JPH1017949A - Vacuum heat treating device of powder and granular material - Google Patents

Vacuum heat treating device of powder and granular material

Info

Publication number
JPH1017949A
JPH1017949A JP19143596A JP19143596A JPH1017949A JP H1017949 A JPH1017949 A JP H1017949A JP 19143596 A JP19143596 A JP 19143596A JP 19143596 A JP19143596 A JP 19143596A JP H1017949 A JPH1017949 A JP H1017949A
Authority
JP
Japan
Prior art keywords
reducing gas
processing chamber
powder
granular materials
granular material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19143596A
Other languages
Japanese (ja)
Inventor
Masatomo Nakamura
雅知 中村
Kenjiro Sato
健二郎 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daido Steel Co Ltd
Original Assignee
Daido Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daido Steel Co Ltd filed Critical Daido Steel Co Ltd
Priority to JP19143596A priority Critical patent/JPH1017949A/en
Publication of JPH1017949A publication Critical patent/JPH1017949A/en
Pending legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/20Recycling

Landscapes

  • Muffle Furnaces And Rotary Kilns (AREA)
  • Manufacture And Refinement Of Metals (AREA)

Abstract

PROBLEM TO BE SOLVED: To recover valuable metals at a high yield by supplying a prescribed amt. of a reducing gas as a carrier gas for the metal vapor generated from powder and granular materials to a treating chamber. SOLUTION: The treating chamber 23 is evacuated to vacuum and a heater 33 is operated to maintain the treating chamber 23 at a prescribed temp. A valve 43a is opened to drop the powder and granular materials from a hopper 15 to a plate 111 of the uppermost stage and a valve 53a is opened to supply the reducing gas from plural nozzles 53b. The dropped powder and granular materials are extruded to fall onto the plate 112 of the lower stage while the powder and granular materials are agitated on the plate 111 and are simultaneously spread thin. Henceforce, the powder and granular materials are successively dropped to the lower stages in the same manner and are finally dropped to a discharge chute 23a. When the reducing gas is supplied as the carrier gas to the surfaces of the powder and granular materials in such a state, the temp. boundary layers of the metal vapor formed around the powder and granular materials are made sufficiently thinner or are substantially destroyed. The zinc, lead, etc., in the powder and granular materials are efficiently and rapidly evaporated and are recovered into a condenser 73.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は粉粒体の真空熱処理
装置に関する。例えば、製鋼工場の集塵装置で捕捉され
るダストには、酸化鉄(Fe23,Fe34)、酸化亜
鉛(ZnO)、酸化鉛(PbO)等の金属酸化物が含ま
れている。かかるダストをそのまま廃棄処分したのでは
資源の無駄になるので、該ダストから鉄、亜鉛、鉛等の
有価金属を回収することが望まれる。本発明は上記のよ
うなダストに代表される粉粒体を真空雰囲気下に加熱処
理して該粉粒体から鉄、亜鉛、鉛等の有価金属を回収す
る装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vacuum heat treatment apparatus for granular materials. For example, dust captured by a dust collector in a steelmaking plant contains metal oxides such as iron oxide (Fe 2 O 3 , Fe 3 O 4 ), zinc oxide (ZnO), and lead oxide (PbO). I have. Discarding such dust as it is wastes resources, and it is desired to recover valuable metals such as iron, zinc and lead from the dust. The present invention relates to an apparatus for recovering valuable metals such as iron, zinc, and lead from a granular material represented by dust as described above by heat-treating the granular material in a vacuum atmosphere.

【0002】[0002]

【従来の技術】従来、粉粒体から鉄、亜鉛、鉛等の有価
金属を回収する真空熱処理装置として、密閉系の容器
と、該容器内に断熱材で囲まれて形成された処理室と、
該処理室に装備されたヒータと、該容器に接続された該
処理室を真空雰囲気にする真空ポンプと、該容器と該真
空ポンプとの間に介装された凝縮器とを備えるものが提
案されており(特開平4−225876)、またかかる
真空熱処理装置に使用される凝縮器として、水冷の凝縮
室と、該凝縮室の下部に形成された第1真空室と、該第
1真空室の下部に形成された第2真空室とを備えるもの
が提案されている(実開平5−30149)。この従来
装置は、処理室に粉粒体を供給し、真空雰囲気下に加熱
処理して、発生した亜鉛や鉛の蒸気を凝縮器で凝縮する
一方、鉄を処理室に残留させるというものである。とこ
ろが、この従来装置には、実際のところ、粉粒体から
鉄、亜鉛、鉛等の有価金属を収率良く回収することがで
きず、またその回収に時間がかかるという問題がある。
2. Description of the Related Art Conventionally, as a vacuum heat treatment apparatus for recovering valuable metals such as iron, zinc, and lead from powders and granules, a closed vessel and a treatment chamber formed by being surrounded by a heat insulating material in the vessel are known. ,
It is proposed to provide a heater provided in the processing chamber, a vacuum pump connected to the container to make the processing chamber a vacuum atmosphere, and a condenser interposed between the container and the vacuum pump. As a condenser used in such a vacuum heat treatment apparatus, a water-cooled condensation chamber, a first vacuum chamber formed below the condensation chamber, and a first vacuum chamber are described. And a second vacuum chamber formed in the lower part of the device (Japanese Utility Model Laid-Open No. 5-30149). In this conventional apparatus, powder and granules are supplied to a processing chamber, and heat treatment is performed in a vacuum atmosphere to condense generated zinc and lead vapors in a condenser while leaving iron in the processing chamber. . However, this conventional apparatus actually has a problem that valuable metals such as iron, zinc, and lead cannot be recovered from the granular material with a high yield, and the recovery takes time.

