JPH10316690A - Aniline derivative having silicon substituent at ortho position and its production - Google Patents
Aniline derivative having silicon substituent at ortho position and its productionInfo
- Publication number
- JPH10316690A JPH10316690A JP9144719A JP14471997A JPH10316690A JP H10316690 A JPH10316690 A JP H10316690A JP 9144719 A JP9144719 A JP 9144719A JP 14471997 A JP14471997 A JP 14471997A JP H10316690 A JPH10316690 A JP H10316690A
- Authority
- JP
- Japan
- Prior art keywords
- group
- compound
- formula
- aniline
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 25
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 125000002490 anilino group Chemical class [H]N(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 title claims 4
- 150000001875 compounds Chemical class 0.000 claims abstract description 37
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 15
- 150000002430 hydrocarbons Chemical class 0.000 claims abstract description 10
- 238000003797 solvolysis reaction Methods 0.000 claims abstract description 9
- 229910052751 metal Inorganic materials 0.000 claims abstract description 8
- 239000002184 metal Substances 0.000 claims abstract description 8
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 6
- 239000010703 silicon Substances 0.000 claims abstract description 6
- 238000006243 chemical reaction Methods 0.000 claims abstract description 5
- 125000005843 halogen group Chemical group 0.000 claims abstract description 5
- 125000004433 nitrogen atom Chemical group N* 0.000 claims abstract description 5
- 229910052783 alkali metal Inorganic materials 0.000 claims description 10
- 150000001340 alkali metals Chemical class 0.000 claims description 10
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 8
- 150000001342 alkaline earth metals Chemical class 0.000 claims description 8
- 125000004432 carbon atom Chemical group C* 0.000 claims description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- 150000002902 organometallic compounds Chemical class 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- 125000004429 atom Chemical group 0.000 claims description 3
- 239000002904 solvent Substances 0.000 abstract description 14
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract description 6
- 239000002994 raw material Substances 0.000 abstract description 6
- 230000002194 synthesizing effect Effects 0.000 abstract description 5
- RHLITNIJIBAVSN-UHFFFAOYSA-N 2-trimethylsilylaniline Chemical compound C[Si](C)(C)C1=CC=CC=C1N RHLITNIJIBAVSN-UHFFFAOYSA-N 0.000 abstract description 4
- 239000004215 Carbon black (E152) Substances 0.000 abstract description 4
- 239000003814 drug Substances 0.000 abstract description 4
- 229930195733 hydrocarbon Natural products 0.000 abstract description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 4
- 239000007818 Grignard reagent Substances 0.000 abstract description 3
- 150000004795 grignard reagents Chemical class 0.000 abstract description 3
- 230000007935 neutral effect Effects 0.000 abstract description 3
- 239000003513 alkali Substances 0.000 abstract 1
- 229940079593 drug Drugs 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002736 metal compounds Chemical class 0.000 abstract 1
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical class C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 abstract 1
- -1 aniline compound Chemical class 0.000 description 54
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 21
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 16
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- 150000001448 anilines Chemical class 0.000 description 15
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 14
- 238000003756 stirring Methods 0.000 description 13
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 12
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 12
- 239000000243 solution Substances 0.000 description 12
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 11
- 239000011541 reaction mixture Substances 0.000 description 11
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 10
- 238000001819 mass spectrum Methods 0.000 description 10
- 235000002639 sodium chloride Nutrition 0.000 description 10
- 238000000862 absorption spectrum Methods 0.000 description 9
- 239000011521 glass Substances 0.000 description 9
- 238000003786 synthesis reaction Methods 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- 239000011780 sodium chloride Substances 0.000 description 8
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 8
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 125000001424 substituent group Chemical group 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- 238000009835 boiling Methods 0.000 description 6
- UBJFKNSINUCEAL-UHFFFAOYSA-N lithium;2-methylpropane Chemical compound [Li+].C[C-](C)C UBJFKNSINUCEAL-UHFFFAOYSA-N 0.000 description 6
- 239000012044 organic layer Substances 0.000 description 6
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 6
- 125000003277 amino group Chemical group 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 238000010521 absorption reaction Methods 0.000 description 4
- RBHJBMIOOPYDBQ-UHFFFAOYSA-N carbon dioxide;propan-2-one Chemical compound O=C=O.CC(C)=O RBHJBMIOOPYDBQ-UHFFFAOYSA-N 0.000 description 4
- 239000003153 chemical reaction reagent Substances 0.000 description 4
- 150000002366 halogen compounds Chemical class 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 125000006239 protecting group Chemical group 0.000 description 4
- 239000003586 protic polar solvent Substances 0.000 description 4
- 238000010992 reflux Methods 0.000 description 4
- 238000001228 spectrum Methods 0.000 description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000000975 dye Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 229910052749 magnesium Inorganic materials 0.000 description 3
- 239000011777 magnesium Substances 0.000 description 3
- OCMBHQJBCVXNJU-UHFFFAOYSA-N 2,6-bis(trimethylsilyl)aniline Chemical compound C[Si](C1=C(N)C(=CC=C1)[Si](C)(C)C)(C)C OCMBHQJBCVXNJU-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- BGTMCBQWSUVKDB-UHFFFAOYSA-N C(CCCCC)[Si](C1=C(N)C=CC=C1)(C)C Chemical compound C(CCCCC)[Si](C1=C(N)C=CC=C1)(C)C BGTMCBQWSUVKDB-UHFFFAOYSA-N 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- OGSKSQPNJPIKBJ-UHFFFAOYSA-N NC1=C(C=CC=C1)[Si](CC)(CC)CC Chemical compound NC1=C(C=CC=C1)[Si](CC)(CC)CC OGSKSQPNJPIKBJ-UHFFFAOYSA-N 0.000 description 2
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 2
- 239000012948 isocyanate Substances 0.000 description 2
- 150000002513 isocyanates Chemical class 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- SUBJHSREKVAVAR-UHFFFAOYSA-N sodium;methanol;methanolate Chemical compound [Na+].OC.[O-]C SUBJHSREKVAVAR-UHFFFAOYSA-N 0.000 description 2
- 125000001637 1-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C(*)=C([H])C([H])=C([H])C2=C1[H] 0.000 description 1
- YKCJSVLTOUVCQM-UHFFFAOYSA-N 2,6-dibromo-N,N-bis(trimethylsilyl)aniline Chemical compound BrC1=C(C(=CC=C1)Br)N([Si](C)(C)C)[Si](C)(C)C YKCJSVLTOUVCQM-UHFFFAOYSA-N 0.000 description 1
