JPH1079337A5 - - Google Patents

Info

Publication number
JPH1079337A5
JPH1079337A5 JP1996234158A JP23415896A JPH1079337A5 JP H1079337 A5 JPH1079337 A5 JP H1079337A5 JP 1996234158 A JP1996234158 A JP 1996234158A JP 23415896 A JP23415896 A JP 23415896A JP H1079337 A5 JPH1079337 A5 JP H1079337A5
Authority
JP
Japan
Prior art keywords
optical system
projection
light
light beam
projection optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP1996234158A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1079337A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP8234158A priority Critical patent/JPH1079337A/ja
Priority claimed from JP8234158A external-priority patent/JPH1079337A/ja
Priority to EP19970113696 priority patent/EP0823662A2/en
Publication of JPH1079337A publication Critical patent/JPH1079337A/ja
Publication of JPH1079337A5 publication Critical patent/JPH1079337A5/ja
Withdrawn legal-status Critical Current

Links

JP8234158A 1996-08-07 1996-09-04 投影露光装置 Withdrawn JPH1079337A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP8234158A JPH1079337A (ja) 1996-09-04 1996-09-04 投影露光装置
EP19970113696 EP0823662A2 (en) 1996-08-07 1997-08-07 Projection exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8234158A JPH1079337A (ja) 1996-09-04 1996-09-04 投影露光装置

Publications (2)

Publication Number Publication Date
JPH1079337A JPH1079337A (ja) 1998-03-24
JPH1079337A5 true JPH1079337A5 (cg-RX-API-DMAC7.html) 2004-11-11

Family

ID=16966571

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8234158A Withdrawn JPH1079337A (ja) 1996-08-07 1996-09-04 投影露光装置

Country Status (1)

Country Link
JP (1) JPH1079337A (cg-RX-API-DMAC7.html)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003532281A (ja) * 2000-04-25 2003-10-28 エーエスエムエル ユーエス，インコーポレイテッド 照明偏光の制御を備えた光学縮小システム
TW200412617A (en) * 2002-12-03 2004-07-16 Nikon Corp Optical illumination device, method for adjusting optical illumination device, exposure device and exposure method
WO2004090952A1 (ja) 2003-04-09 2004-10-21 Nikon Corporation 露光方法及び装置、並びにデバイス製造方法
TWI474132B (zh) 2003-10-28 2015-02-21 尼康股份有限公司 照明光學裝置、投影曝光裝置、曝光方法以及元件製造方法
TWI512335B (zh) 2003-11-20 2015-12-11 尼康股份有限公司 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法
KR101099847B1 (ko) 2004-01-16 2011-12-27 칼 짜이스 에스엠티 게엠베하 편광변조 광학소자
US20070019179A1 (en) 2004-01-16 2007-01-25 Damian Fiolka Polarization-modulating optical element
TWI379344B (en) 2004-02-06 2012-12-11 Nikon Corp Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method
US7324280B2 (en) * 2004-05-25 2008-01-29 Asml Holding N.V. Apparatus for providing a pattern of polarization
TWI423301B (zh) * 2005-01-21 2014-01-11 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
KR101544336B1 (ko) 2005-05-12 2015-08-12 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
JP2006332197A (ja) * 2005-05-24 2006-12-07 Nikon Corp 鏡筒、露光装置及び光学素子の検出方法並びにデバイスの製造方法
SG143178A1 (en) * 2006-11-27 2008-06-27 Asml Netherlands Bv Lithographic apparatus, device manufacturing method and computer program product
US7903234B2 (en) 2006-11-27 2011-03-08 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and computer program product
US20080285000A1 (en) * 2007-05-17 2008-11-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4971932B2 (ja) * 2007-10-01 2012-07-11 キヤノン株式会社 照明光学系、露光装置、デバイス製造方法および偏光制御ユニット
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
JP5164007B2 (ja) * 2008-10-09 2013-03-13 株式会社ブイ・テクノロジー 近接露光装置

Similar Documents

Publication Publication Date Title
JPH1079337A5 (cg-RX-API-DMAC7.html)
JP2536023B2 (ja) 露光装置、及び露光方法
US6774984B2 (en) Optical imaging system with polarizer and a crystalline-quartz plate for use therewith
JP3005203B2 (ja) 照明装置、露光装置及びデバイス製造方法
JP3246615B2 (ja) 照明光学装置、露光装置、及び露光方法
KR930005116A (ko) 상투영 방법과 그 방법을 사용한 반도체 디바이스의 제조방법
KR970049048A (ko) 반도체소자 제조를 위한 노광 방법 및 그를 이용한 노광장치
JPH0478002B2 (cg-RX-API-DMAC7.html)
EP0496891A4 (en) Method and device for optical exposure
KR950033690A (ko) 투영노광장치
KR960042225A (ko) 투영노출방법 및 노출장치
JP3099933B2 (ja) 露光方法及び露光装置
TW490597B (en) Multi-mirror-system for an illumination system, and the illumination system, EUV-projection exposure unit for microlithography, and process for producing microelectronic devices comprising and using the same
EP2645405A3 (en) Illumination optical apparatus and projection exposure apparatus
JP2000003852A5 (ja) 投影露光装置、投影露光装置の調整方法、及び投影露光方法
CN101685264A (zh) 光学照明装置、曝光装置以及曝光方法
KR900008299A (ko) 조명방법 및 그 장치와 투영식 노출방법 및 그 장치
JPH1064790A5 (cg-RX-API-DMAC7.html)
KR20000076783A (ko) 투사노출시스템 및 마이크로리소그라피에서의 노출방법
US5663785A (en) Diffraction pupil filler modified illuminator for annular pupil fills
JPH1050585A5 (cg-RX-API-DMAC7.html)
TW201435515A (zh) 微影投影曝光設備的光學系統
JPH0666246B2 (ja) 照明光学系
JP3128396B2 (ja) 露光方法及び露光装置
JP2503696B2 (ja) 投影露光装置