JPH10213702A - Method and device for forming diffraction grating, and diffraction garting pattern - Google Patents

Method and device for forming diffraction grating, and diffraction garting pattern

Info

Publication number
JPH10213702A
JPH10213702A JP1865297A JP1865297A JPH10213702A JP H10213702 A JPH10213702 A JP H10213702A JP 1865297 A JP1865297 A JP 1865297A JP 1865297 A JP1865297 A JP 1865297A JP H10213702 A JPH10213702 A JP H10213702A
Authority
JP
Japan
Prior art keywords
diffraction grating
optical path
refractive index
forming
photosensitive material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1865297A
Other languages
Japanese (ja)
Other versions
JP3834906B2 (en
Inventor
Toshitaka Toda
敏貴 戸田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP01865297A priority Critical patent/JP3834906B2/en
Publication of JPH10213702A publication Critical patent/JPH10213702A/en
Application granted granted Critical
Publication of JP3834906B2 publication Critical patent/JP3834906B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04Processes or apparatus for producing holograms
    • G03H1/0476Holographic printer
    • G03H2001/0482Interference based printer

Abstract

PROBLEM TO BE SOLVED: To make a distribution of diffraction efficiency in a dot uniform by delicately controlling the diffraction grating by using quasi-coherent light, varying the optical path difference between two pieces of luminous flux which is made incident on a photosensitive material, and varying characteristics of a formed diffraction grating. SOLUTION: A laser beam source which emits a beam such as quasi-coherent light is used. A controller controls respective elements (refractive index modulating element, etc.) according to data on coordinates, characteristics, etc., of the diffraction grating on the photosensitive material. The refractive index modulating element can modulate an optical distance by which the laser beam passes and control the optical path difference from the other laser beam. Through the modulation of the refractive index, the optical distance Lopt when the laser beam passes through the refractive index modulating element varies so that Lopt =Lreal ×n. Here Lreal is a distance by which the laser beam travels straight, impinges on, and exits from and (n) is the refractive index. Therefore, the variation in refractive index by the refractive index modulating element becomes the variation of the optical path difference and corresponds to variation in interference fringe density recorded based on the visibility.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、回折格子からなる
ドットを形成する方法・装置の改良に関し、さらには、
前記ドットを基板上に所望に配置してなるパターンに関
する。
[0001] 1. Field of the Invention [0002] The present invention relates to an improvement of a method and an apparatus for forming dots formed by a diffraction grating,
The present invention relates to a pattern in which the dots are arranged as desired on a substrate.

【0002】[0002]

【従来の技術】レーザー光などの2本のコヒーレント光
を感光材料上で干渉させ、回折格子を形成する方法(2
光束干渉)が周知であり、微小なドット状の回折格子を
基板上に所望に配置してパターンを構成する方法が、本
出願人による特開昭59−166913号公報,特開昭60−1560
04号公報,特開平2− 72319号公報などにより公知であ
る。
2. Description of the Related Art A method of forming a diffraction grating by interfering two coherent lights such as a laser beam on a photosensitive material (2).
Light beam interference) is well known, and a method of arranging minute dot-shaped diffraction gratings on a substrate as desired to form a pattern is disclosed in Japanese Patent Application Laid-Open Nos. 59-166913 and 60-1560 by the present applicant.
No. 04, JP-A-2-72319, and the like.

【0003】回折格子(格子縞)のパラメータには、 回折格子の方向 回折格子のピッチ 回折効率 などがあり、によって回折光が観察される方向が、
によって周波数(定点で見える色)が、によって回折
光の明るさがそれぞれ決定される。
The parameters of the diffraction grating (grating fringes) include the direction of the diffraction grating, the pitch of the diffraction grating, the diffraction efficiency, and the like.
Determines the frequency (the color seen at a fixed point), and determines the brightness of the diffracted light.

【0004】公知の従来技術による2光束干渉において
は、回折格子の明るさを変化させたい場合、入射光の
強度あるいは露光時間の増減を調整することによって、
露光量(強度×時間)を変えている。
In the two-beam interference according to the known prior art, when it is desired to change the brightness of the diffraction grating, the intensity of the incident light or the increase or decrease of the exposure time is adjusted.
The amount of exposure (intensity x time) is changed.

【0005】上記方法では、微妙な露光量の制御が難し
く、正確に回折格子の明るさを制御することが困難であ
る。特に、短い露光時間で回折効率の低いドットを形成
する場合、所望とする回折効率を精密に調整することは
極めて難しい。
In the above method, it is difficult to delicately control the amount of exposure, and it is difficult to accurately control the brightness of the diffraction grating. In particular, when forming dots with low diffraction efficiency in a short exposure time, it is extremely difficult to precisely adjust the desired diffraction efficiency.

