JPH10287491A - Diamond-coated hard member having regulated surface roughness - Google Patents

Diamond-coated hard member having regulated surface roughness

Info

Publication number
JPH10287491A
JPH10287491A JP10810197A JP10810197A JPH10287491A JP H10287491 A JPH10287491 A JP H10287491A JP 10810197 A JP10810197 A JP 10810197A JP 10810197 A JP10810197 A JP 10810197A JP H10287491 A JPH10287491 A JP H10287491A
Authority
JP
Japan
Prior art keywords
surface roughness
diamond
coating
substrate
hard member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10810197A
Other languages
Japanese (ja)
Inventor
Hiroyuki Kodama
浩亨 児玉
Masaru Yagi
優 八木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tungaloy Corp
Original Assignee
Toshiba Tungaloy Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Tungaloy Co Ltd filed Critical Toshiba Tungaloy Co Ltd
Priority to JP10810197A priority Critical patent/JPH10287491A/en
Publication of JPH10287491A publication Critical patent/JPH10287491A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/009After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
    • C04B41/5001Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials with carbon or carbonisable materials
    • C04B41/5002Diamond

Abstract

PROBLEM TO BE SOLVED: To provide a diamond-coated hard member, excellent in abrasion, peeling and chipping resistances and having a regulated surface roughness practicable especially as a cutting tool. SOLUTION: This diamond-coated hard member is obtained by coating the top surface of a substrate with a coating film of diamond and/or diamondlike carbon. The average surface roughness of the substrate adjacent to the coating film is regulated to 0.1-2.5 μm expressed in terms of Ra and the average surface roughness of the coating film is regulated to <=1.5 μm expressed in terms of the Ra . The diamond-coated hard member has the relationship of Ra (c)<=Ra (s) when the average surface roughness of the coating film is expressed as Ra (c) and that of the substrate is expressed as Ra (s). The Ra is in conformity to the contents of the description in the Japanese Industrial Standards JIS B0601.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、被膜が緻密である
こと、膜質がすぐれていること、被膜の付着性および耐
剥離性がすぐれていることを特徴とする表面粗さを調整
したダイヤモンド被覆硬質部材に関し、具体的には、基
材の表面粗さと、基材上に被覆するダイヤモンドを主成
分とする被膜の表面粗さとを調整することにより、旋削
工具,ドリル,エンドミル,リーマ,フライス工具に代
表される切削工具部材,スリッターなどの切断工具,ノ
ズル,光学素子成形型,ボンデングツールに代表される
耐摩耗性および耐摩擦性を重要視する耐摩耗性工具、さ
らには電子工業,精密工業,化学工業などに用いられる
構造部材,機能部材として実用可能な表面粗さを調整し
たダイヤモンド被覆硬質部材に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a diamond coating having a controlled surface roughness, characterized in that the coating is dense, the quality of the coating is excellent, and the adhesion and peeling resistance of the coating are excellent. For a hard member, specifically, a turning tool, a drill, an end mill, a reamer, and a milling tool are prepared by adjusting the surface roughness of a base material and the surface roughness of a diamond-based film coated on the base material. Tools such as cutting tools, cutting tools such as slitters, nozzles, optical element molding dies, wear-resistant tools such as bond tools, which emphasize wear and friction resistance, as well as electronics and precision The present invention relates to a diamond-coated hard member whose surface roughness is adjusted, which can be practically used as a structural member and a functional member used in the industrial and chemical industries.

【0002】[0002]

【従来の技術】従来から超硬合金に代表される焼結合金
の基材上にダイヤモンドおよび/またはダイヤモンド状
カ−ボンの被膜を被覆してなるダイヤモンド被覆焼結合
金についての検討が行われており、その被膜の耐摩耗性
を発揮させることにより工具材料、特に切削工具として
実用化しようという試みが行われている。
2. Description of the Related Art Conventionally, studies have been made on diamond-coated sintered alloys in which a diamond and / or diamond-like carbon film is coated on a substrate of a sintered alloy represented by a cemented carbide. Attempts have been made to put the film into practical use as a tool material, especially a cutting tool, by exerting the wear resistance of the film.

【0003】ダイヤモンド被覆焼結合金は、ダイヤモン
ドおよび/またはダイヤモンド状カーボンが他の物質と
の濡れ性に劣ることから、基材の表面にダイヤモンドお
よび/またはダイヤモンド状カ−ボンの被膜を、密着性
および付着性を高めた状態に、いかに被覆することがで
きるかという問題が最大の課題となっている。また、各
種の基材上にダイヤモンドおよび/またはダイヤモンド
状カ−ボンの被膜がある程度の密着性および付着性にす
ぐれた状態に被覆されたとしても、工具材料に応用した
場合には、実用時に被膜の剥離またはチッピングが生じ
易くなるという課題がある。
[0003] In a diamond-coated sintered alloy, diamond and / or diamond-like carbon is poor in wettability with other substances. The biggest problem is how to coat the coating with enhanced adhesion. Even if a coating of diamond and / or diamond-like carbon is coated on a variety of substrates with a certain degree of adhesion and adhesion, when applied to a tool material, the coating may be applied in practical use. There is a problem that peeling or chipping is easily caused.

【0004】特に、旋削工具,フライス工具,ドリル,
エンドミルに代表される切削工具、金型,裁断刃,切断
刃に代表される耐摩耗工具などの工具の場合は、最も苛
酷な条件で用いられるために、例えば超硬合金でなる基
材と被膜との密着性および付着性、ならびに被膜の表面
粗度が一層重要な問題になっている。
[0004] In particular, turning tools, milling tools, drills,
In the case of cutting tools typified by end mills, tools such as molds, cutting blades, and wear-resistant tools typified by cutting blades, they are used under the most severe conditions. And the surface roughness of the coating have become more important issues.

【0005】ダイヤモンドおよび/またはダイヤモンド
状カ−ボンの被膜と基材との密着性を高めて、工具とし
て用いることが可能なダイヤモンド被覆焼結合金とし
て、多数提案されており、このうち、基材の表面をエッ
チングすることについて提案されている代表的なもの
に、特開昭63−53269号公報,特開平1−201
475号公報,特開平1−246361号公報,特開平
2−217398号公報,特開平3−107460号公
報および特開平3−115571号公報があり、基材の
表面粗さについて提案されている代表的なものに、特開
平7−223101号公報がある。
[0005] Many diamond-coated sintered alloys which can be used as a tool by enhancing the adhesion between a diamond and / or diamond-like carbon coating and a substrate have been proposed. Representative examples of etching of the surface of the semiconductor device are disclosed in JP-A-63-53269 and JP-A-1-201.
475, JP-A-1-246361, JP-A-2-217398, JP-A-3-107460, and JP-A-3-115571. Representative representatives have been proposed for the surface roughness of a substrate. Japanese Patent Application Laid-Open No. 7-223101 discloses a typical method.

【0006】[0006]

【発明が解決しようとする課題】ダイヤモンド被覆焼結
合金の基材の表面部について提案されている先行技術の
内、特開昭63−53269号公報,特開平1−201
475号公報,特開平1−246361号公報,特開平
2−217398号公報,特開平3−107460号公
報および特開平3−115571号公報には、超硬合金
でなる基材の表面を酸によりエッチング処理すること、
特に特開平2−217398号公報および特開平3−1
07460号公報には、基材の表面を酸や中性物質によ
り電解研磨およびエッチング処理して、表面部に存在す
る結合相を除去した基材の表面にダイヤモンドの被膜を
被覆することが開示されている。
Among the prior arts proposed for the surface portion of a diamond-coated sintered alloy substrate, JP-A-63-53269 and JP-A-1-201.
No. 475, JP-A-1-246361, JP-A-2-217398, JP-A-3-107460 and JP-A-3-115571 disclose that the surface of a substrate made of a cemented carbide is treated with an acid. Etching,
In particular, JP-A-2-217398 and JP-A-3-13-1
JP 07460 discloses that the surface of the substrate is electrolytically polished and etched with an acid or a neutral substance to coat the surface of the substrate with a diamond film from which the binder phase present on the surface has been removed. ing.

【0007】これらの公報に開示されている方法により
得られるダイヤモンド被覆焼結合金は、酸溶液によるエ
ッチングであるために、結合相のみがエッチングされ
て、エッチング前後における基材表面の面粗さの変動が
余り大きくなく、理想的な凹凸面にすることが困難であ
ることから、基材表面に被覆されたダイヤモンドの被膜
の付着性および密着性に満足できないという問題があ
り、特に工具材料に応用した場合には短寿命になるとい
う問題がある。
[0007] Since the diamond-coated sintered alloy obtained by the methods disclosed in these publications is etched by an acid solution, only the binder phase is etched, and the surface roughness of the substrate surface before and after etching is reduced. Since the fluctuation is not so large and it is difficult to make an ideal uneven surface, there is a problem that the adhesion and adhesion of the diamond film coated on the substrate surface cannot be satisfied. In that case, there is a problem that the service life becomes short.

