JPH11228220A - Production of ito sintered compact by slurry casting process - Google Patents

Production of ito sintered compact by slurry casting process

Info

Publication number
JPH11228220A
JPH11228220A JP10027177A JP2717798A JPH11228220A JP H11228220 A JPH11228220 A JP H11228220A JP 10027177 A JP10027177 A JP 10027177A JP 2717798 A JP2717798 A JP 2717798A JP H11228220 A JPH11228220 A JP H11228220A
Authority
JP
Japan
Prior art keywords
slurry
specific surface
hours
surface area
sintered body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10027177A
Other languages
Japanese (ja)
Inventor
Isao Nakamura
村 功 中
Yoichiro Emori
森 洋一郎 江
Hiroshi Watanabe
辺 弘 渡
Minoru Okubo
穣 大久保
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Mining and Smelting Co Ltd
Original Assignee
Mitsui Mining and Smelting Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Mining and Smelting Co Ltd filed Critical Mitsui Mining and Smelting Co Ltd
Priority to JP10027177A priority Critical patent/JPH11228220A/en
Priority to TW088101590A priority patent/TW548256B/en
Priority to KR10-1999-0003841A priority patent/KR100453621B1/en
Priority to CN99100765A priority patent/CN1121358C/en
Publication of JPH11228220A publication Critical patent/JPH11228220A/en
Pending legal-status Critical Current

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  • Physical Vapour Deposition (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a method for producing a large-size, high-density ITO sintered compact through molding a slurry containing indium oxide and tin oxide using a slurry casting mold followed by sintering the resultant molded form. SOLUTION: This method for producing an ITO sintered compact comprises the following steps: a slurry is prepared from indium oxide powder 4.6-14.6 m<2> /g in specific surface area and tin oxide powder <=7.2 m<2> /g in specific surface area using ion-exchanged water, and then subjected to slurry casting molding process to obtain a molded form, which, in turn, is dried and degreased and then sintered. Another version of the above ITO sintered compact, a high-density ITO sintered compact, is obtained by sintering the above-mentioned molded form in an oxygen atmosphere.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、スパッタリング法
で透明導電膜の形成に用いられるITOターゲットの製
造に関する。
The present invention relates to the production of an ITO target used for forming a transparent conductive film by a sputtering method.

【0002】[0002]

【従来の技術】ITO薄膜は液晶ディスプレイ等の透明
導電膜として広く用いられている。このITO薄膜の形
成法としては、ITO焼結体をターゲット材として使用
するスパッタリング成膜法が一般的である。
2. Description of the Related Art ITO thin films are widely used as transparent conductive films for liquid crystal displays and the like. As a method of forming the ITO thin film, a sputtering film forming method using an ITO sintered body as a target material is generally used.

【0003】近年、液晶ディスプレイサイズの拡大とと
もにITOターゲット材の大型化が進んでいる。従来、
ITO焼結体の製造方法としては金型プレス法により成
形し、得られた成形体を焼成する方法がある。しかし金
型プレス法は成形サイズの大型化に伴い、設備費が増加
するなどの問題がある。
In recent years, the size of an ITO target material has been increasing with the increase in the size of a liquid crystal display. Conventionally,
As a method for producing an ITO sintered body, there is a method of molding by a die pressing method and firing the obtained molded body. However, the die press method has problems such as an increase in equipment cost as the molding size increases.

【0004】設備費が安価な方法として石膏型等を利用
した泥漿鋳込み成形法があるが、金型プレス法と比較し
て成形体の抗折強度、成形密度が低いために焼成により
クラックなどの欠陥が発生しやすく、また高密度の焼結
体が必ずしも得られない(例えば特公平6−659号公
報)。泥漿鋳込み成形後、冷間静水圧プレスにより圧密
化し、密度の向上を図る方法があるが、冷間静水圧プレ
スを施すことにより、設備費が増加する(例えば特公平
8−11711号公報)。
[0004] As a method with a low equipment cost, there is a slurry casting method using a gypsum mold or the like. However, since the bending strength and the molding density of the molded body are lower than those of a die pressing method, cracks and the like are caused by firing. Defects are likely to occur, and a high-density sintered body cannot always be obtained (for example, Japanese Patent Publication No. 6-659). There is a method of increasing the density by consolidation by a cold isostatic press after the slip casting, but equipment cost increases by applying the cold isostatic press (for example, Japanese Patent Publication No. H8-11711).

【0005】[0005]

【発明が解決しようとする課題】本発明の目的は、泥漿
鋳込み法により成形した成形体の抗折強度を高め、焼成
後にクラック、割れなどの欠陥がない大型サイズで高密
度のITO焼結体を製造することにある。
SUMMARY OF THE INVENTION An object of the present invention is to increase the transverse rupture strength of a molded article formed by a slurry casting method, and to provide a large-sized, high-density ITO sintered body free from defects such as cracks and cracks after firing. Is to manufacture.

【0006】[0006]

【課題を解決するための手段】本発明者等は、酸化イン
ジウム粉の比表面積を変えることで泥漿鋳込み成形体の
強度が変化することに着目し、成形サイズの大型化に適
した条件を見い出した。また酸化錫粉の比表面積が7.
2m2 /g以上の場合、酸化インジウムの比表面積に関
係なくクラックが発生しやすいことを見い出した。これ
らの知見に基づいて、酸化インジウム及び酸化錫の比表
面積をある特定の範囲に限定したところ、クラック、割
れなどの欠陥のない高密度ITO焼結体を得ることがで
き、本発明を完成させるに至った。尚、ここでいう比表
面積は、BET法で測定される値である。
Means for Solving the Problems The present inventors have focused on the fact that the strength of a slurry cast molded body changes by changing the specific surface area of indium oxide powder, and have found conditions suitable for increasing the molding size. Was. The specific surface area of the tin oxide powder is 7.
When it is 2 m 2 / g or more, it has been found that cracks are easily generated regardless of the specific surface area of indium oxide. Based on these findings, when the specific surface areas of indium oxide and tin oxide were limited to a specific range, a high-density ITO sintered body free from defects such as cracks and cracks could be obtained, and the present invention was completed. Reached. Here, the specific surface area is a value measured by the BET method.

【0007】本発明は、下記の事項をその特徴としてい
る。 (1) 比表面積4.6m2 /g以上14.7m2 /g
以下の酸化インジウム粉と、比表面積7.2m2 /g以
下の酸化錫粉をイオン交換水で調製してスラリーを作
り、このスラリーを泥漿鋳込み成形型を用いて成形体と
し、得られた成形体を乾燥後、焼成することを特徴とす
るITO焼結体の製造方法。 (2) 上記(1)の方法で製造された成形体を乾燥
後、酸素雰囲気で焼成して得られる相対密度97.5%
(密度6.97g/cm3 )以上のITO焼結体。
The present invention has the following features. (1) Specific surface area of 4.6 m 2 / g or more and 14.7 m 2 / g
The following indium oxide powder and tin oxide powder having a specific surface area of 7.2 m 2 / g or less were prepared with ion-exchanged water to form a slurry, and this slurry was formed into a compact using a slurry casting mold. A method for producing an ITO sintered body, comprising drying and firing the body. (2) The relative density obtained by drying the molded body produced by the method of (1) and firing in an oxygen atmosphere is 97.5%.
(Density 6.97 g / cm 3 ) or more ITO sintered body.

