JP2009263316A - Method for producing incompletely condensed oligosilsesquioxane - Google Patents
Method for producing incompletely condensed oligosilsesquioxane Download PDFInfo
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本発明は、不完全縮合オリゴシルセスキオキサンの製造方法に関する。 The present invention relates to a method for producing incompletely condensed oligosilsesquioxane.
不完全縮合のオリゴシルセスキオキサン骨格は、シルセスキオキサンを含むポリマー、シリカ担持触媒、ネットワークポリマー等の合成ブロックとして重要な役割をはたしている(例えば、非特許文献1)。不完全縮合ポリヘドラルオリゴシルセスキオキサン(以下、POSSということがある)の合成について、Feherらは完全縮合型POSS骨格の「controlled cleavage」を試みている(例えば、非特許文献2)。
本発明は、完全縮合型POSSの骨格の再配列(reshuffling process)により、環状四量体、不完全縮合POSS誘導体を得る新規な製造方法の提供にある。 The present invention is to provide a novel production method for obtaining a cyclic tetramer and an incompletely condensed POSS derivative by reshuffling process of a fully condensed POSS skeleton.
本発明は、一般式(1) The present invention relates to a general formula (1)
[式中、Phはフェニル基を表す。]
で示される完全縮合オクタフェニルオクタシルセスキオキサン(以下、Ph−T8ということがある)を、水−アルコール溶媒中、アルカリの共存下、加水分解反応させ、必要により、次いで保護基で保護することを特徴とする一般式(2)
[Wherein Ph represents a phenyl group. ]
A fully condensed octaphenyl octasilsesquioxane (hereinafter sometimes referred to as Ph-T 8 ) represented by the following formula is hydrolyzed in the presence of an alkali in a water-alcohol solvent, and then protected with a protecting group as necessary. General formula (2) characterized by
[式中、R’はフェニル基を表し、R’’はナトリウム(Na)又はSi(R’’’)3を表し、R’’’は水素、炭素数1から4の脂肪族炭化水素基又は更に置換基を有することもあるフェニル基を表す。]
で示される環状テトラシロキサン、一般式(3)
[式中、R’はフェニル基を表し、R’’はナトリウム(Na)又はSi(R’’’)3を表し、R’’’は水素、炭素数1から4の脂肪族炭化水素基又は更に置換基を有することもあるフェニル基を表す。]
で示される環状ヘプタシルセスキオキサン及び/又は一般式(4)
[式中、R’はフェニル基を表し、R’’はナトリウム(Na)又はSi(R’’’)3を表し、R’’’は水素、炭素数1から4の脂肪族炭化水素基又は更に置換基を有することもあるフェニル基を表す。]
で示される環状オクタシルセスキオキサンの製造方法である(請求項1)。
[Wherein R ′ represents a phenyl group, R ″ represents sodium (Na) or Si (R ′ ″) 3 , R ′ ″ represents hydrogen, and an aliphatic hydrocarbon group having 1 to 4 carbon atoms. Or it represents the phenyl group which may have a substituent further. ]
A cyclic tetrasiloxane represented by the general formula (3)
[Wherein R ′ represents a phenyl group, R ″ represents sodium (Na) or Si (R ′ ″) 3 , R ′ ″ represents hydrogen, and an aliphatic hydrocarbon group having 1 to 4 carbon atoms. Or it represents the phenyl group which may have a substituent further. ]
Cyclic heptasilsesquioxane and / or general formula (4)
Wherein, R 'represents a phenyl group, R''is sodium (Na) or Si (R''') 3 represents, R '''is hydrogen, an aliphatic hydrocarbon group having 1 to 4 carbon atoms Or it represents the phenyl group which may have a substituent further. ]
(Claim 1) It is a manufacturing method of cyclic octasilsesquioxane shown by these.
また、本発明は、アルコールが、炭素数1から4の分枝されていてもよい脂肪族アルコールから選択される請求項1に記載の製造方法である(請求項2)。 Moreover, this invention is a manufacturing method of Claim 1 as which alcohol is selected from the C1-C4 aliphatic alcohol which may be branched (Claim 2).
