JPH10307406A - Chemical treatment equipment - Google Patents
Chemical treatment equipmentInfo
- Publication number
- JPH10307406A JPH10307406A JP11825497A JP11825497A JPH10307406A JP H10307406 A JPH10307406 A JP H10307406A JP 11825497 A JP11825497 A JP 11825497A JP 11825497 A JP11825497 A JP 11825497A JP H10307406 A JPH10307406 A JP H10307406A
- Authority
- JP
- Japan
- Prior art keywords
- brush
- substrate
- tank
- chemical
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000126 substance Substances 0.000 title claims abstract description 20
- 239000000758 substrate Substances 0.000 claims abstract description 50
- 230000001680 brushing effect Effects 0.000 claims abstract description 4
- 238000012545 processing Methods 0.000 claims description 33
- 238000004140 cleaning Methods 0.000 claims description 12
- 238000012993 chemical processing Methods 0.000 claims description 10
- 238000002513 implantation Methods 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 abstract description 8
- 238000000576 coating method Methods 0.000 abstract description 8
- 239000000049 pigment Substances 0.000 abstract description 6
- 238000000034 method Methods 0.000 description 30
- 238000011161 development Methods 0.000 description 13
- 239000007788 liquid Substances 0.000 description 12
- 239000000243 solution Substances 0.000 description 11
- 238000012546 transfer Methods 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 239000011521 glass Substances 0.000 description 5
- 239000003513 alkali Substances 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000012466 permeate Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- 241000694440 Colpidium aqueous Species 0.000 description 1
- 241001465754 Metazoa Species 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 229920000305 Nylon 6,10 Polymers 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical class [H]C([H])([H])C(*)=O 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000002657 fibrous material Substances 0.000 description 1
- 235000012907 honey Nutrition 0.000 description 1
- 239000002563 ionic surfactant Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920005575 poly(amic acid) Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 239000012209 synthetic fiber Substances 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Landscapes
- Optical Filters (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Cleaning In General (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、特に液晶ディスプ
レイ用カラーフィルタの製造工程などに用いると好適な
薬液処理装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a chemical processing apparatus suitable for use in, for example, a process of manufacturing a color filter for a liquid crystal display.
【０００２】[0002]
【従来の技術】カラーフィルターの製造プロセスでは、
微細加工を行うため、基板の上に感光性のレジストを塗
布、露光し、現像を行うフォトリソグラフィー法が主流
を占めている。フォトリソグラフィー法では、洗浄工
程、現像工程、剥離工程といった薬液を使用する工程が
多く、薬液の種類や工程に応じてスピン方式、シャワー
方式、ディップ方式など様々な方式が選択されている。2. Description of the Related Art In a color filter manufacturing process,
In order to perform fine processing, a photolithography method in which a photosensitive resist is coated on a substrate, exposed to light, and developed is predominant. In the photolithography method, there are many steps using a chemical such as a cleaning step, a developing step, and a peeling step, and various methods such as a spin method, a shower method, and a dip method are selected according to the type and step of the chemical solution.
【０００３】特開平５−１１９４８２号公報、特開平８
−４４０７５号公報ではスピン方式を用いた現像方法が
提案されている。スピン方式とは、基板を回転させてそ
の中央部に処理液を滴下し、処理液を放射状に広げて基
板全体に処理液を浸透させる方法である。[0003] JP-A-5-119482, JP-A-Hei-8
Japanese Patent Application Laid-Open No. 44075/1999 proposes a developing method using a spin method. The spin method is a method in which a substrate is rotated, a processing liquid is dropped at a central portion thereof, the processing liquid is radially spread, and the processing liquid permeates the entire substrate.
