JPH11140204A - Formation of stainproof thin film - Google Patents
Formation of stainproof thin filmInfo
- Publication number
- JPH11140204A JPH11140204A JP9310261A JP31026197A JPH11140204A JP H11140204 A JPH11140204 A JP H11140204A JP 9310261 A JP9310261 A JP 9310261A JP 31026197 A JP31026197 A JP 31026197A JP H11140204 A JPH11140204 A JP H11140204A
- Authority
- JP
- Japan
- Prior art keywords
- impregnated carrier
- thin film
- forming
- shaped
- antifouling
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Laminated Bodies (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は偏光板等の光学部材
で防汚性を必要とする各種基材の表面に、防汚性薄膜を
形成する方法に関するものであり、特に連続成膜可能な
防汚性薄膜の形成方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming an antifouling thin film on the surface of various substrates requiring antifouling properties using an optical member such as a polarizing plate, and more particularly to a method for forming a continuous film. The present invention relates to a method for forming an antifouling thin film.
【０００２】[0002]
【従来の技術】従来より、レンズや偏光板等の反射防止
膜付き光学部材において、汗や指紋等による汚れが付着
し易く、一旦付着したこのような汚れを除去するため
に、特殊な布等で拭き取るなどの操作が知られている
が、完全に除去するには困難なものであった。2. Description of the Related Art Conventionally, in optical members having an antireflection film such as a lens and a polarizing plate, dirt due to sweat or fingerprints is apt to adhere. Operation such as wiping is known, but it was difficult to completely remove it.
【０００３】このような問題を解決する手段として、防
汚性あるいは撥水性のあるフルオロアルキルシランの薄
膜を光学部材の表面に形成する方法が提案されている。
例えば、特開平５−２１５９０５号公報では、フルオロ
アルキルシラザン等を金属粉末の焼結フィルターに含浸
させた蒸発源を用いる真空蒸着方法としたものであり、
また、特開平８−１４３３３２号公報では、フルオロア
ルメキルシラザンをスチールウールに含浸させた蒸発源
を用いる真空蒸着方法としたものが開示されている。As a means for solving such a problem, there has been proposed a method of forming an antifouling or water repellent fluoroalkylsilane thin film on the surface of an optical member.
For example, JP-A-5-215905 discloses a vacuum deposition method using an evaporation source in which a sintered filter of a metal powder is impregnated with a fluoroalkylsilazane or the like,
Further, Japanese Patent Application Laid-Open No. 8-143332 discloses a vacuum evaporation method using an evaporation source obtained by impregnating steel wool with fluoroalkylmethylsilazane.
【０００４】また、特開平６−１２２７７８号公報で
は、プラズマＣＶＤ（Ｃｈｅｍｉｃａｌ Ｖａｐｏｒ
Ｄｅｐｏｓｉｔｉｏｎ）法を用いてフルオロアルキルシ
ランの撥水性薄膜を形成する方法としたものが開示され
ている。Japanese Patent Application Laid-Open No. Hei 6-122778 discloses a plasma CVD (Chemical Vapor).
A method of forming a water-repellent thin film of fluoroalkylsilane using a deposition method is disclosed.
【０００５】[0005]
【発明が解決しようとする課題】しかしながら、上記特
開平５−２１５９０５号公報、特開平８−１４３３３２
号公報に開示されている方法では、メガネレンズ等の被
処理基材にバッチ処理で防汚性薄膜を形成するために開
発された方法であって、被処理基材としてポリエステル
フィルムやポリアセチルセルロースフィルム等のロール
状のフィルムを用いた巻き取り方式で連続処理を行った
としても、蒸着源のセットや調整に煩雑さがあるため、
蒸発量の安定性、制御性および処理の作業性が悪いとい
う問題があった。特に、被処理基材が反射防止膜付きの
光学部材である場合、薄膜の厚みムラは光学特性ムラの
原因となるため、致命的問題であった。However, Japanese Patent Application Laid-Open Nos. Hei 5-215905 and Hei 8-143332 disclose the above problems.
Is a method developed for forming an antifouling thin film by batch processing on a substrate to be treated such as an eyeglass lens, and a polyester film or polyacetyl cellulose is used as the substrate to be treated. Even if continuous processing is performed by a winding method using a roll-shaped film such as a film, since setting and adjusting the deposition source is complicated,
There is a problem that the stability, controllability and workability of the evaporation amount are poor. In particular, when the substrate to be processed is an optical member having an antireflection film, the unevenness in the thickness of the thin film causes unevenness in the optical characteristics, which is a fatal problem.
【０００６】また、上記特開平６−１２２７７８号公報
に開示されている方法では、巻き取り方式で連続処理も
可能であるが、メガネレンズ等の水やけ防止を目的に提
案された撥水性薄膜であるため、防汚性が不十分なもの
であった。すなわち、防汚性の優れた材料は概して、分
子量が大きく、蒸気圧が低く、反応性が高くなる傾向に
あるが、上記のＣＶＤ法ではこのような材料の薄膜化は
不向きであって、上記提案の材料にも防汚性の点で問題
があった。In the method disclosed in JP-A-6-122778, continuous processing can be performed by a winding method. However, a water-repellent thin film proposed for the purpose of preventing drainage of eyeglass lenses and the like is proposed. Therefore, the antifouling property was insufficient. That is, materials having excellent antifouling properties generally have a large molecular weight, a low vapor pressure, and a tendency to have high reactivity. However, in the above-mentioned CVD method, thinning of such a material is not suitable. The proposed material also had problems with antifouling properties.
【０００７】本発明は、かかる従来技術の問題点を解決
するものであり、その課題とするところは、偏光板等の
光学部材の防汚性薄膜の形成において、より優れた防汚
性薄膜を安定的にムラがなく、連続的に形成でき、その
薄膜形成の制御性および蒸発源の調整やセット等の作業
性に優れた簡便な防汚性薄膜の形成方法を提供すること
にある。The present invention has been made to solve the above-mentioned problems of the prior art, and an object thereof is to provide a more excellent antifouling thin film in forming an antifouling thin film of an optical member such as a polarizing plate. An object of the present invention is to provide a simple method of forming an antifouling thin film which can be formed stably without unevenness and which is excellent in workability such as controllability of thin film formation and adjustment and setting of an evaporation source.
【０００８】[0008]
【課題を解決するための手段】本発明に於いて上記課題
を達成するために、まず請求項１の発明では、真空蒸着
法によって被処理基材の表面に防汚性薄膜を形成する方
法であって、織物状の含浸担体に浸したフルオロアルキ
ルシラン等の防汚性材料をランプヒ−タ−による放射加
熱もしくはヒートローラーによる接触加熱により蒸発さ
せることを特徴とする防汚性薄膜の形成方法としたもの
である。Means for Solving the Problems In order to achieve the above object in the present invention, first, according to the first aspect of the present invention, a method for forming an antifouling thin film on the surface of a substrate to be treated by a vacuum deposition method is provided. A method of forming an antifouling thin film, comprising evaporating an antifouling material such as fluoroalkylsilane soaked in a woven impregnated carrier by radiant heating with a lamp heater or contact heating with a heat roller. It was done.
【０００９】また、請求項２の発明では、前記織物状の
含浸担体がロ−ル状であって、そのロール状含浸担体を
連続巻き取り式送り装置により送り、連続的に蒸発させ
ることを特徴とする防汚性薄膜の形成方法としたもので
ある。In the invention according to claim 2, the woven impregnated carrier is roll-shaped, and the roll-shaped impregnated carrier is fed by a continuous winding type feeder, and is continuously evaporated. And a method for forming an antifouling thin film.
【００１０】また、請求項３の発明では、前記織物状の
含浸担体がグラスファイバ−からなることを特徴とする
防汚性薄膜の形成方法としたものである。In a third aspect of the present invention, there is provided a method for forming an antifouling thin film, wherein the woven impregnated carrier comprises glass fiber.
【００１１】また、請求項４の発明では、前記織物状の
含浸担体がカ−ボンファイバ−からなることを特徴とす
る防汚性薄膜の形成方法としたものである。Further, the invention according to claim 4 is a method for forming an antifouling thin film, wherein the woven impregnated carrier is made of carbon fiber.
【００１２】また、請求項５の発明では、前記織物状の
含浸担体がアルミナファイバ−からなることを特徴とす
る防汚性薄膜の形成方法としたものである。Further, in the invention of claim 5, there is provided a method for forming an antifouling thin film, wherein the woven impregnated carrier is made of alumina fiber.
【００１３】また、請求項６の発明では、真空蒸着法に
よって被処理基材の表面に防汚性薄膜を形成する方法で
あって、セラミックス多孔性形成体からなる含浸担体に
浸したフルオロアルキルシラン等の防汚性材料を、ラン
プヒ−タ−による照射加熱により蒸発させることを特徴
とする防汚性薄膜の形成方法。According to a sixth aspect of the present invention, there is provided a method for forming an antifouling thin film on the surface of a substrate to be treated by a vacuum deposition method, wherein the fluoroalkylsilane is immersed in an impregnated carrier comprising a ceramic porous body. A method for forming an antifouling thin film, wherein the antifouling material is evaporated by irradiation with a lamp heater.
【００１４】また、請求項７の発明では、前記セラミッ
クス多孔性形成体からなる含浸担体が、板状含浸担体、
または裏面に金属製板を備えた板状含浸担体であって、
該板状含浸担体の表面から照射加熱してなることを特徴
とする防汚性薄膜の形成方法としたものである。Further, in the invention according to claim 7, the impregnated carrier comprising the ceramic porous body is a plate-shaped impregnated carrier,
Or a plate-shaped impregnated carrier with a metal plate on the back surface,
A method for forming an antifouling thin film, characterized in that the surface of the plate-shaped impregnated carrier is irradiated and heated.