【0008】本発明を以下に詳細に説明する。本発明の
泥漿鋳込み法によるITO焼結体の製造工程は、図1に
示す通りである。以下に、その各製造工程について説明
する。
The present invention will be described in detail below. The manufacturing process of the ITO sintered body by the slurry casting method of the present invention is as shown in FIG. Hereinafter, each manufacturing process will be described.

【0009】(a) 原料粉の調整 市販の酸化インジウム粉、酸化錫粉は、微粒で凝集しや
すいために仮焼処理によって微粒子を粒成長させる。こ
のとき仮焼処理温度によって酸化インジウム粉、酸化錫
粉の比表面積を変えることができる。
(A) Preparation of Raw Material Powder Since commercially available indium oxide powder and tin oxide powder are fine and easily aggregated, fine particles are grown by calcining. At this time, the specific surface area of the indium oxide powder and the tin oxide powder can be changed depending on the calcination temperature.

【0010】酸化インジウム粉の比表面積は、4.6〜
14.6m2 /gとする。比表面積が14.6m2 /g
超であると焼結体にクラックが発生しやすい。また、比
表面積が4.6m2 /g未満であると、脱脂後の抗折強
度が小さく、成形体や焼結体にクラックや割れが発生し
やすくなる。
The specific surface area of the indium oxide powder is from 4.6 to
It is set to 14.6 m 2 / g. Specific surface area is 14.6m 2 / g
If it is more than one, cracks tend to occur in the sintered body. On the other hand, when the specific surface area is less than 4.6 m 2 / g, the transverse rupture strength after degreasing is small, and cracks and cracks are liable to be generated in the formed body and the sintered body.

【0011】(b) スラリーの調製 酸化インジウム、酸化錫、イオン交換水を樹脂製ポット
に入れボールミルにより粉砕、混合する。酸化錫組成は
5〜10wt%が好ましい。その後、水及び分散剤、バ
インダーを加えて、湿式ボールミルによりスラリーを調
製する。容器はポリエチレン製、ポリプロピレン製、ナ
イロン製のものなどが使用できる。ボールはジルコニア
製、樹脂製のものなどが使用できる。分散剤はポリカル
ボン酸系のものが使用でき、バインダーとしてはワック
スエマルジョン系、アクリルエマルジョン系のものが使
用できる。
(B) Preparation of slurry Indium oxide, tin oxide, and ion-exchanged water are put into a resin pot and ground and mixed by a ball mill. The tin oxide composition is preferably from 5 to 10% by weight. Thereafter, water, a dispersant, and a binder are added, and a slurry is prepared by a wet ball mill. The container can be made of polyethylene, polypropylene, nylon, or the like. The ball may be made of zirconia or resin. A polycarboxylic acid-based dispersant can be used, and a wax emulsion-based or acrylic emulsion-based dispersant can be used as a binder.

【0012】(c) スラリーの鋳込み成形 スラリーに消泡剤を添加して減圧脱気する。消泡剤はア
ミド系のものなどが使用できる。脱気したスラリーを、
図2に示す成形型に鋳込み、フィルターの下型面側を減
圧し、スラリー中の水分を排水することにより成形す
る。本発明で限定した酸化インジウム粉、酸化錫粉から
スラリーを調製した場合、成形型は図2に示す成形型に
限定されるものではなく、石膏型、樹脂型を使用するこ
とができる。
(C) Casting of the slurry An antifoaming agent is added to the slurry and the slurry is degassed under reduced pressure. An amide-based defoaming agent can be used. The degassed slurry is
The molding is performed by casting into a mold shown in FIG. 2, reducing the pressure on the lower mold side of the filter, and draining the water in the slurry. When a slurry is prepared from the indium oxide powder and the tin oxide powder limited in the present invention, the molding die is not limited to the molding die shown in FIG. 2, but a gypsum die or a resin die can be used.

【0013】(d) 成形体の乾燥、脱脂 成形体は室温で乾燥後、熱風循環式脱脂炉を使用して残
留水分及びバインダーを除去する。脱脂温度は400〜
600℃が好ましい。
(D) Drying and Degreasing of the Molded Body After the molded body is dried at room temperature, residual moisture and binder are removed by using a hot air circulation type degreasing furnace. Degreasing temperature is 400 ~
600 ° C. is preferred.

【0014】(e) 成形体の焼成 残留水分及びバインダーを除去した成形体を焼成するこ
とにより、ITO焼結体を得ることができる。また、焼
成を酸素雰囲気下で行うことにより相対密度97.5%
(6.97g/cm3 )以上のITO焼結体を得ること
ができる。焼成温度は1400〜1600℃が好まし
い。
(E) Firing of the molded body By firing the molded body from which residual moisture and binder have been removed, an ITO sintered body can be obtained. Further, by performing the firing in an oxygen atmosphere, the relative density is 97.5%.
(6.97 g / cm 3 ) or more of ITO sintered body can be obtained. The firing temperature is preferably from 1400 to 1600 ° C.

【0015】[0015]

【実施例】以下に、本発明を実施例と比較例により更に
説明する。実施例1 比表面積8.07m2 /gの酸化インジウム粉900g
と比表面積2.2m2/gの酸化錫粉100g、イオン
交換水30g及び直径5mmのジルコニアボールを樹脂
製ポットに入れ20時間ボールミル混合を行った。次に
イオン交換水178.3gとポリカルボン酸系分散剤
7.9gを入れ、1時間ボールミル混合した。1時間後
にワックス系バインダー9.9gを添加し、19時間ボ
ールミル混合を行った。
The present invention will be further described below with reference to examples and comparative examples. Example 1 900 g of indium oxide powder having a specific surface area of 8.07 m 2 / g
And 100 g of tin oxide powder having a specific surface area of 2.2 m 2 / g, 30 g of ion-exchanged water, and zirconia balls having a diameter of 5 mm were placed in a resin pot and mixed with a ball mill for 20 hours. Next, 178.3 g of ion-exchanged water and 7.9 g of a polycarboxylic acid-based dispersant were added and mixed in a ball mill for 1 hour. One hour later, 9.9 g of a wax-based binder was added, and ball mill mixing was performed for 19 hours.

