JPH10237699A - Method for removing titanium compound coating - Google Patents

Method for removing titanium compound coating

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Publication number
JPH10237699A
JPH10237699A JP3891497A JP3891497A JPH10237699A JP H10237699 A JPH10237699 A JP H10237699A JP 3891497 A JP3891497 A JP 3891497A JP 3891497 A JP3891497 A JP 3891497A JP H10237699 A JPH10237699 A JP H10237699A
Authority
JP
Japan
Prior art keywords
coating film
titanium compound
titanium
potential difference
base material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3891497A
Other languages
Japanese (ja)
Inventor
Yoshitaka Totsutori
由貴 鳥取
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Metal Mining Co Ltd
Original Assignee
Sumitomo Metal Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Mining Co Ltd filed Critical Sumitomo Metal Mining Co Ltd
Priority to JP3891497A priority Critical patent/JPH10237699A/en
Publication of JPH10237699A publication Critical patent/JPH10237699A/en
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide a method for perfectly removing or peeling titanium compound coating composed of TiC or TiCN applied on the surface of a metallic base material in a short time without damaging the metallic base material at the inside. SOLUTION: A member in which the surface of a metallic base material is applied with titanium compound coating composed of TiC or TiCN is immersed in an alkaline electrolyte of >=7.3pH preferably, of >=8.0pH, electric current is made to flow between the member as an anode and a reference electrode, and the potential difference between the member and the reference electrode is regulated to +0.1 to +1.0V (to silver-silver chloride electrode couple), by which the titanium compound coating is melted away.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、チタンの炭化物又
は炭窒化物のようなチタン化合物の表面被覆膜が施され
た金属部材から、チタン化合物の表面被覆膜を除去する
方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of removing a titanium compound surface coating from a metal member having a titanium compound such as titanium carbide or carbonitride. is there.

【0002】[0002]

【従来の技術】現在、金属材料よりなる基材の表面に、
耐摩耗性などの機械的特性や耐食性の向上あるいは装飾
を目的として、各種金属や金属化合物の被覆膜をめっき
法により被覆することが一般に行われている。特に炭化
チタンや炭窒化チタンなどのチタン化合物の被覆膜は、
高硬度で耐摩耗性及び耐熱性に優れるため、各種切削工
具や機械部品、金型、弁などに多く適用されている。
2. Description of the Related Art At present, the surface of a base material made of a metal material is
2. Description of the Related Art For the purpose of improving mechanical properties such as abrasion resistance and corrosion resistance or decorating, coating with a coating film of various metals or metal compounds by a plating method is generally performed. In particular, a coating film of a titanium compound such as titanium carbide or titanium carbonitride,
Due to its high hardness and excellent wear resistance and heat resistance, it is widely applied to various cutting tools, machine parts, dies, valves and the like.

【0003】かかるチタン化合物からなる表面被覆膜の
形成に用いられるめっき法には、大きく分けて湿式法と
乾式法があり、更に乾式法としてイオンプレーティング
法、蒸着法、スパッタリング法などがある。特に乾式法
の多くは、金属蒸発源と反応ガスを選択することによっ
て、金属化合物の被覆膜を容易に得ることができる手段
として広く普及している。
The plating method used for forming a surface coating film made of such a titanium compound is roughly classified into a wet method and a dry method, and further includes an ion plating method, a vapor deposition method, a sputtering method, and the like. . In particular, many dry methods are widely used as means for easily obtaining a coating film of a metal compound by selecting a metal evaporation source and a reaction gas.

【0004】しかし、これらの方法によって基材表面に
被覆膜を形成する場合に、成膜条件を誤ったり、成膜装
置上のトラブルなどの原因により、被覆膜付き金属部材
が不良品となることがある。また、例えば被覆膜付きの
切削工具のような部材においては、その使用過程で局部
的に被覆膜が損傷することによって寿命となることが多
い。このような場合には、不良品となり又は寿命となっ
た部材又は基材の表面に、再度被覆膜を施して製品とす
ることが広く行われており、特に基材が高価である場合
などには有効である。
However, when a coating film is formed on the substrate surface by these methods, the metal member with the coating film may be defective due to an incorrect film forming condition or a trouble in the film forming apparatus. May be. Further, for example, in the case of a member such as a cutting tool with a coating film, the coating film is locally damaged in the course of its use, so that the life is often increased. In such a case, it is widely practiced to apply a coating film again on the surface of a member or a base material that has become a defective product or that has reached the end of its life, especially when the base material is expensive. Is effective.

