JPH11158115A - Deuterated ester compound - Google Patents

Deuterated ester compound

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Publication number
JPH11158115A
JPH11158115A JP32569797A JP32569797A JPH11158115A JP H11158115 A JPH11158115 A JP H11158115A JP 32569797 A JP32569797 A JP 32569797A JP 32569797 A JP32569797 A JP 32569797A JP H11158115 A JPH11158115 A JP H11158115A
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JP
Japan
Prior art keywords
group
general formula
acid
compound
equivalent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP32569797A
Other languages
Japanese (ja)
Inventor
Hisao Takayanagi
久男 高柳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Corp
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Priority to JP32569797A priority Critical patent/JPH11158115A/en
Publication of JPH11158115A publication Critical patent/JPH11158115A/en
Pending legal-status Critical Current

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  • Epoxy Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a new deuterated ester compound useful as an intermediate for the production of 2,2-dideutero-5-aminolevulinic acid by introducing deuterium using inexpensive heavy water but not using a large excess amount of it. SOLUTION: This compound shown by the formula [R<1> is a 1-4C alkyl; R<2> forms a single bond together with R<3> ; R<4> is H] is obtained by the reaction of an allylmalonic acid ester with 1.0-1.5 equivalent(s) of a base (e.g. sodium hydroxicle, n-butyl lithium) in an appropriate solvent at -50 to 100 deg.C, followed by the reaction with 1.0-5 equivalent(s), preferably 1.0-2 equivalent(s), of heavy acetic acid prepared by adding 1/2 equivalent of heave water to acetic acid anhydride and stirring the mixture.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、MR(磁気共鳴)
診断の機能を併せ持ったPDT(光力学治療)剤として
有用な2,2−ジジューテロ−5−アミノレブリン酸の
新規な製造法における重要中間体およびその製造方法に
関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an MR (magnetic resonance)
The present invention relates to an important intermediate in a novel method for producing 2,2-dideutero-5-aminolevulinic acid, which is useful as a PDT (photodynamic therapy) agent having a diagnostic function, and a method for producing the intermediate.

【0002】[0002]

【従来の技術および発明が解決しようとする課題】2,
2−ジジューテロ−5−アミノレブリン酸の製法とし
て、本発明者は5,5−ジメトキシ−2−ピペリドンを
重水素化し、次いで加水分解する方法を提案した(WO
97/03042参照)が、本方法においては重水素化
は重水素源となる化合物と5,5−ジメトキシ−2−ピ
ペリドンとの間の平衡反応を経て行なうため、重水素化
率の高い2,2−ジジューテロ−5−アミノレブリン酸
を得るためには、高価な重水素源化合物を大過剰使用し
なければならないという重大な欠点があった。一方、
2,2−ジジューテロ−5−アミノレブリン酸は本発明
者が2,2−ジジューテロ−5−アミノレブリン酸を製
造したのと同様な経路(特開平9−67323号公報)
でも製造できるはずであり、その際出発原料として2,
2−ジジューテロ−4−ペンテン酸エステル(本願、下
記一般式(II)で表わされる化合物の内、R2 ,R3
単結合、R4 =水素原子で表わされる化合物)が必要と
なる。最近、2,2−ジジューテロ−4−ペンテン酸の
合成が報告された(J.Amev.Chem.So
o.,118,2634(1996)参照)が、この合
成法においても重水素原子導入反応は大過剰(約100
倍モル)の重水を使用するものであった。本発明の目的
は、重水素源化合物としては最も安価に入手できる重水
を用い、さらにこれを大過剰用いることなく重水素原子
を導入する反応を経る2,2−ジジューテロ−5−アミ
ノレブリン酸の安価な製造法を提供することにある。
2. Description of the Related Art
As a method for producing 2-dideutero-5-aminolevulinic acid, the present inventors have proposed a method in which 5,5-dimethoxy-2-piperidone is deuterated and then hydrolyzed (WO
However, in the present method, deuteration is carried out through an equilibrium reaction between a compound serving as a deuterium source and 5,5-dimethoxy-2-piperidone. In order to obtain 2-dideutero-5-aminolevulinic acid, there was a serious disadvantage that a large excess of expensive deuterium source compounds had to be used. on the other hand,
2,2-dideutero-5-aminolevulinic acid is obtained by the same route as the present inventors producing 2,2-dideutero-5-aminolevulinic acid (JP-A-9-67323).
However, it should be able to be manufactured.
2-dideuter-4-pentenoic acid ester (in the present application, among compounds represented by the following general formula (II), R 2 , R 3 =
A single bond, a compound represented by R 4 = hydrogen atom). Recently, the synthesis of 2,2-dideutero-4-pentenoic acid was reported (J. Amev. Chem. So.
o. , 118 , 2634 (1996)), but also in this synthesis method, the deuterium atom introduction reaction has a large excess (about 100).
Heavy water). An object of the present invention is to use heavy water, which is available at the lowest cost, as a deuterium source compound, and to use a low-cost 2,2-dideutero-5-aminolevulinic acid through a reaction of introducing a deuterium atom without using a large excess thereof. It is to provide a simple manufacturing method.

【0003】[0003]

【課題を解決するための手段】本発明者は、前述の目的
を達成すべく鋭意検討を重ねた結果、容易に入手できる
アリルマロン酸エステルの活性水素を重水素に置換し、
次いで重水存在下脱酸する方法、すなわち、化学量論的
には1.5モル当量の重水の使用で重水素化が行なえる
方法により、2,2−ジジューテロ−4−ペンテン酸エ
ステルが高い重水素化率で容易に製造できることを見い
出し、本発明に到達した。即ち、本発明の要旨は、下記
一般式(I)
Means for Solving the Problems As a result of intensive studies to achieve the above object, the present inventors have replaced active hydrogen of easily available allyl malonic ester with deuterium,
Then, 2,2-dideutero-4-pentenoic acid ester is deoxidized in the presence of heavy water, that is, a method in which deuteration can be performed using 1.5 molar equivalents of heavy water in a stoichiometric manner. They have found that they can be easily produced at a hydrogenation rate, and have reached the present invention. That is, the gist of the present invention is represented by the following general formula (I)

【0004】[0004]

