JPH1080668A - Washing unit and continuous washing device for disk substrate - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a washing unit and a continuous washing device for a disk substrate which are capable of preventing the generation of irregularity in washing and effectively executing continuous washing in the washing process of the disk substrate. SOLUTION: A pair of scrubbing rolls 11 which have a center axis line extended in a nealy vertical direction and are rotatably supported is installed contactably with both surfaces of the disk substrate D placed lengthwise, the peripheral edge part of the disk substrate D is supported by being brought into contact with one pressing roller 15 from one side thereof, and being brought into contact with two supporting rollers 16, 17 from the other side thereof, and a washing liquid is ejected toward both surfaces of the disk substrate from a washing liquid jetting nozzle 26. When the washing of the disk substrate D is completed, the disk substrate D is sent out of the washing setting position by rotation of a pair of the scrubbing rolls 11 and simultaneously the supporting rollers 16, 17 are also moved upward and downward respectively, thereby allowing the disk substrate D to pass between the supporting rollers 16, 17 and to move to the next process.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a disk unit cleaning unit and a continuous cleaning apparatus, and more particularly, to a cleaning unit and a continuous cleaning apparatus used for cleaning a disk substrate in a magnetic recording medium manufacturing process.

[0002]

2. Description of the Related Art For example, in the process of manufacturing a magnetic recording medium used in a hard disk drive or the like, that is, a magnetic disk, etc., the surface of the disk substrate is subjected to a texturing process of mechanically forming a streak on the surface of a metal disk substrate. And then cleaning the disk substrate after polishing.

Conventionally, this cleaning step has been performed by an apparatus as described below. That is, this type of conventional cleaning apparatus includes a spindle (not shown) which is relatively inserted into the center opening of the disk substrate after surface polishing and supports it, as shown in FIG. The scrub rolls 2 cantilevered on both sides of the supported disk substrate 1 were arranged.

According to such a conventional cleaning apparatus, the disk substrate 1 is rotated by the rotation of the spindle, and at the same time, the two scrub rolls 2 are rotated in opposite directions as indicated by arrows 3, respectively. Sliding contact with the surface. In the meantime, a predetermined cleaning liquid is sprayed onto the surface of the disk substrate 1 from a cleaning liquid injection nozzle (not shown).

[0005]

However, in the conventional disk substrate cleaning apparatus, since the disk substrate is supported by the spindle inserted in the center opening thereof,
The tip of the spindle disturbs and the scrub roll 2 is radially inward of the disk substrate (the portion along the periphery of the center opening).
There was a concern that it could not be slid properly, resulting in uneven cleaning.

In the conventional disk substrate cleaning apparatus,
The scrub roll was configured to be cantilevered as shown in FIG. 6 because the disc substrate was supported by a spindle contained in its center opening. If the scrub roll is supported by a cantilever and you try to press the scrub roll against the disc substrate,
It is difficult for the pressing pressure to be uniformly applied to the entire length direction,
In addition, there is a problem that a shake is liable to occur when this is rotated at a high speed.

As described above, even when the scrub roll cannot be pressed against the disk substrate with a uniform pressing force in the longitudinal direction, or when the scrub roll rotates and the scrub roll is rotated, the disk substrate may be displaced. Cannot be pressed with a uniform pressure of the scrub roll against the surface of the scrub roll.

As a result, the cleaning of the disk substrate surface becomes uneven, and it is expected that the subsequent processing steps will be hindered. In addition, the inability to rotate the scrub roll at high speed necessitates a certain amount of time for cleaning the disk substrate, which causes a problem that the cleaning operation is not very efficient.

In the conventional disk substrate cleaning apparatus,
As described above, since each disk substrate is rotatably supported by the spindle, if a plurality of such cleaning devices are arranged to perform continuous continuous cleaning, it takes a lot of time to move and reset the disk substrate, and the continuous There is a problem that cleaning efficiency is very poor.

SUMMARY OF THE INVENTION An object of the present invention is to solve the above-mentioned conventional problems, and it is an object of the present invention to provide a disk substrate capable of eliminating unevenness of cleaning in a disk substrate cleaning step and efficiently performing continuous cleaning. A cleaning unit and a continuous cleaning device are provided.