【００１５】さらにまた、請求項８の発明では、前記セ
ラミックス多孔性形成体からなる含浸担体が、ペレット
状含浸担体もしくは塊状含浸担体もしくは粉状含浸担
体、または裏面に多数個穿設された金属製板を備えたペ
レット状もしくは塊状含浸担体であって、該ペレット状
もしくは塊状もしくは粉状含浸担体の裏面から照射加熱
してなることを特徴とする防汚性薄膜の形成方法とした
ものである。Further, according to the invention of claim 8, the impregnated carrier comprising the ceramic porous formed body is a pellet-shaped impregnated carrier, a massive impregnated carrier, or a powdered impregnated carrier, or a metal impregnated on the back surface. A method for forming an antifouling thin film, comprising a pellet-shaped or massive impregnated carrier provided with a plate, and irradiation and heating from the back surface of the pellet-shaped, massive or powdery impregnated carrier.
【００１６】ここで、上記フルオロアルキルシラン等の
防汚性材料とは、真空蒸着法に適用できる材料で、分子
量が大きく、蒸気圧が低く、反応性が高い材料あるいは
多元系の材料との混合物であり、発明者らの鋭意検討を
重ねた結果、非常に防汚性の優れた材料であることを見
いだしたもので、具体的には、フルオロアルキルシラ
ン、フルオロアルキルシラザンあるいはこれらの混合系
材料である。Here, the antifouling material such as the fluoroalkylsilane is a material which can be applied to a vacuum deposition method, and has a high molecular weight, a low vapor pressure, a high reactivity, or a mixture with a multi-component material. As a result of intensive studies by the inventors, they have found that the material is extremely excellent in antifouling properties. Specifically, fluoroalkylsilane, fluoroalkylsilazane or a mixed material thereof is used. It is.
【００１７】[0017]
【発明の実施の形態】以下本発明の実施の形態を説明す
る。本発明の防汚性薄膜の形成方法は、図１に示すよう
に、巻き取り式真空蒸着装置（１００）によって被処理
基材（１０）の表面に防汚性薄膜を形成する方法であっ
て、織物状の含浸担体（２０）に浸したフルオロアルキ
ルシラン等の防汚性材料をランプヒ−タ−（３０）によ
る放射加熱もしくは図２に示すヒートローラー（４０）
による接触加熱により蒸発させるものであり、前記織物
状の含浸担体（２０）がロ−ル状であって、そのロール
状含浸担体（２０ａ）を連続巻き取り式送り装置（１１
０）により、連続的に蒸発させることを特徴とする防汚
性薄膜の形成方法としたものである。Embodiments of the present invention will be described below. As shown in FIG. 1, the method for forming an antifouling thin film of the present invention is a method of forming an antifouling thin film on the surface of a substrate (10) to be processed by a roll-up type vacuum evaporation apparatus (100). A radiant heating of an antifouling material such as fluoroalkylsilane impregnated in a woven impregnated carrier (20) by a lamp heater (30) or a heat roller (40) shown in FIG.
The woven impregnated carrier (20) is rolled, and the roll-shaped impregnated carrier (20a) is continuously wound and fed by a continuous winding device (11).
0), a method for forming an antifouling thin film characterized by continuous evaporation.
【００１８】また、前記織物状の含浸担体（２０）が、
グラスファイバー、カーボンファイバーまたはアルミナ
ファイバーからなるものである。Further, the woven impregnated carrier (20) is
It is made of glass fiber, carbon fiber or alumina fiber.
【００１９】以上のような本発明の防汚性薄膜の形成方
法によれば、巻き取り式真空蒸着装置（１００）内の被
処理基材（１０）であるフィルムの走行速度とロール状
含浸担体（２０ａ）の送り速度の調整だけで、単分子あ
るいは数分子層程度の防汚性薄膜（１）を安定してムラ
なく形成することができ、織物状の含浸担体（２０）を
ロール状含浸担体（２０ａ）とし、連続巻き取り式送り
装置（１１０）で連続的に蒸発させることによって、１
万ｍ以上の被処理基材（１０）であるロールフィルムの
連続処理が容易に可能となり、かつロール状含浸担体
（２０ａ）の調整やセットを簡単にすることができるも
のである。According to the method for forming an antifouling thin film of the present invention as described above, the running speed of the film as the substrate to be treated (10) in the take-up type vacuum evaporation apparatus (100) and the roll-shaped impregnated carrier By simply adjusting the feed rate in (20a), a single-molecule or several-molecule-layer antifouling thin film (1) can be formed stably and uniformly, and the woven impregnated carrier (20) is impregnated in roll form. The carrier (20a) is continuously evaporated by a continuous winding type feeder (110), whereby 1
This makes it possible to easily carry out continuous processing of a roll film as a substrate (10) to be treated having a length of 10,000 m or more, and to simplify adjustment and setting of the roll-shaped impregnated carrier (20a).
【００２０】また、本発明のもう一つの防汚性薄膜の形
成方法は、図３に示すように、巻き取り式真空蒸着装置
（１００）によって被処理基材（１０）の表面に防汚性
薄膜（１）を形成する方法であって、セラミックス多孔
性形成体からなる含浸担体（２４）に浸したフルオロア
ルキルシラン等の防汚性材料を、ランプヒ−タ−（３
０）による照射加熱により蒸発させるものであり、前記
セラミックス多孔性形成体からなる含浸担体（２４）
が、図４（ａ）に示すように、板状含浸担体（２４ａ）
であって、または、図４（ｂ）に示すように、裏面に金
属板（２４ｃ）を備えた板状含浸担体（２４ａ）であっ
て、これら板状含浸担体（２４ａ）の表面からランプヒ
−タ−（３０）による照射加熱してなることを特徴とす
る防汚性薄膜の形成方法としたものである。As shown in FIG. 3, another method for forming an antifouling thin film according to the present invention uses a roll-up type vacuum evaporator (100) to coat the surface of the substrate (10) with antifouling properties. A method for forming a thin film (1), wherein an antifouling material such as fluoroalkylsilane soaked in an impregnated carrier (24) made of a ceramic porous body is coated with a lamp heater (3).
(2) an impregnated carrier (24), which is evaporated by irradiation heating according to (0), and is made of the ceramic porous body.
However, as shown in FIG. 4 (a), the plate-shaped impregnated carrier (24a)
Alternatively, as shown in FIG. 4B, a plate-like impregnated carrier (24a) provided with a metal plate (24c) on the back surface, and A method for forming an antifouling thin film, characterized in that the film is heated by irradiation with a tar (30).
【００２１】また、前記セラミックス多孔性形成体から
なる含浸担体（２４）が、図５（ａ）に示すように、ペ
レット状含浸担体（２４ｂ）もしくは図６（ａ）に示す
ように、塊状含浸担体（２４ｅ）もしくは図７に示すよ
うに、粉状含浸担体（２４ｆ）であって、または図５
（ｂ）に示すように、裏面に多数個穿設された金属板
（２４ｄ）を備えたペレット状含浸担体（２４ｂ）もし
くは図６（ｂ）に示すように、塊状含浸担体（２４ｅ）
であって、それらペレット状含浸担体（２４ｂ）もしく
は塊状含浸担体（２４ｅ）もしくは粉状含浸担体（２４
ｆ）の裏面からランプヒ−タ−（３０）による照射加熱
してなることを特徴とする防汚性薄膜（１）の形成方法
としたものである。The impregnated carrier (24) made of the porous ceramic body may be a pellet impregnated carrier (24b) as shown in FIG. 5 (a) or a bulk impregnated carrier (24b) as shown in FIG. 6 (a). Carrier (24e) or a powdered impregnated carrier (24f) as shown in FIG.
As shown in FIG. 6B, a pellet-shaped impregnated carrier (24b) provided with a plurality of metal plates (24d) perforated on the back surface, or a massive impregnated carrier (24e) as shown in FIG. 6B.
The pellet-shaped impregnated carrier (24b), the bulk impregnated carrier (24e), or the powdered impregnated carrier (24b).
The method for forming an antifouling thin film (1) is characterized in that the rear surface of (f) is heated by irradiation with a lamp heater (30).
【００２２】以上のような本発明のもう一つの防汚性薄
膜の形成方法によれば、巻き取り式真空蒸着装置（１０
０）内の被処理基材（１０）であるフィルムの走行速度
の調整だけで、単分子あるいは数分子層程度の防汚性薄
膜を安定してムラなく形成することができ、セラミック
ス多孔性形成体からなる含浸担体（２４）の上記形状と
長さを調整することによって、５００ｍから数千ｍの被
処理基材（１０）であるロールフィルムの連続処理が容
易に可能となり、かつセラミックス多孔性形成体からな
る含浸担体（２４）の調整やセットを簡単にすることが
できるものである。According to another method for forming an antifouling thin film of the present invention as described above, a take-up type vacuum evaporation apparatus (10
Only by adjusting the running speed of the film as the substrate (10) in (0), a single-molecule or several-molecule-layer antifouling thin film can be formed stably and without unevenness, and the porous ceramics can be formed. By adjusting the shape and length of the impregnated carrier (24) made of a body, continuous processing of a roll film, which is a substrate (10) to be processed, having a length of 500 m to several thousand m can be easily performed, and the ceramic porous material can be easily treated. The adjustment and setting of the impregnated carrier (24) composed of the formed body can be simplified.
【００２３】ここで上記各含浸担体（２０、２４）に浸
した非常に防汚性に優れた防汚性材料として、上述のよ
うに、真空蒸着法に適用できる材料で、分子量が大き
く、蒸気圧が低く、反応性が高い材料あるいは多元系の
材料との混合物であり、具体的には、フルオロアルキル
シラン、フルオロアルキルシラザンあるいはこれらの混
合系材料である。Here, as an antifouling material having a very excellent antifouling property immersed in each of the impregnated carriers (20, 24), as described above, a material which can be applied to a vacuum deposition method and has a large molecular weight, It is a mixture with a material having a low pressure and a high reactivity or a multi-component material, specifically, a fluoroalkylsilane, a fluoroalkylsilazane or a mixed material thereof.