【0005】しかしながら、被覆膜を再形成する際に、
最初に施した被覆膜が残った状態の基材をそのまま用い
ると、再形成した被覆膜に割れや欠落、色調の違い、寸
法の変化などが生じやすい。そこで、被覆膜の再形成に
際して、最初に施した被覆膜を一旦全て除去又は剥離
し、元の基材の状態に戻してから再被覆することが一般
的に行われている。
However, when the coating film is reformed,
If the base material in which the coating film applied first remains is used as it is, the reformed coating film is likely to have cracks or missing portions, a difference in color tone, a change in dimensions, and the like. Therefore, when re-forming the coating film, it is common practice to remove or peel off the coating film that has been applied first, return to the original substrate state, and then re-coat.

【0006】かかる被覆膜の除去又は剥離は、研磨、研
削等の機械的手段によっても行われるが、特に形状の複
雑な部材や被覆膜厚の厚いもの、表面積の大きいものな
どでは除去又は剥離に時間と手間とを要するため、薬品
浸漬による除去又は剥離が広く用いられている。例え
ば、被覆膜が窒化チタンなどのチタン系化合物からなる
場合には、特公昭63−53266号公報に記載されて
いるように、過酸化水素とアルカリ剤とを含有する水溶
液に浸漬することによって、除去又は剥離できることが
知られている。
[0006] The removal or peeling of the coating film is also performed by mechanical means such as polishing and grinding. Particularly, in the case of a member having a complicated shape, a material having a large coating film thickness, or a material having a large surface area, it is removed or stripped. Since stripping requires time and effort, removal or stripping by chemical immersion is widely used. For example, when the coating film is made of a titanium-based compound such as titanium nitride, as described in JP-B-63-53266, it is immersed in an aqueous solution containing hydrogen peroxide and an alkali agent. , Can be removed or stripped.

【0007】[0007]

【発明が解決しょうとする課題】上記特公昭63−53
266号公報に記載の方法は、窒化チタンの被覆膜の剥
離には有効であるが、チタンの炭化物や炭窒化物からな
る被覆膜を除去又は剥離しようとすると、窒化チタンの
場合に比較して数倍〜数十倍もの時間を必要とする。こ
れは、チタンの炭化物又は炭窒化物からなる被覆膜が、
チタン窒化物の被覆膜に比べて化学的に安定であるため
と考えられる。
[Problems to be Solved by the Invention]
Although the method described in Japanese Patent Publication No. 266 is effective for peeling off the coating film of titanium nitride, it is difficult to remove or peel off the coating film made of titanium carbide or carbonitride. It takes several times to several tens of times. This is because the coating film made of titanium carbide or carbonitride,
This is probably because the film is chemically more stable than the titanium nitride coating film.

【0008】そこで、このように安定なチタンの炭化物
又は炭窒化物の被覆膜を除去又は剥離するため、一般的
に剥離液として多く使用されている硝酸や弗酸などの無
機強酸溶液を用いると、酸化力が強すぎるために、内部
の金属基材までが損なわれることが多い。
Therefore, in order to remove or remove such a stable coating film of titanium carbide or carbonitride, an inorganic strong acid solution such as nitric acid or hydrofluoric acid, which is generally used as a stripping solution, is used. In this case, since the oxidizing power is too strong, the internal metal substrate is often damaged.

【0009】本発明は、このような従来の事情に鑑み、
金属基材の表面に施されたチタンの炭化物又は炭窒化物
からなる被覆膜を、内部の金属基材を損傷させることな
く、短時間で完全に除去又は剥離する方法を提供するこ
とを目的とする。
The present invention has been made in view of such conventional circumstances,
An object of the present invention is to provide a method for completely removing or peeling a coating film made of titanium carbide or carbonitride applied to the surface of a metal substrate in a short time without damaging the internal metal substrate. And

【0010】[0010]