【化3】 (式中、R1 はC1 〜C4 のアルキル基を表わし、R2
はアミノ基、アジド基、またはフタルイミド基を表わす
か、あるいはR2 はR3 と一緒になって単結合またはエ
ポキシ環を形成していてもよい。また、R3 は置換シリ
ル基で保護されていてもよい水酸基を表わす。R4 は水
素原子を表わすか、R3 と一緒になってオキソ基を表わ
す。)で表わされる重水素化エステル類化合物、もしく
はその塩、またはそれらの水和物もしくはそれらの溶媒
和物および、上記一般式(I)で表わされる化合物を重
水存在下、脱炭酸することを特徴とする下記一般式(I
I)
Embedded image (In the formula, R 1 represents an alkyl group of C 1 ~C 4, R 2
Represents an amino group, an azido group, or a phthalimide group, or R 2 may form a single bond or an epoxy ring together with R 3 . R 3 represents a hydroxyl group which may be protected by a substituted silyl group. R 4 represents a hydrogen atom or, together with R 3 , represents an oxo group. )) Or a salt thereof, or a hydrate or solvate thereof, and a compound represented by the above general formula (I), which is decarboxylated in the presence of heavy water. The following general formula (I
I)

【0005】[0005]

【化4】 Embedded image

【0006】(式中、R1 ,R2 ,R3 及びR4 は前記
と同義を表わす。)で表わされる化合物の製造方法に存
する。なお、本発明においては、上記一般式(II)で、
1 が水素原子、R2 がアミノ基、R3 及びR4 が一緒
になってオキソ基を表わす、即ち、2,2−ジジューテ
ロ−5−アミノレブリン酸を製造する方法が最も好まし
い態様として挙げられる。
(Wherein R 1 , R 2 , R 3 and R 4 have the same meanings as described above). In the present invention, in the above general formula (II),
R 1 is a hydrogen atom, R 2 is an amino group, and R 3 and R 4 together represent an oxo group, that is, a method for producing 2,2-dideutero-5-aminolevulinic acid is the most preferred embodiment. .

【0007】[0007]

【発明の実施の形態】以下、本発明につき詳細に説明す
る。上記の定義において、R1 におけるC1 〜C4 のア
ルキル基としてはメチル基、エチル基、n−プロピル
基、イソプロピル基、t−ブチル基などが挙げられる。
3 における水酸基を保護する置換シリル基としては、
トリメチルシリル基、トリエチルシリル基、t−ブチル
ジメチルシリル基などが挙げられる。以下、一般式
(I)で表わされる好ましい化合物の具体例を下記表−
1,−2,−3,−4,−5,−6および−7に表わ
す。 (1)R2 とR3 が一緒になって単結合を表わす場合
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail. In the above definition, examples of the C 1 -C 4 alkyl group for R 1 include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, and a t-butyl group.
Examples of the substituted silyl group for protecting the hydroxyl group in R 3 include:
Examples include a trimethylsilyl group, a triethylsilyl group, and a t-butyldimethylsilyl group. Hereinafter, specific examples of preferred compounds represented by the general formula (I) are shown in the following Tables.
1, -2, -3, -4, -5, -6 and -7. (1) When R 2 and R 3 together represent a single bond

【0008】[0008]

【表1】 [Table 1]

【0009】(2)R2 とR3 が一緒になってエポキシ
環を形成する場合
(2) When R 2 and R 3 together form an epoxy ring

【0010】[0010]

【表2】 [Table 2]

【0011】(3)R2 がアジド基を表わす場合 a)R3 が置換シリル基で保護されていてもよい水酸基
を表わす場合(この場合R4 =水素原子)
(3) When R 2 represents an azide group a) When R 3 represents a hydroxyl group which may be protected by a substituted silyl group (in this case, R 4 = hydrogen atom)

【0012】[0012]

【表3】 [Table 3]

【0013】b)R3 がR4 とともにオキソ基を表わす
場合
B) when R 3 together with R 4 represents an oxo group

【0014】[0014]

【表4】 [Table 4]

【0015】(4)R2 がフタルイミド基を表わす場合 a)R3 が置換シリル基で保護されていてもよい水酸基
を表わす場合(この場合、R4 =水素原子)
(4) When R 2 represents a phthalimide group a) When R 3 represents a hydroxyl group which may be protected by a substituted silyl group (in this case, R 4 = hydrogen atom)

【0016】[0016]

【表5】 [Table 5]

【0017】b)R3 がR4 と共にオキソ基を表わす場
B) when R 3 together with R 4 represents an oxo group

【0018】[0018]

【表6】 [Table 6]

【0019】(5)R2 がアミノ基を表わし、R3 がR
4 とともにオキソ基を表わす場合
(5) R 2 represents an amino group, and R 3 represents R
When 4 represents an oxo group

【0020】[0020]

【表7】 [Table 7]

【0021】なお、上記表−1〜7中、−Meはメチル
基を、−Etはエチル基を、−tBuはt−ブチル基を
それぞれ表わす。上記一般式(I)で表される化合物に
対する塩類としては、製薬上許容される塩類が好まし
く、例えば塩酸塩、臭化水素酸塩、ヨウ化水素酸塩、硫
酸塩、燐酸塩等の無機酸塩、およびシュウ酸塩、マレイ
ン酸塩、フマル酸塩、乳酸塩、リンゴ酸塩、クエン酸
塩、酒石酸塩、安息香酸塩、メタンスルホン酸塩、カン
ファースルホン酸塩等の有機酸塩が挙げられる。上記一
般式(I)の化合物及びその塩は水和物または溶媒和物
の形で存在することもあるので、これらの水和物及び溶
媒和物も本発明の範囲に含まれる。溶媒和物の溶媒とし
てはメタノール、エタノール、イソプロパノール、アセ
トン、酢酸エチル、塩化メチレン等が挙げられる。
In Tables 1 to 7, -Me represents a methyl group, -Et represents an ethyl group, and -tBu represents a t-butyl group. As the salts for the compound represented by the above general formula (I), pharmaceutically acceptable salts are preferable, and for example, inorganic acids such as hydrochloride, hydrobromide, hydroiodide, sulfate and phosphate are preferred. Salts and organic acid salts such as oxalate, maleate, fumarate, lactate, malate, citrate, tartrate, benzoate, methanesulfonate, camphorsulfonate, etc. . Since the compounds of the above general formula (I) and salts thereof may exist in the form of hydrates or solvates, these hydrates and solvates are also included in the scope of the present invention. Examples of the solvent for the solvate include methanol, ethanol, isopropanol, acetone, ethyl acetate, and methylene chloride.

