JPH11156286A - Deposition method of cylindrical substrate - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obviate the occurrence of the infiltration of a coating liquid into a cylindrical substrate and the coating application defect by the leakage of internal air by making it possible to easily attach and detach caps for closing the bottom end opening of the cylindrical substrate and making the hermetic closure by these caps perfect in forming a photosensitive film, etc., on the sub strate surface by immersing the cylindrical substrate into a coating vessel. SOLUTION: This deposition method for the cylindrical substrate 11 consists in forming the film on the substrate surface by immersing the cylindrical substrate 11 closed at the top and bottom end openings by the caps into the coating vessel 26 filled with the coating liquid 27. The lower cap 13 closing the bottom end opening of the cylindrical substrate 11 in this method comprises a hard member 21 and an elastic member 23 arranged in at least the part of the hard member 21 where the bottom end of the cylindrical substrate 11 comes into contact. The bottom end of the cylindrical substrate 11 is butted against the elastic member 23 and the internal air is sucked out, by which the lower cap 13 is attracted to the bottom end of the cylindrical substrate 11.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming a film on the surface of a substrate by immersing a cylindrical substrate in a coating solution, and is applicable to, for example, film formation of an electrophotographic photosensitive member. Things.

[0002]

2. Description of the Related Art In general, electrophotographic photosensitive members widely used in copiers, laser printers, faxes, and the like include:
It is required that the photosensitive characteristics be good and that there be no image defects such as uneven density. For this reason, a technique for forming a photosensitive film with high accuracy and uniformity has been actively studied.

Conventionally, in manufacturing such an electrophotographic photosensitive member, a lid is placed on the upper end opening of a cylindrical substrate made of an alloy of aluminum or copper, plastic, or the like, and the closed substrate is closed in a substantially vertical direction. The photosensitive film was formed on the surface of the substrate by dipping in a coating tank filled with the coating solution, dipping for a predetermined time, and then pulling up from the coating tank. Although the coating liquid does not penetrate deep into the inside from the lower end of the cylindrical base due to the action of water pressure, the coating liquid adhering to the inner surface near the lower end forms a film, which causes poor mounting of the flange and poor grounding. Become. Therefore, a method has recently been known in which the lower end opening of the cylindrical substrate is also covered with a lid and then immersed in a coating tank (JP-A-3-11456).
9 and JP-A-1-47470). The former means, as shown in FIG. 3, fits the lids 2 and 3 at the upper and lower ends of the cylindrical base 1 and holds the upper end of the support rod 5 of the lower lid 3 with the chuck portion 4 of the upper lid 2. It was done. Thereby, the inside of the cylindrical substrate 1 can be sealed, and the intrusion of the coating liquid from the lower end opening is prevented. The latter means is shown in FIG.
As shown in the figure, the lower lid 3 is floated on the surface of the coating liquid 7 filled in the coating tank 6, and the lower end opening is positioned on the lower lid 3 when the cylindrical base 1 is immersed. It is a method of matching.

[0004]

However, in the above-mentioned conventional film forming means, in the former case, the cylindrical substrate 1
Since the lids 2 and 3 placed on the upper and lower ends of the upper lid 2 must be aligned and connected inside the base body, the upper lid 2
In the case where the chuck portion 4 and the tip of the support rod 5 of the lower lid 3 are misaligned, the connection between the two is not sufficient, and the coating liquid 7 is removed from the gap between the lower lid member 3 and the cylindrical base 1. In addition, there is a problem that the air may leak into the inside of the coating liquid 7 and bubbles may be generated near the lower end of the cylindrical substrate 1 to cause poor coating. In addition, the step of disconnecting the upper lid 2 and the lower lid 3 after being lifted from the coating tank 6 has been troublesome. On the other hand, in the latter case, since the upper and lower lids 2 and 3 do not need to be connected, the problem as in the former does not occur, but the center accuracy between the cylindrical base 1 and the lower lid 3 floating on the liquid surface is reduced. If the position is slightly deviated, there is a problem that the lower lid 3 does not completely seal the lower end opening, resulting in poor coating as in the above-described example.

Therefore, the present invention makes it possible to easily attach and detach a lid for closing the lower end opening of the cylindrical substrate, complete the sealing by the lid, and immerse the cylindrical substrate in a coating tank. In this case, it is an object of the present invention to prevent a coating liquid from penetrating into the inside of the cylindrical substrate and causing a coating defect due to leakage of internal air.

[0006]

In order to solve the above problems, a method of forming a cylindrical substrate according to claim 1 of the present invention comprises:
In a method for forming a cylindrical substrate, in which a cylindrical substrate whose upper and lower ends are closed by a lid is immersed in a coating tank filled with a coating liquid to form a film on the surface of the substrate, The lower lid closing the lower end opening is constituted by a hard member and an elastic member arranged at least in a portion of the hard member where the lower end of the cylindrical base comes into contact, and the lower end of the cylindrical base is abutted against the elastic member. The lower lid is attracted to the lower end of the cylindrical base by sucking out the internal air.

