JPH10178330A - Surface acoustic wave element - Google Patents

Surface acoustic wave element

Info

Publication number
JPH10178330A
JPH10178330A JP33681396A JP33681396A JPH10178330A JP H10178330 A JPH10178330 A JP H10178330A JP 33681396 A JP33681396 A JP 33681396A JP 33681396 A JP33681396 A JP 33681396A JP H10178330 A JPH10178330 A JP H10178330A
Authority
JP
Japan
Prior art keywords
film
thin film
piezoelectric thin
acoustic wave
surface acoustic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP33681396A
Other languages
Japanese (ja)
Inventor
Kazuyasu Suketa
和康 助田
Chikafumi Kondou
親史 近藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murata Manufacturing Co Ltd
Original Assignee
Murata Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Manufacturing Co Ltd filed Critical Murata Manufacturing Co Ltd
Priority to JP33681396A priority Critical patent/JPH10178330A/en
Publication of JPH10178330A publication Critical patent/JPH10178330A/en
Pending legal-status Critical Current

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  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)

Abstract

PROBLEM TO BE SOLVED: To prevent deterioration and alternation of piezoelectric thin film caused by external atmosphere by covering the forming area of the piezoelectric thin film with a protective member so as to perfectly isolate the piezoelectric thin film from external atmosphere to prevent the entering of moisture and foreign matters. SOLUTION: IDT electrodes 2, 3 and fetching electrodes 2a, 2b, 3a and 3b consisting of aluminum thin films are formed on one main surface of a substrate 1 and the piezoelectric thin film 5 consisting of Zno is formed by a sputtering method so as to cover the forming area of the IDT electrodes 2 and 3 from the upper side of these. Then a protective film 6 consisting of ceramics such as SiO2 , sapphire, etc., is formed by the sputtering method or a depositing method so as to cover the film 5. The film 6 is the protective member for disconnecting the film 5 from external atmosphere, is provided with an area a little larger than the outer peripheral of the film 5 so as to perfectly cover the film 5 and is formed on the substrate 1 so as to expose the tip parts of the electrodes 2a, 2b, 3a and 3b.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、絶縁性の基板上に
IDT電極を形成してなる弾性表面波素子に関し、詳し
くは、チップ状で充分な耐湿性、耐蝕性を有するベアチ
ップ実装が可能な弾性表面波素子に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface acoustic wave device having an IDT electrode formed on an insulative substrate, and more particularly, to a chip-like surface mountable chip having sufficient moisture resistance and corrosion resistance. The present invention relates to a surface acoustic wave device.

【0002】[0002]

【従来の技術】基板上に電極を形成し、その上から圧電
薄膜を形成してなる弾性表面波素子としては、図3に示
すような構造のものが知られている。図3(a)は弾性
表面波素子の平面図、図3(b)は断面図である。
2. Description of the Related Art As a surface acoustic wave device having an electrode formed on a substrate and a piezoelectric thin film formed thereon, there is known a surface acoustic wave device having a structure as shown in FIG. FIG. 3A is a plan view of the surface acoustic wave element, and FIG. 3B is a cross-sectional view.

【0003】この弾性表面波素子は、絶縁性の基板1の
一方主面上に、アルミニウム薄膜からなるIDT電極
2、3が形成され、IDT電極2、3に接続されて取出
し電極2a,2b,3a,3bが形成され、これらの上
からIDT電極2、3等を覆うように、スパッタリング
法によりZnO膜等の圧電薄膜5が形成されている。こ
の構成における圧電薄膜5は弾性表面波を伝搬する層を
形成するものであり、弾性表面波素子の特性は圧電薄膜
5の膜厚や特性に大きく影響される。
In this surface acoustic wave device, IDT electrodes 2 and 3 made of an aluminum thin film are formed on one main surface of an insulating substrate 1, and are connected to the IDT electrodes 2 and 3 to take out electrodes 2a, 2b and 2b. 3a and 3b are formed, and a piezoelectric thin film 5 such as a ZnO film is formed by a sputtering method so as to cover the IDT electrodes 2, 3 and the like from above. The piezoelectric thin film 5 in this configuration forms a layer that propagates a surface acoustic wave, and the characteristics of the surface acoustic wave element are greatly affected by the thickness and characteristics of the piezoelectric thin film 5.

