JPH10206604A - Reflection preventive film - Google Patents
Reflection preventive filmInfo
- Publication number
- JPH10206604A JPH10206604A JP9019563A JP1956397A JPH10206604A JP H10206604 A JPH10206604 A JP H10206604A JP 9019563 A JP9019563 A JP 9019563A JP 1956397 A JP1956397 A JP 1956397A JP H10206604 A JPH10206604 A JP H10206604A
- Authority
- JP
- Japan
- Prior art keywords
- film
- layer
- refractive index
- optical thin
- uneven
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Surface Treatment Of Optical Elements (AREA)
- Laminated Bodies (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、防眩性の光学的機
能をもつフィルムに関し、特にワープロ、コンピュー
タ、テレビなどの各種ディスプレイ、液晶表示装置に用
いる偏光板の表面、透明なプラスチック類からなりサン
グラスのレンズ、度付きメガネのレンズ、カメラ用ファ
インダーのレンズなどの光学レンズ、各種計器のカバ
ー、自動車、電車などの窓ガラスの表面の反射防止フィ
ルムに適する光学的特性に優れたフィルムに属する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a film having an optical function of antiglare properties, and more particularly to a film made of various plastics such as word processors, computers and televisions, a polarizing plate used for a liquid crystal display, and transparent plastics. It belongs to a film having excellent optical characteristics suitable for an anti-reflection film on a surface of a window glass of an automobile, a train, etc., an optical lens such as a sunglass lens, a prescription glasses lens, a camera finder lens, and the like.
【０００２】[0002]
【従来の技術】カーブミラー、バックミラー、ゴーグ
ル、窓ガラス、パソコン、ワープロなどのディスプレイ
その他種々の商業ディスプレイなどには、ガラスやプラ
スチックなどの透明基板が使用されている。そして、こ
れらの透明基板を通して物体や文字、図形などの視覚情
報、あるいはミラーからの像を透明基板を通して反射層
から観察する場合に、これら透明基板の表面が光を反射
して、内部の必要な視覚情報が判読し難いという問題点
があった。2. Description of the Related Art Transparent substrates such as glass and plastic are used for curved mirrors, rearview mirrors, goggles, windows, displays such as personal computers and word processors, and various other commercial displays. When observing visual information such as objects, characters, and figures through these transparent substrates or an image from a mirror through a transparent substrate through a reflective layer, the surface of these transparent substrates reflects light, and the necessary internal parts are reflected. There was a problem that visual information was difficult to read.
【０００３】従来、これらの光の反射を防止する技術に
は、ガラスやプラスチックなどの基材表面に反射防止塗
料を塗工する方法、ガラスなどの透明基板の表面に厚み
０．１μｍ程度のＭg Ｆ2 などの極薄膜や金属蒸着膜を
設ける方法、プラスチックレンズなどの表面に電離放射
線硬化型樹脂を塗工し、更に、その上に蒸着によりＳi
ＯｘやＭg Ｆ2 の膜を形成する方法、電離放射線硬化型
樹脂の硬化膜の上に更に低屈折率の塗膜を形成したりす
る方法などがあった。Conventionally, techniques for preventing such light reflection include a method of applying an antireflection paint to a substrate surface such as glass or plastic, and a method of coating a glass or other transparent substrate with a Mg layer having a thickness of about 0.1 μm. method of providing an extremely thin film or a metal deposition film, such as F 2, coating the surfaces to ionizing radiation curable resin such as a plastic lens, Si addition, by vapor deposition thereon
A method of forming a film of the Ox and Mg F 2, there is such a method of further or to form a coating film having a low refractive index on the cured film of an ionizing radiation curable resin.
【０００４】また、基材表面に光学薄膜層を多層で設
け、光の干渉効果を利用してフィルムの分光最低反射率
を下げてきた。しかしながら、多層の光学薄膜は各厚み
の管理精度を要求される。すなわち、層構成が多い光学
薄膜層の場合は、反射防止効果は得られるものの、光の
干渉により発色する色を均一化することが難しい。ま
た、層構成が少ない光学薄膜の場合は、充分な反射防止
効果を得ることができないなどの問題があった。特に液
晶ディスプレーなどの反射防止フィルムにおいては重要
な課題の一つとなっていた。Further, an optical thin film layer is provided in multiple layers on the surface of a substrate, and the spectral minimum reflectance of the film has been lowered by utilizing the light interference effect. However, a multilayer optical thin film is required to control the thickness of each layer. That is, in the case of an optical thin film layer having a large number of layer structures, although an antireflection effect can be obtained, it is difficult to make the color developed by light interference uniform. Further, in the case of an optical thin film having a small layer structure, there is a problem that a sufficient antireflection effect cannot be obtained. In particular, it has been one of the important issues in antireflection films such as liquid crystal displays.
【０００５】更に、光干渉により、局所的に特定の波長
領域で分光最低反射率を下げた場合には、必然的に、他
の波長領域における分光反射率の数値が上がるという問
題があった。また、充分な反射防止効果を与えるために
は、光学薄膜層を多層にすることで、反射率が高い波長
領域を極力せまくすることが行われていた。しかしなが
ら、多層に光学薄膜層を設けることは、工程的に不安定
であるという問題点があった。Further, when the spectral minimum reflectance is locally reduced in a specific wavelength region due to optical interference, there is a problem that the numerical value of the spectral reflectance in other wavelength regions necessarily increases. Further, in order to provide a sufficient anti-reflection effect, it has been practiced to minimize the wavelength region having a high reflectivity by making the optical thin film layer a multilayer. However, providing an optical thin film layer in multiple layers has a problem that the process is unstable.
