JPH10188220A - Soft magnetic alloy thin film, magnetic head and magnetic recording and reproducing device - Google Patents

Soft magnetic alloy thin film, magnetic head and magnetic recording and reproducing device

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Publication number
JPH10188220A
JPH10188220A JP34306496A JP34306496A JPH10188220A JP H10188220 A JPH10188220 A JP H10188220A JP 34306496 A JP34306496 A JP 34306496A JP 34306496 A JP34306496 A JP 34306496A JP H10188220 A JPH10188220 A JP H10188220A
Authority
JP
Japan
Prior art keywords
magnetic
film
alloy
thin film
head
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP34306496A
Other languages
Japanese (ja)
Inventor
Katsumi Hoshino
勝美 星野
Masaaki Sano
雅章 佐野
Matahiro Komuro
又洋 小室
Shunichi Narumi
俊一 鳴海
Gen Oikawa
玄 及川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP34306496A priority Critical patent/JPH10188220A/en
Publication of JPH10188220A publication Critical patent/JPH10188220A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To obtain a soft magnetic alloy plating film having high electric resistivity while maintaining a high saturation magnetic flux density and relatively low soft magnetostrictive constant by using a magnetic core material added with Cr, Mo, W, etc., for a Co-Ni-Fe alloy. SOLUTION: The electric resistivity of the soft magnetic alloy thin film formed by adding <=5wt.% at least one kind of the elements selected from Cr, Mo and W to a Cox Niy Fez alloy (65<=x<=85, 10<=y<=25, 5<=z<=25wt.%) may be enhanced up to about 60μΩcm while that saturation magnetic flux density of >=1.3T and the magnetostrictive constant of <=+20/10<7> are maintained. The soft magnetic alloy thin film is manufactured from a plating bath prepd. by adding <=0.7g/l, in total, Cr, Mo and W ions to a plating high bath contg. bivalent Co, Ni and Fe ions respectively at rations of 6 to 15g/l, 10 to 30g/l, 0.5 to 2.5g/l and contg. a stress relieving agent and surfactant. The thin film is applied as an upper magnetic pole 15 to the magnetic head.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は軟磁性合金薄膜,磁
気ヘッドおよび磁気記録再生装置に関する。
The present invention relates to a soft magnetic alloy thin film, a magnetic head, and a magnetic recording / reproducing apparatus.

【0002】[0002]

【従来の技術】近年、磁気ディスク装置の高記録密度化
に伴い、高い保磁力の媒体に記録できる薄膜磁気ヘッド
が要求されている。そのためには、磁気ヘッドのコア材
料には、高い飽和磁束密度を有し、かつ高周波特性に優
れた材料を用いる必要がある。現在の薄膜磁気ヘッド材
料は、パーマロイ(78wt%Ni−Fe合金)が公知
であるが、飽和磁束密度が1.0T と低く、かつ、電気
抵抗率が20μΩcm程度と低いため、うず電流損失が大
きく、高周波領域における記録磁界強度が低下する問題
がある。また、他の材料として、Co系非晶質材料,セ
ンダスト(Fe−Al−Si合金)等が上げられるが、
非晶質材料は熱的に不安定であり、センダストは500
℃程度の熱処理が必要であることなどから、磁気ヘッド
プロセス上に問題があり、実用化には至っていない。
2. Description of the Related Art In recent years, as the recording density of magnetic disk devices has increased, a thin film magnetic head capable of recording on a medium having a high coercive force has been required. For that purpose, it is necessary to use a material having a high saturation magnetic flux density and excellent high-frequency characteristics as a core material of the magnetic head. As a current thin-film magnetic head material, permalloy (78 wt% Ni-Fe alloy) is known, but since the saturation magnetic flux density is as low as 1.0 T and the electric resistivity is as low as about 20 μΩcm, eddy current loss is large. In addition, there is a problem that the recording magnetic field intensity in a high frequency region is reduced. Other materials include a Co-based amorphous material and Sendust (Fe-Al-Si alloy).
Amorphous materials are thermally unstable and Sendust is 500
Since a heat treatment of about ° C. is required, there is a problem in the magnetic head process, and it has not been put to practical use.

