JPH1117056A - Semiconductor chip mounting board - Google Patents

Semiconductor chip mounting board

Info

Publication number
JPH1117056A
JPH1117056A JP16933997A JP16933997A JPH1117056A JP H1117056 A JPH1117056 A JP H1117056A JP 16933997 A JP16933997 A JP 16933997A JP 16933997 A JP16933997 A JP 16933997A JP H1117056 A JPH1117056 A JP H1117056A
Authority
JP
Japan
Prior art keywords
semiconductor chip
chip mounting
mounting substrate
resin
connection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16933997A
Other languages
Japanese (ja)
Other versions
JP4058773B2 (en
Inventor
Naoyuki Urasaki
直之 浦崎
Yasushi Shimada
靖 島田
義之 ▲つる▼
Yoshiyuki Tsuru
Akishi Nakaso
昭士 中祖
Itsuo Watanabe
伊津夫 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP16933997A priority Critical patent/JP4058773B2/en
Priority to PCT/JP1998/002872 priority patent/WO1999000842A1/en
Priority to DE69835747T priority patent/DE69835747T2/en
Priority to EP98929711A priority patent/EP0993039B1/en
Priority to US09/446,674 priority patent/US6281450B1/en
Publication of JPH1117056A publication Critical patent/JPH1117056A/en
Application granted granted Critical
Publication of JP4058773B2 publication Critical patent/JP4058773B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector

Landscapes

  • Wire Bonding (AREA)

Abstract

PROBLEM TO BE SOLVED: To improve connection reliability by providing a connecting terminal and wiring conductor for connecting with the bumps of a semiconductor chip on the surface of the board and not arranging the wiring conductor on the outline of the semiconductor chip to be mounted later. SOLUTION: A wiring conductor 12 formed on the surface of a semiconductor chip mounting board 8 is not formed under the outline 1 of a semiconductor chip 3, and the opening 2 of solder resist 6 is formed larger than the outline 1 of the semiconductor chip 3. Then, a bump 4 is formed on the terminal electrode of the semiconductor chip 3, and an anisotropical conductive adhesive 9 is arranged between the semiconductor chip 3 and the semiconductor chip mounting board 8. The semiconductor chip 3 is faced down to be aligned with a connecting terminal 5 and is mounted on the semiconductor chip mounting board 8. Then, heat and pressure are applied to the workpiece, and the bump 4 and the connecting terminal 5 are electrically connected via the anisotropical conductive adhesive 9.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半導体チップ搭載
用基板に関する。
The present invention relates to a substrate for mounting a semiconductor chip.

【0002】[0002]

【従来の技術】近年、電子機器の発達にともない、電子
機器の高性能化はもとより、配線板と電子部品とからな
る回路板の小型化、軽量化の要求はますます厳しくなっ
ている。これまで、スルーホールを設けた配線板にDI
PパッケージやPGAパッケージなどを実装していた方
式から表面に接続用の回路を設けた配線板にQFPパッ
ケージやBGAパッケージなどを実装する方式に進化し
てきた。これは、後者の方が、配線板のデッドスペース
が小さくなり、高密度実装が可能なこと、パッケージ自
身が小型化、高性能化しやすいことによる。しかし、電
子機器の発達は留まることを知らず、電子機器の高性能
化と回路板の小型化、軽量化の両立は今でも大きな課題
となっている。
2. Description of the Related Art In recent years, with the development of electronic equipment, demands for not only higher performance of electronic equipment but also reduction in size and weight of a circuit board including a wiring board and electronic components have become more severe. Until now, wiring boards with through holes
It has evolved from a method of mounting a P package or a PGA package to a method of mounting a QFP package, a BGA package, or the like on a wiring board provided with a connection circuit on the surface. This is because, in the latter case, the dead space of the wiring board is reduced, high-density mounting is possible, and the package itself is easily reduced in size and performance. However, the development of electronic equipment is unavoidable, and it is still a major challenge to achieve both high performance of electronic equipment and reduction in size and weight of circuit boards.

【0003】その解決方法の一つとして、半導体チップ
をパッケージングせずに、直接配線板に搭載する方法が
注目を浴びている。この方法は半導体チップと配線板の
接合の仕方によって大きく2つに分かれる。一つはこれ
までパッケージングの技術で汎用的に用いられてきたワ
イヤボンディングを用いる方法、もう一つはバンプ接続
を用いる方法である。後者は一般的にフリップチップ接
続と呼ばれ、エリアアレイ状に電極を形成できるので多
ピン化が容易なこと、信号パス経路が短く電気特性が良
好なことから、今後の普及の拡大が見込まれている。
As one of the solutions, a method of mounting a semiconductor chip directly on a wiring board without packaging has attracted attention. This method is roughly divided into two depending on the way of bonding the semiconductor chip and the wiring board. One is a method using wire bonding, which has been widely used in the packaging technology, and the other is a method using bump connection. The latter is generally called flip-chip connection, and because electrodes can be formed in an area array, it is easy to increase the number of pins, and the signal path is short and the electrical characteristics are good. ing.

【0004】一般的なフリップチップ接続方法は、半導
体チップの濡れ性を有する金属端子上に置かれたはんだ
バンプとその対の基板上に配置された濡れ性を有する金
属端子を利用し、リフローにより半導体チップと基板を
電気的に接続している。
A general flip-chip connection method uses a solder bump placed on a wettable metal terminal of a semiconductor chip and a pair of wettable metal terminals placed on a substrate, and performs reflow by a reflow process. The semiconductor chip and the substrate are electrically connected.

【0005】[0005]

【発明が解決しようとする課題】ところで、現在では、
このような半導体チップを搭載するための基板の、量産
性を改良する構造はいくつか提案されてはいるが、いず
れも、一長一短があり、量産性の高い構造が未確立であ
るという課題があった。
However, at present,
Although several structures for improving the mass productivity of such a substrate for mounting a semiconductor chip have been proposed, there is a problem that each has advantages and disadvantages and a structure having a high mass productivity has not been established. Was.

【0006】本発明は、接続の信頼性を改良した上で量
産性に優れた半導体チップ搭載用基板を提供することを
目的とする。
SUMMARY OF THE INVENTION An object of the present invention is to provide a semiconductor chip mounting substrate which has improved connection reliability and is excellent in mass productivity.

【0007】[0007]

【課題を解決するための手段】本発明の半導体チップ搭
載用基板は、端子を有する半導体チップを接着剤によっ
て搭載する半導体チップ搭載用基板であって、その表面
に、半導体チップのバンプと接続するための接続端子
と、配線導体とを有し、その配線導体が、後に搭載され
る半導体チップの外形線の箇所には配置されていないこ
とを特徴とする。
A semiconductor chip mounting substrate according to the present invention is a semiconductor chip mounting substrate on which a semiconductor chip having terminals is mounted with an adhesive, and the surface of which is connected to a bump of the semiconductor chip. And a wiring conductor, and the wiring conductor is not arranged at a position of an outline of a semiconductor chip to be mounted later.

