JPH11211631A - Apparatus for diluting sampling exhaust gas - Google Patents

Apparatus for diluting sampling exhaust gas

Info

Publication number
JPH11211631A
JPH11211631A JP10023772A JP2377298A JPH11211631A JP H11211631 A JPH11211631 A JP H11211631A JP 10023772 A JP10023772 A JP 10023772A JP 2377298 A JP2377298 A JP 2377298A JP H11211631 A JPH11211631 A JP H11211631A
Authority
JP
Japan
Prior art keywords
exhaust gas
flow rate
diluted
gas
specific component
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10023772A
Other languages
Japanese (ja)
Inventor
Shigeru Yanagihara
茂 柳原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tsukasa Sokken KK
Original Assignee
Tsukasa Sokken KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tsukasa Sokken KK filed Critical Tsukasa Sokken KK
Priority to JP10023772A priority Critical patent/JPH11211631A/en
Publication of JPH11211631A publication Critical patent/JPH11211631A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To reduce a quantity of exhaust gas to be sampled, lessen a quantity of dilution air as much as possible and make a concentration of pollution components in the diluted exhaust gas proportional to a quantity in a flow rate of the whole exhaust gas similar to a CVS(constant volume sampler) apparatus. SOLUTION: When the exhaust gas of an engine is continuously extracted with a constant mass flow rate at a temperature not lower than a dew point, mixed with N2 or pure air and diluted, an apparatus 100 controls a flow rate of the N2 or pure air to obtain a flow rate of the diluted exhaust gas proportionally to a flow rate of the whole exhaust gas, thereby making a concentration of a specific component in the diluted exhaust gas 3 proportional to a discharge quantity of the specific component in the flow rate of the whole exhaust gas. Moreover, the apparatus controls to obtain the concentration of the specific component proportional to the discharge quantity within a sampling time when the diluted exhaust gas 3 is sampled at a constant flow rate.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は自動車の排気ガス測
定などの環境技術分野に係わる。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to the field of environmental technology such as exhaust gas measurement of automobiles.

【0002】[0002]

【従来の技術】自動車排気ガスによる大気汚染の防止技
術において、汚染成分の排出量を測定する方法として、
CVS(Constant Volume Sampler)装置が1970年代
から広く世界中で利用されてきた。これは排気ガスの全
流量を清浄な空気で希釈して一定流量の希釈排気ガスと
し、水分などの凝縮を防ぎながら一定流量である運転時
間内の試料ガスをバッグにサンプリングしてガス分析す
る方法で、希釈排気ガスの中のある特定成分の濃度がそ
の排出量に比例する装置である。
2. Description of the Related Art In a technology for preventing air pollution caused by automobile exhaust gas, as a method of measuring the amount of polluting components,
CVS (Constant Volume Sampler) devices have been widely used worldwide since the 1970s. This is a method of diluting the entire flow rate of exhaust gas with clean air to make a constant flow rate of diluted exhaust gas, and sampling the sample gas within the operating time at a constant flow rate into a bag while preventing condensation of moisture etc. and analyzing the gas. In this device, the concentration of a specific component in the diluted exhaust gas is proportional to the emission amount.

【0003】[0003]

【従来技術の問題点】CVS装置は排気ガスの全量を希
釈するために多量の清浄な希釈空気を必要とする。装置
全体が大型となり、設置や配管のスペースやブロワーな
どの動力も大きくなりコストも問題となる。近年自動車
の排気ガス対策が進み、またCNGやメタノ一ル燃料な
ど水分の割合の多い排気ガスへの対応やとくに低濃度の
汚染成分排出のエンジンに適応する測定装置には清浄度
の極めて高い乾燥希釈空気を多量に供給することが必要
であるが、その実現が困難となってきている。
2. Description of the Prior Art CVS systems require a large amount of clean dilution air to dilute the total amount of exhaust gas. The whole device becomes large, the space for installation and piping, the power of a blower, etc. increase, and the cost becomes a problem. In recent years, measures have been taken to reduce exhaust gas from automobiles. In addition, measurement equipment adapted to engines with a high moisture content, such as CNG and methanol fuel, and especially for engines that emit low-concentration pollutants, have extremely high cleanliness. It is necessary to supply a large amount of dilution air, but it has become difficult to achieve this.