更に、本発明は、アルカリが、アルカリ金属水酸化物、アルカリ土類金属水酸化物、アルカリ金属炭酸塩、アルカリ土類金属炭酸塩、炭素数1から4のアルキル置換基をもつ四級アンモニウム塩の水酸化物及び炭素数1から4のアルキル置換基をもつ四級アンモニウム塩のフッ素物から選択される請求項1乃至請求項2の何れかに記載の製造方法である(請求項3)。 Furthermore, the present invention relates to a quaternary ammonium salt in which the alkali is an alkali metal hydroxide, an alkaline earth metal hydroxide, an alkali metal carbonate, an alkaline earth metal carbonate, or an alkyl substituent having 1 to 4 carbon atoms. The production method according to any one of claims 1 to 2, wherein the production method is selected from the hydroxides of quaternary ammonium salts having an alkyl substituent of 1 to 4 carbon atoms.
更にまた、本発明は、反応温度が、室温から溶媒の還流温度の範囲から選択される請求項1乃至請求項3の何れかに記載の製造方法である(請求項4)。
次に、本発明は、一般式(1)
[式中、Phはフェニル基を表す。]
で示される完全縮合オクタフェニルオクタシルセスキオキサン(Ph−T8)を、水−アルコール溶媒中、アルカリの共存下、加水分解反応させ、次いで保護基(クロロトリメチルシランなどのシランカップリング剤)で保護することを特徴とする一般式(5)
で示される環状1,3,5,7−テトラキス(トリメチルシリル)テトラフェニルテトラシロキサン(T4OTMS)、一般式(6)
で示される環状3,7,14−トリス(トリメチルシリル)ヘプタフェニルトリシクロ[7.3.3.15,11]ヘプタシルセスキオキサン(T7OTMS)及び/又は一般式(7)
で示される環状5,11,14,17−テトラキス(トリメチルシリル)オクタフェニルテトラシクロ[7.3.3.33,7]オクタシルセスキオキサン(DDT8OTMS)の製造方法である(請求項5)。
Furthermore, the present invention is the production method according to any one of claims 1 to 3, wherein the reaction temperature is selected from the range of room temperature to the reflux temperature of the solvent (claim 4).
Next, the present invention provides a general formula (1)
[Wherein Ph represents a phenyl group. ]
Is fully condensed octaphenyl octasilsesquioxane (Ph-T 8 ) in a water-alcohol solvent in the presence of an alkali, followed by a hydrolysis reaction, and then a protective group (a silane coupling agent such as chlorotrimethylsilane). General formula (5) characterized by protection with
Cyclic 1,3,5,7-tetrakis (trimethylsilyl) tetraphenyltetrasiloxane (T 4 OTMS) represented by the general formula (6)
In shown are annular 3,7,14- tris (trimethylsilyl) heptaphenyl tricyclo [7.3.3.1 5 and 11] hept silsesquioxane (T 7 OTMS) and / or formula (7)
A cyclic 5,11,14,17-tetrakis (trimethylsilyl) octaphenyltetracyclo [7.3.3.3 3,7 ] octasilsesquioxane (DDT 8 OTMS) represented by 5).
本発明は、完全縮合型POSSの骨格の再配列により、環状四量体、不完全縮合POSS誘導体を得る新規な製造方法の提供にある。本発明の特徴は、水-アルコール溶媒及びアルカリの仕込みモル比、反応温度などを任意に変化させることで、前記一般式(2)の環状テトラシロキサン(環状四量体骨格)、一般式(3)の環状ヘプタシルセスキオキサン(T7骨格)及び一般式(4)の環状オクタシルセスキオキサン(DDT8骨格)の不完全縮合POSS誘導体を任意に得る新規な製造方法の提供にある。 The present invention is to provide a novel production method for obtaining a cyclic tetramer, an incompletely condensed POSS derivative by rearrangement of the skeleton of a fully condensed POSS. The feature of the present invention is that the cyclic molar ratio of the water-alcohol solvent and alkali, the reaction temperature, and the like are arbitrarily changed, so that the cyclic tetrasiloxane (cyclic tetramer skeleton) of the above general formula (2) It is to provide a novel production method for obtaining arbitrarily cyclic hepta silsesquioxane (T 7 backbone) and incomplete condensation POSS derivatives of cyclic octasilsesquioxane of general formula (4) (DDT 8 backbone) of).
