JPH10213707A - Formation of black resist pattern and production of color filter - Google Patents

Abstract

PROBLEM TO BE SOLVED: To remarkably remove stain (ground soil) on a pattern non-formation face without generating a white defect. SOLUTION: After applying a photopolymerized composition, into which a black material is dispersed, to the surface of a transparent substrate, respective processing processes of heat drying, image exposure, development and thermosetting are executed to form a black matrix and then the black materix formation surface is processed by gas containing 300 to 13,000ppm ozone under a heating condition of 100 to 250 deg.C. Respective photopolymerized compositions into which red, green and blue materials are respectively dispersed are used and respective processing processes such as the application of these compositions to the black matrix formation surface, heat drying, image exposure, development and thermosetting are executed to form the pixel images of respective colors.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming a black resist pattern and a method for manufacturing a color filter. The present invention relates to a method for forming a resist pattern and a method for manufacturing a color filter using the black resist pattern (black matrix).

[0002]

2. Description of the Related Art Optical color filters suitably used for color televisions, liquid crystal display devices, cameras and the like are composed of three types of red, green and blue on the surface of a transparent substrate provided with a black resist pattern (black matrix). Different hues
It is manufactured by forming a color pattern such as a stripe or mosaic having a width of 0 to 150 μm with an accuracy of several μm.

[0003] The above-mentioned black resist pattern is formed by applying a photopolymerizable composition in which a black material is dispersed on a transparent substrate, and then performing each of heat drying, image exposure, development, and thermosetting. The color filter, red, green, using each photopolymerizable composition in which the blue material is dispersed, on the black resist pattern forming surface, coating, heat drying, image exposure, development and It can be manufactured by performing each process of thermosetting to form a pixel image of each color (JP-A-2-902).

[0004]

However, the above-described method for forming a black resist pattern has a disadvantage that the surface of the substrate is easily contaminated. Such contamination is caused by a slight residue of the photopolymerizable composition, which is not removed during washing after development, adhering to the non-pixel surface, and is usually called background contamination. Background dirt on the non-pixel surface causes a decrease in sealability and contamination in the system when a liquid crystal module is assembled with a color filter, thereby significantly reducing the yield of the assembly process. Background dirt can be prevented to some extent by lowering the adhesion of the photopolymerizable composition to the transparent substrate. However, if the adhesion is excessively reduced, so-called white defects such as chipping or peeling of the black resist pattern can be prevented. Is more likely to occur. Therefore, the background stain due to the residue of the photopolymerizable composition and the white defect have a trade-off relationship, and it is difficult to satisfy both at the same time.

The present invention has been made in view of the above circumstances, and an object of the present invention is to provide an improved black color so that dirt (ground dirt) on a pattern non-formed surface can be highly removed without causing white defects. An object of the present invention is to provide a method for forming a resist pattern and a method for manufacturing a color filter using the black resist pattern (black matrix).

[0006]

Means for Solving the Problems As a result of extensive studies to achieve the above object, the present inventor has treated a black resist pattern forming surface with an ozone-containing gas under a heating condition, preferably an ultraviolet irradiation condition. By doing so, it has been found that background contamination on the pattern non-formed surface can be removed to a high degree without giving any adverse effect such as a substantial decrease in thickness to the black resist pattern.

[0007] Incidentally, "GS News Techn"
The first 51 to 59 pages ical Report 54 Vol No.2 (December 1995 issue), "Study on" UV / O ₃ process according to various plastic, peeling of the surface treatment and the resist inorganic material "is reported Photoresist film (composition of cyclized rubber and bisazide) and positive photoresist film (composition of novolak and naphthoquinonediazide) coated on Si wafer substrate
The results of the peel test are shown.

Accordingly, the entire surface of the photoresist film to be treated with an ozone-containing gas under ultraviolet irradiation conditions (ashing treatment)
Is known as described above. However, although the specific heating condition is indispensable, the above-mentioned knowledge of the present inventors that the background stain on the pattern non-formed surface can be selectively removed is a surprising fact.

The present invention has been achieved based on the above findings. The first gist of the present invention is to apply a photopolymerizable composition in which a black material is dispersed on a transparent substrate, and then heat and dry the composition.
A black resist pattern is formed by performing image exposure, development, and heat curing, and then the black resist pattern forming surface is treated with an ozone-containing gas having a concentration of 300 to 13,000 ppm under a heating condition of 100 to 250 ° C. And a method for forming a black resist pattern.

