JPH11167350A - Front surface filter for plasma display panel and its production - Google Patents

Abstract

PROBLEM TO BE SOLVED: To make it possible to efficiently and cost effectively produce a front surface filter and to produce the filter having excellent near IR cut performance, electromagnetic wave shield performance, flaw prevention and antireflection by bonding a transparent laminated film formed by providing the surface of a transparent resin film with an electromagnetic wave shield layer, near IR shield layer and adhesive layer and a transparent resin substrate to each other and providing both surfaces thereof with antireflection layers. SOLUTION: This front surface filter is constituted by disposing the antireflection layers on both surfaces of the substrate obtd. by bonding the transparent laminated film formed by providing the surface of the transparent resin film with the electromagnetic wave shield layer, the near IR shield layer and the adhesive layer and the transparent resin substrate to each other. The process for production is executed firstly by depositing a conductive material by evaporation on the transparent resin film. The conductive material is deposited by evaporation for the purpose of shielding electromagnetic waves, for which a metal or metal oxide or the like is used. The near IR shield layer is obtd. by coating of a near IR absorbent coating liquid prepd. by dispersing or dissolving, for example, the near IR absorbent into an or. solvent and adding a binder resin thereto.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a front filter for a plasma display panel (hereinafter, referred to as a PDP) which has a near-infrared cut-off performance, an electromagnetic wave shielding performance, an anti-scratch performance, and an anti-reflection performance required for a PDP. And its manufacturing method.

[0002]

2. Description of the Related Art In a PDP, a phosphor applied in a tube is excited by ultraviolet rays generated by exciting discharge of xenon gas molecules sealed in the tube to emit light in a visible light region. But, when the discharge excitation of xenon gas molecules,
Near-infrared rays are generated together with the ultraviolet rays, and a part thereof is emitted outside the tube. Since the wavelength of the near-infrared ray is close to the near-infrared ray wavelength range used in a remote control device or optical communication, there is a possibility that these devices and devices may malfunction.

Further, an electromagnetic wave is generated along with the driving of the PDP and slightly leaks to the outside, which may adversely affect a human body and peripheral devices. Further, since the display surface of the PDP is a flat surface, light due to the reflection of external light enters the eyes simultaneously with the color light emitted from the PDP, and the screen may be difficult to see. For the above reasons, there is a demand for a front filter for a PDP having a function of preventing emission of near infrared rays, prevention of leakage of electromagnetic waves, and prevention of surface reflection of external light on the front surface of the PDP. However, in the case of a conventional front filter for a PDP, for example, in order to provide near-infrared cut performance, a resin obtained by melt-kneading a near-infrared absorbent into a resin and then extruding the resin is used. In order to provide a high mesh, a synthetic resin mesh woven fabric plated with a metal having high conductivity is used, and the manufacturing process is generally large and complicated.

[0004]

SUMMARY OF THE INVENTION Accordingly, the present invention provides an efficient and economical production method and excellent near-infrared cut performance.
Provided is a front filter for a PDP having electromagnetic wave shielding performance, anti-scratch performance, and anti-reflection performance.

[0005]

Means for Solving the Problems The present invention is obtained by laminating a transparent laminated film having an electromagnetic wave shielding layer, a near infrared ray shielding layer and an adhesive layer on a transparent resin film, and a transparent resin substrate. The present invention relates to a front filter for a plasma display panel having antireflection layers provided on both sides of a substrate and a method for manufacturing the same.

[0006]

DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail.
As a first method of manufacturing the front filter for a PDP of the present invention, a conductive substance is deposited on a transparent resin film. The transparent resin film is not particularly limited as long as it is substantially transparent and does not have large absorption and scattering. Specific examples of the resin used for the transparent resin film include polyolefin resin, polyester resin,
Polycarbonate resin, poly (meth) acrylate resin, polystyrene, polyvinyl chloride, polyvinyl acetate, polyarylate resin, polyether sulfone resin and the like can be mentioned. Among these, amorphous polyolefin resin, polyester resin, polycarbonate resin, poly (meth) acrylate resin, polyarylate resin, and polyether sulfone resin are particularly preferable. In particular, a cyclic polyolefin is particularly preferable, and among polyester resins, polyethylene terephthalate is particularly preferable.