【0003】[0003]

【発明が解決しようとする課題】本発明が解決しようと
する課題は、従来装置では、粉粒体から鉄、亜鉛、鉛等
の有価金属を収率良く回収することができず、またその
回収に時間がかかる点である。
The problem to be solved by the present invention is that the conventional apparatus cannot recover valuable metals such as iron, zinc, lead and the like from the granular material in a high yield, and the recovery thereof It takes time.

【0004】[0004]

【課題を解決するための手段】しかして本発明は、密閉
系の容器内に形成された処理室で粉粒体を真空雰囲気下
に加熱処理し、該粉粒体から有価金属を回収する装置で
あって、処理室に該粉粒体から発生する金属蒸気のキャ
リアーガスとして該金属蒸気の濃度境界層を充分に薄く
する或は実質的に破壊するに足る量の還元性ガスを供給
するようにして成ることを特徴とする粉粒体の真空熱処
理装置に係る。
SUMMARY OF THE INVENTION Accordingly, the present invention provides an apparatus for recovering valuable metal from a granular material by heating the granular material under a vacuum atmosphere in a processing chamber formed in a closed vessel. And supplying the processing chamber with a sufficient amount of reducing gas as a carrier gas for the metal vapor generated from the powder or granules to sufficiently thin or substantially destroy the concentration boundary layer of the metal vapor. The present invention relates to a vacuum heat treatment apparatus for a granular material characterized by comprising:

【0005】本発明においても、密閉系の容器と、該容
器内に断熱材で囲まれて形成された処理室と、該処理室
に装備された加熱源と、該容器に接続された該処理室を
真空雰囲気にする真空ポンプと、該容器と該真空ポンプ
との間に介装された凝縮器とを備えている。
[0005] Also in the present invention, a closed system container, a processing chamber surrounded by a heat insulating material in the container, a heating source provided in the processing chamber, and a processing source connected to the container. A vacuum pump for evacuating the chamber to a vacuum atmosphere, and a condenser interposed between the container and the vacuum pump are provided.

【0006】本発明では、容器の処理室に粉粒体から発
生する金属蒸気のキャリアーガスとして還元性ガス、例
えばH2ガス、COガス、RXガス等を、該金属蒸気の
濃度境界層を充分に薄くする或は実質的に破壊するに足
る量供給するように構成されている。処理室で粉粒体を
真空雰囲気下に加熱処理すると、粉粒体から亜鉛や鉛等
の金属の蒸気が発生するので、粉粒体の回りからかかる
金属蒸気をキャリアーガスとして供給した還元性ガスに
同伴させて、粉粒体の回りの金属蒸気の濃度を低くし、
すなわち金属蒸気の分圧を低くし、粉粒体からのかかる
金属の蒸発を促進させるのであるが、一般に粉粒体から
の金属の蒸発は、粉粒体の回りに形成される金属蒸気の
濃度境界層によって大きな影響を受け、濃度境界層が厚
いと、粉粒体からの金属の蒸発がそれだけ遅くなり、逆
に濃度境界層が薄いと、粉粒体からの金属の蒸発がそれ
だけ速くなるので、粉粒体の回りに形成される金属蒸気
の濃度境界層を充分に薄くする或は実質的に破壊するに
足る量の還元性ガスを供給する。
According to the present invention, a reducing gas such as H 2 gas, CO gas, RX gas or the like is used as a carrier gas for metal vapor generated from the granular material in the processing chamber of the container, and the concentration boundary layer of the metal vapor is sufficiently increased. And is configured to provide an amount sufficient to make it thin or substantially destroyed. When the powder is heat-treated in a vacuum atmosphere in a processing chamber, a metal vapor such as zinc or lead is generated from the powder. The reducing gas supplied as a carrier gas from the metal vapor around the powder is used as a carrier gas. To lower the concentration of metal vapor around the granules,
That is, the partial pressure of the metal vapor is lowered to promote the evaporation of the metal from the granular material. Generally, the evaporation of the metal from the granular material depends on the concentration of the metal vapor formed around the granular material. It is greatly influenced by the boundary layer, and when the concentration boundary layer is thick, the evaporation of the metal from the granular material becomes slower, and conversely, when the concentration boundary layer is thin, the evaporation of the metal from the granular material becomes faster. Supply sufficient reducing gas to sufficiently thin or substantially destroy the concentration boundary layer of the metal vapor formed around the granules.

【0007】粉粒体の回りに形成される金属蒸気の濃度
境界層を充分に薄くし易くする或は実質的に破壊し易く
するためには、処理室において粉粒体の各部に還元性ガ
スを供給するのが好ましく、或はまた処理室において粉
粒体を撹拌するのが好ましいが、なかでも処理室におい
て粉粒体を薄く広げて撹拌した状態とするのが好まし
く、特に薄く広げて撹拌した状態の粉粒体に向かって還
元性ガスを供給するのが好ましい。
[0007] In order to make the concentration boundary layer of the metal vapor formed around the granular material easy to be sufficiently thin or to be substantially broken, reducing gas is added to each part of the granular material in the processing chamber. Is preferably supplied, or the granules are preferably agitated in the processing chamber, but it is particularly preferable that the granules are spread thinly and stirred in the processing chamber. It is preferable to supply the reducing gas toward the powdery particles in the state in which the particles are kept.