【0006】また、レーザー光を用いた2光束干渉で
は、レーザー光の強度分布(ガウシアン分布)に依存し
て、ドット内での空間的な露光量分布も変わってしま
い、均一な回折格子を形成することが必然的に困難であ
る。
In the case of two-beam interference using laser light, the spatial exposure distribution within a dot also changes depending on the intensity distribution (Gaussian distribution) of the laser light, and a uniform diffraction grating is formed. It is necessarily difficult to do.

【0007】[0007]

【発明が解決しようとする課題】本発明は、回折効率の
微妙な制御が可能であると共に、ドット内での回折効率
の分布を均一にすることが可能な回折格子の形成方法・
装置を提供し、回折格子からなる前記ドットの集まりか
ら構成される回折格子パターンを提供することを目的と
する。
SUMMARY OF THE INVENTION The present invention provides a method of forming a diffraction grating which enables fine control of the diffraction efficiency and makes the distribution of the diffraction efficiency uniform within a dot.
It is an object of the present invention to provide a device, and to provide a diffraction grating pattern composed of a group of the dots composed of a diffraction grating.

【0008】[0008]

【課題を解決するための手段】本発明では、準コヒーレ
ント光を利用した2光束干渉によって回折格子を形成す
る。請求項1の発明は、コヒーレント光の代わりに準コ
ヒーレント光を用い、感光材料に入射する2光束の光路
差を変えることにより、2光束の光路差に依存する干渉
縞のビジビリティ(可視度,鮮明度)の変化に基づき、
感光材料に形成される回折格子の特性を変化させること
を特徴とする。
According to the present invention, a diffraction grating is formed by two-beam interference using quasi-coherent light. The invention according to claim 1 uses the quasi-coherent light instead of the coherent light, and changes the optical path difference between the two light beams incident on the photosensitive material, so that the visibility (visibility, sharpness) of the interference fringe depending on the optical path difference between the two light beams. Degree) change,
The characteristics of the diffraction grating formed on the photosensitive material are changed.

【0009】請求項2の発明は、変化させる回折格子の
特性として、回折格子(干渉縞)の濃度を変えることに
より、回折効率(回折光の明るさ)を変化させる。
According to a second aspect of the present invention, the diffraction efficiency (brightness of the diffracted light) is changed by changing the density of the diffraction grating (interference fringe) as a characteristic of the diffraction grating to be changed.

【0010】請求項3の発明は、準コヒーレント光とし
て、波長の異なる2つの単色光を重ねて使用することを
特徴とする回折格子の形成方法である。
A third aspect of the present invention is a method for forming a diffraction grating, wherein two quasi-coherent lights having different wavelengths are superposed and used.

【0011】請求項4の発明は、2光束の光路差を変え
る手段として、空間的な距離を変えることを特徴とする
回折格子の形成方法である。
According to a fourth aspect of the present invention, there is provided a method for forming a diffraction grating, comprising changing a spatial distance as means for changing an optical path difference between two light beams.

【0012】請求項5の発明は、2光束の光路差を変え
る手段として、屈折率変調素子を用いることを特徴とす
る回折格子の形成方法である。
A fifth aspect of the present invention is a method for forming a diffraction grating, wherein a refractive index modulation element is used as a means for changing an optical path difference between two light beams.

【0013】回折格子の形成装置に係る請求項6の発明
は、準コヒーレントなビームを出射する光源と、前記ビ
ームの通過/遮断を選択することにより、露光時間を制
御することが可能なシャッターと、前記シャッターから
のビームを2本に分岐するビームスプリッターと、分岐
された一方のビームの光路長を一定範囲内で可変できる
光路長制御手段、とを有し、前記光路長制御手段を経由
するビームともう一方のビームとを感光材料上で交わら
せ、前記感光材料に2本のビームによる干渉縞を記録す
ることにより、ドット状の回折格子を形成する。
According to a sixth aspect of the present invention, there is provided a diffraction grating forming apparatus, comprising: a light source for emitting a quasi-coherent beam; and a shutter capable of controlling an exposure time by selecting passage / blocking of the beam. A beam splitter that splits a beam from the shutter into two beams, and an optical path length control unit that can change an optical path length of one of the split beams within a certain range, and via the optical path length control unit. The beam and the other beam are crossed on a photosensitive material, and interference fringes by the two beams are recorded on the photosensitive material, thereby forming a dot-like diffraction grating.

