JPH10197717A - Manufacture of color filter - Google Patents

Abstract

PROBLEM TO BE SOLVED: To enhance the flatness performance of a color filter, to prevent the occurrence of damage, and to eliminate white defect by plurally performing a process for arranging a coloring layer on a transparent base plate in a condition where a protecting layer is set on the coloring layer, performing exposure, removing a protecting layer, developing the coloring layer, and forming a picture element on the aperture part of a light shielding layer. SOLUTION: The process for arranging the coloring layer being a picture element base material on the transparent base plate on which the light shielding layer is provided in the condition where the protecting layer is set on the coloring layer, performing exposure from a surface side opposite to the surface where the light shielding layer of the transparent base plate is provided, removing the protecting layer, and developing the coloring layer so that the picture element is formed on the specified aperture part of the light shielding layer is performed specified number of times. Consequently, the color filter in which the flatness performance of the color filter can be improved without being influenced by the thickness of the light shielding layer being a base, the damage occurring in the case of contact with an exposing machine stage and a carrying system can be prevented, the white defect caused by a foreign matter on the back surface of the base plate can be prevented can be manufactured.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

TECHNICAL FIELD OF THE INVENTION

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a color filter used in, for example, a color liquid crystal display device.

[0002]

2. Description of the Related Art Liquid crystal displays (hereinafter abbreviated as LCDs)
Utilizing features such as thinness, small size, and low power consumption, is currently used for display units of watches, calculators, TVs, personal computers, and the like. Furthermore, in recent years, color LCDs have been developed and used for a variety of applications such as navigation systems and viewfinders, mainly OA / AV equipment, and the market is expected to rapidly expand in the future.

As shown in FIG. 6, a color filter for displaying a color image on an LCD is a light-shielding layer 1 having a lattice pattern.
R (red) on a transparent substrate such as a glass substrate 2 on which
A color pixel 3 composed of G (green) and B (blue) (about 300 ×
100 × 2 μm) are sequentially formed, and a transparent overcoat layer (OC) 4 is formed thereon. 5 is a polarizing plate and 6 is an ITO electrode.

[0004] In the color LCD, the color filter 7 has an LC
D, the display screen can be colored by transmitting backlight light through a color filter. 8 is an alignment film, 9 is a liquid crystal, 10 is a sealing material, 11 is a top coat layer, 12 is an ITO electrode, 13 is a substrate such as a glass plate, 14
Is a polarizing plate.

At present, color filters are mainly manufactured using a dyeing method. However, in this method, a step of forming a pixel by applying a transparent photosensitive resin on a glass substrate, drying, exposing, and developing, dyeing with a dye, and then forming a color mixing prevention layer is required to be repeated three times. Therefore, reliability (lightfastness,
Heat resistance). Therefore, some color filters using a pigment as a coloring agent have been proposed, among which are an electrodeposition method, a printing method, and a photolithography method (photolithography method).

However, the electrodeposition method requires the formation of an electrode pattern. (1) The degree of freedom of the pattern is small.
There are problems such as (2) high cost, and (3) poor flatness of the pattern in the printing method. At present, the photolithography method is considered to be the mainstream. For photolithography, liquid resists and films are contemplated. The liquid resist is formed by applying a varnish obtained by dispersing a pigment in a photosensitive resin on a glass substrate by a spinner, drying, exposing, and developing to form color pixels. On the other hand, the film is a film obtained by forming a varnish into a film in the same manner as the photosensitive film for a printed board, and after laminating on a substrate, exposing the base film as a support when the film has oxygen inhibition properties, and then exposing and developing. If the film has no oxygen-inhibiting properties, color pixels are formed by exposing and developing with the base film attached. Here, the light is irradiated from the colored layer side through a photomask.

