JPH102665A - Vacuum drying device - Google Patents
Vacuum drying deviceInfo
- Publication number
- JPH102665A JPH102665A JP17553196A JP17553196A JPH102665A JP H102665 A JPH102665 A JP H102665A JP 17553196 A JP17553196 A JP 17553196A JP 17553196 A JP17553196 A JP 17553196A JP H102665 A JPH102665 A JP H102665A
- Authority
- JP
- Japan
- Prior art keywords
- vacuum chamber
- dried
- exhaust port
- porous plate
- drying
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、真空乾燥装置に係
り、特に乾燥に要する時間の短縮が可能で、かつ、被乾
燥体の乾燥面が良好な真空乾燥装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vacuum drying apparatus, and more particularly to a vacuum drying apparatus capable of shortening the time required for drying and having a good drying surface of a material to be dried.
【０００２】[0002]
【従来の技術】例えば、ＬＣＤ用カラーフィルタでは、
ガラス基板にレジスト液等の塗布液を塗布して乾燥し、
フォトリソグラフィー等により所望のパターンの形成が
行われる。塗布液の塗布方式としては、例えば、スピン
塗布方式、ナイフ塗布方式、ロール塗布方式およびビー
ド塗布方式等の種々の塗布方式が用いられている。この
ような何れの塗布方式で塗布した場合でも、パターン形
成工程の前に塗布膜の乾燥工程を経る必要がある。従
来、塗布液が塗布されたガラス基板等の被乾燥体は、オ
ーブンあるいはホットプレートにおいて加熱乾燥がなさ
れていた。2. Description of the Related Art For example, in a color filter for LCD,
A coating liquid such as a resist liquid is applied to a glass substrate and dried,
A desired pattern is formed by photolithography or the like. Various coating methods such as a spin coating method, a knife coating method, a roll coating method, and a bead coating method are used as a coating liquid coating method. Regardless of the application method using any of these application methods, it is necessary to go through a drying step of the coating film before the pattern forming step. Conventionally, a dried object such as a glass substrate to which a coating liquid has been applied has been heated and dried in an oven or a hot plate.
【０００３】しかし、上記の加熱による方法は乾燥に要
する時間が長く、この結果、上述のようなＬＣＤ用カラ
ーフィルタの製造工程では、ガラス基板の塗布膜の乾燥
工程が全工程の律速段階となっていた。そこで、近年、
この乾燥工程の時間短縮を可能とするものとして真空乾
燥装置が使用されている。これは、塗布膜が形成された
ガラス基板を真空状態に置き、溶剤の蒸発速度を飛躍的
に高めたものである。However, the above-described heating method requires a long time for drying. As a result, in the above-described manufacturing process of the color filter for LCD, the drying process of the coating film on the glass substrate is the rate-limiting step of all processes. I was So, in recent years,
A vacuum drying apparatus is used to shorten the time of the drying step. In this method, the glass substrate on which the coating film is formed is placed in a vacuum state, and the evaporation rate of the solvent is dramatically increased.
【０００４】[0004]
【発明が解決しようとする課題】上記のような従来の真
空乾燥装置では、真空チャンバーの底部に設けられた排
気口（真空チャンバー内に保持されたガラス基板の下方
に位置する）を介して真空ポンプにより吸引することに
よって真空チャンバー内を真空状態としていた。しか
し、従来の真空乾燥装置では、乾燥時間を短縮するため
に真空チャンバー内の排気速度を速くすると、局所的な
圧力ムラ等が生じて、ガラス基板上の塗布膜に突沸が発
生したり不均一な乾燥が生じやすく、平坦な乾燥膜面が
得られないという問題があった。このため、真空チャン
バーの排気に要する時間の短縮には限界があった。In the conventional vacuum drying apparatus as described above, a vacuum is provided through an exhaust port (located below a glass substrate held in the vacuum chamber) provided at the bottom of the vacuum chamber. The inside of the vacuum chamber was evacuated by suction with a pump. However, in the conventional vacuum drying apparatus, if the exhaust speed in the vacuum chamber is increased to shorten the drying time, local pressure unevenness or the like may occur, causing bumping or unevenness in the coating film on the glass substrate. Drying is likely to occur, and a flat dried film surface cannot be obtained. For this reason, there is a limit in shortening the time required for evacuation of the vacuum chamber.
