position of the upper three layers is shifted from the position of the aluminum layer 21. In this case, the bump can be formed at a position where aluminum does not exist below, so that a metal compound of the bump material and aluminum is less likely to be formed.

【0015】図3は、従来の電極構造によるバンプ接続
の表面弾性波装置と本発明による表面弾性波装置の強度
を比較するもので、各温度で10分間加熱したときの強度
の劣化状況を示したものてある。・で示したものが本発
明によるもので、温度を高くしても強度の劣化はほとん
どなく、しかもそのばらつきも小さい範囲に留まってい
る。△はアルミニウム−クロム−金の3層としたもので
300°C以上では強度が劣化している。×はアルミのみ
の場合で 250°C程度から強度が半減し、 300°C以上
ではほとんど使用できない状態となっている。
FIG. 3 is a graph comparing the strength of a conventional surface acoustic wave device having a bump connection with an electrode structure and the surface acoustic wave device according to the present invention. There is. Indicated by () are those according to the present invention, in which the strength is hardly deteriorated even when the temperature is increased, and the variation is small. △ indicates three layers of aluminum-chromium-gold
Above 300 ° C., the strength deteriorated. × indicates the case where aluminum is used alone, the strength is reduced by half from about 250 ° C, and is hardly usable above 300 ° C.

【0016】上記のように、バンプ形成、フェイスダウ
ンボンディングの後のダイシェアー強度の劣化が少なく
なり、安定した品質を得ることが可能となる。
As described above, the die shear strength after bump formation and face-down bonding is less deteriorated, and stable quality can be obtained.

【0017】[0017]

【発明の効果】本発明によれば、異種金属化合物の発生
を防止できるので機械的強度が保たれて、フェイスダウ
ンボンディングにおいて接着強度を大きく維持できる表
面弾性波装置を得ることができる。
According to the present invention, it is possible to obtain a surface acoustic wave device capable of preventing the generation of dissimilar metal compounds, maintaining the mechanical strength, and maintaining a large adhesive strength in face-down bonding.

【0018】また、品質の安定したボンディングパッド
が得られるので、機械的な特性のみでなく電気的な特性
も良好な信頼性の高い表面弾性波装置が得られる。
In addition, since a bonding pad having stable quality can be obtained, a highly reliable surface acoustic wave device having not only mechanical characteristics but also excellent electrical characteristics can be obtained.

【0019】さらに、表面に金層を形成してあるので、
金バンプとの密着性を良好に維持することが可能とな
り、また加工条件においても低電力、低荷重化が可能と
なる利点もある。
Further, since a gold layer is formed on the surface,
There is also an advantage that good adhesion with the gold bump can be maintained, and low power and low load can be achieved even under processing conditions.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明の実施例を示す正面断面図FIG. 1 is a front sectional view showing an embodiment of the present invention.

【図2】 本発明の他の実施例を示す正面断面図FIG. 2 is a front sectional view showing another embodiment of the present invention.

【図3】 本発明による弾性表面波装置の強度の説明図FIG. 3 is an explanatory diagram of the strength of the surface acoustic wave device according to the present invention.

【符号の説明】[Explanation of symbols]

10:20:基板 11、21:アルミニウム層 12、22:クロム層 13、23:ニッケル層 14、24:金層 10:20: substrate 11, 21: aluminum layer 12, 22: chromium layer 13, 23: nickel layer 14, 24: gold layer

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 アルミニウムによるインターデジタル電
極とそれらと外部回路とを接続するための電極パッドを
具え、電極パッドと接続されたバンプによってフェイス
ダウンボンディングされる表面弾性波装置において、 アルミニウムの電極パッドの表面の全部または一部にク
ロム層と、そのクロム層の表面に形成されたニッケル層
を具え、そのニッケル層の表面に金の電極層が形成され
たことを特徴とする表面弾性波装置。
1. A surface acoustic wave device comprising an aluminum interdigital electrode and an electrode pad for connecting the interdigital electrodes to an external circuit, wherein the surface acoustic wave device is face-down bonded by a bump connected to the electrode pad. A surface acoustic wave device comprising: a chromium layer on all or part of the surface; and a nickel layer formed on the surface of the chromium layer, and a gold electrode layer formed on the surface of the nickel layer.
【請求項2】 アルミニウムによるインターデジタル電
極とそれらと外部回路とを接続するための電極パッドを
具え、電極パッドと接続されたバンプによってフェイス
ダウンボンディングされる表面弾性波装置において、 アルミニウムの電極パッドの表面の全部または一部にク
ロム層と、そのクロム層の表面に形成されたニッケル層
を具え、そのニッケル層の表面に金の電極層が形成さ
れ、その表面にパンプが形成されたことを特徴とする表
面弾性波装置。
2. A surface acoustic wave device comprising an aluminum interdigital electrode and an electrode pad for connecting them to an external circuit, wherein the surface acoustic wave device is face-down bonded by a bump connected to the electrode pad. It has a chromium layer on all or part of the surface and a nickel layer formed on the surface of the chromium layer, a gold electrode layer is formed on the surface of the nickel layer, and a pump is formed on the surface. Surface acoustic wave device.
【請求項3】 クロムおよびニッケル層をアルミニウム
が存在しない位置まで引き出し、バンプをアルミニウム
が存在しない位置の表面上に形成する請求項1または請
求項2記載の表面弾性波装置。
3. The surface acoustic wave device according to claim 1, wherein the chromium and nickel layers are drawn out to a position where aluminum does not exist, and the bump is formed on a surface where aluminum does not exist.
JP4883198A 1998-02-13 1998-02-13 Surface acoustic wave device Pending JPH11234082A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4883198A JPH11234082A (en) 1998-02-13 1998-02-13 Surface acoustic wave device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4883198A JPH11234082A (en) 1998-02-13 1998-02-13 Surface acoustic wave device

