JPH11131261A - Glazed article having photocatalysis function and its production - Google Patents
Glazed article having photocatalysis function and its productionInfo
- Publication number
- JPH11131261A JPH11131261A JP9309906A JP30990697A JPH11131261A JP H11131261 A JPH11131261 A JP H11131261A JP 9309906 A JP9309906 A JP 9309906A JP 30990697 A JP30990697 A JP 30990697A JP H11131261 A JPH11131261 A JP H11131261A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- glaze
- photocatalyst
- particles
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000001699 photocatalysis Effects 0.000 title claims abstract description 41
- 238000004519 manufacturing process Methods 0.000 title claims description 20
- 238000007146 photocatalysis Methods 0.000 title abstract 2
- 239000011941 photocatalyst Substances 0.000 claims abstract description 127
- 239000002245 particle Substances 0.000 claims abstract description 99
- 239000003086 colorant Substances 0.000 claims abstract description 5
- 239000000758 substrate Substances 0.000 claims abstract description 5
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 37
- 239000000463 material Substances 0.000 claims description 29
- 239000011163 secondary particle Substances 0.000 claims description 27
- 239000002002 slurry Substances 0.000 claims description 27
- 239000003242 anti bacterial agent Substances 0.000 claims description 20
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 20
- 230000000844 anti-bacterial effect Effects 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 16
- 238000010304 firing Methods 0.000 claims description 11
- 229910052725 zinc Inorganic materials 0.000 claims description 6
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 230000000873 masking effect Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 126
- 238000004040 coloring Methods 0.000 description 11
- 210000003298 dental enamel Anatomy 0.000 description 5
- 238000005259 measurement Methods 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- 238000010998 test method Methods 0.000 description 4
- 241000894006 Bacteria Species 0.000 description 3
- 230000003213 activating effect Effects 0.000 description 3
- 230000001580 bacterial effect Effects 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 229920001817 Agar Polymers 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 239000008272 agar Substances 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 238000001354 calcination Methods 0.000 description 2
- 238000006555 catalytic reaction Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000004927 clay Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000005034 decoration Methods 0.000 description 2
- 239000002781 deodorant agent Substances 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 230000001954 sterilising effect Effects 0.000 description 2
- 238000004659 sterilization and disinfection Methods 0.000 description 2
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910004261 CaF 2 Inorganic materials 0.000 description 1
- 244000182625 Dictamnus albus Species 0.000 description 1
- 241000588724 Escherichia coli Species 0.000 description 1
- RJQXTJLFIWVMTO-TYNCELHUSA-N Methicillin Chemical compound COC1=CC=CC(OC)=C1C(=O)N[C@@H]1C(=O)N2[C@@H](C(O)=O)C(C)(C)S[C@@H]21 RJQXTJLFIWVMTO-TYNCELHUSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 241000191967 Staphylococcus aureus Species 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000004599 antimicrobial Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000001506 calcium phosphate Substances 0.000 description 1
- 229910000389 calcium phosphate Inorganic materials 0.000 description 1
- 235000011010 calcium phosphates Nutrition 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- LOKCTEFSRHRXRJ-UHFFFAOYSA-I dipotassium trisodium dihydrogen phosphate hydrogen phosphate dichloride Chemical compound P(=O)(O)(O)[O-].[K+].P(=O)(O)([O-])[O-].[Na+].[Na+].[Cl-].[K+].[Cl-].[Na+] LOKCTEFSRHRXRJ-UHFFFAOYSA-I 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052809 inorganic oxide Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 229960003085 meticillin Drugs 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000002953 phosphate buffered saline Substances 0.000 description 1
- 239000002504 physiological saline solution Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- 229910000166 zirconium phosphate Inorganic materials 0.000 description 1
- LEHFSLREWWMLPU-UHFFFAOYSA-B zirconium(4+);tetraphosphate Chemical compound [Zr+4].[Zr+4].[Zr+4].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LEHFSLREWWMLPU-UHFFFAOYSA-B 0.000 description 1
Landscapes
- Apparatus For Disinfection Or Sterilisation (AREA)
- Disinfection, Sterilisation Or Deodorisation Of Air (AREA)
- Catalysts (AREA)
- Agricultural Chemicals And Associated Chemicals (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】この発明は光触媒機能を有す
る施釉品及びその製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a glaze having a photocatalytic function and a method for producing the same.
【0002】[0002]
【従来の技術】近年、酸化チタンで代表される光触媒の
触媒反応に基づく抗菌・防臭等の技術が注目されてい
る。この光触媒は一般に400nm以下の波長の光、即
ち紫外線エネルギーを受けて触媒反応を生じ、空気中の
酸素を活性化して有機物等の分解対象物を分解すると考
えられている。2. Description of the Related Art In recent years, techniques such as antibacterial and deodorant techniques based on a catalytic reaction of a photocatalyst represented by titanium oxide have been attracting attention. It is generally considered that this photocatalyst receives light having a wavelength of 400 nm or less, that is, ultraviolet energy, to cause a catalytic reaction, thereby activating oxygen in the air and decomposing a decomposition target such as an organic substance.
【0003】従ってこの光触媒が有効に働くためには、
光触媒の粒子が表面に露出している必要がある。光触媒
の粒子がその保持層中に埋没していたりすると、これを
活性化するための光が光触媒粒子まで届かず、また光触
媒粒子が空気や分解対象物に触れないことになり、本来
の働きを有効になし得ないからである。Therefore, for this photocatalyst to work effectively,
The photocatalyst particles need to be exposed on the surface. If the photocatalyst particles are buried in the holding layer, the light for activating the photocatalysts does not reach the photocatalyst particles, and the photocatalyst particles do not come into contact with air or decomposition objects, and the original function is achieved. This is because it cannot be effective.
【0004】そこで所定の製品に光触媒機能を持たせる
ため、その製品における基材表面にバインダ層を形成し
て、そのバインダ層を介して光触媒の粒子群を基材表面
に固着し、基材表面を覆うといったことが考えられる。
このようにすれば、光触媒粒子を効果的に表面に集中し
て存在させることができ、光触媒機能を有効に発揮させ
ることが可能である。In order to make a given product have a photocatalytic function, a binder layer is formed on the surface of a base material of the product, and particles of the photocatalyst are fixed to the surface of the base material via the binder layer. Can be considered.
With this configuration, the photocatalyst particles can be effectively concentrated on the surface, and the photocatalytic function can be effectively exerted.
【0005】[0005]
【発明が解決しようとする課題】しかしながら一方でこ
のようにした場合、光触媒の下側の基材自体を着色し或
いは基材表面に着色層(加飾層)を形成して製品を加飾
したり、或いは様々な色付けしたりしようとしても、そ
れらの加飾や色が光触媒層(光触媒の粒子群)によって
覆われ、隠蔽されてしまうといった問題を生ずる。即
ち、製品に様々な加飾や着色を施すことが実際上できな
くなってしまう問題を生ずる。On the other hand, in such a case, the base material itself under the photocatalyst is colored or a colored layer (decorative layer) is formed on the surface of the base material to decorate the product. However, even if an attempt is made to provide various colors, the decoration and the color are covered and covered by the photocatalyst layer (particle group of the photocatalyst). That is, there arises a problem that it is practically impossible to apply various decorations and colorings to the product.
