JPH10309773A - Photocatalytic sheet - Google Patents
Photocatalytic sheetInfo
- Publication number
- JPH10309773A JPH10309773A JP9135886A JP13588697A JPH10309773A JP H10309773 A JPH10309773 A JP H10309773A JP 9135886 A JP9135886 A JP 9135886A JP 13588697 A JP13588697 A JP 13588697A JP H10309773 A JPH10309773 A JP H10309773A
- Authority
- JP
- Japan
- Prior art keywords
- intermediate layer
- sheet
- photocatalyst
- layer
- fine particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000001699 photocatalysis Effects 0.000 title abstract description 12
- 239000010419 fine particle Substances 0.000 claims abstract description 45
- 229920000642 polymer Polymers 0.000 claims abstract description 27
- 230000035699 permeability Effects 0.000 claims abstract description 18
- 239000001301 oxygen Substances 0.000 claims abstract description 12
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 12
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000011941 photocatalyst Substances 0.000 claims description 53
- 238000000034 method Methods 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 claims description 7
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims description 7
- 229920002050 silicone resin Polymers 0.000 claims description 6
- 150000003377 silicon compounds Chemical class 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 4
- 238000007740 vapor deposition Methods 0.000 claims description 4
- 229910021645 metal ion Inorganic materials 0.000 claims description 3
- 229920005989 resin Polymers 0.000 claims description 2
- 239000011347 resin Substances 0.000 claims description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- 150000003609 titanium compounds Chemical class 0.000 claims 1
- 239000007789 gas Substances 0.000 abstract description 22
- 230000003373 anti-fouling effect Effects 0.000 abstract description 6
- 239000002245 particle Substances 0.000 abstract description 5
- 239000010409 thin film Substances 0.000 abstract description 4
- 230000001877 deodorizing effect Effects 0.000 abstract description 2
- 239000011148 porous material Substances 0.000 abstract description 2
- 241000233866 Fungi Species 0.000 abstract 2
- 230000000845 anti-microbial effect Effects 0.000 abstract 2
- 239000010410 layer Substances 0.000 description 46
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 20
- 230000000052 comparative effect Effects 0.000 description 14
- 239000000377 silicon dioxide Substances 0.000 description 10
- 239000010408 film Substances 0.000 description 7
- 230000000844 anti-bacterial effect Effects 0.000 description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 5
- 238000000354 decomposition reaction Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 5
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 4
- 238000000746 purification Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 description 3
- 238000011056 performance test Methods 0.000 description 3
- 230000001954 sterilising effect Effects 0.000 description 3
- 238000004659 sterilization and disinfection Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000002781 deodorant agent Substances 0.000 description 2
- 238000004332 deodorization Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000011859 microparticle Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229920000620 organic polymer Polymers 0.000 description 2
- 230000002186 photoactivation Effects 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920006267 polyester film Polymers 0.000 description 2
- 230000027756 respiratory electron transport chain Effects 0.000 description 2
- 238000003980 solgel method Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 241000894006 Bacteria Species 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 229910001413 alkali metal ion Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000000249 desinfective effect Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- -1 for example Substances 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 150000007529 inorganic bases Chemical class 0.000 description 1
- 229910052809 inorganic oxide Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 244000005700 microbiome Species 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920001709 polysilazane Polymers 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は抗菌、除菌、防汚、
防臭、浄化等に使用される光触媒シ−トに関するもので
ある。TECHNICAL FIELD The present invention relates to antibacterial, antibacterial, antifouling,
The present invention relates to a photocatalyst sheet used for deodorization and purification.