[0011]

SUMMARY OF THE INVENTION The present invention relates to a disk substrate cleaning unit, which is configured as follows to achieve the above-mentioned technical object. In other words, the disk substrate cleaning unit of the present invention was installed so as to be able to contact both surfaces of the vertically placed disk substrate at the cleaning set position, and was rotatably supported by extending the central axis in a substantially vertical direction. A pair of scrub rolls, at least one pressing roller that abuts and supports the peripheral edge of the disk substrate from one side thereof, and at least two that abuts and supports the peripheral edge of the disk substrate from the other side. A pair of scrub rolls, wherein the pair of scrub rolls are movable so as to be separated from each other and close to each other; Can also be moved up and down so as to be separated from each other, and when cleaning of the disk substrate is completed, the pair of scrubbers The roll rotates to feed the disk substrate from the cleaning set position, and the two support rollers also move upward and downward, respectively, so that the disk substrate passes between the two support rollers and can be moved to the next step. It is characterized by that.

The pressing roller, which is an important component in the present invention, can be moved upward or downward to remove the uncleaned disk substrate transferred vertically from the previous step of cleaning by the two scrubbings. The cleaning set position between the rolls can be positioned.

The outer periphery of the pressing roller and the two support rollers is provided with a V for stably supporting the disk substrate.
It is preferable to form a U-shaped groove or the like, and to engage the outer edge of the disk substrate with this groove.

<Additional Configuration in the Present Invention> The disk substrate cleaning unit of the present invention comprises the above-mentioned components, but is established even when the components are specifically as follows. The specific components thereof, the scrub roll is a relatively rigid support shaft and a roll scrub armored to the support shaft, an internal passage formed in the support shaft in the axial direction, and through which a cleaning liquid flows, The roll scrub is formed on the outer peripheral surface of the support shaft, and a plurality of holes communicating with the internal passage are connected to an opening of the internal passage at an end of the support shaft. A cleaning liquid supply source for supplying the cleaning liquid, wherein the cleaning liquid permeated from the inside of the roll scrub from the cleaning liquid supply source through the internal passage of the support shaft and the plurality of holes is blown out by centrifugal force to thereby provide the roll scrub. Is characterized by self-cleaning. In this case, the roll scrub attached to the support shaft may be a sponge-like material similar to a conventional roll scrub.

Further, the present invention is a continuous cleaning apparatus for a disk substrate, wherein a large number of the above-mentioned cleaning units are arranged in a row, and the disk substrates are rolled and transferred to the adjacent cleaning units between the respective cleaning units. A guide rail is installed, and a fluid ejecting nozzle is installed to apply a rolling force to the disc substrate transferred to the guide rail, and the disc substrate rolls on the guide rail by the fluid blown out from the fluid ejecting nozzle. The disk substrate can be continuously and repeatedly cleaned by being transferred to the cleaning unit.

According to such a disk substrate cleaning unit of the present invention, when the disk substrate is first set in the cleaning unit, the disk substrate is sandwiched and supported by a pair of scrub rolls in a vertical position. Thereafter, one pressing roller abuts from one peripheral edge of the disk substrate, and two support rollers abut from the other peripheral edge of the disk substrate, whereby the disk substrate is completely disengaged. Supported in a falling state.

Thereafter, the pair of scrub rolls are positioned so as to lightly contact the surface of the disk substrate. Next, the support roller is driven, and the disk substrate is rotated in contact with the support roller. At the same time, the pair of scrub rolls are also rotated in directions opposite to each other, and the cleaning liquid is sprayed from the cleaning liquid jet nozzle toward the rotating disk substrate and the scrub roll.

Thus, the rotating roll scrub comes into sliding contact with the rotating disk substrate surface, and the surface of the disk substrate is wiped and cleaned by using the sprayed cleaning liquid. The use of roll scrub causes dirt to adhere to its surface. In that case, the cleaning liquid is sent out from the inside through the internal passage of the support shaft on which the roll scrub is provided and the plurality of holes on the peripheral surface of the support shaft, and is blown out from the inside of the roll scrub by centrifugal force. . In this way, the scrub roll is self-cleaned by the cleaning liquid that permeates from inside and is blown out.

Further, by arranging the above-described disk substrate cleaning units in one row in the horizontal direction, the cleaning can be performed several times continuously. In that case, the disk substrate that has been cleaned by one cleaning unit rolls on the guide rail to the adjacent cleaning unit, and is set at a predetermined position. At this time, a rolling force can be applied by spraying a fluid such as a cleaning liquid or air toward the disk substrate from the fluid ejection nozzle provided between the cleaning units in the traveling direction.