[0007]

Heretofore, metal chromium having a high optical density per unit film thickness has been applied to the light shielding layer. In the case of a thin film transistor (TFT) liquid crystal, the optical density of the light shielding layer is required to be 3 or more in order to prevent malfunction of the TFT. To achieve this optical density, a thickness of 0.15 μm was sufficient for chromium metal. However, since the metal chromium reflectance is high, there is a problem that reflection of external light is high when the LCD is used, and visibility is reduced. Therefore,
In order to reduce the reflectance, a method of laminating chromium oxide is adopted, and the visibility is improved. However, there is a problem that the cost is high because metal chromium and chromium oxide are formed by a vacuum deposition method such as sputtering. In order to solve this problem, a resin in which a black coloring layer material such as carbon is dispersed in a photocurable resin, and a resin light-shielding layer in which graphite is dispersed in a thermosetting resin are being adopted. However, the optical density per unit film thickness of the resin light-shielding layer was not as high as that of metallic chromium, and even if it was high, the optical density was required to be 0.5 μm to obtain an optical density of 3. When a colored layer is formed on this light-shielding layer by a film method, as shown in FIG. 4, the film follows the base well (FIG. 4a).
A projection 20 having a thickness equal to the thickness of the light-shielding layer is generated in a portion of the pixel 3b where the colored layer 3a overlaps with the colored layer 3a (FIG. 4B). In FIG. 4, 16 is an exposure stage, 17 is a photomask,
Reference numeral 18 denotes a photomask light-shielding film.

The color filter is required to have high flatness, and the presence of a projection corresponding to the thickness of the light shielding layer poses a problem. This problem is the same in the chrome light shielding layer. As a countermeasure against this, a backside exposure method has been proposed in which a light-shielding layer pattern as shown in JP-A-7-120608 is used as a photomask and exposure is performed from the glass substrate side (FIG. 5).
However, in this method, since the colored layer 3a is processed without any protection, dust 22 is attached when the colored layer 3a comes into contact with the exposure unit stage 16 or the transport system (FIG. 5), and the pixel 3b is scratched 21 (FIG. 5). 5b) There was a problem that it became a defect. In FIG. 4, 16 is an exposure stage, 17 is a photomask, 18
Is a photomask light-shielding film.

Further, in the film transfer method, since the backup roll of the laminating apparatus is in direct contact with the back surface of the transparent substrate, foreign matter adheres to the back surface of the transparent substrate, and ultraviolet rays are shielded at the time of back surface exposure. However, there was a problem in that the photosensitivity was insufficient, resulting in poor white spots during development.

Conventionally, a base material that transmits ultraviolet light, such as polyethylene terephthalate, has been used for the base film. However, since the ultraviolet light is transmitted, even the adjacent pixels are exposed due to irregular reflection on a stage or cover that supports the substrate. There was a problem of doing it.

The photomask alignment mark and the substrate alignment mark are optically read by a microscope,
In the conventional method of performing alignment, it is difficult to perform alignment because there is a gap corresponding to the thickness of the glass substrate, and the focus is not aligned.

The present invention has been made in view of such a problem, and improves the flatness of a color filter without being affected by the thickness of a light-shielding layer serving as a base, and makes contact with an exposure machine stage and a transport system. It is an object of the present invention to provide a method of manufacturing a color filter which prevents scratches occurring at the time of printing and prevents white defects due to foreign matter on the back surface of the substrate.

[0013]

According to a first aspect of the present invention, there is provided a color filter manufacturing method, wherein a light-shielding layer is provided at a predetermined position on a transparent substrate so that a predetermined opening is formed. In a method of manufacturing a color filter in which pixels of a plurality of colors made of a curable resin are arranged, a colored layer as a pixel base material is provided on a transparent substrate provided with the light shielding layer, and a protective layer is provided on the colored layer. In this state, the transparent substrate is exposed from the side opposite to the surface on which the light-shielding layer is provided, the protective layer is removed, and the colored layer is developed to form a pixel at a predetermined opening of the light-shielding layer. Is performed a predetermined number of times.

