JPH1071722A - Manufacture of inkjet head - Google Patents

Abstract

PROBLEM TO BE SOLVED: To improve accuracy of an ink flow path, to decrease fluctuation of jetting characteristics of ink drops and to improve quality of an image. SOLUTION: After a dry film resist 75 of the first layer is laminated on a nozzle plate 51, only parts corresponding to a pressure liq. room 64 and an ink feeding path being a fluid resistance part are exposed to light with a mask pattern. Then, after a dry film resist 77 of the second layer is laminated on the dry film resist 75, it is exposed to light with a mask pattern with which the pressure liq. room 64 and the other parts 65 are made to required shapes and the dry film resists 75 and 77 are developed by one operation.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing an ink jet head, and more particularly to a method of manufacturing an ink jet head in which a plurality of film-shaped photosensitive resin layers are used to form a liquid chamber partition.

[0002]

2. Description of the Related Art An ink jet recording apparatus has little vibration and noise at the time of recording and is easy to colorize. Therefore, it is used not only for a printer for outputting data of a digital processing device such as a computer but also for facsimile and copying. It is supposed to be. Such an ink jet recording apparatus is
A nozzle for discharging ink droplets, an actuator element such as an electromechanical transducer or an electrothermal transducer provided corresponding to the nozzle, and an ink flow path pressurized by the actuator element (hereinafter referred to as “pressurized liquid”). By using an ink jet head having a chamber as a recording head and discharging ink droplets from nozzles to a recording medium (to which ink droplets adhere) according to a recording signal, high-speed, high-resolution,
It performs high quality recording.

With the demand for higher speed and higher image quality of the ink jet recording apparatus, it is necessary to increase the degree of integration of the nozzles of the ink jet head and to reduce the diameter of the nozzles. For this reason, it is indispensable to improve the degree of integration of the liquid chamber structure and to make the fluid resistance portion finer to balance fluidly.

However, on the other hand, if the flying ink droplet volume is not ensured, the image quality deteriorates. Therefore, a pressurized liquid chamber or an ink flow path for supplying ink to the pressurized liquid chamber (hereinafter referred to as a “common liquid chamber”) ) Cannot be reduced so much. Therefore, securing the volume of the liquid chamber by increasing the pitch in the nozzle arrangement direction causes a reduction in the degree of integration, so that the volume in the liquid chamber volume is increased by increasing the thickness in the direction perpendicular to the nozzle arrangement direction, mainly in the thickness direction. We are trying to secure them.

Therefore, the liquid chamber requires a thin fluid resistance portion serving as an ink supply path between the common liquid chamber and the pressurized liquid chamber, and a thick pressurized liquid chamber and a common liquid chamber. In order to form them arbitrarily, various ink jet heads have been proposed in which thin layers such as a metal plate or a film-like photosensitive resin layer (dry film resist) are laminated in the thickness direction to form an ink flow path. ing.

For example, Japanese Patent Application Laid-Open No. 4-369546 discloses a method in which a first layer photosensitive resin is laminated on a glass substrate, exposed by a first mask pattern, and a second layer photosensitive resin is formed on the first layer photosensitive resin. A method for manufacturing an ink jet head is described in which a conductive resin is laminated, exposed by a second mask pattern, and the photosensitive resin is developed to form a flow path substrate.

Japanese Patent Application Laid-Open No. 4-216951 discloses a method in which a first photosensitive material layer for forming an ink flow path is provided on a substrate provided with an energy generating element, and the ink flow path is formed in the first photosensitive material layer. A pattern exposure for forming is performed, then a second photosensitive material layer is further provided on the first photosensitive material layer, and a pattern exposure for forming an ink discharge port and an ink supply port is performed on the second photosensitive material layer. And a method for manufacturing an ink jet head for developing the second photosensitive material layer.

As described above, in the conventional method of manufacturing an ink jet head in which a photosensitive resin layer is laminated to form a liquid chamber partition, the photosensitive resin layer is formed in order to form a fine structure and simplify the process. A method of repeating lamination and pattern exposure, and finally developing the photosensitive resin layer collectively is used.

[0009]

However, in the case of using the method of finally developing all at once as described above, the first photosensitive resin in which a cured region and an uncured region are mixed by pattern exposure is used. Since the second photosensitive resin layer softened by heating is laminated on the layer, the thickness of the second photosensitive resin layer varies depending on the area of the cured region of the first photosensitive resin layer. Specifically, the thickness of the second photosensitive resin layer is smaller in an area where the area of the cured region of the first photosensitive resin layer is small than in an area where the area of the cured region is large.

As described above, when the thickness of the photosensitive resin layer forming the partition wall of the ink flow path fluctuates, the pressurized liquid chamber requiring high accuracy and the pressurized liquid chamber and the common liquid chamber are separated. The dimensional accuracy of the fluid resistance portion (ink supply path) communicating therewith is degraded, and the ejection characteristics of ink droplets from a plurality of nozzles are varied, thereby deteriorating recording quality.

SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and has as its object to improve ink flow path accuracy, reduce variations in ink droplet ejection characteristics, and improve image quality.

[0012]

According to a first aspect of the present invention, there is provided a method of manufacturing an ink jet head, comprising: laminating a plurality of film-shaped photosensitive resin layers on a substrate; In the method of manufacturing an ink jet head having a partition wall portion, a first photosensitive resin layer on the substrate side of two film-shaped photosensitive resin layers that are in contact with each other is cured so that a cured region is substantially uniform in a laminating direction. After that, another photosensitive resin layer was laminated on the first photosensitive resin layer.

According to a second aspect of the present invention, there is provided a method of manufacturing an ink jet head, wherein a plurality of nozzles, a plurality of pressurized liquid chambers communicating with the nozzles, and all or a part of a common liquid chamber for supplying ink to each pressurized liquid chamber. (A) laminating a first photosensitive resin layer on a substrate, and (b) forming a first photosensitive resin layer on the substrate. Exposing the photosensitive resin layer to only the portion corresponding to the pressurized liquid chamber and the fluid resistance portion communicating the pressurized liquid chamber and the common liquid chamber with a mask pattern, and (c) exposing the first photosensitive layer After laminating the second photosensitive resin layer on the resin layer, (d) exposure is performed with a mask pattern having a desired shape in the pressurized liquid chamber portion and other portions,
(E) The first and second photosensitive resin layers are collectively developed.

According to a third aspect of the present invention, there is provided a method for manufacturing an ink jet head, wherein a plurality of nozzles, a plurality of pressurized liquid chambers communicating with the nozzles, and all or a part of a common liquid chamber for supplying ink to each pressurized liquid chamber. (A) laminating a first photosensitive resin layer on a substrate, and then (b) forming a first photosensitive resin layer on the substrate. The photosensitive resin layer is exposed with a mask pattern that provides a substantially uniform exposure area in the laminating direction of the second photosensitive resin layer.
After laminating the second photosensitive resin layer on the photosensitive resin layer of (1), (d) the entire liquid chamber is exposed with a mask pattern having a desired shape, and (e) the first and second photosensitive resins are exposed. The layers were developed in a batch.

According to a fourth aspect of the present invention, there is provided a method for manufacturing an ink jet head according to the second or third aspect, wherein the steps (a) and (b) are repeated to form a final photosensitive resin layer. After forming the above steps (c) and (d) when forming the above, the above (e) step is performed to form a desired partition wall having a photosensitive resin layer having three or more different patterns. The configuration is such that a liquid chamber shape is formed.

According to a fifth aspect of the invention, there is provided a method of manufacturing an ink jet head according to any one of the first to fourth aspects, wherein the substrate on which the photosensitive resin layer is laminated has a plurality of nozzles. Was adopted.

[0017]

Embodiments of the present invention will be described below with reference to the accompanying drawings. 1 is an exploded perspective view of an ink jet head to which the present invention is applied, FIG. 2 is an enlarged sectional view of a main part in a direction orthogonal to the nozzle arrangement direction of FIG. 1, and FIG. 3 is an enlarged sectional view of a main part in the nozzle arrangement direction of FIG. It is.

This ink jet head includes a drive unit 1, a liquid chamber unit 2, and a head cover 3. The drive unit 1 has a plurality of laminated piezoelectric elements 12 joined and arranged in two rows on an insulating substrate 11 made of ceramic, glass epoxy resin or the like, and surrounds the periphery of the laminated piezoelectric elements 12 in each row. The frame member 13 as a liquid chamber support member is joined. Further, a common electrode pattern 14 and an individual electrode pattern 15 are provided on the substrate 11,
These common electrode pattern 14 and individual electrode pattern 1
Numerals 5 are connected to end electrodes 17, 18 in which the internal electrodes of the piezoelectric element 12 are alternately connected via a conductive adhesive 16. The common electrode pattern 14 is electrically connected to each other by filling a conductive adhesive in a hole 19 provided in the frame member 13.

The substrate 11 is supported and held on a spacer member (head holder) 21 serving as a head support member.
A PCB substrate having C and the like and each piezoelectric element 12 of the drive unit 1 are connected via an FPC cable 22 joined to each of the electrode patterns 14 and 15.

The liquid chamber unit 2 includes a vibration plate 23 made of a thin film of metal or resin, and a photosensitive resin layer 2 made of a three-layer photoresist film constituting a liquid chamber partition member.
No. 4, 25, 26 and a nozzle plate 28 made of metal, resin, or the like, in which the nozzle holes 27 are formed, are sequentially laminated and heat-sealed. On the surface of the nozzle plate 28,
A water-repellent film 29, which is a water-repellent surface treatment film, is formed, and a non-water-repellent surface 30 on which no water-repellent treatment is applied is provided around the water-repellent film 29.