【0006】加えてこの方法では、基材表面に光触媒の
層を形成するための工程が複雑で、これに起因して製造
コストが高くなるといった問題を生ずる。In addition, in this method, the process for forming the photocatalyst layer on the surface of the base material is complicated, which causes a problem that the production cost is increased.
【0007】[0007]
【課題を解決するための手段】本願の発明はこのような
課題を解決するためになされたものである。而して請求
項1は光触媒機能を有する施釉品に係り、基材と、最表
層としての光触媒層とを有し、該光触媒層は、光触媒粒
子の凝集体である二次粒子の大きさよりも膜厚が薄く形
成された透光性の釉薬の膜中に、該二次粒子の上部が該
釉薬の膜表面から外部に突き出し、下部が該釉薬の膜よ
り下側の層に埋まり込まない状態で且つ該釉薬の膜の下
側の層が該釉薬の膜を透して表面に見える状態で分散状
に含有されて構成されていることを特徴とする。The invention of the present application has been made to solve such a problem. Claim 1 relates to a glazed product having a photocatalytic function, comprising a base material and a photocatalyst layer as the outermost layer, wherein the photocatalyst layer has a size larger than the size of secondary particles which are aggregates of photocatalyst particles. A state in which the upper part of the secondary particles protrudes outside from the glaze film surface and the lower part is not buried in a layer below the glaze film in the light-transmitting glaze film having a small thickness. And a layer below the glaze film is contained in a dispersed manner so as to be visible on the surface through the glaze film.
【0008】請求項2のものは、基材と、最表層として
の光触媒層とを有し、該光触媒層は、光触媒粒子とそれ
に加えてAg,Cu,Znの一種若しくは二種以上を抗
菌成分とする抗菌剤の粒子とが分散状に含有されている
ことを特徴とする。According to a second aspect of the present invention, there is provided a base material and a photocatalyst layer as the outermost layer, wherein the photocatalyst layer comprises photocatalyst particles and one or more of Ag, Cu and Zn in addition to an antibacterial component. And particles of the antimicrobial agent described above are contained in a dispersed state.
【0009】請求項3のものは、請求項2において、前
記光触媒層は、光触媒粒子の凝集体である二次粒子の大
きさよりも膜厚が薄く形成された透光性の釉薬の膜中
に、該二次粒子の上部が該釉薬の膜表面から外部に突き
出し、下部が該釉薬の膜より下側の層に埋まり込まない
状態で且つ該釉薬の膜の下側の層が該釉薬の膜を透して
表面に見える状態で分散状に含有されて構成されている
ことを特徴とする。According to a third aspect of the present invention, in the second aspect, the photocatalyst layer is formed in a light-transmitting glaze film having a thickness smaller than a size of secondary particles which are aggregates of the photocatalyst particles. The upper part of the secondary particles protrudes outside from the glaze film surface, the lower part is not embedded in the lower layer of the glaze film, and the lower layer of the glaze film is the glaze film. Characterized in that they are contained in a dispersed manner in a state where they can be seen through the surface.
【0010】請求項4のものは、請求項1,2,3の何
れかにおいて、前記光触媒粒子がアナターゼ型の酸化チ
タン粒子であることを特徴とする。According to a fourth aspect, in any one of the first, second and third aspects, the photocatalyst particles are titanium oxide particles of an anatase type.
【0011】請求項5のものは、請求項1〜4の何れか
において、前記光触媒層の下側には、該光触媒層よりも
厚みの厚い着色層が形成されていることを特徴とする。According to a fifth aspect of the present invention, in any one of the first to fourth aspects, a colored layer thicker than the photocatalyst layer is formed below the photocatalyst layer.
【0012】請求項6のものは、請求項5において、前
記着色層の下側であって前記基材の上側に、該基材の表
面を隠蔽する隠蔽層が形成されていることを特徴とす
る。According to a sixth aspect, in the fifth aspect, a concealing layer for concealing the surface of the base material is formed below the colored layer and above the base material. I do.
【0013】請求項7は光触媒機能を有する施釉品の製
造方法に係るもので、基材と、最表層としての光触媒層
とを有し、該光触媒層は、光触媒粒子の凝集体である二
次粒子の大きさよりも膜厚が薄く形成された透光性の釉
薬の膜中に、該二次粒子の上部が該釉薬の膜表面から外
部に突き出し、下部が該釉薬の膜より下側の層に埋まり
込まない状態で且つ該釉薬の膜の下側の層が該釉薬の膜
を透して表面に見える状態で分散状に含有されて構成さ
れている施釉品の製造方法であって、前記光触媒層を形
成するための釉薬の泥漿中に前記光触媒粒子を混合分散
させ、該光触媒粒子含有の釉薬の泥漿を、焼成後の釉薬
の膜の厚みが前記二次粒子の大きさよりも薄くなる膜厚
で最表面に塗布した後、前記基材の軟化温度以下の温度
で焼成処理することを特徴とする。According to a seventh aspect of the present invention, there is provided a method for producing a glaze having a photocatalytic function, comprising a base material and a photocatalyst layer as an outermost layer, wherein the photocatalyst layer is formed of an aggregate of photocatalyst particles. In a translucent glaze film formed thinner than the particle size, the upper part of the secondary particles protrudes from the glaze film surface to the outside, and the lower part is a layer below the glaze film. A method for producing a glazed article, wherein the glazed article is configured to be contained in a dispersed state in a state where the layer is not embedded in the film and the lower layer of the glaze film is visible on the surface through the glaze film, The photocatalyst particles are mixed and dispersed in a glaze slurry for forming a photocatalyst layer, and the glaze slurry containing the photocatalyst particles is reduced in thickness after firing to a thickness of the glaze film smaller than the size of the secondary particles. After being applied to the outermost surface with a thickness, a baking treatment is performed at a temperature equal to or lower than the softening temperature of the base material. The features.
【0014】請求項8の製造方法は、基材と、最表層と
しての光触媒層とを有し、該光触媒層は、光触媒粒子と
それに加えてAg,Cu,Znの一種若しくは二種以上
を抗菌成分とする抗菌剤の粒子とが釉薬の膜中に分散状
に含有されて構成されている施釉品の製造方法であっ
て、前記光触媒層を形成するための釉薬の泥漿中に前記
光触媒粒子と前記抗菌剤の粒子とを混合分散させ、それ
ら光触媒粒子及び抗菌剤粒子含有の釉薬の泥漿を最表面
に塗布した後、前記基材の軟化温度以下の温度で焼成処
理することを特徴とする。[0014] According to a eighth aspect of the present invention, there is provided a manufacturing method comprising a base material and a photocatalyst layer as an outermost layer. A method for producing a glazed product, wherein the particles of the antibacterial agent as a component are dispersedly contained in a film of the glaze, wherein the photocatalyst particles are contained in a slurry of the glaze for forming the photocatalyst layer. The antibacterial agent particles are mixed and dispersed, and the photocatalyst particles and the antiglare agent-containing glaze slurry are applied to the outermost surface, and then baked at a temperature equal to or lower than the softening temperature of the base material.