【0008】また、本発明の半導体チップ搭載用基板
は、端子を有する半導体チップを接着剤によって搭載す
る半導体チップ搭載用基板であって、その表面には、半
導体チップのバンプと接続するための接続端子のみが設
けられ、その接続端子と、別の面あるいは基板端部に設
けられた導体とを接続するための配線導体とを有するこ
とを特徴とする。
A semiconductor chip mounting substrate according to the present invention is a semiconductor chip mounting substrate on which a semiconductor chip having terminals is mounted with an adhesive, and has a surface for connection with a bump of the semiconductor chip. Only a terminal is provided, and a wiring conductor for connecting the connection terminal to a conductor provided on another surface or an end of the substrate is provided.

【0009】このような半導体チップ搭載用基板に、接
続のためのスルーホールを設けることもでき、このスル
ーホールに、穴埋めの樹脂を充填することが、熱に対す
るスルーホール強度を高める上で好ましい。
[0009] Such a semiconductor chip mounting substrate may be provided with a through hole for connection, and it is preferable to fill the through hole with a resin for filling the hole in order to increase the strength of the through hole against heat.

【0010】[0010]

【発明の実施の形態】本発明の配線導体は、接続端子か
ら引き出された配線である場合もあり、そのほかの配線
である場合もあるが、この表面の配線導体が、半導体チ
ップの外形線の箇所に配置されていないことが必要であ
る。その配線導体が配置されていない部分は、半導体チ
ップの外形線から100μm以上離れていることが好ま
しく、100μm未満であると、搭載時に半導体チップ
の縁と配線がショートする可能性があり好ましくない。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The wiring conductor of the present invention may be a wiring drawn from a connection terminal or other wiring. It is necessary that it is not located at a place. It is preferable that the portion where the wiring conductor is not arranged is separated from the outline of the semiconductor chip by 100 μm or more.

【0011】このような配線板は、例えば、接続端子
と、その接続端子を支える絶縁層と、接続端子に接続さ
れた裏面の導体と、接続端子と裏面の導体を接続するス
ルーホールとからなり、その導体は、基板端面に形成し
た半割のスルーホールに接続されている配線板であるプ
ラスチックリードレスチップキャリア(以下、PLCC
という。)であってもよい。また、この基板端面に形成
された半割のスルーホールに代えて、基板裏面に形成さ
れた、接続端子の配列間隔よりも広い配列間隔を有する
パッドを有する配線板でもよく、このパッドにはんだボ
ールを搭載すれば、ボールグリッドアレイ(以下、BG
Aという。)として使用でき、はんだや金のバンプを形
成すれば、フリップチップとして使用することもでき
る。
Such a wiring board comprises, for example, a connection terminal, an insulating layer supporting the connection terminal, a conductor on the back surface connected to the connection terminal, and a through hole connecting the connection terminal and the conductor on the back surface. The conductor is a plastic leadless chip carrier (hereinafter, PLCC), which is a wiring board connected to a half through hole formed in the end face of the substrate.
That. ). Further, instead of the half through hole formed on the end face of the board, a wiring board having pads formed on the back face of the board and having an arrangement interval wider than the arrangement interval of the connection terminals may be used. Is equipped with a ball grid array (hereinafter referred to as BG
A. ), And can be used as a flip chip if solder or gold bumps are formed.

【0012】また、接続端子と、その接続端子を支える
絶縁層と、接続端子に接続された内層導体と、接続端子
と内層導体を接続するバイアホールとからなり、その内
層導体は、基板端面に形成した半割のスルーホールに接
続されているようなPLCCにも使用できる。接続端子
と、その接続端子を支える絶縁層と、接続端子に接続さ
れた内層導体と、接続端子と内層導体を接続するバイア
ホールとからなり、その内層導体は、バイアホールによ
って、接続端子と同じ面に設けた配線導体に接続されて
いる配線板であってもよい。また、スルーホールに接続
された配線板であってもよい。そして、このスルーホー
ルに接続用のピンを挿入してはんだなどで固定すれば、
ピングリッドアレイ(以下、PGAという。)として使
用することもできる。
[0012] Further, the semiconductor device includes a connection terminal, an insulating layer supporting the connection terminal, an inner conductor connected to the connection terminal, and a via hole connecting the connection terminal to the inner conductor. It can also be used for PLCCs that are connected to half of the formed through holes. A connection terminal, an insulating layer supporting the connection terminal, an inner conductor connected to the connection terminal, and a via hole connecting the connection terminal and the inner conductor, the inner conductor being the same as the connection terminal by the via hole. It may be a wiring board connected to a wiring conductor provided on the surface. Further, a wiring board connected to a through hole may be used. And if you insert the connecting pin into this through hole and fix it with solder etc.,
It can also be used as a pin grid array (hereinafter, referred to as PGA).

【0013】さらには、多層配線板であって、上記のよ
うなPLCC、フリップチップ、BGA,PGAとして
も使用でき、これらの構造を組み合わせて用いることも
できる。
Furthermore, it is a multilayer wiring board, and can be used as PLCC, flip chip, BGA, and PGA as described above, and these structures can be used in combination.

【0014】前記の接続端子は、ガラス布で補強された
基板によって支持されていることが好ましく、また、そ
の接続端子が支持される基板は、ガラス布で補強された
基板にビルドアップ層を設けたものであり、接続端子は
直接にはそのビルドアップ層によって支持されているも
のであることが好ましい。このようなビルドアップ層と
しては、ガラス不織布で補強された絶縁層でもよく、ま
た、アラミド繊維で補強された絶縁層であってもよい。
Preferably, the connection terminals are supported by a substrate reinforced with glass cloth, and the substrate on which the connection terminals are supported is provided with a build-up layer on the substrate reinforced with glass cloth. It is preferable that the connection terminal is directly supported by the build-up layer. Such a build-up layer may be an insulating layer reinforced with a glass nonwoven fabric or an insulating layer reinforced with aramid fibers.

