JPH1048414A - Forming method of color pattern for color filter - Google Patents

Abstract

PROBLEM TO BE SOLVED: To produce a color filter of high definition, excellent in color characteristics of pixels and contrast, with good reproducibility, by repeating for required times from a process to form a photosensitive resin coating film on a transparent substrate up to a process to leave only a desired color coating film only on an opening in the photosensitive resin film. SOLUTION: A photosensitive resin compsn. soln. is applied on the whole or a part of one surface of a transparent substrate and dried to form a photosensitive resin coating film. Openings corresponding to a desired pattern are formed on the photosensitive resin film to expose a part of the transparent substrate. A desired color coating film is formed on the whole surface or a part of the transparent substrate coated with the photosensitlve resin. By peeling or developing the unnecessary photosensitive resin film and color coating film on the transparent substrate, only a desired color coating film on the openings of the photosensitive resin film can be left. These processes are repeated for required times to obtain a color filter color pattern.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming a color pattern of a color filter used for multicoloring various display devices such as a liquid crystal display device.

[0002]

2. Description of the Related Art In recent years, a liquid crystal display (LCD) has attracted the most attention among all flat panel displays, and is expected as a high-definition color display that competes with a cathode ray tube (CRT).

[0003] In a liquid crystal display, the most important member for multicoloring (coloring) is a color filter.
Currently, generally used color filter manufacturing methods include a dyeing method, a printing method, a pigment dispersion method, an electrodeposition method, and the like.
Both are excellent methods, but they require a larger screen, higher definition,
Further, there remains a problem to be solved in terms of low-cost manufacturing technology. For example, in the case of the dyeing method, since the dye is deteriorated by heat or light, there is a problem in the heat resistance and / or weather resistance of the coloring layer of the formed color filter. In the case of the printing method, there is a limit to miniaturization of a pattern, and there is a problem in dimensional accuracy. In addition, the electrodeposition method is a method of electrodepositing a colored paint on a substrate having a transparent conductive layer. However, the production cost for forming the transparent conductive layer is high, and the light transmittance of the entire substrate is increased by the conductive layer. Is reduced. In the case of the pigment dispersion method, since an appropriate light transmittance is required for patterning the colored resist, the concentration of the pigment dispersed in the resist cannot be increased, and therefore, the pigment contains a black matrix (BM). In the color filter, there is a problem that a sufficient optical density (OD value) cannot be obtained. In order to solve this problem, a method of forming a two-layer plating layer of metal chromium or chromium oxide as a light-shielding film on a substrate is generally used, but the production process becomes complicated and the production cost is reduced. There is a disadvantage of being expensive.

[0004]

SUMMARY OF THE INVENTION The present invention provides a high-definition color filter for a liquid crystal display which does not suffer from the above-mentioned disadvantages because the functionalities of the photosensitive resin and the coloring paint are high and the degree of freedom is wide. Can be provided.

[0005]

According to the present invention, (I) a photosensitive resin composition solution is applied to the whole or a part of one surface of a transparent substrate and dried to form a photosensitive resin film. Step (II): Exposing the photosensitive resin film through a mask having a pattern corresponding to a desired colored layer portion, and then developing the photosensitive resin film to form an opening corresponding to the desired pattern in the photosensitive resin film. Exposing a part of the transparent substrate to (III) applying a desired colored coating composition to the entire surface or a part of the surface of the transparent substrate on which the photosensitive resin film is provided, and drying the coated composition. And (IV) peeling off or developing both the unnecessary photosensitive resin film and the unnecessary colored paint film on the transparent substrate so that the desired colored paint film is formed only in the openings of the photosensitive resin film. From the process of leaving , Providing the (I) ~ forming method of the color pattern for a color filter by repeating a required number of times the steps of (IV). Further, the present invention provides
A positive-type photosensitive resin solution is used as the photosensitive resin solution, and the surface of the transparent substrate provided with the colored coating film before the step (IV) and / or the surface provided with the colored coating film of the transparent substrate and vice versa. The present invention provides a method for forming a colored pattern for a color filter in which the entire surface is exposed from both sides.
According to the method of the present invention, a high-resolution, high-definition, high-contrast, and high-brightness color filter can be provided by using a high-sensitivity photosensitive resin and a high-pigment-colored paint.