【0015】請求項9の製造方法は、請求項8におい
て、前記光触媒層が、光触媒粒子の凝集体である二次粒
子の大きさよりも膜厚が薄く形成された透光性の釉薬の
膜中に、該二次粒子の上部が該釉薬の膜表面から外部に
突き出し、下部が該釉薬の膜より下側の層に埋まり込ま
ない状態で且つ該釉薬の膜の下側の層が該釉薬の膜を透
かして表面に見える状態で分散状に含有されて構成され
ている施釉品を製造するに際し、前記光触媒粒子及び抗
菌剤の粒子含有の釉薬の泥漿を、焼成後の釉薬の膜の厚
みが該光触媒粒子の凝集体である二次粒子の大きさより
も薄くなる膜厚で最表面に塗布することを特徴とする。According to a ninth aspect of the present invention, there is provided the method according to the eighth aspect, wherein the photocatalyst layer is formed of a translucent glaze having a thickness smaller than a size of secondary particles which are aggregates of photocatalyst particles. The upper part of the secondary particles protrudes outside from the surface of the glaze film, the lower part is not embedded in the lower layer of the glaze film, and the lower layer of the glaze film is the lower part of the glaze film. In producing a glazed product that is configured to be contained in a dispersed manner while being visible on the surface through the film, the thickness of the film of the glazed film after sintering the glaze of the glaze containing the photocatalyst particles and the particles of the antibacterial agent is reduced. It is characterized in that the photocatalyst particles are applied to the outermost surface with a film thickness smaller than the size of the secondary particles which are aggregates.
【0016】請求項10の製造方法は、請求項7,8,
9の何れかにおいて、前記光触媒粒子としてアナターゼ
型の酸化チタン粒子を用い、前記焼成処理を800℃以
下の温度で行うことを特徴とする。According to a tenth aspect of the present invention, there is provided a manufacturing method according to the seventh aspect.
9. The method according to any one of 9 to 9, wherein anatase-type titanium oxide particles are used as the photocatalyst particles, and the firing treatment is performed at a temperature of 800 ° C. or less.
【0017】請求項11の製造方法は、請求項7,9,
10の何れかにおいて、前記光触媒層を形成するための
釉薬の泥漿を塗布処理するに先立って、先ず該光触媒層
の下側の該光触媒層より厚みの厚い着色層形成用の、該
光触媒層用の釉薬のより高耐火度の且つ着色剤含有の釉
薬の泥漿を塗布した上、前記基材の軟化温度以下の温度
で焼成処理して該着色層を形成し、しかる後前記光触媒
層を形成するための釉薬泥漿を塗布した上、該着色層が
軟化熔融しない温度条件下で焼成処理することを特徴と
する。The manufacturing method according to claim 11 is the method according to claims 7, 9,
10. In any one of the photocatalytic layers, prior to applying a glaze slurry for forming the photocatalytic layer, first forming a colored layer thicker than the photocatalytic layer below the photocatalytic layer. After applying the slurry of the glaze having a higher fire resistance and a colorant containing the glaze of above, the calcining treatment is performed at a temperature lower than the softening temperature of the base material to form the colored layer, and then the photocatalytic layer is formed. And a baking treatment under a temperature condition at which the colored layer does not soften and melt.
【0018】[0018]
【作用及び発明の効果】上記のように請求項1のもの
は、光触媒粒子の保持層を透光性の釉薬の膜にて形成
し、そしてその釉薬の膜厚を、光触媒粒子の凝集体であ
る二次粒子の大きさよりも薄くして、その二次粒子の上
部が釉薬の膜表面から外部に突き出すように且つ釉薬の
膜の下側の層が釉薬の膜を透して表面に見える状態で分
散状に含有するようになしたもので、この請求項1の施
釉品の場合、製品表面に着色を施した場合においてその
着色が最表層の光触媒層を通じて表面に透して見えるた
め、施釉品の美観を良好となし或いは様々なカラーバリ
エーションを持たせつつ光触媒機能を付与することがで
きる。According to the first aspect of the present invention, the holding layer of the photocatalyst particles is formed of a translucent glaze film, and the thickness of the glaze is reduced by the aggregate of the photocatalyst particles. Thinner than a certain secondary particle size, with the upper part of the secondary particle protruding outside from the glaze film surface and the lower layer of the glaze film visible through the glaze film In the case of the glazed product according to claim 1, when the product surface is colored, the coloring can be seen through the surface through the outermost photocatalyst layer. The photocatalytic function can be imparted while maintaining good appearance of the product or having various color variations.
【0019】加えてこの施釉品の場合、光触媒粒子の保
持層としての釉薬の膜が光触媒粒子の二次粒子の大きさ
よりも薄く、これに保持された光触媒粒子の二次粒子が
釉薬の膜表面上に露出するため、効率的に光触媒として
の働きを行わせることができる。In addition, in the case of this glazed product, the glaze film as a holding layer for the photocatalyst particles is thinner than the secondary particles of the photocatalyst particles, and the secondary particles of the photocatalyst particles are retained on the surface of the glaze film. Since it is exposed above, the function as a photocatalyst can be efficiently performed.
【0020】請求項2のものは、上記光触媒層の釉薬の
膜中にAg,Cu,Znの一種若しくは二種以上を抗菌
成分とする抗菌剤の粒子を分散状に含有させるようにな
したものである。According to a second aspect of the present invention, in the glaze film of the photocatalytic layer, particles of an antibacterial agent containing one or more of Ag, Cu, and Zn as antibacterial components are contained in a dispersed state. It is.
【0021】光触媒層中に光触媒粒子のみが含有されて
いる場合、紫外線の当らない条件、例えば夜間等には抗
菌を良好に行うことができない。しかるに請求項2に従
って光触媒層の釉薬の膜中に抗菌剤の粒子をも含有させ
ておけば、細菌等が増殖活動を活発に行う夜間において
も、即ち光触媒粒子を活性化するための光エネルギーが
与えられない夜間においても抗菌作用を良好に行わせる
ことができる。更にこの請求項においては、Ag,C
u,Zn等の金属イオンが光触媒粒子と共存することに
よって光触媒活性そのものが向上することが分かってお
り、紫外線の当たる環境下での抗菌・消臭作用を効果的
に行わせることができる。When only the photocatalyst particles are contained in the photocatalyst layer, the antibacterial property cannot be favorably performed under the condition not exposed to ultraviolet rays, for example, at night. However, if particles of the antibacterial agent are also contained in the glaze film of the photocatalyst layer according to claim 2, light energy for activating the photocatalyst particles can be obtained even at night when bacteria and the like actively proliferate. The antibacterial action can be favorably performed even in the nighttime when it is not given. Further, in this claim, Ag, C
It has been found that the coexistence of metal ions such as u and Zn with the photocatalyst particles enhances the photocatalytic activity itself, and can effectively perform the antibacterial and deodorant effects in an environment exposed to ultraviolet rays.
【0022】また、請求項3に従って光触媒層の釉薬の
膜を、光触媒粒子の凝集体である二次粒子が釉薬の膜表
面から突き出すようにその二次粒子の大きさよりも薄い
膜厚で形成すれば、光触媒粒子を請求項1のものと同様
に有効に働かせることができる。According to a third aspect of the present invention, the glaze film of the photocatalytic layer is formed with a thickness smaller than the size of the secondary particles, which are aggregates of the photocatalyst particles, so that the secondary particles protrude from the glaze film surface. If this is the case, the photocatalyst particles can work effectively as in the first aspect.
