JPH11186156A - Xy stage - Google Patents

Xy stage

Info

Publication number
JPH11186156A
JPH11186156A JP9364614A JP36461497A JPH11186156A JP H11186156 A JPH11186156 A JP H11186156A JP 9364614 A JP9364614 A JP 9364614A JP 36461497 A JP36461497 A JP 36461497A JP H11186156 A JPH11186156 A JP H11186156A
Authority
JP
Japan
Prior art keywords
stage
linear motor
upper plate
lower plate
electromagnet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9364614A
Other languages
Japanese (ja)
Other versions
JP3553350B2 (en
Inventor
Kazuhide Watanabe
和英 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Priority to JP36461497A priority Critical patent/JP3553350B2/en
Publication of JPH11186156A publication Critical patent/JPH11186156A/en
Application granted granted Critical
Publication of JP3553350B2 publication Critical patent/JP3553350B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
  • Details Of Measuring And Other Instruments (AREA)

Abstract

PROBLEM TO BE SOLVED: To enable stable fine positioning operation at a high speed, by installing electromagnets for levitation which levitates and retains a stage, and a linear motor stator which positions the stage in the XY direction in a noncontact manner. SOLUTION: Four corners of an upper plate 11a on which a specimen is mounted and a lower plate 11b are combined by struts 11c, and an XY stage 11 is constituted. On the upper surface of the upper plate 11a, e.g. a semiconductor wafer 12 is mounted. Electromagnets 14 for levitation are arranged on four corners of the lower surface of a fixed pedestal 13. Magnetic pole surfaces of the electromagnets face the lower plate 11b of the stage 11 and levitate and retain the stage 11 in a noncontact manner. A stator 15a of a linear motor is installed in the upper surface of the fixed pedestal 13, and a movable member for the linear motor is installed on the lower surface of the upper plate 11a of the stage 11. The movable member is constituted of a magnetic material having an uneven surface. The linear motor stator 15a of the fixed pedestal 13 exerts magnetic attractive force to a magnetic pole having the uneven surface in the X, Y directions, so that the stage 11 is moved and positioned.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、XYステージに係
り、特に光リソグラフィのための描画装置等の半導体製
造装置や半導体検査装置等の試料を載置するのに用いて
好適な、精密な位置決めを行うことのできるXYステー
ジに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an XY stage, and particularly to a precise positioning suitable for mounting a sample such as a semiconductor manufacturing apparatus such as a drawing apparatus for optical lithography or a semiconductor inspection apparatus. XY stage capable of performing the following.

【0002】[0002]

【従来の技術】半導体製造装置や検査装置等において
は、その試料を通常XYステージに載置して、その処理
や観察等を行っている。近年、半導体デバイスの高集積
化が進むにつれて回路の配線が微細化し、配線間距離も
狭くなりつつある。特に0.5μm以下の光リソグラフ
ィの場合、ステッパーの結像点を高精度に位置決めする
必要があるが、しかも高速で移動位置決めをしないとス
ループットにも影響する。
2. Description of the Related Art In a semiconductor manufacturing apparatus, an inspection apparatus, or the like, a sample is usually mounted on an XY stage to perform processing, observation, and the like. In recent years, as semiconductor devices have become highly integrated, circuit wiring has become finer, and the distance between wirings has been decreasing. In particular, in the case of optical lithography of 0.5 μm or less, it is necessary to position the imaging point of the stepper with high accuracy.

【0003】しかしながら、従来のXYステージは、設
置台に置かれたアクチュエータ、例えば、サーボモータ
により、ボールネジ等を介して、X方向或いはY方向の
フィードバック制御等により、試料を載置したテーブル
が位置決め制御されていた。このように、機械的摩擦が
ある機構では、高速且つ高精度の位置合わせには必ずし
も十分なものではなかった。
However, in the conventional XY stage, a table on which a sample is placed is positioned by feedback control in an X direction or a Y direction through a ball screw or the like by an actuator, for example, a servomotor placed on a mounting table. Was controlled. Thus, a mechanism having mechanical friction is not always sufficient for high-speed and high-accuracy alignment.