本発明は、前述のとおり、一般式(1) As described above, the present invention relates to the general formula (1)
[式中、Phはフェニル基を表す。]
で示される完全縮合オクタフェニルオクタシルセスキオキサン(Ph−T8)を、水−アルコール溶媒中、アルカリの共存下、加水分解反応させ、必要により、次いで保護基で保護することを特徴とする一般式(2)
[Wherein Ph represents a phenyl group. ]
A fully condensed octaphenyl octasilsesquioxane (Ph-T 8 ) represented by the formula (1) is hydrolyzed in the presence of an alkali in a water-alcohol solvent, and then protected with a protecting group, if necessary. General formula (2)
[式中、R’はフェニル基を表し、R’’はナトリウム(Na)又はSi(R’’’)3を表し、R’’’は水素、炭素数1から4の脂肪族炭化水素基又は更に置換基を有することもあるフェニル基を表す。]
で示される環状テトラシロキサン、一般式(3)
[式中、R’はフェニル基を表し、R’’はナトリウム(Na)又はSi(R’’’)3を表し、R’’’は水素、炭素数1から4の脂肪族炭化水素基又は更に置換基を有することもあるフェニル基を表す。]
で示される環状ヘプタシルセスキオキサン及び/又は一般式(4)
[式中、R’はフェニル基を表し、R’’はナトリウム(Na)又はSi(R’’’)3を表し、R’’’は水素、炭素数1から4の脂肪族炭化水素基又は更に置換基を有することもあるフェニル基を表す。]
で示される環状オクタシルセスキオキサンの製造方法である。
中でも、本発明は、一般式(1)
[式中、Phはフェニル基を表す。]
で示される完全縮合オクタフェニルオクタシルセスキオキサン(Ph−T8)を、水−アルコール溶媒中、アルカリの共存下、加水分解反応させ、次いで保護基(クロロトリメチルシランなどのシランカップリング剤)で保護することを特徴とする一般式(5)
で示される環状1,3,5,7−テトラキス(トリメチルシリル)テトラフェニルテトラシロキサン(T4OTMS)、一般式(6)
[式中、R’はフェニル(Ph)を表す。]
で示される環状3,7,14−トリス(トリメチルシリル)ヘプタフェニルトリシクロ[7.3.3.15,11]ヘプタシルセスキオキサン(T7OTMS)及び/又は一般式(7)
で示される環状5,11,14,17−テトラキス(トリメチルシリル)オクタフェニルテトラシクロ[7.3.3.33,7]オクタシルセスキオキサン(DDT8OTMS)の製造方法である。
[Wherein R ′ represents a phenyl group, R ″ represents sodium (Na) or Si (R ′ ″) 3 , R ′ ″ represents hydrogen, and an aliphatic hydrocarbon group having 1 to 4 carbon atoms. Or it represents the phenyl group which may have a substituent further. ]
A cyclic tetrasiloxane represented by the general formula (3)
[Wherein R ′ represents a phenyl group, R ″ represents sodium (Na) or Si (R ′ ″) 3 , R ′ ″ represents hydrogen, and an aliphatic hydrocarbon group having 1 to 4 carbon atoms. Or it represents the phenyl group which may have a substituent further. ]
Cyclic heptasilsesquioxane and / or general formula (4)
[Wherein R ′ represents a phenyl group, R ″ represents sodium (Na) or Si (R ′ ″) 3 , R ′ ″ represents hydrogen, and an aliphatic hydrocarbon group having 1 to 4 carbon atoms. Or it represents the phenyl group which may have a substituent further. ]
It is a manufacturing method of cyclic octasilsesquioxane shown by these.
Among these, the present invention provides the general formula (1)
[Wherein Ph represents a phenyl group. ]
Is fully condensed octaphenyl octasilsesquioxane (Ph-T 8 ) in a water-alcohol solvent in the presence of an alkali, followed by a hydrolysis reaction, and then a protective group (a silane coupling agent such as chlorotrimethylsilane). General formula (5) characterized by protection with
Cyclic 1,3,5,7-tetrakis (trimethylsilyl) tetraphenyltetrasiloxane (T 4 OTMS) represented by the general formula (6)
[Wherein, R ′ represents phenyl (Ph). ]
In shown are annular 3,7,14- tris (trimethylsilyl) heptaphenyl tricyclo [7.3.3.1 5 and 11] hept silsesquioxane (T 7 OTMS) and / or formula (7)
In shown are annular 5,11,14,17- tetrakis (trimethylsilyl) octaphenyl tetracyclo [7.3.3.3 3, 7] is a manufacturing method of octasilsesquioxane (DDT 8 OTMS).
以下、本発明の加水分解反応機構の詳細について更に具体的に説明する。
水-アルコール中、水酸化ナトリウムによる完全縮合型オクタフェニルオクタシルセスキオキサン(Ph−T8)の加水分解では、反応温度と出発物質の比率に依存して環状四量体、DDT8、T7骨格を選択的に得ることができる。合成結果を表1に示す。
Hereinafter, the details of the hydrolysis reaction mechanism of the present invention will be described more specifically.
