JPH10363A - Formation of coating film having photochemical activity - Google Patents
Formation of coating film having photochemical activityInfo
- Publication number
- JPH10363A JPH10363A JP8152038A JP15203896A JPH10363A JP H10363 A JPH10363 A JP H10363A JP 8152038 A JP8152038 A JP 8152038A JP 15203896 A JP15203896 A JP 15203896A JP H10363 A JPH10363 A JP H10363A
- Authority
- JP
- Japan
- Prior art keywords
- group
- coating film
- organosilane
- function
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 30
- 239000011248 coating agent Substances 0.000 title claims abstract description 28
- 230000000694 effects Effects 0.000 title claims abstract description 6
- 230000015572 biosynthetic process Effects 0.000 title description 4
- 150000001282 organosilanes Chemical class 0.000 claims abstract description 26
- 238000000034 method Methods 0.000 claims abstract description 13
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 11
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims abstract description 10
- 230000001699 photocatalysis Effects 0.000 claims abstract description 9
- 229920006163 vinyl copolymer Polymers 0.000 claims abstract description 8
- 239000008199 coating composition Substances 0.000 claims abstract description 5
- 239000002344 surface layer Substances 0.000 claims abstract description 3
- -1 titanium oxide compound Chemical class 0.000 claims description 16
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims description 14
- 238000005498 polishing Methods 0.000 claims description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 7
- 150000003377 silicon compounds Chemical class 0.000 claims description 5
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- 239000001506 calcium phosphate Substances 0.000 claims description 3
- 229910000389 calcium phosphate Inorganic materials 0.000 claims description 3
- 235000011010 calcium phosphates Nutrition 0.000 claims description 3
- 239000000741 silica gel Substances 0.000 claims description 3
- 229910002027 silica gel Inorganic materials 0.000 claims description 3
- 229910021536 Zeolite Inorganic materials 0.000 claims description 2
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 claims description 2
- 239000010457 zeolite Substances 0.000 claims description 2
- 230000000844 anti-bacterial effect Effects 0.000 abstract description 10
- 230000003373 anti-fouling effect Effects 0.000 abstract description 6
- 230000001877 deodorizing effect Effects 0.000 abstract description 6
- 238000002156 mixing Methods 0.000 abstract description 6
- 239000000758 substrate Substances 0.000 abstract description 5
- 239000012298 atmosphere Substances 0.000 abstract description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- 239000010408 film Substances 0.000 description 16
- 229920001577 copolymer Polymers 0.000 description 15
- 229910000831 Steel Inorganic materials 0.000 description 11
- 239000003973 paint Substances 0.000 description 11
- 239000010959 steel Substances 0.000 description 11
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 10
- 239000000178 monomer Substances 0.000 description 10
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 8
- 229920002554 vinyl polymer Polymers 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 239000000049 pigment Substances 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 5
- 229910010413 TiO 2 Inorganic materials 0.000 description 5
- 239000004568 cement Substances 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 239000003960 organic solvent Substances 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- 239000008096 xylene Substances 0.000 description 5
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- UUAGAQFQZIEFAH-UHFFFAOYSA-N chlorotrifluoroethylene Chemical group FC(F)=C(F)Cl UUAGAQFQZIEFAH-UHFFFAOYSA-N 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 229920003023 plastic Polymers 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 3
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- 230000003301 hydrolyzing effect Effects 0.000 description 3
- 125000000962 organic group Chemical group 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 229920001567 vinyl ester resin Polymers 0.000 description 3
- 239000002023 wood Substances 0.000 description 3
- SKYXLDSRLNRAPS-UHFFFAOYSA-N 1,2,4-trifluoro-5-methoxybenzene Chemical compound COC1=CC(F)=C(F)C=C1F SKYXLDSRLNRAPS-UHFFFAOYSA-N 0.000 description 2
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 2
- 229910001335 Galvanized steel Inorganic materials 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 238000004887 air purification Methods 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- ZMAPKOCENOWQRE-UHFFFAOYSA-N diethoxy(diethyl)silane Chemical compound CCO[Si](CC)(CC)OCC ZMAPKOCENOWQRE-UHFFFAOYSA-N 0.000 description 2
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 239000008397 galvanized steel Substances 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 229910052588 hydroxylapatite Inorganic materials 0.000 description 2
- 230000006698 induction Effects 0.000 description 2
- 229910052500 inorganic mineral Inorganic materials 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- HJOVHMDZYOCNQW-UHFFFAOYSA-N isophorone Chemical compound CC1=CC(=O)CC(C)(C)C1 HJOVHMDZYOCNQW-UHFFFAOYSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 2
- 239000010445 mica Substances 0.000 description 2
- 229910052618 mica group Inorganic materials 0.000 description 2
- 239000011707 mineral Substances 0.000 description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- XYJRXVWERLGGKC-UHFFFAOYSA-D pentacalcium;hydroxide;triphosphate Chemical compound [OH-].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O XYJRXVWERLGGKC-UHFFFAOYSA-D 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 239000002987 primer (paints) Substances 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000010454 slate Substances 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- XQMTUIZTZJXUFM-UHFFFAOYSA-N tetraethoxy silicate Chemical compound CCOO[Si](OOCC)(OOCC)OOCC XQMTUIZTZJXUFM-UHFFFAOYSA-N 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- YQFIWRZWBBOPAF-UHFFFAOYSA-N 1,6-diisocyanatohexane;2-ethyl-2-(hydroxymethyl)propane-1,3-diol Chemical compound CCC(CO)(CO)CO.O=C=NCCCCCCN=C=O YQFIWRZWBBOPAF-UHFFFAOYSA-N 0.000 description 1
- OSNILPMOSNGHLC-UHFFFAOYSA-N 1-[4-methoxy-3-(piperidin-1-ylmethyl)phenyl]ethanone Chemical compound COC1=CC=C(C(C)=O)C=C1CN1CCCCC1 OSNILPMOSNGHLC-UHFFFAOYSA-N 0.000 description 1
- KTIBRDNFZLYLNA-UHFFFAOYSA-N 2-(2-hydroxyethenoxy)ethenol Chemical compound OC=COC=CO KTIBRDNFZLYLNA-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- JJRUAPNVLBABCN-UHFFFAOYSA-N 2-(ethenoxymethyl)oxirane Chemical compound C=COCC1CO1 JJRUAPNVLBABCN-UHFFFAOYSA-N 0.000 description 1
- MTLWTRLYHAQCAM-UHFFFAOYSA-N 2-[(1-cyano-2-methylpropyl)diazenyl]-3-methylbutanenitrile Chemical compound CC(C)C(C#N)N=NC(C#N)C(C)C MTLWTRLYHAQCAM-UHFFFAOYSA-N 0.000 description 1
- WDQMWEYDKDCEHT-UHFFFAOYSA-N 2-ethylhexyl 2-methylprop-2-enoate Chemical compound CCCCC(CC)COC(=O)C(C)=C WDQMWEYDKDCEHT-UHFFFAOYSA-N 0.000 description 1
- WGRZHLPEQDVPET-UHFFFAOYSA-N 2-methoxyethoxysilane Chemical compound COCCO[SiH3] WGRZHLPEQDVPET-UHFFFAOYSA-N 0.000 description 1
- KQOAGTHDNCRFCU-UHFFFAOYSA-N 2-methylhexyl 2-methylprop-2-enoate Chemical compound CCCCC(C)COC(=O)C(C)=C KQOAGTHDNCRFCU-UHFFFAOYSA-N 0.000 description 1
- RUMACXVDVNRZJZ-UHFFFAOYSA-N 2-methylpropyl 2-methylprop-2-enoate Chemical compound CC(C)COC(=O)C(C)=C RUMACXVDVNRZJZ-UHFFFAOYSA-N 0.000 description 1
- KSCAZPYHLGGNPZ-UHFFFAOYSA-N 3-chloropropyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)CCCCl KSCAZPYHLGGNPZ-UHFFFAOYSA-N 0.000 description 1
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 description 1
- POZWNWYYFQVPGC-UHFFFAOYSA-N 3-methoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[SiH2]CCCOC(=O)C(C)=C POZWNWYYFQVPGC-UHFFFAOYSA-N 0.000 description 1
- DCQBZYNUSLHVJC-UHFFFAOYSA-N 3-triethoxysilylpropane-1-thiol Chemical compound CCO[Si](OCC)(OCC)CCCS DCQBZYNUSLHVJC-UHFFFAOYSA-N 0.000 description 1
- URDOJQUSEUXVRP-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C URDOJQUSEUXVRP-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 229920001817 Agar Polymers 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 239000004606 Fillers/Extenders Substances 0.000 description 1