In addition to the present invention, a method of manufacturing a color filter by a photolithography method using a photosensitive resin has been conventionally performed. This involves forming a photosensitive resin film on a substrate, patterning (exposure and development) to form a colored layer, exposing a portion of the substrate, applying a colored paint to the substrate by an appropriate method, In this method, a desired colored layer is formed at a predetermined position by removing (developing) an unnecessary photosensitive resin film. However, this conventional manufacturing method is disadvantageous in terms of production due to the large number of manufacturing steps. In addition, in the process step, in the step of peeling (developing) the photosensitive resin film, insufficient exposure or contact mixing with the colored paint film is required. There are problems such as peeling (development) failure, poor pattern accuracy and white spots (peeling of the colored paint film in necessary portions) caused by the peeling (development). These problems can be dealt with by increasing the exposure dose or strengthening the stripping solution and stripping conditions for the photosensitive resin film, thereby further dissolving and / or dissolving the desired colored pattern layer.
Alternatively, peeling and poor linearity of the pattern may occur.

The present invention overcomes the problems of the conventional photolithography method as described above and provides a high-performance color filter.

[0008]

DETAILED DESCRIPTION OF THE INVENTION The photosensitive resin composition solution used in the present invention may be either a positive type or a negative type photosensitive resin composition solution known to those skilled in the art. It is a type photosensitive resin composition. In order to form a colored pattern layer, a photosensitive resin is applied. However, since the resin is peeled off in a subsequent step, a control margin (specifically, process control such as application conditions and exposure conditions and liquid control) are performed. Management) can be set widely. When the photosensitive resin composition used in the method of the present invention is of a positive type, sequential exposure is not necessarily required, but may be sequential.

In the method of the present invention, a naphthoquinonediazide-based photosensitive resin composition having excellent workability under development and / or peeling conditions and high resolution is preferably used.

In the present invention, the colored coating composition is repelled on the photosensitive resin film to form a nonuniform colored coating film, so that the light transmittance is increased and the penetration of the stripping solution for the photosensitive resin is prevented. Can be promoted. The formation of such a non-uniform colored paint film can be achieved by adding a surface conditioner to the photosensitive resin solution and / or by surface modification such as chemical modification of the photosensitive resin composition by the surface conditioner. Examples of the surface conditioner include silicone resin-based additives, fluororesin-based additives, and generally commercially available surfactants.

The colored coating composition used in the present invention is thermosetting or photocurable, and contains a binder resin and a thermosetting agent in the case of thermosetting, and a binder resin and a photocuring agent in the case of photocuring. It may include a polymerization initiator and a monomer having a polymerizable unsaturated bond. As the binder resin, for example, any of conventionally known resins such as an acrylic resin, an epoxy resin, a polyester resin, a urethane resin, and an amino resin may be used. As a thermosetting agent,
For example, conventionally known compounds such as melamine, epoxy and block isocyanate compounds may be mentioned, and these may be used alone or in combination. As the photopolymerization initiator, for example, conventionally known compounds such as benzoin ether-based, benzyl ketal-based, acetophenone-based, phosphine oxide-based, benzophenone-based, and thioxanthone-based compounds, and if necessary, an organic amine-based photopolymerization accelerator and the like. And these may be used alone or as a mixture. As the monomer having a polymerizable unsaturated bond, similarly to the above compound, a conventionally known compound, specifically, a polyfunctional (meth) acrylate [for example, polyethylene glycol di (meth) acrylate, trimethylolpropane tri ( Meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, pentaerythritol hexa (meth) acrylate, dipentaerythritol penta (meth) acrylate, tris (2-acryloyloxyethyl) isocyanurate, etc. Illustrated, they may be used alone or in combination. In the coloring coating composition used in the present invention, in the case of thermosetting, the compounding amount of the binder resin is 2 to 15% by weight in solid content, the thermosetting agent is 1 to 5% by weight, In this case, the amount of the binder resin is 1 to 15% by weight on a solid basis,
The photopolymerization initiator is 0.01 to 5% by weight, and the polymerizable monomer is 1 to 15% by weight. Further, if necessary, a thermosetting agent may be added to the photocurable composition in the range of 0 to 5% by weight to impart thermosetting properties.