【0003】特願平7−16666号明細書に見るように、高
い飽和磁束密度を有し、かつ、高周波において記録磁界
強度が低下しない材料として、めっき法で作製した40
〜60wt%Ni−Fe合金がある。Ni−Fe合金
は、1.4T 以上の高い飽和磁束密度を有する。また、
電気抵抗率が30μΩcm以上と高く、うず電流損失が小
さいため、高周波における透磁率は高い。しかし、Ni
−Fe合金は磁歪定数が50/107 と高く、コア形状
にしたときの応力のために、良好な磁区構造が得られに
くい。
As disclosed in Japanese Patent Application No. Hei 7-16666, as a material having a high saturation magnetic flux density and a recording magnetic field strength which does not decrease at high frequencies, a material prepared by plating is used.
6060 wt% Ni—Fe alloy. Ni-Fe alloys have a high saturation magnetic flux density of 1.4 T or more. Also,
Since the electric resistivity is as high as 30 μΩcm or more and the eddy current loss is small, the magnetic permeability at high frequencies is high. However, Ni
The -Fe alloy has a high magnetostriction constant of 50/10 7, and it is difficult to obtain a good magnetic domain structure due to stress when the core is formed.

【0004】また、特開昭64−8605号,特開昭62−2569
89号,特開平6−89422号、あるいは特開平4−43989号公
報に見るように、めっき法により作製した様々な組成の
Co−Ni−Fe合金がある。Co−Ni−Feめっき
合金は高い飽和磁束密度を有し、磁歪定数も組成によっ
ては低くなる。しかし、電気抵抗率も低いため、うず電
流損失が大きく、高周波での透磁率は低下する。
Further, Japanese Patent Application Laid-Open Nos. 64-8605 and 62-2569
No. 89, JP-A-6-89422 or JP-A-4-43989, there are Co-Ni-Fe alloys of various compositions produced by plating. The Co—Ni—Fe plated alloy has a high saturation magnetic flux density, and the magnetostriction constant also becomes low depending on the composition. However, since the electric resistivity is low, the eddy current loss is large, and the magnetic permeability at a high frequency decreases.

【0005】特開平2−290995 号あるいは特開平2−290
995 号公報には、磁歪を低減させる目的でCo組成が2
0at%前後のCo−Ni−Fe合金に3at%以下の
Cr,6at%以下のMoを添加している。しかし、こ
れらの膜の磁歪は、CrやMoを添加しても50〜70
/107と高い。
JP-A-2-29095 or JP-A-2-290
No. 995 discloses that the Co composition is 2 in order to reduce magnetostriction.
Cr of less than 3 at% and Mo of less than 6 at% are added to a Co-Ni-Fe alloy of about 0 at%. However, the magnetostriction of these films is 50 to 70 even when Cr or Mo is added.
It is as high as / 10 7 .

【0006】[0006]

【発明が解決しようとする課題】高い磁気記録密度を有
する磁気ディスク装置には、高い飽和磁束密度を有し、
かつ、高周波において記録磁界強度が低下しない材料を
用いた薄膜磁気ヘッドを用いることが必要である。めっ
き法で作製したCoxNiyFez合金(65≦x≦85,
10≦y≦25,5≦z≦25wt%)は、1.6T 以
上の高い飽和磁束密度を有し、磁歪定数も+20/10
7 以下と比較的低い。しかし、電気抵抗率が20μΩcm
以下と低いため、うず電流損失が大きくなり、高周波で
の透磁率は低くなる。
A magnetic disk drive having a high magnetic recording density has a high saturation magnetic flux density,
In addition, it is necessary to use a thin film magnetic head using a material that does not reduce the recording magnetic field strength at high frequencies. Co x Ni y Fe z alloy (65 ≦ x ≦ 85 produced by a plating method,
10 ≦ y ≦ 25, 5 ≦ z ≦ 25 wt%) has a high saturation magnetic flux density of 1.6 T or more and a magnetostriction constant of +20/10.
Relatively low at 7 or less. However, the electric resistivity is 20 μΩcm
Therefore, the eddy current loss increases and the magnetic permeability at high frequencies decreases.

【0007】本研究の目的はCo−Ni−Feめっき膜
の問題の解決方法を提供することにある。
[0007] The purpose of this study is to provide a solution to the problem of Co-Ni-Fe plating films.