【0016】次にスラリーにアミド系消泡剤0.2gを
添加し減圧脱気を行った。このスラリーの濃度は83%
だった。このスラリーを図2に示す構造の成形サイズ1
90mmφの成形用型に鋳込み、減圧−760mmHg
で排水した成形体を得た。成形体は25℃乾燥後、60
0℃で9時間脱脂を行った。脱脂後の抗折強度は0.9
4kgf/mm2 であった。脱脂した成形体を酸素雰囲
気にて1550℃で8時間焼成しITO焼結体を得た。
ITO焼結体の寸法は157.3mmφ×6.1mmで
あり、密度は99.4%(7.11g/cm3 )であっ
た。尚、スラリー濃度の定義は次の通りである。 スラリー濃度(%)=溶質重量/(溶質重量+溶媒重
量)×100
Next, 0.2 g of an amide-based antifoaming agent was added to the slurry, followed by degassing under reduced pressure. The concentration of this slurry is 83%
was. This slurry was formed into a molding size 1 having the structure shown in FIG.
Cast into a molding die of 90mmφ, reduced pressure -760mmHg
To obtain a molded body. After drying at 25 ° C.,
Degreasing was performed at 0 ° C. for 9 hours. Flexural strength after degreasing is 0.9
It was 4 kgf / mm 2 . The degreased molded body was fired at 1550 ° C. for 8 hours in an oxygen atmosphere to obtain an ITO sintered body.
The dimensions of the ITO sintered body were 157.3 mmφ × 6.1 mm, and the density was 99.4% (7.11 g / cm 3 ). The definition of the slurry concentration is as follows. Slurry concentration (%) = solute weight / (solute weight + solvent weight) × 100

【0017】実施例2 比表面積8.52m2 /gの酸化インジウム粉7200
gと、比表面積2.95m2 /gの酸化錫粉800g、
イオン交換水240gを直径5mmのジルコニアボール
とともに樹脂製ポットに入れ20時間ボールミル混合を
行った。次にイオン交換水1440gとポリカルボン酸
系分散剤64gを入れ1時間ボールミル混合した。1時
間後にワックス系バインダーを80g添加し19時間ボ
ールミル混合を行った。
Example 2 Indium oxide powder 7200 having a specific surface area of 8.52 m 2 / g
g of tin oxide powder having a specific surface area of 2.95 m 2 / g,
240 g of ion-exchanged water was placed in a resin pot together with zirconia balls having a diameter of 5 mm, and mixed in a ball mill for 20 hours. Next, 1440 g of ion-exchanged water and 64 g of a polycarboxylic acid-based dispersant were added and mixed in a ball mill for 1 hour. One hour later, 80 g of a wax-based binder was added, and ball mill mixing was performed for 19 hours.

【0018】次にスラリーにアミド系消泡剤1.6gを
添加し減圧脱気を行った。このスラリーの濃度は83%
だった。このスラリーを、図2に示す構造の成形サイズ
700mm×300mmの成形用型に鋳込み、減圧−7
60mmHgで排水し成形体を得た。成形体を乾燥後、
脱脂処理を600℃で3時間行った。その後、酸素雰囲
気にて1550℃で8時間焼成しITO焼結体を得た。
このときのITO焼結体の寸法は578mm×247m
m×6.9mmであり、焼結体の密度は97.7%
(6.99g/cm3 )であった。焼結体にクラック、
割れなどの欠陥がなかった。
Next, 1.6 g of an amide-based antifoaming agent was added to the slurry, followed by degassing under reduced pressure. The concentration of this slurry is 83%
was. This slurry was cast into a mold having a structure shown in FIG. 2 and having a molding size of 700 mm × 300 mm.
Drained at 60 mmHg to obtain a molded body. After drying the molded body,
The degreasing treatment was performed at 600 ° C. for 3 hours. Then, it was baked at 1550 ° C. for 8 hours in an oxygen atmosphere to obtain an ITO sintered body.
At this time, the size of the ITO sintered body was 578 mm × 247 m.
mx 6.9 mm, and the density of the sintered body is 97.7%
(6.99 g / cm 3 ). Cracks in the sintered body,
There were no defects such as cracks.

【0019】実施例3 比表面積8.07m2 /gの酸化インジウム粉7200
gと、比表面積2.68m2 /gの酸化錫粉800g、
イオン交換水240gを直径5mmのジルコニアボール
とともに樹脂製ポットに入れ20時間ボールミル混合を
行った。次にイオン交換水1440gとポリカルボン酸
系分散剤64gを入れ1時間ボールミル混合した。1時
間後にワックス系バインダーを80g添加し19時間ボ
ールミル混合を行った。
Example 3 Indium oxide powder 7200 having a specific surface area of 8.07 m 2 / g
g of tin oxide powder having a specific surface area of 2.68 m 2 / g,
240 g of ion-exchanged water was placed in a resin pot together with zirconia balls having a diameter of 5 mm, and mixed in a ball mill for 20 hours. Next, 1440 g of ion-exchanged water and 64 g of a polycarboxylic acid-based dispersant were added and mixed in a ball mill for 1 hour. One hour later, 80 g of a wax-based binder was added, and ball mill mixing was performed for 19 hours.

【0020】次にスラリーにアミド系消泡剤1.6gを
添加し減圧脱気を行った。このスラリーの濃度は83%
であった。このスラリーを図2に示す構造の成形サイズ
700mm×800mmの成形用型に鋳込み、減圧−7
60mmHgで排水し成形体を得た。成形体を乾燥後、
脱脂処理を600℃で3時間行った。その後、酸素雰囲
気にて1550℃で8時間焼成しITO焼結体を得た。
このときのITO焼結体の寸法は578mm×247m
m×7.3mmであり、焼結体の密度は98.1%
(7.01g/cm3 )であった。焼結体にクラック、
割れなどの欠陥がなかった。
Next, 1.6 g of an amide-based antifoaming agent was added to the slurry, followed by degassing under reduced pressure. The concentration of this slurry is 83%
Met. This slurry was cast into a mold having a structure shown in FIG. 2 and having a molding size of 700 mm × 800 mm.
Drained at 60 mmHg to obtain a molded body. After drying the molded body,
The degreasing treatment was performed at 600 ° C. for 3 hours. Then, it was baked at 1550 ° C. for 8 hours in an oxygen atmosphere to obtain an ITO sintered body.
At this time, the size of the ITO sintered body was 578 mm × 247 m.
mx 7.3 mm, and the density of the sintered body is 98.1%
(7.01 g / cm 3 ). Cracks in the sintered body,
There were no defects such as cracks.

