JPH11190866A - Light quantity adjusting device and image input device - Google Patents
Light quantity adjusting device and image input deviceInfo
- Publication number
- JPH11190866A JPH11190866A JP35785297A JP35785297A JPH11190866A JP H11190866 A JPH11190866 A JP H11190866A JP 35785297 A JP35785297 A JP 35785297A JP 35785297 A JP35785297 A JP 35785297A JP H11190866 A JPH11190866 A JP H11190866A
- Authority
- JP
- Japan
- Prior art keywords
- light
- adjusting device
- filter
- vapor deposition
- amount adjusting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、ビデオカメラ、デ
ジタルスチルカメラ等の画像入力装置に装備される光量
調節装置であって、特に光量調整のためのＮＤ（ニュー
トラル・デンシティ）フィルターを有する光量調節装置
に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a light amount adjusting device provided in an image input device such as a video camera and a digital still camera, and more particularly to a light amount adjusting device having an ND (neutral density) filter for adjusting the light amount. It concerns the device.
【０００２】[0002]
【従来の技術】従来の光量調節装置は、図６に示すよう
に、絞り羽根６３にＮＤフィルター６７を接着剤６８に
より取り付け、絞り羽根６３からフィルターとして使用
される部分６７ａが一定量はみだした状態で用いられて
いる。この場合、絞り部の厚みが増加してしまうため、
図７に示すカメラに光量調節装置７１を取り付けたとき
に、レンズ７２Ａ，７２Ｂ間の距離を大きくする必要が
あり、倍率の向上を妨げる問題となっていた。2. Description of the Related Art As shown in FIG. 6, an ND filter 67 is attached to a diaphragm blade 63 with an adhesive 68, and a portion 67a used as a filter protrudes from the diaphragm blade 63 by a predetermined amount as shown in FIG. Used in. In this case, since the thickness of the narrowed portion increases,
When the light amount adjusting device 71 is attached to the camera shown in FIG. 7, it is necessary to increase the distance between the lenses 72A and 72B, which has been a problem that hinders improvement in magnification.
【０００３】なお、図７に示す光量調節装置７１におい
て、７１ＡがＮＤフィルター（６７）、７１Ｂと７１Ｃ
が対向的に移動する絞り羽根（６３）である。ＮＤフィ
ルターは、上記絞り羽根の内の１枚に接着されている。
また、７１Ｄは絞り羽根支持板である。また、７２Ａ，
７２Ｂ，７２Ｃ，７２Ｄは撮影光学系７２を構成する成
分レンズであり、７３はローパスフィルタで、７４は固
体撮像素子である。In the light amount adjusting device 71 shown in FIG. 7, 71A is an ND filter (67), 71B and 71C.
Are aperture blades (63) that move oppositely. The ND filter is bonded to one of the aperture blades.
Reference numeral 71D is a diaphragm blade support plate. Also, 72A,
Reference numerals 72B, 72C and 72D denote component lenses constituting the photographing optical system 72, 73 denotes a low-pass filter, and 74 denotes a solid-state image sensor.
【０００４】ここで、絞り羽根とＮＤフィルターの板厚
を薄くすれば、レンズ７２Ａ，７２Ｂ間の距離を小さく
することも可能である。Here, if the thickness of the diaphragm blade and the ND filter is reduced, the distance between the lenses 72A and 72B can be reduced.
【０００５】[0005]
【発明が解決しようとする課題】しかしながら、絞り羽
根とＮＤフィルターを薄くすると、これらの反りが大き
くなってしまうという問題がある。However, if the diaphragm blades and the ND filter are made thinner, there is a problem that the warpage of the diaphragm blades and the ND filter increases.
【０００６】また、接着剤が多いと接着剤がはみだし、
また接着剤が少ないとＮＤフィルターが絞り羽根から剥
れるというように、接着剤の量の管理も難しい。If the amount of the adhesive is large, the adhesive protrudes.
Also, when the amount of the adhesive is small, it is difficult to control the amount of the adhesive such that the ND filter is peeled off from the diaphragm blade.
【０００７】しかも、絞り羽根への接着によりＮＤフィ
ルターの位置決めをしているため、ＮＤフィルターの正
確な位置決めをすることが困難である。また、接着時の
硬化収縮応力によりＮＤフィルターが反り返るおそれも
ある。Moreover, since the ND filter is positioned by bonding to the diaphragm blade, it is difficult to accurately position the ND filter. Further, the ND filter may warp due to the curing shrinkage stress at the time of bonding.