【0015】本発明の、半導体チップ搭載用基板と端子
を有する半導体チップとを接着する接着剤に用いる樹脂
組成物としては、エポキシ樹脂とイミダゾール系、ヒド
ラジド系、三フッ化ホウ素-アミン錯体、スルホニウム
塩、アミンイミド、ポリアミンの塩、ジシアンジアミド
等の潜在性硬化剤の混合物が用いられ、回路部材の熱膨
張係数差に基づくストレスを緩和するためには、接着後
の40℃での貯蔵弾性率が100〜1500MPaの接
着樹脂組成物が好ましい。
The resin composition used for the adhesive for bonding the semiconductor chip mounting substrate to the semiconductor chip having terminals according to the present invention includes epoxy resin and imidazole, hydrazide, boron trifluoride-amine complex, sulfonium A mixture of a latent curing agent such as a salt, an amine imide, a polyamine salt, and dicyandiamide is used. In order to alleviate the stress based on the difference in thermal expansion coefficient of the circuit member, the storage elastic modulus at 40 ° C. after bonding is 100%. An adhesive resin composition of up to 1500 MPa is preferred.

【0016】例えば、接続時の良好な流動性や高接続信
頼性を得られる接着剤の樹脂組成物として、エポキシ樹
脂とイミダゾール系、ヒドラジド系、三フッ化ホウ素-
アミン錯体、スルホニウム塩、アミンイミド、ポリアミ
ンの塩、ジシアンジアミド等の潜在性硬化剤の混合物
に、接着後の40℃での貯蔵弾性率が100〜1500
MPaになるようにアクリルゴムを配合した接着剤があ
げられる。これらの樹脂組成物を溶剤に溶解し、表面に
離型処理したフィルムやシートに塗布し、硬化剤の硬化
温度以下で加熱して、溶剤を蒸散させて得られた接着フ
ィルム硬化物の貯蔵弾性率は、例えば、レオロジ(株)
製レオスペクトラDVE−4(引っぱりモード、周波数
10Hz、5℃/minで昇温)を使用して測定でき
る。
For example, epoxy resin and imidazole-based, hydrazide-based, boron trifluoride-based resin compositions can be used as adhesive resin compositions to obtain good fluidity during connection and high connection reliability.
A mixture of a latent curing agent such as an amine complex, a sulfonium salt, an amine imide, a polyamine salt, and dicyandiamide has a storage elastic modulus at 40 ° C. of 100 to 1500 after adhesion.
An adhesive in which an acrylic rubber is blended so as to be in MPa may be used. These resin compositions are dissolved in a solvent, applied to a film or sheet whose surface has been release-treated, heated at a temperature lower than the curing temperature of the curing agent, and the storage elasticity of the cured adhesive film obtained by evaporating the solvent. The rate is, for example, Rheological Co., Ltd.
It can be measured using Rheospectra DVE-4 (pulling mode, frequency 10 Hz, temperature rise at 5 ° C./min).

【0017】接着剤に混合するアクリルゴムとしては、
アクリル酸、アクリル酸エステル、メタクリル酸エステ
ルまたはアクリロニトリルのうち少なくともひとつをモ
ノマー成分とした重合体または共重合体があげられ、中
でもグリシジルエーテル基を含有するグリシジルアクリ
レートやグリシジルメタクリレートを含む共重合体系ア
クリルゴムが好適に用いられる。これらアクリルゴムの
分子量は、接着剤の凝集力を高める点から20万以上が
好ましい。アクリルゴムの接着剤中の配合量は、15w
t%以下であると接着後の40℃での貯蔵弾性率が15
00MPaを越えてしまい、また40wt%以上になる
と低弾性率化は図れるが接続時の溶融粘度が高くなり接
続電極界面、または接続電極と導電粒子界面の溶融接着
剤の排除性が低下するため、接続電極間または接続電極
と導電粒子間の電気的導通を確保できなくなるため、ア
クリル配合量としては15〜40wt%が好ましい。
As acrylic rubber to be mixed with the adhesive,
Polymers or copolymers containing at least one of acrylic acid, acrylic acid ester, methacrylic acid ester and acrylonitrile as a monomer component, and among them, copolymer acrylic rubber containing glycidyl acrylate or glycidyl methacrylate containing a glycidyl ether group Is preferably used. The molecular weight of these acrylic rubbers is preferably 200,000 or more from the viewpoint of increasing the cohesive strength of the adhesive. The amount of acrylic rubber in the adhesive is 15w
If it is less than 10%, the storage elastic modulus at 40 ° C. after bonding is 15%.
If it exceeds 100 MPa, and if it exceeds 40 wt%, the elastic modulus can be reduced, but the melt viscosity at the time of connection increases, and the rejection of the molten adhesive at the interface of the connection electrode or the interface of the connection electrode and the conductive particles decreases, Since electrical conduction between the connection electrodes or between the connection electrodes and the conductive particles cannot be secured, the acrylic compounding amount is preferably 15 to 40 wt%.

【0018】また、接着剤にはフィルム形成性をより容
易にするためにフェノキシ樹脂などの熱可塑性樹脂を配
合することもできる。特に、フェノキシ樹脂は、エポキ
シ樹脂と構造が類似しているため、エポキシ樹脂との相
溶性、接着性に優れるなどの特徴を有するので好まし
い。
Further, a thermoplastic resin such as a phenoxy resin may be blended in the adhesive to make the film formability easier. In particular, the phenoxy resin is preferable because it has a similar structure to the epoxy resin, and has characteristics such as excellent compatibility with the epoxy resin and excellent adhesiveness.

【0019】このような接着剤をフィルム状に形成する
には、上記のエポキシ樹脂、アクリルゴム、フェノキシ
樹脂、潜在性硬化剤からなる接着組成物とを、有機溶剤
に溶解あるいは分散により液状化して、剥離性基材上に
塗布し、硬化剤の活性温度以下で溶剤を除去することに
より行われれる。この時用いる溶剤は、芳香族炭化水素
系と含酸素系の混合溶剤が材料の溶解性を向上させるた
め好ましい。
In order to form such an adhesive in the form of a film, an adhesive composition comprising the above epoxy resin, acrylic rubber, phenoxy resin, and a latent curing agent is liquefied by dissolving or dispersing in an organic solvent. This is performed by applying the composition on a peelable substrate and removing the solvent at a temperature lower than the activation temperature of the curing agent. As the solvent used at this time, a mixed solvent of an aromatic hydrocarbon type and an oxygen-containing type is preferable because the solubility of the material is improved.