The nozzle hole 2 is formed by these members.
7, common ink chambers 32, 32 located on both sides of the pressurized liquid chamber 31, and a fluid resistance unit for supplying ink from the common liquid chamber 32 to the pressurized liquid chamber 31. Are formed.

The nozzle cover (head cover) 3 is formed in a box shape to cover the periphery of the nozzle plate 28 and the side surface of the head, and has an opening corresponding to the water-repellent film 29 of the nozzle plate 28. The non-water-repellent surface 30 of the plate 28 is adhesively bonded with an adhesive.

In order to supply ink from an ink cartridge (not shown) to the liquid chamber, ink supply holes 35 to 38 are provided in the spacer member 21, the substrate 11, the frame member 13 and the vibration plate 21, respectively.
Is provided.

Next, a process for assembling the liquid chamber unit will be described with reference to FIGS. Here,
In order to simplify the description, an example will be described in which the photosensitive resin layer constituting the liquid chamber partition member in the above embodiment has a two-layer structure.

First, a member having a photosensitive resin layer formed on the vibration plate 23 is manufactured as follows. As shown in FIG. 4A, a diaphragm 23 made of a Ni (nickel) metal plate is manufactured in advance by using an electron forming method (electroforming), and then, as shown in FIG. A negative dry film resist 41 as a photosensitive resin is laminated on a flat surface by heat and pressure. The thickness of this dry film resist is, for example, about 20 to 50 μm.

As shown in FIG. 3C, ultraviolet rays (U) are applied by using a mask 42 having a pattern corresponding to the shape of the ink flow path (in FIG.
V light) Exposure is performed to cure the exposed portion of the dry film resist 41. As a result, the dry film resist 41 has a cured region (exposed portion) 41a as a solvent insolubilized region and an uncured region (unexposed portion) 41b as a solvent solubilized region, as shown in FIG.

As shown in FIG. 2E, development is performed using a solvent capable of removing the unexposed portion, the unexposed portion 41b is removed, and the exposed portion 41a is left. Thus, the photosensitive resin layer 43 having a predetermined pattern is formed. After rinsing with water and drying, it is fully cured again by exposure to ultraviolet light and heating.

On the other hand, a member having a photosensitive resin layer formed on the nozzle plate 28 side is manufactured in the same manner as the vibration plate 23 side. That is, as shown in FIG. 5A, a nozzle plate 28 having a nozzle 27 made of a Ni (nickel) metal plate is manufactured in advance by using an electron forming method (electroforming) as shown in FIG. Nozzle plate 2
A negative dry film resist 45 as a photosensitive resin is laminated on the surface on the side of the diaphragm 8 by heat and pressure. The thickness of this dry film resist is, for example, 40 to
It is about 100 μm.

As shown in FIG. 3C, exposure is performed with UV light using a mask 46 having a pattern corresponding to the shape of the ink flow path, and the exposed portion of the dry film resist 45 is cured. Thereby, the dry film resist 4
Reference numeral 5 denotes a cured region (exposed portion) 45 as shown in FIG.
a and an uncured region (unexposed portion) 45b are generated.

As shown in FIG. 3E, development is performed using a solvent capable of removing the unexposed portion, the unexposed portion 45b is removed, and the exposed portion 45a is left. Thus, the photosensitive resin layer 46 having a predetermined pattern is formed. After rinsing with water and drying, it is fully cured again by exposure to ultraviolet light and heating.

Then, as shown in FIG. 6, the corresponding surfaces of the photosensitive resin layer 43 and the photosensitive resin layer 45 formed of the dry film resist formed on the vibration plate 23 and the nozzle plate 28 are joined. This joining is performed using a positioning jig, and pressure and heating at a higher temperature than in the main curing are performed. Actually, in the above steps, the assembling is performed with a plate having a head area corresponding to a plurality of heads.

Next, as in the above-described ink jet head, two photosensitive resin layers are provided on the nozzle plate side, and one photosensitive resin layer is provided on the diaphragm side to form a three-layer liquid chamber partition structure. A method of manufacturing the nozzle plate side when forming is described. Here, the configuration of the liquid chamber unit is as follows. That is, as shown in FIG. 7, a liquid chamber partition member 53 composed of a photosensitive resin layer having a three-layer structure is interposed between the nozzle plate 51 and the vibration plate 52. As shown in FIG. 8, the nozzle plate 51 has the nozzles 54 formed in a line, and has bubble discharge ports 55 on both sides of the end portion. The supply holes 56 correspond.

The liquid chamber partition member 53 includes a first photosensitive resin layer 61 and a second photosensitive resin layer 62 formed on the nozzle plate 51 side, and a third photosensitive resin layer 63 formed on the diaphragm 52 side. , A pressurized liquid chamber 64, a common liquid chamber 65, an ink supply path 66 also serving as a fluid resistance portion, and an inlet portion from the pressurized liquid chamber 64 to the nozzle 54 (hereinafter, referred to as a "nozzle inlet").
67 are formed respectively.