【０００２】[0002]
【従来の技術】酸化物半導体である酸化チタン等の光触
媒微粒子にバンドギャップ以上のエネルギ−を有する光
を照射すると、励起により電子及び正孔が発生され、表
面に近接した有機物や微生物が酸化により分解され、無
機酸化物においては、最終酸化物にまで酸化されるに至
る。そこで、この光触媒微粒子を支持基材の表面にシリ
カ等の無機質バインダ−で担持させた光触媒シ−トを所
定の場所に配設し、空気中に浮遊する細菌や臭気性ガス
を分解して抗菌、除菌、防汚、防臭、浄化等を行うこと
が提案されている。而るに、この光触媒シ−トの支持基
材に高分子シ−トを使用し得れば、高分子シ−トの可撓
性のために取扱が容易となり、コストの低廉化を図り
得、有利である。2. Description of the Related Art When photocatalytic fine particles such as titanium oxide, which is an oxide semiconductor, are irradiated with light having an energy higher than the band gap, electrons and holes are generated by excitation, and organic substances and microorganisms close to the surface are oxidized. It is decomposed and, in the case of inorganic oxides, is oxidized to the final oxide. Accordingly, a photocatalyst sheet in which the photocatalyst fine particles are supported on the surface of a supporting base material by an inorganic binder such as silica is disposed at a predetermined place, and bacteria and odorous gas floating in the air are decomposed to decompose antibacterial substances. It has been proposed to perform sterilization, antifouling, deodorization, purification, and the like. However, if a polymer sheet can be used as a supporting base material of the photocatalyst sheet, handling becomes easy due to the flexibility of the polymer sheet, and cost can be reduced. Is advantageous.
【０００３】[0003]
【発明が解決しようとする課題】この光触媒シ−トにお
いては、光触媒微粒子を支持シ−ト上に固定しているバ
インダ−（シリカを主成分とする無機質バインダ−）層
が多孔質化されて光触媒微粒子と空気との充分な接触が
図られている。しかしながら、本発明者等の検討結果に
よれば、光触媒シ−トの支持基材に高分子シ−トを使用
すると、無機質基材（ガラス、セラミックス、タイル、
金属、セメント等）を使用する場合に較べ、分解性能の
低下が避けられない。In this photocatalyst sheet, a binder (an inorganic binder mainly composed of silica) layer which fixes photocatalyst fine particles on a support sheet is made porous. Sufficient contact between the photocatalyst fine particles and air is achieved. However, according to the study results of the present inventors, when a polymer sheet is used as a support base material for a photocatalyst sheet, an inorganic base material (glass, ceramic, tile,
Degradation performance is inevitably reduced as compared with the case of using metal, cement, etc.).
【０００４】その原因は一概には論じ難いが、光触媒微
粒子に近接している高分子シ−ト部分が活性化された光
触媒微粒子のために分解されてガスを発生し、このガス
が上記多孔質の孔内にトラップされ、このトラップガス
によって外部の空気と光触媒微粒子との接触が妨げられ
ることが一原因であると推定される。[0004] Although the cause is generally difficult to discuss, the polymer sheet portion close to the photocatalyst fine particles is decomposed by the activated photocatalyst fine particles to generate gas, and this gas is generated by the above-mentioned porous material. It is presumed that one of the causes is that the trapped gas hinders contact between the external air and the photocatalyst fine particles.
【０００５】本発明の目的は、支持基材に高分子シ−ト
を用いるにもかかわらず、活性光触媒微粒子の分解作用
による抗菌、除菌、防汚、防臭、浄化等を効率よく行わ
せ得る光触媒シ−トを提供することにある。[0005] An object of the present invention is to make it possible to efficiently perform antibacterial, disinfecting, antifouling, deodorizing, purifying, etc. by the decomposing action of active photocatalyst fine particles, even though a polymer sheet is used as a supporting substrate. An object of the present invention is to provide a photocatalyst sheet.
【０００６】[0006]
【課題を解決するための手段】本発明に係る光触媒シ−
トは、酸素透過率が２０cc/m2・24hr以下の無機質中間層
を介して高分子シ−ト上に光触媒微粒子担持層を設けた
ことを特徴とする構成であり、無機質中間層の厚みは数
１０Åｍ〜数μｍにすることができる。この無機質中間
層には、珪素化合物層または金属イオンで不活性化され
た酸化チタンと珪素化合物との混合物から成る層を使用
でき、その形成には、１５０℃以下の温度のもとでの蒸
着法またはゾル−ゲル法を使用できる。The photocatalytic sheath according to the present invention is provided.
