JPH10282508A - Production of liquid crystal display device - Google Patents

Production of liquid crystal display device

Info

Publication number
JPH10282508A
JPH10282508A JP9336397A JP9336397A JPH10282508A JP H10282508 A JPH10282508 A JP H10282508A JP 9336397 A JP9336397 A JP 9336397A JP 9336397 A JP9336397 A JP 9336397A JP H10282508 A JPH10282508 A JP H10282508A
Authority
JP
Japan
Prior art keywords
liquid crystal
substrate
base
sealants
substrates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9336397A
Other languages
Japanese (ja)
Inventor
Hideo Yamanaka
英雄 山中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP9336397A priority Critical patent/JPH10282508A/en
Publication of JPH10282508A publication Critical patent/JPH10282508A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a process for producing a liquid crystal display device with which liquid crystal gap control is facilitated, image quality is improved and a cost is reduced. SOLUTION: A liquid crystal drive substrate 1 formed with circuits and pixel parts 4 consisting of polysilicon thin-film transistors and a counter substrate 2 formed with counter electrodes are superposed to face each other and thereafter, the respective substrates are divided, by which individual liquid crystal panel parts are formed. A plurality of sealants 9 are first applied on the inside surface of the liquid crystal driving substrate 1 or the counter substrate 2 in the state of forming liquid crystal injection ports 9a and outer peripheral sealants 10 are applied in the state of enclosing the outermost peripheral of a region where the liquid crystal sealants 9 line up. Next, these substrates 1, 2 are superposed on each other via the liquid crystal sealants 9 and the outer peripheral sealants 10. The respective outside surfaces of the substrates 1, 2 are optically polished in the state of superposing the substrates on each other and, thereafter, the substrates 1, 2 are broken and divided by a half cut dicing treatment, by which the plural liquid crystal panel parts are formed.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、複数の液晶駆動回
路および画素開口部が形成された液晶駆動基体と、複数
の対向電極が形成された対向基体とを重ね合わせた後、
各基体を分割して個々の液晶パネル部品を形成する液晶
表示装置の製造方法に関する。
BACKGROUND OF THE INVENTION The present invention relates to a liquid crystal display device having a plurality of liquid crystal driving circuits and pixel openings formed thereon, and a counter substrate having a plurality of counter electrodes formed thereon.
The present invention relates to a method for manufacturing a liquid crystal display device in which individual substrates are divided to form individual liquid crystal panel components.

【0002】[0002]

【従来の技術】液晶表示装置の製造方法としては、従
来、基体の分割を行った後に重ね合わせを行ういわゆる
単個組立て方式と、基体の重ね合わせを行った後に分割
を行ういわゆる面面組立て方式とがある。単個組立て方
式では、まず、ガラス基体に液晶駆動用回路と画素開口
部の液晶用薄膜トランジスタ等をマトリクス状に形成し
(以下、単にTFTと称する)、ダイシング等によって
個々の基板に、すなわち単個に分割した液晶駆動基板
に、配向膜の塗布およびラビング処理と洗浄を施し、コ
モン剤の塗布を行う。また、他のガラス基体に対向電極
およびカラーフィルタ等を形成し、ダイシング等によっ
て個々の基板に、すなわち単個に分割した対向基板に配
向膜の塗布およびラビング処理と洗浄を施す。その後、
この対向基板にシール剤を塗布し、双方を重ね合わせて
液晶パネル部品を形成する。
2. Description of the Related Art As a method of manufacturing a liquid crystal display device, there are conventionally known a so-called single-assembly method in which a substrate is divided and then superposed, and a so-called surface-assembly method in which a substrate is superposed and divided. There is. In the single unit assembling method, first, a liquid crystal driving circuit and a liquid crystal thin film transistor in a pixel opening are formed in a matrix on a glass substrate (hereinafter simply referred to as a TFT), and the individual substrates are formed by dicing or the like. An alignment film is applied, rubbed and washed on the divided liquid crystal driving substrate, and a common agent is applied. In addition, a counter electrode, a color filter, and the like are formed on another glass substrate, and an individual substrate, that is, a single divided counter substrate is coated with an alignment film, rubbed, and washed by dicing or the like. afterwards,
A liquid crystal panel component is formed by applying a sealant to the counter substrate and superposing the two on each other.