【０００６】[0006]
【発明が解決しようとする課題】本発明は、各種ディス
プレイに使用して透明基板を通して識別する物体や文
字、図形などの視覚情報、あるいはミラーからの像を透
明基板を通して反射層から観察する場合に、これら透明
基板の表面が光の反射を防止して、内部の必要な視覚情
報を透過して、明瞭に判読できる反射防止フィルムの提
供を課題とするものである。そして、光学薄膜層を少な
くして光の干渉を緩和し、なお、かつ反射率が高い波長
領域のせまい、フィルム全体としては低反射となる反射
防止フィルムの提供を課題とするものである。SUMMARY OF THE INVENTION The present invention is applicable to a case where visual information such as an object, a character, and a figure to be identified through a transparent substrate used in various displays or an image from a mirror is observed from a reflective layer through a transparent substrate. An object of the present invention is to provide an antireflection film in which the surfaces of these transparent substrates prevent reflection of light, transmit necessary visual information inside, and can be clearly read. It is another object of the present invention to provide an antireflection film which reduces the interference of light by reducing the number of optical thin film layers, and furthermore, has a low reflectance in the whole film due to a high reflectance in a wavelength region.
【０００７】[0007]
【課題を解決するための手段】上記の課題を解決するた
めに本発明は、透明、かつ、表面に凹凸形状をもつ凹凸
基材に、基材の屈折率よりも低い光学薄膜層をλ／４ｎ
（但し、ｎ：屈折率、λ：５００〜６００ｎｍ）の膜厚
で単層のみを設けた積層フィルムであって、積層フィル
ム全体のヘイズ値が４０％以下であり、かつ、可視光領
域（以下、本明細書においては、３８０〜７８０ｎｍを
いう。）における最低分光反射率と最高分光反射率との
差が０．５％以下である反射防止フィルムである。そし
て、上記積層フィルム全体のヘイズ値が２０〜４０％の
範囲の反射防止フィルムである。また、上記凹凸基材の
最表面の表面平均粗度Ｒａが０．１〜０．５μｍの反射
防止フィルムである。そして、上記の凹凸基材と、光学
薄膜層との屈折率差が０．０３〜０．１５である反射防
止フィルムである。そして、透明な基材シート上に凹凸
形状をもつ塗工層を介して、塗工層の屈折率よりも低い
光学薄膜層をλ／４ｎ（但し、ｎ：屈折率、λ：５００
〜６００ｎｍ）の膜厚で単層のみを設けた積層フィルム
であって、積層フィルム全体のヘイズ値が４０％以下で
あり、かつ、可視光領域における最低分光反射率と最高
分光反射率との差が０．５％以下である反射防止フィル
ムである。また、請求項５記載の積層フィルム全体のヘ
イズ値が２０〜４０％の範囲にある反射防止フィルムで
ある。また、前記凹凸形状をもつ塗工層の最表面の表面
粗度Ｒａが０．１〜０．５μｍである反射防止フィルム
である。そして、前記凹凸形状をもつ塗工層と、光学薄
膜層との屈折率差が０．０３〜０．１５の反射防止フィ
ルムである。更に前記の請求項５記載の塗工層が鉛筆硬
度で２Ｈ以上の硬化皮膜の反射防止フィルムである。SUMMARY OF THE INVENTION In order to solve the above-mentioned problems, the present invention relates to a method for forming an optical thin film layer having a refractive index lower than the refractive index of a substrate on a concave and convex substrate having a transparent and irregular surface. 4n
(Where n: refractive index, λ: 500 to 600 nm) is a laminated film provided with only a single layer and has a haze value of 40% or less in the entire laminated film and a visible light region (hereinafter, referred to as a haze value). In this specification, the difference between the lowest spectral reflectance and the highest spectral reflectance at 380 to 780 nm is 0.5% or less. And the haze value of the whole laminated film is an antireflection film in the range of 20 to 40%. The anti-reflection film has a surface average roughness Ra of 0.1 to 0.5 μm on the outermost surface of the uneven substrate. And it is an antireflection film in which the refractive index difference between the above-mentioned uneven base material and the optical thin film layer is 0.03 to 0.15. Then, an optical thin film layer having a refractive index lower than the refractive index of the coating layer is formed on a transparent base sheet via a coating layer having an uneven shape by λ / 4n (n: refractive index, λ: 500).
A single-layered film having a thickness of about 600 nm), the haze value of the entire laminated film is 40% or less, and the difference between the lowest spectral reflectance and the highest spectral reflectance in the visible light region. Is 0.5% or less. The haze value of the entire laminated film according to claim 5 is an antireflection film having a haze value in the range of 20 to 40%. Further, the antireflection film has a surface roughness Ra of the outermost surface of the coating layer having the uneven shape of 0.1 to 0.5 μm. The antireflection film has a refractive index difference of 0.03 to 0.15 between the coating layer having the uneven shape and the optical thin film layer. Further, the coating layer according to claim 5 is an antireflection film of a cured film having a pencil hardness of 2H or more.