According to a second aspect of the present invention, there is provided a method of forming a film on a cylindrical substrate, wherein the lower member is formed of a high-molecular polyethylene and the elastic member is formed of a perfluoro rubber. Features.

[0008]

Embodiments of the present invention will be described below in detail with reference to the accompanying drawings. In the embodiment of the present invention shown in FIGS. 1 and 2, a film forming apparatus includes a cylindrical substrate 11 made of an alloy of aluminum or copper, and an upper lid 12 for closing the upper and lower openings. And a lower lid 13.

The upper lid 12 is composed of a disk portion 14 in contact with the upper end surface of the cylindrical base 11, and an insertion portion 15 protruding from the back side of the disk portion 14. The diameter of the insertion portion 15 is slightly smaller than the inner diameter of the cylindrical
Insertion section 1 until the lower surface of
5 is inserted into the cylindrical base 11, and the O-ring 16 fitted on the outer periphery of the insertion portion 15 is attached to the cylindrical base 1.
The upper end opening is closed in close contact with the inner wall surface 11a. An arm 17 of an automatic transfer device (not shown) is connected to the upper surface of the disk portion 14. Therefore, by lowering the arm 17 in the vertical direction, fitting the insertion portion 15 from the upper end opening of the cylindrical base 11, and pressing the O-ring 16 against the inner surface of the cylindrical base 11, the cylindrical base 11 is attached to the arm. 17 is suspended. In this embodiment, a flow path 18 is formed between the insertion portion 15 and the arm 17 through the disk portion 14, and the insertion portion 15 has a cylindrical base 11.
The arm 17 has an opening 19 connected to a vacuum pump (not shown) by an air hose.
Has been established.

On the other hand, as shown in FIGS. 1 and 2, the lower lid 13 is composed of a top-shaped hard member 21 having a substantially conical top and bottom, and a shelf provided along the outer periphery of a central portion thereof. 22
And the elastic member 23 placed on the second member. The outer dimension of the shelf 22 is substantially the same as the outer diameter of the lower end of the cylindrical base 11, and a cylindrical shape having substantially the same inner diameter of the lower end of the cylindrical base 11 above the shelf 22. Torso 2
4 are formed. Further, a conical inclined surface 25 is formed above the body 24, and when the lower lid 13 is attached to the lower end of the cylindrical base 11, the lower end of the cylindrical base 11 is formed on the inclined surface 25. It fits in the trunk 24 while being guided.

The hard member 21 of the lower cover 13 is required to have excellent solvent resistance to the solvent contained in the coating solution 27 filled in the coating tank 26. Further, since it is used repeatedly, it is required that the material is not easily deformed and has durability against the cleaning liquid. Further, a material having good surface accuracy is desirable so that the cleaning liquid does not remain on the surface after cleaning. For example, plastics such as Teflon and polypropylene, aluminum, stainless steel and the like can be used, and high molecular polyethylene is particularly preferable as satisfying the above properties. It is needless to say that the shape of the hard member 21 is not limited to the above.

On the other hand, the elastic member 23 is formed in a ring shape, and after being placed on the shelf 22 of the hard member 21,
It is adhesively fixed to the shelf 22. The elastic member 23 is appropriately elastically deformed when the lower end portion of the cylindrical base 11 is abutted, and is brought into close contact with the lower end portion to prevent liquid from entering. Therefore, like the hard member 21, the elastic member 23 is required to have excellent solvent resistance, and it is desirable that the elastic member 23 can maintain appropriate elastic performance for a long period of time. For example, a rubber material such as urethane rubber, perfluoro rubber, butadiene rubber, or a foamed material such as polyethylene or polypropylene can be used, and perfluoro rubber is particularly preferable. When using a foam material, adjust the expansion ratio or coat the surface with a thin film of Teflon,
Suitable flexibility and hardness can be imparted, and solvent resistance can be increased. In addition, by performing electron beam crosslinking using an electron beam or γ-ray at the time of foaming polymerization, solvent resistance and heat resistance can be improved. The components described above and the residual gas in the foaming material are not eluted into the coating solution 27, and the generation of bubbles can be suppressed.

Next, a film forming method will be specifically described. First, the arm 17 of the above-described automatic transfer device (not shown) is lowered vertically, the insertion portion 15 of the upper lid 12 is fitted into the upper end opening of the cylindrical base 11, and the O-ring 16 is attached to the cylindrical base 11. The upper end opening is closed by pressing against the inner wall surface 11a. Next, the arm 17 is moved while the cylindrical base 11 is suspended, and the cylindrical base 11 is positioned above the lower lid 13 positioned at a predetermined position. Next, the cylindrical base 11 is gradually lowered, and the lower end opening is fitted along the body 24 from above the lower lid 13. At this time, the cylindrical substrate 11 is inclined by the inclined surface 25 of the lower lid 13.
Is guided at the lower end. Then, the cylindrical substrate 11
Abut on the elastic member 23. Next, the vacuum pump is operated to suck out the air inside the cylindrical substrate 11,
The lower lid 13 is attracted to the lower end of the cylindrical substrate 11 by the suction force. The elastic member 23 is elastically contracted and slightly dented by this suction, and the elastic member 23 is brought into close contact with the lower end of the cylindrical base 11, whereby the lower end opening of the cylindrical base 11 can be completely sealed.