【0004】[0004]

【発明が解決しようとする課題】排気ガスの汚染成分の
排出量を測定するための代表的試料をバッグにサンプリ
ングするにはCVS装置と同様に排気ガスを希釈して水
分などの凝縮を防ぐ必要がある。希釈排気ガスの量はガ
ス分析などに必要な量で良い訳で、排気ガスのサンプリ
ング量を少なくして、清浄度が極めて高いことが要求さ
れてコストなどで多くの難点がある希釈空気の量をでき
るだけ少なくし、しかもCVS装置と同様に希釈排気ガ
スの中の汚染成分の濃度を全排気ガス流量の中の量に比
例するようにすることが課題である。
In order to sample a representative sample for measuring the emission of polluting components of exhaust gas into a bag, it is necessary to dilute the exhaust gas to prevent condensation of moisture and the like as in the case of the CVS apparatus. There is. Since the amount of diluted exhaust gas is sufficient for gas analysis, etc., the amount of diluted air required to be extremely high in cleanliness by reducing the sampling amount of exhaust gas and having many difficulties in cost etc. It is an object of the present invention to make the concentration of contaminants in the diluted exhaust gas proportional to the amount in the total exhaust gas flow rate, as in the case of the CVS device, as much as possible.

【0005】[0005]

【課題を解決するための手段】上記の課題を解決する手
段のーつとしてサンプリングする排気ガスの質量流量を
一定とし、希釈する空気もしくはN2 ガスの流量を可変
として希釈排気ガスの流量を全排気ガス流量に逆比例す
るように制御する手段を選んだ。
As a means for solving the above-mentioned problems, the mass flow rate of the exhaust gas to be sampled is made constant, the flow rate of the diluted air or N 2 gas is made variable, and the flow rate of the diluted exhaust gas is changed. We chose a means to control it in inverse proportion to the exhaust gas flow rate.

【0006】一般に石油系燃料の燃焼排気ガスの露点は
55℃ないし65℃であるが、この流量を制御するため
には圧力変化などが生じるので、80℃程度以上に保つ
必要がある。こうした高温では熱式のマスフローコント
ローラは応答性などの点で適用に困難性を伴うことが多
い。質量流量を一定に制御するには一定温度・圧力にお
いてCFVを用いることが容易である。こうした実際の
装置の特性を考慮して本発明では、排気ガスの質量流量
をCFVで一定に制御し、希釈空気またはN2の流量を
熱式などの通常のマスフローコントローラで応答性良く
可変制御する手段を採用した。
[0006] Generally, the dew point of the combustion exhaust gas of petroleum-based fuel is 55 ° C to 65 ° C. However, in order to control this flow rate, it is necessary to maintain the dew point at about 80 ° C or more because a pressure change occurs. At such high temperatures, thermal mass flow controllers often have difficulty in application in terms of responsiveness and the like. In order to control the mass flow rate to be constant, it is easy to use CFV at a constant temperature and pressure. In the present invention, in consideration of such characteristics of the actual apparatus, the mass flow rate of the exhaust gas is controlled to be constant by the CFV, and the flow rate of the dilution air or N 2 is variably controlled with a high response by a normal mass flow controller such as a thermal type. Means were adopted.

【0007】さらに希釈排気ガスの露点が場合によって
は問題になることがあるが、本装置では流量が少なく装
置が小形化できるので容易に管系を40℃以上に保つよ
うにして、1/2程度以下の希釈比にも対応できるよう
にした。
Further, the dew point of the diluted exhaust gas may cause a problem in some cases. However, in this apparatus, since the flow rate is small and the apparatus can be miniaturized, the pipe system can be easily maintained at 40 ° C. or more by a factor of 1/2. It was made possible to cope with a dilution ratio of less than about.

