JPH11111811A - Substrate-conveying device - Google Patents

Substrate-conveying device

Info

Publication number
JPH11111811A
JPH11111811A JP29152197A JP29152197A JPH11111811A JP H11111811 A JPH11111811 A JP H11111811A JP 29152197 A JP29152197 A JP 29152197A JP 29152197 A JP29152197 A JP 29152197A JP H11111811 A JPH11111811 A JP H11111811A
Authority
JP
Japan
Prior art keywords
wafer
substrate
fiber sensor
present
view
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP29152197A
Other languages
Japanese (ja)
Inventor
Yukinori Yuya
幸則 油谷
Kazuhiro Shino
和弘 示野
Hisashi Yoshida
久志 吉田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Electric Corp
Original Assignee
Kokusai Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kokusai Electric Corp filed Critical Kokusai Electric Corp
Priority to JP29152197A priority Critical patent/JPH11111811A/en
Publication of JPH11111811A publication Critical patent/JPH11111811A/en
Withdrawn legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a wafer-conveying device, which can sense the presence or absence of the substrate such as a wafer without vacuum sucking. SOLUTION: The sensing part of a transmission-type fiber sensor 10 is provided, so that the sensing part comes to the vicinity of the side of a wafer conveying plate 40. The sensing part of the transmission-type fiber sensor 10 is movably provided together with the wafer conveying plate 40. Fibers 11 and 12 are arranged in the vertically directions. When the wafer-conveying plate 40 is inserted between a cassette and a wafer 21, which is laminated on a boat, and when the wafer 21 is mounted on the wafer-conveying plate and conveyed, the part between the fibers 11 and 12 is cut by the wafer 21. Whether the wafer is present or not on the wafer conveying plate 40 can always be discriminated, even the time when the wafer is mouted and the wafer is conveyed.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は基板搬送装置に関
し、特に半導体製造工程で使用される半導体ウェーハ処
理装置に於ける半導体ウェーハ搬送装置に関するもので
ある。
The present invention relates to a substrate transfer apparatus, and more particularly to a semiconductor wafer transfer apparatus in a semiconductor wafer processing apparatus used in a semiconductor manufacturing process.

【0002】[0002]

【従来の技術】半導体ウェーハ搬送装置に於けるウェー
ハ搬送はウェーハ搬送プレート上にウェーハを載せて搬
送している。従来はこのウェーハ搬送に於いてウェーハ
をウェーハ搬送プレートに真空吸着することでウェーハ
搬送プレート上のウェーハ有無を検知してきた。しか
し、デバイスの高集積化にともないパーティクル問題等
が重要さを増しており、真空吸着では、吸着面が剥離等
を起こしウェーハにダメージを与えるばかりかウェーハ
の剥離によって生じた塵埃が装置内を汚染し、半導体ウ
ェーハ処理の精度を低下させる場合もある。
2. Description of the Related Art In a semiconductor wafer transfer apparatus, a wafer is transferred by mounting a wafer on a wafer transfer plate. Conventionally, in this wafer transfer, the presence or absence of the wafer on the wafer transfer plate has been detected by vacuum-sucking the wafer to the wafer transfer plate. However, particle problems are becoming more important due to the high integration of devices.In vacuum suction, not only does the suction surface cause separation, etc., causing damage to the wafer, but also dust generated by the separation of the wafer contaminates the inside of the equipment. However, the accuracy of semiconductor wafer processing may be reduced.

【0003】[0003]

【発明が解決しようとする課題】本発明の目的は、前述
の真空吸着によるウェーハ有無検知の問題点を解決し、
真空吸着しなくてもウェーハ等の基板有無検知のできる
基板搬送装置を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to solve the above-described problem of detecting the presence or absence of a wafer by vacuum suction.
It is an object of the present invention to provide a substrate transfer device capable of detecting the presence or absence of a substrate such as a wafer without vacuum suction.