- XIRRDAWDNHRRLB-UHFFFAOYSA-N 2,6-dibromoaniline Chemical compound NC1=C(Br)C=CC=C1Br XIRRDAWDNHRRLB-UHFFFAOYSA-N 0.000 description 1
- 125000001622 2-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C(*)C([H])=C([H])C2=C1[H] 0.000 description 1
- YLZOPXRUQYQQID-UHFFFAOYSA-N 3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]propan-1-one Chemical compound N1N=NC=2CN(CCC=21)CCC(=O)N1CCN(CC1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F YLZOPXRUQYQQID-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- KONKDLFCTPVTIS-UHFFFAOYSA-N BrC1=C(N([Si](CC)(CC)CC)[Si](CC)(CC)CC)C=CC=C1 Chemical group BrC1=C(N([Si](CC)(CC)CC)[Si](CC)(CC)CC)C=CC=C1 KONKDLFCTPVTIS-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- KXDHJXZQYSOELW-UHFFFAOYSA-M Carbamate Chemical group NC([O-])=O KXDHJXZQYSOELW-UHFFFAOYSA-M 0.000 description 1
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- IRVQUSIKOMODPP-UHFFFAOYSA-N N,2-bis(trimethylsilyl)aniline Chemical compound C[Si](C)(C)Nc1ccccc1[Si](C)(C)C IRVQUSIKOMODPP-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 238000005904 alkaline hydrolysis reaction Methods 0.000 description 1
- 150000001408 amides Chemical group 0.000 description 1
- 125000006242 amine protecting group Chemical group 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 235000011089 carbon dioxide Nutrition 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 150000004696 coordination complex Chemical class 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000010511 deprotection reaction Methods 0.000 description 1
- 239000012039 electrophile Substances 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000000417 fungicide Substances 0.000 description 1
- 238000002290 gas chromatography-mass spectrometry Methods 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- 125000000040 m-tolyl group Chemical group [H]C1=C([H])C(*)=C([H])C(=C1[H])C([H])([H])[H] 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- UUBHRQZKROMHOC-UHFFFAOYSA-N n,n-bis(trimethylsilyl)aniline Chemical compound C[Si](C)(C)N([Si](C)(C)C)C1=CC=CC=C1 UUBHRQZKROMHOC-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- IPJPAQIHUIKFLV-UHFFFAOYSA-N n-trimethylsilylaniline Chemical compound C[Si](C)(C)NC1=CC=CC=C1 IPJPAQIHUIKFLV-UHFFFAOYSA-N 0.000 description 1
- 125000003261 o-tolyl group Chemical group [H]C1=C([H])C(*)=C(C([H])=C1[H])C([H])([H])[H] 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 125000001979 organolithium group Chemical group 0.000 description 1
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- 125000003538 pentan-3-yl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- BSCCSDNZEIHXOK-UHFFFAOYSA-N phenyl carbamate Chemical compound NC(=O)OC1=CC=CC=C1 BSCCSDNZEIHXOK-UHFFFAOYSA-N 0.000 description 1
- DGTNSSLYPYDJGL-UHFFFAOYSA-N phenyl isocyanate Chemical compound O=C=NC1=CC=CC=C1 DGTNSSLYPYDJGL-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000003548 sec-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、有機合成原料とし
て有用な新規化合物である、オルト位にケイ素置換基を
有するアニリン誘導体及びその製造方法に関する。The present invention relates to a novel compound useful as a raw material for organic synthesis, an aniline derivative having a silicon substituent at the ortho position, and a method for producing the same.
【0002】[0002]
【従来の技術及び発明が解決しようとする課題】アニリ
ンは、染料、医薬品、殺菌剤及び金属錯体配位子等の合
成原料として広範に用いられ、工業的に極めて重要な化
合物である。また、そのベンゼン環上に各種の置換基を
有する誘導体もこれまで数多く合成されており、これら
の誘導体を合成原料として用いれば、得られる化合物の
物性を様々に変化させることが可能である。BACKGROUND OF THE INVENTION Aniline is an industrially important compound that is widely used as a raw material for synthesizing dyes, pharmaceuticals, fungicides, metal complex ligands and the like. In addition, many derivatives having various substituents on the benzene ring have been synthesized so far, and if these derivatives are used as a raw material for synthesis, it is possible to change variously the physical properties of the obtained compound.
【0003】その置換基としてケイ素を使用することも
可能であり、パラ位にトリメチルシリル基を有するアニ
リン誘導体等が公知であるが、置換基を導入した場合最
も変化を与えやすい位置であるオルト位にケイ素置換基
を有するアニリン誘導体は知られていない。このような
オルト位にケイ素置換基を有するアニリン誘導体の合成
法として、アミノ基に置換基(保護基)を有し、オルト
位にケイ素置換基を有するアニリン化合物を合成した
後、アミノ基の置換基(保護基)を除去する方法が考え
られるが、そのようなアミノ基に置換基(保護基)を有
し、オルト位にケイ素置換基を有するアニリン化合物と
しては、例えば、欧州特許公報第538231号にはオ
ルト位にトリメチルシリル基を有するフェニルカルバミ
ン酸エステルの合成例が記載されている程度である。し
かしながら、ベンゼン環に結合したケイ素置換基はプロ
トン等の求電子剤によって容易に切断されることが知ら
れている。従ってオルトリチオ化に使用されるカルバミ
ン酸エステルやアミドのような、一般に強酸性での加水
分解による脱保護が必要なアミン保護基を用いることは
困難である。また、同じ文献において、オルト位にトリ
メチルシリル基を有するイソシアン酸フェニルエステル
の合成の記載も見られる。このイソシアン酸エステルを
アルカリ加水分解すればアニリン誘導体が得られること
も考えられるが、工程数が多く、またイソシアン酸エス
テル類は一般に毒性があるため最良の方法とはいえな
い。[0003] Silicon can be used as the substituent, and aniline derivatives having a trimethylsilyl group at the para-position are known. However, when the substituent is introduced, the aniline derivative is most likely to be changed at the ortho-position. An aniline derivative having a silicon substituent is not known. As a method for synthesizing such an aniline derivative having a silicon substituent at the ortho position, an aniline compound having a substituent (protecting group) at the amino group and a silicon substituent at the ortho position is synthesized, and then the amino group is substituted. A method of removing the group (protecting group) can be considered. Examples of such an aniline compound having a substituent (protecting group) in the amino group and a silicon substituent in the ortho position include, for example, European Patent Publication No. 538231. The publication describes a synthesis example of a phenylcarbamate having a trimethylsilyl group at the ortho position. However, it is known that the silicon substituent bonded to the benzene ring is easily cleaved by an electrophile such as a proton. Therefore, it is difficult to use amine protecting groups such as carbamates and amides used for orthotrithiolation, which generally require deprotection by hydrolysis under strong acidic conditions. Further, in the same document, description of the synthesis of phenyl isocyanate having a trimethylsilyl group at the ortho position is also found. Although it is conceivable that an aniline derivative can be obtained by alkaline hydrolysis of this isocyanate, it is not the best method because the number of steps is large and isocyanates are generally toxic.
【0004】このように、オルト位にケイ素置換基を有
するアニリン誘導体は工業的に有用であるが、現在全く
知られておらず、また、上記の如き公知のアミノ基に置
換基(保護基)を有し、オルト位にケイ素置換基を有す
るアニリン化合物からの合成は困難であるため、その開
発、並びに簡便な製造方法の構築が期待されていた。As described above, aniline derivatives having a silicon substituent at the ortho-position are industrially useful, but are not known at all at present, and have a substituent (protecting group) on the above-mentioned known amino group. Since it is difficult to synthesize from an aniline compound having a silicon substituent at the ortho position, its development and construction of a simple production method have been expected.
【0005】従って、本発明の目的は染料や医薬品等の
合成原料として工業的に有用な、オルト位にケイ素置換
基を有するアニリン誘導体を提供し、更にその簡便な製
造方法を提供することである。Accordingly, an object of the present invention is to provide an aniline derivative having a silicon substituent at the ortho position which is industrially useful as a raw material for synthesizing dyes and pharmaceuticals, and to provide a simple method for producing the aniline derivative. .