【０００５】また、乾燥が終了した後、真空チャンバー
の底部に設けられた上記の排気口から空気を導入して大
気圧に戻す際に、真空チャンバーの底部にゴミが存在す
ると、導入された気体によってゴミが舞い上げられて、
乾燥された塗布膜に付着するという問題があった。この
ため、ゴミの舞い上がりを生じないような遅い速度で排
気口から真空チャンバー内に空気を導入する必要があっ
た。After the drying is completed, when air is introduced from the above-described exhaust port provided at the bottom of the vacuum chamber to return to atmospheric pressure, if dust is present at the bottom of the vacuum chamber, the introduced gas is removed. The garbage is soared by
There is a problem that it adheres to the dried coating film. For this reason, it was necessary to introduce air from the exhaust port into the vacuum chamber at such a low speed that dust would not be raised.
【０００６】したがって、従来の真空乾燥装置を使用す
ることによっても、乾燥工程が全工程の律速段階である
ことは変わらず、乾燥工程の更なる時間短縮が重要な課
題となっている。Therefore, even if a conventional vacuum drying apparatus is used, the drying step is still the rate-determining step of all the steps, and the further shortening of the drying step is an important issue.
【０００７】本発明は、このような事情に鑑みてなされ
たものであり、被乾燥体の乾燥時間の短縮が可能で、か
つ、乾燥後の被乾燥体の表面状態が極めて良好である真
空乾燥装置を提供することを目的とする。[0007] The present invention has been made in view of such circumstances, and it is possible to reduce the drying time of the object to be dried, and to perform vacuum drying in which the surface condition of the object to be dried after drying is extremely good. It is intended to provide a device.
【０００８】[0008]
【課題を解決するための手段】上記目的を達成するため
に、本発明は上壁部に排気口を有する真空チャンバー
と、該真空チャンバー内の底部に配設された載置用部材
と、該載置用部材上に載置される被乾燥体と対向し、か
つ、該被乾燥体と前記排気口との間に位置するように配
設された多孔質板とを少なくとも備えるような構成とし
た。In order to achieve the above object, the present invention provides a vacuum chamber having an exhaust port on an upper wall, a mounting member disposed at the bottom in the vacuum chamber, and A configuration including at least a porous plate facing the object to be dried placed on the mounting member, and disposed between the object to be dried and the exhaust port; did.
【０００９】上述のような本発明では、載置用部材上に
載置された被乾燥体の周囲の気体は、被乾燥体と対向す
るように配設された多孔質板を介して排気口から外部に
排出されるので、被乾燥体の周囲の圧力は均一な状態で
減少することになり、また、上記排気口から空気を導入
して真空チャンバー内を大気圧に戻すことができるの
で、真空チャンバーの底部にゴミが存在しても、ゴミの
舞い上がりが発生しない。In the present invention as described above, the gas around the object to be dried placed on the mounting member is discharged through the porous plate provided so as to face the object to be dried. From the outside, the pressure around the object to be dried is reduced in a uniform state, and since air can be introduced from the exhaust port to return the inside of the vacuum chamber to atmospheric pressure, Even if dust is present at the bottom of the vacuum chamber, no dust is generated.
【００１０】[0010]
【発明の実施の形態】以下、本発明の実施の形態につい
て説明を行う。Embodiments of the present invention will be described below.
【００１１】図１は本発明の真空乾燥装置の一実施形態
を示す概略構成図である。図１において、本発明の真空
乾燥装置１は、真空チャンバー２と、この真空チャンバ
ー２の上壁部２Ａに設けられた排気口３と、真空チャン
バー２の底部２Ｂに配設された複数の載置用部材４と、
真空チャンバー２の上壁部２Ａの下方に設けられた多孔
質板６とを備えている。FIG. 1 is a schematic configuration diagram showing one embodiment of a vacuum drying apparatus of the present invention. In FIG. 1, a vacuum drying apparatus 1 according to the present invention includes a vacuum chamber 2, an exhaust port 3 provided on an upper wall 2 </ b> A of the vacuum chamber 2, and a plurality of mountings disposed on a bottom 2 </ b> B of the vacuum chamber 2. A mounting member 4,
And a porous plate 6 provided below the upper wall 2A of the vacuum chamber 2.