【0008】[0008]

【発明実施の形態】本発明では実際に希釈排気ガスに用
いる排気ガス流量は通常1L/min以下と少ないの
で、排気ガスのサンプリング系での遅れ時間を少なくす
るためにバイパス流を利用する。サンプリング系の温度
は110℃程度に保ち、普通10L/min程度のバイ
パス流から0.4L/minないし3.0L/min程
度の希釈に用いる排気ガスを抽出して一定の入り口温度
・圧カ条件にしてCFV(音速ノズル)で一定の質量流
量に制御して吸引する。この吸引負圧は絶対圧で65k
Pa程度以下に制御され、小型のノズルでも十分に余裕
をもって音速にできる圧力とする。希釈空気またはN2
は最大流量30L/min程度の供給能力のある清浄な
標準空気発生装置または高圧ボンベから減圧して常圧・
常温として熱式のマスフローコントローラに入れる。
DESCRIPTION OF THE PREFERRED EMBODIMENTS In the present invention, the flow rate of the exhaust gas actually used for the diluted exhaust gas is usually as low as 1 L / min or less. Therefore, a bypass flow is used to reduce the delay time in the exhaust gas sampling system. The temperature of the sampling system is maintained at about 110 ° C., and the exhaust gas used for dilution of about 0.4 L / min to about 3.0 L / min is extracted from a bypass flow of about 10 L / min, and constant inlet temperature and pressure conditions are obtained. Then, a constant mass flow rate is controlled by a CFV (sonic velocity nozzle) and suction is performed. This suction negative pressure is 65k in absolute pressure
The pressure is controlled to about Pa or less, and the pressure can be set to a sonic speed with a sufficient margin even with a small nozzle. Dilution air or N 2
Is depressurized from a clean standard air generator or high-pressure cylinder capable of supplying a maximum flow rate of about 30 L / min.
As a normal temperature, put it in a thermal mass flow controller.

【0009】一方、排気ガスの全流量は別な排気ガス流
量計で測定されてその信号が制御回路に利用される。排
気ガスの全質量流量をXとし、希釈に用いる一定の排気
ガス質量流量をci とし、制御される希釈空気の質量流
量をda として、定数Aと希釈比rとの関係を数式にす
ると次のようになる。
On the other hand, the total flow rate of the exhaust gas is measured by another exhaust gas flow meter, and the signal is used for a control circuit. The total mass flow rate of the exhaust gas is X, a constant exhaust gas mass flow rate to be used for diluting and c i, as the mass flow rate d a of dilution air to be controlled, when the relationship between the dilution ratio r with constant A in equation It looks like this:

【0010】da =(A/X)−ci , r=ci
(d..+ci i =1,2・・・ この式のda になるように、信号Xに応じてマスフロー
コントローラで希釈空気流量を制御する。
D a = (A / X) −c i , r = c i /
(D .. + c i ) i = 1, 2,... The mass flow controller controls the dilution air flow rate according to the signal X so that d a in this equation is satisfied.

【0011】希釈排気ガス流量は排気ガスの全質量流量
に逆比例して変化するので、その中のある特定成分の濃
度はその成分の排出値に比例する。したがってこの方式
の希釈排気ガスから一定の流量でサンプリングしてバッ
グに捕集すれば、その運転時間内の排出量を代表する試
料が得られる。
Since the diluted exhaust gas flow rate varies inversely with the total mass flow of the exhaust gas, the concentration of a particular component therein is proportional to the emission value of that component. Therefore, if a sample is sampled at a constant flow rate from the diluted exhaust gas of this system and collected in a bag, a sample representative of the amount discharged during the operation time can be obtained.

【0012】[0012]