【０００８】[0008]
【発明の実施形態】請求項１の発明は、図１に示すよう
に、透明、かつ、表面に凹凸形状６をもつ凹凸基材２
に、基材の屈折率よりも低い光学薄膜層５をλ／４ｎ
（但し、ｎ：屈折率、λ：５００〜６００ｎｍ）の膜厚
で単層のみ設けた積層フィルムである。そして、該積層
フィルム全体のヘイズ値が４０％以下の範囲にある反射
防止フィルム１である。そして、上記積層フィルム全体
のヘイズ値が２０〜４０％の範囲の反射防止フィルム１
である。また、上記凹凸基材２の最表面の表面平均粗度
Ｒａが０．１〜０．５μｍの反射防止フィルム１であ
る。そして、上記の凹凸基材２と、光学薄膜層５との屈
折率差が０．０３〜０．１５である反射防止フィルムで
ある。そして、請求項５の発明は、図２に示すとおりの
透明な基材シート３の上に凹凸形状６をもつ凹凸塗工層
４を介して、前記の光学薄膜層５を設けた積層フィルム
であり、該積層フィルム全体のヘイズ値が４０％以下の
範囲にある反射防止フィルム１である。また、請求項５
記載の積層フィルム全体のヘイズ値が２０〜４０％の範
囲にある反射防止フィルム１である。また、前記凹凸形
状をもつ塗工層４の最表面の表面粗度Ｒａが０．１〜
０．５μｍである反射防止フィルム１である。そして、
前記凹凸形状をもつ塗工層４と、光学薄膜層５との屈折
率差が０．０３〜０．１５である反射防止フィルム１で
ある。また、請求項５記載の塗工層４が鉛筆硬度で２Ｈ
以上の硬化皮膜の反射防止フィルム１である。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS As shown in FIG. 1, the invention according to claim 1 is an uneven base material 2 which is transparent and has an uneven shape 6 on its surface.
Then, the optical thin film layer 5 having a refractive index lower than the refractive index of
(Where n: refractive index, λ: 500 to 600 nm) is a laminated film provided with only a single layer. The antireflection film 1 has a haze value of the entire laminated film of 40% or less. And the antireflection film 1 whose haze value of the entire laminated film is in the range of 20 to 40%.
It is. The anti-reflection film 1 has a surface average roughness Ra of the outermost surface of the uneven substrate 2 of 0.1 to 0.5 μm. And it is an antireflection film in which the refractive index difference between the uneven substrate 2 and the optical thin film layer 5 is 0.03 to 0.15. The invention according to claim 5 is a laminated film in which the optical thin film layer 5 is provided on a transparent base sheet 3 as shown in FIG. The antireflection film 1 has a haze value of 40% or less for the entire laminated film. Claim 5
An antireflection film 1 having a haze value of the entire laminated film described in the range of 20 to 40%. Further, the surface roughness Ra of the outermost surface of the coating layer 4 having the uneven shape is 0.1 to 0.1.
This is an antireflection film 1 having a thickness of 0.5 μm. And
The antireflection film 1 has a refractive index difference between the coating layer 4 having the uneven shape and the optical thin film layer 5 of 0.03 to 0.15. The coating layer 4 according to claim 5 has a pencil hardness of 2H.
This is the cured film antireflection film 1 described above.
【０００９】本発明は、凹凸形状を設けた透明基材に光
学薄膜層を単層で設けることにより、凹凸形状の光拡散
効果と、光学薄膜層の光干渉効果との組合せにより、積
層フィルムが全体として、全光線透過率が高く、可視光
領域における分光平均反射率が２％以下で、かつ最低分
光反射率と最高分光反射率との差を０．５％以下の色む
らがない反射防止フィルムを構成するものである。According to the present invention, a laminated film is formed by providing a single layer of an optical thin film layer on a transparent base material having an uneven shape, thereby combining the light diffusion effect of the uneven shape and the light interference effect of the optical thin film layer. Overall, high total light transmittance, a spectral average reflectance in the visible light region of 2% or less, and a difference between the minimum spectral reflectance and the maximum spectral reflectance of 0.5% or less. It constitutes a film.
【００１０】請求項１の発明に使用する凹凸基材２は、
屈折率が１．５％以上の透明なガラスなどのセラミック
ス、又は透明のプラスチックの延伸又は未延伸のフィル
ムから形成される。そして、通常の光学ガラスの他に、
ポリエステル、トリ又はジアセチルセルロース、ポリア
ミド、ポリイミド、ポリプロピレン、ポリメチルペンテ
ン、ポリ塩化ビニル、ポリビニルアセタール、ポリメタ
アクリル酸メチル、ポリカーボネート、ポリウレタンな
どの熱可塑性樹脂を使用することができる。フィルムの
厚みは材料の剛性、強度、製造方法にもよるが、プラス
チックフィルムでは３０〜１０００μｍ、セラミックス
で２００〜３０００μｍである。そして、凹凸形状は、
成膜を行うときに賦型フィルム、又は賦型板と積層した
り、成膜を完了したフィルムをサンドブラストなどの処
理で形成する。The uneven substrate 2 used in the first aspect of the present invention comprises:
It is formed from a stretched or unstretched film of ceramics such as transparent glass having a refractive index of 1.5% or more, or transparent plastic. And, besides ordinary optical glass,
Thermoplastic resins such as polyester, tri- or diacetylcellulose, polyamide, polyimide, polypropylene, polymethylpentene, polyvinyl chloride, polyvinyl acetal, polymethyl methacrylate, polycarbonate, and polyurethane can be used. The thickness of the film depends on the rigidity, strength and manufacturing method of the material, but is 30 to 1000 μm for a plastic film and 200 to 3000 μm for a ceramic. And the uneven shape is
When forming a film, the film is laminated with a shaping film or a shaping plate, or a film on which film formation is completed is formed by a process such as sandblasting.