[0007] The resin is generally known additives such as antioxidants such as phenols and phosphorus, flame retardants such as halogen and phosphoric acid, heat aging inhibitors, ultraviolet absorbers, lubricants, An antistatic agent or the like can be blended. The transparent resin film is formed by a known method such as T-die molding, calender molding, or compression molding, or a method of dissolving in an organic solvent and casting. The thickness of the film is 10 μm to 1 m depending on the purpose.
The range of m is desirable. The transparent resin film may be unstretched or stretched. Further, it may be laminated with another plastic substrate.

Further, the transparent resin film may be subjected to a surface treatment by a conventionally known method such as a corona discharge treatment, a flame treatment, a plasma treatment, a glow discharge treatment, a surface roughening treatment, a chemical treatment, and the like.
A coating such as a primer may be applied on one side or both sides. As the electromagnetic wave shielding layer, a method of bonding a mesh of conductive fibers is known, but this method has a problem that the visibility of the screen is deteriorated because the mesh is provided on the front surface of the display. The electromagnetic wave shielding layer of the present invention is obtained, for example, by depositing a conductive substance, and does not have a problem of deteriorating visibility.

The conductive material deposited on the transparent resin film is deposited for the purpose of shielding electromagnetic waves emitted from the PDP, and a metal or a metal oxide is used.
Any material may be used as long as it transmits 70% or more of the visible light region of 400 to 700 nm and has a surface resistivity of 50 Ω / □ or less. Preferably, a metal oxide such as tin oxide, indium tin oxide (hereinafter, referred to as ITO), antimony tin oxide (hereinafter, referred to as ATO), or a metal oxide and a metal are alternately stacked. Lamination of a metal oxide and a metal is more preferable because the surface resistivity can be reduced. Metal oxides include tin oxide, ITO, ATO
The metal is generally silver or a silver-palladium alloy, usually starting from a metal oxide layer and having 3 to 11
About layers are laminated.

As a method for depositing a conductive substance, a usual method such as a vacuum deposition method, an ion plating method, a sputtering method, a chemical vapor deposition method, and a plasma chemical vapor deposition method can be adopted. Preferably, a vacuum deposition method and a sputtering method are used. The degree of vacuum at the time of vapor deposition is 1 × 10 ⁻⁴ Torr or less when performing by vacuum vapor deposition, and 1
It is preferred to be less than × 10 ^-2 . When the sputtering is performed, an argon gas or a mixed gas of oxygen and argon is used as a sputtering gas. When depositing a conductive material, it is preferable to heat-treat the transparent resin film in order to reduce resistance. The conditions vary depending on the material of the transparent resin film to be used, but the upper limit is a temperature lower by 5 to 10 ° C. than the thermal deformation starting temperature.

The thickness of the conductive material varies depending on required physical properties, applications, etc.
Preferably, it is 50 to 300 nm. It is desirable that the thickness of each part of the film is uniform. Further, in order to improve the adhesion when the conductive substance is vapor-deposited on the transparent resin film, it is desirable that the surface to be vapor-deposited of the transparent resin film is previously coated with a base coat agent. As the base coating agent, thermosetting resin, ultraviolet curing resin,
An electron beam curable resin, a thermoplastic resin, or the like is used. Preferably, a thermosetting resin is used. Examples of thermosetting resins include phenolic resins, urea resins, diallyl phthalate resins, melamine resins, guanamine resins, unsaturated polyester resins, polyurethane resins, epoxy resins, aminoalkyd resins, melamine / urea cocondensation resins, silicon resins, A polysiloxane resin or the like is used, and a crosslinking agent, a curing agent such as a polymerization initiator, a polymerization accelerator, a solvent, a viscosity modifier and the like are added as necessary.

An ultraviolet absorber may be added to the base coat agent for the purpose of improving the light resistance of the near infrared absorber contained in the near infrared absorber coating liquid to be coated later. As the ultraviolet absorber used, salicylic acid ester type, benzophenone type, benzotriazole type,
Hydroxybenzoate type, cyanoacrylate type and the like can be mentioned. Also, a mixture of a reaction product obtained by reacting a compound having an ultraviolet absorbing property with an adhesive component such as an epoxy compound and at least one of an isocyanate or an amino resin as disclosed in JP-A-2-58571 may be used. Can be.