The structure is characterized in that a photocatalyst fine particle supporting layer is provided on a polymer sheet via an inorganic intermediate layer having an oxygen permeability of 20 cc / m 2 · 24 hr or less, and the thickness of the inorganic intermediate layer is It can be several tens m to several μm. As the inorganic intermediate layer, a silicon compound layer or a layer made of a mixture of titanium oxide and a silicon compound inactivated by metal ions can be used, and the layer is formed by vapor deposition at a temperature of 150 ° C. or less. A method or a sol-gel method can be used.
【０００７】[0007]
【発明の実施の形態】以下、図面を参照しつつ本発明の
実施の形態について説明する。図１は本発明に係る光触
媒シ−トを示している。図１において、１は高分子シ−
トであり、後述する無機質中間層の形成時や光触媒微粒
子担持層の形成時の加熱に耐え得る耐熱性を有するもの
であれば、適宜のものを使用でき、透明性のアクリル樹
脂、ポリエステル、ポリカ−ボネ−ト、塩化ビニル樹
脂、フッ素樹脂等が好適である。２は高分子シ−ト１の
片面に固着した酸素透過率（単位圧力差１パスカルのも
とでの、２４時間での単位面積１ｍ2当たりの透過酸素
量ｃｃ）が２０cc/m2・24hr以下の無機質中間層である。
３は無機質中間層２上に固着した光触媒微粒子担持層で
あり、光触媒微粒子を無機質バインダ−、例えば、シリ
カで無機質中間層に固定してあり、光触媒微粒子を可及
的に露出させるために、通常多孔質にされる。この光触
媒微粒子担持層３は、光触媒微粒子とシリカゾルとのア
ルコ−ル分散液を塗布し、この塗布層を加熱乾燥させる
ことにより形成できる。光触媒微粒子には、極めて優れ
た光触媒活性を呈するアナタ−ゼ型酸化チタンの微粒子
を使用することが好ましく、その粒径は、一般に０．０
０７〜０．５μｍである。光触媒微粒子の活性を高める
ために、低温焼成の場合は、アルカリ金属イオンを担持
して電子を分離する方法を採ることもできる。Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 shows a photocatalyst sheet according to the present invention. In FIG. 1, 1 is a polymer screen.
Any material can be used as long as it has heat resistance enough to withstand heating during the formation of the inorganic intermediate layer described later and the formation of the photocatalyst fine particle supporting layer, and a transparent acrylic resin, polyester, or polycarbonate can be used. -Bones, vinyl chloride resins, fluororesins and the like are preferred. 2 the polymer sheet - oxygen permeability which is fixed on one side of the sheet 1 (under the unit pressure difference 1 Pascal, permeate oxygen amount cc unit area 1 m 2 per 24 hours) is 20 cc / m 2 · 24 hr or These are the following inorganic intermediate layers.
Reference numeral 3 denotes a photocatalyst fine particle supporting layer fixed on the inorganic intermediate layer 2. The photocatalyst fine particles are fixed to the inorganic intermediate layer with an inorganic binder, for example, silica, and are usually used to expose the photocatalyst fine particles as much as possible. It is made porous. The photocatalyst fine particle supporting layer 3 can be formed by applying an alcohol dispersion of photocatalyst fine particles and silica sol, and heating and drying the applied layer. As the photocatalyst fine particles, it is preferable to use fine particles of an anatase type titanium oxide exhibiting extremely excellent photocatalytic activity.
07 to 0.5 μm. In order to enhance the activity of the photocatalyst fine particles, in the case of low-temperature baking, a method in which electrons are separated by supporting an alkali metal ion may be employed.