In the hydrolysis of fully condensed octaphenyl octasilsesquioxane (Ph-T 8 ) with sodium hydroxide in water-alcohol, depending on the reaction temperature and the ratio of starting materials, cyclic tetramer, DDT 8 , T 7 skeleton can be obtained selectively. The synthesis results are shown in Table 1.
a;Ph−T8/溶媒=1mmol/6mL
b;Ph−T8/溶媒=1mmol/10mL
a; Ph-T 8 / solvent = 1 mmol / 6 mL
b; Ph-T 8 / solvent = 1 mmol / 10 mL
室温下、40時間、2-プロパノール中、水と水酸化ナトリウム(Ph−T8:H2O:NaOH=1:2:4のモル比)でPh−T8を加水分解し、トリメチルクロロシランで処理すると、全てcis-体の環状四量体(T4OTMS)が主生成物として得られた(表1, No.1)。 Hydrolysis of Ph-T 8 with water and sodium hydroxide (Ph-T 8 : H 2 O: NaOH = 1: 2: 4 molar ratio) in 2-propanol at room temperature for 40 hours, followed by trimethylchlorosilane Upon treatment, a cis-form cyclic tetramer (T 4 OTMS) was obtained as the main product (Table 1, No. 1).
1−[ビス(トリメチルシロキシ)]フェニル−3,5,7−トリス(トリメチルシロキシ)−1,3,5,7−テトラフェニルシクロシロキサンは、Ph−T8の加水分解、続く室温下でのトリメチルシリル(TMS)基保護により得られた。この事実は、Ph−T8の橋かけ部分の開裂、及び環状部分の緩やかな開裂を示唆している。 1- [Bis (trimethylsiloxy)] phenyl-3,5,7-tris (trimethylsiloxy) -1,3,5,7-tetraphenylcyclosiloxane is obtained by hydrolysis of Ph-T 8 followed by room temperature. Obtained by protection of the trimethylsilyl (TMS) group. This fact suggests cleavage of the bridging portion of the Ph-T 8, and a gradual cleavage of the annular portion.
ダブルデッカー型POSSであるDDT8OTMSは、2−プロパノール中で還流、もしくは2-メチル−1−プロパノール中、90℃で、24時間加水分解を行うと高収率で得られる(表1、No.2と3)。 DDT 8 OTMS, which is a double-decker POSS, can be obtained in high yields by refluxing in 2-propanol or hydrolysis in 2-methyl-1-propanol at 90 ° C. for 24 hours (Table 1, No. .2 and 3).
出発物質のモル比(Ph−T8:H2O:NaOH)を1:2:4から1:1:2に変えると、3,7,14−トリス(トリメチルシリル)ヘプタフェニルトリシクロ「7.3.3.15,11」ヘプタシルセスキオキサン(T7OTMS)が主生成物として得られる(表1、No.4)。 When the molar ratio of the starting materials (Ph-T 8 : H 2 O: NaOH) was changed from 1: 2: 4 to 1: 1: 2, 3,7,14-tris (trimethylsilyl) heptaphenyltricyclo “7. 3.3.1 5,11 "Heptasilsesquioxane (T 7 OTMS) is obtained as the main product (Table 1, No. 4).
以下、本発明の加水分解反応の実際について更に具体的に説明する。 Hereinafter, the actual hydrolysis reaction of the present invention will be described more specifically.
本発明の製造方法に用いられる炭素数1から4の分枝されていてもよい脂肪族アルコールとしては、具体的には、エタノール、2−プロパノール、2-メチル−1−プロパノール、n−ブタノールもしくはSec−ブタノールなどが挙げられる。中でも、2−プロパノールもしくは2-メチル−1−プロパノールが好ましくは用いられる。 Specific examples of the aliphatic alcohol having 1 to 4 carbon atoms which may be used in the production method of the present invention include ethanol, 2-propanol, 2-methyl-1-propanol, n-butanol or Examples include Sec-butanol. Of these, 2-propanol or 2-methyl-1-propanol is preferably used.