【0014】請求項7の発明は、感光材料を載置したテ
ーブルと、テーブルの移動に伴う2本のビームの入射位
置,前記光路長制御手段の制御に伴う2本のビームの光
路長差,前記シャッターの開閉,を制御するコントロー
ラー、とを有し、前記コントローラーの制御により、ド
ット毎に回折格子の特性を適宜に変化させることを特徴
とする。
According to a seventh aspect of the present invention, there is provided a table on which a photosensitive material is placed, an incident position of two beams associated with movement of the table, an optical path length difference between the two beams associated with control of the optical path length control means, A controller for controlling the opening and closing of the shutter, wherein the characteristics of the diffraction grating are appropriately changed for each dot under the control of the controller.

【0015】請求項8の発明は、準コヒーレントなビー
ムを出射する光源として、レーザー光源を用いることを
特徴とする。
The invention according to claim 8 is characterized in that a laser light source is used as a light source for emitting a quasi-coherent beam.

【0016】請求項9の発明は、光路長制御手段とし
て、屈折率変調素子を用いることを特徴とする。
A ninth aspect of the present invention is characterized in that a refractive index modulation element is used as the optical path length control means.

【0017】請求項10の発明は、光路長制御手段とし
て、一方のビームの反射光路を変化させるミラーの搭載
された移動ステージを用いることを特徴とする。
According to a tenth aspect of the present invention, as the optical path length control means, a moving stage provided with a mirror for changing a reflection optical path of one beam is used.

【0018】上記の形成方法/形成装置を利用して作製
される回折格子パターンに係る請求項11の発明は、回
折格子の濃度および/または回折効率が、ドット内では
均一であり、ドット単位で任意に変化した複数のドット
から構成される回折格子パターンである。
According to the eleventh aspect of the present invention, which relates to a diffraction grating pattern produced by using the above-described forming method / forming apparatus, the density and / or the diffraction efficiency of the diffraction grating are uniform within the dot, and the unit of the dot is It is a diffraction grating pattern composed of a plurality of dots that are arbitrarily changed.

【0019】請求項2では、回折格子の特性として「回
折効率」を変化させるが、その他の特性としては、回折
格子の深さを制御させることより、回折光の偏光特性や
照明光の入射角依存特性などを変化させることも考えら
れる。
According to the second aspect, the "diffraction efficiency" is changed as a characteristic of the diffraction grating. As other characteristics, the polarization characteristic of the diffracted light and the incident angle of the illumination light are controlled by controlling the depth of the diffraction grating. It is also conceivable to change the dependence characteristics and the like.

【0020】2光束の光路差を変える手段として、 機械的(空間的に距離を変える) 電気的(屈折率変調素子を制御して光学的距離を変え
る) があり、精密かつ正確な特性の制御が可能である。特
に、電気的に制御する場合、機械的な動作は必要なく、
高速な光路差の変更が可能である。
As means for changing the optical path difference between the two light beams, there are mechanical (changing the distance spatially) and electrical (changing the optical distance by controlling the refractive index modulation element), and precise and accurate control of the characteristics. Is possible. In particular, when controlling electrically, no mechanical operation is required,
It is possible to change the optical path difference at high speed.

【0021】なお、光路差とは光学的な距離の差であ
り、真空中で光が伝播する距離に相当する距離の差を示
す。
Note that the optical path difference is a difference in optical distance, and indicates a difference in distance corresponding to a distance in which light propagates in a vacuum.

【0022】<作用>露光時間が極めて短い場合でも、
露光時間の増減などの必要なく、回折格子の特性の制御
が可能である。
<Operation> Even when the exposure time is extremely short,
It is possible to control the characteristics of the diffraction grating without having to increase or decrease the exposure time.

【0023】2光束干渉による干渉縞の濃度は、光のビ
ジビリティと2光束の光路差に依存する。すなわち、2
光束の光路差によってそれぞれの光束が感光材料に到達
する時間的なずれが生じ、これにより干渉縞のビジビリ
ティが変化する。
The density of interference fringes due to two-beam interference depends on the visibility of light and the optical path difference between the two beams. That is, 2
Due to the optical path difference between the light beams, a time shift occurs in which the respective light beams reach the photosensitive material, thereby changing the visibility of the interference fringes.

【0024】ビジビリティは干渉縞の濃度に相当するの
で、感光材料に記録される回折格子の濃度となる。本発
明では、光が入射している感光材料上の領域内では干渉
縞の濃度は均一に変化するので、均一な回折格子が記録
される。
Since the visibility corresponds to the density of interference fringes, it becomes the density of the diffraction grating recorded on the photosensitive material. In the present invention, since the density of the interference fringes changes uniformly in the area on the photosensitive material where light is incident, a uniform diffraction grating is recorded.