【0003】一方、面面組立て方式では、まず、分割す
る前のガラス基体に複数のTFTを形成し、配向膜の塗
布およびラビング処理、洗浄、コモン剤の塗布を施す。
また、分割する前の他のガラス基体に対向電極、カラー
フィルタおよび配向膜の塗布、ラビング処理、洗浄、シ
ール剤の塗布を施す。次いで、各ガラス基体を重ね合わ
せ、その後これを分割して個々の液晶パネル部品を形成
する。
On the other hand, in the surface assembling method, first, a plurality of TFTs are formed on a glass substrate before being divided, and an alignment film is applied, rubbed, washed, and a common agent is applied.
Further, the other glass substrate before division is coated with a counter electrode, a color filter and an alignment film, rubbed, washed, and coated with a sealant. Next, the respective glass substrates are overlapped with each other, and then divided to form individual liquid crystal panel components.

【0004】[0004]

【発明が解決しようとする課題】ところで、このような
製造方法において、TFTを形成する側の基体、すなわ
ち液晶駆動基体については、TFT形成のための半導体
技術による種々の処理、例えばリソグラフィー、CV
D、エッチング、スパッタ等の半導体技術による処理が
なされる。このような処理のうち、特にCVDやスパッ
タなどによる成膜処理では、通常、基体におけるTFT
形成面だけでなく、その反対側のガラス面(外面)にも
成膜されてしまい、さらには前記各処理によって外面に
キズや汚れが生じてしまう。
By the way, in such a manufacturing method, the substrate on which the TFT is formed, that is, the liquid crystal driving substrate, is subjected to various processes by semiconductor technology for forming the TFT, for example, lithography and CV.
Processing by semiconductor technology such as D, etching, and sputtering is performed. Among such processes, in particular, in a film forming process by CVD, sputtering, or the like, a TFT on a substrate is usually used.
A film is formed not only on the formation surface, but also on the glass surface (outer surface) on the opposite side, and furthermore, the above-described processing causes scratches and stains on the outer surface.

【0005】特に、液晶駆動基体が多結晶シリコン薄膜
トランジスタを形成した基体(以下、ポリSiTFT基
体と略称する)である場合には、絶縁膜と半導体膜とを
プラズマCVDで連続成膜することが多いことなどか
ら、外面にポリシリコンやPSG(リンシリケートガラ
ス)等のTFT構成薄膜が形成されてしまうのである。
しかして、このように液晶駆動基体がポリSiTFT基
体である場合、特に最終的に形成する液晶表示装置が透
過型であるときには、前記外面に形成される膜は不要で
あり、これが透光性を損なうことになってしまうため途
中工程で除去しなくてはならない。
In particular, when the liquid crystal driving substrate is a substrate on which a polycrystalline silicon thin film transistor is formed (hereinafter, simply referred to as a poly-Si TFT substrate), an insulating film and a semiconductor film are often continuously formed by plasma CVD. For this reason, a TFT constituting thin film such as polysilicon or PSG (phosphorus silicate glass) is formed on the outer surface.
Thus, when the liquid crystal driving substrate is a poly-Si TFT substrate, particularly when the finally formed liquid crystal display device is of a transmission type, the film formed on the outer surface is unnecessary, and this reduces light transmission. It must be removed in the middle of the process because it will be damaged.

【0006】しかしながら、このように外面に形成され
る膜を除去すると、この膜除去処理に起因して該ポリS
iTFT基体に形成されるTFT構成薄膜の圧縮応力に
よる凹状の反りが大きくなってしまい、その後の工程に
おいて例えばリソグラフィー精度や重ね合わせの液晶ギ
ャップムラ等悪影響を与えてしまう。そして、このよう
にポリSiTFT基体の凹状反りが大きくなると、対向
基板との重ね合わせでの液晶ギャップ制御が難しくな
り、光透過率の低下、コントラストの低下など、画質低
下を招いてしまう。
[0006] However, when the film formed on the outer surface is removed in this manner, the poly-S
The concave warpage due to the compressive stress of the TFT constituent thin film formed on the iTFT base becomes large, and adverse effects such as lithography accuracy and non-uniformity of liquid crystal gap in superposition are caused in subsequent steps. When the concave warpage of the poly-Si TFT substrate becomes large, it becomes difficult to control the liquid crystal gap when the poly-Si TFT substrate is superimposed on the counter substrate, resulting in deterioration of image quality such as reduction of light transmittance and reduction of contrast.

【0007】また、このような外面に形成された膜を除
去した後、各種の処理によって該外面にキズや汚れが生
じた場合、これが画質不良を招いてしまう。したがっ
て、従来では良否選別後、得られた不良液晶パネル部品
を1個ずつ光学研磨加工し、外面のキズや汚れを除去し
ているものの、結果としてこれが工数増加を招き、コス
トアップの一因となっている。
Further, if the outer surface is scratched or stained by various processes after removing the film formed on the outer surface, this leads to poor image quality. Therefore, in the past, after quality screening, the obtained defective liquid crystal panel parts were optically polished one by one to remove scratches and dirt on the outer surface. However, this resulted in an increase in man-hours, which contributed to an increase in cost. Has become.