【0020】この接着剤には、半導体チップのバンプや
回路電極の高さばらつきを吸収するために、異方導電性
を積極的に付与する目的で導電粒子を分散することもで
きる。このような導電粒子は、例えばAu、Ni、A
g、Cu、Wやはんだなどの金属粒子またはこれらの金
属粒子表面に金やパラジウムなどの薄膜をめっきや蒸着
によって形成した金属粒子であり、ポリスチレン等の高
分子の球状の核材にNi、Cu、Au、はんだ等の導電
層を設けた導電粒子を用いることができる。粒径は基板
の電極の最小の間隔よりも小さいことが必要で、電極の
高さにばらつきがある場合、そのばらつきよりも大きい
ことが好ましく、1μm〜10μmの範囲が好ましい。
また、接着剤に分散される導電粒子量は、0.1〜30
体積%であり、好ましくは0.1〜20体積%である。
このような異方導電性接着剤として、市販のものは、フ
リップタック(日立化成工業株式会社製、商品名)があ
る。
Conductive particles can be dispersed in the adhesive for the purpose of positively imparting anisotropic conductivity in order to absorb variations in height of bumps and circuit electrodes of the semiconductor chip. Such conductive particles include, for example, Au, Ni, A
g, Cu, W or metal particles such as solder or metal particles formed by plating or depositing a thin film of gold or palladium on the surface of these metal particles. Conductive particles provided with a conductive layer of Au, solder, or the like can be used. The particle size needs to be smaller than the minimum distance between the electrodes on the substrate, and if there is a variation in the height of the electrodes, it is preferably larger than the variation, and preferably in the range of 1 μm to 10 μm.
The amount of the conductive particles dispersed in the adhesive is 0.1 to 30.
%, Preferably 0.1 to 20% by volume.
As such an anisotropic conductive adhesive, a commercially available one is Flip Tack (trade name, manufactured by Hitachi Chemical Co., Ltd.).

【0021】また、スルーホルーを樹脂で充填するとき
に用いる樹脂は、ポリアミドイミド樹脂と熱硬化性成分
から成る、樹脂組成物であることが好ましい。このポリ
アミドイミド樹脂には、芳香族環を3個以上有するジア
ミンと無水トリメット酸とを反応させて得られる芳香族
ジイミドカルボン酸と、芳香族ジイソシアネートとを反
応させて得られる芳香族ポリアミドイミド樹脂、また
は、芳香族ジイミドカルボン酸として、2,2−ビス
〔4−{4−(5−ヒドロキシカルボニル−1,3−ジ
オン−イソインドリノ)フェノキシ}フェニル〕プロパ
ンと、芳香族ジイソシアネートとして、4,4’−ジフ
ェニルメタンジイソシアネートとを反応させて得られる
芳香族ポリアミドイミド樹脂を使用することが好まし
い。
The resin used for filling the through hole with a resin is preferably a resin composition comprising a polyamideimide resin and a thermosetting component. The polyamide-imide resin includes an aromatic polyamide-imide resin obtained by reacting an aromatic diimide carboxylic acid obtained by reacting a diamine having three or more aromatic rings with trimetic anhydride and an aromatic diisocyanate; Alternatively, 2,2-bis [4- {4- (5-hydroxycarbonyl-1,3-dione-isoindolino) phenoxy} phenyl] propane as an aromatic diimide carboxylic acid and 4,4 ′ as an aromatic diisocyanate -It is preferable to use an aromatic polyamide-imide resin obtained by reacting with diphenylmethane diisocyanate.

【0022】芳香族環を3個以上有するジアミンには、
2,2−ビス〔4−(4−アミノフェノキシ)フェニ
ル〕プロパン、ビス〔4−(3−アミノフェノキシ)フ
ェニル〕スルホン、ビス〔4−(4−アミノフェノキ
シ)フェニル〕スルホン、2,2−ビス〔4−(4−ア
ミノフェノキシ)フェニル〕ヘキサフルオロプロパン、
ビス〔4−(4−アミノフェノキシ)フェニル〕メタ
ン、4,4−ビス(4−アミノフェノキシ)ビフェニ
ル、ビス〔4−(4−アミノフェノキシ)フェニル〕エ
ーテル、ビス〔4−(4−アミノフェノキシ)フェニ
ル〕ケトン、1,3−ビス(4−アミノフェノキシ)ベ
ンゼン、1,4−ビス(4−アミノフェノキシ)ベンゼ
ン等を、単独でまたはこれらを組み合わせて用いること
ができる。
Diamines having three or more aromatic rings include:
2,2-bis [4- (4-aminophenoxy) phenyl] propane, bis [4- (3-aminophenoxy) phenyl] sulfone, bis [4- (4-aminophenoxy) phenyl] sulfone, 2,2- Bis [4- (4-aminophenoxy) phenyl] hexafluoropropane,
Bis [4- (4-aminophenoxy) phenyl] methane, 4,4-bis (4-aminophenoxy) biphenyl, bis [4- (4-aminophenoxy) phenyl] ether, bis [4- (4-aminophenoxy) )] Phenyl] ketone, 1,3-bis (4-aminophenoxy) benzene, 1,4-bis (4-aminophenoxy) benzene and the like can be used alone or in combination.

【0023】また芳香族ジイソシアネートには、4,
4’−ジフェニルメタンジイソシアネート、2,4−ト
リレンジイソシアネート、2,6−トリレンジイソシア
ネート、ナフタレン−1,5−ジイソシアネート、2,
4−トリレンダイマー等を、単独でまたは組み合わせて
用いることができる。
The aromatic diisocyanate includes 4,4
4′-diphenylmethane diisocyanate, 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, naphthalene-1,5-diisocyanate, 2,
4-Tolylene dimer or the like can be used alone or in combination.

【0024】また、熱硬化性成分は、エポキシ樹脂とそ
の硬化剤もしくは硬化促進剤であることが好ましく、エ
ポキシ樹脂は、グリシジル基を2つ以上有しているもの
であればどのようなものでもよく、グリシジル基が3つ
以上であればさらに好ましい。このエポキシ樹脂は、室
温で液状でも固形でもよい。市販のものとしては、液状
のエポキシ樹脂として、ビスフェノールA型の、YD1
28、YD8125(東都化成工業株式会社製、商品
名)等、Ep815、Ep828(油化シェルエポキシ
株式会社製、商品名)等、DER337(ダウケミカル
工業株式会社製、商品名)等、ビスフェノールF型の、
YDF170、YDF2004等(東都化成工業株式会
社製、商品名)等が挙げられる。また、固形のエポキシ
樹脂としては、YD907、YDCN704S、YDP
N172(いずれも東都化成工業株式会社製、商品名)
等、Ep1001、Ep1010、Ep180S70
(油化シェルエポキシ株式会社製、商品名)等、ESA
019、ESCN195(住友化学工業株式会社製、商
品名)等、DER667、DEN438(ダウケミカル
工業株式会社製、商品名)、EOCN1020(日本化
薬株式会社製、商品名)等が挙げられる。さらに、難燃
性を向上するためには、臭素化エポキシ樹脂を用いても
よく、例えば、市販のものとして、YDB400(東都
化成工業株式会社製、商品名)等、Ep5050(油化
シェルエポキシ株式会社製、商品名)等、ESB400
(住友化学工業株式会社製、商品名)等が挙げられる。
また、これらは、単独で用いてもよいが、必要に応じて
複数のエポキシ樹脂を選択してもよい。
The thermosetting component is preferably an epoxy resin and a curing agent or a curing accelerator thereof. The epoxy resin may be any one having at least two glycidyl groups. It is more preferable that the number of glycidyl groups is three or more. The epoxy resin may be liquid or solid at room temperature. Commercially available products include bisphenol A type YD1 as a liquid epoxy resin.
Bisphenol F type, such as 28, YD8125 (trade name, manufactured by Toto Kasei Kogyo Co., Ltd.), Ep815, Ep828 (trade name, manufactured by Yuka Shell Epoxy Co., Ltd.), DER337 (trade name, manufactured by Dow Chemical Industry Co., Ltd.) of,
YDF170 and YDF2004 (trade names, manufactured by Toto Kasei Kogyo Co., Ltd.) and the like. As solid epoxy resins, YD907, YDCN704S, YDP
N172 (all manufactured by Toto Kasei Kogyo Co., Ltd., trade name)
Etc., Ep1001, Ep1010, Ep180S70
(Product name made by Yuka Shell Epoxy Co., Ltd.)
019, ESCN195 (manufactured by Sumitomo Chemical Co., Ltd., trade name), DER667, DEN438 (manufactured by Dow Chemical Industry Co., Ltd., trade name), EOCN1020 (manufactured by Nippon Kayaku Co., Ltd., trade name) and the like. Further, in order to improve the flame retardancy, a brominated epoxy resin may be used. For example, commercially available products such as YDB400 (trade name, manufactured by Toto Kasei Kogyo Co., Ltd.) and Ep5050 (Yukaka Epoxy Co., Ltd.) ESB400, made by company, product name)
(Manufactured by Sumitomo Chemical Co., Ltd., trade name).
These may be used alone, but a plurality of epoxy resins may be selected as necessary.