The colored coating composition is prepared by appropriately blending a pigment, a solvent (for example, an organic solvent, water), and a conventionally known additive which is usually used, in addition to the above-mentioned blend. The pigment concentration in the colored coating composition can be any color (black, red, blue,
For example, the pigment of (green) is preferably in the range of 3 to 30% by weight. The combined amount of other additives may be from 0.01 to 5% by weight in the colored coating composition.

The colored coating composition used in the present invention is preferably an aqueous acrylic resin-based coating composition because the coating properties such as coating stability, light resistance, and chemical resistance are easily obtained. .

In the method of the present invention, the photosensitive resin composition and the colored coating composition can be optionally combined, and the colored coating composition has a composition such as a pigment concentration and a nonvolatile content.
It can be changed according to the purpose. Therefore, the present invention is considered to be a method for producing a color filter that can respond to a wide range of uses and purposes.

Further, the method of the present invention will be described in more detail with reference to the accompanying drawings.

FIGS. 1 and 2 show a process of manufacturing a color filter according to the method of the present invention.

FIG. 1A shows a step (I) of the present invention for forming a positive photosensitive resin film 2 on a transparent substrate 1.

As the transparent substrate 1 used in the method of the present invention, a conventionally known transparent substrate for a color filter such as glass and plastic can be used.

In a usual method, the above substrate is washed with a cleaning agent, washed with water, and dried.
The positive photosensitive resin composition can be applied so that the dry thickness of the photosensitive resin film can be adjusted to a desired thickness of the colored pattern layer, and is preferably 5 μm or less, particularly 0.5 to 3.0 μm. I do. The method of applying the photosensitive resin composition to the substrate may be any method such as a spin coating method, a spray method, and a flow coating method, and is performed under appropriate drying conditions (for example, 5 to 20 at 70 to 120 ° C.). ), The solvent contained therein is evaporated to form a photosensitive resin film.

FIGS. 1B to 1C show a case where the photosensitive resin film 2 is exposed to light via a mask 3 having a pattern corresponding to the first colored pattern layer portion and then developed to obtain a desired pattern. The step (II) of the present invention in which a positive photosensitive resin opening corresponding to a pattern is provided to expose a part of the transparent substrate is shown. Exposure and development conditions can be changed depending on the photosensitive resin composition used. Preferred exposure conditions are as follows: Exposure amount: 50 to 50% using a light source having a photosensitive wavelength range of the photosensitive resin composition (for example, an ultrahigh pressure mercury lamp)
It may be performed in a range of 1000 mJ / cm ² by applying a conventionally known method. Further, preferred development conditions are as follows:
Development conditions using 0.1 to 3.0% organic amine aqueous solution:
It may be performed at 10 to 40 ° C. for 30 to 150 seconds by a conventionally known method (for example, a spray method and / or a dipping method).

Preferably, after development, at 20 to 120 ° C., 5
Dry for ~ 60 minutes.

FIG. 1D shows the step (II) of the present invention in which the first colored coating composition is applied to the entire surface or a part of the transparent substrate and dried to form the first colored coating film 4.
I). The method of applying the colored coating composition to the substrate may be any method such as a spin coating method, a flow coating method, and a roll coating method, and may be performed under appropriate drying conditions (for example, 5 to 20 ° C. at 50 to 150 ° C.). Minutes)
By evaporating the contained solvent, a colored paint film is formed. The dry film thickness of the colored paint film on the photosensitive film is
The thinner the better, the better in terms of light transmittance and permeability of the stripping solution. The coating is performed so as to be as thin as possible. Since the film thickness depends on the critical coating film thickness and the film thickness distribution of the coating method, it can be appropriately adjusted at the stage of preparing the coating composition.

FIGS. 1E to 1F show a first example of a transparent substrate.
After the entire surface is exposed from the surface provided with the colored paint film 4 and / or the opposite surface, development is performed to form the first colored pattern layer 5 leaving the desired colored paint film only in the photosensitive resin opening. FIG. 4 illustrates the step (IV) of the present invention. The colored pattern layer 5 represents a black matrix (BM) layer when the colored paint is black, for example. A light source (for example, a high-pressure mercury lamp) that generates light in the UV region is used as a light source for the entire surface exposure used here, and a light source for a surface having a photosensitive resin film on a substrate and a light source for the opposite surface are used. Need not be the same. In this case, the total amount of exposure is preferably in the range of 200 to 1000 mJ / cm ² , including the amount of exposure from both sides of the surface of the substrate having the photosensitive resin film and the opposite surface.
Alternatively, the entire surface exposure may be performed at an exposure amount in the range of 200 to 1000 mJ / cm ² only from the surface of the substrate having the photosensitive resin film.

