JPH11118726A - Defect inspecting device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To enable wide-field image formation through the use of a small- diameter image-forming lens. SOLUTION: An illuminating means is constituted so that the angle of the beam of illuminating light at each point on a sample to be inspected 5 may be smaller than the angular aperture of an image-forming lens 6, a linear region on the sample to be inspected 5 may be irradiated with the illuminating light, and that each beam of the illuminating light may be convergent into the pupil of the image-forming lens 6. An image-forming means comprises a light transmitting plate provided with a reflecting mirror 7 of the size of the exit pupil of the image-forming lens 6 or less, the first one-dimensional array type detector 8 to detect the image of the linear region whose image is formed by light reflected by the reflecting mirror 7 of the light transmitting plate and to output the first detection signal, and the second one-dimensional array type detector 8 to detect the image of the linear region whose image is formed by light passed through a part except the reflecting mirror of the light transmitting plate and to output the second detection signal. A signal processing means simultaneously detects two kinds of different defects such as black defects and flaw and foreign-matter defects on the basis of the first and second detection signals.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a defect of an electrode pattern or a filter pattern formed on a glass substrate in a process of manufacturing a liquid crystal display, and a defect for detecting whether or not foreign matter is attached to the glass substrate. It relates to an inspection device.

[0002]

2. Description of the Related Art A liquid crystal display (LCD: Liqui)
d Crystal Display) is a CRT (C
Since it can be made thinner and lighter than an Anode Ray Tube, a CTV (Color Tele Tube) can be used.
vision) and OA equipment, etc., and the screen size is increased to 10 inches or more.
Higher definition and colorization are being promoted. The liquid crystal display has a TN (Twisted N)
eMatic) type, STN (Super Twiste)
d Natural) type and TFT (Thin Fil)
m Transistor) type. Among these liquid crystal displays, a color liquid crystal display particularly has a color filter substrate which is patterned corresponding to each pixel electrode. The color filter substrate and the pixel electrode substrate enable color display of a liquid crystal display. The defect inspection apparatus detects various defects (for example, a black defect, a projection defect, a pinhole defect, a color defect defect, a pattern defect, etc.) occurring on the color filter substrate and the pixel electrode substrate. A conventional defect inspection apparatus utilizes the fact that a filter pattern formed on a color filter substrate and an electrode pattern formed on a pixel electrode substrate have a repetitive property (periodicity). Various defects are detected based on the data. Some defect inspection devices use, for example, a spatial filtering method. This utilizes the characteristic that scattered light from a regular pattern on a glass substrate is shielded by a light-shielding portion of a spatial filter, and that diffracted light from a defect passes through the spatial filter and forms an image. Others use an optical Fourier transform system as a kind of pattern discriminator.

[0003]

Generally, a defect inspection apparatus using a diffraction phenomenon forms a wide field of view on a glass substrate at a time because parallel light of monochromatic light is used as illumination light. Is difficult. Therefore, in order to collectively image a wide field of view, a large-diameter imaging lens is required, which causes a problem of increasing the cost of the optical system. In addition, as the size of the liquid crystal display increases, the size of the glass substrate is changed from 300 × 400 mm to 360 × 460 mm to 370 × which can take four 10-inch class panels.
470mm, and currently inspects glass substrates of size 550 x 650mm or more, which can take 10.4 to 12.1 type panels and 6 panels or 15 15 type panels. It is a proposition to do it at high speed. When the size of the glass substrate is increased as described above, there is a problem that it takes too much time to inspect for defects by using a conventional imaging optical system having a small visual field. In order to shorten the inspection time, a large-diameter imaging lens that can collectively image a wide field of view on a glass substrate may be used, but such an optical system is very expensive, so the inspection apparatus There is a problem that the cost of the device itself is increased, which is not preferable from the viewpoint of cost reduction. The present invention has been made in view of the above points, and an object of the present invention is to provide a low-cost defect inspection apparatus that enables wide-field imaging using a small-diameter imaging lens.

[0004]

According to a first aspect of the present invention, there is provided a defect inspection apparatus which irradiates illumination light from a light source onto a sample to be inspected using an illumination lens, and that the illumination means applies the illumination light to the sample to be inspected. Imaging means for imaging the transmitted or reflected light of the illuminated illumination light with an imaging lens and detecting the image with a one-dimensional array detector, and output from the detector corresponding to the imaging; A signal processing means for processing signals to detect defects on the sample to be inspected, and a sample transporting means for transporting the sample to be inspected in a predetermined direction. The illuminating means is configured such that the luminous flux angle of the illuminating light at each point on the sample to be inspected is smaller than the opening angle of the imaging lens, and the illuminating light forms a linear region on the sample to be inspected. Configured to illuminate the area containing Each of the light flux of the illumination light is configured to focus within the pupil of the imaging lens,
The image forming unit includes a branching unit including a reflecting unit that reflects a part of an exit pupil region of the imaging lens, and an image of a linear region formed by light reflected by the reflecting unit of the branching unit. A first one-dimensional array type detector for detecting and outputting a first detection signal; and detecting an image of a linear region formed by light passing through a portion other than the reflecting portion of the branching means. And a second one-dimensional array type detector for outputting two detection signals, wherein the signal processing means includes the first and second detectors.
Based on the detection signal, simultaneously detects two different types of defects such as black defects and scratches / foreign matter defects of the sample to be inspected
The sample transport means continuously transports the sample to be inspected in a direction perpendicular to the longitudinal direction of the linear region irradiated by the illumination light. In the defect inspection scanning according to the first invention, the illumination light applied to the surface of the sample to be inspected by the illuminating means normally passes through the sample to be inspected when there is no defect on the surface of the sample to be inspected. Or is reflected normally on the surface of the sample to be inspected. However, if a black defect, a scratch or a foreign matter defect exists on the surface of the sample to be inspected, the illumination light is attenuated, scattered or deflected according to the defect. Of the scattered and deflected light, light within a range smaller than the aperture angle of the imaging lens is taken into the imaging lens, passes through the branching means provided with the reflecting portion, and forms the second one-dimensional array type detector. Image. Normal light is reflected by the reflector and forms an image on the first one-dimensional array type detector. Therefore, the signal processing means can simultaneously detect two different types of defects such as a black defect and a scratch / foreign matter defect of the sample to be inspected based on the outputs from the first and second one-dimensional array type detectors. . In addition, in the first invention, since the inspection is performed by the one-dimensional array detector, the first invention has a transport unit that transports the sample to be inspected in a direction perpendicular to the longitudinal direction of the one-dimensional array detector.

According to a second aspect of the present invention, there is provided a defect inspection apparatus which illuminates illumination light from a light source onto a sample to be inspected by using an illumination lens; Imaging means for imaging transmitted light or reflected light with an imaging lens and detecting the image with a one-dimensional array type detector, and processing a signal output from the detector corresponding to the image formation In a defect inspection apparatus for a sample to be inspected, comprising: display means for visually displaying a defect on the sample to be inspected, and sample transport means for transporting the sample to be inspected in a predetermined direction; The luminous flux angle of the illumination light at each point on the inspection sample is configured to be smaller than the opening angle of the imaging lens, and the illumination light irradiates a region including a linear region on the inspection sample. And the illumination Each of the light fluxes of light is configured to be converged in a pupil of the imaging lens, and the imaging unit includes a reflecting unit that includes a reflecting unit that reflects a part of an exit pupil region of the imaging lens. A first one-dimensional array-type detector for detecting an image of a linear region formed by light reflected by the reflector of the branching unit and outputting a first detection signal; A second one-dimensional array-type detector that detects an image of a linear region formed by light passing through a portion other than the portion and outputs a second detection signal; Based on the first and second detection signals, two different types of defects such as a black defect and a scratch / foreign matter defect of the sample to be inspected are displayed so as to be distinguishable, and the sample transport means is illuminated by the illumination light The test is performed in a direction perpendicular to the longitudinal direction of the linear region. It is intended to convey the sample continuously. The defect inspection apparatus according to the second invention has display means for processing a signal of an image detected by the one-dimensional array type detector and displaying it in a visible manner,
With this display means, two different types of defects such as a black defect and a scratch / foreign matter defect of the sample to be inspected are displayed so as to be distinguishable.

According to a third aspect of the present invention, there is provided a defect inspection apparatus comprising: an illuminating means for irradiating illumination light from a light source to an inspection sample using an illumination lens; Image forming means for forming transmitted light or reflected light with an image forming lens and detecting the image with a two-dimensional array type detector, and processing a signal output from the detector in accordance with the image formation. And a signal processing unit for detecting a defect on the sample to be inspected, wherein the illuminating unit includes a light beam angle of the illumination light at each point on the sample to be inspected. The illumination light is configured to be smaller than the aperture angle of the imaging lens, the illumination light is configured to irradiate a planar region on the sample to be inspected, and each of the light beams of the illumination light is a pupil of the imaging lens. Configured to focus within The imaging unit includes a branching unit having a reflection unit that reflects a part of an exit pupil region of the imaging lens; and a planar image formed by light reflected by the reflection unit of the branching unit. And a first two-dimensional array type detector that outputs a first detected image signal, and a planar image formed by light passing through a portion other than the reflecting portion of the branching means, A second two-dimensional array-type detector that outputs a second detection image signal, wherein the signal processing unit detects a black defect and a black defect of the sample to be inspected based on the first and second detection image signals. Different 2 such as scratches and foreign matter defects
This is to detect various kinds of defects simultaneously. In the defect inspection apparatus according to the third aspect of the invention, the illuminating means is configured to irradiate the planar area of the sample to be inspected, and the imaging means is also capable of detecting a planar image. It is composed of Based on the image signal detected by the two-dimensional array type detector, two different types of defects such as a black defect and a scratch / foreign matter defect of the sample to be inspected are simultaneously detected.

According to a fourth aspect of the present invention, there is provided a defect inspection apparatus comprising: an illuminating means for illuminating illumination light from a light source onto an inspection sample using an illumination lens; In a defect inspection apparatus in which transmitted light or reflected light is imaged by an imaging lens and the image is displayed on a two-dimensional screen, the illuminating means includes a luminous flux angle of the illumination light at each point on the sample to be inspected. It is configured to be smaller than the aperture angle of the imaging lens, the illumination light is configured to irradiate a planar region on the sample to be inspected,
Each of the luminous fluxes of the illumination light is configured to converge within a pupil of the imaging lens, and the imaging unit includes a reflecting unit that reflects a part of an exit pupil region of the imaging lens. Means and a planar image formed by the light reflected by the reflecting portion of the branching means, on a first screen, and formed by light passing through portions other than the reflecting portion of the branching means. A planar image to be formed on a second screen, and based on the images on the first and second screens, two types of defects such as a black defect and a scratch / foreign matter defect of the sample to be inspected. At the same time. In the defect inspection apparatus according to the fourth aspect of the present invention, the illuminating means is configured to irradiate the planar area of the sample to be inspected, and the imaging means is different from the sample to be inspected, such as a black defect and a scratch / foreign matter defect. Images corresponding to the two types of defects are separately and simultaneously formed and displayed on two screens.