【0008】一方、対向電極やカラーフィルタを形成す
る側の基体、すなわち対向基体についても、液晶駆動基
体の場合と同様に半導体プロセス技術による種々の処理
がなされており、したがってこの対向基体にも、その外
面にレジスト汚れやキズ等が生じる。よって、この対向
基体についても、最終工程にて内面を保護した状態で外
面を光学研磨し、レジスト汚れやキズを除去している
が、このため、工数増加によりやはりコストアップを招
いている。
On the other hand, the substrate on which the counter electrode and the color filter are to be formed, that is, the opposite substrate is also subjected to various treatments by the semiconductor process technology as in the case of the liquid crystal driving substrate. Resist stains, scratches, and the like occur on the outer surface. Therefore, the outer surface of this opposing substrate is optically polished while the inner surface is protected in the final step to remove resist stains and flaws. However, the number of steps increases the cost.

【0009】本発明は前記事情に鑑みてなされたもの
で、その目的とするところは、液晶ギャップ制御を容易
にして画質の向上を図ることができ、また、コストダウ
ンをも図ることのできる液晶表示装置の製造方法を提供
することにある。
The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a liquid crystal display device that can easily control a liquid crystal gap to improve image quality and reduce costs. An object of the present invention is to provide a method for manufacturing a display device.

【0010】[0010]

【課題を解決するための手段】本発明の液晶表示装置の
製造方法では、多結晶シリコン薄膜トランジスタからな
る液晶駆動回路及び画素開口部を複数形成した液晶駆動
基体と、対向電極を複数形成した対向基体とを対向さ
せ、重ね合わせた後、各基体を分割することによって個
々の液晶パネル部品を形成するに際し、まず、前記液晶
駆動基体または対向基体の内面に、液晶の注入口を形成
した状態に液晶シール剤を複数塗布するとともに、複数
の液晶シール剤が並ぶ領域の最外周を囲む状態に外周シ
ール剤を塗布し、かつ前記液晶駆動基体の所定位置にコ
モン剤を塗布し、次に、前記液晶駆動基体と前記対向基
体とを前記液晶シール剤および前記外周シール剤を介し
て重ね合わせ、次いで、これら液晶駆動基体と対向基体
とを重ね合わした状態でそれぞれの基体の外面を光学研
磨し、その後、前記液晶駆動基体と前記対向基体とをハ
ーフカットダイシングとブレークすることによって分割
し、複数の液晶パネル部品を形成することを前記課題の
解決手段とした。
According to a method of manufacturing a liquid crystal display device of the present invention, a liquid crystal driving circuit comprising a polycrystalline silicon thin film transistor and a liquid crystal driving substrate having a plurality of pixel openings formed therein, and a counter substrate having a plurality of counter electrodes formed thereon. When the individual liquid crystal panel components are formed by dividing each substrate after superimposing and superimposing, first, the liquid crystal is placed in a state where a liquid crystal injection port is formed on the inner surface of the liquid crystal driving substrate or the opposite substrate. A plurality of sealants are applied, an outer periphery sealant is applied so as to surround an outermost periphery of a region where a plurality of liquid crystal sealants are arranged, and a common agent is applied to a predetermined position of the liquid crystal driving base. A state in which the driving substrate and the opposing substrate are overlapped with each other via the liquid crystal sealing agent and the outer peripheral sealing agent, and then the liquid crystal driving substrate and the opposing substrate are overlapped. The method of solving the above problem is to optically polish the outer surface of each of the substrates, and then divide the liquid crystal driving substrate and the opposite substrate by half-cut dicing and breaking to form a plurality of liquid crystal panel components. did.

【0011】この製造方法によれば、液晶シール剤が並
ぶ領域の最外周を囲む状態に外周シール剤を塗布し、液
晶駆動基体と対向基体とを重ね合わしているので、その
後の光学研磨処理のときやハーフカットダイシング処理
の際に、各基体の内面を保護する必要がなく、また、こ
れらの処理に使用される水が液晶シール剤の並ぶ領域に
浸入することも防止される。また、それぞれの基体の外
面を光学研磨するに先立って、すなわち液晶駆動基体に
大きな凹状の反りが生じる前に液晶駆動基体と対向基体
とをシール剤を介して重ね合わしているので、これら液
晶駆動基体と対向基体との間の液晶ギャップ制御が容易
になる。
According to this manufacturing method, the outer periphery sealing agent is applied so as to surround the outermost periphery of the region where the liquid crystal sealing agents are arranged, and the liquid crystal driving base and the opposing base are overlapped. It is not necessary to protect the inner surface of each substrate at the time of the half-cut dicing process, and it is also possible to prevent water used in these processes from entering the region where the liquid crystal sealant is arranged. Further, prior to optically polishing the outer surfaces of the respective substrates, that is, before the liquid crystal driving substrate has a large concave warp, the liquid crystal driving substrate and the opposing substrate are overlapped with a sealant interposed therebetween. The liquid crystal gap between the base and the opposing base can be easily controlled.