【０００８】そこで、本発明は、薄型で、光量調整を精
度良く行うことができ、しかも組立てを容易に行うこと
ができる光量調節装置を提供することを目的としてい
る。SUMMARY OF THE INVENTION It is an object of the present invention to provide a light amount adjusting device which is thin, can accurately adjust light amount, and can easily assemble.
【０００９】[0009]
【課題を解決するための手段】上記の目的を達成するた
めに、本願第１の発明では、絞り開口の大きさを変更す
る絞り変更部材を有する光量調節装置において、絞り変
更部材を、この絞り変更部材の基材上に遮光材料を塗装
して形成した遮光領域と基材上に光透過率を下げるため
の蒸着層を形成したＮＤフィルター用領域とを有するよ
うに作っている。In order to achieve the above object, according to a first aspect of the present invention, in a light quantity adjusting device having a diaphragm changing member for changing the size of a diaphragm opening, the diaphragm changing member includes a diaphragm changing member. It is made to have a light-shielding region formed by coating a light-shielding material on the substrate of the changing member, and an ND filter region on which a vapor-deposited layer for reducing light transmittance is formed on the substrate.
【００１０】すなわち、ＮＤフィルターを絞り変更部材
に接着する従来の構造とは異なり、同一基材内に絞り羽
根として機能する領域とＮＤフィルターとして機能する
領域とを一体成形することにより、反りや位置決め等の
問題を生ずることなく、上記従来のものに比べて薄型の
光量調節装置を実現している。That is, unlike the conventional structure in which the ND filter is adhered to the aperture changing member, the area functioning as the aperture blade and the area functioning as the ND filter are integrally formed in the same base material, so that warping and positioning are performed. Thus, a light amount adjusting device thinner than the above-mentioned conventional one can be realized without causing the above-mentioned problems.
【００１１】なお、上記第１の発明においては、基材と
光透過率を下げるための蒸着層との間に反射を防止する
ための蒸着層を形成するのが望ましい。また、ＮＤフィ
ルター用領域に、光透過率を下げるための蒸着層を複数
形成し、間に反射を防止するための蒸着層を形成するこ
とにより、反射を防止しつつＮＤフィルターとしての光
透過率を自由に設定してもよい。In the first aspect of the present invention, it is desirable to form a vapor deposition layer for preventing reflection between the substrate and the vapor deposition layer for lowering the light transmittance. Further, by forming a plurality of vapor-deposited layers for lowering the light transmittance in the ND filter region and forming a vapor-deposited layer for preventing reflection therebetween, the light transmittance as the ND filter is prevented while preventing reflection. May be set freely.
【００１２】さらに、複数のＮＤフィルター用領域を形
成し、これら複数のＮＤフィルター用領域における光透
過率を下げるための蒸着層数を互いに異ならせるように
してもよい。Further, a plurality of ND filter regions may be formed, and the number of vapor deposition layers for lowering the light transmittance in the plurality of ND filter regions may be different from each other.
【００１３】また、本願第２の発明では、絞り開口の大
きさを変更する絞り変更部材を有する光量調節装置にお
いて、絞り変更部材を、ＮＤフィルター用光透過率を有
する基材上に、ＮＤフィルター用領域を残して遮光材料
を塗装して作るようにしている。According to a second aspect of the present invention, in the light amount adjusting device having a diaphragm changing member for changing the size of the diaphragm opening, the diaphragm changing member is provided on a substrate having a light transmittance for an ND filter. It is made by painting the light-shielding material leaving the area for use.
【００１４】すなわち、基材自体にＮＤフィルターの機
能を持たせつつ、絞りバネとして機能させる部分に遮光
塗装を施すことにより、反りや位置決め等の問題を生ず
ることなく、上記従来のものに比べて薄型の光量調節装
置を実現している。That is, by providing the base material itself with the function of an ND filter and applying a light-shielding coating to a portion functioning as an aperture spring, problems such as warpage and positioning do not occur. A thin light amount adjustment device is realized.