[0020]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a disk substrate cleaning unit and a continuous cleaning apparatus according to the present invention will be described in more detail with reference to the embodiments shown in the drawings. FIG. 1 shows a continuous cleaning apparatus A for a disk substrate according to an embodiment of the present invention. The continuous cleaning device A is substantially an aggregate of a plurality of cleaning units 10, and therefore, the configuration of one cleaning unit 10 will be described first.

The disk substrate cleaning unit 10 is shown in FIG.
4 to FIG. FIG. 2 is a configuration explanatory view schematically showing, in an enlarged scale, a part of the continuous cleaning apparatus A for disk substrates shown in FIG. 1, and FIG. 3 is a sectional view taken along line 3-3 in FIG. FIG. 4 is a sectional view showing the internal structure of the scrub roll.

The cleaning unit 10 is disposed at a position to be cleaned (hereinafter, simply referred to as a "cleaning set position") on a vertical line along both surfaces of the vertically placed disk substrate D. A pair of scrub rolls 11 are provided so as to be sandwiched from the side. The scrub roll 11 includes two roll scrubs 11b externally provided near a lower end of a relatively rigid rotatable support shaft 11a that is suspended from above.

These two roll scrubs 11b are provided at an interval from each other so as to come into contact with the surface portion from the inside to the outside in the radial direction except for the center opening of the disk substrate D. It is preferable that each roll scrub 11b mounted and mounted on the support shaft 11a be made of a sponge-like material similar to a conventional one.

The support shaft 1 of the pair of scrub rolls 11
1a is connected to a shaft rotating device 12 (see FIG. 1) installed above, so that each scrub roll 1
1 are rotatable in mutually opposite directions. Further, the support shaft 11a of the scrub roll 11 is supported by a shaft reciprocating device 13 (see FIG. 1) so as to be separated from each other.

Therefore, when the scrub rolls 11 are moved in a direction approaching each other, the roll scrubs 11b strongly contact and pinch the disk substrate D. 11b is in a non-contact state with the disk substrate D.

The roll scrub 11b is
When dirt adheres to the surface due to use, the dirt is removed by self-cleaning. This structure will be specifically described with reference to FIG. Roll scrub 1
The upper end of the support shaft 11a that covers the outer periphery 1b is inserted into the lower end concave portion of the hollow rotary shaft 34, and is firmly connected by being tightened by the tightening nut 35.

At this time, the upper end surface of the support shaft 11a and the rotating shaft 3
4, the inner passages 11c, 34
A ring-shaped seal 36, preferably a Teflon seal, arranged concentrically with a. A pulley 37 is mounted on the upper portion of the rotating shaft 34, and a pulley (not shown) attached to the pulley 37 and a driving shaft (not shown).
A belt 38 is hung between the shaft and the shaft to transmit the rotation of the driving shaft to the rotating shaft 34.

Inside the support shaft 11a, an internal passage 11c for flowing a cleaning liquid, that is, a self-cleaning liquid, is formed in the axial direction, and communicates with the internal passage 34a of the rotating shaft 34. This support shaft 1
A plurality of holes 1 communicating with the internal passage 11c are provided on the outer surface of the roll 1b on the periphery of the roll scrub 11b.
1d is formed.

The self-cleaning liquid supply pipe 14 is inserted into the internal passage 11c above the support shaft 11a via the internal passage 34a of the rotary shaft 34. One end of the self-cleaning liquid supply pipe 14 is located near the upper end of the support shaft 11a, and the other end protrudes from the upper end of the rotating shaft 34 and is fixed by a support bracket 39.

As described above, the cleaning liquid supply pipe 14 inserted and arranged in the internal passage of the support shaft 11a via the internal passage 34a of the rotary shaft 34 has an opening having a diameter smaller than the diameter of the internal passages 11c and 34a. The ring-shaped seal 36 is inserted relatively tightly into the support shaft 11a, whereby the support shaft 11a of the cleaning liquid supply pipe 14 is inserted.
Is relatively accurately positioned with respect to the internal passage 11c, thereby preventing the sliding contact with the rotating support shaft 11a and the rotating shaft 34.

