JPH10259292A - Epoxy resin molding material for sealing electronic part and electronic part - Google Patents

Epoxy resin molding material for sealing electronic part and electronic part

Info

Publication number
JPH10259292A
JPH10259292A JP1652697A JP1652697A JPH10259292A JP H10259292 A JPH10259292 A JP H10259292A JP 1652697 A JP1652697 A JP 1652697A JP 1652697 A JP1652697 A JP 1652697A JP H10259292 A JPH10259292 A JP H10259292A
Authority
JP
Japan
Prior art keywords
epoxy resin
molding material
component
resin molding
sealing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1652697A
Other languages
Japanese (ja)
Other versions
JP3783312B2 (en
Inventor
Shinsuke Hagiwara
伸介 萩原
Hiroyuki Saito
裕之 斎藤
Haruaki To
晴昭 陶
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP01652697A priority Critical patent/JP3783312B2/en
Publication of JPH10259292A publication Critical patent/JPH10259292A/en
Application granted granted Critical
Publication of JP3783312B2 publication Critical patent/JP3783312B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

PROBLEM TO BE SOLVED: To realize dehalogenation and de-antimony reaction and obtain the subject material capable of developing excellent environmental protection property and high-temperature storage characteristics without impairing flame retardance by compounding an epoxy resin with a specific cyclic phosphazene compound as a flame retardance. SOLUTION: This molding material consists essentially of (A) an epoxy resin having >=2 epoxy groups in the molecule [e.g. 4,4'-bis(2,3- epoxypropoxy)-3,3',5,5'-tetramethylbiphenyl], (B) a compound having >=2 phenolic OH groups in the molecule, (C) a compound of the formula [R and R' are each a 1-4C alkyl or an aryl; (n) is 3-5] and (D) an inorganic filler. The content of the component C is 0.2-3.0wt.% in terms of phosphorus amount based on total amount of compounding components excluding the component D and the content of the component D is >=70wt.% based on total amount of molding material.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半導体封止用エポ
キシ樹脂成形材料、特に環境対応の観点から要求される
ノンハロゲン系の電子部品封止用エポキシ樹脂成形材料
で、耐湿性、耐リフロークラック性など厳しい信頼性を
要求されるVLSIの封止用に好適な成形材料及びその
成形材料で素子を封止した電子部品に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an epoxy resin molding material for encapsulating semiconductors, particularly a non-halogen epoxy resin molding material for encapsulating electronic parts required from the viewpoint of environmental friendliness. The present invention relates to a molding material suitable for sealing a VLSI requiring strict reliability and an electronic component in which an element is sealed with the molding material.

【0002】[0002]

【従来の技術】従来から、トランジスタ、ICなどの電
子部品用素子の封止の分野ではエポキシ樹脂成形材料が
広く用いられている。この理由としては、エポキシ樹脂
が電気特性、耐湿性、耐熱性、機械特性、インサート品
との接着性などの諸特性にバランスがとれているためで
ある。これらのエポキシ樹脂成形材料の難燃化は主にテ
トラブロモビスフェノールAのジグリシジルエーテル等
のブロム化樹脂と酸化アンチモンの組合せにより行われ
ている。
2. Description of the Related Art Conventionally, epoxy resin molding materials have been widely used in the field of sealing elements for electronic parts such as transistors and ICs. The reason for this is that the epoxy resin is balanced in various properties such as electrical properties, moisture resistance, heat resistance, mechanical properties, and adhesiveness to insert products. Flame retardation of these epoxy resin molding materials is mainly carried out by a combination of a brominated resin such as diglycidyl ether of tetrabromobisphenol A and antimony oxide.

【0003】[0003]

【発明が解決しようとする課題】近年、環境保護の観点
からダイオキシンの問題に端を発し、デカブロムをはじ
めハロゲン化樹脂についても規制の動きがある。同様に
アンチモン化合物も毒性面から規制の動きがあり、電子
部品封止用エポキシ樹脂成形材料についても脱ハロゲン
化(脱ブロム化)、脱アンチモン化の要求が出てきてい
る。また、プラスチック封止ICの高温放置特性にブロ
ムイオンが悪影響を及ぼすことが知られており、この観
点からもブロム化樹脂量の低減が望まれている。本発明
はかかる状況に鑑みなされたもので、高温保管特性の優
れた電子部品封止用エポキシ樹脂材料を提供しようとす
るものである。
In recent years, the problem of dioxin originated from the viewpoint of environmental protection, and there has been a movement to regulate halogenated resins such as decabrom. Similarly, antimony compounds are being regulated from the viewpoint of toxicity, and there is a demand for dehalogenation (debromination) and deantimony of epoxy resin molding materials for encapsulating electronic components. It is also known that bromide ions have an adverse effect on the high-temperature storage characteristics of plastic-sealed ICs. From this viewpoint, it is desired to reduce the amount of brominated resin. The present invention has been made in view of such circumstances, and has as its object to provide an epoxy resin material for electronic component sealing having excellent high-temperature storage characteristics.

