JPH10221498A - X-ray take-out window and x-ray exposure device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To effectively cool an X-ray take-out window. SOLUTION: An X-ray take-out window 10 consisting of a beryllium foil 11 and a window frame 12 are fixed together with a cooling ring 13 and a spacer 14 in between a beam duct 2 and flanges 2a and 3a of an exposure room 3. The cooling ring 13 is cooled by refrigerant flowing in an inner pipe 13b and cools the beryllium foil 11 by touching the inner edge 13a to its surface. Thus, the exchange of the X-ray take-out window 10 is easy and such a troubles as degradation of the bonding agent of the window frame 12 and generation of gas can be avoided.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

[0001] 1. Field of the Invention [0002] The present invention relates to an X-ray extraction window and an X-ray exposure apparatus for extracting X-rays generated from a light source in a vacuum into the atmosphere or a reduced-pressure atmosphere.

[0002]

2. Description of the Related Art Conventionally, in an X-ray analyzer and an X-ray exposure apparatus such as a diffraction apparatus using X-rays, an X-ray is extracted from a light source in a vacuum to the atmosphere or a reduced-pressure atmosphere. An X-ray extraction window also serving as a pressure partition is required, and a beryllium foil having a thickness of several μm to several hundred μm is generally used. This beryllium foil is fixed to an analytical instrument or an exposure room via a window frame that also serves as reinforcement. The beryllium foil and the window frame are hermetically bonded by a bonding method using an adhesive, brazing, a diffusion bonding method, or the like.

In recent years, devices using X-rays have been required to have higher performance, and accordingly, X-rays having higher intensity have been required. Therefore, while increasing the output of the light source by using a charged particle storage ring or the like as the light source, studies have been made to increase the use efficiency of X-rays by reducing the thickness of the X-ray extraction window.

However, when a thinner beryllium foil is used, for example, in the case of silver brazing, the temperature reaches a high temperature of several hundred degrees during processing, so that the junction becomes brittle due to a phenomenon such as recrystallization of beryllium. There is a point. Also, the diffusion bonding method has a drawback that it is unsuitable for thin beryllium foil because heat and pressure are applied to the bonding portion.

On the other hand, for example, a method of fixing using an organic adhesive is widely used because thermal stress is not applied to the beryllium foil so much.

However, when a charged particle storage ring or the like having a large light source output is used as described above, the beryllium foil does not transmit the entire wavelength region of the radiation of the charged particle storage ring, but also absorbs the wavelength region. wide. These absorbed energies become heat, but one side of the beryllium foil is in a high vacuum region, and the other side is in a reduced-pressure atmosphere, and the amount of heat escaping into the space is small, so that the beryllium foil has a high temperature. Therefore, as shown in FIG. 8, a coolant channel 102 is provided in the window frame 101 to cool the window frame 101, and the beryllium foil 10
3 is released to the window frame 101 (Rev. Sci. Instrument. Vol. 63, N.
o. 1).

[0007]

However, according to the above-mentioned prior art, since the heat of the beryllium foil, which has been heated by absorbing the energy of X-rays, is released through the window frame, the window is not provided. A large temperature gradient is generated at the joint between the frame and the beryllium foil, and especially when an organic adhesive is used, the adhesive strength is significantly reduced and the distortion is remarkable. Become.

In addition, beryllium foil absorbs X-ray energy while receiving a pressure difference between a high vacuum and the atmosphere or a reduced-pressure atmosphere and becomes high temperature, so that mechanical fatigue is accumulated and its life is short. Therefore, it is necessary to replace the beryllium foil. In this case, it is common to replace the beryllium foil for each window frame. However, if the window frame is provided with the refrigerant flow path, it is necessary to change the connection of the pipe every time the window frame is replaced, and there is also a disadvantage that the replacement operation is complicated.
There is also an unsolved problem that every time the window frame is replaced, an expensive window frame provided with a coolant flow path is wasted and the cost is high.

SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned unsolved problems of the prior art, and effectively cools a permeable film such as a beryllium foil which absorbs X-ray energy and raises the temperature. In addition to being able to prevent the deterioration of the adhesive in the window frame and the generation of gas, the structure of the window frame is simple, and the trouble of replacing the permeable membrane with the entire window frame becomes complicated. It is an object of the present invention to provide a high performance X-ray extraction window and an X-ray exposure apparatus.

[0010]

In order to achieve the above object, an X-ray extraction window according to the present invention comprises a permeable membrane, support means for supporting an outer peripheral portion of the permeable membrane, and a predetermined portion of the permeable membrane. And a cooling means for cooling the facing member.

The permeable film is preferably a beryllium foil.

[0012] Further, a beam duct opened on one side of the permeable membrane may be provided, and the beam duct and the facing member may be integrated.

[0013]

The permeable membrane is cooled through the opposed member by cooling the opposed member facing one or both surfaces of the permeable membrane. In addition to efficiently cooling the permeable membrane, it is possible to avoid troubles such as deterioration of the adhesive and the like due to transmission of heat of the permeable membrane to supporting means such as a window frame for supporting an outer peripheral portion of the permeable membrane.

Further, the structure of the window frame and the like is simpler than the case where the coolant flow path and the like are provided in the supporting means such as the window frame and the like. No replacement is required, and the replacement operation is easy.

By using such an X-ray extraction window, it is possible to greatly contribute to higher performance and lower cost of an X-ray exposure apparatus and the like, and further to reduction of running cost.

[0016]

Embodiments of the present invention will be described with reference to the drawings.

FIG. 1 shows an X-ray extraction window 10 according to one embodiment.
This has a beryllium foil 11 which is a permeable film having a thickness of several μm to several hundred μm, and a window frame 12 which is a support means for supporting an outer peripheral portion thereof. And a pair of window frame members 12a adhered to both sides of the outer periphery of the window frame member 12a.

The X-rays L ₁ generated from the light source 1 are introduced into an exposure chamber 3 through a beam duct 2 maintained in an ultra-high vacuum. The exposure chamber 3 is controlled to a reduced pressure atmosphere of helium gas, and the X-ray extraction window 10 is provided to shut off the ultra-high vacuum of the beam duct 2 and the reduced pressure atmosphere of the exposure chamber 3.

At the end of the beam duct 2, a cooling ring 13 as an opposing member is provided, and its inner edge 13 a is arranged so as to face the beryllium foil 11 of the X-ray extraction window 10. The material of the cooling ring 13 is copper having good thermal conductivity, and the internal pipe 1 is a cooling means for flowing a coolant fluid such as cooling water supplied from a coolant supply source (not shown).
3b. The material of the cooling ring 13 is not limited to copper, but may be any other material as long as it has good thermal conductivity and can be used in an ultra-high vacuum. Beryllium foil 1
Instead of 1, a permeable film such as another metal foil or a known organic film can be used.

When assembling the X-ray extraction window 10, a spacer 14 is interposed between the cooling ring 13 and the X-ray extraction window 10.
a. Spacer 1
4 is the inner edge 13a of the cooling ring 13 and the beryllium foil 1
The beam duct 2 and the exposure chamber 3
When there is no pressure difference between the inner edge 1 of the cooling ring 13
3a and the beryllium foil 11 are assembled so as to form a gap of about 1 to 500 μm. When the beam duct 2 is controlled to an ultra-high vacuum and the exposure chamber 3 is controlled to a reduced pressure atmosphere of helium gas, the beryllium foil 11 bends toward the beam duct 2 and the cooling ring 13 as shown in FIG. Contacts the inner edge 13a of the second member.

When the beryllium foil 11 is assembled from the beginning so that the inner edge 13a of the cooling ring 13 and the beryllium foil 11 are in contact with each other, when the beryllium foil 11 is bent by the pressure difference, the beryllium foil 11 exerts an excessive pressure on the cooling ring 13. As a result, the beryllium foil 11 may be damaged.

FIG. 2 shows the entire X-ray exposure apparatus. An X-ray L ₁ generated from a light source 1 is expanded to a predetermined beam width by a convex mirror 4 and passes through a beam duct 2.
A wafer W, which is a substrate on a wafer stage as a substrate holding means, is exposed through a line extraction window 10 and a mask M in an exposure chamber 3. Since the X-rays magnified by the convex mirror 4 have an intensity distribution similar to a Gaussian distribution, the exposure time is adjusted by controlling the moving speed of a moving shutter 5 provided in the exposure chamber 3, and the exposure unevenness of the wafer W is reduced. It is devised to prevent it.