- 229910001111 Fine metal Inorganic materials 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 241000208125 Nicotiana Species 0.000 description 1
- 235000002637 Nicotiana tabacum Nutrition 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- BJNKASMFSPKVTJ-UHFFFAOYSA-N O(CC)[SiH3].C(=C)[Si](OC)(OC)OC Chemical compound O(CC)[SiH3].C(=C)[Si](OC)(OC)OC BJNKASMFSPKVTJ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 229910000611 Zinc aluminium Inorganic materials 0.000 description 1
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 229920006243 acrylic copolymer Polymers 0.000 description 1
- 125000004423 acyloxy group Chemical group 0.000 description 1
- 239000008272 agar Substances 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000003302 alkenyloxy group Chemical group 0.000 description 1
- 125000005083 alkoxyalkoxy group Chemical group 0.000 description 1
- 125000005250 alkyl acrylate group Chemical group 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 229940037003 alum Drugs 0.000 description 1
- HXFVOUUOTHJFPX-UHFFFAOYSA-N alumane;zinc Chemical compound [AlH3].[Zn] HXFVOUUOTHJFPX-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000003242 anti bacterial agent Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000010425 asbestos Substances 0.000 description 1
- 230000001580 bacterial effect Effects 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- FPCJKVGGYOAWIZ-UHFFFAOYSA-N butan-1-ol;titanium Chemical compound [Ti].CCCCO.CCCCO.CCCCO.CCCCO FPCJKVGGYOAWIZ-UHFFFAOYSA-N 0.000 description 1
- BSDOQSMQCZQLDV-UHFFFAOYSA-N butan-1-olate;zirconium(4+) Chemical compound [Zr+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] BSDOQSMQCZQLDV-UHFFFAOYSA-N 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 1
- 239000010960 cold rolled steel Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000004567 concrete Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 1
- 150000004292 cyclic ethers Chemical class 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 239000002781 deodorant agent Substances 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- ZZNQQQWFKKTOSD-UHFFFAOYSA-N diethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OCC)(OCC)C1=CC=CC=C1 ZZNQQQWFKKTOSD-UHFFFAOYSA-N 0.000 description 1
- CZUBGVJZOVZVBI-UHFFFAOYSA-N diethoxyboron Chemical compound CCO[B]OCC CZUBGVJZOVZVBI-UHFFFAOYSA-N 0.000 description 1
- VSYLGGHSEIWGJV-UHFFFAOYSA-N diethyl(dimethoxy)silane Chemical compound CC[Si](CC)(OC)OC VSYLGGHSEIWGJV-UHFFFAOYSA-N 0.000 description 1
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 description 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 1
- WDBCEHRZNIFSAY-UHFFFAOYSA-N dipropoxyboron Chemical compound CCCO[B]OCCC WDBCEHRZNIFSAY-UHFFFAOYSA-N 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000002612 dispersion medium Substances 0.000 description 1
- GMSCBRSQMRDRCD-UHFFFAOYSA-N dodecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCOC(=O)C(C)=C GMSCBRSQMRDRCD-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000009503 electrostatic coating Methods 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- UIWXSTHGICQLQT-UHFFFAOYSA-N ethenyl propanoate Chemical compound CCC(=O)OC=C UIWXSTHGICQLQT-UHFFFAOYSA-N 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011381 foam concrete Substances 0.000 description 1
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 125000001475 halogen functional group Chemical group 0.000 description 1
- LNMQRPPRQDGUDR-UHFFFAOYSA-N hexyl prop-2-enoate Chemical compound CCCCCCOC(=O)C=C LNMQRPPRQDGUDR-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000001023 inorganic pigment Substances 0.000 description 1
- KFZAUHNPPZCSCR-UHFFFAOYSA-N iron zinc Chemical compound [Fe].[Zn] KFZAUHNPPZCSCR-UHFFFAOYSA-N 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002609 medium Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000004570 mortar (masonry) Substances 0.000 description 1
- QELJHCBNGDEXLD-UHFFFAOYSA-N nickel zinc Chemical compound [Ni].[Zn] QELJHCBNGDEXLD-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 229910000392 octacalcium phosphate Inorganic materials 0.000 description 1
- 239000006259 organic additive Substances 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000011941 photocatalyst Substances 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- 235000003441 saturated fatty acids Nutrition 0.000 description 1
- 150000004671 saturated fatty acids Chemical class 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- YIGWVOWKHUSYER-UHFFFAOYSA-F tetracalcium;hydrogen phosphate;diphosphate Chemical compound [Ca+2].[Ca+2].[Ca+2].[Ca+2].OP([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O YIGWVOWKHUSYER-UHFFFAOYSA-F 0.000 description 1
- GBNXLQPMFAUCOI-UHFFFAOYSA-H tetracalcium;oxygen(2-);diphosphate Chemical compound [O-2].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O GBNXLQPMFAUCOI-UHFFFAOYSA-H 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 235000010215 titanium dioxide Nutrition 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 1
- ZLGWXNBXAXOQBG-UHFFFAOYSA-N triethoxy(3,3,3-trifluoropropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCC(F)(F)F ZLGWXNBXAXOQBG-UHFFFAOYSA-N 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- UDUKMRHNZZLJRB-UHFFFAOYSA-N triethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OCC)(OCC)OCC)CCC2OC21 UDUKMRHNZZLJRB-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- OBROYCQXICMORW-UHFFFAOYSA-N tripropoxyalumane Chemical compound [Al+3].CCC[O-].CCC[O-].CCC[O-] OBROYCQXICMORW-UHFFFAOYSA-N 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- LRXTYHSAJDENHV-UHFFFAOYSA-H zinc phosphate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LRXTYHSAJDENHV-UHFFFAOYSA-H 0.000 description 1
- 229910000165 zinc phosphate Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- 239000004711 α-olefin Substances 0.000 description 1
Landscapes
- Catalysts (AREA)
- Paints Or Removers (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、脱臭機能、抗菌機
能、防汚機能、大気の浄化機能を発揮する多機能塗膜の
形成方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming a multifunctional coating film having a deodorizing function, an antibacterial function, an antifouling function and an air purifying function.
【0002】[0002]
【従来の技術】従来、家屋やビル等の天井や内壁、床面
等に塗装される塗料には、脱臭、抗菌等の機能を同時に
有する塗料は皆無であり、脱臭塗料としては、鉄化合
物、エチレンジアミン四酢酸及びミョウバンを含有する
塗料、抗菌塗料としては、銀シリカゲル系抗菌剤を含有
する塗料などが知られているが、脱臭機能、抗菌機能を
併せ有する塗料については、確立していないのが現状で
あった。2. Description of the Related Art Conventionally, there is no paint having a function of deodorizing and antibacterial at the same time as a paint applied to a ceiling, an inner wall, a floor or the like of a house or a building. Paints containing ethylenediaminetetraacetic acid and alum, as antibacterial paints, paints containing silver silica gel antibacterial agents, etc. are known, but paints that have both deodorant function and antibacterial function have not been established. It was the current situation.
【0003】[0003]
【発明が解決しようとする課題】本発明は、前記課題を
解決し、脱臭機能、抗菌機能を併せ持ち、さらに防汚機
能、大気の浄化機能にも優れる多機能塗膜の形成方法を
提供することを目的とする。SUMMARY OF THE INVENTION The present invention solves the above-mentioned problems, and provides a method for forming a multifunctional coating film which has both a deodorizing function and an antibacterial function, and is also excellent in an antifouling function and an air purifying function. With the goal.
【0004】[0004]
【課題を解決するための手段】本発明者らは、前記課題
を解決するため研究を行った結果、下地処理を施した基
材に、加水分解性ケイ素化合物又は溶剤可溶型フッ素樹
脂に光触媒活性を有する酸化チタンを特定量配合した塗
料を塗布し、さらに表面を研磨して、表層に活性面を出
すことにより、脱臭機能、抗菌機能、防汚機能、大気の
浄化機能に優れるという知見を得た。本発明は、かかる
知見に基づき完成されたものである。Means for Solving the Problems The present inventors have conducted research to solve the above-mentioned problems, and as a result, a photocatalyst was applied to a hydrolyzable silicon compound or a solvent-soluble fluororesin on a substrate subjected to a base treatment. By applying a paint containing a specific amount of active titanium oxide, polishing the surface, and exposing the surface to an active surface, it is known that it has excellent deodorizing function, antibacterial function, antifouling function, and air purification function. Obtained. The present invention has been completed based on such findings.