本発明の製造方法に用いられるアルカリとしては、アルカリ金属水酸化物、アルカリ土類金属水酸化物、アルカリ金属炭酸塩、アルカリ土類金属炭酸塩、炭素数1から4のアルキル置換基をもつ四級アンモニウム塩の水酸化物、炭素数1から4のアルキル置換基をもつ四級アンモニウム塩のフッ素物から選択されるが、具体的には、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウム、炭酸カリウムなどが挙げられる。中でも、水酸化ナトリウムが好ましくは用いられる。 Examples of the alkali used in the production method of the present invention include alkali metal hydroxides, alkaline earth metal hydroxides, alkali metal carbonates, alkaline earth metal carbonates, and four alkyl substituents having 1 to 4 carbon atoms. Selected from hydroxides of quaternary ammonium salts and fluorides of quaternary ammonium salts having an alkyl substituent of 1 to 4 carbon atoms, specifically, sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate Etc. Of these, sodium hydroxide is preferably used.
本発明の製造方法において、反応温度は、室温から水−アルコール溶媒の還流温度の範囲内で選択される。 In the production method of the present invention, the reaction temperature is selected within the range of room temperature to the reflux temperature of the water-alcohol solvent.
本発明の製造方法において、目的物の取出し、分離方法は、晶析法又は濃縮乾固法による通常の方法によって行われる。 In the production method of the present invention, the object is taken out and separated by an ordinary method such as a crystallization method or a concentration to dryness method.
以下、実施例によって本発明の方法を更に具体的に説明する。 Hereinafter, the method of the present invention will be described more specifically with reference to examples.
実施例1
Ph−T8(4.14g,4mmol)と水酸化ナトリウム(0.64g,16mmol)の入っている100mLの二口フラスコを窒素置換した。次いで、2−プロパノール(24mL)と水(8mmol)を反応器に加え、室温下で40時間攪拌した。反応終了後、ろ過により白色固体を得、2−プロパノールで洗浄して、真空下、70℃で乾燥させた。生成物を同定しやすくするために、ONa基を以下の実験手順でトリメチルシリル基保護した。
Example 1
A 100 mL two-necked flask containing Ph-T 8 (4.14 g, 4 mmol) and sodium hydroxide (0.64 g, 16 mmol) was purged with nitrogen. Subsequently, 2-propanol (24 mL) and water (8 mmol) were added to the reactor and stirred at room temperature for 40 hours. After completion of the reaction, a white solid was obtained by filtration, washed with 2-propanol, and dried at 70 ° C. under vacuum. In order to facilitate the identification of the product, the ONa group was protected with a trimethylsilyl group by the following experimental procedure.
100mLの二口フラスコに上記生成物(1.20g)を加えて同様に窒素置換した。氷水浴下、テトラヒドロフラン(THF;10mL)、トリエチルアミン(1.8g,17.8mmol)、クロロトリメチルシラン(2.3g,21.2mmol)を反応器に加え、反応溶液を室温下で3時間攪拌し、氷水浴下で水(10mL)を反応器にゆっくり加えた。攪拌を止めて有機層を分離し、蒸留水を加えて洗浄して中性にし、ヘキサン(10mL)を有機層に加えた。有機溶媒や水に不溶固体が析出したが、これはケイ素核磁気共鳴測定(29Si−NMR;δ=78.31ppm)から未反応のPh−T8と同定した。 The above product (1.20 g) was added to a 100 mL two-necked flask and the atmosphere was replaced with nitrogen in the same manner. In an ice-water bath, tetrahydrofuran (THF; 10 mL), triethylamine (1.8 g, 17.8 mmol) and chlorotrimethylsilane (2.3 g, 21.2 mmol) were added to the reactor, and the reaction solution was stirred at room temperature for 3 hours. Water (10 mL) was slowly added to the reactor under an ice water bath. Stirring was stopped and the organic layer was separated, washed with distilled water to neutralize, and hexane (10 mL) was added to the organic layer. An insoluble solid precipitated in an organic solvent or water, and this was identified as unreacted Ph-T 8 from silicon nuclear magnetic resonance measurement ( 29 Si-NMR; δ = 78.31 ppm).
その結果、Ph−T8の転換率は77%であった。トリメチルシリル保護した生成物として、1,3,5,7−テトラ(トリメチルシロキシ)−1,3,5,7−テトラフェニルシクロシロキサン(T4OTMS)を分取サイズ排除クロマトグラフィー(SEC)により得た。全組成中のT4OTMSの重量比は50%であった。 As a result, the conversion of Ph-T 8 was 77%. 1,3,5,7-tetra (trimethylsiloxy) -1,3,5,7-tetraphenylcyclosiloxane (T 4 OTMS) was obtained by preparative size exclusion chromatography (SEC) as a trimethylsilyl protected product. It was. The weight ratio of T 4 OTMS in the total composition was 50%.