【0008】[0008]

【課題を解決するための手段】本発明者は、薄膜磁気ヘ
ッドにおける磁気コア材料について、誠意研究を行った
結果、Co−Ni−Fe合金にCr,Mo,W等を添加
することにより、高い飽和磁束密度、比較的低い磁歪定
数を保ったまま、高い電気抵抗率を有する軟磁性合金め
っき膜が得られることを見出し、本発明を完成するに至
った。
Means for Solving the Problems The present inventor conducted a sincere study on a magnetic core material in a thin-film magnetic head, and as a result, by adding Cr, Mo, W, etc. to a Co-Ni-Fe alloy, a high cost was obtained. The present inventors have found that a soft magnetic alloy plating film having a high electric resistivity can be obtained while maintaining a saturated magnetic flux density and a relatively low magnetostriction constant, and have completed the present invention.

【0009】すなわち、2価のCo,Ni,Feイオン
量がそれぞれ6〜15g/l,10〜30g/l,0.
5〜2.5g/l、および応力緩和剤,界面活性剤めっ
き浴に、総量で0.7g/l 以下のCr,Mo,Wイオ
ンを添加しためっき浴から作製される、CoxNiyFe
z合金(65≦x≦85,10≦y≦25,5≦z≦25
wt%)に、Cr,Mo,Wから選ばれる少なくとも一
種類の元素が、5wt%未満添加された軟磁性合金薄膜
は、飽和磁束密度が1.3T 以上、および磁歪定数が+
20/107 以下を保ったまま、電気抵抗率は約60μ
Ωcmまで高くすることができる。
That is, the amounts of divalent Co, Ni and Fe ions are 6 to 15 g / l, 10 to 30 g / l, and 0.1, respectively.
Co x Ni y Fe prepared from a plating bath obtained by adding a total of 0.7 g / l or less of Cr, Mo and W ions to a plating bath of 5 to 2.5 g / l and a stress relaxing agent and a surfactant.
z alloy (65 ≦ x ≦ 85, 10 ≦ y ≦ 25, 5 ≦ z ≦ 25
wt%), a soft magnetic alloy thin film to which at least one element selected from Cr, Mo, and W is added in an amount of less than 5 wt% has a saturation magnetic flux density of 1.3 T or more and a magnetostriction constant of +
The electric resistivity is about 60μ while keeping 20/10 7 or less.
Can be as high as Ωcm.

【0010】Co−Ni−Feを主成分とするめっき軟
磁性膜を用いた薄膜磁気ヘッドは、高い周波数特性を示
す。さらに、薄膜磁気ヘッドを用いることにより、高い
磁気記録密度を有した磁気記録再生装置が得られる。
A thin-film magnetic head using a plated soft magnetic film containing Co-Ni-Fe as a main component exhibits high frequency characteristics. Further, by using the thin film magnetic head, a magnetic recording / reproducing apparatus having a high magnetic recording density can be obtained.

【0011】[0011]

【発明の実施の形態】以下に本発明の一実施例を挙げ、
図表を参照しながらさらに具体的に説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below.
This will be described more specifically with reference to the figures and tables.

【0012】(実施例1)厚さ0.1μm の80wt%
Ni−Fe電極膜を形成したガラス基板上に、表1に示
すめっき浴を用いてCo−Ni−Fe−Mo合金を作製
した。
(Example 1) 80% by weight of 0.1 μm thickness
A Co—Ni—Fe—Mo alloy was produced on a glass substrate on which a Ni—Fe electrode film was formed, using a plating bath shown in Table 1.

【0013】[0013]

【表1】 [Table 1]

【0014】作製時におけるめっき条件は、pHは3.
0 、浴温度は30℃、電流密度は15mA/cm2 であ
る。この時作製されたMoを添加する前のCo−Ni−
Feの組成は、それぞれ71wt%,18wt%,11
wt%である。Mo組成は、モリブデン酸ナトリウム添
加量により、変化させた。
The plating conditions at the time of fabrication are as follows: pH: 3.
0, bath temperature 30 ° C., current density 15 mA / cm 2 . At this time, the Co-Ni-
The composition of Fe was 71 wt%, 18 wt%, 11
wt%. The Mo composition was changed by the amount of sodium molybdate added.