【0005】すなわち、本発明は、下地処理を施した基
材に(A)加水分解性を有するシリル基含有ビニル系共
重合体、オルガノシランの加水分解物及びオルガノシラ
ンの加水分解物の部分縮合物からなる群より選ばれた少
なくとも1種の加水分解性ケイ素化合物または溶剤可溶
型フッ素樹脂、(B)光触媒活性を有する酸化チタン配
合してなり、PWCが45〜85である塗料組成物を塗
布し、塗膜を形成させ、さらに表面を研磨することによ
り表層に活性面を出すことを特徴とする光化学活性を有
する塗膜の形成方法である。More specifically, the present invention relates to (A) a hydrolyzable silyl group-containing vinyl copolymer, a hydrolyzate of an organosilane and a partial condensation of a hydrolyzate of an organosilane, At least one hydrolyzable silicon compound or a solvent-soluble fluororesin selected from the group consisting of titanium oxide having photocatalytic activity (B) and a PWC of 45 to 85; This is a method for forming a coating film having photochemical activity, characterized in that an active surface is exposed on the surface layer by coating, forming a coating film, and further polishing the surface.
【0006】[0006]
【発明の実施の形態】以下、本発明について詳細に説明
する。BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described in detail.
【0007】本発明の光化学活性を有する塗膜の形成方
法においては、基材として、その表面に下地処理が予め
施されている金属板、無機質板、木質板、プラスチック
系基材等特に限定されない。金属板としては、例えば、
鋼板、アルミ板、ステンレス板、チタン板等の各種金属
板が挙げられる。このうち、鋼板の例としては、冷延鋼
板、熱延鋼板、亜鉛メッキ鋼板、合金亜鉛メッキ鋼板、
亜鉛−鉄合金メッキ鋼板、亜鉛−アルミ合金メッキ鋼
板、アルミメッキ鋼板、クロムメッキ鋼板、ニッケルメ
ッキ鋼板、亜鉛−ニッケル合金鋼板、錫メッキ鋼板等が
挙げられ、下地処理としては、水洗、湯洗、酸洗、アル
カリ脱脂、研磨、クロメート処理、リン酸処理、リン酸
亜鉛処理、ブラスト処理、複合酸化被膜処理等を単独ま
たは組合せて塗装前処理を行い、必要により、ポリエス
テル系、エポキシ系、ウレタン系のプライマーをロール
コーター、カーテンフローコーター、ローラーカーテン
コーター、静電塗装機、ブレードコーター、ダイコータ
ー等で塗装し、次いで常温放置で、あるいは熱風炉、誘
導加熱炉、誘導加熱と熱風の併用炉、近赤外炉、遠赤外
炉、活性エネルギー線照射炉等で常法に従って硬化乾燥
させて、通常、0.5〜30μm程度の膜厚に塗装して
得られる。無機質板としては、例えば、外壁材や内装材
に使用されるスレート板、木片セメント板、パルプセメ
ント板、石綿セメント板、軽量骨材混入セメント板、発
砲コンクリート板、ガラス繊維強化セメント板、珪酸カ
ルシウム板、炭酸マグネシウム板、またはその他の水硬
性板材等が挙げられ、ウレタン系、エポキシ系、ビニル
系等のシーラーを塗布して得られる。木質板としては、
目止め処理、研磨処理、ウッドシーラー塗布等が挙げら
れる。プラスチック系基材としては、各種プラスチック
用プライマー塗布等が挙げられる。In the method of forming a coating film having photochemical activity according to the present invention, the substrate is not particularly limited, such as a metal plate, an inorganic plate, a wooden plate, and a plastic substrate, the surface of which is preliminarily treated. . As a metal plate, for example,
Various metal plates such as a steel plate, an aluminum plate, a stainless steel plate, and a titanium plate are exemplified. Of these, examples of steel sheets include cold-rolled steel sheets, hot-rolled steel sheets, galvanized steel sheets, alloy galvanized steel sheets,
Zinc-iron alloy-plated steel sheet, zinc-aluminum alloy-plated steel sheet, aluminum-plated steel sheet, chromium-plated steel sheet, nickel-plated steel sheet, zinc-nickel alloy steel sheet, tin-plated steel sheet, etc. Pickling, alkali degreasing, polishing, chromate treatment, phosphoric acid treatment, zinc phosphate treatment, blast treatment, composite oxide film treatment, etc., alone or in combination, pre-coating treatment, if necessary, polyester, epoxy, urethane The primer is coated with a roll coater, curtain flow coater, roller curtain coater, electrostatic coating machine, blade coater, die coater, etc., and then left at room temperature, or a hot air furnace, induction heating furnace, combined heating furnace with induction heating and hot air, It is cured and dried in a near-infrared furnace, far-infrared furnace, active energy ray irradiation furnace, etc. according to a conventional method. Obtained by coating to a thickness of about ~30μm. Examples of inorganic boards include slate boards, wood chip cement boards, pulp cement boards, asbestos cement boards, lightweight aggregate-mixed cement boards, foamed concrete boards, glass fiber reinforced cement boards, and calcium silicate boards used for exterior wall materials and interior materials. Examples thereof include a plate, a magnesium carbonate plate, and other hydraulic plate materials, which are obtained by applying a urethane-based, epoxy-based, vinyl-based sealer, or the like. As a wooden board,
Filling treatment, polishing treatment, wood sealer application, and the like are included. Examples of the plastic base material include a primer coating for various plastics.
【0008】本発明で用いる加水分解性ケイ素化合物と
は、加水分解性を有するシリル基含有ビニル系共重合
体、オルガノシランの加水分解物及びオルガノシランの
加水分解物の部分縮合物からなる群より選ばれたもので
あって、これらを単独で、または2種以上組み合わせて
使用することができる。The hydrolyzable silicon compound used in the present invention is a hydrolyzable silyl group-containing vinyl copolymer, a hydrolyzate of organosilane and a partial condensate of a hydrolyzate of organosilane. These are selected, and these can be used alone or in combination of two or more.
【0009】該シリル基含有ビニル系共重合体は、一般
式(I):>C=C<の基を少なくとも1個含むエチレ
ン性不飽和単量体少なくとも1種と、下記一般式(II)
のシリル基含有単量体少なくとも1種とを含む共重合体
である。The silyl group-containing vinyl copolymer comprises at least one ethylenically unsaturated monomer having at least one group of the general formula (I):> C = C <;
And a copolymer containing at least one silyl group-containing monomer.
【0010】RSiXn R1 (3-n) (II) (式中、Rはビニル基を含む1価の有機基、R1 は炭素
原子数1〜10個のアルキル基、アリール基またはアラ
ルキル基、Xはハロゲン、アルコキシ、アルコキシアル
コキシ、アシロキシ、ケトキシメート、アミノ、酸アミ
ド、アミノオキシ、メルカプト、アルケニルオキシ基か
らなる群から選ばれる加水分解性基、nは1〜3の整数
である。) 前記シリル基含有単量体の例を挙げると、γ−メタクリ
ロキシプロピルトリメトキシシラン、ビニルトリエトキ
シシラン、ビニル−トリス(2−メトキシエトキシシラ
ン等がある。RSiX n R 1 (3-n) (II) (wherein, R is a monovalent organic group containing a vinyl group, R 1 is an alkyl group having 1 to 10 carbon atoms, an aryl group or an aralkyl group) , X is a hydrolyzable group selected from the group consisting of halogen, alkoxy, alkoxyalkoxy, acyloxy, ketoximate, amino, acid amide, aminooxy, mercapto, and alkenyloxy groups, and n is an integer of 1 to 3.) Examples of the silyl group-containing monomer include γ-methacryloxypropyltrimethoxysilane, vinyltriethoxysilane, and vinyl-tris (2-methoxyethoxysilane).
【0011】また、前記シリル基含有ビニル系共重合体
の製造に適したエチレン性不飽和単量体の例を挙げる
と、メチルアクリレート、エチルアクリレート、プロピ
ルアクリレート、ブチルアクリレート、ヘキシルアクリ
レート、2−エチルヘキシルアクリレート、ブチルメタ
クリレート、2−メチルヘキシルメタクリレート、ラウ
リルメタクリレート等のアルキルアクリレート;スチレ
ン、ビニルトルエン、α−メチルスチレン等のビニル芳
香族炭化水素;塩化ビニル等のハロゲン化ビニル;塩化
ビニリデン等のハロゲン化ビニリデン;ブタジエン、イ
ソプレン等の共役ジエン;炭素原子数1〜12個の飽和
脂肪酸のビニルエステル、酢酸ビニル及びプロピオン酸
ビニル等があり、これらを単独で、または2種以上組み
合わせて使用することができる。Examples of the ethylenically unsaturated monomers suitable for producing the silyl group-containing vinyl copolymer include methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, hexyl acrylate, and 2-ethylhexyl. Alkyl acrylates such as acrylate, butyl methacrylate, 2-methylhexyl methacrylate and lauryl methacrylate; vinyl aromatic hydrocarbons such as styrene, vinyl toluene and α-methyl styrene; vinyl halides such as vinyl chloride; vinylidene halides such as vinylidene chloride Conjugated dienes such as butadiene and isoprene; vinyl esters of saturated fatty acids having 1 to 12 carbon atoms, vinyl acetate and vinyl propionate; and these may be used alone or in combination of two or more. Can.
