JPH10171104A - Production of base for positive type photosensitive planographic printing plate - Google Patents

Production of base for positive type photosensitive planographic printing plate

Info

Publication number
JPH10171104A
JPH10171104A JP33577096A JP33577096A JPH10171104A JP H10171104 A JPH10171104 A JP H10171104A JP 33577096 A JP33577096 A JP 33577096A JP 33577096 A JP33577096 A JP 33577096A JP H10171104 A JPH10171104 A JP H10171104A
Authority
JP
Japan
Prior art keywords
treatment
printing plate
support
lithographic printing
aqueous solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP33577096A
Other languages
Japanese (ja)
Inventor
Kazuyuki Nishio
和之 西尾
Takahiro Mori
孝博 森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP33577096A priority Critical patent/JPH10171104A/en
Publication of JPH10171104A publication Critical patent/JPH10171104A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a process for producing a base for a positive type photosensitive planographic printing plate capable of yielding the positive type photosensitive planographic printing plate which simultaneously satisfies a stop staining property, a photoreceptor remaining characteristic, erasability, fringe staining, sludge and printing resistance. SOLUTION: In the process for producing the positive type photosensitive planographic printing plate formed by disposing a photosensitive layer on the aluminum base subjected to an electrolytic surface roughening treatment in an aq. hydrochloric acid soln., an anodic oxidation treatment and a hydrophilicity impartation treatment in this order, the hydrophilicity impartation treatment is executed by an aq. carboxylate soln. In addition, the hydrophilicity impartation treatment by an alkaline metal silicate soln. of 3.0 to 4.0 in the molar ratio of SiO2 /M2 O (M denotes an alkaline metal) and 0.05 to 0.5wt.% in the concn. of the alkaline metal silicate before or after the execution of the hydrophilicity impartation treatment. The hydrophilicity impartation treatment by an aq. hydrophilic high-polymer soln. is otherwise executed after the hydrophilicity impartation treatment by the aq. carboxylic acid soln. described above.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、感光性平版印刷版
の支持体の製造方法に関し、詳しくはストップ汚れ、感
光体残り性、消去性、フリンジ汚れ、スラッジ、耐刷性
に優れたポジ型感光性平版印刷版が得られるようなポジ
型感光性平版印刷版の支持体の製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a support for a photosensitive lithographic printing plate, and more particularly to a positive type excellent in stop stain, photoreceptor residual property, erasability, fringe stain, sludge, and printing durability. The present invention relates to a method for producing a support for a positive photosensitive lithographic printing plate capable of obtaining a photosensitive lithographic printing plate.

【0002】[0002]

【従来の技術】従来、感光性平版印刷版に用いられる支
持体としては、印刷適性の面から親水性、保水性、感光
層との接着性に優れたものが要求され、このような観点
から通常、表面を砂目立てといわれる粗面化処理を施さ
れたアルミニウム版が用いられている。粗面化処理は、
ボール研磨、ブラシ研磨、ブラスト研磨、バフ研磨、ホ
ーニング研磨等の機械的粗面化法、また塩酸、硝酸等の
酸性電解液中で交流或いは直流によって支持体表面を電
解処理する電気化学的粗面化法等が知られている。
2. Description of the Related Art Conventionally, a support used for a photosensitive lithographic printing plate is required to be excellent in hydrophilicity, water retention and adhesion to a photosensitive layer from the viewpoint of printability. Usually, an aluminum plate subjected to a surface roughening treatment called graining is used. The surface roughening process
Mechanical surface roughening methods such as ball polishing, brush polishing, blast polishing, buff polishing, and honing polishing, and electrochemically roughening the surface of the support by AC or DC in an acidic electrolyte such as hydrochloric acid or nitric acid Chemical conversion methods are known.