【００１１】上記の凹凸基材は、賦型を行うことにより
ヘイズを４０％以下とし、そしてその凹凸形状の表面粗
度Ｒａは、０．１〜０．５μｍとする。このような凹凸
形状に単層の光学薄膜層を設けることにより、可視光領
域における分光平均反射率を、２．０％以下、かつ可視
光領域における最低分光反射率と、最高分光反射率との
差を０．５％以下にできる。分光反射率が２％以下であ
り、かつ可視光領域における最高分光反射率と最低分光
反射率とのさが０．５％以下にすることが好ましい。表
面粗度Ｒａが０．５μｍを超えると、表面が荒れて液晶
ディスプレーなどの用途には不適当である。ヘイズが４
０％を超えると全体に白っぽい表面となり、ディスプレ
ーの用途には不適当である。また、表面粗度Ｒａが０．
１μｍに充たないときは、表面凹凸による光拡散効果が
不充分となり、単層のみの光学薄膜層では可視光領域に
おける分光平均反射率を、２．０％以下にすることは困
難である。The above-mentioned uneven base material is formed to have a haze of 40% or less by shaping, and the surface roughness Ra of the uneven shape is 0.1 to 0.5 μm. By providing a single optical thin film layer in such a concavo-convex shape, the spectral average reflectance in the visible light region is 2.0% or less, and the minimum spectral reflectance in the visible light region and the maximum spectral reflectance in the visible light region. The difference can be reduced to 0.5% or less. It is preferable that the spectral reflectance is 2% or less and the maximum spectral reflectance and the minimum spectral reflectance in the visible light region are 0.5% or less. If the surface roughness Ra exceeds 0.5 μm, the surface becomes rough and unsuitable for applications such as liquid crystal displays. Haze is 4
If it exceeds 0%, the entire surface becomes whitish, which is not suitable for display use. Further, the surface roughness Ra is set at 0.
When the thickness is less than 1 μm, the light diffusion effect due to surface irregularities becomes insufficient, and it is difficult to reduce the spectral average reflectance in the visible light region to 2.0% or less with only a single optical thin film layer.
【００１２】請求項５の発明における凹凸形状は、前記
凹凸基材で作成したものと同一、又は表面硬度などの特
性を向上させる目的で透明の基材シート３に塗工により
形成する。そして、透明基材シート３に熱硬化型又は電
離放射線硬化型組成物を主とする塗料を塗工して、基材
シートとは異なる表面特性をもつ凹凸塗工層４を形成す
るものである。また、基材シートに、直接又は凹凸塗工
層の接着を強固にするプライマー層を設けて、凹凸塗工
層を形成することもできる。そして、凹凸塗工層の塗工
量（本明細書においては、塗工量の厚みは固形分で記載
する。）は、２〜２０μｍである。塗工量が２μｍ以下
では、精度のある凹凸形状を賦型できないばかりでな
く、塗工材料がもつ特性を発揮することができない。ま
た、塗工量が２０μｍ以上になると、資源の浪費であ
り、硬化に時間を必要とし、塗工層の可撓性を損ない、
加工工程で亀裂を生ずるなどの問題を発生することとな
る。また、凹凸塗工層が熱可塑性樹脂を主とする組成物
を塗工・賦型することでも形成できる。According to the fifth aspect of the present invention, the uneven shape is the same as that formed by the uneven base material, or is formed on the transparent base sheet 3 by coating for the purpose of improving properties such as surface hardness. Then, a coating mainly containing a thermosetting or ionizing radiation-curable composition is applied to the transparent base sheet 3 to form the uneven coating layer 4 having a surface characteristic different from that of the base sheet. . In addition, the base material sheet may be provided with a primer layer directly or by providing a primer layer for strengthening the adhesion of the uneven coating layer, to form the uneven coating layer. The coating amount of the concavo-convex coating layer (the thickness of the coating amount is described as a solid content in this specification) is 2 to 20 μm. When the coating amount is 2 μm or less, not only the accurate uneven shape cannot be formed, but also the characteristics of the coating material cannot be exhibited. Further, when the coating amount is 20 μm or more, it is a waste of resources, requires time for curing, impairs the flexibility of the coating layer,
Problems such as generation of cracks in the processing step occur. The uneven coating layer can also be formed by applying and shaping a composition mainly composed of a thermoplastic resin.
【００１３】凹凸塗工層が形成する屈折率と、光学薄膜
層がもつ屈折率との差が、０．０３に充たないときは、
干渉効果を奏さず、また、０．１５を超えると、干渉効
果により発色する。したがって、上記屈折率の差は、
０．０３〜０．１５好ましくは０．０５〜０．１０であ
る。When the difference between the refractive index formed by the uneven coating layer and the refractive index of the optical thin film layer is less than 0.03,
No interference effect is exhibited, and if it exceeds 0.15, color is formed by the interference effect. Therefore, the difference in the refractive index is
0.03 to 0.15, preferably 0.05 to 0.10.