【0006】[0006]
【課題を解決するための手段及び発明の実施の形態】本
発明者らは上記の課題を解決すべく種々検討を行った結
果、下記一般式(1)で表されるオルト位にケイ素置換
基を有するアニリン誘導体を見出すに至った。また、そ
の製造方法として、下記一般式(2)で表されるハロゲ
ン化合物に、アルカリ金属又はアルカリ土類金属の単
体、又はそれらから得られる有機金属化合物を作用させ
て、下記一般式(3)で表される化合物に変換した後
に、窒素原子に結合したR1R2R3Si−及びMを加溶
媒分解によって除去する方法を見出した。Means for Solving the Problems and Embodiments of the Invention The present inventors have conducted various studies to solve the above-mentioned problems, and as a result, have found that a silicon substituent at the ortho position represented by the following general formula (1): Have been found. Further, as a production method thereof, a simple substance of an alkali metal or an alkaline earth metal, or an organometallic compound obtained therefrom is allowed to act on a halogen compound represented by the following general formula (2) to obtain a compound represented by the following general formula (3) After converting into the compound represented by the formula, a method was found in which R 1 R 2 R 3 Si— and M bonded to the nitrogen atom were removed by solvolysis.
【0007】[0007]
【化4】 (式中、R1,R2,R3は互いに同一でも異なっていて
もよく、それぞれ炭素数1〜10の一価炭化水素基より
選択される。R4は水素原子、R1R2R3Si−で表され
る含ケイ素基又は炭素数1〜10の一価炭化水素基であ
る。)Embedded image (Wherein, R 1 , R 2 , and R 3 may be the same or different and are each selected from a monovalent hydrocarbon group having 1 to 10 carbon atoms. R 4 is a hydrogen atom, R 1 R 2 R It is a silicon-containing group represented by 3 Si- or a monovalent hydrocarbon group having 1 to 10 carbon atoms.)
【0008】[0008]
【化5】 (式中、R1,R2,R3及びR4は、式(1)におけるR
1,R2,R3,R4と同じものを表す。Xはハロゲン原子
を表す。)Embedded image (Wherein R 1 , R 2 , R 3 and R 4 are the same as R 1 in the formula (1))
It represents the same as 1 , R 2 , R 3 , and R 4 . X represents a halogen atom. )
【0009】[0009]
【化6】 (式中、R1,R2,R3及びR4は、式(1)におけるR
1,R2,R3,R4と同じものを表す。Mはアルカリ金属
原子又はアルカリ土類金属原子を表す。nは金属原子M
の価数−1の整数である。)Embedded image (Wherein R 1 , R 2 , R 3 and R 4 are the same as R 1 in the formula (1))
It represents the same as 1 , R 2 , R 3 , and R 4 . M represents an alkali metal atom or an alkaline earth metal atom. n is a metal atom M
Is an integer of valence-1. )
【0010】従って、本発明は、上記一般式(1)で示
されるオルト位にケイ素置換基を有するアニリン誘導
体、及び、上記一般式(2)のハロゲン化合物に、アル
カリ金属又はアルカリ土類金属の単体、又はそれらから
得られる有機金属化合物を作用させて、上記一般式
(3)で表される化合物に変換した後、窒素原子に結合
したR1R2R3Si−及びMを加溶媒分解によって除去
することを特徴とする、上記式(1)のオルト位にケイ
素置換基を有するアニリン誘導体の製造方法を提供す
る。Accordingly, the present invention provides an aniline derivative having a silicon substituent at the ortho position represented by the above general formula (1) and a halogen compound of the above general formula (2), wherein an alkali metal or an alkaline earth metal is added. After reacting with a simple substance or an organometallic compound obtained therefrom to convert to a compound represented by the above general formula (3), R 1 R 2 R 3 Si— and M bonded to a nitrogen atom are solvolyzed. A process for producing an aniline derivative having a silicon substituent at the ortho-position of the above formula (1), which is characterized by comprising:
【0011】以下、本発明につき更に詳しく説明する。
本発明のオルト位にケイ素置換基を有するアニリン誘導
体は、下記一般式(1)で表されるものである。Hereinafter, the present invention will be described in more detail.
The aniline derivative having a silicon substituent at the ortho position according to the present invention is represented by the following general formula (1).
【0012】[0012]
【化7】 Embedded image
【0013】式(1)において、R1,R2,R3は互い
に同一でも異なっていてもよく、それぞれ炭素数1〜1
0の一価炭化水素基より選択される。R1,R2,R3と
してはメチル基、エチル基、n−プロピル基、イソプロ
ピル基、シクロプロピル基、n−ブチル基、イソブチル
基、sec−ブチル基、tert−ブチル基、シクロブ
チル基、n−ペンチル基、イソペンチル基、1−メチル
ブチル基、1−エチルプロピル基、1,1−ジメチルプ
ロピル基、シクロペンチル基、n−ヘキシル基、テキシ
ル基、シクロヘキシル基、n−ヘプチル基、シクロヘプ
チル基、n−オクチル基、シクロオクチル基、n−ノニ
ル基、n−デシル基、フェニル基、o−トリル基、m−
トリル基、p−トリル基、2,6−ジメチルフェニル
基、2,5−ジメチルフェニル基、2,4−ジメチルフ
ェニル基、2,3−ジメチルフェニル基、3,4−ジメ
チルフェニル基、3,5−ジメチルフェニル基、メシチ
ル基、1−ナフチル基、2−ナフチル基等が挙げられ
る。つまり式(1)の化合物はアミノ基のオルト位にか
さだかいケイ素置換基を有している。In the formula (1), R 1 , R 2 and R 3 may be the same or different from each other, and each has 1 to 1 carbon atoms.
0 is selected from monovalent hydrocarbon groups. R 1 , R 2 , and R 3 are methyl, ethyl, n-propyl, isopropyl, cyclopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, cyclobutyl, n -Pentyl, isopentyl, 1-methylbutyl, 1-ethylpropyl, 1,1-dimethylpropyl, cyclopentyl, n-hexyl, texyl, cyclohexyl, n-heptyl, cycloheptyl, n -Octyl group, cyclooctyl group, n-nonyl group, n-decyl group, phenyl group, o-tolyl group, m-
Tolyl group, p-tolyl group, 2,6-dimethylphenyl group, 2,5-dimethylphenyl group, 2,4-dimethylphenyl group, 2,3-dimethylphenyl group, 3,4-dimethylphenyl group, 3, Examples include a 5-dimethylphenyl group, a mesityl group, a 1-naphthyl group, and a 2-naphthyl group. That is, the compound of formula (1) has a bulky silicon substituent at the ortho position of the amino group.