【0004】従来、このような弾性表面波素子は、金属
ベースやアルミナ等のベース基板に接着剤や半田付けに
より固定し、金属ベースやベース基板に金属キャップを
接合することにより、金属ベースやベース基板と金属キ
ャップからなるパッケージ内に密封して使用されてい
る。
Conventionally, such a surface acoustic wave element has been fixed to a metal base or a base substrate such as alumina by an adhesive or soldering, and a metal cap has been joined to the metal base or the base substrate. It is used sealed in a package consisting of a substrate and a metal cap.

【0005】ところで、近年、機器の小型化、低コスト
化、実装作業の容易化等を実現するために、弾性表面波
素子をハーメチックケース等のパッケージ内に収納する
ことなく、実装基板にベアチップのまま実装する方法が
検討されている。
By the way, in recent years, in order to realize miniaturization, cost reduction, and simplification of mounting work of devices, a bare chip is mounted on a mounting board without storing the surface acoustic wave element in a package such as a hermetic case. A method of implementing it as is is under consideration.

【0006】[0006]

【発明が解決しようとする課題】しかしながら、上記従
来の弾性表面波素子をベアチップのまま使用した場合、
圧電薄膜は外部雰囲気から遮断されておらず、半田付け
実装時や使用時の外部雰囲気により圧電薄膜が劣化また
は変質して、弾性表面波素子の特性が劣化するという問
題があった。例えば、耐蝕試験、特にSO2雰囲気試験
においては、圧電薄膜が腐食し、特性の劣化が急速に進
行するという問題があった。
However, when the above conventional surface acoustic wave element is used as a bare chip,
The piezoelectric thin film is not shielded from the external atmosphere, and there is a problem that the piezoelectric thin film is deteriorated or deteriorated by the external atmosphere at the time of solder mounting or use, and the characteristics of the surface acoustic wave element are deteriorated. For example, in a corrosion resistance test, in particular, in an SO 2 atmosphere test, there is a problem that the piezoelectric thin film is corroded, and the characteristics deteriorate rapidly.

【0007】そこで、本発明の目的は、パッケージに収
納することなく、簡単な構造で必要充分な信頼性を実現
することができるベアチップ実装が可能な弾性表面波素
子を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a surface acoustic wave device which can be mounted on a bare chip and can realize necessary and sufficient reliability with a simple structure without being housed in a package.

【0008】[0008]

【課題を解決するための手段】上記目的を達成するため
に、請求項1に係る発明は、基板上にIDT電極等の電
極を形成するとともに、これら電極の上から圧電薄膜を
形成してなる弾性表面波素子において、前記圧電薄膜の
形成領域を保護部材で被覆したことを特徴とするもので
ある。
In order to achieve the above object, the invention according to claim 1 comprises forming electrodes such as IDT electrodes on a substrate and forming a piezoelectric thin film on these electrodes. In the surface acoustic wave device, a region where the piezoelectric thin film is formed is covered with a protective member.

【0009】請求項2に係る発明は、請求項1に記載の
弾性表面波素子において、前記保護部材が前記圧電薄膜
上に膜状に形成されていることを特徴とするものであ
る。
According to a second aspect of the present invention, in the surface acoustic wave device according to the first aspect, the protection member is formed in a film shape on the piezoelectric thin film.

【0010】請求項3に係る発明は、請求項1に記載の
弾性表面波素子において、前記保護部材がキャップ形状
であることを特徴とするものである。
According to a third aspect of the present invention, in the surface acoustic wave device according to the first aspect, the protection member has a cap shape.

【0011】上記の構成によれば、圧電薄膜は、保護部
材により被覆されており外部雰囲気から完全に遮断され
ているので、湿気や異物の侵入が防止され外部雰囲気に
よる圧電薄膜の劣化や変質が防止される。すなわち、パ
ッケージに収納することなく耐湿性、耐蝕性を大幅に向
上でき、よって、小型かつ簡単な構造で必要充分な信頼
性を実現でき、本発明の弾性表面波素子は、フェイスダ
ウンボンディング法によりチップのままで実装基板に表
面実装することが可能となる。
According to the above configuration, since the piezoelectric thin film is covered with the protective member and completely shielded from the external atmosphere, the invasion of moisture and foreign substances is prevented, and the deterioration and deterioration of the piezoelectric thin film due to the external atmosphere are prevented. Is prevented. In other words, moisture resistance and corrosion resistance can be greatly improved without being housed in a package, and thus sufficient and sufficient reliability can be realized with a small and simple structure. The chip can be surface-mounted on a mounting substrate as it is.