[0010] The second gist of the present invention is that red, green,
Using each photopolymerizable composition in which the blue material is dispersed,
The black resist pattern forming surface obtained by the above method is subjected to coating, heat drying, image exposure, development, and heat curing to form a pixel image of each color, thereby providing a color filter manufacturing method. .

[0011]

BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described in detail.
In the present invention, a plastic sheet, a glass plate, or the like is used as the transparent substrate, and examples of the material of the plastic sheet include polyester such as polyethylene terephthalate, and polyolefin such as polypropylene and polyethylene.

On the transparent substrate, corona discharge treatment, ozone treatment,
A thin film forming treatment of various polymers such as a silane coupling agent and a urethane polymer can be performed. The thickness of the transparent substrate is usually 0.05 to 10 mm, preferably 0.1 to 10 mm.
７7 mm. When a thin film of various polymers is formed, the film thickness is usually 0.01 to 10 μm.
m, preferably in the range of 0.05 to 5 μm.

In the present invention, carbon black is usually used as the black material, and red, green, and blue dyes and pigments are usually used as the other color materials. White pigments, fluorescent pigments and the like can also be used.

Specific examples of carbon black and dyes and pigments include Mitsubishi Carbon Black M1000, Mitsubishi Carbon Black MA-100, Mitsubishi Carbon Black # 40,
Victoria Pure Blue (42595), Auramine O
(41000), Catillon Brilliant Flavin (Basic 13), Rhodamine 6 GCP (45160), Rhodamine B (45170), Sakuranin OK 70: 1
00 (50240), Erioglaucine X (4208)
0), NO. 120 / Lionol Yellow (2109
0), Lionol Yellow GRO (21090), Shimura First Yellow GRO (21090), Shimura First Yellow 8GF (21105), Benzidine Yellow 4J-564D (21095), Shimla First Red 4015 (12355), Lionol Red 7B4401 (15850). ), First Gen Blue J
GR-L (74160), Lionol Blue SM (26
150), Lionol Blue ES (Pigment Blue 1)
5: 6, Pigment Blue 1536), Lionogen Red GD (Pigment Red 168, Pigment Red 108), Lionol Green 2YS (Pigment Green 36) and the like (the numbers in parentheses above indicate the color index (C.I. I.)).

The amount of the color material dispersed in the photopolymerizable composition is usually in the range of 10 to 70% by weight, preferably 20 to 60% by weight, based on the total solid content. The composition is required to have a high adhesiveness to the transparent substrate and a function of providing a high quality color material pixel image in the state of the high color material content.

In the present invention, in addition to the above color material, the photopolymerizable composition comprises a photopolymerization initiation system which absorbs light to generate radicals, and an addition-polymerizable ethylenic polymer which is polymerized by the radicals. A compound having at least one saturated double bond (hereinafter referred to as “ethylenic compound”),
Further, in order to improve the photopolymerizable layer such as compatibility, film forming property, developing property, adhesiveness, etc., it contains an organic polymer substance as a binder.

The photopolymerization initiation system includes the following compounds. That is, since the black photopolymerizable layer is image-exposed through the pattern mask from above the photopolymerizable layer, the photopolymerization initiation system used for the black photopolymerizable composition is sensitive from ultraviolet to visible. Are appropriately used, and an exposure light source corresponding thereto is used for image exposure.

In each of the red, green, and blue photopolymerizable layers, red, green, and blue photo-polymerizable layers may be exposed between the black matrix patterns by exposure through a pattern mask of each color or by other methods.
In order to form green and blue pixel image patterns, as in the case of the black matrix pattern, a compound having sensitivity from ultraviolet to visible light, preferably 4
A compound having a spectral sensitivity at a wavelength of 50 nm or less, more preferably 400 nm or less, is used.

As a photopolymerization initiation system that absorbs ultraviolet light having the above-mentioned wavelength to generate radicals, for example, "Fine Chemical" (March 1, 1991, vol. 20, N.K.)
o. 4), pages 16 to 26, dialkylacetophenones, benzoin, thioxanthone derivatives and the like, JP-A-58-403023, and JP-B-45-3.
No. 7377, hexaarylbiimidazole type, S-trihalomethyltriazine type, JP-A-4-22
1958 and JP-A-4-219756, a system in which a titanocene is combined with a xanthene dye, an addition-polymerizable ethylenically saturated double bond-containing compound having an amino group or a urethane group, and the like.