[0023] During exposure, beryllium foil 11 of the X-ray extraction window 10 is to raise the temperature by absorbing the energy of the X-ray L _1.
Therefore, a cooling fluid is caused to flow through the internal piping 13 b of the cooling ring 13 to cool the cooling ring 13, and the beryllium foil 11 is cooled.
The beryllium foil 11 is cooled by heat conduction or the like of the inner edge 13a in contact with. Inner edge 13a of cooling ring 13
Is configured to contact and cool the beryllium foil 11 inside the window frame 12 of the beryllium foil 11,
In addition, radiant heat released around the beryllium foil 11 is also absorbed by the cooling ring 13. In this manner, the beryllium foil 11 is effectively cooled, and the heat is transmitted to the window frame 12 to effectively prevent the adhesive from deteriorating or generating a gas from the adhesive.

[0024] Since the cooling ring 13 is disposed upstream of the X-ray extraction window 10 along the optical path of the X-ray L _1,
Exposure of the window frame 12 of the X-ray extraction window 10 to unnecessary X-rays can be reduced. As a result, the life expectancy of the X-ray extraction window 10 can be prolonged.

The inner edge 13a of the cooling ring 13 is
The portion in contact with the beryllium foil 11 is processed into a curved surface having an appropriate curvature so that there is no corner.

According to this embodiment, the cooling ring, which is separate from the window frame, is brought into direct contact with the beryllium foil to cool the X-ray extraction window. The cooling efficiency is higher than when the beryllium foil is cooled through the window frame, and there is no trouble such as deterioration of the bonding portion between the window frame and the beryllium foil or generation of gas.

In addition, when the X-ray extraction window is replaced, the cooling ring and the window frame may be separated, and the X-ray extraction window may be replaced together with the window frame. There is also an advantage that the X-ray extraction window can be easily replaced without requiring a complicated operation such as connection of refrigerant fluid piping. Further, unlike the case where the internal piping is provided in the window frame, there is no possibility that the window frame exchanged with the beryllium foil becomes expensive.

By using such an X-ray extraction window, it is possible to greatly contribute to higher performance and lower cost of an X-ray exposure apparatus and the like, and further to reduction of running cost.

FIG. 3 shows a modification. In this configuration, a pair of cooling rings 23 are opposed to both surfaces of an X-ray extraction window 20 including a beryllium foil 21 and a window frame 22, respectively. Each cooling ring 23 is fastened to the beam duct 2 and the flanges 2a, 3a of the exposure chamber 3 via a spacer 24,
The inner edge 23a of each cooling ring 23 faces each surface of the beryllium foil 21, and is cooled by the refrigerant fluid flowing through the internal piping 23b.

By providing cooling rings on both sides of the beryllium foil, the beryllium foil can be cooled very quickly,
The temperature rise can be effectively avoided.

Also, as shown in FIG.
A cooling ring 33 integrally provided at the end of the cooling ring 33 may be used. In this case, the material of the beam duct 2 may be a beryllium-copper alloy to improve the cooling efficiency.
Instead of providing an internal pipe in the cooling ring 33, a cooling coil 33b is wound around the end of the beam duct 2. With such a configuration, the X-ray extraction window 30 including the window frame 32 and the beryllium foil 31 can be effectively cooled, and
The additional advantage that the X-ray extraction window 30 can be easily attached and detached and the exchange operation can be performed quickly is added.

FIG. 5 shows another modification. That is, the cooling ring 43 is fastened between the flange 2a of the beam duct 2 and the connecting member 45 by a bolt penetrating the screw hole 2b or the like, and the connecting member 45 is connected to the spacer 4 in the same manner.
4 and fastened to the flange 3a of the exposure chamber 3 via

The X-ray extraction window 40 composed of the beryllium foil 41 and the window frame 42 has an advantage that it can be easily attached and detached, and that the vacuum seal of the portion where the cooling ring 43 is assembled can be strengthened.