【0012】前記保護部材は膜状またはキャップ形状に
形成され、特に、保護部材を膜状に形成すれば、保護部
材をより安価に形成することができる。
The protection member is formed in a film shape or a cap shape. In particular, if the protection member is formed in a film shape, the protection member can be formed at lower cost.

【0013】[0013]

【発明の実施の形態】以下、本発明をその実施例を示す
図面に基づいて説明する。本発明の第1実施例に係る弾
性表面波素子の構造を図1に示す。図1(a)は弾性表
面波素子の平面図、図1(b)は断面図である。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described with reference to the drawings showing embodiments thereof. FIG. 1 shows the structure of a surface acoustic wave device according to a first embodiment of the present invention. FIG. 1A is a plan view of a surface acoustic wave device, and FIG. 1B is a cross-sectional view.

【0014】本実施例の弾性表面波素子は、ガラス等の
絶縁性の基板1を備え、基板1の一方主面には、アルミ
ニウム薄膜からなるIDT電極2、3、及びIDT電極
2、3に接続されて取出し電極2a,2b,3a,3b
が形成され、これらの上から取出し電極2a,2b,3
a,3bの一部を除いて、IDT電極2、3の形成領域
を覆うようにスパッタリング法によりZnOからなる圧
電薄膜5が形成されている。
The surface acoustic wave device according to the present embodiment includes an insulating substrate 1 made of glass or the like. On one main surface of the substrate 1, IDT electrodes 2 and 3 made of an aluminum thin film and IDT electrodes 2 and 3 are provided. Connected extraction electrodes 2a, 2b, 3a, 3b
Are formed, and the extraction electrodes 2a, 2b, 3
A piezoelectric thin film 5 made of ZnO is formed by a sputtering method so as to cover the region where the IDT electrodes 2 and 3 are formed except for a part of a and 3b.

【0015】IDT電極2、3は基板1の長手方向に適
宜間隔を隔てて対向して形成され、取出し電極2a,2
b,3a,3bはそれぞれのIDT電極2、3の両端か
ら基板1の長手方向の一方端部に延びてそれぞれ形成さ
れている。
The IDT electrodes 2 and 3 are formed to face each other at appropriate intervals in the longitudinal direction of the substrate 1 and take out electrodes 2a and 2a.
b, 3a, 3b are formed extending from both ends of the respective IDT electrodes 2, 3 to one end of the substrate 1 in the longitudinal direction.

【0016】この構成における圧電薄膜5は弾性表面波
を伝搬する層を形成するものであり、IDT電極2、3
や表面波伝搬路等の弾性表面波素子の機能上の主要部を
覆うように形成されており、弾性表面波素子の特性は圧
電薄膜5の膜厚や特性に大きく影響される。
The piezoelectric thin film 5 in this configuration forms a layer that propagates a surface acoustic wave.
The surface acoustic wave element is formed so as to cover a major part of the surface acoustic wave element such as a surface acoustic wave propagation path and the like, and the characteristics of the surface acoustic wave element are greatly affected by the thickness and characteristics of the piezoelectric thin film 5.

【0017】そして、本実施例の弾性表面波素子におい
ては、圧電薄膜5の形成領域を覆うようにSiO2やサ
ファイヤ等のセラミックスからなる保護膜6がスパッタ
リング法あるいは蒸着法により形成されている。保護膜
6は、圧電薄膜5を外部雰囲気から遮断するための保護
部材として機能するものであり、圧電薄膜5を完全に覆
うように圧電薄膜5の外周よりもやや大きめの面積で、
かつ取出し電極2a,2b,3a,3bの端部を露出す
るように基板1上に形成されている。
In the surface acoustic wave device according to the present embodiment, a protective film 6 made of ceramics such as SiO 2 or sapphire is formed by a sputtering method or a vapor deposition method so as to cover a region where the piezoelectric thin film 5 is formed. The protective film 6 functions as a protective member for shielding the piezoelectric thin film 5 from the external atmosphere, and has an area slightly larger than the outer periphery of the piezoelectric thin film 5 so as to completely cover the piezoelectric thin film 5.
Further, it is formed on the substrate 1 so as to expose the ends of the extraction electrodes 2a, 2b, 3a, 3b.