【０００４】シャワー方式とは、処理液を線状に吐出さ
せる複数のノズルを用いて、処理液を基板全体に塗布し
て浸透させる方法である。また、ディップ方式とは、処
理液を槽に溜めて、基板を槽内に入れることで基板全体
に処理液を浸透させる方法である。The shower system is a method in which a plurality of nozzles for discharging a treatment liquid in a linear manner are used to apply and permeate the treatment liquid over the entire substrate. The dip method is a method in which a processing liquid is stored in a tank and the substrate is put in the tank so that the processing liquid permeates the entire substrate.
【０００５】[0005]
【発明が解決しようとする課題】しかしながら、従来の
方法では以下に示すような問題があった。However, the conventional method has the following problems.
【０００６】例としてカラーフィルタの現像工程を挙げ
ると、顔料を含む現像性塗膜を現像した時に、完全に現
像性塗膜を現像することができず、現像残渣としてガラ
ス基板上に残っていた。そのため、後工程のＩＴＯ成膜
後に、顔料残渣と共にＩＴＯが基板から剥離するという
品質上のトラブルが発生していた。As an example, when a developing process of a color filter is taken up, when a developable coating film containing a pigment is developed, the developable coating film cannot be completely developed and remains on a glass substrate as a development residue. . Therefore, after the ITO film is formed in a later step, a quality problem occurs in that the ITO is peeled off from the substrate together with the pigment residue.
【０００７】また洗浄工程では、基板の洗浄が不十分と
なり、基板上にパーティクル・油脂等が残存するため、
塗膜形成時などの後処理工程で不良品を発生させる原因
となっていた。In the cleaning step, the cleaning of the substrate becomes insufficient, and particles, oils and the like remain on the substrate.
This has caused defective products in post-processing steps such as the formation of a coating film.
【０００８】本発明はかかる従来技術の欠点を改良し、
均一に薬液の処理を可能とし、洗浄あるいは現像残渣等
の除去を効率よく行うことができる薬液処理装置を提供
することを目的とする。[0008] The present invention ameliorates the disadvantages of the prior art,
An object of the present invention is to provide a chemical processing apparatus capable of uniformly processing a chemical solution and efficiently performing cleaning or removal of development residues and the like.
【０００９】[0009]
（１）薬液処理を行う第１の処理槽と、第１の処理槽で
用いた薬液を除去する第２の処理槽からなり、基板を前
記第１の処理槽と第２の処理槽に連続的に搬送する薬液
処理装置において、第１の処理槽および／または第２の
処理槽に前記基板の表面をブラッシングするブラシを具
備することを特徴とする薬液処理装置。 （２）ブラシに用いられる毛の直径が、４０〜１５０μ
ｍであることを特徴とする前記（１）に記載の薬液処理
装置。(1) Consisting of a first processing tank for performing chemical processing and a second processing tank for removing the chemical used in the first processing tank, and the substrate is continuously connected to the first processing tank and the second processing tank. A chemical treatment apparatus, comprising: a first treatment tank and / or a second treatment tank; and a brush for brushing a surface of the substrate. (2) The diameter of the bristles used for the brush is 40 to 150 μm
m, the chemical liquid treatment apparatus according to the above (1).
【００１０】（３）ブラシの植毛密度が、２００〜３０
００本／ｃｍ2 であることを特徴とする前記（１）また
は（２）に記載の薬液処理装置。(3) The flocking density of the brush is 200 to 30
The chemical processing apparatus according to the above (1) or (2), wherein the number is 00 / cm 2 .
【００１１】（４）ブラシが搬送方向に対して交差方向
に揺動するものであることを特徴とする前記（１）〜
（３）のいずれかに記載の薬液処理装置 （５）洗浄装置であることを特徴とする前記（１）〜
（４）のいずれかに記載の薬液処理装置。(4) The brush according to the above (1), wherein the brush swings in a direction crossing the transport direction.
(3) The chemical treatment device according to any one of (3) to (5), which is a cleaning device.
(4) The chemical solution treatment device according to any one of (4) and (4).
【００１２】（６）現像装置であることを特徴とする前
記（１）〜（４）のいずれかに記載の薬液処理装置。(6) The chemical processing apparatus according to any one of (1) to (4), which is a developing apparatus.