Here, as shown in FIG. 7 and FIG.
The photosensitive resin layer 61 forms a partition 61 a separating the nozzle inlet 67 from the common liquid chamber 65 and an outer peripheral partition 61 b separating the outer periphery of the common liquid chamber 65, and the second photosensitive resin layer 62 forms a pressurized liquid chamber The third photosensitive resin layer 63 forms an ink supply path 66 and separates the pressurized liquid chamber and the common liquid chamber 65 from each other. The partition 63a and the outer partition 63b are formed. The partition 6 of the second photosensitive resin layer 62
On the side opposite to the ink supply hole 56 of FIG. 2a, the common liquid chambers 65, 65 are continuous with the outer peripheral partition part 62b to form a dead end shape as shown in FIG. 9 (partition walls of the first photosensitive resin layer 61). The same applies to the portion 61a and the outer peripheral partition 61b.)

Therefore, first, in order to compare with the present invention, the first and second photosensitive resin layers 61, 61 on the nozzle plate 51 side of the liquid chamber unit shown in FIG. FIG. 1 shows the process of forming
This will be described with reference to FIG. The nozzles 54 and the like of the nozzle plate 51 are indicated by solid lines in the drawings but are indicated by solid lines until development is completed (the same applies to the following description).

A negative dry film resist 71, which is a film-shaped photosensitive resin, is heated on the diaphragm side of the nozzle plate 51 as shown in FIGS. 10 (a) and 11 (a). And pressure to laminate. Then, as shown in FIG. 10 (c), a mask 72 having portions 72a and 72b in which a region having substantially the same shape as the nozzle inlet 67 of the pressurized liquid chamber 64 and the common liquid chamber 65 cannot be exposed (masked) is used. Exposure to ultraviolet light (UV light).

As a result, FIG. 10 (c) and FIG.
As shown in (c), the hardened regions 71a and 71b corresponding to the partition portions 61a and 61b of the first photosensitive resin layer 61, the nozzle inlet 67, and the common liquid chamber 6 are formed in the dry film resist 71.
The uncured regions 71c and 71d corresponding to No. 5 are formed.

Next, using the nozzle arrangement direction as a laminating direction as shown in FIG. 11C, a negative type dry film resist 73 is laminated on the exposed dry film resist 71 as shown in FIG. 10D. . Then, as shown in FIG. 10 (e), exposure is performed using a mask 74 having portions 74a and 74b that make exposure impossible (masking) in a region having substantially the same shape as the pressurized liquid chamber 64 and the common liquid chamber 65. Thereby, FIG. 10E and FIG.
As shown in (d), the dry film resist 73 has cured regions 73 a and 73 b corresponding to the partition portions 62 a and 62 b of the second photosensitive resin layer 62, a pressurized liquid chamber 64, and a common liquid chamber 6.
The uncured regions 73c and 73d corresponding to No. 5 are formed.

Thereafter, two layers of dry film resist 7
By developing all of 1, 73 simultaneously, FIG.
As shown in FIG. 11F and FIG. 11E, the uncured regions 71c, 71d, 73 of the dry film resists 71, 73, respectively.
The exposed areas 71a, 71b, 73a, 73b become partition walls 61a, 61b, 62a, 62b by performing post-exposure and heating to form a predetermined liquid chamber pattern (ink flow path shape). First and second photosensitive resin layers 61 and 62 are formed.

As described above, with respect to the two film-shaped photosensitive resin layers 61 and 62, the first photosensitive resin layer 61 is exposed with a predetermined mask pattern, and the second photosensitive resin layer 62 is laminated to form a predetermined After exposing with the mask pattern, finally, the two photosensitive resin layers 61 and 62 are collectively developed, post-exposed and heated to perform the third photosensitive resin layer 6 of the diaphragm 52 described above.
The liquid chamber unit is completed by aligning and joining with the liquid chamber 3.

However, in this example, the first photosensitive resin layer 61
The dry film resist 7 that becomes the second photosensitive resin layer 62 after the exposure of the dry film resist 71 that becomes
11 is laminated in the direction shown in FIG. 11C, the areas of the cured areas 71a and 71b of the first layer dry film resist 71 are different between the area A and the area B in the laminating process as shown in FIG. The thickness of the thermally softened second-layer dry film resist 73 is smaller in the region A than in the region B due to the difference in unit weight per area of the cured region of the first layer dry film resist 71. Therefore, the pressurized liquid chamber 64 and the ink supply path 66 serving as a fluid resistance part
Accuracy may decrease.

Therefore, a method of manufacturing an ink jet head according to the present invention will be described with reference to FIGS. In the same manner as described above, FIGS.
A negative dry film resist 75 which is a film-shaped photosensitive resin is laminated on the diaphragm side of the nozzle plate 51 as shown in FIG.