【0004】[0004]

【課題を解決するための手段】発明者らは上記の課題を
解決するために鋭意検討を重ねた結果、難燃剤として特
定の環状ホスファゼン化合物を配合することにより上記
の目的を達成しうることを見いだし、本発明を完成する
に至った。
Means for Solving the Problems As a result of intensive studies to solve the above-mentioned problems, the inventors have found that the above object can be achieved by blending a specific cyclic phosphazene compound as a flame retardant. They have found and completed the present invention.

【0005】すなわち、本発明は、(1)(A)1分子
中に2個以上のエポキシ基を持つエポキシ樹脂、(B)
1分子中に2個以上のフェノール性水酸基を持つ化合
物、(C)次式(I)
That is, the present invention relates to (1) (A) an epoxy resin having two or more epoxy groups in one molecule;
A compound having two or more phenolic hydroxyl groups in one molecule, (C) a compound represented by the following formula (I):

【化2】 (nは3〜5の整数で、R、R’は同じでも異なってい
てもよい炭素数1〜4のアルキル基またはアリール基を
示す)で示される環状ホスファゼン化合物、(D)無機
充填剤を必須成分とする成形材料であって、(C)成分
の含有量が充填剤(D)を除く配合成分の合計量に対し
て燐原子の量が0.2〜3.0重量%となる量であり、
(D)成分の含有量が成形材料全体に対して70重量%
以上であることを特徴とする電子部品封止用エポキシ樹
脂成形材料、(2)(C)成分のnが3である上記
(1)記載の電子部品封止用エポキシ樹脂成形材料、
(3)(C)成分のn個のR及びn個のR’が全てフェ
ニル基である上記(1)または(2)記載の電子部品封
止用エポキシ樹脂成形材料、(4)(C)成分のn個の
Rとn個のR’のうち2〜4個がヒドロキシフェニル基
であり、他の全てがフェニル基である上記(1)または
(2)記載の電子部品封止用エポキシ樹脂成形材料、
(5)(C)成分のn個のR及びn個のR’が全てヒド
ロキシフェニル基である上記(1)または(2)記載の
電子部品封止用エポキシ樹脂成形材料、(6)(A)成
分のエポキシ樹脂が4,4’−ビス(2,3−エポキシ
プロポキシ)−3,3’,5,5’−テトラメチルビフ
ェニルである上記(1)〜(5)記載のいずれかの電子
部品封止用エポキシ樹脂成形材料、(7)上記(1)〜
(6)記載のいずれかの電子部品封止用エポキシ樹脂成
形材料により素子を封止して得られる電子部品、であ
る。
Embedded image (N is an integer of 3 to 5, R and R ′ each represent an alkyl group or an aryl group having 1 to 4 carbon atoms which may be the same or different), and (D) an inorganic filler. A molding material as an essential component, wherein the content of the component (C) is such that the amount of phosphorus atoms is 0.2 to 3.0% by weight based on the total amount of the components except the filler (D). And
(D) The content of the component is 70% by weight based on the whole molding material.
The epoxy resin molding material for electronic component sealing, characterized in that: (2) The epoxy resin molding material for electronic component sealing according to (1), wherein n of the component (C) is 3.
(3) The epoxy resin molding material for encapsulating electronic parts according to the above (1) or (2), wherein n R and n R ′ of the component (C) are all phenyl groups, (4) (C) The epoxy resin for electronic component encapsulation according to the above (1) or (2), wherein 2 to 4 of n R and n R ′ components are hydroxyphenyl groups, and all others are phenyl groups. Molding materials,
(5) The epoxy resin molding material for encapsulating electronic parts according to the above (1) or (2), wherein n R and n R ′ of the component (C) are all hydroxyphenyl groups, (6) (A (1) The electron according to any one of (1) to (5), wherein the component epoxy resin is 4,4′-bis (2,3-epoxypropoxy) -3,3 ′, 5,5′-tetramethylbiphenyl. Epoxy resin molding material for parts encapsulation, (7) above (1) to
(6) An electronic component obtained by sealing the element with the epoxy resin molding material for electronic component sealing according to any one of (6).

【0006】[0006]

【発明の実施の形態】本発明において用いられる(A)
成分のエポキシ樹脂としては、電子部品封止用エポキシ
樹脂成形材料で一般に使用されているもので特に限定は
ないが、たとえば、フェノールノボラック型エポキシ樹
脂、オルソクレゾールノボラック型エポキシ樹脂をはじ
めとするフェノール類とアルデヒド類のノボラック樹脂
をエポキシ化したもの、ビスフェノールA、ビスフェノ
ールF、ビスフェノールS、アルキル置換ビフェノール
などのジグリシジルエーテル、ジアミノジフェニルメタ
ン、イソシアヌル酸などのポリアミンとエピクロルヒド
リンの反応により得られるグリシジルアミン型エポキシ
樹脂、オレフィン結合を過酢酸などの過酸で酸化して得
られる線状脂肪族エポキシ樹脂、及び脂環族エポキシ樹
脂などがあり、これらを適宜何種類でも併用することが
できる。
DETAILED DESCRIPTION OF THE INVENTION (A) used in the present invention
The epoxy resin of the component is not particularly limited as it is generally used in an epoxy resin molding material for sealing electronic components, and examples thereof include phenols such as phenol novolak epoxy resins and orthocresol novolac epoxy resins. Glycidylamine epoxy resin obtained by the reaction of epichlorohydrin with polyamines such as diglycidyl ethers such as bisphenol A, bisphenol F, bisphenol S, and alkyl-substituted biphenols, diaminodiphenylmethane, isocyanuric acid, etc. And linear aliphatic epoxy resins and alicyclic epoxy resins obtained by oxidizing olefin bonds with a peracid such as peracetic acid. Any of these may be used in combination.