1−[ビス(トリメチルシロキシ)]フェニル−3,5,7−トリス(トリメチルシロキシ)−1,3,5,7−テトラフェニルシクロシロキサンをマトリックス支援レーザー脱離方式イオン化-飛行時間型質量分析装置(MALDI−TOF−MS)から得たスペクトルを図1に示す[MALDI−TOF−MS(m/z):1073.84[M+Na]+, calc.1073.26]。 1- [Bis (trimethylsiloxy)] phenyl-3,5,7-tris (trimethylsiloxy) -1,3,5,7-tetraphenylcyclosiloxane is matrix-assisted laser desorption ionization-time-of-flight mass spectrometer The spectrum obtained from (MALDI-TOF-MS) is shown in FIG. 1 [MALDI-TOF-MS (m / z): 1073.84 [M + Na] + , calc. 1073.26].
分取前のSECクロマトグラム、Mw/Mn=1940/1860(26.17%); 1090/1080(73.83%)を図2に示す。分取後のSECクロマトグラムは、Mw/Mn=1960/1050。 The SEC chromatogram before fractionation, Mw / Mn = 1940/1860 (26.17%); 1090/1080 (73.83%) is shown in FIG. The SEC chromatogram after fractionation is Mw / Mn = 1960/1050.
化合物同定データを以下に示す。
元素分析:C% 51.82(found),51.38(calc.); H% 6.53(found),6.71(calc.).
MALDI−TOF−MS(m/z): 863.94([M+Na]+, calc.863.20) .
29Si−NMR δ(ppm): 10.51(OSiMe3),−79.66(O3SiPh).
The compound identification data is shown below.
Elemental analysis: C% 51.82 (found), 51.38 (calc.); H% 6.53 (found), 6.71 (calc.).
MALDI-TOF-MS (m / z): 863.94 ([M + Na] + calc. 863.20).
29 Si-NMR δ (ppm): 10.51 (OSiMe 3 ), −79.66 (O 3 SiPh).
実施例2
還流下で24時間攪拌させる以外は、室温で反応させるのと同様の操作手順で行った。反応終了後、ろ過により白色固体を得、2−プロパノールで洗浄して、真空下、70℃で乾燥させた。得られた生成物は、5,11,14,17−テトラ(ソディオ)オクタフェニルテトラシクロ[7.3.3.33,7]オクタシルセスキオキサノレート(DDT8ONa)であった。収量:4.21g(収率91%)。生成物を同定しやすくするために、ONa基を以下の実験手順で、トリメチルシリル基保護した。100mLの二口フラスコに上記生成物(0.61g,0.53mmol)を加えて同様に窒素置換した。氷水浴下、THF(10mL)、トリエチルアミン(1.8g,17.8mmol)、クロロトリメチルシラン(2.3g,21.2mmol)を反応器に加えた。反応溶液を室温下で3時間攪拌し、氷水浴下で水(10mL)を反応器にゆっくり加えた。攪拌を止めて有機層を分離し、蒸留水を加えて洗浄して中性にし、ヘキサン(10mL)を有機層に加えた。有機層を無水硫酸ナトリウムで乾燥後、溶媒を留去して白色固体を得た。収量:0.52g(収率72%)。単結晶は、生成物を含むヘキサン溶液中で溶媒をゆっくり蒸発させることにより得、単結晶X−線回折により決定した(図3に示す)。生成物を元素分析、SEC、MALDI−TOF−MS、29Si−NMR、単結晶X−線回折により5,11,14,17−テトラキス(トリメチルシリル)オクタフェニルテトラシクロ[7.3.3.33,7]オクタシルセスキオキサン(DDT8OTMS)と同定した。
Example 2
The procedure was the same as the reaction at room temperature except that the mixture was stirred for 24 hours under reflux. After completion of the reaction, a white solid was obtained by filtration, washed with 2-propanol, and dried at 70 ° C. under vacuum. The resulting product was 5,11,14,17-tetra (sodio) octaphenyltetracyclo [7.3.3.3 3,7 ] octasilsesquioxanolate (DDT 8 ONa). Yield: 4.21 g (91% yield). To facilitate product identification, the ONa group was protected with a trimethylsilyl group by the following experimental procedure. The above product (0.61 g, 0.53 mmol) was added to a 100 mL two-necked flask, and the atmosphere was replaced with nitrogen in the same manner. Under an ice-water bath, THF (10 mL), triethylamine (1.8 g, 17.8 mmol), and chlorotrimethylsilane (2.3 g, 21.2 mmol) were added to the reactor. The reaction solution was stirred at room temperature for 3 hours, and water (10 mL) was slowly added to the reactor in an ice-water bath. Stirring was stopped and the organic layer was separated, washed with distilled water to neutralize, and hexane (10 mL) was added to the organic layer. The organic layer was dried over anhydrous sodium sulfate, and then the solvent was distilled off to obtain a white solid. Yield: 0.52 g (72% yield). Single crystals were obtained by slowly evaporating the solvent in a hexane solution containing the product and determined by single crystal X-ray diffraction (shown in FIG. 3). The product was analyzed by elemental analysis, SEC, MALDI-TOF-MS, 29 Si-NMR, single crystal X-ray diffraction, 5,11,14,17-tetrakis (trimethylsilyl) octaphenyltetracyclo [7.3.3.3. 3,7 ] octasilsesquioxane (DDT 8 OTMS).