Then, as shown in FIG. 12 (c), a region having substantially the same shape as the portion corresponding to the nozzle inlet 67 of the pressurized liquid chamber 64, the common liquid chamber 65 and the outer peripheral partition 61b is made unexposed (masking). UV exposure using a mask 76 having portions 76a and 76b. As a result, as shown in FIGS. 12C and 13C, the hardened region 75a corresponding to the partition wall 61a of the first photosensitive resin layer 61 and the nozzle inlet 6 are formed in the dry film resist 75.
7. Uncured regions 75b and 75c corresponding to the portions corresponding to the common liquid chamber 65 and the outer partition 61b are formed.

Next, a negative type dry film resist 77 is laminated on the exposed dry film resist 75 as shown in FIG. 12D, with the nozzle arrangement direction as a laminating direction as shown in FIG. 13C. . Then, as shown in FIG. 12 (e), exposure is performed using a mask 78 having portions 78a and 78b in which regions having substantially the same shape as the pressurized liquid chamber 64 and the common liquid chamber 65 are not exposed (masked).

As a result, FIG. 12 (e) and FIG.
As shown in (d), the dry film resist 77 has cured regions 77a and 77b corresponding to the partition portions 62a and 62b of the second photosensitive resin layer 62, a pressurized liquid chamber 64, and a common liquid chamber 6 respectively.
The uncured regions 77c and 77d corresponding to No. 5 are formed.
At the same time, of the uncured region 75c of the dry film resist 75 that has not been exposed in the previous exposure, a portion corresponding to the outer peripheral partition 61b of the first photosensitive resin layer 61 is also exposed to become an exposed region 77b.

Thereafter, the two-layer dry film resist 7
By developing 5,77 in a lump, FIG.
As shown in FIG. 13F and FIG. 13E, the uncured regions 75b, 75c, 7 of the dry film resists 75, 77 are formed.
The exposed areas 75a, 77a, 77b become partition walls 61a, 61b, 62a, 62b by performing post-exposure and heating to form a predetermined liquid chamber pattern (ink flow path shape). First and second photosensitive resin layers 61 and 62 are formed.

Here, when the second layer dry film resist 77 is laminated in the direction shown in FIG. 13C after exposing the first layer dry film resist 75, the first layer dry film resist 75 is exposed. Since the portion corresponding to the outer peripheral partition portion 61b is not exposed and cured, as shown in FIG.
And the cured area of the cured region 75a of the first layer dry film resist 75 becomes substantially the same, and even if the thermally softened second layer dry film resist 77 is laminated, the film thickness is different between the region A and the region B. And the variation in the thickness of the second photosensitive resin layer 62 can be reduced.

As described above, when manufacturing an ink jet head in which a plurality of film-shaped photosensitive resin layers are laminated on a substrate to form a partition of an ink flow path having a predetermined shape, two film-shaped photosensitive resin layers which are in contact with each other are used. After the first photosensitive resin layer on the substrate side of the resin layer is cured so that the cured region is substantially uniform in the laminating direction, another photosensitive resin layer is formed on the first photosensitive resin layer. Because it was made to laminate, the variation in the thickness of the photosensitive resin layer can be reduced,
High-precision parts such as the pressurized liquid chamber and the fluid resistance part can be made with high accuracy, the variation of the ink droplet ejection characteristics from each nozzle is reduced, and the recording quality can be improved. .

Then, as in the above-described ink jet head, a plurality of nozzles, a plurality of pressurized liquid chambers communicating with the nozzles, and all or a part of a common liquid chamber for supplying ink to each pressurized liquid chamber. An ink-jet head in which a partition is formed by laminating a plurality of film-shaped photosensitive resin layers is prepared by (a) laminating a first photosensitive resin layer on a substrate, and (b) forming the first photosensitive resin layer. Only the portion corresponding to the pressurized liquid chamber and the fluid resistance portion communicating the pressurized liquid chamber and the common liquid chamber is exposed with a mask pattern, and then (c) a second photosensitive resin layer is formed on the first photosensitive resin layer. After laminating the photosensitive resin, (d) exposure is performed with a mask pattern having a desired shape in the pressurized liquid chamber and other parts, and (e) the first and second photosensitive resin layers are collectively developed. The first photosensitive resin is manufactured by the manufacturing method having the above structure. Since the cured region of the layer is substantially uniform in the laminating direction of the second photosensitive resin layer, the dimensional accuracy of the pressurized liquid chamber and the fluid resistance portion can be increased, and the variation in the ink discharge characteristics between nozzles can be improved. And image quality is improved.

In this case, in order to make the thickness of the second photosensitive resin layer uniform, the first photosensitive resin layer
It is sufficient that the cured region of the photosensitive resin layer is substantially uniform in the laminating direction. Therefore, for example, as shown in FIG. 14, the outer periphery formed by the first photosensitive resin layer 61 in the liquid chamber unit of FIG. When the shape of the partition 61b is made uniform in the laminating direction, the portion corresponding to the outer peripheral partition 61b of the dry film resist 75 serving as the first layer can be exposed and cured in the step of FIG.