The ethylene compound may be any of a monomer or a polymer having an ethylenically unsaturated double bond in a side chain or a main chain. Specifically, an ester of an aliphatic polyhydroxy compound and an unsaturated carboxylic acid (for example,
Ethylenic compounds such as ethylene glycol diacrylate, pentaerythritol triacrylate, and dipentaerythritol hexaacrylate) or monomers of acrylate or methacrylate are preferably used.

As the organic polymer substance used as a binder of the photopolymerizable composition, methyl (meth) acrylic acid,
Examples include polymers composed of alkyl esters of (meth) acrylic acid such as benzyl (meth) acrylic acid, vinyl acetate, and acrylonitrile.
From the viewpoint of substrate adhesion, a copolymer containing a copolymerizable monomer having a phenyl group such as styrene, α-methylstyrene, or benzyl (meth) acrylate, or 1 to 50 mol% of epoxy (meth) ) Acrylate-added reactants are preferably used.

The amounts of the above components are as follows.
That is, the photopolymerizable starting system is usually 0.1 to 40% by weight, preferably 0.2 to 30% by weight, and the ethylenic compound is usually 20 to 90% by weight, preferably 30 to 80% by weight, and the organic polymer substance is usually 10 to 80% by weight, preferably 2 to 80% by weight.
0 to 60% by weight. In the present invention, the photopolymerizable composition may contain 0.1 to 10% by weight of a silane coupling agent on the same basis as described above.

The above photopolymerizable composition is used as a coating solution prepared with a suitable solvent. As the solvent, methyl cellosolve, ethyl cellosolve, diethylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, methyl ethyl ketone,
Examples include methyl isobutyl ketone, cyclohexanone, toluene, methanol, butanol, tetrahydrofuran and the like.

In the production of the color filter, an oxygen blocking layer such as a polyvinyl alcohol layer is provided on the photopolymerizable layer in order to prevent a decrease in sensitivity of the photopolymerizable layer due to oxygen during exposure of the photopolymerizable layer. May be applied.

When the oxygen-blocking layer is not provided, the above-mentioned monomer having an aromatic hydrogen group is usually used as a component of the photopolymerizable composition as a copolymer component in an amount of 5 to 50 mol% (preferably 10 to 30 mol%). Or an organic polymer substance contained in the photopolymerizable composition.
No. 48, JP-A-5-19453 and the like preferably contain 1 to 20% by weight (preferably 2 to 10% by weight) of a diazo compound. As a result, a decrease in sensitivity due to oxygen can be suppressed, and an oxygen blocking layer can be eliminated.

First, in the method for forming a black resist pattern according to the present invention, a photopolymerizable composition (coating solution) in which a black material is dispersed is applied on a transparent substrate, and then heated and dried, image exposure, development, and Perform each process of thermosetting. Then, in a preferred embodiment of the present invention, most of the solvent in the coating film is removed by performing preliminary drying prior to the heat drying treatment.

Examples of the coating device include a spinner, a wire bar, a flow coater, a die coater, a roll coater,
A spray or the like is used. Pre-drying conditions are appropriately selected depending on the type of the solvent.
The duration is from 2 seconds to 5 minutes, preferably from 30 seconds to 3 minutes at a temperature of 50-70 ° C.

The condition of the heat drying is preferably higher than the preliminary drying temperature and at a temperature of 50 to 160 ° C. for 15 seconds to 10 minutes, and at a temperature of 70 to 130 ° C. for 15 seconds to 30 seconds to 5 minutes. Is particularly preferred. In addition, the thickness of the photopolymerizable layer (dried coating film) after drying is usually 0.5 to 3 μm,
Preferably, it is in the range of 1-2 μm.

The image exposure is performed by guiding a negative matrix pattern on the black photopolymerizable layer and irradiating an ultraviolet or visible light source through the mask pattern. At this time, if necessary, in order to prevent a decrease in sensitivity of the photopolymerizable layer due to oxygen, exposure may be performed after forming an oxygen barrier layer such as a polyvinyl alcohol layer on the photopolymerizable layer.