【0012】また、両基体を重ね合わせた後光学研磨を
するまで、石英ガラスに比べて低抵抗のポリシリコンや
PSG等からなる積層膜が液晶駆動基体の外面にそのま
ま残っていることにより、例えばセル作製工程における
ラビング処理などにおいても静電気ダメージを受けにく
くなる。さらに、液晶駆動基体と対向基体とをシール剤
を介して重ね合わした後、それぞれの基体の外面を光学
研磨するので、これら液晶駆動基体の外面と対向基体の
外面とを同時に処理することができ、したがって工数の
低減が可能になる。なお、外面のキズが数μmの場合
は、光学研磨処理でよいが、10μm前後の深いキズの
場合は、ラッピングした後に光学研磨することが、工数
低減の面からよい。
In addition, a laminated film made of polysilicon, PSG, or the like having a lower resistance than quartz glass remains on the outer surface of the liquid crystal driving substrate until the two substrates are overlapped and optically polished. Even in a rubbing process or the like in a cell manufacturing process, it is hard to receive electrostatic damage. Furthermore, after the liquid crystal driving substrate and the opposing substrate are overlapped with each other via the sealant, the outer surfaces of the respective substrates are optically polished, so that the outer surface of the liquid crystal driving substrate and the outer surface of the opposing substrate can be simultaneously processed, Therefore, the number of steps can be reduced. In addition, when the scratch on the outer surface is several μm, optical polishing may be performed. However, when the scratch is as deep as about 10 μm, it is preferable to perform optical polishing after lapping from the viewpoint of reducing the number of steps.

【0013】[0013]

【発明の実施の形態】以下、本発明の反射型液晶表示装
置の製造方法を詳しく説明する。図1(a)〜(d)、
図2(a)〜(d)は本発明の第1実施形態例を説明す
るための図であり、これらの図において符号1は液晶駆
動基体、2は対向基体である。まず、図1(a)に示す
ように、例えば8インチ径で0.8mm程度の厚さの石
英ガラス板3を用意し、これの一方の面(内面)に、公
知の半導体技術により複数のポリSiTFTからなる液
晶駆動回路および画素開口部を形成して回路・画素部4
を作製し、液晶駆動基体1を得る。このとき、石英ガラ
ス板3には、回路・画素部4と反対の側の面(外面)に
TFT構成薄膜が形成されてしまう。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a method for manufacturing a reflection type liquid crystal display device according to the present invention will be described in detail. 1 (a) to 1 (d),
FIGS. 2A to 2D are views for explaining the first embodiment of the present invention. In these figures, reference numeral 1 denotes a liquid crystal driving base, and 2 denotes a counter base. First, as shown in FIG. 1A, for example, a quartz glass plate 3 having a diameter of, for example, 8 inches and a thickness of about 0.8 mm is prepared, and a plurality of surfaces (inner surfaces) are formed on one surface (inner surface) by a known semiconductor technology. A liquid crystal driving circuit composed of a poly-Si TFT and a pixel opening portion are formed to form a circuit / pixel portion 4.
Is manufactured to obtain the liquid crystal driving base 1. At this time, a thin film constituting the TFT is formed on the surface (outer surface) of the quartz glass plate 3 on the side opposite to the circuit / pixel portion 4.

【0014】続いて、回路・画素部4における液晶駆動
回路についてペレットチェックと称されるプローブテス
トを行って電気的性能を調べ、機能チェックで良否判定
を行う。そして、この液晶駆動基体1の回路・画素部4
側の面(内面)にポリイミド等からなる配向膜(図示
略)を形成し、さらにこれにラビング処理を施す。その
後、これを洗浄して後の重ね合わせ工程に備える。ここ
で、このような洗浄によっても、通常は石英ガラス板3
の外面に形成されたTFT構成薄膜は除去されず、ま
た、TFT形成やラビング処理などの処理の際、フォト
レジストコーターやチャック治具などによって石英ガラ
ス板3の外面にはキズなども生じてしまう。なお、これ
らTFT構成薄膜やキズが形成された箇所を図1中符号
5で示す。
Subsequently, a probe test called a pellet check is performed on the liquid crystal driving circuit in the circuit / pixel section 4 to check the electrical performance, and pass / fail judgment is made by a function check. The circuit / pixel section 4 of the liquid crystal driving base 1
An alignment film (not shown) made of polyimide or the like is formed on the side surface (inner surface), and a rubbing process is performed thereon. Thereafter, this is washed to prepare for a later superposition step. Here, even with such washing, usually the quartz glass plate 3
The TFT constituent thin film formed on the outer surface of the quartz glass plate 3 is not removed, and the outer surface of the quartz glass plate 3 is scratched by a photoresist coater, a chuck jig, or the like during processing such as TFT formation or rubbing. . The locations where these TFT constituent thin films and flaws are formed are indicated by reference numeral 5 in FIG.