【課題を解決するための手段】上記の目的を達成するた
め、本発明が提供するチタン化合物被覆膜の除去方法
は、金属基材の表面にチタンの炭化物及び炭窒化物から
選ばれた少なくとも一種のチタン化合物よりなる被覆膜
が施された部材を、pH7.3以上のアルカリ性の電解
液に浸漬し、該部材をアノードとして対照極との間に電
流を通じ、該部材と対照極との電位差を+0.1〜+1.
0V(対銀−塩化銀電極)に制御することを特徴とす
る。
In order to achieve the above object, a method for removing a titanium compound coating film provided by the present invention is to provide a method for removing at least one selected from carbides and carbonitrides of titanium on the surface of a metal substrate. A member provided with a coating film made of a kind of titanium compound is immersed in an alkaline electrolyte having a pH of 7.3 or more, and an electric current is passed between the member and a reference electrode using the member as an anode, thereby allowing the member and the reference electrode to contact each other. Potential difference between +0.1 and +1.
It is characterized in that it is controlled to 0 V (to silver-silver chloride electrode).

【0011】[0011]

【発明の実施の形態】本発明においては、基材表面に炭
化チタン又は炭窒化チタンからなるチタン化合物被覆膜
を有する部材をpH7.3以上のアルカリ性電解液に浸
漬し、この部材をアノードとして、対照極(カソード)
との間に+0.1〜+1.0Vの電位差を保持して電流を
通じることにより、表面のチタン化合物被覆膜のみを溶
解して除去する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS In the present invention, a member having a titanium compound coating film made of titanium carbide or titanium carbonitride on a substrate surface is immersed in an alkaline electrolyte having a pH of 7.3 or more, and this member is used as an anode. , Reference electrode (cathode)
By passing a current while maintaining a potential difference of +0.1 to +1.0 V between the substrate and the substrate, only the titanium compound coating film on the surface is dissolved and removed.

【0012】本発明を適用し得る部材は、金属基材の表
面にチタンの炭化物又は炭窒化物の1種又はそれ以上よ
りなる被覆膜を1層又は複数層に形成したものである。
尚、上記チタン化合物被覆膜の製法は特に限定されず、
公知の乾式又は湿式のめっき法による被覆膜を支障なく
除去することができる。
A member to which the present invention can be applied is one in which one or more coating films made of one or more of titanium carbide or carbonitride are formed on the surface of a metal substrate.
The method for producing the titanium compound coating film is not particularly limited,
The coating film formed by a known dry or wet plating method can be removed without any trouble.

【0013】チタン化合物の被覆膜が施される基材の材
質は、純金属材料あるいは合金材料などの金属系材料で
あればよく、特に限定されるものではない。また、チタ
ンを合金成分として含む基材であっても、チタンが均一
に溶解していれば、本発明方法によって基材が損傷する
ことはない。基材の形状や寸法もまた限定されるもので
はなく、例えばドリル、チップなどの切削工具、ネジ及
びナットをはじめ、各種の機械部品などのように、形状
が複雑なもの、あるいは金型などの大型のものであって
もよい。
The material of the substrate on which the coating film of the titanium compound is applied is not particularly limited as long as it is a metal material such as a pure metal material or an alloy material. In addition, even if the substrate contains titanium as an alloy component, if the titanium is uniformly dissolved, the substrate is not damaged by the method of the present invention. The shape and dimensions of the base material are also not limited. For example, cutting tools such as drills and chips, screws and nuts, and various types of mechanical parts, such as various mechanical parts, or molds and the like It may be large.

【0014】本発明に用いる電解液としては、アルカリ
性であればチタン化合物被覆膜の溶解が認められるが、
pH7.3以上でなければ溶解反応が極めて遅く実用的
でない。電解液のpHが7.3以上であれば、pHが高
いほど同一電位差でもチタン化合物被覆膜の溶解反応が
速くなり、従って短時間で被覆膜の除去を完了すること
ができる。実用的な処理時間を考慮すると、電解液のp
Hは8.0以上が好ましく、pH12.0〜13.9の範
囲が更に好ましい。
In the case of the electrolytic solution used in the present invention, the dissolution of the titanium compound coating film is recognized if it is alkaline.
If the pH is not higher than 7.3, the dissolution reaction is extremely slow and not practical. If the pH of the electrolyte is 7.3 or more, the higher the pH, the faster the dissolution reaction of the titanium compound coating film can be made even at the same potential difference, so that the removal of the coating film can be completed in a short time. Considering the practical processing time, p
H is preferably 8.0 or more, and more preferably pH 12.0 to 13.9.