化合物同定データを以下に示す。
元素分析:C% 53.92(found),53.06(calc.);H% 5.83 (found),5.64(calc.).
SEC:Mw/Mn=1240/1230.
MALDI−TOF−MS(m/z):1379.60([M+Na]+, calc.1379.24).
29Si−NMR δ(ppm): 10.51(OSiMe3);−76.10,−78.95(O3SiPh).
The compound identification data is shown below.
Elemental analysis: C% 53.92 (found), 53.06 (calc.); H% 5.83 (found), 5.64 (calc.).
SEC: Mw / Mn = 1240/1230.
MALDI-TOF-MS (m / z): 1379.60 ([M + Na] + , calc. 1379.24).
29 Si-NMR δ (ppm): 10.51 (OSiMe 3 ); −76.10, −78.95 (O 3 SiPh).
実施例3
溶媒に2−メチル−1−プロパノールを用い、他の条件は実施例2と同様にして90℃で攪拌して反応させると、DDT8OTMSが69%収率で得られた。
Example 3
When 2-methyl-1-propanol was used as a solvent and the reaction was stirred at 90 ° C. under the same conditions as in Example 2, DDT 8 OTMS was obtained in 69% yield.
実施例4
Ph−T8:H2O:NaOHのモル比を1:2:4から1:1:2に変え、Ph−T8/2−プロパノールを1mmol/6mLから1mmol/10mLに変え、他の条件は同様で反応させると、3,7,14−トリス(トリメチルシリル)ヘプタフェニルトリシクロ[7.3.3.35,11]ヘプタシルセスキオキサン(T7OTMS)が主生成物として44%収率で得られた。
Example 4
The molar ratio of Ph-T 8 : H 2 O: NaOH was changed from 1: 2: 4 to 1: 1: 2, Ph-T 8 / 2-propanol was changed from 1 mmol / 6 mL to 1 mmol / 10 mL, and other conditions Were reacted in the same manner, and 3,7,14-tris (trimethylsilyl) heptaphenyltricyclo [7.3.3.3 5,11 ] heptacilsesquioxane (T 7 OTMS) was 44% as the main product. Obtained in yield.
化合物同定データを以下に示す。
MALDI−TOF−MS (m/z): 1169.55 ([M+Na]+, calc.1169.18).
29Si−NMR δ (ppm): 10.54(OSiMe3);−77.62, −77.99,−78.26(O3SiPh).
The compound identification data is shown below.
MALDI-TOF-MS (m / z): 1169.55 ([M + Na] + calc. 1169.18).
29 Si-NMR δ (ppm): 10.54 (OSiMe 3 ); −77.62, −77.99, −78.26 (O 3 SiPh).
これらのPOSSは、各種レジスト及びパターン形成材料、酸素吸収剤及び酸素吸収樹脂組成物、プラズマディスプレイパネルなどの用途の合成素子として期待される。 These POSSs are expected as synthetic elements for applications such as various resists and pattern forming materials, oxygen absorbers and oxygen-absorbing resin compositions, and plasma display panels.