That is, the plurality of nozzles, the plurality of pressurized liquid chambers communicating with the nozzles, and all or some of the partition walls of the common liquid chamber that supplies ink to each pressurized liquid chamber are formed of a plurality of film-shaped photosensitive photosensitive members. An ink-jet head formed by laminating resin layers is formed by (a) laminating a first photosensitive resin layer on a substrate, and (b) transforming the first photosensitive resin layer into a second photosensitive resin layer. Exposure is performed with a mask pattern that provides a substantially uniform exposure area in the laminating direction. Then, (c) after laminating a second photosensitive resin layer on the first photosensitive resin layer, (d) the entire liquid chamber Is also exposed by a mask pattern having a desired shape, and (e) the first and second photosensitive resin layers are collectively developed and manufactured, so that the dimensional accuracy of the pressurized liquid chamber and the fluid resistance portion can be improved. Can increase the ink ejection characteristics between nozzles There is reduced, image quality is improved.

Further, the exposure process is repeated in which the hardened region is almost patterned in the lamination direction in the laminating direction, and is exposed so as to have a desired liquid chamber shape at the time of forming the final layer, and is developed, for example, as shown in FIG. A liquid chamber shape having a complicated structure can be formed.

The liquid chamber unit shown in FIG. 15 has a structure in which a liquid chamber partition member 53 made of a four-layer photosensitive resin layer is interposed between the nozzle plate 51 and the vibration plate 52 shown in FIG. I have to. The liquid chamber partition member 53 here is
First photosensitive resin layer 8 formed on nozzle plate 51 side
1, second photosensitive resin layer 82 and third photosensitive resin layer 83
And a fourth photosensitive resin layer 84 formed on the diaphragm 52 side, and a third photosensitive resin layer 83 and a fourth photosensitive resin layer 84.
To form an ink supply path 66 having a complicated shape also serving as a fluid resistance portion.

The first photosensitive resin layer 81 forms a partition 81a and an outer peripheral partition 81b separating the nozzle inlet 67 and the common liquid chamber 65, and the second photosensitive resin layer 82 forms a pressurized liquid chamber 64. And a common liquid chamber 65, a partition 82a and an outer peripheral partition 82b are formed. The third photosensitive resin layer 63 forms an ink supply path 66 and becomes a partition between the pressurized liquid chamber 64 and the third photosensitive resin layer 63. 83a and the outer peripheral partition 82b, the fourth photosensitive resin layer 84 forms an ink supply path 66, and the pressurized liquid chamber 6
A partition wall portion 84a serving as a partition wall between the common liquid chamber 65 and the common liquid chamber 65 and a partition wall portion 84b on the outer periphery are formed.

The manufacturing process of the liquid chamber unit on the nozzle plate side will now be described with reference to FIGS. In the same manner as described above, a negative dry film resist 85 is laminated on the diaphragm side of the nozzle plate 51 as shown in FIG. 16A, as shown in FIG. As described above, ultraviolet (UV) light exposure is performed using a mask 86 having portions 86a and 86b for masking portions corresponding to the nozzle inlet 67 of the pressurized liquid chamber 64, the common liquid chamber 65, and the outer partition 81b. 18
As shown in (a), a hardened region 85a corresponding to the partition 61a of the dry film resist 85 is formed, and a portion corresponding to the nozzle inlet 67, the common liquid chamber 65, and the outer peripheral partition 81b of the dry film resist 85 is formed. These are uncured regions 85b and 85c.

Next, as shown in FIG. 16D, a negative type dry film resist 87 is laminated on the dry film resist 85. Then, as shown in FIG. 9E, ultraviolet (UV) light exposure is performed using a mask 88 having portions 88a and 88b for masking portions corresponding to the pressurized liquid chamber 64, the common liquid chamber 65, and the outer peripheral partition 81b. Do
As shown in FIG. 18B, the dry film resist 8
7 to form a hardened region 87a corresponding to the partition 62a;
Portions of the dry film resist 87 corresponding to the pressurized liquid chamber 64, the common liquid chamber 65, and the outer peripheral partition 81b are defined as uncured regions 85b and 85c.

Further, as shown in FIG. 17A, a negative type dry film resist 8 is formed on the dry film resist 87.
Laminate 9 Then, as shown in FIG. 3B, the pressurized liquid chamber 64, the common liquid chamber 65, and the ink supply path 66 are formed.
Exposure is carried out using a mask 90 having portions 90a and 90b for masking portions corresponding to the above, and as shown in FIG.
The hardened regions 89a and 89b corresponding to a and 83b are formed. At this time, the uncured regions 8 of the dry film resists 85 and 87 that were not exposed by the previous and previous exposures
The portions corresponding to the outer peripheral partition portions 81b and 82b among the portions 5c and 87c are also exposed to be cured regions 89b. Further, the pressurized liquid chamber 64 of the dry film resist 89 and the common liquid chamber 6
5 and the portion corresponding to the ink supply path 66
9c and 89d.