【0015】電解液に溶解するアルカリ源は特に限定さ
れるものではないが、アルカリ金属の水酸化物、アンモ
ニウム塩などが好適であり、取り扱いも容易である。
尚、溶解反応を安定化したり、溶解した被覆膜成分の部
材への再付着を防ぐために、公知の錯化剤や界面活性剤
を電解液に添加することができるが、その場合にはpH
が低下し過ぎないように注意しなければならない。
The alkali source dissolved in the electrolytic solution is not particularly limited, but a hydroxide or an ammonium salt of an alkali metal is preferable, and handling is easy.
In order to stabilize the dissolution reaction or to prevent the dissolved coating film component from re-adhering to the member, a known complexing agent or surfactant can be added to the electrolytic solution.
Care must be taken not to reduce the excess.

【0016】部材と対照極との間の電位差は、銀−塩化
銀電極に対して+0.1〜+1.0Vの範囲とすることが
好ましく、+0.2〜+0.8Vの範囲が更に好ましい。
この電位差が+0.1V未満である場合には、電解液の
pHに拘らずチタン化合物被覆膜の溶解反応が遅く、除
去が完了するまでの時間が長くなる。電位差を大きくす
るほど被覆膜の溶解反応が速く進行し、短時間で効率的
に被覆膜を除去できるが、電位差が+1.0Vを越える
と基材の溶解が生じやすくなり、残った基材の表面が粗
れたり、変色を生じたりするので好ましくない。
The potential difference between the member and the control electrode is preferably in the range of +0.1 to +1.0 V, more preferably +0.2 to +0.8 V, with respect to the silver-silver chloride electrode.
When this potential difference is less than +0.1 V, the dissolution reaction of the titanium compound coating film is slow regardless of the pH of the electrolytic solution, and the time until the removal is completed becomes long. The larger the potential difference, the faster the dissolution reaction of the coating film proceeds, and the more efficiently the coating film can be removed in a short time. However, if the potential difference exceeds +1.0 V, the dissolution of the base material tends to occur, and It is not preferable because the surface of the material becomes rough or discoloration occurs.

【0017】被覆膜の除去が完了したことは、電位差制
御中の電流の変化をモニターすることにより知ることが
できる。即ち、被覆膜の溶解反応の進行中は、溶出イオ
ンの移動に伴う電流の流れがあるが、除去が完了すると
同時に、この電流の値が極端に低くなるので、これによ
って被覆膜除去の完了を知ることができる。この電流の
値は、被覆膜の量(厚さと面積)、基材の材質、電解液
のpH、電位差の値などによって異なるが、反応の進行
中と除去完了後では通常1〜数桁程度の変化が見られる
ので、これを以て容易に判断できる。
The completion of the removal of the coating film can be known by monitoring a change in current during the potential difference control. That is, during the dissolution reaction of the coating film, there is a current flow accompanying the movement of the eluted ions. At the same time as the removal is completed, the value of this current becomes extremely low. You can know the completion. The value of this current varies depending on the amount (thickness and area) of the coating film, the material of the base material, the pH of the electrolytic solution, the value of the potential difference, and the like. Can be easily determined from this.

【0018】尚、電位差の制御は、通常の電位差制御装
置を用いて行う。また、電位の計測は照合電極と電位差
計により、通常のごとく簡単に行うことができる。照合
電極は銀−塩化銀電極の他、カロメル電極なども使用で
きる。例えば北斗電工(株)製の全自動分極測定装置な
どの市販の装置を用いて、電位差の制御と電流値のモニ
ター及び記録を、同時に全自動で行うこともできる。
The control of the potential difference is performed by using a normal potential difference control device. Further, the measurement of the potential can be easily performed as usual by using the reference electrode and the potentiometer. As the reference electrode, a calomel electrode or the like can be used in addition to the silver-silver chloride electrode. For example, using a commercially available device such as a fully automatic polarization measuring device manufactured by Hokuto Denko Co., Ltd., the control of the potential difference and the monitoring and recording of the current value can also be performed simultaneously and fully automatically.