【0022】本発明の化合物の製法について説明する。
上記一般式(I)において、R2 とR3 が一緒になって
単結合を表わす化合物はアリルマロン酸エステルの活性
メチン水素原子が重水素原子に置換した化合物であり、
アリルマロン酸エステルをテトラヒドロフラン(TH
F)、ジエチルエーテル、ジメチルホルムアミド(DM
F)等適当な溶媒中、−50℃から100℃、好ましく
は−10℃から20℃で、1.0から1.5当量の水素
化ナトリウム、n−ブチルリチウム等、活性メチン水素
原子を水素ガス、ブタン等不活性物質として引き抜ける
塩基を反応させ、次いで無水酢酸に1/2当量の重水を
加えかきまぜることにより容易に調製できる重酢酸を、
1.0から5当量、好ましくは1.0から2当量、反応
させ製造できる。アリルマロン酸エステルは市販されて
いるものもあり、また、マロン酸エステルのアリル化反
応により容易に調製できる。
The method for producing the compound of the present invention will be described.
In the general formula (I), the compound in which R 2 and R 3 together represent a single bond is a compound in which an active methine hydrogen atom of an allyl malonic ester is substituted with a deuterium atom;
Allylmalonate is converted to tetrahydrofuran (TH
F), diethyl ether, dimethylformamide (DM
F) In a suitable solvent such as -50 ° C to 100 ° C, preferably -10 ° C to 20 ° C, 1.0 to 1.5 equivalents of an active methine hydrogen atom such as sodium hydride or n-butyllithium is hydrogenated. Gas, a heavy acetic acid which can be easily prepared by reacting a base which is withdrawn as an inert substance such as butane, and then adding 1/2 equivalent of heavy water to acetic anhydride and stirring,
It can be produced by reacting 1.0 to 5 equivalents, preferably 1.0 to 2 equivalents. Some allyl malonic esters are commercially available, and can be easily prepared by an allylation reaction of the malonic ester.

【0023】上述したR2 とR3 が一緒になって単結合
を表わす一般式(I)で表わされる化合物から、ジメチ
ルホルムアミド中、0.01から20当量の塩化リチウ
ム、塩化ナトリウム、シアン化ナトリウム等の無機塩、
および1.0から10当量、好ましくは1.0から2.
0当量の重水の存在下、30分から2日間、好ましくは
1時間から6時間、加熱還流することにより上述の一般
式(II)で表わされる化合物に変換できる。
From the compound represented by the general formula (I) wherein R 2 and R 3 together represent a single bond, from 0.01 to 20 equivalents of lithium chloride, sodium chloride and sodium cyanide in dimethylformamide Inorganic salts, such as
And 1.0 to 10 equivalents, preferably 1.0 to 2.
The compound can be converted to the compound represented by the above general formula (II) by heating under reflux for 30 minutes to 2 days, preferably 1 hour to 6 hours in the presence of 0 equivalent of heavy water.

【0024】上記で製造したR2 とR3 が一緒になって
単結合を表わす、すなわち二重結合を有する一般式
(I)で表わされる化合物から、孤立二重結合をエポキ
シ化するのに用いられる方法、たとえば有機過酸、アル
キルヒドロペルオキシド、過酸化水素などの酸化剤を作
用させる方法、あるいは含水有機溶媒中、N−ブロモス
クシンイミド等のN−ハロカルボン酸アミドを作用し、
生成するハロヒドリンを塩基処理する方法等により一般
式(I)において、R2 とR3 が酸素原子を介してエポ
キシ環を形成している化合物を製造できる。有機過酸と
しては過酢酸、m−クロロ過安息香酸などが用いられ、
これを0.1〜10当量、好ましくは1〜1.5当量を
塩化メチレン、クロロホルム等の適当な有機溶媒中、−
20℃〜150℃、好ましくは0℃から100℃で1時
間から10日間、好ましくは5時間から3日間作用させ
る。アルキルヒドロペルオキシド、過酸化水素を用いる
際には、チタニウム、アルミニウム、バナジウム、モリ
ブデン等の金属酸化物錯体を触媒として用いる。
The above-prepared R 2 and R 3 together represent a single bond, that is, they are used to epoxidize an isolated double bond from a compound represented by the general formula (I) having a double bond. Method, for example, a method of reacting an oxidizing agent such as an organic peracid, an alkyl hydroperoxide, or hydrogen peroxide, or an N-halocarboxylic acid amide such as N-bromosuccinimide in a water-containing organic solvent,
In the general formula (I), a compound in which R 2 and R 3 form an epoxy ring via an oxygen atom can be produced by a method of treating the resulting halohydrin with a base or the like. Peracetic acid, m-chloroperbenzoic acid and the like are used as the organic peracid,
0.1 to 10 equivalents, preferably 1 to 1.5 equivalents of this in a suitable organic solvent such as methylene chloride and chloroform,
It is allowed to act at 20 ° C. to 150 ° C., preferably 0 ° C. to 100 ° C., for 1 hour to 10 days, preferably 5 hours to 3 days. When an alkyl hydroperoxide or hydrogen peroxide is used, a metal oxide complex such as titanium, aluminum, vanadium, or molybdenum is used as a catalyst.

