JPH10188872A - Ion beam work device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To easily execute measurement of continuity and insulating resistance. SOLUTION: In an ion beam work device consisting of an ion source arc chamber 1 forming plasma of introduced gas to generate ions, vacuum chamber 6 housing a sample, ion source electrodes 2A, 2B drawing out ions from the ion source arc chamber toward the sample, and an ion source power part 100 supplying power to the ion source electrodes 2A, 2B, outside of the ion source arc chamber 1 and the vacuum chamber 6, a switching terminal 18A, 18B is provided, which switches electrical connection/disconnection between the ion source electrodes 2A, 2B and the ion source power part 100.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ion beam processing apparatus for performing fine processing using the kinetic energy of an ion beam, and more particularly to a maintenance and inspection technique for the ion beam processing apparatus.

[0002]

2. Description of the Related Art FIG. 7 schematically shows the structure of an ion beam processing apparatus.

In such a configuration, when electric power is supplied from the power supply section 100 to each section, the ion source arc chamber 12
Inside, thermoelectrons are emitted from the filament 4. An arc discharge occurs between the wall of the ion source arc chamber 1 and the filament 3, and the emitted thermoelectrons are generated by a magnetic field of a magnet (not shown) arranged on the outer periphery of the ion source arc chamber 1. Performs a spiral movement. Then, when a gas is introduced from the gas inlet 14 into the ion source arc chamber 1 in such a state, the gas molecules collide with thermoelectrons and are turned into plasma.

[0004] The ions in the plasma are drawn into the vacuum chamber 6 by a potential difference between two ion source electrodes 2 provided on the vacuum chamber 6 side of the ion source arc chamber 1. The extracted ion beam is electrically neutralized and adjusted by the neutralizer filament 15. When the shutter 5 is opened, the ion beam is applied to the sample holder 10.
The sample 22 is processed by irradiating the sample 22 on the sample 22 held in the device.

[0005] Such an ion beam processing apparatus is disclosed in, for example, Japanese Patent Application Laid-Open No. 1-132033 (Japanese Patent Application No. 62-290345) and Japanese Patent Application Laid-Open No. 1-267943.
An apparatus described in Japanese Patent Application Laid-Open No. 63-94517 is known.

[0006]

In such an ion beam processing apparatus, a spatter generated by the irradiation of the ion beam adheres to all parts constituting the ion source and the vacuum chamber. If the spatter is peeled off, a short-circuit phenomenon between the ion source electrodes (acceleration electrode and deceleration electrode), so-called break-down, may occur. In general, the power supply unit has a function of temporarily turning off the power supply at the time of such a breakdown (short circuit).

In view of the occurrence of such a breakdown, an ion beam processing apparatus which has been used continuously for a long time needs to check the continuity and insulation of each electrode such as an ion source electrode and each insulator as daily inspection. is there.

Conventionally, such a check of continuity and insulation has been performed by removing the terminal of each electrode or by leaking the vacuum chamber and removing the ion source electrode. Therefore, such a check operation is time-consuming and burdensome. In addition, the terminal may be damaged due to an operation error during the terminal removal operation, and serious damage such as, for example, vacuum leak may be caused to the ion beam processing apparatus.

Accordingly, an object of the present invention is to provide an ion beam processing apparatus capable of easily checking the continuity of an ion source electrode and the like and measuring the insulation resistance.

[0010]

To achieve the above object,
The present invention provides an ion source chamber for generating ions, a vacuum chamber for accommodating a sample, an ion source electrode for extracting ions from the ion source chamber toward the sample, and an ion source for supplying power to the ion source electrode. An ion source power supply unit provided outside the chamber and the vacuum chamber, wherein the ion source electrode outside the ion source chamber and the vacuum chamber and the ion source power supply unit, A first switching terminal for switching electrical connection / disconnection between the source electrode and the ion source power supply unit is provided.

According to such an ion beam processing apparatus, daily inspection and the like can be performed, for example, in the following procedure.