【0019】[0019]

【実施例】実施例1 高速度鋼SKH51からなる基材の表面に、イオンプレ
ーティング装置によって膜厚2μmの炭化チタン(Ti
C)被覆膜を形成した。この基材表面にTiC被覆膜を
形成した部材を下記表1に示すごとくpHを変えた電解
液にそれぞれ浸漬し、部材をアノードとして対照極との
間で通電し、このときの対照極と部材との電位差を表1
のごとく制御した。電位差測定に使用する照合電極は銀
−塩化銀電極を用いた。
EXAMPLE 1 A 2 .mu.m-thick titanium carbide (Ti) was coated on the surface of a high-speed steel SKH51 substrate by an ion plating apparatus.
C) A coating film was formed. The member having the TiC coating film formed on the surface of the base material was immersed in an electrolytic solution having a different pH as shown in Table 1 below, and the member was used as an anode, and electricity was passed between the control electrode and the control electrode. Table 1 shows the potential difference with the member
Controlled like A silver-silver chloride electrode was used as a reference electrode used for the potential difference measurement.

【0020】尚、各電解液の組成とpHは下記の通りで
ある。 電解液1:5.13×10-3mol/lのリン酸水素二
ナトリウム+1.53×10-3mol/lのリン酸二水
素カリウム混合水溶液(pH7.3) 電解液2:6.525×10-3mol/lの硼酸+3.4
75×10-3mol/lの塩酸混合水溶液(pH8.
2) 電解液3:4.56×10-3mol/lのグリシン+5.
45×10-2mol/lの水酸化ナトリウム水溶液(p
H12.0) 電解液4:0.6mol/lの水酸化ナトリウム水溶液
(pH13.1) 電解液5:2.5mol/lの水酸化ナトリウム水溶液
(pH13.6)
The composition and pH of each electrolytic solution are as follows. Electrolytic solution 1: 5.13 × 10 −3 mol / l disodium hydrogen phosphate + 1.53 × 10 −3 mol / l potassium dihydrogen phosphate mixed aqueous solution (pH 7.3) Electrolyte solution 2: 6.525 × 10 −3 mol / l boric acid + 3.4
75 × 10 −3 mol / l hydrochloric acid mixed aqueous solution (pH 8.
2) Electrolyte 3: 4.56 × 10 −3 mol / l glycine + 5.
45 × 10 -2 mol / l sodium hydroxide aqueous solution (p
H12.0) Electrolyte 4: 0.6 mol / l sodium hydroxide aqueous solution (pH 13.1) Electrolyte 5: 2.5 mol / l sodium hydroxide aqueous solution (pH 13.6)

【0021】各条件での試験を3時間実施し、TiC被
覆膜が完全に除去されるまでの時間を調べ、その結果を
下記表1に併せて示した。尚、表1において、「未完」
は3時間(180分)処理しても被覆膜を完全に除去で
きなかった部材を、「点食」は被覆膜が完全に除去され
たが、同時に基材も部分的に点状の腐食ないし除去が認
められた部材を意味する。
The test under each condition was performed for 3 hours, and the time until the TiC coating film was completely removed was examined. The results are shown in Table 1 below. In Table 1, "incomplete"
Indicates that the coating film could not be completely removed even after the treatment for 3 hours (180 minutes). In the case of "pitting", the coating film was completely removed, but at the same time, the base material was partially dotted. A member that has been corroded or removed.

【0022】[0022]

【表1】電 解 液 電 位 差(V;対AgAgCl電極) 番号 pH +0.05 +0.1 +0.3 +0.45 +0.6 +1.0 +1.1 1 7.3 未完 未完 未完 未完 未完 未完 未完 2 8.2 未完 未完 170min 110min 45min 20min 点食 3 12.0 未完 未完 80min 50min 30min 10min 点食 4 13.1 未完 未完 50min 35min 20min 点食 点食 5 13.6 未完 150min 25min 15min 10min 点食 点食TABLE 1 electrolytic solution conductivity level difference (V; vs. AgAgCl electrode) No. pH +0.05 +0.1 +0.3 +0.45 +0.6 +1.0 +1.1 1 7.3 unfinished unfinished unfinished unfinished unfinished Unfinished unfinished 2 8.2 Unfinished Unfinished 170min 110min 45min 20min Pitting 3 12.0 Unfinished Unfinished 80min 50min 30min 10min Pitting 4 13.1 Unfinished Unfinished 50min 35min 20min Pitting with pit 5 13.6 Unfinished 150min 25min 15min 10min Pitting with pit

【0023】上記の結果から、電解液のpHが8.2以
上であればTiC被覆膜付き部材と対照極との電位差を
選択することにより実用的な被覆膜の除去が可能であ
り、更にpH12.0以上であれば一層効率的な除去が
可能であることが分かる。尚、電解液のpHが7.3の
場合でも、電位差を+1.0V近くまで高めて3時間以
上通電すれば、TiC被覆膜を完全に除去することが可
能である。
From the above results, if the pH of the electrolytic solution is 8.2 or more, a practical coating film can be removed by selecting the potential difference between the member with the TiC coating film and the control electrode, Further, it can be seen that more efficient removal is possible if the pH is 12.0 or more. Even when the pH of the electrolytic solution is 7.3, the TiC coating film can be completely removed by increasing the potential difference to near +1.0 V and energizing for 3 hours or more.