【0021】実施例4 比表面積6.86m2 /gの酸化インジウム粉6750
gと、比表面積3.38m2 /gの酸化錫粉750g、
イオン交換水225gを直径5mmのジルコニアボール
とともに樹脂製ポットに入れ20時間ボールミル混合を
行った。次にイオン交換水1348.2gとポリカルボ
ン酸系分散剤60gを入れ1時間ボールミル混合した。
1時間後にワックス系バインダーを75g添加し19時
間ボールミル混合を行った。
Example 4 Indium oxide powder 6750 having a specific surface area of 6.86 m 2 / g
g of tin oxide powder having a specific surface area of 3.38 m 2 / g,
225 g of ion-exchanged water was put into a resin pot together with zirconia balls having a diameter of 5 mm, and mixed in a ball mill for 20 hours. Next, 1348.2 g of ion-exchanged water and 60 g of a polycarboxylic acid-based dispersant were added and mixed with a ball mill for 1 hour.
One hour later, 75 g of a wax-based binder was added, and ball mill mixing was performed for 19 hours.

【0022】次にスラリーにアミド系消泡剤1.4gを
添加し減圧脱気を行った。このスラリーの濃度は83%
だった。このスラリーを、図2に示す構造の成形サイズ
700mm×300mmの成形用型に鋳込み、減圧−7
60mmHgで排水し成形体を得た。成形体を乾燥後、
脱脂処理を600℃で3時間行った。その後、酸素雰囲
気にて1550℃で8時間焼成しITO焼結体を得た。
このときのITO焼結体の寸法は565mm×242m
m×7.1mmであり、焼結体の密度は98.7%
(7.05g/cm3 )であった。焼結体にクラック、
割れなどの欠陥がなかった。
Next, 1.4 g of an amide-based antifoaming agent was added to the slurry, followed by degassing under reduced pressure. The concentration of this slurry is 83%
was. This slurry was cast into a mold having a structure shown in FIG. 2 and having a molding size of 700 mm × 300 mm.
Drained at 60 mmHg to obtain a molded body. After drying the molded body,
The degreasing treatment was performed at 600 ° C. for 3 hours. Then, it was baked at 1550 ° C. for 8 hours in an oxygen atmosphere to obtain an ITO sintered body.
At this time, the size of the ITO sintered body was 565 mm × 242 m.
mx 7.1 mm, and the density of the sintered body is 98.7%
(7.05 g / cm 3 ). Cracks in the sintered body,
There were no defects such as cracks.

【0023】実施例5 比表面積6.54m2 /gの酸化インジウム粉7200
gと、比表面積2.49m2 /gの酸化錫粉800g、
イオン交換水240gを直径5mmのジルコニアボール
とともに樹脂製ポットに入れ20時間ボールミル混合を
行った。次にイオン交換水1440gとポリカルボン酸
系分散剤64gを入れ1時間ボールミル混合した。1時
間後にワックス系バインダーを80g添加し19時間ボ
ールミル混合を行った。
Example 5 Indium oxide powder 7200 having a specific surface area of 6.54 m 2 / g
g, tin oxide powder 800 g having a specific surface area of 2.49 m 2 / g,
240 g of ion-exchanged water was placed in a resin pot together with zirconia balls having a diameter of 5 mm, and mixed in a ball mill for 20 hours. Next, 1440 g of ion-exchanged water and 64 g of a polycarboxylic acid-based dispersant were added and mixed in a ball mill for 1 hour. One hour later, 80 g of a wax-based binder was added, and ball mill mixing was performed for 19 hours.

【0024】次にスラリーにアミド系消泡剤1.6gを
添加し減圧脱気を行った。このスラリーの濃度は83%
だった。このスラリーを図2に示す構造の成形サイズ7
00mm×300mmの成形用型に鋳込み、減圧−76
0mmHgで排水し成形体を得た。成形体を乾燥後、脱
脂処理を600℃で3時間行った。その後、酸素雰囲気
にて1550℃で8時間焼成しITO焼結体を得た。こ
のときのITO焼結体の寸法は572mm×245mm
×7.3mmであり、焼結体の密度は98.6%(7.
03g/cm3 )であった。焼結体にクラック、割れな
どの欠陥がなかった。
Next, 1.6 g of an amide-based antifoaming agent was added to the slurry, followed by degassing under reduced pressure. The concentration of this slurry is 83%
was. This slurry was molded to a size of 7 having the structure shown in FIG.
Cast into a 00 mm x 300 mm molding die,
Drained at 0 mmHg to obtain a molded body. After drying the compact, a degreasing treatment was performed at 600 ° C. for 3 hours. Then, it was baked at 1550 ° C. for 8 hours in an oxygen atmosphere to obtain an ITO sintered body. At this time, the size of the ITO sintered body was 572 mm × 245 mm.
× 7.3 mm, and the density of the sintered body was 98.6% (7.
03 g / cm 3 ). There were no cracks, cracks or other defects in the sintered body.

【0025】実施例6 比表面積6.64の酸化インジウム粉18000gと、
比表面積3.11の酸化錫粉2000g、イオン交換水
600g及び直径5mmのジルコニアボールを樹脂製ポ
ットに入れ20時間ボールミル混合を行った。次にイオ
ン交換水3592gとポリカルボン酸系分散剤160g
を入れ1時間ボールミル混合した。1時間後にワックス
系バインダーを200g添加し19時間ボールミル混合
を行った。
Example 6 18000 g of indium oxide powder having a specific surface area of 6.64,
2000 g of tin oxide powder having a specific surface area of 3.11, 600 g of ion-exchanged water, and zirconia balls having a diameter of 5 mm were placed in a resin pot and mixed with a ball mill for 20 hours. Next, 3592 g of ion-exchanged water and 160 g of a polycarboxylic acid-based dispersant were used.
And mixed with a ball mill for 1 hour. One hour later, 200 g of a wax-based binder was added, and ball mill mixing was performed for 19 hours.

【0026】次にスラリーにアミド系消泡剤4gを添加
し減圧脱気を行った。このスラリーの濃度は83%だっ
た。このスラリーを図2に示す構造の成形サイズ127
0mm×375mmの成形用型に鋳込み、減圧−760
mmHgで排水し成形体を得た。成形体は25℃乾燥
後、600℃で3時間脱脂を行い、酸素雰囲気にて15
50℃で8時間焼成してITO焼結体を得た。ITO焼
結体の寸法は1046mm×308mm×7.9mmで
あり、焼結体の密度は98.8%(7.06g/c
3 )であった。長軸が1000mm以上の大型ITO
焼結体を得ることができた。
Next, 4 g of an amide-based antifoaming agent was added to the slurry, followed by degassing under reduced pressure. The concentration of this slurry was 83%. This slurry was formed into a molding size 127 having the structure shown in FIG.
0mm x 375mm casting mold, decompression -760
Drained at mmHg to obtain a molded body. The molded body was dried at 25 ° C, degreased at 600 ° C for 3 hours, and dried in an oxygen atmosphere for 15 hours.
It was fired at 50 ° C. for 8 hours to obtain an ITO sintered body. The dimensions of the ITO sintered body were 1046 mm × 308 mm × 7.9 mm, and the density of the sintered body was 98.8% (7.06 g / c).
m 3 ). Large ITO with a long axis of 1000mm or more
A sintered body was obtained.