【００１２】真空乾燥装置１を構成する真空チャンバー
２は、公知の種々の真空チャンバーを使用することがで
き、内部容積、内部形状等は適宜設定することができ
る。図示例では、真空チャンバー２は上壁部２Ａ、底部
２Ｂ、側壁部２Ｃを備え、縦断面形状が長方形をなして
いる。また、真空チャンバーの上壁部２Ａに設けられて
いる排気口３は、図示されていない真空ポンプに接続さ
れ、この排気口３を介して真空チャンバー２内の気体が
外部に排出され、真空チャンバー２内を所定の真空状態
とすることができる。この排気口３は、図示例では真空
チャンバー２の上壁部２Ａの中央に１個形成されている
が、複数の排気口３（例えば、４個）を上壁部２Ａに形
成してもよい。Various known vacuum chambers can be used as the vacuum chamber 2 constituting the vacuum drying apparatus 1, and the internal volume, internal shape, and the like can be appropriately set. In the illustrated example, the vacuum chamber 2 includes an upper wall portion 2A, a bottom portion 2B, and a side wall portion 2C, and has a rectangular longitudinal sectional shape. Further, an exhaust port 3 provided on the upper wall 2A of the vacuum chamber is connected to a vacuum pump (not shown), and the gas in the vacuum chamber 2 is exhausted to the outside through the exhaust port 3, and 2 can be set to a predetermined vacuum state. Although one exhaust port 3 is formed at the center of the upper wall 2A of the vacuum chamber 2 in the illustrated example, a plurality of (for example, four) exhaust ports 3 may be formed in the upper wall 2A. .
【００１３】底部２Ｂに設けられた載置用部材４は、被
乾燥体Ｓを底部２Ｂから所望の距離に浮かして保持する
ためのものであり、円錐形状、円柱形状、角柱形状等任
意の形状のものとすることができる。この載置用部材４
の形成個数、形成位置は特に制限はなく、また、載置用
部材４の高さは、１〜５０ｍｍ程度の範囲で設定するこ
とができる。載置用部材４は、底部２Ｂとの擦れ等から
被乾燥体Ｓに傷を与えないような材料を選定して形成さ
れたものを使用でき、底部２Ｂに固定して配設すること
ができる。The mounting member 4 provided on the bottom portion 2B is for holding the object S to be dried at a desired distance from the bottom portion 2B, and has an arbitrary shape such as a conical shape, a cylindrical shape, a prism shape, and the like. It can be. This mounting member 4
There is no particular limitation on the number and positions of the components, and the height of the mounting member 4 can be set in a range of about 1 to 50 mm. The mounting member 4 can be formed by selecting a material that does not damage the object to be dried S due to friction with the bottom 2B or the like, and can be fixed to the bottom 2B. .
【００１４】本発明の真空乾燥装置１を構成する多孔質
板６は、載置用部材４上に被乾燥体Ｓを載置したとき
に、この被乾燥体Ｓと対向し、かつ、被乾燥体Ｓと排気
口３との間に位置するように配設されている。図示例で
は、多孔質板６は、上壁部２Ａの下方であって、この上
壁部２Ａとの間に間隙を形成するように配設されてい
る。The porous plate 6 constituting the vacuum drying apparatus 1 of the present invention faces the object S to be dried when the object S is placed on the mounting member 4, and It is arranged so as to be located between the body S and the exhaust port 3. In the illustrated example, the porous plate 6 is disposed below the upper wall 2A so as to form a gap with the upper wall 2A.
【００１５】多孔質板６は、ポリビニルアルコール樹
脂、フッ素樹脂等の合成樹脂、セラミックス等の材料に
より形成された多孔質体を使用することができ、例え
ば、気孔率が２０％以上、好ましくは５０％以上であ
り、気孔径が０．０１〜０．５μｍ程度、厚みが０．１
〜５ｃｍ程度の多孔質体を使用することができる。具体
的には、カネボウ（株）製ベルイーターＡシリーズ、Ｃ
ＫＤ（株）製ＦＰＭ等の市販の多孔質体を使用すること
ができる。As the porous plate 6, a porous body made of a material such as a synthetic resin such as a polyvinyl alcohol resin or a fluororesin, or a ceramic, for example, has a porosity of 20% or more, preferably 50% or more. % Or more, the pore diameter is about 0.01 to 0.5 μm, and the thickness is 0.1
A porous body of about 5 cm can be used. Specifically, Kanebo Co., Ltd. Bell Eater A series, C
A commercially available porous body such as FPM manufactured by KD Corporation can be used.