The development is carried out using an alkaline developer by a method such as immersion development, spray development, brush development, or ultrasonic development. Thereby, a black matrix pattern is formed on the transparent substrate. Examples of the alkali developer include inorganic alkali agents such as sodium carbonate, potassium carbonate, sodium silicate, potassium silicate, sodium hydroxide, and potassium hydroxide; and organic solvents such as diethanolamine, triethanolamine, and tetraalkylammonium hydroxide salts. Use an aqueous solution containing an alkali agent and, if necessary, a surfactant, a water-soluble organic solvent, a low molecular compound having a hydroxyl group or a carboxylic acid group, etc. for the purpose of improving image quality and shortening the development time. Can be done.

Examples of the surfactant include an anionic surfactant having a sodium naphthalene sulfonate group, a sodium benzene sulfonate group, a nonionic surfactant having a polyalkyleneoxy group, and a cationic surfactant having a tetraalkylammonium group. No. Examples of the water-soluble organic solvent include ethanol, propion alcohol, butanol, methyl cellosolve, butyl cellosolve, ethylene glycol, propylene glycol, and propylene glycol monomethyl ether.
Examples of the low molecular weight compound having a hydroxyl group or a carboxy group include 1-naphthol, 2-naphthol, pyrogallol,
Benzoic acid, succinic acid, glutaric acid and the like can be mentioned.

The temperature as a developing condition is usually from 20 to 40.
It is selected from the range of ° C. The conditions for the heat curing treatment are usually 1
It is 5 to 60 minutes at 00 to 280 ° C. This allows
The formation of the black matrix image ends.

Next, in the method for forming a black resist pattern according to the present invention, the surface on which the black resist pattern is formed is treated with an ozone-containing gas under heating conditions to selectively remove background contamination on the non-pattern-formed surface. In the present invention, the reason why background contamination on the pattern non-formed surface can be removed to a high degree without adversely affecting the black resist pattern, such as a substantial decrease in thickness, is not necessarily clear, but is presumed as follows. You.

That is, the background stain on the non-pattern-formed surface is caused by a slight residue that has not been removed during the cleaning after development and adheres to the non-pixel surface. It is considered that the content of the organic polymer substance that acts is small and rich in black material (carbon black). The state of attachment is as if they were attached in the form of particles. It is presumed that such a difference in the composition and the adhesion state enables the selective removal of the background soil due to the oxidizing power of ozone enhanced by heating at a constant temperature.

In the present invention, the treatment with the ozone-containing gas under the heating condition is performed in an appropriate chamber. The environment (degree of clinization) in the chamber is not particularly limited as long as it is a normal cleaning environment, but it is preferable that the amount of particles having a particle size of 0.5 μm or more is 1,000 or less per cubic foot. . As the heating means, for example, an infrared heater or the like can be used, and the ozone-containing gas can be obtained as an atmospheric gas in a chamber using an ozone generator.

In the present invention, the temperature under the above heating conditions is 100 to 250 ° C., preferably 130 to 230 ° C.
More preferably, the temperature is set to 150 to 200 ° C. The ozone concentration in the ozone-containing gas is 300 to 13,000 p.
pm, preferably 500 to 110,00 ppm. When the heating temperature is lower than 100 ° C. and when the ozone concentration is lower than 300 ppm, background contamination on the pattern non-formed surface cannot be effectively removed. On the other hand, when the heating temperature is higher than 250 ° C. and when the ozone concentration is higher than 13,000 ppm, white spots and peeling occur on the pattern surface.

In the present invention, the treatment with the ozone-containing gas under the heating condition is preferably performed under the irradiation conditions of ultraviolet rays having wavelengths of 185 nm and 254 nm. The integrated amount of ultraviolet light is not particularly limited, but is preferably 100 to 50,0.
00 mJ / cm ² , particularly preferably 500 to 5,000
mJ / cm ² . A part of the air in the chamber is ozonized by the ultraviolet irradiation, but the ozone concentration in the ozone-containing gas (atmospheric gas) is a value including ozone generated by the ultraviolet irradiation.

In the present invention, the specific method of the treatment with the ozone-containing gas under the heating condition is not particularly limited.
A single-wafer method in which substrates to be processed are introduced one by one into the chamber by the transfer means and are drawn out after the transfer is suitably used. The time of the treatment with the ozone-containing gas under the heating condition is as follows:
Although not particularly limited, it is preferably 30 to 180 seconds.

In the present invention, the treatment with the ozone-containing gas under the above-mentioned heating condition effectively removes the background stain on the non-pattern forming surface. It is preferable to perform wet cleaning treatment on the entire surface of the treatment surface.