【0008】したがって本発明では、処理室に還元性ガ
ス供給管を挿入し、該還元性ガス供給管に複数のノズル
を取付けて、該ノズルから処理室内の粉粒体中へ還元性
ガスを供給するのが好ましく、この場合、処理室内の粉
粒体を撹拌するのがより好ましい。また本発明では、処
理室に複数のプレートを所定間隔を空けて多段に配置
し、該プレートのそれぞれ上面に近接して撹拌用部材及
び移送用部材を回転可能に配置して、最上段のプレート
に供給した粉粒体を該撹拌用部材により撹拌し、併せて
該移送用部材により薄く広げつつ順次下段のプレートへ
と落下させて連続的に加熱処理するのが好ましく、この
場合、処理室に還元性ガス供給管を挿入し、該還元性ガ
ス供給管に複数のノズルを取付けて、該ノズルから各プ
レート上の粉粒体に向かって還元性ガスを供給するのが
好ましい。
Therefore, according to the present invention, a reducing gas supply pipe is inserted into the processing chamber, a plurality of nozzles are attached to the reducing gas supply pipe, and the reducing gas is supplied from the nozzles into the particles in the processing chamber. Preferably, in this case, it is more preferable to stir the granules in the processing chamber. Further, in the present invention, a plurality of plates are arranged in the processing chamber in multiple stages at predetermined intervals, and the stirring member and the transfer member are rotatably arranged near the upper surface of each of the plates, and the uppermost plate It is preferable to stir the powder and granules supplied to the stirring member by the stirring member, and simultaneously spread the thinner and thinner by the transfer member and successively drop it to the lower plate to perform a continuous heat treatment. It is preferable that a reducing gas supply pipe is inserted, a plurality of nozzles are attached to the reducing gas supply pipe, and the reducing gas is supplied from the nozzles toward the particles on each plate.

【0009】更に本発明では、還元性ガスの処理室への
供給及び処理室からの排気を一定に保ち、処理室内の圧
力を一定に保つこともできるが、還元性ガスの処理室へ
の供給若しくは処理室からの排気を断続的に調節し、処
理室内の圧力を繰り返し変動させるのが好ましい。粉粒
体相互間にこもる金属蒸気を強制的に還元性ガスに同伴
させて回収できるからである。
Further, in the present invention, the supply of the reducing gas to the processing chamber and the exhaust from the processing chamber can be kept constant, and the pressure in the processing chamber can be kept constant. Alternatively, the pressure in the processing chamber is preferably repeatedly changed by intermittently adjusting exhaust gas from the processing chamber. This is because the metal vapor trapped between the powders can be forcibly entrained in the reducing gas and recovered.

【0010】[0010]

【発明の実施の形態】図1は本発明に係る真空熱処理装
置を一部縦断面で例示する全体図である。密閉系の容器
11に断熱材11aが内張りされており、断熱材11a
で囲まれて処理室21が形成されていて、処理室21に
チューブヒータ31が挿入されている。容器11の上面
には処理室21と連通する粉粒体供給管41が接続され
ており、粉粒体供給管41にバルブ41aが介装されて
いる。容器11の左側面上部には還元性ガス供給管51
が接続されており、還元性ガス供給管51は処理室21
の中央部を通って下部へと挿入されていて、挿入された
還元性ガス供給管51に長さの異なる複数のノズル51
bが取付けられている。還元性ガス供給管51にはバル
ブ51aが介装されており、還元性ガス供給管51の上
流側に図示しない還元性ガス供給源が接続されている。
容器11の右側面上部には処理室21と連通する排気管
61が接続されており、排気管61にバルブ61aが介
装されている。排気管61の下流側には凝縮器71が接
続されており、凝縮器71の下流側に真空ポンプ81が
接続されている。
DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 is an overall view partially illustrating a vacuum heat treatment apparatus according to the present invention in a longitudinal section. A heat insulating material 11a is lined with a closed system container 11, and the heat insulating material 11a
, A processing chamber 21 is formed, and a tube heater 31 is inserted into the processing chamber 21. A powder supply pipe 41 communicating with the processing chamber 21 is connected to the upper surface of the container 11, and a valve 41 a is interposed in the powder supply pipe 41. A reducing gas supply pipe 51 is provided on the upper left side of the container 11.
Is connected, and the reducing gas supply pipe 51 is connected to the processing chamber 21.
Are inserted into the lower part through the center of the nozzle, and a plurality of nozzles 51 having different lengths are inserted into the inserted reducing gas supply pipe 51.
b is attached. A valve 51 a is interposed in the reducing gas supply pipe 51, and a reducing gas supply source (not shown) is connected upstream of the reducing gas supply pipe 51.
An exhaust pipe 61 communicating with the processing chamber 21 is connected to an upper right portion of the container 11, and a valve 61 a is interposed in the exhaust pipe 61. A condenser 71 is connected downstream of the exhaust pipe 61, and a vacuum pump 81 is connected downstream of the condenser 71.

【0011】図2は本発明に係る他の真空熱処理装置を
一部縦断面で例示する全体図である。全体として円筒状
に形成された密閉系の容器12に断熱材12aが内張り
されており、断熱材12aで囲まれて処理室22が形成
されていて、断熱材12aの内側にパネルヒータ32が
周設されている。容器12の上面には処理室22と連通
する粉粒体供給管42が接続されており、粉粒体供給管
42にバルブ42aが介装されている。容器12の下部
には軸線部に向かって下降する傾斜面が形成されてお
り、該傾斜面の下端部に処理室22と連通する出口22
aが開設されている。出口22aには軸線部に向かって
上昇する傾斜面の形成された排出管13が接続されてお
り、排出管13にバルブ13aが介装されている。排出
管13の大径に形成された部分の右側面上部には排気管
63が接続されており、排気管63の下流側はバルブ6
3aを介して真空ポンプ82へと接続されている。
FIG. 2 is an overall view partially exemplifying another vacuum heat treatment apparatus according to the present invention in a longitudinal section. A heat insulating material 12a is lined in a closed container 12 formed as a whole in a cylindrical shape, and a processing chamber 22 is formed surrounded by the heat insulating material 12a. A panel heater 32 is provided inside the heat insulating material 12a. Has been established. A powder supply pipe 42 communicating with the processing chamber 22 is connected to the upper surface of the container 12, and a valve 42 a is interposed in the powder supply pipe 42. An inclined surface descending toward the axis is formed at a lower portion of the container 12, and an outlet 22 communicating with the processing chamber 22 is provided at a lower end of the inclined surface.
a has been established. The outlet 22a is connected to a discharge pipe 13 having an inclined surface rising toward the axis, and the discharge pipe 13 is provided with a valve 13a. An exhaust pipe 63 is connected to the upper part on the right side of the large-diameter portion of the exhaust pipe 13, and a downstream side of the exhaust pipe 63 is a valve 6.
It is connected to a vacuum pump 82 via 3a.