【0015】また、これとは別に、図1(b)に示すよ
うに例えば8インチ径あるいは8インチ角で1.1mm
程度の厚さの透明結晶化ガラス板6を用意し、これの一
方の面(内面)にカラーフィルタ(図示略)やITO等
からなる対向電極(図示略)、さらにはブラックマスク
用のクロムパターンなどを形成して対向素子部7を作製
し、これにより対向側基体2を得る。このとき、透明結
晶化ガラス板6には、対向素子部7と反対の側の面(外
面)に着色レジスト汚れなどが生じてしまう。
In addition, as shown in FIG. 1B, for example, as shown in FIG.
A transparent crystallized glass plate 6 having a thickness of about 3 mm is prepared, and a counter electrode (not shown) made of a color filter (not shown) or ITO, and a chrome pattern for a black mask are provided on one surface (inner surface) thereof. The opposing element portion 7 is manufactured by forming the above-mentioned components, and thereby the opposing base 2 is obtained. At this time, the transparent crystallized glass plate 6 is stained with colored resist on the surface (outer surface) on the side opposite to the opposing element portion 7.

【0016】続いて、作製した対向素子部7の良否判別
を行い、さらにその対向素子部7側の面(内面)にポリ
イミド等からなる配向膜(図示略)を形成し、さらにこ
れにラビング処理を施す。その後、これを洗浄して後の
重ね合わせ工程に備える。ここで、このような洗浄によ
っても、前記液晶駆動基体1の場合と同様に、透明結晶
化ガラス板6の外面に形成されたレジスト汚れは除去さ
れず、また、カラーフィルタ形成やラビング処理などの
処理の際、フォトレジストコーターやチャック治具など
によって透明結晶化ガラス板6の外面にはキズなども生
じてしまう。なお、これら着色レジスト汚れやキズが形
成された箇所を図1中符号8で示す。
Subsequently, the quality of the manufactured opposing element portion 7 is determined, and an alignment film (not shown) made of polyimide or the like is formed on the surface (inner surface) on the side of the opposing element portion 7, and a rubbing process is performed thereon. Is applied. Thereafter, this is washed to prepare for a later superposition step. Here, even with such cleaning, the resist stain formed on the outer surface of the transparent crystallized glass plate 6 is not removed, as in the case of the liquid crystal driving base 1, and the color filter formation, the rubbing treatment, etc. During the processing, the outer surface of the transparent crystallized glass plate 6 may be scratched by a photoresist coater or a chuck jig. The spots where these colored resist stains and scratches are formed are indicated by reference numeral 8 in FIG.

【0017】このようにして液晶駆動基体1、対向基体
2を用意したら、図1(c)に示すように、これら液晶
駆動基体1または対向基体2の内面に、液晶の注入口9
aを形成した状態に液晶シール剤9を複数塗布するとと
もに、これら液晶シール剤9が並ぶ領域の最外周を囲む
状態に外周シール剤10を塗布する。また、液晶駆動基
体1の所定位置にコモン剤(図示略)を塗布する。続い
て、これら液晶駆動基体1と対向基体2とを、図1
(d)に示すように液晶シール剤9および外周シール剤
10を介して重ね合わせる。
After the liquid crystal driving base 1 and the opposing base 2 are prepared in this way, as shown in FIG. 1C, the liquid crystal injection port 9 is provided on the inner surface of the liquid crystal driving base 1 or the opposing base 2.
A plurality of liquid crystal sealants 9 are applied in a state where a is formed, and an outer peripheral sealant 10 is applied so as to surround the outermost periphery of a region where these liquid crystal sealants 9 are arranged. Further, a common agent (not shown) is applied to a predetermined position of the liquid crystal driving base 1. Subsequently, the liquid crystal driving base 1 and the opposing base 2 are
As shown in (d), they are superposed via the liquid crystal sealant 9 and the outer peripheral sealant 10.