【００１３】[0013]
【発明の実施の形態】次に本発明の好ましい実施の形態
について説明する。Next, a preferred embodiment of the present invention will be described.
【００１４】本発明による装置は、処理基板の搬送を枚
葉で連続的に行うことにより大量処理を可能にしてい
る。基板の搬送方法としては、搬送ローラー、移載機、
搬送アーム、吸着テーブルなどがあり、搬送ローラーに
よる搬送が好適に用いられるが、特に限定されるもので
はない。The apparatus according to the present invention makes it possible to carry out a large amount of processing by continuously transporting the processing substrates one by one. The transfer method of the substrate includes a transfer roller, a transfer machine,
There are a transfer arm, a suction table, and the like, and transfer by a transfer roller is preferably used, but there is no particular limitation.
【００１５】基板の処理を行う処理方法として、スピン
方式、シャワー方式、ディップ方式等様々な方法が選択
されるが、基板の形状や搬送方法によって適宜選択され
る。また、第１と第２の処理槽間で異なる方式を組み合
わせてもよい。Various methods such as a spin method, a shower method, and a dip method are selected as a processing method for processing the substrate, and are appropriately selected depending on the shape of the substrate and the transfer method. Further, different methods may be combined between the first and second processing tanks.
【００１６】本発明に使用するブラシはロールブラシ、
ディスクブラシ等があり、用途に応じて適宜選択され
る。The brush used in the present invention is a roll brush,
There are disk brushes and the like, which are appropriately selected according to the application.
【００１７】本発明に使用するブラシの材質は、ナイロ
ン、ＰＥＴ、アクリル、ＰＶＡ、ＰＶＣなどの合成繊維
や、植物、動物由来の高分子などが好適に用いられる。As the material of the brush used in the present invention, synthetic fibers such as nylon, PET, acrylic, PVA and PVC, and polymers derived from plants and animals are preferably used.
【００１８】ブラシに用いられる毛の直径は、４０〜１
５０μｍが好ましい。特に好ましくは、６０〜１２０μ
ｍである。ブラシの毛の直径が４０μｍ以下ではブラシ
の強度が落ちるために、顔料残渣を十分に洗浄できな
い。また、１５０μｍ以上では、ブラシの強度が強すぎ
るために、現像性塗膜にキズおよびはがれが発生し、製
品品質上問題がある。The diameter of the bristles used for the brush is 40 to 1
50 μm is preferred. Particularly preferably, 60 to 120 μm
m. If the diameter of the bristles of the brush is less than 40 μm, the strength of the brush is reduced, so that the pigment residue cannot be sufficiently washed. On the other hand, if the thickness is 150 μm or more, the strength of the brush is too strong, so that the developable coating film is scratched and peeled off, which causes a problem in product quality.
【００１９】ブラシの植毛密度は２００〜３０００本／
ｃｍ2 が好ましい。より好ましくは１０００〜２５００
本／ｃｍ2 である。さらに好ましくは２０００〜２４０
０本／ｃｍ2 である。また、ブラシの植毛状態について
は、放射洗浄タイプ、チャンネル状タイプ、らせん状タ
イプ、密巻状タイプ等があるが、ブラシの植毛密度の関
係から、密巻状タイプが好適に用いられる。The flocking density of the brush is 200-3000 brushes /
cm 2 is preferred. More preferably 1000 to 2500
Book / cm 2 . More preferably 2000 to 240
0 / cm 2 . As for the brush implantation state, there are a radiation cleaning type, a channel type, a spiral type, a close winding type, and the like, and the close winding type is preferably used in view of the brush implantation density.
【００２０】ブラシの毛の長さは、基板表面に傷を付け
ない程度の弾力性をもつようにするため、５〜３０ｍｍ
であることが好ましいが、ブラシの材質、線径に応じて
適宜選択すればよい。The length of the bristle of the brush is 5 to 30 mm in order to have elasticity enough not to damage the substrate surface.