【0027】比較例1 比表面積4.22m2 /gの酸化インジウム粉900g
と、比表面積2.2m2 /gの酸化錫粉100g、アル
コール系バインダー7.9g及び直径10mmのジルコ
ニアボールを樹脂製ポットに入れ20時間ボールミル混
合を行った。処理粉を成形サイズ190mmφ、圧力1
000kgf/cm2 でプレス成形した。成形体は60
0℃で3時間脱脂を行った。脱脂後の抗折強度は0.7
2kgf/cm2 だった。脱脂した成形体を酸素雰囲気
にて1550℃で8時間焼成し高密度ITO焼結体を得
た。ITO焼結体の寸法は166.0mmφ×5.7m
mであり、密度は99.0%(7.08g/cm3 )で
あった。
Comparative Example 1 900 g of indium oxide powder having a specific surface area of 4.22 m 2 / g
And 100 g of tin oxide powder having a specific surface area of 2.2 m 2 / g, 7.9 g of an alcohol-based binder, and zirconia balls having a diameter of 10 mm were placed in a resin pot and mixed with a ball mill for 20 hours. Processed powder is molded at 190mmφ, pressure 1
Press molding was performed at 000 kgf / cm 2 . The molded body is 60
Degreasing was performed at 0 ° C. for 3 hours. Flexural strength after degreasing is 0.7
It was 2 kgf / cm 2 . The degreased molded body was fired in an oxygen atmosphere at 1550 ° C. for 8 hours to obtain a high-density ITO sintered body. The size of the ITO sintered body is 166.0mmφ × 5.7m
m, and the density was 99.0% (7.08 g / cm 3 ).

【0028】比較例2 比表面積4.53m2 /gの酸化インジウム粉900g
と、比表面積2.2m2 /gの酸化錫粉100g、イオ
ン交換水30g及び直径5mmのジルコニアボールを樹
脂製ポットに入れ20時間ボールミル混合を行った。次
にイオン交換水128.7gとポリカルボン酸系分散剤
4.5gを入れ1時間ボールミル混合した。1時間後に
ワックス系バインダー9.9gを添加し19時間ボール
ミル混合を行った。
Comparative Example 2 900 g of indium oxide powder having a specific surface area of 4.53 m 2 / g
And 100 g of tin oxide powder having a specific surface area of 2.2 m 2 / g, 30 g of ion-exchanged water, and zirconia balls having a diameter of 5 mm were placed in a resin pot and mixed with a ball mill for 20 hours. Next, 128.7 g of ion-exchanged water and 4.5 g of a polycarboxylic acid-based dispersant were added and mixed for 1 hour with a ball mill. One hour later, 9.9 g of a wax-based binder was added, and the mixture was mixed in a ball mill for 19 hours.

【0029】次にスラリーにアミド系消泡剤0.4gを
添加し、減圧脱気を行った。このスラリーの濃度は86
%だった。このスラリーを、図2に示す構造の成形サイ
ズ190mmφの成形用型に鋳込み、減圧−760mm
Hgで排水し成形体を得た。成形体は25℃乾燥後、6
00℃で3時間脱脂を行った。脱脂後の抗折強度は、
0.60kgf/mm2 だった。脱脂した成形体を酸素
雰囲気にて1550℃で8時間焼成しITO焼結体を得
た。ITO焼結体の寸法は、160.6mmφ×5.9
mmであり、密度は99.7%(7.13g/cm3
であった。
Next, 0.4 g of an amide-based antifoaming agent was added to the slurry, and deaeration was performed under reduced pressure. The concentration of this slurry is 86
%was. This slurry was cast into a mold having a structure shown in FIG.
Drained with Hg to obtain a molded body. After drying the molded body at 25 ° C, 6
Degreasing was performed at 00 ° C. for 3 hours. The bending strength after degreasing is
It was 0.60 kgf / mm 2 . The degreased molded body was fired at 1550 ° C. for 8 hours in an oxygen atmosphere to obtain an ITO sintered body. The size of the ITO sintered body is 160.6 mmφ × 5.9.
mm, and the density is 99.7% (7.13 g / cm 3 ).
Met.

【0030】比較例3 比表面積4.22m2 /gの酸化インジウム粉900g
と、比表面積2.2m2 /gの酸化錫粉100g、イオ
ン交換水30g及び直径5mmのジルコニアボールを樹
脂製ポットに入れ20時間ボールミル混合を行った。次
にイオン交換水108.9gとポリカルボン酸系分散剤
4.7gを入れ1時間ボールミル混合した。1時間後に
ワックス系バインダー7.9gを添加し19時間ボール
ミル混合を行った。
Comparative Example 3 900 g of indium oxide powder having a specific surface area of 4.22 m 2 / g
And 100 g of tin oxide powder having a specific surface area of 2.2 m 2 / g, 30 g of ion-exchanged water, and zirconia balls having a diameter of 5 mm were placed in a resin pot and mixed with a ball mill for 20 hours. Next, 108.9 g of ion-exchanged water and 4.7 g of a polycarboxylic acid-based dispersant were added and mixed in a ball mill for 1 hour. One hour later, 7.9 g of a wax-based binder was added, and the mixture was mixed in a ball mill for 19 hours.

【0031】次にスラリーにアミド系消泡剤0.5gを
添加し減圧脱気を行った。このスラリーの濃度は87%
だった。このスラリーを、図2に示す構造の成形サイズ
190mmφの成形用型に鋳込み、減圧−760mmH
gで排水し成形体を得た。成形体は25℃乾燥後、60
0℃で8時間脱脂を行った。脱脂後の抗折強度は0.5
0kgf/mm2 だった。脱脂した成形体を酸素雰囲気
にて1550℃で8時間焼成しITO焼結体を得た。I
TO焼結体の寸法は166.0mmφ×5.5mmであ
り、密度は99.9%(7.14g/cm3 )であっ
た。
Next, 0.5 g of an amide-based antifoaming agent was added to the slurry, followed by degassing under reduced pressure. The concentration of this slurry is 87%
was. This slurry is cast into a mold having a structure shown in FIG.
g to obtain a molded product. After drying at 25 ° C.,
Degreasing was performed at 0 ° C. for 8 hours. Flexural strength after degreasing is 0.5
It was 0 kgf / mm 2 . The degreased molded body was fired at 1550 ° C. for 8 hours in an oxygen atmosphere to obtain an ITO sintered body. I
The dimensions of the TO sintered body were 166.0 mmφ × 5.5 mm, and the density was 99.9% (7.14 g / cm 3 ).