【００１６】多孔質板６は、上記のような多孔質体を所
望の形状、寸法に加工したものを直接使用することがで
きる。この場合、図１に矢印で示したように、排気口３
からの排気が開始されると、載置用部材４上に載置され
た被乾燥体Ｓの周囲の空気は、多孔質板６を通過し、多
孔質板６と上壁部２Ａとの間の間隙部を経由して排気口
３から外部に排出される。The porous plate 6 can be directly used by processing the above porous body into a desired shape and dimensions. In this case, as shown by an arrow in FIG.
Is started, the air around the object to be dried S placed on the mounting member 4 passes through the porous plate 6 and is located between the porous plate 6 and the upper wall 2A. Is discharged from the exhaust port 3 to the outside through the gap.
【００１７】また、多孔質板６として、担体に多孔質体
を保持させたものを使用してもよい。図２は、このよう
な担体に多孔質体を保持させた多孔質板６の一例を示す
ものである。この多孔質板６は、多孔質体７の一方の面
を担体８に保持させ、多孔質体７の端面はシール部材９
により封止された構造となっている。担体８の表面に
は、担持した多孔質体７に対向する開口部８ａが複数設
けられており、各開口部８ａは担体８の内部に形成され
た流路８ｂにより接続されているとともに、流路８ｂは
担体８の反対面の１か所に設けられた口部８ｃに接続さ
れている。このような多孔質板６を、多孔質板７が載置
用部材４上に載置される被乾燥体Ｓに対向するように真
空チャンバー２内に配設し、担体８の口部８ｃを排気口
３に接続して、排気口３からの排気が開始されると、載
置用部材４上に載置された被乾燥体Ｓの周囲の気体は、
多孔質体７を通過して担体８の開口部８ａ、流路８ｂを
経由して口部８ｃに導かれ、その後、排気口３から外部
に排出される。Further, as the porous plate 6, a carrier in which a porous body is held on a carrier may be used. FIG. 2 shows an example of a porous plate 6 in which a porous body is held on such a carrier. The porous plate 6 has one surface of the porous body 7 held by the carrier 8, and the end face of the porous body 7 is
The structure is sealed. On the surface of the carrier 8, a plurality of openings 8 a facing the supported porous body 7 are provided. Each of the openings 8 a is connected by a flow path 8 b formed inside the carrier 8, The passage 8b is connected to an opening 8c provided at one place on the opposite surface of the carrier 8. Such a porous plate 6 is arranged in the vacuum chamber 2 so that the porous plate 7 faces the object S to be dried placed on the placing member 4, and the opening 8 c of the carrier 8 is placed. When connected to the exhaust port 3 and the exhaust from the exhaust port 3 is started, the gas around the object S to be dried placed on the placing member 4 becomes:
After passing through the porous body 7, it is guided to the opening 8 c via the opening 8 a of the carrier 8 and the flow path 8 b, and then discharged to the outside from the exhaust port 3.
【００１８】多孔質板６の配設位置は、上述のように被
乾燥体Ｓと対向し、かつ、被乾燥体Ｓと排気口３との間
の位置であれば特に制限はないが、例えば、載置用部材
４上に載置された被乾燥体Ｓとの距離が２〜７ｃｍとな
るような範囲で配設することができる。The location of the porous plate 6 is not particularly limited as long as it is opposed to the object S to be dried and between the object S and the exhaust port 3 as described above. It can be arranged in a range such that the distance from the object S to be dried placed on the placing member 4 is 2 to 7 cm.
【００１９】このような多孔質板６が真空チャンバー２
内に配設されていることにより、載置用部材４上に載置
された被乾燥体Ｓの周囲の空気は、多孔質板６を介して
排気口３から外部に排出されるので、被乾燥体Ｓの周囲
の圧力は均一な状態で減少することになる。したがっ
て、真空チャンバー２内での局所的な圧力ムラ等が防止
され、被乾燥体Ｓに突沸が発生したり不均一な乾燥が生
じることなく排気速度を高くすることができ、かつ、平
坦な乾燥膜面が得られる。Such a porous plate 6 serves as a vacuum chamber 2
Since the air around the object to be dried S placed on the mounting member 4 is exhausted to the outside from the exhaust port 3 through the porous plate 6, The pressure around the dried body S decreases in a uniform state. Therefore, local pressure unevenness or the like in the vacuum chamber 2 is prevented, and the pumping speed can be increased without bumping or uneven drying of the object to be dried S. A film surface is obtained.