【0025】上述の方法で製造できる一般式(I)にお
いて、R2 とR3 が酸素原子を介して結合してエポキシ
環を形成している化合物から、エポキシ環をアジドアニ
オンで開環する方法、たとえばアルコール系溶媒中、ア
ンモニウムアジドを作用させる方法(J.Org.Ch
em.,50,1556(1985)参照)、過塩素酸
リチウム等の金属塩の存在下、アセトニトリル溶媒中、
ナトリウムアジドを作用させる方法(Tetrahed
ron Letters,31,5641(1990)
参照)、トリメチルシリルアジド、トリ−n−ブチルス
タニルアジド等のアジド化合物を触媒なしで(Tetr
ahedron Letters,30,4153(1
989)参照)、あるいは触媒存在下(Tetrahe
dron:Asymmetry,,437(199
1)参照)作用させる方法等で、一般式(I)において
2 がアジド基、R3 が水酸基あるいは置換シリル基で
保護された水酸基である化合物が製造できる。トリメチ
ルシリルアジド、トリ−n−ブチルスタニルアジドの代
りに、たとえばt−ブチルジメチルシリルアジド、t−
ブチルジメチルスタニルアジドを用いれば、水酸基がt
−ブチルジメチルシリル基で保護された当該化合物が製
造できる。同様にして、一般式(I)において、R2
3 が酸素原子を介して結合してエポキシ環を形成して
いる化合物に、フタルイミドカリウム等を作用する方法
(Tetrahedron Lett.,23,169
7(1982)参照)により、一般式(I)においてR
2 がフタルイミド基、R3 が水酸基である化合物が製造
できる。
In the general formula (I) which can be produced by the above-mentioned method, a method of opening an epoxy ring with an azide anion from a compound in which R 2 and R 3 are bonded via an oxygen atom to form an epoxy ring. For example, a method of reacting ammonium azide in an alcohol solvent (J. Org. Ch.
em. , 50 , 1556 (1985)) in an acetonitrile solvent in the presence of a metal salt such as lithium perchlorate.
Method of reacting sodium azide (Tetrahed
ron Letters, 31 , 5641 (1990)
Azide compounds such as trimethylsilyl azide and tri-n-butylstannyl azide without a catalyst (Tetr
ahedron Letters, 30 , 4153 (1
989)) or in the presence of a catalyst (Tetrahe
dron: Asymmetry, 2 , 437 (199
Compounds in which R 2 is an azide group and R 3 is a hydroxyl group or a hydroxyl group protected by a substituted silyl group in the general formula (I) can be produced by a method or the like which acts 1). Instead of trimethylsilyl azide and tri-n-butylstannyl azide, for example, t-butyldimethylsilyl azide, t-butyl
If butyldimethylstannyl azide is used, the hydroxyl group becomes t
The compound protected with -butyldimethylsilyl group can be produced. Similarly, in the general formula (I), a compound in which R 2 and R 3 are bonded via an oxygen atom to form an epoxy ring is reacted with potassium phthalimide or the like (Tetrahedron Lett., 23 , 169).
7 (1982)), R in general formula (I)
A compound in which 2 is a phthalimide group and R 3 is a hydroxyl group can be produced.

【0026】上記の方法で製造したR2 がアジド基また
はフタルイミド基、R3 が水酸基である一般式(I)で
表される化合物から、二級アルコールをケトンに酸化す
る方法、たとえば(1)ジョーンズ試薬、クロロクロム
酸ピリジニウム等のクロム酢酸化、(2)ジメチルスル
ホキシド(DMSO)−三酸化硫黄−ピリジン系、DM
SO−無水トリフルオロ酢酸系を用いるDMSO酸化、
あるいは(3)次亜塩素酸ナトリウム、次亜塩素酸カル
シウムを用いる次亜ハロゲン酸酸化などにより、対応す
るR3 とR4 が一緒になってオキソ基を表す化合物、す
なわちカルボニル化合物を製造できる。また、酸化剤に
よっては、たとえば、ジョーンズ試薬によりR2 がアジ
ド基、R3 が置換シリル基で保護された水酸基である化
合物から、脱保護することなく直接当該カルボニル化合
物を製造できる。
A method of oxidizing a secondary alcohol to a ketone from the compound represented by the general formula (I) in which R 2 is an azide group or a phthalimide group and R 3 is a hydroxyl group produced by the above method, for example, (1) Jones reagent, chromium acetate such as pyridinium chlorochromate, (2) dimethylsulfoxide (DMSO) -sulfur trioxide-pyridine system, DM
DMSO oxidation using SO-trifluoroacetic anhydride system,
Alternatively, (3) a compound in which R 3 and R 4 together represent an oxo group, that is, a carbonyl compound, can be produced by hypohalous acid oxidation using sodium hypochlorite or calcium hypochlorite. In addition, depending on the oxidizing agent, for example, the carbonyl compound can be directly produced from a compound in which R 2 is an azide group and R 3 is a hydroxyl group protected with a substituted silyl group by a Jones reagent without deprotection.

【0027】さらに、前述した二重結合のエポキシ化、
アジドによるエポキシ環開裂を経ることなく、一般式
(I)においてR2 とR3 が一緒になって単結合を表わ
す化合物、すなわち二重結合にアジ化クロミル(Tet
rahedron Lett.,36,6751(19
95)参照)を塩化メチレン等適当な溶媒中作用させる
ことにより直接R2 がアシド基、R3 ,R4 がオキソ基
を表わす一般式(I)で表わされる化合物を製造するこ
とも可能である。
Further, the epoxidation of the aforementioned double bond,
A compound in which R 2 and R 3 together represent a single bond in the general formula (I) without undergoing an epoxy ring cleavage by an azide, ie, a chromyl azide (Tet)
rahedron Lett. , 36 , 6751 (19
95)) in a suitable solvent such as methylene chloride to directly produce a compound represented by the general formula (I) wherein R 2 represents an acid group and R 3 and R 4 represent an oxo group. .