【0004】[0004]

【発明が解決しようとする課題】例えば、スキャンタイ
プのステッパでは、XYステージを高速、高精度且つス
ムーズに移動させる必要がある。このように、半導体製
造装置等においては、XYステージ上の測定対象物、加
工対象物等の搭載物を高速且つ高精度に位置決めする必
要性がますます要求されている。電子顕微鏡でも同様で
あり、サブミクロンオーダの位置決めを、精度よく、且
つ高速に行うことができることが望まれている。
For example, in the case of a scan type stepper, it is necessary to move the XY stage smoothly at high speed, with high precision, and smoothly. As described above, in a semiconductor manufacturing apparatus and the like, there is an increasing demand for a high-speed and high-precision positioning of a mounted object such as an object to be measured and an object to be processed on an XY stage. The same applies to electron microscopes, and it is desired that positioning on the order of submicrons can be performed accurately and at high speed.

【0005】本発明は上述した事情に鑑みて為されたも
ので、微細な位置決め動作を安定に且つ高速に行うこと
ができるXYステージを提供することを目的とする。
The present invention has been made in view of the above circumstances, and has as its object to provide an XY stage capable of performing a fine positioning operation stably and at a high speed.

【0006】[0006]

【課題を解決するための手段】本発明のXYステージ
は、搭載物を載置する上板と、下板と、該上板及び下板
の四隅を結合した支柱とからなるステージと、前記ステ
ージの下板に対面する磁極面を有して前記ステージを浮
上支持する浮上用電磁石と、前記上板の下面に設けられ
たリニアモータの可動子に対面して前記ステージをXY
方向に非接触で位置決めするリニアモータ固定子とを備
えたことを特徴とする。
According to the present invention, there is provided an XY stage comprising an upper plate on which a load is placed, a lower plate, and a column connecting four corners of the upper plate and the lower plate. A levitation electromagnet having a magnetic pole surface facing the lower plate for levitation and supporting the stage; and an XY stage facing the mover of the linear motor provided on the lower surface of the upper plate.
And a linear motor stator positioned in a non-contact manner in the direction.

【0007】上述した本発明によれば、搭載物を載置す
るステージを浮上用電磁石により浮上支持し、XY方向
の位置決め動作を同様にリニアモータにより非接触で行
うことから、安定に且つ高速にステージの搭載物の位置
決め動作を行うことができる。これにより電子顕微鏡等
においては、高倍率の観察を安定に行うことが可能とな
り、又半導体製造装置等においては微細な位置合わせを
精度よく行うことができる。従って、例えば半導体製品
の製造歩留まり等に良好な影響をもたらすことができ
る。
According to the present invention described above, the stage on which the object is mounted is levitated and supported by the levitating electromagnet, and the positioning operation in the XY directions is similarly performed without contact by the linear motor. The positioning operation of the load on the stage can be performed. This makes it possible to stably perform high-magnification observation in an electron microscope or the like, and to perform fine alignment with high accuracy in a semiconductor manufacturing apparatus or the like. Therefore, a favorable effect can be brought about, for example, on the production yield of semiconductor products.

【0008】また、前記ステージ下板と浮上用電磁石と
の相対変位を検出する変位センサと、該変位センサの信
号に基づいて浮上用電磁石の磁力を制御する制御回路と
を備えたことを特徴とする。これにより、フィードバッ
ク制御が可能となり、Z方向等の目標浮上位置にステー
ジを位置決めすることができる。
[0008] Further, there is provided a displacement sensor for detecting a relative displacement between the stage lower plate and the levitation electromagnet, and a control circuit for controlling a magnetic force of the levitation electromagnet based on a signal from the displacement sensor. I do. As a result, feedback control becomes possible, and the stage can be positioned at the target floating position in the Z direction or the like.