【実施例】本発明の実施例を図1の装置解説図によって
説明する。エンジンの排気管系の末端であるテールパイ
プ51に挿入した排気サンプリングプローブ21から排
気ガス1をほぼ一定流量で抽出し、約110℃に保たれ
たサンプリング系22を経由して10L/min程度の
流量の排気ガス試料がガスコネクタ−23を通して本装
置100に取り入れられる。高温フィルタ24を経て、
排気ガス分流器25において一定流量の希釈に用いる排
気ガス2が分流され、残余のガスはバッファータンク2
6とバイパスポンプ27、およぴ流量調節弁28、流量
モニタ−29を経由し排気排出コネクター30から装置
外に導かれ、エンジン排気系の下流側で排気サンプリン
グプローブに影響しない位置の排気排出ダクト32に戻
される。このようにして排気サンプリング系での遅れは
ほぼ0.2抄以内にすることができる。希釈に用いる排
気ガス2は3方電磁弁10を通して100℃程度に正確
に温度制御されかつ合流部37で合流するCFV11ま
たは11´のいずれかに入る。ここでは下流側の圧力が
ある圧力比0.7程度以下であればベンチュリーのスロ
ート部断面積で流量が決定されるので、容易に一定質量
流量c1 またはc2 に自動的に制御される。希釈に用い
る清浄な空気またはN2 は本装置100の外部から供給
されるが、例えば図に例示するようにボンベ41から減
圧弁42で一定圧力にして圧力計45でモニターされな
がらガスコネク夕−43から本装置100に導入され、
電磁弁44、3方電磁弁46を経てマスフローコントロ
ーラ20で流量制御されて希釈空気として供給される。
この流量はほぼ室温に近い温度で作動する熱式のマスフ
ローコントローラ20で制御回路50からの信号に応じ
て流量値daに応答性良く制御される。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described with reference to the apparatus explanatory diagram of FIG. An exhaust gas 1 is extracted at a substantially constant flow rate from an exhaust sampling probe 21 inserted into a tail pipe 51 at the end of an exhaust pipe system of the engine, and is extracted at a rate of about 10 L / min through a sampling system 22 maintained at about 110 ° C. A flow rate of the exhaust gas sample is introduced into the apparatus 100 through the gas connector 23. After passing through the high temperature filter 24,
Exhaust gas 2 used for dilution at a constant flow rate is divided in an exhaust gas distributor 25, and the remaining gas is supplied to a buffer tank 2.
6 and a bypass pump 27, a flow control valve 28, and an exhaust discharge duct that is guided to the outside of the apparatus from the exhaust discharge connector 30 via a flow monitor 29 and that does not affect the exhaust sampling probe on the downstream side of the engine exhaust system. It is returned to 32. In this way, the delay in the exhaust sampling system can be made within approximately 0.2%. The exhaust gas 2 used for dilution passes through the three-way solenoid valve 10, is accurately temperature-controlled to about 100 ° C., and enters either the CFV 11 or 11 ′ which joins at the junction 37. Here, since the flow rate at the throat cross-sectional area of the venturi not more than about pressure ratio 0.7 there is a pressure on the downstream side is determined, it is readily automatically controlled to a constant mass flow rate c 1 or c 2. The clean air or N 2 used for dilution is supplied from the outside of the present apparatus 100. For example, as shown in the figure, the gas is connected to the gas connector 4-43 while the pressure is kept constant from the cylinder 41 by the pressure reducing valve 42 and monitored by the pressure gauge 45. Introduced into the device 100 from
The flow rate is controlled by the mass flow controller 20 via the solenoid valve 44 and the three-way solenoid valve 46, and supplied as dilution air.
This flow rate is controlled with good responsiveness to the flow rate value da in response to a signal from the control circuit 50 by a thermal mass flow controller 20 operating at a temperature close to room temperature.

【0013】排気ガスと清浄な希釈空気とは混合部12
で一定な圧カ条件で混合され、希釈排気ガスと3とな
る。この庄力は希釈排気ガス分流部13で接続する吸引
ポンプ38の入り口側バッファータンク35に取り付け
られたリリーフ弁36で制御されるが、ほぽ絶対圧65
kPa程度に保たれ排気排出コネクター34から排出さ
れる。希釈排気ガスの一部は流量調節弁16で制御され
流量計17でモニ夕一されながら一定流量でバッグサン
プリングポンプ14で吸引され3方電磁弁18を経由し
てバッグ6などに圧送され、捕集されてガス分析用の試
料5となる。
The exhaust gas and the clean dilution air are mixed in the mixing section 12.
Are mixed under a constant pressure condition to become 3 with diluted exhaust gas. This pressure is controlled by a relief valve 36 attached to the inlet side buffer tank 35 of the suction pump 38 connected at the dilution exhaust gas diverting section 13, but the absolute pressure 65
It is kept at about kPa and discharged from the exhaust discharge connector 34. A part of the diluted exhaust gas is controlled by a flow control valve 16 and monitored by a flow meter 17 while being suctioned at a constant flow rate by a bag sampling pump 14 and sent to a bag 6 or the like via a three-way solenoid valve 18 to be pumped. It is collected to form a sample 5 for gas analysis.