【0012】本発明のシリル基含有ビニル系共重合体を
製造する場合、前記エチレン性不飽和単量体とシリル基
含有単量体とを、任意の割合で用いることができるが、
シリル基含有単量体は0.5〜25モル%、エチレン性
不飽和単量体は99.5〜75モル%の割合で用いるの
が好ましい。この共重合体を製造する場合、従来から公
知の方法を用いることができる。該シリル基含有ビニル
系共重合体の分子量は、3,000〜1,000,00
0、特に、10,000〜300,000とするのが好
ましい。In producing the silyl group-containing vinyl copolymer of the present invention, the ethylenically unsaturated monomer and the silyl group-containing monomer can be used in any ratio.
The silyl group-containing monomer is preferably used in a ratio of 0.5 to 25 mol%, and the ethylenically unsaturated monomer is preferably used in a ratio of 99.5 to 75 mol%. When producing this copolymer, a conventionally known method can be used. The molecular weight of the silyl group-containing vinyl copolymer is from 3,000 to 1,000,000.
It is preferably set to 0, especially 10,000 to 300,000.
【0013】本発明で用いるオルガノシランの加水分解
物は、下記一般式(III-A) 、(III-B) または(IV)で示
される化合物である。The hydrolyzate of the organosilane used in the present invention is a compound represented by the following general formula (III-A), (III-B) or (IV).
【0014】R2 Si(OR3 )3 (III-A) Si(OR3 )4 (III-B) R2 2Si(OR3 )2 (IV) (式中、R2 は炭素原子数1〜8個の有機基であり、R
3 は炭素原子数1〜4個のアルキル基であり、各R2 、
R3 は同一でも、異なっていてもよい。) また、本発明では、一般式(III-A) 、(III-B) または
(IV)で示される化合物の部分縮合化合物を使用するこ
とができる。本発明においては、このオルガノシランの
加水分解物またはその部分縮合物はバインダーの働きを
する一成分である。また、部分縮合化合物のポリスチレ
ン換算分子量は、1,000〜5,000、好ましくは
1,500〜3,000である。[0014] R 2 Si (OR 3) 3 (III-A) Si (OR 3) 4 (III-B) R 2 2 Si (OR 3) 2 (IV) ( wherein, R 2 is C 1 -C ~ 8 organic groups, R
3 is an alkyl group having 1 to 4 carbon atoms, each R 2 ,
R 3 may be the same or different. In the present invention, a partially condensed compound of the compound represented by formula (III-A), (III-B) or (IV) can be used. In the present invention, the hydrolyzate of organosilane or a partial condensate thereof is one component acting as a binder. The polycondensed molecular weight of the partially condensed compound is from 1,000 to 5,000, preferably from 1,500 to 3,000.
【0015】この加水分解物またはその部分縮合物を使
用する場合、固形分10〜80重量%を含有する溶剤溶
液とするのが好ましい。When this hydrolyzate or its partial condensate is used, it is preferable to use a solvent solution having a solid content of 10 to 80% by weight.
【0016】上記一般式(III-A) 、(III-B) または(I
V)における有機基R2 の具体例を挙げると、メチル
基、エチル基、n−プロピル基、i−プロピル基、i−
ブチル基等のアルキル基、γ−クロロプロピル基、ビニ
ル基、3,3,3−トリフロロプロピル基、γ−グリシ
ドキシプロピル基、γ−メタクリルオキシプロピル基、
γ−メルカプトプロピル基、フェニル基、3,4−エポ
キシシクロヘキシルエチル基等がある。また、アルキル
基R3 の具体例を挙げると、メチル基、エチル基、n−
プロピル基、i−プロピル基、n−ブチル基、sec−
ブチル基、tert−ブチル基等がある。The above general formula (III-A), (III-B) or (I
Specific examples of the organic group R 2 in V), methyl group, ethyl group, n- propyl group, i- propyl, i-
Alkyl group such as butyl group, γ-chloropropyl group, vinyl group, 3,3,3-trifluoropropyl group, γ-glycidoxypropyl group, γ-methacryloxypropyl group,
γ-mercaptopropyl group, phenyl group, 3,4-epoxycyclohexylethyl group and the like. Specific examples of the alkyl group R 3 include a methyl group, an ethyl group, and n-
Propyl group, i-propyl group, n-butyl group, sec-
There are a butyl group and a tert-butyl group.
【0017】また、一般式、(III-A) で示されるオルガ
ノシランの具体例を挙げると次のとおりである:メチル
トリメトキシシラン、メチルトリエトキシシラン、エチ
ルトリメトキシシラン、エチルトリエトキシシラン、n
−プロピルトリメトキシシラン、n−プロピルトリエト
キシシラン、i−プロピルトリメトキシシラン、i−プ
ロピルトリエトキシシラン、γ−クロロプロピルトリメ
トキシシラン、γ−クロロプロピルトリエトキシシラ
ン、ビニルトリメトキシシラン、ビニルトリエトキシシ
ラン、3,3,3−トリフロロプロピルトリメトキシシ
ラン、3,3,3−トリフロロプロピルトリエトキシシ
ラン、γ−グリシドキシプロピルトリメトキシシラン、
γ−グリシドキシプロピルトリエトキシシラン、γ−メ
タクリルオキシプロピルトリメトキシシラン、γ−メタ
クリルオキシプロピルトリエトキシシラン、γ−メルカ
プトプロピルトリメトキシシラン、γ−メルカプトプロ
ピルトリエトキシシラン、フェニルトリメトキシシラ
ン、フェニルトリエトキシシラン、3,4−エポキシシ
クロヘキシルエチルトリメトキシシラン、3,4−エポ
キシシクロヘキシルエチルトリエトキシシラン、i−ブ
チルトリメトキシシラン、i−ブチルトリエトキシシラ
ン等であり、特にメチルトリメトキシシラン及びメチル
トリエトキシシランが好ましい。Specific examples of the organosilane represented by the general formula (III-A) are as follows: methyltrimethoxysilane, methyltriethoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, n
-Propyltrimethoxysilane, n-propyltriethoxysilane, i-propyltrimethoxysilane, i-propyltriethoxysilane, γ-chloropropyltrimethoxysilane, γ-chloropropyltriethoxysilane, vinyltrimethoxysilane, vinyltrimethoxysilane Ethoxysilane, 3,3,3-trifluoropropyltrimethoxysilane, 3,3,3-trifluoropropyltriethoxysilane, γ-glycidoxypropyltrimethoxysilane,
γ-glycidoxypropyltriethoxysilane, γ-methacryloxypropyltrimethoxysilane, γ-methacryloxypropyltriethoxysilane, γ-mercaptopropyltrimethoxysilane, γ-mercaptopropyltriethoxysilane, phenyltrimethoxysilane, phenyl Triethoxysilane, 3,4-epoxycyclohexylethyltrimethoxysilane, 3,4-epoxycyclohexylethyltriethoxysilane, i-butyltrimethoxysilane, i-butyltriethoxysilane and the like, particularly methyltrimethoxysilane and methyl Triethoxysilane is preferred.
【0018】前記一般式(III-B) で示されるオルガノシ
ラン(アルキルシリケート)の具体例を挙げると、テト
ラメチルシリケート、テトラエチルシリケート、テトラ
−n−プロピルシリケート、テトラ−i−プロピルシリ
ケート、テトラ−n−ブチルシリケート、テトラ−i−
ブチルシリケート、テトラ−sec−ブチルシリケート
等がある。また、前記(IV)のオルガノシランの具体例
を挙げると、ジメチルジメトキシシラン、ジメチルジエ
トキシシラン、ジエチルジメトキシシラン、ジエチルジ
エトキシシラン、ジ−i−プロピルジメトキシシラン、
ジ−i−プロピルジエトキシシラン、ジ−i−プロピル
ジメトキシシラン、ジ−i−プロピルジエトキシシラ
ン、ジフェニルジメトキシシラン、ジフェニルジエトキ
シシラン等があり、特にジメチルジメトキシシラン、ジ
エチルジエトキシシランが好ましい。本発明では、これ
らの加水分解性ケイ素化合物を、単独で、または2種以
上組み合わせて使用することができる。Specific examples of the organosilane (alkyl silicate) represented by the general formula (III-B) include tetramethyl silicate, tetraethyl silicate, tetra-n-propyl silicate, tetra-i-propyl silicate and tetra-silicate. n-butyl silicate, tetra-i-
Butyl silicate, tetra-sec-butyl silicate, and the like. Specific examples of the organosilane (IV) include dimethyldimethoxysilane, dimethyldiethoxysilane, diethyldimethoxysilane, diethyldiethoxysilane, di-i-propyldimethoxysilane,
Examples include di-i-propyldiethoxysilane, di-i-propyldimethoxysilane, di-i-propyldiethoxysilane, diphenyldimethoxysilane, diphenyldiethoxysilane, and the like, with dimethyldimethoxysilane and diethyldiethoxysilane being particularly preferred. In the present invention, these hydrolyzable silicon compounds can be used alone or in combination of two or more.