【0018】次いで、このようにして重ね合わした液晶
駆動基体1の外面と対向基体2の外面とを、酸化セリウ
ム主体の研磨剤を用いて同時に光学研磨し、図2(a)
に示すようにTFT構成薄膜やキズが形成された箇所5
とレジスト汚れやキズが形成された箇所8とを同時に除
去する。このとき、液晶駆動基体1と対向基体2との間
については、液晶シール剤9を外周シール剤10で囲ん
でいるので、光学研磨面などに流す水が液晶シール剤9
の並ぶ領域に浸入することがない。
Next, the outer surface of the liquid crystal driving substrate 1 and the outer surface of the opposing substrate 2 thus superimposed are simultaneously optically polished using an abrasive mainly composed of cerium oxide, as shown in FIG.
As shown in FIG. 5, a portion 5 where a TFT constituting thin film or a scratch is formed
And the portion 8 where the resist stains and flaws are formed are simultaneously removed. At this time, since the liquid crystal sealant 9 is surrounded by the outer peripheral sealant 10 between the liquid crystal drive base 1 and the opposing base 2, water flowing on the optically polished surface or the like is not filled with the liquid crystal sealant 9.
Does not penetrate into the area where is lined up.

【0019】次いで、重ね合わされた状態の液晶駆動基
体1と前記対向基体2とを、単体液晶パネルに分割す
る。分割処理としては、図2(b)に示すようにスクラ
イブブレークの場合と、図2(c)に示すようにハーフ
カットダイシングの場合とがある。なお、ハーフカット
ダイシングの場合には、図2(c)に示したように、切
削水が浸入しないように100〜200μm程度の厚さ
の切り残し11ができるが、これはガラスゴミの一因と
なり、さらに、後での液晶注入や封止の邪魔となるので
除去するのが望ましい。ただし、このような切り残し1
1の除去については、液晶注入口側のみ行うようにして
もよい。次いで、従来と同様にして液晶駆動基板1aと
対向基板2aとの間の液晶シール剤9内に液晶12を注
入し、さらにこれを封止し、その後、熱処理を施してこ
れを配向させ、図2(d)に示すように液晶パネル部品
13を得る。
Next, the liquid crystal driving base 1 and the opposing base 2 in the superposed state are divided into a single liquid crystal panel. The division processing includes a scribe break as shown in FIG. 2B and a half-cut dicing as shown in FIG. 2C. In the case of half-cut dicing, as shown in FIG. 2C, an uncut portion 11 having a thickness of about 100 to 200 μm is formed so that cutting water does not enter. And furthermore, it is desirable to remove it because it hinders later liquid crystal injection and sealing. However, such uncut 1
The removal of 1 may be performed only on the liquid crystal injection port side. Next, the liquid crystal 12 is injected into the liquid crystal sealant 9 between the liquid crystal driving substrate 1a and the opposing substrate 2a in the same manner as in the related art, and the liquid crystal 12 is further sealed. A liquid crystal panel component 13 is obtained as shown in FIG.

【0020】このような製造方法にあっては、液晶シー
ル剤9が並ぶ領域の最外周を囲む状態に外周シール剤1
0を塗布し、液晶駆動基体1と対向基体2とを重ね合わ
しているので、その後の光学研磨処理のときや単体分割
処理の際に、各基体1、2の内面を保護する必要がな
く、また、これらの処理に使用される水が液晶シール剤
9の並ぶ領域に浸入することも防止することができ、こ
れによりプロセスを容易にすることができるとともに、
得られる液晶表示装置の歩留及び品質の向上を図ること
ができる。また、それぞれの基体1、2の外面を光学研
磨するに先立って、凹状反りの小さい状態の液晶駆動基
体1と対向基体2とをシール剤9、10を介して重ね合
わしているので、これら液晶駆動基体と対向基体との間
の液晶ギャップ制御を容易にすることができる。
In such a manufacturing method, the outer peripheral sealant 1 is placed so as to surround the outermost periphery of the region where the liquid crystal sealants 9 are arranged.
0, and the liquid crystal driving base 1 and the opposing base 2 are overlapped, so that it is not necessary to protect the inner surfaces of the bases 1 and 2 at the time of the subsequent optical polishing processing or the single-piece division processing. In addition, it is possible to prevent water used for these treatments from entering a region where the liquid crystal sealant 9 is lined up, thereby facilitating the process and
The yield and quality of the obtained liquid crystal display device can be improved. Before the outer surfaces of the substrates 1 and 2 are optically polished, the liquid crystal driving substrate 1 and the opposing substrate 2 in a state of small concave warp are overlapped with the sealing agents 9 and 10 therebetween. It is possible to easily control the liquid crystal gap between the driving base and the opposing base.