That is, the ion beam processing apparatus is operated with the first switching terminal connected. When the sample is irradiated with the ion beam, the sputtered workpiece adheres to the entire inside of the ion source arc chamber and the vacuum chamber. When this is continuously operated for a long time, sputter adhered to the ion source arc chamber or the vacuum chamber comes off. Then, since a voltage for extracting an ion beam is applied to the ion source electrode provided in the ion source, a break-down (short circuit) phenomenon frequently occurs. In such a state, the ion beam processing apparatus may be interrupted because it cannot be continuously operated. For this reason, it is necessary to stop the apparatus and start daily inspection. However, if it is not desired to stop the apparatus, the first switching terminal is cut off, the first switching terminal is used as a measurement terminal, and the ion source electrode is disconnected. Check continuity and check what kind of condition is occurring.

When the inspection is performed in such a procedure, the inspection can be easily performed without performing a vacuum leak of the ion beam processing apparatus or removing the terminal of the ion source electrode or the ion source electrode. Since the ion source electrode can be checked in a state where the ion source power supply is disconnected, and conversely, the ion source power supply can be checked in a state where the ion source electrode is disconnected, causing a problem. It is possible to easily guess the location of the work, and it is possible to greatly reduce the subsequent work time and load.

[0014]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the ion beam processing apparatus according to the present invention will be described below.

FIG. 1 shows a schematic configuration of an ion beam processing apparatus according to the present embodiment. FIG. 2 shows an external view of the ion beam processing apparatus viewed from the side of an ion source arc chamber door of a vacuum chamber described later. The arrangement of each part viewed from the upper surface of the ion beam processing apparatus is schematically shown.

In the ion beam processing apparatus shown in FIG. 1, the ion source arc chamber 1 and the vacuum chamber 6 are arranged with two ion source electrodes 2A and 2B interposed therebetween. Further, the vacuum chamber 6 and the ion source electrode 2B,
Ion source electrode 2B, ion source electrode 2A, ion source electrode 2
A and the ion source arc chamber 1 are connected to each other in an electrically insulated state through spacers mainly formed of a Teflon plate.

The ion source arc chamber 1 and the vacuum chamber 6 are
One airtight chamber is formed, and this airtight chamber is evacuated by the vacuum pump 9 via the main gate valve 6 when processing is performed using an ion beam. The ion source arc chamber 1 has an ion source arc chamber door that can be opened and closed by a hinge mechanism at the upper part of FIG. 3, and the vacuum chamber 6 has a vacuum chamber door that can be opened and closed by a hinge mechanism at the lower part of FIG. Further, the ion source arc chamber 1 is surrounded by a protective cover 19 which is electrically insulated from the ion source arc chamber 1, and the portion of the protective cover 19 covering the ion source arc chamber door is the same as the ion source arc chamber door. Are configured to be independently opened and closed by a hinge mechanism.

Here, the ion beam processing apparatus according to the present embodiment includes a thermionic emission type ion source (bucket type ion source) for generating plasma in the ion source arc chamber 12. That is, in the ion source arc chamber 12, when power is supplied from the power supply unit 100 to the filament 4 via the filament terminal 3, the filament 4
Lights up and thermionic electrons are emitted. Also, when a voltage is applied from the power supply unit 100 between the wall of the ion source arc chamber 1 and the filament 3 (Varc), an arc discharge occurs during that time,
The emitted thermoelectrons perform a spiral motion by a magnetic field of a magnet (not shown) arranged on the outer periphery of the ion source arc chamber 1. When a gas is introduced from the gas inlet 14 into the ion source arc chamber 1 in such a state, the gas molecules collide with thermoelectrons and are turned into plasma.

Now, the ions in the plasma generated in this manner are applied to the two ion source electrodes 2 installed on the vacuum chamber 6 side of the ion source arc chamber 1 by voltages (Vacc, Vacc, Vdec) is drawn into the vacuum chamber 6 by the potential difference due to Vdec). The extracted ion beam is electrically neutralized and adjusted. This is realized by supplying power from the power supply unit 100 to the neutralizer filament 15 installed between the ion source electrode 2B and the shutter 5 and heating the neutralizer filament 15 to emit electrons to cancel the + of the ion beam.