【００２４】さらに具体的には、一般式More specifically, the general formula
【００２５】［化１］Ｒｆ−ＯＨ （式中Ｒｆは、数平均分子量５００〜１０，０００のフ
ッ素を有する置換基を表す）で表されるフッ素系材料あ
るいは、一般式A fluorine-based material represented by Rf-OH (wherein Rf represents a substituent having fluorine having a number average molecular weight of 500 to 10,000) or a general formula:
【００２６】［化２］ ＣＦ3（ＣＦ2）n（ＣＨ2）mＳｉ（ＮＨ）1.5 （ｎは正の整数、ｍは０以上の整数、Ａは加水分解可能
な置換基を表す。）で表されるフルオロアルキルシラザ
ンあるいは上記材料との混合物である。[0026] represents the reduction 2] CF 3 (CF 2) n (CH2) m Si (NH) 1. 5 (n is a positive integer, m is an integer of 0 or more, A is hydrolyzable substituent. ) Or a mixture with the above materials.
【００２７】これら防汚性材料をメタキシレンヘキサフ
ロライドなどのフッ素系溶媒で０．１から３０重量％に
希釈し、グラスファイバ−、カ−ボンファイバ−、アル
ミナファイバ−等からなる織物状の含浸担体（２０）ま
たは硫酸カルシウム、カルシア、シリカ、マグネシア、
アルミナあるいはそれら材料との混合物等のセラミック
ス粉末を焼成した多孔性形成体からなる含浸担体（２
４）に含浸後乾燥させ、それぞれの蒸着用含浸担体とす
る。These antifouling materials are diluted to 0.1 to 30% by weight with a fluorinated solvent such as meta-xylene hexafluoride to form a woven fabric made of glass fiber, carbon fiber, alumina fiber or the like. Impregnated carrier (20) or calcium sulfate, calcia, silica, magnesia,
An impregnated carrier (2) consisting of a porous formed body obtained by firing ceramic powder such as alumina or a mixture thereof.
4) After being impregnated and dried, each impregnated carrier for vapor deposition is obtained.
【００２８】ここで上記セラミックス多孔性形成体から
なる含浸担体（２４）について詳述する。セラミックス
の焼成形状には、板状、ペレット状、塊状、粉状等が考
えられる。照射加熱方法によらず材料の蒸発方向には指
向性がないので、被処理基材（１０）側に蒸発する効率
をよくするためには、形状と加熱方法のマッチングが必
要である。本発明のランプヒ−タ−（３０）による照射
加熱では、図４（ａ）に示すマクロ的隙間の無い板状含
浸担体（２４ａ）の場合は、表面（被処理基材（１０）
側）からのランプヒ−タ−（３０）による照射加熱が適
している。また図４（ｂ）に示すこの板状含浸担体（２
４ａ）の下面に金属製板（２４ｃ）を設けることで一旦
裏面に蒸発した材料を表面に再蒸発させることができる
ので、より材料使用効率がよくなるものである。また、
ペレット状含浸担体（２４ｂ）や塊状含浸担体（２４
ｅ）や粉状含浸担体（２４ｆ）の場合、表面照射でもよ
いが、図５（ａ）および図６（ａ）および図７に示すよ
うに、裏面（被処理基材（１０）と反対側）照射がより
良い成膜を可能にする。また、図５（ｂ）および図６
（ｂ）に示すように、このペレット状含浸担体（２４
ｂ）や塊状含浸担体（２４ｅ）の下面に多数穿設された
金属製板（２４ｄ）を設けることで前記板状含浸担体
（２４ａ）同様に一旦裏面に蒸発した材料を表面に再蒸
発させることができるので、より材料使用効率よくなる
ものである。Here, the impregnated carrier (24) composed of the ceramic porous body will be described in detail. As the firing shape of the ceramic, a plate shape, a pellet shape, a lump shape, a powder shape, and the like can be considered. Regardless of the irradiation heating method, there is no directivity in the evaporation direction of the material, so that the shape and the heating method need to be matched in order to improve the efficiency of evaporation toward the substrate to be processed (10). In the irradiation heating by the lamp heater (30) of the present invention, in the case of the plate-shaped impregnated carrier (24a) having no macro gap shown in FIG.
Irradiation heating by a lamp heater (30) from the side) is suitable. Further, this plate-shaped impregnated carrier (2) shown in FIG.
By providing the metal plate (24c) on the lower surface of 4a), the material once evaporated on the back surface can be re-evaporated on the front surface, so that the material use efficiency is further improved. Also,
Pellet impregnated carriers (24b) and bulk impregnated carriers (24
e) or the powdery impregnated carrier (24f), the surface may be irradiated, but as shown in FIGS. 5 (a), 6 (a) and 7, the back surface (the side opposite to the substrate (10) to be treated) ) Irradiation allows better film formation. FIG. 5B and FIG.
As shown in (b), this pellet-shaped impregnated carrier (24
b) By providing a plurality of perforated metal plates (24d) on the lower surface of the bulk impregnated carrier (24e), the material once evaporated on the back surface is re-evaporated to the front surface similarly to the plate-shaped impregnated carrier (24a). Therefore, material use efficiency can be improved.
【００２９】被処理基材（１０）としての光学部材に
は、例えば、液晶ディスプレー用の偏光板あるいは偏光
板貼り付け用反射防止フィルムやテレビモニタ−貼り付
け用反射防止フィルムがあり、いずれの場合でも真空蒸
着やスパッタリング法などのドライコ−トあるいはディ
ップコ−トやスピンコ−トなどのウェットコ−トなどに
よって、ハ−ドコ−ト付きのポリエステルフィルムやト
リアセチルセルロ−スフィルム等のロ−ルフィルム上
に、反射防止膜を積層したものを用いる。この反射防止
膜はＭｇＦ2、ＬｉＦ2、ＴｈＦ4、ＳｉＯ、ＳｉＯ2、Ｚ
ｒＯ2、ＣｅＯ2、Ａｌ2Ｏ3、ＴｉＯ2、Ｔａ2Ｏ5などの
フッ化物、酸化物を単層で、あるいは積層したものを用
いる。The optical member as the substrate to be treated (10) includes, for example, a polarizing plate for a liquid crystal display, an antireflection film for attaching a polarizing plate, and an antireflection film for attaching a television monitor. However, by dry coating such as vacuum evaporation or sputtering, or wet coating such as dip coating or spin coating, a roll film such as a polyester film with a hard coat or a triacetyl cellulose film is formed. And an anti-reflection film are laminated. This antireflection film is made of MgF 2 , LiF 2 , ThF 4 , SiO, SiO 2 , Z
A single layer or a stack of fluorides and oxides such as rO 2 , CeO 2 , Al 2 O 3 , TiO 2 , and Ta 2 O 5 is used.
【００３０】これら上述の被処理基材（１０）と蒸着用
含浸担体（２０、２４）を巻き取り式真空蒸着装置（１
００）にセットし、１Ｅ−４Ｔｏｒｒ以下に真空排気し
て後、この蒸着用含浸担体（織物状の含浸担体（２０）
の場合）を適当な速度で送り込みながら、特定の一部分
を１５０℃〜５００℃、好ましくは２００℃から４００
℃に加熱し含浸された材料を蒸発させる。加熱方法とし
て、両者の蒸着用含浸担体（２０、２４）ではランプヒ
−タ−（３０）加熱が適用され、織物状の含浸担体（２
０）には、図２に示すようにヒートローラー（４０）に
よる接触加熱を用いることもできる。The above-mentioned substrate to be treated (10) and the impregnated carriers for vapor deposition (20, 24) are wound up by a vacuum type vapor deposition apparatus (1).
00) and evacuated to 1E-4 Torr or less, and then the impregnated carrier for vapor deposition (woven impregnated carrier (20))
) At a suitable speed while feeding a specific portion from 150 ° C to 500 ° C, preferably from 200 ° C to 400 ° C.
Heat to ℃ to evaporate the impregnated material. As a heating method, heating of a lamp heater (30) is applied to both the impregnated carriers for vapor deposition (20, 24), and the impregnated carrier (2,
For 0), contact heating by a heat roller (40) can be used as shown in FIG.
【００３１】[0031]
【実施例】次に本発明を実施例により、さらに具体的に
説明する。 〈実施例１〉前記化２で表されるフルオロアルキルシラ
ザンをメタキシレンヘキサフロライドで３重量％に希釈
した溶液（信越化学工業製：ＫＰ８０１Ｍ）を、幅５０
ｍｍ・厚さ１ｍｍ・長さ１ｍのグラスファイバ−からな
る織物（日東紡製スライバ−クロスＷＳ８５０Ｓ１０
０）に含浸、乾燥させて蒸着用ロール状含浸担体（２０
ａ）を得た。Next, the present invention will be described more specifically with reference to examples. <Example 1> A solution prepared by diluting a fluoroalkylsilazane represented by the above formula (2) to 3% by weight with meta-xylene hexafluoride (KP801M manufactured by Shin-Etsu Chemical Co., Ltd.) was applied to a solution having a width of 50%.
mm / thickness 1 mm / length 1 m glass fiber fabric (Nittobo Sliver Cloth WS850S10
0) and dried to obtain a roll-shaped impregnated carrier for vapor deposition (20).
a) was obtained.