【0009】また、前記ステージのXY方向位置を検出
する位置センサと、該位置センサの信号に基づいて、前
記リニアモータを駆動して前記ステージを位置決めする
制御回路とを備えたことを特徴とする。これにより、同
様に高精度のX,Y方向等の位置決めが可能となる。
[0009] Further, there is provided a position sensor for detecting a position of the stage in the X and Y directions, and a control circuit for driving the linear motor and positioning the stage based on a signal from the position sensor. . This also enables highly accurate positioning in the X and Y directions and the like.

【0010】また、前記浮上用電磁石と、リニアモータ
とはそれぞれが隔壁によって密閉されていることを特徴
とする。これにより、真空等の高清浄度雰囲気下におい
ても、使用が可能となる。
The levitation electromagnet and the linear motor are each sealed by a partition. Accordingly, it can be used even under a high cleanliness atmosphere such as a vacuum.

【0011】[0011]

【発明の実施の形態】以下、本発明の実施の形態につい
て添付図面を参照しながら説明する。
Embodiments of the present invention will be described below with reference to the accompanying drawings.

【0012】図1は、本発明の一実施形態のXYステー
ジを示す。このXYステージ11においては、試料を載置
する上板11aと下板11bとがそれぞれの四隅を支柱11cに
より結合されて構成されている。上板11aの上面には例
えば半導体ウエハ等の搭載物12が戴置される。ステージ
11は、固定脚13aにより支持された固定基台13の電磁石
により非接触で浮上支持されると共に、X,Y方向に同
様にリニアモータにより非接触で駆動され、位置決め制
御される。
FIG. 1 shows an XY stage according to an embodiment of the present invention. In the XY stage 11, an upper plate 11a on which a sample is placed and a lower plate 11b are connected to each other at four corners by pillars 11c. On the upper surface of the upper plate 11a, a load 12, such as a semiconductor wafer, is placed. stage
11 is floated and supported in a non-contact manner by an electromagnet of a fixed base 13 supported by a fixed leg 13a, and is similarly driven in a non-contact manner by a linear motor in the X and Y directions to perform positioning control.

【0013】図2は、このXYステージの立面図であ
る。固定基台13の下面には、その四隅に浮上用電磁石14
を備えている。この浮上用電磁石14の磁極面は、ステー
ジ11の下板11bに対面しており、磁性体プレートである
下板11bに磁気吸引力を及ぼすことで、ステージ11を非
接触浮上支持する。
FIG. 2 is an elevation view of the XY stage. On the lower surface of the fixed base 13, electromagnets 14
It has. The magnetic pole surface of the levitation electromagnet 14 faces the lower plate 11b of the stage 11, and applies a magnetic attractive force to the lower plate 11b, which is a magnetic plate, to support the stage 11 in a non-contact floating manner.

【0014】それぞれの電磁石14の略中央部には変位セ
ンサを備え、磁性体プレートからなる下板11bとの間隔
が計測され、図3に示すようにこの変位信号に基づい
て、図7のz,α,βの3自由度を制御回路により浮上
用電磁石14を励磁して制御し、下板11b、ひいては搭載
物12が戴置されたステージ11の全体を所定の目標浮上位
置に浮上支持する。
A displacement sensor is provided at a substantially central portion of each of the electromagnets 14, and a distance between the electromagnet 14 and the lower plate 11b made of a magnetic material plate is measured. As shown in FIG. , Α, β are controlled by exciting the levitation electromagnet 14 by a control circuit, and the lower plate 11b and, consequently, the entire stage 11 on which the load 12 is placed are levitated and supported at a predetermined target levitation position. .