Here, when the shutter 5 is opened, the ion beam is irradiated on the sample 22 held by the sample holder 10 to start processing.

The sample holder 10 is provided with a self-revolution mechanism and a tilt mechanism in order to maintain the uniformity of the processing of the sample 22 by the ion beam and to improve the efficiency. As shown in FIG.
These mechanisms are hermetically sealed by the storage container 12 and are provided at atmospheric pressure insulated from the pressure in the vacuum chamber 6. The tilt drive mechanism 13 is provided outside the vacuum chamber 6 via a vacuum chamber door 7 serving as a sample outlet, and is connected to the tilt drive mechanism 13 and includes a drive motor 11 for driving the sample holder 10. Storage container 12 for storing
Is installed inside the vacuum chamber 6. The supply of power to the rotary drive mechanism and the supply of cooling water or gas to the sample holder 10 are performed via the tilt drive mechanism 13.

In such a configuration, in the present embodiment, the voltage Vneut is applied to the neutralizer filament 16.
Terminal 16 for applying a voltage to the filament 4, a filament terminal 3 for supplying a voltage Vfil to the filament 4, terminals 110 and 111 for applying a voltage (Vacc, Vdec) to the ion source electrode 2, and an arc voltage Varc. Switching terminals 18a to 18e for switching connection / disconnection between the power supply unit 100 and each terminal are provided between a terminal 112 for supplying to the wall of the source arc chamber and a power supply side.

Now, the switching terminals 18a to 18e are
As shown in (1), the protective cover 19 is arranged in a line just below the ion source arc chamber 1 at a position inside the protective cover 19 which can be operated by opening a portion 19A of the protective cover 19 covering the ion source arc chamber door.

Each of the switching terminals 18A to 18E is a lever-type disconnection terminal block, and as shown in FIG. 5, two stators 181 and 182 for connecting cables, and
A contact 21 for bridging between the contacts 82 and a lever 20 connected to the contact 21 for opening and closing are provided. When the lever 20 is opened and closed, the contact 21 is separated from the fixed state.

As shown in FIG. 6, the contact 21 has a plate-like portion at both ends sandwiched between holding portions 186 and 187 provided on the stators 181 and 182, respectively.
81,182. The key 1 of the lever 20
84 engages with a protrusion 185 fixed to the stators 181 and 182, and fixes the contact 20 to the stator 18
1, 182.

When the contact 21 is not connected, probes of various measuring instruments are externally connected to the respective stators 18.
1,182.

As described above, when the ion beam processing is performed in the ion beam processing apparatus, the processed sputter is formed over the entire area of the ion source arc chamber 1 and the vacuum chamber 6. Then, when the continuous operation is performed for a long time, these spatters also adhere to the ion source electrodes 2A and 2B and cause a breakdown (short circuit). That is, when the spatter adheres thickly and the internal stress increases, peeling occurs, and a state in which they bridge between the ion source electrodes 2A and 2B and between the grounds (dead short).

Therefore, the ion beam processing apparatus routinely conducts the filament 4, the ion source electrodes 2A and 2B, and the neutralizer filament 16 and insulates them from each other. It is necessary to check insulation between them.

In such a case, according to the ion beam processing apparatus according to the present embodiment, the ion source electrodes 2A and 2B are removed, and each terminal (for example, the filament terminal 3 and the neutralizer terminal 16) is connected, as in the related art. Without removing, the contacts 21 of the switching terminals 18A to 18E
1, 182, the filament 4, the ion source electrodes 2A and 2B, and the neutralizer filament 16
Using the stator on the wall side of the ion source arc chamber 1 as a measurement point, necessary continuity and insulation resistance can be checked.

When a malfunction occurs in the operation of the ion beam processing apparatus, the cause is caused by the filament 4 or the ion source electrode 2 in the ion source arc chamber 1 or the vacuum chamber 6.
A, 2B, the neutralizer filament 16, the wall of the ion source arc chamber 1, and the like may be located on the power supply unit 100 side.