【0004】[0004]

【課題を解決するための手段】請求項1によれば、基板
搬送プレート近傍に、基板をはさんで動作する一対の透
過式センサを前記基板搬送プレートと共に移動可能に設
けたことを特徴とする基板搬送装置が提供される。
According to the first aspect of the present invention, a pair of transmission type sensors which operate with a substrate interposed therebetween are provided near the substrate transport plate so as to be movable together with the substrate transport plate. A substrate transfer device is provided.

【0005】このようにすれば、真空吸着しなくても、
基板搬送装置による基板搬送において基板搬送プレート
上に基板をのせて基板を搬送中は常に基板搬送プレート
上に基板が有るか無いかを判断する事ができる。
[0005] In this way, even if vacuum suction is not performed,
In the substrate transfer by the substrate transfer device, the substrate is placed on the substrate transfer plate, and during the transfer of the substrate, it can be always determined whether or not the substrate is on the substrate transfer plate.

【0006】請求項2によれば、前記一対の透過式セン
サを前後にずらして設けたことを特徴とする請求項1記
載の基板搬送装置が提供される。
According to a second aspect of the present invention, there is provided the substrate transport apparatus according to the first aspect, wherein the pair of transmission sensors are provided to be shifted back and forth.

【0007】このようにすれば、複数の基板が鉛直方向
に積層されている基板支持台(例えばカセットやボー
ト)から基板を持ち上げたり降ろしたりする際、センサ
が他の基板にぶつかる事なく基板を搬送できる。
With this configuration, when a substrate is lifted or lowered from a substrate support (eg, a cassette or boat) on which a plurality of substrates are stacked in a vertical direction, the substrate can be moved without hitting another substrate. Can be transported.

【0008】[0008]

【発明の実施の形態】次に、本発明の実施の形態を図面
を参照して説明する。
Next, embodiments of the present invention will be described with reference to the drawings.

【0009】(第1の実施の形態)図1は、本発明の第
1の実施の形態の半導体ウェーハ搬送装置を説明するた
めの図であり、図1Aは縦断面図、図1Bは図1AをX
X方向からみた正面図である。図2は、本発明の第1の
実施の形態の半導体ウェーハ搬送装置において使用する
透過型ファイバセンサを説明するための斜視図である。
(First Embodiment) FIG. 1 is a view for explaining a semiconductor wafer transfer apparatus according to a first embodiment of the present invention. FIG. 1A is a longitudinal sectional view, and FIG. 1B is FIG. 1A. To X
It is the front view seen from the X direction. FIG. 2 is a perspective view for explaining a transmission fiber sensor used in the semiconductor wafer transfer device according to the first embodiment of the present invention.

【0010】本実施の形態においては、ファイバ11、
12の真横に光軸をもつサイドビュウタイプの透過式フ
ァイバセンサ10の検知部をウェーハ搬送プレート40
の横の近傍にくる様に設置し、透過式ファイバセンサ1
0の検知部をウェーハ搬送プレート40と共に移動可能
に設けた。この際、ファイバ11、12は上下方向に配
置されるようにした。ウェーハ21をウェーハ搬送プレ
ート40に載せる為に、ウェーハ搬送プレート40をカ
セットやボートに積層されたウェーハ21間に差し込ん
だ場合、ウェーハ21によってセンサ10のファイバ1
1、12間を切る様にした。また、ウェーハ搬送プレー
ト上にウェーハ21を搭載して搬送する場合において
も、センサ10のファイバ11、12間にウェーハ21
がくるようにして、ウェーハ搬送中も常にウェーハ搬送
プレート40上にウェーハが有るか無いかを判断する事
ができるようにした。
In the present embodiment, the fibers 11,
The detection unit of the transmission type fiber sensor 10 of the side view type having the optical axis
Installed so that it is near the side of the
The 0 detection unit is provided so as to be movable together with the wafer transfer plate 40. At this time, the fibers 11 and 12 were arranged vertically. When the wafer transfer plate 40 is inserted between the wafers 21 stacked in a cassette or a boat in order to place the wafer 21 on the wafer transfer plate 40, the wafer 21 causes the fiber 1 of the sensor 10 to be mounted.
Cut between 1 and 12. Also, when the wafer 21 is mounted on the wafer transfer plate and transferred, the wafer 21 is placed between the fibers 11 and 12 of the sensor 10.
Thus, it is possible to always determine whether or not there is a wafer on the wafer transfer plate 40 even during wafer transfer.