【0003】このような方法で砂目立て処理したアルミ
ニウム版はそのままでは印刷適性、耐摩耗性に劣るの
で、次いで陽極酸化処理を施し、酸化皮膜を形成する。
更に、現像性能、製版性能や印刷性能を満足させる事を
目的として陽極酸化皮膜の親水化処理を行う。親水化処
理としては、米国特許第2,714,066号、第3,
181,461号、第3,280,734号、第3,9
02,734号に開示されているようなアルカリ金属シ
リケート(例えば珪酸ナトリウム水溶液)法、特公昭3
6−22063号に開示されているフッ化ジルコン酸カ
リウム、米国特許第3,276,868号、第4,15
3,461号、第4,689,272号に開示されてい
るポリビニルスルホン酸で処理する方法、特開昭56−
21126号に開示されている親水性樹脂と水溶性塩か
らなる下塗層を設ける方法、特開昭64−14090号
で開示されているカルボン酸塩からなる下塗層を設ける
方法、特開昭63−130391号で開示されている少
なくとも1つのアミノ基と、カルボキシル基及びスルホ
基から選ばれた少なくとも1つの基とを有する化合物の
無機酸塩及び有機酸塩から選ばれた少なくとも1つから
なる親水層を設ける方法、特開昭63−165183号
で開示されている少なくとも1つのアミノ基と、ホスホ
ン基又はホスホン基の塩を含む親水層を設ける方法等、
数多くの提案がなされているが、何れも印刷時に見当合
わせや休憩等でしばらく印刷機を停止した後、印刷再開
時に発生する微点状の汚れ(以下、ストップ汚れと記
す。)、感光体残り性、消去性、フリンジ汚れ、スラッ
ジ、耐刷性等を同時に満たす事はできなかった。
An aluminum plate grained by such a method is inferior in printability and abrasion resistance as it is, and is then subjected to an anodic oxidation treatment to form an oxide film.
Further, for the purpose of satisfying the developing performance, plate making performance and printing performance, the anodized film is subjected to a hydrophilic treatment. U.S. Pat. Nos. 2,714,066 and 3,
No. 181,461, No. 3,280,734, No. 3,9
No. 02,734, an alkali metal silicate (for example, sodium silicate aqueous solution) method.
Potassium fluoride zirconate disclosed in U.S. Patent No. 6,276,868;
No. 3,461,4,689,272, a method of treating with polyvinyl sulfonic acid.
JP-A-21126 discloses a method for providing an undercoat layer comprising a hydrophilic resin and a water-soluble salt, JP-A-64-14090 discloses a method for providing an undercoat layer comprising a carboxylate, No. 63-130391, which comprises at least one selected from inorganic acid salts and organic acid salts of a compound having at least one amino group and at least one group selected from a carboxyl group and a sulfo group. A method of providing a hydrophilic layer, a method of providing a hydrophilic layer containing at least one amino group and a phosphon group or a salt of a phosphon group disclosed in JP-A-63-165183,
Although many proposals have been made, in any case, after the printing press has been stopped for a while for registration or a break during printing, fine dot-like stains (hereinafter referred to as stop stains) that occur when printing is resumed, and the photosensitive member remains. , Erasability, fringe stain, sludge, printing durability, etc. could not be satisfied at the same time.

【0004】更に、粗面形状では、米国特許第4,30
1,229号ではピット径の累積度数分布と中心線平均
粗さを規定、米国特許第3,861,917号では粗面
の深さを規定、カナダ特許第955,449号では粗面
の山の高さと直径を規定、ドイツ特許第1,813,4
43号では粗面の高低差を規定、特開昭55−1322
94号では平均深さを規定、特開平5−24376号で
はピット径と径に垂直な方向の最大深さを規定等が提案
されているがこれらの形状でも、ストップ汚れ、スラッ
ジ等の改善には不十分であった。
Further, in the case of a rough surface, US Pat.
No. 1,229 specifies the cumulative frequency distribution of the pit diameter and the center line average roughness, US Pat. No. 3,861,917 specifies the depth of the rough surface, and Canadian Patent No. 955,449 describes the peak of the rough surface. Height and diameter, German Patent No. 1,813,4
No. 43 specifies the height difference of a rough surface.
No. 94 specifies an average depth, and JP-A-5-24376 proposes a specification of a pit diameter and a maximum depth in a direction perpendicular to the diameter. However, even with these shapes, stop dirt and sludge can be improved. Was inadequate.

【0005】[0005]

【発明が解決しようとする課題】上記のような問題に対
して、本発明の課題は、ストップ汚れ性、感光体残り
性、消去性、フリンジ汚れ、スラッジ、耐刷性を同時に
満足させるポジ型感光性平版印刷版が得られるようなポ
ジ型平版印刷版の支持体の製造方法を提供することにあ
る。
SUMMARY OF THE INVENTION In view of the above-mentioned problems, an object of the present invention is to provide a positive type which simultaneously satisfies stop stain property, photoreceptor remaining property, erasability, fringe stain, sludge, and printing durability. It is an object of the present invention to provide a method for producing a support for a positive type lithographic printing plate capable of obtaining a photosensitive lithographic printing plate.

【0006】[0006]

【課題を解決するための手段】本発明の上記課題は、下
記手段により達成される。
The above object of the present invention is achieved by the following means.