According to a fifth aspect of the present invention, there is provided a defect inspection apparatus, comprising: an illuminating means for irradiating illumination light from a light source to an inspection sample using an illumination lens; Imaging means for imaging transmitted light or reflected light with an imaging lens and detecting the image with a two-dimensional array type detector, and processing a signal output from the detector corresponding to the image formation; And a display means for visually displaying a defect on the sample to be inspected, wherein the illuminating means comprises a luminous flux angle of the illumination light at each point on the sample to be inspected. Is configured to be smaller than the aperture angle of the imaging lens, the illumination light is configured to irradiate a planar region on the sample to be inspected,
Each of the luminous fluxes of the illumination light is configured to converge within a pupil of the imaging lens, and the imaging unit includes a reflecting unit that reflects a part of an exit pupil region of the imaging lens. Means, and a first two-dimensional array type detector for detecting a planar image formed by light reflected by the reflecting portion of the branching means and outputting a first detected image signal;
A second two-dimensional array type detector that detects a planar image formed by light passing through a portion other than the reflecting portion of the branching unit and outputs a second detected image signal, The display means is configured to display two different types of defects such as a black defect and a scratch / foreign matter defect of the sample to be inspected based on the first and second detection image signals. The defect inspection apparatus according to the fifth aspect of the invention has display means such as a monitor for processing an image signal detected by the two-dimensional array type detector and displaying it in a visible manner. Two different types of defects such as a black defect and a scratch / foreign matter defect of the sample are displayed so as to be distinguishable.

According to a sixth aspect of the present invention, there is provided a defect inspection apparatus, comprising: an illuminating means for irradiating illumination light from a light source to an inspection sample using an illumination lens; Imaging means for imaging transmitted light or reflected light with an imaging lens and detecting the image with a one-dimensional array type detector, and processing a signal output from the detector corresponding to the image formation In a defect inspection apparatus for a sample to be inspected, comprising: signal processing means for detecting a defect on the sample to be inspected; and sample transport means for transporting the sample to be inspected in a predetermined direction. A line in which the luminous flux angle of the illumination light at each point on the inspection sample is smaller than the opening angle of the imaging lens, and the illumination light is longer than the aperture of the imaging lens on the inspection sample Irradiates the area including the shape area And each of the luminous fluxes of the illumination light is converged in a pupil of the imaging lens, and the imaging unit reflects a part of an exit pupil region of the imaging lens. A branching means having a portion,
A first one-dimensional array type detector for detecting a linear image formed by the light reflected by the reflector of the branching unit and outputting a first detection signal; And a second one-dimensional array-type detector that detects a linear image formed by light passing through the first portion and outputs a second detection signal. And two kinds of different defects such as a black defect and a scratch / foreign matter defect of the sample to be inspected are simultaneously detected based on the second detection signal, and the sample transporting means detects a linear region irradiated by the illumination light. By continuously transporting the test sample in a direction perpendicular to the longitudinal direction, various defects on the test sample in a region wider than the aperture of the imaging lens are inspected. The defect inspection apparatus according to the sixth invention is the defect inspection apparatus according to the first invention,
The illuminating means is configured to irradiate the illumination light onto a region including a linear region longer than the diameter of the imaging lens on the sample to be inspected, and the sample to be inspected is spread over an area wider than the diameter of the imaging lens. It is configured to inspect the above various defects. That is, the aperture is configured to increase in the order of the aperture of the imaging lens, the length of the linear region on the sample to be inspected, and the aperture of the illumination lens. As a result, it is possible to inspect a defect on a specimen to be inspected over a wider area by using an imaging lens having a small diameter.

According to a seventh aspect of the present invention, there is provided a defect inspection apparatus, comprising: an illuminating means for irradiating illumination light from a light source to an inspection sample using an illumination lens; Imaging means for imaging transmitted light or reflected light with an imaging lens and detecting the image with a one-dimensional array type detector, and processing a signal output from the detector corresponding to the image formation In a defect inspection apparatus for a sample to be inspected, comprising: display means for visually displaying a defect on the sample to be inspected, and sample transport means for transporting the sample to be inspected in a predetermined direction; The luminous flux angle of the illumination light at each point on the inspection sample is configured to be smaller than the opening angle of the imaging lens, and the illumination light is smaller than the aperture of the imaging lens on the inspection sample. A region containing a long linear region And each of the luminous fluxes of the illumination light is converged in a pupil of the imaging lens, and the imaging unit reflects a part of an exit pupil region of the imaging lens. And a first one-dimensional array type for detecting an image of a linear region formed by the light reflected by the reflecting section of the branching section and outputting a first detection signal. A second detector for detecting a detector and an image of a linear region formed by light passing through a portion other than the reflecting portion of the branching unit, and outputting a second detection signal;
Wherein the display means determines two different types of defects such as a black defect and a scratch / foreign matter defect of the sample to be inspected based on the first and second detection signals. Display possible, the sample transport means, by continuously transporting the test sample in a direction perpendicular to the longitudinal direction of the linear region irradiated by the illumination light,
Various defects on the sample to be inspected are inspected over a region wider than the aperture of the imaging lens. The defect inspection apparatus according to a seventh aspect of the present invention is the defect inspection apparatus according to the second aspect, wherein the illuminating means irradiates the illumination light on an area including a linear area longer than the diameter of the imaging lens on the inspection sample. And inspects various defects on the sample to be inspected over an area wider than the aperture of the imaging lens.

According to an eighth aspect of the present invention, there is provided a defect inspection apparatus, comprising: an illuminating means for irradiating illumination light from a light source to an inspection sample using an illumination lens; Image forming means for forming transmitted light or reflected light with an image forming lens and detecting the image with a two-dimensional array type detector, and processing a signal output from the detector in accordance with the image formation. And a signal processing unit for detecting a defect on the sample to be inspected, wherein the illuminating unit includes a light beam angle of the illumination light at each point on the sample to be inspected. The illumination light is configured to be smaller than the aperture angle of the imaging lens, and the illumination light is configured to irradiate a planar area larger than the aperture of the imaging lens on the sample to be inspected, and the luminous flux of the illumination light Each of the imaging lenses The imaging unit is configured to be focused within the pupil, and the imaging unit is provided with a reflecting unit that reflects a part of an exit pupil region of the imaging lens, and is reflected by the reflecting unit of the branching unit. A first two-dimensional array type detector for detecting a planar image formed by light and outputting a first detected image signal, and forming an image by light passing through a portion other than the reflecting portion of the branching means; And a second two-dimensional array type detector for detecting a planar image to be output and outputting a second detected image signal, wherein the signal processing means converts the first and second detected image signals into Based on this, two different types of defects, such as a black defect and a scratch / foreign matter defect, on the sample to be inspected in a region wider than the aperture of the imaging lens are simultaneously detected. The defect inspection apparatus according to the eighth invention is
In the defect inspection apparatus according to the third invention, the illuminating means is configured to irradiate the illumination light onto a planar area larger than the aperture of the imaging lens on the sample to be inspected. It is configured to inspect various defects on a sample to be inspected over a wide area.

According to a ninth aspect of the present invention, there is provided a defect inspection apparatus comprising: an illuminating means for irradiating illumination light from a light source to an inspection sample using an illumination lens; In a defect inspection apparatus that forms transmitted light or reflected light with an imaging lens and displays the image on a two-dimensional screen, the illuminating unit includes a luminous flux angle of the illuminating light at each point on the sample to be inspected. The illumination light is configured to be smaller than the aperture angle of the imaging lens, and the illumination light is configured to irradiate a planar area larger than the aperture of the imaging lens on the sample to be inspected, Each of the light beams is configured to converge in a pupil of the imaging lens, and the imaging unit includes a reflecting unit that includes a reflecting unit that reflects a part of an exit pupil region of the imaging lens. Reflecting part of branching means Accordingly, a planar image formed by the reflected light is formed on the first screen, and a planar image formed by light passing through a portion other than the reflecting portion of the branching unit is formed on the second screen. And two different types such as a black defect and a scratch / foreign matter defect of the sample to be inspected in a region wider than the aperture of the imaging lens based on the images on the first and second screens. Are simultaneously visible. The defect inspection apparatus according to the ninth aspect is the defect inspection apparatus according to the fourth aspect, wherein the illumination means irradiates the illumination light onto a planar area wider than the aperture of the imaging lens on the sample to be inspected. It is configured to inspect various defects on the sample to be inspected over a region wider than the aperture of the imaging lens.

According to a tenth aspect of the present invention, there is provided a defect inspection apparatus comprising: an illuminating means for irradiating illumination light from a light source to an inspection sample using an illumination lens; Image forming means for forming transmitted light or reflected light with an image forming lens and detecting the image with a two-dimensional array type detector, and processing a signal output from the detector in accordance with the image formation. A defect inspection apparatus for inspecting the sample to be inspected, the illumination means comprising: a luminous flux angle of the illumination light at each point on the sample to be inspected. Is configured to be smaller than the opening angle of the imaging lens, and the illumination light is configured to irradiate a planar area larger than the aperture of the imaging lens on the test sample, and the illumination light Each of the light beams The imaging unit is configured to be focused within a pupil of the lens, and the imaging unit includes a reflecting unit that reflects a part of an exit pupil region of the imaging lens, and a reflecting unit that reflects the light. A first two-dimensional array type detector that detects a planar image formed by the divided light and outputs a first detected image signal, and light that has passed through a portion other than the reflecting portion of the branching unit. A second two-dimensional array detector for detecting a planar image to be formed and outputting a second detected image signal, wherein the display means includes the first and second detected image signals And two different types of defects such as a black defect and a flaw / foreign matter defect of the sample to be inspected in a region wider than the aperture of the imaging lens are displayed so as to be distinguishable. The defect inspection apparatus according to the tenth aspect of the present invention is the defect inspection apparatus according to the fifth aspect, wherein the illumination means irradiates the illumination light onto a planar area wider than the aperture of the imaging lens on the sample to be inspected. It is configured to inspect various defects on the sample to be inspected over an area wider than the aperture of the imaging lens.

According to an eleventh aspect of the present invention, there is provided a defect inspection apparatus comprising: an illuminating means for irradiating illumination light from a light source to an inspection sample using an illumination lens; Imaging means for imaging transmitted light or reflected light with an imaging lens and detecting the image with a one-dimensional array type detector, and processing a signal output from the detector corresponding to the image formation In a defect inspection apparatus for a sample to be inspected, comprising: signal processing means for detecting a defect on the sample to be inspected; and sample transport means for transporting the sample to be inspected in a predetermined direction. The luminous flux angle of the illumination light at each point on the inspection sample is configured to be smaller than the opening angle of the imaging lens, and the illumination light irradiates an area including a linear region on the inspection sample. The illumination light Each of the light beams is configured to converge within a pupil of the imaging lens, and the imaging means is arranged in the same direction as a longitudinal direction of the one-dimensional array type detector installed behind the imaging lens. A first branch for detecting an image of the linear region formed by the light reflected by the reflecting section of the first branch, and outputting a first detection signal; And a second one-dimensional array for detecting an image of a linear region formed by light passing through a portion other than the reflecting portion of the branching unit and outputting a second detection signal And a type detector,
The signal processing means simultaneously detects two different types of defects such as a black defect and a scratch / foreign matter defect of the sample to be inspected based on the first and second detection signals. The test sample is conveyed continuously in a direction perpendicular to the longitudinal direction of the linear region irradiated with light. The defect inspection apparatus according to an eleventh aspect of the present invention is the defect inspection apparatus according to the first aspect, wherein the imaging means includes a reflecting portion in a linear reflection area in the same direction as the longitudinal direction of the one-dimensional array detector. It has a branching means.