【００１５】なお、上記第２の発明においても、複数の
ＮＤフィルター用領域を形成し、これら複数のＮＤフィ
ルター用領域のうち少なくとも１つ（基材をそのままＮ
Ｄフィルターとして用いる以外の領域）に光透過率を下
げるための蒸着層を形成してもよい。さらにはこれら蒸
着層を形成したＮＤフィルター用領域が複数ある場合に
は、これら領域における光透過率を下げるための蒸着層
数を互いに異ならせてもよい。In the second invention, a plurality of ND filter regions are formed, and at least one of the plurality of ND filter regions (the base material is used as it is).
An evaporation layer for lowering the light transmittance may be formed in a region other than the region used as the D filter. Further, when there are a plurality of ND filter regions in which these vapor deposition layers are formed, the number of vapor deposition layers for reducing the light transmittance in these regions may be different from each other.
【００１６】[0016]
【発明の実施の形態】（第１実施形態）図１には、本発
明の第１実施形態である光量調節装置を分解して示して
いる。なお、この光量調節装置は、図７に示したカメラ
（画像入力装置）に、光量調節装置７１に代えて用いら
れるものである。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS (First Embodiment) FIG. 1 shows an exploded light amount adjusting device according to a first embodiment of the present invention. This light amount adjusting device is used in the camera (image input device) shown in FIG. 7 instead of the light amount adjusting device 71.
【００１７】この図において、１は光量調節装置の静止
構造体であり、光路用開口部１ａを有する絞り地板、
３，４は絞り地板１の長手方向に相対移動する第１絞り
羽根、２はＮＤフィルター用領域２ａと遮光用領域とが
一体成形され、絞り地板１の長手方向に移動する第２絞
り羽根（請求の範囲にいう絞り変更部材）である。In this figure, reference numeral 1 denotes a stationary structure of the light amount adjusting device, which is a diaphragm base plate having an optical path opening 1a;
Reference numerals 3 and 4 denote first diaphragm blades which relatively move in the longitudinal direction of the diaphragm base plate 1, and 2 denote second diaphragm blades (in which the ND filter region 2a and the light shielding region are integrally formed, and which move in the longitudinal direction of the diaphragm base plate 1). (A diaphragm changing member) described in the claims.
【００１８】第１絞り羽根３，４には、駆動用長穴３
ｂ，４ｂが形成されており、これら駆動用長穴には、モ
ータ（ステッピングモータ等）５の出力軸５ａに連結さ
れて揺動駆動される駆動部材６の駆動ピン６ａが嵌合し
ている。The first aperture blades 3 and 4 have a driving slot 3
Drive pins 6a of a driving member 6, which is connected to an output shaft 5a of a motor (such as a stepping motor) 5 and is oscillated, are fitted into these elongated driving holes. .
【００１９】また、第１絞り羽根３，４には、光路を規
定するための開口部３ｆ，４ｆが形成されているととも
に、ガイド用長穴３ｃ，３ｄ，４ｃ，４ｄが形成されて
おり、これらガイド用長穴には絞り地板１に形成された
ガイドピン８，９，１０，１１が嵌合している。The first aperture blades 3 and 4 are formed with openings 3f and 4f for defining an optical path, and formed with guide slots 3c, 3d, 4c and 4d. Guide pins 8, 9, 10, and 11 formed on the drawn ground plate 1 are fitted into these elongated guide holes.
【００２０】一方、第２絞り羽根２には、駆動用長穴２
ｂが形成されており、この駆動用長穴には、不図示のモ
ータ（ステッピングモータ等）の出力軸に連結されて駆
動される駆動部材１２の駆動ピンが嵌合している。On the other hand, the second aperture blade 2 has a driving slot 2
The driving pin of the driving member 12 which is connected to and driven by an output shaft of a motor (not shown) is fitted into the driving slot.
【００２１】また、第２絞り羽根２には、ガイド用長穴
２ｃ，２ｄが形成されており、これらガイド用長穴には
絞り地板１に形成されたガイドピン１０，１１が嵌合し
ている。The second diaphragm blade 2 is formed with guide slots 2c and 2d. Guide pins 10 and 11 formed on the diaphragm base plate 1 are fitted into these guide slots. I have.