However, it may be appropriately selected according to the brush material and wire diameter.
【００２１】ブラシの配置は、千鳥配列、対向配列等が
あるが、対向配列が好適に用いられる。The arrangement of the brushes includes a staggered arrangement and an opposing arrangement, but the opposing arrangement is preferably used.
【００２２】ブラシの設置本数は基板のパスラインに対
して上下に一対または複数対設置することが好ましい
が、上のみに一個または複数個設置してもよい。The number of brushes to be installed is preferably one or more pairs above and below the path line of the substrate, but one or more brushes may be provided only on the upper side.
【００２３】ブラシを揺動させる方向については、搬送
方向に対して交わる方向であればよいが、搬送方向に対
して直行方向に、すなわちロールの軸方向に揺動させる
方が好ましい。ブラシの揺動ストロークは、５〜１００
ｍｍが好ましい。より好ましくは１５〜３０ｍｍであ
る。The direction of swinging the brush may be any direction that intersects the conveying direction, but it is preferable to swing the brush in the direction perpendicular to the conveying direction, that is, in the axial direction of the roll. The swinging stroke of the brush is 5 to 100
mm is preferred. More preferably, it is 15 to 30 mm.
【００２４】ブラシの揺動速度は、ブラシの数、ブラシ
の間隔、ブラシの揺動方法、基板の搬送速度に左右され
るため適宜選択される。好ましくは１０〜５００往復／
分であるが、さらに好ましくは４０〜３００往復／分で
ある。ブラシの揺動速度を５００往復／分以上にする
と、現像性塗膜表面の傷、はがれなどの品質上の欠点が
発生するようになってくる。The swing speed of the brush is appropriately selected because it depends on the number of brushes, the interval between the brushes, the brush swing method, and the substrate transfer speed. Preferably 10-500 round trips /
Min, and more preferably 40 to 300 reciprocations / min. When the swinging speed of the brush is 500 reciprocations / minute or more, defects such as scratches and peeling on the surface of the developable coating film occur.
【００２５】ブラシの揺動方法としては、カムとシャフ
ト、歯車、モーターとボールネジ、エアーシリンダー等
を用いてブラシを揺動させる方法があるが、装置の構
成、ブラシの揺動速度などによって、適宜選択される。As a method of swinging the brush, there is a method of swinging the brush using a cam and a shaft, a gear, a motor and a ball screw, an air cylinder, and the like. Selected.
【００２６】また、ブラシの揺動はブラシの揺動速度、
基板の搬送速度、搬送方法などによって、ブラシの揺動
方法を変えるため、必ずしもすべてのブラシを同調操作
させてもさせなくてもよい。The swing of the brush is determined by the swing speed of the brush,
Since the method of swinging the brush is changed depending on the transfer speed, transfer method, and the like of the substrate, not all the brushes need to be synchronized.
【００２７】本発明に用いるブラシは、薬液処理を行う
第１の槽と薬液の除去を行う第２の槽のいずれに設置し
てもよいし、双方に設置してもよい。洗浄装置の場合、
基板上の異物の除去効果を高めるために、第１の槽にブ
ラシを設置することが多い。現像装置の場合は、現像液
を用いた第１の処理槽にブラシを設置すると、現像ムラ
を引き起こすことがあるので第２の槽にブラシを設置す
ることが多い。また、第２の槽にブラシを用いることで
現像残渣を除去することができる。The brush used in the present invention may be installed in either the first tank for performing the chemical treatment or the second tank for removing the chemical, or may be installed in both. For cleaning equipment,
In order to enhance the effect of removing foreign matter on the substrate, a brush is often installed in the first tank. In the case of a developing device, if a brush is installed in a first processing tank using a developing solution, development unevenness may be caused. Therefore, a brush is often installed in a second tank. The development residue can be removed by using a brush for the second tank.