【0025】エポキシ樹脂の硬化剤もしくは硬化促進剤
としては、アミン類、イミダゾール類、多官能フェノー
ル類、酸無水物、イソシアネート類等が使用できる。ア
ミン類としては、ジシアンジアミド、ジアミノジフェニ
ルメタン、グアニル尿素等があり、イミダゾール類とし
ては、アルキル置換イミダゾール、ベンズイミダゾール
等があり、多官能フェノール類としては、ヒドロキノ
ン、レゾルシノール、ビスフェノールAおよびそのハロ
ゲン化合物、さらに、これにアルデヒドとの縮合物であ
るノボラック、レゾール樹脂等があり、酸無水物として
は、無水フタル酸、ヘキサヒドロ無水フタル酸、ベンゾ
フェノンテトラカルボン酸等がある。イソシアネート類
としては、トリレンジイソシアネート、イソホロンジイ
ソシアネート等があり、このイソシアネートをフェノー
ル類等でマスクしたものを使用してもよい。
As the epoxy resin curing agent or curing accelerator, amines, imidazoles, polyfunctional phenols, acid anhydrides, isocyanates and the like can be used. Examples of amines include dicyandiamide, diaminodiphenylmethane, and guanylurea.Examples of imidazoles include alkyl-substituted imidazole and benzimidazole.Examples of polyfunctional phenols include hydroquinone, resorcinol, bisphenol A and halogen compounds thereof. These include novolaks and resole resins which are condensates with aldehydes, and the acid anhydrides include phthalic anhydride, hexahydrophthalic anhydride, benzophenonetetracarboxylic acid and the like. Examples of the isocyanates include tolylene diisocyanate, isophorone diisocyanate, and the like, and those obtained by masking this isocyanate with a phenol or the like may be used.

【0026】これらの硬化剤の必要な量は、アミン類の
場合は、アミンの活性水素の当量とエポキシ樹脂のエポ
キシ当量がほぼ等しくなる量が好ましい。例えば、1級
アミンの場合は、水素が2つあり、エポキシ樹脂1当量
に対してこの1級アミンは、0.5当量必要であり、2
級アミンの場合は、1当量必要である。次に、イミダゾ
ール類の場合は、単純に活性水素との当量比とならず、
経験的にエポキシ樹脂100重量部に対して、1〜10
重量部必要となる。多官能フェノール類や酸無水物の場
合、エポキシ樹脂1当量に対して、0.8〜1.2当量
必要である。イソシアネート類の場合は、ポリアミドイ
ミド樹脂とエポキシ樹脂のどちらにも反応するため、そ
れぞれの1当量に対して、0.8〜1.2当量必要であ
る。これらの硬化剤もしくは硬化促進剤は、単独で用い
てもよいが、必要に応じて複数の硬化剤もしくは硬化促
進剤を選択してもよい。
In the case of amines, the necessary amount of these curing agents is preferably such that the equivalent of the active hydrogen of the amine is substantially equal to the epoxy equivalent of the epoxy resin. For example, in the case of a primary amine, there are two hydrogens, and 0.5 equivalent of the primary amine is required for 1 equivalent of the epoxy resin.
In the case of a secondary amine, one equivalent is required. Next, in the case of imidazoles, the equivalence ratio with active hydrogen is not simply obtained,
Empirically, 1 to 10 parts by weight of epoxy resin
Parts by weight are required. In the case of polyfunctional phenols and acid anhydrides, 0.8 to 1.2 equivalents are required for 1 equivalent of the epoxy resin. In the case of isocyanates, it reacts with both the polyamideimide resin and the epoxy resin, so that 0.8 to 1.2 equivalents are required for 1 equivalent of each. These curing agents or curing accelerators may be used alone, but if necessary, a plurality of curing agents or curing accelerators may be selected.

【0027】また、ポリアミドイミド樹脂と熱硬化性成
分との重量比は、ポリアミドイミド樹脂100重量部に
対して、熱硬化性成分を、10〜150重量部の範囲で
あることが好ましく、10重量部未満であると、ガラス
転移点から350℃までの線膨張係数が大きく、300
℃での貯蔵弾性率が低いという、ポリアミドイミド樹脂
の特性がそのまま現れ、150重量部を超えると、相溶
性が低下し、攪拌時にゲル化する。
The weight ratio of the polyamide-imide resin to the thermosetting component is preferably in the range of 10 to 150 parts by weight, more preferably 10 to 150 parts by weight, based on 100 parts by weight of the polyamide-imide resin. Is less than 300 parts, the coefficient of linear expansion from the glass transition point to 350 ° C. is large,
The characteristic of the polyamide-imide resin that the storage elastic modulus at a temperature is low is manifest as it is, and when it exceeds 150 parts by weight, the compatibility is reduced and gelation occurs during stirring.