【0007】上記に示したエポキシ樹脂の中で、4,
4’−ビス(2,3−エポキシプロポキシ)−3,
3’,5,5’−テトラメチルビフェニルなどのアルキ
ル置換ビフェノール型ジエポキシ樹脂を用いた場合、接
着性、吸湿性が良好であり、これにより耐リフロークラ
ック性及び耐湿性に優れた成形材料が得られる。このア
ルキル置換ビフェノール型ジエポキシ樹脂は、エポキシ
樹脂全量に対し60重量%以上使用することが好まし
い。60重量%未満では当該エポキシ樹脂の低吸湿性、
高接着性の特長が発揮されず、本発明の目的である耐は
んだ性に対して効果が小さい。当該エポキシ樹脂として
は、4,4’−ビスヒドロキシ3,3’,5,5’−テ
トラメチルビフェニルをエピクロルヒドリンを用いてエ
ポキシ化して得られるものなどが上げられる。
Among the epoxy resins shown above, 4,
4'-bis (2,3-epoxypropoxy) -3,
When an alkyl-substituted biphenol type diepoxy resin such as 3 ′, 5,5′-tetramethylbiphenyl is used, the adhesiveness and the hygroscopicity are good, whereby a molding material having excellent reflow crack resistance and moisture resistance is obtained. Can be The alkyl-substituted biphenol type diepoxy resin is preferably used in an amount of 60% by weight or more based on the total amount of the epoxy resin. If it is less than 60% by weight, the epoxy resin has low moisture absorption,
The high adhesiveness is not exhibited, and the effect of the present invention on the solder resistance is small. Examples of the epoxy resin include those obtained by epoxidizing 4,4′-bishydroxy 3,3 ′, 5,5′-tetramethylbiphenyl using epichlorohydrin.

【0008】本発明において用いられる(B)成分の1
分子中に2個以上のフェノール性水酸基を有する化合物
としては、フェノール、クレゾール、キシレノール、レ
ゾルシン、カテコール、ビスフェノールA、ビスフェノ
ールFなどのフェノール類又はα−ナフトール、β−ナ
フトール、ジヒドロキシナフタレン等のナフトール類と
ホルムアルデヒド、アセトアルデヒド、プロピオンアル
デヒド、ベンズアルデヒド、サリチルアルデヒド等のア
ルデヒド類とを酸性触媒下で縮合又は共縮合させて得ら
れる樹脂、ポリパラビニルフェノール樹脂、フェノール
類とジメトキシパラキシレンから合成されるキシリレン
基を有するフェノール・アラルキル樹脂などがあり、単
独又は2種類以上併用してもよい。
[0008] One of the components (B) used in the present invention
Compounds having two or more phenolic hydroxyl groups in the molecule include phenols such as phenol, cresol, xylenol, resorcinol, catechol, bisphenol A, bisphenol F, and naphthols such as α-naphthol, β-naphthol, dihydroxynaphthalene and the like. Resin obtained by condensing or co-condensing aldehydes such as formaldehyde, acetaldehyde, propionaldehyde, benzaldehyde, salicylaldehyde with an acidic catalyst, polyparavinylphenol resin, xylylene group synthesized from phenols and dimethoxyparaxylene And a phenol-aralkyl resin having the following formula. These may be used alone or in combination of two or more.

【0009】(A)成分のエポキシ樹脂と(B)成分の
フェノール化合物の当量比((B)の水酸基数/(A)
のエポキシ基数)は、特に限定はされないが、それぞれ
の未反応分を少なく抑えるために0.7〜1.3の範囲
に設定することが好ましい。
The equivalent ratio of the epoxy resin (A) to the phenol compound (B) (the number of hydroxyl groups in (B) / (A))
Is not particularly limited, but is preferably set in the range of 0.7 to 1.3 in order to reduce the amount of each unreacted component.