【0014】バッグ6は多くの場合複数個装着され、各
分岐管に電磁弁9を備えて切り替えて使用すると共に、
着脱容易なコネクタ−8を備えておく。また管路にはバ
ッグ6の安全を図るために圧力スイッチ7が配置設計さ
れている。
In many cases, a plurality of bags 6 are mounted, and each branch pipe is provided with a solenoid valve 9 for switching and used.
A detachable connector-8 is provided. Further, a pressure switch 7 is arranged and designed in the pipeline to secure the bag 6.

【0015】バッグからの試料ガスの排出には排出ポン
プ47と電磁弁48,49が備えられている。これらに
よって試料ガスは分析ガスコネクタ−33から図に示し
ていないガス分析装置に送出される。各電磁弁の切り替
えによって試料ガスの導入やバッグを洗浄するパージ空
気の導入・排出などを行う。
A discharge pump 47 and solenoid valves 48 and 49 are provided for discharging the sample gas from the bag. As a result, the sample gas is sent from the analysis gas connector-33 to a gas analyzer (not shown). The switching of each solenoid valve introduces sample gas and introduces / discharges purge air for cleaning the bag.

【0016】制御回路50には全排気ガス流量の信号X
が入力され、CFV11,またはCFV11´で設定さ
れる希釈に用いる排気ガス流量c1 またはc2 がセット
され、希釈比に関係する定数Aを設定する。制御回路5
0からは全排気ガス流量がある値より大きいときはCF
V11(例えば3L/min)のセット信号が出され、
ある値より小さいときはCFV11´(例えば0.4L
/min)へのセット信号が電磁弁10に発信されると
共に、マスフローコントローラ20に流量daの指示信
号が次の式により計算されて発信される。
The control circuit 50 has a signal X of the total exhaust gas flow rate.
Is set, the exhaust gas flow rate c 1 or c 2 used for dilution set by the CFV 11 or CFV 11 ′ is set, and a constant A related to the dilution ratio is set. Control circuit 5
From 0, when the total exhaust gas flow rate is larger than a certain value, CF
A set signal of V11 (for example, 3 L / min) is issued,
When the value is smaller than a certain value, the CFV 11 '(for example, 0.4L
/ Min) set signal to together with is transmitted to the solenoid valve 10, an instruction signal flow d a mass flow controller 20 is transmitted is calculated by the following equation.

【0017】da =(A/X)−ci i は1ま
たは2でCFVの選択による) このときXの信号が入力されてからda の信号が発信さ
れるまでに遅延時間としてτL を設定できるようにして
おく。このτL はXの関数として定義されエンジンの排
気系のデッドボリュームなどに基づくテールパイプから
の排気ガスの排出時間遅れと本装置の排気ガスサンプリ
ング系の遅れ時間を補正するもので、通常1秒以内の時
間である。
[0017] d a = (A / X) -c i (i is 1 or by selection of CFV in 2) tau as a delay time from the signal of the time X is input to the signal d a is transmitted Be prepared to set L. This τ L is defined as a function of X, and corrects the delay time of the exhaust gas from the tail pipe based on the dead volume of the exhaust system of the engine and the delay time of the exhaust gas sampling system of the present apparatus, and is usually 1 second. Within hours.

【0018】制御回路50には希釈比rを次の式によっ
て計算し表示するようにしてあり、 r=Ci /(da +ci ) 希釈排気ガスの露点とバッグ入り口までの温度に配慮で
きるようにしてある。通常はr≦1/2で配管系を40
℃以上にして露点より高く保つ。
The control circuit 50 calculates and displays the dilution ratio r according to the following equation: r = C i / (d a + c i ) The dew point of the diluted exhaust gas and the temperature up to the bag inlet can be considered. It is like that. Normally, the pipe system is 40 when r ≦ 1/2.
Keep it above the dew point above ℃.