【0015】図4に示すように、固定基台13の上面には
リニアモータの固定子15aを備えている。そして、ステ
ージ11の上板11aの下面にはリニアモータ用の可動子15b
を備えている。この可動子15bは、例えば櫛の歯状の凹
凸面を有する磁性材からなり、この凹凸面を有する磁極
に対して固定基台13のリニアモータ固定子15aが図7の
X方向、Y方向に磁気吸引力を及ぼすことで、ステージ
11を移動させて位置決めする。図5に示すように固定基
台13を固定しているベースにはレーザ干渉計17aを備
え、ステージ11の上板11aにレーザ干渉計用のミラー17b
を備え、レーザビームBによりその精密な位置を検出す
る。従って、レーザ干渉計17aはミラー17bの図7のX,
Y及びγ方向の位置信号を検出し、図6に示すように制
御回路によりリニアモータの1次側15aを制御すること
により、目標位置にステージ11を移動させることができ
る。
As shown in FIG. 4, on the upper surface of the fixed base 13, a stator 15a of a linear motor is provided. A mover 15b for a linear motor is provided on the lower surface of the upper plate 11a of the stage 11.
It has. The mover 15b is made of, for example, a magnetic material having a comb-shaped uneven surface, and the linear motor stator 15a of the fixed base 13 is moved in the X direction and the Y direction in FIG. By applying magnetic attraction, the stage
Move 11 for positioning. As shown in FIG. 5, a laser interferometer 17a is provided on a base on which the fixed base 13 is fixed, and a mirror 17b for the laser
And the precise position is detected by the laser beam B. Therefore, the laser interferometer 17a is provided with the mirror 17b as shown in FIG.
By detecting the position signals in the Y and γ directions and controlling the primary side 15a of the linear motor by the control circuit as shown in FIG. 6, the stage 11 can be moved to the target position.

【0016】これによりステージ11は浮上用電磁石14の
磁気吸引力により浮上支持されつつ、リニアモータ15
a,15bにより、X,Y方向の任意の位置にステージ11を
駆動することにより、非接触で位置決め制御することが
できる。このように、このXYステージにおいては、位
置決め制御が非接触で電磁的に行われるので、従来のギ
ア等のメカニカルな機構を用いることなく、精密な且つ
高速な位置決め動作が可能となる。
As a result, the stage 11 is levitated and supported by the magnetic attraction force of the levitating electromagnet 14 while the linear motor 15
By driving the stage 11 to an arbitrary position in the X and Y directions by a and 15b, positioning control can be performed in a non-contact manner. As described above, in the XY stage, since the positioning control is performed electromagnetically in a non-contact manner, a precise and high-speed positioning operation can be performed without using a mechanical mechanism such as a conventional gear.

【0017】また、このXYステージにおいては、固定
基台13、モータ固定子(1次側)15a、浮上用電磁石1
4、変位センサ等はそれぞれキャンにより封止されてい
る。従って、これらがキャン等の隔壁によって密閉され
ることで、真空雰囲気等の極めて清浄度の高い環境にお
いても、ガスの発生等による高い清浄度の要求される搭
載物に対する汚染等を防止することができる。
In the XY stage, a fixed base 13, a motor stator (primary side) 15a, a floating electromagnet 1
4. The displacement sensors are sealed by cans. Therefore, by sealing these with a partition wall such as a can, it is possible to prevent contamination of a load requiring high cleanliness due to generation of gas or the like even in an environment with extremely high cleanliness such as a vacuum atmosphere. it can.

【0018】尚、上述した説明においては、固定基台下
面に設けた浮上用電磁石14により、ステージ11の下板11
bを磁気吸引力により懸垂保持する構成としたが、下板1
1bをアルミ板等により構成し、その下側に交番磁界を生
成する電磁石の磁極面を配置することで、反発浮上支持
するようにしてもよい。また、上板11aの下面にアルミ
板等の金属板を配置することで、リニア誘導モータの可
動子(2次側)とし、固定基台13に固定された電磁石15
aをリニア誘導モータの固定子(1次側)として、これ
により駆動するようにしてもよい。
In the above description, the lower plate 11 of the stage 11 is moved by the floating electromagnet 14 provided on the lower surface of the fixed base.
b is suspended by magnetic attraction.
1b may be made of an aluminum plate or the like, and a magnetic pole surface of an electromagnet for generating an alternating magnetic field may be arranged below the aluminum plate to support repulsion and floating. Further, by disposing a metal plate such as an aluminum plate on the lower surface of the upper plate 11a, the movable member (secondary side) of the linear induction motor can be used.
a may be used as a stator (primary side) of the linear induction motor to drive the linear induction motor.