【0023】上記抗菌剤粒子はゼオライト,リン酸カル
シウム,リン酸ジルコニウム,シリカゲル,水溶性ガラ
ス,チタニア等無機酸化物などを担体としてその担体に
Ag,Cu,Zn等の抗菌成分を担持させた形態のもの
であっても良いし、或いはそのような担体に担持させた
形態でなく、抗菌金属ないしその化合物をそのまま抗菌
剤として用いるようにしても良い。The above-mentioned antibacterial agent particles have a form in which zeolite, calcium phosphate, zirconium phosphate, silica gel, water-soluble glass, inorganic oxide such as titania, etc. are used as carriers and the carrier carries antibacterial components such as Ag, Cu, Zn and the like. Alternatively, an antibacterial metal or a compound thereof may be used as it is as an antibacterial agent without being supported on such a carrier.
【0024】尚、請求項2及び請求項3の施釉品におい
て、光触媒層の釉薬の膜中に含有させた抗菌剤の粒子は
光触媒粒子の表面に付着している必要はなく、これとは
別個独立して存在させることができる。また抗菌剤の粒
子は必ずしも釉薬の膜表面のみに存在していなくても良
く、釉薬の膜の内部全体に亘って分散させておくことが
できる。In the glazed product according to claim 2 or 3, the particles of the antibacterial agent contained in the glaze film of the photocatalyst layer do not need to adhere to the surface of the photocatalyst particles. They can exist independently. Also, the particles of the antibacterial agent do not necessarily need to be present only on the surface of the glaze film, and can be dispersed throughout the entire glaze film.
【0025】本発明においては、上記光触媒粒子として
アナターゼ型の酸化チタン粒子を好適に用いることがで
きる(請求項4)。尚上記請求項1,3,4において、
光触媒層における釉薬の膜の厚みは、例えば1〜30μ
m程度の厚みとすることができる。In the present invention, anatase type titanium oxide particles can be suitably used as the photocatalyst particles (claim 4). In the above claims 1, 3 and 4,
The thickness of the glaze film in the photocatalyst layer is, for example, 1 to 30 μm.
m.
【0026】請求項5のものは、光触媒層の下側にその
光触媒層よりも厚みの厚い着色層を形成したもので、こ
のような着色層を形成することによって施釉品に色付け
をすることができ、また着色層に用いる着色剤を種々変
えることによって施釉品を様々に着色し且つこれを光触
媒層を通じて表面に現出させることができる。According to a fifth aspect of the present invention, a colored layer thicker than the photocatalyst layer is formed below the photocatalyst layer. By forming such a colored layer, the glaze can be colored. The glaze can be colored in various ways by changing the colorant used in the colored layer, and can be exposed on the surface through the photocatalytic layer.
【0027】また光触媒層の下側に、その光触媒層より
も厚みの厚い着色層を形成することによって、その上側
の光触媒層、詳しくは釉薬の膜の厚みを容易に薄く形成
することができる。By forming a colored layer thicker than the photocatalyst layer below the photocatalyst layer, the thickness of the photocatalyst layer above the photocatalyst layer, more specifically, the thickness of the glaze film can be easily reduced.
【0028】請求項6のものは、更にその着色層の下側
に基材の表面を隠蔽する隠蔽層を形成したもので、この
ようにすることによって基材の色自体が表面に表れるこ
とをその隠蔽層によって防止でき、着色層による着色を
良好に行うことができる。According to a sixth aspect of the present invention, a concealing layer for concealing the surface of the base material is further formed under the colored layer, whereby the color of the base material itself appears on the surface. This can be prevented by the concealing layer, and coloring by the coloring layer can be performed favorably.
【0029】請求項7は、請求項1の施釉品を製造する
に際して、光触媒層を形成するための釉薬泥漿中に光触
媒粒子を混合分散させ、その釉薬泥漿を、焼成後の釉薬
の膜の厚みが光触媒粒子の二次粒子の大きさよりも薄く
なる膜厚で最表面に塗布した後、基材の軟化温度以下の
温度で焼成処理するもので、この請求項1に従えば、光
触媒粒子含有の釉薬泥漿を表面に所定膜厚で塗布し、そ
の後焼成処理するだけで、簡単に最表層に光触媒層を有
する請求項1の施釉品を製造することができる。According to a seventh aspect of the present invention, in producing the glazed article of the first aspect, photocatalyst particles are mixed and dispersed in a glaze slurry for forming a photocatalyst layer, and the glaze slurry has a thickness of the fired glaze film. Is applied to the outermost surface in a film thickness smaller than the size of the secondary particles of the photocatalyst particles, and then calcined at a temperature equal to or lower than the softening temperature of the base material. The glaze product having the photocatalyst layer on the outermost layer can be easily manufactured by simply applying the glaze slurry to the surface at a predetermined film thickness and then performing the baking treatment.
【0030】請求項8の製造方法は、釉薬泥漿中に光触
媒粒子と併せて抗菌剤の粒子を含有させておき、それら
光触媒粒子及び抗菌剤粒子を含有する釉薬泥漿を最表面
に塗布した後、焼成処理するもので、この方法によれ
ば、ただ単に釉薬泥漿を最表面に塗布した後焼成処理す
るだけで、抗菌剤による抗菌機能及び光触媒粒子による
光触媒機能を併せて有する光触媒層を備えた施釉品を簡
単に製造することができる。[0030] In the manufacturing method according to the eighth aspect, the antibacterial agent particles are contained in the glaze slurry together with the photocatalyst particles, and the glaze slurry containing the photocatalyst particles and the antibacterial agent particles is applied to the outermost surface. According to this method, a glaze provided with a photocatalyst layer having both an antibacterial function by an antibacterial agent and a photocatalytic function by photocatalyst particles simply by applying a glaze slurry to the outermost surface and then firing. The product can be easily manufactured.
【0031】また請求項9の製造方法によれば、上記請
求項3の施釉品を容易に得ることができる。According to the manufacturing method of the ninth aspect, the glazed article of the third aspect can be easily obtained.
【0032】請求項10の製造方法は、光触媒粒子とし
てアナターゼ型の酸化チタン粒子を用い、800℃以下
の温度で焼成を行うものである。According to a tenth aspect of the present invention, anatase type titanium oxide particles are used as the photocatalyst particles, and firing is performed at a temperature of 800 ° C. or less.
【0033】酸化チタンはアナターゼ型の結晶形の下で
光触媒機能を発揮し、高温型のルチル型の下では光触媒
機能を十分発揮しない。Titanium oxide exhibits a photocatalytic function under an anatase type crystal form, and does not sufficiently exhibit a photocatalytic function under a high temperature type rutile type.
【0034】そこで請求項10の方法においては、光触
媒層を形成するための釉薬の焼成を800℃以下の温度
で行うもので、これによればアナターゼ型の酸化チタン
が焼成の過程でルチル型に結晶変化するのを防止し、焼
成により酸化チタンの光触媒機能が消失するのを防止す
ることができる。Therefore, in the method of claim 10, firing of the glaze for forming the photocatalyst layer is carried out at a temperature of 800 ° C. or less, whereby the anatase type titanium oxide is converted into rutile type during the firing process. The crystal change can be prevented, and the loss of the photocatalytic function of titanium oxide due to firing can be prevented.