【0010】また、エポキシ樹脂とフェノール樹脂の硬
化反応を促進する硬化促進剤を必要に応じて使用するこ
とができる。この硬化促進剤としては、例えば、1,8
−ジアザビシクロ(5,4,0)ウンデセン−7などの
ジアザビシクロアルケン及びその誘導体、トリエチレン
ジアミン、ベンジルジメチルアミン、トリエタノールア
ミン、ジメチルアミノエタノール、トリス(ジメチルア
ミノメチル)フェノールなどの三級アミン類、2−メチ
ルイミダゾール、2−フェニルイミダゾール、2−フェ
ニル−4−メチルイミダゾール、2−ヘプタデシルイミ
ダゾールなどのイミダゾール類、トリブチルホスフィ
ン、メチルジフェニルホスフィン、トリフェニルホスフ
ィンなどの有機ホスフィン類、テトラフェニルホスホニ
ウム・テトラフェニルボレートなどのテトラ置換ホスホ
ニウム・テトラ置換ボレート、2−エチル−4−メチル
イミダゾール・テトラフェニルボレート、N−メチルモ
ルホリン・テトラフェニルボレートなどのテトラフェニ
ルボロン塩などがある。
[0010] A curing accelerator for accelerating the curing reaction between the epoxy resin and the phenol resin can be used as required. As this curing accelerator, for example, 1,8
-Diazabicycloalkenes and derivatives thereof such as diazabicyclo (5,4,0) undecene-7 and tertiary amines such as triethylenediamine, benzyldimethylamine, triethanolamine, dimethylaminoethanol and tris (dimethylaminomethyl) phenol Imidazoles such as 2-methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole and 2-heptadecylimidazole; organic phosphines such as tributylphosphine, methyldiphenylphosphine and triphenylphosphine; and tetraphenylphosphonium. Tetra-substituted phosphonium / tetra-substituted borate such as tetraphenyl borate, 2-ethyl-4-methylimidazole / tetraphenyl borate, N-methylmorpholine / tetraf And the like tetraphenyl boron salts such as Niruboreto.

【0011】本発明において難燃剤として用いられる
(C)成分の環状ホスファゼン化合物は、次式(I)
The cyclic phosphazene compound (C) used as a flame retardant in the present invention is represented by the following formula (I):

【化3】 (nは3〜5の整数で、R、R’は同じでも異なってい
てもよい炭素数1〜4のアルキル基またはアリール基を
示す)で示される化合物で、3量体の6員環、4量体の
8員環、5量体の10員環を単独あるいは混合して用い
ることができる。エポキシ樹脂成形材料の流動性からは
3量体を主成分として用いることが好ましい。
Embedded image (N is an integer of 3 to 5, and R and R ′ each represent an alkyl group or an aryl group having 1 to 4 carbon atoms which may be the same or different), a 6-membered trimer ring, A tetramer 8-membered ring and a pentamer 10-membered ring can be used alone or as a mixture. It is preferable to use a trimer as a main component from the fluidity of the epoxy resin molding material.

【0012】上記式(I)中のn個のR、R’は同じで
も異なっていてもよい炭素数1〜4のアルキル基または
アリール基で、たとえばnが3の3量体6員環の場合に
はR、R’は6個の置換基となり、これらは全て同じで
も異なっていてもよい。エポキシ樹脂成形材料の耐熱
性、耐湿性の観点からはアリール基が好ましい。特にフ
ェニル基であることが好ましく、さらに好ましくはヒド
ロキシフェニル基である。ヒドロキシフェニル基を導入
する場合には、n個のRとn個のR’が全てヒドロキシ
フェニル基でも良いが、2〜4個の導入が好ましい。ヒ
ドロキシフェニル基の数が5個以上になるとエポキシ樹
脂硬化物が脆くなりやすく、2個未満の場合にはエポキ
シ樹脂の架橋構造に取り込まれない成分がでてくるた
め、耐熱性が低下しやすい。
In the above formula (I), n R's and R ''s may be the same or different and are an alkyl group or an aryl group having 1 to 4 carbon atoms. In such a case, R and R 'are 6 substituents, which may be the same or different. An aryl group is preferable from the viewpoint of heat resistance and moisture resistance of the epoxy resin molding material. Particularly, it is preferably a phenyl group, and more preferably a hydroxyphenyl group. When a hydroxyphenyl group is introduced, n R and n R ′ may all be hydroxyphenyl groups, but preferably 2 to 4 introductions. When the number of hydroxyphenyl groups is 5 or more, the epoxy resin cured product is apt to become brittle, and when the number is less than 2, components that are not taken into the crosslinked structure of the epoxy resin appear, so that the heat resistance tends to decrease.

【0013】本発明において用いられる(C)成分の環
状ホスファゼン化合物の好ましい構造として、たとえ
ば、次の式(II)〜(IV)
Preferred structures of the cyclic phosphazene compound (C) used in the present invention include, for example, the following formulas (II) to (IV)

【化4】 Embedded image

【化5】 Embedded image

【化6】 (R1〜R6のうち2〜4個は水酸基で、他の4〜2個は
水素を示す)などがあげられる。
Embedded image (2 to 4 of R 1 to R 6 are hydroxyl groups, and the other 4 to 2 are hydrogen).

【0014】これらの環状ホスファゼン化合物の添加量
は、充填剤を除く他の全配合成分に対して、0.2〜
3.0重量%の範囲内であることが必要である。0.2
重量%より少ない場合は難燃効果が発揮されず、3.0
重量%を超えた場合は耐湿性の低下を引き起こす。
The amount of the cyclic phosphazene compound to be added is 0.2 to 0.2% based on all the other components except the filler.
It must be within the range of 3.0% by weight. 0.2
If the amount is less than 3.0% by weight, the flame retardant effect is not exhibited, and
If the content is more than 10% by weight, the moisture resistance is reduced.