【0032】比較例4 比表面積14.7m2 /gの酸化インジウム粉7200
gと、比表面積2.482m2 /gの酸化錫粉800
g、イオン交換水240gを直径5mmのジルコニアボ
ールとともに樹脂製ポットに入れ20時間ボールミル混
合を行った。次にイオン交換水2000gとポリカルボ
ン酸系分散剤64gを入れ1時間ボールミル混合した。
1時間後にワックス系バインダーを80g添加し19時
間ボールミル混合を行った。
Comparative Example 4 Indium oxide powder 7200 having a specific surface area of 14.7 m 2 / g
g and tin oxide powder 800 having a specific surface area of 2.482 m 2 / g
g and 240 g of ion-exchanged water together with a zirconia ball having a diameter of 5 mm were placed in a resin pot and mixed with a ball mill for 20 hours. Next, 2000 g of ion-exchanged water and 64 g of a polycarboxylic acid-based dispersant were added and mixed in a ball mill for 1 hour.
One hour later, 80 g of a wax-based binder was added, and ball mill mixing was performed for 19 hours.

【0033】次にスラリーにアミド系消泡剤1.6gを
添加し減圧脱気を行った。このスラリーの濃度は76%
だった。このスラリーを図2に示す構造の成形サイズ7
00mm×300mmの成形用型に鋳込み、減圧−76
0mmHgで排水し成形体を得た。成形体を乾燥後、脱
脂処理を600℃で3時間行った。その後、酸素雰囲気
にて1550℃で8時間焼成しITO焼結体を得た。こ
のときのITO焼結体の寸法は522mm×224mm
×7.1mmであり、焼結体の密度は98.5%(7.
04g/cm3 )であった。焼結体に10mm〜20m
mのクラックが6本発生した。
Next, 1.6 g of an amide-based antifoaming agent was added to the slurry and deaeration was performed under reduced pressure. The concentration of this slurry is 76%
was. This slurry was molded to a size of 7 having the structure shown in FIG.
Cast into a 00 mm x 300 mm molding die,
Drained at 0 mmHg to obtain a molded body. After drying the compact, a degreasing treatment was performed at 600 ° C. for 3 hours. Then, it was baked at 1550 ° C. for 8 hours in an oxygen atmosphere to obtain an ITO sintered body. At this time, the size of the ITO sintered body was 522 mm × 224 mm.
× 7.1 mm, and the density of the sintered body was 98.5% (7.
04 g / cm 3 ). 10mm to 20m for sintered body
m cracks occurred.

【0034】比較例5 比表面積7.73m2 /gの酸化インジウム粉7200
gと、比表面積7.62m2 /gの酸化錫粉800g、
イオン交換水400gを直径5mmのジルコニアボール
とともに樹脂製ポットに入れ20時間ボールミル混合を
行った。次にイオン交換水1440gとポリカルボン酸
系分散剤80gを入れ1時間ボールミル混合した。1時
間後にワックス系バインダーを80g添加し19時間ボ
ールミル混合を行った。
Comparative Example 5 Indium oxide powder 7200 having a specific surface area of 7.73 m 2 / g
g of tin oxide powder having a specific surface area of 7.62 m 2 / g,
400 g of ion-exchanged water was put into a resin pot together with zirconia balls having a diameter of 5 mm, and mixed in a ball mill for 20 hours. Next, 1440 g of ion-exchanged water and 80 g of a polycarboxylic acid-based dispersant were added and mixed in a ball mill for 1 hour. One hour later, 80 g of a wax-based binder was added, and ball mill mixing was performed for 19 hours.

【0035】次にスラリーにアミド系消泡剤1.6gを
添加し減圧脱気を行った。このスラリーの濃度は82%
だった。このスラリーを図2に示す構造の成形サイズ7
00mm×300mmの成形用型に鋳込み、減圧−76
0mmHgで排水し成形体を得た。成形体を乾燥後、脱
脂処理を600℃で3時間行った。その後、酸素雰囲気
にて1550℃で8時間焼成しITO焼結体を得た。こ
のときのITO焼結体の寸法は575mm×246mm
×7.4mmであり、焼結体の密度は97.8%(6.
99g/cm3 )であった。焼結体に長さ4〜26mm
のクラックが19本発生した。
Next, 1.6 g of an amide-based antifoaming agent was added to the slurry, and deaeration was performed under reduced pressure. The concentration of this slurry is 82%
was. This slurry was molded to a size of 7 having the structure shown in FIG.
Cast into a 00 mm x 300 mm molding die,
Drained at 0 mmHg to obtain a molded body. After drying the compact, a degreasing treatment was performed at 600 ° C. for 3 hours. Then, it was baked at 1550 ° C. for 8 hours in an oxygen atmosphere to obtain an ITO sintered body. The size of the ITO sintered body at this time is 575 mm x 246 mm
× 7.4 mm, and the density of the sintered body was 97.8% (6.
99 g / cm 3 ). 4 to 26 mm length for sintered body
19 cracks occurred.

【0036】比較例6 比表面積7.73m2 /gの酸化インジウム粉8100
gと、比表面積7.23m2 /gの酸化錫粉900g、
イオン交換水450gを直径5mmのジルコニアボール
とともに樹脂製ポットに入れ20時間ボールミル混合を
行った。次にイオン交換水1710gとポリカルボン酸
系分散剤94gを入れ1時間ボールミル混合した。1時
間後にワックス系バインダーを90g添加し19時間ボ
ールミル混合を行った。このスラリーの濃度は81%だ
った。このスラリーを図2に示す構造の成形サイズ70
0mm×300mmの成形用型に鋳込み、減圧−760
mmHgで排水し成形体を得た。成形体を乾燥後、脱脂
処理を600℃で3時間行った。脱脂後の密度は63%
(4.5g/cm3 )であった。成形体は脱脂により中
央部分で2つに割れた。
Comparative Example 6 Indium oxide powder 8100 having a specific surface area of 7.73 m 2 / g
g of tin oxide powder having a specific surface area of 7.23 m 2 / g;
450 g of ion-exchanged water was put into a resin pot together with zirconia balls having a diameter of 5 mm, and mixed in a ball mill for 20 hours. Next, 1710 g of ion-exchanged water and 94 g of a polycarboxylic acid-based dispersant were added and mixed in a ball mill for 1 hour. One hour later, 90 g of a wax-based binder was added, and ball mill mixing was performed for 19 hours. The concentration of this slurry was 81%. This slurry was formed into a molding size 70 having the structure shown in FIG.
Cast into a 0 mm x 300 mm molding die and decompress -760
Drained at mmHg to obtain a molded body. After drying the compact, a degreasing treatment was performed at 600 ° C. for 3 hours. 63% density after degreasing
(4.5 g / cm 3 ). The molded body was split into two at the center by degreasing.