【0008】また、特に特開平2−217398号公報
および特開平3−107460号公報に開示されている
ように、酸による電解研磨およびエッチングにより、基
材表面部のエッチング深さを深くした場合には、上述の
問題の他に、さらに基材表面部の強度が低下するという
問題がある。
Further, as disclosed in JP-A-2-217398 and JP-A-3-107460, when the etching depth of the substrate surface is increased by electrolytic polishing and etching using an acid, However, in addition to the above-described problems, there is a problem that the strength of the substrate surface portion is further reduced.

【0009】特開平7−223101号公報には、基材
とダイヤモンド被膜との接合表面における表面粗さがR
a=0.1〜3μmに調整することが開示されている。
しかしながら、同公報に開示のダイヤモンド被覆焼結合
金は、ダイヤモンド被膜の表面粗さが調整されていない
ことから、基材とダイヤモンド被膜との付着性および密
着性が著しく低く、工具として用いた場合に被膜の剥
離,チッピングなどにより短寿命になりやすいという問
題がある。
Japanese Patent Application Laid-Open No. 7-223101 discloses that the surface roughness of the bonding surface between a substrate and a diamond coating is R
It is disclosed that a is adjusted to 0.1 to 3 μm.
However, the diamond-coated sintered alloy disclosed in this publication has extremely low adhesion and adhesion between the substrate and the diamond coating because the surface roughness of the diamond coating is not adjusted, and when used as a tool, There is a problem that the service life is likely to be short due to peeling of the coating and chipping.

【0010】また、その他の技術文献に、基材の表面に
被覆したダイヤモンドの被膜表面を研磨して表面粗さを
小さくすると、長寿命化を達成することが可能であると
開示されているものがある。この場合、従来のダイヤモ
ンド被覆部材に対比して、ダイヤモンドの被膜表面粗さ
を小さくすることにより、長寿命の傾向を有している
が、基材の表面粗さを調整していないために、より過酷
な条件で実用された場合には、基材と被膜との付着性お
よび密着性の低下、被膜の剥離,チッピングなどにより
短寿命になりやすいという問題がある。
[0010] Further, other technical documents disclose that it is possible to achieve a longer life if the surface roughness of the diamond film coated on the surface of the substrate is reduced by polishing the surface. There is. In this case, compared to the conventional diamond coated member, by reducing the diamond film surface roughness, there is a tendency of long life, but because the surface roughness of the substrate is not adjusted, When used under more severe conditions, there is a problem that the service life tends to be short due to a decrease in the adhesion and adhesion between the base material and the coating, and peeling and chipping of the coating.

【0011】本発明は、上述のような問題点を解決した
もので、具体的には、金属,合金,焼結合金,またはセ
ラミックス焼結体の基材の表面粗さを調整することによ
り、その基材表面に被覆する被膜の成膜時にダイヤモン
ドの核が容易に、かつ多量に形成可能であること、緻密
な膜にし得ること、および膜質にすぐれること、そして
成膜後の被膜表面粗さを調整すると、実用時において被
膜の耐摩耗性および耐摩擦性が向上し、基材との付着性
および密着性がより一層すぐれるようになることから被
膜厚さを厚く被覆することが可能となること、これらが
総合されて耐摩耗性,耐剥離性,耐チッピング性にすぐ
れること、特に切削工具として実用可能な表面粗さを調
整したダイヤモンド被覆硬質部材の提供を目的とするも
のである。
The present invention has solved the above-mentioned problems, and more specifically, by adjusting the surface roughness of a base material of a metal, an alloy, a sintered alloy, or a ceramic sintered body, Diamond nuclei can be formed easily and in large quantities at the time of forming a film to be coated on the base material surface, a dense film can be formed, and the film quality is excellent, and the film surface roughness after film formation By adjusting the thickness, the abrasion resistance and friction resistance of the coating are improved in practical use, and the adhesion and adhesion to the base material are further improved, so that the coating thickness can be increased. The purpose is to provide a diamond-coated hard member with adjusted surface roughness that can be practically used as a cutting tool, especially because it is excellent in wear resistance, peeling resistance and chipping resistance when combined. is there.

【0012】[0012]

【課題を解決するための手段】本発明者らは、上記目的
を達成するために長年に亘り研究を重ねていたところ、
超硬合金でなる基材表面の面粗さが、ダイヤモンドの気
相合成時におけるダイヤモンドの核形成量および膜質に
大きく影響すること、それにより成膜されたダイヤモン
ド被膜と基材との付着性,密着性に大きく影響するこ
と、これら両方の効果を最大に発揮させるためには、最
適な基材表面の面粗さが存在するという第1の知見を得
た。
Means for Solving the Problems The present inventors have been conducting research for many years to achieve the above object,
The surface roughness of the substrate made of cemented carbide greatly affects the nucleation amount and film quality of diamond during the vapor phase synthesis of diamond. The first finding was that there is an optimum surface roughness of the substrate surface in order to greatly affect the adhesion and to maximize both of these effects.

【0013】また、本発明者らは、基材の表面に気相合
成法によりダイヤモンド被膜を被覆した場合に、被膜表
面の面粗さが実用時における相手物質との摩擦および摩
耗に大きく影響を及ぼし、そして基材表面の面粗さと被
膜表面の面粗さとの関係から、被膜の耐剥離性を最大に
高め得ること、その結果、切削工具として用いた場合に
長寿命となるという第2の知見を得た。これら第1およ
び第2の知見に基づいて、本発明を完成するに至ったも
のである。
Further, the present inventors have found that when a diamond film is coated on the surface of a substrate by a vapor phase synthesis method, the surface roughness of the film surface has a great effect on friction and abrasion with a partner material in practical use. And from the relationship between the surface roughness of the substrate surface and the surface roughness of the coating surface, it is possible to maximize the peeling resistance of the coating film, and as a result, the service life becomes long when used as a cutting tool. Obtained knowledge. The present invention has been completed based on these first and second findings.

【0014】すなわち、本発明のダイヤモンド被覆硬質
部材は、基材の上にダイヤモンドおよび/またはダイヤ
モンド状カーボンの被膜を被覆したダイヤモンド被覆硬
質部材であって、該被膜に隣接する該基材の平均表面粗
さがRa表示において0.1μm〜2.5μmに調整さ
れており、該被膜の平均表面粗さがRa表示において
1.5μm以下に調整されており、かつ該被膜の平均表
面粗さをRa(c)と表示し、該基材の平均表面粗さを
Ra(s)と表示したときに、Ra(c)≦Ra(s)
からなることを特徴とするものである。(但し、Ra
は、日本工業規格JIS B0601に記載の内容に準
ずる)
That is, the diamond-coated hard member of the present invention is a diamond-coated hard member in which a coating of diamond and / or diamond-like carbon is coated on a substrate, and the average surface of the substrate adjacent to the coating is provided. The roughness is adjusted to 0.1 μm to 2.5 μm in Ra display, the average surface roughness of the coating is adjusted to 1.5 μm or less in Ra display, and the average surface roughness of the coating is Ra (C), and when the average surface roughness of the substrate is represented by Ra (s), Ra (c) ≦ Ra (s)
It is characterized by consisting of. (However, Ra
Is based on the content described in Japanese Industrial Standard JIS B0601)

【0015】[0015]

【発明の実施の形態】本発明のダイヤモンド被覆硬質部
材における基材は、ダイヤモンド気相合成法において、
変形が生じない材料であり、かつ基材表面に被膜が被覆
された後に実用時に耐え得る材料ならば問題はなく、具
体的には、例えばSi,Ti,Zr,Hf,V,Ta,
Nb,W,Mo,Crの金属、これらの金属の中の少な
くとも1種を含む合金,高速度鋼,ダイス鋼などの合
金、またはサーメット,超硬合金などの焼結合金、もし
くは窒化珪素基焼結体,炭化珪素基焼結体,炭化タング
ステン主体の炭化物含有焼結体などのセラミックス焼結
体、あるいはこれらの金属,合金,焼結合金,セラミッ
クス焼結体の表面にダイヤモンドおよび/またはダイヤ
モンド状カーボン以外の無機物質からなる単層,多層の
薄膜を被覆した部材を挙げることができる。
BEST MODE FOR CARRYING OUT THE INVENTION The base material of the diamond-coated hard member of the present invention is obtained by a diamond vapor phase synthesis method.
There is no problem as long as it is a material which does not deform and which can withstand practical use after the film is coated on the substrate surface. Specifically, for example, Si, Ti, Zr, Hf, V, Ta,
Nb, W, Mo, Cr metals, alloys containing at least one of these metals, alloys such as high-speed steel, die steel, or sintered alloys such as cermet, cemented carbide, or silicon nitride-based sintered Ceramics, such as sintered bodies, silicon carbide-based sintered bodies, and tungsten-based carbide-containing sintered bodies, or the surfaces of these metals, alloys, sintered alloys, and ceramics sintered bodies have diamond and / or diamond-like A member coated with a single-layer or multi-layer thin film made of an inorganic substance other than carbon can be given.