【0015】図1には、Mo添加量に対する飽和磁束密
度、および磁歪定数の変化を示す。図のように、Moを
添加するに従い、飽和磁束密度は低下するが、磁歪定数
はほぼ一定である。図2には、Mo添加量に対する電気
抵抗率の変化を示す。電気抵抗率はMo添加量の増加に
ともない、高くなる。このように、Moを増加させるこ
とにより、低い磁歪定数を保ったまま、電気抵抗率は高
くなるが、飽和磁束密度は低下する。飽和磁束密度が
1.3T 以上であるためにはMo量は5wt%以下が好
ましい。さらに、飽和磁束密度が1.6T 以上であるた
めにはMo量は2wt%以下がより好ましい。
FIG. 1 shows changes in saturation magnetic flux density and magnetostriction constant with respect to the amount of Mo added. As shown in the figure, the saturation magnetic flux density decreases as Mo is added, but the magnetostriction constant is almost constant. FIG. 2 shows a change in electric resistivity with respect to the amount of Mo added. The electric resistivity increases as the amount of Mo added increases. As described above, by increasing Mo, the electric resistivity increases while maintaining the low magnetostriction constant, but the saturation magnetic flux density decreases. In order for the saturation magnetic flux density to be 1.3 T or more, the Mo amount is preferably 5 wt% or less. Further, in order for the saturation magnetic flux density to be 1.6 T or more, the Mo amount is more preferably 2 wt% or less.

【0016】本実施例では、Moを添加した場合につい
て述べたが、Cr,Wを用いても同様な効果が得られ
る。
In this embodiment, the case where Mo is added has been described. However, similar effects can be obtained by using Cr and W.

【0017】(実施例2)実施例1と同様な方法を用
い、膜厚が3μmであるCo−Ni−Fe−X(X=M
o,Cr,W)磁性膜を作製した。これらの磁性膜の緒
特性を表2に示す。
(Embodiment 2) Using a method similar to that of Embodiment 1, a Co-Ni-Fe-X (X = M
(o, Cr, W) magnetic films were prepared. Table 2 shows the characteristics of these magnetic films.

【0018】[0018]

【表2】 [Table 2]

【0019】表のように、Mo,Cr,Wを添加するこ
とにより、飽和磁束密度を大きく低減させることなく、
電気抵抗率を高くすることができる。これらの磁性膜の
透磁率の周波数依存性を図3に示す。図のように、M
o,Cr,Wを添加することにより高い周波数における
透磁率が増加している。
As shown in the table, by adding Mo, Cr, and W, the saturation magnetic flux density was not greatly reduced.
Electric resistivity can be increased. FIG. 3 shows the frequency dependence of the magnetic permeability of these magnetic films. As shown, M
The addition of o, Cr, and W increases the magnetic permeability at high frequencies.

【0020】(実施例3)実施例1で示した磁性めっき
膜を用い、記録再生分離型ヘッドを作製した。磁気ヘッ
ドの構造を以下に示す。図4は磁気ヘッドの一部分を切
断した場合の斜視図である。磁気抵抗効果膜11をシー
ルド層12,13で挟んだ部分が再生ヘッドとして働
く。また、シールド層13は、記録ヘッドの下部磁極も
かねており、コイル14を挟むシールド層13,上部磁
極15の部分が記録ヘッドとして働く。上部磁極15
は、フレームめっき法を用いて作製した。また、上部磁
極の材料は、実施例1に記載の72wt%Co−16w
t%Ni−9wt%Fe−3wt%Mo磁性膜を用いた。
また、磁気抵抗効果膜11の電極17には、Cuを用い
た。
(Embodiment 3) Using the magnetic plating film shown in Embodiment 1, a recording / reproducing separation type head was manufactured. The structure of the magnetic head is shown below. FIG. 4 is a perspective view when a part of the magnetic head is cut. The portion where the magnetoresistive film 11 is sandwiched between the shield layers 12 and 13 functions as a reproducing head. The shield layer 13 also functions as the lower magnetic pole of the recording head, and the portion of the shield layer 13 and the upper magnetic pole 15 sandwiching the coil 14 functions as a recording head. Upper magnetic pole 15
Was manufactured using a frame plating method. In addition, the material of the upper magnetic pole is 72 wt% Co-16w described in Example 1.
A t% Ni-9wt% Fe-3wt% Mo magnetic film was used.
Cu was used for the electrode 17 of the magnetoresistive film 11.

【0021】以下にこのヘッドの作製方法を示す。Hereinafter, a method of manufacturing the head will be described.