【0019】希釈排気ガスは吸引ポンプ38によって一
部または場合によっては全量が吸引される。その吸引負
圧力は吸引ポンプ38の入り口側に配置したバッファー
タンク35に装着したリリーフ弁36によって一定圧力
に制御されており、圧力計19によってモニターされ
る。バッグ6への希釈排気ガス試料4の送入はサンプリ
ングポンプ14と流量調節弁16と流量計17で必要流
量に設定し、3方電磁弁18の切り替えによってバッグ
サンプリングが必要な時間だけ行われる。このサンプリ
ングポンプ14の出・入り口に取り付けるバッファータ
ンク15には実質的なガスの流れの遅れ時間が短いもの
を選ぶことが望ましい。
The diluted exhaust gas is partially or possibly entirely sucked by the suction pump 38. The negative suction pressure is controlled to a constant pressure by a relief valve 36 mounted on a buffer tank 35 arranged on the inlet side of the suction pump 38, and is monitored by a pressure gauge 19. The supply of the diluted exhaust gas sample 4 to the bag 6 is set to a required flow rate by the sampling pump 14, the flow control valve 16 and the flow meter 17, and the three-way solenoid valve 18 is switched to perform the bag sampling for a necessary time. It is desirable to select a buffer tank 15 attached to the inlet / outlet of the sampling pump 14 that has a substantial delay in gas flow.

【0020】[0020]

【発明の効果】本発明によると極めて小型な装置によっ
て小流量の清浄な希釈用ガスを利用してエンジンの排気
ガスのある特定成分の排出量に比例した濃度の希釈排気
ガス試料が得られる。従来のCVS装置では全排気ガス
流量に対応する希釈用ガスを必要としたのに対比する
と、ほぼ1/1000程度の希釈用ガスでガス分析に必
要なバッグ試料が得られる。とくに排気ガス対策が進ん
だエンジンに適用するとき希釈に用いるガスの清浄度が
重要になるが、本発明の装置では希釈用ガスが小流量で
あるために、高純度のボンベガスまたは清浄度の高いガ
ス精製装置からの水分を含まないガスを利用することが
可能となり、バックグランド濃度に影響されない信頼性
の高い測定ができる。
According to the present invention, it is possible to obtain a diluted exhaust gas sample having a concentration proportional to the emission amount of a specific component of the exhaust gas of an engine by using a very small amount of clean diluent gas by an extremely small apparatus. Compared to the conventional CVS apparatus which requires a diluting gas corresponding to the total exhaust gas flow rate, a bag sample required for gas analysis can be obtained with approximately 1/1000 of the diluting gas. The cleanliness of the gas used for dilution is important especially when applied to an engine with advanced exhaust gas measures.However, in the apparatus of the present invention, since the dilution gas has a small flow rate, a high-purity cylinder gas or a highly clean gas is used. A gas containing no water from the gas purification device can be used, and highly reliable measurement can be performed without being affected by the background concentration.

【0021】希釈排気ガスの露点に関連して、管路系の
温度を容易に高くできるので、希釈比を小さくすること
ができる。さらに、装置が全体として小形化できるため
に、測定室におけるスペースにも自由度が増し、排気ガ
スサンプリングについてのコストも大幅に低減できる。
Since the temperature of the pipeline system can be easily raised in relation to the dew point of the diluted exhaust gas, the dilution ratio can be reduced. Further, since the apparatus can be downsized as a whole, the degree of freedom in the space in the measurement chamber is increased, and the cost for exhaust gas sampling can be significantly reduced.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の希釈排気ガスサンプリング装置の構成
を示す装置解説図
FIG. 1 is an explanatory view showing a configuration of a diluted exhaust gas sampling device of the present invention.