【0016】これらの基材のうち、実質的に周期律表の
4a,5a,6a族元素,Si,Alの炭化物,窒化
物,酸化物,およびこれらの相互固溶体の中の少なくと
も1種の硬質相と不可避不純物とからなるセラミックス
焼結体でなる基材、または99重量%以上の炭化タング
ステンを主成分とする硬質相と残部がCoおよび/また
はNiを主成分とする結合相と不可避不純物とからなる
セラミックス焼結体でなる基材、もしくは1重量%を超
えて10重量%以下のCoおよび/またはNiを主成分
とする結合相と残部が炭化タングステンを主成分とする
硬質相と不可避不純物とからなる超硬合金でなる基材の
場合は、気相合成法によるダイヤモンド被膜の膜質を高
めることが容易であることから好ましいことである。
Among these base materials, at least one hard material selected from the group consisting of elements of groups 4a, 5a and 6a of the periodic table, carbides, nitrides and oxides of Si and Al, and their mutual solid solutions. Of a ceramic sintered body composed of a phase and unavoidable impurities, or a hard phase containing 99% by weight or more of tungsten carbide as a main component, and a binder phase containing Co and / or Ni as a main component, and unavoidable impurities. And a binder phase composed mainly of Co and / or Ni of more than 1% by weight and not more than 10% by weight and a hard phase composed mainly of tungsten carbide as a balance, and unavoidable impurities In the case of a substrate made of a cemented carbide consisting of the following, it is preferable because it is easy to enhance the film quality of the diamond film by the vapor phase synthesis method.

【0017】特に、上述の超硬合金からなる基材の場合
には、切削工具として実用した場合に、基材自体の強度
および靭性にすぐれていることから、長寿命を発揮させ
得ることが可能となり、好ましいことである。この超硬
合金は、従来から実用されている超硬合金である、例え
ばJIS規格のB4104およびB4053に記載され
ている超硬合金を用いることができる。具体的には、C
oおよび/またはNiを主成分とする結合相1〜15重
量%と残部が炭化タングステンのみの硬質相、または8
0重量%以上の炭化タングステンと他の炭化物,窒化
物,炭窒化物を少なくとも1種を20重量%以下とでな
る硬質相からなる超硬合金である。これらの超硬合金の
うち、特に、上述の結合相を1〜10重量%と残部が上
述の硬質相からなる超硬合金である場合がダイヤモンド
被膜形成と実用時の強度,靭性から好ましいことであ
る。
In particular, in the case of a substrate made of the above-mentioned cemented carbide, when used as a cutting tool, the base material itself is excellent in strength and toughness, so that a long life can be exhibited. Which is preferable. As the cemented carbide, a cemented carbide conventionally used in practice, for example, a cemented carbide described in JIS B4104 and B4053 can be used. Specifically, C
a hard phase containing 1 to 15% by weight of a binder phase mainly containing o and / or Ni and a balance of only tungsten carbide, or 8
This is a cemented carbide comprising a hard phase comprising at least 20% by weight of at least one of tungsten carbide of at least 0% by weight and another carbide, nitride or carbonitride. Among these cemented carbides, in particular, a cemented carbide composed of 1 to 10% by weight of the above-mentioned binder phase and the balance of the above-mentioned hard phase is preferable from the viewpoint of diamond film formation and practical strength and toughness. is there.

【0018】この超硬合金の基材のうち、結合相は、具
体的には、Ni,Co,NiとCoの混在,またはNi
−Co合金からなる場合、もしくはこれらのNiおよび
/またはCoと他の金属との混在、あるいは相互合金と
なっている場合がある。このうち、Ni,Co以外の金
属の含有した結合相は、具体的には、例えばCo−Fe
合金,Ni−Fe合金,Ni−Mo合金,Co−Mo合
金,Ni−Co−Mo合金,Co−Ni−Fe合金,C
o−Cr合金,Ni−Cr合金,Co−Ni−Cr合
金,Co−Fe−Cr合金,Ni−Fe−Cr合金,C
o−V合金,Ni−V合金,Co−Ni−V合金,Co
−Ni−Cr−V合金,Co−Cr−V合金,Ni−C
r−V合金,Co−W合金,Ni−Cr−Mo合金を挙
げることができる。 この結合相は、Co,Niの中の
少なくとも1種が結合相に対して、50wt%以上含有
されていることが好ましいことである。この結合相の含
有量は、ドリルおよびエンドミルに代表される回転工具
に用いる場合には、超硬合金全体に対して2〜10重量
%でなることが特に好ましく、硬質相の粒成長抑制効果
の高いCrおよび/またはVが含有されていることがさ
らに好ましいことである。
[0018] In the cemented carbide substrate, specifically, the binder phase is Ni, Co, a mixture of Ni and Co, or Ni.
-Co alloy, or a mixture of Ni and / or Co with another metal or a mutual alloy. Of these, the binder phase containing a metal other than Ni and Co is specifically, for example, Co-Fe
Alloy, Ni-Fe alloy, Ni-Mo alloy, Co-Mo alloy, Ni-Co-Mo alloy, Co-Ni-Fe alloy, C
o-Cr alloy, Ni-Cr alloy, Co-Ni-Cr alloy, Co-Fe-Cr alloy, Ni-Fe-Cr alloy, C
o-V alloy, Ni-V alloy, Co-Ni-V alloy, Co
-Ni-Cr-V alloy, Co-Cr-V alloy, Ni-C
r-V alloy, Co-W alloy, Ni-Cr-Mo alloy can be mentioned. The binder phase preferably contains at least one of Co and Ni in an amount of 50 wt% or more based on the binder phase. When used in a rotating tool represented by a drill and an end mill, the content of the binder phase is particularly preferably from 2 to 10% by weight based on the entire cemented carbide, and the content of the binder phase has an effect of suppressing grain growth of the hard phase. It is more preferred that high Cr and / or V be contained.

【0019】さらに、これらの金属,合金,焼結合金,
セラミックス焼結体の表面に、ダイヤモンドおよび/ま
たはダイヤモンド状カーボンの被膜以外の無機物質から
なる薄膜を被覆した基材の場合には、ダイヤモンドの被
膜合成時にダイヤモンドの核発生および成長を阻害させ
ないような物質からなる薄膜の選択が可能となること、
かつ基材全体の強度および靭性をも選定でき得ることか
ら、好ましいことである。具体的には、例えば超硬合金
や高速度鋼の表面に、TiN,TiCN,(TiAl)
N,SiC,Si34,Siの中の1種の単層または2
種以上の多層からなる薄膜を被覆した基材を挙げること
ができる。このときの薄膜の厚さは、上述の被膜の形成
時に効果が発揮され得る最低厚さがあればよく、具体的
には、0.1μm以上,好ましくは0.5〜5μmであ
る。
Furthermore, these metals, alloys, sintered alloys,
In the case of a substrate in which the surface of the ceramic sintered body is coated with a thin film made of an inorganic substance other than the diamond and / or diamond-like carbon coating, the nucleation and growth of diamond are not inhibited during the synthesis of the diamond coating. Selection of a thin film made of a substance,
This is preferable because the strength and toughness of the entire substrate can be selected. Specifically, for example, TiN, TiCN, (TiAl)
One kind of monolayer or two of N, SiC, Si 3 N 4 , Si
Substrates coated with a thin film composed of at least two or more kinds can be given. The thickness of the thin film at this time may be a minimum thickness at which the effect can be exerted at the time of forming the above-mentioned film, and is specifically 0.1 μm or more, preferably 0.5 to 5 μm.

【0020】この基材は、ダイヤモンドおよび/または
ダイヤモンド状カーボンの被膜に隣接する基材表面の平
均の表面粗さがRa=0.1μm〜2.5μmからなる
ことである。この基材表面の平均の表面粗さがRa<
0.1μmの場合には、基材への被膜の付着性,密着性
が劣ること、逆に基材表面の平均の表面粗さがRa>
2.5μmの場合には、基材上に被覆されるダイヤモン
ドおよび/またはダイヤモンド状カーボンの被膜表面の
面粗さが粗くなり、例えば切削工具として用いると、切
削抵抗が高くなり、欠損および被膜の剥離の原因になる
こと、相手材である被削材の仕上げ面を粗くし、短寿命
となる。また、被覆後にラッピングなどにより、被膜表
面粗さを調整するとしても、物質の中で最高の硬さを有
している被膜表面粗さの調整は、長時間を要すること、
被膜を損傷する可能性が高くなる。したがって、基材表
面の平均の表面粗さは、Ra=0.1μm〜2.5μm
と定めたものである。
This substrate has an average surface roughness of Ra = 0.1 μm to 2.5 μm on the substrate surface adjacent to the diamond and / or diamond-like carbon coating. The average surface roughness of the substrate surface is Ra <
In the case of 0.1 μm, the adhesion and adhesion of the coating to the substrate are poor, and conversely, the average surface roughness of the substrate surface is Ra>
In the case of 2.5 μm, the surface roughness of the diamond and / or diamond-like carbon coating film coated on the base material becomes coarse. This may cause peeling and roughen the finished surface of the work material as the mating material, resulting in a short life. In addition, even if the coating surface roughness is adjusted by wrapping or the like after coating, the adjustment of the coating surface roughness having the highest hardness among the substances takes a long time,
The chance of damaging the coating is increased. Therefore, the average surface roughness of the substrate surface is Ra = 0.1 μm to 2.5 μm
It is defined.