On the other hand, the other end of the cleaning liquid supply pipe 14 is connected to a cleaning liquid supply source (not shown) by a suitable pipe (not shown). Thus, the support shaft 1
The self-cleaning liquid is supplied to the internal passage 11c of 1a even during the rotation. Thereby, the self-cleaning liquid supplied from the cleaning liquid supply source to the internal passage 11c of the support shaft 11a during the rotation of the scrub roll 11 penetrates into the roll scrub 11b from the inside through the plurality of holes 11d, and is centrifuged. Blow out. As a result, dirt on the surface of the roll scrub 11b can be easily removed.

A plurality of radially extending drain passages 34b are radially formed on the connecting portion of the rotating shaft 34 with the support shaft 11a, in other words, on the rotating shaft 34 above the position where the seal 36 is disposed. ing. This drainage channel 34
b indicates that the cleaning liquid supplied to the internal passage 11c of the support shaft 11a is in an overflow state and passes through a slight gap between the seal 36 and the peripheral wall of the self-cleaning liquid supply pipe 14, and the rotating shaft 3
4 is for draining the self-cleaning liquid to the outside when rising up the internal passage 34a.

Thus, the internal passage 11 of the support shaft 11a is
Even if the cleaning liquid supplied to c is in an overflow state, it can be prevented from overflowing from the upper end of the rotating shaft 34 and scattering to the driving unit, and the durability of the driving unit and the reliability of its operation can be obtained. . The size (diameter) or number of the drainage channel 34b can be determined according to the expected amount of overflow, and the drainage channel 34b can be formed vertically if necessary.

At the cleaning set position for cleaning, one pressing roller 15 is provided at a position slightly above the horizontal center line on the left side of the disk substrate D as viewed in FIG. Similarly, on the right side of the disk substrate D as viewed in FIG. 2, two support rollers 16 and 17 are provided at positions above and below the horizontal center line, respectively.

The pressing roller 15 and the supporting roller 1
V-shaped grooves are formed in the outer peripheral portions of 6, 17. Accordingly, when the rollers 15, 16, 17 support the outer peripheral portion at a predetermined position by circumscribing the outer peripheral edge of the disk substrate D, the outer peripheral groove portion of each roller is engaged with the outer peripheral edge of the disk substrate D. The contact makes it possible to stably support the disk substrate D.

The pressing roller 15 and the supporting roller 1
Reference numerals 6 and 17 are rotatably supported by shafts extending to the back side of the paper as viewed in FIG. The shaft (not shown) of the former pressing roller 15 is merely for supporting the roller 13, but the shafts 18, 19 of the supporting rollers 16, 17 are provided.
Are used as drive shafts so that the support rollers 16, 17 function as drive rollers for the disk substrates.

As shown in FIG. 3, the drive shafts 18 and 19 are rotatably supported by bearings 22 mounted on the mounts 20 and 21, and are also provided with servo motors mounted on the mounts 20 and 21. 23 and 24 drive shafts. Below the mounts 20, 21, two air cylinder devices 25 (only one air cylinder device is shown in FIG. 3) are installed.
Reference numeral 21 is connected to the piston rod 25a of the air cylinder device 25, and is movably supported in the moving direction of the rod.

As a result, each of the mounts 20 and 21 can be moved up and down by the operation of each air cylinder device 24. When the gantry 20, 21 moves up and down, the support rollers 1
6 and 17 move so as to be spaced apart from each other as indicated by their solid and dotted lines in FIG.

Further, as shown in FIGS. 2 and 3, two cleaning liquid jet nozzles 26 are installed diagonally above the cleaning set position. This cleaning liquid injection nozzle 26
Is directed so that the cleaning liquid can be sprayed obliquely upward from both surfaces of the disk substrate D.

As shown in FIG. 3, these cleaning liquid injection nozzles 26 are connected to a cleaning liquid supply source (not shown) by a suitable pipe 27, and the cleaning liquid supplied from the cleaning liquid supply source to a predetermined pressure is supplied to each cleaning liquid injection source. The liquid is sent to the nozzle 26 and is ejected from the nozzle 26 to the disk substrate D like a shower.

The configuration of the disk substrate cleaning unit 10 is as described above. By arranging such cleaning units 10 in a horizontal line and allowing the disk substrate D to move sequentially through the cleaning units 10, the disk substrate D is moved. Can be constituted.