Next, an embodiment of a method for manufacturing a semiconductor device using the above-described X-ray exposure apparatus will be described. FIG.
Is a semiconductor device (semiconductor chip such as IC or LSI,
Or, a production flow of a liquid crystal panel, a CCD or the like is shown.
In step 1 (circuit design), the circuit of the semiconductor device is designed. Step 2 is a process for making a mask on the basis of the circuit pattern design. Step 3
In (wafer manufacture), a wafer is manufactured using a material such as silicon. Step 4 (wafer process) is called a pre-process, and an actual circuit is formed on the wafer by lithography using the prepared mask and wafer. Step 5 (assembly) is called a post-process, and is a process of forming a semiconductor chip using the wafer produced in step 4, and includes processes such as an assembly process (dicing and bonding) and a packaging process (chip encapsulation). . In step 6 (inspection), inspections such as an operation confirmation test and a durability test of the semiconductor device manufactured in step 5 are performed. Through these steps, a semiconductor device is completed and shipped (step 7).

FIG. 7 shows a detailed flow of the wafer process. Step 11 (oxidation) oxidizes the wafer's surface. Step 12 (CVD) forms an insulating film on the wafer surface. Step 13 (electrode formation) forms electrodes on the wafer by vapor deposition. In step 14 (ion implantation), ions are implanted into the wafer. Step 15
In (resist processing), a photosensitive agent is applied to the wafer. Step 16 (exposure) uses the above-described exposure apparatus to print and expose the circuit pattern of the mask onto the wafer. Step 17 (development) develops the exposed wafer. In step 18 (etching), portions other than the developed resist image are removed. In step 19 (resist stripping), unnecessary resist after etching is removed. By repeating these steps, multiple circuit patterns are formed on the wafer. By using the manufacturing method of this embodiment, it is possible to manufacture a highly integrated semiconductor device which has been conventionally difficult to manufacture.

[0036]

Since the present invention is configured as described above, it has the following effects.

Beryllium foil or the like, which is heated by absorbing X-ray energy, can be cooled effectively. Further, the structure of the window frame is simple, there is no possibility that the operation of replacing the window frame with beryllium foil or the like becomes complicated, and troubles such as deterioration of the adhesive of the window frame and generation of gas can be prevented.

By using such an X-ray extraction window, it is possible to greatly contribute to higher performance, lower cost, and lower running cost of an X-ray exposure apparatus and the like.

[Brief description of the drawings]

FIG. 1 shows an X-ray extraction window according to one embodiment.
(A) is a schematic sectional view, and (b) is an enlarged partial sectional view showing a part of (a) in an enlarged manner.

FIG. 2 is a diagram illustrating the entire X-ray exposure apparatus.

FIG. 3 is a schematic sectional view showing a first modification.

FIG. 4 is a schematic sectional view showing a second modification.

FIG. 5 is a schematic sectional view showing a third modification.

FIG. 6 is a flowchart showing a semiconductor manufacturing process.

FIG. 7 is a flowchart showing a wafer process.

FIG. 8 is a schematic sectional view showing a conventional example.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Light source 2 Beam duct 3 Exposure room 10, 20, 30, 40 X-ray extraction window 11, 21, 31, 41 Beryllium foil 12, 22, 32, 42 Window frame 13, 23, 33, 43 Cooling ring 14, 24, 44 Spacer 45 Connection member

Claims (4)

[Claims] 1. An X-ray extraction window having a permeable membrane, supporting means for supporting an outer peripheral portion of the permeable membrane, an opposing member opposing a predetermined portion of the permeable membrane, and cooling means for cooling the opposing member. . 2. The X-ray extraction window according to claim 1, wherein the permeable film is a beryllium foil. 3. The X-ray extraction window according to claim 1, further comprising a beam duct opened on one side of the permeable membrane, wherein the beam duct and the facing member are integrated. 4. The X according to claim 1, wherein
An X-ray exposure apparatus comprising: a line extraction window; and a substrate holding unit configured to hold a substrate exposed by X-rays extracted through the X-ray extraction window.