【0021】この基材上に被覆されるダイヤモンドおよ
び/またはダイヤモンド状カーボンの被膜は、平均の表
面粗さがRa≦1.5μmでなるものである。この被膜
の平均の表面粗さがRa>1.5μmになると、上述し
たように、例えば切削工具として用いた場合に、切削抵
抗が高くなり、欠損および被膜の剥離の原因になるこ
と、相手材である被削材の仕上げ面を粗くし、短寿命と
なるという問題がある。この被膜の平均の表面粗さがR
a≦1.0μmでなることが好ましく、特に好ましいの
は、Ra=0.1〜1.0μmである。また、この被膜
の膜厚さは、用途により最適値が異なるが、切削工具ま
たは耐摩耗工具のような過酷な条件でも実用可能な膜厚
さとするためには、平均膜厚さを1〜15μmとするこ
とが好ましいことである。
The coating of diamond and / or diamond-like carbon coated on the substrate has an average surface roughness of Ra ≦ 1.5 μm. When the average surface roughness of the coating is Ra> 1.5 μm, as described above, for example, when used as a cutting tool, the cutting resistance increases, which may cause chipping and peeling of the coating. However, there is a problem that the finished surface of the work material is roughened and the life is shortened. The average surface roughness of this coating is R
It is preferable that a ≦ 1.0 μm, and it is particularly preferable that Ra = 0.1 to 1.0 μm. Although the optimum value of the film thickness varies depending on the application, the average film thickness should be 1 to 15 μm to obtain a film thickness that can be used even under severe conditions such as cutting tools or wear-resistant tools. Is preferable.

【0022】この基材表面の面粗さと被膜表面の面粗さ
との比が重要であり、被膜表面の面粗さが基材表面の面
粗さより大きくなると、膜の耐密着性,耐付着性,耐剥
離性,および耐チッピング性の低下が著しくなること、
さらに摩擦性の増大と、相手材料への損傷の増大を誘起
させることになる。
The ratio between the surface roughness of the substrate surface and the surface roughness of the coating surface is important. If the surface roughness of the coating surface is larger than the surface roughness of the substrate surface, the film has a high adhesion resistance and adhesion resistance. , The deterioration of peeling resistance and chipping resistance becomes remarkable,
In addition, it will increase friction and increase damage to the mating material.

【0023】この本発明のダイヤモンド被覆硬質部材に
おける基材の表面粗さの調整は、従来から行われている
表面粗さ調整方法である、例えば研磨,ラッピング,腐
食,バレル処理,ショットピーニング処理,熱処理など
の方法により調整することができる。このことを、超硬
合金の基材について、具体的に説明すると、例えば、焼
き肌面または研磨面でなる超硬合金の表面を、アルカリ
溶液中で超硬合金の表面に存在する硬質相を電解腐食
し、その後酸溶液中で超硬合金の表面に存在する結合相
を腐食することにより、基材の表面粗さを調整すること
ができる。
The surface roughness of the substrate in the diamond-coated hard member of the present invention is adjusted by a conventional method for adjusting the surface roughness, such as polishing, lapping, corrosion, barrel processing, shot peening, and the like. It can be adjusted by a method such as heat treatment. This is specifically described for a cemented carbide substrate.For example, the surface of a cemented carbide that is a baked surface or a polished surface is made of a hard phase existing on the surface of the cemented carbide in an alkaline solution. The surface roughness of the substrate can be adjusted by performing electrolytic corrosion and then corroding the binder phase present on the surface of the cemented carbide in an acid solution.

【0024】このようにして、表面粗さを調整した基材
を用いて、例えば従来から行われているマイクロ波プラ
ズマ化学蒸着法,高周波プラズマ化学蒸着法により、基
材の表面にダイヤモンドおよび/またはダイヤモンド状
カーボンからなる被膜を被覆する。このとき、基材の表
面粗さの調整と、その基材の表面に被覆する被膜形成条
件により、被膜の表面粗さを調整することも可能であ
り、この場合には、後工程を省略することができて、か
つ寿命が向上するのに最適な被膜表面粗さにすることが
できることから好ましいことである。しかし、その被膜
の表面粗さは、調整範囲が狭いことから、被膜形成後
に、例えば従来から行われている微粒ダイヤモンドペー
ストによるラッピング法,金属酸化物との摩擦接触によ
る酸化法,熱腐食法などにより、被膜の表面粗さを調整
することも、特に好ましい。
Using the substrate whose surface roughness has been adjusted in this way, the diamond and / or diamond is added to the surface of the substrate by, for example, conventional microwave plasma chemical vapor deposition or high frequency plasma chemical vapor deposition. A coating made of diamond-like carbon is applied. At this time, it is also possible to adjust the surface roughness of the substrate by adjusting the surface roughness of the substrate and the conditions for forming the film to be coated on the surface of the substrate, and in this case, the post-process is omitted. This is preferable because the surface roughness of the coating film can be adjusted to an optimum value for improving the service life. However, since the surface roughness of the coating has a narrow adjustment range, after the coating is formed, for example, a conventional lapping method using a fine diamond paste, an oxidation method by frictional contact with a metal oxide, a hot corrosion method, etc. It is particularly preferable to adjust the surface roughness of the coating.

【0025】[0025]

【作用】本発明のダイヤモンド被覆硬質部材は、基材の
表面粗さを調整することにより、被膜の成膜時にダイヤ
モンドの核の発生を誘起させていること、良質な被膜を
生成させていること、基材表面の凹凸にクサビ状に被膜
がくい込んで基材と被膜との密着性,付着性を高めると
いう作用をしているものである。また、本発明のダイヤ
モンド被覆硬質部材は、被膜の表面粗さを調整すること
により、相手材料との摩擦抵抗を低減する作用をし、被
膜の表面粗さが基材の表面粗さと等しいか、または被膜
の表面粗さが基材の表面粗さより小さくすることによ
り、より一層の基材と被膜との密着性,付着性を高めて
いること、被膜の耐剥離性,部材の耐欠損性,耐チッピ
ング性を高めていること、切削工具として用いた場合に
相手材料である被削材の仕上げ面粗さを高めるという間
接的な作用をもしているものである。
The diamond-coated hard member of the present invention controls the surface roughness of the substrate to induce the generation of diamond nuclei during the formation of the coating, and to produce a high-quality coating. In addition, the coating is formed in a wedge-like manner into the unevenness of the surface of the base material, thereby increasing the adhesion and adhesion between the base material and the coating. Further, the diamond-coated hard member of the present invention, by adjusting the surface roughness of the coating, acts to reduce the frictional resistance with the mating material, the surface roughness of the coating is equal to the surface roughness of the substrate, Alternatively, by making the surface roughness of the coating smaller than the surface roughness of the base material, the adhesion and adhesion between the base material and the coating can be further improved, the peeling resistance of the coating, the fracture resistance of the member, It also has an indirect action of increasing chipping resistance and increasing the finished surface roughness of the work material which is the mating material when used as a cutting tool.