【0018】なお、本実施例では、基板1は約800μ
m、IDT電極2、3は約10μm、圧電薄膜5は約2
5μm、保護膜6は約0.8μmの厚みで形成されてい
る。この保護膜6の厚みや材料等は、要求される耐湿
性、耐食性等の信頼性の要求値により適宜設定される。
In this embodiment, the substrate 1 has a thickness of about 800 μm.
m, IDT electrodes 2 and 3 are about 10 μm, and piezoelectric thin film 5 is about 2 μm.
The protective film 6 is formed with a thickness of about 0.8 μm. The thickness, material, and the like of the protective film 6 are appropriately set according to the required values of reliability such as required moisture resistance and corrosion resistance.

【0019】本実施例の弾性表面波素子では、基板1上
に形成された圧電薄膜5が全て保護膜6で被覆されてお
り、この保護膜6により圧電薄膜5は外部雰囲気から完
全に遮断されているので、圧電薄膜5の耐湿性、耐蝕性
は大幅に向上され、外部雰囲気による圧電薄膜の劣化や
変質が防止される。すなわち、保護膜6によって必要充
分な信頼性が確保されているので、保護膜6以外にパッ
ケージ等の外装部品を設ける必要がない。
In the surface acoustic wave device of this embodiment, the piezoelectric thin film 5 formed on the substrate 1 is entirely covered with the protective film 6, and the piezoelectric thin film 5 is completely shielded from the external atmosphere by the protective film 6. Therefore, the moisture resistance and corrosion resistance of the piezoelectric thin film 5 are greatly improved, and the deterioration and deterioration of the piezoelectric thin film due to an external atmosphere are prevented. That is, since the necessary and sufficient reliability is secured by the protective film 6, it is not necessary to provide an exterior component such as a package other than the protective film 6.

【0020】このような弾性表面波素子は一般に母基板
に多数の素子を形成した後、切断により個々の素子に分
割して形成されるので、本実施例のように保護部材を膜
状に形成すれば、上記のようにスパッタリング、蒸着あ
るいは印刷等により多数の素子に同時に一括して保護膜
を形成することができ、保護部材を安価に形成すること
ができる。
Since such a surface acoustic wave device is generally formed by forming a large number of devices on a mother substrate and then dividing the device into individual devices by cutting, the protective member is formed in a film shape as in this embodiment. Then, as described above, a protective film can be simultaneously formed on a large number of elements simultaneously by sputtering, vapor deposition, printing, or the like, and the protective member can be formed at low cost.

【0021】さらに、本実施例の弾性表面波素子では、
取出し電極2a,2b,3a,3bの露出した部分に、
例えば、はんだバンプを形成し、フェイスダウンボンデ
ィングによって実装基板に表面実装することができる。
すなわち、本実施例の弾性表面波素子は、いわゆるベア
チップのままで実装基板に実装することができる。
Further, in the surface acoustic wave device of this embodiment,
In the exposed portions of the extraction electrodes 2a, 2b, 3a, 3b,
For example, it is possible to form a solder bump and perform surface mounting on a mounting substrate by face-down bonding.
That is, the surface acoustic wave device of the present embodiment can be mounted on a mounting board as it is as a so-called bare chip.

【0022】また、保護膜が形成された面を上にしてダ
イボンディングし、各取出し電極と実装基板の電極とを
ワイヤボンディングして実装するようにしてもよい。
Alternatively, die bonding may be performed with the surface on which the protective film is formed facing upward, and each extraction electrode and the electrode of the mounting substrate may be mounted by wire bonding.

【0023】なお、保護膜は上記実施例に限るものでは
なく、保護膜としてポリイミド等の耐蝕性、耐湿性の良
好な樹脂系材料を用い、この樹脂をスクリーン印刷等に
より圧電薄膜上に形成するようにしてもよい。
Note that the protective film is not limited to the above-described embodiment, and a resin material having good corrosion resistance and moisture resistance such as polyimide is used as the protective film, and this resin is formed on the piezoelectric thin film by screen printing or the like. You may do so.