Thereafter, three layers of dry film resist 8
By developing 5,87,89 in a lump, FIG.
As shown in FIG. 7 (c) and FIG. 18 (d), the uncured regions of the dry film resists 85, 87, 89 are removed, and the exposed regions 85a, 85a,
87a and 89a are partition walls 81a, 81b and 82, respectively.
a, 82b, 83a, 83b, the first, second, and third photosensitive resin layers 81, 82 having a predetermined liquid chamber pattern.
83 are formed.

In the case where the photosensitive resin layer is provided on the nozzle plate in a three-layer structure as described above, lamination and exposure are repeated from the nozzle plate side to the second layer only by forming a pressurized liquid chamber shape. When exposing with a mask pattern that can obtain the entire liquid chamber shape with a certain third layer and developing the three layers at a time, another photosensitive resin layer is laminated and laminated on the exposed photosensitive resin layer. The resulting uneven thickness can be reduced, a complicated ink flow path shape (liquid chamber shape) having a multilayer structure can be formed with high accuracy, and the recording quality can be further improved.

In this case, as for the patterning up to the second layer, other patterns can be formed as long as the exposure area (cured area) is uniform in the laminating direction as in FIG. As a result, even in the case of multi-layer lamination, it is possible to form only a portion having a high required film thickness accuracy with high accuracy.

In the above embodiment, the nozzle plate has been described as an example of a substrate provided with a plurality of film-shaped photosensitive resin layers. However, the diaphragm may be formed of a substrate provided with a plurality of film-shaped photosensitive resin layers. it can. In addition, although the description has been given of an ink jet head using a piezoelectric element as an actuator element, the present invention is similarly applied to an ink jet head using other actuator elements such as a heating resistor, but is not limited thereto. can do.

[0062]

As described above, according to the method for manufacturing an ink jet head according to the first aspect, when a plurality of film-shaped photosensitive resin layers are laminated on a substrate, two film-shaped photosensitive resin layers in contact with each other are used. After the first photosensitive resin layer on the substrate side of the layers is cured so that the cured region is substantially uniform in the laminating direction, another photosensitive resin layer is laminated on the first photosensitive resin layer. This makes it possible to make high-precision parts such as the pressurized liquid chamber and ink supply path that require high dimensional accuracy, reduce variations in the ink droplet ejection characteristics from each nozzle, and improve print quality. Can be improved.

According to the method of manufacturing an ink jet head according to the second aspect, (a) after laminating the first photosensitive resin layer on the substrate, (b) the first photosensitive resin layer is placed in the pressure liquid chamber. And only the portion corresponding to the fluid resistance portion that communicates the pressurized liquid chamber and the common liquid chamber is exposed with a mask pattern,
(C) after laminating the second photosensitive resin layer on the first photosensitive resin layer, (d) exposing the pressurized liquid chamber and other parts with a mask pattern having a desired shape; ) First,
Since the second photosensitive resin layer is configured to be developed in a lump, parts requiring high dimensional accuracy, such as the pressurized liquid chamber and the ink supply path, can be formed with high accuracy, and the pressure from each nozzle can be increased. Variations in ink droplet ejection characteristics are reduced, and recording quality is improved.

According to the method of manufacturing an ink jet head of claim 3, (a) after laminating the first photosensitive resin layer on the substrate, (b) this first photosensitive resin layer is applied to the second photosensitive resin layer. Exposure with a mask pattern that provides a substantially uniform exposure area in the laminating direction of the conductive resin layer, and then (c)
After laminating the second photosensitive resin layer on the first photosensitive resin layer, (d) the entire liquid chamber is exposed with a mask pattern having a desired shape, and (e) the first and second photosensitive resin layers are exposed. Since the resin layer is developed in a batch, parts requiring high dimensional accuracy, such as the pressurized liquid chamber and ink supply path, can be made with high accuracy, and the ink droplet ejection characteristics from each nozzle can be improved. Variation is reduced, and recording quality is improved.

According to the method of manufacturing an ink jet head of claim 4, in the method of manufacturing an ink jet head of claim 2 or 3, after repeating the steps (a) and (b), the final photosensitive resin is obtained. After forming the layers (c) and (d), the step (e) is performed to form a desired liquid having a partition part formed of three or more photosensitive resin layers having different patterns. Since the configuration is such that the chamber shape is formed, a complicated ink flow path shape having a multilayer structure can be formed with high precision, and the recording quality is further improved.

According to a fifth aspect of the present invention, there is provided a method of manufacturing an ink jet head according to any one of the first to fourth aspects, wherein the substrate on which the photosensitive resin layer is laminated has a plurality of nozzles. Since the structure is a member, the step of joining the liquid chamber partition member to the nozzle plate is not required, and the productivity can be improved.

[Brief description of the drawings]

FIG. 1 is an exploded perspective view of an inkjet head to which the present invention is applied.

FIG. 2 is an enlarged sectional view of a main part in a direction orthogonal to the nozzle arrangement direction in FIG.