According to a twelfth aspect of the present invention, there is provided a defect inspection apparatus, comprising: an illuminating means for illuminating illumination light from a light source onto an inspection sample using an illumination lens; Imaging means for imaging transmitted light or reflected light with an imaging lens and detecting the image with a one-dimensional array type detector, and processing a signal output from the detector corresponding to the image formation In a defect inspection apparatus for a sample to be inspected, comprising: display means for visually displaying a defect on the sample to be inspected, and sample transport means for transporting the sample to be inspected in a predetermined direction; The luminous flux angle of the illumination light at each point on the inspection sample is configured to be smaller than the opening angle of the imaging lens, and the illumination light irradiates a region including a linear region on the inspection sample. Is configured to be Each of the light beams of bright light is configured to converge in a pupil of the imaging lens, and the imaging means includes a light source, a light source, a light source, a light source, a light source, and a light source. A branching unit having a reflecting portion in a linear reflecting region in the same direction, and detecting an image of the linear region formed by light reflected by the reflecting portion of the branching unit, and outputting a first detection signal. A first one-dimensional array type detector, and a second one which detects an image of a linear region formed by light passing through a portion other than the reflecting portion of the branching means and outputs a second detection signal. A two-dimensional array type detector, wherein the display means is capable of distinguishing two different types of defects such as a black defect and a scratch / foreign matter defect of the sample to be inspected based on the first and second detection signals. And the sample transport means is illuminated by the illumination light. It is intended to convey the sample to be inspected continuously in a direction perpendicular to the longitudinal direction of that linear region. A defect inspection apparatus according to a twelfth aspect is the defect inspection apparatus according to the second aspect, wherein the imaging means includes a reflecting portion in a linear reflection area in the same direction as the longitudinal direction of the one-dimensional array detector. Means.

According to a thirteenth aspect of the present invention, there is provided a defect inspection apparatus, comprising: an illuminating means for irradiating illumination light from a light source to an inspection sample using an illumination lens; Imaging means for imaging transmitted light or reflected light with an imaging lens and detecting the image with a one-dimensional array type detector, and processing a signal output from the detector corresponding to the image formation In a defect inspection apparatus for a sample to be inspected, comprising: signal processing means for detecting a defect on the sample to be inspected; and sample transport means for transporting the sample to be inspected in a predetermined direction. A line in which the luminous flux angle of the illumination light at each point on the inspection sample is smaller than the opening angle of the imaging lens, and the illumination light is longer than the aperture of the imaging lens on the inspection sample Irradiates the area including the shape area And each of the luminous fluxes of the illumination light is converged in a pupil of the imaging lens, and the imaging unit is configured to be one-dimensionally disposed behind the imaging lens. Branching means provided with a reflection portion in a linear reflection region in the same direction as the longitudinal direction of the array type detector,
A first one-dimensional array type detector for detecting a linear image formed by the light reflected by the reflector of the branching unit and outputting a first detection signal; And a second one-dimensional array-type detector that detects a linear image formed by light passing through the first portion and outputs a second detection signal. And two kinds of different defects such as a black defect and a scratch / foreign matter defect of the sample to be inspected are simultaneously detected based on the second detection signal, and the sample transporting means detects a linear region irradiated by the illumination light. By continuously transporting the test sample in a direction perpendicular to the longitudinal direction, various defects on the test sample in a region wider than the aperture of the imaging lens are inspected. The defect inspection apparatus according to a thirteenth aspect of the present invention is the defect inspection apparatus according to the sixth aspect, wherein the imaging means includes a reflecting portion in a linear reflection area in the same direction as the longitudinal direction of the one-dimensional array detector. It has a branching means.

According to a fourteenth aspect of the present invention, there is provided a defect inspection apparatus, comprising: an illuminating means for irradiating illumination light from a light source to an inspection sample using an illumination lens; Imaging means for imaging transmitted light or reflected light with an imaging lens and detecting the image with a one-dimensional array type detector, and processing a signal output from the detector corresponding to the image formation In a defect inspection apparatus for a sample to be inspected, comprising: display means for visually displaying a defect on the sample to be inspected, and sample transport means for transporting the sample to be inspected in a predetermined direction; The luminous flux angle of the illumination light at each point on the inspection sample is configured to be smaller than the opening angle of the imaging lens, and the illumination light is smaller than the aperture of the imaging lens on the inspection sample. An area containing a long linear area Illuminating light, and each of the luminous fluxes of the illumination light is converged in a pupil of the imaging lens, and the imaging means includes a light source provided behind the imaging lens. A branching unit having a reflecting portion in a linear reflecting region in the same direction as the longitudinal direction of the two-dimensional array type detector, and detecting an image of the linear region formed by light reflected by the reflecting portion of the branching unit. A first one-dimensional array-type detector that outputs a first detection signal, and an image of a linear region formed by light that has passed through a portion other than the reflecting portion of the branching unit. Second output detection signal
Wherein the display means determines two different types of defects such as a black defect and a scratch / foreign matter defect of the sample to be inspected based on the first and second detection signals. Display possible, the sample transport means, by continuously transporting the test sample in a direction perpendicular to the longitudinal direction of the linear region irradiated by the illumination light,
It is to inspect various defects on the sample to be inspected in a region wider than the aperture of the imaging lens. This 14th
The defect inspection apparatus according to the present invention is the defect inspection apparatus according to the seventh invention, wherein the imaging means includes a branching means provided with a reflecting portion in a linear reflection area in the same direction as the longitudinal direction of the one-dimensional array type detector. Have

According to a fifteenth aspect of the present invention, there is provided a defect inspection apparatus comprising: an illuminating means for irradiating illumination light from a light source to an inspection sample using an illumination lens; Imaging means for imaging transmitted light or reflected light with an imaging lens and detecting the image with a one-dimensional array type detector, and processing a signal output from the detector corresponding to the image formation In a defect inspection apparatus for a sample to be inspected, comprising: signal processing means for detecting a defect on the sample to be inspected; and sample transport means for transporting the sample to be inspected in a predetermined direction. The luminous flux angle of the illumination light at each point on the inspection sample is configured to be smaller than the opening angle of the imaging lens, and the illumination light irradiates an area including a linear region on the inspection sample. The illumination light Each of the light beams is configured to be focused in the pupil of the imaging lens. A substantially elliptical stop having a short axis diameter that is in the same direction as the longitudinal direction of the one-dimensional array type detector is provided at the pupil position of the imaging lens. A branching means provided with a reflecting portion in a linear reflecting area in the same direction as the longitudinal direction of the one-dimensional array type detector installed in the one-dimensional array type detector, and a linear image formed by light reflected by the reflecting portion of the branching means. A first one-dimensional array type detector for detecting an image of the area and outputting a first detection signal, and an image of a linear area formed by light passing through a portion other than the reflecting portion of the branching means. A second one-dimensional array detector for detecting and outputting a second detection signal Have,
The signal processing means simultaneously detects two different types of defects such as a black defect and a scratch / foreign matter defect of the sample to be inspected based on the first and second detection signals. The test sample is conveyed continuously in a direction perpendicular to the longitudinal direction of the linear region irradiated with light. A defect inspection apparatus according to a fifteenth aspect of the present invention is the defect inspection apparatus according to the eleventh aspect, wherein a substantially elliptical stop is provided at a pupil position of the imaging lens.

According to a sixteenth aspect of the present invention, there is provided a defect inspection apparatus, comprising: an illuminating means for irradiating illumination light from a light source to an inspection sample using an illumination lens; Imaging means for imaging transmitted light or reflected light with an imaging lens and detecting the image with a one-dimensional array type detector, and processing a signal output from the detector corresponding to the image formation In a defect inspection apparatus for a sample to be inspected, comprising: display means for visually displaying a defect on the sample to be inspected, and sample transporting means for transporting the sample to be inspected in a predetermined direction; The luminous flux angle of the illumination light at each point on the inspection sample is configured to be smaller than the opening angle of the imaging lens, and the illumination light irradiates a region including a linear region on the inspection sample. Is configured to be Each of the light beams of bright light is configured to converge in the pupil of the imaging lens, and the imaging unit sets a major axis diameter substantially equal to the pupil diameter of the imaging lens, and is shorter than this. A dimension having a minor axis diameter, a substantially elliptical aperture having a minor axis diameter in the same direction as the longitudinal direction of the one-dimensional array detector is provided at a pupil position of the imaging lens, and A branching means having a reflecting portion in a linear reflecting area in the same direction as the longitudinal direction of the one-dimensional array type detector installed behind the lens, and an image formed by light reflected by the reflecting portion of the branching means One-dimensional array detector that detects an image of a linear region and outputs a first detection signal, and a linear region that is imaged by light passing through a portion other than the reflecting portion of the branching unit. A second one-dimensional array for detecting the image of And a display means for displaying two different kinds of defects such as a black defect and a scratch / foreign matter defect of the sample to be inspected based on the first and second detection signals. The sample transport means continuously transports the sample to be inspected in a direction perpendicular to the longitudinal direction of the linear region irradiated by the illumination light. The defect inspection apparatus according to a sixteenth aspect of the present invention is the defect inspection apparatus according to the twelfth aspect, wherein a substantially elliptical stop is provided at the pupil position of the imaging lens.

According to a seventeenth aspect of the present invention, there is provided a defect inspection apparatus comprising: an illuminating means for irradiating illumination light from a light source to an inspection sample using an illumination lens; Imaging means for imaging transmitted light or reflected light with an imaging lens and detecting the image with a one-dimensional array type detector, and processing a signal output from the detector corresponding to the image formation In a defect inspection apparatus for a sample to be inspected, comprising: signal processing means for detecting a defect on the sample to be inspected; and sample transport means for transporting the sample to be inspected in a predetermined direction. A line in which the luminous flux angle of the illumination light at each point on the inspection sample is smaller than the opening angle of the imaging lens, and the illumination light is longer than the aperture of the imaging lens on the inspection sample Irradiates the area including the shape area And each of the luminous fluxes of the illumination light is converged in a pupil of the imaging lens, and the imaging unit has a length substantially the same as the pupil diameter of the imaging lens. The diameter of the axis is set to be shorter than that of the one-dimensional array detector, and a substantially elliptical stop is set to the pupil position of the imaging lens. Branching means having a reflecting portion in a linear reflecting area in the same direction as the longitudinal direction of the one-dimensional array type detector provided behind the imaging lens, and reflecting by the reflecting portion of the branching means. A first one-dimensional array type detector that detects an image of a linear region formed by the divided light and outputs a first detection signal, and light that has passed through a part other than the reflection part of the branching unit. Detects the image of the linear region to be formed and outputs a second detection signal That the second and a one-dimensional array detector, said signal processing means, said first
And detecting two different types of defects such as a black defect and a scratch / foreign matter defect of the sample to be inspected in a region wider than the aperture of the imaging lens based on the second detection signal,
The sample transport means continuously transports the sample to be inspected in a direction perpendicular to the longitudinal direction of the linear region irradiated by the illumination light. The defect inspection apparatus according to a seventeenth aspect of the present invention is the defect inspection apparatus according to the fifteenth aspect, wherein the illuminating means irradiates the illumination light on an area including a linear area longer than the diameter of the imaging lens on the inspection sample. And inspects various defects on the sample to be inspected over an area wider than the aperture of the imaging lens. That is, the aperture is configured to increase in the order of the aperture of the imaging lens, the length of the linear region on the sample to be inspected, and the aperture of the illumination lens. As a result, it is possible to inspect a defect on a specimen to be inspected over a wider area by using an imaging lens having a small diameter.