【0022】Al23・TiCを主成分とする焼結体を
スライダ用の基板16とした。シールド層12,13に
はスパッタリング法で形成した窒素を含んだパーマロイ
(80wt%Ni−Fe合金)を用いた。各磁性膜の膜
厚は、以下のようにした。上下のシールド層12,13
は2.0μm、上部磁極15は3.0μm、各層間のギャ
ップ材はスパッタリングで形成したAl23を用いた。
ギャップ層の膜厚は、シールド層と磁気抵抗効果素子間
で0.2μm、記録磁極間では0.4μmとした。磁気抵
抗効果膜11には、厚さ20nmのパーマロイ膜を用い
た。コイル14には膜厚1μmのCuを使用した。
A sintered body mainly composed of Al 2 O 3 .TiC was used as a substrate 16 for the slider. Permalloy (80 wt% Ni-Fe alloy) containing nitrogen formed by a sputtering method was used for the shield layers 12 and 13. The thickness of each magnetic film was as follows. Upper and lower shield layers 12, 13
Was 2.0 μm, the upper magnetic pole 15 was 3.0 μm, and the gap material between the layers was Al 2 O 3 formed by sputtering.
The thickness of the gap layer was 0.2 μm between the shield layer and the magnetoresistive element, and 0.4 μm between the recording magnetic poles. As the magnetoresistive film 11, a permalloy film having a thickness of 20 nm was used. Cu having a thickness of 1 μm was used for the coil 14.

【0023】以上述べた薄膜磁気ヘッドを用いて記録再
生を行った。媒体には保磁力が2500OeであるCo−C
r−Pt系合金を用いた。また、ヘッドと媒体間のスペ
−シングは、45nmとした。図5には、記録電流が4
0mAのときの記録周波数に対するオーバーライトの変
化を示す。同時に比較のために、Moを添加していない
Co−18wt%Ni−9wt%Fe膜を上部磁極に用
いた結果も示す。図のように、Co−Ni−FeにMo
を添加した磁性膜を用いた磁気ヘッドにおいて、記録周
波数が90MHzにおいても−40dB以上の優れたオ
ーバーライト特性が得られている。これは、本発明によ
る磁気ヘッドを用いたためであると考えられる。
Recording and reproduction were performed using the thin-film magnetic head described above. The medium is Co-C with a coercive force of 2500 Oe.
An r-Pt alloy was used. The spacing between the head and the medium was 45 nm. FIG. 5 shows that the recording current is 4
The change of the overwrite with respect to the recording frequency at 0 mA is shown. At the same time, for comparison, the results of using a Co-18 wt% Ni-9 wt% Fe film to which Mo was not added for the upper magnetic pole are also shown. As shown in the figure, Mo is added to Co-Ni-Fe.
In a magnetic head using a magnetic film to which is added, excellent overwrite characteristics of −40 dB or more are obtained even at a recording frequency of 90 MHz. This is probably because the magnetic head according to the present invention was used.

【0024】本実施例では、上部シールド層13はスパ
ッタリング法を用いているが、めっき法を用いて形成す
ることもできる。
In the present embodiment, the upper shield layer 13 is formed by a sputtering method, but may be formed by a plating method.

【0025】(実施例4)実施例3で述べた本発明の磁
気ヘッドを用い、磁気ディスク装置を作製した。図6に
磁気ディスク装置の構造の説明図を示す。
(Embodiment 4) A magnetic disk drive was manufactured using the magnetic head of the present invention described in Embodiment 3. FIG. 6 is an explanatory diagram of the structure of the magnetic disk drive.

【0026】磁気記録媒体21の記録層には、2500
Oeの保磁力を有するCo−Cr−Pt系合金からなる
材料を用いた。磁気ヘッド23の記録ヘッドのトラック
幅は2.3μm、再生ヘッドのトラック幅は1.7μmと
した。磁気ヘッド23における記録ヘッドの磁気コア材
料は、従来のパーマロイを用いた記録ヘッドと比較し
て、高抵抗,高飽和磁束密度を有し、かつ、磁極の磁区
構造が良好であるため、高周波に対応した磁気ディスク
装置を作製することができる。本発明の磁気ヘッドは、
最高記録周波数が90MHz以上である磁気記録再生装
置に有効である。
The recording layer of the magnetic recording medium 21 has 2500
A material made of a Co-Cr-Pt alloy having a coercive force of Oe was used. The track width of the recording head of the magnetic head 23 was 2.3 μm, and the track width of the reproducing head was 1.7 μm. The magnetic core material of the recording head in the magnetic head 23 has a higher resistance, a higher saturation magnetic flux density, and a better magnetic domain structure of the magnetic poles as compared with a recording head using a conventional permalloy. A corresponding magnetic disk device can be manufactured. The magnetic head of the present invention
This is effective for a magnetic recording / reproducing apparatus having a maximum recording frequency of 90 MHz or more.