【００１４】凹凸塗工層は、小ロットで生産する凹凸形
状の賦型に適するばかりでなく、基材シートの表面特
性、擦り傷などの発生を防止する硬度や、異物の付着を
防止する防汚性を付与するために設けるものである。し
たがって、熱可塑性樹脂ばかりでなく、フィルムによる
凹凸賦型が容易な硬化型樹脂、熱硬化性樹脂、電離放射
線硬化型樹脂などに必要によっては、界面活性剤や、離
形材料を添加したものの使用が好ましい。例えば、ポリ
カーボネート、ポリメチルメタアクリレート、ポリメチ
ルペンテン、ポリイミド、ポリエステルなどの熱可塑性
樹脂の他に、ポリエステル・イソシアネート、ポリエー
テル・イソシアネート、エポキシ・イソシアネートなど
の二液反応型樹脂がある。更に好ましくは、ポリエステ
ル・（メタ）アクリレート（本明細書においては、・・
メタアク・・・と・・アク・・とを・・（メタ）アク・
・と記載する。）、エポキシ（メタ）アクリレート、多
官能（メタ）アクリレートなどを主成分とする電離放射
線硬化型樹脂である。これらの樹脂を基材シートに塗工
し、溶融状態あるいは未硬化の状態で、賦型フィルムと
圧着・賦型して、冷却や、加熱及び／又は電離放射線で
硬化して凹凸塗工層を構成するものである。また、硬化
した塗工層をサンドブラスト処理により凹凸形状を形成
することもできる。The concavo-convex coating layer is not only suitable for forming concavo-convex shapes to be produced in small lots, but also has a surface property of a base sheet, a hardness for preventing the occurrence of scratches, and an antifouling for preventing adhesion of foreign substances. It is provided to impart the property. Therefore, not only thermoplastic resins but also curable resins, thermosetting resins, ionizing radiation-curable resins, etc., which can be easily formed by using a film, may be added with a surfactant or release material if necessary. Is preferred. For example, in addition to thermoplastic resins such as polycarbonate, polymethyl methacrylate, polymethyl pentene, polyimide, and polyester, there are two-pack reactive resins such as polyester isocyanate, polyether isocyanate, and epoxy isocyanate. More preferably, polyester (meth) acrylate (in the present specification,
The meta-act ... and the meta -... (meta)
・ It is described. ), An epoxy (meth) acrylate, a polyfunctional (meth) acrylate, or the like as a main component. These resins are applied to a substrate sheet, and in a molten or uncured state, pressed and shaped with a molding film, and cooled, heated and / or ionized radiation to form an uneven coating layer. Make up. Further, the cured coating layer can be formed into an uneven shape by sandblasting.
【００１５】凹凸塗工層は、賦型フィルムによる形成の
他に、上記の樹脂ワニスに、無機又は有機微粒子を分散
した組成物を塗工して形成することができる。上記の塗
工用組成物は、熱硬化型樹脂、及び／又は電離放射線型
樹脂を１重量部に対して、ＩＴＯ、ＳｉＯ2 、Ａｌ2 Ｏ
3 や、ポリカーボネート、ポリイミド、ポリアミド、ポ
リエステル、ポリメチルメタアクリレートなどから１種
類以上の微粒子から選択したマット材が、０．２〜２０
重量部で構成されている。The uneven coating layer can be formed by applying a composition obtained by dispersing inorganic or organic fine particles to the above-mentioned resin varnish, in addition to the formation using a molding film. The above-mentioned coating composition is composed of 1 part by weight of a thermosetting resin and / or an ionizing radiation type resin, and is composed of ITO, SiO 2 , and Al 2 O.
3, or a mat material selected from one or more kinds of fine particles from polycarbonate, polyimide, polyamide, polyester, polymethyl methacrylate, etc.
It is composed of parts by weight.
【００１６】光学薄膜層は、基材シートより屈折率が小
さくすることが好ましく、Ｓi Ｏｘ（ｘは１．５〜４．
０）である。Ｓi Ｏｘを蒸着、プラズマＣＶＤ又はスパ
ッタリングで設ける。そして、Ｓi Ｏｘの原料は、好ま
しくは有機シロキサンを原料ガスとして、他の無機蒸着
源が存在しない条件でプラズマＣＶＤで被蒸着フィルム
をできるだけ低温度に維持することが好ましい。本発明
の光学薄膜層（Ｓi Ｏｘ層）には未分解の有機シロキサ
ンを含むことがＳi Ｏｘの可撓性と接着性を維持するこ
とに効果がある。光学薄膜層の厚さｄは、λ／４ｎ（但
し、λが５００〜６００ｎｍ、ｎを１．５とすれば、ｄ
は約８０〜１００ｎｍ）を満足する厚みｄで設けること
が好ましい。厚みが上記の数値以下（例えば、８０ｎｍ
では干渉効果を示さず全光線透過率が充分でなく、上記
の数値を超える（例えば１００ｎｍ）と発色するという
問題がある。The refractive index of the optical thin film layer is preferably smaller than that of the substrate sheet, and SiO x (x is 1.5 to 4.0).