【0011】図2に示すように、この透過式ファイバセ
ンサ10においては、ファイバ11、12はアンプ60
に接続されると共に、ファイバ11、12の先端部はス
テンレススリーブ31、32内にそれぞれ収容されてい
る。
As shown in FIG. 2, in the transmission type fiber sensor 10, fibers 11 and 12 are connected to an amplifier 60.
And the distal ends of the fibers 11 and 12 are accommodated in stainless steel sleeves 31 and 32, respectively.

【0012】本実施の形態のこのシステムは数々の成膜
種による評価でも全てのウェーハの有無を検知した。な
お、ウェーハ有無検知をする為、反射式のファイバセン
サを用いてみたが、ウェーハ上にできる成膜種により、
反射しない場合があった。
The system according to the present embodiment also detects the presence or absence of all wafers even in the evaluation using various types of film formation. In order to detect the presence or absence of a wafer, a reflection type fiber sensor was used.
In some cases, it did not reflect.

【0013】(第2の実施の形態)図3は、本発明の第
2の実施の形態の半導体ウェーハ搬送装置を説明するた
めの図であり、図3Aは縦断面図、図3Bは図3AをY
Y方向からみた正面図である。図4は、本発明の第2の
実施の形態の半導体ウェーハ搬送装置において使用する
透過型ファイバセンサを説明するための斜視図である。
(Second Embodiment) FIG. 3 is a view for explaining a semiconductor wafer transfer device according to a second embodiment of the present invention. FIG. 3A is a longitudinal sectional view, and FIG. 3B is FIG. 3A. Is Y
It is the front view seen from the Y direction. FIG. 4 is a perspective view for explaining a transmission fiber sensor used in the semiconductor wafer transfer device according to the second embodiment of the present invention.

【0014】本実施の形態では、透過型ファイバセンサ
を構成するファイバ13、14を前後にずらして配置し
た斜め検知タイプ透過式ファイバセンサ15を使用し
た。他の点は上記第1の実施の形態と同じとした。この
ような斜め検知タイプ透過式ファイバセンサ15を使用
すれば、ウェーハ23をカセットやボートから持ち上げ
たり降ろしたりする際、上側のファイバ13がウェーハ
23の上側のウェーハ22にぶつかることが容易に防止
できるようになる。
In the present embodiment, an oblique detection type transmission type fiber sensor 15 in which the fibers 13 and 14 constituting the transmission type fiber sensor are arranged so as to be shifted back and forth is used. Other points are the same as those of the first embodiment. By using such an oblique detection type transmission type fiber sensor 15, it is possible to easily prevent the upper fiber 13 from hitting the upper wafer 22 of the wafer 23 when the wafer 23 is lifted or lowered from the cassette or the boat. Become like

【0015】このような斜め検知タイプ透過式ファイバ
センサ15を製造するためには、光軸を斜め前に出す必
要があるが、そのためには、図4に示すように、ファイ
バ13の先端を斜めにカットしてするか、プリズムで光
軸を曲げればよい。
In order to manufacture such an oblique detection type transmission type fiber sensor 15, it is necessary to extend the optical axis obliquely forward. For this purpose, as shown in FIG. Or bend the optical axis with a prism.