In the disk substrate continuous cleaning apparatus A,
As shown in FIGS. 1 and 2, when the disk substrate D existing at the cleaning set position moves to the adjacent cleaning unit 10, it rolls from the cleaning set position and moves to the cleaning set position of the adjacent cleaning unit 10. A guide rail 28 is provided so as to be able to do so. The guide rail 28 is formed in a U-shaped groove shape in cross section, and the groove width is set slightly larger than the thickness dimension of the disk substrate D.

When the disc substrate D moves to another cleaning unit 10 adjacent thereto, the guide rail 28 rolls and moves. At this time, the disc substrate D is also supported above the guide rail 28 to prevent the disc substrate D from falling down. Rail 29 for
Is installed. A fluid ejection nozzle 30 for applying a rolling force to the disk substrate D is provided near one end of the support rail 28 (the side where the disk substrate enters).

The fluid ejecting nozzle 30 applies fluid blown from the nozzle like a shower to the disk substrate D
And rolls the disk substrate D toward the adjacent cleaning unit 10.
Therefore, the nozzle 30 is installed such that its blowing direction is directed to the traveling direction of the disk substrate D and is directed to the upper half from the center of the disk substrate.

On the movement path of the disk substrate D that moves on the guide rail 28, when the guide rail 28 rolls and moves to the adjacent cleaning unit 10, it is synchronized with the disk substrate support posture of the adjacent cleaning unit 10. That is, in order to take the timing, the disk substrate D is
A stopper 31 for temporarily stopping on 8 is provided.

As shown in FIG. 3, the stopper 31 has a vertically movable rod 31a which is suspended from above, and a roller 31b is rotatably attached to the lower end of the rod 31a. 1, the left side of the continuous disk substrate cleaning apparatus A is a supply receiving portion for setting the disk substrate D in the first cleaning unit 10, and a supply rail exactly the same as the guide rail described above. 32 are installed.

In FIG. 1, the right side of the disk substrate continuous cleaning device A is a discharge receiving portion for taking out the disk substrate D from the last cleaning unit 10 and setting the disk substrate D in the stacking section S. The same discharge rail 33 as the guide rail is provided.

Next, the operation of the disk substrate continuous cleaning apparatus A according to this embodiment will be described. After the texturing step and the substrate surface polishing step, the disk substrate D is placed on the supply rail 32 in the supply / reception section of the continuous cleaning apparatus A, and the cleaning operation is substantially started.

The disk substrate D placed on the supply rail 32 rolls on the slightly inclined supply rail 32 and moves to the first cleaning unit 10. At this time, the pressing roller 15 in the cleaning unit 10 moves upward and is in a standby state, and the pair of scrub rolls 11 move left and right as viewed in FIG. Waiting open.

The disk substrate D, which has been rolled and moved on the supply rail 32, rotates as soon as it enters between the pair of scrub rolls 11 and sandwiches the disk substrate D and rotates slightly. The disk substrate D is forcibly advanced, and the two support rollers 16, 1
7 Thus, the disk substrate D is set at the cleaning set position of the first cleaning unit 10. Therefore, the opposite rotation directions of the pair of scrub rolls 11 need to be such that the side in sliding contact with the disk substrate D pushes the disk substrate D forward.

Thereafter, the pressing roller 15 descends from above and comes into contact with the peripheral edge on one side of the disk substrate D. Since the two support rollers 16 and 17 are in contact with the upper circumferential portion and the lower circumferential portion of the disk substrate D at the cleaning set position with respect to the horizontal center line, one side of the pressing roller 15 is provided. It is supported in a completely non-falling state in combination with the engagement with the other circumferential portion.

Next, pure water as a cleaning liquid is sprayed vigorously in a shower form from the cleaning liquid injection nozzle 26,
By rotating the two support rollers 16 and 17, the disk substrate D is rotated, and simultaneously, the pair of scrub rolls 11 are rotated in opposite directions. Thus, the disk substrate D at the cleaning set position is cleaned.

At this time, the rotation speed of the scrub roll 11 is about 0 to 2000 rpm, and the rotation speed of the disc substrate D is about 0 to 2000 rpm.
It is preferable to select in the range of 300 rpm. However,
The option of both rotating at 0 is excluded.