0). SiO 2 is provided by vapor deposition, plasma CVD or sputtering. As a raw material of SiOx, it is preferable to use an organic siloxane as a raw material gas and to maintain the film to be deposited at a temperature as low as possible by plasma CVD under the condition that no other inorganic vapor deposition source is present. The optical thin film layer (SiOx layer) of the present invention contains undecomposed organic siloxane, which is effective in maintaining the flexibility and adhesiveness of SiOx. The thickness d of the optical thin film layer is λ / 4n (where λ is 500 to 600 nm and n is 1.5,
Is preferably about 80 to 100 nm). The thickness is equal to or less than the above numerical value (for example, 80 nm
In this case, there is a problem that an interference effect is not exhibited, the total light transmittance is not sufficient, and if the value exceeds the above value (for example, 100 nm), color is formed.
【００１７】以下、実験例に基づいて本発明を更に詳細
に説明する。図１又は図２に示すとおりの、表１に示す
厚み８０μｍの凹凸基材２もしくは、基材シート３とし
てのトリアセチルセルロースフィルムに下記に示す「塗
工液組成物」を約７μｍ塗工し、各種の賦型フィルムを
積層し、紫外線照射装置で（８０Ｗ／ｃｍ×１０ｍ／ｍ
ｉｎ×４回）の条件で硬化後、賦型フィルムを剥離し、
表面に凹凸塗工層５をもつ積層フィルムを作製した。次
いで、上記積層フィルムを、６０℃の８％苛性ソーダ水
溶液で２分間ケン化処理後水洗・乾燥した。更に、比較
例５（＊）を除く他の積層フィルムの凹凸形状６の面に
Ｓi Ｏｘを、λ／４（約９０ｎｍ）の膜厚で蒸着し本発
明の実施例及び比較例のヘイズ又は表面粗さをもつ反射
防止フィルム１を構成した。 「塗工液組成物」 ・ペンタエリスリトールトリアクリレート（官能アクリレート）１００重量部 ・光重合開始剤 ３重量部 ・プロピオン酸セルロース １．２５重量部 ・シリコーン （レベリング剤） ０．１ 重量部 （以下余白）Hereinafter, the present invention will be described in more detail based on experimental examples. As shown in FIG. 1 or FIG. 2, about 80 μm of the uneven coating substrate 2 or the triacetyl cellulose film as the substrate sheet 3 having a thickness of 80 μm shown in Table 1 was coated with about 7 μm of the “coating liquid composition” shown below. , Various shaped films were laminated, and the ultraviolet irradiation device (80 W / cm × 10 m / m)
After curing under the conditions of (in × 4 times), the shaped film was peeled off,
A laminated film having an uneven coating layer 5 on the surface was produced. Next, the laminated film was saponified with an 8% aqueous solution of caustic soda at 60 ° C. for 2 minutes, washed with water and dried. Further, SiOx was deposited in a thickness of λ / 4 (approximately 90 nm) on the surface of the uneven shape 6 of the laminated film other than Comparative Example 5 (*), and the haze or the surface of Examples and Comparative Examples of the present invention were obtained. An antireflection film 1 having a roughness was formed. "Coating composition" 100 parts by weight of pentaerythritol triacrylate (functional acrylate) 3 parts by weight of photopolymerization initiator 1.25 parts by weight of cellulose propionate 0.1 part by weight of silicone (leveling agent) )
【００１８】[0018]
【表１】 ＊：Ｓi Ｏｘ層を設けていない試料[Table 1] *: Sample without SiOx layer
【００１９】上記実験の（表１）に示すヘイズ及び表面
粗さをもつ実施例及び比較例の各試料について、次のよ
うに反射防止フィルムとしての分光反射率、全光線透過
率、発色の程度およびグロスの測定と評価を行った結果
を（表２）に示す。 ・表面粗さ：小坂研究所製 サーフコーダーＡＹ−３１
により測定する。 ・ヘイズ：東洋精機（株）製 直読式ヘイズメーターに
より測定する。 ・分光反射率：島津製作所製 分光反射率測定器 ＭＰ
Ｃ−３１００を用いて可視光領域の範囲における、全光
線透過率及び最高分光反射率と最低分光反射率とを測定
し、その差を算出する。 ・グロス：村上色彩技術研究所製 グロスメーターＧＭ
−３Ｄを用いて、入射光６０度におけるグロスを評価す
る。 ・発色の程度：光干渉による発色の程度を目視で評価す
る。 ３：発色の程度が大 ２：若干発色する １：殆ど発色がない （以下余白）For each sample of Examples and Comparative Examples having the haze and surface roughness shown in Table 1 of the above experiment, the spectral reflectance as an antireflection film, the total light transmittance, and the degree of color development are as follows. The results of the measurement and evaluation of the gloss and the gloss are shown in (Table 2).・ Surface roughness: Surf coder AY-31 manufactured by Kosaka Laboratory
Measured by Haze: Measured by a direct-reading haze meter manufactured by Toyo Seiki Co., Ltd.・ Spectral reflectance: Shimadzu Spectral reflectance measuring instrument MP
Using C-3100, the total light transmittance, the highest spectral reflectance, and the lowest spectral reflectance in the visible light range are measured, and the difference is calculated.・ Gross: Gloss meter GM manufactured by Murakami Color Research Laboratory
Gloss at 60 degrees of incident light is evaluated using -3D. -Degree of color development: The degree of color development due to light interference is visually evaluated. 3: High degree of color development 2: Slight color development 1: Little color development (below margin)
【００２０】[0020]
【表２】 ・実施例９及び１０は、反射率が比較的大きく、反射防
止効が若干劣るものであった。 ・比較例１はヘイーズが高く画像の鮮明性が劣るもので
あった。[Table 2] -In Examples 9 and 10, the reflectance was relatively large, and the antireflection effect was slightly inferior. Comparative Example 1 had high haze and poor image clarity.