【0016】[0016]

【発明の効果】本発明によれば、真空吸着を利用したウ
ェーハ等の基板有無検知による吸着面の剥離や剥離によ
る塵埃の装置内汚染、半導体ウェーハ等の基板処理の精
度の低下等を防ぐだけでなく確実なウェーハ等の基板搬
送の実現、真空用配管の不要による省スペース化、装置
の簡略化等の実現が可能となる。
According to the present invention, it is only necessary to prevent separation of the suction surface by detecting the presence or absence of a substrate of a wafer or the like utilizing vacuum suction, contamination of the inside of the apparatus by dust due to separation, and a decrease in accuracy of substrate processing of a semiconductor wafer or the like. Rather, it is possible to realize a reliable transfer of a substrate such as a wafer, a space saving by eliminating a vacuum pipe, and a simplification of an apparatus.

【0017】又、真空吸着でのウェーハ等の基板検知同
様、常に、ウェーハ等の基板の有無を認識できる。
Further, as in the case of detecting a substrate such as a wafer by vacuum suction, the presence or absence of a substrate such as a wafer can always be recognized.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の第1の実施の形態の半導体ウェーハ搬
送装置を説明するための図であり、図1Aは縦断面図、
図1Bは図1AをXX方向からみた正面図である。
FIG. 1 is a view for explaining a semiconductor wafer transfer device according to a first embodiment of the present invention, and FIG. 1A is a longitudinal sectional view;
FIG. 1B is a front view of FIG. 1A viewed from the XX direction.

【図2】本発明の第1の実施の形態の半導体ウェーハ搬
送装置において使用する透過型ファイバセンサを説明す
るための斜視図である。
FIG. 2 is a perspective view for explaining a transmission fiber sensor used in the semiconductor wafer transfer device according to the first embodiment of the present invention.

【図3】本発明の第2の実施の形態の半導体ウェーハ搬
送装置を説明するための図であり、図3Aは縦断面図、
図3Bは図3AをYY方向からみた正面図である。
FIG. 3 is a view for explaining a semiconductor wafer transfer device according to a second embodiment of the present invention, and FIG.
FIG. 3B is a front view of FIG. 3A viewed from the YY direction.

【図4】本発明の第2の実施の形態の半導体ウェーハ搬
送装置において使用する透過型ファイバセンサを説明す
るための斜視図である。
FIG. 4 is a perspective view for explaining a transmission fiber sensor used in a semiconductor wafer transfer device according to a second embodiment of the present invention.

【符号の説明】[Explanation of symbols]

10…サイドビュウタイプ透過式ファイバセンサ 11〜14…ファイバ 15…斜め検知タイプ透過式ファイバセンサ 21〜23…ウェーハ 31〜33…ステンレススリーブ 40…ウェーハ搬送プレート 51、52…光 60…アンプ DESCRIPTION OF SYMBOLS 10 ... Side view type transmission type fiber sensor 11-14 ... Fiber 15 ... Oblique detection type transmission type fiber sensor 21-23 ... Wafer 31-33 ... Stainless steel sleeve 40 ... Wafer transfer plate 51, 52 ... Light 60 ... Amplifier

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】基板搬送プレート近傍に、基板をはさんで
動作する一対の透過式センサを前記基板搬送プレートと
共に移動可能に設けたことを特徴とする基板搬送装置。
1. A substrate transport apparatus, comprising: a pair of transmission type sensors which are sandwiched between substrates and are movable near the substrate transport plate together with the substrate transport plate.
【請求項2】前記一対の透過式センサを前後にずらして
設けたことを特徴とする請求項1記載の基板搬送装置。
2. The substrate transfer apparatus according to claim 1, wherein said pair of transmission sensors are provided shifted from front to back.
JP29152197A 1997-10-07 1997-10-07 Substrate-conveying device Withdrawn JPH11111811A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29152197A JPH11111811A (en) 1997-10-07 1997-10-07 Substrate-conveying device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29152197A JPH11111811A (en) 1997-10-07 1997-10-07 Substrate-conveying device

Publications (1)

Publication Number Publication Date
JPH11111811A true JPH11111811A (en) 1999-04-23

Family

ID=17769984

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29152197A Withdrawn JPH11111811A (en) 1997-10-07 1997-10-07 Substrate-conveying device

Country Status (1)

Country Link
JP (1) JPH11111811A (en)

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Legal Events

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Effective date: 20041207