FIGS. 1G to 1K show the steps of forming the second colored pattern layer 7 by repeating the steps shown in FIGS. 1A to 1F. The conditions for forming the second colored paint film 6 and the second colored pattern layer 7 and the dry film thickness thereof may be the same as those of the first colored paint film 4 and the first colored pattern layer 5. Thereafter, the above-mentioned methods (A) to (F) are repeated as many times as necessary until a desired colored pattern is obtained, whereby the colored pattern layers 8 and 9 are repeated.
Each is formed, and a color filter 10 having a high-quality colored pixel pattern is manufactured (FIG. 1 (L)). Like the first colored pattern 5, the thickness of each colored pattern layer is preferably 3 μm or less from the viewpoint of light transmittance and the like.

This color pattern is finally baked at 250 ° C. for 1 hour by a conventionally known method to provide a color filter 10 for liquid crystal display.

FIG. 2 shows a procedure for forming a colored pattern according to another method of the present invention. FIG.
(C) shows a mask 2 having a pattern corresponding to the first colored pattern layer portion, as in (A) to (C) of FIG.
Step 3 of the present invention in which the positive photosensitive resin film 22 is exposed through 3 and then developed to provide a photosensitive resin opening corresponding to a desired pattern to expose a part of the transparent substrate. (I) to (II) are shown. The dry film thickness of the photosensitive resin film is preferably 5 μm or less, particularly preferably 0.1 μm or less.
It may be in the range of 5 to 3.0 μm.

Next, FIG. 2D shows the first colored paint 24.
Before applying, the substrate 21 is coated with the positive photosensitive resin film 2.
2 shows an optional step of the present invention in which the entire surface is exposed from both sides of the surface provided with 2 and the opposite surface. As the light source for full-surface exposure used here, any of the light sources shown in FIGS. 1E to 1F can be used. By exposing the entire surface of the substrate before applying the coloring paint, advantages such as a reduction in exposure failure, a reduction in exposure time, and a reduction in the number of lamp replacements are thereby achieved. In this case, the total exposure amount is 100 to 60 in total, including the exposure amounts from both sides of the surface of the substrate having the photosensitive resin film and the opposite surface.
A range of 0 mJ / cm ² is preferred. Alternatively, the entire surface exposure is performed only from the surface of the substrate having the photosensitive resin film by 100%.
It may be performed with an exposure amount ranging from ~600mJ / cm ^2.

Thereafter, as shown in FIGS. 2E to 2F, the first colored coating composition is applied to the entire surface or a part of the transparent substrate and dried to form the first colored coating film 2.
After forming 4, the first colored pattern layer 25 with the first colored paint film left only in the photosensitive resin opening can be formed by developing (step (ii) of the present invention).
i) to (iv)). In this case, the formation conditions and the dry film thickness of the colored paint film may be the same as those in FIG.

Next, (g) to (k) of FIG.
2A to 2F are repeated to form a second colored pattern layer 27. Second colored paint film 2
The conditions for forming the sixth colored pattern layer 27 and the dry film thickness thereof may be the same as those of the first colored paint film 24 and the first colored pattern layer 25 described above. afterwards,
Until a desired coloring pattern is obtained, the above (a) to
By repeating the method (f) a required number of times, the colored pattern layers 28 and 29 are formed, and the color filter 30 having a high-quality colored pixel pattern is manufactured ((l) in FIG. 2). As described in FIG. 1, the thickness of each colored pattern layer is preferably 3 μm or less.

This is finally fired at 250 ° C. for 1 hour as described with reference to FIG. 1 to provide a color filter for liquid crystal display.

When the negative photosensitive resin composition is used in the present invention, the entire surface exposure shown in FIGS. 1E and 1J and FIGS. 2D and 2I is not performed. ,
1 (F) and 1 (K) and FIGS. 2 (f) and 2 (k), a release agent is used instead of developing an unnecessary photosensitive resin film and an unnecessary colored paint film on a transparent substrate. And peel off. Examples of the release agent used at that time include a mixture of an aqueous solution of an inorganic alkali, an aqueous solution of an organic amine, and a water-soluble solvent.