【符号の説明】[Explanation of symbols]

1 装置に導入する試料排気ガス 2 希釈に用いる試料排気ガス 3 希釈排気ガス 4 バッグに捕集する希釈排気ガス試料 5 バッグに捕集された希釈排気ガス試料 6,6′,6 バッグ 7 圧カスイッチ 8,8−,8 コネクター 9,9′,9 電磁弁 10 高温3方電磁弁 11 CFV(クリティカル・フロー・ベンチュリ) 11´ CFV 12 排気ガス・希釈ガス混合部 13 希釈排気ガス分流部 41 純空気ボ
ンベ 14 サンプリングポンプ 42 減圧弁 15 バッファータンク 43 ガスコネ
夕ター 16 流量調節弁 44 電磁弁 17 流量計 45 圧力計 18 3方電磁弁 46 3方電磁
弁 19 圧力計 47 排出ポン
プ 20 マスフローコントローラ 48 電磁弁 21 サンプリングプローブ 49 電磁弁 22 サンプリング系 50 制御回路 23 ガスコネクター 51 テールパ
イプ 24 高温フィルタ 100 排気ガ
ス希釈サンプリング 25 分流器 装置 26 バッファータンク 27 バイパスポンプ 28 流量調節弁 29 流量モニター 30 排気排出コネクター 31 サンプリングプローブホルダー 32 排気排出ダクト 33 分析ガスコネクター 34 排気排出コネクター 35 バッファータンク 36 リリーフ弁 37 合流部 38 吸引ポンプ
1 Sample exhaust gas introduced into the apparatus 2 Sample exhaust gas used for dilution 3 Dilution exhaust gas 4 Diluted exhaust gas sample collected in a bag 5 Diluted exhaust gas sample collected in a bag 6, 6 ', 6 Bag 7 Pressure Switch 8, 8-, 8 Connector 9, 9 ', 9 Solenoid valve 10 High-temperature three-way solenoid valve 11 CFV (critical flow venturi) 11' CFV 12 Exhaust gas / diluent gas mixing unit 13 Diluted exhaust gas distribution unit 41 Pure Air cylinder 14 Sampling pump 42 Pressure reducing valve 15 Buffer tank 43 Gas connector 16 Flow control valve 44 Solenoid valve 17 Flow meter 45 Pressure gauge 18 Three-way solenoid valve 46 Three-way solenoid valve 19 Pressure gauge 47 Discharge pump 20 Mass flow controller 48 Solenoid valve 21 Sampling Probe 49 Solenoid Valve 22 Sampling System 50 Control Circuit 23 Connector 51 Tail pipe 24 High temperature filter 100 Exhaust gas dilution sampling 25 Divider device 26 Buffer tank 27 Bypass pump 28 Flow control valve 29 Flow monitor 30 Exhaust exhaust connector 31 Sampling probe holder 32 Exhaust exhaust duct 33 Analytical gas connector 34 Exhaust exhaust connector 35 buffer tank 36 relief valve 37 junction 38 suction pump