【００２０】さらに、本発明の真空乾燥装置では、被乾
燥体Ｓの乾燥完了後に排気口３から多孔質板６を介して
真空チャンバー２内に空気を導入し、真空チャンバー２
内の圧力を大気圧に戻すことができる。これにより、排
気口３からの空気導入速度を高くしても、多孔質板６を
通過して真空チャンバー２の底部２Ｂ方向に流れる空気
の流れは緩やかなものとなり、真空チャンバー２の底部
２Ｂにゴミが存在しても、ゴミの舞い上がりが防止さ
れ、被乾燥体Ｓへのゴミ等の付着を生じることがない。Further, in the vacuum drying apparatus according to the present invention, after the drying of the object to be dried S is completed, air is introduced into the vacuum chamber 2 from the exhaust port 3 through the porous plate 6 and the vacuum chamber 2 is dried.
The internal pressure can be returned to atmospheric pressure. Thereby, even if the air introduction speed from the exhaust port 3 is increased, the flow of the air flowing through the porous plate 6 in the direction of the bottom 2B of the vacuum chamber 2 becomes gentle, and Even if dust is present, the dust is prevented from flying up and does not adhere to the object S to be dried.
【００２１】本発明では、被乾燥体には特に制限はな
く、種々の方式により形成された塗布膜が対象となり得
る。In the present invention, the object to be dried is not particularly limited, and may be a coating film formed by various methods.
【００２２】[0022]
【実施例】次に、実施例を挙げて本発明を更に詳細に説
明する。Next, the present invention will be described in more detail with reference to examples.
【００２３】まず、下記の塗布液を調製した。First, the following coating solutions were prepared.
【００２４】 塗布液 ・固形分含有量 ： ２０重量％ ・使用溶剤 ： セロソルブアセテート（沸点１５６．４℃） 次に、この塗布液を用いて、厚み１．１ｍｍのガラス基
板上にスピンコート方法により塗布（膜厚２μｍ）を行
った。 Coating solution / solid content: 20% by weight Solvent used: cellosolve acetate (boiling point: 156.4 ° C.) Next, using this coating solution, a 1.1 mm thick glass substrate was spin-coated. Coating (film thickness 2 μm) was performed.
【００２５】一方、下記の仕様の真空チャンバー、載置
用部材、多孔質板を備えた本発明の真空乾燥装置Ａ（図
１に相当するもの）を準備し、真空ポンプ（アルバック
（株）製Ｄ−９５０Ｋ＋ＰＭＢ００３ＣＭ）に排気口を
接続した。On the other hand, a vacuum drying apparatus A (corresponding to FIG. 1) of the present invention equipped with a vacuum chamber having the following specifications, a mounting member, and a porous plate is prepared, and a vacuum pump (manufactured by ULVAC, Inc.) is provided. D-950K + PMB003CM).
【００２６】 ・内部容積 ： １６６１６ｃｍ3 ・底部形状 ： 長方形 ・底部面積 ： ４１５４ｃｍ2 ・側壁部高さ ： ４０ｍｍ ・載置用部材の高さ ： ５ｍｍ ・載置用部材形成数 ： ５個 ・多孔質板の気孔率 ： ４０％ ・多孔質板の気孔径 ： ０．１μｍ ・多孔質板の厚み ： １．０ｃｍ 上記の真空乾燥装置Ａの載置用部材に、上記の塗布液を
塗布したガラス基板を載置した。そして、真空ポンプに
よる排気時間を下記の表１に示されるように数種類で設
定し、排気開始から乾燥完了（塗布膜の乾燥が完了し
て、ほぼ一定であった真空チャンバー内の真空度が再度
変化する時点）までの時間ｔを測定し、また、乾燥完了
後、排気口から下記の表１に示されるリーク時間で空気
を導入して真空チャンバー内を大気圧に戻し、上記の吸
引開始から乾燥を経て大気圧戻しが完了するまでの乾燥
工程時間Ｔを下記の表１に示した。また、このような真
空乾燥が行われたガラス基板の乾燥塗布膜の状態を評価
して下記の表１に示した。・ Internal volume: 16616 cm 3・ Bottom shape: rectangular ・ Bottom area: 4154 cm 2・ Height of side wall: 40 mm ・ Height of mounting member: 5 mm ・ Number of mounting members: 5 ・ Porous Porosity of the plate: 40% ・ Pore size of the porous plate: 0.1 μm ・ Thickness of the porous plate: 1.0 cm A glass substrate obtained by applying the above-mentioned coating solution to the mounting member of the above vacuum drying apparatus A Was placed. Then, the evacuation time by the vacuum pump is set by several types as shown in Table 1 below, and drying is completed from the start of evacuation (the drying of the coating film is completed, and the degree of vacuum in the vacuum chamber, which has been substantially constant, is reduced again. T), and after the drying is completed, air is introduced from the exhaust port for a leak time shown in Table 1 below to return the inside of the vacuum chamber to the atmospheric pressure. Table 1 below shows the drying process time T from drying to completion of the return to the atmospheric pressure. Table 1 below shows the state of the dried coating film on the glass substrate subjected to such vacuum drying.