【0021】また、両基体1、2を重ね合わせた後に光
学研磨をするまで、石英ガラスに比べ低抵抗であるポリ
シリコンやPSG等のTFT構成薄膜からなる積層膜
が、液晶駆動基体1の外面にそのまま残っていることに
より、例えばセル作製工程におけるラビング処理などに
おいても静電気ダメージが受けにくくなり、したがって
静電気ダメージを抑えることができる。さらに、液晶駆
動基体1と対向基体2とをシール剤9、10を介して重
ね合わした後、それぞれの基体1、2の外面を光学研磨
するので、これら液晶駆動基体1の外面と対向基体2の
外面とを同時に処理することができ、したがって従来に
比べ工数を低減してコストダウンを図ることができる。
Until the substrates 1 and 2 are superimposed and optically polished, a laminated film composed of a TFT constituting thin film such as polysilicon or PSG having a lower resistance than quartz glass is formed on the outer surface of the liquid crystal driving substrate 1. , It is difficult to receive electrostatic damage even in, for example, a rubbing process in a cell manufacturing process, and therefore, the electrostatic damage can be suppressed. Further, after the liquid crystal driving base 1 and the opposing base 2 are overlapped with each other via the sealants 9 and 10, the outer surfaces of the bases 1 and 2 are optically polished. The outer surface and the outer surface can be processed at the same time, so that the man-hour can be reduced and the cost can be reduced as compared with the conventional case.

【0022】なお、前記実施形態例では、液晶駆動基体
1の外面と対向基体2の外面とを同時に光学研磨した
が、外面のキズの深さや汚れのレベルに応じて、ラッピ
ングした後に光学研磨してもよい。すなわち、一般にラ
ッピングの場合は、表面の凹凸レベルが光学的に問題と
なるので光学研磨仕上げが必要となるからである。ま
た、要求される画質レベルに応じてはラッピングのみで
もよい。
In the above embodiment, the outer surface of the liquid crystal driving base 1 and the outer surface of the opposing base 2 are optically polished at the same time. You may. That is, in general, in the case of lapping, the level of unevenness on the surface becomes optically problematic, so that optical polishing is required. Further, only wrapping may be performed according to a required image quality level.

【0023】[0023]

【発明の効果】以上説明したように本発明の液晶表示装
置の製造方法は、液晶シール剤が並ぶ領域の最外周を囲
む状態に外周シール剤を塗布し、液晶駆動基体と対向基
体とを重ね合わすことにより、その後の光学研磨処理の
ときやハーフカットダイシング分割処理の際に、各基体
の内面を保護する必要がなく、また、これらの処理に使
用される水が液晶シール剤の並ぶ領域に浸入することも
防止するものであるから、プロセスを容易にすることが
できるとともに、得られる液晶表示装置の歩留及び品質
の向上を図ることができる。また、それぞれの基体の外
面を光学研磨するに先立って、すなわち液晶駆動基体に
大きな凹状の反りが生じる前に液晶駆動基体と対向基体
とをシール剤を介して重ね合わしているので、これら液
晶駆動基体と対向基体との間の液晶ギャップ制御を容易
にすることができ、これにより得られる液晶表示装置の
画質の向上を図ることができる。
As described above, in the method of manufacturing a liquid crystal display device according to the present invention, an outer peripheral sealant is applied to a state surrounding an outermost periphery of a region where liquid crystal sealants are arranged, and a liquid crystal driving substrate and an opposing substrate are overlapped. By doing so, it is not necessary to protect the inner surface of each substrate during the subsequent optical polishing process or the half-cut dicing division process, and water used for these processes is deposited in the area where the liquid crystal sealant is lined up. Since the intrusion is also prevented, the process can be facilitated, and the yield and quality of the obtained liquid crystal display device can be improved. Further, prior to optically polishing the outer surfaces of the respective substrates, that is, before the liquid crystal driving substrate has a large concave warp, the liquid crystal driving substrate and the opposing substrate are overlapped with a sealant interposed therebetween. The liquid crystal gap between the base and the opposing base can be easily controlled, thereby improving the image quality of the obtained liquid crystal display device.

【0024】また、両基体を重ね合わせた後光学研磨を
するまで、石英ガラスに比べて低抵抗のポリシリコンや
PSG等からなる積層膜が液晶駆動基体の外面に必然的
に残ることから、例えばセル作製工程におけるラビング
処理などにおいても静電気ダメージを受けにくくなり、
したがって静電気ダメージを抑えて歩留り及び品質の向
上を図ることができるとともに、従来工程中に用いてい
たイオナイザー等の静電気対策のための設備投資や管理
工数を少なくすることができる。さらに、液晶駆動基体
と対向基体とをシール剤を介して重ね合わした後、それ
ぞれの基体の外面を光学研磨するので、例えばこれら液
晶駆動基体の外面と対向基体の外面とを同時に処理すれ
ば、従来に比べ工数を低減してコストダウンを図ること
ができる。
Further, a laminated film made of polysilicon, PSG, or the like having a lower resistance than quartz glass is necessarily left on the outer surface of the liquid crystal driving substrate until the two substrates are overlapped and optically polished. Even in the rubbing process in the cell manufacturing process, it is hard to receive electrostatic damage,
Therefore, yield and quality can be improved by suppressing electrostatic damage, and capital investment and management man-hours for static electricity countermeasures such as an ionizer used in conventional processes can be reduced. Further, after the liquid crystal driving substrate and the opposing substrate are overlapped with a sealant interposed therebetween, the outer surfaces of the respective substrates are optically polished. Thus, man-hours can be reduced and costs can be reduced.