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 エンジンの排気ガスを露点以上の温度に
おいて一定の質量流量で連続的に抽出し、これにN2
たは純空気を混合して希釈する時に、全排気ガス流量に
比例した希釈排気ガス流量になるようにN2 または純空
気の流量を制御して、希釈排気ガスの中のある特定成分
の濃度が全排気ガス流量の中のある特定成分の排出量に
比例するようにした排気ガス希釈サンブリング装置であ
って、さらにその希釈排気ガスを一定流量でサンプリン
グすると、そのサンプリング時間内の排出量に比例した
ある特定成分の濃度が得られる排気ガス希釈サンプリン
グ装置。
1. A method of continuously extracting an exhaust gas of an engine at a temperature equal to or higher than a dew point at a constant mass flow rate and diluting the mixed gas with N 2 or pure air to dilute the exhaust gas in proportion to the total exhaust gas flow rate. Exhaust in which the flow rate of N 2 or pure air is controlled so that the gas flow rate is reached, so that the concentration of a specific component in the diluted exhaust gas is proportional to the emission amount of the specific component in the total exhaust gas flow rate What is claimed is: 1. A gas dilution sampling apparatus, further comprising: sampling a diluted exhaust gas at a constant flow rate to obtain a concentration of a specific component in proportion to an emission amount during the sampling time.
【請求項2】 前項1の排気ガス希釈サンプリング装置
においてエンジンの排気ガスを一定の質量流量で連続的
に抽出するときに、サンプリングする排気ガスの流量を
全排気ガス流量の範囲またはエンジンの回転数などの範
囲に応じて段階的に2つ以上の流量設定値に切り換えて
希釈排気ガス流量の変化する範囲を適当に縮小しなが
ら、希釈排気ガスの中のある特定成分の濃度が全排気ガ
ス流量の中のある特定成分の排出量に比例するようにし
た排気ガス希釈サンプリング装置。
2. The exhaust gas dilution sampling apparatus according to claim 1, wherein when the exhaust gas of the engine is continuously extracted at a constant mass flow rate, the flow rate of the exhaust gas to be sampled is set within the range of the total exhaust gas flow rate or the engine speed. The concentration of a specific component in the diluted exhaust gas is adjusted to the total exhaust gas flow while appropriately switching the range in which the diluted exhaust gas flow is changed by gradually switching to two or more flow setting values according to the range. An exhaust gas dilution sampling device that is proportional to the amount of emission of a specific component in the exhaust gas.
JP10023772A 1998-01-21 1998-01-21 Apparatus for diluting sampling exhaust gas Pending JPH11211631A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10023772A JPH11211631A (en) 1998-01-21 1998-01-21 Apparatus for diluting sampling exhaust gas

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10023772A JPH11211631A (en) 1998-01-21 1998-01-21 Apparatus for diluting sampling exhaust gas

Publications (1)

Publication Number Publication Date
JPH11211631A true JPH11211631A (en) 1999-08-06

Family

ID=12119642

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10023772A Pending JPH11211631A (en) 1998-01-21 1998-01-21 Apparatus for diluting sampling exhaust gas

Country Status (1)

Country Link
JP (1) JPH11211631A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002214082A (en) * 2001-01-24 2002-07-31 Tsukasa Sokken Co Ltd Simultaneity correction apparatus for ensuring simultaneity in measurement of mass emission or fuel consumption quantity by high speed continuous measurement of flow rate and composition of exhaust gas
JP2003075308A (en) * 2001-09-06 2003-03-12 Tsukasa Sokken Co Ltd Mini constant flow rate sampling apparatus
JP2007024730A (en) * 2005-07-19 2007-02-01 Tsukasa Sokken Co Ltd Apparatus and method for sampling diluted exhaust gas using laminar exhaust gas flowmeter and heating/cooling surge tube apparatus
JP2015519585A (en) * 2012-06-11 2015-07-09 エイヴィエル・テスト・システムズ・インコーポレーテッド Exhaust sampling system and method for synchronizing time alignment and time delay
EP1467194B1 (en) 2003-04-11 2015-08-19 Testo AG Process and apparatus for detecting, characterising and/or eliminating particles

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002214082A (en) * 2001-01-24 2002-07-31 Tsukasa Sokken Co Ltd Simultaneity correction apparatus for ensuring simultaneity in measurement of mass emission or fuel consumption quantity by high speed continuous measurement of flow rate and composition of exhaust gas
JP2003075308A (en) * 2001-09-06 2003-03-12 Tsukasa Sokken Co Ltd Mini constant flow rate sampling apparatus
EP1467194B1 (en) 2003-04-11 2015-08-19 Testo AG Process and apparatus for detecting, characterising and/or eliminating particles
EP2270465B2 (en) 2003-04-11 2016-06-29 Testo AG Process and apparatus for detecting, characterising and/or eliminating particles
JP2007024730A (en) * 2005-07-19 2007-02-01 Tsukasa Sokken Co Ltd Apparatus and method for sampling diluted exhaust gas using laminar exhaust gas flowmeter and heating/cooling surge tube apparatus
JP2015519585A (en) * 2012-06-11 2015-07-09 エイヴィエル・テスト・システムズ・インコーポレーテッド Exhaust sampling system and method for synchronizing time alignment and time delay

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