【０００８】上記無機質中間層２には、シリカが好適に
使用され、その形成には、真空蒸着やスパッタリング
等のＰＶＣ法によりＳｉＯ2膜を形成する方法（例え
ば、フレ−ク状の一酸化珪素を抵抗加熱や電子線照射等
によって加熱、昇華させて高分子シ−トに蒸着させ
る）、ＣＶＤ法により液体の有機シリコン化合物やシ
ランを原料としてＳｉＯ2膜を形成する方法、セラミ
ックス微粒子あるいはその前駆体粒子が分散している高
安定性の粒子コロイドのゾルにシリコ−ン樹脂やフッ素
樹脂等の難分解性の有機ポリマ−を混合したものを高分
子シ−ト上に塗布し、この塗布層を分散媒の除去により
ゲル化し、加熱して高分子シ−トに融着する方法（ゾル
−ゲル法）、光触媒微粒子とシリカゾルに、更に光触
媒微粒子の光活性化を防止するためのアルミ、鉄、亜鉛
等の金属イオンを加えたアルコ−ル分散液を高分子シ−
ト上に塗布し、この塗布層を加熱乾燥させる方法等を使
用できる。これらは、１５０℃以下の加熱温度でシリカ
またはシリカを主成分とする無機質中間層を高分子シ−
トに膜成することを可能にする方法であり、の方法に
おいて、シリコ−ン樹脂やフッ素樹脂等の難分解性有機
ポリマ−を混合する理由は、シリカゾルのみの場合の膜
成温度である３００℃を１５０℃以下に低下させるため
であり、シリコ−ン樹脂やフッ素樹脂に代えポリシラザ
ンを使用することもできる。The inorganic intermediate layer 2 is preferably made of silica, and is formed by a method of forming an SiO 2 film by a PVC method such as vacuum evaporation or sputtering (for example, flake-like silicon monoxide). Is heated and sublimated by resistance heating or electron beam irradiation to deposit the polymer sheet on a polymer sheet), a method of forming an SiO 2 film using a liquid organic silicon compound or silane as a raw material by a CVD method, ceramic fine particles or a precursor thereof. A mixture of a highly stable colloidal sol in which body particles are dispersed and a hardly decomposable organic polymer such as a silicone resin or a fluororesin is applied onto a polymer sheet. To form a gel by removing the dispersing medium, heating and fusing the polymer sheet to a polymer sheet (sol-gel method), in order to prevent photoactivation of the photocatalyst microparticles and silica sol, and further to photoactivation of the photocatalyst microparticles. Alcohol dispersion to which metal ions such as aluminum, iron and zinc are added
A method in which the composition is coated on a substrate and the coating layer is heated and dried can be used. In these methods, silica or an inorganic intermediate layer containing silica as a main component is polymer-sealed at a heating temperature of 150 ° C. or less.
The reason for mixing a hardly decomposable organic polymer such as a silicone resin or a fluororesin in the above method is that the film forming temperature is 300 when only silica sol is used. In order to lower the temperature to 150 ° C. or lower, polysilazane may be used instead of the silicone resin or the fluororesin.
【０００９】本発明に係る光触媒シ−トにおいて、無機
質中間層２の厚みは１０Åｍ〜数μｍの超薄膜に形成さ
れる。而して、光触媒微粒子担持層３の光触媒微粒子と
高分子シ−ト１の最短距離が１０Åｍオダ−の超近距離
になり、高分子シ−ト１が活性化光触媒微粒子により分
解ガス化される可能性があるが、例え、高分子シ−ト１
にガスが発生しても、無機質中間層２のガス透過率を酸
素透過率で２０cc/m2・24hr以下といった低ガス透過性に
してあるから、光触媒微粒子担持層３の多孔質内がその
分解ガスで充填されるようなことを排除でき、外部の空
気を光触媒微粒子に充分に近接・接触させ得て、活性化
光触媒微粒子による抗菌、除菌、防汚、防臭、浄化を効
率よく行わせ得る。In the photocatalyst sheet according to the present invention, the thickness of the inorganic intermediate layer 2 is formed as an ultrathin film of 10 μm to several μm. Thus, the shortest distance between the photocatalyst fine particles of the photocatalyst fine particle supporting layer 3 and the polymer sheet 1 becomes an extremely short distance of the order of 10 m, and the polymer sheet 1 is decomposed into gas by the activated photocatalyst fine particles. Although there is a possibility, for example, polymer sheet 1
Even if a gas is generated, the gas permeability of the inorganic intermediate layer 2 is set to a low gas permeability such as an oxygen permeability of 20 cc / m 2 · 24 hours or less. It is possible to eliminate the possibility of being filled with gas, to allow the outside air to sufficiently come into contact with and contact the photocatalyst fine particles, and to efficiently perform antibacterial, sterilization, antifouling, deodorant, and purification by the activated photocatalytic fine particles. .