【0014】R1R2R3Si−で表されるこのケイ素置
換基の具体例としては、トリメチルシリル基、エチルジ
メチルシリル基、n−プロピルジメチルシリル基、イソ
プロピルジメチルシリル基、シクロプロピルジメチルシ
リル基、n−ブチルジメチルシリル基、イソブチルジメ
チルシリル基、sec−ブチルジメチルシリル基、te
rt−ブチルジメチルシリル基、シクロブチルジメチル
シリル基、n−ペンチルジメチルシリル基、イソペンチ
ルジメチルシリル基、(1−メチルブチル)ジメチルシ
リル基、(1−エチルプロピル)ジメチルシリル基、
(1,1−ジメチルプロピル)ジメチルシリル基、シク
ロペンチルジメチルシリル基、n−ヘキシルジメチルシ
リル基、テキシルジメチルシリル基、シクロヘキシルジ
メチルシリル基、n−ヘプチルジメチルシリル基、シク
ロヘプチルジメチルシリル基、n−オクチルジメチルシ
リル基、シクロオクチルジメチルシリル基、n−ノニル
ジメチルシリル基、n−デシルジメチルシリル基、ジエ
チルメチルシリル基、ジ−n−プロピルメチルシリル
基、ジ−n−ブチルメチルシリル基、ジシクロプロピル
メチルシリル基、トリエチルシリル基、フェニルジメチ
ルシリル基、o−トリルジメチルシリル基、m−トリル
ジメチルシリル基、p−トリルジメチルシリル基、2,
6−ジメチルフェニルジメチルシリル基、2,5−ジメ
チルフェニルジメチルシリル基、2,4−ジメチルフェ
ニルジメチルシリル基、2,3−ジメチルフェニルジメ
チルシリル基、3,4−ジメチルフェニルジメチルシリ
ル基、3,5−ジメチルフェニルジメチルシリル基、メ
シチルジメチルシリル基、1−ナフチルジメチルシリル
基、2−ナフチルジメチルシリル基等が挙げられる。Specific examples of the silicon substituent represented by R 1 R 2 R 3 Si— include trimethylsilyl, ethyldimethylsilyl, n-propyldimethylsilyl, isopropyldimethylsilyl, and cyclopropyldimethylsilyl. , N-butyldimethylsilyl group, isobutyldimethylsilyl group, sec-butyldimethylsilyl group, te
rt-butyldimethylsilyl group, cyclobutyldimethylsilyl group, n-pentyldimethylsilyl group, isopentyldimethylsilyl group, (1-methylbutyl) dimethylsilyl group, (1-ethylpropyl) dimethylsilyl group,
(1,1-dimethylpropyl) dimethylsilyl group, cyclopentyldimethylsilyl group, n-hexyldimethylsilyl group, texyldimethylsilyl group, cyclohexyldimethylsilyl group, n-heptyldimethylsilyl group, cycloheptyldimethylsilyl group, n- Octyldimethylsilyl, cyclooctyldimethylsilyl, n-nonyldimethylsilyl, n-decyldimethylsilyl, diethylmethylsilyl, di-n-propylmethylsilyl, di-n-butylmethylsilyl, dicyclo Propylmethylsilyl group, triethylsilyl group, phenyldimethylsilyl group, o-tolyldimethylsilyl group, m-tolyldimethylsilyl group, p-tolyldimethylsilyl group, 2,
6-dimethylphenyldimethylsilyl group, 2,5-dimethylphenyldimethylsilyl group, 2,4-dimethylphenyldimethylsilyl group, 2,3-dimethylphenyldimethylsilyl group, 3,4-dimethylphenyldimethylsilyl group, 3, Examples thereof include a 5-dimethylphenyldimethylsilyl group, a mesityldimethylsilyl group, a 1-naphthyldimethylsilyl group, and a 2-naphthyldimethylsilyl group.
【0015】式(1)のR4はベンゼン環上の置換基で
あり、水素原子又はR1R2R3Si−で表される含ケイ
素基、或いは炭素数1〜10の一価炭化水素基の中から
選ばれる。この一価炭化水素基としては、上で例示した
ものと同様のものが挙げられる。R4としては、特に水
素原子又はR1R2R3Si−であるものが好ましい。R 4 in the formula (1) is a substituent on the benzene ring, and is a hydrogen atom, a silicon-containing group represented by R 1 R 2 R 3 Si—, or a monovalent hydrocarbon having 1 to 10 carbon atoms. Selected from among the groups. Examples of the monovalent hydrocarbon group include the same as those exemplified above. R 4 is particularly preferably a hydrogen atom or R 1 R 2 R 3 Si—.
【0016】次に、本発明の式(1)の化合物の製造方
法を詳しく説明すると、まず下記一般式(2)のハロゲ
ン化合物に、アルカリ金属又はアルカリ土類金属の単
体、又はアルカリ金属又はアルカリ土類金属から得られ
る有機金属化合物、例えば有機リチウム試薬やグリニャ
ール試薬を作用させて、下記一般式(3)で表される化
合物に転換させる工程Aと、この式(3)の化合物の窒
素原子に結合したR1R2R3Si−及びMを加溶媒分解
によって除去する工程Bとを含む。Next, the method for producing the compound of the formula (1) of the present invention will be described in detail. First, a halogen compound of the following general formula (2) is added to a simple substance of an alkali metal or an alkaline earth metal, or an alkali metal or an alkali metal. Step A of converting an organometallic compound obtained from an earth metal, for example, an organolithium reagent or a Grignard reagent into a compound represented by the following general formula (3), and a nitrogen atom of the compound of the formula (3) B) removing R 1 R 2 R 3 Si— and M bonded to the compound by solvolysis.
【0017】[0017]
【化8】 (式中、R1,R2,R3,R4は上記と同じものを表す。
Xはハロゲン原子、Mはアルカリ金属又はアルカリ土類
金属を表す。nは金属原子Mの価数−1の整数であ
る。)Embedded image (In the formula, R 1 , R 2 , R 3 , and R 4 represent the same as described above.)
X represents a halogen atom, and M represents an alkali metal or an alkaline earth metal. n is an integer of the valence of the metal atom M minus one. )
【0018】ここで、工程Aにおいて、Xのハロゲン原
子としては、塩素、臭素、フッ素、ヨウ素が挙げられ
る。Mとしては、Li,Na,K,Mgなどが挙げられ
る。Here, in the step A, examples of the halogen atom of X include chlorine, bromine, fluorine and iodine. Examples of M include Li, Na, K, and Mg.
【0019】上記式(3)の化合物は、上述したよう
に、式(2)で表されるハロゲン化合物にアルカリ金属
やアルカリ土類金属の単体、もしくは有機リチウム試薬
やグリニャール試薬に代表される有機金属試薬を作用さ
せることにより得ることができるが、この際の反応温度
は通常−100℃〜100℃であり、反応時間は30分
〜50時間で、用いる金属や金属試薬の種類に応じて異
なる。反応溶媒はテトラヒドロフランやジエチルエーテ
ルに代表されるエーテル系溶媒、又はヘキサン、トルエ
ン、キシレン等に代表される炭化水素系溶媒とエーテル
系溶媒の混合溶媒を用いることができる。As described above, the compound of the formula (3) may be a simple compound of an alkali metal or an alkaline earth metal, or an organic compound represented by an organic lithium reagent or a Grignard reagent, in addition to the halogen compound represented by the formula (2). It can be obtained by allowing a metal reagent to act, but the reaction temperature at this time is usually -100 ° C to 100 ° C, and the reaction time is 30 minutes to 50 hours, and varies depending on the type of metal or metal reagent used. . As a reaction solvent, an ether solvent represented by tetrahydrofuran or diethyl ether, or a mixed solvent of a hydrocarbon solvent represented by hexane, toluene, xylene and the like and an ether solvent can be used.
【0020】また、工程Bにおいて、加溶媒分解に用い
る溶媒としては、水、メタノール、エタノール等の低級
アルコールや、水と低級アルコールとの混合溶媒などの
プロトン性溶媒が有効に用いられ、式(3)の化合物
は、上記水又はアルコール等のプロトン性溶媒を用いて
加溶媒分解により式(1)の化合物に変換することがで
きる。式(3)の化合物は水分や空気に敏感であり、単
離することは困難であるので、前工程の反応混合物に前
記のプロトン性溶媒を加える。反応混合物を酸性にする
と分解反応は速やかになるが、炭素−ケイ素結合が切断
されるので、この反応は中性又は塩基性の条件で行うこ
とが好ましい。反応温度は通常0〜100℃であり、反
応時間は30分〜10時間であるが、R1,R2,R3の
種類により長時間の加熱が必要な場合がある。In the step B, as a solvent used for solvolysis, a protic solvent such as water, a lower alcohol such as methanol or ethanol, or a mixed solvent of water and a lower alcohol is effectively used. The compound of 3) can be converted to the compound of formula (1) by solvolysis using the above-mentioned protic solvent such as water or alcohol. Since the compound of the formula (3) is sensitive to moisture and air and is difficult to isolate, the above-mentioned protic solvent is added to the reaction mixture in the previous step. When the reaction mixture is acidified, the decomposition reaction is accelerated, but the carbon-silicon bond is broken. Therefore, this reaction is preferably performed under neutral or basic conditions. The reaction temperature is usually from 0 to 100 ° C., and the reaction time is from 30 minutes to 10 hours. However, depending on the type of R 1 , R 2 and R 3 , long-time heating may be required.