The base coating agent is coated on a transparent resin substrate by a known method such as gravure coating, reverse roll coating, and kiss roll coating. The layer thickness is usually 0.5 to 10 μm, and it is preferable that the layer has no thickness unevenness and good surface flatness. Secondly, a near-infrared shielding layer is provided on the conductive material deposited. In the present invention, the stacking order of the electromagnetic wave shielding layer and the near infrared ray shielding layer is arbitrary.
However, when the electromagnetic wave shielding layer is formed on the near-infrared ray blocking layer by vapor deposition as described above, the surface to be vapor-deposited at the time of vapor deposition is reduced in the near-infrared absorption capacity, or the electron content is relatively low. When the near-infrared absorbing agent is used, it is necessary to be careful because it may cause a problem such as deposition on the surface of the surface to be vapor-deposited under a vacuum at the time of vapor-deposition, and the like.

The near-infrared blocking layer can be obtained, for example, by coating a near-infrared absorbing agent coating solution. The near-infrared absorbing agent coating liquid is obtained by dispersing or dissolving a near-infrared absorbing agent in an organic solvent and adding a binder resin, or a near-infrared absorbing agent, for example, a monofunctional or polyfunctional acrylate such as polyurethane acrylate or epoxy acrylate. And a hard coating agent containing a photopolymerization initiator and an organic solvent; those added to an isocyanate-based, polyurethane-based, polyester-based, polyethyleneimine-based, polybutadiene-based or alkyl titanate-based anchor coating agent or adhesive, etc. Then, the coating liquid is coated on the electromagnetic wave shielding layer.

Examples of the near-infrared absorbing agent to be used include a nitroso compound which is an organic substance and a metal complex thereof, a cyanine compound, a squarylium compound, a thiol nickel complex compound, a phthalocyanine compound, a naphthalocyanine compound, and a triallylmethane compound. Compounds, immonium compounds, diimonium compounds, naphthoquinone compounds, anthraquinone compounds, or amino compounds, aminium salt compounds, or inorganic carbon black, indium tin oxide, antimony tin oxide,
Oxides of metals belonging to Groups 4A, 5A or 6A of the periodic table;
Alternatively, a carbide, a boride, or the like can be given. At least two of these are used. Further, at least one kind is preferably a near-infrared absorbing agent selected from an immonium-based compound, a diimonium-based compound, and an aminium salt-based compound. More preferably, at least one selected from the above-mentioned near-infrared absorbing agents other than the immonium-based compound, the diimonium-based compound and the aminium salt-based compound is used in combination. Examples of the immonium-based compound and the diimonium-based compound include compounds having a skeleton represented by Chemical Formulas 1 to 4.

[0016]

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[0017]

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[0018]

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[0019]

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As the aminium salt compound, there may be mentioned a compound represented by the following formula (5).

[0021]

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Specific examples of X in the formula include antimonate hexafluoride ion, perchlorate ion, fluoroborate ion, hexafluoroarsenate ion, periodate ion, trifluoroacetate ion, chloride ion What? The near-infrared absorbing agent coating liquid is prepared by mixing a near-infrared absorbing agent at a ratio of 0.1 to 60 parts by weight with respect to 100 parts by weight of a binder resin, a hard coating agent, an anchor coating agent or an adhesive, and an organic solvent, Is adjusted to a solid content concentration suitable for coating. The solid content concentration is preferably adjusted to a concentration of 5 to 50% by weight.

The near-infrared absorbing agent coating solution is a flow coat,
Coating is performed on the electromagnetic wave shielding layer by a known coating method such as spray coating, bar coating, gravure coating, roll coating, reverse coating, blade coating, kiss roll coating, spin coating, and air knife coating. Preferably, a gravure coat and a reverse coat are used. In the gravure coat, it is preferable to use a gravure roll of 180 mesh or more so that the pattern of the gravure roll does not remain. After coating, the solvent is dried. The condition is preferably 80 to 160 ° C.
If the drying temperature is too high, the deformation of the transparent resin substrate and the thermal decomposition of the near-infrared absorbing agent are not preferred.