【0024】図2は、本発明の第2実施例に係る弾性表
面波素子の断面図である。本実施例の弾性表面波素子
は、圧電薄膜5の形成領域を密閉するようにして、プラ
スチックからなる箱形の保護キャップ7が接着剤8によ
り接着固定されて配置されている。保護部材として保護
膜に代えて保護キャップ7を形成したこと以外の構成に
ついては、第1実施例で説明したものと同様の構成であ
り、その説明を省略する。
FIG. 2 is a sectional view of a surface acoustic wave device according to a second embodiment of the present invention. In the surface acoustic wave element of this embodiment, a box-shaped protective cap 7 made of plastic is adhered and fixed with an adhesive 8 so as to seal the area where the piezoelectric thin film 5 is formed. Except for forming a protective cap 7 instead of a protective film as a protective member, the configuration is the same as that described in the first embodiment, and a description thereof will be omitted.

【0025】なお、保護キャップ7の高さは本実施例で
は約2mmで形成されているが、フェイスダウンで表面
実装する場合はできるだけ高さの低いものを用いるのが
好ましい。
Although the height of the protective cap 7 is about 2 mm in this embodiment, it is preferable to use a protective cap having a height as low as possible in the case of face-down surface mounting.

【0026】また、保護キャップの材料はプラスチック
に限定されるものではなく、耐湿性、耐食性、耐熱性の
良好な材料であればよい。
The material of the protective cap is not limited to plastic, but may be any material having good moisture resistance, corrosion resistance and heat resistance.

【0027】この構成においても、保護キャップ7によ
り圧電薄膜5は密閉されて外部雰囲気から完全に遮断さ
れているので、第1実施例で説明したものと同様の効果
を得ることができる。
Also in this configuration, since the piezoelectric thin film 5 is hermetically sealed by the protective cap 7 and completely shielded from the external atmosphere, the same effect as that described in the first embodiment can be obtained.

【0028】上記各実施例では、トランスバーサル型フ
ィルタの構成を例にとって説明したが、共振子型フィル
タやその他発振子等にも本発明を適用することができ
る。
In each of the above embodiments, the configuration of the transversal type filter has been described as an example. However, the present invention can be applied to a resonator type filter and other oscillators.

【0029】[0029]

【発明の効果】以上説明したように、本発明に係る弾性
表面波素子によれば、圧電薄膜は、保護膜や保護キャッ
プ等の保護部材により被覆されており外部雰囲気から完
全に遮断されているので、圧電薄膜の耐湿性、耐蝕性は
大幅に向上し、外部雰囲気による圧電薄膜の劣化を防止
することができる。
As described above, according to the surface acoustic wave device according to the present invention, the piezoelectric thin film is covered with the protective member such as the protective film and the protective cap and is completely shielded from the external atmosphere. Therefore, the moisture resistance and corrosion resistance of the piezoelectric thin film are greatly improved, and the deterioration of the piezoelectric thin film due to an external atmosphere can be prevented.

【0030】また、保護部材を膜状に形成すれば、保護
部材をより安価に形成できる。
Further, when the protective member is formed in a film shape, the protective member can be formed at lower cost.

【0031】したがって、本発明によれば、保護部材に
よって必要充分な信頼性を実現でき、パッケージ等の外
装部品を不要とし、小型、安価でかつベアチップ実装が
可能な弾性表面波素子を容易に得ることができる。
Therefore, according to the present invention, a necessary and sufficient reliability can be realized by the protection member, and no external components such as a package are required, and a small, inexpensive, surface acoustic wave element which can be mounted on a bare chip can be easily obtained. be able to.

【図面の簡単な説明】[Brief description of the drawings]

【図1】(a)は本発明の第1実施例に係る弾性表面波
素子の平面図であり、(b)はその断面図である。
FIG. 1A is a plan view of a surface acoustic wave device according to a first embodiment of the present invention, and FIG. 1B is a cross-sectional view thereof.

【図2】本発明の第2実施例に係る弾性表面波素子の断
面図である。
FIG. 2 is a sectional view of a surface acoustic wave device according to a second embodiment of the present invention.

【図3】(a)は従来の弾性表面波素子の平面図であ
り、(b)はその断面図である。
FIG. 3A is a plan view of a conventional surface acoustic wave device, and FIG. 3B is a cross-sectional view thereof.