【００３２】また、被処理基材（１０）として、幅５０
０ｍｍ・厚さ８０ミクロン・長さ５００ｍのトリアセチ
ルセルロ−スフィルム上にハ−ドコ−ト層と反射防止膜
を積層したものを用いて、図１に示すように、巻き取り
式真空蒸着装置（１００）内の巻き出しロール（１
２）、蒸着ロール（１６）および巻き取りロール（１
４）に装填した。The substrate (10) to be treated has a width of 50
As shown in FIG. 1, a roll-up type vacuum vapor deposition apparatus was used in which a hard coat layer and an antireflection film were laminated on a triacetyl cellulose film having a thickness of 0 mm, a thickness of 80 microns and a length of 500 m. The unwinding roll (1) in (100)
2), evaporation roll (16) and take-up roll (1)
4).
【００３３】さらに、図１に示すように、巻き取り式真
空蒸着装置（１００）内に上記で得られた蒸着用ロール
状含浸担体（２０ａ）をセットし、１Ｅ−４Ｔｏｒｒ以
下に真空排気して後、このロール状含浸担体（２０ａ）
を巻き取り式送り装置（１１０）を介して５ｍｍ／ｍｉ
ｎで送り込みながら、蒸着用織物状の含浸担体（２０）
にスポット状に集光できるランプヒ−タ−（３０）（ウ
シオ電機製IHU-A03-01500W）で照射加熱し、蒸発させ
た。この時の蒸着用含浸担体（２０）の表面温度は３５
０℃で、被処理基材（１０）であるフィルムの走行速度
は５ｍ／ｍｉｎであった。Further, as shown in FIG. 1, the roll-shaped impregnated carrier for vapor deposition (20a) obtained above was set in a take-up type vacuum vapor deposition apparatus (100), and evacuated to 1E-4 Torr or less. Thereafter, the roll-shaped impregnated carrier (20a)
5 mm / mi through a take-up feeder (110)
n, a woven impregnated carrier for vapor deposition (20)
Irradiated and heated with a lamp heater (30) (IHU-A03-01500W manufactured by Ushio Inc.), which was capable of condensing light into a spot, and evaporated. At this time, the surface temperature of the impregnated carrier (20) for vapor deposition was 35.
At 0 ° C., the running speed of the film as the substrate to be treated (10) was 5 m / min.
【００３４】この結果、水の接触角で１１０度から１１
１度の均一な防汚性薄膜（１）が形成された。また防汚
性薄膜（１）の形成前後における分光特性の変化は無
く、幅方向・長さ方向の色ムラはみられず良好であっ
た。As a result, the contact angle of water from 110 degrees to 11
One uniform antifouling thin film (1) was formed. Also, there was no change in the spectral characteristics before and after the formation of the antifouling thin film (1), and no color unevenness was observed in the width direction and the length direction, which was favorable.
【００３５】〈実施例２〉実施例１同様に調整した蒸着
用ロール状含浸担体（２０ａ）と被処理基材（１０）を
用いて、図２に示すように、巻き取り式真空蒸着装置
（１００）内にセットし、１Ｅ−４Ｔｏｒｒ以下に真空
排気して後、この織物状の含浸担体（２０）を３５０℃
に温度制御されたヒートローラー（４０）上を接触させ
ながら５ｍｍ／ｍｉｎで通過させ、蒸発させた。被処理
基材（１０）であるフィルムの走行速度は５ｍ／ｍｉｎ
であった。Example 2 Using a roll-shaped impregnated carrier for vapor deposition (20a) and a substrate to be treated (10) adjusted in the same manner as in Example 1, as shown in FIG. 100) and evacuated to 1E-4 Torr or less, and then the woven impregnated carrier (20) is heated to 350 ° C.
The solution was passed at 5 mm / min while being in contact with a heat roller (40) whose temperature was controlled, and evaporated. The traveling speed of the film as the substrate to be treated (10) is 5 m / min.
Met.
【００３６】この結果、水の接触角で１１０度から１１
１度の均一な防汚性薄膜が形成された。また防汚性薄膜
（１）の形成前後における分光特性の変化は無く、幅方
向・長さ方向の色ムラはみられず良好であった。As a result, the contact angle of water from 110 degrees to 11
One uniform antifouling thin film was formed. Also, there was no change in the spectral characteristics before and after the formation of the antifouling thin film (1), and no color unevenness was observed in the width direction and the length direction, which was favorable.
【００３７】〈実施例３〉上記化１と化２で表されるフ
ルオロアルキルシラザンを１：１の比率で混合し、メタ
キシレンヘキサフロライドで６重量％に希釈した混合溶
液を用いて、実施例１と同様の蒸着用ロール状含浸担体
（２０ａ）を用意した。Example 3 A fluoroalkylsilazane represented by the above formulas 1 and 2 was mixed at a ratio of 1: 1 and diluted with meta-xylene hexafluoride to 6% by weight. A roll-like impregnated carrier for vapor deposition (20a) similar to that in Example 1 was prepared.
【００３８】図１に示すように、巻き取り式真空蒸着装
置（１００）内に、実施例１で用意された被処理基材
（１０）と上記で得られた蒸着用ロール状含浸担体（２
０ａ）をセットし、１Ｅ−４Ｔｏｒｒ以下に真空排気し
て後、このロール状含浸担体（２０ａ）を巻き取り式送
り装置（１１０）を介して５ｍｍ／ｍｉｎで送り込みな
がら、実施例１と同様のランプヒ−タ−（３０）で照射
加熱し、蒸発させた。この時の蒸着用織物状の含浸担体
（２０）の表面温度は３５０℃で、被処理基材（１０）
であるフィルムの走行速度は５ｍ／ｍｉｎであった。As shown in FIG. 1, the substrate (10) to be treated prepared in Example 1 and the roll-shaped impregnated carrier (2) for vapor deposition obtained above were placed in a take-up type vacuum vapor deposition device (100).
0a) was set and evacuated to 1E-4 Torr or less, and then the roll-shaped impregnated carrier (20a) was fed at a rate of 5 mm / min through a wind-up type feeder (110). Irradiation heating was carried out with a lamp heater (30) to evaporate. At this time, the surface temperature of the woven impregnated carrier for vapor deposition (20) is 350 ° C.
Was 5 m / min.
【００３９】この結果、水の接触角で１０５度から１１
０度の均一な防汚性薄膜（１）が形成された。また防汚
性薄膜（１）の形成前後における分光特性の変化は無
く、幅方向・長さ方向の色ムラはみられず良好であっ
た。As a result, the contact angle of water from 105 degrees to 11
A uniform antifouling thin film (1) of 0 ° was formed. Also, there was no change in the spectral characteristics before and after the formation of the antifouling thin film (1), and no color unevenness was observed in the width direction and the length direction, which was favorable.
【００４０】〈実施例４〉実施例３と同様の混合溶液
を、幅５０ｍｍ・厚さ１ｍｍ・長さ１ｍのカ−ボンファ
イバ−からなる織物状の含浸担体（２０）に含浸、乾燥
させて蒸着用ロール状含浸担体（２０ａ）を得た。Example 4 The same mixed solution as in Example 3 was impregnated into a woven impregnated carrier (20) made of carbon fiber having a width of 50 mm, a thickness of 1 mm and a length of 1 m, and dried. A roll-shaped impregnated carrier (20a) for vapor deposition was obtained.
【００４１】図１に示すように、巻き取り式真空蒸着装
置（１００）内に、この蒸着用ロール状含浸担体（２０
ａ）と実施例１同様の被処理基材（１０）をセットし、
１Ｅ−４Ｔｏｒｒ以下に真空排気して後、この含浸担体
（２０ａ）を巻き取り式送り装置を介して５ｍｍ／ｍｉ
ｎで送り込みながら、実施例１と同様のランプヒ−タ−
（３０）で照射加熱し、蒸発させた。この時の蒸着用含
浸担体（２０）の表面温度は３５０℃で、被処理基材
（１０）であるフィルムの走行速度は５ｍ／ｍｉｎであ
った。As shown in FIG. 1, a roll-type impregnated carrier for vapor deposition (20) is placed in a take-up type vacuum vapor deposition apparatus (100).
a) and the same substrate (10) as in Example 1 were set,
After evacuating to 1E-4 Torr or less, the impregnated carrier (20a) was passed through a winding type feeder at 5 mm / mi.
n, and the same lamp heater as in the first embodiment.
It was irradiated and heated in (30) to evaporate. At this time, the surface temperature of the impregnated carrier for vapor deposition (20) was 350 ° C., and the running speed of the film as the substrate to be treated (10) was 5 m / min.
【００４２】この結果、水の接触角で１０５度から１１
０度の均一な防汚性薄膜（１）が形成された。また防汚
性薄膜（１）の形成前後における分光特性の変化は無
く、幅方向・長さ方向の色ムラはみられず良好であっ
た。As a result, the contact angle of water from 105 degrees to 11
A uniform antifouling thin film (1) of 0 ° was formed. Also, there was no change in the spectral characteristics before and after the formation of the antifouling thin film (1), and no color unevenness was observed in the width direction and the length direction, which was favorable.
【００４３】〈実施例５〉実施例３と同様の混合溶液
を、幅５０ｍｍ・厚さ１ｍｍ・長さ１ｍのアルミナファ
イバ−からなる織物状の含浸担体（２０）に含浸、乾燥
させて蒸着用ロール状含浸担体（２０ａ）を得た。Example 5 The same mixed solution as in Example 3 was impregnated into a woven impregnated carrier (20) made of alumina fiber having a width of 50 mm, a thickness of 1 mm, and a length of 1 m, and dried for vapor deposition. A roll impregnated carrier (20a) was obtained.