【００１０】この効果は次の実施例と比較例との分解性
能試験結果の対比からも確認できる。This effect can also be confirmed from the comparison of the decomposition performance test results of the following examples and comparative examples.
〔実施例１〕厚さ５０μｍのポリエステルフィルムに、
シリコ−ン樹脂を混合したシリカゾルを乾燥後の厚みで
０．５μｍになるようにコ−ティングし、１４０℃で５
分間加熱してシリカを主成分とした中間層を形成した。
この中間層の酸素透過率は２０cc/m2・24hrであった。こ
の無機質中間層上に、アナタ−ゼ型酸化チタン微粒子と
シリカゾルとを重量比で８０：２０で含有する固形分濃
度５％のアルコ−ル分散液を乾燥後厚みが０．５μｍに
なるようにコ−ティングし、１４０℃×５分で加熱し光
触媒微粒子担持層を形成して光触媒シ−トを得た。 〔比較例１〕ポリエステルフィルムに無機質中間層を設
けることなく、直接光触媒微粒子担持層を形成した以
外、実施例１に同じとした。 〔比較例２〕実施例１の中間層に対し、シリコ−ン樹脂
とシリカゾルとの配合割合を変えて中間層の酸素透過率
を３０cc/m2・24hrとした以外、実施例１に同じとした。[Example 1] To a polyester film having a thickness of 50 µm,
A silica sol mixed with a silicone resin is coated so as to have a thickness of 0.5 μm after drying,
After heating for an minute, an intermediate layer containing silica as a main component was formed.
The oxygen permeability of this intermediate layer was 20 cc / m 2 · 24 hr. On this inorganic intermediate layer, an alcohol dispersion having a solid content of 5% containing anatase-type titanium oxide fine particles and silica sol at a weight ratio of 80:20 was dried so that the thickness became 0.5 μm. It was coated and heated at 140 ° C. for 5 minutes to form a photocatalyst fine particle supporting layer to obtain a photocatalyst sheet. Comparative Example 1 The same operation as in Example 1 was performed except that the photocatalyst fine particle supporting layer was directly formed without providing the inorganic intermediate layer on the polyester film. Comparative Example 2 Same as Example 1 except that the oxygen permeability of the intermediate layer was changed to 30 cc / m 2 · 24 hr by changing the mixing ratio of the silicone resin and silica sol to the intermediate layer of Example 1. did.
【００１１】これらの実施例品及び比較例品について、
市販の１５Ｗのブラックライトをセットした内容積４リ
ットルの密閉容器内に試料（寸法は５cm×５cm）を光触
媒微粒子担持層をブラックライトに向けて配置し、悪臭
物質としてアセトアルデヒド１００ｐｐｍを注入したの
ち、ブラックライトを点灯して１ｍＷ／cm2の紫外線を
照射し、６０分後、容器内のアセトアルデヒドの濃度を
ガスクロマトグラフで測定したところ、実施例では６ｐ
ｐｍに、比較例１では２０ｐｐｍに、比較例２では１２
ｐｐｍに減少していた。[0011] For these examples and comparative examples,
A sample (dimensions: 5 cm × 5 cm) was placed in a closed container having a capacity of 4 liters containing a commercially available 15 W black light with the photocatalyst fine particle supporting layer facing the black light, and 100 ppm of acetaldehyde was injected as a malodorous substance. The black light was turned on to irradiate ultraviolet rays of 1 mW / cm 2 , and after 60 minutes, the concentration of acetaldehyde in the container was measured by gas chromatography.
pm, 20 ppm in Comparative Example 1, and 12 ppm in Comparative Example 2.
ppm.