According to a second aspect of the present invention, there is provided a color filter manufacturing method, wherein a light-shielding layer is provided at a predetermined position on a transparent substrate so that a predetermined opening is formed, and a plurality of light-shielding resins are formed in the predetermined opening. In a method of manufacturing a color filter for arranging pixels of a color, a colored layer serving as a pixel base material is disposed on a transparent substrate provided with the light shielding layer in a state where a protective layer is provided on the colored layer, A photomask is arranged on the surface of the transparent substrate opposite to the surface on which the light-shielding layer is provided, and alignment is performed so that the pattern of the photomask is aligned with the predetermined opening. A step of forming a pixel in a predetermined opening of the light-shielding layer by exposing from the side opposite to the surface provided, removing the protective layer, and developing the coloring layer, is performed a predetermined number of times. is there.

That is, a method of manufacturing a color filter according to a second aspect of the present invention is directed to a method of manufacturing a color filter in which pixels of a plurality of colors made of a light-shielding layer and a photocurable resin are arranged at predetermined positions on a transparent substrate. When forming at least one of the pixels on a substrate on which a light-shielding layer is formed at a predetermined position on a transparent substrate, the transparent substrate is provided with a protective layer provided on a colored layer serving as a pixel base material. The photomask installed on the side is aligned with the predetermined opening of the light-shielding layer, and exposure is performed from the transparent substrate side. Then, the protective layer is removed, and the colored layer is developed so that a predetermined amount of the light-shielding layer is obtained. The pixel is formed in the opening. This protective layer is provided for the purpose of protecting the colored layer from scratches or the like when the exposure stage or the transport system comes into contact with the colored layer. Here, the transparent substrate only needs to transmit ultraviolet rays in the next exposure step, and need not be transparent to visible light. Performing the step of forming a pixel in the predetermined opening of the light-shielding layer a predetermined number of times means, for example, R (red),
When forming three color pixels of G (green) and B (blue), one color may be formed, or all three colors may be formed. At least one color is formed.

According to a third aspect of the present invention, in the method of manufacturing a color filter, a light-shielding layer is provided at a predetermined position on a transparent substrate so that a predetermined opening is formed, and a plurality of light-shielding resins are formed in the predetermined opening. In a method of manufacturing a color filter for arranging pixels of a color, a colored layer serving as a pixel base material is disposed on a transparent substrate provided with the light shielding layer in a state where a protective layer is provided on the colored layer, A photomask is arranged on the surface of the transparent substrate opposite to the surface on which the light-shielding layer is provided, and alignment is performed so that the pattern of the photomask is aligned with the predetermined opening. The step of forming a pixel in a predetermined opening of the light-shielding layer by exposing from the side opposite to the surface provided, removing the protective layer, and developing the colored layer is performed twice to form a two-color pixel. A pixel base material on a transparent substrate provided with the two-color pixels. Disposing the colored layer with the protective layer provided on the colored layer, exposing the transparent substrate from the side opposite to the surface on which the light shielding layer is provided, removing the protective layer, and developing the colored layer. Forming a third color pixel in a predetermined opening of the light shielding layer. When the third color pixel is formed as described above, the entire surface can be exposed without using a photomask.

In the method for manufacturing a color filter according to a fourth aspect of the present invention, the coloring layer as a pixel base material is a film-like coloring layer formed on a base film support serving as a protective layer. That is, the method for producing a color filter according to claim 4 of the present invention is a method for forming a colored layer and a protective layer, wherein the colored layer is formed by a film transfer method, and the protective layer is a support for the colored layer in the film transfer method. Characterized in that it is a base film.

According to a fifth aspect of the present invention, there is provided a color filter manufacturing method according to the fourth aspect, wherein a protective film is laminated on the film colored layer. The protective film is peeled off and the film-shaped colored layer is placed on the transparent substrate provided with the light-shielding layer. At the same time, the peeled protective film is adhered to the surface of the transparent substrate opposite to the surface provided with the light-shielding layer and exposed. A color comprising a step of peeling the protective film before
This is a method for manufacturing a filter. This protective film can prevent foreign substances from adhering to the back surface of the transparent substrate during lamination.