When a coating liquid is prepared by adding a near-infrared absorbing agent to a hard coating agent, after coating and drying the solvent, a xenon lamp, a low-pressure mercury lamp, a high-pressure mercury lamp, an ultra-high-pressure mercury lamp, a metal halide lamp, a carbon arc lamp, and tungsten are used. Crosslink and cure using a lamp or the like. The coating thickness after drying is 0.3 to 50 μm, preferably 0.5 to 10 μm. It is desirable that the thickness be uniform. Third, an adhesive is coated on the near-infrared shielding layer. As the adhesive, isocyanate-based, polyurethane-based, polyester-based, polyethyleneimine-based, polybutadiene-based, alkyl titanate-based adhesives,
An adhesive is used. The adhesive may be a known coating method such as flow coating, spray coating, bar coating, gravure coating, roll coating, reverse coating, blade coating, kiss roll coating, spin coating and air knife coating, or after coating on release paper. Coating is performed by bonding and transferring to the coating surface of the near infrared absorbing agent coating liquid. At this time, the coating thickness is 0.5 to 40 μm.

The adhesive may be used by adding an ultraviolet absorber in order to improve the light resistance of the near infrared absorber. As the ultraviolet absorber to be added, salicylic acid ester type,
Reaction products obtained by reacting a benzophenone-based compound, a benzotriazole-based compound, a hydroxybenzoate-based compound, a cyanoacrylate-based compound, or a compound having an ultraviolet absorbing property with an adhesive component such as an epoxy compound, as described in JP-A-2-58571. And at least one mixture of isocyanate and amino resin. The amount of the ultraviolet absorber added is 0.3 to 30% by weight, preferably 0.3 to 10% by weight.

Fourth, the adhesive surface and the transparent resin substrate are bonded. The transparent resin substrate is substantially transparent,
It is sufficient that the resin substrate does not have large absorption and scattering, and there is no particular limitation. Specific examples of resins used include polyolefin resins, polyester resins, polycarbonate resins, poly (meth) acrylate resins, polystyrene, polyvinyl chloride, polyvinyl acetate, polyacrylate resins, polyethersulfone. Resins and the like can be given. Among these, amorphous polyolefin resin, polyester resin, polycarbonate resin, poly (meth) acrylate resin, polyarylate resin, and polyether sulfone resin are particularly preferable.

The resins for the transparent resin substrate are generally known additives such as phenol-based and phosphorus-based antioxidants, halogen-based and phosphoric acid-based flame retardants, heat-resistant aging inhibitors, and ultraviolet absorbers. Agents, lubricants, antistatic agents and the like can be added. The transparent resin substrate is formed into a sheet (plate) using a known method such as injection molding, T-die molding, calendar molding, or compression molding. The thickness of the sheet is preferably in the range of 1 mm to 8 mm depending on the purpose. Such a transparent substrate may be laminated with another plastic substrate.

Further, the transparent resin substrate is subjected to a corona discharge treatment,
A surface treatment by a conventionally known method such as a flame treatment, a plasma treatment, a glow discharge treatment, a surface roughening treatment, and a chemical treatment, or a coating such as a primer may be applied to one or both surfaces. One surface of the transparent resin substrate may be provided with a damage prevention layer for preventing damage. In this case, the other surface of the surface on which the scratch prevention layer is formed is bonded to the adhesive layer of the transparent laminated film. The scratch prevention layer, for example,
It is formed of a monofunctional or polyfunctional acrylate such as urethane acrylate or epoxy acrylate, a photopolymerization initiator, and a hard coat agent mainly containing an organic solvent. In order to improve abrasion resistance, a silica sol using a colloidal metal oxide and an organic solvent as a dispersion medium can be added.

The coating liquid of the above hard coating agent is applied by a coating method such as a dipping method, a flow coating method, a spray method, a bar coating method, a gravure coat, a roll coat, a blade coat, and an air knife coat, and dried by a solvent. After irradiation with active energy, 1 to 50 μm, preferably 3 to 20 μm.
Make a thickness of μm. After drying the solvent, in order to cross-link and cure the applied coating agent, ultraviolet light emitted from a light source such as a xenon lamp, a low-pressure mercury lamp, a high-pressure mercury lamp, an ultra-high-pressure mercury lamp, a metal halide lamp, a carbon arc lamp, and a tungsten lamp, or usually 20 to 2000 ke
Electron beam, α-ray, β taken out of V electron beam accelerator
An active energy ray such as a ray and a gamma ray can be used.

As a method of bonding the transparent resin substrate and the adhesive-coated surface of the transparent laminated film, pressure bonding, fusion bonding, thermocompression bonding and the like can be adopted. Preferably, thermocompression bonding is employed in terms of adhesion and appearance. In the case of thermocompression bonding, the conditions of heating and pressing vary depending on the selected adhesive, transparent resin film, and transparent resin substrate, but are preferably performed at 80 to 130 ° C. and 80 to 150 kg / cm ^2. Is done.