【0019】又、ステージ上板の下面に可動子の永久磁
石を有し、固定基台13に固定子のコイルを配置したリ
ニア直流モータでステージを駆動してもよい。
Alternatively, the stage may be driven by a linear DC motor having a permanent magnet of a mover on the lower surface of the upper plate of the stage and a coil of the stator arranged on a fixed base 13.

【0020】更に又、ステージの上板に搭載物を載置す
る支持台を更に備え、この支持台を圧電素子等のアクチ
ュエータで移動制御するようにしてもよい。これによ
り、リニアパルスモータを用いてラフな位置合わせを行
い、更に圧電素子等のアクチュエータにより微細な位置
合わせを行うこともできる。このように本発明の趣旨を
逸脱することなく、種々の変形実施例が可能である。
Further, the stage may further include a support for mounting the object on the upper plate, and the movement of the support may be controlled by an actuator such as a piezoelectric element. Thus, rough positioning can be performed using a linear pulse motor, and fine positioning can be performed using an actuator such as a piezoelectric element. Thus, various modifications can be made without departing from the spirit of the present invention.

【0021】[0021]

【発明の効果】以上に説明したように本発明のXYステ
ージによれば、ステージを非接触で浮上支持しつつ、
X,Y方向に任意に位置決めが可能である。従って、高
精度で且つ高速応答性に優れたXYステージを実現する
ことができ、これにより半導体製造装置、或いは検査機
器等の微細な位置決めを要する機器のスループットを向
上させることができる。
As described above, according to the XY stage of the present invention, the stage is levitated and supported without contact.
Arbitrary positioning is possible in the X and Y directions. Therefore, it is possible to realize an XY stage with high accuracy and excellent high-speed response, thereby improving the throughput of equipment requiring fine positioning, such as a semiconductor manufacturing apparatus or an inspection equipment.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施形態のXYステージの斜視図。FIG. 1 is a perspective view of an XY stage according to an embodiment of the present invention.

【図2】図1に示すXYステージの立面図。FIG. 2 is an elevation view of the XY stage shown in FIG. 1;

【図3】磁気浮上制御系のブロック図。FIG. 3 is a block diagram of a magnetic levitation control system.

【図4】固定基台を示す図であり、(a)は平面図、
(b)は(a)のA−A’断面図。
FIG. 4 is a view showing a fixed base, (a) is a plan view,
(B) is AA 'sectional drawing of (a).

【図5】ステージの移動制御を示す説明図。FIG. 5 is an explanatory diagram showing stage movement control.

【図6】リニアモータによるステージの位置制御系のブ
ロック図。
FIG. 6 is a block diagram of a stage position control system using a linear motor.

【図7】ステージの運動方向を示す図。FIG. 7 is a diagram showing a direction of movement of a stage.

【符号の説明】[Explanation of symbols]

11 ステージ 11a 上板 11b 下板(磁性材プレート) 11c 支柱 12 搭載物 13 固定基台 14 浮上用電磁石 15a リニアモータ固定子(1次側) 15b リニアモータ可動子(2次側) Reference Signs List 11 Stage 11a Upper plate 11b Lower plate (magnetic material plate) 11c Column 12 Mount 13 Fixed base 14 Electromagnet for floating 15a Linear motor stator (primary side) 15b Linear motor mover (secondary side)

