JPH11207608A - Upper surface plate elevating and lowering mechanism in surface grinding device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To easily and accurately elevate/lower an upper surface plate and stop the upper surface plate at a fixed location by a small elevating/lowering mechanism, even if the gross weight is large, by normally energizing a surface plate supporting frame supporting the upper surface plate upward by air cylinders for receiving load. SOLUTION: A surface plate supporting frame 5 supports on a base member 12 which is freely rotatably mounted at one end of a machine body 1 by a bearing 11 so that the frame 5 may freely elevate/lower by an elevating/lowering mechanism 10. The elevating/lowering mechanism 10 is provided with a plurality of air cylinders 15 for receiving load which normally energize the surface plate supporting frame 5 upward and partially support a part of load of an upper surface plate assembly 3A including the surface plate supporting frame 5 and the upper surface plate. The plurality of air cylinders 15 normally support about 1/3 to 2/3 of load of the upper surface plate assembly 3A, for instance, and the remaining load is supported by a servo motor 16. As a result, the elevating/lowering mechanism 10 can be miniaturized, and the elevating/lowering and stopping at a fixed location of the upper plate assembly 3A can be easily and accurately performed.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a flat surface polishing apparatus for polishing both sides of a work held by a carrier using upper and lower platens, and raising and lowering the upper platen at the time of loading / unloading and polishing of the work. The present invention relates to an elevating mechanism for causing the lifting mechanism.

[0002]

2. Description of the Related Art A planar polishing apparatus such as a lapping machine or a polishing machine includes a sun gear, an internal gear, and upper and lower stools which are rotatably driven and rotatable coaxially. A work such as a semiconductor wafer held by a carrier that is in planetary motion by meshing with a workpiece is polished by sandwiching the work from both sides between upper and lower platens.

In such a flat surface polishing apparatus, when the upper surface plate is raised and lowered during loading / unloading of a work or polishing, etc., the lifting and lowering is performed by using an air cylinder or a servomotor alone. Was like that.

[0004] However, the method of using the air cylinder or the servomotor alone as described above requires an upper surface plate of several tens of kilograms.
There is no problem in the case of a relatively light weight such as several hundred kg, but the structure becomes complicated with the improvement of the polishing accuracy, and the upper platen and a supporting frame supporting the platen and related mechanisms such as a driving mechanism are included. Total weight of surface plate assembly is several tons to 10
It is very difficult for a recent polishing apparatus to reach tons to raise and lower this upper platen assembly by an air cylinder or a servomotor alone. That is, the method of using the air cylinder alone not only makes the air cylinder large, but also it is difficult to accurately stop the upper platen assembly at a fixed position due to air compressibility and the like. In the method using the servo motor alone, the large weight of the upper surface plate assembly necessitates the use of a large and expensive servo motor, and the lifting mechanism including its control device is very large. Become.

[0005]

The technical problem of the present invention is that even when the total weight of the upper stool including related equipment is large, the upper stool can be easily and accurately moved up and down by a small lifting mechanism. An object of the present invention is to provide an upper platen elevating mechanism capable of stopping a position.

[0006]

In order to solve the above-mentioned problems, a lifting mechanism according to the present invention is characterized in that a platen supporting frame for supporting an upper platen is constantly urged upward by a load receiving air cylinder. Thus, a part of the load of the upper stool assembly including the upper stool and the stool support frame is partially supported by the air cylinder, and the upper stool assembly is moved up and down by a servomotor in that state. It is characterized by having done.

According to the present invention, a small air cylinder and a servomotor can be used in the present invention, so that the lifting mechanism can be downsized. In addition, the small servomotor can be used to raise and lower the upper platen assembly. And the fixed position stop can be performed easily and accurately.

According to a preferred embodiment of the present invention, a plurality of the load receiving air cylinders are provided, and a drive shaft of the servo motor is provided at the center of the arrangement.

According to a specific embodiment of the present invention, the platen support frame is supported on a base member provided on the fuselage in a cantilever manner via a guide mechanism so as to be vertically movable. The air cylinder for receiving the load is provided between the base member and the platen support frame.