【0025】回折格子の濃度は、感光材料(回折格子の
種類)に応じて、文字通りの回折格子の記録濃度(振幅
型回折格子)である場合と、回折格子の深さ(表面レリ
ーフ型回折格子)、あるいは屈折率変調度(位相型回折
格子)として記録される場合などがある。
Depending on the photosensitive material (kind of diffraction grating), the density of the diffraction grating is either the literal recording density of the diffraction grating (amplitude type diffraction grating) or the depth of the diffraction grating (surface relief type diffraction grating). ), Or recorded as a refractive index modulation degree (phase type diffraction grating).

【0026】[0026]

【発明の実施の形態】干渉縞のビジビリティの例を、図
1〜図4に示す。横軸が二光束の時間的なずれτ(光路
差に比例)であり、縦軸がビジビリティである。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Examples of the visibility of interference fringes are shown in FIGS. The horizontal axis is the time shift τ of the two light beams (proportional to the optical path difference), and the vertical axis is the visibility.

【0027】完全なコヒーレント光のビジビリティ特性
を、図1に示す。完全なコヒーレント光同士(同一光源
から発したものでなくても)は、時間的なずれτ(2光
束の光路差)に依存せず、ビジビリティは常に1(=1
00%)であるため、干渉によって高いコントラストの
格子縞が記録される。
FIG. 1 shows the visibility characteristics of the completely coherent light. Perfect coherent light beams (even if they do not originate from the same light source) always have a visibility of 1 (= 1) without depending on a time shift τ (optical path difference between two light beams).
00%), a high-contrast lattice fringe is recorded by interference.

【0028】一般に干渉光とされるレーザー光であって
も、実際には完全なコヒーレント光ではなく、ビジビリ
ティは、光路差に依存して1から0の間で変化する。
Even a laser beam generally used as interference light is not actually completely coherent light, and the visibility varies between 1 and 0 depending on the optical path difference.

【0029】レーザー光のビジビリティの周期は、数m
m程度の光路差を問題にしない程度に長いため、同一光
源から発したレーザー光による2光束干渉では、感光材
料で干渉縞は安定して記録される。
The visibility cycle of the laser beam is several meters.
Since the optical path difference of about m is long enough not to cause a problem, interference fringes by two laser beams emitted from the same light source can stably record interference fringes on the photosensitive material.

【0030】本発明では、ビジビリティの周期が、数m
m程度の光路差による影響を受ける程度の準コヒーレン
ト光を用いた二光束干渉を採用する。波長の異なる2つ
の単色光(レーザー光)を重ねて使用することによっ
て、上記の準コヒーレント光による2光束干渉とするこ
とができる。
In the present invention, the visibility cycle is several meters.
Two-beam interference using quasi-coherent light that is affected by an optical path difference of about m is employed. By using two monochromatic lights (laser lights) having different wavelengths in an overlapped manner, it is possible to cause two-beam interference by the above quasi-coherent light.

【0031】準コヒーレント光として波長の異なる2つ
の単色光を用いると、周期的なビジビリティを持つた
め、周期的な光路差の取り扱いが可能になり、光学系の
自由度が増し、実現が容易になる。
When two monochromatic lights having different wavelengths are used as the quasi-coherent light, periodic visibility is provided, so that a periodic optical path difference can be handled, the degree of freedom of the optical system is increased, and the realization is easy. Become.

【0032】本発明での準コヒーレントのビジビリティ
特性を、図2,図3に示す。図4は、水銀灯のビジビリ
ティ特性を示す説明図である。
FIGS. 2 and 3 show quasi-coherent visibility characteristics in the present invention. FIG. 4 is an explanatory diagram showing the visibility characteristics of a mercury lamp.

【0033】図2〜図4では、光路差に応じて、ビジビ
リティが1から0の間で変化する。従って、光路差を適
切に設定することにより、その光による干渉縞のビジビ
リティを任意に制御できる。
In FIGS. 2 to 4, the visibility changes between 1 and 0 according to the optical path difference. Therefore, by appropriately setting the optical path difference, the visibility of the interference fringes due to the light can be arbitrarily controlled.

【0034】2光束干渉による干渉縞のビジビリティ
は、2光束が交わっている領域内での干渉縞の濃度を表
す。本発明では、2光束が交わる位置で感光材料に干渉
縞を記録するので、任意の濃度の干渉縞が記録できる。
The visibility of interference fringes due to two-beam interference indicates the density of the interference fringes in a region where the two beams intersect. In the present invention, an interference fringe is recorded on a photosensitive material at a position where two light beams intersect, so that an interference fringe having an arbitrary density can be recorded.