【0027】[0027]

【発明の効果】電気めっき法により作製されたCox
yFez 合金(65≦x≦80,15≦y≦25,8
≦z≦25wt%)に5wt%以下のMo,W,Crを
添加することにより、高い飽和磁束密度,比較的低い磁
歪定数を保ちながら、電気抵抗率を高くすることができ
る。このめっき法で作製された軟磁性薄膜を磁気ヘッド
に用いることにより、最高記録周波数が90MHz以上
である記録ヘッドが作製できる。さらに、記録ヘッドを
用いることにより、高性能磁気記録再生装置を得ること
ができる。
According to the present invention, Co x N produced by an electroplating method.
i y Fe z alloy (65 ≦ x ≦ 80,15 ≦ y ≦ 25,8
≦ z ≦ 25 wt%), the electric resistivity can be increased while maintaining a high saturation magnetic flux density and a relatively low magnetostriction constant by adding 5 wt% or less of Mo, W, and Cr. By using a soft magnetic thin film produced by this plating method for a magnetic head, a recording head having a maximum recording frequency of 90 MHz or more can be produced. Further, by using the recording head, a high-performance magnetic recording / reproducing apparatus can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】Co−Ni−Fe合金に添加されるMo量に対
する飽和磁束密度および磁歪定数の変化を示すグラフ。
FIG. 1 is a graph showing changes in saturation magnetic flux density and magnetostriction constant with respect to the amount of Mo added to a Co—Ni—Fe alloy.

【図2】Co−Ni−Fe合金に添加されるMo量に対
する電気抵抗率の変化を示すグラフ。
FIG. 2 is a graph showing a change in electric resistivity with respect to the amount of Mo added to a Co—Ni—Fe alloy.

【図3】Cr,Mo,Wを添加したCo−Ni−Fe膜
における透磁率の周波数特性を示すグラフ。
FIG. 3 is a graph showing frequency characteristics of magnetic permeability in a Co—Ni—Fe film to which Cr, Mo, and W are added.

【図4】本発明の磁気ヘッドの斜視図。FIG. 4 is a perspective view of a magnetic head according to the present invention.

【図5】本発明の磁気ヘッドにおける記録周波数に対す
るオーバーライト特性を示すグラフ。
FIG. 5 is a graph showing overwrite characteristics with respect to a recording frequency in the magnetic head of the present invention.

【図6】本発明の磁気ディスク装置の斜視図。FIG. 6 is a perspective view of the magnetic disk drive of the present invention.

【符号の説明】[Explanation of symbols]

11…磁気抵抗効果膜、12,13…シールド層、14
…コイル、15…上部磁極、16…基板、17…電極。
11 ... Magnetoresistance effect film, 12, 13 ... Shield layer, 14
... coils, 15 ... upper magnetic poles, 16 ... substrates, 17 ... electrodes.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 鳴海 俊一 東京都国分寺市東恋ケ窪一丁目280番地 株式会社日立製作所中央研究所内 (72)発明者 及川 玄 神奈川県小田原市国府津2880番地 株式会 社日立製作所ストレージシステム事業部内 ──────────────────────────────────────────────────の Continued on the front page (72) Inventor Shunichi Narumi 1-280 Higashi Koigakubo, Kokubunji-shi, Tokyo Inside the Central Research Laboratory, Hitachi, Ltd. System Division