On the other hand, according to the ion beam processing apparatus of the present embodiment, the contacts 21 of the switching terminals 18A to 18E are separated from the stators 181 and 182 to check necessary continuity and insulation resistance. By performing the measurement,
The cause of the failure is the power supply unit 100 side or the ion source arc chamber 1
And whether it is in the vacuum chamber 6 or not.

Further, the continuity check and the measurement of the insulation resistance can be efficiently performed because all the switches can be checked by the switching terminals 18A to 18E arranged in a line in the protective cover 19.

Specifically, in the case of the ion beam processing apparatus according to the present embodiment, the time required for the operation is one time less than the conventional one.
It can be shortened to / 4 to 1/6 or less.

As described above, according to the ion beam processing apparatus of this embodiment, each part in the ion source arc chamber and the vacuum chamber is checked by the ion source electrodes 2A and 2B.
Without removing the terminals and without removing the terminals (for example, the filament terminal 3 and the neutralizer terminal 16), thereby improving the efficiency of the operation and causing damage to the terminals that may cause a serious obstacle such as a vacuum leak. Can be prevented from being caused by a work error.

[0035]

As described above, the ion beam processing apparatus according to the present embodiment provides an ion beam processing apparatus that can easily check the continuity of the ion source electrode and the like and measure the insulation resistance. be able to.

[Brief description of the drawings]

FIG. 1 is a diagram schematically showing a configuration of an ion beam processing apparatus.

FIG. 2 is a diagram illustrating an outer shape of an ion beam processing apparatus.

FIG. 3 is a diagram showing an arrangement of each part of the ion beam processing apparatus.

FIG. 4 is a diagram showing an arrangement of switching terminals.

FIG. 5 is a front view of a switching terminal.

FIG. 6 is a side view of a switching terminal.

FIG. 7 is a diagram showing a schematic configuration of a conventional ion beam processing apparatus.

[Explanation of Signs] 1: Ion source arc chamber 2: Ion source electrode 3: Filament terminal 4: Filament 5: Shutter 6: Vacuum chamber 7: Vacuum chamber door 8: Main gate valve
9: Vacuum pump 10: Sample holder 11: Driving motor 12: Storage container 13: Incline drive mechanism 14: Gas inlet 15: Neutralizer 16: Neutralizer terminal 17: Insulating spacer 18: Switching terminal 19: Protective cover 20: Lever 21: Contact 22: Substrate

Claims (4)

[Claims] 1. An ion source chamber for generating ions, a vacuum chamber containing a sample, an ion source electrode for extracting ions from the ion source chamber toward the sample, and an ion source for supplying power to the ion source electrode. An ion beam processing apparatus including an ion source power supply unit provided outside a source chamber and a vacuum chamber, wherein the ion source power supply unit is provided between the ion source electrode and the ion source power supply unit outside the ion source chamber and the vacuum chamber. A first method for switching electrical connection / disconnection between the ion source electrode and the ion source power supply unit;
An ion beam processing apparatus, comprising: a switching terminal. 2. An ion beam processing apparatus according to claim 1, wherein said filament emits thermoelectrons, and said filament and said ion are emitted to generate an arc discharge between said filament and a wall of said ion source chamber. An arc discharge power supply unit for providing a potential difference between the ion source chamber and a wall of the ion source chamber and an arc discharge power supply unit disposed outside the ion source chamber and the vacuum chamber; An ion beam processing apparatus comprising: a second switching terminal that switches between electrical connection and disconnection between a wall and an arc discharge power supply unit. 3. The ion beam processing apparatus according to claim 2, wherein a lever-type disconnection terminal block is used as the first switching terminal and the second switching terminal. 4. The ion beam processing apparatus according to claim 2, further comprising an opening / closing door that covers the ion source chamber, a cover that is electrically insulated from the ion source chamber, Wherein the switching terminal and the second switching terminal are disposed around the opening / closing door in the cover.