【0026】[0026]

【実施例1】市販されている平均粒径が約0.5〜2μ
mの各種粉末を用いて、表1に示した配合組成成分に秤
量し、混合粉砕,粉末成形および焼結(焼結条件、1×
10-2Torr,1400〜1600℃,50分間保
持)を行って形状および表面粗さがJIS規格のSNG
N120408に相当する焼結体の基材を得た。これら
の基材を用いて、表1に併記したアルカリ溶液中でそれ
ぞれの基材を陽極とし、銅板を陰極として、直流電流を
流して各基材の表面を電解腐食した。次いで、各基材表
面を洗浄,乾燥後、表1に併記した酸処理により各基材
表面を腐食した。次に、各基材は、ダイヤモンド砥粒に
よる表面の傷付け処理,洗浄,乾燥後、マイクロ波プラ
ズマCVD装置内に設置し、水素:200SCCM,メ
タン:1SCCM,圧力:40Torrの雰囲気中、マ
イクロ波出力:2.1kw,基材温度:950℃の条件
により、各基材表面にダイヤモンドの被膜を被覆して本
発明品1〜9を得た。
Example 1 A commercially available average particle size of about 0.5 to 2 μm
m, and weighed into the composition components shown in Table 1, mixed and pulverized, powder compacted and sintered (sintering conditions, 1 ×
10 -2 Torr, 1400-1600 ° C, 50 minutes) and the shape and surface roughness are SNG of JIS standard
A substrate of a sintered body corresponding to N120408 was obtained. Using these base materials, the surfaces of the respective base materials were electrolytically corroded by flowing a direct current with each base material serving as an anode and a copper plate serving as a cathode in the alkaline solution shown in Table 1. Next, after cleaning and drying each substrate surface, each substrate surface was corroded by the acid treatment described in Table 1. Next, each substrate is placed in a microwave plasma CVD apparatus after the surface is scratched by diamond abrasive grains, washed, and dried, and is subjected to microwave output in an atmosphere of hydrogen: 200 SCCM, methane: 1 SCCM, pressure: 40 Torr. : 2.1 kw, substrate temperature: 950 ° C, the surface of each substrate was coated with a diamond film to obtain products 1 to 9 of the present invention.

【0027】比較として、基材と被膜の表面粗さは、研
磨およびラッピングにより調整作製した基材の表面粗さ
と被膜の表面粗さとの比が本発明品から外れた比較品1
〜3、および基材表面におけるアルカリ溶液中での電解
腐食を行わなかったこと以外は、上述の本発明品と同様
に処理して比較品4〜6を得た。また、表面粗さが異な
る基材を用いた以外は、上述の本発明品と同様に処理し
て比較品7〜9を得た。
As a comparison, the surface roughness of the base material and the coating was adjusted by polishing and lapping.
Comparative products 4 to 6 were treated in the same manner as the product of the present invention described above, except that electrolytic corrosion in an alkaline solution on the substrate surface was not performed. Moreover, except that the base materials having different surface roughnesses were used, comparative products 7 to 9 were obtained by performing the same treatment as the above-described present invention product.

【0028】こうして得た本発明品1〜9および比較品
1〜9について、成膜後の基材の表面粗さおよび被膜の
表面粗さをランダムに5点測定し、それぞれの平均表面
粗さを求めて、その結果を表2に示した。また、本発明
品1〜9および比較品1〜9の被膜厚さは、約10μm
であった。さらに、引っ掻き硬さ試験機に相当する被膜
の耐剥離試験機を用いて、本発明品1〜9および比較品
1〜9の被膜がそれぞれ剥離する最大荷重を求めて表2
に併記した。次に、本発明品1〜9および比較品1〜9
を用いて、被削材:Al−18wt%Si合金,切削速
度:900m/min,送り:0.1mm,切り込み:
0.5mm,乾式切削という条件で旋削試験を行い、逃
げ面摩耗量が0.3mmまたは欠損,チッピングが発生
したときを寿命とし、寿命までの切削時間を求めて表2
に併記した。
With respect to the thus obtained inventive products 1 to 9 and comparative products 1 to 9, the surface roughness of the substrate after film formation and the surface roughness of the film were measured at five points at random, and the average surface roughness of each was measured. And the results are shown in Table 2. The coating thickness of each of the products 1 to 9 of the present invention and the comparative products 1 to 9 is about 10 μm.
Met. Further, the maximum load at which the films of the present invention products 1 to 9 and the comparative products 1 to 9 peeled off was determined using a film peeling resistance tester corresponding to the scratch hardness tester.
It was also described in. Next, products 1 to 9 of the present invention and comparative products 1 to 9
Work material: Al-18 wt% Si alloy, cutting speed: 900 m / min, feed: 0.1 mm, cutting depth:
A turning test was conducted under the conditions of 0.5 mm and dry cutting, and the life when the flank wear amount was 0.3 mm or when chipping or chipping occurred was defined as the life, and the cutting time until the life was calculated.
It was also described in.

【0029】[0029]

【表1】 [Table 1]

【0030】[0030]

【表2】 [Table 2]

【0031】[0031]

【実施例2】実施例1で用いた各種の粉末を、表3に示
した配合組成成分に秤量したこと、形状が直径6mm,
長さ80mmのドリルを基材としたこと、ドリルの刃先
先端から約20mmまでを、表3に併記した腐食溶液に
よる腐食および被膜の被覆を施したこと、被膜処理条件
が熱フィラメント装置,フィラメント:タングステン
線,水素:200SCCM,メタン:1SCCM,圧
力:30Torr,フィラメント温度:2000℃,基
材温度:900℃とした以外は、実施例1の本発明品1
〜9とほぼ同様にして本発明品10〜18を得た。
Example 2 Various powders used in Example 1 were weighed into the composition components shown in Table 3 and had a shape of 6 mm in diameter.
A drill having a length of 80 mm was used as a base material. Corrosion by a corrosive solution described in Table 3 and coating of the coating were performed from the tip of the drill to about 20 mm. Invention product 1 of Example 1 except that tungsten wire, hydrogen: 200 SCCM, methane: 1 SCCM, pressure: 30 Torr, filament temperature: 2000 ° C., and substrate temperature: 900 ° C.
Inventive products 10 to 18 were obtained in substantially the same manner as in Examples 9 to 9.

【0032】比較として、基材と被膜の表面粗さは、研
磨およびラッピングにより調整作製した基材の表面粗さ
と被膜の表面粗さとの比が本発明品から外れた比較品1
0〜12、および基材表面におけるアルカリ溶液中での
電解腐食を行わなかったこと以外は、上述の本発明品と
同様に処理して比較品13〜15を得た。また、表面粗
さが異なる基材を用いた以外は、上述の本発明品と同様
に処理して比較品16〜18を得た。
For comparison, the surface roughness of the base material and the coating was adjusted by polishing and lapping.
Comparative products 13 to 15 were obtained by treating in the same manner as the above-mentioned present invention product, except that electrolytic corrosion in an alkaline solution on the substrate surface was not performed. Also, except that a substrate having a different surface roughness was used, comparative products 16 to 18 were obtained by performing the same treatment as the above-mentioned inventive product.

【0033】こうして得た本発明品10〜18および比
較品10〜18について、成膜後の基材の表面粗さおよ
び被膜の表面粗さをランダムに5点測定し、それぞれの
平均表面粗さを求めて、その結果を表4に示し、実施例
1と同様にして被膜の耐剥離性を求めて表4に併記し
た。また、本発明品10〜18および比較品10〜18
の被膜厚さは、約10μmであった。次に、本発明品1
0〜18および比較品10〜18を用いて、被削材:A
l−30wt%Si合金,切削速度:230m/mi
n,回転当りの送り:0.2mm/rev,穴深さ:2
0mm,水溶性エマルジョンによる湿式切削という条件
で穴明け試験を行い、加工穴形状の不良,またはドリル
の欠損,チッピングが発生したときを寿命とし、寿命ま
での穴加工数を求めて表4に併記した。
With respect to the thus-obtained inventive products 10 to 18 and comparative products 10 to 18, the surface roughness of the base material and the surface roughness of the film after film formation were randomly measured at five points, and the average surface roughness of each was measured. And the results are shown in Table 4. In the same manner as in Example 1, the peeling resistance of the coating was determined and also shown in Table 4. The products 10 to 18 of the present invention and the comparative products 10 to 18
Was about 10 μm. Next, the product 1 of the present invention
Work material: A using No. 0-18 and Comparative products 10-18
1-30wt% Si alloy, cutting speed: 230m / mi
n, feed per rotation: 0.2 mm / rev, hole depth: 2
A hole drilling test was performed under the condition of 0 mm, wet cutting with a water-soluble emulsion, and when the shape of the machined hole was defective, or when the drill was chipped or chipped, the life was determined. did.

【0034】[0034]

【表3】 [Table 3]

【0035】[0035]

【表4】 [Table 4]

【0036】[0036]

【実施例3】表5に示した基材組成でなり、形状が直径
0.5mm,長さ50mmのミクロンドリルの基材を用
いて、ドリルの刃先先端から約5mmまでを表5に併記
したアルカリ溶液中の電解腐食および酸溶液による腐食
を施したこと、並びに熱フイラメント装置によりタング
ステン線をフイラメントとし、水素:200SCCM,
メタン:2SCCM,圧力:40Torrの雰囲気,フ
イラメント温度:1840℃,基材温度:950℃の条
件で被膜を被覆したこと以外は、ほぼ実施例1の本発明
品1〜9と同様に処理して本発明品19〜24を得た。
Example 3 Using a micron drill base material having the composition of the base material shown in Table 5 and having a diameter of 0.5 mm and a length of 50 mm, Table 5 also shows about 5 mm from the tip of the edge of the drill. Electrolytic corrosion in an alkaline solution and corrosion by an acid solution were performed, and a tungsten wire was made into a filament by a hot filament device. Hydrogen: 200 SCCM,
Except that the coating was applied under the conditions of methane: 2 SCCM, pressure: 40 Torr, filament temperature: 1840 ° C., and substrate temperature: 950 ° C., the treatment was performed in substantially the same manner as the products 1 to 9 of the present invention in Example 1. Products 19 to 24 of the present invention were obtained.