A defect inspection apparatus according to an eighteenth aspect of the present invention provides an illumination device for irradiating illumination light from a light source to an inspection sample using an illumination lens, and an illumination device for illuminating the illumination light irradiated on the inspection sample by the illumination device. Imaging means for imaging transmitted light or reflected light with an imaging lens and detecting the image with a one-dimensional array type detector, and processing a signal output from the detector corresponding to the image formation In a defect inspection apparatus for a sample to be inspected, comprising: display means for visually displaying a defect on the sample to be inspected, and sample transport means for transporting the sample to be inspected in a predetermined direction; The luminous flux angle of the illumination light at each point on the inspection sample is configured to be smaller than the opening angle of the imaging lens, and the illumination light is smaller than the aperture of the imaging lens on the inspection sample. An area containing a long linear area Illuminating, each of the luminous flux of the illumination light is configured to converge in the pupil of the imaging lens, the imaging means has substantially the same size as the pupil diameter of the imaging lens A substantially elliptical aperture having a major axis diameter, a dimension shorter than the major axis diameter, and a minor axis diameter in the same direction as the longitudinal direction of the one-dimensional array type detector is pupil of the imaging lens. A branching means having a reflecting part in a linear reflecting area in the same direction as the longitudinal direction of the one-dimensional array type detector which is provided at a position and further provided behind the imaging lens; and a reflecting part of the branching means. And a first one-dimensional array detector that outputs a first detection signal and detects a portion of the linear region formed by the light reflected by the light, and passes through a portion other than the reflection portion of the branching unit. The image of the linear region formed by the light is detected, and the second detection is performed. And a second one-dimensional array type detector for outputting a signal, the display means,
Displaying two different types of defects such as a black defect and a scratch / foreign matter defect of the sample to be inspected in a region wider than the aperture of the imaging lens based on the first and second detection signals; The sample transport means continuously transports the sample to be inspected in a direction perpendicular to the longitudinal direction of the linear region irradiated by the illumination light. This first
The defect inspection apparatus according to an eighth aspect of the present invention is the defect inspection apparatus according to the sixteenth aspect, wherein the illuminating means irradiates the illumination light onto an area including a linear area longer than the diameter of the imaging lens on the sample to be inspected. And inspects various defects on the sample to be inspected over an area wider than the aperture of the imaging lens. That is, the aperture is configured to increase in the order of the aperture of the imaging lens, the length of the linear region on the sample to be inspected, and the aperture of the illumination lens. As a result, it is possible to inspect a defect on a specimen to be inspected over a wider area by using an imaging lens having a small diameter.

[0022]

An embodiment of the present invention will be described below with reference to the accompanying drawings. FIG. 2 is a diagram showing a schematic configuration of a defect inspection apparatus according to the first embodiment for detecting a defect or foreign matter on a color filter substrate and a pixel electrode substrate of a liquid crystal display. In this defect inspection apparatus, the presence or absence of a black defect and a scratch / foreign matter defect are simultaneously detected from a sample to be inspected (color filter substrate and pixel electrode substrate) by an inspection optical system described later. First, the defect inspection device
The sample to be inspected is held by the sample transport unit 21 and transported in a predetermined direction. The sample transport section 21 has an XY axis encoder 22 for detecting the position of the sample. This X
The −Y-axis encoder 22 detects the relative position of the sample to be inspected on the XY axis based on a scale provided on the side surface of the sample transport unit 21. Detector drive circuit 23
Are based on the X-axis coordinate signal from the XY-axis encoder 22, based on the direct light detector 24, the scattered light polarized light detector 28, and A
The drive control of the / D converters 25 and 29, the determination circuits 26 and 2A, the black defect memory 27, and the scratch / foreign matter defect memory 2B is performed. The direct light detector 24 and the scattered light polarized light detector 28
It is composed of one-dimensional array type detectors 8 and 9. The direct photodetector 24 detects an image formed by light transmitted or reflected normally on the sample to be inspected, and outputs the detection signal V1 to A / A.
Output to the D converter 25. The A / D converter 25 converts the detection signal V1 into a digital signal and outputs the digital signal to the determination circuit 26. The determination circuit 26 determines whether the detection signal V1 is smaller than a predetermined value, and outputs a signal indicating the determination result to the black defect memory 27. Black defect memory 27 is XY
A signal indicating the determination result of the determination circuit 26 is stored using the coordinate signals X and Y from the axis encoder 22 as addresses. The scattered light deflection light detector 28 detects an image formed by light scattered or deflected by a scratch or foreign matter on the sample to be inspected,
The detection signal V2 is output to the A / D converter 29. A /
The D converter 29 converts the detection signal V2 into a digital signal and outputs the digital signal to the determination circuit 2A. The determination circuit 2A detects the detection signal V2
Is greater than a predetermined value, and a signal indicating the determination result is output to the scratch / foreign matter defect memory 2B. If a repetitive pattern or a directional pattern is formed on the sample 5 to be inspected, the influence of the pattern is determined by using a difference image circuit corresponding to the adjacent pattern comparison processing method in the determination circuit 26 and 2A. May be removed to detect minute pattern defects. The scratch / foreign matter defect memory 2B stores coordinate signals X and Y from the XY axis encoder 22.
Is used as an address to store a signal indicating the determination result of the determination circuit 2A. When the processing for the predetermined coordinate signal Y is completed, the coordinate signal is incremented, and the same processing is repeatedly executed to obtain defect information corresponding to the entire surface of the sample 5 to be inspected in FIG. In FIG. 2, the determination circuits 26 and 2A independently process the respective detection signals V1 and V2, but for the reason described in FIG.
(Not shown) for comparing (difference or calculation) between V2 and V2 improves the sensitivity of recognition (determination) of defects. The microprocessor unit (MPU) 2C has a black defect memory 27.
On the basis of the signal from the flaw / foreign matter defect memory 2B, a black defect and a flaw / foreign matter defect of the sample to be inspected are determined, converted into displayable data, and output to the display 2D.
The display 2D is a display panel that visually displays display data from the MPU 2C.

FIG. 1 is a diagram showing the configuration of each optical system for the sample 5 to be inspected held by the sample transport unit 21 of FIG. 2, and the upper drawing is a diagram of the optical system viewed from the + X axis direction. The lower drawing is a diagram of the optical system viewed from the + Y-axis direction. 3 to 7, the relationship between the upper drawing and the lower screen is the same. In FIG.
Shall be inspected by transmitted light. In FIG. 1, the optical system includes illumination means and imaging means. Illumination means includes a light source 1, a condenser lens 2, a slit diaphragm 3, and a condenser 4.
Consists of The imaging means includes a detection lens group 6 and a reflecting mirror stop 7
Consists of The one-dimensional array detector 8 corresponds to the scattered light polarized light detector 28 in FIG. 2, and the one-dimensional array detector 9 corresponds to FIG.
Corresponds to the direct light detector 24. The light source 1 outputs a white light beam, a halogen lamp or the like is used, and monochromatic light such as a laser may be used. The illumination light flux of the light source 1 passes through the condenser lens 2 at the front focal position of the condenser 4 (the position of the slit stop 3). The slit stop 3 is a slit elongated in the X-axis direction, and has a shape such that a light beam from the light source 1 irradiates a linear region on the sample 5 to be inspected. The condenser 4 forms a light beam that has passed through the slit stop 3, that is, an image A1 of the slit stop 3 on the surface of the inspection area 5 as an image A2. The detection lens group 6 converts the image A2 of the linear region of the slit diaphragm 3 formed on the surface of the sample 5 to be inspected into the image A3 on the rear focal position of the detection lens group 6, that is, the surface of the one-dimensional array type detector 8. As an image. The image A2 of the linear region of the slit diaphragm 3 formed on the surface of the sample 5 to be inspected is formed as an image A3 on the surface of the one-dimensional array type detector 8 unless it is scattered or deflected on the surface of the sample 5 to be inspected. Form an image. The detection lens group 6 includes a plurality of plano-convex lenses and a biconvex lens. However, in this embodiment, since the reflecting mirror stop 7 is provided at the pupil position (the exit pupil position, the pupil diameter is Cφ) of the detection lens group 6, it is not scattered or deflected on the surface of the sample 5 to be inspected. The light (direct light) is reflected in a vertical (Y-axis) direction by a reflecting portion 7A provided in the central portion of the reflecting mirror stop 7, and forms an actual image A3 on the surface of the one-dimensional array type detector 9. I do. On the other hand, the light scattered or deflected on the surface of the sample 5 to be inspected passes through the light transmitting portion 7B of the reflector stop 7, and forms an image on the surface of the one-dimensional array type detector 8. That is, the reflecting mirror stop 7 is a branching unit that branches the scattered / deflected light and the direct light. Since the light-shielding portion 7C constituting the stop is provided around the light transmitting portion 7B of the reflector stop 7, the opening angle of the detection lens group 6 is θ0. The light beam angle of the light incident on the sample 5 to be inspected by the illumination means is θ, and the opening angle θ0 of the detection lens group 6 is set to be larger than the light beam angle θ. Therefore, of the light scattered or deflected on the surface of the sample 5 to be inspected, only the light beam passing through the ring-shaped light passing portion 7B within the opening angle θ0 is taken into the imaging means, and the surface of the one-dimensional array type detector 8 Image. That is, the opening angle θ0 can be changed by appropriately adjusting the outer diameter of the ring-shaped light transmitting portion 7B of the light shielding plate 7. The other image B1 of the slit diaphragm 3 has the image B1 on the surface of the inspection area 5 on the opposite side with the optical axis symmetrical.
The image is formed as 2 and further formed as an image B3 on the surface of the one-dimensional array type detector 9, but the auxiliary line indicating the state is omitted.

FIG. 3 is a diagram showing a schematic configuration of each optical system of the defect inspection apparatus according to the second embodiment, similarly to FIG. 3, the same components as those in FIG. 1 are denoted by the same reference numerals, and the description thereof will be omitted. The embodiment of FIG. 3 is different from that of FIG. 1 in that the shape of the slit diaphragm 3A is rectangular (two-dimensional), and the shapes of the two-dimensional array type detectors 8A and 9A are adjusted accordingly. Shape (2
(Dimensional). Thus, since the slit diaphragm 3A and the two-dimensional array sensors 8A and 9A are one-dimensionally configured, it is not necessary to perform the scanning process in the Y-axis direction as shown in FIG. The time required for the defect inspection time can be greatly reduced.

FIG. 4 is a diagram showing a schematic configuration of each optical system as in FIG. 1, and the light source 1 and the condenser lens 2 in FIG. 1 are omitted. 4, components having the same configuration as in FIG. 1 are denoted by the same reference numerals, and a description thereof will be omitted. 4 differs from the embodiment of FIG. 1 in that the diameter dφ of the condenser 4A is larger than the diameter Dφ of the detection lens group 6A, and the image of the slit aperture 3B formed on the surface of the sample 5 to be inspected. This is a point larger than the diameter L. Further, the slit stop 3B is longer than the slit stop 3 of FIG. 1, and the detection length group 6A is constituted by an uneven lens sandwiched between a plurality of plano-convex lenses. As described above, by increasing the size of the slit aperture 3B and the condenser 4A and using a normal small-diameter aperture for the detection lens group 6A, the area to be inspected of the specimen 5 to be inspected, that is, the linear illumination area of the slit aperture 3B is increased. Therefore, the inspection area by one scan in the X direction can be greatly improved, so that the inspection time can be shortened, that is, the time required for the defect inspection of the sample 5 to be inspected can be greatly reduced. it can.