【0019】これらの一般式(III-A) 、(III-B) 及び
(IV)のオルガノシラン類を併用する場合、オルガノシ
ラン換算で(III-A) 対(III-B) の混合比(重量比)を1
00:0〜30とし(即ち、(III-B) を含有しない場合
もある)、オルガノシラン換算で(III-A) と(III-B) と
の合計量対(IV)の混合比(重量比)を100:5〜1
50、特に100:10〜120とするのが好ましい。
一般式(IV)のオルガノシランの混合比が、前記範囲よ
りも大きい場合には、形成された塗膜に亀裂が入り易
く、逆に前記範囲よりも小さい場合、硬化性が低下し、
かつ塗膜硬度が低下する傾向がある。When these organosilanes of the general formulas (III-A), (III-B) and (IV) are used in combination, the mixing ratio (III-A) to (III-B) in terms of organosilane ( Weight ratio)
00: 0 to 30 (that is, (III-B) may not be contained in some cases), and the mixing ratio (weight) of (IV) to the total amount of (III-A) and (III-B) in terms of organosilane. Ratio) is 100: 5-1.
It is preferably 50, especially 100: 10 to 120.
When the mixing ratio of the organosilane of the general formula (IV) is larger than the above range, the formed coating film is liable to crack, and conversely, when smaller than the above range, the curability decreases,
And the hardness of the coating film tends to decrease.
【0020】本発明では前記オルガノシランの加水分解
物またはその部分縮合物が用いられるが、この加水分解
及び部分縮合を行うために水を添加する。水の添加量は
一般式(III-A) 、(III-B) 及び(IV)のオルガノシラン
のアルコキシ基1当量に対して、通常0.1〜1.0モ
ル、特に0.15〜0.7モルとするのが好ましい。水
の添加モル数が前記範囲よりも小さいと貯蔵安定性が悪
くなる傾向があり、また水の添加モル数が前記範囲より
も大きいと硬化乾燥が遅くなる傾向がある。また、この
様なオルガノシランの縮合物を生成させるために生成促
進剤を用いてもよい。In the present invention, a hydrolyzate of the organosilane or a partial condensate thereof is used, and water is added to perform the hydrolysis and the partial condensation. The amount of water to be added is generally 0.1 to 1.0 mol, especially 0.15 to 0 mol, per equivalent of the alkoxy group of the organosilane of the general formulas (III-A), (III-B) and (IV). It is preferable to use 0.7 mol. If the number of moles of water is smaller than the above range, storage stability tends to be deteriorated, and if the number of moles of water is larger than the above range, curing and drying tends to be slow. Further, a production accelerator may be used to produce such a condensate of organosilane.
【0021】この様な促進剤としては、一般式(V):
M(OR)x で表わされる化合物や鉱酸等を用いること
ができる。一般式(V)において、MはTi、Al、
B、Zr等の金属であり、Rは炭素原子数2〜5個のア
ルキル基であり、xは2〜4の整数である。Such an accelerator is represented by the general formula (V):
A compound represented by M (OR) x , a mineral acid, or the like can be used. In the general formula (V), M is Ti, Al,
A metal such as B and Zr, R is an alkyl group having 2 to 5 carbon atoms, and x is an integer of 2 to 4.
【0022】一般式(V)の具体例を挙げると、テトラ
−i−プロポキシチタン、テトラ−n−ブトキシチタ
ン、トリ−i−プロポキシアルミニウム、モノ−sec
−ブトキシ−ジ−i−プロポキシアルミニウム、ジエト
キシホウ素、ジ−n−プロポキシホウ素、テトラ−n−
ブトキシジルコニウム等、及び鉱酸として塩酸、硫酸等
がある。その添加量はオルガノシラン100重量部に対
して0.05〜2.0重量部の範囲にするのが好ましい 本発明で用いる溶剤可溶型フッ素樹脂としては、フルオ
ロオレフィンとヒドロキシル基またはグリシジル基を有
するビニルエーテルとを主成分とする共重合体、フルオ
ロオレフィンとビニルエステルを主成分とする共重合体
やこれら共重合体の一部にカルボキシル基を有するもの
等が挙げられ、かかる溶剤可溶型フッ素樹脂の具体例と
しては、フルオロオレフィン、シクロヘキシルビニルエ
ーテル、アルキルビニルエーテル及びヒドロキシアルキ
ルビニルエーテルを必須成分とする共重合体;フルオロ
オレフィン、シクロヘキシルビニルエーテル及びグリシ
ジルビニルエーテルを必須成分とした共重合体;フルオ
ロオレフィン、アルキルビニルエーテル及びヒドロキシ
ビニルエーテルの共重合体に二塩基酸無水物を反応させ
て一部をカルボキシル化した共重合体;テトラフルオロ
エチレン及びクロロトリフルオロエチレンから選ばれた
少なくとも1種のパーハロオレフィン、フッ化ビニリデ
ン、ビニルエステル及び他の単量体の共重合体を加水分
解した水酸基含有共重合体;テトラフルオロエチレン及
びクロロトリフルオロエチレンから選ばれた少なくとも
1種のパーハロオレフィン、α−オレフィン、ヒドロキ
シアルキルビニルエーテル及び他の共単量体からなる共
重合体;クロロトリフルオロエチレン、テトラフルオロ
プロピルビニルエーテル及び官能基として水酸基、グリ
シジル基またはアミノ基を有するビニルエーテルの1種
または2種以上からなる共重合体;ジフルオロエチレン
とヒドロキシル基、グリシジル基またはカルボキシル基
等の官能基を有する単量体とテトラフルオロエチレンま
たはクロロトリフルオロエチレンの共重合体等が挙げら
れ、かかる市販品としてはルミフロン200、ルミフロ
ン400、ルミフロン500、ルミフロン554等(以
上旭硝子社製商品名)及びこれらを組み合わせたものが
挙げられる。Specific examples of the general formula (V) include tetra-i-propoxytitanium, tetra-n-butoxytitanium, tri-i-propoxyaluminum, and mono-sec.
-Butoxy-di-i-propoxyaluminum, diethoxyboron, di-n-propoxyboron, tetra-n-
Butoxyzirconium and the like, and mineral acids such as hydrochloric acid and sulfuric acid. The addition amount is preferably in the range of 0.05 to 2.0 parts by weight based on 100 parts by weight of the organosilane. The solvent-soluble fluororesin used in the present invention includes a fluoroolefin and a hydroxyl group or a glycidyl group. Copolymers containing vinyl ether as the main component, copolymers containing fluoroolefin and vinyl ester as the main component, and those having a carboxyl group in a part of these copolymers. Specific examples of the resin include a copolymer containing fluoroolefin, cyclohexyl vinyl ether, alkyl vinyl ether and hydroxyalkyl vinyl ether as essential components; a copolymer containing fluoroolefin, cyclohexyl vinyl ether and glycidyl vinyl ether as essential components; Copolymer obtained by reacting a dibasic acid anhydride with a copolymer of phenyl ether and hydroxyvinyl ether and partially carboxylated; at least one perhaloolefin selected from tetrafluoroethylene and chlorotrifluoroethylene; A hydroxyl group-containing copolymer obtained by hydrolyzing a copolymer of vinylidene, vinyl ester and another monomer; at least one perhaloolefin selected from tetrafluoroethylene and chlorotrifluoroethylene, α-olefin, hydroxyalkyl A copolymer comprising vinyl ether and another comonomer; a copolymer comprising one or more of chlorotrifluoroethylene, tetrafluoropropyl vinyl ether and a vinyl ether having a hydroxyl group, a glycidyl group or an amino group as a functional group; Difluo Copolymers of ethylene and a monomer having a functional group such as a hydroxyl group, a glycidyl group or a carboxyl group and a copolymer of tetrafluoroethylene or chlorotrifluoroethylene, and the like. Examples of such commercially available products are Lumiflon 200, Lumiflon 400, and Lumiflon 500. , Lumiflon 554 and the like (these are trade names of Asahi Glass Co., Ltd.) and combinations thereof.