【００２８】また、ブラシの材質は上記記載の繊維状の
もの以外にポリビニールアセタール等の多孔質のスポン
ジなどでもよい。The material of the brush may be a porous sponge such as polyvinyl acetal, in addition to the fibrous material described above.
【００２９】本装置において使用する第１の槽で使用す
る処理液は、例えば洗浄装置の場合、非イオン性あるい
はイオン性の界面活性剤、純水、アルカリ水溶液、オゾ
ン水、イオン水などの機能水などが好適に用いられる。
また、現像装置の場合、ＮａＯＨ、ＫＯＨ等の無機アル
カリ水溶液や、テトラメチルアンモニウムヒドロキシド
のような有機アルカリ水溶液などのアルカリ現像液が使
用するが、特に限定されない。The treatment liquid used in the first tank used in the present apparatus is, for example, in the case of a washing apparatus, a nonionic or ionic surfactant, pure water, an alkaline aqueous solution, ozone water, ionized water, or the like. Water and the like are preferably used.
In the case of a developing device, an alkali developing solution such as an aqueous solution of an inorganic alkali such as NaOH or KOH or an aqueous solution of an organic alkali such as tetramethylammonium hydroxide is used, but is not particularly limited.
【００３０】第２の処理槽に使用する薬液は、第１の処
理槽で用いた処理液を除去することを目的とするため、
通常純水を用いることが多い。The chemical used in the second processing tank is intended to remove the processing liquid used in the first processing tank.
Usually, pure water is often used.
【００３１】本装置において使用する基板は、石英ガラ
ス、無アルカリガラス、ソーダガラスなどのガラス基板
や、有機プラスチックのフィルムまたはシートが好適に
用いられる。As the substrate used in the present apparatus, a glass substrate such as quartz glass, non-alkali glass, soda glass or the like, or an organic plastic film or sheet is suitably used.
【００３２】[0032]
【実施例】以下に、本発明の装置を用いた現像装置に関
する実施例を述べるが、用いた実施例によって本発明の
効力はなんら制限されるものではない。EXAMPLES Examples of the developing apparatus using the apparatus of the present invention will be described below, but the effects of the present invention are not limited by the used examples.
【００３３】図１は本発明の実施例の１つで、カラーフ
ィルタの現像装置の構成図を示すものであり、図２は図
１の上面図である。また、図３は本発明に用いるブラシ
の一例を示す概略図である。FIG. 1 shows one embodiment of the present invention and shows a configuration diagram of a developing device for a color filter. FIG. 2 is a top view of FIG. FIG. 3 is a schematic view showing an example of a brush used in the present invention.
【００３４】図において、１は現像性塗膜を現像する第
１の槽であり、２は第１の処理槽で用いた現像液を除去
する第２の処理槽である。３は基板に現像液を塗布する
ためのシャワーであり、４は現像液を除去するための純
水シャワーである。５は顔料残渣を除去するためのブラ
シであり、６は基板の液切りを行うためのエアーナイフ
であり、７は基板であり、８は基板のパスラインであ
る。In FIG. 1, reference numeral 1 denotes a first tank for developing a developable coating film, and reference numeral 2 denotes a second processing tank for removing a developing solution used in the first processing tank. Reference numeral 3 denotes a shower for applying a developing solution to the substrate, and reference numeral 4 denotes a pure water shower for removing the developing solution. Reference numeral 5 denotes a brush for removing the pigment residue, 6 denotes an air knife for draining the substrate, 7 denotes the substrate, and 8 denotes a pass line of the substrate.
【００３５】実施例１ まず、使用する基板は以下の方法で製造した。Example 1 First, a substrate to be used was manufactured by the following method.
【００３６】顔料を含む現像性塗膜として、ポジ型感光
性ポリイミドの前駆体（ポリアミック酸）溶液とカーボ
ンブラック（三菱化成（株）製、ＭＡ１００）とを調整
したブラックペーストを用いた。A black paste prepared by preparing a precursor (polyamic acid) solution of positive photosensitive polyimide and carbon black (MA100, manufactured by Mitsubishi Kasei Co., Ltd.) was used as the developable coating film containing the pigment.
