JPH1112797A - Aluminum-made heat radiating plate and production thereof - Google Patents

Aluminum-made heat radiating plate and production thereof

Info

Publication number
JPH1112797A
JPH1112797A JP17043797A JP17043797A JPH1112797A JP H1112797 A JPH1112797 A JP H1112797A JP 17043797 A JP17043797 A JP 17043797A JP 17043797 A JP17043797 A JP 17043797A JP H1112797 A JPH1112797 A JP H1112797A
Authority
JP
Japan
Prior art keywords
sealing
aluminum
treatment
anodic
heat radiating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17043797A
Other languages
Japanese (ja)
Inventor
Hideo Hotta
日出男 堀田
Yoichi Miura
陽一 三浦
Yoshio Hirayama
良夫 平山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Nippon Light Metal Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Nippon Light Metal Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd, Nippon Light Metal Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP17043797A priority Critical patent/JPH1112797A/en
Publication of JPH1112797A publication Critical patent/JPH1112797A/en
Pending legal-status Critical Current

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  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a heat radiating plate for semi-conductor device having high adhesion with a synthetic resin for sealing without developing the crack and lowering the heat radiating property by applying an anodic-oxidized film having a specific sealing degree value on an aluminum or aluminum alloy plate. SOLUTION: The anodic-oxidizing treatment is executed to the aluminum or aluminum alloy plate by using sulfuric acid acidic bath, etc., to improve the corrosion resistance and decolativeness on the surface. A sealing treatment is applied to the anodic-oxidized film formed by the above treatment by using boiled water bath dissolving a sealing assist agent of metallic salt, etc., and the sealing degree value of the anodic-oxidized film is regulated to >=80 mg/dm<2> . Further, if necessary, a dipping treatment to the plate is executed in nitric acid of about 30% concn. at about 20 deg.C for about 45 sec and then, the enlargement of fine hole in the anodic-oxidizing film and the recovery of surface activation can be contrived. After this sealing treatment, a heat treatment is executed at >=180 deg.C to the anodic-oxidized film. By this method, the aluminum or aluminum alloy-made heat radiating plate having high adhesion with the synthetic resin for sealing the semi-conductor device and excellent heat radiation, is obtd.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、アルミニウムまた
はアルミニウム合金製放熱板に関し、とくに半導体素子
を搭載する樹脂封止型の半導体装置(プラスチックパッ
ケージ)に搭載するアルミニウムまたはアルミニウム合
金製放熱板に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a radiator plate made of aluminum or an aluminum alloy, and more particularly to a radiator plate made of aluminum or an aluminum alloy mounted on a resin-sealed semiconductor device (plastic package) having a semiconductor element mounted thereon.

【0002】[0002]

【従来の技術】集積回路を搭載した半導体装置は電子機
器の小型高性能化に対応し、集積度の増大、高機能化等
に伴い、熱的特性、電気的特性、信頼性などの観点から
各種構造のパッケージが提案されている。特に、広く用
いられている樹脂で封止したプラスチックパッケージ型
半導体装置においては発熱量の増大に対応して、放熱板
を設けることが行われている。放熱特性を向上するため
には、放熱板の材料として、熱伝導率の高い銅、アルミ
ニウムが用いられている。これらのうちでもアルミニウ
ムまたはアルミニウム合金(以下において、これらを単
にアルミニウムとも称する)が重量が軽い等の理由で広
く用いられている。放熱板は、外部への熱の放出を良好
とするために、樹脂中にモールドされると共に放熱板の
一部を樹脂の外部に露出させ、回路基板あるいは雰囲気
等へ熱の放出を行っており、アルミニウムあるいはその
合金表面の耐食性を高めたり、化粧性の観点から陽極酸
化処理が施される。
2. Description of the Related Art A semiconductor device equipped with an integrated circuit is compatible with the miniaturization and high performance of electronic equipment. Packages of various structures have been proposed. In particular, in a plastic package type semiconductor device sealed with a resin widely used, a heat radiating plate is provided to cope with an increase in heat generation. In order to improve the heat radiation characteristics, copper and aluminum having high thermal conductivity are used as the material of the heat radiation plate. Among them, aluminum or aluminum alloy (hereinafter, also simply referred to as aluminum) is widely used because of its light weight and the like. The radiator plate is molded into the resin and exposes part of the radiator plate to the outside of the resin to release the heat to the circuit board or the atmosphere in order to improve the heat release to the outside. Anodizing treatment is performed from the viewpoint of enhancing the corrosion resistance of the surface of aluminum or its alloy or from the viewpoint of cosmetics.