【００２７】比較として、図３に示されるような構造の
従来の真空乾燥装置Ｂを準備した。この真空乾燥装置Ｂ
は、真空チャンバー１２と、この真空チャンバー１２の
底部１２Ｂに設けられた排気口１３と、真空チャンバー
１２の底部１２Ｂに脚部１６を介して排気口１３の上方
に配設された中間板１５と、この中間板上に設けられた
複数の載置用部材１４とを備えたものであり、真空チャ
ンバー、中間板、載置用部材は下記の仕様のもとした。
そして、真空乾燥装置Ｂの排気口に真空ポンプ（アルバ
ック（株）製Ｄ−９５０Ｋ＋ＰＭＢ００３ＣＭ）を接続
した。For comparison, a conventional vacuum drying apparatus B having a structure as shown in FIG. 3 was prepared. This vacuum drying device B
Is a vacuum chamber 12, an exhaust port 13 provided at the bottom 12B of the vacuum chamber 12, and an intermediate plate 15 disposed above the exhaust port 13 via a leg 16 at the bottom 12B of the vacuum chamber 12. And a plurality of mounting members 14 provided on the intermediate plate. The vacuum chamber, the intermediate plate, and the mounting member have the following specifications.
Then, a vacuum pump (D-950K + PMB003CM manufactured by ULVAC, Inc.) was connected to the exhaust port of the vacuum drying device B.
【００２８】 ・内部容積 ： １６６１６ｃｍ3 ・底部形状 ： 長方形 ・底部面積 ： ４１５４ｃｍ2 ・側壁部高さ ： ４０ｍｍ ・脚部の高さ ： ５ｍｍ ・中間板の厚み ： ５ｍｍ ・中間板の面積 ： ９９００ｃｍ2 ・載置用部材の高さ ： ５ｍｍ ・載置用部材形成数 ： ５個 上記の真空乾燥装置Ｂの載置用部材に、上記の塗布液を
塗布したガラス基板を載置した。そして、上記の真空乾
燥装置Ａによる真空乾燥と同様に、真空ポンプによる排
気時間を設定し、排気開始から乾燥完了までの時間ｔを
測定して下記の表１に示した。また、乾燥完了後、排気
口から下記の表１に示されるリーク時間で空気を導入し
て真空チャンバー内を大気圧に戻し、上記の吸引開始か
ら乾燥を経て大気圧戻しが完了するまでの乾燥工程時間
Ｔを下記の表１に示した。さらに、このような真空乾燥
が行われたガラス基板の乾燥塗布膜の状態を評価して下
記の表１に示した。[0028] Internal volume: 16616Cm 3-bottom shape: rectangular-bottom area: 4154Cm 2-side wall height: 40 mm, leg height: 5 mm, the intermediate plate having a thickness: area of 5 mm, the middle plate: 9900Cm 2 -Height of mounting member: 5 mm-Number of mounting members: 5 The glass substrate coated with the above-mentioned coating solution was mounted on the mounting member of the vacuum drying device B. Then, similarly to the vacuum drying by the vacuum drying apparatus A, the evacuation time by the vacuum pump was set, and the time t from the start of evacuation to the completion of the drying was measured and shown in Table 1 below. After the drying is completed, air is introduced from the exhaust port for a leak time shown in Table 1 below to return the inside of the vacuum chamber to the atmospheric pressure. The process time T is shown in Table 1 below. Further, the state of the dried coating film on the glass substrate subjected to such vacuum drying was evaluated and is shown in Table 1 below.
【００２９】尚、上記の真空乾燥装置Ａ、Ｂにおける乾
燥工程の開始前に、真空チャンバーには予め１０個／ｃ
ｍ2 の程度でゴミとしてのスペーサー（φ＝５μｍ）を
存在させ、底部に定着させておいた。Before starting the drying process in the vacuum drying apparatuses A and B, 10 pieces / c are previously stored in the vacuum chamber.
A spacer (φ = 5 μm) as dust was present in the order of m 2 , and was fixed on the bottom.