【0035】尚この場合において、焼成を600℃以上
の温度で行うことが望ましい。これより低い温度である
と焼成を良好に行うことが難しくなる。In this case, it is desirable to perform the firing at a temperature of 600 ° C. or higher. If the temperature is lower than this, it is difficult to perform sintering well.
【0036】請求項11の製造方法は、光触媒層の下側
の着色層を先ず形成し、しかる後その着色層の上側に光
触媒層を形成するための釉薬泥漿を塗布処理し、そして
下側の着色層が軟化熔融しない温度条件下で、新たに塗
布した釉薬を焼成処理するもので、このようにすれば最
表層の光触媒層とその下側の着色層とが焼成により混合
拡散してしまうのを防止してそれら両層を良好に形成す
ることができる。[0036] In the manufacturing method according to the eleventh aspect, a colored layer on the lower side of the photocatalyst layer is first formed, and then, a glaze slurry for forming a photocatalyst layer is applied on the upper side of the colored layer. Under the condition that the colored layer does not soften and melt, the newly applied glaze is baked, so that the outermost photocatalyst layer and the colored layer below it are mixed and diffused by calcination. And both layers can be formed favorably.
【0037】[0037]
【実施例】次に本発明の実施例を以下に詳述する。図1
において、10は流し台12に設けられた、本発明の一
実施例である施釉品としてのホーローシンクで、図2に
示しているように基材14としてのステンレスプレート
(この例では厚み1mm)の表面に隠蔽層16,着色層
18,光触媒層20を積層して構成してある。Next, embodiments of the present invention will be described in detail. FIG.
In the figure, reference numeral 10 denotes an enamel sink as a glazed product according to one embodiment of the present invention, which is provided on a sink 12 and has a stainless plate (1 mm thick in this example) as a base material 14 as shown in FIG. The shielding layer 16, the coloring layer 18, and the photocatalyst layer 20 are laminated on the surface.
【0038】隠蔽層16は基材14の表面を隠蔽するた
めの層であって、この例では釉薬中に隠蔽剤として酸化
チタン粒子を分散状に含有させて構成した白色の層であ
る。本例ではこの隠蔽層16の厚みは40μmとされて
いる。The concealing layer 16 is a layer for concealing the surface of the substrate 14, and in this example, is a white layer formed by dispersing titanium oxide particles as a concealing agent in a glaze. In this example, the thickness of the concealing layer 16 is set to 40 μm.
【0039】着色層18はシンク10に着色を施すため
の層で、顔料を含有する釉薬からなっており、本例では
その厚みは100μmとされている。一方、光触媒層2
0はシンク10に対して光触媒機能を付与するための層
で、光触媒粒子としてアナターゼ型の酸化チタン粒子2
4を含有する、厚み20μmの透光性の薄い層である。The coloring layer 18 is a layer for coloring the sink 10 and is made of glaze containing a pigment. In this embodiment, the thickness of the coloring layer 18 is 100 μm. On the other hand, the photocatalyst layer 2
Numeral 0 is a layer for imparting a photocatalytic function to the sink 10.
4 is a light-transmitting thin layer having a thickness of 20 μm.
【0040】ここで光触媒粒子としてのアナターゼ型の
酸化チタン粒子24は粒径が30μm(二次粒子の粒
径)であり、下部が下側の着色層18に埋まり込まない
状態で、その上部が光触媒層20の釉薬の膜22表面か
ら外部に突き出す状態で釉薬の膜22に保持されてい
る。Here, the anatase type titanium oxide particles 24 as the photocatalyst particles have a particle size of 30 μm (the particle size of the secondary particles), and the lower portion is not embedded in the lower colored layer 18 and the upper portion is The photocatalyst layer 20 is held by the glaze film 22 so as to protrude from the glaze film 22 surface.
【0041】以下に上記光触媒機能を有するホーローシ
ンク10の具体的製造例を詳述する。 下記組成 フリットA 100重量部 アルミナ 20重量部 粘土 6重量部 から成る釉薬に水を加えて隠蔽層16用の釉薬泥漿を調
製した。Hereinafter, a specific production example of the enamel sink 10 having the photocatalytic function will be described in detail. Water was added to a glaze composed of 100 parts by weight of frit A, 20 parts by weight of alumina, and 6 parts by weight of clay to prepare a glaze slurry for the hiding layer 16.
【0042】尚、フリットAの組成は以下の通りであ
る。 SiO2 40% B2O3 14% Na2O 7% K2O 11% TiO2 20% NaF 8% (但し数値は重量%)The composition of the frit A is as follows. SiO 2 40% B 2 O 3 14% Na 2 O 7% K 2 O 11% TiO 2 20% NaF 8% ( although the numerical weight%)
【0043】一方これとは別に下記組成 フリットA 100重量部 粘土 6重量部 顔料 3〜5重量部 から成る釉薬に水を加えて着色層18用の釉薬泥漿を調
製した。Separately, water was added to a glaze consisting of 100 parts by weight of frit A, 6 parts by weight of clay, and 3 to 5 parts by weight of pigment to prepare a glaze slurry for the colored layer 18.
【0044】またこれと併せて下記組成 フリットB 100重量部 アナターゼ型酸化チタン 10重量部 から成る釉薬に水を加えて光触媒層20用の釉薬泥漿を
調製した。In addition, water was added to a glaze consisting of 100 parts by weight of frit B and 10 parts by weight of anatase-type titanium oxide to prepare a glaze slurry for the photocatalyst layer 20.
【0045】尚、フリットBの組成は以下の通りであ
る。 SiO2 50% Al2O3 4% B2O3 15% Na2O 17% K2O 3% CaF2 10% (但し数値は重量%) ここでアナターゼ型酸化チタンの粒径(二次粒子の粒
径)は30μmである。The composition of the frit B is as follows. SiO 2 50% Al 2 O 3 4% B 2 O 3 15% Na 2 O 17% K 2 O 3% CaF 2 10% ( although values are% by weight) particle size here anatase type titanium oxide (secondary particles Is 30 μm.
【0046】次に、上記調製した隠蔽層16用の釉薬泥
漿と着色層18用の釉薬泥漿とを、基材14の表面に、
隠蔽層16用の釉薬泥漿,着色層18用の釉薬泥漿の順
で施釉した。このときの釉薬泥漿の塗布量は、隠蔽層1
6用の釉薬泥漿の場合10cm2当り1.5g,着色層
18用の釉薬泥漿の場合10cm2当り4gとした。Next, the glaze slurry for the concealing layer 16 and the glaze slurry for the coloring layer 18 prepared above are applied to the surface of the base material 14.
The glaze for the concealing layer 16 and the glaze for the colored layer 18 were applied in this order. At this time, the coating amount of the glaze slurry is determined by the concealing layer 1
The amount of glaze for 6 was 1.5 g per 10 cm 2 and the amount of glaze for colored layer 18 was 4 g per 10 cm 2 .
【0047】その後、900℃で5分間それらを共に焼
成処理し、隠蔽層16と着色層18とを積層形成した。
このとき隠蔽層16の膜厚は40μm,着色層18の膜
厚は100μmであった。Thereafter, they were baked together at 900 ° C. for 5 minutes to form the concealing layer 16 and the colored layer 18 in a laminated manner.