【0003】アルミニウムまたはアルミニウム合金から
なる放熱板を樹脂によって封止した場合に、アルミニウ
ムまたはその合金との間に間隙が生じたり、密着性が不
充分であると放熱性が著しく低下する。また、間隙が生
じると発熱による温度上昇時に封止樹脂のクラック発生
を誘発するので、放熱板と樹脂との間には高い密着性が
要求されている。
When a heat radiating plate made of aluminum or an aluminum alloy is sealed with a resin, if a gap is formed between the heat radiating plate and the aluminum or its alloy or if the adhesiveness is insufficient, the heat radiating property is significantly reduced. In addition, if a gap is formed, a crack in the sealing resin is induced when the temperature rises due to heat generation, so that high adhesion is required between the heat sink and the resin.

【0004】[0004]

【発明が解決しようとする課題】本発明は、アルミニウ
ムまたはアルミニウム合金からなる放熱板において、半
導体装置の封止用に用いる合成樹脂との密着性を高める
ことを課題とするものであり、放熱板と合成樹脂との密
着性を高め、封止用合成樹脂と放熱板の界面からクラッ
クを生じたり、放熱性の低下を生じることがないアルミ
ニウム製放熱板を提供することを課題とするものであ
る。
SUMMARY OF THE INVENTION An object of the present invention is to improve the adhesion of a heat sink made of aluminum or an aluminum alloy to a synthetic resin used for sealing a semiconductor device. It is an object of the present invention to provide an aluminum heat radiating plate that enhances the adhesion between the heat sink and a synthetic resin, and does not cause cracks at the interface between the sealing synthetic resin and the heat radiating plate and does not cause a decrease in heat radiation. .

【0005】[0005]

【課題を解決するための手段】本発明は、アルミニウム
またはアルミニウム合金製放熱板において、放熱板に施
した陽極酸化被膜の封孔度値が80mg/dm2 以上で
あるアルミニウムまたはアルミニウム合金製放熱板であ
る。また、アルミニウムまたはアルミニウム合金製放熱
板の製造方法において、陽極酸化処理の後に陽極酸化皮
膜を封孔度値が80mg/dm2 以上となるように封孔
処理し、次いで180℃以上で熱処理するアルミニウム
またはアルミニウム合金製放熱板の製造方法である。
SUMMARY OF THE INVENTION The present invention relates to a heat sink made of aluminum or aluminum alloy, wherein the anodic oxide coating applied to the heat sink has a sealing value of 80 mg / dm 2 or more. It is. Further, in the method for producing a heat sink made of aluminum or aluminum alloy, after the anodizing treatment, the anodized film is sealed so as to have a sealing degree value of 80 mg / dm 2 or more, and then heat-treated at 180 ° C. or more. Or a method of manufacturing an aluminum alloy radiator plate.

【0006】[0006]

【発明の実施の形態】アルミニウムあるいはアルミニウ
ム合金の耐食性の改善の目的で陽極酸化処理によって形
成された酸化皮膜には、微細孔が形成されている。微細
孔は染色等による着色、機能性の付与に有用であるが、
その反面、皮膜表面は吸着性が大きく、汚染されやす
く、また耐食性を低下させるという問題点もあった。そ
こで、皮膜に形成された微細孔を塞ぎ耐食性を向上させ
る目的で封孔処理が行われており、沸騰水中での煮沸処
理、酢酸ニッケル、クロム酸塩等の水溶液中での処理等
が行われている。
DESCRIPTION OF THE PREFERRED EMBODIMENTS An oxide film formed by anodic oxidation for the purpose of improving the corrosion resistance of aluminum or an aluminum alloy has fine pores. Micropores are useful for coloring by coloring etc., and for imparting functionality,
On the other hand, there is a problem that the film surface has a large adsorptivity, is easily contaminated, and lowers corrosion resistance. Therefore, sealing treatment is performed for the purpose of closing the micropores formed in the film and improving corrosion resistance, such as boiling treatment in boiling water, treatment in an aqueous solution of nickel acetate, chromate, or the like. ing.

【0007】封孔処理を施すことによりアルミニウムま
たはアルミニウム合金は、耐食性等の面で優れた特性の
ものが得られるが、封孔処理を行った放熱板を、樹脂封
止パッケージに用いると、封孔処理を行わないものに比
べて封止用の樹脂との密着性が低下することが明らかと
なった。
[0007] By performing the sealing treatment, aluminum or an aluminum alloy can have excellent characteristics such as corrosion resistance. However, if the heat-dissipating plate subjected to the sealing treatment is used for a resin-sealed package, the aluminum or aluminum alloy can be sealed. It became clear that the adhesion to the sealing resin was lower than that in which no hole treatment was performed.