【図面の簡単な説明】[Brief description of the drawings]

【図1】(a)〜(d)は、本発明の製造方法を工程順
に説明するための要部側断面図である。
FIGS. 1A to 1D are side sectional views of a main part for describing a manufacturing method of the present invention in the order of steps.

【図2】(a)〜(d)は、本発明の製造方法を工程順
に説明するための図であり、図1に示した工程に続く工
程を説明するための要部側断面図である。
FIGS. 2 (a) to 2 (d) are views for explaining the manufacturing method of the present invention in the order of steps, and are main-portion side sectional views for explaining steps subsequent to the step shown in FIG. 1; .

【符号の説明】[Explanation of symbols]

1 液晶駆動基体 2 対向基体 4 回路・画素
部 9 液晶シール剤 10 外周シール剤 13 液
晶パネル部品
DESCRIPTION OF SYMBOLS 1 Liquid crystal drive base | substrate 2 Opposite base | substrate 4 Circuit / pixel part 9 Liquid crystal sealant 10 Peripheral sealant 13 Liquid crystal panel components

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 多結晶シリコン薄膜トランジスタからな
る液晶駆動回路および画素開口部を複数形成した液晶駆
動基体と、対向電極を複数形成した対向基体とを対向さ
せ、重ね合わせた後、各基体を分割することによって個
々の液晶パネル部品を形成する液晶表示装置の製造方法
であって、 まず、前記液晶駆動基体または対向基体の内面に、液晶
の注入口を形成した状態に液晶シール剤を複数塗布する
とともに、複数の液晶シール剤が並ぶ領域の最外周を囲
む状態に外周シール剤を塗布し、かつ前記液晶駆動基体
の所定位置にコモン剤を塗布し、 次に、前記液晶駆動基体と前記対向基体とを前記液晶シ
ール剤および前記外周シール剤を介して重ね合わせ、 次いで、これら液晶駆動基体と対向基体とを重ね合わし
た状態でそれぞれの基体の外面を光学研磨し、 その後、前記液晶駆動基体と前記対向基体とをハーフカ
ットダイシングとブレークすることによって分割し、複
数の液晶パネル部品を形成することを特徴とする液晶表
示装置の製造方法。
1. A liquid crystal driving circuit comprising a polycrystalline silicon thin film transistor and a liquid crystal driving substrate having a plurality of pixel openings formed thereon are opposed to a counter substrate having a plurality of counter electrodes formed thereon. A method for manufacturing a liquid crystal display device for forming individual liquid crystal panel components by first applying a plurality of liquid crystal sealants to the inner surface of the liquid crystal driving base or the opposing base in a state where a liquid crystal injection port is formed. Applying an outer peripheral sealant to a state surrounding the outermost periphery of a region where a plurality of liquid crystal sealants are arranged, and applying a common agent to a predetermined position of the liquid crystal drive base; Are interposed via the liquid crystal sealant and the outer peripheral sealant. Then, in a state where the liquid crystal drive base and the opposing base are superposed, the outer surface of each base is Wherein the liquid crystal driving base and the opposing base are divided by half-cut dicing and breaking to form a plurality of liquid crystal panel components.
【請求項2】 前記液晶駆動基体および対向基体の外面
の光学研磨を、両方の基体について同時に行うことを特
徴とする請求項1記載の液晶表示装置の製造方法。
2. The method for manufacturing a liquid crystal display device according to claim 1, wherein the optical polishing of the outer surfaces of the liquid crystal driving substrate and the opposing substrate is performed simultaneously on both substrates.
JP9336397A 1997-04-11 1997-04-11 Production of liquid crystal display device Pending JPH10282508A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9336397A JPH10282508A (en) 1997-04-11 1997-04-11 Production of liquid crystal display device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9336397A JPH10282508A (en) 1997-04-11 1997-04-11 Production of liquid crystal display device

Publications (1)

Publication Number Publication Date
JPH10282508A true JPH10282508A (en) 1998-10-23

Family

ID=14080218

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9336397A Pending JPH10282508A (en) 1997-04-11 1997-04-11 Production of liquid crystal display device

Country Status (1)

Country Link
JP (1) JPH10282508A (en)

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