【0028】このようにして製造したR2 がアジド基、
3 とR4 が一緒になってオキソ基である一般式(I)
で表わされる化合物から、R2 がアジド基の場合、たと
えばR1 に対応するアルコールを溶媒とし、1当量から
それ以上の薬理学的に許容される塩酸、臭酸、硫酸等の
無機酸、あるいはメタンスルホン酸、p−トルエンスル
ホン酸等の有機酸の存在下、たとえば、活性炭に担持し
たパラジウム、パラジウム黒、酸化白金等の接触水素添
加反応の触媒の存在下、接触水添を行い、R2がアミノ
基である一般式(I)で表わされる化合物を製造でき
る。還元反応をアルコールの代りに水を溶媒として行な
う、あるいは一旦製造したR2 がアミノ基である一般式
(I)の化合物を酸加水分解することによって、2,2
−ジジューテロ−5−アミノレブリン酸を製造できる。
生成物は反応に用いた酸の塩として得られる。2,2−
ジジューテロ−5−アミノレブリン酸は、一般式(I)
においてR2がフタルイミド基、R3 とR4 が一緒にな
ってオキソ基である化合物から、塩酸、硫酸等の鉱酸の
存在下加熱、加水分解することによっても製造できる。
R 2 thus produced is an azide group,
General formula (I) wherein R 3 and R 4 together form an oxo group
When R 2 is an azide group from the compound represented by, for example, using an alcohol corresponding to R 1 as a solvent, one equivalent or more of a pharmacologically acceptable inorganic acid such as hydrochloric acid, bromic acid, sulfuric acid, or methanesulfonic acid, the presence of an organic acid such as p- toluenesulfonic acid, for example, palladium supported on activated carbon, palladium black, the presence of a catalytic hydrogenation reaction, such as platinum oxide catalyst, subjected to catalytic hydrogenation, R 2 Is a compound represented by the general formula (I) wherein is an amino group. The reduction reaction is carried out using water as a solvent instead of alcohol, or the compound of general formula (I) in which R 2 is an amino group once produced is acid-hydrolyzed to give 2,2
-Didutero-5-aminolevulinic acid can be produced.
The product is obtained as a salt of the acid used in the reaction. 2,2-
Didutero-5-aminolevulinic acid has the general formula (I)
Wherein R 2 is a phthalimido group and R 3 and R 4 are together an oxo group by heating and hydrolyzing in the presence of a mineral acid such as hydrochloric acid or sulfuric acid.

【0029】[0029]

【発明の効果】本発明によれば、2,2−ジジューテロ
−5−アミノレブリン酸の安価な製造方法が提供可能
な、新規製造中間体及びそれを用いた製造方法を得るこ
とができる。
According to the present invention, a novel intermediate which can provide an inexpensive production method of 2,2-dideutero-5-aminolevulinic acid and a production method using the same can be obtained.

【0030】[0030]

【実施例】以下、実施例によって本発明を具体的に説明
するが、本発明はその要旨を超えない限り以下に限定さ
れるものではない。 実施例1
EXAMPLES The present invention will be described below in detail with reference to examples, but the present invention is not limited to the following unless it exceeds the gist. Example 1

【0031】[0031]

【化5】 Embedded image

【0032】60%水素化ナトリウム(13.2g、
0.33mol、n−ヘキサン洗浄しオイルを除去す
る)のテトラヒドロフラン(300ml)懸濁液に、窒
素雰囲気下、かきまぜながら、約20℃でジエチルアリ
ルマロネート60ml(0.30mol)を徐々に滴下
した。滴下終了後、室温で3時間さらにかきまぜを続け
た後、無水酢酸24ml(0.20mol)に重水(D
化率>99.9%)4.4g(0.22mol)を加え
2日間室温でかきまぜることにより調製した重酢酸をス
テンレスチューブを通じて徐々にかきまぜながら加え
た。反応混合物から、窒素気流中濾過することにより不
溶部を濾別、テトラヒドロフランで洗浄した。濾液を減
圧濃縮し、残渣にジエチルテーテルおよび冷水を加え、
分離した有機層を冷水、冷飽和炭酸水素ナトリウム水溶
液、冷水の順に洗浄後、乾燥(MgSO 4 )、濾過、濃
縮し得た残渣を蒸留にて精製した。
60% sodium hydride (13.2 g,
0.33mol, n-hexane washing to remove oil
) In tetrahydrofuran (300 ml) suspension.
Under a nitrogen atmosphere, stir with stirring at about 20 ° C.
60 ml (0.30 mol) of lumalonate is slowly dropped
did. After dropping, continue stirring for 3 hours at room temperature.
After that, heavy water (D) was added to 24 ml (0.20 mol) of acetic anhydride.
(99.9%) 4.4 g (0.22 mol)
Stir the biacetic acid prepared by stirring at room temperature for 2 days.
Stir slowly through the stainless steel tube and add
Was. The reaction mixture was filtered by filtration in a nitrogen stream.
The solution was separated by filtration and washed with tetrahydrofuran. Reduce filtrate
The mixture was concentrated under reduced pressure, and diethyl ether and cold water were added to the residue.
Separate the organic layer into cold water and cold saturated aqueous sodium hydrogen carbonate
After washing with liquid and cold water in that order, dry (MgSO Four), Filtration, thick
The residue that could be compacted was purified by distillation.

【0033】51.7g(86%)。 94−5℃/7mmHg。1 H−NMR(CDCl3 ,300MHz)δ1.27
(6H,t,J=7.1Hz,CH2 3 ),2.6
3(2H,d,J=6.8Hz,C 2 CH=),4.
20(4H,q,J=7.1Hz,C 2 CH3 ),
5.08(2H,m,−CH=C 2 ),5.78(1
H,m,−C=CH2 )。13 C−NMR(CDCl3 ,75MHz)δ13.9,
32.6,51.2(t, 1J(C,D)=20.5H
z),61.2,117.3,134.0,168.
7。 実施例2
51.7 g (86%). 94-5 ° C / 7 mmHg. 1 H-NMR (CDCl 3 , 300 MHz) δ 1.27
(6H, t, J = 7.1Hz , CH 2 C H 3), 2.6
3 (2H, d, J = 6.8Hz, C H 2 CH =), 4.
20 (4H, q, J = 7.1Hz, C H 2 CH 3),
5.08 (2H, m, -CH = C H 2), 5.78 (1
H, m, -C H = CH 2). 13 C-NMR (CDCl 3 , 75 MHz) δ 13.9,
32.6, 51.2 (t, 1 J (C, D) = 20.5H
z), 61.2, 117.3, 134.0, 168.
7. Example 2

【0034】[0034]