【0035】記録された干渉縞の濃度は、即ち回折格子
の濃度であるので、一般的に、回折格子の回折効率とは
比例関係にある。以上から、光路差の制御により、形成
される回折格子の特性を変化できることは明らかであ
る。
Since the density of the recorded interference fringes is the density of the diffraction grating, it is generally proportional to the diffraction efficiency of the diffraction grating. From the above, it is clear that the characteristics of the formed diffraction grating can be changed by controlling the optical path difference.

【0036】例えば、光路差がなくなるようにして2本
のビームを干渉させると(図5(a)参照)、ビジビリテ
ィ=1であり、最も高いコントラストで干渉縞が記録さ
れ、回折格子の回折効率は高くなる。一方、ビジビリテ
ィ=0.5になるように光路差を変えて干渉縞を記録す
ると(図5(b) 参照)、半分のコントラストの干渉縞が
記録され、回折効率は低くなる。
For example, when two beams interfere with each other so as to eliminate the optical path difference (see FIG. 5A), visibility = 1, interference fringes are recorded with the highest contrast, and the diffraction efficiency of the diffraction grating is obtained. Will be higher. On the other hand, when the interference fringes are recorded by changing the optical path difference so that the visibility becomes 0.5 (see FIG. 5B), interference fringes having half the contrast are recorded, and the diffraction efficiency is reduced.

【0037】実際には、表面レリーフ型あるいは位相型
の回折格子などの場合には、干渉縞の濃淡がどれくらい
の深さあるいは位相変調度に相当するかにより、回折効
率が決定するので、ビジビリティ=1が最大回折効率と
は限らない。すなわち、回折効率とビジビリティとは、
回折格子の深さに応じて0〜100 %の間で同様に変動す
るものではないためである。図5(a) (b) での説明は、
ビジビリティ=1の時に最大回折効率になるように露光
量を設定した例ということになる。
Actually, in the case of a surface relief type or phase type diffraction grating, the diffraction efficiency is determined by the depth or phase modulation degree of the interference fringes, so that visibility = 1 is not always the maximum diffraction efficiency. That is, diffraction efficiency and visibility are
This is because it does not similarly vary between 0% and 100% depending on the depth of the diffraction grating. The explanation in FIGS. 5 (a) and 5 (b)
This is an example in which the exposure amount is set so that the maximum diffraction efficiency is obtained when visibility = 1.

【0038】図6は、回折格子形成装置の1実施形態を
示す説明図である。上記装置は、準コヒーレントなビー
ムを発するレーザー光源と、前記光源からのレーザービ
ームの透過/遮光を選択するシャッターと、シャッター
を透過したレーザービームを2本に分けるビームスプリ
ッターとして機能するハーフミラーと、ハーフミラーを
経由した一方のレーザービームの光路差を変化する屈折
率変調素子と、屈折率変調素子を経由するレーザービー
ムと他方のレーザービームとを干渉させて、回折格子
(干渉縞)により構成されるドットを記録する感光材料
と、感光材料を2次元に移動させて、任意の位置に回折
格子を形成するためのXZステージと、複数の回折格子
(ドット)を形成するために、ステージ,屈折率変調素
子,シャッターを制御するコントローラー、とから成
る。
FIG. 6 is an explanatory view showing one embodiment of the diffraction grating forming apparatus. The apparatus includes a laser light source that emits a quasi-coherent beam, a shutter that selects transmission / shielding of the laser beam from the light source, and a half mirror that functions as a beam splitter that divides the laser beam transmitted through the shutter into two beams. A refractive index modulation element that changes the optical path difference of one laser beam passing through a half mirror, and a laser beam that passes through the refractive index modulation element and the other laser beam interfere with each other to form a diffraction grating (interference fringe). Photosensitive material for recording dots, an XZ stage for moving the photosensitive material two-dimensionally to form a diffraction grating at an arbitrary position, a stage for forming a plurality of diffraction gratings (dots), and a refractor. And a controller for controlling the shutter.

【0039】コントローラーは、形成する回折格子の感
光材料上の座標と特性(明るさ)などの(予め準備し
た)データに従い、各要素(ステージ,屈折率変調素
子,シャッター)を制御する。
The controller controls each element (stage, refractive index modulation element, shutter) in accordance with (prepared) data such as coordinates of the diffraction grating to be formed on the photosensitive material and characteristics (brightness).