【0037】比較として、基材と被膜の表面粗さは、研
磨およびラッピングにより調整し、基材の表面は、アル
カリ溶液の電解腐食および酸溶液の腐食を行わずに、そ
の他はほぼ同様に処理し基材の表面粗さと被膜の表面粗
さとの比が本発明品から外れた比較品19〜20を得
た。また、基材は、表5に併記した組成のものを用い
て、この基材表面におけるアルカリ溶液中の電解腐食を
行わずに、酸溶液の腐食のみを行って、その他はほぼ同
様に処理して比較品21,22を得た。さらに、基材
は、表5に併記した組成であって、この基材の表面粗さ
が本発明品から外れるようにした基材を用いて、基材表
面におけるアルカリ溶液中の電解腐食および酸溶液の腐
食を行って、その他はほぼ同様に処理して比較品23,
24を得た。
As a comparison, the surface roughness of the substrate and the coating is adjusted by polishing and lapping, and the surface of the substrate is treated in the same manner without electrolytic corrosion of an alkaline solution and corrosion of an acid solution. Comparative products 19 to 20 were obtained in which the ratio between the surface roughness of the substrate and the surface roughness of the coating deviated from the product of the present invention. Further, the base material having the composition described in Table 5 was used, and only the corrosion of the acid solution was performed without performing the electrolytic corrosion in the alkaline solution on the surface of the base material. Thus, comparative products 21 and 22 were obtained. Further, the base material having the composition described in Table 5 was used, and the surface roughness of the base material was set so as to deviate from that of the product of the present invention. The solution was corroded, and the others were treated in substantially the same manner.
24 was obtained.

【0038】こうして得た本発明品19〜24および比
較品19〜24について、成膜後の基材の表面粗さおよ
び被膜の表面粗さを実施例1と同様に測定して、その結
果を表6に示し、実施例1と同様にして被膜の耐剥離性
を求めて表6に併記した。また、本発明品19〜24お
よび比較品21〜24の基材表面部における組成成分を
確認したところ、基材の表面から内部に向かって約2μ
m深さまでは結合相が減少または除去された状態となっ
ていた。また、被膜の厚さは、約5μmであった。次い
で、本発明品19〜24および比較品19〜24を用い
て、被削材:厚さ0.6mmのAlとCuを積層したプ
ラスチック製電子回路用プリント基板,切削速度:1.
4m/min,回転当りの送り:2μm/rev,穴深
さ:3mm,雰囲気:乾式切削という条件で、プリント
基板の穴明け試験を行い、加工穴形状が不良になったと
きを寿命とし、寿命までの穴加工数を求めて表6に併記
した。
With respect to the thus obtained inventive products 19 to 24 and comparative products 19 to 24, the surface roughness of the base material after film formation and the surface roughness of the coating film were measured in the same manner as in Example 1, and the results were obtained. The results are shown in Table 6 and the peel resistance of the coating film was determined in the same manner as in Example 1 and also shown in Table 6. In addition, when the composition components in the surface portions of the base materials of the products 19 to 24 of the present invention and the comparative products 21 to 24 were confirmed, about 2 μm from the surface of the substrate toward the inside.
At a depth of m, the binder phase was reduced or removed. Further, the thickness of the coating was about 5 μm. Next, using the products 19 to 24 of the present invention and the comparative products 19 to 24, a work material: a plastic electronic circuit printed circuit board having a thickness of 0.6 mm laminated with Al and Cu, and a cutting speed of 1.
Under the conditions of 4 m / min, feed per rotation: 2 μm / rev, hole depth: 3 mm, atmosphere: dry cutting, a drilling test was performed on the printed circuit board. Table 6 also shows the number of holes processed up to this point.

【0039】[0039]

【表5】 [Table 5]

【0040】[0040]

【表6】 [Table 6]

【0041】[0041]

【実施例4】実施例1で用いた各種の粉末を、表7に示
した配合組成成分に秤量したこと、形状が直径6mm,
長さ70mm,刃長30mmの4枚刃エンドミルの基材
としたこと、刃先先端から約30mmまでを、表7に併
記した腐食溶液による腐食および被膜の被覆を施したこ
と、被膜処理条件が熱フィラメント装置,フィラメン
ト:タングステン線,水素:250SCCM,メタン:
2.3SCCM,圧力:30Torr,フィラメント温
度:1860℃,基材温度:950℃とした以外は、実
施例1の本発明品1〜9とほぼ同様にして本発明品25
〜30を得た。
Example 4 Various powders used in Example 1 were weighed into the composition components shown in Table 7, and the powder having a diameter of 6 mm was obtained.
The base material of a 4-flute end mill having a length of 70 mm and a blade length of 30 mm was used. Corrosion and coating of the coating solution were performed from the tip of the blade up to about 30 mm with the corrosive solution described in Table 7; Filament device, filament: tungsten wire, hydrogen: 250 SCCM, methane:
2.3 Inventive product 25 in substantially the same manner as inventive products 1 to 9 of Example 1 except that the pressure was 30 Torr, the filament temperature was 1860 ° C., and the substrate temperature was 950 ° C.
~ 30 was obtained.

【0042】比較として、基材と被膜の表面粗さは、研
磨およびラッピングにより調整し、基材の表面は、アル
カリ溶液の電解腐食および酸溶液の腐食を行わずに、そ
の他はほぼ同様に処理し基材の表面粗さと被膜の表面粗
さとの比が本発明品から外れた比較品25〜26を得
た。また、基材表面におけるアルカリ溶液中での電解腐
食を行わなかったこと以外は、上述の本発明品と同様に
処理して比較品27〜28を得た。また、基材の表面粗
さが異なること以外は、上述の本発明品と同様に処理し
て比較品29〜30を得た。
As a comparison, the surface roughness of the substrate and the coating was adjusted by polishing and lapping, and the surface of the substrate was treated in substantially the same manner without electrolytic corrosion of an alkaline solution and corrosion of an acid solution. Comparative products 25 to 26 were obtained in which the ratio between the surface roughness of the base material and the surface roughness of the coating deviated from the product of the present invention. Moreover, except that the electrolytic corrosion in the alkaline solution on the base material surface was not performed, it processed similarly to the above-mentioned present invention product, and obtained comparative products 27-28. In addition, except that the surface roughness of the base material was different, the same treatment as that of the above-described present invention product was performed to obtain comparative products 29 to 30.

【0043】こうして得た本発明品25〜30および比
較品25〜30について、成膜後の基材の表面粗さおよ
び被膜の表面粗さをランダムに5点測定し、それぞれの
平均表面粗さを求めて、その結果を表8に示し、実施例
1と同様にして被膜の耐剥離性を求めて表8に併記し
た。また、本発明品25〜30および比較品25〜30
の被膜厚さは、約15μmであった。次に、本発明品2
5〜30および比較品25〜30を用いて、被削材:C
/Cコンポジット,工具突出し:30mm,切削速度:
90m/min,切込み:軸方向6mm−半径方向2m
m,刃当りの送り:0.02mm/rev,乾式切削と
いう条件でエンドミルの切削試験を行い、逃げ面摩耗幅
が0.2mmになったときを寿命とし、寿命までの加工
長を求めて表8に併記した。
With respect to the thus obtained inventive products 25 to 30 and comparative products 25 to 30, the surface roughness of the base material and the surface roughness of the film after film formation were randomly measured at five points, and the average surface roughness of each film was measured. And the results are shown in Table 8. In the same manner as in Example 1, the peeling resistance of the coating was determined and also shown in Table 8. In addition, the product of the present invention 25-30 and the comparative product 25-30
Had a coating thickness of about 15 μm. Next, the product 2 of the present invention
Work material: C using 5 to 30 and comparative products 25 to 30
/ C composite, tool overhang: 30 mm, cutting speed:
90m / min, depth of cut: 6mm in axial direction-2m in radial direction
m, feed per tooth: 0.02 mm / rev, dry cutting, end mill cutting test. When the flank wear width reaches 0.2 mm, the service life is calculated. 8

【0044】[0044]

【表7】 [Table 7]

【0045】[0045]

【表8】 [Table 8]

【0046】[0046]

【実施例5】実施例1で用いた各種の粉末を、表9に示
した配合組成成分に秤量したこと、形状が直径6mm,
長さ70mm,刃長30mmの4枚刃エンドミルの基材
としたこと、刃先先端から約30mmまでを、表9に併
記した腐食溶液による腐食および被膜の被覆を施したこ
と、被膜処理条件が熱フィラメント装置,フィラメン
ト:タングステン線,水素:250SCCM,メタン:
2.3SCCM,圧力:30Torr,フィラメント温
度:1860℃,基材温度:950℃とした以外は、実
施例1の本発明品1〜9とほぼ同様にして本発明品31
〜38を得た。
Example 5 Various powders used in Example 1 were weighed into the composition components shown in Table 9 and the shape was 6 mm in diameter.
The base material of a four-flute end mill having a length of 70 mm and a blade length of 30 mm was used. Corrosion with a corrosion solution and a coating of the coating from Table 1 to about 30 mm from the tip of the cutting edge were performed. Filament device, filament: tungsten wire, hydrogen: 250 SCCM, methane:
Inventive product 31 in substantially the same manner as inventive products 1 to 9 of Example 1 except that 2.3 SCCM, pressure: 30 Torr, filament temperature: 1860 ° C, and substrate temperature: 950 ° C
~ 38 was obtained.