【0012】容器12の右側面上部には処理室22と連
通する排気管62が接続されており、排気管62にバル
ブ62aが介装されている。排気管62の下流側には凝
縮器72が接続されており、凝縮器72の下流側に真空
ポンプ82が接続されている。そして容器12の下部傾
斜面には還元性ガス供給管52が接続されており、還元
性ガス供給管52は処理室22の側部を通って上部へと
挿入されていて、挿入された還元性ガス供給管52に複
数のノズル52bが取付けられている。還元性ガス供給
管52にはバルブ52aが介装されており、還元性ガス
供給管52の上流側に図示しない還元性ガス供給源が接
続されている。
An exhaust pipe 62 communicating with the processing chamber 22 is connected to an upper portion on the right side of the container 12, and the exhaust pipe 62 is provided with a valve 62a. A condenser 72 is connected downstream of the exhaust pipe 62, and a vacuum pump 82 is connected downstream of the condenser 72. A reducing gas supply pipe 52 is connected to the lower inclined surface of the container 12, and the reducing gas supply pipe 52 is inserted upward through the side of the processing chamber 22, and the inserted reducing gas A plurality of nozzles 52b are attached to the gas supply pipe 52. A valve 52a is interposed in the reducing gas supply pipe 52, and a reducing gas supply source (not shown) is connected upstream of the reducing gas supply pipe 52.

【0013】処理室22には軸線部に回転筒91が挿入
されており、回転筒91に複数の板状の羽根92が取付
けられている。回転筒91は容器12に軸受されてお
り、その上部は容器12外に取出されていて、駆動モー
タ93に接続されている。回転筒91には昇降軸94が
貫挿されており、その上部は回転筒91外に取出されて
いて、シリンダ機構95に接続されている。昇降軸94
の下部は出口41を通って排出管13へと至り、その端
部に軸線部に向かって上昇する傾斜面の形成された弁9
6が取付けられている。昇降軸94が上昇すると、弁9
6の傾斜面が排出管13の傾斜面に密接して出口22a
を閉じ、逆に昇降軸94が下降すると、弁96の傾斜面
が排出管13の傾斜面から離れて出口22aを開く構成
である。
A rotary cylinder 91 is inserted into the processing chamber 22 along the axis thereof, and a plurality of plate-like blades 92 are mounted on the rotary cylinder 91. The rotating cylinder 91 is supported by the container 12, and the upper part thereof is taken out of the container 12 and connected to a drive motor 93. An elevating shaft 94 is inserted through the rotating cylinder 91, and the upper part thereof is taken out of the rotating cylinder 91 and connected to a cylinder mechanism 95. Elevating shaft 94
The lower part of the valve 9 reaches the discharge pipe 13 through the outlet 41, and the valve 9 having an inclined surface formed at the end thereof rising toward the axis.
6 are attached. When the lifting shaft 94 moves up, the valve 9
6 is close to the inclined surface of the discharge pipe 13 and the outlet 22a
Is closed, and when the elevating shaft 94 descends, the inclined surface of the valve 96 is separated from the inclined surface of the discharge pipe 13 to open the outlet 22a.

【0014】図3は本発明に係る更に他の真空熱処理装
置を一部縦断面で例示する全体図、図4は図3と同じ真
空熱処理装置の内部構造を示す部分拡大縦断面図、図5
は図3と同じ真空熱処理装置の内部構造を示す部分拡大
横断面図、図6は図3と同じ真空熱処理装置の内部構造
を別の角度から示す部分拡大縦断面図である。図3にお
いて、全体として円筒状の密閉系の容器14に断熱材1
4aが内張りされており、容器14内には断熱材14a
で囲まれて処理室23が形成されていて、処理室23に
チューブヒータ33が装備されている。容器14の軸線
部には断熱材14a及び処理室23を貫通して回転軸1
10が装架されており、回転軸110は容器14に取付
けられた駆動モータ110aの図示しない駆動軸に接続
されている。
FIG. 3 is an overall view partially illustrating a further example of a vacuum heat treatment apparatus according to the present invention in a longitudinal section, FIG. 4 is a partially enlarged longitudinal sectional view showing the internal structure of the same vacuum heat treatment apparatus as FIG.
3 is a partially enlarged horizontal sectional view showing the internal structure of the same vacuum heat treatment apparatus as FIG. 3, and FIG. 6 is a partially enlarged vertical sectional view showing the internal structure of the same vacuum heat treatment apparatus as FIG. In FIG. 3, a heat insulating material 1 is placed in a closed container 14 having a cylindrical shape as a whole.
4a is lined, and a heat insulating material 14a
A processing chamber 23 is formed, and a tube heater 33 is provided in the processing chamber 23. The axis of the container 14 passes through the heat insulating material 14a and the processing chamber 23, and the rotating shaft 1
The rotation shaft 110 is connected to a drive shaft (not shown) of a drive motor 110 a attached to the container 14.