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】CoxNiyFez合金(65≦x≦85,1
0≦y≦25,5≦z≦25wt%)に、Cr,Mo,W
から選ばれる少なくとも一種類の元素が、5wt%以下
添加された軟磁性合金薄膜であり、前記磁性合金薄膜が
電気めっき法により作製されたことを特徴とする軟磁性
合金薄膜。
1. A Co x Ni y Fe z alloy (65 ≦ x ≦ 85,1
0 ≦ y ≦ 25,5 ≦ z ≦ 25 wt%), Cr, Mo, W
A soft magnetic alloy thin film to which at least one element selected from the group consisting of 5 wt% or less is added, and wherein the magnetic alloy thin film is produced by an electroplating method.
【請求項2】請求項1において、2価のCo,Ni,F
eイオン量がそれぞれ6〜15g/l,10〜30g/
l,0.5〜2.5g/l、および応力緩和剤,界面活性
剤を含んだ電気めっき浴に、総量で0.7g/l 以下の
Cr,Mo,Wイオンを添加しためっき浴から形成され
る軟磁性合金薄膜。
2. The method according to claim 1, wherein the divalent Co, Ni, F
e ion amount is 6 to 15 g / l, 10 to 30 g /
1, 0.5 to 2.5 g / l and a plating bath containing 0.7 g / l or less of Cr, Mo, and W ions in an electroplating bath containing a stress relaxing agent and a surfactant. Soft magnetic alloy thin film.
【請求項3】下部磁性膜と、前記下部磁性膜上に形成さ
れ、一端が前記下部磁性膜の一端に接しており、他端が
前記下部磁性層の他端に磁気ギャップを介して対向し、
磁気回路を形成する上部磁性膜と、両磁性膜の間に電気
的に絶縁された膜を介して、磁気コアと交差する所定巻
回数のコイルからなる薄膜磁気ヘッドであり、前記上部
磁性層と前記下部磁性層の少なくとも一方が、請求項1
または請求項2に記載の前記軟磁性合金薄膜により形成
された薄膜磁気ヘッド。
3. A lower magnetic film, formed on the lower magnetic film, having one end in contact with one end of the lower magnetic film, and the other end facing the other end of the lower magnetic layer via a magnetic gap. ,
An upper magnetic film forming a magnetic circuit, a thin-film magnetic head comprising a coil having a predetermined number of turns intersecting with a magnetic core through a film electrically insulated between the two magnetic films, wherein the upper magnetic layer and 2. The method according to claim 1, wherein at least one of the lower magnetic layers is formed of a material.
A thin-film magnetic head formed of the soft magnetic alloy thin film according to claim 2.
【請求項4】請求項3に記載の前記薄膜磁気ヘッドと磁
気抵抗効果素子とを組み合わせた複合型磁気ヘッド。
4. A composite magnetic head in which the thin-film magnetic head according to claim 3 and a magnetoresistive element are combined.
【請求項5】請求項3または請求項4に記載の前記薄膜
磁気ヘッドを搭載した磁気記録再生装置。
5. A magnetic recording / reproducing apparatus equipped with the thin-film magnetic head according to claim 3.
JP34306496A 1996-12-24 1996-12-24 Soft magnetic alloy thin film, magnetic head and magnetic recording and reproducing device Pending JPH10188220A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP34306496A JPH10188220A (en) 1996-12-24 1996-12-24 Soft magnetic alloy thin film, magnetic head and magnetic recording and reproducing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP34306496A JPH10188220A (en) 1996-12-24 1996-12-24 Soft magnetic alloy thin film, magnetic head and magnetic recording and reproducing device

Publications (1)

Publication Number Publication Date
JPH10188220A true JPH10188220A (en) 1998-07-21

Family

ID=18358664

Family Applications (1)

Application Number Title Priority Date Filing Date
JP34306496A Pending JPH10188220A (en) 1996-12-24 1996-12-24 Soft magnetic alloy thin film, magnetic head and magnetic recording and reproducing device

Country Status (1)

Country Link
JP (1) JPH10188220A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003034891A (en) * 2001-05-18 2003-02-07 Headway Technologies Inc Method for manufacturing cobalt iron alloy and plated magnetic thin-film of cobalt iron alloy, and method for manufacturing quaternary alloy and plated magnetic thin-film of cobalt iron molybdenum alloy
US6780530B2 (en) 1999-10-06 2004-08-24 Nec Corporation Magnetic material having a high saturation magnetic flux density and a low coercive force

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6780530B2 (en) 1999-10-06 2004-08-24 Nec Corporation Magnetic material having a high saturation magnetic flux density and a low coercive force
JP2003034891A (en) * 2001-05-18 2003-02-07 Headway Technologies Inc Method for manufacturing cobalt iron alloy and plated magnetic thin-film of cobalt iron alloy, and method for manufacturing quaternary alloy and plated magnetic thin-film of cobalt iron molybdenum alloy

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