【0015】本発明においては、(C)成分の特定の環
状ホスファゼン化合物を用いることで信頼性、成形性の
優れたノンハロゲン、ノンアンチモンの難燃性電子部品
封止用エポキシ樹脂成形材料を提供するものである。燐
化合物と窒素化合物の併用が難燃化に良いことは一般的
に知られているが、本発明は優れた信頼性を発揮できる
半導体封止用エポキシ樹脂成形材料の難燃剤成分とし
て、燐原子と窒素原子の双方を構造中に含む化合物を提
供するものである。
According to the present invention, there is provided a non-halogen, non-antimony non-flammable epoxy resin molding material for sealing electronic parts having excellent reliability and moldability by using a specific cyclic phosphazene compound as the component (C). Things. It is generally known that the combined use of a phosphorus compound and a nitrogen compound is good for flame retardancy. However, the present invention uses phosphorus atom as a flame retardant component of an epoxy resin molding material for semiconductor encapsulation capable of exhibiting excellent reliability. And a nitrogen atom in the structure.

【0016】また、充填剤としては吸湿性低減及び強度
向上の観点から無機充填剤を用いることが必要である。
本発明における(D)成分の無機質充填剤としては、溶
融シリカ、結晶シリカ、アルミナ、ジルコン、珪酸カル
シウム、炭酸カルシウム、炭化珪素、窒化ホウ素、ベリ
リア、ジルコニア、などの粉体、又はこれらを球形化し
たビーズ、チタン酸カリウム、炭化珪素、窒化珪素、ア
ルミナなどの単結晶繊維、ガラス繊維などを1種類以上
配合して用いることができる。さらに、難燃効果のある
無機充填剤としては水酸化アルミニウム、水酸化マグネ
シウム、硼酸亜鉛などが上げられ、これらを単独または
併用して用いることもできる。無機質充填剤の配合量と
しては、吸湿性、線膨張係数の低減及び強度向上の観点
から70重量%以上が好ましい。上記の無機充填剤の中
で、線膨張係数低減の観点からは溶融シリカが、高熱伝
導性の観点からはアルミナが好ましく、充填剤形状は成
形時の流動性及び金型摩耗性の点から球形が好ましい。
Further, it is necessary to use an inorganic filler as the filler from the viewpoint of reducing the hygroscopicity and improving the strength.
As the inorganic filler of the component (D) in the present invention, powders of fused silica, crystalline silica, alumina, zircon, calcium silicate, calcium carbonate, silicon carbide, boron nitride, beryllia, zirconia, and the like, or spherical powders thereof One or more kinds of beads, single crystal fibers such as potassium titanate, silicon carbide, silicon nitride, and alumina, and glass fibers can be used. Further, examples of the inorganic filler having a flame-retardant effect include aluminum hydroxide, magnesium hydroxide, zinc borate and the like, and these can be used alone or in combination. The amount of the inorganic filler is preferably 70% by weight or more from the viewpoints of hygroscopicity, reduction of linear expansion coefficient and improvement of strength. Among the above-mentioned inorganic fillers, fused silica is preferred from the viewpoint of reducing the coefficient of linear expansion, and alumina is preferred from the viewpoint of high thermal conductivity, and the filler shape is spherical from the viewpoint of fluidity during molding and mold abrasion. Is preferred.

【0017】その他の添加剤として高級脂肪酸、高級脂
肪酸金属塩、エステル系ワックス、ポリオレフィン系ワ
ックスなどの離型剤、カーボンブラックなどの着色剤、
エポキシシラン、アミノシラン、ウレイドシラン、ビニ
ルシラン、アルキルシラン、有機チタネート、アルミニ
ウムアルコレートなどのカップリング剤などを用いるこ
とができる。
Other additives include release agents such as higher fatty acids, metal salts of higher fatty acids, ester waxes and polyolefin waxes, and colorants such as carbon black.
Coupling agents such as epoxy silane, amino silane, ureido silane, vinyl silane, alkyl silane, organic titanate, and aluminum alcoholate can be used.

【0018】本発明における成形材料は、各種原材料を
均一に分散混合できるのであれば、いかなる手法を用い
ても調製できるが、一般的な手法として、所定の配合量
の原材料をミキサー等によって十分混合した後、ミキシ
ングロール、押出機等によって溶融混練した後、冷却、
粉砕する方法を挙げることができる。
The molding material in the present invention can be prepared by any method as long as the various raw materials can be uniformly dispersed and mixed. As a general method, the raw materials having a predetermined blending amount are sufficiently mixed by a mixer or the like. After mixing, melt-kneading with a mixing roll, extruder, etc., cooling,
A pulverizing method can be used.