【００２２】ここで、図２および図３を用いて第２絞り
羽根２の構成について詳しく説明する。第２絞り羽根２
は、図３に示すように、蒸着基板（請求の範囲にいう基
材）２０上に遮光塗装２１を施した遮光用領域と、蒸着
基板２０上に反射を防止するためのＡｌ2 Ｏ3 蒸着層
（第１，３，５層）と光透過率を下げるためのＴｉＯｘ
蒸着層（第２，４，６層）とを交互に形成したＮＤフィ
ルター用領域２ａとを有する。Here, the configuration of the second aperture blade 2 will be described in detail with reference to FIGS. 2nd diaphragm blade 2
As shown in FIG. 3, a light-shielding region in which a light-shielding coating 21 is applied on a deposition substrate (base material in claims) 20 and an Al 2 O 3 deposition for preventing reflection on the deposition substrate 20 are shown in FIG. Layers (first, third, fifth layer) and TiOx for lowering light transmittance
And an ND filter region 2a in which deposition layers (second, fourth, sixth layers) are alternately formed.
【００２３】基板２０としては、剛性が高く、透明度が
高く、かつ耐熱性が高いＰＥＴまたはＰＥＮを用いる。
第２絞り羽根２を作るには、まず遮光用領域のみの加工
を行うために、ＮＤフィルター用領域となる部分をステ
ンレスの治工具を用いてマスキングし、剛性を持たせる
ために無電解ニッケルめっきを行い、その後遮光性をも
たせるためにポリアミドイド樹脂溶液（遮光材料）のス
プレー塗装を施す。As the substrate 20, PET or PEN having high rigidity, high transparency and high heat resistance is used.
In order to make the second diaphragm blade 2, first, in order to process only the light shielding region, a portion to be an ND filter region is masked using a stainless steel jig, and electroless nickel plating is performed to have rigidity. After that, a spray coating of a polyamideide resin solution (light-shielding material) is applied to provide light-shielding properties.
【００２４】次に、ＮＤフィルター用領域となる部分か
らマスキングを外し、ＮＤフィルター用領域となる部分
以外の部分を放熱性の高いＡｌ板でシャドウイングし、
上記蒸着層を形成する。Next, the masking is removed from the portion to be the ND filter region, and the portion other than the portion to be the ND filter region is shadowed with an Al plate having high heat dissipation,
The above evaporation layer is formed.
【００２５】なお、ＮＤフィルター用領域の光透過率は
ＴｉＯｘ蒸着層の総膜厚によって変化し、厚くなるほど
光透過率は低下する。このため、ＴｉＯｘ蒸着層の数は
必要とされる光透過率に応じて設定すればよい。The light transmittance of the ND filter region changes depending on the total thickness of the TiOx deposited layer, and the light transmittance decreases as the thickness increases. For this reason, the number of TiOx vapor-deposited layers may be set according to the required light transmittance.
【００２６】また、４００ｎｍ〜７００ｎｍの波長範囲
内での光透過率のニュートラル性はＴｉＯｘ膜組成のｘ
によって変化するので、ｘを適当に選択することにより
透過率分布をニュートラルにすることができる。好まし
くは、ｘの数値は０、５以上２以下の範囲であり、ｚ＝
１．２のとき約５５０ｎｍの波長を境界として低波長の
透過率が低くなるように傾く現象が出る。また、ｘ＝
１．２以上のときは逆に低波長の透過率が高くなるよう
に傾く。このため、蒸着時に透過率をモニタリングする
ことにより、透過率をニュートラルにすることが重要で
ある。The neutrality of the light transmittance in the wavelength range of 400 nm to 700 nm depends on the TiOx film composition.
The transmittance distribution can be neutralized by appropriately selecting x. Preferably, the numerical value of x is in the range of 0, 5 or more and 2 or less, and z =
In the case of 1.2, a phenomenon occurs in which the transmittance at low wavelengths becomes lower with the wavelength of about 550 nm as a boundary. Also, x =
On the other hand, when the ratio is 1.2 or more, the inclination is increased so that the transmittance at a low wavelength is increased. For this reason, it is important to make the transmittance neutral by monitoring the transmittance during the deposition.
【００２７】また、Ａｌ2 Ｏ3 蒸着層の蒸着時に、反射
率をモニタリングして膜厚みを制御することにより反射
率を小さくすることが可能である。In addition, it is possible to reduce the reflectivity by monitoring the reflectivity and controlling the film thickness when depositing the Al 2 O 3 vapor deposition layer.