Publications (1)

Publication Number Publication Date
JPH11234082A true JPH11234082A (en) 1999-08-27

Family

ID=12814193

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4883198A Pending JPH11234082A (en) 1998-02-13 1998-02-13 Surface acoustic wave device

Country Status (1)

Country Link
JP (1) JPH11234082A (en)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1158669A2 (en) * 2000-05-19 2001-11-28 Murata Manufacturing Co., Ltd. Surface acoustic wave device
EP1184978A2 (en) 2000-07-31 2002-03-06 Murata Manufacturing Co., Ltd. Surface acoustic wave device and method of producing the same
US6369490B1 (en) * 1999-04-28 2002-04-09 Murata Manufacturing Co., Ltd Surface acoustic wave device having bump electrodes
US6492198B2 (en) 1999-09-29 2002-12-10 Samsung Electronics, Co., Ltd. Method for fabricating a semiconductor device
US6552475B2 (en) 2000-07-19 2003-04-22 Murata Manufacturing Co., Ltd. Surface acoustic wave device
JP2004048639A (en) * 2002-05-17 2004-02-12 Murata Mfg Co Ltd Piezo-resonator and manufacturing method of the same
EP1128423A3 (en) * 2000-02-25 2004-03-10 Murata Manufacturing Co., Ltd. Flip-Chip mounted electronic device with multi-layer electrodes
JP2004221622A (en) * 2002-01-08 2004-08-05 Murata Mfg Co Ltd Piezoelectric resonator, piezoelectric filter, duplexer, communication apparatus, and manufacturing method of piezoelectric resonator
JP2005051498A (en) * 2003-07-28 2005-02-24 Tdk Corp Element, device, and duplexer for surface acoustic wave and method for manufacturing surface acoustic wave element
KR100488616B1 (en) * 2001-07-06 2005-05-11 가부시키가이샤 무라타 세이사쿠쇼 Surface acoustic wave element and manufacturing method of the same
WO2006100900A1 (en) * 2005-03-22 2006-09-28 Matsushita Electric Industrial Co., Ltd. Underbump metal film, method for forming same, and surface acoustic wave device
JP2015146523A (en) * 2014-02-03 2015-08-13 京セラ株式会社 Acoustic wave element and acoustic wave device

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6369490B1 (en) * 1999-04-28 2002-04-09 Murata Manufacturing Co., Ltd Surface acoustic wave device having bump electrodes
US6492198B2 (en) 1999-09-29 2002-12-10 Samsung Electronics, Co., Ltd. Method for fabricating a semiconductor device
EP1128423A3 (en) * 2000-02-25 2004-03-10 Murata Manufacturing Co., Ltd. Flip-Chip mounted electronic device with multi-layer electrodes
US6762533B2 (en) 2000-05-19 2004-07-13 Murata Manufacturing Co., Ltd. Surface acoustic wave device
EP1158669A2 (en) * 2000-05-19 2001-11-28 Murata Manufacturing Co., Ltd. Surface acoustic wave device
EP1158669A3 (en) * 2000-05-19 2003-12-10 Murata Manufacturing Co., Ltd. Surface acoustic wave device
US6552475B2 (en) 2000-07-19 2003-04-22 Murata Manufacturing Co., Ltd. Surface acoustic wave device
EP1184978A2 (en) 2000-07-31 2002-03-06 Murata Manufacturing Co., Ltd. Surface acoustic wave device and method of producing the same
EP1184978A3 (en) * 2000-07-31 2008-03-26 Murata Manufacturing Co., Ltd. Surface acoustic wave device and method of producing the same
KR100488616B1 (en) * 2001-07-06 2005-05-11 가부시키가이샤 무라타 세이사쿠쇼 Surface acoustic wave element and manufacturing method of the same
JP2004221622A (en) * 2002-01-08 2004-08-05 Murata Mfg Co Ltd Piezoelectric resonator, piezoelectric filter, duplexer, communication apparatus, and manufacturing method of piezoelectric resonator
JP2004048639A (en) * 2002-05-17 2004-02-12 Murata Mfg Co Ltd Piezo-resonator and manufacturing method of the same
JP2005051498A (en) * 2003-07-28 2005-02-24 Tdk Corp Element, device, and duplexer for surface acoustic wave and method for manufacturing surface acoustic wave element
US7102461B2 (en) * 2003-07-28 2006-09-05 Tdk Corporation Surface acoustic wave element, surface acoustic wave device, surface acoustic wave duplexer, and method of manufacturing surface acoustic wave element
WO2006100900A1 (en) * 2005-03-22 2006-09-28 Matsushita Electric Industrial Co., Ltd. Underbump metal film, method for forming same, and surface acoustic wave device
JP2006269458A (en) * 2005-03-22 2006-10-05 Matsushita Electric Ind Co Ltd Underbump metal film, surface acoustic wave device using same and forming method thereof
US7764007B2 (en) 2005-03-22 2010-07-27 Panasonic Corporation Under bump metal film comprising a stress relaxation layer and a diffusion-resistant layer
JP4682657B2 (en) * 2005-03-22 2011-05-11 パナソニック株式会社 Surface acoustic wave device
JP2015146523A (en) * 2014-02-03 2015-08-13 京セラ株式会社 Acoustic wave element and acoustic wave device

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