FIG. 3 is an enlarged sectional view of a main part in a nozzle arrangement direction of FIG. 1;

FIG. 4 is a process diagram illustrating a manufacturing process of a diaphragm in a manufacturing process of a liquid chamber unit.

FIG. 5 is a process chart for explaining a nozzle plate manufacturing process in the liquid chamber unit manufacturing process.

FIG. 6 is a process diagram illustrating the joining of the diaphragm and the nozzle plate in the manufacturing process of the liquid chamber unit.

FIG. 7 is a sectional view illustrating the structure of another liquid chamber unit.

FIG. 8 is a plan view of a nozzle plate of the unit.

FIG. 9 is a plan view of the nozzle plate of the unit viewed from the back side.

FIG. 10 is an explanatory sectional view for explaining a general manufacturing process of the liquid chamber unit on the nozzle plate side;

FIG. 11 is an explanatory plan view for explaining a manufacturing process on the nozzle plate side.

FIG. 12 is a sectional explanatory view for explaining a manufacturing process of the liquid chamber unit on the nozzle plate side according to the present invention.

FIG. 13 is an explanatory plan view for explaining a manufacturing process on the nozzle plate side according to the present invention.

FIG. 14 is an explanatory plan view for explaining still another liquid chamber unit.

FIG. 15 is a sectional view illustrating the structure of still another liquid chamber unit.

FIG. 16 is an explanatory sectional view illustrating a part of a manufacturing process of the liquid chamber unit on the nozzle plate side;

FIG. 17 is an explanatory sectional view for explaining the rest of the manufacturing process on the nozzle plate side of the liquid chamber unit;

FIG. 18 is an explanatory plan view for explaining a manufacturing process on the nozzle plate side.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 ... Actuator unit, 2 ... Liquid chamber unit, 12
... piezoelectric element, 23 ... vibrating plate, 24, 25, 26 ... photosensitive resin layer, 28 ... nozzle plate, 51 ... nozzle plate (substrate for laminating photosensitive resin), 61, 81 ... first photosensitive resin layer, 62, 82... Second photosensitive resin layer, 63, 83
... third photosensitive resin layer, 84 ... fourth photosensitive resin layer, 75,
77, 75, 87, 89: dry film resist, 7
6,78,86,88,90 ... mask.

Claims (5)

[Claims] In a method of manufacturing an ink jet head, a plurality of film-shaped photosensitive resin layers are laminated on a substrate to form a partition wall of an ink flow path having a predetermined shape. In the first substrate side
And after curing the photosensitive resin layer in the laminating direction so that the cured region is substantially uniform, another photosensitive resin layer is laminated on the first photosensitive resin layer. Production method. 2. A method according to claim 1, wherein a plurality of nozzles, a plurality of pressurized liquid chambers communicating with the respective nozzles, and all or a part of a partition wall of a common liquid chamber for supplying ink to each pressurized liquid chamber are formed by a plurality of film-shaped photosensitive members. In the method for manufacturing an ink jet head formed by laminating a photosensitive resin layer, (a) after laminating a first photosensitive resin layer on a substrate, (b) applying the first photosensitive resin layer to the pressurized liquid Only the chamber and a portion corresponding to a fluid resistance portion communicating the pressurized liquid chamber and the common liquid chamber are exposed with a mask pattern, and then (c) a second photosensitive resin layer is formed on the first photosensitive resin layer. After laminating the resin layer, (d) exposure is performed with a mask pattern having a desired shape in the pressurized liquid chamber portion and other portions, and (e) the first and second photosensitive resin layers are collectively exposed. A method for manufacturing an ink jet head, comprising developing. 3. A plurality of film-shaped photosensitive members, wherein a plurality of nozzles, a plurality of pressurized liquid chambers communicating with each nozzle, and all or a part of a partition of a common liquid chamber for supplying ink to each pressurized liquid chamber are provided. In the method for manufacturing an ink jet head formed by laminating resin layers, (a) after laminating a first photosensitive resin layer on a substrate, and (b) second laminating the first photosensitive resin layer to a second photosensitive resin layer Exposure is performed with a mask pattern that provides a substantially uniform exposure area in the laminating direction of the resin layer, and then (c)
After laminating the second photosensitive resin layer on the first photosensitive resin layer, (d) the entire liquid chamber is exposed with a mask pattern having a desired shape, and (e) the first and second photosensitive resin layers are exposed. A method for manufacturing an ink-jet head, wherein a photosensitive resin layer is collectively developed. 4. The method for manufacturing an ink jet head according to claim 2, wherein after the steps (a) and (b) are repeated, the step (c) is performed when a final photosensitive resin layer is formed. And (d), and then performing the step (e) to form a desired liquid chamber shape formed from three or more photosensitive resin layers having different patterns. Head manufacturing method. 5. A method according to claim 1, wherein the substrate on which the photosensitive resin layer is laminated is a nozzle forming member having a plurality of nozzles. Head manufacturing method.