As a result, the roll scrubs 11b of the pair of scrub rolls 11 are brought into sliding contact with both surfaces of the disc substrate D, and the both surfaces are evenly wiped using the sprayed cleaning liquid. About 7 to 10 seconds,
After preferably cleaning for 7.5 seconds, the rotation of the two support rollers 16, 17 and the pair of scrub rollers 11 is stopped. The two support rollers 16 and 17 are vertically separated from each other as shown by an arrow 40 in FIG. 2, and form a passage for the disk substrate D to move onto the adjacent guide rail 28.

At this time, if the lower support roller 17 is lowered to almost the same height as the guide rail 28, the lower support roller 17 can guide the space from the washing set position to the guide rail 28. Therefore, stable and reliable movement of the disk substrate D can be guaranteed.
When the two support rollers 16 and 17 open up and down to form a space for moving the disk substrate D, the pair of scrub rolls 11 are then driven again for a short time.

As a result, the disk substrate D sandwiched between the pair of scrub rolls 11 is pushed out in the rotation direction of the slab rolls 11 and moves from the cleaning set position to the guide rails 28. In this manner, the disk substrate D that has moved onto the guide roller 28 at the same time has its upper peripheral edge engaged with the support rail 29, thereby preventing falling during movement.

Next, the disk substrate D that has moved onto the guide rails 28 is temporarily stopped on the guide rails 28 by the stopper 31 in order to synchronize with, ie, take timing with, the disk substrate support in the adjacent cleaning unit 10. Then, when the disk substrate receiving posture in the adjacent cleaning unit 10 is established, the rod 31a constituting the stopper 30 is raised, and the lower roller 3
The contact between the disk substrate 1b and the disk substrate D is released.

Thereafter, the fluid ejecting nozzle 30 installed near one end (the side where the disk substrate enters) of the supporting rail 29 installed above the guide rail 28 faces in the direction of travel of the disk substrate D. For example, a fluid such as a cleaning liquid or air is sprayed in a shower shape, whereby a rolling force is applied to the disk substrate D.

As a result, the disk substrate D rolls on the guide rail 28 and moves to the next cleaning set position of the cleaning unit 10, and the disk substrate D is held and cleaned at this cleaning set position in the same manner as described above. You. The disk substrate D moves each cleaning unit 10 while repeating such an operation.

When the cleaning of one disk substrate D in the final stage, that is, the sixth cleaning unit 10 in this embodiment, is completed, the disk substrate D is sent out onto the discharge rail 33 of the discharge receiving portion. From there to the stacking unit S by suitable means.

When the scrub cleaning of the disk substrate D is performed in each cleaning unit 10 as described above, the roll scrub 11b of the scrub roll 11 becomes dirty. In this case, the cleaning liquid is sent out from the inside through the internal passage 11c of the support shaft 11a on which the roll scrub 11b is provided and the plurality of holes 11d on the support shaft peripheral surface, and the centrifugal force is applied from inside the roll scrub 11b. It is blown out. Thus, the scrub roll 11b is self-cleaned by the cleaning liquid that permeates from inside and is blown out.

As is apparent from such an operation, according to the disk substrate continuous cleaning apparatus A according to this embodiment, the disk substrate D can be continuously moved so as to flow through the plurality of cleaning units 10. Work time can be reduced. This means that the cleaning time in each cleaning unit can be lengthened on the basis of the working time in the conventional cleaning process.

Further, in the disk substrate continuous cleaning apparatus A according to this embodiment, when the disk substrate D moves between the cleaning units 10, a cleaning liquid or compressed air or the like is sprayed from the fluid ejection nozzle 30 to apply a moving force. Since the so-called shower conveyance is performed, a transfer structure in which the chamfer portion C of the disk substrate D does not contact the side wall of the guide rail 28 as shown in FIG. The occurrence of damage during D transfer can be extremely reduced.

In the disk substrate cleaning unit according to the above-described embodiment, the pressing roller 15 uses one roller that hangs down from above. However, two rollers may be used similarly to the supporting roller, or Only one may be arranged so that it can move downward.

[0065]

As described above, according to the disk substrate cleaning unit of the present invention, the vertically placed disk substrate is moved up and down from both sides by two support rollers, which are also moved upward or downward. The disk substrate is supported by at least one movable pressing roller and is sandwiched between a pair of scrub rolls, so that the disk substrate can be fed or unloaded from the side to the cleaning set position. Can be set very easily and in a very short time, and since the disk substrate is not supported by the spindle as in the prior art, the disk substrate can be washed evenly.