In the method of manufacturing a color filter according to claim 6 of the present invention, a protective layer such as a base film that is non-transparent to ultraviolet light is used. Ultraviolet non-transmission means both ultraviolet absorption and ultraviolet reflection. When a protective layer such as a base film absorbs ultraviolet rays, it prevents irregular reflection from an exposure stage, which is a component of an exposure machine for supporting a transparent substrate, or exposure of a portion other than a predetermined portion due to leaked light in the exposure machine. Further, when a protective layer such as a base film reflects ultraviolet light, the reflected light also contributes as light for sensitizing a predetermined portion of the colored layer, so that the amount of exposure light can be reduced. Has the same effect as in the case of absorbing

According to a seventh aspect of the present invention, in the method of manufacturing a color filter, the light shielding layer is a resin light shielding layer. By using a resin light-shielding layer, reflection of external light on the LCD is reduced, and display quality is improved.

According to a eighth aspect of the present invention, in a method of manufacturing a color filter, the pattern of the photomask and the predetermined opening are aligned by setting the focus of the alignment microscope in advance on the photomask side. The coordinates of the photomask-side alignment mark are read in accordance with the mark, converted and registered into the coordinate position of the transparent substrate-side alignment mark, and then the transparent substrate-side alignment mark is focused on the alignment microscope and the registered coordinates are adjusted to the registered coordinates. This is a method for manufacturing a color filter performed by aligning alignment marks on the transparent substrate. By this alignment method, two substrates having different focal lengths are efficiently aligned.

According to a ninth aspect of the present invention, there is provided a color filter manufacturing method according to the first aspect, wherein a colored layer serving as a pixel base material is provided on a transparent substrate provided with a predetermined pattern, and a protective layer is provided on the colored layer. Forming a predetermined pixel by exposing the transparent substrate from the side opposite to the surface on which the predetermined pattern is provided, removing the protective layer, and developing the coloring layer. A method for manufacturing a color filter characterized by the following. Here, the predetermined patterns are, for example, R (red), G (green),
B (blue) pixels, light-shielding layers, etc., and the pixels of the pixel base material are, for example, R (red), G (green), B (blue) pixels, light-shielding layers, and the like.

According to a tenth aspect of the present invention, in a method of manufacturing a color filter, a light shielding layer is provided at a predetermined position on a transparent substrate so that a predetermined opening is formed, and a plurality of light-shielding resins are formed in the predetermined opening. In a method of manufacturing a color filter for arranging pixels of colors, a colored layer serving as a pixel base material is disposed on a transparent substrate provided with the light-shielding layer, and is opposite to a surface of the transparent substrate on which the light-shielding layer is provided. Exposing from the surface side, forming a pixel in a predetermined opening of the light shielding layer by developing the coloring layer, and disposing a coloring layer which is a pixel base material on a transparent substrate provided with the light shielding layer. Forming a pixel in a predetermined opening of the light-shielding layer by exposing from the colored layer side and developing the colored layer.

[0024]

DESCRIPTION OF THE PREFERRED EMBODIMENTS In the present invention, 1 in FIG. 1 is a light-shielding layer, 2 is a glass substrate, 3 is a colored layer, 15 is a base film, 16 is an exposure stage, 17 is a photomask, 18
Is a light shielding film of a photomask.