【0015】処理室23には上下方向に合計9段でプレ
ート111〜119が所定間隔を空けて配置されてお
り、プレート111〜119は同一径を有する円板状に
形成されていて、その軸線部で回転軸110に軸受され
ている。同一径を有する円板状のプレート111〜11
9は同一軸線回りに配置されているのである。プレート
111〜119の周縁にはリング状の壁片111a,1
14a,119a,・・・が立設されており、壁片11
1a,114a,119a,・・・は容器14の上下方
向に装架された棒材110bに取付けられている。した
がってプレート111〜119は回転軸110に支持さ
れているが、回転軸110が回転してもそれ自体は回転
しない。
In the processing chamber 23, plates 111 to 119 are arranged at predetermined intervals in a total of nine stages in the vertical direction. The plates 111 to 119 are formed in a disc shape having the same diameter, The bearing is mounted on the rotating shaft 110 at the portion. Disc-shaped plates 111 to 11 having the same diameter
9 are arranged around the same axis. On the periphery of the plates 111 to 119, ring-shaped wall pieces 111a, 1
, And the wall piece 11 is provided.
.. Are attached to a bar 110b mounted in the vertical direction of the container 14. Therefore, the plates 111 to 119 are supported by the rotating shaft 110, but do not rotate when the rotating shaft 110 rotates.

【0016】プレート111〜119には開口部111
b,114b,119b,・・・がその半径方向に沿う
スリット状に設けられている。開口部111b,114
b,119b,・・・は最上段のプレート111から最
下段のプレート119へと向かって順次、回転軸110
の回転方向とは逆方向へずれた位置に設けられている。
図4及び図5において、回転軸110は平面から見て右
回りで回転するが、最上段のプレート111の開口部1
11bはプレート111を臨む粉粒体供給管43の直下
よりも左回りの位置に設けられており、第2段のプレー
ト112の図示しない開口部は最上段のプレート111
の開口部111bよりも更に左回りの位置に設けられて
いる。以下同様にして、第3段のプレート113から最
下段のプレート119へと、これらの開口部は順次左回
りのずれた位置に設けられているが、これらのうちで第
4段のプレート114の開口部114bは最も右側に設
けられており、また最下段のプレート119の開口部1
19bは最も左側に設けられていて、開口部119bは
ロート状に形成された排出シュート23aの直上に位置
している。
The openings 111 are provided in the plates 111 to 119.
, 114b, 119b, ... are provided in a slit shape along the radial direction. Openings 111b, 114
, are sequentially arranged from the uppermost plate 111 to the lowermost plate 119.
Is provided at a position deviated in the direction opposite to the rotation direction of the.
4 and 5, the rotation shaft 110 rotates clockwise when viewed from the plane, but the opening 1
11 b is provided at a position counterclockwise from immediately below the granular material supply pipe 43 facing the plate 111, and the opening (not shown) of the second stage plate 112 is
The opening 111b is located further counterclockwise than the opening 111b. Similarly, from the third stage plate 113 to the lowermost stage plate 119, these openings are sequentially provided at leftwardly shifted positions. Of these, the fourth stage plate 114 is provided. The opening 114b is provided on the rightmost side, and the opening 1b of the lowermost plate 119 is formed.
19b is provided on the leftmost side, and the opening 119b is located immediately above the discharge chute 23a formed in a funnel shape.

【0017】図4〜図6において、プレート111,1
14,119,・・・の上面にはこれらに近接してそれ
ぞれ複数の突起棒を有する2本の櫛状物を備える撹拌用
部材121,124,129,・・・が配置されてお
り、また撹拌用部材121,124,129,・・・よ
りもやや右回りの位置にそれぞれ2枚の羽根を備える移
送用部材131,134,139,・・・が配置されて
いる。撹拌用部材121,124,129,・・・及び
移送用部材131,134,139,・・・は回転軸1
10に取付けられており、これらは回転軸110と一体
的に回転するようになっている。例えば、回転軸110
を正逆方向へ回転させつつ全体としては間欠的に正方向
へ回転させると、すなわち回転軸110を右回りと左回
りとで交互に回転させつつ全体としては間欠的に右回り
で回転させると、撹拌用部材121,124,129,
・・・及び移送用部材131,134,139,・・・
も正逆方向へ回転しつつ全体としては間欠的に正方向へ
回転する、すなわち撹拌用部材121,124,12
9,・・・及び移送用部材131,134,139,・
・・も右回りと左回りとで交互に回転しつつ全体として
は間欠的に右回りで回転するのである。
4 to 6, the plates 111, 1
Are arranged on the upper surfaces of 14, 119,... Provided with two comb-like objects each having a plurality of projecting bars in close proximity to them. The transfer members 131, 134, 139,... Each having two blades are disposed at a position slightly clockwise from the stirring members 121, 124, 129,. The stirring members 121, 124, 129,... And the transfer members 131, 134, 139,.
10, which rotate integrally with the rotating shaft 110. For example, the rotating shaft 110
Is rotated intermittently in the forward direction as a whole while rotating in the forward and reverse directions, that is, as the whole is intermittently rotated clockwise while the rotation shaft 110 is alternately rotated clockwise and counterclockwise. , Stirring members 121, 124, 129,
... and transfer members 131, 134, 139, ...
Also intermittently rotate in the forward direction as a whole while rotating in the forward and reverse directions, ie, the stirring members 121, 124, 12
9, and the transfer members 131, 134, 139,.
・ ・ Also intermittently rotate clockwise as a whole while rotating clockwise and counterclockwise alternately.