Further, according to the apparatus for continuously cleaning a disk substrate of the present invention, the disk substrate can be continuously moved so as to flow through a plurality of cleaning units, so that the time required for transfer to each cleaning unit is greatly reduced. As a result, the working time in the cleaning process can be reduced. This has the effect that the cleaning time in each cleaning unit can be lengthened on the basis of the working time in the conventional cleaning process.

[Brief description of the drawings]

FIG. 1 is a perspective view showing a continuous cleaning apparatus for a disk substrate according to an embodiment of the present invention.

FIG. 2 is a configuration explanatory view schematically showing a partially enlarged apparatus for continuously cleaning the disk substrate shown in FIG. 1;

FIG. 3 is a vertical sectional view showing one cleaning unit constituting a continuous cleaning apparatus for a disk substrate, which is cut along line 3-3 in FIG. 2;

FIG. 4 is a cross-sectional view of a scrub roll in a cleaning unit according to an embodiment of the present invention, in which the scrub roll is longitudinally cut to show a self-cleaning means of the scrub roll.

FIG. 5 is a cross-sectional view schematically showing a part of the disk substrate moving on a guide rail in the continuous disk substrate cleaning apparatus shown in FIG. 1;

FIG. 6 is a perspective view schematically showing a conventional disk substrate cleaning apparatus.

[Explanation of symbols]

 Reference Signs List A Continuous cleaning device for disk substrate D Disk substrate 10 Cleaning unit 11 Scrub roll 11a Support shaft 11b Roll scrub 11c Internal passage 11d Hole 12 Axis rotating device 13 Axis reciprocating device 14 Self-cleaning liquid supply pipe 15 Holding roller 16 Supporting roller 17 Support Roller 18 axis 19 axis 20 gantry 21 gantry 22 bearing 23 servomotor 24 servomotor 25 air cylinder device 25a piston rod 26 cleaning liquid injection nozzle 27 cleaning liquid supply pipe 28 guide rail 29 support rail 30 fluid injection nozzle 31 stopper 32 supply rail 33 Ejection rail

Claims (4)

[Claims] 1. A pair of scrub rolls which are installed so as to be in contact with both surfaces of a vertically placed disk substrate at a cleaning set position, and are rotatably supported by extending a central axis in a substantially vertical direction, and At least one pressing roller that abuts and supports the peripheral edge of the disk substrate from one side thereof, at least two support rollers that abuts and supports the peripheral edge of the disk substrate from the other side, and the disk A cleaning liquid spray nozzle for spraying a cleaning liquid toward both surfaces of the substrate, wherein the pair of scrub rolls are movable so as to be separated from each other, and the two support rollers are also separated from each other. Can be moved up and down respectively,
When the cleaning of the disk substrate is completed, the pair of scrub rolls rotate to send out the disk substrate from the cleaning set position, and the two support rollers also move upward and downward, respectively. A disk substrate cleaning unit characterized in that the disk substrate cleaning unit can be moved to the next step by passing between support rollers. 2. The press roller is movable upward or downward, and can position an uncleaned disk substrate, which has been transported in a vertical position from a pre-cleaning process, at a cleaning set position between the two scrub rolls. The disk unit cleaning unit according to claim 1, wherein: 3. A support shaft in which the scrub roll is relatively rigid, a roll scrub armored on the support shaft, an internal passage formed in the support shaft in an axial direction, and through which a cleaning liquid flows, and the roll scrub includes: A plurality of holes formed on the outer peripheral surface of the support shaft and communicating with the internal passage, and a cleaning liquid supply connected to an opening of the internal passage at an end of the support shaft to supply the cleaning liquid to the passage; A cleaning liquid permeated from the inside of the roll scrub from the cleaning liquid supply source through the internal passage and the plurality of holes of the support shaft by centrifugal force to self-clean the roll scrub. 3. The disk substrate cleaning unit according to claim 1, wherein: 4. A plurality of disk substrate cleaning units according to claim 1 are arranged in a horizontal row, and a guide rail for rolling and transferring the disk substrate to the adjacent cleaning unit is provided between each of the cleaning units. A fluid ejecting nozzle is installed to apply a rolling force to the disk substrate transferred to the guide rail, and the disk substrate rolls on the guide rail by the fluid blown out from the fluid ejecting nozzle to perform the next cleaning. A disk substrate continuous cleaning apparatus, wherein the disk substrate is continuously and repeatedly cleaned by being transferred to a unit.