【0040】屈折率変調素子は、レーザービームの通過
する光学的距離を変調できるため、他方のレーザービー
ムとの光路差を制御できる。屈折率の変調によって、レ
ーザービームが屈折率変調素子中を通過する際の光学的
距離Lopt は以下のように変化する。 Lopt =Lreal × n Lrealは、レーザービームが屈折率変調素子に、直進し
て入射〜出射する距離(屈折率変調素子の厚み)であ
り、nは屈折率である。
Since the refractive index modulation element can modulate the optical distance through which the laser beam passes, the optical path difference from the other laser beam can be controlled. Due to the modulation of the refractive index, the optical distance Lopt when the laser beam passes through the refractive index modulation element changes as follows. L opt = L real × n L real is a distance (thickness of the refractive index modulation element) where the laser beam goes straight from the incidence to the refractive index modulation element and exits, and n is a refractive index.

【0041】従って、屈折率変調素子による屈折率の変
化が光路差の変化になり、ビジビリティに基づいて記録
される干渉縞濃度の変化に相当する。
Therefore, a change in the refractive index by the refractive index modulation element becomes a change in the optical path difference, and corresponds to a change in the density of interference fringes recorded based on visibility.

【0042】屈折率変調素子には、音響光学変調素子
(AOM)や液晶素子などがあり、特に後者ではホモジ
ニアス配向のものが好適である。それらは、電気的に制
御可能であるため、高速な屈折率変化の制御が可能であ
り、回折格子の作製時間の短縮の上で有効である。ま
た、光学系における可動部分を減らせるため、振動など
の発生がなく、安定した回折格子の形成が実現できる。
The refractive index modulation element includes an acousto-optic modulation element (AOM), a liquid crystal element, and the like. In the latter, a homogeneous alignment element is preferable. Since they can be electrically controlled, it is possible to control the refractive index change at high speed, which is effective in reducing the time required for manufacturing a diffraction grating. In addition, since the number of movable parts in the optical system can be reduced, vibrations and the like do not occur, and a stable diffraction grating can be formed.

【0043】図7は、回折格子形成装置の他の実施形態
を示す説明図である。上記装置は、図6の装置における
屈折率変調素子の代わりに、機械的に2光束の空間的距
離を変える手段を採用している。すなわち、移動ステー
ジ上にミラーを載置して(同図では、両者を合わせて移
動ミラーと称している)、移動ミラーの位置を上下に変
化させることによって、光路差を任意に制御できるよう
にしている。
FIG. 7 is an explanatory view showing another embodiment of the diffraction grating forming apparatus. The above device employs means for mechanically changing the spatial distance of two light beams, instead of the refractive index modulation element in the device of FIG. That is, a mirror is placed on a moving stage (in the figure, both are collectively referred to as a moving mirror), and by changing the position of the moving mirror up and down, the optical path difference can be arbitrarily controlled. ing.

【0044】図7の場合には、光路差=0の条件は実現
できない(移動ミラーの位置に関わらず、2光束の光路
長は必然的に異なるため)が、ビジビリティの周期性を
利用すれば、回折格子の特性を変化させることは可能で
ある。また、図7の装置に若干の変更を加えることで、
0を含む光路差を実現するような光学系とすることも可
能である。
In the case of FIG. 7, the condition of the optical path difference = 0 cannot be realized (since the optical path lengths of the two light beams are necessarily different regardless of the position of the moving mirror), but if the periodicity of the visibility is used. It is possible to change the characteristics of the diffraction grating. Also, by making some changes to the device of FIG. 7,
It is also possible to use an optical system that realizes an optical path difference including zero.

【0045】光学的な距離を変える手段として、空間的
に距離を変えることは非常に容易であり、また距離の可
変範囲を自由に設定でき、準コヒーレント光の特性に合
わせた光学系の設計が可能であるばかりでなく、必要に
応じた精度の制御が容易である。
As a means for changing the optical distance, it is very easy to change the distance spatially, and it is also possible to freely set the variable range of the distance, and to design an optical system in accordance with the characteristics of the quasi-coherent light. Not only is it possible, but it is easy to control the accuracy as needed.

【0046】以上の2つの実施形態に係る回折格子形成
装置において、2光束の干渉によるビジビリティは光路
差によって容易に正確に制御できるので、任意に明るさ
などの特性を設定した回折格子を高精度に作製できる。
In the diffraction grating forming apparatus according to the above two embodiments, the visibility due to the interference of two light beams can be easily and accurately controlled by the optical path difference. Can be manufactured.

【0047】また、光路差に依存するビジビリティは、
干渉縞内では一様に変化するので、干渉縞のビジビリテ
ィも一様であり、ドット内での回折効率が均一な回折格
子の作製が可能である。
The visibility depending on the optical path difference is as follows.
Since the interference fringes change uniformly, the visibility of the interference fringes is uniform, and a diffraction grating having a uniform diffraction efficiency within the dot can be manufactured.