【0024】また、TiC被覆膜の除去が完了し、且つ
点食も認められなかった各部材は、試験後の基材の表面
粗さがいずれもRmaxで0.1μm前後であり、被覆
膜を施す前の基材の表面粗さRmax0.12μmと殆
ど変化がなく、シミや変色などの外観変化も認められな
かった。
In each of the members in which the removal of the TiC coating film was completed and no pitting was observed, the surface roughness of the base material after the test was about 0.1 μm in Rmax in all cases. The surface roughness Rmax of the substrate before application of the film was 0.12 μm, which was almost unchanged, and no change in appearance such as spots or discoloration was observed.

【0025】実施例2 実施例1と同様に、高速度鋼SKH51の基材の表面に
膜厚8μmの炭化チタンを被覆した部材を、pH13.
9の水酸化ナトリウム溶液に浸漬して、対照極と部材と
の電位差を+0.45Vに制御しながら処理した。電位
差測定における照合電極には銀−塩化銀電極を用いた。
Example 2 In the same manner as in Example 1, a member in which the surface of a base material of high-speed steel SKH51 was coated with titanium carbide having a thickness of 8 μm was prepared at pH 13.
9 was immersed in a sodium hydroxide solution and treated while controlling the potential difference between the control electrode and the member to + 0.45V. A silver-silver chloride electrode was used as a reference electrode in the potential difference measurement.

【0026】その結果、40分間の処理後、部材表面か
ら膜厚8μmのTiC被覆膜が完全に除去されていた。
また、TiC被覆膜を除去した後の基材の表面粗さはR
maxで0.1μm前後であり、被覆膜を施す前の基材
の表面粗さRmax0.12μmと殆ど変わらず、シミ
や変色などの外観変化もなかった。
As a result, after the treatment for 40 minutes, the 8 μm thick TiC coating film was completely removed from the member surface.
The surface roughness of the substrate after removing the TiC coating film is R
The maximum value was around 0.1 μm, which was almost the same as the surface roughness Rmax of 0.12 μm before applying the coating film, and there was no change in appearance such as spots or discoloration.

【0027】実施例3 イオンプレーティング装置により、超硬合金製のチップ
の表面に膜厚2μmの炭窒化チタン(TiCN)の被覆
膜を形成した。このTiCN被覆膜を設けた超硬合金製
のチップをpH13.4の水酸化ナトリウム溶液に浸漬
し、このときの対照極と部材との電位差を+0.6Vに
制御した。電位差測定に際する照合電極には銀−塩化銀
電極を用いた。
Example 3 A coating film of titanium carbonitride (TiCN) having a thickness of 2 μm was formed on the surface of a cemented carbide chip by an ion plating apparatus. The chip made of cemented carbide provided with the TiCN coating film was immersed in a sodium hydroxide solution of pH 13.4, and the potential difference between the control electrode and the member at this time was controlled to + 0.6V. A silver-silver chloride electrode was used as a reference electrode for measuring the potential difference.

【0028】その結果、膜厚2μmのTiCN被覆膜
は、45分間で完全に除去された。また、被覆膜除去後
のチップの表面粗さはRmaxで0.1μm前後であ
り、被覆膜を施す前の表面粗さRmax0.12μmと
殆ど変わらず、シミや変色などの外観変化もなかった。
As a result, the TiCN coating film having a thickness of 2 μm was completely removed in 45 minutes. The surface roughness of the chip after removing the coating film was about 0.1 μm in Rmax, almost the same as the surface roughness Rmax of 0.12 μm before applying the coating film, and there was no change in appearance such as spots or discoloration. Was.

【0029】[0029]

【比較例】イオンプレーティグ装置により、基材である
高速度鋼SKH51又は超硬合金製チップの表面に、そ
れぞれ膜厚2μmのTiC被覆膜又はTiCN被覆膜を
形成した。
Comparative Example A 2 μm-thick TiC coating film or a TiCN coating film having a thickness of 2 μm was formed on the surface of a high-speed steel SKH51 or a cemented carbide chip as a substrate by an ion plating apparatus.