【0028】[0028]

【実施例】 実施例1 18μmの銅箔を両面に張り合わせた厚さ0.8mmの
両面銅張り積層板であるMCL−E-67(日立化成工業
株式会社製、商品名)に、スルーホール7となる穴をあ
け、無電解銅めっき液であるL−59めっき液(日立化
成工業株式会社製、商品名)に、液温70℃で8時間浸
漬し、15μmのめっき銅を析出させ、不要な銅を選択
的にエッチング除去して、スルーホール7に樹脂を充填
し、ソルダーレジスト6をシルクスクリーン印刷法によ
り形成して、スルーホールを有する半導体チップ搭載用
基板8を作成した。このときに、充填した樹脂は、次の
ようにして作製した。還流冷却器を連結したコック付き
25mlの水分定量受器、温度計、撹拌機を備えた1リ
ットルのセパラブルフラスコに、芳香族環を3個以上有
するジアミンとして、2,2−ビス−[4−(4−アミ
ノフェノキシ)フェニル]プロパン123.2g(0.
3mol)、無水トリメリット酸115.3g(0.6
mol)を、溶媒としてNMP(N−メチル−2−ピロ
リドン)716gを仕込み、80℃で30分撹拌した。
そして、水と共沸可能な芳香族炭化水素としてトルエン
143gを投入してから温度を上げ約160℃で2時間
還流させた。水分定量受器に水が約10.8ml以上溜
まっていること、水の留出が見られなくなっていること
を確認し、水分定量受器に溜まっている留出液を除去し
ながら約190℃まで温度を上げて、トルエンを除去し
た。その後、溶液を室温に戻し、芳香族ジイソシアネー
トとして4,4‘−ジフェニルメタンジイソシアネート
75.1g(0.3mol)を投入し、190℃で2時
間反応させた。反応終了後、芳香族ポリアミドイミド樹
脂のNMP溶液樹脂を得た。上記芳香族ポリアミドイミ
ド樹脂に、熱硬化性成分としてエポキシ樹脂とフェノー
ル樹脂を加え、常温で約1時間撹拌し、樹脂組成物とし
た。穴埋め後、電熱乾燥器で160℃で60分間硬化し
た後、# 600の研磨布を装着したベルトサンダー研
磨機T26MW型(菊川鉄工所製、商品名)で、基板表
面の余剰穴埋め樹脂を取り除いた。この半導体チップ搭
載用基板8は、図1(a)に示すように、ソルダーレジ
スト6の開口部2を、半導体チップの外形線1と同じか
あるいは半導体チップの外形線1よりも大きく形成した
ものであるそして、図1(b)に示すように、半導体チ
ップ3の端子電極に、めっきでバンプ4を形成し、さら
に、異方導電性接着剤9であるフリップタック(日立化
成工業株式会社製、商品名)を、半導体チップ搭載用基
板8と半導体チップ3との間に配置し、前記半導体チッ
プ3を下向きにして半導体チップ搭載用基板8上の接続
端子5に位置合わせを行い、半導体チップ搭載用基板8
上に半導体チップを載置した後、180℃、30g/バ
ンプ、20秒の条件でチップ上方から加熱、加圧するこ
とにより半導体チップ3のバンプ4と半導体チップ搭載
用基板8の接続端子5を、異方導電性接着剤9を介して
電気的に接続した。以上のようにして、半導体チップ3
と半導体チップ搭載用基板8を極めて簡便、安定的に、
かつ、汎用性のある方法で接続ができた。さらに、この
半導体チップ搭載用基板8のチップ搭載面に形成される
ソルダーレジスト6の形成不良は皆無であり、半導体チ
ップ3搭載後の接続信頼性は、良好であった。また、ス
ルーホールのはんだ耐熱性は、260℃の溶融はんだ
に、1分浮かべても、スルーホールボイドの発生や基材
樹脂との剥離が見られなかった。
Example 1 A through-hole 7 was formed on an MCL-E-67 (trade name, manufactured by Hitachi Chemical Co., Ltd.) which is a 0.8 mm-thick double-sided copper-clad laminate in which 18 μm copper foil was laminated on both sides. And immersed in an L-59 plating solution (trade name, manufactured by Hitachi Chemical Co., Ltd.), which is an electroless copper plating solution, at a solution temperature of 70 ° C. for 8 hours to deposit 15 μm plated copper, which is unnecessary. The copper was selectively removed by etching, the through-hole 7 was filled with a resin, and a solder resist 6 was formed by a silk-screen printing method to produce a semiconductor chip mounting substrate 8 having a through-hole. At this time, the filled resin was produced as follows. In a 1-liter separable flask equipped with a faucet equipped with a faucet connected to a reflux condenser, a thermometer and a stirrer, as a diamine having three or more aromatic rings, 2,2-bis- [4 -(4-aminophenoxy) phenyl] propane 123.2 g (0.
3mol), 115.3 g of trimellitic anhydride (0.6
mol) as a solvent, 716 g of NMP (N-methyl-2-pyrrolidone) was charged, and the mixture was stirred at 80 ° C for 30 minutes.
Then, 143 g of toluene was charged as an aromatic hydrocarbon azeotropic with water, and then the temperature was increased and the mixture was refluxed at about 160 ° C. for 2 hours. Confirm that water has accumulated in the water content determination receiver at least about 10.8 ml and that distilling of water has not been observed, and remove the distillate remaining in the water content determination device at about 190 ° C. The temperature was increased to remove the toluene. Thereafter, the solution was returned to room temperature, and 75.1 g (0.3 mol) of 4,4'-diphenylmethane diisocyanate was charged as an aromatic diisocyanate, and reacted at 190 ° C. for 2 hours. After completion of the reaction, an NMP solution resin of an aromatic polyamideimide resin was obtained. An epoxy resin and a phenol resin were added to the aromatic polyamideimide resin as thermosetting components, and the mixture was stirred at room temperature for about 1 hour to obtain a resin composition. After filling the holes, the mixture was cured at 160 ° C. for 60 minutes with an electric heat dryer, and then the excess filling resin on the substrate surface was removed with a belt sander polishing machine T26MW type (trade name, manufactured by Kikugawa Iron Works) equipped with a # 600 polishing cloth. . As shown in FIG. 1A, the semiconductor chip mounting substrate 8 has the opening 2 of the solder resist 6 formed to be the same as or larger than the outline 1 of the semiconductor chip. Then, as shown in FIG. 1B, bumps 4 are formed on the terminal electrodes of the semiconductor chip 3 by plating, and a flip-tack (an anisotropic conductive adhesive 9) (manufactured by Hitachi Chemical Co., Ltd.) (Trade name) is disposed between the semiconductor chip mounting substrate 8 and the semiconductor chip 3, the semiconductor chip 3 is turned downward, and the connection terminals 5 on the semiconductor chip mounting substrate 8 are aligned. Mounting substrate 8
After the semiconductor chip is mounted on the chip, the bumps 4 of the semiconductor chip 3 and the connection terminals 5 of the semiconductor chip mounting substrate 8 are heated and pressed from above the chip under the conditions of 180 ° C., 30 g / bump, and 20 seconds. They were electrically connected via an anisotropic conductive adhesive 9. As described above, the semiconductor chip 3
And the semiconductor chip mounting substrate 8 very simply and stably,
And the connection was made in a versatile way. Further, there was no defective formation of the solder resist 6 formed on the chip mounting surface of the semiconductor chip mounting substrate 8, and the connection reliability after mounting the semiconductor chip 3 was good. Regarding the solder heat resistance of the through hole, generation of through hole voids and peeling from the base resin were not observed even after floating for 1 minute in the 260 ° C. molten solder.