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 搭載物を載置する上板と、下板と、該上
板及び下板の四隅を結合した支柱とからなるステージ
と、 前記ステージの下板に対面する磁極面を有して、前記ス
テージを浮上支持する浮上用電磁石と、前記上板の下面
に設けられたリニアモータの可動子に対面して前記ステ
ージをXY方向に非接触で位置決めするリニアモータ固
定子とを備えたことを特徴とするXYステージ。
1. A stage comprising an upper plate on which a load is placed, a lower plate, and a column connecting four corners of the upper plate and the lower plate, and a magnetic pole surface facing the lower plate of the stage. A floating electromagnet that levitates and supports the stage, and a linear motor stator that faces the mover of the linear motor provided on the lower surface of the upper plate and positions the stage in the XY directions in a non-contact manner. An XY stage characterized by the following.
【請求項2】 前記ステージ下板と浮上用電磁石との相
対変位を検出する変位センサと、該変位センサの信号に
基づいて浮上用電磁石の磁力を制御する制御回路とを備
えたことを特徴とする請求項1記載のXYステージ。
2. The apparatus according to claim 1, further comprising: a displacement sensor for detecting a relative displacement between the stage lower plate and the levitation electromagnet; and a control circuit for controlling a magnetic force of the levitation electromagnet based on a signal from the displacement sensor. The XY stage according to claim 1, wherein
【請求項3】 前記ステージのXY方向位置を検出する
位置センサと、該位置センサの信号に基づいて、前記リ
ニアモータを駆動して前記ステージを位置決めする制御
回路とを備えたことを特徴とする請求項1記載のXYス
テージ。
3. A position sensor for detecting a position of the stage in the X and Y directions, and a control circuit for driving the linear motor and positioning the stage based on a signal from the position sensor. The XY stage according to claim 1.
【請求項4】 前記浮上用電磁石と、リニアモータとは
それぞれが隔壁によって密閉されていることを特徴とす
る請求項1記載のXYステージ。
4. The XY stage according to claim 1, wherein each of the levitating electromagnet and the linear motor is sealed by a partition.
JP36461497A 1997-12-18 1997-12-18 XY stage Expired - Fee Related JP3553350B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP36461497A JP3553350B2 (en) 1997-12-18 1997-12-18 XY stage

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP36461497A JP3553350B2 (en) 1997-12-18 1997-12-18 XY stage

Publications (2)

Publication Number Publication Date
JPH11186156A true JPH11186156A (en) 1999-07-09
JP3553350B2 JP3553350B2 (en) 2004-08-11

Family

ID=18482248

Family Applications (1)

Application Number Title Priority Date Filing Date
JP36461497A Expired - Fee Related JP3553350B2 (en) 1997-12-18 1997-12-18 XY stage

Country Status (1)

Country Link
JP (1) JP3553350B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005079368A (en) * 2003-09-01 2005-03-24 Nikon Corp Magnetic levitating stage system and exposure device
JP2006287033A (en) * 2005-04-01 2006-10-19 Yaskawa Electric Corp Stage device and its exposure device
CN113767464A (en) * 2019-06-17 2021-12-07 应用材料公司 Magnetic levitation system and method for levitating a carrier
WO2022264287A1 (en) * 2021-06-15 2022-12-22 株式会社日立ハイテク Stage device, charged particle beam device, and vacuum device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005079368A (en) * 2003-09-01 2005-03-24 Nikon Corp Magnetic levitating stage system and exposure device
JP4590846B2 (en) * 2003-09-01 2010-12-01 株式会社ニコン Magnetic levitation stage apparatus and exposure apparatus
JP2006287033A (en) * 2005-04-01 2006-10-19 Yaskawa Electric Corp Stage device and its exposure device
JP4699071B2 (en) * 2005-04-01 2011-06-08 株式会社安川電機 Stage apparatus and exposure apparatus therefor
CN113767464A (en) * 2019-06-17 2021-12-07 应用材料公司 Magnetic levitation system and method for levitating a carrier
WO2022264287A1 (en) * 2021-06-15 2022-12-22 株式会社日立ハイテク Stage device, charged particle beam device, and vacuum device

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