【００４４】図１に示すように、上記で得た蒸着用ロー
ル状含浸担体（２０ａ）と実施例１と同様の被処理基材
（１０）を巻き取り式真空蒸着装置（１００）内にセッ
トし、１Ｅ−４Ｔｏｒｒ以下に真空排気して後、この蒸
着用ロール状含浸担体（２０ａ）を巻き取り式送り装置
（１１０）を介して５ｍｍ／ｍｉｎで送り込みながら、
実施例１と同様のランプヒ−タ−（３０）で照射加熱
し、蒸発させた。この時の蒸着用織物状の含浸担体（２
０）の表面温度は３５０℃で、被処理基材（１０）であ
るフィルムの走行速度は５ｍ／ｍｉｎであった。As shown in FIG. 1, the roll impregnated carrier (20a) for vapor deposition obtained above and the substrate (10) to be treated as in Example 1 were set in a take-up type vacuum vapor deposition apparatus (100). Then, after evacuation to 1E-4 Torr or less, while feeding the roll impregnated carrier (20a) for vapor deposition at 5 mm / min through a winding type feeder (110),
Irradiation and heating were performed using the same lamp heater (30) as in Example 1 to evaporate. At this time, the woven impregnated carrier for vapor deposition (2
The surface temperature of 0) was 350 ° C., and the running speed of the film as the substrate to be treated (10) was 5 m / min.
【００４５】この結果、水の接触角で１０５度から１１
０度の均一な防汚性薄膜（１）が形成された。また防汚
性薄膜（１）の形成前後における分光特性の変化は無
く、幅方向・長さ方向の色ムラはみられず良好であっ
た。As a result, the contact angle of water from 105 degrees to 11
A uniform antifouling thin film (1) of 0 ° was formed. Also, there was no change in the spectral characteristics before and after the formation of the antifouling thin film (1), and no color unevenness was observed in the width direction and the length direction, which was favorable.
【００４６】〈実施例６〉実施例３と同様の混合溶液
を、幅５０ｍｍ・厚さ１ｍｍ・長さ３０ｍのグラスファ
イバ−からなるロ−ル状の織物（日東紡製スライバ−ク
ロスＷＳ８５０Ｓ１００）に含浸、乾燥させて蒸着用ロ
ール状含浸担体（２０ａ）を得た。Example 6 The same mixed solution as in Example 3 was applied to a roll-shaped woven fabric (a sliver cloth WS850S100 manufactured by Nitto Bo) made of glass fiber having a width of 50 mm, a thickness of 1 mm and a length of 30 m. Impregnation and drying were performed to obtain a roll-shaped impregnated carrier for vapor deposition (20a).
【００４７】続いて、図１に示すように、上記で得た蒸
着用ロール状含浸担体（２０ａ）と実施例１同様の被処
理基材（１０）を巻き取り式真空蒸着装置（１００）に
セットし、１０Ｅ−４Ｔｏｒｒ以下に真空排気して後、
この蒸着用ロール状含浸担体（２０ａ）を巻き取り式送
り装置（１１０）を用いて５ｍｍ／ｍｉｎで送り込みな
がら、実施例１と同様のランプヒ−タ−（３０）で照射
加熱し、蒸発させた。この時の蒸着用織物状の含浸担体
（２０）の表面温度は３５０℃で、被処理基材（１０）
であるフィルムの走行速度は５ｍ／ｍｉｎであった。Subsequently, as shown in FIG. 1, the roll-shaped impregnated carrier for vapor deposition (20a) obtained above and the substrate (10) to be treated as in Example 1 were wound into a take-up type vacuum vapor deposition apparatus (100). After setting and evacuating to 10E-4 Torr or less,
The roll impregnated carrier for vapor deposition (20a) was irradiated and heated by the same lamp heater (30) as in Example 1 while being fed at 5 mm / min using the take-up type feeder (110), and evaporated. . At this time, the surface temperature of the woven impregnated carrier for vapor deposition (20) is 350 ° C.
Was 5 m / min.
【００４８】この結果、水の接触角で１０５度から１１
０度の均一な防汚性薄膜（１）が形成された。また防汚
性薄膜（１）の形成前後における分光特性の変化は無
く、幅方向・長さ方向の色ムラはみられず良好であっ
た。また、この長尺（３０ｍ）のロ−ル状の織物からな
る蒸着用ロール状含浸担体（２０ａ）であるため、交換
なしで、１本５００ｍの前記被処理基材（１０）を５０
本分すなわち２５０００ｍ分の処理ができた。As a result, the contact angle of water from 105 degrees to 11
A uniform antifouling thin film (1) of 0 ° was formed. Also, there was no change in the spectral characteristics before and after the formation of the antifouling thin film (1), and no color unevenness was observed in the width direction and the length direction, which was favorable. In addition, since this is a roll-shaped impregnated carrier (20a) for vapor deposition made of this long (30m) roll-shaped woven fabric, one 500m of the substrate to be treated (10) is replaced without replacement.
The main process, that is, 25000 m of processing was completed.
【００４９】〈実施例７〉上記化２で表されるフルオロ
アルキルシラザンをメタキシレンヘキサフロライドで３
重量％に希釈した溶液（信越化学工業製：ＫＰ８０１
Ｍ）を、幅５０ｍｍ・厚さ３ｍｍ・長さ１ｍの硫酸カル
シウムの成形体に１２００ｃｃを含浸、乾燥させて蒸着
用セラミックス多孔性形成体からなる含浸担体（２４）
で図６に示すような板状含浸担体（２４ａ）を得た。Example 7 The fluoroalkylsilazane represented by the above formula (2) was treated with metaxylene hexafluoride to give
% Solution (KP801 manufactured by Shin-Etsu Chemical Co., Ltd.)
M) is impregnated with a calcium sulfate compact having a width of 50 mm, a thickness of 3 mm and a length of 1 m, which is impregnated with 1200 cc and dried to form an impregnated carrier (24) comprising a porous ceramic formed body for vapor deposition.
Thus, a plate-like impregnated carrier (24a) as shown in FIG. 6 was obtained.
【００５０】続いて図３に示すように、上記で得た蒸着
用セラミックス多孔性形成体からなる板状含浸担体（２
４ａ）と実施例１と同様の被処理基材（１０）を巻き取
り式真空蒸着装置（１００）内にセットし、１Ｅ−４Ｔ
ｏｒｒ以下に真空排気して後、この板状含浸担体（２４
ａ）を５ｍｍ／ｍｉｎで送り込みながら、図６に示すよ
うに、スポット上に集光できるランプヒ−タ−（３０）
（ウシオ電機製IHU-A03-01 500W）で表面から照射加熱
し、蒸発させた。この時の蒸着用板状含浸担体（２４
ａ）の表面温度は３５０℃で、被処理基材（１０）であ
るフィルムの走行速度は５ｍ／ｍｉｎであった。Subsequently, as shown in FIG. 3, a plate-shaped impregnated carrier (2
4a) and the same substrate (10) as in Example 1 were set in a take-up type vacuum evaporation apparatus (100), and 1E-4T
orr or less, and then the plate-shaped impregnated carrier (24
As shown in FIG. 6, a lamp heater (30) capable of condensing light on a spot while feeding a) at 5 mm / min.
(Ushio's IHU-A03-01 500W) was irradiated and heated from the surface and evaporated. At this time, the plate-like impregnated carrier for vapor deposition (24
The surface temperature of a) was 350 ° C., and the running speed of the film as the substrate to be treated (10) was 5 m / min.
【００５１】この結果、水の接触角で１１０度から１１
１度の均一な防汚性薄膜（１）が形成された。また防汚
性薄膜（１）の形成前後における分光特性の変化は無
く、幅方向・長さ方向の色ムラはみられず良好であっ
た。As a result, the contact angle of water from 110 degrees to 11
One uniform antifouling thin film (1) was formed. Also, there was no change in the spectral characteristics before and after the formation of the antifouling thin film (1), and no color unevenness was observed in the width direction and the length direction, which was favorable.
【００５２】〈実施例８〉実施例７と同様の材料を直径
φ４ｍｍ長さ６ｍｍのペレット状の成形体に含浸、乾燥
させて図５（ａ）に示すような蒸着用ペレット状含浸担
体（２４ｂ）を得た。Example 8 The same material as in Example 7 was impregnated into a pellet-shaped compact having a diameter of 4 mm and a length of 6 mm and dried to obtain a pellet-impregnated carrier for vapor deposition (24b) as shown in FIG. ) Got.
【００５３】続いて巻き取り式真空蒸着装置（１００）
に実施例７同様の被処理基材（１０）と上記で得た蒸着
用ペレット状含浸担体（２４ｂ）をセットし、１Ｅ−４
Ｔｏｒｒ以下に真空排気して後、このペレット状含浸担
体（２４ｂ）を５ｍｍ／ｍｉｎで送り込みながら、図５
（ａ）に示すように、実施例７と同様のランプヒ−タ−
（３０）で裏面から照射加熱し、蒸発させた。この時の
蒸着用ペレット状含浸担体（２４ｂ）の表面温度は３５
０℃で、被処理基材（１０）であるフィルムの走行速度
は５ｍ／ｍｉｎであった。Subsequently, a winding type vacuum evaporation apparatus (100)
The same substrate to be treated (10) as in Example 7 and the pellet-shaped impregnated carrier for vapor deposition (24b) obtained above were set in 1E-4.
After evacuation to Torr or less, the pellet-shaped impregnated carrier (24b) was fed at 5 mm / min.
(A) As shown in FIG.
In (30), irradiation heating was performed from the back surface to evaporate. At this time, the surface temperature of the pellet-shaped impregnated carrier (24b) for vapor deposition was 35.
At 0 ° C., the running speed of the film as the substrate to be treated (10) was 5 m / min.
【００５４】この結果、水の接触角で１１０度から１１
１度の均一な防汚性薄膜（１）が形成された。また防汚
性薄膜（１）の形成前後における分光特性の変化は無
く、幅方向・長さ方向の色ムラはみられず良好であっ
た。また、実施例６と同様の材料使用効率を得た。As a result, the contact angle of water from 110 degrees to 11
One uniform antifouling thin film (1) was formed. Also, there was no change in the spectral characteristics before and after the formation of the antifouling thin film (1), and no color unevenness was observed in the width direction and the length direction, which was favorable. Further, the same material use efficiency as in Example 6 was obtained.