【0008】そこで、本発明者等は、封孔処理を行った
放熱板について鋭意検討した結果、封孔度が密着性に影
響を与えていることを見出したものである。すなわち、
リン酸クロム酸法によって測定した封孔度が80mg/
dm2 よりも大きな場合に、密着性が優れるとともに、
プラスチックパッケージにクラックが生じないものが得
られることを見出したものである。
Therefore, the present inventors have conducted intensive studies on the heat-dissipating plate which has been subjected to the sealing treatment, and as a result, have found that the degree of sealing affects the adhesion. That is,
The degree of sealing measured by the chromic phosphate method is 80 mg /
When it is larger than dm 2 , the adhesiveness is excellent,
It has been found that a plastic package free of cracks can be obtained.

【0009】本発明の放熱板は、個別の放熱板に機械加
工したアルミニウムあるいはアルミニウム合金に処理を
施す場合のみではなく、アルミニウムあるいはアルミニ
ウム合金等の長尺等の部材から多数の放熱板を切断して
製造する場合には、切断前の部材を本発明の方法によっ
て処理をした後に、所定の大きさに切断加工しても良
い。この場合には、切断面は本発明の処理が施されない
でモールド化されるが、切断面は板状の部材の端面であ
るので、放熱板のモールド化される面積に比べてごくわ
ずかでありモールドする樹脂との密着性に悪影響を及ぼ
すことはない。
The heat radiating plate of the present invention is not limited to a case in which aluminum or an aluminum alloy machined into an individual heat radiating plate is processed, but a large number of heat radiating plates are cut from a long member such as aluminum or an aluminum alloy. In the case of manufacturing by cutting, the member before cutting may be processed by the method of the present invention and then cut into a predetermined size. In this case, the cut surface is molded without performing the treatment of the present invention, but since the cut surface is the end surface of the plate-shaped member, the cut surface is very small compared to the area to be molded of the heat sink. It does not adversely affect the adhesion to the resin to be molded.

【0010】本発明におけるリン酸クロム酸法による封
孔度の測定は、リン酸35ml/lとクロム酸20g/
lを含有する38℃の水溶液中に15分間浸漬し、重量
減少を測定したものである(アルミニウム表面処理研究
組合規格ARS−2321)。腐食環境の厳しい屋外で
使用するアルミニウム建材等の場合には、リン酸クロム
酸法による封孔度の値は20mg/dm2 以下の封孔処
理が完全に行われた状態とすることが望ましいとされて
いる。ところが、この様な封孔度では、モールドした樹
脂との十分な密着性が得られず、また封孔度が80mg
/dm2 以下では、プラスチックパッケージにクラック
が発生することは避けられなかった。
In the present invention, the measurement of the sealing degree by the chromic acid phosphate method is carried out by measuring 35 ml / l phosphoric acid and 20 g / chromic acid.
1 was immersed in an aqueous solution at 38 ° C. for 15 minutes, and the weight loss was measured (ARS-2321 standard for aluminum surface treatment research association). In the case of aluminum building materials used outdoors where the corrosive environment is severe, it is preferable that the value of the degree of sealing by the chromic acid phosphate method is 20 mg / dm 2 or less, and that the sealing treatment is completely performed. Have been. However, with such a degree of sealing, sufficient adhesion with the molded resin cannot be obtained, and the sealing degree is 80 mg.
At / dm 2 or less, the occurrence of cracks in the plastic package was inevitable.

【0011】本発明の放熱板の封孔処理は、金属塩、フ
ッ素化物系の封孔助剤を溶解した水を沸騰した浴を用い
ることができ、具体的には酢酸ニッケル5g/l、ホウ
酸5g/lの浴を用いることができる。本発明の放熱板
の陽極酸化処理は、硫酸、シュウ酸、その他の有機酸及
びそれらの混酸等の酸性浴を用いることが好ましく、一
例を挙げれば、130〜180g/lの硫酸と1〜10
g/lのアルミニウム成分を含有する浴を挙げることが
できる。
The heat-radiating plate of the present invention can be sealed by using a bath in which water in which a metal salt or a fluorinated sealing aid is dissolved is boiled. Specifically, nickel acetate 5 g / l, borane A bath of 5 g / l of acid can be used. The anodic oxidation treatment of the heat sink of the present invention is preferably performed using an acid bath such as sulfuric acid, oxalic acid, other organic acids and their mixed acids. For example, 130 to 180 g / l sulfuric acid and 1 to 10 g
Baths containing g / l of an aluminum component can be mentioned.