【0021】この加溶媒分解反応は二段階逐次で行うこ
ともできる。即ち、加溶媒分解をより温和な条件で行え
ば下記一般式(4)で表されるアニリン誘導体を単離す
ることができる。その後、式(4)の化合物を中性又は
塩基性条件でプロトン性溶媒と反応させれば式(1)の
化合物が得られる。This solvolysis reaction can be carried out in two steps successively. That is, if the solvolysis is performed under milder conditions, the aniline derivative represented by the following general formula (4) can be isolated. Thereafter, the compound of the formula (1) is obtained by reacting the compound of the formula (4) with a protic solvent under neutral or basic conditions.
【0022】[0022]
【化9】 (式中、R1,R2,R3及びR4は、式(1)におけるR
1,R2,R3,R4と同じものを表す。)Embedded image (Wherein R 1 , R 2 , R 3 and R 4 are the same as R 1 in the formula (1))
It represents the same as 1 , R 2 , R 3 , and R 4 . )
【0023】[0023]
【発明の効果】本発明のアニリン誘導体は、染料や医薬
品等の合成原料として有用であり、また本発明の製造方
法によれば、このアニリン誘導体を効率よく製造し得
る。The aniline derivative of the present invention is useful as a raw material for synthesizing dyes and pharmaceuticals, and according to the production method of the present invention, this aniline derivative can be produced efficiently.
【0024】[0024]
【実施例】以下、実施例を示し、本発明を具体的に説明
するが、本発明は下記の実施例に制限されるものではな
い。The present invention will be described below in more detail with reference to Examples, but the present invention is not limited to the following Examples.
【0025】〔実施例1〕tert−ブチルリチウムを
用いる2−(トリメチルシリル)アニリンの合成 滴下ロート、温度計、撹拌機を備えた500mlの三つ
口ガラスフラスコを窒素置換し、2−ブロモビス(トリ
メチルシリル)アニリン31.6g(0.10mol)
及びテトラヒドロフラン200mlを仕込んだ。内容物
を撹拌しながら、ドライアイス−アセトン浴で−70℃
に冷却した。滴下ロートよりtert−ブチルリチウム
1.7Mペンタン溶液118ml(0.20mol)を
−70〜−61℃、1時間で滴下した。−55℃以下で
4時間撹拌し、徐々に室温へ温度を上げた。反応混合物
にメタノール3.2g(0.10mol)を加え、室温
で30分間撹拌した後にロータリーエバポレーターで溶
媒を留去した。濃縮液にヘキサン100mlを加え、析
出した塩を濾過して除いた。塩をヘキサン100mlで
洗い、洗液と濾液を合わせてロータリーエバポレーター
で濃縮後、減圧蒸留した。4mmHgで沸点72℃の無
色透明留分21.3gが得られた。質量スペクトル(E
I,m/z237(M+)、222([M−Me]+)、
73(Me3Si+))よりこの液体がN,2−ビス(ト
リメチルシリル)アニリンであることが確認された。Example 1 Synthesis of 2- (trimethylsilyl) aniline using tert-butyllithium A 500-ml three-necked glass flask equipped with a dropping funnel, a thermometer, and a stirrer was replaced with nitrogen, and 2-bromobis (trimethylsilyl) was added. ) 31.6 g (0.10 mol) of aniline
And 200 ml of tetrahydrofuran. -70 ° C in a dry ice-acetone bath while stirring the contents
And cooled. From a dropping funnel, 118 ml (0.20 mol) of a 1.7 M tert-butyllithium pentane solution was added dropwise at -70 to -61 ° C for 1 hour. The mixture was stirred at −55 ° C. or lower for 4 hours, and the temperature was gradually raised to room temperature. 3.2 g (0.10 mol) of methanol was added to the reaction mixture, and the mixture was stirred at room temperature for 30 minutes, and then the solvent was distilled off with a rotary evaporator. 100 ml of hexane was added to the concentrated solution, and the precipitated salt was removed by filtration. The salt was washed with 100 ml of hexane, and the washing and the filtrate were combined, concentrated by a rotary evaporator, and then distilled under reduced pressure. 21.3 g of a colorless transparent fraction having a boiling point of 72 ° C. at 4 mmHg were obtained. Mass spectrum (E
I, m / z 237 (M + ), 222 ([M-Me] + ),
73 (Me 3 Si + )), it was confirmed that this liquid was N, 2-bis (trimethylsilyl) aniline.
【0026】この液体を、滴下ロート、温度計、撹拌機
を備え、窒素置換した100mlの三つ口ガラスフラス
コに仕込み、内容物を撹拌しながら滴下ロートよりメタ
ノール10mlを22〜25℃にて30分間で滴下し
た。20〜25℃で1時間撹拌を続けた後、反応混合物
を減圧蒸留した。2.5mmHgにおいて沸点73〜7
5℃の無色透明留分13.8gが得られた。核磁気共鳴
スペクトル、赤外吸収スペクトル、質量スペクトルの結
果より、この液体が2−(トリメチルシリル)アニリン
であることが確認された。収率は83.5%であった。This liquid was charged into a 100 ml three-necked glass flask equipped with a dropping funnel, a thermometer and a stirrer and purged with nitrogen, and 10 ml of methanol was added to the flask at 22 to 25 ° C. from the dropping funnel while stirring the contents. In minutes. After stirring for 1 hour at 20-25 ° C, the reaction mixture was distilled under reduced pressure. Boiling point 73 to 7 at 2.5 mmHg
13.8 g of a colorless transparent fraction at 5 ° C. was obtained. From the results of nuclear magnetic resonance spectrum, infrared absorption spectrum and mass spectrum, it was confirmed that this liquid was 2- (trimethylsilyl) aniline. The yield was 83.5%.
【0027】本化合物の1H核磁気共鳴スペクトル(C
DCl3溶媒)を図1に、13C核磁気共鳴スペクトル
(CDCl3溶媒)を図2に、また赤外吸収スペクトル
(NaCl岩塩板)を図3に示す。 質量スペクトル(EI)m/z:165(M+)、15
0([M−Me]+)The 1 H nuclear magnetic resonance spectrum (C
DCl 3 solvent) in FIG. 1, 13 C nuclear magnetic resonance spectrum (CDCl 3 solvent) in FIG. 2, also showing the infrared absorption spectrum (NaCl rock salt plate) in FIG. Mass spectrum (EI) m / z: 165 (M + ), 15
0 ([M-Me] + )
【0028】〔実施例2〕金属マグネシウムを用いる2
−(トリメチルシリル)アニリンの合成 滴下ロート、温度計、撹拌機を備えた200mlの三つ
口ガラスフラスコを窒素置換し、マグネシウム2.8g
(0.116mol)及びテトラヒドロフラン10ml
を仕込んだ。内容物を撹拌しながら、滴下ロートより2
−ブロモビス(トリメチルシリル)アニリン36.6g
(0.116mol)をテトラヒドロフラン25mlに
溶かした溶液を5〜10℃、1時間で滴下した。10℃
で2時間撹拌し、更に20〜25℃で40時間撹拌を続
けた。反応混合物にヘキサン30gを加え、8%塩酸5
2.9g(0.116mol)を40℃以下に保ちなが
ら30分間で滴下した。室温で30分間撹拌した後に分
液し、有機層を減圧下に蒸留した。7mmHgで沸点8
6〜89℃の無色透明留分12.2gが得られた。核磁
気共鳴スペクトル、赤外吸収スペクトル、質量スペクト
ルの結果より、この液体が2−(トリメチルシリル)ア
ニリンであることが確認された。収率は63.6%であ
った。Example 2 2 using metallic magnesium
Synthesis of-(trimethylsilyl) aniline A 200 ml three-necked glass flask equipped with a dropping funnel, a thermometer, and a stirrer was purged with nitrogen, and 2.8 g of magnesium was added.