【化6】 Embedded image

【0035】ジエステル体6.2g(30.8mmo
l)、塩化リチウム(150℃、減圧下乾燥したもの)
2.0g(47.2mmol)、重水(D化率>99.
9%)2.0ml(100mmol)、ジメチルホルム
アミド10mlの混合物を窒素雰囲気下、氷水を流した
冷却管付容器中8時間加熱還流後、常圧にて蒸留を行な
い得た105℃までの留分を分液し、上層を水洗(2
回)、乾燥(MgSO4 )、濾過し減圧蒸留にて精製し
目的とするジジューテロ体2.65g(66%)を得
た。
6.2 g of diester (30.8 mmol)
l), lithium chloride (dried at 150 ° C. under reduced pressure)
2.0 g (47.2 mmol), heavy water (D conversion> 99.
9%) A mixture of 2.0 ml (100 mmol) and 10 ml of dimethylformamide was heated and refluxed for 8 hours in a vessel equipped with a cooling tube through which ice water was flown under a nitrogen atmosphere, and then distilled at normal pressure to obtain a fraction up to 105 ° C. And the upper layer is washed with water (2
Times), dried (MgSO 4 ), filtered and purified by distillation under reduced pressure to obtain 2.65 g (66%) of the target dideutero compound.

【0036】78−80℃/68mmHg。1 H−NMR(CDCl3 ,300MHz)δ1.26
(3H,t,J=7.0Hz,CH2 3 ),2.3
6(2H,d,J=6.6Hz,CH2 CD2),4.
13(2H,q,J=7.0Hz,C 2 CH3 ),
5.03(2H,m,CH2 =),5.82(1H,
m,−CH2 =C)。13 C−NMR(CDCl3 ,75MHz)δ14.1,
28.6,32.8(pen, 1J(C,D)=19.
5Hz),60.1,115.2,136.6,17
2.8。 実施例3
78-80 ° C./68 mmHg. 1 H-NMR (CDCl 3 , 300 MHz) δ 1.26
(3H, t, J = 7.0Hz , CH 2 C H 3), 2.3
6 (2H, d, J = 6.6 Hz, CH 2 CD 2 );
13 (2H, q, J = 7.0Hz, C H 2 CH 3),
5.03 (2H, m, CH 2 =), 5.82 (1H,
m, -CH 2 = C H) . 13 C-NMR (CDCl 3 , 75 MHz) δ 14.1,
28.6, 32.8 (pen, 1 J (C, D) = 19.
5Hz), 60.1, 115.2, 136.6, 17
2.8. Example 3

【0037】[0037]

【化7】 Embedded image

【0038】オレフィン体9.60g(73.8mmo
l)の塩化メチレン溶液(100ml)にm−クロロ過
安息香酸(純度55%、25g,80mmol)をかき
まぜながら加え、室温で1週間放置した。過剰の飽和炭
酸水素ナトリウム水溶液を加え、はげしくかきまぜた
後、分離した有機層を飽和炭酸水素ナトリウム水溶液、
水で順次洗浄し、乾燥(MgSO4 )、濾過、濃縮で得
た残渣をSiO2 カラムクロマトグラフィー精製(展開
液、n−ヘキサン=酢酸エチル=10:1→6:1)に
付し目的とするエポキシ体6.82g(63%)を得
た。
9.60 g (73.8 mmol) of olefin compound
l) To methylene chloride solution (100 ml) was added m-chloroperbenzoic acid (purity 55%, 25 g, 80 mmol) with stirring, and the mixture was allowed to stand at room temperature for 1 week. After adding an excess of an aqueous saturated sodium hydrogen carbonate solution and stirring vigorously, the separated organic layer was washed with an aqueous saturated sodium hydrogen carbonate solution,
The residue obtained by successively washing with water, drying (MgSO 4 ), filtration and concentration was subjected to SiO 2 column chromatography purification (developing solution, n-hexane = ethyl acetate = 10: 1 → 6: 1). 6.82 g (63%) of the resulting epoxy compound was obtained.

【0039】1H−NMR(CDCl3 ,300MH
z)δ1.26(3H,t,J=7.1Hz,CH2
3 ),1.78(1H,dd,J=6.4,14.3
Hz,C a b CD2 ),1.95(1H,dd,J
=4.7,14.3Hz,CH a b CD2 ),2.5
6(1H,dd,J=2.6,4.9Hz, a b
=CH),2.76(1H,dd,J=4.1,4.9
Hz,H a b C=CH),2.99(1H,m,H2
C=C)。13 C−NMR(CDCl3 ,75MHz)δ14.1,
27.4,30.0(pen, 1J(C,D)=19.
5Hz),46.9,51.1,60.4,172.
7。 実施例4
[0039]1H-NMR (CDClThree, 300MH
z) δ 1.26 (3H, t, J = 7.1 Hz, CHTwoC
H Three), 1.78 (1H, dd, J = 6.4, 14.3).
Hz, CH aHbCDTwo), 1.95 (1H, dd, J
= 4.7, 14.3 Hz, CH a H bCDTwo), 2.5
6 (1H, dd, J = 2.6, 4.9 Hz,H aHbC
= CH), 2.76 (1H, dd, J = 4.1, 4.9)
Hz, H a H bC = CH), 2.99 (1H, m, HTwo
C = CH).13 C-NMR (CDClThree, 75 MHz) δ 14.1,
27.4, 30.0 (pen,1J (C, D) = 19.
5Hz), 46.9, 51.1, 60.4, 172.
7. Example 4

【0040】[0040]

【化8】 Embedded image

【0041】エポキシ体2.1g(16.1mmo
l)、トリメチルシリルニトリル4.3ml(32.2
mmol)のジメチルホルムアミド(DMF,3ml溶
液を窒素雰囲気下85℃に50時間加熱した。室温にま
で冷却後、過剰の反応剤、DMFを減圧留去し、残渣を
SiO2 カラムクロマトグラフィー(展開液、n−ヘキ
サン:酢酸エチル=8:1)精製に付し目的とするアジ
ド体3.37g(85%)を得た。
2.1 g of epoxy compound (16.1 mmo)
l), 4.3 ml of trimethylsilyl nitrile (32.2)
(mmol) of dimethylformamide (DMF, 3 ml) was heated under a nitrogen atmosphere for 50 hours at 85 ° C. After cooling to room temperature, excess reactant and DMF were distilled off under reduced pressure, and the residue was subjected to SiO 2 column chromatography (developing solution). , N-hexane: ethyl acetate = 8: 1) to give 3.37 g (85%) of the desired azide.