【0047】比較として、基材と被膜の表面粗さは、研
磨およびラッピングにより調整し、基材の表面は、アル
カリ溶液の電解腐食および酸溶液の腐食を行わずに、そ
の他はほぼ同様に処理し基材の表面粗さと被膜の表面粗
さとの比が本発明品から外れた比較品31〜34を得
た。また、基材の表面粗さが異なること以外は、上述の
本発明品と同様に処理して比較品35〜38を得た。
As a comparison, the surface roughness of the substrate and the coating was adjusted by polishing and lapping, and the surface of the substrate was treated in substantially the same manner without electrolytic corrosion of an alkaline solution and corrosion of an acid solution. Comparative products 31 to 34 having ratios of the surface roughness of the base material to the surface roughness of the coating film deviated from those of the present invention. Also, except that the surface roughness of the base material was different, the same treatment as that of the above-described present invention was performed to obtain comparative products 35 to 38.

【0048】こうして得た本発明品31〜38および比
較品31〜38について、成膜後の基材の表面粗さおよ
び被膜の表面粗さをランダムに5点測定し、それぞれの
平均表面粗さを求めて、その結果を表10に示し、実施
例1と同様にして被膜の耐剥離性を求めて表10に併記
した。た。また、本発明品31〜38および比較品31
〜38の被膜厚さは、約10μmであった。次に、本発
明品31〜38および比較品31〜38を用いて、被削
材:C/Cコンポジット,工具突出し:30mm,切削
速度:90m/min,切込み:軸方向6mm−半径方
向2mm,刃当りの送り:0.02mm/rev,乾式
切削という条件でエンドミルの切削試験を行い、逃げ面
摩耗幅が0.2mmになったときを寿命とし、寿命まで
の加工長を求めて表10に併記した。
With respect to the products 31 to 38 of the present invention and the comparative products 31 to 38 thus obtained, the surface roughness of the substrate after film formation and the surface roughness of the film were measured at five points at random, and the average surface roughness of each of them was measured. And the results are shown in Table 10. In the same manner as in Example 1, the peeling resistance of the coating was determined and also shown in Table 10. Was. In addition, products 31 to 38 of the present invention and comparative product 31
The film thickness of 3838 was about 10 μm. Next, using the products 31 to 38 of the present invention and the comparative products 31 to 38, a work material: C / C composite, a tool protrusion: 30 mm, a cutting speed: 90 m / min, a cutting depth: 6 mm in an axial direction-2 mm in a radial direction, End mill cutting test was performed under the conditions of feed per tooth: 0.02 mm / rev and dry cutting, and the life when the flank wear width became 0.2 mm was defined as the life, and the processing length up to the life was calculated and shown in Table 10. Also described.

【0049】[0049]

【表9】 [Table 9]

【0050】[0050]

【表10】 [Table 10]

【0051】[0051]

【実施例6】市販されているMo板,Si板および窒化
珪素基焼結体を基材とし、これらの基材の表面を研磨,
ラッピングおよび腐食処理により調整し、各種の表面粗
さでなる基材を作製した後、実施例1の本発明品1〜9
とほぼ同様に処理して基材表面にダイヤモンド被膜を被
覆し、それぞれの被膜表面を、ダイヤモンドペーストに
よるラッピング,酸化鉄粉末との加熱摩擦による酸化拡
散処理を施して、被膜表面の面粗さを調整した。こうし
て基材表面粗さと被膜表面粗さとを調整したダイヤモン
ド被覆部材について、実施例1の耐剥離性試験と同様に
して被膜の耐剥離性を確認した結果、基材表面粗さと被
膜表面粗さとその両者の比は、実施例1の本発明品1〜
9と比較品1〜9との関係とほぼ同様の傾向が見られ
た。
Embodiment 6 A commercially available Mo plate, Si plate and silicon nitride-based sintered body were used as base materials, and the surfaces of these base materials were polished and polished.
After adjusting by lapping and corrosion treatment to produce substrates having various surface roughnesses, the products 1 to 9 of the present invention of Example 1 were prepared.
The surface of the base material is coated with a diamond film by applying the same procedure as described above, and the surface of each film is subjected to lapping with a diamond paste and oxidation diffusion treatment by heating friction with iron oxide powder to reduce the surface roughness of the film surface. It was adjusted. As a result of confirming the peeling resistance of the coating in the same manner as in the peeling resistance test of Example 1, the diamond-coated member having the substrate surface roughness and the coating surface roughness adjusted as a result showed that the substrate surface roughness, the coating surface roughness and the The ratio of the two is the present invention product 1 of Example 1.
Almost the same tendency as the relationship between No. 9 and Comparative products 1 to 9 was observed.

【0052】[0052]

【発明の効果】本発明のダイヤモンド被覆硬質部材は、
基材と被膜との表面粗さ比が本願発明の範囲から外れた
比較品、表面を酸腐食処理した基材の表面にダイヤモン
ドの被膜を被覆した本発明の範囲から外れた比較品、お
よび表面をアルカリ溶液と酸溶液による腐食処理した基
材の表面にダイヤモンドの被膜を被覆した本発明の範囲
から外れた比較品に比べて、成膜時にはダイヤモンドの
核が容易にかつ多量に形成できること、成膜後には被膜
と基材との付着性および密着性がすぐれていること、そ
の成膜された膜質がすぐれていること(不純物含有量が
少い)、しかも基材との付着性および密着性がすぐれて
いることから被膜厚さを厚く被覆することが可能となる
こと、さらに被膜の表面粗さが基材の表面粗さよりも小
さくなっていることから、実用時において相手材料との
摩擦が小さく、耐摩耗性,耐剥離性,耐チッピング性を
高めること、相手材料の損傷を抑制するという効果があ
る。これらのことから、本発明のダイヤモンド被覆硬質
部材は、工具材料として用いることが可能であること、
工具材料の中でも切削工具として用いることが可能であ
ること、切削工具の中でも最も過酷な回転工具、具体的
には、例えばエンドミル,ドリル,プリント基板用ミク
ロンドリル,フライス用切削チップ,リーマとして用い
ると長寿命になるというすぐれた効果が発揮される。さ
らに、各種の基材に応用できることから、本発明のダイ
ヤモンド被覆硬質部材は、電子機器,精密機器,化学機
器,医療機器などに使用される部品としても実用できる
という効果が期待される。
The diamond-coated hard member of the present invention has the following features.
A comparative product whose surface roughness ratio between the substrate and the coating deviates from the range of the present invention, a comparative product which deviates from the range of the present invention in which the surface of the substrate whose surface is subjected to acid corrosion treatment is coated with a diamond film, and a surface Can be formed easily and in large quantities at the time of film formation as compared with a comparative product which is out of the range of the present invention, in which the surface of a substrate which has been subjected to corrosion treatment with an alkali solution and an acid solution is coated with a diamond film. After film formation, excellent adhesion and adhesion between the film and substrate, excellent film quality (low impurity content), and adhesion and adhesion to substrate It is possible to coat a thick coating film because of its superiority, and since the surface roughness of the coating is smaller than the surface roughness of the base material, friction with the mating material during practical use is reduced. Small and resistant耗性, peel resistance, to improve the chipping resistance, the effect of suppressing the damage of the counter material. From these, the diamond-coated hard member of the present invention can be used as a tool material,
It can be used as a cutting tool among tool materials, and the most severe rotating tool among cutting tools, specifically, for example, when used as an end mill, drill, micron drill for printed circuit board, cutting tip for milling, reamer An excellent effect of long life is exhibited. Furthermore, since it can be applied to various base materials, the effect that the diamond-coated hard member of the present invention can be used as a part used in electronic equipment, precision equipment, chemical equipment, medical equipment, and the like is expected.