In this way, the cylindrical base body 11 whose lower end opening is closed moves to the next step while being suspended by the arm 17. In the next step, the cylindrical substrate 11 is moved onto the coating tank 26 filled with the coating liquid 27, and the cylindrical substrate 11 is directly lowered as shown in FIG. 1 to a predetermined depth in the coating tank 26. Immerse. During this time, the vacuum pump continues to operate, and the lower lid 13 is kept in close contact with the lower end opening of the cylindrical substrate 11. Therefore, the lower end opening of the cylindrical base 11 is securely sealed by the lower lid 13, so that the coating liquid 27 does not enter the inside through the lower end opening of the cylindrical base 11, and the inside has a negative pressure. Therefore, there is no fear that the internal air leaks from the lower end opening to generate bubbles. In addition, since the lower lid 13 is made independent of the upper lid 12, the cylindrical base 11 can be lowered straight down. When the cylindrical base 11 is pulled up after being immersed for a predetermined time, the cylindrical base 11 is removed. A photosensitive film having a uniform thickness is formed on the outer peripheral surface.

The cylindrical substrate 11 lifted from the coating tank 26 moves to the next step in a state of being suspended by the arm 17. In the process, the vacuum pump is stopped and the cylindrical substrate 1 is stopped.
Return the inside of 1 to normal pressure. As a result, the lower lid 13 is released from being adsorbed to the cylindrical base 11, detaches from the lower end opening of the cylindrical base 11, and falls to the spot. This lower lid 13
Is thoroughly cleaned by a cleaning device (not shown) so that the cleaning liquid does not remain on the surface, and is used again. The elastic member 23 is used several times until the elastic performance decreases, and is replaced with a new one. Although the upper lid 12 is removed from the cylindrical substrate 11 in the final step, it is needless to say that a series of film forming steps from mounting of the upper lid 12 to detachment can be performed by an automation line.

In the above embodiment, the case where a photosensitive film is provided as a film formed on the surface of the cylindrical substrate 11 has been described. However, the present invention is not limited to the formation of the photosensitive film, but may be an insulating film or a protective film. It can be applied to various film forming means such as formation of a film. In the above embodiment, the hard member 21 is provided with a shelf 23, and the shelf 23 is provided with a ring-shaped elastic member 2.
Although the case where 3 is arranged has been described, it goes without saying that the shape and arrangement of the elastic member 23 are not limited to those of the above-described embodiment.

[0017]

As described above, according to the method for forming a cylindrical substrate according to the present invention, the lower lid for closing the lower end opening of the cylindrical substrate has the above-described structure, and the elastic member is provided on the elastic member. The lower lid is abutted on the lower end of the cylindrical base by abutting the lower end of the cylindrical base to suck out the internal air, so that the lower lid can be easily attached and detached and replaced with an automated line. The lower end opening of the tubular base is reliably closed, so that the application liquid does not enter the inside of the tubular base and a coating failure due to leakage of internal air does not occur.

In the case where the lower lid is made of high-molecular polyethylene and perfluoro rubber, since the solvent resistance, non-deformability, and adhesion are particularly excellent, the tightness of the opening at the lower end of the cylindrical base is more reliable. And the durability of the lower lid is improved.

[Brief description of the drawings]

FIG. 1 is a sectional view showing an embodiment of a film forming method according to the present invention.

FIG. 2 is a perspective view showing a lower lid.

FIG. 3 is a cross-sectional view illustrating an example of a conventional film forming method.

FIG. 4 is a cross-sectional view showing another example of a conventional film forming method.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 11 Cylindrical base body 12 Upper lid 13 Lower lid 21 Hard member 23 Elastic member 26 Coating tank 27 Coating liquid

Continued on the front page (72) Inventor Yu Amemiya 1014 Miyaharacho, Kofu City, Yamanashi Prefecture

Claims (2)

[Claims] 1. A film forming method for a cylindrical substrate, wherein a cylindrical substrate whose upper and lower ends are closed by a lid is immersed in a coating tank filled with a coating liquid to form a film on the surface of the substrate. The lower lid closing the lower end opening of the cylindrical base is constituted by a hard member and an elastic member arranged at least in a portion of the hard member where the lower end of the cylindrical base comes into contact. A method for forming a film on a cylindrical base, wherein the lower end is abutted on the lower end of the cylindrical base by sucking internal air to suck the internal air. 2. The method according to claim 1, wherein the hard member of the lower lid is formed of high-molecular polyethylene, and the elastic member is formed of perfluoro rubber.