【００５５】〈実施例９〉実施例７と同様の材料を大き
さ３〜１５ｍｍ、厚さ１〜５ｍｍの不定形の成形体に含
浸、乾燥させて図６（ａ）に示すような、蒸着用塊状含
浸担体（２４ｅ）を得た。Example 9 The same material as in Example 7 was impregnated into an irregular shaped body having a size of 3 to 15 mm and a thickness of 1 to 5 mm, dried and deposited as shown in FIG. A bulk impregnated carrier for use (24e) was obtained.
【００５６】続いて巻き取り式真空蒸着装置（１００）
に実施例７同様の被処理基材と上記で得た蒸着用塊状含
浸担体（２４ｅ）をセットし、１Ｅ−４Ｔｏｒｒ以下に
真空排気して後、この塊状含浸担体（２４ｅ）を５ｍｍ
／ｍｉｎで送り込みながら、図６（ａ）に示すように、
実施例６と同様のランプヒ−タ−（３０）で裏面から加
熱し、蒸発させた。この時の蒸着用塊状含浸担体（２４
ｅ）の表面温度は３５０℃で、被処理基材（１０）であ
るフィルムの走行速度は５ｍ／ｍｉｎであった。Subsequently, a winding type vacuum evaporation apparatus (100)
The same substrate to be treated as in Example 7 and the bulk impregnated carrier for vapor deposition (24e) obtained above were set and evacuated to 1E-4 Torr or less.
/ Min, and as shown in FIG.
The back surface was heated with the same lamp heater (30) as in Example 6 to evaporate. At this time, the bulk impregnated carrier for vapor deposition (24
The surface temperature in e) was 350 ° C., and the running speed of the film as the substrate to be treated (10) was 5 m / min.
【００５７】この結果、水の接触角で１１０度から１１
１度の均一な防汚性薄膜（１）が形成された。また防汚
性薄膜（１）の形成前後における分光特性の変化は無
く、幅方向・長さ方向の色ムラはみられず良好であっ
た。また、実施例６と同様の材料使用効率を得た。As a result, the contact angle of water from 110 degrees to 11
One uniform antifouling thin film (1) was formed. Also, there was no change in the spectral characteristics before and after the formation of the antifouling thin film (1), and no color unevenness was observed in the width direction and the length direction, which was favorable. Further, the same material use efficiency as in Example 6 was obtained.
【００５８】〈実施例１０〉実施例７と同様の材料を平
均粒径１００μｍの成形体に含浸、乾燥させて、図７に
示すような蒸着用粉状含浸担体（２４ｆ）を得た。続い
て巻き取り式真空蒸着装置（１００）に実施例７同様の
被処理基材（１０）と上記で得た蒸着用粉状含浸担体
（２４ｆ）をセットし、１Ｅ−４Ｔｏｒｒ以下に真空排
気して後、この粉状含浸担体（２４ｆ）を５ｍｍ／ｍｉ
ｎで送り込みながら、図７に示すように、実施例６と同
様のランプヒ−タ−（３０）で裏面から加熱し、蒸発さ
せた。この時の蒸着用粉状含浸担体（２４ｆ）の表面温
度は３５０℃で、被処理基材（１０）であるフィルムの
走行速度は５ｍ／ｍｉｎであった。Example 10 The same material as in Example 7 was impregnated into a compact having an average particle size of 100 μm and dried to obtain a powdery impregnated carrier for vapor deposition (24f) as shown in FIG. Subsequently, the same substrate (10) as in Example 7 and the powdery impregnated carrier for vapor deposition (24f) obtained above were set in a take-up type vacuum vapor deposition apparatus (100), and the vacuum impregnation was performed to 1E-4 Torr or less. After that, the powdery impregnated carrier (24f) is filled with 5 mm / mi
As shown in FIG. 7, the same lamp heater (30) as in Example 6 was used to heat and evaporate the back surface while feeding with n. At this time, the surface temperature of the powdery impregnated carrier for vapor deposition (24f) was 350 ° C., and the running speed of the film as the substrate to be treated (10) was 5 m / min.
【００５９】この結果、水の接触角で１１０度から１１
１度の均一な防汚性薄膜（１）が形成された。また防汚
性薄膜（１）の形成前後における分光特性の変化は無
く、幅方向・長さ方向の色ムラはみられず良好であっ
た。また、実施例６と同様の材料使用効率を得た。As a result, the contact angle of water from 110 degrees to 11
One uniform antifouling thin film (1) was formed. Also, there was no change in the spectral characteristics before and after the formation of the antifouling thin film (1), and no color unevenness was observed in the width direction and the length direction, which was favorable. Further, the same material use efficiency as in Example 6 was obtained.
【００６０】〈実施例１１〉巻き取り式真空蒸着装置
（１００）に実施例７同様の被処理基材（１０）と蒸着
用板状含浸担体（２４ａ）をセットし、図４（ｂ）に示
すように、板状含浸担体（２４ａ）の下面に厚さ１ｍｍ
のステンレス製金属板（２４ｃ）を挿入した。１Ｅ−４
Ｔｏｒｒ以下に真空排気して後、この板状含浸担体（２
４ａ）を５ｍｍ／ｍｉｎで送り込みながら、図４に示す
ように、実施例７と同様のランプヒ−タ−（３０）で表
面から照射加熱し、蒸発させた。この時の蒸着用板状含
浸担体（２４ａ）の表面温度は３５０℃で、被処理基材
（１０）であるフィルムの走行速度は７ｍ／ｍｉｎであ
った。<Example 11> A substrate to be treated (10) and a plate-like impregnated carrier for vapor deposition (24a) similar to those in Example 7 were set in a take-up type vacuum vapor deposition apparatus (100), and FIG. As shown, the lower surface of the plate-shaped impregnated carrier (24a) has a thickness of 1 mm.
The stainless steel metal plate (24c) was inserted. 1E-4
After evacuating to below Torr, the plate-shaped impregnated carrier (2
While feeding 4a) at a rate of 5 mm / min, as shown in FIG. 4, the surface was irradiated and heated by a lamp heater (30) similar to that in Example 7 to evaporate. At this time, the surface temperature of the plate-like impregnated carrier for vapor deposition (24a) was 350 ° C., and the running speed of the film as the substrate to be treated (10) was 7 m / min.
【００６１】この結果、水の接触角で１１０度から１１
１度の均一な防汚性薄膜（１）が形成された。また防汚
性薄膜（１）の形成前後における分光特性の変化は無
く、幅方向・長さ方向の色ムラはみられず良好であっ
た。また、実施例７より良い材料使用効率を得た。As a result, the contact angle of water from 110 degrees to 11 degrees
One uniform antifouling thin film (1) was formed. Also, there was no change in the spectral characteristics before and after the formation of the antifouling thin film (1), and no color unevenness was observed in the width direction and the length direction, which was favorable. Further, a better material use efficiency was obtained than in Example 7.
【００６２】〈実施例１２〉巻き取り式真空蒸着装置
（１００）内に実施例７同様の被処理基材（１０）と図
５（ｂ）に示すように、実施例８と同様の蒸着用ペレッ
ト状含浸担体（２４ｂ）をセットし、このペレット状含
浸担体（２４ｂ）の下面にはφ３ｍｍ、開口率７０％に
多数穿設したステンレス製金属板（２４ｄ）を挿入し
た。１Ｅ−４Ｔｏｒｒ以下に真空排気して後、このペレ
ット状含浸担体（２４ｂ）を５ｍｍ／ｍｉｎで送り込み
ながら、図５（ｂ）に示すように、実施例７と同様のラ
ンプヒ−タ−（３０）で裏面から照射加熱し、蒸発させ
た。この時の蒸着用ペレット状含浸担体（２４ｂ）の表
面温度は３５０℃で、被処理基材（１０）であるフィル
ムの走行速度は７ｍ／ｍｉｎであった。<Example 12> In a take-up type vacuum evaporation apparatus (100), a substrate to be treated (10) similar to that in Example 7 and, as shown in FIG. A pellet-shaped impregnated carrier (24b) was set, and a stainless steel plate (24d) having a large diameter of 3 mm and an opening ratio of 70% was inserted into the lower surface of the pellet-shaped impregnated carrier (24b). After evacuating to 1E-4 Torr or less, the same impregnated carrier (24b) as shown in FIG. 5 (b) is fed while the pellet impregnated carrier (24b) is fed at 5 mm / min. Then, irradiation heating was performed from the back side, and evaporated. At this time, the surface temperature of the pellet-shaped impregnated carrier for vapor deposition (24b) was 350 ° C., and the running speed of the film as the substrate to be treated (10) was 7 m / min.
【００６３】この結果、水の接触角で１１０度から１１
１度の均一な防汚性薄膜（１）が形成された。また防汚
性薄膜（１）の形成前後における分光特性の変化は無
く、幅方向・長さ方向の色ムラはみられず良好であっ
た。また、実施例７より良い材料使用効率を得た。As a result, the contact angle of water from 110 degrees to 11
One uniform antifouling thin film (1) was formed. Also, there was no change in the spectral characteristics before and after the formation of the antifouling thin film (1), and no color unevenness was observed in the width direction and the length direction, which was favorable. Further, a better material use efficiency was obtained than in Example 7.