【0019】リードフレーム、配線済みのテープキャリ
ア、配線板、ガラス、シリコンウエハなどの支持部材
に、半導体チップ、トランジスタ、ダイオード、サイリ
スタなどの能動素子、コンデンサ、抵抗体、コイルなど
の受動素子等の素子を搭載し、必要な部分を本発明の封
止用成形材料で封止して、電子部品を製造することがで
きる。このような電子部品としては、たとえば、テープ
キャリアにバンプで接続した半導体チップを、本発明の
成形材料で封止したTCPを挙げることができる。ま
た、配線板やガラス上に形成した配線に、ワイヤーボン
ディング、フリップチップボンディング、はんだなどで
接続した半導体チップ、トランジスタ、ダイオード、サ
イリスタなどの能動素子及び/又はコンデンサ、抵抗
体、コイルなどの受動素子を、本発明の成形材料で封止
したCOBモジュール、ハイブリッドIC、マルチチッ
プモジュールなどを挙げることができる。電子部品を封
止する方法としては、低圧トランスファー成形法が最も
一般的であるが、インジェクション成形法、圧縮成形法
等を用いてもよい。
On a supporting member such as a lead frame, a wired tape carrier, a wiring board, glass, or a silicon wafer, active elements such as semiconductor chips, transistors, diodes, and thyristors, and passive elements such as capacitors, resistors, and coils are provided. An electronic component can be manufactured by mounting the element and sealing a necessary portion with the molding material for sealing of the present invention. An example of such an electronic component is a TCP in which a semiconductor chip connected to a tape carrier by a bump is sealed with the molding material of the present invention. Also, active elements such as semiconductor chips, transistors, diodes, thyristors, and / or passive elements such as capacitors, resistors, and coils are connected to wiring formed on a wiring board or glass by wire bonding, flip chip bonding, soldering, or the like. , A COB module, a hybrid IC, a multi-chip module, and the like, which are sealed with the molding material of the present invention. As a method of sealing the electronic component, a low-pressure transfer molding method is the most common, but an injection molding method, a compression molding method, or the like may be used.

【0020】[0020]

【実施例】次に実施例により本発明を説明するが、本発
明の範囲はこれらの実施例に限定されるものではない。
Next, the present invention will be described with reference to examples, but the scope of the present invention is not limited to these examples.

【0021】実施例1〜6 エポキシ当量200、軟化点67℃のクレゾールノボラ
ック型エポキシ樹脂、エポキシ当量188、融点106
℃のビフェニル骨格型エポキシ樹脂(4,4’−ビス
(2,3−エポキシプロポキシ)−3,3’,5,5’
−テトラメチルビフェニル)、水酸基当量106、軟化
点83℃のフェノールノボラック樹脂、水酸基当量16
7、軟化点70℃のフェノール・アラルキル樹脂(三井
東圧製;ミレックスXL−225)、トリフェニルホス
フィン、カルナバワックス、カーボンブラック、カップ
リング剤としてγ−グリシドキシプロピルトリメトキシ
シラン、溶融シリカ、及び難燃剤として、本発明の
(C)成分であり次の構造式で示される化合物1〜化合
物3
Examples 1 to 6 Cresol novolak type epoxy resin having an epoxy equivalent of 200 and a softening point of 67 ° C., an epoxy equivalent of 188 and a melting point of 106
C. biphenyl skeleton type epoxy resin (4,4'-bis (2,3-epoxypropoxy) -3,3 ', 5,5'
Phenol novolak resin having a hydroxyl equivalent of 106 and a softening point of 83 ° C., a hydroxyl equivalent of 16
7, a phenol-aralkyl resin having a softening point of 70 ° C. (Mitsui Toatsu; Millex XL-225), triphenylphosphine, carnauba wax, carbon black, γ-glycidoxypropyltrimethoxysilane as a coupling agent, fused silica, And as a flame retardant, compound 1 to compound 3 which are component (C) of the present invention and are represented by the following structural formula:

【化7】 Embedded image

【化8】 Embedded image

【化9】 (R1〜R6のうち3個は水酸基で他の3個は水素を示
す)、を表1に示す重量比で配合し、混練温度80〜9
0℃、混練時間10分の条件でロール混練を行い、実施
例1〜6の成形材料を作製した。
Embedded image (Three of R 1 to R 6 represent hydroxyl groups and the other three represent hydrogen) at a weight ratio shown in Table 1 and a kneading temperature of 80 to 9
Roll kneading was performed under the conditions of 0 ° C. and a kneading time of 10 minutes to produce molding materials of Examples 1 to 6.

【0022】比較例1、2 難燃剤としてエポキシ当量375、軟化点80℃、臭素
含量48重量%のブロム化ビスフェノールA型エポキシ
樹脂及び三酸化アンチモンを使用した以外は実施例と同
様に、表1に示す配合で比較例1、2の成形材料を作製
した。
Comparative Examples 1 and 2 In the same manner as in Example 1, except that a brominated bisphenol A type epoxy resin having an epoxy equivalent of 375, a softening point of 80 ° C. and a bromine content of 48% by weight and an antimony trioxide were used as flame retardants. The molding materials of Comparative Examples 1 and 2 were produced with the composition shown in Table 1.