[0032]

The present invention will be described below with reference to examples.
The present invention is not limited to the following examples.

Example 1 A color filter was manufactured according to the method of the present invention. Procedure (1) Washed glass substrate (dimensions: 400 × 500 × 0.7 m)
m) in a positive photosensitive resin solution (Photo ED-P-200)
0: Nippon Paint Co., Ltd.) was applied using a spin coater and dried at 100 ° C. for 10 minutes to obtain a positive photosensitive resin film. Contact type film thickness measuring machine (DEKTAK-3030S
T: manufactured by Nippon Vacuum Technology) at a predetermined position (1
(0 places), the dry film thickness of the film was measured. The result is 1.
It was 8 ± 0.3 μm.

After exposing this substrate at an exposure amount of 150 mJ / cm ² using an exposure machine (MAP-1200L: manufactured by Dainippon Screen) through a mask in which the pixel portion is shielded from light, the substrate was exposed to light at 55% relative humidity. Let stand for minutes. Then
After developing in a 1.0% dimethylethanolamine aqueous solution at 20 ° C. for 1 minute, washing, and then drying at 100 ° C. for 10 minutes, an opening corresponding to a predetermined pattern shape is provided to form a part of the substrate. Was exposed.

Procedure (2) Next, a black aqueous resin paint (Excellead BK-130)
0: Nippon Paint Co., Ltd.) was applied on the photosensitive resin film with a spin coater, and then dried at 110 ° C. for 10 minutes.
A film having a dry film thickness of 1.6 ± 0.3 μm (however, a dry film thickness of the colored paint film of the exposed portion of the substrate of 2.0 ± 0.3 μm) was obtained.

This was entirely exposed in the same manner as described above from the surface having the colored coating film on the substrate and the opposite surface at an exposure amount of 400 mJ / cm ² , and then exposed to a 1.0% dimethylethanolamine aqueous solution. By peeling at 30 ° C. for 2 minutes, the unnecessary photosensitive resin film and the unnecessary black coating film were completely peeled off together. After washing with water, the substrate on which the black pattern layer was formed was dried at 160 ° C. for 10 minutes to obtain a black light-shielding pattern layer (black matrix layer).

Step (3) Next, on the substrate on which the black light-shielding pattern layer is formed,
The same photosensitive resin solution as in step (1) is applied, exposed, and developed in the same manner as in step (1) to provide an opening corresponding to the pixel portion of a color different from the above black, and Part of was exposed. Then, in the same manner as in the procedure (2),
A red aqueous resin paint (EXERID R-1300: manufactured by Nippon Paint) is applied so that the dry film thickness of the exposed portion of the substrate is substantially equal to the black light-shielding pattern layer, exposed and developed, and then dried. Thus, a red pixel pattern layer was obtained.

Procedure (4) Then, a green water-based paint (Excelid G-1200:
Using Nippon Paint) and a blue water-based paint (Exelead B-1300: Nippon Paint), the procedure (3)
Were repeated to form green and blue pixel pattern layers.

Procedure (5) The substrate having the black light-shielding pattern layer and the three-color (red, green, and blue) pixel pattern layers formed above was finally fired at 250 ° C. for 1 hour.

Finally, the thicknesses of the red, green and blue pixel pattern layers are respectively red: 1.2 ± 0.2 μm, green:
1.3 ± 0.1 μm, blue: 1.3 ± 0.1 μm. The thickness of the black light-shielding pattern layer around the pixel is 1.1 ± 0.1.
μm. The optical density (OD value) of the produced black matrix layer was 4.3.

Example 2 Using the photosensitive resin composition used in Example 1 and the black, red, green, and blue colored coating compositions, a color filter was prepared according to the following procedure. Procedure (1) In the same manner as in procedure (1) of Example 1, an opening is provided in a part of the substrate in a predetermined pattern shape on a glass substrate (dimensions: 400 × 500 × 0.7 mm) to form the substrate. An exposed positive photosensitive resin film (dry film thickness: 1.5 ± 0.2 μm) was formed.