Hereinafter, a first embodiment of the present invention will be described with reference to FIG. Corning # 1727 glass 200 mm long, 300 mm wide and 0.7 mm thick glass substrate 2 was used as a transparent substrate. As the light-shielding layer 1, GA-66M (trade name) manufactured by Hitachi Powder Co., Ltd., in which graphite was dispersed in a thermosetting resin and which was patterned by a lift-off method, was used. Positive photoresist Az-13 manufactured by Shipley as a photoresist for lift-off on glass substrate 2
50 (trade name) was spin-coated at 1000 rpm.
Apply about 1.2 μm thick at 20 rpm for 20 seconds. Then 90
Pre-bake on a hot plate for 5 minutes. Next, exposure is performed at 120 mj / cm 2 at a light intensity of 405 nm using a super high pressure mercury lamp through a photomask. Next, the film is developed with a 1% aqueous solution of potassium hydroxide at room temperature for 1 minute and 30 seconds, washed with water, drained, and then post-baked at 100 ° C. Next, the graphite dispersion GA-66M (trade name) was spin-coated at a rotation speed of 500 rpm for 10 seconds and a thickness of 1 μm.
m. Next, drying is performed in a clean oven at 90 ° C. for 15 minutes. Next, the photoresist is dissolved in a 2% aqueous solution of potassium hydroxide for 1 minute, washed with water at a water pressure of 3 kg / cm ² , drained, and cured in a clean oven at 200 ° C. for 30 minutes. Thus, a glass substrate with a light-shielding layer is completed (FIG. 1A). In the present invention, graphite by a lift-off method is used, but one manufactured by a photo method in which carbon is dispersed in a photocurable resin, and one formed by etching method using a photoresist in which carbon is dispersed in a thermosetting resin are used. Is also good. Further, a material in which a metal oxide is dispersed instead of the carbon may be used. Also, a conventional metal or a laminated film of a metal and a metal oxide,
A stacked film of a metal and a metal nitride, or a stacked film of a metal, a metal oxide and a metal nitride may be used, but is preferably black when viewed from the back surface of the glass. At this time, the light-shielding layer pattern had a light-shielding layer width of 20 μm, a pitch of 100 μm in width, and a height of 3 μm.
The size was set to 00 μm, numerical aperture 640 × (three colors) columns, and 480 rows vertically.

Next, a colored layer forming step is started. On a base film support, a black cushion layer 19 of 20 .mu.m and a coloring layer 3a having an oxygen inhibition function of 1.6 .mu.m are coated on a 50 .mu.m thick polyethylene terephthalate (PET) film (base film 15) with a roll-to-roll. The engineered two-layer film for CF manufactured by Hitachi Chemical was used. A protective film is laminated on the colored layer 3a. First, as a first color, a red film is bonded to a glass substrate on which a light-shielding layer is formed at a lamination temperature of 80 ° C., a lamination speed of 0.2 m / min, and a roll pressure of 5 kg / cm ² . At this time, a protective film was simultaneously laminated on the back surface of the glass substrate. Here, the colored layer having the oxygen inhibition function is used, but a material without this function may be used. Next, the protective film laminated on the back surface of the glass substrate is peeled off (FIG. 1b).

Next, an exposure step is started. The exposure is performed by using a proximity exposure machine so that the colored layer side is supported by the exposure stage 16 so that the glass side of the substrate and the light-shielding film side of the photomask face each other (FIG. 1C). Here, the colored layer side does not necessarily need to be set on the exposure stage, and the back surface of the glass substrate may contact the exposure stage depending on the structure of the exposure machine. Next, the visual field of the alignment microscope is moved to the position of the photomask alignment mark and focused, and the alignment mark reference position (Xi, Y
i) is stored in the memory, and the normal coordinate position (Xj, Yj) of the substrate-side alignment mark reference position to be set with the photomask alignment mark is calculated and registered in the memory. In this embodiment, the alignment microscope employs a scanning method using a linear sensor as a reading sensor. However, the scanning may be performed by a CCD (charge capacitance element). Next, it is moved to the substrate side on the Z-axis of the alignment microscope (in the direction normal to the plane of the photomask) to focus on the substrate-side alignment mark. Next, the reference position (Xk, Yk) of the substrate-side alignment mark is optically read, and a deviation amount from the normal coordinate position (ΔX = Xj)
−Xk, ΔY = Yj−Yk). Next, the substrate is moved by this shift amount (ΔX, ΔY). This movement was performed by a pulse motor, and the coordinates were converted to the number of pulses in this embodiment. In this manner, the photomask and the substrate were aligned and exposed to 405 nm at 400 mj / cm ² . At this time, the opening of the photomask is 6
The layout was made to overlap by μm. This overlap amount may be any value within a range of -10 to 15 m. The gap between the substrate and the photomask was 60 μm. This gap amount may be any value within the range of 0 to 500. Next, the base film is peeled off together with the cushion layer, developed with an alkali developer, washed with water, drained, and cured. 3b-1 is a red pixel (FIG. 1)
d). This process is repeated for green and blue (FIGS. 1e, 1f,
1g, 1h). The order of formation is not limited. After the formation of the three colors, washing is performed (FIG. 1h), and an overcoat is formed thereon as necessary to complete the color filter. 3
b-2 is a green pixel and 3b-3 is a blue pixel. Here, instead of the PET film, a rolled aluminum film having a thickness of 20 μm and a transparent cushion layer or a rolled aluminum film coated with a black cushion layer may be used.