【００２８】（第２実施形態）図４には、本発明の第２
実施形態である光量調節装置に用いられる絞り羽根を示
している。なお、この絞り羽根４２は、第１実施形態に
て説明した光量調節装置の第２絞り羽根２に代えて用い
られる。(Second Embodiment) FIG. 4 shows a second embodiment of the present invention.
3 illustrates an aperture blade used in the light amount adjusting device according to the embodiment. The aperture blade 42 is used in place of the second aperture blade 2 of the light amount adjusting device described in the first embodiment.
【００２９】この絞り羽根４２も、第１実施形態の第２
絞り羽根と同様にしてＮＤフィルター用領域と遮光用領
域とを一体成形したものであるが、ＮＤフィルター用領
域を２つ形成した点で第１実施形態のものと異なる。The diaphragm blade 42 is also the second embodiment of the first embodiment.
The ND filter region and the light shielding region are integrally formed in the same manner as the aperture blade, but differ from the first embodiment in that two ND filter regions are formed.
【００３０】すなわち、第１ＮＤフィルター用領域４２
ａと第２ＮＤフィルター用領域４２ｂとで、光透過率を
下げるためのＴｉＯｘ蒸着層の層数を変えている。この
絞り羽根４２を作る際には、まず第１および第２ＮＤフ
ィルター用領域４２ａ，４２ｂの全面に高い光透過率を
有する第１ＮＤフィルター用領域４２ａに必要な層数だ
けＴｉＯｘ蒸着を行った後、第１ＮＤフィルター用領域
４２ａのみにＡｌ板でシャドウイングを施し、光透過率
を低くする第２ＮＤフィルター用領域４２ｂにＴｉＯｘ
蒸着を重ねて行う。そして、これらＮＤフィルター用領
域４２ａ，４２ｂ以外の部分に遮光塗装を行う。That is, the first ND filter area 42
The number of TiOx deposited layers for lowering the light transmittance is changed between a and the second ND filter region 42b. When the aperture blade 42 is formed, first, TiOx is vapor-deposited on the entire surface of the first and second ND filter regions 42a and 42b by the number of layers necessary for the first ND filter region 42a having a high light transmittance. Only the first ND filter area 42a is shadowed with an Al plate to reduce the light transmittance.
Deposition is performed repeatedly. Then, a portion other than the ND filter regions 42a and 42b is coated with light-shielding.
【００３１】（第３実施形態）図５には、本発明の第３
実施形態である光量調節装置に用いられる絞り羽根を示
している。なお、この絞り羽根５２は、第１実施形態に
て説明した光量調節装置の第２絞り羽根２に代えて用い
られる。(Third Embodiment) FIG. 5 shows a third embodiment of the present invention.
3 illustrates an aperture blade used in the light amount adjusting device according to the embodiment. The aperture blade 52 is used in place of the second aperture blade 2 of the light amount adjusting device described in the first embodiment.
【００３２】この絞り羽根５２も、第１実施形態の第２
絞り羽根と同様にしてＮＤフィルター用領域と遮光用領
域とを一体成形したものであるが、ＮＤフィルター用領
域を４つ形成した点で第１実施形態のものと異なる。The diaphragm blade 52 is also the second embodiment of the first embodiment.
The ND filter region and the light shielding region are integrally formed in the same manner as the aperture blade, but differ from the first embodiment in that four ND filter regions are formed.
【００３３】すなわち、第１から第４ＮＤフィルター用
領域５２ａ〜５２ｄとで、光透過率を下げるためのＴｉ
Ｏｘ蒸着層の層数を変えている。この絞り羽根５２の作
り方は、第２実施形態の絞り羽根の作り方と同様に、ま
ず、全フィルター用領域５２ａ〜５２ｄに最も高い光透
過率を有する第１ＮＤフィルター用領域５２ａに必要な
層数だけＴｉＯｘ蒸着を行った後、第１から第３ＮＤ
フィルター用領域５２ａ〜５２ｃ、第１および第２Ｎ
Ｄフィルター用領域５２ａ，５２ｂ、第１ＮＤフィル
ター用領域５２ａにＡｌ板のシャドウイングを施してＴ
ｉＯｘ蒸着を行う工程を繰り返し行う。そして、これら
ＮＤフィルター用領域５２ａ〜５２ｄ以外の部分に遮光
塗装を行う。That is, the first to fourth ND filter regions 52a to 52d are provided with Ti for reducing the light transmittance.