【0012】また、本発明の放熱板は、封孔処理前また
は封孔処理後の少なくともいずれか一方の時点で硝酸に
浸漬処理することによって、更に密着性を向上すること
ができる。封孔処理前に硝酸に浸漬すると、封孔度値が
増加するのみではなく、陽極酸化皮膜の細孔を拡大し、
その結果完全に封孔処理で埋めるに至らない細孔を生ず
ることになる。また、封孔後の浸漬処理は封孔面を一部
溶解し、表面活性を回復すると共に、凹凸を生じせしめ
ることができ、これらの処理によって放熱板とプラスチ
ックパッケージの樹脂との密着性を改善することができ
る。例えば、硝酸に浸漬して処理する場合には、濃度3
0重量%の硝酸に、温度20℃で45秒間浸漬した後
に、水洗乾燥することが好ましい。
Further, the heat sink of the present invention can be further improved in adhesion by immersing it in nitric acid before and / or after the sealing treatment. When immersed in nitric acid before the sealing treatment, not only increases the sealing degree value, but also enlarges the pores of the anodic oxide film,
As a result, pores that cannot be completely filled by the sealing treatment are generated. In addition, the immersion treatment after sealing can partially dissolve the sealing surface, recover the surface activity, and generate irregularities. These treatments improve the adhesion between the heat sink and the resin of the plastic package. can do. For example, when the treatment is performed by immersing in nitric acid, a concentration of 3
After immersion in 0% by weight of nitric acid at a temperature of 20 ° C. for 45 seconds, it is preferable to wash and dry with water.

【0013】[0013]

【実施例】以下に、実施例を示し本発明をさらに詳細に
説明する。 実施例1 板厚1.5mmのAl−2%Fe合金を24mm角に切
断し、プレス加工により段付け加工して試験片とし、1
6重量%硫酸浴中で鉛極を対極として、浴温度15℃、
電流密度2A/dm2 、通電時間38分間の陽極酸化処
理をし、25μmの皮膜を形成した。次いで、酢酸ニッ
ケル5g/l、ホウ酸6g/lを水に溶解し、酢酸およ
び水酸化ナトリウムを加えてpHを5〜6の範囲に調整
したニッケル塩系封孔助剤を添加した90℃の水中で5
分間封孔処理した。皮膜色は濃い灰色であった。封孔処
理後の試験片をリン酸35ml/lとクロム酸20g/
lを含む水溶液(38℃)に7分間浸漬し、その重量減
少量を測定した。減少量は180mg/dm2 であっ
た。次いで、この試験片をエポキシ樹脂(日東電工社製
MP−190M)を用いてモールドしてモールド試験
片を作製した。モールド試験片を300℃に加熱してク
ラック発生試験を行った。試験を行った20個のうちク
ラックを生じたモールド試験片はなかった。
The present invention will be described in more detail with reference to the following examples. Example 1 A 1.5 mm-thick Al-2% Fe alloy was cut into 24 mm squares, and stepped by press working to obtain test pieces.
A bath temperature of 15 ° C. in a 6% by weight sulfuric acid bath with a lead electrode as a counter electrode,
Anodizing treatment was performed at a current density of 2 A / dm 2 and a conduction time of 38 minutes to form a film having a thickness of 25 μm. Next, 5 g / l of nickel acetate and 6 g / l of boric acid were dissolved in water, and a nickel salt-based sealing aid whose pH was adjusted to 5 to 6 by adding acetic acid and sodium hydroxide was added. 5 in the water
Sealed for minutes. The film color was dark gray. The test piece after the sealing treatment was treated with phosphoric acid 35 ml / l and chromic acid 20 g /
The resultant was immersed in an aqueous solution (38 ° C.) containing 1 for 7 minutes, and the weight loss was measured. The decrease was 180 mg / dm 2 . Next, this test piece was molded using an epoxy resin (MP-190M manufactured by Nitto Denko Corporation) to produce a mold test piece. The mold test piece was heated to 300 ° C. to perform a crack generation test. There were no cracked mold test pieces among the 20 tested.