【0018】処理室23には最上段のプレート111を
直下に臨んで粉粒体供給管43が挿入されており、バル
ブ43aを介装する粉粒体供給管43はホッパ15へと
接続されていて、ホッパ15の上流側にはバルブ15a
を介装する粉粒体供給管15bが接続されている。ホッ
パ15の右側面上部には排気管66が接続されており、
排気管66にはバルブ66aが介装されていて、排気管
66の下流側は真空ポンプ83へと接続されている。ま
た処理室23には最下段のプレート119の開口部11
9bを直上に臨んでロート状の排出シュート23aが配
置されている。排出シュート23aにはバルブ23bを
介装する排出管23cが接続されており、排出管23c
はホッパ16へと接続されていて、ホッパ16の下流側
にはバルブ16aを介装する排出管16bが接続されて
いる。ホッパ16の右側面上部には排気管65が接続さ
れており、排気管65にはバルブ65aが介装されてい
て、排気管65の下流側は真空ポンプ83へと接続され
ている。
A powder supply pipe 43 is inserted into the processing chamber 23 so as to face the uppermost plate 111 directly below. The powder supply pipe 43 provided with a valve 43 a is connected to the hopper 15. The valve 15a is located upstream of the hopper 15.
Is connected to the powder supply pipe 15b. An exhaust pipe 66 is connected to the upper right side of the hopper 15.
The exhaust pipe 66 is provided with a valve 66a, and the downstream side of the exhaust pipe 66 is connected to a vacuum pump 83. The processing chamber 23 has an opening 11 of the lowermost plate 119.
A funnel-shaped discharge chute 23a is arranged facing 9b directly above. The discharge chute 23a is connected to a discharge pipe 23c having a valve 23b interposed therebetween.
Is connected to a hopper 16, and a discharge pipe 16b provided with a valve 16a is connected downstream of the hopper 16. An exhaust pipe 65 is connected to the upper right side of the hopper 16, and a valve 65 a is interposed in the exhaust pipe 65, and the downstream side of the exhaust pipe 65 is connected to a vacuum pump 83.

【0019】容器14の右側面上部には処理室23と連
通する排気管64が接続されており、排気管64にはバ
ルブ64aが介装されている。排気管64の下流側には
凝縮器73が接続されており、凝縮器73の下流側に真
空ポンプ83が接続されている。そして処理室23には
還元性ガス供給管53が挿入されており、挿入された還
元性ガス供給管53には複数のノズル53bが取付けら
れていて、これらのノズル53bはそれぞれプレート1
11〜119の上面を向いている。還元性ガス供給管5
3にはバルブ53aが介装されており、還元性ガス供給
管53の上流側に図示しない還元性ガス供給源が接続さ
れている。
An upper portion of the right side of the container 14 is connected to an exhaust pipe 64 communicating with the processing chamber 23. The exhaust pipe 64 is provided with a valve 64a. A condenser 73 is connected downstream of the exhaust pipe 64, and a vacuum pump 83 is connected downstream of the condenser 73. A reducing gas supply pipe 53 is inserted into the processing chamber 23, and a plurality of nozzles 53b are attached to the inserted reducing gas supply pipe 53.
11 to 119. Reducing gas supply pipe 5
3 is provided with a valve 53 a, and a reducing gas supply source (not shown) is connected upstream of the reducing gas supply pipe 53.

【0020】図3〜図6について説明した本発明に係る
真空熱処理装置を用い、粉粒体を真空雰囲気下に加熱処
理して該粉粒体から有価金属を回収する場合について説
明する。バルブ15aを開き、バルブ43aを閉じた状
態で、ホッパ15に粉粒体を投入する。バルブ15a,
43a,16aを閉じ、バルブ66a,23b,65a
を開いた状態で、真空ポンプ83を作動させ、処理室2
3内及びホッパ15,16内を真空雰囲気にすると共
に、駆動モータ110a及びチューブヒータ33を作動
させる。処理室23内が所定温度になったとき、バルブ
43aを開いて、ホッパ15から最上段のプレート11
1へと粉粒体を落下させると共に、バルブ53aを開い
て、還元性ガス供給管53を介し複数のノズル53bか
ら還元性ガスを供給する。落下した粉粒体はプレート1
11上において撹拌用部材121により撹拌され同時に
移送用部材131により薄く広げられつつ押し出され
て、プレート111の開口部111bから第2段のプレ
ート112へと落下する。落下した粉粒体はプレート1
12上において同様に撹拌され同時に薄く広げられつつ
押し出されて、プレート112の開口部から第3段のプ
レート113へと落下する。以下同様にして粉粒体は順
次下段のプレートへと落下し、最後に最下段のプレート
119の開口部119bから排出シュート23aへと落
下する。粉粒体は合計9段のプレート111〜119の
各上面において撹拌用部材121,124,129,・
・・により繰り返して撹拌され同時に移送用部材13
1,134,139,・・・により繰り返して薄く広げ
られた状態となる。また合計9段の各プレート111〜
119上において、上記のように撹拌され同時に薄く広
げられた状態の粉粒体表面に各ノズル53bからキャリ
アーガスとして還元性ガスが供給され、これにより粉粒
体の回りに形成される金属蒸気の濃度境界層を充分に薄
くし或は実質的に破壊する。粉粒体中の亜鉛や鉛等は極
めて効率的に且つ短時間で蒸発し、これらの金属蒸気は
凝縮器73で回収されるのである。排出シュート23a
に落下する処理物は粉粒体から亜鉛や鉛等が蒸発した残
りの例えば鉄であり、この処理物はホッパ16に貯留し
た後、バルブ23bを閉じ、ホッパ16内を復圧してか
ら、バルブ16aを開いて取り出す。
A case will be described in which the granular heat treatment is performed in a vacuum atmosphere by using the vacuum heat treatment apparatus according to the present invention described with reference to FIGS. With the valve 15a opened and the valve 43a closed, the granular material is put into the hopper 15. Valve 15a,
43a, 16a are closed and valves 66a, 23b, 65a
Is opened, the vacuum pump 83 is operated, and the processing chamber 2 is opened.
The inside of the chamber 3 and the hoppers 15 and 16 are set to a vacuum atmosphere, and the drive motor 110a and the tube heater 33 are operated. When the temperature inside the processing chamber 23 reaches a predetermined temperature, the valve 43a is opened and the uppermost plate 11 is opened from the hopper 15.
1 and the valve 53 a is opened, and the reducing gas is supplied from the plurality of nozzles 53 b through the reducing gas supply pipe 53. The dropped powder is plate 1
It is agitated by the agitating member 121 on the surface 11, and at the same time, is extruded while being thinly spread by the transfer member 131, and drops from the opening 111 b of the plate 111 to the second-stage plate 112. The dropped powder is plate 1
Similarly, the mixture is extruded while being agitated and spread at the same time, and falls from the opening of the plate 112 to the third plate 113. In the same manner as described above, the granular material sequentially falls to the lower plate, and finally falls from the opening 119b of the lowermost plate 119 to the discharge chute 23a. The powdery and granular materials are agitated on the upper surfaces of the plates 111 to 119 having a total of nine steps, 121, 124, 129,.
.. Repeatedly agitated and simultaneously transferred member 13
1, 134, 139,... Are repeatedly spread thinly. In addition, a total of 9 stages of plates 111 to 11
119, a reducing gas is supplied as a carrier gas from each of the nozzles 53b to the surface of the granular material which is agitated and spread thinly at the same time as described above, whereby the metal vapor formed around the granular material is supplied. The concentration boundary layer is made sufficiently thin or substantially destroyed. Zinc, lead and the like in the powder and particles evaporate very efficiently and in a short time, and these metal vapors are collected in the condenser 73. Discharge chute 23a
The treated material that falls into the container is, for example, iron remaining after evaporating zinc, lead, and the like from the powder and granular material. After the treated material is stored in the hopper 16, the valve 23b is closed, and the pressure inside the hopper 16 is restored. Open and remove 16a.