【0042】1H−NMR(CDCl3 ,300MH
z)δ0.11(9H,s,SiMe 3 ),1.22
(3H,t,J=7.1Hz,CH2 3 ),1.7
8(1H,dd,J=8.8Hz,14.3Hz,C
a b CD2 ),1.81(1H,dd,J=4.7,
14.3Hz,CH a b CD2 ),3.13(1H,
dd,J=6.0,12.5Hz,C a b 3 ),
3.18(1H,dd,J=4.2,12.5Hz,C
a b 3 ),3.82(1H,m,COSi),
4.09(2H,q,J=7.1Hz,C 2
3 )。13 C−NMR(CDCl3 ,75MHz)δ0,14.
1,29.3(pen, 1J(C,D)=19.6H
z),29.6,56.5,60.3,70.4,17
3.0。 実施例5
[0042]1H-NMR (CDClThree, 300MH
z) δ 0.11 (9H, s, SiMe Three), 1.22
(3H, t, J = 7.1 Hz, CHTwoCH Three), 1.7
8 (1H, dd, J = 8.8 Hz, 14.3 Hz, CH
aHbCDTwo), 1.81 (1H, dd, J = 4.7,
14.3 Hz, CH a H bCDTwo), 3.13 (1H,
dd, J = 6.0, 12.5 Hz, CH aHbNThree),
3.18 (1H, dd, J = 4.2, 12.5 Hz, C
H a H bNThree), 3.82 (1H, m, CHOSi),
4.09 (2H, q, J = 7.1 Hz, CH TwoC
HThree).13 C-NMR (CDClThree, 75 MHz) δ0,14.
1,9.3 (pen,1J (C, D) = 19.6H
z), 29.6, 56.5, 60.3, 70.4, 17
3.0. Example 5

【0043】[0043]

【化9】 Embedded image

【0044】トリメチルシリルエーテル体3.3g(1
3.5mmol)のアセトン(40ml)溶液に、氷冷
下かきまぜながらジョーンズ試薬(4
3.3 g of trimethylsilyl ether compound (1
3.5 mmol) in acetone (40 ml) while stirring under ice-cooling with a Jones reagent (4).

〔0〕mmol/
ml)6.6mlを滴下した。滴下終了後、氷水浴を取
り去り7時間かきまぜを続けた。再び氷水浴にて冷却し
ながら、2−プロパノール(2ml)をかきまぜながら
加えた。反応混合物からアセトンを留去し、残渣に水、
エチルエーテルを加えた。分離した有機層を水(2
回)、飽和炭酸水素ナトリウム水溶液、水で順次洗浄
後、乾燥(MgSO4 )、濾過、濃縮して得た残渣をS
iO2 カラムクロマトグラフィー(展開液n−ヘキサ
ン:酢酸エチル=5:1)にて精製し、目的とするケト
ン体1.66g(72%)を得た。
[0] mmol /
6.6 ml) was added dropwise. After completion of the dropwise addition, the ice water bath was removed and stirring was continued for 7 hours. While cooling again in an ice-water bath, 2-propanol (2 ml) was added with stirring. Acetone is distilled off from the reaction mixture, and water and
Ethyl ether was added. The separated organic layer was washed with water (2
Times), washed successively with a saturated aqueous solution of sodium hydrogencarbonate and water, dried (MgSO 4 ), filtered and concentrated to obtain a residue.
Purification by iO 2 column chromatography (developing liquid n-hexane: ethyl acetate = 5: 1) gave 1.66 g (72%) of the desired ketone.

【0045】1H−NMR(CDCl3 ,300MH
z)δ1.26(3H,t,J=7.1Hz,CH2
3 ),2.71(2H,s,CH2 CD2 ),4.0
3(2H,s,CH2 3 ),4.14(2H,q,J
=7.1Hz,C 2 CH3 )。13 C−NMR(CDCl3 ,75MHz)δ14.0,
27.3(pen, 1J(C,D)=19.5Hz),
34.2,57.4,60.8,172.2,202.
9。 実施例6
1 H-NMR (CDCl 3 , 300 MH
z) δ 1.26 (3H, t, J = 7.1 Hz, CH 2 C
H 3), 2.71 (2H, s, CH 2 CD 2), 4.0
3 (2H, s, CH 2 N 3 ), 4.14 (2H, q, J
= 7.1Hz, C H 2 CH 3 ). 13 C-NMR (CDCl 3 , 75 MHz) δ 14.0,
27.3 (pen, 1 J (C, D) = 19.5 Hz),
34.2, 57.4, 60.8, 172.2, 202.
9. Example 6

【0046】[0046]

【化10】 Embedded image

【0047】トリメチルシリルニトリル2.78g(2
4mmol)の塩化メチレン(32ml)溶液に酸化ク
ロム25.7g(25.7mmol)を加え室温で3時
間よりかきまぜた後、オレフィン体1.20g(10.
7mmol)を加えさらに一昼夜かきまぜを続けた。セ
ライト濾過で不溶部を除いた濾液を濃縮し、残渣をSi
2 カラムクロマトグラフィー(展開液、n−ヘキサ
ン:酢酸エチル=5:1)にて精製し、実施例5で得た
のと同一のケトン体400mg(27%)を得た。 実施例7
2.78 g of trimethylsilyl nitrile (2
Chromium oxide (25.7 g, 25.7 mmol) was added to a methylene chloride (32 ml) solution of the compound (4 mmol), and the mixture was stirred at room temperature for 3 hours.
7 mmol), and the mixture was further stirred for 24 hours. The filtrate from which the insoluble portion was removed by Celite filtration was concentrated, and the residue was
Purification was performed by O 2 column chromatography (developing solution, n-hexane: ethyl acetate = 5: 1) to obtain 400 mg (27%) of the same ketone body as obtained in Example 5. Example 7

【0048】[0048]