【0014】実施例2 板厚1.5mmのAl−2%Fe合金を24mm角に切
断し、プレス加工により段付け加工して試験片とし、1
6重量%硫酸浴中で鉛極を対極として、浴温度15℃、
電流密度1.5A/dm2 、通電時間30分間の陽極酸
化処理をし、15μmの皮膜を形成した。次いで、酢酸
ニッケル5g/l、ホウ酸6g/lを水に溶解し、酢酸
および水酸化ナトリウムを加えてpHを5〜6の範囲に
調整したニッケル塩系封孔助剤を添加した75℃の水中
で20分間封孔処理した。皮膜色は濃い灰色であった。
封孔処理後の試験片をリン酸35ml/lとクロム酸2
0g/lを含む水溶液(38℃)に15分間浸漬し、そ
の重量減少量を測定した。減少量は130mg/dm2
であった。次いで、この試験片をエポキシ樹脂(日東電
工社製 MP−190M)を用いてモールドしてモール
ド試験片を作製した。モールド試験片を300℃に加熱
してクラック発生試験を行った。試験を行った20個の
うちクラックを生じたモールド試験片はなかった。
Example 2 An Al-2% Fe alloy having a thickness of 1.5 mm was cut into 24 mm squares, and stepped by press working to obtain test pieces.
A bath temperature of 15 ° C. in a 6% by weight sulfuric acid bath with a lead electrode as a counter electrode,
Anodizing treatment was performed at a current density of 1.5 A / dm 2 and a conduction time of 30 minutes to form a film having a thickness of 15 μm. Next, 5 g / l of nickel acetate and 6 g / l of boric acid were dissolved in water, and a nickel salt-based sealing aid whose pH was adjusted to 5 to 6 by adding acetic acid and sodium hydroxide was added at 75 ° C. Sealing treatment was performed in water for 20 minutes. The film color was dark gray.
The test piece after the sealing treatment was treated with phosphoric acid 35 ml / l and chromic acid 2
It was immersed in an aqueous solution (38 ° C.) containing 0 g / l for 15 minutes, and the weight loss was measured. The amount of reduction is 130 mg / dm 2
Met. Next, this test piece was molded using an epoxy resin (MP-190M manufactured by Nitto Denko Corporation) to produce a mold test piece. The mold test piece was heated to 300 ° C. to perform a crack generation test. There were no cracked mold test pieces among the 20 tested.

【0015】実施例3 板厚0.8mmのAl−2%Fe−0.5%Mn合金を
直径22mmの円形にプレス加工で成形し、さらにプレ
ス加工により段付け加工をして試験片とした後、濃度1
6重量%硫酸浴中で鉛極を対極として、浴温度10℃、
電流密度1.5A/dm2 、通電時間30分間の条件で
陽極酸化処理をし、15μmの皮膜を形成した。次い
で、濃度80ppmとなるようにピロリン酸ナトリウム
を溶解した水溶液中で100℃において、10分間封孔
処理した。封孔処理後の試験片をリン酸35ml/lと
クロム酸20g/lを含む温度38℃の水溶液に15分
間浸漬し、その重量減少量を測定した。減少量は125
mg/dm2 であった。得られた封孔後の試験片をエポ
キシ樹脂(日東電工社製MP−7400)を用いてモー
ルドしてモールド試験片とした。モールド試験片を30
0℃に加熱してクラック発生試験を行った。試験を行っ
た20個のうちクラックを生じたモールド試験片はなか
った。
Example 3 An Al-2% Fe-0.5% Mn alloy having a thickness of 0.8 mm was formed into a circular shape having a diameter of 22 mm by press working, and further stepped by press working to obtain a test piece. Later, concentration 1
In a 6% by weight sulfuric acid bath, with a lead electrode as a counter electrode, a bath temperature of 10 ° C.,
Anodizing treatment was performed under the conditions of a current density of 1.5 A / dm 2 and an energizing time of 30 minutes to form a 15 μm film. Next, sealing treatment was performed for 10 minutes at 100 ° C. in an aqueous solution in which sodium pyrophosphate was dissolved to a concentration of 80 ppm. The test piece after the sealing treatment was immersed in an aqueous solution containing 35 ml / l of phosphoric acid and 20 g / l of chromic acid at a temperature of 38 ° C for 15 minutes, and the weight loss was measured. Reduction is 125
mg / dm 2 . The obtained test piece after sealing was molded using an epoxy resin (MP-7400 manufactured by Nitto Denko Corporation) to obtain a mold test piece. 30 mold test pieces
A crack generation test was performed by heating to 0 ° C. There were no cracked mold test pieces among the 20 tested.