【００１２】比較例１の分解性能が実施例１に較べて低
い理由は、ポリエステルの高分子シ−トがシリカを主成
分とする中間層に較べ、活性光触媒微粒子によって分解
され易く、その分解ガスが光触媒微粒子とアルデヒドガ
スとの接触を阻害するためであると推定される。また、
比較例２の分解性能が実施例１よりも低い理由は、比較
例２の中間層のガス透過性が実施例１に較べて高く、何
らかの原因で高分子シ−トに発生したガスのかなりの量
が中間層を透過して光触媒微粒子担持層に至るためと推
定される。The reason why the decomposition performance of Comparative Example 1 is lower than that of Example 1 is that the polyester polymer sheet is more easily decomposed by the active photocatalyst fine particles than the intermediate layer mainly composed of silica, Is presumed to be the reason for inhibiting the contact between the photocatalyst fine particles and the aldehyde gas. Also,
The reason why the decomposition performance of Comparative Example 2 is lower than that of Example 1 is that the gas permeability of the intermediate layer of Comparative Example 2 is higher than that of Example 1, and the considerable amount of gas generated in the polymer sheet for some reason. It is presumed that the amount passes through the intermediate layer to reach the photocatalyst fine particle supporting layer.
【００１３】上記無機質中間層の厚みが超薄厚になる
と、光触媒微粒子担持層の活性化光触媒微粒子の高分子
シ−トへの電子授受がこの超薄膜を通して生じる可能性
のあること（従って、活性化光触媒粒子の作用で高分子
シ−トに分解ガスが発生する可能性のあること）は次の
実施例２と比較例３との分解性能試験結果の対比からも
推定できる。 〔実施例２〕中間層をシリコンモノオキサイド（ＳｉＯ
ｘ）の蒸着による厚み７００Åｍのシリカ膜で形成した
以外、実施例１に同じとした。この中間層の酸素透過率
は３cc/m2・24hrであった。 〔比較例３〕中間層をシリコンモノオキサイド（ＳｉＯ
ｘ）の蒸着による厚み７０Åｍのシリカ膜で形成した以
外、実施例１に同じとした。この中間層の酸素透過率は
３０cc/m2・24hrであった。この実施例及び比較例３につ
いて、上記と同様、アルデヒド１００ｐｐｍを悪臭物質
とする６０分の分解性能試験を行ったところ、実施例２
ではアルデヒドが４ｐｐｍにまで低下していたが、比較
例３では１５ｐｐｍであった。When the thickness of the inorganic intermediate layer becomes extremely thin, the electron transfer of the activated photocatalyst fine particles of the photocatalyst fine particle supporting layer to the polymer sheet may occur through the ultra thin film (accordingly, the activity of the photocatalyst fine particle supporting layer may be reduced). The possibility that a decomposed gas is generated in the polymer sheet by the action of the photocatalyst particles) can also be estimated from the comparison of the decomposition performance test results of Example 2 and Comparative Example 3. Example 2 The intermediate layer was made of silicon monooxide (SiO 2).
Example 1 was the same as Example 1 except that a silica film having a thickness of 700 μm was formed by the vapor deposition of x). The oxygen permeability of this intermediate layer was 3 cc / m 2 · 24 hr. [Comparative Example 3] The intermediate layer was formed of silicon monooxide (SiO 2).
Example 1 was the same as Example 1 except that a silica film having a thickness of 70 μm was formed by the vapor deposition of x). The oxygen permeability of this intermediate layer was 30 cc / m 2 · 24 hr. For this Example and Comparative Example 3, a decomposition performance test was conducted for 60 minutes using 100 ppm of aldehyde as a malodorous substance.
Although the aldehyde had decreased to 4 ppm in Comparative Example 3, it was 15 ppm in Comparative Example 3.