(0.116 mol) and 10 ml of tetrahydrofuran
Was charged. While stirring the contents, 2 drops from the dropping funnel.
-Bromobis (trimethylsilyl) aniline 36.6 g
(0.116 mol) in 25 ml of tetrahydrofuran was added dropwise at 5-10 ° C. for 1 hour. 10 ℃
At 20 to 25 ° C. for 40 hours. 30 g of hexane was added to the reaction mixture, and
2.9 g (0.116 mol) was added dropwise over 30 minutes while maintaining the temperature at 40 ° C. or lower. After stirring at room temperature for 30 minutes, the layers were separated, and the organic layer was distilled under reduced pressure. Boiling point 8 at 7 mmHg
12.2 g of a colorless and transparent fraction at 6 to 89 ° C. were obtained. From the results of nuclear magnetic resonance spectrum, infrared absorption spectrum and mass spectrum, it was confirmed that this liquid was 2- (trimethylsilyl) aniline. The yield was 63.6%.
【0029】〔実施例3〕2,6−ビス(トリメチルシ
リル)アニリンの合成 滴下ロート、温度計、撹拌機を備えた200mlの三つ
口ガラスフラスコを窒素置換し、2,6−ジブロモ−
N,N−ビス(トリメチルシリル)アニリン21.7g
(0.055mol)及びテトラヒドロフラン55ml
を仕込んだ。内容物を撹拌しながら、ドライアイス−ア
セトン浴で−70℃に冷却した。滴下ロートよりter
t−ブチルリチウム1.64Mペンタン溶液67ml
(0.11mol)を−70〜−62℃、1.5時間で
滴下した。−70℃で1時間、内温を−30℃に上げて
1時間撹拌した後、滴下ロートからトリメチルクロロシ
ラン6.0g(0.055mol)を−20℃にて加え
た。徐々に室温へ温度を上げながら反応混合物を1時間
撹拌した。GC−MS分析により、2,6−ジブロモ−
N,N−ビス(トリメチルシリル)アニリンが消失し、
2−ブロモ−N,N,6−トリス(トリメチルシリル)
アニリンが生成していることがわかった。10%塩化ア
ンモニウム水溶液50gを室温で加え、分液して有機層
を減圧濃縮することにより褐色の濃縮液22.3gを得
た。Example 3 Synthesis of 2,6-bis (trimethylsilyl) aniline A 200-ml three-necked glass flask equipped with a dropping funnel, a thermometer, and a stirrer was purged with nitrogen to give 2,6-dibromo-aniline.
N, N-bis (trimethylsilyl) aniline 21.7 g
(0.055 mol) and 55 ml of tetrahydrofuran
Was charged. The contents were cooled to -70 ° C in a dry ice-acetone bath while stirring. Ter from the dropping funnel
t-butyllithium 1.64 M pentane solution 67 ml
(0.11 mol) was added dropwise at -70 to -62 ° C for 1.5 hours. After stirring at -70 ° C for 1 hour and raising the internal temperature to -30 ° C for 1 hour, 6.0 g (0.055 mol) of trimethylchlorosilane was added at -20 ° C from the dropping funnel. The reaction mixture was stirred for 1 hour while gradually raising the temperature to room temperature. According to GC-MS analysis, 2,6-dibromo-
N, N-bis (trimethylsilyl) aniline disappears,
2-bromo-N, N, 6-tris (trimethylsilyl)
It was found that aniline was formed. 50 g of a 10% aqueous ammonium chloride solution was added at room temperature, the layers were separated, and the organic layer was concentrated under reduced pressure to obtain 22.3 g of a brown concentrated solution.
【0030】この濃縮液をテトラヒドロフラン55ml
に溶解し、滴下ロート、温度計、撹拌機を備え、窒素置
換した200mlの三つ口ガラスフラスコに仕込んだ。
内容物を撹拌しながら、ドライアイス−アセトン浴で−
70℃に冷却した。滴下ロートよりtert−ブチルリ
チウム1.64Mペンタン溶液67ml(0.11mo
l)を−70〜−63℃、1.5時間で滴下した。−7
0℃で30分間、内温を−35〜−30℃に上げて2時
間撹拌した後、滴下ロートから3.6%塩酸56g
(0.055mol)を0℃以下にて加えた。徐々に室
温へ温度を上げながら反応混合物を30分間撹拌した。
分液して有機層を取り出し、還流冷却器、温度計、撹拌
機を備えた窒素置換した別の200mlの三つ口ガラス
フラスコに仕込んだ。28%ナトリウムメチラートメタ
ノール溶液1.9g(0.01mol)及びメタノール
10gを加え、加熱還流下に4時間撹拌した。得られた
反応混合物を減圧蒸留し、3mmHgにおいて沸点93
〜95℃の無色透明留分9.4gが得られた。核磁気共
鳴スペクトル、赤外吸収スペクトル、質量スペクトルの
結果より、この液体が2,6−ビス(トリメチルシリ
ル)アニリンであることが確認された。収率は72%で
あった。The concentrated solution was added to 55 ml of tetrahydrofuran.
And charged to a 200 ml three-necked glass flask equipped with a dropping funnel, a thermometer, and a stirrer and purged with nitrogen.
While stirring the contents, dry ice in an acetone bath
Cooled to 70 ° C. From a dropping funnel, 67 ml of tert-butyllithium 1.64 M pentane solution (0.11 mol)
l) was added dropwise at -70 to -63 ° C for 1.5 hours. -7
After stirring at 0 ° C. for 30 minutes and raising the internal temperature to −35 to −30 ° C. for 2 hours, 56 g of 3.6% hydrochloric acid was added through a dropping funnel.
(0.055 mol) at 0 ° C. or lower. The reaction mixture was stirred for 30 minutes while gradually raising the temperature to room temperature.
The organic layer was separated and the organic layer was taken out and charged into another 200 ml three-necked glass flask equipped with a reflux condenser, a thermometer, and a stirrer and purged with nitrogen. 1.9 g (0.01 mol) of a 28% sodium methylate methanol solution and 10 g of methanol were added, and the mixture was stirred under heating and reflux for 4 hours. The resulting reaction mixture was distilled under reduced pressure to a boiling point of 93 mm at 3 mmHg.
9.4 g of a clear and colorless fraction at ~ 95 ° C were obtained. From the results of nuclear magnetic resonance spectrum, infrared absorption spectrum and mass spectrum, it was confirmed that this liquid was 2,6-bis (trimethylsilyl) aniline. The yield was 72%.