Hereinafter, a second embodiment of the present invention will be described with reference to FIG. The light shielding layer is manufactured in the same manner as in FIG.
a). Next, a colored layer forming step is started. As a base film support, a single layer film for CF manufactured by Hitachi Chemical Co., Ltd., in which a coloring layer 3a was coated with a 1.6 μm roll-to-roll on a 20 μm thick rolled aluminum film (base film 15). First, as the first color, a red film was laminated at a temperature of 8
0 ° C., lamination speed 0.2 m / min, roll pressure 5
The light-shielding layer is bonded to the glass substrate on which the light-shielding layer is formed at kg / cm ² . At this time, a protective film of the colored layer 3a was simultaneously laminated on the back surface of the glass substrate. Here, in this embodiment, a material having no oxygen-damaging function is used as the coloring layer, but a material having this function may be used. Next, the protective film is peeled off (FIG. 2b). Next, an exposure step is started. Exposure was performed using a proximity exposure machine so that the colored layer side was supported by an exposure stage so that the glass side of the substrate and the light-shielding film side of the photomask faced each other (FIG. 2C). The photomask and the substrate were aligned by the alignment method described above, and exposed at 400 mj / cm ^{2 at} 405 nm. At this time, the opening of the photomask is
The layout was such that each side overlapped by 6 μm.
This overlap amount may be any value within a range of -10 to 15 m. The gap between the substrate and the photomask is 60
μm. This gap amount may be any value within the range of 0 to 500. Next, the base film is peeled off together with the cushion layer, developed with a 3% toehole solution, washed with water, drained, and cured. 3b-1 is a red pixel (FIG. 1d). This process is repeated for green and blue (FIGS. 1e, 1f, 1g, and 1h). The order of formation is not limited. After the formation of the three colors, washing is performed (FIG. 1h), and an overcoat is formed thereon as necessary to complete the color filter. 3b-2 is a green pixel and 3b-3 is a blue pixel.

Hereinafter, a third embodiment of the present invention will be described with reference to FIG. The light shielding layer is manufactured in the same manner as in FIG. Next, the first color is manufactured in the same manner as in FIG. Next, green is formed as a second color. 50μmP as base film
ET was coated with a transparent cushion layer having a thickness of 20 μm, and a blue coloring material was coated thereon with a thickness of 1.6 μm. At a laminating temperature of 80 ° C., a laminating speed of 0.2 m / min, and a roll pressure of 5 kg / cm ² , the laminate is bonded to a glass substrate on which a light-shielding layer has been formed. Here, the colored layer having the oxygen inhibition function is used, but a material without this function may be used. Next, an exposure step is started. Using a proximity exposure machine, the exposure stage was set on the exposure stage so that the colored layer side of the substrate and the light-shielding film side of the photomask faced each other, and the alignment marks on the photomask and the substrate were optically and simultaneously read and aligned. . Next, 405 nm
At 400 mj / cm ² . At this time, the opening of the photomask overlapped the light-shielding layer opening by 6 μm on each side. The gap between the substrate and the photomask was 60 μm. This gap amount may be any value within the range of 0 to 500. Next, the base film is peeled off together with the cushion layer, developed with an aqueous alkali solution, washed with water, drained, and then cured. When the base film and the cushion layer are transparent to ultraviolet light, the base film with the cushion layer may be peeled off before exposure. If either the base film or the cushion layer is opaque to ultraviolet light, the base film with the cushion layer must be peeled off before exposure. Next, blue is manufactured as the third color in the same manner as the second color. FIG. 3 shows the color filters produced in this example.
As shown in FIG. 3A, a projection corresponding to the thickness of the light-shielding layer is formed in the overlapping portion of the light-shielding layer and the second and third colors.
This has the effect of improving the flatness on the overcoat. In this embodiment, the back exposure method is used only for the first color, but it may be applied to the second or third color, or may be applied to two colors. FIG. 3B shows the case where the back exposure method is used for all three colors, and the flatness on the overcoat is not sufficient.