【0023】また、本発明の溶剤可溶型樹脂はキシレ
ン、トルエン等の単独で、かつ極性の低い有機溶剤に可
溶であるが、必要によっては他の有機溶剤を混合して使
用することも可能である。他の有機溶剤としては、テト
ラヒドロフラン、ジオキサン等の環状エーテル、ベンゼ
ン、トルエン、キシレン等の芳香族炭化水素;酢酸エチ
ル、酢酸ブチル等のエステル類;アセトン、メチルエチ
ルケトン、メチルイソブチルケトン、シクロヘキサノン
等のケトン類;ジメチルホルムアミド、ジメチルアセト
アミド、ピリジン等の含窒素溶剤;1,1,1−トリク
ロロエタン、トリクロロエチレン等の含ハロゲン溶剤等
が挙げられる。The solvent-soluble resin of the present invention can be used alone or in a low-polarity organic solvent such as xylene or toluene. However, if necessary, a mixture of other organic solvents may be used. It is possible. Other organic solvents include cyclic ethers such as tetrahydrofuran and dioxane; aromatic hydrocarbons such as benzene, toluene and xylene; esters such as ethyl acetate and butyl acetate; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone and cyclohexanone. Nitrogen-containing solvents such as dimethylformamide, dimethylacetamide and pyridine; halogen-containing solvents such as 1,1,1-trichloroethane and trichloroethylene.
【0024】本発明の溶剤可溶型フッ素樹脂は、通常の
ラジカル開始剤の存在下、溶液重合により製造すること
ができる。The solvent-soluble fluororesin of the present invention can be produced by solution polymerization in the presence of a usual radical initiator.
【0025】本発明で用いる光触媒活性を有する酸化チ
タンとはTiO2 ゾルを基板材料に塗布して薄膜を形成
し、この薄膜に触媒機能を有する金属塩の水溶液または
金属の微粉末の懸濁液を塗布もしくは含浸して、次いで
ルチル型TiO2 への相転移点以下の温度である800
℃以下の温度で熱処理してアナターゼ型TiO2 薄膜に
前記金属を固定化して作られる。The titanium oxide having photocatalytic activity used in the present invention is a TiO 2 sol applied to a substrate material to form a thin film, and an aqueous solution of a metal salt having a catalytic function or a suspension of fine metal powder is formed on the thin film. Is applied or impregnated, and then at a temperature below the phase transition point to rutile-type TiO 2 at 800
The metal is immobilized on an anatase TiO 2 thin film by heat treatment at a temperature of not more than ℃.
【0026】上記のTiO2 ゾルとは、例えば硝酸、塩
酸等の酸性水溶液またはアンモニア等の塩基性水溶液中
に平均粒径0.01〜0.05μm程度のアナターゼ型
TiO2 がゾル状態で数%〜数十%存在しているもので
ある。触媒機能を有する金属としては、Cu、Ag、F
e、Pd、Pt等が挙げられ、塩としては種酸塩、硫酸
塩、酢酸塩等でよい。The above-mentioned TiO 2 sol means that anatase-type TiO 2 having an average particle size of about 0.01 to 0.05 μm is contained in an aqueous solution of an acid such as nitric acid or hydrochloric acid or a basic aqueous solution such as ammonia in a sol state by several%. ~ Tens of percent are present. Examples of metals having a catalytic function include Cu, Ag, and F.
e, Pd, Pt, etc., and the salt may be a seed salt, a sulfate, an acetate, or the like.
【0027】本発明の塗膜の形成方法における塗膜表面
の研磨については、研磨紙による研磨、レベルサンダ
ー、ワイドベルトサンダー等の各種サンダー類での機械
研磨等が挙げられる。The polishing of the coating film surface in the coating film forming method of the present invention includes polishing with abrasive paper, mechanical polishing with various sanders such as a level sander, a wide belt sander and the like.
【0028】本発明の塗料組成物は、前記(A)成分、
(B)成分よりなり、PWCが45〜85、好ましくは
50〜80になるように配合する。The coating composition of the present invention comprises the component (A)
It is composed of the component (B) and is blended so that the PWC is 45 to 85, preferably 50 to 80.
【0029】ここでPWCとは、Pigment We
ight Concentration(顔料重量濃
度)のことであり、以下の式により算出される。Here, the PWC is Pigment Wen.
It is light concentration (pigment weight concentration) and is calculated by the following formula.
【0030】 [0030]
【0031】PWCが45未満では、光触媒効果が十分
に発揮されない。逆に85を越えると成膜性が低下し、
割れ、剥離等が発生し、好ましくない。When the PWC is less than 45, the photocatalytic effect is not sufficiently exhibited. Conversely, if it exceeds 85, the film-forming properties decrease,
Undesirably, cracks and peeling occur.
【0032】なた、本発明の光触媒活性を有する酸化チ
タンの10〜50重量%を活性炭、シリカゲル、ゼオラ
イト、リン酸カルシウムからなる群より選ばれた少なく
とも1種と置換えることが可能である。前記リン酸カル
シウムとしては、α−リン酸三カルシウム、β−リン酸
三カルシウム、リン酸四カルシウム、リン酸八カルシウ
ム、ハイドロキシアパタイト等が挙げられるが、特にハ
イドロキシアパタイトが好ましい。It is possible to replace 10 to 50% by weight of the photocatalytically active titanium oxide of the present invention with at least one selected from the group consisting of activated carbon, silica gel, zeolite and calcium phosphate. Examples of the calcium phosphate include α-tricalcium phosphate, β-tricalcium phosphate, tetracalcium phosphate, octacalcium phosphate, and hydroxyapatite, with hydroxyapatite being particularly preferred.
【0033】置き換える割合が10重量%未満では、置
換効果が認められない。逆に50重量%を越えると光触
媒効果を低下させることとなり好ましくない。If the replacement ratio is less than 10% by weight, no replacement effect is observed. Conversely, if it exceeds 50% by weight, the photocatalytic effect will be reduced, which is not preferable.
【0034】本発明の塗料組成物は、以上説明した塗料
組成物に、必要に応じ各種顔料、有機溶剤あるいは添加
剤等を配合し塗料として使用可能となる。The coating composition of the present invention can be used as a coating by blending various pigments, organic solvents or additives as necessary with the coating composition described above.
【0035】顔料としては、通常塗料用として利用され
ている顔料がそのまま使用可能である。具体的には酸化
チタン、亜鉛華、酸化鉄、黄鉛等の着色無機顔料、フタ
ロシアニンブルー、ベンジジンイエロー等の着色有機顔
料、石英粉、酸化アルミナ、沈降性硫酸バリウム等の体
質顔料、ステンレス粉、亜鉛粉、アルミニウム粉、ブロ
ンズ粉、雲母粉等の金属粉等が代表的なものとして挙げ
られる。As the pigment, pigments that are usually used for paints can be used as they are. Specifically, titanium oxide, zinc oxide, iron oxide, colored inorganic pigments such as graphite, phthalocyanine blue, colored organic pigments such as benzidine yellow, quartz powder, alumina oxide, extender pigments such as precipitated barium sulfate, stainless powder, Representative examples include metal powders such as zinc powder, aluminum powder, bronze powder, and mica powder.
【0036】また、有機溶剤としては、トルエン、キシ
レン等の炭化水素系溶剤;酢酸エチル、酢酸ブチル等の
エステル系溶剤;メチルエチルケトン、メチルイソブチ
ルケトン、シクロヘキサノン、イソホロン等のケトン系
溶剤;メタノール、エタノール、ブタノール等のアルコ
ール系溶剤等が代表的なものとして挙げられる。Examples of the organic solvent include hydrocarbon solvents such as toluene and xylene; ester solvents such as ethyl acetate and butyl acetate; ketone solvents such as methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone and isophorone; Representative examples include alcohol solvents such as butanol.
【0037】また、添加剤としては、表面調整剤、分散
剤、紫外線吸収剤、増粘剤、反応調整触媒等の通常塗料
用添加剤として知られている添加剤が挙げられる。Examples of the additives include additives known as ordinary paint additives such as a surface conditioner, a dispersant, an ultraviolet absorber, a thickener, and a reaction control catalyst.
【0038】このようにして得られる塗料は、鋼板、ス
テンレス板、アルミ板等の各種金属材料はもちろん、モ
ルタル、コンクリート、ガラス等の無機材料、プラスチ
ック、木材等の塗装にも適用可能である。The coating material thus obtained is applicable not only to various metal materials such as steel plate, stainless steel plate and aluminum plate, but also to coating of inorganic materials such as mortar, concrete and glass, plastic and wood.