The type of cleaning liquid used in the wet cleaning process is as follows.
Although not particularly limited, preferably a washing solution having a pH of 9 or more,
More preferably, the pH of the washing solution is adjusted to 9 to 13 with potassium, and particularly preferably, the pH is adjusted to 9 to 13 with potassium.
A cleaning liquid adjusted to 13 and containing a nonionic surfactant. In addition, potassium in the cleaning solution is preferably potassium hydroxide or potassium carbonate.

The type of the nonionic surfactant is not particularly limited, but a surfactant having a structure represented by the following general formula is preferable. Of course, this nonionic surfactant may be used in combination with a nonionic surfactant having another structure.

[0042]

## STR1 ## _{R-φ- (OCH 2 CH 2} ) n OH ( _{where, R: C m H 2m +} 1 (6 ≦ m ≦ 11), φ: phenylene group, 5 ≦ n ≦ 20)

In the present invention, the concentration of the nonionic surfactant in the cleaning solution is generally selected from the range of 0.01 to 10% by weight, preferably 0.1 to 5% by weight. Further, a chelating agent such as EDTA or a carboxylic acid having a complexing action may be contained in the purified liquid.

In the present invention, from the viewpoint of precision cleaning, a cleaning liquid from which foreign substances are contained is used, but the number of particles having a particle size of 0.2 μm or more is preferably 10 particles / ml or less, more preferably 5 particles / ml. Use wash solution not more than pcs / ml. The cleaning liquid is usually used at a temperature of normal temperature or higher, but is preferably used after being heated to a temperature of 30 ° C. or higher.

In the present invention, the cleaning treatment is preferably performed in combination with a mechanical cleaning method. More preferably, it is performed in combination with at least one of ultrasonic cleaning and brush cleaning. The washing time is set to an appropriate time, but is usually at least 20 seconds, preferably at least 30 seconds. Further, in the present invention, it is preferable that the above-described cleaning treatment is performed by a single wafer method in which the transparent substrate is introduced one by one into the cleaning area by the transfer means and washed while being sequentially transferred.

In the method of manufacturing a color filter according to the present invention, each photopolymerizable composition in which red, green and blue materials are dispersed is used, and a black resist pattern (black matrix) obtained by the above method is used. A) A pixel image of each color is formed on the formation surface by performing each of coating, heating and drying, image exposure, development, and heat curing. That is, after applying a photopolymerizable composition containing one color of red, green, and blue to the entire surface of the black matrix forming surface of the transparent substrate, and then pre-drying, as in the case of forming a black resist pattern, The photopolymerizable layer is formed by heating and drying. afterwards,
Exposure processing is performed via a pixel image pattern mask, alkali development and thermal curing processing are performed, and a first color pixel image is formed between black matrix images. Hereinafter, by performing the same operation, two spaces between the black matrix images are obtained.
Pixel images of the third color and the third color are sequentially formed.

As described above, a color filter produced by forming a color filter image composed of black, red, green, and blue on a transparent substrate has an ITO as it is on the image.
(Transparent electrode) is formed and used as a part of the color display part. To improve the surface smoothness and durability, if necessary, a top coat layer such as polyamide or polyimide may be provided on the image. I can do it.

The light source used for the above image exposure is a lamp light source such as a xenon lamp, a halogen lamp, a tungsten lamp, a high-pressure mercury lamp, a metal halide lamp, a medium-pressure mercury lamp, a low-pressure mercury lamp, an argon ion laser, a YAG laser, Laser light sources such as an excimer laser and a nitrogen laser are exemplified. For these light sources, an optical filter can be appropriately used according to a required wavelength range of irradiation light.

[0049]

EXAMPLES Hereinafter, the present invention will be described in more detail with reference to examples, but the present invention is not limited to the following examples unless it exceeds the gist thereof. In the following Examples and Comparative Examples, the following components (1) to (4) shown in Table 1 and the color materials shown in Table 2 were used. Each photopolymerizable coating solution containing each color material has a blending amount shown in the following Table 3, and a paint containing 3.6 weight times zirconia beads (diameter 0.5 mm) with respect to the total amount. It was prepared by performing a dispersion treatment for 7 hours using a shaker.