The number of Ox deposition layers is changed. As with the method of manufacturing the aperture blades of the second embodiment, the number of layers required for the first ND filter region 52a having the highest light transmittance in all of the filter regions 52a to 52d is the same as that of the second embodiment. After performing TiOx deposition, first to third ND
Filter regions 52a to 52c, first and second N
The shadows of the Al plate are applied to the D filter regions 52a and 52b and the first ND filter region 52a, and T
The step of performing iOx deposition is repeated. Then, light-shielding coating is performed on portions other than the ND filter regions 52a to 52d.
【００３４】（第４実施形態）上記各実施形態では、遮
光塗装と光透過率を下げるための蒸着とを行う基板とし
て（無色又はＮＤフィルターには適さない程度の有色）
透明のものを用いる場合について説明したが、プラスチ
ックに有機色素が練り込まれてもともとＮＤフィルター
に適した光透過率を有する基板を用いて、遮光用領域と
ＮＤフィルター用領域とを有する絞り羽根を一体成形し
てもよい。(Fourth Embodiment) In each of the above embodiments, the substrate on which the light-shielding coating and the vapor deposition for lowering the light transmittance are performed is performed (colorless or colored so as not to be suitable for the ND filter).
Although the case of using a transparent material has been described, an aperture blade having a light-shielding region and an ND filter region is formed using a substrate in which an organic dye is kneaded into a plastic and has a light transmittance originally suitable for an ND filter. It may be integrally molded.
【００３５】この場合、基板自体がＮＤフィルターとし
ての機能を持ちあわせているため、ＮＤフィルター用領
域に蒸着加工をしなくて済む。遮光用領域に関しては、
第１実施形態と同様に、ＮＤフィルター用領域となる部
分をステンレスの治工具を用いてマスキングし、剛性を
持たせるために無電解ニッケルめっきを行い、その後遮
光性を持たせるためにポリアミドイミド樹脂溶液のスプ
レー塗装を施す。In this case, since the substrate itself has a function as an ND filter, it is not necessary to perform a deposition process on the ND filter region. Regarding the shading area,
As in the first embodiment, a portion serving as an ND filter region is masked using a stainless steel jig, and electroless nickel plating is performed to provide rigidity, and then polyamide-imide resin is used to provide light-shielding properties. Spray the solution.
【００３６】なお、第２および第３実施形態のように光
透過率が異なるＮＤフィルター用領域を複数形成する場
合には、基板をそのままＮＤフィルターとして用いる領
域以外のＮＤフィルター用領域にＴｉＯｘ蒸着層（必要
ならばＡｌ2 Ｏ3 蒸着層）を形成すればよい。When a plurality of ND filter regions having different light transmittances are formed as in the second and third embodiments, the TiOx deposited layer is formed on the ND filter regions other than the region where the substrate is used as the ND filter as it is. (If necessary, an Al 2 O 3 evaporated layer) may be formed.
【００３７】[0037]
【発明の効果】以上説明したように、本願第１および第
２の発明によれば、同一基材上に遮光部材として機能す
る領域とＮＤフィルターとして機能する領域とを塗装や
蒸着により形成し、ＮＤフィルター付き絞り変更部材を
一体成形したので、絞り変更部材自体を薄くすることな
く光量調節装置を薄型化することができる。このため、
この光量調節装置を挟んで配置されるレンズ間の距離を
小さくすることができ、倍率を向上させることができ
る。また、ＮＤフィルターの部分を絞り開口に対して正
確な位置に配置することができる。As described above, according to the first and second aspects of the present invention, a region functioning as a light shielding member and a region functioning as an ND filter are formed on the same base material by coating or vapor deposition. Since the diaphragm changing member with the ND filter is integrally formed, the light amount adjusting device can be made thinner without reducing the thickness of the diaphragm changing member itself. For this reason,
The distance between the lenses disposed with the light amount adjusting device therebetween can be reduced, and the magnification can be improved. Further, the ND filter can be arranged at an accurate position with respect to the aperture.