【0039】塗装方法としてはエアースプレー、エアレ
ススプレー、静電スプレー、シャワーコート、ディップ
塗装、ハケ塗装、ロール塗装等の従来から一般に行なわ
れている方法がそのまま採用できる。As the coating method, conventionally used methods such as air spray, airless spray, electrostatic spray, shower coating, dip coating, brush coating, and roll coating can be employed as they are.
【0040】[0040]
【発明の効果】本発明の塗膜の形成方法は、脱臭機能、
抗菌機能を併せ持ち、さらに防汚機能、大気の浄化機能
にも優れる。The method for forming a coating film of the present invention has a deodorizing function,
It has both antibacterial and antifouling functions, as well as an air purification function.
【0041】以下、本発明を実施例により、さらに詳細
に説明する。Now, the present invention will be described in further detail with reference to Examples.
【0042】[0042]
【実施例】実施例中「部」、「%」は重量基準で示す。 <オルガノアルコキシシランの加水分解縮合物溶液の調
製>メチルトリエトキシシリケート40部とイソプロピ
ルアルコール54部を40℃で攪拌混合し、次いでこれ
に0.1N−塩酸0.3部と水5.7部からなる混合物
を90分間かけて滴下した。滴下後40℃でさらに4時
間攪拌し、不揮発分40%のメチルトリエトキシシリケ
ートの加水分解縮合物溶液[以下加水分解縮合物A−1
という]を得た。なお、該縮合物のポリスチレン換算重
量平均分子量は、10,000であった。EXAMPLES In the examples, "parts" and "%" are shown on a weight basis. <Preparation of Hydrolysis Condensate Solution of Organoalkoxysilane> 40 parts of methyltriethoxysilicate and 54 parts of isopropyl alcohol were stirred and mixed at 40 ° C., and then 0.3 parts of 0.1N hydrochloric acid and 5.7 parts of water were added thereto. Was added dropwise over 90 minutes. After the dropwise addition, the mixture was further stirred at 40 ° C. for 4 hours, and hydrolyzed condensate solution of methyltriethoxysilicate having a nonvolatile content of 40% [hereinafter referred to as hydrolyzed condensate A-1]
That] was obtained. The polystyrene equivalent weight average molecular weight of the condensate was 10,000.
【0043】<テトラアルコキシシリケートの加水分解
縮合物溶液の調製>テトラエトキシシリケート[「エチ
ルシリケート40」(日本コルコート社製商品名)]3
5部とイソプロピルアルコール61部を40℃で攪拌混
合し、次いでこれに1N−塩酸1部と水3部からなる混
合物を90分間かけて滴下した。滴下後40℃でさらに
4時間攪拌し、不揮発分35%のテトラエトキシシリケ
ートの加水分解縮合物溶液[以下加水分解縮合物A−2
という]を得た。なお、該縮合物のポリスチレン換算重
量平均分子量は、13,000であった。<Preparation of Tetraalkoxysilicate Hydrolysis Condensate Solution> Tetraethoxysilicate [“Ethylsilicate 40” (trade name, manufactured by Nippon Colcoat)] 3
5 parts and 61 parts of isopropyl alcohol were stirred and mixed at 40 ° C., and then a mixture of 1 part of 1N hydrochloric acid and 3 parts of water was added dropwise over 90 minutes. After the dropwise addition, the mixture was further stirred at 40 ° C. for 4 hours, and a solution of a hydrolytic condensate of tetraethoxysilicate having a nonvolatile content of 35% [hereinafter referred to as a hydrolytic condensate A-2]
That] was obtained. The polystyrene equivalent weight average molecular weight of the condensate was 13,000.
【0044】<シリル基含有ビニル系樹脂溶液の調製>
キシレン45部、イソブタノール40部を加え混合し
後、攪拌しながら85℃に加熱した。次に、イソブチル
メタクリレート50部、2−エチルヘキシルメタクリレ
ート35部、γ−メタクリロキシプロピルメトキシシラ
ン15部とアゾビスイソバレロニトリル1.5部の混合
溶液を85℃で3時間かけて滴下し、その後90℃に昇
温し2時間維持し反応を終了させて不揮発分55%のシ
リル基含有ビニル系樹脂溶液[以下ビニル系樹脂Bとい
う]を得た。なお、該ビニル系樹脂は、重量平均分子量
は14,000であり、ポリマー1分子あたり平均約7
個のシリル基を有している。<Preparation of Silyl Group-Containing Vinyl Resin Solution>
After adding and mixing 45 parts of xylene and 40 parts of isobutanol, the mixture was heated to 85 ° C. with stirring. Next, a mixed solution of 50 parts of isobutyl methacrylate, 35 parts of 2-ethylhexyl methacrylate, 15 parts of γ-methacryloxypropylmethoxysilane, and 1.5 parts of azobisisovaleronitrile was added dropwise at 85 ° C. over 3 hours. The temperature was raised to ° C. and maintained for 2 hours to terminate the reaction, thereby obtaining a silyl group-containing vinyl resin solution (hereinafter referred to as vinyl resin B) having a nonvolatile content of 55%. The vinyl resin has a weight average molecular weight of 14,000, and an average of about 7 per polymer molecule.
Has two silyl groups.
【0045】<塗料の調製>表1に示す成分を混合し、
ペイントシェーカーでガラスビーズを分散媒として塗料
を調製した。<Preparation of paint> The components shown in Table 1 were mixed,
A paint was prepared with a glass shaker using a glass shaker as a dispersion medium.
【0046】<下塗塗料>メチルメタクリレート/ブチ
ルアクリレート/2−ヒドロキシメチルアクリレート=
70/20/10からなるアクリル共重合体:10部、
ヘキサメチレンジイソシアネートトリメチロールプロパ
ンアダクト:4部、トリレンジイソシアネートトリマー
体:3部、チタン白:15部、カオリン:8部、マイ
カ:8部、硫酸バリウム:4部、酢酸ブチル:20部及
びキシレン:28部からなる組成物。<Undercoat> Methyl methacrylate / butyl acrylate / 2-hydroxymethyl acrylate =
70/20/10 acrylic copolymer: 10 parts,
Hexamethylene diisocyanate trimethylolpropane adduct: 4 parts, tolylene diisocyanate trimer: 3 parts, titanium white: 15 parts, kaolin: 8 parts, mica: 8 parts, barium sulfate: 4 parts, butyl acetate: 20 parts and xylene: A composition consisting of 28 parts.
【0047】[実施例1〜18、比較例1〜9]スレー
ト板(50×10mm、厚さ5mm)に下塗塗料を施し
た表面に表1〜表3の塗料に硬化促進剤(ジブチルチン
ラウレート)をワニス100部に対して0.1部添加
し、さらに100℃にて10分間乾燥させて乾燥膜厚約
30μmとなるように塗膜を形成させ、耐水性研磨紙
(タイプDCCS、粒度CC−240−CW、三共理化
学社製)を用いて研磨し、各種試験を行い、その結果を
表4〜表6に示す。(但し、比較例2〜5、7、8は研
磨せず)Examples 1 to 18 and Comparative Examples 1 to 9 A slate plate (50 × 10 mm, thickness 5 mm) was coated with an undercoat and the curing accelerator (dibutyltin laurate) was added to the coatings shown in Tables 1 to 3. Rate) is added to 100 parts of varnish, and dried at 100 ° C. for 10 minutes to form a coating film having a dry film thickness of about 30 μm. Water-resistant abrasive paper (type DCCS, particle size Polishing was performed using CC-240-CW (manufactured by Sankyo Rikagaku Co., Ltd.), and various tests were performed. The results are shown in Tables 4 to 6. (However, Comparative Examples 2 to 5, 7, and 8 are not polished)
【0048】<アセトアルデヒド減少率>アセトアルデ
ヒド濃度1000ppmの雰囲気中で資料5cmに対し
てブラックライトを使用して4.0mW/cm2 の強度
で紫外線を照射する。15分間隔で雰囲気中のガス濃度
を測定してアセトアルデヒドの減少率を求める。<Acetaldehyde reduction rate> In an atmosphere having an acetaldehyde concentration of 1000 ppm, a sample of 5 cm is irradiated with ultraviolet light at an intensity of 4.0 mW / cm 2 using a black light. The gas concentration in the atmosphere is measured at intervals of 15 minutes to determine the reduction rate of acetaldehyde.
【0049】<抗菌性試験>試験片(5cm×5cm)
をあらかじめ調製した菌液0.3mlを塗抹した標準寒
天培地に貼り、35℃、24時間放置後、試験片周辺で
の阻止帯形成を測定し、JIS−L−1902ハロー法
に基づいて大腸菌に対する抗菌性試験を行った。<Antibacterial test> Test piece (5 cm × 5 cm)
Was placed on a standard agar medium smeared with 0.3 ml of the bacterial solution prepared in advance, left at 35 ° C. for 24 hours, and the formation of an inhibition zone around the test piece was measured. Based on the JIS-L-1902 halo method, An antibacterial test was performed.