【0021】図7は図1〜図6に示したような本発明に
係る真空熱処理装置において処理室へ還元性ガスを断続
的に供給した場合の処理室内の圧力変動を略示するグラ
フである。図7では処理室からの排気を一定に保ってい
る。図7に示すように、処理室内の圧力を繰り返し変動
させると、粉粒体相互間にこもる金属蒸気を強制的に還
元性ガスに同伴させて回収できるので、有価金属をより
効率的に回収できる。図7に示すような処理室内の圧力
変動は、処理室へ還元性ガスを断続的に供給する場合を
含め、処理室への還元性ガスの供給或は処理室からの還
元性ガスの排気を断続的に調節することによって達成で
き、かかる調節は、図1〜図3のバルブ51a,52
a,53a或はバルブ61a,62a,64aの開度を
調節することによってなし得る。
FIG. 7 is a graph schematically showing the pressure fluctuation in the processing chamber when the reducing gas is intermittently supplied to the processing chamber in the vacuum heat treatment apparatus according to the present invention as shown in FIGS. . In FIG. 7, the exhaust from the processing chamber is kept constant. As shown in FIG. 7, when the pressure in the processing chamber is repeatedly changed, the metal vapor trapped between the particles can be forcibly collected together with the reducing gas, so that the valuable metal can be recovered more efficiently. . The pressure fluctuation in the processing chamber as shown in FIG. 7 may be caused by the supply of the reducing gas to the processing chamber or the exhaust of the reducing gas from the processing chamber, including the case where the reducing gas is intermittently supplied to the processing chamber. It can be achieved by intermittent adjustments, such adjustments being made by the valves 51a, 52 of FIGS.
This can be achieved by adjusting the opening of the valves a, 53a or the valves 61a, 62a, 64a.

【0022】図3〜図6について前述した真空熱処理装
置を用い、製鋼工場の集塵装置で捕捉された亜鉛含量
7.0重量%のダストに還元材としてコークスを混合し
たものを、真空度2Torr、温度900℃、処理室内
滞留2時間で加熱処理すると、排出シュートからホッパ
に落下した処理物中の残留亜鉛含量は0.4重量%とな
った。これに対し、キャリアーガスとして還元性ガスを
供給せず、その他は同様の条件下で加熱処理すると、処
理物中の残留亜鉛含量は1.7重量%であった。
Using the vacuum heat treatment apparatus described above with reference to FIGS. 3 to 6, a mixture of coke as a reducing agent and zinc having a zinc content of 7.0% by weight captured by a dust collector at a steelmaking plant was subjected to a vacuum of 2 Torr. After heating at 900 ° C. for 2 hours in the processing chamber, the residual zinc content in the processed material dropped from the discharge chute to the hopper was 0.4% by weight. On the other hand, when a reducing gas was not supplied as a carrier gas and heat treatment was carried out under the same conditions as above, the residual zinc content in the treated product was 1.7% by weight.

【0023】[0023]

【発明の効果】既に明らかなように、以上説明した本発
明には、粉粒体から高収率且つ短時間で有価金属を回収
できるという効果がある。
As is clear from the above, the present invention described above has an effect that valuable metals can be recovered from powders and granules in high yield in a short time.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係る真空熱処理装置を一部縦断面で例
示する全体図。
FIG. 1 is an overall view partially illustrating a vacuum heat treatment apparatus according to the present invention in a longitudinal section.

【図2】本発明に係る他の真空熱処理装置を一部縦断面
で例示する全体図。
FIG. 2 is an overall view exemplifying a partial longitudinal section of another vacuum heat treatment apparatus according to the present invention.

【図3】本発明に係る更に他の真空熱処理装置を一部縦
断面で例示する全体図。
FIG. 3 is an overall view exemplifying still another vacuum heat treatment apparatus according to the present invention in a partial longitudinal section.

【図4】図3と同じ真空熱処理装置の内部構造を示す部
分拡大縦断面図。
FIG. 4 is a partially enlarged longitudinal sectional view showing the internal structure of the same vacuum heat treatment apparatus as in FIG.