According to a more specific embodiment of the present invention,
The base member is rotatable with respect to the fuselage,
The platen support frame is configured to be pivotable between a polishing position and an unloading position of the work via the base member.

[0011]

DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 shows an example of a planar polishing apparatus to which an upper platen lifting mechanism according to the present invention is applied.
Reference numeral 2 denotes a lower platen rotatably disposed on the body 1 and connected to a drive source (not shown). Reference numeral 3 denotes an upper platen coaxially located above the lower platen 2. The base plate 3 is rotatably mounted on the tip of a platen support frame 5 which has a base end supported in a cantilever shape and extends horizontally, and is supported by a servomotor 6 for driving the upper platen. It is driven via a transmission mechanism provided inside the frame 5.

A sun gear 7 and an internal gear 8 are coaxially disposed at the center and the outer periphery of the lower platen 2, respectively, and mesh with the sun gear 7 and the internal gear 8. Carriers 9 that make planetary motion around sun gear 7
Are arranged, and the work 4 such as a semiconductor wafer or a magnetic disk substrate held by each carrier 9 is polished by being sandwiched between upper and lower platens from both sides.

As can be seen from FIG. 2, the base plate supporting frame 5 is supported by a lifting mechanism 10 on a base member 12 rotatably mounted on one end of the body 1 with a bearing 11 so as to be movable up and down. ing.

The elevating mechanism 10 includes a guide mechanism 14 for guiding the elevating and lowering of the platen support frame 5 and a platen supporting frame 5 by constantly urging the platen supporting frame 5 upward. A plurality of load receiving air cylinders 15 partially supporting a part of the load of the upper platen assembly 3A including the upper platen 3, and the platen support supported by the air cylinders 15 partially. A lifting / lowering servomotor 16 for lifting / lowering the frame 5 and stopping at a fixed position.

The guide mechanism 14 includes a linear guide 19 formed on an outer periphery of a first shaft 18 erected on the base member 12 in the axial direction, and a first shaft fixed to the lower surface of the platen support frame 5. And a slide member 21 formed on the inner surface of the second shaft 20 to be fitted to the linear guide 19. However, the configuration of the guide mechanism 14 is not limited to such a configuration, and any other configuration may be used as long as it can linearly guide the platen support frame 5 in the vertical direction.

The air cylinder 15 is provided with the first cylinder.
At the inner bottom of the shaft 18, three
And the rod 15a is connected to a frame member 20a integral with the second shaft 20. On the other hand, the servomotor 16 for raising and lowering the airframe is positioned on the center of the arrangement of the three air cylinders 15. 1 and its output shaft 16a is connected to the frame member 20a.

The three air cylinders 15 are, for example, about one load (about 6 to 10 tons) of the upper platen assembly 3A.
The servomotor 16 is controlled to always support about / 2 to 2/3, and the servomotor 16 supports the remaining load. This makes it possible to reduce the size of the air cylinder 15 and the servo motor 1 compared to when the air cylinder or the servo motor is used alone.
6 can be used, and not only can the lifting mechanism 10 be miniaturized, but also the small servomotor 1 can be used.
6 and its control mechanism, it is possible to easily and accurately move the upper platen assembly 3A up and down and stop at a fixed position.

The base plate supporting frame 5 includes the base member 12, a servomotor 23 for turning mounted on the body 1, a gear 24 mounted on an output shaft of the servomotor 23, and a base member. Turning mechanism 22 including a gear portion 12a partially formed on a part of the outer periphery of
As shown in FIG. 3, the workpiece 4 can be turned between the polishing position A and the unloading position B of the work 4.

The upper surface plate 3 has a suction hole at a position corresponding to each work 4 on the work surface, so that the work 4 after polishing is vacuum chucked and can be lifted. After turning to the unloading position B in this state, the unloading means 2
6, the workpieces 4 are sequentially taken out.

Further, the polishing apparatus has loading means 27 for carrying in the unprocessed work 4,
Can be supplied to the respective carriers 9 on the lower platen 2 while the workpiece is taken out by turning to the unloading position B.