FIG. 5 is a diagram showing a schematic configuration of each optical system as in FIG. 5, the same components as those in FIG. 1 are denoted by the same reference numerals, and the description thereof will be omitted.
In the embodiment of FIG. 5, the illumination means comprises a light source 1, an auxiliary condenser lens 2A, a slit aperture 3, an auxiliary condenser lens 10, an aperture 11 and a condenser 4B, and the imaging means comprises a plurality of plano-convex lenses and a plurality of irregularities. Detection lens group 6B composed of lenses
And a stop 13 and a branching unit 14 provided at a pupil position inside the detection lens group 6B. Here, the pupil diameter of the lens group 6B is Cφ. These illumination means and the detection lens group 6B are respectively different from those in FIG. 1, and their basic operations are hardly changed. The embodiment of FIG. 5 differs from that of FIG. 1 in that a branch having a linear reflecting portion 14A corresponding to the shape of the slit diaphragm 3 on the surface of a transmission plate 14B is used instead of the reflecting mirror diaphragm 7 of FIG. The point is that the means 14 is provided. The branching means 14 is simpler to manufacture than the reflector stop 7 of FIG. 1 and its positioning in the X direction is easier. The one-dimensional array detector 8 includes a branching unit 14.
And a scattered light deflected light detector 28 that receives light scattered or deflected on the surface of the sample 5 to be inspected, and the one-dimensional array type detector 9 includes the reflection part 14A. Light detector 2 that receives the direct light reflected from the
4. The auxiliary condenser lens 2A passes the light beam of the light source 1 to the focal position of the auxiliary condenser lens 10 (the position of the slit stop 3). The slit stop 3 is a slit elongated in the X-axis direction, and has a shape such that a light beam from the light source 1 irradiates a linear region on the sample 5 to be inspected. Auxiliary condenser lens 1
Numeral 0 inverts the light beam passing through the slit stop 3, that is, the image of the slit stop 3, and supplies the inverted light to the condenser 4B. The stop 11 is located at the focal point between the auxiliary condenser lens 10 and the condenser 4B. The condenser 4B forms a light beam from the auxiliary condenser lens 10, that is, an image of the slit diaphragm 3 on the surface of the sample 5 to be inspected. The detection lens group 6B forms an image of the linear area of the slit diaphragm 3 formed on the surface of the sample 5 to be inspected on the rear focal position of the detection lens group 6B, that is, the surface of the one-dimensional array type detector 8. . Note that the image of the linear region of the slit diaphragm 3 formed on the surface of the sample 5 to be inspected is one image unless scattered or deflected on the surface of the sample 5.
An image is formed on the surface of the two-dimensional array detector 8. The detection lens group 6B includes a plurality of plano-convex lenses and two concave-convex lenses sandwiched between the plano-convex lenses. Then, a pupil 13 is formed at an intermediate position between the concave and convex lenses. In this embodiment, as in the case of FIG.
Is provided between the detection lens group 6 and the one-dimensional array detector 8, light (direct light) not scattered or deflected on the surface of the sample 5 to be inspected is reflected vertically (Y) by the reflecting portion 14A. The light is reflected in the (axial) direction and forms an image on the surface of the one-dimensional array type detector 9. On the other hand, the light scattered or deflected on the surface of the test sample 5 passes through the light transmitting portion 14B of the branching means 14 and forms an image on the surface of the one-dimensional array type detector 8. Therefore, the dimension d of the reflecting portion 14A in FIG. 5 needs to be smaller than the light beam diameter Eφ.

FIG. 6 is a view showing a schematic configuration of each optical system of the defect inspection apparatus of the present invention, similarly to FIG. 4, and the light source 1 and the condenser lens 2 are omitted. 6 and FIG.
Components having the same configuration as those described above are denoted by the same reference numerals, and description thereof will be omitted. The embodiment of FIG. 6 differs from that of FIG. 4 in that, similarly to the case of FIG. 5, the detection lens group 6C is constituted by a plurality of plano-convex lenses having different curvatures, and the pupil position inside this detection lens group 6C. 4 is provided with a branching means 14 having a linear reflecting portion 14A corresponding to the shape of the slit stop 3 on the surface of the transmission plate 14B instead of the reflecting mirror stop 7 in FIG. Is a point. Thus, the optical system of FIG. 6 has the advantages of both those of FIG. 4 and FIG. In addition, the linear reflection part 14A
Since a part of the scattered light or the deflected light is mixed in each part in the longitudinal direction, an optical system having a configuration as shown in FIG. That is, FIG. 7 is a diagram showing an optical system of a defect inspection apparatus capable of removing defects of the optical system of FIG. 6 and improving the reliability of defect classification. 7, the same components as those in FIG. 6 are denoted by the same reference numerals, and the description thereof will be omitted. The embodiment of FIG. 7 differs from that of FIG. 6 in that the shape of the aperture 13A in the detection lens group 6C is elliptical as shown in FIG. Due to the elliptical aperture 13A, scattered light or deflected light entering the linear reflecting portion 14A is eliminated. In the embodiment of FIG. 7, an auxiliary condenser lens 15 is provided between the slit stop 3 and the condenser 4A.

FIG. 8 is a diagram showing two methods of a defect detection method according to the defect inspection apparatus according to the present invention. FIG.
(A) relates to the optical system shown in FIGS. 1, 3 to 7, and is a transmission detection method applicable when the sample 5 to be inspected is made of a transmission material. In this transmission detection method, the light beam from the illumination means 81 is irradiated on the sample 5 to be inspected, and the transmitted light is imaged by the imaging means 82. on the other hand,
When the sample to be inspected is made of an opaque material, that is, a reflective material, the defect inspection of the sample to be inspected 5A is performed by a reflection detection method as shown in FIG. In the case of this reflection detection method, the light beam from the illumination means 81 is irradiated onto the sample 5A to be inspected, and the reflected light is imaged by the imaging means 82. FIGS. 8B to 8D are diagrams schematically showing how an illumination light beam transmits through a sample to be inspected in the transmission detection method, and schematically shows a light beam near the optical axis. FIG. 8B shows a case where the sample to be inspected is normal. The illumination light beam passes through the sample to be inspected while maintaining its incident angle, and enters the imaging means 82. FIG. 8C shows a case where the sample to be inspected has an uneven defect portion. The illumination light flux is transmitted through the uneven defect portion at an angle different from the incident angle and is incident on the imaging means 82. FIG. 8D shows a case where a flaw (foreign matter) defect exists in the sample to be inspected. The illumination light flux is scattered in a complicated manner at each part of the flaw (foreign matter) defect, and a part of the scattered light is formed by the imaging means. At 82. FIGS. 8F to 8H are diagrams schematically showing how an illumination light beam is reflected from an object to be inspected in the reflection detection method, and a light beam near the optical axis thereof. FIG. 8 (F)
Indicates that the sample to be inspected is normal, and the illumination light beam is reflected by the sample to be inspected while maintaining the incident angle, and
2 is incident. FIG. 8 (G) shows a case where the sample to be inspected has an uneven defect portion, and the illumination light beam is reflected at the uneven defect portion at an angle different from the incident angle, and is incident on the image forming means 82. FIG. 8H shows a case where a defect (foreign matter) defect exists in the sample to be inspected. The illumination light flux is complicatedly irregularly reflected (scattered) at each part of the defect (foreign matter), and a part of the reflected light is reflected. The light enters the image forming means 82. The components detected by the transmission detection method include a semiconductor photomask, an LCD electrode substrate, an LCD color filter substrate, a disk glass substrate, a semiconductor photomask substrate, an LCD polarizing plate, and an LC polarizing plate.
There is a phase difference plate for D and STN. In addition, BGA (Ball Grid Array Substrate), Si wafer for semiconductor, PDP substrate, Al substrate for disk, etc. are detected by the reflection detection method.

FIG. 9 is a diagram schematically showing output waveforms of the direct light detector 24 and the scattered light deflected light detector 28 of FIG. 2 in the surface state of the sample 5 to be inspected. In the convex portion 91, the output V1 of the direct photodetector 24 decreases in accordance with the shape of the convex portion 91, and the output V2 of the scattered light deflected photodetector 28 conversely increases.
It increases according to the shape of No. 1. Similarly, the output V1 of the direct photodetector 24 also decreases in accordance with the defect shape in the scratched portion 92, the foreign matter attachment portion 93, and the uneven portion 94, and the output V2 of the scattered light deflected photodetector 28 conversely depends on the defect shape. Is increasing. On the other hand, when a defect such as a black portion 95 in a thin film shape whose transmittance or reflectance is different from the normal is present on the sample to be inspected, scattered light or polarized light is not generated at that portion. The fluctuation of the output V2 of the detector 28 becomes weak, and only the output V1 of the direct photodetector 24 decreases. Since the outputs V1 and V2 are obtained according to the shape of each defect in this manner, it is possible to recognize a defect occurring in the sample to be inspected based on the outputs V1 and V2.

FIG. 11 is a diagram showing another example of the configuration of the defect inspection apparatus. FIG. 11 is an example of the configuration of a defect inspection apparatus using the two-dimensional array detectors 8A and 9A as shown in FIG. The image is displayed on the monitor 111 for displaying foreign matter and the monitor 112 for displaying black defects. FIG. 12 is a diagram showing still another example of the configuration of the defect inspection apparatus. One-dimensional array detectors 8 and 9 and two-dimensional array detectors 8A and 9 are shown.
FIG. 9 is a diagram illustrating a configuration example of a defect inspection apparatus in a case where a screen for scattered light deflection light 121 and a screen for direct light 122 are arranged at these positions instead of using A. By doing so, it is possible to visually recognize the defect of the sample 5 to be inspected.

FIG. 13 is a view showing a modification of the reflector stop 7, that is, the branching means, as viewed from the X direction or the Y direction. FIG. 13A shows the configuration of the reflector stop 7 itself shown in FIG. 1, which has a reflecting portion 7A at the center, a light transmitting portion 7B around the reflecting portion 7A, and a light shielding portion 7C around the reflecting portion 7A. Having. A reflecting mirror stop having a shape as shown in FIG. 13A is used when the sample to be inspected is a mirror-finished sample. FIGS. 13B to 13D show modifications of FIG. 13A. In the reflector stop shown in FIG. 13B, the shape of the reflecting portion 7A is linear as shown in FIG. FIG.
In the reflector aperture of (C), the shape of the reflector 7A is cross-shaped. In the reflector stop shown in FIG. 13D, the reflector 7A includes a plurality of reflectors. In the case of FIG. 13D, the reflecting mirrors may be arranged in a cross as in FIG. 13C. A reflector stop having a shape as shown in FIGS. 13B to 13D is used when the sample to be inspected is a sample with a regular and directional pattern. Further, it goes without saying that the reflection portions 7A and the light transmission portions 7B may be interchanged. In this case, the one-dimensional array detector 8 directly detects light, and the one-dimensional array detector 9 detects scattered light deflection light. In addition to the shape shown in FIG.
It goes without saying that a reflection stop formed according to an existing pattern may be formed. FIG. 14 is a diagram showing a modification of the reflector stop 7 of FIG. 1, that is, the branching means. FIG. 1 illustrates a case where the reflecting mirror stop 7 is configured by forming the reflecting portion 7A and the light shielding portion 7C on one transmitting member that becomes the light transmitting portion 7B, but in FIG. In this case, a part of the direct light and the scattered light or the polarized light is reflected to the primary array type detector 9 side, and the rest is transmitted to the one-dimensional array type detector 8 side. Between the one-dimensional array detector 8 and the half mirror 7D, a light-shielding plate 7E having a circular portion and a ring-shaped transmission portion for directly shielding light is provided near the pupil of the detection lens 6.
Similarly, between the primary array type detector 9 and the half mirror 7D, a ring-shaped light shielding plate 7 for shielding scattered light or polarized light is provided.
F is provided near the pupil of the detection lens 6. Light shield 7
E1 indicates the shape of the light-shielding plate 7E as viewed from the primary array type detector 8, and the light-shielding plate 7F1 indicates the shape of the light-shielding plate 7F as viewed from the primary array type detector 9. The half mirror 7D
Is 10% and the transmittance is 90%.
This is because the direct light has a high intensity, and a sufficient S / N of the signal can be secured even if the intensity is slightly reduced. In addition,
In this case, since only 10% of the scattered light or the polarized light enters the primary array type detector 9 side, even if the light shielding plate 7F is removed, the influence thereof can be suppressed. It goes without saying that the reflectance and the transmittance of the half mirror may be appropriately set according to the optical system.
FIG. 15 is a diagram showing a modification of the branching unit of FIG. In FIG. 5, the branching means 14 is formed by forming a linear reflecting portion 14A corresponding to the shape of the slit diaphragm 3 on the surface of the transmission plate 14B, but in FIG. A corresponding reflecting mirror 7G was prepared and placed near the pupil position of the detection lens 6. Also,
This reflecting mirror 7G does not have a transmitting portion for scattered light or polarized light and only reflects direct light, and its sectional shape is a primary array type as shown in FIG. It is a deformed rectangle cut along the optical path when reaching the detector 8. In the case of the branching means as shown in FIG. 5, it is needless to say that a half mirror may be provided as shown in FIG. Nor.