【0037】比較例7 比表面積4.53m2 /gの酸化インジウム粉8100
gと、比表面積2.68m2 /gの酸化錫粉900g、
イオン交換水270gを直径5mmのジルコニアボール
とともに樹脂製ポットに入れ20時間ボールミル混合を
行った。次にイオン交換水1170gとポリカルボン酸
系分散剤41gを入れ1時間ボールミル混合した。1時
間後にワックス系バインダーを90g添加し19時間ボ
ールミル混合を行った。
Comparative Example 7 Indium oxide powder 8100 having a specific surface area of 4.53 m 2 / g
g of tin oxide powder having a specific surface area of 2.68 m 2 / g;
270 g of ion-exchanged water was put in a resin pot together with zirconia balls having a diameter of 5 mm, and mixed in a ball mill for 20 hours. Next, 1170 g of ion-exchanged water and 41 g of a polycarboxylic acid-based dispersant were added and mixed in a ball mill for 1 hour. One hour later, 90 g of a wax-based binder was added, and ball mill mixing was performed for 19 hours.

【0038】次にスラリーにアミド系消泡剤4.5gを
添加し減圧脱気を行った。このスラリーの濃度は86%
だった。このスラリーを図2に示す構造の成形サイズ7
00mm×300mmの成形用型に鋳込み、減圧−76
0mmHgで排水し成形体を得た。成形体を乾燥後、脱
脂処理を600℃で3時間行った。その後、酸素雰囲気
にて1550℃で8時間焼成しITO焼結体を得た。こ
のときのITO焼結体の寸法は593mm×254mm
×7.7mmであり、焼結体の密度は98.6%(7.
05g/cm3 )であった。焼結体に20mmのクラッ
クが発生した。
Next, 4.5 g of an amide-based antifoaming agent was added to the slurry, followed by degassing under reduced pressure. The concentration of this slurry is 86%
was. This slurry was molded to a size of 7 having the structure shown in FIG.
Cast into a 00 mm x 300 mm molding die,
Drained at 0 mmHg to obtain a molded body. After drying the compact, a degreasing treatment was performed at 600 ° C. for 3 hours. Then, it was baked at 1550 ° C. for 8 hours in an oxygen atmosphere to obtain an ITO sintered body. At this time, the size of the ITO sintered body was 593 mm × 254 mm.
× 7.7 mm, and the density of the sintered body was 98.6% (7.
05 g / cm 3 ). A 20 mm crack was generated in the sintered body.

【0039】比較例8 比表面積4.50m2 /gの酸化インジウム粉7200
gと、比表面積7.62m2 /gの酸化錫粉800g、
イオン交換水240gを直径5mmのジルコニアボール
とともに樹脂製ポットに入れ20時間ボールミル混合を
行った。次にイオン交換水1440gとポリカルボン酸
系分散剤64gを入れ1時間ボールミル混合した。1時
間後にワックス系バインダーを80g添加し19時間ボ
ールミル混合を行った。
Comparative Example 8 Indium oxide powder 7200 having a specific surface area of 4.50 m 2 / g
g of tin oxide powder having a specific surface area of 7.62 m 2 / g,
240 g of ion-exchanged water was placed in a resin pot together with zirconia balls having a diameter of 5 mm, and mixed in a ball mill for 20 hours. Next, 1440 g of ion-exchanged water and 64 g of a polycarboxylic acid-based dispersant were added and mixed in a ball mill for 1 hour. One hour later, 80 g of a wax-based binder was added, and ball mill mixing was performed for 19 hours.

【0040】次にスラリーにアミド系消泡剤1.6gを
添加し減圧脱気を行った。このスラリーの濃度は83%
だった。このスラリーを図2に示す構造の成形サイズ7
00mm×300mmの成形用型に鋳込み、減圧−76
0mmHgで排水し成形体を得た。成形体を乾燥後、脱
脂処理を600℃で3時間行った。その後、酸素雰囲気
にて1550℃で8時間焼成しITO焼結体を得た。こ
のときのITO焼結体の寸法は588mm×251mm
×7.1mmであり、焼結体の密度は97.9%(7.
00g/cm3 )であった。焼結体に12mm及び17
mmのクラックが発生した。
Next, 1.6 g of an amide-based antifoaming agent was added to the slurry, followed by degassing under reduced pressure. The concentration of this slurry is 83%
was. This slurry was molded to a size of 7 having the structure shown in FIG.
Cast into a 00 mm x 300 mm molding die,
Drained at 0 mmHg to obtain a molded body. After drying the compact, a degreasing treatment was performed at 600 ° C. for 3 hours. Then, it was baked at 1550 ° C. for 8 hours in an oxygen atmosphere to obtain an ITO sintered body. At this time, the dimensions of the ITO sintered body were 588 mm × 251 mm.
× 7.1 mm, and the density of the sintered body was 97.9% (7.
00 g / cm 3 ). 12mm and 17
mm cracks occurred.

【0041】比較例9 比表面積3.68m2 /gの酸化インジウム粉8100
gと、比表面積2.65m2 /gの酸化錫粉900g、
イオン交換水270gを直径5mmのジルコニアボール
とともに樹脂製ポットに入れ20時間ボールミル混合を
行った。次にイオン交換水1170gとポリカルボン酸
系分散剤41gを入れ1時間ボールミル混合した。1時
間後にワックス系バインダーを90g添加し19時間ボ
ールミル混合を行った。
Comparative Example 9 Indium oxide powder 8100 having a specific surface area of 3.68 m 2 / g
g of tin oxide powder having a specific surface area of 2.65 m 2 / g;
270 g of ion-exchanged water was put in a resin pot together with zirconia balls having a diameter of 5 mm, and mixed in a ball mill for 20 hours. Next, 1170 g of ion-exchanged water and 41 g of a polycarboxylic acid-based dispersant were added and mixed in a ball mill for 1 hour. One hour later, 90 g of a wax-based binder was added, and ball mill mixing was performed for 19 hours.

【0042】次にスラリーにアミド系消泡剤4.5gを
添加し減圧脱気を行った。このスラリーの濃度は86%
だった。このスラリーを図2に示す構造の成形サイズ7
00mm×300mmの成形用型に鋳込み、減圧−76
0mmHgで排水し成形体を得た。成形体を乾燥後、脱
脂処理を600℃で3時間行った。その後、酸素雰囲気
にて1550℃で8時間焼成しITO焼結体を得た。こ
のときのITO焼結体の寸法は597mm×255mm
×7.5mmであり、焼結体の密度は98.6%(7.
05g/cm3 )であった。焼結体に15mmのクラッ
クが発生した。
Next, 4.5 g of an amide-based antifoaming agent was added to the slurry, followed by degassing under reduced pressure. The concentration of this slurry is 86%
was. This slurry was molded to a size of 7 having the structure shown in FIG.
Cast into a 00 mm x 300 mm molding die,
Drained at 0 mmHg to obtain a molded body. After drying the compact, a degreasing treatment was performed at 600 ° C. for 3 hours. Then, it was baked at 1550 ° C. for 8 hours in an oxygen atmosphere to obtain an ITO sintered body. At this time, the size of the ITO sintered body was 597 mm × 255 mm.
× 7.5 mm, and the density of the sintered body was 98.6% (7.
05 g / cm 3 ). A 15 mm crack occurred in the sintered body.