【0048】さらに、露光時間が極めて短い場合でも、
シャッターの開閉時間を厳密に制御する必要はなく、2
光束の光路差の制御のみで、高精度な制御が可能であ
る。
Further, even when the exposure time is extremely short,
There is no need to strictly control the opening and closing time of the shutter.
High-precision control is possible only by controlling the optical path difference of the light beam.

【0049】[0049]

【発明の効果】回折効率の微妙な制御が可能であると共
に、ドットを構成単位とする場合、ドット内での回折効
率の分布を均一にすることが可能な回折格子の形成方法
・装置が提供され、回折格子からなる前記ドットの集ま
りから構成される回折格子パターンが提供される。
According to the present invention, there is provided a method and apparatus for forming a diffraction grating capable of finely controlling the diffraction efficiency and making the distribution of the diffraction efficiency uniform within a dot when the dot is a constituent unit. And a diffraction grating pattern comprising a group of the dots comprising the diffraction grating is provided.

【0050】[0050]

【図面の簡単な説明】[Brief description of the drawings]

【図1】完全なコヒーレント光のビジビリティ特性を示
す説明図。
FIG. 1 is an explanatory diagram showing visibility characteristics of complete coherent light.

【図2】準コヒーレントのビジビリティ特性を示す説明
図。
FIG. 2 is an explanatory diagram showing quasi-coherent visibility characteristics.

【図3】準コヒーレントのビジビリティ特性を示す説明
図。
FIG. 3 is an explanatory diagram showing quasi-coherent visibility characteristics.

【図4】水銀灯のビジビリティ特性を示す説明図。FIG. 4 is an explanatory diagram showing visibility characteristics of a mercury lamp.

【図5】ビジビリティを変えて干渉縞を記録する状態
を、(a) はビジビリティ=1,(b) はビジビリティ=
0.5について示す説明図。
5A and 5B show states in which interference fringes are recorded by changing visibility, wherein FIG. 5A shows visibility = 1, and FIG.
FIG.

【図6】回折格子形成装置の1実施形態を示す説明図。FIG. 6 is an explanatory view showing one embodiment of a diffraction grating forming apparatus.

【図7】回折格子形成装置の他の実施形態を示す説明
図。
FIG. 7 is an explanatory view showing another embodiment of the diffraction grating forming apparatus.

Claims (11)