In the above-described embodiment, the case where the reflecting mirror reflects completely is described as an example. However, the present invention is not limited to this, and a reflecting mirror such as a half mirror that partially transmits and reflects the rest may be used. Alternatively, a mirror whose reflectance is gradually changed may be used. That is, in the above-described embodiment, the case of the binary level of reflection and transmission has been described. For example, in the case of FIG. 13 (C), the reflectance of the central portion is high, and the reflectance is reduced toward the periphery. In the case of FIG. 13 (D), the reflectance of the central circular portion is high. The reflectance of the surrounding circular portion may be reduced. Further, in the above-described embodiment, a case has been described in which a light shielding member that blocks light is used as the light shielding plate 7, but a phase plate, a polarizing plate (analyzer), or the like may be used instead of the light shielding member. When a phase plate is used, it is necessary to provide an illumination ring stop having a shape corresponding to the transmission ring portion 7B of the light-shielding plate 7 between the sample 5 to be inspected and the slit stop 3. There is a detailed explanation in the column of “Microscope”, and the explanation is omitted here. In the case where a polarizing plate is used, a method of installing a polarizer in the illumination system and obtaining polarized illumination is described in detail in the column of “Polarizing microscope” in a textbook or the like, and thus the description is omitted here. Also, needless to say, when a phase plate or a polarizing plate is used, shading such as semi-transmission may be similarly applied. When a phase plate is used, the detection signal V1 of the direct light detector 24 and the detection signal V2 of the scattered light deflected light detector 28 shown in FIG. 2 are different from the detection signal V2 having a phase difference and the detection signal V2 having no phase difference, respectively. It goes without saying that the detection signal V1 becomes the detection signal V2 having a change in polarization and the detection signal V1 having no change in polarization when a polarizing plate is used. By using a phase plate or a polarizing plate in this way, it is possible to inspect defects of a phase shift type photomask, an optical glass substrate, a phase shift photomask substrate, a Si wafer with a thin film, an LCD alignment film, and the like. it can. For example, a polarizing plate for LCD of 550 × 650 mm,
Phase difference plate, glass substrate, color filter, 300φ LSI Si wafer, 5 inch diagonal LSI photomask, 40 inch diagonal PDP glass substrate, electrode substrate, and 3.5 inch diameter DVD polycarbonate It is possible to collectively inspect the entire surface of the sample 5 without a large-area panne such as a boronate substrate or a 5 inch diameter polycarbonate substrate for a Mo (magneto-optical) disk.

[0033]

According to the present invention, a wide-field image can be formed using a small-diameter imaging lens, and the cost of the entire defect inspection apparatus can be reduced.

[Brief description of the drawings]

FIG. 1 is a diagram illustrating a schematic configuration of each optical system of a defect inspection apparatus according to a first embodiment.

FIG. 2 is a diagram illustrating a schematic configuration of a defect inspection apparatus that detects a defect or foreign matter on a color filter substrate and a pixel electrode substrate of a liquid crystal display.

FIG. 3 is a diagram illustrating a schematic configuration of each optical system of a defect inspection apparatus according to a second embodiment.

FIG. 4 is a diagram showing a schematic configuration of each optical system of a defect inspection device according to a third embodiment.

FIG. 5 is a diagram showing a schematic configuration of each optical system of a defect inspection apparatus according to a fourth embodiment.

FIG. 6 is a diagram showing a schematic configuration of each optical system of a defect inspection device according to a fifth embodiment.

FIG. 7 is a diagram showing a schematic configuration of each optical system of a defect inspection device according to a sixth embodiment.

FIG. 8 is a view showing two methods of a defect detection method according to the defect inspection apparatus according to the present invention.

FIG. 9 is a diagram schematically illustrating output waveforms of the direct light detector and the scattered light polarized light detector of FIG. 2 in a surface state of a sample to be inspected.

FIG. 10 is a diagram showing a shape of a pupil in the detection lens group of FIG.

FIG. 11 is a diagram showing another configuration example of the defect inspection apparatus.

FIG. 12 is a diagram showing still another configuration example of the defect inspection apparatus.

FIG. 13 is a diagram showing a modified example of the reflector stop.

FIG. 14 is a diagram showing a modification of the reflector stop of FIG. 1;

FIG. 15 is a diagram showing a modification of the reflector stop of FIG. 5;

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 ... Light source, 2 ... Condensing lens, 2A, 10, 15 ... Auxiliary condensing lens, 3, 3B ... Slit stop, 3A ... Square aperture slit stop, 4, 4A ... Condenser, 5 ... Transmission material type test sample, 5A: Reflective material type sample to be inspected, 6, 6A, 6
B: detection lens, 7: reflector aperture, 7A: reflection unit, 7B
... light transmitting part, 7C ... light shielding part, 8, 9 ... one-dimensional array type detector, 8A, 9A ... two-dimensional array type detector, 1
1,13 ... stop, 14 ... branching means, 14A ... reflector, 1
4B: transmission section, 21 sample transport section, 22: XY axis encoder, 23: detector drive circuit, 24: direct photodetector, 2
5, 29 ... A / D converter, 26, 2A ... decision circuit, 27
... Black defect memory, 28 ... Scattered light deflection light detector, 2B
... Scratch / foreign matter defect memory, 2C ... MPU, 2D ... Display
81: Illuminating means, 82: Image forming means, 111: Monitor for displaying scratches / foreign substances, 112: Monitor for displaying black defects, 121 ...
Screen for scattering / deflecting light, 122, screen for direct light

Claims (18)