At this time, the thickness of the concealing layer 16 was 40 μm, and the thickness of the coloring layer 18 was 100 μm.
【0048】次に、上記調製した光触媒層20用の釉薬
泥漿を10cm2当り1gの量で着色層18の表面に施
し、その後これを780℃で約4分間焼成処理し、着色
層18の上に光触媒層20を20μmの厚み(釉薬の膜
22の厚み)で形成した。そして下記の方法に従いその
光触媒機能を評価した。Next, the glaze slurry for the photocatalyst layer 20 prepared above was applied to the surface of the colored layer 18 in an amount of 1 g per 10 cm 2 , and then baked at 780 ° C. for about 4 minutes. The photocatalyst layer 20 was formed with a thickness of 20 μm (the thickness of the glaze film 22). And the photocatalytic function was evaluated according to the following method.
【0049】即ち、図3に示しているように上記ホーロ
ーシンク10から切り取った試験片26をガラス製セル
28内にセットし、そしてUVランプ30によりUV
(紫外線)を照射しつつ、NOを0.5ppm含む空気
を流量1.0リットル/分(相対湿度60%)で管路3
2内を流し、下流側で化学発光式NOX計34によりN
O量を測定し、光触媒機能を評価した。That is, as shown in FIG. 3, a test piece 26 cut from the enamel sink 10 was set in a glass cell 28, and a UV lamp 30
(Ultraviolet light), while supplying air containing 0.5 ppm of NO at a flow rate of 1.0 liter / min (relative humidity 60%).
2 and N is measured by a chemiluminescent NO X meter 34 on the downstream side.
The amount of O was measured, and the photocatalytic function was evaluated.
【0050】図4はその結果を表している。但し図中
(A)は実施例品(アナターゼ型酸化チタン粒子24を
光触媒層20中に保持させたもの)の測定結果を、また
(B)はそのようなアナターゼ型酸化チタン粒子24を
含有しない比較例品についての測定結果を示している。FIG. 4 shows the result. However, in the figure, (A) shows the measurement results of the example product (anatase type titanium oxide particles 24 held in the photocatalyst layer 20), and (B) does not contain such anatase type titanium oxide particles 24. The measurement result about the comparative example product is shown.
【0051】図4の結果に表われているように、本実施
例品の場合、UVを照射している間NOの量が効果的に
低減しているのに対し、アナターゼ型酸化チタン粒子を
添加していない比較例品の場合、UVを照射している間
もNO量が変化せず、本実施例品の場合良好に光触媒機
能を発現することが分かる。また本実施例品は、光触媒
層20が透光性であり且つ膜厚が薄く形成されているこ
とから、その下側の着色層18が光触媒層20を透して
表面に現出しており、着色層18の色が表面に良好に表
われていた。As shown in the results of FIG. 4, in the case of the product of this example, the amount of NO was effectively reduced during UV irradiation, while the anatase type titanium oxide particles were not used. In the case of the comparative example to which no additive was added, the NO amount did not change during UV irradiation, and it can be seen that the photocatalytic function was well exhibited in the case of the present example. Further, in the product of this example, since the photocatalyst layer 20 is translucent and formed to be thin, the colored layer 18 below the photocatalyst layer 20 appears on the surface through the photocatalyst layer 20, The color of the colored layer 18 was well represented on the surface.
【0052】次に、光触媒層20用の釉薬中に上記光触
媒粒子としてのアナターゼ型酸化チタン粒子24と併せ
て抗菌剤粒子としてのAg粒子を含有させ、上記と同様
の処理を施して図2(B)に示す積層構造のホーローシ
ンク10を得た。Next, in the glaze for the photocatalyst layer 20, Ag particles as antibacterial agents were added together with the anatase-type titanium oxide particles 24 as the photocatalyst particles, and the same treatment as described above was performed. An enamel sink 10 having a laminated structure shown in B) was obtained.
【0053】図2(B)中36はAg粒子を示すもの
で、光触媒粒子としてのアナターゼ型酸化チタン粒子2
4とは独立して釉薬の膜22内部に均一に分散した状態
となっている。In FIG. 2B, numeral 36 indicates Ag particles, and the anatase type titanium oxide particles 2 as photocatalyst particles.
4 is uniformly dispersed inside the glaze film 22.
【0054】次に、このようにして得たホーローシンク
10から試験片を切り取って、以下に示す抗菌試験に供
した。ここで抗菌試験は「抗菌加工製品の抗菌力試験法
I(1995年度版)フィルム密着法」に準じて実施し
た。Next, a test piece was cut out from the enamel sink 10 thus obtained and subjected to the following antibacterial test. Here, the antibacterial test was carried out according to “Antibacterial Test Method for Antibacterial Products I (1995 Edition) Film Adhesion Method”.
【0055】具体的な試験方法は以下の通りである。 <抗菌性評価方法> 1)試験方法 検体(30mm×30mm)を滅菌スクリューコップ
(30mml)に入れ、検体の試験面に大腸菌(Escher
ichia coli IFO 3301)、黄色ブドウ球菌(Staphylococc
us aureus IFO 12732)及びメチシリン耐性黄色ブドウ
球菌(Staphylococcus aureus IID 1677)の菌液をそれ
ぞれ滴下して37℃で保存し、保存24時間後の生菌数
を測定した。 2)菌液の調製 普通寒天斜面培地で37℃、24時間培養した試験菌の
菌体を普通ブイヨン培地に接種し、37℃、8時間振と
う培養した。次に、この培養液をリン酸緩衝液生理食塩
水で希釈、1/500濃度普通ブイヨン培地で菌数が
8.0×105〜4.0×106となるように希釈し、菌
液とした。検体の試験面に菌液0.05mlを滴下し、
保存容器の蓋をして相対湿度90%以上のデシケーター
内で37℃、24時間保存後に検体の生菌数を測定し
た。 3)生菌数の測定 検体を生理食塩水5mlでそれぞれ洗い出し、この洗い
出し液について普通寒天培地を用いた混釈平板培養法
(37℃、24時間培養)により生菌数を測定し、検体
当たりに換算した。 減菌率(%)=((A−B)/A)×100 A:保存24時間後の比較品(Ag非含有品)の生菌数
の平均値 B:保存24時間後の本実施例品の生菌数の平均値 以上の抗菌試験の結果、本実施例品の場合、減菌率は9
9%以上となっており、良好な抗菌性能を示した。The specific test method is as follows. <Antibacterial evaluation method> 1) Test method A sample (30 mm x 30 mm) was placed in a sterile screw cup (30 mml), and Escherichia coli (Escher) was placed on the test surface of the sample.
ichia coli IFO 3301), Staphylococc
us aureus IFO 12732) and bacterial solutions of methicillin-resistant Staphylococcus aureus IID 1677 were respectively dropped and stored at 37 ° C, and the viable cell count 24 hours after storage was measured. 2) Preparation of bacterial solution The cells of the test bacterium cultured at 37 ° C. for 24 hours on a normal agar slant medium were inoculated into a normal bouillon medium, and cultured with shaking at 37 ° C. for 8 hours. Next, this culture solution was diluted with a phosphate buffered saline, and diluted with a 1/500 concentration ordinary broth medium so that the number of bacteria was 8.0 × 10 5 to 4.0 × 10 6. And 0.05 ml of bacterial solution is dropped on the test surface of the sample,
The storage container was covered and stored in a desiccator at a relative humidity of 90% or more at 37 ° C. for 24 hours, and the viable cell count of the sample was measured. 3) Measurement of viable cell count Specimens were washed out with 5 ml of physiological saline, and the number of viable cells was measured by a pour plate method (cultured at 37 ° C for 24 hours) using a normal agar medium. Was converted to Sterilization rate (%) = ((A−B) / A) × 100 A: Average value of viable cell count of comparative product (Ag-free product) after storage for 24 hours B: This example after storage for 24 hours As a result of the antibacterial test above the average viable cell count of the product, the sterilization rate was 9
9% or more, indicating good antibacterial performance.