【0029】実施例2 実施例1と同様にして半導体チップ搭載用基板8を作製
し、図2(a)に示すように、ソルダーレジスト6の開
口部2を、半導体チップ3の外形線1よりも小さく形成
した。そして、図2(b)に示すように、半導体チップ
3の端子電極に、金ワイヤの先端をトーチ等により溶融
させ、金ボールを形成し、このボールを電極パッド上に
圧着した後、ワイヤを切断して得られるバンプ4を設
け、さらに、異方導電性接着剤9であるフリップタック
(日立化成工業株式会社製、商品名)を半導体チップ搭
載用基板8と半導体チップ3の間に配置し、前記半導体
チップ3を下向きにして半導体チップ搭載用基板8上の
接続端子5に位置合わせを行い、半導体チップ搭載用基
板8上に半導体チップ3を載置した後、180℃、30
g/バンプ、20秒の条件でチップ上方から加熱、加圧
することにより半導体チップ3のバンプ4と半導体チッ
プ搭載用基板8の接続端子5を,導電性接着剤9を介し
て電気的に接続した以上のようにして、半導体チップ3
と半導体チップ搭載用基板8を極めて簡便、安定的に、
かつ、汎用性のある方法で接続ができた。さらに,半導
体チップ搭載用基板8のチップ搭載面に形成されるソル
ダーレジスト6の形成不良は皆無であり、半導体チップ
搭載後の接続信頼性は、良好であった。また、スルーホ
ールのはんだ耐熱性は、260℃の溶融はんだに、1分
浮かべても、スルーホールボイドの発生や基材樹脂との
剥離が見られなかった。
Example 2 A semiconductor chip mounting substrate 8 was prepared in the same manner as in Example 1, and the opening 2 of the solder resist 6 was cut out from the outline 1 of the semiconductor chip 3 as shown in FIG. Also formed smaller. Then, as shown in FIG. 2 (b), the tip of the gold wire is melted with a torch or the like on the terminal electrode of the semiconductor chip 3 to form a gold ball, and the ball is pressed on the electrode pad. A bump 4 obtained by cutting is provided, and a flip-tack (trade name, manufactured by Hitachi Chemical Co., Ltd.) as an anisotropic conductive adhesive 9 is arranged between the semiconductor chip mounting substrate 8 and the semiconductor chip 3. After the semiconductor chip 3 is oriented downward and the connection terminals 5 on the semiconductor chip mounting substrate 8 are aligned, and the semiconductor chip 3 is mounted on the semiconductor chip mounting substrate 8, the semiconductor chip 3 is placed at 180 ° C., 30 ° C.
The bumps 4 of the semiconductor chip 3 and the connection terminals 5 of the semiconductor chip mounting substrate 8 were electrically connected via the conductive adhesive 9 by heating and pressing from above the chip under the conditions of g / bump for 20 seconds. As described above, the semiconductor chip 3
And the semiconductor chip mounting substrate 8 very simply and stably,
And the connection was made in a versatile way. Further, there was no defective formation of the solder resist 6 formed on the chip mounting surface of the semiconductor chip mounting substrate 8, and the connection reliability after mounting the semiconductor chip was good. Regarding the solder heat resistance of the through hole, generation of through hole voids and peeling from the base resin were not observed even after floating for 1 minute in the 260 ° C. molten solder.

【0030】実施例3 実施例1と同様にして半導体チップ搭載用基板8を作製
し、図3(a)に示すように、半導体チップ搭載用基板
8の表面に形成した配線導体12は、チップの外形線1
の下には形成せず、ソルダーレジスト6の開口部2は、
半導体チップ3の外形線1よりも100μm大きく形成
した。そして、図3(b)に示すように、半導体チップ
3の端子電極に、めっきでバンプ4を形成し、さらに、
異方導電性接着剤9としてフリップタック(日立化成工
業株式会社製、商品名)を、半導体チップ搭載用基板8
と半導体チップ3の間に配置し、前記半導体チップ3を
下向きにして半導体チップ搭載用基板8上の接続端子5
に位置合わせを行い、半導体チップ搭載用基板8上に半
導体チップ3を載置した後、180℃、30g/バン
プ、20秒の条件でチップ上方から加熱、加圧すること
により半導体チップ3のバンプ4と半導体チップ実装用
基板8の接続端子5を、異方導電性接着剤9を介して電
気的に接続した。以上のようにして、半導体チップ3と
半導体チップ搭載用基板8を極めて簡便、安定的に、か
つ、汎用性のある方法で接続ができた。さらに、この半
導体チップ実装用基板8のチップ搭載面に形成されるソ
ルダーレジスト6の形成不良は皆無であり、半導体チッ
プ搭載後の接続信頼性は、良好であった。また、スルー
ホールのはんだ耐熱性は、260℃の溶融はんだに、1
分浮かべても、スルーホールボイドの発生や基材樹脂と
の剥離が見られなかった。
Example 3 A semiconductor chip mounting substrate 8 was prepared in the same manner as in Example 1, and as shown in FIG. 3A, a wiring conductor 12 formed on the surface of the semiconductor chip mounting substrate 8 was Outline 1
Below, the opening 2 of the solder resist 6 is
It was formed 100 μm larger than the outline 1 of the semiconductor chip 3. Then, as shown in FIG. 3B, bumps 4 are formed on the terminal electrodes of the semiconductor chip 3 by plating.
A flip-tack (trade name, manufactured by Hitachi Chemical Co., Ltd.) is used as the anisotropic conductive adhesive 9 and the semiconductor chip mounting substrate 8 is used.
Connection terminals 5 on the semiconductor chip mounting substrate 8 with the semiconductor chip 3 facing downward.
After the semiconductor chip 3 is mounted on the semiconductor chip mounting substrate 8, the bumps 4 of the semiconductor chip 3 are heated and pressed from above the chip under the conditions of 180 ° C., 30 g / bump, and 20 seconds. And the connection terminals 5 of the semiconductor chip mounting substrate 8 were electrically connected via an anisotropic conductive adhesive 9. As described above, the semiconductor chip 3 and the substrate 8 for mounting a semiconductor chip could be connected in a very simple, stable and versatile manner. Further, there was no defective formation of the solder resist 6 formed on the chip mounting surface of the semiconductor chip mounting substrate 8, and the connection reliability after mounting the semiconductor chip was good. In addition, the solder heat resistance of the through hole is 1
Even after separation, generation of through-hole voids and separation from the base resin were not observed.