【００６４】〈比較例１〉フルオロアルキルシラザンを
スチ−ルウ−ルに含浸させた直径φ１８ｍｍの銅製カッ
プに圧入した総計４５０ケの蒸発源をリング状に二列に
並べ、送り角度１．５度／ｍｉｎで回転させながら、電
子ビームガンを用いて、加速電圧１０ＫＶ、エミッショ
ン電流１５ｍＡの条件で加熱蒸着した。被処理基材（１
０）は上記実施例と同じものを用い、被処理基材（１
０）であるフィルムの走行速度は２ｍ／ｍｉｎであっ
た。<Comparative Example 1> A total of 450 evaporation sources pressed into a copper cup having a diameter of 18 mm impregnated with a fluoroalkylsilazane in steel wool were arranged in two rows in a ring, and the feed angle was 1.5 degrees. While rotating at / min, the film was heated and vapor-deposited using an electron beam gun under the conditions of an acceleration voltage of 10 KV and an emission current of 15 mA. Substrate to be treated (1
0) is the same as in the above embodiment, and
The traveling speed of the film (0) was 2 m / min.
【００６５】この結果、水の接触角で１１０度から１１
１度の防汚性薄膜（１）が形成されたが、３０ｃｍ程度
の長さで接触角９０度前後の部分が周期的に発生した。
この部分ではた防汚性薄膜（１）の形成前後における分
光特性の変化は無く、幅方向・長さ方向の色ムラはみら
れなかったものの、防汚性能ムラが発生した。また、蒸
発源を並べる作業が煩雑であった。As a result, the contact angle of water from 110 degrees to 11
Although the antifouling thin film (1) was formed once, a portion having a length of about 30 cm and a contact angle of about 90 degrees was periodically generated.
In this portion, there was no change in the spectral characteristics before and after the formation of the antifouling thin film (1), and no color unevenness was observed in the width direction and the length direction, but antifouling performance unevenness occurred. In addition, the operation of arranging the evaporation sources is complicated.
【００６６】〈比較例２〉巻き取り式真空蒸着装置（１
００）に実施例６と同様の被処理基材（１０）と蒸着用
含浸担体をセットし、１Ｅ−４Ｔｏｒｒ以下に真空排気
して後、この含浸担体を５ｍｍ／ｍｉｎで送り込みなが
ら、実施例６と同様のランプヒ−タ−（３０）で裏面か
ら加熱し、蒸発させた。<Comparative Example 2> Winding type vacuum evaporation apparatus (1
00), a substrate to be treated (10) and an impregnated carrier for vapor deposition were set in the same manner as in Example 6, evacuated to 1E-4 Torr or less, and then the impregnated carrier was fed at 5 mm / min. It was heated from the back surface by the same lamp heater (30) as above and evaporated.
【００６７】被処理基材（１０）であるフィルムの走行
速度は５ｍ／ｍｉｎでは適性な成膜レ−トが得られず、
この結果、水の接触角で７０度から９０度の不均一な防
汚性薄膜しか形成できなかった。また、幅方向・長さ方
向の色ムラがあった。また、フィルムの走行速度を０．
５ｍ／ｍｉｎに落としたところ、水の接触角で１１０度
から１１１度の均一な防汚性薄膜（１）が形成された。
したがって、上記各実施例に比べ著しく材料利用効率が
悪かった。If the running speed of the film as the substrate to be treated (10) is 5 m / min, an appropriate deposition rate cannot be obtained.
As a result, only a non-uniform antifouling thin film having a contact angle of 70 to 90 degrees with water was formed. Further, color unevenness was observed in the width direction and the length direction. Further, the running speed of the film is set to 0.
When dropped to 5 m / min, a uniform antifouling thin film (1) having a contact angle of water of 110 ° to 111 ° was formed.
Therefore, the material use efficiency was remarkably low as compared with the above-mentioned respective examples.
【００６８】[0068]
【発明の効果】本発明は以上の構成であるから、下記に
示す如き効果がある。即ち、真空蒸着法によって被処理
基材の表面に防汚性薄膜を形成する方法において、織物
状の含浸担体に浸したフルオロアルキルシラン等の防汚
性材料をランプヒ−タ−による放射加熱もしくはヒート
ローラーによる接触加熱により蒸発させ、前記織物状の
含浸担体がロ−ル状であって、そのロール状含浸担体を
連続巻き取り式送り装置により送り、連続的に蒸発させ
る防汚性薄膜の形成方法としたので、防汚性の優れた分
子量が大きく、蒸気圧が低く、反応性が高い材料あるい
は多元系の材料混合物を被処理基材であるロールフィル
ム上に連続処理が長時間でき、かつ速く、安定して、制
御性よく、簡便な防汚性薄膜の形成を可能にする。As described above, the present invention has the following effects. That is, in a method of forming an antifouling thin film on the surface of a substrate to be treated by a vacuum deposition method, an antifouling material such as fluoroalkylsilane soaked in a woven impregnated carrier is radiantly heated or heated by a lamp heater. A method for forming an antifouling thin film in which the woven impregnated carrier is rolled, and the roll-shaped impregnated carrier is fed by a continuous winding type feeder to be continuously evaporated by being evaporated by contact heating with a roller. Because of its excellent antifouling properties, its molecular weight is large, its vapor pressure is low, and a highly reactive material or a multi-component material mixture can be continuously treated for a long time on a roll film as a substrate to be treated, and quickly. It enables stable, easy to control, and easy formation of an antifouling thin film.
【００６９】また、セラミックス多孔性形成体からなる
含浸担体に浸したフルオロアルキルシラン等の防汚性材
料を、ランプヒ−タ−による照射加熱により蒸発させ、
前記セラミックス多孔性形成体からなる含浸担体が、裏
面に金属製板を備えた板状含浸担体であって、該板状含
浸担体の表面から照射加熱してなるもしくは前記セラミ
ックス多孔性形成体からなる含浸担体が、裏面に多数個
穿設された金属製板を備えたペレット状もしくは塊状含
浸担体であって、該ペレット状もしくは塊状もしくは粉
状含浸担体の裏面から照射加熱してなる防汚性薄膜の形
成方法としたので、防汚性の優れた分子量が大きく、蒸
気圧が低く、反応性が高い材料あるいは多元系の材料混
合物を被処理基材であるロールフィルム上に連続処理が
比較的長くでき、かつ速く、安定して、制御性よく、簡
便な防汚性薄膜の形成を可能にする。また、蒸発用含浸
担体の調整やセットが非常に簡単にできる。Further, an antifouling material such as fluoroalkylsilane soaked in an impregnated carrier comprising a porous ceramic body is evaporated by irradiation heating with a lamp heater,
The impregnated carrier composed of the ceramic porous forming body is a plate-shaped impregnated carrier having a metal plate on the back surface, and is formed by irradiating and heating the surface of the plate-shaped impregnated carrier or is formed of the ceramic porous forming body. The impregnated carrier is a pellet-shaped or massive impregnated carrier provided with a plurality of metal plates perforated on the back surface, and an antifouling thin film obtained by irradiating and heating from the back surface of the pellet-shaped or massive or powdered impregnated carrier. Because of the method of forming, a high molecular weight with excellent antifouling properties, a low vapor pressure, a highly reactive material or a multi-component material mixture can be continuously treated on a roll film as a substrate to be treated for a relatively long time. It is possible to form an antifouling thin film easily, quickly, stably, with good controllability, and easily. Further, adjustment and setting of the impregnated carrier for evaporation can be performed very easily.
【００７０】また、上記板状含浸担体の裏面に金属製板
を、ペレット状もしくは塊状含浸担体の裏面に多数個穿
設された金属製板を設けることによって、金属製板を設
けない場合に比べ、より材料使用効率をよくすることが
できる。Further, by providing a metal plate on the back surface of the plate-like impregnated carrier and providing a plurality of perforated metal plates on the back surface of the pellet-shaped or massive impregnated carrier, compared to a case where no metal plate is provided. Thus, the material use efficiency can be improved.
【図１】本発明の一実施の形態を示す巻き取り式真空蒸
着装置にロール状含浸担体とランプヒ−タ−を配した概
略を断面で表した説明図である。FIG. 1 is an explanatory view schematically showing a cross section in which a roll-shaped impregnated carrier and a lamp heater are arranged in a take-up type vacuum evaporation apparatus according to an embodiment of the present invention.
【図２】本発明の他の一実施の形態を示す巻き取り式真
空蒸着装置にロール状含浸担体とヒートローラーを配し
た概略を断面で表した説明図である。FIG. 2 is an explanatory diagram schematically showing a cross section in which a roll-shaped impregnated carrier and a heat roller are arranged in a take-up vacuum evaporation apparatus according to another embodiment of the present invention.
【図３】本発明の一実施の形態を示す巻き取り式真空蒸
着装置にセラミックス多孔性形成体からなる含浸担体と
ランプヒ−タ−を配した概略を断面で表した説明図であ
る。FIG. 3 is an explanatory diagram showing a schematic cross-sectional view of a roll-up vacuum evaporation apparatus according to an embodiment of the present invention, in which an impregnated carrier formed of a ceramic porous body and a lamp heater are arranged.
【図４】本発明の一実施の形態を示すランプヒ−タ−照
射加熱部を説明する図で、（ａ）は、板状含浸担体に対
する照射状態を断面で表した説明図である。（ｂ）は、
金属製板を裏面に配した板状含浸担体に対する照射状態
を断面で表した説明図である。FIG. 4 is a view for explaining a lamp heater-irradiation heating unit showing one embodiment of the present invention, and FIG. 4 (a) is an explanatory view showing a state of irradiation on a plate-like impregnated carrier in a cross section. (B)
It is explanatory drawing which represented the irradiation state with respect to the plate-shaped impregnation support | carrier which arrange | positioned the metal plate on the back surface with the cross section.