【００３７】３００×４００ｍｍのサイズの無アルカリ
ガラス（日本電気ガラス（株）製、ＯＡ−２）基板にス
ピナーを用いてブラックペーストを塗布し、オーブン中
１３５℃、２０分間セミキュアした。続いて露光機（キ
ャノン（株）製、ＰＬＡ−５０）を用い、フォトマスク
を介して８０ｍＪ露光を行った。A black paste was applied to a 300 × 400 mm alkali-free glass substrate (OA-2, manufactured by NEC Corporation) using a spinner and semi-cured in an oven at 135 ° C. for 20 minutes. Subsequently, 80 mJ exposure was performed through a photomask using an exposure machine (PLA-50, manufactured by Canon Inc.).
【００３８】次に、搬送方向の長さが２００ｃｍあるシ
ャワー現像槽（図１における第１の処理層１）中に現像
液であるテトラメチルアンモニウムヒドロキシドを２重
量％含んだ２３℃の水溶液を入れ、基板を２００ｃｍ／
分で搬送させた。現像時間は６０秒でありブラックペー
ストの現像を行った。Next, a 23 ° C. aqueous solution containing 2% by weight of tetramethylammonium hydroxide as a developing solution was placed in a shower developing tank (first processing layer 1 in FIG. 1) having a length of 200 cm in the transport direction. 200cm /
Minutes. The development time was 60 seconds, and the black paste was developed.
【００３９】その後、現像を停止させるために、基板を
搬送方向の長さが２００ｃｍの水洗シャワー槽（図１に
おける第２の処理層２）を搬送速度２００ｃｍ／分で搬
送させた。Thereafter, in order to stop the development, the substrate was transported at a transport speed of 200 cm / min through a rinsing shower tank (second processing layer 2 in FIG. 1) having a length of 200 cm in the transport direction.
【００４０】ブラシ５としては植毛密度２１００本／ｃ
ｍ2 の蜜巻状タイプのロールブラシを使用した。ブラシ
の材質はナイロン６・１０であり、ブラシの線径は７０
μｍのものを使用した。また、ブラシの毛の長さは２ｃ
ｍのものを使用した。The brush 5 has a flocking density of 2100 brushes / c.
A honey roll type roll brush of m 2 was used. The brush material is nylon 6,10, and the wire diameter of the brush is 70
μm was used. The length of the brush hair is 2c
m.
【００４１】ブラシ５はパスライン８の上下にそれぞれ
２対具備し、ブラシとブラシの間隔は３０ｃｍであっ
た。基板に対するブラシの押し込み圧は上下ともに＋
０．５ｍｍであった。ブラシの回転方向は全てのブラシ
が内回転になるように調整し、ブラシの回転数は４００
ｒｐｍであった。The brush 5 was provided two pairs above and below the pass line 8, and the distance between the brushes was 30 cm. The pressing pressure of the brush against the substrate is +
0.5 mm. The brush rotation direction is adjusted so that all brushes rotate inward, and the number of brush rotations is 400.
rpm.
【００４２】ブラシの揺動方法は、基板の搬送方向に対
して直交方向になるように調整した。ブラシの揺動方法
は、上下２対のブラシ全て同調操作を行い、揺動ストロ
ークは１５ｍｍとした。ブラシの揺動速度は１００往復
／分であった。The swinging method of the brush was adjusted so as to be perpendicular to the substrate transport direction. The method of swinging the brush was such that the tuning operation was performed for all of the upper and lower pairs of brushes, and the swing stroke was 15 mm. The swing speed of the brush was 100 reciprocations / minute.
【００４３】シャワー水洗部の後に液切り用のエアーナ
イフ６を設置し、基板の液切りを行った。An air knife 6 for draining the liquid was provided after the shower water washing section to drain the liquid from the substrate.