【図5】図3と同じ真空熱処理装置の内部構造を示す部
分拡大横断面図。
FIG. 5 is a partially enlarged cross-sectional view showing the internal structure of the same vacuum heat treatment apparatus as in FIG.

【図6】図3と同じ真空熱処理装置の内部構造を別の角
度から示す部分拡大縦断面図。
FIG. 6 is a partially enlarged longitudinal sectional view showing the internal structure of the same vacuum heat treatment apparatus as FIG. 3 from another angle.

【図7】本発明に係る真空熱処理装置において処理室へ
還元性ガスを断続的に供給した場合の処理室内の圧力変
動を略示するグラフ。
FIG. 7 is a graph schematically showing pressure fluctuation in the processing chamber when a reducing gas is intermittently supplied to the processing chamber in the vacuum heat treatment apparatus according to the present invention.

【符号の説明】[Explanation of symbols]

11,12,14・・・容器、11a,12a,14a
・・・断熱材、21,22,23・・・処理室、31,
33・・・チューブヒータ、32・・・パネルヒータ、
51,52,53・・・還元性ガス供給管、51b,5
3b・・・ノズル、71,72,73・・・凝縮器、8
1,82,83・・・真空ポンプ、92・・・羽根、1
11〜119・・・プレート、121,124,129
・・・撹拌用部材、131,134,139・・・移送
用部材
11, 12, 14 ... container, 11a, 12a, 14a
... heat insulating material, 21, 22, 23 ... processing chamber, 31,
33: tube heater, 32: panel heater,
51, 52, 53 ... reducing gas supply pipe, 51b, 5
3b: nozzle, 71, 72, 73: condenser, 8
1, 82, 83: vacuum pump, 92: blade, 1
11 to 119: plate, 121, 124, 129
... Stirring members, 131, 134, 139 ... Transfer members

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 密閉系の容器内に形成された処理室で粉
粒体を真空雰囲気下に加熱処理し、該粉粒体から有価金
属を回収する装置であって、処理室に該粉粒体から発生
する金属蒸気のキャリアーガスとして該金属蒸気の濃度
境界層を充分に薄くする或は実質的に破壊するに足る量
の還元性ガスを供給するようにして成ることを特徴とす
る粉粒体の真空熱処理装置。
1. An apparatus for heating a granular material under a vacuum atmosphere in a processing chamber formed in a closed container to recover valuable metal from the granular material, wherein the processing chamber comprises Characterized in that a sufficient amount of reducing gas is supplied as a carrier gas for the metal vapor generated from the body so as to sufficiently thin or substantially destroy the concentration boundary layer of the metal vapor. Vacuum heat treatment equipment for body.
【請求項2】 処理室に還元性ガス供給管が挿入されて
おり、該還元性ガス供給管には複数のノズルが取付けら
れていて、該ノズルから処理室内の粉粒体中へ還元性ガ
スを供給するようにした請求項1記載の粉粒体の真空熱
処理装置。
2. A reducing gas supply pipe is inserted into the processing chamber, and a plurality of nozzles are attached to the reducing gas supply pipe, and the reducing gas is supplied from the nozzles into the particles in the processing chamber. The vacuum heat treatment apparatus for a granular material according to claim 1, wherein the powder is supplied.
【請求項3】 処理室に複数のプレートが所定間隔を空
けて多段に配置されており、該プレートのそれぞれ上面
に近接して撹拌用部材及び移送用部材が回転可能に配置
されていて、最上段のプレートに供給した粉粒体を該撹
拌用部材により撹拌し、併せて該移送用部材により薄く
広げつつ順次下段のプレートへと落下させて連続的に加
熱処理するようにした請求項1記載の粉粒体の真空熱処
理装置。
3. A plurality of plates are arranged in a multistage manner at a predetermined interval in a processing chamber, and a stirring member and a transfer member are rotatably arranged close to respective upper surfaces of the plates. 2. The powdery material supplied to the upper plate is agitated by the agitating member, and is simultaneously dropped on the lower member while being spread thinly by the transferring member, so as to be continuously heated. Vacuum heat treatment equipment for granular materials.
【請求項4】 処理室に還元性ガス供給管が挿入されて
おり、該還元性ガス供給管には複数のノズルが取付けら
れていて、該ノズルから各プレート上の粉粒体に向かっ
て還元性ガスを供給するようにした請求項3記載の粉粒
体の真空熱処理装置。
4. A reducing gas supply pipe is inserted into the processing chamber, and a plurality of nozzles are attached to the reducing gas supply pipe. The vacuum heat treatment apparatus for a granular material according to claim 3, wherein a neutral gas is supplied.
【請求項5】 還元性ガスの供給若しくは排気を断続的
に調節して処理室内の圧力を繰り返し変動させるように
した請求項1、2、3又は4記載の粉粒体の真空熱処理
装置。
5. The vacuum heat treatment apparatus for granular material according to claim 1, wherein the pressure in the processing chamber is repeatedly changed by intermittently adjusting the supply or exhaust of the reducing gas.
JP19143596A 1996-07-01 1996-07-01 Vacuum heat treating device of powder and granular material Pending JPH1017949A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19143596A JPH1017949A (en) 1996-07-01 1996-07-01 Vacuum heat treating device of powder and granular material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19143596A JPH1017949A (en) 1996-07-01 1996-07-01 Vacuum heat treating device of powder and granular material

Publications (1)

Publication Number Publication Date
JPH1017949A true JPH1017949A (en) 1998-01-20

Family

ID=16274579

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19143596A Pending JPH1017949A (en) 1996-07-01 1996-07-01 Vacuum heat treating device of powder and granular material

Country Status (1)

Country Link
JP (1) JPH1017949A (en)

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