Claims (5)
[式中、Phはフェニル基を表す。]
で示される完全縮合オクタフェニルオクタシルセスキオキサン(Ph−T8)を、水−アルコール溶媒中、アルカリの共存下、加水分解反応させ、必要により、次いで保護基で保護することを特徴とする一般式(2)
[式中、R’はフェニル基を表し、R’’はナトリウム(Na)又はSi(R’’’)3を表し、R’’’は水素、炭素数1から4の脂肪族炭化水素基又は更に置換基を有することもあるフェニル基を表す。]
で示される環状テトラシロキサン、一般式(3)
[式中、R’はフェニル基を表し、R’’はナトリウム(Na)又はSi(R’’’)3を表し、R’’’は水素、炭素数1から4の脂肪族炭化水素基又は更に置換基を有することもあるフェニル基を表す。]
で示される環状ヘプタシルセスキオキサン及び/又は一般式(4)
[式中、R’はフェニル基を表し、R’’はナトリウム(Na)又はSi(R’’’)3を表し、R’’’は水素、炭素数1から4の脂肪族炭化水素基又は更に置換基を有することもあるフェニル基を表す。]
で示される環状オクタシルセスキオキサンの製造方法。 General formula (1)
[Wherein Ph represents a phenyl group. ]
A fully condensed octaphenyl octasilsesquioxane (Ph-T 8 ) represented by the formula (1) is hydrolyzed in the presence of an alkali in a water-alcohol solvent, and then protected with a protecting group as necessary General formula (2)
[Wherein R ′ represents a phenyl group, R ″ represents sodium (Na) or Si (R ′ ″) 3 , R ′ ″ represents hydrogen, and an aliphatic hydrocarbon group having 1 to 4 carbon atoms. Or it represents the phenyl group which may have a substituent further. ]
A cyclic tetrasiloxane represented by the general formula (3)
[Wherein R ′ represents a phenyl group, R ″ represents sodium (Na) or Si (R ′ ″) 3 , R ′ ″ represents hydrogen, and an aliphatic hydrocarbon group having 1 to 4 carbon atoms. Or it represents the phenyl group which may have a substituent further. ]
Cyclic heptasilsesquioxane and / or general formula (4)
[Wherein R ′ represents a phenyl group, R ″ represents sodium (Na) or Si (R ′ ″) 3 , R ′ ″ represents hydrogen, and an aliphatic hydrocarbon group having 1 to 4 carbon atoms. Or it represents the phenyl group which may have a substituent further. ]
The manufacturing method of cyclic octasilsesquioxane shown by these.
[式中、Phはフェニル基を表す。]
で示される完全縮合オクタフェニルオクタシルセスキオキサン(Ph−T8)を、水−アルコール溶媒中、アルカリの共存下、加水分解反応させ、次いで保護基(クロロトリメチルシランなどのシランカップリング剤)で保護することを特徴とする一般式(5)
で示される環状1,3,5,7−テトラキス(トリメチルシリル)テトラフェニルテトラシロキサン(T4OTMS)、一般式(6)
で示される環状3,7,14−トリス(トリメチルシリル)ヘプタフェニルトリシクロ[7.3.3.15,11]ヘプタシルセスキオキサン(T7OTMS)及び/又は一般式(7)
[式中、R’はフェニル(Ph)を表す。]
で示される環状5,11,14,17−テトラキス(トリメチルシリル)オクタフェニルテトラシクロ[7.3.3.33,7]オクタシルセスキオキサン(DDT8OTMS)の製造方法。
General formula (1)
[Wherein Ph represents a phenyl group. ]
Is fully condensed octaphenyl octasilsesquioxane (Ph-T 8 ) in a water-alcohol solvent in the presence of an alkali, followed by a hydrolysis reaction, and then a protective group (a silane coupling agent such as chlorotrimethylsilane). General formula (5) characterized by protection with
Cyclic 1,3,5,7-tetrakis (trimethylsilyl) tetraphenyltetrasiloxane (T 4 OTMS) represented by the general formula (6)
In shown are annular 3,7,14- tris (trimethylsilyl) heptaphenyl tricyclo [7.3.3.1 5 and 11] hept silsesquioxane (T 7 OTMS) and / or formula (7)
[Wherein, R ′ represents phenyl (Ph). ]
Method for producing in shown are annular 5,11,14,17- tetrakis (trimethylsilyl) octaphenyl tetracyclo [7.3.3.3 3, 7] octasilsesquioxane (DDT 8 OTMS).
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WO2011062033A1 (en) | 2009-11-18 | 2011-05-26 | セントラル硝子株式会社 | Preparation method for aromatic difluoroacetic acid ester |
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WO2011062033A1 (en) | 2009-11-18 | 2011-05-26 | セントラル硝子株式会社 | Preparation method for aromatic difluoroacetic acid ester |
US9048311B2 (en) | 2010-10-29 | 2015-06-02 | Tokyo Ohka Kogyo Co., Ltd. | Laminate and method for separating the same |
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