【0016】実施例4 板厚0.5mmのA6061合金を28mm角に切断
し、プレス加工により段付け加工をして試験片とし、濃
度18重量%硫酸浴中で鉛極を対極として、浴温度18
℃、電流密度2A/dm2 、通電時間45分間の条件で
陽極酸化処理をし、30μmの皮膜を形成した。次い
で、リン酸を濃度が45ppmとなるように添加した水
中において、100℃において10分間封孔処理した。
皮膜色は濃い灰色であった。封孔処理後の試験片をリン
酸35ml/lとクロム酸20g/lを含む水溶液(3
8℃)に15分間浸漬し、その重量減少量を測定した。
減少量は150mg/dm2 であった。ついで、エポキ
シ樹脂(日東電工社製 MP−7400)を用いてモー
ルドしてモールド試験片とした。モールド試験片を30
0℃に加熱してクラック発生試験を行った。試験を行っ
た20個のうちクラックを生じたモールド試験片はなか
った。
Example 4 A6061 alloy having a thickness of 0.5 mm was cut into a 28 mm square, and stepped by press working to form a test piece. In a 18% by weight sulfuric acid bath, a lead electrode was used as a counter electrode, and the bath temperature was changed. 18
Anodizing was carried out at a temperature of 2 ° C., a current density of 2 A / dm 2 , and an energizing time of 45 minutes to form a 30 μm film. Next, sealing treatment was performed at 100 ° C. for 10 minutes in water to which phosphoric acid was added to a concentration of 45 ppm.
The film color was dark gray. After the sealing treatment, the test piece was treated with an aqueous solution containing phosphoric acid 35 ml / l and chromic acid 20 g / l (3
8 ° C.) for 15 minutes, and the weight loss was measured.
The decrease was 150 mg / dm 2 . Then, it was molded using an epoxy resin (MP-7400 manufactured by Nitto Denko Corporation) to obtain a molded test piece. 30 mold test pieces
A crack generation test was performed by heating to 0 ° C. There were no cracked mold test pieces among the 20 tested.

【0017】実施例5 板厚1.5mmのAl−2%Fe合金を24mm角に切
断し、プレス加工により段付け加工をし試験片とした
後、濃度16重量%硫酸浴中で鉛極を対極として、浴温
度15℃、電流密度2A/dm2 、通電時間38分間の
条件で陽極酸化処理し、25μmの皮膜を形成した。9
0℃の水中において10分間煮沸して封孔処理を行っ
た。封孔処理後の試験片をリン酸35ml/lとクロム
酸20g/lを含む水溶液(38℃)に7分間浸漬し、
その重量減少量を測定した。減少量は250mg/dm
2 であった。この試験片をエポキシ樹脂(日東電工社製
MP−190M)を用いてモールドしモールド試験片
とした。モールド試験片を300℃に加熱してクラック
発生試験を行った。試験を行った20個のうちクラック
を生じた物はなかった。
Example 5 An Al-2% Fe alloy having a thickness of 1.5 mm was cut into a square of 24 mm, stepped by pressing to form a test piece, and a lead electrode was placed in a 16% by weight sulfuric acid bath. As a counter electrode, anodizing treatment was performed under the conditions of a bath temperature of 15 ° C., a current density of 2 A / dm 2 , and a conduction time of 38 minutes to form a 25 μm film. 9
It was boiled in water at 0 ° C. for 10 minutes to perform a sealing treatment. The test piece after the sealing treatment was immersed in an aqueous solution (38 ° C.) containing phosphoric acid 35 ml / l and chromic acid 20 g / l for 7 minutes,
The weight loss was measured. 250 mg / dm reduction
Was 2 . This test piece was molded using an epoxy resin (MP-190M manufactured by Nitto Denko Corporation) to obtain a molded test piece. The mold test piece was heated to 300 ° C. to perform a crack generation test. None of the 20 tested had cracks.

【0018】実施例6 板厚1.5mmのAl−2%Fe合金を24mm角に切
断し、プレス加工により段付け加工をし試験片とした
後、濃度18重量%硫酸浴中で鉛極を対極として、浴温
度15℃、電流密度2A/dm2 、通電時間45分間の
条件で陽極酸化処理し、30μmの皮膜を形成した。次
いで、リン酸45ppmを含む100℃の水溶液中にお
いて10分間封孔処理を行った。得られた被膜は濃い灰
色であった。 封孔処理後の試験片をリン酸35ml/
lとクロム酸20g/lを含む水溶液(38℃)に7分
間浸漬し、その重量減少量を測定した。減少量は150
mg/dm2 であった。次いで、循環式熱風乾燥炉を用
いて225℃で5分間の加熱処理をした。次に、この試
験片をエポキシ樹脂(日東電工社製 MP−7400)
を用いてモールドしモールド試験片を作製した。モール
ド試験片を300℃に加熱してクラック発生試験を行っ
た。試験を行った20個のうちクラックを生じたモール
ド試験片はなかった。
Example 6 A 1.5 mm-thick Al-2% Fe alloy was cut into 24 mm squares, stepped by press working to form test pieces, and a lead electrode was placed in a 18% by weight sulfuric acid bath. As a counter electrode, anodizing was performed under the conditions of a bath temperature of 15 ° C., a current density of 2 A / dm 2 , and an energization time of 45 minutes to form a 30 μm-thick film. Next, sealing treatment was performed for 10 minutes in a 100 ° C. aqueous solution containing 45 ppm of phosphoric acid. The resulting coating was dark gray. The test piece after the sealing treatment was treated with
and 20 g / l of chromic acid were immersed in an aqueous solution (38 ° C.) for 7 minutes, and the weight loss was measured. 150 reduction
mg / dm 2 . Next, heat treatment was performed at 225 ° C. for 5 minutes using a circulating hot air drying furnace. Next, this test piece was epoxy resin (MP-7400 manufactured by Nitto Denko Corporation).
Was used to mold a test piece. The mold test piece was heated to 300 ° C. to perform a crack generation test. There were no cracked mold test pieces among the 20 tested.