【符号の説明】[Explanation of symbols]

1 基板 2,3 IDT 5 圧電薄膜 6 保護膜 7 保護キャップ DESCRIPTION OF SYMBOLS 1 Substrate 2, 3 IDT 5 Piezoelectric thin film 6 Protective film 7 Protective cap

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 基板上にIDT電極等の電極を形成する
とともに、これら電極の上から圧電薄膜を形成してなる
弾性表面波素子において、 前記圧電薄膜の形成領域を保護部材で被覆したことを特
徴とする弾性表面波素子。
1. A surface acoustic wave device in which electrodes such as IDT electrodes are formed on a substrate and a piezoelectric thin film is formed on these electrodes, wherein the formation region of the piezoelectric thin film is covered with a protective member. Characteristic surface acoustic wave element.
【請求項2】 前記保護部材が前記圧電薄膜上に膜状に
形成されていることを特徴とする請求項1に記載の弾性
表面波素子。
2. The surface acoustic wave device according to claim 1, wherein the protection member is formed in a film shape on the piezoelectric thin film.
【請求項3】 前記保護部材がキャップ形状であること
を特徴とする請求項1に記載の弾性表面波素子。
3. The surface acoustic wave device according to claim 1, wherein the protection member has a cap shape.
JP33681396A 1996-12-17 1996-12-17 Surface acoustic wave element Pending JPH10178330A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP33681396A JPH10178330A (en) 1996-12-17 1996-12-17 Surface acoustic wave element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33681396A JPH10178330A (en) 1996-12-17 1996-12-17 Surface acoustic wave element

Publications (1)

Publication Number Publication Date
JPH10178330A true JPH10178330A (en) 1998-06-30

Family

ID=18302925

Family Applications (1)

Application Number Title Priority Date Filing Date
JP33681396A Pending JPH10178330A (en) 1996-12-17 1996-12-17 Surface acoustic wave element

Country Status (1)

Country Link
JP (1) JPH10178330A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1043836A2 (en) * 1999-04-09 2000-10-11 Murata Manufacturing Co., Ltd. Surface acoustic wave filter
US7176903B2 (en) 2003-10-07 2007-02-13 Fujitsu Limited Piezoelectric element and touch screen utilizing the same
JP2012155832A (en) * 2011-01-07 2012-08-16 Nhk Spring Co Ltd Manufacturing method of piezoelectric element, piezoelectric element, piezoelectric actuator, and head suspension
US20120279795A1 (en) * 2010-01-20 2012-11-08 Panasonic Corporation Acoustic wave device
US8624690B2 (en) 2009-12-28 2014-01-07 Seiko Epson Corporation Surface acoustic wave device, oscillator, module apparatus
US8674790B2 (en) 2009-12-28 2014-03-18 Seiko Epson Corporation Surface acoustic wave device, oscillator, module apparatus

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1043836A2 (en) * 1999-04-09 2000-10-11 Murata Manufacturing Co., Ltd. Surface acoustic wave filter
US6369673B1 (en) 1999-04-09 2002-04-09 Murata Manufacturing Co., Ltd. Surface acoustic wave filter with terminal electrode coating film
EP1043836A3 (en) * 1999-04-09 2003-03-26 Murata Manufacturing Co., Ltd. Surface acoustic wave filter
US7176903B2 (en) 2003-10-07 2007-02-13 Fujitsu Limited Piezoelectric element and touch screen utilizing the same
US8624690B2 (en) 2009-12-28 2014-01-07 Seiko Epson Corporation Surface acoustic wave device, oscillator, module apparatus
US8674790B2 (en) 2009-12-28 2014-03-18 Seiko Epson Corporation Surface acoustic wave device, oscillator, module apparatus
US20120279795A1 (en) * 2010-01-20 2012-11-08 Panasonic Corporation Acoustic wave device
US9099981B2 (en) * 2010-01-20 2015-08-04 Skyworks Panasonic Filter Solutions Japan Co., Ltd. Acoustic wave device having an inorganic insulator and an organic insulator
JP2012155832A (en) * 2011-01-07 2012-08-16 Nhk Spring Co Ltd Manufacturing method of piezoelectric element, piezoelectric element, piezoelectric actuator, and head suspension

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