【００４４】次にオーブン中で２５０℃、３０分で基板
のキュアを行った。Next, the substrate was cured in an oven at 250 ° C. for 30 minutes.
【００４５】比較例１ 第２の処理槽にブラシを具備せず、水洗槽はシャワーの
みとした。その他は実施例１と同等の手法で基板の作成
を行った。Comparative Example 1 The second treatment tank was not provided with a brush, and the washing tank was provided only with a shower. In other respects, a substrate was formed in the same manner as in Example 1.
【００４６】実施例２ 第２の処理槽のブラシの揺動速度を０往復／分（揺動な
し）とした。その他は実施例１と同等の手法で基板の作
成を行った。Example 2 The swing speed of the brush in the second processing tank was set to 0 reciprocations / minute (no swing). In other respects, a substrate was formed in the same manner as in Example 1.
【００４７】実施例１、２および比較例１による基板の
表面状態の結果を表１に示す。Table 1 shows the results of the surface states of the substrates according to Examples 1 and 2 and Comparative Example 1.
【００４８】[0048]
【表１】 上記の結果から、ブラシを用いずに現像を行った場合、
基板上の全面に現像残渣が残ったが、現像槽後の水洗部
にブラシを用いることで、ブラシと接触した部分の現像
残渣を除去することができた。しかし、ブラシの揺動回
数を０往復／分、つまりブラシを揺動させないようにし
て現像を行うと、ブラシの基板への接触にムラがあるた
めに、基板の搬送方向と同一の方向にスジ状のムラが若
干発生したが、ブラシの揺動回数を１００往復／分にす
ると、基板上の現像残渣を完全に除去することができ
た。[Table 1] From the above results, when developing without using a brush,
Although the development residue remained on the entire surface of the substrate, the development residue in the portion in contact with the brush could be removed by using a brush in the washing section after the development tank. However, if development is performed with the brush oscillating frequency of 0 reciprocations / minute, that is, without oscillating the brush, the brush contacts the substrate inconsistently, so that the stripes move in the same direction as the substrate transport direction. Although some irregularities occurred in the shape, the development residue on the substrate could be completely removed when the number of swings of the brush was set to 100 reciprocations / minute.
【００４９】よって、ブラシの揺動速度を最適化するこ
とで基板上の現像残渣を完全に除去できることがわかっ
た。Thus, it was found that the development residue on the substrate could be completely removed by optimizing the swing speed of the brush.
【００５０】[0050]
【発明の効果】本発明の薬液処理装置は、処理槽にブラ
シを具備することで、洗浄、あるいは現像効率を高める
ことができ、さらにブラシを基板の搬送方向に対して交
わる方向に揺動させることで、ブラシの当りムラ等をな
くし、洗浄、あるいは現像残渣等の除去を効率よく行う
ことができる。According to the chemical processing apparatus of the present invention, by providing a brush in the processing tank, the cleaning or developing efficiency can be increased, and the brush is swung in a direction intersecting with the transport direction of the substrate. This makes it possible to eliminate unevenness in contact with the brush and to efficiently perform cleaning or removal of development residues and the like.
【００５１】[0051]
【００５２】[0052]
【図１】本発明の現像装置の一例を示す正面図である。FIG. 1 is a front view illustrating an example of a developing device of the present invention.
【００５３】[0053]
【図２】図１の上面図である。FIG. 2 is a top view of FIG.
【００５４】[0054]
【図３】本発明に用いるブラシの一例を示す概略図であ
る。FIG. 3 is a schematic view showing an example of a brush used in the present invention.