【0031】本化合物の1H核磁気共鳴スペクトル(C
DCl3溶媒)を図4に、13C核磁気共鳴スペクトル
(CDCl3溶媒)を図5に、また赤外吸収スペクトル
(NaCl岩塩板)を図6に示す。 質量スペクトル(EI)m/z:237(M+)、22
2([M−Me]+)、206、74The 1 H nuclear magnetic resonance spectrum (C
DCl 3 solvent) in FIG. 4, 13 C nuclear magnetic resonance spectrum (CDCl 3 solvent) in FIG. 5, also showing the infrared absorption spectrum (NaCl rock salt plate) in FIG. Mass spectrum (EI) m / z: 237 (M <+> ), 22
2 ([M-Me] + ), 206, 74
【0032】〔実施例4〕2−(トリエチルシリル)ア
ニリンの合成 滴下ロート、温度計、撹拌機を備えた200mlの三つ
口ガラスフラスコを窒素置換し、2−ブロモビス(トリ
エチルシリル)アニリン20.0g(0.05mol)
及びテトラヒドロフラン50mlを仕込んだ。内容物を
撹拌しながら、ドライアイス−アセトン浴で−66℃に
冷却した。滴下ロートよりtert−ブチルリチウム
1.64Mペンタン溶液61ml(0.10mol)を
−66〜−57℃、1.5時間で滴下した。−64℃で
30分間撹拌し、−30〜−25℃に温度を上げて2時
間撹拌を続けた。その後徐々に室温へ温度を上げた。反
応混合物に3.6%塩酸51g(0.05mol)を2
0℃以下で加え、分液して有機層を取り出し、還流冷却
器、温度計、撹拌機を備えた窒素置換した別の200m
lの三つ口ガラスフラスコに仕込んだ。28%ナトリウ
ムメチラートメタノール溶液2.9g(0.015mo
l)及びメタノール20gを加え、加熱還流下に8時間
撹拌した。得られた反応混合物を減圧蒸留し、2mmH
gにおいて沸点80〜81℃の無色透明留分8.5gが
得られた。核磁気共鳴スペクトル、赤外吸収スペクト
ル、質量スペクトルの結果より、この液体が2−(トリ
エチルシリル)アニリンであることが確認された。収率
は82%であった。Example 4 Synthesis of 2- (triethylsilyl) aniline A 200-ml three-necked glass flask equipped with a dropping funnel, a thermometer, and a stirrer was replaced with nitrogen, and 2-bromobis (triethylsilyl) aniline. 0g (0.05mol)
And 50 ml of tetrahydrofuran. The contents were cooled to -66 ° C in a dry ice-acetone bath while stirring. From a dropping funnel, 61 ml (0.10 mol) of a tert-butyllithium 1.64M pentane solution was added dropwise at -66 to -57 ° C for 1.5 hours. The mixture was stirred at −64 ° C. for 30 minutes, and the temperature was increased to −30 to −25 ° C., and stirring was continued for 2 hours. Thereafter, the temperature was gradually raised to room temperature. To the reaction mixture was added 51 g (0.05 mol) of 3.6% hydrochloric acid in 2 parts.
The mixture was added at 0 ° C. or lower, liquid-separated, and the organic layer was taken out. Another 200 m of nitrogen-purged equipped with a reflux condenser, a thermometer, and a stirrer
of a three-necked glass flask. 2.9 g of 28% sodium methylate methanol solution (0.015 mol
l) and 20 g of methanol were added, and the mixture was stirred for 8 hours while heating under reflux. The obtained reaction mixture was distilled under reduced pressure, and
As a result, 8.5 g of a colorless transparent fraction having a boiling point of 80 to 81 ° C. was obtained. From the results of nuclear magnetic resonance spectrum, infrared absorption spectrum and mass spectrum, it was confirmed that this liquid was 2- (triethylsilyl) aniline. The yield was 82%.
【0033】本化合物の1H核磁気共鳴スペクトル(C
DCl3溶媒)を図7に、13C核磁気共鳴スペクトル
(CDCl3溶媒)を図8に、また赤外吸収スペクトル
(NaCl岩塩板)を図9に示す。 質量スペクトル(EI)m/z:207(M+)、17
8([M−Et]+)、150、122The 1 H nuclear magnetic resonance spectrum (C
DCl 3 solvent) in FIG. 7, 13 C nuclear magnetic resonance spectrum (CDCl 3 solvent) in FIG. 8, also illustrates an infrared absorption spectrum (NaCl rock salt plate) in FIG. Mass spectrum (EI) m / z: 207 (M <+> ), 17
8 ([M-Et] + ), 150, 122
【0034】〔実施例5〕2−(n−ヘキシルジメチル
シリル)アニリンの合成 滴下ロート、温度計、撹拌機を備えた200mlの三つ
口ガラスフラスコを窒素置換し、2−ブロモビス(n−
ヘキシルジメチルシリル)アニリン22.8g(0.0
5mol)及びテトラヒドロフラン50mlを仕込ん
だ。内容物を撹拌しながら、ドライアイス−アセトン浴
で−65℃に冷却した。滴下ロートよりtert−ブチ
ルリチウム1.64Mペンタン溶液61ml(0.10
mol)を−65〜−57℃、1.5時間で滴下した。
−67〜−64℃で1時間撹拌し、−25℃に温度を上
げて2時間撹拌を続けた。その後徐々に室温へ温度を上
げた。反応混合物に3.6%塩酸51g(0.05mo
l)を25℃以下で加え、分液して有機層を取り出し、
減圧濃縮した。濃縮液を減圧蒸留し、1mmHgにおい
て沸点93℃の無色透明留分9.8gが得られた。核磁
気共鳴スペクトル、赤外吸収スペクトル、質量スペクト
ルの結果より、この液体が2−(n−ヘキシルジメチル
シリル)アニリンであることが確認された。収率は83
%であった。Example 5 Synthesis of 2- (n-hexyldimethylsilyl) aniline A 200-ml three-necked glass flask equipped with a dropping funnel, a thermometer, and a stirrer was purged with nitrogen, and 2-bromobis (n-
Hexyldimethylsilyl) aniline 22.8 g (0.0
5 mol) and 50 ml of tetrahydrofuran. The contents were cooled to -65 ° C in a dry ice-acetone bath while stirring. From a dropping funnel, 61 ml of tert-butyllithium 1.64M pentane solution (0.10 M
mol) was added dropwise at -65 to -57 ° C for 1.5 hours.
The mixture was stirred at -67 to -64 ° C for 1 hour, the temperature was raised to -25 ° C, and the stirring was continued for 2 hours. Thereafter, the temperature was gradually raised to room temperature. 51% of 3.6% hydrochloric acid (0.05 mol) was added to the reaction mixture.
l) is added at 25 ° C or lower, and liquid separation is performed to take out an organic layer.
It was concentrated under reduced pressure. The concentrated solution was distilled under reduced pressure to obtain 9.8 g of a colorless transparent fraction having a boiling point of 93 ° C. at 1 mmHg. From the results of nuclear magnetic resonance spectrum, infrared absorption spectrum and mass spectrum, it was confirmed that this liquid was 2- (n-hexyldimethylsilyl) aniline. Yield 83
%Met.