【0030】これらの被覆膜を設けた各部材を、特公昭
63−53266号公報に記載の方法に準拠して、過酸
化水素とアルカリ剤を含む水溶液に浸漬した。その結
果、いずれの部材においても、TiC又はTiCNの被
覆膜が完全に剥離するまでに20時間を要した。
Each of the members provided with the coating films was immersed in an aqueous solution containing hydrogen peroxide and an alkali agent in accordance with the method described in JP-B-63-53266. As a result, it took 20 hours for any of the members to completely peel off the coating film of TiC or TiCN.

【0031】[0031]

【発明の効果】本発明によれば、金属基材の表面に施さ
れた炭化チタン又は炭窒化チタンからなるチタン化合物
の被覆膜を、内部の基材を損傷することなく、簡単な方
法で効率よく溶解して、短時間で完全に除去することが
できる。
According to the present invention, a titanium compound coating film made of titanium carbide or titanium carbonitride applied to the surface of a metal substrate can be coated in a simple manner without damaging the internal substrate. It dissolves efficiently and can be completely removed in a short time.

【0032】従って、複雑形状のもの、膜厚の厚いもの
や表面積の大きなものであっても、チタン化合物の被覆
膜を効率良く完全に除去でき、被覆膜を除去した基材に
被覆膜を再形成すれば、密着性等の機械的特性の劣化が
少なく、外観的にも遜色ない再生品を得ることができ
る。
Therefore, even in the case of a complex shape, a thick film or a large surface area, the coating film of the titanium compound can be efficiently and completely removed, and the base material from which the coating film has been removed is coated. If the film is reformed, a regenerated product with little deterioration in mechanical properties such as adhesion and the like in appearance can be obtained.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 金属基材の表面にチタンの炭化物及び炭
窒化物から選ばれた少なくとも一種のチタン化合物より
なる被覆膜が施された部材を、pH7.3以上のアルカ
リ性の電解液に浸漬し、該部材をアノードとして対照極
との間に電流を通じ、該部材と対照極との電位差を+
0.1〜+1.0V(対銀−塩化銀電極)に制御すること
を特徴とするチタン化合物被覆膜の除去方法。
1. A member in which a coating film made of at least one titanium compound selected from titanium carbide and carbonitride is formed on the surface of a metal substrate is immersed in an alkaline electrolyte having a pH of 7.3 or more. Then, a current is passed between the member and the control electrode using the member as an anode, and the potential difference between the member and the control electrode is increased by +
A method for removing a titanium compound-coated film, which is controlled at 0.1 to +1.0 V (to silver-silver chloride electrode).
【請求項2】 電解液のpHが8.0以上であることを
特徴とする、請求項1に記載のチタン化合物被覆膜の除
去方法。
2. The method for removing a titanium compound-coated film according to claim 1, wherein the pH of the electrolytic solution is 8.0 or more.
JP3891497A 1997-02-24 1997-02-24 Method for removing titanium compound coating Pending JPH10237699A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3891497A JPH10237699A (en) 1997-02-24 1997-02-24 Method for removing titanium compound coating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3891497A JPH10237699A (en) 1997-02-24 1997-02-24 Method for removing titanium compound coating

Publications (1)

Publication Number Publication Date
JPH10237699A true JPH10237699A (en) 1998-09-08

Family

ID=12538483

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3891497A Pending JPH10237699A (en) 1997-02-24 1997-02-24 Method for removing titanium compound coating

Country Status (1)

Country Link
JP (1) JPH10237699A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999041435A1 (en) * 1998-02-13 1999-08-19 Mitsubishi Heavy Industries, Ltd. METHOD OF REMOVING Ti FILM AND APPARATUS THEREFOR
CN102234835A (en) * 2010-04-20 2011-11-09 深圳富泰宏精密工业有限公司 Stripping solution and method for stripping titanium carbide film layer by electrolysis

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999041435A1 (en) * 1998-02-13 1999-08-19 Mitsubishi Heavy Industries, Ltd. METHOD OF REMOVING Ti FILM AND APPARATUS THEREFOR
CN102234835A (en) * 2010-04-20 2011-11-09 深圳富泰宏精密工业有限公司 Stripping solution and method for stripping titanium carbide film layer by electrolysis

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