【００５５】[0055]
１：第１の処理槽 ２：第２の処理槽 ３：薬液シャワーノズル ４：純水シャワーノズル ５：揺動ブラシ ６：液切り用のエアーナイフ ７：基板 ８：パスライン 1: First processing tank 2: Second processing tank 3: Chemical solution shower nozzle 4: Pure water shower nozzle 5: Oscillating brush 6: Air knife for draining 7: Substrate 8: Pass line
───────────────────────────────────────────────────── フロントページの続き (72)発明者 垣貫 剛広 滋賀県大津市園山１丁目１番１号 東レ株 式会社滋賀事業場内 ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Takehiro Kakinuki 1-1-1 Sonoyama, Otsu City, Shiga Pref.
Claims (6)
理槽で用いた薬液を除去する第２の処理槽からなり、基
板を前記第１の処理槽と第２の処理槽に連続的に搬送す
る薬液処理装置において、第１の処理槽および／または
第２の処理槽に前記基板の表面をブラッシングするブラ
シを具備することを特徴とする薬液処理装置。1. A first processing tank for performing a chemical processing, and a second processing tank for removing a chemical used in the first processing tank, wherein the substrate is provided in the first processing tank and the second processing tank. A chemical treatment apparatus for continuously transporting a substrate, wherein a brush for brushing the surface of the substrate is provided in the first treatment tank and / or the second treatment tank.
５０μｍであることを特徴とする請求項１に記載の薬液
処理装置。2. The bristles used in the brush have a diameter of 40-1.
2. The chemical processing apparatus according to claim 1, wherein the thickness is 50 [mu] m.
／ｃｍ2 であることを特徴とする請求項１または２に記
載の薬液処理装置。3. The chemical processing apparatus according to claim 1, wherein the brush implantation density is 200 to 3000 brushes / cm 2 .
するものであることを特徴とする請求項１〜３のいずれ
かに記載の薬液処理装置4. The chemical processing apparatus according to claim 1, wherein the brush swings in a direction crossing the transport direction.
〜４のいずれかに記載の薬液処理装置。5. The cleaning device according to claim 1, wherein the cleaning device is a cleaning device.
The chemical solution treatment device according to any one of claims 1 to 4.
〜４のいずれかに記載の薬液処理装置。6. A developing device according to claim 1, wherein said developing device is a developing device.
The chemical solution treatment device according to any one of claims 1 to 4.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11825497A JP4042179B2 (en) | 1997-05-08 | 1997-05-08 | Chemical treatment equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11825497A JP4042179B2 (en) | 1997-05-08 | 1997-05-08 | Chemical treatment equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH10307406A true JPH10307406A (en) | 1998-11-17 |
| JP4042179B2 JP4042179B2 (en) | 2008-02-06 |
Family
ID=14732069
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11825497A Expired - Fee Related JP4042179B2 (en) | 1997-05-08 | 1997-05-08 | Chemical treatment equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4042179B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005249906A (en) * | 2004-03-02 | 2005-09-15 | Toppan Printing Co Ltd | Cleaning equipment and cleaning method for color filter for liquid crystal display device |
| JP2006231144A (en) * | 2005-02-23 | 2006-09-07 | Toray Monofilament Co Ltd | Brush bristle material for cleaning liquid crystal screen and brush for cleaning liquid crystal screen |
| CN103521491A (en) * | 2013-09-25 | 2014-01-22 | 京东方科技集团股份有限公司 | Cleaning fluid absorbing device and developing liquid washing equipment |
-
1997
- 1997-05-08 JP JP11825497A patent/JP4042179B2/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005249906A (en) * | 2004-03-02 | 2005-09-15 | Toppan Printing Co Ltd | Cleaning equipment and cleaning method for color filter for liquid crystal display device |
| JP2006231144A (en) * | 2005-02-23 | 2006-09-07 | Toray Monofilament Co Ltd | Brush bristle material for cleaning liquid crystal screen and brush for cleaning liquid crystal screen |
| CN103521491A (en) * | 2013-09-25 | 2014-01-22 | 京东方科技集团股份有限公司 | Cleaning fluid absorbing device and developing liquid washing equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4042179B2 (en) | 2008-02-06 |
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