In the above description, the production method by the film method has been limited. However, the same effect can be obtained by forming a colored layer and then laminating a cover film as a protective layer in the spin coating method.

[0031]

According to the present invention, when a colored layer is formed on a light-shielding layer having a thickness of 1 μm by a conventional method of exposing from a colored layer side through a photomask, the flatness is 1 μm.
1 μm, no wraparound of light, no residual color layer on adjacent pixels due to misalignment during exposure, LC
The display when lit as D was good. Further, the occurrence of scratches on the colored layer, which was a problem in the conventional back exposure method, was eliminated.

[Brief description of the drawings]

FIG. 1 is a cross-sectional view showing a manufacturing process of an embodiment of a method for manufacturing a color filter of the present invention.

FIG. 2 is a cross-sectional view showing a manufacturing process of another embodiment of the method for manufacturing a color filter of the present invention.

FIG. 3 is a cross-sectional view illustrating a manufacturing process of another embodiment of the method for manufacturing a color filter of the present invention.

FIG. 4 is a cross-sectional view showing a manufacturing process of a conventional color filter manufacturing method.

FIG. 5 is a cross-sectional view illustrating a manufacturing process of a conventional color filter manufacturing method.

FIG. 6 is a cross-sectional view of a color liquid crystal display.

[Explanation of symbols]

 1: light shielding layer 2: glass substrate 3: pixel 3a: colored layer 3a-1: colored layer 3a-2: colored layer 3a-3: colored layer 3b: pixel 4: overcoat layer 5: polarizing plate 6: ITO electrode 7 : Color filter 8: alignment film 9: liquid crystal 10: sealant 11: top coat layer 12: ITO electrode 13: glass plate 14: polarizing plate 15: base film 16: exposure stage 17: photomask 18: light shielding film 19: cushion Layer 20: protrusion 21: scratch 22: dust

 ──────────────────────────────────────────────────の Continued on front page (72) Inventor Masahiko Itabashi 48 Wadai, Tsukuba, Ibaraki Pref.Hitachi Chemical Industry Co., Ltd. Inside the development laboratory

Claims (10)