【００３８】さらに、従来のように、ＮＤフィルターを
接着する必要がないため、接着剤のはみだしやＮＤフィ
ルターの剥れ等の問題をも消することができ、容易に組
立てることができる。Further, since it is not necessary to bond the ND filter as in the prior art, problems such as the protrusion of the adhesive and the peeling of the ND filter can be eliminated, and the assembly can be easily performed.
【図１】本発明の第１実施形態である光量調節装置の分
解斜視図である。FIG. 1 is an exploded perspective view of a light amount adjusting device according to a first embodiment of the present invention.
【図２】上記光量調節装置の絞り羽根の拡大斜視図であ
る。FIG. 2 is an enlarged perspective view of an aperture blade of the light amount adjusting device.
【図３】上記絞り羽根の部分断面図である。FIG. 3 is a partial sectional view of the diaphragm blade.
【図４】本発明の第２実施形態である光量調節装置にお
ける絞り羽根の拡大斜視図である。FIG. 4 is an enlarged perspective view of an aperture blade in a light amount adjusting device according to a second embodiment of the present invention.
【図５】本発明の第３実施形態である光量調節装置にお
ける絞り羽根のイメージ図である。FIG. 5 is an image diagram of an aperture blade in a light amount adjusting device according to a third embodiment of the present invention.
【図６】従来の絞り羽根の拡大斜視図である。FIG. 6 is an enlarged perspective view of a conventional diaphragm blade.
【図７】従来の光量調節装置を備えたカメラの構成図で
ある。FIG. 7 is a configuration diagram of a camera provided with a conventional light amount adjusting device.
１ 絞り地板 ２，４２，５２，６３ （ＮＤフィルター付き）絞り羽
根 ２ａ，４２ａ，４２ｂ，５２ａ〜５２ｄ ＮＤフィルタ
ー用領域 ２０ 蒸着基板 ２１ 遮光塗装 ３，４ 絞り羽根 ５ モータREFERENCE SIGNS LIST 1 diaphragm base plate 2, 42, 52, 63 (with ND filter) diaphragm blade 2 a, 42 a, 42 b, 52 a to 52 d region for ND filter 20 vapor deposition substrate 21 light-shielding coating 3, 4 diaphragm blade 5 motor
Claims (10)
材を有する光量調節装置において、 前記絞り変更部材は、この絞り変更部材の基材上に遮光
材料を塗装して形成した遮光領域と前記基材上に光透過
率を下げるための蒸着層を形成したＮＤフィルター用領
域とを有することを特徴とする光量調節装置。1. A light amount adjusting device having an aperture changing member for changing the size of an aperture opening, wherein the aperture changing member includes a light shielding region formed by coating a light shielding material on a base material of the aperture changing member. An ND filter region in which a vapor deposition layer for lowering light transmittance is formed on a substrate.
層との間に反射を防止するための蒸着層を形成したこと
を特徴とする請求項１に記載の光量調節装置。2. The light quantity adjusting device according to claim 1, wherein a vapor deposition layer for preventing reflection is formed between the substrate and the vapor deposition layer for lowering light transmittance.
を下げるための蒸着層を複数形成したことを特徴とする
請求項１又は２に記載の光量調節装置。3. The light amount adjusting device according to claim 1, wherein a plurality of vapor-deposited layers for lowering light transmittance are formed in the ND filter region.
蒸着層の間に反射を防止するための蒸着層を形成したこ
とを特徴とする請求項３に記載の光量調節装置。4. The light amount adjusting device according to claim 3, wherein a vapor deposition layer for preventing reflection is formed between the substrate and the vapor deposition layer for lowering the light transmittance.
ー用領域が形成されており、 これら複数のＮＤフィルター用領域における光透過率を
下げるための蒸着層数が互いに異なることを特徴とする
請求項１から４のいずれかに記載の光量調節装置。 【請求項５】 絞り開口の大きさを変更する絞り変更部
材を有する光量調節装置において、 前記絞り変更部材は、ＮＤフィルター用光透過率を有す
る基材上に、ＮＤフィルター用領域を残して遮光材料を
塗装して作られたことを特徴とする光量調節装置。5. A plurality of ND filter regions are formed in the aperture changing member, and the plurality of ND filter regions are different in the number of vapor deposition layers for reducing light transmittance. The light amount adjustment device according to any one of 1 to 4. 5. A light amount adjusting device having an aperture changing member for changing the size of an aperture opening, wherein the aperture changing member shields light on a substrate having a light transmittance for an ND filter while leaving an area for an ND filter. Light intensity control device characterized by being made by painting materials.