【0056】以上本発明の実施例を詳述したがこれはあ
くまで一例示である。例えば本発明は上記ホーロー製品
のみならず、基材が陶磁器,その他の材質から成るもの
にも適用可能であるし、また上記着色層と隠蔽層を必ず
しも二層に分ける場合のみならず、それらを一つの層で
兼用させることも可能である。The embodiment of the present invention has been described in detail above, but this is merely an example. For example, the present invention is applicable not only to the above-mentioned enameled products, but also to those whose base material is made of ceramics or other materials. Further, the present invention is not limited to the case where the colored layer and the concealing layer are necessarily divided into two layers. It is also possible to use a single layer.
【0057】その他抗菌剤粒子として上記Ag粒子以外
のものを用いることも可能であるなど、本発明はその主
旨を逸脱しない範囲において種々変更を加えた形態・態
様で構成・実施可能である。The present invention can be constituted and implemented in various modified forms and modes without departing from the gist of the invention, such as using other particles than the above-mentioned Ag particles as the antibacterial agent particles.
【図1】本発明の一実施例であるホーローシンクを流し
台への設置状態で示す図である。FIG. 1 is a diagram showing an engraved sink according to an embodiment of the present invention installed on a sink.
【図2】図1のホーローシンクの断面構造を模式的に表
す図である。FIG. 2 is a diagram schematically illustrating a cross-sectional structure of the engraved sink of FIG.
【図3】同実施例品の光触媒機能の評価試験の方法を示
す図である。FIG. 3 is a view showing a method of an evaluation test of a photocatalytic function of the product of the example.
【図4】図3の試験方法により得られた測定結果を表す
図である。FIG. 4 is a diagram showing measurement results obtained by the test method of FIG.
14 基材 16 隠蔽層 18 着色層 20 光触媒層 22 膜 24 アナターゼ型酸化チタン粒子(光触媒粒子) 36 Ag粒子(抗菌剤粒子) Reference Signs List 14 base material 16 concealing layer 18 coloring layer 20 photocatalytic layer 22 film 24 anatase type titanium oxide particles (photocatalytic particles) 36 Ag particles (antibacterial agent particles)
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 FI B01J 35/02 B01J 35/02 J C04B 41/86 C04B 41/86 R // A01N 25/34 A01N 25/34 Z 59/16 59/16 Z A 59/20 59/20 Z ────────────────────────────────────────────────── ─── Continued on the front page (51) Int.Cl. 6 Identification code FI B01J 35/02 B01J 35/02 J C04B 41/86 C04B 41/86 R // A01N 25/34 A01N 25/34 Z 59/16 59 / 16Z A 59/20 59 / 20Z
Claims (11)
し、該光触媒層は、光触媒粒子の凝集体である二次粒子
の大きさよりも膜厚が薄く形成された透光性の釉薬の膜
中に、該二次粒子の上部が該釉薬の膜表面から外部に突
き出し、下部が該釉薬の膜より下側の層に埋まり込まな
い状態で且つ該釉薬の膜の下側の層が該釉薬の膜を透し
て表面に見える状態で分散状に含有されて構成されてい
ることを特徴とする光触媒機能を有する施釉品。Claims: 1. A light-transmitting layer having a substrate and a photocatalyst layer as an outermost layer, wherein the photocatalyst layer is formed to have a thickness smaller than the size of secondary particles that are aggregates of photocatalyst particles. In the glaze film, the upper part of the secondary particles protrudes outside from the glaze film surface, and the lower part is not embedded in the lower layer of the glaze film and the lower layer of the glaze film Characterized in that they are dispersed and contained so that they can be seen on the surface through a film of the glaze.
し、該光触媒層は、光触媒粒子とそれに加えてAg,C
u,Znの一種若しくは二種以上を抗菌成分とする抗菌
剤の粒子とが分散状に含有されていることを特徴とする
光触媒機能を有する施釉品。2. A photocatalyst layer comprising a substrate and a photocatalyst layer as an outermost layer, wherein the photocatalyst layer comprises photocatalyst particles and, in addition, Ag, C
A glazed product having a photocatalytic function, characterized by containing particles of an antibacterial agent containing one or more of u and Zn as antibacterial components.
触媒粒子の凝集体である二次粒子の大きさよりも膜厚が
薄く形成された透光性の釉薬の膜中に、該二次粒子の上
部が該釉薬の膜表面から外部に突き出し、下部が該釉薬
の膜より下側の層に埋まり込まない状態で且つ該釉薬の
膜の下側の層が該釉薬の膜を透して表面に見える状態で
分散状に含有されて構成されていることを特徴とする光
触媒機能を有する施釉品。3. The photocatalytic layer according to claim 2, wherein the secondary particles are formed in a light-transmitting glaze film having a thickness smaller than that of the secondary particles, which are aggregates of the photocatalytic particles. The upper part protrudes outside from the glaze film surface, and the lower part is not embedded in the layer below the glaze film, and the lower layer of the glaze film is exposed through the glaze film. A glazed product having a photocatalytic function, characterized in that it is contained in a dispersed state in a state where it can be seen.
記光触媒粒子がアナターゼ型の酸化チタン粒子であるこ
とを特徴とする光触媒機能を有する施釉品。4. The glazed product having a photocatalytic function according to claim 1, wherein the photocatalytic particles are titanium oxide particles of anatase type.
触媒層の下側には、該光触媒層よりも厚みの厚い着色層
が形成されていることを特徴とする光触媒機能を有する
施釉品。5. The glaze product having a photocatalytic function according to claim 1, wherein a colored layer thicker than the photocatalyst layer is formed below the photocatalyst layer. .
あって前記基材の上側に、該基材の表面を隠蔽する隠蔽
層が形成されていることを特徴とする光触媒機能を有す
る施釉品。6. The photocatalytic function according to claim 5, wherein a concealing layer for concealing the surface of the base material is formed below the colored layer and above the base material. Glazed products.