【化11】 Embedded image

【0049】アジド体5.50g(29.4mmo
l)、濃塩酸3mlのメタノール(120ml)溶液に
窒素雰囲気下、10%パラジウム/炭素700mgを加
え、水素ガスに置換後室温にて14時間はげしくかきま
ぜた。触媒を濾去した濾液を濃縮し、これを1N塩酸水
溶液20mlに溶解後室温にて一昼夜放置した。次い
で、40℃水浴上に減圧濃縮し、再び1N塩酸水溶液2
0mlに溶解し室温に5時間放置する操作を2回繰り返
した後、濃縮した。残渣をエタノール12mlに溶解
し、エチルエーテル5mlを加えた。生成した結晶を濾
取、エタノール:エチルエーテル(2:1)混合溶媒に
て洗浄、乾燥し目的とするアミノ酸塩酸塩4.12gを
得た。濾液より濃縮、再結晶(エタノール:エチルエー
テル=1:1)を行ないさらに0.53gの目的物が得
られた。1,2番晶合わせた収率は93%であった。
5.50 g (29.4 mmol) of azide compound
l) To a solution of concentrated hydrochloric acid (3 ml) in methanol (120 ml) was added 10% palladium / carbon (700 mg) under a nitrogen atmosphere, and the mixture was replaced with hydrogen gas and stirred vigorously at room temperature for 14 hours. The filtrate from which the catalyst was removed by filtration was concentrated, dissolved in 20 ml of a 1N aqueous hydrochloric acid solution, and allowed to stand at room temperature for 24 hours. Then, the mixture was concentrated under reduced pressure on a water bath at 40 ° C.
The operation of dissolving in 0 ml and leaving at room temperature for 5 hours was repeated twice, and then concentrated. The residue was dissolved in ethanol (12 ml), and ethyl ether (5 ml) was added. The generated crystals were collected by filtration, washed with a mixed solvent of ethanol and ethyl ether (2: 1), and dried to obtain 4.12 g of the desired amino acid hydrochloride. The filtrate was concentrated and recrystallized (ethanol: ethyl ether = 1: 1) to obtain 0.53 g of the desired product. The combined yield of the first and second crystals was 93%.

【0050】1H−NMR(D2 O,500MHz)δ
2.74(2H,s,CH2 CD2),3.99(2
H,s,CH2 3 )。13 C−NMR(D2 O,125MHz,内部標準:ジオ
キサン)δ27.3.(pen, 1J(C,D)=2
0.0Hz),34.7,47.5,177.2,20
4.5。
1 H-NMR (D 2 O, 500 MHz) δ
2.74 (2H, s, CH 2 CD 2 ), 3.99 (2
H, s, CH 2 N 3 ). 13 C-NMR (D 2 O, 125 MHz, internal standard: dioxane) δ 27.3. (Pen, 1 J (C, D) = 2
0.0 Hz), 34.7, 47.5, 177.2, 20
4.5.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 FI C07C 247/04 C07C 247/04 C07D 303/40 C07D 303/40 C07F 7/18 C07F 7/18 N P T // C07M 5:00 ──────────────────────────────────────────────────の Continuation of the front page (51) Int.Cl. 6 Identification code FI C07C247 / 04 C07C247 / 04 C07D303 / 40 C07D303 / 40 C07F7 / 18 C07F7 / 18NPTT // C07M 5: 00

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 下記一般式(I) 【化1】 (式中、R1 はC1 〜C4 のアルキル基を表わし、R2
はアミノ基、アジド基、またはフタルイミド基を表わす
か、あるいはR2 はR3 と一緒になって単結合またはエ
ポキシ環を形成していてもよい。また、R3 は置換シリ
ル基で保護されていてもよい水酸基も表わす。R4 は水
素原子を表わすか、R3 と一緒になってオキソ基を表わ
す。)で表わされる重水素化エステル類化合物、もしく
はその塩、またはそれらの水和物もしくはそれらの溶媒
和物。
1. A compound represented by the following general formula (I) (In the formula, R 1 represents an alkyl group of C 1 ~C 4, R 2
Represents an amino group, an azido group, or a phthalimide group, or R 2 may form a single bond or an epoxy ring together with R 3 . R 3 also represents a hydroxyl group which may be protected by a substituted silyl group. R 4 represents a hydrogen atom or, together with R 3 , represents an oxo group. Or a salt thereof, or a hydrate or solvate thereof.
【請求項2】 上記一般式(I)で表わされる化合物を
重水存在下、脱炭酸することを特徴とする下記一般式
(II) 【化2】 (式中、R1 ,R2 ,R3 及びR4 は前記と同義を表わ
す。)で表わされる化合物の製造方法。
2. A compound represented by the following general formula (II), wherein the compound represented by the general formula (I) is decarboxylated in the presence of heavy water. (Wherein R 1 , R 2 , R 3 and R 4 have the same meanings as described above).
【請求項3】 一般式(II)中、R1 が水素原子、R2
がアミノ基、R3 とR4 が一緒になってオキソ基を表わ
すことを特徴とする請求項2記載の製造方法。
3. In the general formula (II), R 1 is a hydrogen atom, R 2
Represents an amino group, and R 3 and R 4 together represent an oxo group.
JP32569797A 1997-11-27 1997-11-27 Deuterated ester compound Pending JPH11158115A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32569797A JPH11158115A (en) 1997-11-27 1997-11-27 Deuterated ester compound

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32569797A JPH11158115A (en) 1997-11-27 1997-11-27 Deuterated ester compound

Publications (1)

Publication Number Publication Date
JPH11158115A true JPH11158115A (en) 1999-06-15

Family

ID=18179710

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32569797A Pending JPH11158115A (en) 1997-11-27 1997-11-27 Deuterated ester compound

Country Status (1)

Country Link
JP (1) JPH11158115A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111004076A (en) * 2019-12-16 2020-04-14 云南民族大学 Method for preparing deuterated amino acid ester by using deuterium source as deuterium source
CN114560763A (en) * 2022-03-07 2022-05-31 山东汉峰新材料科技有限公司 Production process of deuterated acetic acid

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111004076A (en) * 2019-12-16 2020-04-14 云南民族大学 Method for preparing deuterated amino acid ester by using deuterium source as deuterium source
CN114560763A (en) * 2022-03-07 2022-05-31 山东汉峰新材料科技有限公司 Production process of deuterated acetic acid
CN114560763B (en) * 2022-03-07 2024-02-20 山东汉峰新材料科技有限公司 Production process of deuterated acetic acid

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