【0043】表1は酸化錫の比表面積を固定した条件で
の酸化インジウムの比表面積とITOターゲットの抗折
強度を示している。酸化インジウムの比表面積が等しい
場合、泥漿鋳込み法で成形したITO成形体はプレス成
形したITO成形体に比較して抗折強度が低い。しかし
ながら、酸化インジウムの比表面積を高くすることで抗
折強度を高めることができる。
Table 1 shows the specific surface area of indium oxide and the bending strength of the ITO target when the specific surface area of tin oxide was fixed. When the specific surface area of indium oxide is equal, the ITO molded body formed by the slurry casting method has a lower bending strength than the pressed ITO molded body. However, the bending strength can be increased by increasing the specific surface area of indium oxide.

【0044】[0044]

【表1】 [Table 1]

【0045】表2に内寸法700mm×300mmで成
形したITO成形体の密度及び欠陥の有無を示す。使用
した酸化インジウム、酸化錫の原料粉の比表面積が本発
明で限定した範囲から外れるとクラック、脱脂割れなが
の欠陥が発生する。
Table 2 shows the density and the presence / absence of defects of the ITO molded body having an inner size of 700 mm × 300 mm. If the specific surface area of the used indium oxide or tin oxide raw material powder is out of the range defined in the present invention, cracks and degreasing cracks are generated.

【0046】[0046]

【表2】 [Table 2]

【0047】[0047]

【発明の効果】本発明によれば、酸化インジウムと酸化
錫の原料粉の比表面積を適正範囲に選択することによ
り、泥漿鋳込み成形法により従来の比べて大型で欠陥の
ない高密度ITO焼結体が得られる。
According to the present invention, by selecting the specific surface area of the raw material powder of indium oxide and tin oxide within an appropriate range, a high-density ITO sintering which is larger than the conventional one and has no defect can be performed by a slurry casting method. The body is obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係る泥漿鋳込み法によるITOターゲ
ットの製造工程を示す説明図である。
FIG. 1 is an explanatory view showing a production process of an ITO target by a slurry casting method according to the present invention.

【図2】本発明の泥漿鋳込み法に使用される成形型の説
明図である。
FIG. 2 is an explanatory view of a molding die used in the slurry casting method of the present invention.

【符号の説明】[Explanation of symbols]

1 スラリー 2 成形用型枠 3 成形用下型 4 フィルター 5 シール材 6 水抜き孔 DESCRIPTION OF SYMBOLS 1 Slurry 2 Mold form 3 Lower mold 4 Filter 5 Sealing material 6 Drain hole

フロントページの続き (51)Int.Cl.6 識別記号 FI H01B 13/00 503 C04B 35/00 D Continued on the front page (51) Int.Cl. 6 Identification code FI H01B 13/00 503 C04B 35/00 D

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】比表面積4.6m2 /g以上14.6m2
/g以下の酸化インジウム粉と、比表面積7.2m2
g以下の酸化錫粉をイオン交換水で調製してスラリーを
作り、このスラリーを泥漿鋳込み成形法により成形体と
し、得られた成形体を乾燥後、焼成することを特徴とす
るITO焼結体の製造方法。
1. A specific surface area of 4.6 m 2 / g or more and 14.6 m 2.
/ G or less of indium oxide powder and a specific surface area of 7.2 m 2 /
g of tin oxide powder or less with ion-exchanged water to form a slurry, and this slurry is formed into a compact by a slurry casting method, and the obtained compact is dried and fired. Manufacturing method.
【請求項2】請求項1に記載の方法で製造されたITO
成形体を乾燥後、酸素雰囲気で焼成して得られる相対密
度97.5%(密度6.97g/cm3 )以上のITO
焼結体。
2. An ITO manufactured by the method according to claim 1.
An ITO having a relative density of 97.5% (density 6.97 g / cm 3 ) or more obtained by drying the molded body and firing in an oxygen atmosphere
Sintered body.
JP10027177A 1998-02-04 1998-02-09 Production of ito sintered compact by slurry casting process Pending JPH11228220A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP10027177A JPH11228220A (en) 1998-02-09 1998-02-09 Production of ito sintered compact by slurry casting process
TW088101590A TW548256B (en) 1998-02-04 1999-02-02 Filtration-type mold and method for producing ceramic sintered body using the mold
KR10-1999-0003841A KR100453621B1 (en) 1998-02-04 1999-02-04 Filtration forming mold and method for producing ceramics sintered body using the same
CN99100765A CN1121358C (en) 1998-02-04 1999-02-04 Filtration-type mold and mehtod for producing ceramic sintered body using the mold

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10027177A JPH11228220A (en) 1998-02-09 1998-02-09 Production of ito sintered compact by slurry casting process

Publications (1)

Publication Number Publication Date
JPH11228220A true JPH11228220A (en) 1999-08-24

Family

ID=12213800

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10027177A Pending JPH11228220A (en) 1998-02-04 1998-02-09 Production of ito sintered compact by slurry casting process

Country Status (1)

Country Link
JP (1) JPH11228220A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100370401B1 (en) * 2000-08-31 2003-01-30 삼성코닝 주식회사 Method for preparing indium tin oxide powder from indium tin oxide scrap
KR100370402B1 (en) * 2000-08-31 2003-01-30 삼성코닝 주식회사 Method for preparing indium tin oxide powder from indium tin oxide scrap
JP2006222408A (en) * 2005-01-14 2006-08-24 Ricoh Co Ltd Conductive wiring structure and manufacturing method thereof
JP2009537426A (en) * 2006-05-18 2009-10-29 イドロ−ケベック Ceramic preparation process, the ceramic thus obtained and its use as a sputtering target in particular
JP2011140235A (en) * 2011-04-04 2011-07-21 Ulvac Japan Ltd Mold and method for producing plate-shaped sintered body

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100370401B1 (en) * 2000-08-31 2003-01-30 삼성코닝 주식회사 Method for preparing indium tin oxide powder from indium tin oxide scrap
KR100370402B1 (en) * 2000-08-31 2003-01-30 삼성코닝 주식회사 Method for preparing indium tin oxide powder from indium tin oxide scrap
JP2006222408A (en) * 2005-01-14 2006-08-24 Ricoh Co Ltd Conductive wiring structure and manufacturing method thereof
JP4675144B2 (en) * 2005-01-14 2011-04-20 株式会社リコー Method for manufacturing conductor wiring structure
JP2009537426A (en) * 2006-05-18 2009-10-29 イドロ−ケベック Ceramic preparation process, the ceramic thus obtained and its use as a sputtering target in particular
JP2011140235A (en) * 2011-04-04 2011-07-21 Ulvac Japan Ltd Mold and method for producing plate-shaped sintered body

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