ー用領域が形成されており、 これら複数のＮＤフィルター用領域のうち少なくとも１
つに光透過率を下げるための蒸着層を形成したことを特
徴とする請求項５に記載の光量調節装置。6. A plurality of ND filter regions are formed in the aperture changing member, and at least one of the plurality of ND filter regions is provided.
6. The light amount adjusting device according to claim 5, wherein a vapor deposition layer for lowering light transmittance is formed.
層との間に反射を防止するための蒸着層を形成したこと
を特徴とする請求項６に記載の光量調節装置。7. The light amount adjusting device according to claim 6, wherein a vapor deposition layer for preventing reflection is formed between the substrate and the vapor deposition layer for lowering light transmittance.
成されたＮＤフィルター用領域が複数形成されており、 これら複数のＮＤフィルター用領域における光透過率を
下げるための蒸着層数が互いに異なることを特徴とする
請求項６又は７に記載の光量調節装置。8. A plurality of ND filter regions on which a vapor deposition layer for lowering the light transmittance is formed, and the number of vapor deposition layers for lowering the light transmittance in the plurality of ND filter regions is different from each other. The light amount adjusting device according to claim 6, wherein the light amount adjusting device is different.
層の間に反射を防止するための蒸着層を形成したことを
特徴とする請求項８に記載の光量調節装置。9. The light quantity adjusting device according to claim 8, wherein a vapor deposition layer for preventing reflection is formed between the plurality of vapor deposition layers for lowering light transmittance.
量調節装置を備えたことを特徴とする画像入力装置。10. An image input device comprising the light amount adjusting device according to claim 1. Description:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP35785297A JP3961655B2 (en) | 1997-12-25 | 1997-12-25 | Light amount adjusting device and image input device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP35785297A JP3961655B2 (en) | 1997-12-25 | 1997-12-25 | Light amount adjusting device and image input device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH11190866A true JPH11190866A (en) | 1999-07-13 |
| JP3961655B2 JP3961655B2 (en) | 2007-08-22 |
Family
ID=18456263
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP35785297A Expired - Lifetime JP3961655B2 (en) | 1997-12-25 | 1997-12-25 | Light amount adjusting device and image input device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3961655B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001330869A (en) * | 2000-05-24 | 2001-11-30 | Canon Inc | Light quantity adjusting device, optical device and image pickup device |
| JP2002277612A (en) * | 2001-03-15 | 2002-09-25 | Canon Electronics Inc | Nd filter, method for manufacturing nd filter, device for controlling light quantity, and image pickup device |
| US7661892B2 (en) | 2004-10-26 | 2010-02-16 | Sony Corporation | Image-capturing device, light adjustment mechanism, and light control blade |
| US7932952B2 (en) | 2001-10-12 | 2011-04-26 | Canon Kabushiki Kaisha | Light quantity adjusting device, optical system having the same, and image taking apparatus |
-
1997
- 1997-12-25 JP JP35785297A patent/JP3961655B2/en not_active Expired - Lifetime
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001330869A (en) * | 2000-05-24 | 2001-11-30 | Canon Inc | Light quantity adjusting device, optical device and image pickup device |
| JP4684386B2 (en) * | 2000-05-24 | 2011-05-18 | キヤノン株式会社 | Light amount adjusting device and optical apparatus |
| JP2002277612A (en) * | 2001-03-15 | 2002-09-25 | Canon Electronics Inc | Nd filter, method for manufacturing nd filter, device for controlling light quantity, and image pickup device |
| JP4637383B2 (en) * | 2001-03-15 | 2011-02-23 | キヤノン電子株式会社 | ND filter, ND filter manufacturing method, light amount adjusting device, and photographing device |
| US7932952B2 (en) | 2001-10-12 | 2011-04-26 | Canon Kabushiki Kaisha | Light quantity adjusting device, optical system having the same, and image taking apparatus |
| US7661892B2 (en) | 2004-10-26 | 2010-02-16 | Sony Corporation | Image-capturing device, light adjustment mechanism, and light control blade |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3961655B2 (en) | 2007-08-22 |
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