【0031】[0031]

【発明の効果】以上に説明したように、本発明によっ
て、接続の信頼性を改良した上で量産性に優れた半導体
チップ搭載用基板を提供することができる。
As described above, according to the present invention, it is possible to provide a semiconductor chip mounting substrate which is improved in connection reliability and excellent in mass productivity.

【図面の簡単な説明】[Brief description of the drawings]

【図1】(a)は本発明の一実施例の要部を示す上面図
であり、(b)は本発明の一実施例の断面図である。
FIG. 1A is a top view illustrating a main part of an embodiment of the present invention, and FIG. 1B is a cross-sectional view of the embodiment of the present invention.

【図2】(a)は本発明の他の実施例の要部を示す上面
図であり、(b)は本発明の他の実施例の断面図であ
る。
FIG. 2A is a top view showing a main part of another embodiment of the present invention, and FIG. 2B is a cross-sectional view of another embodiment of the present invention.

【図3】(a)は本発明の更に他の実施例の要部を示す
上面図であり、(b)は本発明の更に他の実施例を示す
断面図である。
FIG. 3A is a top view showing a main part of still another embodiment of the present invention, and FIG. 3B is a cross-sectional view showing still another embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1.外形線 2.開口部 3.半導体チップ 4.バンプ 5.接続端子 6.ソルダ
ーレジスト 7.スルーホール 8.半導体
チップ搭載用基板 9.異方導電性接着剤 12.配線
導体
1. Outline line 2. Opening 3. Semiconductor chip 4. Bump 5. Connection terminal 6. 6. Solder resist 7. Through hole 8. Substrate for mounting semiconductor chip Anisotropic conductive adhesive 12. Wiring conductor

───────────────────────────────────────────────────── フロントページの続き (72)発明者 中祖 昭士 茨城県下館市大字小川1500番地 日立化成 工業株式会社下館研究所内 (72)発明者 渡辺 伊津夫 茨城県つくば市和台48 日立化成工業株式 会社筑波開発研究所内 ──────────────────────────────────────────────────の Continued on the front page (72) Inventor: Shoji Nakaso 1500 Ogawa, Shimodate-shi, Ibaraki Pref.Hitachi Kasei Kogyo Co., Ltd. Tsukuba Development Laboratory

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】端子を有する半導体チップを接着剤によっ
て搭載する半導体チップ搭載用基板であって、その表面
に、半導体チップのバンプと接続するための接続端子
と、配線導体とを有し、その配線導体が、後に搭載され
る半導体チップの外形線の箇所には配置されていないこ
とを特徴とする半導体チップ搭載用基板。
1. A semiconductor chip mounting substrate on which a semiconductor chip having terminals is mounted with an adhesive, having a connection terminal for connecting to a bump of the semiconductor chip and a wiring conductor on a surface thereof. A semiconductor chip mounting substrate, wherein a wiring conductor is not arranged at a position of an outline of a semiconductor chip to be mounted later.
【請求項2】端子を有する半導体チップを接着剤によっ
て搭載する半導体チップ搭載用基板であって、その表面
には、半導体チップのバンプと接続するための接続端子
のみが設けられ、その接続端子と、別の面あるいは基板
端部に設けられた導体とを接続するための配線導体とを
有することを特徴とする半導体チップ搭載用基板。
2. A semiconductor chip mounting substrate on which a semiconductor chip having terminals is mounted by means of an adhesive, the surface of which is provided with only connection terminals for connection with bumps of the semiconductor chip. A wiring conductor for connecting to a conductor provided on another surface or an end of the substrate.
【請求項3】めっきしたスルホールを有し、そのスルー
ホールが穴埋め樹脂によって充填されたものであること
を特徴とする請求項1または2に記載の半導体チップ搭
載用基板。
3. The semiconductor chip mounting substrate according to claim 1, wherein the substrate has a plated through hole, and the through hole is filled with a filling resin.
JP16933997A 1997-06-26 1997-06-26 Semiconductor chip mounting substrate Expired - Fee Related JP4058773B2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP16933997A JP4058773B2 (en) 1997-06-26 1997-06-26 Semiconductor chip mounting substrate
PCT/JP1998/002872 WO1999000842A1 (en) 1997-06-26 1998-06-26 Substrate for mounting semiconductor chips
DE69835747T DE69835747T2 (en) 1997-06-26 1998-06-26 SUBSTRATE FOR MOUNTING SEMICONDUCTOR CHIPS
EP98929711A EP0993039B1 (en) 1997-06-26 1998-06-26 Substrate for mounting semiconductor chips
US09/446,674 US6281450B1 (en) 1997-06-26 1998-06-26 Substrate for mounting semiconductor chips

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16933997A JP4058773B2 (en) 1997-06-26 1997-06-26 Semiconductor chip mounting substrate

Publications (2)

Publication Number Publication Date
JPH1117056A true JPH1117056A (en) 1999-01-22
JP4058773B2 JP4058773B2 (en) 2008-03-12

Family

ID=15884734

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16933997A Expired - Fee Related JP4058773B2 (en) 1997-06-26 1997-06-26 Semiconductor chip mounting substrate

Country Status (1)

Country Link
JP (1) JP4058773B2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7000312B2 (en) 2001-12-05 2006-02-21 Murata Manufacturing Co., Ltd. Circuit board device and mounting method therefor
US7285727B2 (en) 2000-08-10 2007-10-23 Sony Corporation Flexible wiring boards for double-side connection
US7327042B2 (en) * 2002-12-05 2008-02-05 Tohoku Pioneer Corporation Interconnection structure of electric conductive wirings
JP2010027961A (en) * 2008-07-23 2010-02-04 Renesas Technology Corp Semiconductor device and method for manufacturing the same

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6307936B2 (en) 2014-02-28 2018-04-11 オムロン株式会社 Flexible printed circuit board, surface light source device, display device, and electronic device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7285727B2 (en) 2000-08-10 2007-10-23 Sony Corporation Flexible wiring boards for double-side connection
US7000312B2 (en) 2001-12-05 2006-02-21 Murata Manufacturing Co., Ltd. Circuit board device and mounting method therefor
US7327042B2 (en) * 2002-12-05 2008-02-05 Tohoku Pioneer Corporation Interconnection structure of electric conductive wirings
JP2010027961A (en) * 2008-07-23 2010-02-04 Renesas Technology Corp Semiconductor device and method for manufacturing the same

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