【0019】比較例1 板厚1.5mmのA6061合金を24mm角に切断
し、プレス加工により段付け加工をして試験片とし、濃
度16重量%硫酸浴中で鉛極を対極として、浴温度15
℃、電流密度1.2A/dm2 、30分間の陽極酸化処
理で、10μmの皮膜を形成した。続いて、アルマイト
用染料(サンド社製 DeepBlackMLW)を6
g/l溶解した染色液中で5分間染色した。さらに、染
料を安定化し、封孔処理するため、実施例1と同様のニ
ッケル塩系封孔助剤を添加した純水中で30分間煮沸し
た。皮膜色は真黒色であった。封孔処理後の試験片をリ
ン酸35ml/lとクロム酸20g/lを含む水溶液
(38℃)に15分間浸漬し、その重量減少量を測定し
た。減少量は6mg/dm2 であった。次いで、この試
験片をエポキシ樹脂(日東電工社製 MD−190M)
を用いてモールド試験片とし、300℃に加熱してクラ
ック発生試験を行った。試験を行った20個のうち5個
にクラックを生じた。
Comparative Example 1 A6061 alloy having a thickness of 1.5 mm was cut into a square of 24 mm, stepped by press working to form a test piece, and in a 16% by weight sulfuric acid bath, a lead electrode was used as a counter electrode, and a bath temperature was set. Fifteen
A 10 μm film was formed by anodizing at 30 ° C. and a current density of 1.2 A / dm 2 for 30 minutes. Subsequently, a dye for alumite (DeepBlackMLW manufactured by Sando Co., Ltd.) was added to 6
Staining was performed for 5 minutes in a staining solution in which g / l had been dissolved. Further, in order to stabilize the dye and perform the sealing treatment, the mixture was boiled for 30 minutes in pure water to which the same nickel salt sealing aid as in Example 1 was added. The coating color was true black. The test piece after the sealing treatment was immersed in an aqueous solution (38 ° C.) containing 35 ml / l of phosphoric acid and 20 g / l of chromic acid for 15 minutes, and the weight loss was measured. The decrease was 6 mg / dm 2 . Next, this test piece was epoxy resin (MD-190M manufactured by Nitto Denko Corporation).
, And heated to 300 ° C. to conduct a crack generation test. Cracks occurred in 5 out of 20 tested.

【0020】比較例2 板厚0.8mmのAl−2%Fe合金を直径22mmの
円形にプレス加工で成形して試験片とし、16重量%硫
酸浴中で鉛極を対極として、浴温度15℃、電流密度2
A/dm2 、通電時間38分間の陽極酸化処理をし、2
5μmの皮膜を得た。純水中で100℃で10分間煮沸
した。皮膜色は濃い灰色であった。この得られた封孔処
理後の試験片をリン酸35ml/lとクロム酸20g/
lの水溶液(38℃)に15分間浸漬し、その重量減少
量を測定した。減少量は12mg/dm2 であった。こ
の試験片をエポキシ樹脂(日東電工製MP−7400)
を用いてモールドし、300℃に加熱してクラック発生
試験を行なった。試験を行なった20個のうち6個にク
ラックを生じた。
Comparative Example 2 An Al-2% Fe alloy having a thickness of 0.8 mm was formed into a circular shape having a diameter of 22 mm by press working to prepare a test piece, and a lead electrode was used as a counter electrode in a 16% by weight sulfuric acid bath at a bath temperature of 15%. ° C, current density 2
A / dm 2 , anodizing treatment for 38 minutes
A film of 5 μm was obtained. The mixture was boiled in pure water at 100 ° C. for 10 minutes. The film color was dark gray. The obtained test piece after the sealing treatment was treated with phosphoric acid 35 ml / l and chromic acid 20 g / l.
The solution was immersed in 1 l of an aqueous solution (38 ° C.) for 15 minutes, and the weight loss was measured. The decrease was 12 mg / dm 2 . This test piece was epoxy resin (MP-7400 manufactured by Nitto Denko).
, And heated to 300 ° C. to perform a crack generation test. Six of the 20 tested cracked.