【００１４】[0014]
【発明の効果】本発明に係る光触媒シ−トにおいては、
無機質中間層のガス透過率を酸素透過率で２０cc/m2・24
hrといった低ガス透過性としてあるため、高分子シ−ト
にガスが発生しても光触媒微粒子担持層への移行をよく
防止して光触媒微粒子と外部空気との接触を充分に行わ
せて活性化光触媒微粒子の分解作用を効率よく営まし得
る。従って、高分子シ−トにガスが発生しても、例え
ば、無機質中間層にシリコンモノオキサイドの蒸着膜の
ように超薄膜を使用し、その超薄膜を介して活性化光触
媒微粒子と高分子シ−トの電子授受が行われるようなこ
とがあっても、そのガス発生に影響されることなく、光
触媒微粒子の活性化による効率のよい抗菌、除菌、防
汚、防臭、浄化等を保証できる。According to the photocatalyst sheet of the present invention,
20cc gas permeability of the inorganic intermediate layer in oxygen permeability / m 2 · 24
Since it has low gas permeability such as hr, even if gas is generated in the polymer sheet, migration to the photocatalyst fine particle supporting layer is well prevented and sufficient activation of the photocatalyst fine particles and external air is achieved. The photocatalytic fine particles can be efficiently decomposed. Therefore, even if a gas is generated in the polymer sheet, for example, an ultra-thin film such as a silicon monooxide vapor-deposited film is used for the inorganic intermediate layer, and the activated photocatalyst fine particles and the polymer sheet are interposed through the ultra-thin film. -Even if electron transfer is performed, efficient antibacterial, sterilization, antifouling, deodorant, purification, etc. can be guaranteed by activating the photocatalytic fine particles without being affected by gas generation. .
【図１】本発明に係る光触媒シ−トを示す図面である。FIG. 1 is a drawing showing a photocatalyst sheet according to the present invention.
【符号の説明】 １ 高分子シ−ト ２ 無機質中間層 ３ 光触媒微粒子担持層[Description of Signs] 1 Polymer sheet 2 Inorganic intermediate layer 3 Photocatalyst fine particle supporting layer
Claims (5)
中間層を介して高分子シ−ト上に光触媒微粒子担持層を
設けたことを特徴とする光触媒シ−ト。1. A photocatalyst sheet comprising a photocatalyst fine particle supporting layer provided on a polymer sheet via an inorganic intermediate layer having an oxygen permeability of 20 cc / m 2 · 24 hours or less.
である請求項１記載の光触媒シ−ト。2. The inorganic intermediate layer has a thickness of several tens of .mu.m to several .mu.m.
The photocatalyst sheet according to claim 1, wherein
ンで不活性化された酸化チタンと珪素化合物との混合物
から成る請求項１または２記載の光触媒シ−ト。3. The photocatalyst sheet according to claim 1, wherein the inorganic intermediate layer is made of a mixture of a silicon compound or a titanium compound inactivated with a metal ion and a silicon compound.
ッ素樹脂を混合したシリカゾルの１５０℃以下での塗布
・加熱により形成されている請求項１または２記載の光
触媒シ−ト。4. The photocatalyst sheet according to claim 1, wherein the inorganic intermediate layer is formed by applying and heating a silica sol mixed with a silicone resin or a fluorine resin at 150 ° C. or less.
る請求項１乃至３何れか記載の光触媒シ−ト。5. The photocatalyst sheet according to claim 1, wherein the inorganic intermediate layer is formed by a vapor deposition method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9135886A JPH10309773A (en) | 1997-05-09 | 1997-05-09 | Photocatalytic sheet |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9135886A JPH10309773A (en) | 1997-05-09 | 1997-05-09 | Photocatalytic sheet |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH10309773A true JPH10309773A (en) | 1998-11-24 |
Family
ID=15162095
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9135886A Pending JPH10309773A (en) | 1997-05-09 | 1997-05-09 | Photocatalytic sheet |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH10309773A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101190955B1 (en) | 2008-06-20 | 2012-10-12 | 주식회사 엘지화학 | Contamination-proof film and method for preparing the same |
-
1997
- 1997-05-09 JP JP9135886A patent/JPH10309773A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101190955B1 (en) | 2008-06-20 | 2012-10-12 | 주식회사 엘지화학 | Contamination-proof film and method for preparing the same |
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