[Claims] An illumination unit for irradiating illumination light from a light source to an inspection sample using an illumination lens, and an imaging lens for transmitting or reflecting the illumination light applied to the inspection sample by the illumination unit. Imaging means for detecting the image with a one-dimensional array type detector, and processing a signal output from the detector in accordance with the imaging to detect a defect on the sample to be inspected. In a defect inspection apparatus for a sample to be inspected, comprising: a signal processing unit for detecting; and a sample transporting unit for transporting the sample to be inspected in a predetermined direction, wherein the illumination unit is configured to illuminate each point on the sample to be inspected. The luminous flux angle of the light is configured to be smaller than the aperture angle of the imaging lens, and the illumination light is configured to irradiate an area including a linear area on the test sample, and the luminous flux of the illumination light is configured. Each of the imaging lenses The imaging unit is configured to have a reflecting unit that reflects a part of an exit pupil region of the imaging lens, and is reflected by a reflecting unit of the branching unit. A first one-dimensional array detector that detects an image of a linear region formed by the reflected light and outputs a first detection signal; and a light that has passed through a portion other than the reflecting portion of the branching unit. A second one-dimensional array type detector for detecting an image of the linear region to be formed and outputting a second detection signal, wherein the signal processing means converts the first and second detection signals into The two different types of defects such as a black defect and a scratch / foreign matter defect of the sample to be inspected are simultaneously detected based on the sample specimen, and the sample transporting means is perpendicular to a longitudinal direction of the linear region irradiated by the illumination light. Characterized by continuously transporting the sample to be inspected in the direction Defect inspection equipment. 2. An illumination unit for irradiating illumination light from a light source to an inspection sample using an illumination lens, and an imaging lens for transmitting transmitted light or reflection light of the illumination light applied to the inspection sample by the illumination unit. Imaging means for detecting the image with a one-dimensional array type detector, and processing a signal output from the detector in accordance with the imaging to detect a defect on the sample to be inspected. In a defect inspection apparatus for a specimen to be inspected, comprising: display means for displaying the specimen so as to be visually recognizable; and sample transport means for transporting the specimen to be inspected in a predetermined direction. The illuminating light is configured such that a light flux angle is smaller than an opening angle of the imaging lens, and the illuminating light is configured to irradiate an area including a linear area on the sample to be inspected, Each of the light beams The imaging unit is configured to be focused within a pupil of the lens, and the imaging unit includes a branch unit including a reflection unit that reflects a part of an exit pupil region of the imaging lens; A first one-dimensional array type detector that detects an image of a linear region formed by the divided light and outputs a first detection signal, and light that has passed through a part other than the reflection part of the branching unit. A second one-dimensional array type detector for detecting an image of the linear region to be formed and outputting a second detection signal, wherein the display means outputs the first and second detection signals Two kinds of different defects such as a black defect and a scratch / foreign matter defect of the sample to be inspected are displayed on the basis of the sample specimen, and the sample transporting means is arranged in a longitudinal direction of the linear region irradiated by the illumination light. Continuously transporting the sample to be inspected in a vertical direction A defect inspection apparatus characterized by the above-mentioned. 3. An illumination means for irradiating illumination light from a light source to an inspection sample using an illumination lens; and an imaging lens for transmitting or reflecting the illumination light illuminated on the inspection sample by the illumination means. Imaging means for detecting the image with a two-dimensional array type detector, and processing a signal output from the detector in accordance with the imaging to detect a defect on the sample to be inspected. In the defect inspection apparatus for a specimen to be inspected, comprising: a signal processing unit for detecting; a luminous flux angle of the illumination light at each point on the specimen to be inspected is smaller than an aperture angle of the imaging lens. And the illumination light is configured to irradiate a planar region on the sample to be inspected, and each of the light fluxes of the illumination light is configured to be focused within a pupil of the imaging lens. Wherein the imaging means is A branching unit provided with a reflecting part for reflecting a part of the exit pupil region of the image lens, and a planar image formed by light reflected by the reflecting part of the branching unit, and a first detected image signal And a second two-dimensional array type detector for detecting a plane image formed by light passing through a portion other than the reflecting portion of the branching means, and outputting a second detected image signal. Two two-dimensional array type detectors, wherein the signal processing means is configured to detect two kinds of different types of black defects and scratches / foreign matter defects of the sample to be inspected based on the first and second detected image signals. A defect inspection device for simultaneously detecting defects. 4. An illumination means for irradiating illumination light from a light source to an inspection sample using an illumination lens, and an imaging lens for transmitting transmitted light or reflection light of the illumination light applied to the inspection sample by the illumination means. A defect inspection apparatus that forms an image on a two-dimensional screen and displays the image on a two-dimensional screen, wherein the illuminating means is such that the luminous flux angle of the illumination light at each point on the inspection sample is greater than the aperture angle of the imaging lens. The illumination light is configured to irradiate a planar region on the sample to be inspected, and each of the luminous fluxes of the illumination light is configured to be focused in a pupil of the imaging lens. The image forming means includes a branching unit having a reflection unit that reflects a part of the exit pupil region of the imaging lens, and a planar shape formed by light reflected by the reflection unit of the branching unit. The image is the first script And a planar image formed by light passing through a portion other than the reflecting portion of the branching means is formed on a second screen, and the first and second images are formed.
A defect inspection apparatus characterized in that two different types of defects, such as a black defect and a scratch / foreign matter defect, of the sample to be inspected are simultaneously visible based on the image on the screen. 5. An illumination unit for irradiating illumination light from a light source to an inspection sample using an illumination lens, and an imaging lens for transmitting transmitted light or reflection light of the illumination light applied to the inspection sample by the illumination unit. Imaging means for detecting the image with a two-dimensional array type detector, and processing a signal output from the detector in accordance with the imaging to detect a defect on the sample to be inspected. A defect inspection apparatus for inspecting the sample to be inspected, comprising: a display means for displaying the image so as to be visually recognizable. Is also configured to be smaller, the illumination light is configured to irradiate a planar area on the sample to be inspected, and each of the light fluxes of the illumination light is focused in a pupil of the imaging lens. Wherein the imaging means is A branching unit provided with a reflecting part for reflecting a part of the exit pupil region of the imaging lens, and a planar image formed by light reflected by the reflecting part of the branching unit is detected. A first two-dimensional array detector for outputting an image signal, and a planar image formed by light passing through a portion other than the reflecting portion of the branching means, and outputting a second detected image signal A second two-dimensional array type detector, wherein the display means is configured to detect two different types of black defect and scratch / foreign matter defect of the sample to be inspected based on the first and second detected image signals. A defect inspection device for displaying a defect of the object in a distinguishable manner. 6. An illumination means for irradiating illumination light from a light source to an inspection sample using an illumination lens, and an imaging lens for transmitting transmitted light or reflection light of the illumination light applied to the inspection sample by the illumination means. Imaging means for detecting the image with a one-dimensional array type detector, and processing a signal output from the detector in accordance with the imaging to detect a defect on the sample to be inspected. In a defect inspection apparatus for a sample to be inspected, comprising: a signal processing unit for detecting; and a sample transporting unit for transporting the sample to be inspected in a predetermined direction. The luminous flux angle of the light is configured to be smaller than the aperture angle of the imaging lens, and the illumination light irradiates an area on the sample to be inspected including a linear area longer than the aperture of the imaging lens. The illumination light Each of the light beams is configured to converge in a pupil of the imaging lens. A first one-dimensional array-type detector that detects a linear image formed by light reflected by the reflector of the branching unit and outputs a first detection signal; A second one-dimensional array-type detector that detects a linear image formed by light passing through the portion and outputs a second detection signal; Based on a second detection signal, two different types of defects, such as a black defect and a scratch / foreign matter defect, of the sample to be inspected are simultaneously detected. The test sample is continuous in the direction perpendicular to the direction A defect inspection apparatus that inspects various defects on the sample to be inspected in a region wider than the diameter of the imaging lens by transporting the sample in a focused manner. 7. An illuminating means for irradiating illumination light from a light source to an inspection sample using an illumination lens, and an imaging lens for transmitting or reflecting the illumination light illuminating the inspection sample by the illumination means. Imaging means for detecting the image with a one-dimensional array type detector, and processing a signal output from the detector in accordance with the imaging to detect a defect on the sample to be inspected. In a defect inspection apparatus for a specimen to be inspected, comprising: display means for displaying the specimen so as to be visually recognizable; and sample transport means for transporting the specimen to be inspected in a predetermined direction. The luminous flux angle of the illumination light is configured to be smaller than the opening angle of the imaging lens, and the illumination light irradiates an area including a linear area longer than the aperture of the imaging lens on the sample to be inspected. Is configured to be Each of the light beams of bright light is configured to converge in a pupil of the imaging lens, and the imaging unit includes a branching unit including a reflection unit that reflects a part of an exit pupil region of the imaging lens. A first one-dimensional array-type detector for detecting an image of a linear region formed by light reflected by the reflector of the branching unit and outputting a first detection signal; A second one-dimensional array-type detector that detects an image of a linear region formed by light passing through a portion other than the portion and outputs a second detection signal; Based on the first and second detection signals, two kinds of different defects such as a black defect and a scratch / foreign matter defect of the sample to be inspected are displayed so as to be distinguishable, and the sample transport means is illuminated by the illumination light. The covering is perpendicular to the longitudinal direction of the linear region. A defect inspection apparatus that inspects various defects on the inspection sample over an area wider than the aperture of the imaging lens by continuously transporting the inspection sample. 8. An illumination means for irradiating illumination light from a light source to a sample to be inspected using an illumination lens, and an imaging lens for transmitting transmitted light or reflected light of the illumination light applied to the inspection sample by the illumination means. Imaging means for detecting the image with a two-dimensional array type detector, and processing a signal output from the detector in accordance with the imaging to detect a defect on the sample to be inspected. In the defect inspection apparatus for a specimen to be inspected, comprising: a signal processing unit for detecting; a luminous flux angle of the illumination light at each point on the specimen to be inspected is smaller than an aperture angle of the imaging lens. And the illumination light irradiates a planar area wider than the aperture of the imaging lens on the sample to be inspected, and each of the light beams of the illumination light is a pupil of the imaging lens. Configured to focus within The image forming means includes a branching unit having a reflection unit that reflects a part of the exit pupil region of the imaging lens, and a planar shape formed by light reflected by the reflection unit of the branching unit. A first two-dimensional array type detector for detecting an image and outputting a first detected image signal; and detecting a planar image formed by light passing through a portion other than the reflecting portion of the branching means. A second two-dimensional array type detector that outputs a second detected image signal, wherein the signal processing unit calculates a diameter of the imaging lens based on the first and second detected image signals. A defect inspection apparatus for simultaneously detecting two different types of defects such as a black defect and a scratch / foreign matter defect on the inspection sample in a wide area. 9. An illumination unit for irradiating illumination light from a light source to a sample to be inspected using an illumination lens, and an imaging lens for transmitting transmitted light or reflected light of the illumination light applied to the inspection sample by the illumination unit. A defect inspection apparatus that forms an image on the two-dimensional screen and displays the image on a two-dimensional screen, wherein the illuminating unit is configured such that a luminous flux angle of the illumination light at each point on the inspection sample is larger than an aperture angle of the imaging lens. It is configured to be smaller, the illumination light is configured to irradiate a planar area larger than the aperture of the imaging lens on the test sample, and each of the light flux of the illumination light is The imaging unit is configured to be focused in a pupil, and the imaging unit is provided with a reflecting unit that reflects a part of an exit pupil region of the imaging lens, and is reflected by a reflecting unit of the branching unit. Tied by light A planar image to be formed is formed on a first screen, and a planar image formed by light passing through a portion other than the reflecting portion of the branching unit is formed on a second screen. , The first and second
A defect in which two different kinds of defects such as a black defect and a scratch / foreign matter defect of the sample to be inspected in a region wider than the aperture of the imaging lens are simultaneously visible based on an image on the screen. Inspection equipment. 10. An illumination unit for irradiating illumination light from a light source to an inspection sample using an illumination lens, and an imaging lens for transmitting transmitted light or reflection light of the illumination light applied to the inspection sample by the illumination unit. Imaging means for detecting the image with a two-dimensional array type detector, and processing a signal output from the detector in accordance with the imaging to detect a defect on the sample to be inspected. A defect inspection apparatus for inspecting the inspected sample, wherein the illuminating means is configured such that a luminous flux angle of the illumination light at each point on the inspected sample is greater than an aperture angle of the imaging lens. Is also configured to be smaller, the illumination light is configured to irradiate a planar area larger than the aperture of the imaging lens on the sample to be inspected, each of the luminous flux of the illumination light is the imaging lens To focus within my eyes Wherein the imaging means comprises: a branching means provided with a reflecting portion for reflecting a part of an exit pupil region of the imaging lens; and a surface imaged by light reflected by the reflecting portion of the branching means. A two-dimensional array type detector that detects an image in the shape of a circle and outputs a first detected image signal, and a planar image formed by light passing through a portion other than the reflecting portion of the branching unit. A second two-dimensional array-type detector for detecting and outputting a second detected image signal, wherein the display means includes an aperture of the imaging lens based on the first and second detected image signals. A defect inspection apparatus, wherein two different types of defects such as a black defect and a scratch / foreign matter defect of the inspection sample in a wider area are displayed so as to be distinguishable. 11. An illumination means for irradiating illumination light from a light source to an inspection sample using an illumination lens, and an imaging lens for transmitting or reflecting the illumination light applied to the inspection sample by the illumination means. Imaging means for detecting the image with a one-dimensional array type detector, and processing a signal output from the detector in accordance with the imaging to detect a defect on the sample to be inspected. In a defect inspection apparatus for a sample to be inspected, comprising: a signal processing unit for detecting; and a sample transporting unit for transporting the sample to be inspected in a predetermined direction. The luminous flux angle of the light is configured to be smaller than the aperture angle of the imaging lens, and the illumination light is configured to irradiate an area including a linear area on the test sample, and the luminous flux of the illumination light is configured. Each of the Wherein the imaging means reflects light to a linear reflection area in the same direction as the longitudinal direction of the one-dimensional array type detector installed behind the imaging lens. And a first one-dimensional array type detector for detecting an image of a linear region formed by light reflected by a reflecting portion of the branching unit and outputting a first detection signal And, to detect an image of a linear region formed by light passing through a portion other than the reflecting portion of the branching means,