【００２１】[0021]
【発明の効果】本発明の反射防止フィルムは、以上説明
したように、凹凸形状を賦型したヘイズが４０％以下、
あるいは、硬化型の塗工層に凹凸形状を設けたヘイズが
４０％以下のフィルムに、光学薄膜層を単層に設けて形
成するものである。したがって、単層の光学薄膜層の形
成は、多層のものと比較して生産上の管理が容易であ
り、可視光領域において、分光平均反射率が２％以下の
低反射率の反射防止フィルムを提供できる効果を奏す
る。また、従来の反射防止フィルムとは異なり、可視光
領域における、最高分光反射率と最低分光反射率との差
が０．５％以下を実現できるため、高い分光反射率の波
長領域でも反射防止効果を阻害することがない。そし
て、硬化型凹凸塗工層を設けた反射防止フィルムは表面
特性に優れた効果を奏する。As described above, the antireflection film of the present invention has an uneven haze of 40% or less,
Alternatively, it is formed by providing a single layer of an optical thin film layer on a film having a haze of 40% or less in which a curable coating layer is provided with irregularities. Therefore, the formation of a single optical thin film layer is easier to control in production than a multilayer optical thin film layer, and a low-reflection antireflection film having a spectral average reflectance of 2% or less in the visible light region is used. It has an effect that can be provided. Also, unlike the conventional antireflection film, the difference between the highest spectral reflectance and the lowest spectral reflectance in the visible light region can be 0.5% or less, so that the antireflection effect can be achieved even in the wavelength region of high spectral reflectance. Does not hinder. And the antireflection film provided with the curable concavo-convex coating layer has an effect excellent in surface characteristics.
【図１】本発明の反射防止フィルムの層構成を示す断面
概略図である。FIG. 1 is a schematic sectional view showing a layer structure of an antireflection film of the present invention.
【図２】本発明の反射防止フィルムの他の層構成を示す
断面概略図である。FIG. 2 is a schematic sectional view showing another layer configuration of the antireflection film of the present invention.
１ 反射防止フィルム ２ 凹凸基材 ３ 基材シート ４ 凹凸塗工層 ５ 光学薄膜層 ６ 凹凸形状 DESCRIPTION OF SYMBOLS 1 Anti-reflection film 2 Uneven substrate 3 Substrate sheet 4 Uneven coating layer 5 Optical thin film layer 6 Uneven shape
Claims (9)
基材に、基材の屈折率よりも低い光学薄膜層をλ／４ｎ
（但し、ｎ：屈折率、λ：５００〜６００ｎｍ）の膜厚
で単層のみを設けた積層フィルムであって、積層フィル
ム全体のヘイズ値が４０％以下であり、かつ、可視光領
域（３８０〜７８０ｎｍ）における最低分光反射率と最
高分光反射率との差が０．５％以下であることを特徴と
する反射防止フィルム。1. An optical thin film layer having a refractive index lower than the refractive index of a substrate having a thickness of λ / 4n is provided on a transparent and uneven substrate having an uneven surface.
(Where n: refractive index, λ: 500 to 600 nm) is a laminated film provided with only a single layer and has a haze value of 40% or less in the entire laminated film and a visible light region (380 (? 780 nm), wherein the difference between the lowest spectral reflectance and the highest spectral reflectance is 0.5% or less.
ズ値が２０〜４０％の範囲にあることを特徴とする反射
防止フィルム。2. The antireflection film according to claim 1, wherein the haze value of the entire laminated film is in the range of 20 to 40%.
平均粗度Ｒａが０．１〜０．５μｍであることを特徴と
する反射防止フィルム。3. An anti-reflection film, wherein the outermost surface of the uneven substrate according to claim 1 has a surface average roughness Ra of 0.1 to 0.5 μm.
との屈折率差が０．０３〜０．１５であることを特徴と
する反射防止フィルム。4. An anti-reflection film, characterized in that the difference in refractive index between the uneven substrate according to claim 1 and the optical thin film layer is 0.03 to 0.15.
工層を介して、塗工層の屈折率よりも低い光学薄膜層を
λ／４ｎ（但し、ｎ：屈折率、λ：５００〜６００ｎ
ｍ）の膜厚で単層のみを設けた積層フィルムであって、
積層フィルム全体のヘイズ値が４０％以下であり、か
つ、可視光領域における最低分光反射率と最高分光反射
率との差が０．５％以下であることを特徴とする反射防
止フィルム。5. An optical thin film layer having a refractive index lower than that of the coating layer λ / 4n (where n: refractive index, λ: 500) via a coating layer having an uneven shape on a transparent substrate sheet. ~ 600n
m) a laminated film having only a single layer with a thickness of
An antireflection film, wherein a haze value of the entire laminated film is 40% or less, and a difference between a minimum spectral reflectance and a maximum spectral reflectance in a visible light region is 0.5% or less.
ズ値が２０〜４０％の範囲にあることを特徴とする反射
防止フィルム。6. An anti-reflection film, wherein the haze value of the entire laminated film according to claim 5 is in the range of 20 to 40%.