【0021】[0021]

【発明の効果】以上に述べた通り、アルミニウムまたは
アルミニウム合金製半導体装置用放熱板を陽極酸化処理
後、封孔処理を行うことにより、封止樹脂との密着性が
向上し、加熱試験に於けるクラックの発生を防止するこ
とができ、熱放散性に優れ、電気絶縁性を有し、イオン
性汚染の少ない半導体装置用放熱板を製造できる。
As described above, the radiating plate for a semiconductor device made of aluminum or an aluminum alloy is subjected to anodizing treatment and then sealing treatment, whereby the adhesion with the sealing resin is improved, and the heat radiating plate is subjected to a heating test. A heat sink for a semiconductor device having excellent heat dissipation, electrical insulation, and low ionic contamination can be manufactured.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 平山 良夫 静岡県庵原郡蒲原町蒲原1丁目34番1号 日本軽金属株式会社グループ技術センター 内 ────────────────────────────────────────────────── ─── Continued on the front page (72) Inventor Yoshio Hirayama 1-34-1 Kambara, Kambara-cho, Abara-gun, Shizuoka

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 アルミニウムまたはアルミニウム合金製
放熱板において、放熱板に施した陽極酸化皮膜の封孔度
値が80mg/dm2 以上であることを特徴とするアル
ミニウムまたはアルミニウム合金製放熱板。
1. An aluminum or aluminum alloy radiator plate, wherein the anodic oxide coating applied to the radiator plate has a sealing degree value of 80 mg / dm 2 or more.
【請求項2】 アルミニウムまたはアルミニウム合金製
放熱板の製造方法において、陽極酸化処理の後に陽極酸
化皮膜を封孔度値が80mg/dm2 以上となるように
封孔処理し、次いで180℃以上で熱処理することを特
徴とするアルミニウムまたはアルミニウム合金製放熱板
の製造方法。
2. A method for manufacturing a heat radiating plate made of aluminum or an aluminum alloy, wherein the anodic oxide film is sealed after the anodic oxidation treatment so as to have a sealing degree of 80 mg / dm 2 or more, and then at 180 ° C. or more. A method for producing a heat sink made of aluminum or an aluminum alloy, which comprises performing a heat treatment.
JP17043797A 1997-06-26 1997-06-26 Aluminum-made heat radiating plate and production thereof Pending JPH1112797A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17043797A JPH1112797A (en) 1997-06-26 1997-06-26 Aluminum-made heat radiating plate and production thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17043797A JPH1112797A (en) 1997-06-26 1997-06-26 Aluminum-made heat radiating plate and production thereof

Publications (1)

Publication Number Publication Date
JPH1112797A true JPH1112797A (en) 1999-01-19

Family

ID=15904907

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17043797A Pending JPH1112797A (en) 1997-06-26 1997-06-26 Aluminum-made heat radiating plate and production thereof

Country Status (1)

Country Link
JP (1) JPH1112797A (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009267336A (en) * 2007-09-28 2009-11-12 Fujifilm Corp Substrate for solar cell and solar cell
US7643297B2 (en) 2007-05-07 2010-01-05 Mitsubishi Electric Corporation Electronic control apparatus
US7791888B2 (en) 2006-12-27 2010-09-07 Mitsubishi Electric Corporation Electronic control apparatus
JP2013528707A (en) * 2010-05-19 2013-07-11 サンフォード・プロセス・コーポレーション Sealed anodized film
US9260792B2 (en) 2010-05-19 2016-02-16 Sanford Process Corporation Microcrystalline anodic coatings and related methods therefor
US10214827B2 (en) 2010-05-19 2019-02-26 Sanford Process Corporation Microcrystalline anodic coatings and related methods therefor
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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7791888B2 (en) 2006-12-27 2010-09-07 Mitsubishi Electric Corporation Electronic control apparatus
US7643297B2 (en) 2007-05-07 2010-01-05 Mitsubishi Electric Corporation Electronic control apparatus
JP2009267336A (en) * 2007-09-28 2009-11-12 Fujifilm Corp Substrate for solar cell and solar cell
JP2013528707A (en) * 2010-05-19 2013-07-11 サンフォード・プロセス・コーポレーション Sealed anodized film
US9260792B2 (en) 2010-05-19 2016-02-16 Sanford Process Corporation Microcrystalline anodic coatings and related methods therefor
US10214827B2 (en) 2010-05-19 2019-02-26 Sanford Process Corporation Microcrystalline anodic coatings and related methods therefor
CN113088224A (en) * 2021-02-26 2021-07-09 广东美的白色家电技术创新中心有限公司 Protection composition applied to packaging product, power module and preparation method of power module

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