【0023】[0023]

【表1】 [Table 1]

【0024】実施例及び比較例で得られた成形材料の特
性を、次に示す方法で評価した。 (1)熱時硬度 直径100mm、厚さ3mmの円板を成形する金型を使
用し、トランスファプレスにて180±3℃、6.9±
0.17MPa、90秒の条件で成形材料を成形し、成
形直後の成形品の熱時硬度をショア硬度計(Dタイプ)
により求めた。なお、熱時硬度の値は数値が高いほど良
いと評価する。 (2)吸水率 JIS−K−6911に準拠した、直径50mm厚さ3
mmの円板を作製し、85℃、85%RHの条件で加湿
を行い、所定時間後の重量変化から求めた。 (3)接着性 30μmのアルミ箔上に成形材料をトランスファプレス
にて180±3℃、6.9±0.17MPa、90秒の
条件で成形し、その後、アルミ箔の90度方向へのピー
ル強度を測定した。 (4)難燃性 厚さ1/16インチの試験片を成形する金型を使用し、
トランスファプレスにて180±3℃、6.9±0.1
7MPa、90秒の条件で成形材料を成形し、その後1
80±5℃、5時間後硬化を行った。評価はUL94−
V0試験法に従った。 (5)高温放置特性 外形サイズ5×9(mm)で5μmの酸化膜を有するシ
リコンサブストレート上にライン/スペースが10μm
のアルミ配線を形成したテスト素子を使用して、部分銀
メッキを施した42アロイのリードフレームに銀ペース
トで接続し、サーモソニック型ワイヤボンダにより20
0℃で素子のボンディングパッドとインナリードをAu
線にて接続した。その後、トランスファ成形により16
ピン型DIP(Dual Inline Packag
e)を作製し、得られた試験用ICを200℃の高温槽
に保管し、所定時間毎に取り出して導通試験を行い、不
良数を調べた。なお、評価用ICパッケージの成形はト
ランスファプレスにて180±3℃、6.9±0.17
MPa、90秒の条件で成形材料を成形し、その後18
0±5℃、5時間後硬化を行った。
The properties of the molding materials obtained in Examples and Comparative Examples were evaluated by the following methods. (1) Hot hardness Using a mold for forming a disk having a diameter of 100 mm and a thickness of 3 mm, using a transfer press at 180 ± 3 ° C and 6.9 ±.
A molding material is molded under the conditions of 0.17 MPa and 90 seconds, and the hardness of the molded product immediately after molding is measured by a Shore hardness tester (D type).
Determined by In addition, it is evaluated that the higher the value of the hardness at the time of heating, the better. (2) Water absorption 50 mm in diameter and 3 in thickness according to JIS-K-6911
A disk having a thickness of mm was prepared, humidified under the conditions of 85 ° C. and 85% RH, and determined from a change in weight after a predetermined time. (3) Adhesiveness A molding material is formed on a 30 μm aluminum foil by a transfer press under the conditions of 180 ± 3 ° C., 6.9 ± 0.17 MPa, 90 seconds, and then the aluminum foil is peeled in a 90 ° direction. The strength was measured. (4) Flame retardancy Using a mold for molding a test piece 1/16 inch thick,
180 ± 3 ° C, 6.9 ± 0.1 with transfer press
The molding material is molded under the conditions of 7 MPa and 90 seconds.
Post-curing was performed at 80 ± 5 ° C. for 5 hours. Evaluation is UL94-
The V0 test method was followed. (5) High temperature storage characteristics Line / space is 10 μm on a silicon substrate having an outer size of 5 × 9 (mm) and a 5 μm oxide film.
Using a test element having aluminum wiring formed thereon, it was connected to a 42-alloy lead frame partially silver-plated with silver paste, and a thermosonic wire bonder was used to connect the alloy to the lead frame.
At 0 ° C, the bonding pads and inner leads of the device are Au
Connected by wire. After that, transfer molding
Pin type DIP (Dual Inline Package)
e) was prepared, and the obtained test IC was stored in a high-temperature bath at 200 ° C., taken out every predetermined time and subjected to a continuity test, and the number of defects was examined. The IC package for evaluation was molded by a transfer press at 180 ± 3 ° C. and 6.9 ± 0.17.
The molding material was molded under the conditions of 90 MPa for 90 seconds.
After 5 hours at 0 ± 5 ° C., curing was performed.

【0025】得られた評価結果を表2に示す。Table 2 shows the obtained evaluation results.

【表2】 [Table 2]

【0026】本発明の実施例1〜6は、ブロム化樹脂及
びアンチモン化合物を含む比較例1、2と較べ高温放置
特性が格段に向上している。特に、実施例4〜6はビフ
ェニル骨格型エポキシ樹脂を使用しているため接着性も
良好である。本発明の難燃剤を用いた実施例はいずれも
高温放置特性が良好で、難燃性にも優れているが、化合
物1はエポキシ基と反応可能な官能基を持たないため、
これを難燃剤として用いた場合は実施例1及び4に示す
ように熱時硬度がやや低下する。また、化合物2は6個
の置換基が全てエポキシ基と反応可能なヒドロキシフェ
ニル基であるため、これを用いた実施例2及び5は硬化
性は良好であるが、接着性がやや低下する。置換基のう
ち3個がヒドロキシフェニル基である化合物3を使用し
た実施例3及び6は熱時硬度と接着性のバランスに特に
優れる。
In Examples 1 to 6 of the present invention, the high-temperature storage characteristics are remarkably improved as compared with Comparative Examples 1 and 2 containing a brominated resin and an antimony compound. Particularly, in Examples 4 to 6, the biphenyl skeleton type epoxy resin is used, so that the adhesiveness is also good. All of the examples using the flame retardant of the present invention have good high-temperature storage characteristics and excellent flame retardancy, but since Compound 1 does not have a functional group capable of reacting with an epoxy group,
When this is used as a flame retardant, the hardness when heated is slightly reduced as shown in Examples 1 and 4. In addition, since all of the six substituents of the compound 2 are hydroxyphenyl groups capable of reacting with an epoxy group, Examples 2 and 5 using the compound have good curability, but have a slight decrease in adhesiveness. Examples 3 and 6 using compound 3 in which three of the substituents are hydroxyphenyl groups are particularly excellent in the balance between the hardness when heated and the adhesiveness.