表面粗度Ｒａが０．１〜０．５μｍであることを特徴と
する反射防止フィルム。7. An antireflection film, wherein the outermost surface of the multilayer film according to claim 5 has a surface roughness Ra of 0.1 to 0.5 μm.
の屈折率差が０．０３〜０．１５であることを特徴とす
る反射防止フィルム。8. An anti-reflection film, wherein a difference in refractive index between the coating layer according to claim 5 and the optical thin film layer is 0.03 to 0.15.
以上の硬化皮膜であることを特徴とする反射防止フィル
ム。9. The coating layer according to claim 4, wherein the pencil hardness is 2H.
An anti-reflection film characterized by the above cured film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9019563A JPH10206604A (en) | 1997-01-20 | 1997-01-20 | Reflection preventive film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9019563A JPH10206604A (en) | 1997-01-20 | 1997-01-20 | Reflection preventive film |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006145353A Division JP4119925B2 (en) | 2006-05-25 | 2006-05-25 | Antireflection film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH10206604A true JPH10206604A (en) | 1998-08-07 |
Family
ID=12002777
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9019563A Pending JPH10206604A (en) | 1997-01-20 | 1997-01-20 | Reflection preventive film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH10206604A (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000329905A (en) * | 1998-09-22 | 2000-11-30 | Fuji Photo Film Co Ltd | Antireflection film and its production |
| JP2001109414A (en) * | 1999-10-01 | 2001-04-20 | Sumitomo Chem Co Ltd | Front plate for signboard and signboard |
| JP2001330706A (en) * | 2000-05-19 | 2001-11-30 | Nof Corp | Reflection reducing material and its use |
| US6806926B1 (en) * | 1999-10-18 | 2004-10-19 | Nec Lcd Technologies, Ltd. | Reflection-type color liquid crystal display apparatus and method for manufacturing the same |
| JP2006123288A (en) * | 2004-10-28 | 2006-05-18 | Dainippon Printing Co Ltd | Gas barrier film, substrate for display using it and display |
| JP2006272588A (en) * | 2005-03-28 | 2006-10-12 | Toray Ind Inc | Reflection preventing film and image display |
| WO2008010376A1 (en) * | 2006-07-18 | 2008-01-24 | Konica Minolta Opto, Inc. | Anti-reflection film |
| WO2008102882A1 (en) * | 2007-02-23 | 2008-08-28 | Nippon Sheet Glass Company, Limited | Reflection-preventing structure |
| CN111470784A (en) * | 2020-06-01 | 2020-07-31 | 中建材蚌埠玻璃工业设计研究院有限公司 | High-transmittance wide-color-system cover glass |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6451174A (en) * | 1987-08-24 | 1989-02-27 | Dainippon Printing Co Ltd | Manufacture of lusterless film |
| JPH01239501A (en) * | 1988-03-22 | 1989-09-25 | Nitto Denko Corp | Reflection preventing plate |
| JPH0616851A (en) * | 1991-11-25 | 1994-01-25 | Dainippon Printing Co Ltd | Mar-resistant antiglaring film, polarizing plate and production thereof |
-
1997
- 1997-01-20 JP JP9019563A patent/JPH10206604A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6451174A (en) * | 1987-08-24 | 1989-02-27 | Dainippon Printing Co Ltd | Manufacture of lusterless film |
| JPH01239501A (en) * | 1988-03-22 | 1989-09-25 | Nitto Denko Corp | Reflection preventing plate |
| JPH0616851A (en) * | 1991-11-25 | 1994-01-25 | Dainippon Printing Co Ltd | Mar-resistant antiglaring film, polarizing plate and production thereof |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000329905A (en) * | 1998-09-22 | 2000-11-30 | Fuji Photo Film Co Ltd | Antireflection film and its production |
| JP2001109414A (en) * | 1999-10-01 | 2001-04-20 | Sumitomo Chem Co Ltd | Front plate for signboard and signboard |
| US6806926B1 (en) * | 1999-10-18 | 2004-10-19 | Nec Lcd Technologies, Ltd. | Reflection-type color liquid crystal display apparatus and method for manufacturing the same |
| JP2001330706A (en) * | 2000-05-19 | 2001-11-30 | Nof Corp | Reflection reducing material and its use |
| JP2006123288A (en) * | 2004-10-28 | 2006-05-18 | Dainippon Printing Co Ltd | Gas barrier film, substrate for display using it and display |
| JP2006272588A (en) * | 2005-03-28 | 2006-10-12 | Toray Ind Inc | Reflection preventing film and image display |
| WO2008010376A1 (en) * | 2006-07-18 | 2008-01-24 | Konica Minolta Opto, Inc. | Anti-reflection film |
| JPWO2008010376A1 (en) * | 2006-07-18 | 2009-12-17 | コニカミノルタオプト株式会社 | Antireflection film |
| WO2008102882A1 (en) * | 2007-02-23 | 2008-08-28 | Nippon Sheet Glass Company, Limited | Reflection-preventing structure |
| CN111470784A (en) * | 2020-06-01 | 2020-07-31 | 中建材蚌埠玻璃工业设计研究院有限公司 | High-transmittance wide-color-system cover glass |
| CN111470784B (en) * | 2020-06-01 | 2024-06-18 | 中建材玻璃新材料研究院集团有限公司 | High-transmittance wide-color cover plate glass |
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