[Claims] 1. A method of manufacturing a color filter in which a light-shielding layer is formed at a predetermined position on a transparent substrate so that a predetermined opening is formed, and pixels of a plurality of colors made of a photocurable resin are arranged in the predetermined opening. In this case, a colored layer, which is a pixel base material, is disposed on a transparent substrate provided with the light-shielding layer with a protective layer provided on the colored layer, and the surface of the transparent substrate opposite to the surface on which the light-shielding layer is provided. Forming a pixel in a predetermined opening of the light-shielding layer by exposing from the side, removing the protective layer, and developing the colored layer, performing a predetermined number of steps. 2. A method of manufacturing a color filter in which a light-shielding layer is provided at a predetermined position on a transparent substrate so that a predetermined opening is formed, and pixels of a plurality of colors made of a photocurable resin are arranged in the predetermined opening. In this case, a colored layer, which is a pixel base material, is disposed on a transparent substrate provided with the light-shielding layer with a protective layer provided on the colored layer, and is opposite to a surface of the transparent substrate on which the light-shielding layer is provided. A photomask is arranged on the surface side, and alignment is performed so that the pattern of the photomask matches the predetermined opening.
A step of forming a pixel in a predetermined opening of the light-shielding layer by exposing the transparent substrate from the side opposite to the surface on which the light-shielding layer is provided, removing the protective layer, and developing the coloring layer is performed a predetermined number of times. A method for producing a color filter, characterized in that: 3. A method of manufacturing a color filter in which a light-shielding layer is provided at a predetermined position on a transparent substrate so that a predetermined opening is formed, and pixels of a plurality of colors made of a photocurable resin are arranged in the predetermined opening. In this case, a colored layer, which is a pixel base material, is disposed on a transparent substrate provided with the light-shielding layer with a protective layer provided on the colored layer, and is opposite to a surface of the transparent substrate on which the light-shielding layer is provided. A photomask is arranged on the surface side, and alignment is performed so that the pattern of the photomask matches the predetermined opening.
The step of forming a pixel in a predetermined opening of the light-shielding layer by exposing the transparent substrate from the side opposite to the surface on which the light-shielding layer is provided, removing the protective layer, and developing the coloring layer is performed twice. A two-color pixel is formed, and a colored layer serving as a pixel base material is disposed on a transparent substrate provided with the two-color pixels with a protective layer provided on the colored layer. Exposure is performed from the side opposite to the surface provided, the protective layer is removed, and the colored layer is developed.
A method of manufacturing a color filter, characterized by forming pixels of (1). 4. The method for producing a color filter according to claim 1, wherein the colored layer serving as a pixel base material is a film-shaped colored layer formed on a base film support serving as a protective layer. 5. The method for producing a color filter according to claim 4, wherein a protective film is laminated on the film-shaped colored layer, and the protective film on the film-shaped colored layer is peeled off to form the film-shaped colored layer. A color comprising a step of disposing the protective film peeled off at the same time as disposing the protective film on the transparent substrate provided with the light-shielding layer, on a surface of the transparent substrate opposite to the surface provided with the light-shielding layer, and peeling off the protective film before exposure. Manufacturing method of filter. 6. The protective layer according to claim 1, which is opaque to ultraviolet light.
5. A method for producing a color filter according to any one of the above items. 7. The light-shielding layer is a resin light-shielding layer.
A method for producing a color filter as described in each item. 8. The alignment of the pattern of the photomask according to claim 2 with a predetermined opening, the focus of an alignment microscope is previously set on an alignment mark on the photomask side, and the coordinates of the alignment mark on the photomask side are read. A color filter for converting and registering the coordinate position of the transparent substrate side alignment mark to the opposite one, and then adjusting the focus of the alignment microscope to the transparent substrate side alignment mark and aligning the transparent substrate side alignment mark with the registered coordinates. Manufacturing method. 9. A colored layer, which is a pixel base material, is arranged on a transparent substrate provided with a predetermined pattern with a protective layer provided on the colored layer, and the predetermined pattern of the transparent substrate is formed. A method for manufacturing a color filter, comprising the steps of: exposing from the side opposite to the surface provided, removing the protective layer, and developing the colored layer to form predetermined pixels. 10. A method for manufacturing a color filter in which a light-shielding layer is provided at a predetermined position on a transparent substrate so that a predetermined opening is formed, and pixels of a plurality of colors made of a photocurable resin are arranged in the predetermined opening. In the method, a colored layer serving as a pixel base material is disposed on the transparent substrate on which the light-shielding layer is provided, and the transparent substrate is exposed from the side opposite to the surface on which the light-shielding layer is provided, and the colored layer is developed. Forming a pixel in a predetermined opening of the light-shielding layer, and disposing a colored layer as a pixel base material on a transparent substrate provided with the light-shielding layer, exposing from the colored layer side, and developing the colored layer Forming a pixel in a predetermined opening of the light-shielding layer.