【0050】<防汚性試験>喫煙室に塗膜をバクロし、
1カ月後のΔE値を測定し、タバコのヤニの分解性を評
価した。<Test for antifouling property>
One month later, the ΔE value was measured to evaluate the decomposability of the tobacco tar.
【0051】表4及び表5から明らかな通り、本発明の
塗膜の形成方法を行った実施例1〜18は、優れた塗膜
性能を有していた。As is clear from Tables 4 and 5, Examples 1 to 18 in which the coating film forming method of the present invention was performed had excellent coating film performance.
【0052】一方、表6より明らかな通り、PWCが4
5未満の比較例1、5、6は、アセトアルデヒドの減少
率が低く、ΔE値が高く不良であり、PWCが85を越
えた比較例2、7は、クラックが著しく塗膜が形成され
ず不良であり、光触媒酸化チタンの50重量%以上を活
性炭と置き換えた比較例3、8は、アセトアルデヒドの
減少率が低く不良であり、光触媒酸化チタンを使用しな
い比較例4、9は、阻止帯の形成がなく不良であった。On the other hand, as is clear from Table 6, PWC was 4
Comparative Examples 1, 5, and 6 having less than 5 had a low reduction rate of acetaldehyde and had a high ΔE value, and Comparative Examples 2 and 7 having a PWC of more than 85 exhibited remarkable cracks and poor film formation. Comparative Examples 3 and 8, in which 50% by weight or more of the photocatalytic titanium oxide were replaced with activated carbon, had a low reduction rate of acetaldehyde and were poor, and Comparative Examples 4, 9 in which no photocatalytic titanium oxide was used showed the formation of a stop band. There was no defect.
【0053】[0053]
【表1】 [Table 1]
【0054】[0054]
【表2】 [Table 2]
【0055】[0055]
【表3】 [Table 3]
【0056】[0056]
【表4】 [Table 4]
【0057】[0057]
【表5】 [Table 5]
【0058】[0058]
【表6】 [Table 6]
フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 C09D 7/12 PSK C09D 7/12 PSK 127/12 PFG 127/12 PFG 143/04 PGL 143/04 PGL 157/00 PDM 157/00 PDM 183/04 PMT 183/04 PMT Continued on the front page (51) Int.Cl. 6 Identification code Agency reference number FI Technical indication location C09D 7/12 PSK C09D 7/12 PSK 127/12 PFG 127/12 PFG 143/04 PGL 143/04 PGL 157 / 00 PDM 157/00 PDM 183/04 PMT 183/04 PMT
Claims (2)
性を有するシリル基含有ビニル系共重合体、オルガノシ
ランの加水分解物及びオルガノシランの加水分解物の部
分縮合物からなる群より選ばれた少なくとも1種の加水
分解性ケイ素化合物または溶剤可溶型フッ素樹脂、
(B)光触媒活性を有する酸化チタン配合してなり、P
WCが45〜85である塗料組成物を塗布し、塗膜を形
成させ、さらに表面を研磨することにより表層に活性面
を出すことを特徴とする光化学活性を有する塗膜の形成
方法。1. A group comprising (A) a hydrolyzable silyl group-containing vinyl copolymer, a hydrolyzate of an organosilane, and a partial condensate of a hydrolyzate of an organosilane. At least one hydrolyzable silicon compound or a solvent-soluble fluororesin selected from the group consisting of:
(B) a titanium oxide compound having photocatalytic activity
A method for forming a coating film having photochemical activity, comprising applying a coating composition having a WC of 45 to 85, forming a coating film, and polishing the surface to give an active surface to a surface layer.
50重量%を活性炭、シリカゲル、ゼオライト及びリン
酸カルシウムからなる群より選ばれた、少なくとも1種
と置き換えたことを特徴とする請求項1記載の塗膜の形
成方法。2. Titanium oxide having photocatalytic activity of 10 to 10.
2. The method according to claim 1, wherein 50% by weight is replaced with at least one selected from the group consisting of activated carbon, silica gel, zeolite and calcium phosphate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8152038A JPH10363A (en) | 1996-06-13 | 1996-06-13 | Formation of coating film having photochemical activity |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8152038A JPH10363A (en) | 1996-06-13 | 1996-06-13 | Formation of coating film having photochemical activity |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH10363A true JPH10363A (en) | 1998-01-06 |
Family
ID=15531706
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8152038A Pending JPH10363A (en) | 1996-06-13 | 1996-06-13 | Formation of coating film having photochemical activity |
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Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000110272A (en) * | 1998-10-09 | 2000-04-18 | Jsr Corp | Building material |
JP2000191966A (en) * | 1998-12-25 | 2000-07-11 | Central Glass Co Ltd | Ink for forming oxide film, and formation of metal oxide film |
WO2000063313A1 (en) * | 1999-04-20 | 2000-10-26 | Imperial Chemical Industries Plc | Aqueous coating composition |
WO2002004569A1 (en) * | 2000-07-10 | 2002-01-17 | Mutsuo Himeno | Coating composition |
JP2003053143A (en) * | 2001-08-10 | 2003-02-25 | Bitsugu Sons:Kk | Photocatalytic member, base material to be used in the member and method for manufacturing the member |
KR100393925B1 (en) * | 1998-11-20 | 2003-08-09 | 아사히 가세이 가부시키가이샤 | Modified photocatalyst sol |
JP2004051644A (en) * | 2001-08-30 | 2004-02-19 | Toto Ltd | Photocatalytic coating agent, photocatalytic composite material and method for producing the same |
JP2004269898A (en) * | 2001-08-30 | 2004-09-30 | Toto Ltd | Photocatalytic coating agent and photocatalytic composite material, and preparation process for this agent |
JP2004331969A (en) * | 2003-05-05 | 2004-11-25 | Northrop Grumman Corp | Protective autologous decontamination or autologous cleaning coating against deleterious biological pathogen and toxic chemical |
JP2008088436A (en) * | 1998-04-14 | 2008-04-17 | National Institute Of Advanced Industrial & Technology | Paint composition containing photocatalyst |
US11446644B2 (en) * | 2019-09-05 | 2022-09-20 | ITALCER S.p.A. | Photocatalytic ceramic |
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JPH07171408A (en) * | 1993-06-28 | 1995-07-11 | Ishihara Sangyo Kaisha Ltd | Photocatalytic body and its production |
JPH07241475A (en) * | 1994-03-02 | 1995-09-19 | Ishihara Sangyo Kaisha Ltd | Photocatalyst body, its production and method for removing harmful substance using the same |
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Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH07171408A (en) * | 1993-06-28 | 1995-07-11 | Ishihara Sangyo Kaisha Ltd | Photocatalytic body and its production |
JPH07241475A (en) * | 1994-03-02 | 1995-09-19 | Ishihara Sangyo Kaisha Ltd | Photocatalyst body, its production and method for removing harmful substance using the same |
Cited By (11)
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JP2008088436A (en) * | 1998-04-14 | 2008-04-17 | National Institute Of Advanced Industrial & Technology | Paint composition containing photocatalyst |
JP2000110272A (en) * | 1998-10-09 | 2000-04-18 | Jsr Corp | Building material |
KR100393925B1 (en) * | 1998-11-20 | 2003-08-09 | 아사히 가세이 가부시키가이샤 | Modified photocatalyst sol |
JP2000191966A (en) * | 1998-12-25 | 2000-07-11 | Central Glass Co Ltd | Ink for forming oxide film, and formation of metal oxide film |
WO2000063313A1 (en) * | 1999-04-20 | 2000-10-26 | Imperial Chemical Industries Plc | Aqueous coating composition |
WO2002004569A1 (en) * | 2000-07-10 | 2002-01-17 | Mutsuo Himeno | Coating composition |
JP2003053143A (en) * | 2001-08-10 | 2003-02-25 | Bitsugu Sons:Kk | Photocatalytic member, base material to be used in the member and method for manufacturing the member |
JP2004051644A (en) * | 2001-08-30 | 2004-02-19 | Toto Ltd | Photocatalytic coating agent, photocatalytic composite material and method for producing the same |
JP2004269898A (en) * | 2001-08-30 | 2004-09-30 | Toto Ltd | Photocatalytic coating agent and photocatalytic composite material, and preparation process for this agent |
JP2004331969A (en) * | 2003-05-05 | 2004-11-25 | Northrop Grumman Corp | Protective autologous decontamination or autologous cleaning coating against deleterious biological pathogen and toxic chemical |
US11446644B2 (en) * | 2019-09-05 | 2022-09-20 | ITALCER S.p.A. | Photocatalytic ceramic |
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