A second one-dimensional array-type detector that outputs a second detection signal, wherein the signal processing means is configured to detect a black defect and a flaw of the inspected sample based on the first and second detection signals. Simultaneously detecting two different types of defects such as foreign matter defects, the sample transporting means continuously transports the sample to be inspected in a direction perpendicular to a longitudinal direction of a linear region irradiated by the illumination light. A defect inspection device characterized by the above-mentioned. 12. Illumination means for irradiating illumination light from a light source to an inspection sample using an illumination lens, and transmitting light or reflection light of illumination light applied to the inspection sample by the illumination means to form an imaging lens. Imaging means for detecting the image with a one-dimensional array type detector, and processing a signal output from the detector in accordance with the imaging to detect a defect on the sample to be inspected. In a defect inspection apparatus for a specimen to be inspected, comprising: display means for displaying the specimen so as to be visually recognizable; and sample transport means for transporting the specimen to be inspected in a predetermined direction. The illuminating light is configured such that a light flux angle is smaller than an opening angle of the imaging lens, and the illuminating light is configured to irradiate an area including a linear area on the sample to be inspected, Each of the luminous flux The image forming means is configured to be focused within a pupil of an image lens, and the image forming means is provided in a linear reflection area in the same direction as a longitudinal direction of the one-dimensional array type detector installed behind the image forming lens. Branching means provided with a reflecting part, and first one-dimensional array type detection for detecting an image of a linear region formed by light reflected by the reflecting part of the branching means and outputting a first detection signal Detector, to detect an image of a linear region formed by light passing through a portion other than the reflecting portion of the branching means,
A second one-dimensional array-type detector that outputs a second detection signal, wherein the display unit is configured to detect a black defect and a scratch / foreign matter of the sample to be inspected based on the first and second detection signals. Two kinds of different defects such as defects are displayed so as to be distinguishable, and the sample transport means continuously transports the sample to be inspected in a direction perpendicular to a longitudinal direction of a linear region irradiated by the illumination light. And a defect inspection apparatus. 13. An illumination unit for irradiating illumination light from a light source to an inspection sample using an illumination lens, and an imaging lens for transmitting transmitted light or reflected light of the illumination light applied to the inspection sample by the illumination unit. Imaging means for detecting the image with a one-dimensional array type detector, and processing a signal output from the detector in accordance with the imaging to detect a defect on the sample to be inspected. In a defect inspection apparatus for a sample to be inspected, comprising: a signal processing unit for detecting; and a sample transporting unit for transporting the sample to be inspected in a predetermined direction. The luminous flux angle of the light is configured to be smaller than the aperture angle of the imaging lens, and the illumination light irradiates an area on the sample to be inspected including a linear area longer than the aperture of the imaging lens. The illumination is configured Each of the light beams is focused in a pupil of the imaging lens, and the imaging means is the same as a longitudinal direction of the one-dimensional array type detector installed behind the imaging lens. A branching unit having a reflecting part in a linear reflecting area in the direction, and a first unit for detecting a linear image formed by light reflected by the reflecting unit of the branching unit and outputting a first detection signal. And a second one-dimensional array type detector for detecting a linear image formed by light passing through a portion other than the reflecting portion of the branching unit and outputting a second detection signal. A detector, wherein the signal processing means simultaneously detects two different types of defects such as a black defect and a scratch / foreign matter defect of the sample to be inspected based on the first and second detection signals, The sample transport means is a linear area illuminated by the illumination light. A defect inspection apparatus that inspects various defects on the inspection sample in a region wider than the aperture of the imaging lens by continuously transporting the inspection sample in a direction perpendicular to a longitudinal direction of the imaging lens. 14. An illumination means for irradiating illumination light from a light source to a sample to be inspected using an illumination lens, and a transmission lens or a reflection light of the illumination light illuminated on the sample to be inspected by the illumination means. Imaging means for detecting the image with a one-dimensional array type detector, and processing a signal output from the detector in accordance with the imaging to detect a defect on the sample to be inspected. In a defect inspection apparatus for a specimen to be inspected, comprising: display means for displaying the specimen so as to be visually recognizable; and sample transport means for transporting the specimen to be inspected in a predetermined direction. The luminous flux angle of the illumination light is configured to be smaller than the opening angle of the imaging lens, and the illumination light irradiates an area including a linear area longer than the aperture of the imaging lens on the sample to be inspected. Configured to be before Each of the luminous fluxes of the illumination light is configured to converge in a pupil of the imaging lens, and the imaging unit is arranged in a longitudinal direction of the one-dimensional array detector provided behind the imaging lens. Branching means having a reflecting portion in a linear reflecting region in the same direction as the above, and detecting an image of the linear region formed by the light reflected by the reflecting portion of the branching portion, and outputting a first detection signal. A first one-dimensional array type detector to detect an image of a linear region formed by light passing through a portion other than the reflecting portion of the branching means;
A second one-dimensional array-type detector that outputs a second detection signal, wherein the display unit is configured to detect a black defect and a scratch / foreign matter of the sample to be inspected based on the first and second detection signals. Two kinds of different defects such as defects are displayed so as to be distinguishable, and the sample transport means continuously transports the sample to be inspected in a direction perpendicular to a longitudinal direction of a linear region irradiated by the illumination light. A defect inspection apparatus that inspects various defects on the sample to be inspected in a region wider than the aperture of the imaging lens. 15. An illumination unit for irradiating illumination light from a light source to an inspection sample using an illumination lens, and an imaging lens for transmitting transmitted light or reflection light of the illumination light applied to the inspection sample by the illumination unit. Imaging means for detecting the image with a one-dimensional array type detector, and processing a signal output from the detector in accordance with the image formation to detect a defect on the sample to be inspected. In a defect inspection apparatus for a sample to be inspected, comprising: a signal processing unit for detecting; and a sample transporting unit for transporting the sample to be inspected in a predetermined direction, wherein the illumination unit is configured to illuminate each point on the sample to be inspected. The luminous flux angle of the light is configured to be smaller than the aperture angle of the imaging lens, and the illumination light is configured to irradiate an area including a linear area on the test sample, and the luminous flux of the illumination light is configured. Each of the The imaging means is configured to have a major axis diameter substantially the same as the pupil diameter of the imaging lens, a minor axis diameter shorter than the pupil diameter, and A substantially elliptical stop whose axis diameter is the same as the longitudinal direction of the one-dimensional array type detector is provided at the pupil position of the imaging lens, and the 1st aperture provided behind the imaging lens is
A branching unit having a reflecting portion in a linear reflecting region in the same direction as the longitudinal direction of the two-dimensional array type detector, and detecting an image of the linear region formed by light reflected by the reflecting portion of the branching unit. A first one-dimensional array type detector for outputting a first detection signal, and an image of a linear region formed by light passing through a portion other than the reflecting portion of the branching means,
And a second one-dimensional array-type detector for outputting a detection signal of the following. The signal processing means comprises: a black defect and a scratch / foreign matter defect of the sample to be inspected based on the first and second detection signals; Simultaneously detecting two different types of defects, such that the sample transport means continuously transports the test sample in a direction perpendicular to the longitudinal direction of the linear region irradiated by the illumination light. Characteristic defect inspection equipment. 16. An illumination unit for irradiating illumination light from a light source to an inspection sample using an illumination lens, and an imaging lens for transmitting or reflecting the illumination light illuminating the inspection sample by the illumination unit. Imaging means for detecting the image with a one-dimensional array type detector, and processing a signal output from the detector in accordance with the imaging to detect a defect on the sample to be inspected. In a defect inspection apparatus for a specimen to be inspected, comprising: display means for displaying the specimen so as to be visually recognizable; and sample transport means for transporting the specimen to be inspected in a predetermined direction. The illuminating light is configured such that a light flux angle is smaller than an opening angle of the imaging lens, and the illuminating light is configured to irradiate an area including a linear area on the sample to be inspected, Each of the luminous flux The image forming means is configured to converge within a pupil of the image lens, and the image forming unit sets a major axis diameter substantially equal to the pupil diameter of the image forming lens, and sets a minor axis diameter to a shorter dimension than this. A substantially elliptical aperture having a minor axis diameter in the same direction as the longitudinal direction of the one-dimensional array type detector is provided at a pupil position of the imaging lens, and further provided behind the imaging lens. Branching means provided with a reflection part in a linear reflection area in the same direction as the longitudinal direction of the one-dimensional array type detector, and detects an image of the linear area formed by light reflected by the reflection part of the branching means. A first one-dimensional array type detector for outputting a first detection signal; and an image of a linear region formed by light passing through a portion other than the reflecting portion of the branching means. And a second one-dimensional array type detector for outputting a detection signal of Means for displaying two different types of defects such as a black defect and a flaw / foreign matter defect on the sample to be inspected based on the first and second detection signals; A defect inspection apparatus for continuously transporting the sample to be inspected in a direction perpendicular to a longitudinal direction of a linear region irradiated by the inspection. 17. An illumination unit for irradiating illumination light from a light source to an inspection sample using an illumination lens, and an imaging lens for transmitting transmitted light or reflection light of the illumination light applied to the inspection sample by the illumination unit. Imaging means for detecting the image with a one-dimensional array type detector, and processing a signal output from the detector in accordance with the imaging to detect a defect on the sample to be inspected. In a defect inspection apparatus for a sample to be inspected, comprising: a signal processing unit for detecting; and a sample transporting unit for transporting the sample to be inspected in a predetermined direction, wherein the illumination unit is configured to illuminate each point on the sample to be inspected. The luminous flux angle of the light is configured to be smaller than the aperture angle of the imaging lens, and the illumination light irradiates an area on the sample to be inspected including a linear area longer than the aperture of the imaging lens. The illumination is configured Are configured to be focused in the pupil of the imaging lens, and the imaging unit sets the major axis diameter to be substantially the same as the pupil diameter of the imaging lens, and the dimension shorter than this. Has a substantially elliptical aperture at the pupil position of the imaging lens such that the short axis diameter is in the same direction as the longitudinal direction of the one-dimensional array type detector. The said 1 installed behind
A branching unit having a reflecting portion in a linear reflecting region in the same direction as the longitudinal direction of the two-dimensional array type detector, and detecting an image of the linear region formed by light reflected by the reflecting portion of the branching unit. A first one-dimensional array type detector for outputting a first detection signal, and an image of a linear region formed by light passing through a portion other than the reflecting portion of the branching means,
And a second one-dimensional array type detector that outputs a detection signal of the following. The signal processing means is configured to detect the signal in a region wider than the aperture of the imaging lens based on the first and second detection signals. Simultaneously detects two different types of defects such as a black defect and a scratch / foreign matter defect of the sample to be inspected, and the sample transporting means is configured to detect the defect in a direction perpendicular to a longitudinal direction of a linear region irradiated by the illumination light. A defect inspection apparatus for continuously transporting a sample to be inspected. 18. An illumination unit for irradiating illumination light from a light source to an inspection sample using an illumination lens, and an imaging lens for transmitting or reflecting the illumination light applied to the inspection sample by the illumination unit. Imaging means for detecting the image with a one-dimensional array type detector, and processing a signal output from the detector in accordance with the imaging to detect a defect on the sample to be inspected. In a defect inspection apparatus for a specimen to be inspected, comprising: display means for displaying the specimen so as to be visually recognizable; and sample transport means for transporting the specimen to be inspected in a predetermined direction. The luminous flux angle of the illumination light is configured to be smaller than the opening angle of the imaging lens, and the illumination light irradiates an area including a linear area longer than the aperture of the imaging lens on the sample to be inspected. Configured to be before Each of the luminous fluxes of the illumination light is configured to converge in the pupil of the imaging lens, and the imaging unit sets the major axis diameter to be substantially the same as the pupil diameter of the imaging lens. A short dimension is defined as a minor axis diameter, and a substantially elliptical stop is provided at the pupil position of the imaging lens so that the minor axis diameter is in the same direction as the longitudinal direction of the one-dimensional array type detector. A branching unit having a reflecting part in a linear reflecting area in the same direction as the longitudinal direction of the one-dimensional array type detector installed behind the image lens, and forming an image by light reflected by the reflecting part of the branching unit A first one-dimensional array type detector for detecting an image of a linear region to be output and outputting a first detection signal, and a linear image formed by light passing through a portion other than the reflecting portion of the branching means. A second one-dimensional detector for detecting an image of the area and outputting a second detection signal A ray-type detector, wherein the display means includes a black defect and a scratch / foreign matter defect of the sample to be inspected in a region wider than the aperture of the imaging lens based on the first and second detection signals. The sample transporting means continuously transports the test sample in a direction perpendicular to the longitudinal direction of the linear region irradiated by the illumination light. A defect inspection apparatus characterized by the above-mentioned.