Procedure (2) Next, in the same manner as in Procedure (2) of Example 1, the entire surface was exposed at an exposure amount of 250 mJ / cm ^{2 from the} front and back surfaces of the substrate. A dry film thickness of 1.5 ± 0.5 μm (provided that the dry film thickness of the colored coating film on the exposed portion of the substrate is 1.8 ± 1 μm) is coated on the conductive resin film with a spin coater and dried at 110 ° C. for 10 minutes. 0.2 μm).

This was peeled off in a 0.5% aqueous solution of dimethylethanolamine at 30 ° C. for 2 minutes to completely peel off the unnecessary photosensitive resin film and unnecessary black film together. After washing with water, the substrate on which the black pattern layer was formed was heated to 160 ° C.
For 10 minutes to obtain a black light-shielding pattern layer (black matrix layer).

Step (3) Next, on the substrate on which the black light-shielding pattern layer is formed,
By repeating the above procedures (I) to (II), red, green, and blue colored paint films were formed.

Procedure (4) The substrate having the black light-shielding pattern layer and the three-color (red, green, and blue) pixel pattern layers formed above was finally fired at 250 ° C. for one hour.

Finally, the thicknesses of the red, green, and blue pixel pattern layers are respectively red: 1.25 ± 0.2 μm, green:
1.3 ± 0.1 μm, blue: 1.2 ± 0.2 μm. The thickness of the black light-shielding pattern layer around the pixel is 1.0 ± 0.1.
μm. The optical density (OD value) of the produced black matrix layer was 3.9.

[0047]

According to the method of the present invention, a color filter having high definition and excellent color characteristics and contrast of pixels can be manufactured with good reproducibility by using a photosensitive resin having high sensitivity and a coloring paint having a high pigment concentration. it can.

[Brief description of the drawings]

FIG. 1 is a cross-sectional view illustrating a manufacturing process of a colored pattern layer for a color filter when a positive photosensitive resin composition is used in the method of the present invention.

FIG. 2 is a cross-sectional view showing a manufacturing process of a color filter colored pattern layer when a positive photosensitive resin composition is used in the method of the present invention.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 ... Transparent substrate, 2 ... Photosensitive resin film, 3 ... Photomask, 4 ... First colored paint film, 5 ... First colored pattern layer,
6 ... second colored paint film, 7 ... second colored pattern layer, 8 ...
3rd colored pattern layer, 9 ... xth colored pattern layer, 10 ...
Color filter, 21: substrate, 22: photosensitive resin film, 23: photomask, 24: first colored paint film, 2
5: first colored pattern layer, 26: second colored paint film, 2
7 ... second colored pattern layer, 28 ... third colored pattern layer,
29: x-th colored pattern layer, 30: color filter.

Claims (4)

[Claims] 1. A step of forming a photosensitive resin film by applying and drying a photosensitive resin composition solution on the whole or a part of one surface of a transparent substrate, and (II) a desired coloring. Through a mask having a pattern corresponding to the layer portion,
By exposing and then developing the photosensitive resin film,
A step of providing an opening corresponding to a desired pattern in the photosensitive resin film to expose a part of the transparent substrate; and (III) a desired coloring on the entire surface or a part of the surface of the transparent substrate on which the photosensitive resin film is provided. By applying the coating composition and drying,
A step of forming a colored paint film, and (IV) peeling or developing both the unnecessary photosensitive resin film and the unnecessary colored paint film on the transparent substrate to obtain desired coloring only at the opening of the photosensitive resin film. It consists of a process that leaves a paint film,
A method of forming a colored pattern for a color filter by repeating the above steps (I) to (IV) a required number of times. 2. The method for forming a color pattern for a color filter according to claim 1, wherein the photosensitive resin solution is a positive photosensitive resin solution. 3. The method according to claim 1, wherein prior to the step (IV), the entire surface is exposed from both sides of the transparent substrate provided with the colored paint film and / or the opposite surface of the transparent substrate provided with the colored paint film. 3. The method for forming a color pattern for a color filter according to item 2. 4. The method according to claim 1, wherein prior to the step (III), the entire surface is exposed from both sides of the transparent substrate provided with the colored paint film and / or the opposite surface of the transparent substrate provided with the colored paint film. 3. The method for forming a color pattern for a color filter according to item 2.