As the vacuum chuck means, loading means 27 or unloading means 26, known ones can be used, and their constructions are not specifically mentioned here.

In the planar polishing apparatus having the above configuration,
The work 4 supplied to each carrier 9 on the lower stool 2 with the upper stool 3 raised is sandwiched between the upper and lower stools 2 and 3 by the lowering of the upper stool 3 and rotated. Both surfaces are polished by the platens 2 and 3. At this time, each carrier 9 is driven by the sun gear 7 and the internal gear 8 to perform planetary motion around the sun gear 7. The operation of lowering the upper platen 3 to the processing position is performed by the lifting servomotor 16 in the lifting mechanism 10 via the platen support frame 5. This is performed by another pressurizing cylinder (not shown) provided in the above.

When the polishing of the work 4 is completed and the upper and lower stools 2 and 3 are stopped at the predetermined rotation positions, the upper and lower stools 3 hold the processed work 4 and the lifting servo motor 16
Is guided by the guide mechanism 14 to ascend to a predetermined height, and the turning mechanism 8 causes the unloading position B
And the unloaded means 26 takes out the processed work 4 at this position. At this time, the unprocessed work is supplied to each carrier 9 on the lower platen 2 by the loading means 27.

When the removal of the processed work and the supply of the unprocessed work are completed, the upper surface plate 3 is turned to a position immediately above the lower surface plate 2 and then lowered by the servomotor 16 for lifting and lowering the work 4 again. Polishing is performed.

The upper platen 3 is lifted and lowered by partially supporting a part of the load of the upper platen assembly 3A by the load receiving air cylinder 15 of the lifting mechanism 10, and the servo is performed in a state where the load is reduced. Since the upper platen assembly 3A is very heavy, such as several tons to ten tons, it is driven by the motor 16 and the upper platen 3 is controlled by using a small servomotor 16 and its control mechanism. Can be easily raised and lowered, and at the same time, it can be reliably and accurately stopped at a predetermined position.

[0026]

As described above, according to the lifting mechanism of the present invention,
Even when the total weight of the upper stool is large, the upper stool can be easily moved up and down and stopped at a fixed position by a small lifting mechanism.

[Brief description of the drawings]

FIG. 1 is a side view showing one embodiment of a polishing apparatus using a lifting mechanism according to the present invention.

FIG. 2 is an enlarged sectional view of a main part of FIG.

FIG. 3 is a plan view of a main part of FIG. 1;

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 Airframe 2 Lower surface plate 3 Upper surface plate 3A Upper surface plate assembly 4 Work 5 Surface plate support frame 9 Carrier 10 Lifting mechanism 12 Base member 14 Guide mechanism 15 Air cylinder 16 Lifting servomotor 16a Output shaft 22 Rotating mechanism

Claims (4)

[Claims] An elevation mechanism for raising and lowering an upper surface plate and stopping at a fixed position in a plane polishing apparatus for polishing both surfaces of a work held by a carrier with upper and lower surface plates, wherein the upper surface plate is supported. A guide mechanism for guiding the lifting and lowering of the platen support frame, and by constantly urging the platen support frame upward to reduce the load of the upper platen assembly including the platen support frame and the upper platen. A load receiving air cylinder that partially supports the part, a lifting servomotor that lifts and lowers the upper platen assembly in a state where a part of the load is supported by the air cylinder,
An upper platen lifting / lowering mechanism in a planar polishing apparatus, comprising: 2. The upper platen elevating mechanism according to claim 1, wherein three of said load receiving air cylinders are provided at respective vertices of a triangle, and the output of said servomotor is provided at the center of their arrangement. It is characterized by having a shaft. 3. The upper platen lifting mechanism according to claim 1, wherein the platen support frame is supported in a cantilever shape on a base member provided on an airframe, and the platen support frame. An upper platen is attached to a tip of the base plate, and the guide mechanism and an air cylinder for receiving a load are provided between the platen support frame and the base member. 4. The upper platen elevating mechanism according to claim 3, wherein the base member is rotatable with respect to the body, and a driving means for rotating the base member is provided. The board support frame is pivotable between a workpiece processing position and an unloading position.