【特許請求の範囲】[Claims] 【請求項1】コヒーレント光の2光束干渉により干渉縞
を感光材料に記録して、回折格子を形成する方法におい
て、 コヒーレント光の代わりに準コヒーレント光を用い、 感光材料に入射する2光束の光路差を変えることによ
り、 2光束の光路差に依存する干渉縞のビジビリティの変化
に基づき、 感光材料に形成される回折格子の特性を変化させること
を特徴とする回折格子の形成方法。
1. A method of forming a diffraction grating by recording interference fringes on a photosensitive material by two-beam interference of coherent light, wherein a quasi-coherent light is used instead of the coherent light, and an optical path of two light beams incident on the photosensitive material. A method of forming a diffraction grating, comprising: changing a difference to change characteristics of a diffraction grating formed on a photosensitive material based on a change in visibility of interference fringes depending on an optical path difference between two light beams.
【請求項2】回折格子の特性として、回折効率を変化さ
せることを特徴とする請求項1記載の回折格子の形成方
法。
2. The method according to claim 1, wherein the diffraction efficiency is changed as a characteristic of the diffraction grating.
【請求項3】準コヒーレント光として、波長の異なる2
つの単色光を重ねて使用することを特徴とする請求項1
または2に記載の回折格子の形成方法。
3. The quasi-coherent light having two wavelengths different from each other.
2. The method according to claim 1, wherein two monochromatic lights are used in an overlapping manner.
Or the method for forming a diffraction grating according to 2.
【請求項4】2光束の光路差を変える手段として、空間
的な距離を変えることを特徴とする請求項1〜3の何れ
かに記載の回折格子の形成方法。
4. The method of forming a diffraction grating according to claim 1, wherein a spatial distance is changed as a means for changing an optical path difference between the two light beams.
【請求項5】2光束の光路差を変える手段として、屈折
率変調素子を用いることを特徴とする請求項1〜3の何
れかに記載の回折格子の形成方法。
5. The method for forming a diffraction grating according to claim 1, wherein a refractive index modulation element is used as means for changing the optical path difference between the two light beams.
【請求項6】準コヒーレントなビームを出射する光源
と、 前記ビームの通過/遮断を選択することにより、露光時
間を制御することが可能なシャッターと、 前記シャッターからのビームを2本に分岐するビームス
プリッターと、 分岐された一方のビームの光路長を一定範囲内で可変で
きる光路長制御手段、 とを有し、 前記光路長制御手段を経由するビームともう一方のビー
ムとを感光材料上で交わらせ、前記感光材料に2本のビ
ームによる干渉縞を記録することにより、ドット状の回
折格子を形成する回折格子形成装置。
6. A light source for emitting a quasi-coherent beam, a shutter capable of controlling an exposure time by selecting passage / blocking of the beam, and splitting a beam from the shutter into two beams. A beam splitter, and an optical path length control unit capable of changing an optical path length of one of the branched beams within a certain range, wherein the beam passing through the optical path length control unit and the other beam are formed on a photosensitive material. A diffraction grating forming apparatus for forming a dot-like diffraction grating by recording interference fringes of two beams on the photosensitive material.
【請求項7】感光材料を載置したテーブルと、 テーブルの移動に伴う2本のビームの入射位置,前記光
路長制御手段の制御に伴う2本のビームの光路長差,前
記シャッターの開閉,を制御するコントローラー、とを
有し、 前記コントローラーの制御により、ドット毎に回折格子
の特性を適宜に変化させることを特徴とする請求項6記
載の回折格子形成装置。
7. A table on which a photosensitive material is placed, an incident position of two beams associated with movement of the table, an optical path length difference between the two beams associated with control of the optical path length control means, opening and closing of the shutter, 7. The diffraction grating forming apparatus according to claim 6, further comprising: a controller for controlling the characteristics of the diffraction grating for each dot under the control of the controller.
【請求項8】準コヒーレントなビームを出射する光源と
して、レーザー光源を用いることを特徴とする請求項6
または7に記載の回折格子の形成装置。
8. A laser light source as a light source for emitting a quasi-coherent beam.
Or the apparatus for forming a diffraction grating according to 7.
【請求項9】光路長制御手段として、屈折率変調素子を
用いることを特徴とする請求項6〜8の何れかに記載の
回折格子の形成装置。
9. The diffraction grating forming apparatus according to claim 6, wherein a refractive index modulation element is used as the optical path length control means.
【請求項10】光路長制御手段として、一方のビームの
反射光路を変化させるミラーの搭載された移動ステージ
を用いることを特徴とする請求項6〜8の何れかに記載
の回折格子の形成装置。
10. A diffraction grating forming apparatus according to claim 6, wherein a moving stage provided with a mirror for changing a reflection optical path of one beam is used as the optical path length control means. .
【請求項11】請求項1〜5の何れかに記載の回折格子
の形成方法および請求項6〜10の何れかに記載の回折
格子の形成装置を利用して作製される回折格子パターン
であって、 回折格子の濃度および/または回折効率が、ドット内で
は均一であり、ドット単位で任意に変化した複数のドッ
トから構成される回折格子パターン。
11. A diffraction grating pattern produced by using the diffraction grating forming method according to any one of claims 1 to 5 and the diffraction grating forming apparatus according to any one of claims 6 to 10. A diffraction grating pattern composed of a plurality of dots in which the density and / or diffraction efficiency of the diffraction grating is uniform within the dots and arbitrarily changed in dot units.
JP01865297A 1997-01-31 1997-01-31 Diffraction grating forming method, forming apparatus, and diffraction grating pattern Expired - Fee Related JP3834906B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP01865297A JP3834906B2 (en) 1997-01-31 1997-01-31 Diffraction grating forming method, forming apparatus, and diffraction grating pattern

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Application Number Priority Date Filing Date Title
JP01865297A JP3834906B2 (en) 1997-01-31 1997-01-31 Diffraction grating forming method, forming apparatus, and diffraction grating pattern

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Publication Number Publication Date
JPH10213702A true JPH10213702A (en) 1998-08-11
JP3834906B2 JP3834906B2 (en) 2006-10-18

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006091555A (en) * 2004-09-24 2006-04-06 Fuji Photo Film Co Ltd Method for forming rugged pattern and method for manufacturing optical element
CN100359299C (en) * 2003-11-03 2008-01-02 中国科学院长春光学精密机械与物理研究所 Grating diffraction efficiency testing instrument for optical path symmetrical distribution
CN114415275A (en) * 2020-10-28 2022-04-29 杭州海康威视数字技术股份有限公司 Exposure apparatus and near-to-eye display apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100359299C (en) * 2003-11-03 2008-01-02 中国科学院长春光学精密机械与物理研究所 Grating diffraction efficiency testing instrument for optical path symmetrical distribution
JP2006091555A (en) * 2004-09-24 2006-04-06 Fuji Photo Film Co Ltd Method for forming rugged pattern and method for manufacturing optical element
CN114415275A (en) * 2020-10-28 2022-04-29 杭州海康威视数字技术股份有限公司 Exposure apparatus and near-to-eye display apparatus

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