【0027】[0027]

【発明の効果】本発明によって得られる電子部品封止用
エポキシ樹脂成形材料は実施例で示したようにノンハロ
ゲン、ノンアンチモンで難燃化を達成でき、これを用い
てIC、LSIなどの電子部品を封止すれば成形性が良
好であり、耐湿性、高温放置特性などの信頼性に優れた
製品を得ることができ、その工業的価値は大である。
The epoxy resin molding material for encapsulating electronic parts obtained by the present invention can achieve flame retardancy with non-halogen and non-antimony as shown in the examples, and is used for electronic parts such as ICs and LSIs. Is sealed, the product is excellent in moldability, and a product having excellent reliability such as moisture resistance and high-temperature storage characteristics can be obtained, and its industrial value is great.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 FI H01L 23/31 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 6 Identification code FI H01L 23/31

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】(A)1分子中に2個以上のエポキシ基を
持つエポキシ樹脂、(B)1分子中に2個以上のフェノ
ール性水酸基を持つ化合物、(C)次式(I) 【化1】 (nは3〜5の整数で、R、R’は同じでも異なってい
てもよい炭素数1〜4のアルキル基またはアリール基を
示す)で示される環状ホスファゼン化合物、(D)無機
充填剤、を必須成分とする成形材料であって、(C)成
分の含有量が充填剤(D)を除く配合成分の合計量に対
して燐原子の量が0.2〜3.0重量%となる量であ
り、(D)成分の含有量が成形材料全体に対して70重
量%以上であることを特徴とする電子部品封止用エポキ
シ樹脂成形材料。
(1) an epoxy resin having two or more epoxy groups in one molecule; (B) a compound having two or more phenolic hydroxyl groups in one molecule; (C) a compound having the following formula (I): Formula 1 (N is an integer of 3 to 5, R and R 'each represent an alkyl group or an aryl group having 1 to 4 carbon atoms which may be the same or different), (D) an inorganic filler, Wherein the content of the component (C) is 0.2 to 3.0% by weight based on the total amount of the components except the filler (D). An epoxy resin molding material for encapsulating electronic components, wherein the content of the component (D) is 70% by weight or more based on the whole molding material.
【請求項2】(C)成分のnが3である請求項1記載の
電子部品封止用エポキシ樹脂成形材料。
2. The epoxy resin molding material according to claim 1, wherein n of component (C) is 3.
【請求項3】(C)成分のn個のR及びn個のR’が全
てフェニル基である請求項1または請求項2記載の電子
部品封止用エポキシ樹脂成形材料。
3. The epoxy resin molding material for sealing electronic parts according to claim 1, wherein n R and n R ′ of the component (C) are all phenyl groups.
【請求項4】(C)成分のn個のRとn個のR’のうち
2〜4個がヒドロキシフェニル基であり、他の全てがフ
ェニル基である請求項1または請求項2記載の電子部品
封止用エポキシ樹脂成形材料。
4. The method according to claim 1, wherein 2 to 4 of n R and n R ′ of the component (C) are hydroxyphenyl groups, and all others are phenyl groups. Epoxy resin molding material for sealing electronic components.
【請求項5】(C)成分のn個のR及びn個のR’が全
てヒドロキシフェニル基である請求項1または請求項2
記載の電子部品封止用エポキシ樹脂成形材料。
5. The method according to claim 1, wherein n R and n R ′ of the component (C) are all hydroxyphenyl groups.
The epoxy resin molding material for sealing electronic parts according to the above.
【請求項6】(A)成分のエポキシ樹脂が4,4’−ビ
ス(2,3−エポキシプロポキシ)−3,3’,5,
5’−テトラメチルビフェニルである請求項1〜5各項
記載のいずれかの電子部品封止用エポキシ樹脂成形材
料。
6. The epoxy resin as component (A) is 4,4'-bis (2,3-epoxypropoxy) -3,3 ', 5.
The epoxy resin molding material for sealing electronic parts according to any one of claims 1 to 5, which is 5'-tetramethylbiphenyl.
【請求項7】請求項1〜6各項記載のいずれかの電子部
品封止用エポキシ樹脂成形材料により素子を封止して得
られる電子部品。
7. An electronic component obtained by sealing an element with the epoxy resin molding material for electronic component sealing according to any one of claims 1 to 6.
JP01652697A 1997-01-17 1997-01-30 Epoxy resin molding material for electronic component sealing and electronic component Expired - Lifetime JP3783312B2 (en)

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