【0035】本化合物の1H核磁気共鳴スペクトル(C
DCl3溶媒)を図10に、13C核磁気共鳴スペクトル
(CDCl3溶媒)を図11に、また赤外吸収スペクト
ル(NaCl岩塩板)を図12に示す。 質量スペクトル(EI)m/z:235(M+)、22
0([M−Me]+)、150([M−C6H13]+)The 1 H nuclear magnetic resonance spectrum (C
The DCl 3 solvent) FIG. 10, the 13 C nuclear magnetic resonance spectrum (CDCl 3 solvent) in FIG. 11, also shown the infrared absorption spectrum (NaCl rock salt plate) Figure 12. Mass spectrum (EI) m / z: 235 (M <+> ), 22
0 ([M-Me] + ), 150 ([M-C 6 H 13 ] + )
【図1】本発明の実施例1で得られた化合物の1H核磁
気共鳴スペクトルを示す。FIG. 1 shows the 1 H nuclear magnetic resonance spectrum of the compound obtained in Example 1 of the present invention.
【図2】本発明の実施例1で得られた化合物の13C核磁
気共鳴スペクトルを示す。FIG. 2 shows a 13 C nuclear magnetic resonance spectrum of the compound obtained in Example 1 of the present invention.
【図3】本発明の実施例1で得られた化合物の 赤外吸収
スペクトルを示す。FIG. 3 shows the results of the compound obtained in Example 1 of the present invention. Infrared absorption
The spectrum is shown.
【図4】本発明の実施例3で得られた化合物の1H核磁
気共鳴スペクトルを示す。FIG. 4 shows a 1 H nuclear magnetic resonance spectrum of the compound obtained in Example 3 of the present invention.
【図5】本発明の実施例3で得られた化合物の13C核磁
気共鳴スペクトルを示す。FIG. 5 shows a 13 C nuclear magnetic resonance spectrum of the compound obtained in Example 3 of the present invention.
【図6】本発明の実施例3で得られた化合物の 赤外吸収
スペクトルを示す。FIG. 6 shows the results of the compound obtained in Example 3 of the present invention. Infrared absorption
The spectrum is shown.
【図7】本発明の実施例4で得られた化合物の1H核磁
気共鳴スペクトルを示す。FIG. 7 shows a 1 H nuclear magnetic resonance spectrum of the compound obtained in Example 4 of the present invention.
【図8】本発明の実施例4で得られた化合物の13C核磁
気共鳴スペクトルを示す。FIG. 8 shows a 13 C nuclear magnetic resonance spectrum of the compound obtained in Example 4 of the present invention.
【図9】本発明の実施例4で得られた化合物の 赤外吸収
スペクトルを示す。FIG. 9 shows the results of the compound obtained in Example 4 of the present invention. Infrared absorption
The spectrum is shown.
【図10】本発明の実施例5で得られた化合物の1H核
磁気共鳴スペクトルを示す。FIG. 10 shows a 1 H nuclear magnetic resonance spectrum of the compound obtained in Example 5 of the present invention.
【図11】本発明の実施例5で得られた化合物の13C核
磁気共鳴スペクトルを示す。FIG. 11 shows a 13 C nuclear magnetic resonance spectrum of the compound obtained in Example 5 of the present invention.
【図12】本発明の実施例5で得られた化合物の 赤外吸
収スペクトルを示す。FIG. 12 shows the results of the compound obtained in Example 5 of the present invention. Infrared absorption
2 shows a collection spectrum.
Claims (3)
もよく、それぞれ炭素数1〜10の一価炭化水素基より
選択される。R4は水素原子、R1R2R3Si−で表され
る含ケイ素基又は炭素数1〜10の一価炭化水素基であ
る。)で表されるオルト位にケイ素置換基を有するアニ
リン誘導体。[Claim 1] The following general formula (1) (Wherein, R 1 , R 2 , and R 3 may be the same or different and are each selected from a monovalent hydrocarbon group having 1 to 10 carbon atoms. R 4 is a hydrogen atom, R 1 R 2 R An aniline derivative having a silicon substituent at the ortho position represented by 3 Si— or a silicon-containing group or a monovalent hydrocarbon group having 1 to 10 carbon atoms.
又はR1R2R3Si−で表される含ケイ素基である請求
項1記載のオルト位にケイ素置換基を有するアニリン誘
導体。2. The aniline derivative having a silicon substituent at the ortho-position according to claim 1, wherein in the formula (1), R 4 is a hydrogen atom or a silicon-containing group represented by R 1 R 2 R 3 Si—. .
1,R2,R3,R4と同じものを表す。Xはハロゲン原子
を表す。)で表されるハロゲン化合物に、アルカリ金属
又はアルカリ土類金属の単体、又はそれらから得られる
有機金属化合物を作用させて、下記一般式(3) 【化3】 (式中、R1,R2,R3及びR4は、式(1)におけるR
1,R2,R3,R4と同じものを表す。Mはアルカリ金属
原子又はアルカリ土類金属原子を表す。nは金属原子M
の価数−1の整数である。)で表される化合物に変換し
た後、窒素原子に結合したR1R2R3Si−及びMを加
溶媒分解によって除去することを特徴とする請求項1又
は2記載のオルト位にケイ素置換基を有するアニリン誘
導体の製造方法。3. The following general formula (2): (Wherein R 1 , R 2 , R 3 and R 4 are the same as R 1 in the formula (1))
It represents the same as 1 , R 2 , R 3 , and R 4 . X represents a halogen atom. ) Is reacted with a simple substance of an alkali metal or an alkaline earth metal, or an organometallic compound obtained therefrom, to give a compound represented by the following general formula (3): (Wherein R 1 , R 2 , R 3 and R 4 are the same as R 1 in the formula (1))
It represents the same as 1 , R 2 , R 3 , and R 4 . M represents an alkali metal atom or an alkaline earth metal atom. n is a metal atom M
Is an integer of valence-1. 3. ) The compound of claim 1 or 2, wherein R 1 R 2 R 3 Si— and M bonded to the nitrogen atom are removed by solvolysis after conversion into the compound represented by the formula (1). A method for producing an aniline derivative having a group.
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JP14471997A JP3861947B2 (en) | 1997-05-19 | 1997-05-19 | Method for producing aniline derivative having silicon substituent at ortho position |
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JP14471997A JP3861947B2 (en) | 1997-05-19 | 1997-05-19 | Method for producing aniline derivative having silicon substituent at ortho position |
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JP2016128518A (en) * | 2014-12-04 | 2016-07-14 | 信越化学工業株式会社 | Method for producing polyalkylene glycol derivative having amino group at end |
US10377775B2 (en) | 2014-12-04 | 2019-08-13 | Shin-Etsu Chemical Co., Ltd. | Method for producing polyalkylene glycol derivative having amino group at end |
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1997
- 1997-05-19 JP JP14471997A patent/JP3861947B2/en not_active Expired - Fee Related
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JP2016128518A (en) * | 2014-12-04 | 2016-07-14 | 信越化学工業株式会社 | Method for producing polyalkylene glycol derivative having amino group at end |
US10377775B2 (en) | 2014-12-04 | 2019-08-13 | Shin-Etsu Chemical Co., Ltd. | Method for producing polyalkylene glycol derivative having amino group at end |
US10472377B2 (en) | 2014-12-04 | 2019-11-12 | Shin-Etsu Chemical Co., Ltd. | Method for producing polyalkylene glycol derivative having amino group at end, polymerization initiator for use in the same, and alcohol compound as raw material for the polymerization initiator |
US10550136B2 (en) | 2014-12-04 | 2020-02-04 | Shin-Etsu Chemical Co., Ltd. | Method for producing polyalkylene glycol derivative having amino group at end |
US11066430B2 (en) | 2014-12-04 | 2021-07-20 | Shin-Etsu Chemical Co., Ltd. | Method for producing polyalkylene glycol derivative having amino group at end |
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