Finally, antireflection layers are formed on both surfaces of the bonded substrate obtained above. By providing an antireflection layer on both sides of the substrate, when the filter of the present invention is installed on the front of the display, the antireflection layer on the display side,
The anti-reflection layer on the opposite side (closer to the human eye) increases the transmittance of light from the display, and has the effect of preventing the reflection of external light such as fluorescent light, thereby improving the visibility of the image. The antireflection layer is made of silicon oxide, zirconium oxide, titanium oxide, magnesium fluoride, calcium fluoride, aluminum oxide having a relatively low refractive index, or JP-A-2-1980.
It is composed of an amorphous fluoropolymer as disclosed in No. 1. Examples of the formation method include a method of applying and firing a metal alkoxide, a vacuum evaporation method, a sputtering method, an ion plating method, a CVD method, a roll coating method, and a dip coating method. From the viewpoint of economy and handling, it is preferable to coat a solution obtained by dissolving the amorphous fluoropolymer in a fluorinated solvent by dip coating.

For example, the amorphous fluorine-containing polymer may be
Luorooctane, CF_Three(CF_Two) _nCH = CH
_Two(N; 5 to 11), CF_Three(CF_Two)_mCH_TwoCH_Three
(M; 5 to 11)
And apply the solution as a coating solution. Immersion
In coating, the coating liquid density ρ (g / cm^Three), Coating liquid viscosity μ
(Poise), coating liquid surface tension σ (dyne / cm)
Vw (cm / sec) at a constant speed
When pulled up in degrees, the theoretical coating thickness hth is
It is represented as

[0033]

Hth = 0.944 (μ · Vw / σ) ^1/6 · (μ · Vw / ρ · g) ^1/2 Equation 1

The coating film thickness is 10 to 1000 n
m, preferably 20 to 500 nm, the density, viscosity, and surface tension of the coating solution to be used can be measured, and the pulling speed can be set with reference to Equation 1 to perform the measurement. PD of the present invention
The filter obtained by the method of manufacturing the front filter for P has a visible light transmittance of 50% or more at 400 to 700 nm, a near infrared transmittance of 800 to 1000 nm of 10% or less, and an electromagnetic wave shielding performance of 30 to 100 MHz of 30 d.
It has performance of B or higher and is suitable as a front filter for PDP.

[0035]

EXAMPLES Next, examples of the present invention will be described more specifically, but this description does not limit the present invention. [Example 1] PET film "T100E" (thickness: 100 m) manufactured by Diafoil Hoechst Co., Ltd .; coating agent "SF-409" manufactured by Dainippon Ink Co., Ltd .; benzotriazole ultraviolet absorber "ADK STAB 1413" manufactured by Asahi Denka Co., Ltd.
Was added at 2% by weight, and a 5 μm-thick base coat layer was coated and cured. On top of this base coat layer,
An ITO film having a thickness of 200 nm was formed and used as an electromagnetic wave shielding layer. At this time, In ₂ O ₃ —SnO ₂ was used as a deposition material.
(5 parts by weight) Using a sintered body, a plasma gun apparatus (manufactured by Chugai Furnace Industry), base vacuum degree 1 × 10 ⁻⁵ Torr, film formation vacuum degree 5 × 10 ⁻⁴ Torr, Ar flow rate 30 sccm, O ₂
Flow rate 100 sccm, deposition rate 3 nm / sec, gun output 5
The test was performed under the conditions of 5 V and 150 A.