[0050]

[Table 1]

[0051]

Embedded image (A: b: c: d = 55: 15: 20: 10 (mol%), Mw: 12,000)

[0052]

Embedded image

[0053]

[Table 2]

[0054]

[Table 3]

Examples 1 to 4 and Comparative Examples 1 to 4 A glass substrate ("AN635" manufactured by Asahi Glass Co., Ltd.) having a length of 370 mm, a width of 470 mm and a thickness of 0.7 mm has a dry film thickness of 0.7 μm.
m was coated with a black photopolymerizable coating solution by a spin coater. Then, after drying at 60 ° C for 1 minute, 110 ° C
For 2 minutes. Thereafter, an aqueous solution of polyvinyl alcohol was applied on the photopolymerizable layer so as to have a dry film thickness of 1.5 μm, and then dried to form an oxygen barrier layer.

Next, a width of 30 μm, a length of 330 μm, and a width of 1 μm
Using a negative photomask for a black matrix that is repeated at a pitch of 10 μm, and using a 2 kW high-pressure mercury lamp,
The exposure processing was performed at an exposure amount of 0 mJ / cm ² . afterwards,
As a development process, polyethyleneoxy-β-naphthyl ether (“Newcol B-10” manufactured by Nippon Emulsifier Co., Ltd.)
After immersing in a developer consisting of an aqueous solution containing 2% by weight of potassium carbonate and 0.5% by weight of potassium carbonate at 25 ° C. for 30 seconds, the black matrix is spray-washed at a water pressure of 3 kg / cm ² for 30 seconds to form a black matrix. Formed. Then, 20
A thermosetting treatment was performed at 0 ° C. for 7 minutes.

Next, heating and wavelengths of 185 nm and 25
The surface on which the black matrix was formed was treated with an ozone-containing gas under irradiation conditions of 4 nm ultraviolet rays. Table 4 shows the processing conditions. In Comparative Example 4 in Table 4, the above treatment with the ozone-containing gas under the conditions of heating and irradiation of ultraviolet rays was not performed. Thereafter, the glass substrate with the resin black matrix is immersed for 1 minute in a circulating overflow tank containing 0.1% by weight of a nonionic surfactant represented by the following formula and containing a cleaning solution adjusted to pH 11 with KOH. After that, pure water rinsing and air knife drying were performed.
The temperature of the cleaning liquid was 40 ° C., and 50 kHz was used for cleaning.
Was used together with ultrasonic cleaning.

[0058]

Embedded image C ₉ H ₁₉ -φ- (OC ₂ H ₄ ) ₁₅ OH (φ: phenylene group)

Next, each photopolymerizable coating solution containing each of the red, green, and blue coloring materials was used sequentially, and the coating,
Each process of preliminary drying, heating drying, exposure, development, washing with water, and heat curing was performed to form a pattern of each color, and a color filter was obtained. However, the exposure amount was 500 mJ / cm ^{2 for} each color.
And

In each of the above examples, the background stain (residue of the black photopolymerizable composition: μg / sheet) on the pattern non-formed surface after the formation of the black matrix and before the application of the red photopolymerizable coating liquid was 1%. The number of white chips and peelings having an area of 2,000 μm ² or more was measured. Table 4 shows the results.

[0061]

[Table 4]

[0062]

According to the present invention described above, a method for forming a black resist pattern improved so that dirt (ground stain) on a pattern non-formed surface can be highly removed without causing white defects. A method for producing a color filter using a black resist pattern is provided, and the present invention has great industrial value.

Claims (5)

[Claims] After applying a photopolymerizable composition in which a black material is dispersed on a transparent substrate, heat drying, image exposure, development and heat curing are performed to form a black resist pattern, Under heating conditions of 100-250 ° C, 300
A method for forming a black resist pattern, comprising: treating a black resist pattern forming surface with an ozone-containing gas having a concentration of about 13,000 ppm. 2. The method for forming a black resist pattern according to claim 1, wherein the black material is carbon black. 3. The method according to claim 1, wherein the black resist pattern forming surface is treated with an ozone-containing gas under irradiation conditions of ultraviolet rays having wavelengths of 185 nm and 254 nm. 4. The method according to claim 1, wherein the surface on which the black resist pattern is formed is wet-cleaned after the treatment with the ozone-containing gas. 5. A black resist pattern forming surface obtained by the method according to any one of claims 1 to 4, using each of the photopolymerizable compositions in which red, green, and blue materials are dispersed. Coating,
A method for producing a color filter, wherein a pixel image of each color is formed by performing each of heat drying, image exposure, development, and heat curing.