し、該光触媒層は、光触媒粒子の凝集体である二次粒子
の大きさよりも膜厚が薄く形成された透光性の釉薬の膜
中に、該二次粒子の上部が該釉薬の膜表面から外部に突
き出し、下部が該釉薬の膜より下側の層に埋まり込まな
い状態で且つ該釉薬の膜の下側の層が該釉薬の膜を透し
て表面に見える状態で分散状に含有されて構成されてい
る施釉品の製造方法であって前記光触媒層を形成するた
めの釉薬の泥漿中に前記光触媒粒子を混合分散させ、該
光触媒粒子含有の釉薬の泥漿を、焼成後の釉薬の膜の厚
みが前記二次粒子の大きさよりも薄くなる膜厚で最表面
に塗布した後、前記基材の軟化温度以下の温度で焼成処
理することを特徴とする光触媒機能を有する施釉品の製
造方法。7. A light-transmitting material having a base material and a photocatalyst layer as an outermost layer, wherein the photocatalyst layer is formed to have a thickness smaller than the size of secondary particles that are aggregates of photocatalyst particles. In the glaze film, the upper part of the secondary particles protrudes outside from the glaze film surface, and the lower part is not embedded in the lower layer of the glaze film and the lower layer of the glaze film Is a method for producing a glazed product which is contained in a dispersed state in a state where it can be seen through a film of the glaze, wherein the photocatalyst particles are mixed in a glaze slurry for forming the photocatalyst layer. After being dispersed and coated on the outermost surface of the glaze slurry containing the photocatalyst particles with a thickness such that the thickness of the fired glaze film is smaller than the size of the secondary particles, the temperature is lower than the softening temperature of the base material. A method for producing a glazed product having a photocatalytic function, characterized by firing at a temperature.
し、該光触媒層は、光触媒粒子とそれに加えてAg,C
u,Znの一種若しくは二種以上を抗菌成分とする抗菌
剤の粒子とが釉薬の膜中に分散状に含有されて構成され
ている施釉品の製造方法であって前記光触媒層を形成す
るための釉薬の泥漿中に前記光触媒粒子と前記抗菌剤の
粒子とを混合分散させ、それら光触媒粒子及び抗菌剤粒
子含有の釉薬の泥漿を最表面に塗布した後、前記基材の
軟化温度以下の温度で焼成処理することを特徴とする光
触媒機能を有する施釉品の製造方法。8. A photocatalyst layer comprising a substrate and a photocatalyst layer as an outermost layer, wherein the photocatalyst layer comprises photocatalyst particles and, in addition thereto, Ag, C
A method for producing a glazed product comprising particles of an antibacterial agent containing one or more of u and Zn as antibacterial components in a state of being dispersed in a glaze film to form the photocatalyst layer. After mixing and dispersing the photocatalyst particles and the antibacterial agent particles in the glaze slurry, and applying the photocatalyst particles and the antibacterial agent-containing glaze slurry to the outermost surface, the temperature is equal to or lower than the softening temperature of the base material. A method for producing a glazed product having a photocatalytic function, characterized by performing a baking treatment.
触媒粒子の凝集体である二次粒子の大きさよりも膜厚が
薄く形成された透光性の釉薬の膜中に、該二次粒子の上
部が該釉薬の膜表面から外部に突き出し、下部が該釉薬
の膜より下側の層に埋まり込まない状態で且つ該釉薬の
膜の下側の層が該釉薬の膜を透かして表面に見える状態
で分散状に含有されて構成されている施釉品を製造する
に際し、前記光触媒粒子及び抗菌剤の粒子含有の釉薬の
泥漿を、焼成後の釉薬の膜の厚みが該光触媒粒子の凝集
体である二次粒子の大きさよりも薄くなる膜厚で最表面
に塗布することを特徴とする施釉品の製造方法。9. The method according to claim 8, wherein the photocatalyst layer is formed in a translucent glaze film having a thickness smaller than the size of the secondary particles which are aggregates of the photocatalyst particles. The upper part protrudes outside from the glaze film surface, the lower part is not embedded in the layer below the glaze film, and the lower layer of the glaze film is exposed through the glaze film on the surface. In producing a glazed product constituted to be contained in a dispersed state in a visible state, the thickness of the glaze film containing the photocatalyst particles and the antibacterial agent containing the glaze after firing is reduced to an aggregate of the photocatalyst particles. A method for producing a glazed product, characterized in that it is applied to the outermost surface with a film thickness smaller than the size of the secondary particles.
前記光触媒粒子としてアナターゼ型の酸化チタン粒子を
用い、前記焼成処理を800℃以下の温度で行うことを
特徴とする光触媒機能を有する施釉品の製造方法。10. The method according to any one of claims 7, 8, and 9,
A method for producing a glazed product having a photocatalytic function, wherein anatase-type titanium oxide particles are used as the photocatalyst particles, and the firing treatment is performed at a temperature of 800 ° C or less.
て、前記光触媒層を形成するための釉薬の泥漿を塗布処
理するに先立って、先ず該光触媒層の下側の該光触媒層
より厚みの厚い着色層形成用の、該光触媒層用の釉薬の
より高耐火度の且つ着色剤含有の釉薬の泥漿を塗布した
上、前記基材の軟化温度以下の温度で焼成処理して該着
色層を形成し、しかる後前記光触媒層を形成するための
釉薬泥漿を塗布した上、該着色層が軟化熔融しない温度
条件下で焼成処理することを特徴とする光触媒機能を有
する施釉品の製造方法。11. The photocatalyst layer according to claim 7, wherein the thickness of the photocatalyst layer is lower than that of the photocatalyst layer prior to the application of the glaze slurry for forming the photocatalyst layer. For the formation of a thick colored layer, the glaze for the photocatalyst layer is coated with a slurry of a glaze having a higher degree of fire resistance and containing a colorant, and then calcined at a temperature equal to or lower than the softening temperature of the base material. A method for producing a glazed product having a photocatalytic function, comprising forming, then applying a glaze slurry for forming the photocatalyst layer, and baking under a temperature condition at which the colored layer does not soften and melt.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9309906A JPH11131261A (en) | 1997-10-24 | 1997-10-24 | Glazed article having photocatalysis function and its production |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9309906A JPH11131261A (en) | 1997-10-24 | 1997-10-24 | Glazed article having photocatalysis function and its production |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH11131261A true JPH11131261A (en) | 1999-05-18 |
Family
ID=17998768
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9309906A Pending JPH11131261A (en) | 1997-10-24 | 1997-10-24 | Glazed article having photocatalysis function and its production |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH11131261A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11192436A (en) * | 1996-12-10 | 1999-07-21 | Toto Ltd | Photocatalyst compound, photocatalyst-containing material, material having photocatalytic function and production thereof |
JP2001232215A (en) * | 2000-02-25 | 2001-08-28 | Nippon Soda Co Ltd | Photocatalyst carrying structure having antibacterial and antifungal effect |
US7754648B2 (en) | 1997-12-10 | 2010-07-13 | Toto Ltd. | Photocatalytic hydrophilifiable material |
-
1997
- 1997-10-24 JP JP9309906A patent/JPH11131261A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11192436A (en) * | 1996-12-10 | 1999-07-21 | Toto Ltd | Photocatalyst compound, photocatalyst-containing material, material having photocatalytic function and production thereof |
US7754648B2 (en) | 1997-12-10 | 2010-07-13 | Toto Ltd. | Photocatalytic hydrophilifiable material |
US8034309B2 (en) | 1997-12-10 | 2011-10-11 | Toto Ltd | Photocatalytic process using hydrophilifiable material |
JP2001232215A (en) * | 2000-02-25 | 2001-08-28 | Nippon Soda Co Ltd | Photocatalyst carrying structure having antibacterial and antifungal effect |
JP4549477B2 (en) * | 2000-02-25 | 2010-09-22 | 日本曹達株式会社 | Photocatalyst carrying structure having antibacterial and antifungal effects |
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