Next, 100 parts by weight of PMMA binder "Dianal BR-80" manufactured by Mitsubishi Rayon Co., Ltd., 4 parts by weight of a near-infrared absorber "IRG-022 (diimonium type)" manufactured by Nippon Kayaku Co., Ltd. One part by weight of an infrared absorbent "EEXCOLOR IR-3 (phthalocyanine)" was mixed, and a coating solution diluted to a solid content of 10% with a methyl ethyl ketone solvent was prepared. This coating solution was coated on the electromagnetic wave shielding layer and dried to obtain a near-infrared absorbing layer having a thickness of 5 μm. 4m thick molded with Mitsubishi engineering plastic polycarbonate resin "Iupilon S-3000"
m on one side of the sheet, "Kayad DPH" manufactured by Nippon Kayaku
A) is applied with 100 parts by weight of a 40% by weight methyl ethyl ketone solution of a hard coat agent mixed with 0.2 parts by weight of benzyl dimethyl ketal, dried and output 7.5 k
Using a high-pressure mercury lamp having an output density of 120 w / cm and using a high-pressure mercury lamp at a position 10 cm below the light source and irradiating ultraviolet rays under the condition of a conveyor speed of 2 m / min to cure, a hard coat layer was formed.
The other surface and the surface of the near-infrared absorbing layer of the PET film were added to 100 parts by weight of BLS-3082 manufactured by Toyo Morton Co., and 0.5 parts by weight of a curing agent CAT-RT30, and a benzotriazole-based ultraviolet absorber manufactured by Asahi Denka Co., Ltd. "ADK STAB 1413" was laminated with an adhesive to which 3% by weight was added to form a laminate. The pressing conditions at this time are 100 ° C.
100 kg / cm ^{2 for} 30 minutes.

Next, a polymer having a fluorinated aliphatic ring structure obtained by homopolymerizing perfluoro (butenyl vinyl ether) was added to perfluorooctane in an amount of 1.5% by weight.
After immersing the laminate in the solution dissolved in
By pulling up at a rate of mm / min and heating at 120 ° C. for 10 minutes, a 100-nm-thick antireflection layer was formed on both sides of the laminate to obtain a front filter for PDP. The visible light transmittance of this filter at 400 to 700 nm is 50 on average.
%, The near-infrared cut ratio of 800 to 1000 nm is 5 on average.
%, The electromagnetic wave shielding performance was 40 dB at 50 MHz. When this filter was installed in front of the display, reflection of external light was reduced, and visibility was improved.

[0038]

The present invention provides a method for efficiently and economically producing a front filter for a PDP having near-infrared cut performance, electromagnetic wave shielding performance, anti-scratch performance, and anti-reflection performance. Further, the front filter for a plasma display panel of the present invention has near-infrared cut performance, electromagnetic wave shielding performance, anti-scratch performance, and anti-reflection performance, and has good light resistance of near-infrared cut performance and good visibility of images. Optimally used as a filter.

──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. ⁶ Identification code FI G02B 1/10 G12B 17/02 5/22 H01J 11/02 Z G12B 17/02 17/16 H01J 11/02 H05K 9/00 V 17/16 G02B 1/10 A H05K 9/00 Z

Claims (9)

[Claims] An anti-reflection layer is provided on both sides of a substrate obtained by laminating a transparent laminated film having an electromagnetic wave shielding layer, a near infrared ray shielding layer and an adhesive layer on a transparent resin film and a transparent resin substrate. A front filter for a plasma display panel. 2. The method according to claim 1, wherein the near-infrared shielding layer comprises an immonium compound,
The front filter for a plasma display panel according to claim 1, comprising at least one compound selected from a diimonium compound and an aminium salt-based compound. 3. The front filter for a plasma display panel according to claim 1, wherein the adhesive layer is made of a thermosetting resin containing an ultraviolet absorbent. 4. The front filter for a plasma display panel according to claim 1, further comprising a base coat layer between the transparent resin film and the electromagnetic wave shielding layer. 5. The front filter for a plasma display panel according to claim 1, further comprising an anti-scratch layer between the transparent resin substrate and the anti-reflection layer. 6. An adhesive layer of a transparent laminated film in which a transparent resin film is provided with a vapor-deposited layer of a conductive substance having an electromagnetic wave shielding function and a coating layer of a near-infrared absorbing agent coating liquid, and further coated with an adhesive. 2. The front filter for a plasma display panel according to claim 1, wherein an anti-reflection layer is provided on both sides of a substrate obtained by laminating a transparent resin substrate. 7. An adhesive surface of a transparent laminated film obtained by vapor-depositing a conductive substance having an electromagnetic wave shielding function on a transparent resin film, and then sequentially coating a near-infrared absorbing agent coating liquid and an adhesive, A method for producing a front filter for a plasma display panel, comprising a substrate obtained by laminating antireflection layers on both surfaces. 8. An anti-reflection layer is formed by dip coating.
A method for manufacturing a front filter for a plasma display panel according to claim 7. 9. The method for manufacturing a front filter for a plasma display panel according to claim 7, wherein a conductive material is deposited after applying the base coat agent to the transparent resin film.