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 基材の上にダイヤモンドおよび/または
ダイヤモンド状カーボンの被膜を被覆したダイヤモンド
被覆硬質部材において、該被膜に隣接する該基材の平均
表面粗さがRa表示において0.1μm〜2.5μmに
調整されており、該被膜の平均表面粗さがRa表示にお
いて1.5μm以下に調整されており、かつ該被膜の平
均表面粗さをRa(c)と表示し、該基材の平均表面粗
さをRa(s)と表示したときに、Ra(c)≦Ra
(s)であることを特徴とする表面粗さを調整したダイ
ヤモンド被覆硬質部材。(但し、Raは、日本工業規格
JIS B0601に記載の内容に準ずる)
1. A diamond-coated hard member having a substrate coated with a coating of diamond and / or diamond-like carbon, wherein the average surface roughness of the substrate adjacent to the coating is 0.1 μm to 2 in Ra. 0.5 μm, the average surface roughness of the coating is adjusted to 1.5 μm or less in Ra display, and the average surface roughness of the coating is indicated as Ra (c). When the average surface roughness is expressed as Ra (s), Ra (c) ≦ Ra
(S) A diamond-coated hard member having a controlled surface roughness. (However, Ra conforms to the contents described in Japanese Industrial Standard JIS B0601)
【請求項2】 上記被膜は、プラズマ化学蒸着法,化学
蒸着法により被覆されたものであることを特徴とする請
求項1記載の表面粗さを調整したダイヤモンド被覆硬質
部材。
2. The diamond-coated hard member with adjusted surface roughness according to claim 1, wherein said coating is coated by a plasma chemical vapor deposition method or a chemical vapor deposition method.
【請求項3】 上記被膜の平均表面粗さは、Ra=0.
1〜1.0μmであることを特徴とする請求項1または
2記載の表面粗さを調整したダイヤモンド被覆硬質部
材。
3. The average surface roughness of the coating is Ra = 0.
The diamond-coated hard member having a controlled surface roughness according to claim 1 or 2, wherein the thickness is 1 to 1.0 µm.
【請求項4】 上記被膜は、平均膜厚さが1〜15μm
であることを特徴とする請求項1,2または3記載の表
面粗さを調整したダイヤモンド被覆硬質部材。
4. The coating has an average thickness of 1 to 15 μm.
4. The diamond-coated hard member with adjusted surface roughness according to claim 1, 2 or 3.
【請求項5】 上記基材は、超硬合金でなる焼結合金ま
たは炭化タングステン,炭化珪素,窒化珪素の中の少な
くとも1種を主成分とするセラミックス焼結体、または
超硬合金からなることを特徴とする請求項1,2,3ま
たは4記載の表面粗さを調整したダイヤモンド被覆硬質
部材。
5. The base material is made of a sintered alloy made of a cemented carbide, a ceramic sintered body mainly containing at least one of tungsten carbide, silicon carbide, and silicon nitride, or a cemented carbide. 5. The diamond-coated hard member having the adjusted surface roughness according to claim 1, 2, 3, or 4.
【請求項6】 上記基材は、該基材の表面をアルカリ溶
液中での電解処理と酸腐食処理により調整してあること
を特徴とする請求項5記載の表面粗さを調整したダイヤ
モンド被覆硬質部材。
6. The diamond coating of claim 5, wherein the surface of the substrate is adjusted by electrolytic treatment in an alkaline solution and acid corrosion treatment. Hard member.
【請求項7】 上記ダイヤモンド被覆硬質部材は、切削
工具として用いられることを特徴とする請求項1,2,
3,4,5または6記載の表面粗さを調整したダイヤモ
ンド被覆硬質部材。
7. The diamond-coated hard member is used as a cutting tool.
A diamond-coated hard member having a surface roughness adjusted to 3, 4, 5 or 6.
JP10810197A 1997-04-10 1997-04-10 Diamond-coated hard member having regulated surface roughness Pending JPH10287491A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10810197A JPH10287491A (en) 1997-04-10 1997-04-10 Diamond-coated hard member having regulated surface roughness

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10810197A JPH10287491A (en) 1997-04-10 1997-04-10 Diamond-coated hard member having regulated surface roughness

Publications (1)

Publication Number Publication Date
JPH10287491A true JPH10287491A (en) 1998-10-27

Family

ID=14475907

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10810197A Pending JPH10287491A (en) 1997-04-10 1997-04-10 Diamond-coated hard member having regulated surface roughness

Country Status (1)

Country Link
JP (1) JPH10287491A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006521466A (en) * 2003-03-21 2006-09-21 コムコン・アーゲー Object having a smooth diamond layer, apparatus and method therefor
WO2007111293A1 (en) 2006-03-28 2007-10-04 Sumitomo Metal Industries, Ltd. Cutting tool and process for manufacturing the same
CN100387385C (en) * 2003-07-31 2008-05-14 联合材料公司 Diamond film coated tool and process for producing the same
JP2010030015A (en) * 2008-07-31 2010-02-12 Tocalo Co Ltd Carrier for holding polishing material and manufacturing method therefor
JP2010030013A (en) * 2008-07-31 2010-02-12 Tocalo Co Ltd Carrier for holding polishing material and manufacturing method therefor
JP2010030014A (en) * 2008-07-31 2010-02-12 Tocalo Co Ltd Method for manufacturing carrier for holding polishing material
JP2011038150A (en) * 2009-08-11 2011-02-24 Sumitomo Electric Ind Ltd Diamond coated tool
US11267033B2 (en) * 2015-12-01 2022-03-08 Toyo Seikan Group Holdings, Ltd. Mold and method for manufacturing drawn can

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006521466A (en) * 2003-03-21 2006-09-21 コムコン・アーゲー Object having a smooth diamond layer, apparatus and method therefor
CN100387385C (en) * 2003-07-31 2008-05-14 联合材料公司 Diamond film coated tool and process for producing the same
WO2007111293A1 (en) 2006-03-28 2007-10-04 Sumitomo Metal Industries, Ltd. Cutting tool and process for manufacturing the same
US7704593B2 (en) 2006-03-28 2010-04-27 Sumitomo Metal Industries, Ltd. Cutting tool and method of producing the same
JP2010030015A (en) * 2008-07-31 2010-02-12 Tocalo Co Ltd Carrier for holding polishing material and manufacturing method therefor
JP2010030013A (en) * 2008-07-31 2010-02-12 Tocalo Co Ltd Carrier for holding polishing material and manufacturing method therefor
JP2010030014A (en) * 2008-07-31 2010-02-12 Tocalo Co Ltd Method for manufacturing carrier for holding polishing material
JP2011038150A (en) * 2009-08-11 2011-02-24 Sumitomo Electric Ind Ltd Diamond coated tool
JP4690479B2 (en) * 2009-08-11 2011-06-01 住友電気工業株式会社 Diamond coated tools
US9302327B2 (en) 2009-08-11 2016-04-05 Sumitomo Electric Industries, Ltd. Diamond coated tool
US9731355B2 (en) 2009-08-11 2017-08-15 Sumitomo Electric Industries, Ltd. Diamond coated tool
US11267033B2 (en) * 2015-12-01 2022-03-08 Toyo Seikan Group Holdings, Ltd. Mold and method for manufacturing drawn can

Similar Documents

Publication Publication Date Title
US8481145B2 (en) Sintered cubic boron nitride tool
JP2004223711A (en) Cutting tool insert
JP2006281363A (en) Surface coated member and surface coated cutting tool
JP2004100004A (en) Coated cemented carbide and production method therefor
JP3016703B2 (en) Coated hard member
JPH10287491A (en) Diamond-coated hard member having regulated surface roughness
JP3452615B2 (en) Cemented carbide, hard carbon film coated cemented carbide, method for producing cemented carbide, and tool using these alloys
JP4351521B2 (en) Surface coated cutting tool
JP3250414B2 (en) Method for producing cutting tool coated with titanium carbonitride layer surface
JP2007268656A (en) Cutting tool and manufacturing method thereof
JP3419140B2 (en) Surface coated cutting tool
JPH10130092A (en) Diamond coated sintered alloy
JP3519260B2 (en) Hard member coated with diamond film with excellent peel resistance
JP3198636B2 (en) Cutting tool made of cemented carbide with graded hard layer coating
JPH10226597A (en) Diamond-clad hard member
JPH0353070A (en) Surface coated tool member having excellent wear resistance
JP2001220268A (en) Coated tool made of cubic boron nitride-containing sintered material
JP4484500B2 (en) Surface coated cutting tool
JP2005028520A (en) Hard film coated tool
JP3174464B2 (en) Gas phase synthetic diamond coated sintered body
JP2657235B2 (en) Coated super hard alloy tool
JP2657236B2 (en) Coated super hard alloy tool
JPH08118109A (en) Surface-coated cemented carbide alloy cutting tool with tungsten carbide group having carbonaceous hard coated layer excellent in adhesion
JPH0929508A (en) High tenacity surface-coated hard metal
JP2779531B2 (en) Diamond coated tungsten carbide based sintered body

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20040405

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20061207

A131 Notification of reasons for refusal

Effective date: 20061211

Free format text: JAPANESE INTERMEDIATE CODE: A131

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20070403