【００３０】[0030]
【表１】 表１に示されるように、本発明の真空乾燥装置Ａによる
塗布膜の真空乾燥では、吸引速度と導入速度を乾燥条件
３まで高めても、乾燥途中の塗布膜に突沸が発生したり
不均一な乾燥が生じることがなく、平坦で良好な面品質
の乾燥膜が得られ、また、乾燥完了後に真空チャンバー
内を大気圧に戻す際に、乾燥膜へのゴミ付着がみられ
ず、乾燥工程に要する時間Ｔを２４秒まで短縮すること
が可能であった。[Table 1] As shown in Table 1, in the vacuum drying of the coating film by the vacuum drying apparatus A of the present invention, even if the suction speed and the introduction speed are increased to the drying condition 3, bumping occurs in the coating film during drying or unevenness occurs. No dryness occurs, a dry film with flat and good surface quality is obtained, and no dust adheres to the dry film when the inside of the vacuum chamber is returned to atmospheric pressure after drying is completed. Was reduced to 24 seconds.
【００３１】これに対して、真空乾燥装置Ｂによる塗布
膜の真空乾燥では、吸引速度と導入速度を乾燥条件２に
高めると、乾燥途中の塗布膜に突沸が発生したり不均一
な乾燥が生じることによる乾燥膜の凹凸、あるいは、乾
燥完了後に真空チャンバー内を大気圧に戻す際の乾燥膜
へのゴミ付着がみられ、乾燥工程に要する時間Ｔを３１
秒まで短縮するのが限界であった。On the other hand, in the vacuum drying of the coating film by the vacuum drying apparatus B, when the suction speed and the introduction speed are increased to the drying condition 2, bumping occurs in the coating film during drying and uneven drying occurs. As a result, unevenness of the dried film, or dust adhered to the dried film when the inside of the vacuum chamber was returned to the atmospheric pressure after the drying was completed, was observed.
Limiting to seconds was the limit.
【００３２】[0032]
【発明の効果】以上詳述したように、本発明によれば真
空チャンバー内の底部に載置用部材を設け、真空チャン
バーの上壁部に設けた排気口と上記載置用部材上に載置
される被乾燥体との間に、この被乾燥体と対向するよう
に多孔質板を配設して真空乾燥装置とするので、乾燥時
において載置用部材上に載置された被乾燥体の周囲の気
体は、多孔質板を介して排気口から外部に排出され、こ
れにより被乾燥体の周囲の圧力は均一な状態で減少する
ので、局所的な圧力ムラ等が防止され、被乾燥体に突沸
が発生したり不均一な乾燥が生じることなく排気速度を
速くすることができ、同時に平坦な乾燥膜面が得られ、
また、乾燥完了後に真空チャンバーの上部に設けた排気
口から多孔質板を介し空気を導入して真空チャンバー内
を大気圧に戻すことができるので、真空チャンバーの底
部にゴミが存在しても、ゴミの舞い上がりを防止でき、
ゴミ等の付着がない塗布膜が得られるとともに、排気口
からの空気導入を速めることができ、排気→乾燥→大気
圧戻しからなる一連の乾燥工程に要する時間の短縮が可
能であり、被乾燥体の乾燥後の表面状態も極めて良好な
ものとなる。As described above in detail, according to the present invention, the mounting member is provided at the bottom of the vacuum chamber, and the mounting member is mounted on the exhaust port provided at the upper wall of the vacuum chamber and the mounting member. Since a porous plate is arranged between the object to be dried and the object to be dried so as to face the object to be dried, a vacuum drying device is used. The gas around the body is exhausted to the outside from the exhaust port through the porous plate, whereby the pressure around the body to be dried is reduced in a uniform state, thereby preventing local pressure unevenness and the like. Pumping speed can be increased without bumping or uneven drying occurring in the dried body, and at the same time, a flat dried film surface can be obtained,
Also, after drying is completed, air can be introduced from the exhaust port provided at the top of the vacuum chamber through a porous plate to return the inside of the vacuum chamber to atmospheric pressure, so that even if dust is present at the bottom of the vacuum chamber, We can prevent garbage from rising,
A coating film free of dust and the like can be obtained, and the speed of air introduction from the exhaust port can be increased. The surface condition of the body after drying is also very good.
【図１】本発明の真空乾燥装置の一実施形態を示す概略
構成図である。FIG. 1 is a schematic configuration diagram showing one embodiment of a vacuum drying device of the present invention.