【図５】本発明の他の一実施の形態を示すランプヒ−タ
−照射加熱部を説明する図で、（ａ）は、ペレット状含
浸担体に対する照射状態を断面で表した説明図である。
（ｂ）は、多数穿設したステンレス製金属板を裏面に配
したペレット状含浸担体に対する照射状態を断面で表し
た説明図である。FIG. 5 is a view for explaining a lamp heater irradiation heating section showing another embodiment of the present invention, and FIG. 5 (a) is an explanatory view showing a cross section of an irradiation state on a pellet-shaped impregnated carrier.
(B) is explanatory drawing which showed the irradiation state with respect to the pellet-shaped impregnation support | carrier which arrange | positioned the stainless steel metal plate by which many perforations were arrange | positioned on the back surface in cross section.
【図６】本発明の他の一実施の形態を示すランプヒ−タ
−照射加熱部を説明する図で、（ａ）は、塊状含浸担体
に対する照射状態を断面で表した説明図である。（ｂ）
は、多数穿設したステンレス製金属板を裏面に配した塊
状含浸担体に対する照射状態を断面で表した説明図であ
る。FIG. 6 is a view for explaining a lamp heater-irradiation heating unit according to another embodiment of the present invention, and FIG. 6 (a) is an explanatory view showing a state of irradiation on a massive impregnated carrier in cross section. (B)
FIG. 3 is an explanatory diagram showing, in cross-section, an irradiation state on a massive impregnated carrier in which a large number of perforated stainless steel metal plates are arranged on the back surface.
【図７】本発明の他の一実施の形態を示すランプヒ−タ
−照射加熱部を説明する図で、粉状含浸担体に対する照
射状態を断面で表した説明図である。FIG. 7 is a diagram illustrating a lamp heater-irradiation heating unit according to another embodiment of the present invention, and is an explanatory diagram illustrating a cross-sectional state of irradiation of a powdery impregnated carrier.
１‥‥防汚性薄膜 １０‥‥被処理基材 １２‥‥巻き出しロール １４‥‥巻き取りロール １６‥‥蒸着ロール ２０‥‥織物状の含浸担体 ２０ａ‥‥ロール状含浸担体 ２４‥‥セラミックス多孔性形成体からなる含浸担体 ２４ａ‥‥板状ち含浸担体 ２４ｂ‥‥ペレット状含浸担体 ２４ｃ‥‥金属製板 ２４ｄ‥‥多数個穿設された金属板 ２４ｅ‥‥塊状含浸担体 ２４ｆ‥‥粉状含浸担体 ３０‥‥ランプヒ−タ− ４０‥‥ヒートローラー １００‥‥巻き取り式真空蒸着装置 １１０‥‥連続巻き取り式送り装置 1 Antifouling thin film 10 Substrate to be treated 12 Unwinding roll 14 Winding roll 16 Evaporation roll 20 Fabric impregnated carrier 20a Roll impregnated carrier 24 Ceramics Impregnated carrier composed of porous forming body 24a {plate-shaped impregnated carrier 24b} pellet-shaped impregnated carrier 24c {metal plate 24d} metal plate with a large number of perforations 24e {bulk impregnated carrier 24f} Impregnated carrier 30 ‥‥ lamp heater 40 ‥‥ heat roller 100 ‥‥ wind-up vacuum evaporation system 110 ‥‥ continuous winding feeder
Claims (8)
汚性薄膜を形成する方法であって、織物状の含浸担体に
浸したフルオロアルキルシラン等の防汚性材料をランプ
ヒ−タ−による放射加熱もしくはヒートローラーによる
接触加熱により蒸発させることを特徴とする防汚性薄膜
の形成方法。1. A method for forming an antifouling thin film on a surface of a substrate to be treated by a vacuum deposition method, wherein an antifouling material such as fluoroalkylsilane soaked in a woven impregnated carrier is used as a lamp heater. A method for forming an antifouling thin film, characterized in that the film is evaporated by radiant heating with a heat roller or contact heating with a heat roller.
て、そのロール状含浸担体を連続巻き取り式送り装置に
より送り、連続的に蒸発させることを特徴とする請求項
１記載の防汚性薄膜の形成方法。2. The method according to claim 1, wherein the woven impregnated carrier is in a roll form, and the roll-shaped impregnated carrier is fed by a continuous winding type feeder and is continuously evaporated. A method for forming an antifouling thin film.
からなることを特徴とする請求項１または２記載の防汚
性薄膜の形成方法。3. The woven impregnated carrier is made of glass fiber.
The method for forming an antifouling thin film according to claim 1, wherein the method comprises:
−からなることを特徴とする請求項１または２記載の防
汚性薄膜の形成方法。4. The method for forming an antifouling thin film according to claim 1, wherein said woven impregnated carrier is made of carbon fiber.
−からなることを特徴とする請求項１または２記載の防
汚性薄膜の形成方法。5. The method for forming an antifouling thin film according to claim 1, wherein said woven impregnated carrier comprises alumina fibers.
汚性薄膜を形成する方法であって、セラミックス多孔性
形成体からなる含浸担体に浸したフルオロアルキルシラ
ン等の防汚性材料を、ランプヒ−タ−による照射加熱に
より蒸発させることを特徴とする防汚性薄膜の形成方
法。6. A method for forming an antifouling thin film on the surface of a substrate to be treated by a vacuum deposition method, comprising the steps of: applying an antifouling material such as fluoroalkylsilane soaked in an impregnated carrier comprising a ceramic porous body. A method for forming an antifouling thin film, wherein the film is evaporated by irradiation heating with a lamp heater.
浸担体が、板状含浸担体、または裏面に金属製板を備え
た板状含浸担体であって、該板状含浸担体の表面から照
射加熱してなることを特徴とする請求項６記載の防汚性
薄膜の形成方法。7. The impregnated carrier comprising the porous ceramic body is a plate-shaped impregnated carrier or a plate-shaped impregnated carrier having a metal plate on the back surface, and is irradiated and heated from the surface of the plate-shaped impregnated carrier. The method for forming an antifouling thin film according to claim 6, wherein:
浸担体が、ペレット状含浸担体もしくは塊状含浸担体も
しくは粉状含浸担体、または裏面に多数個穿設された金
属製板を備えたペレット状もしくは塊状含浸担体であっ
て、該ペレット状もしくは塊状もしくは粉状含浸担体の
裏面から照射加熱してなることを特徴とする請求項６記
載の防汚性薄膜の形成方法。8. The impregnated carrier comprising the ceramic porous forming body may be a pellet-shaped impregnated carrier, a block-shaped impregnated carrier, or a powdered impregnated carrier, or a pellet-shaped or block-shaped impregnated carrier having a plurality of metal plates perforated on the back surface. 7. The method for forming an antifouling thin film according to claim 6, wherein the impregnated carrier is irradiated and heated from the back surface of the pellet-shaped, lump-shaped, or powdered impregnated carrier.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31026197A JP3870516B2 (en) | 1997-11-12 | 1997-11-12 | Method for forming antifouling thin film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31026197A JP3870516B2 (en) | 1997-11-12 | 1997-11-12 | Method for forming antifouling thin film |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006172358A Division JP4525637B2 (en) | 2006-06-22 | 2006-06-22 | Method for forming antifouling thin film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH11140204A true JPH11140204A (en) | 1999-05-25 |
| JP3870516B2 JP3870516B2 (en) | 2007-01-17 |
Family
ID=18003126
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP31026197A Expired - Fee Related JP3870516B2 (en) | 1997-11-12 | 1997-11-12 | Method for forming antifouling thin film |
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| Country | Link |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11217558A (en) * | 1998-01-31 | 1999-08-10 | Toppan Printing Co Ltd | Stainproofing agent and formation of stainproofing layer |
| WO2012121237A1 (en) * | 2011-03-09 | 2012-09-13 | コニカミノルタホールディングス株式会社 | Vapor-deposition device and thin-film formation method |
| JP2013040357A (en) * | 2011-08-11 | 2013-02-28 | Optorun Co Ltd | Film forming device |
| WO2017208826A1 (en) * | 2016-05-30 | 2017-12-07 | ソニー株式会社 | Thin film manufacturing method, thin film manufacturing apparatus, photoelectric conversion element manufacturing method, logic circuit manufacturing method, light-emitting element manufacturing method, and light control element manufacturing method |
| KR102439501B1 (en) * | 2022-07-04 | 2022-09-02 | 주식회사 세미안 | An automatic carbon fiber feeder for a carbon coating device |
-
1997
- 1997-11-12 JP JP31026197A patent/JP3870516B2/en not_active Expired - Fee Related
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11217558A (en) * | 1998-01-31 | 1999-08-10 | Toppan Printing Co Ltd | Stainproofing agent and formation of stainproofing layer |
| WO2012121237A1 (en) * | 2011-03-09 | 2012-09-13 | コニカミノルタホールディングス株式会社 | Vapor-deposition device and thin-film formation method |
| JP2013040357A (en) * | 2011-08-11 | 2013-02-28 | Optorun Co Ltd | Film forming device |
| WO2017208826A1 (en) * | 2016-05-30 | 2017-12-07 | ソニー株式会社 | Thin film manufacturing method, thin film manufacturing apparatus, photoelectric conversion element manufacturing method, logic circuit manufacturing method, light-emitting element manufacturing method, and light control element manufacturing method |
| JPWO2017208826A1 (en) * | 2016-05-30 | 2019-03-28 | ソニー株式会社 | Thin film manufacturing method, thin film manufacturing apparatus, photoelectric conversion element manufacturing method, logic circuit manufacturing method, light emitting element manufacturing method, and dimming element manufacturing method |
| US10679850B2 (en) | 2016-05-30 | 2020-06-09 | Sony Corporation | Manufacturing method for forming a thin film between two terminals |
| KR102439501B1 (en) * | 2022-07-04 | 2022-09-02 | 주식회사 세미안 | An automatic carbon fiber feeder for a carbon coating device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3870516B2 (en) | 2007-01-17 |
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