【図２】本発明の真空乾燥装置に使用される多孔質板の
一例を示す図である。FIG. 2 is a diagram showing an example of a porous plate used in the vacuum drying device of the present invention.
【図３】従来の真空乾燥装置の一例を示す概略構成図で
ある。FIG. 3 is a schematic configuration diagram showing an example of a conventional vacuum drying device.
１…真空乾燥装置 ２…真空チャンバー ２Ａ…上壁部 ２Ｂ…底部 ２Ｃ…側壁部 ３…排気口 ４…載置用部材 ６…多孔質板 ７…多孔質体 ８…担体 Ｓ…被乾燥体 DESCRIPTION OF SYMBOLS 1 ... Vacuum drying device 2 ... Vacuum chamber 2A ... Top wall part 2B ... Bottom part 2C ... Side wall part 3 ... Exhaust port 4 ... Mounting member 6 ... Porous plate 7 ... Porous body 8 ... Carrier S ... Drying body
───────────────────────────────────────────────────── フロントページの続き (72)発明者 竹本 潤 東京都新宿区市谷加賀町一丁目１番１号 大日本印刷株式会社内 ────────────────────────────────────────────────── ─── Continued on the front page (72) Inventor Jun Takemoto 1-1-1, Ichigaya-Kagacho, Shinjuku-ku, Tokyo Inside Dai Nippon Printing Co., Ltd.
Claims (1)
と、該真空チャンバー内の底部に配設された載置用部材
と、該載置用部材上に載置される被乾燥体と対向し、か
つ、該被乾燥体と前記排気口との間に位置するように配
設された多孔質板とを少なくとも備えることを特徴とす
る真空乾燥装置。1. A vacuum chamber having an exhaust port on an upper wall portion, a mounting member disposed at a bottom portion in the vacuum chamber, and an object to be dried mounted on the mounting member facing the vacuum chamber. And a porous plate disposed at least between the object to be dried and the exhaust port.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17553196A JP3776977B2 (en) | 1996-06-14 | 1996-06-14 | Vacuum drying equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17553196A JP3776977B2 (en) | 1996-06-14 | 1996-06-14 | Vacuum drying equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH102665A true JPH102665A (en) | 1998-01-06 |
| JP3776977B2 JP3776977B2 (en) | 2006-05-24 |
Family
ID=15997706
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17553196A Expired - Fee Related JP3776977B2 (en) | 1996-06-14 | 1996-06-14 | Vacuum drying equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3776977B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001095682A1 (en) * | 2000-06-08 | 2001-12-13 | Matsushita Electric Industrial Co., Ltd. | Method and device for drying materials and method of producing circuit boards using the same |
| KR100812009B1 (en) | 2005-10-31 | 2008-03-10 | 도쿄 오카 고교 가부시키가이샤 | Pressure-reduced treatment apparatus |
| JP2008089760A (en) * | 2006-09-29 | 2008-04-17 | Dainippon Printing Co Ltd | Manufacturing apparatus for color filter, manufacturing method of color filter, drying apparatus, drying method, manufacturing apparatus for display apparatus, manufacture method of display apparatus |
| US9881985B2 (en) | 2012-02-28 | 2018-01-30 | Boe Technology Group Co., Ltd. | OLED device, AMOLED display device and method for manufacturing same |
-
1996
- 1996-06-14 JP JP17553196A patent/JP3776977B2/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001095682A1 (en) * | 2000-06-08 | 2001-12-13 | Matsushita Electric Industrial Co., Ltd. | Method and device for drying materials and method of producing circuit boards using the same |
| US6893530B2 (en) | 2000-06-08 | 2005-05-17 | Matsushita Electric Industrial Co., Ltd. | Method and system of drying materials and method of manufacturing circuit boards using the same |
| KR100812009B1 (en) | 2005-10-31 | 2008-03-10 | 도쿄 오카 고교 가부시키가이샤 | Pressure-reduced treatment apparatus |
| JP2008089760A (en) * | 2006-09-29 | 2008-04-17 | Dainippon Printing Co Ltd | Manufacturing apparatus for color filter, manufacturing method of color filter, drying apparatus, drying method, manufacturing apparatus for display apparatus, manufacture method of display apparatus |
| US9881985B2 (en) | 2012-02-28 | 2018-01-30 | Boe Technology Group Co., Ltd. | OLED device, AMOLED display device and method for manufacturing same |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3776977B2 (en) | 2006-05-24 |
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