【0007】 塩酸水溶液中での電解粗面化処理、陽
極酸化処理、親水化処理をこの順で施したアルミニウム
支持体上に感光層を設けてなるポジ型感光性平版印刷版
の支持体の製造方法において、該親水化処理がカルボン
酸塩水溶液による親水化処理を行う前又は後に、SiO
2/M2O(Mはアルカリ金属を表す)のモル比が3.0
〜4.0、アルカリ金属ケイ酸塩濃度が0.05〜0.
5wt%であるアルカリ金属ケイ酸塩水溶液による親水
化処理を行う事を特徴とするポジ型感光性平版印刷版の
支持体の製造方法。
Production of a positive photosensitive lithographic printing plate support comprising a photosensitive layer provided on an aluminum support which has been subjected to electrolytic surface roughening treatment, anodic oxidation treatment and hydrophilic treatment in an aqueous hydrochloric acid solution in this order. In the method, before or after the hydrophilization treatment is performed with an aqueous solution of a carboxylate, the hydrophilization treatment is performed using SiO 2.
The molar ratio of 2 / M 2 O (M represents an alkali metal) is 3.0
-4.0, alkali metal silicate concentration 0.05-0.4.
A method for producing a support for a positive photosensitive lithographic printing plate, characterized by performing a hydrophilization treatment with an aqueous solution of an alkali metal silicate of 5 wt%.

【0008】 塩酸水溶液中での電解粗面化処理、陽
極酸化処理、親水化処理をこの順で施したアルミニウム
支持体上に感光層を設けてなるポジ型感光性平版印刷版
の支持体の製造方法において、該親水化処理がカルボン
酸塩水溶液による親水化処理を行い、次いで親水性高分
子水溶液による親水化処理を行う事を特徴とするポジ型
感光性平版印刷版の支持体の製造方法。
Production of a positive type photosensitive lithographic printing plate support comprising a photosensitive layer provided on an aluminum support which has been subjected to electrolytic surface roughening treatment, anodic oxidation treatment and hydrophilic treatment in an aqueous hydrochloric acid solution in this order. The method for producing a support of a positive photosensitive lithographic printing plate, wherein the hydrophilic treatment is performed by a hydrophilic treatment with an aqueous solution of a carboxylate, followed by a hydrophilic treatment with an aqueous solution of a hydrophilic polymer.

【0009】以下、本発明について詳細に説明する。Hereinafter, the present invention will be described in detail.

【0010】本発明に使用されるアルミニウム支持体に
は、純アルミニウム及びアルミニウム合金よりなる支持
体が含まれる。アルミニウム合金としては種々のものが
使用でき、例えば珪素、銅、マンガン、マグネシウム、
クロム、亜鉛、鉛、ビスマス、ニッケル、チタン、ナト
リウム、鉄等の金属とアルミニウムの合金が用いられ
る。本発明に使用されるアルミニウム支持体は、組成を
特に限定するものではなく、公知、公用のものを適用す
る事ができる。好ましい素材としてはJIS規格A10
50、同1100に規定されるものである。
The aluminum support used in the present invention includes a support made of pure aluminum and an aluminum alloy. Various aluminum alloys can be used, for example, silicon, copper, manganese, magnesium,
An alloy of aluminum with a metal such as chromium, zinc, lead, bismuth, nickel, titanium, sodium and iron is used. The composition of the aluminum support used in the present invention is not particularly limited, and any known or publicly available one can be used. A preferred material is JIS A10
50 and 1100.

【0011】アルミニウム支持体は、粗面化に先立って
アルミニウム表面の圧延油を除去するために脱脂処理を
施すことが好ましい。脱脂処理としては、トリクレン、
シンナー等の溶剤を用いる脱脂処理、ケロシン、トリエ
タノール等のエマルジョンを用いたエマルジョン脱脂処
理等が用いられる。また、脱脂処理には、苛性ソーダ等
のアルカリの水溶液を用いることもできる。脱脂処理に
苛性ソーダ等のアルカリ水溶液を用いた場合、上記脱脂
処理のみでは除去できない汚れや酸化皮膜も除去するこ
とができる。脱脂処理に苛性ソーダ等のアルカリ水溶液
を用いた場合、支持体の表面にはスマットが生成するの
で、この場合には、燐酸、硝酸、硫酸、クロム酸等の
酸、又はそれらの混酸に浸漬しデスマット処理を施すこ
とが好ましい。
The aluminum support is preferably subjected to a degreasing treatment to remove rolling oil on the aluminum surface prior to roughening. As the degreasing treatment, trichlene,
A degreasing treatment using a solvent such as a thinner, an emulsion degreasing treatment using an emulsion of kerosene, triethanol, or the like is used. In the degreasing treatment, an aqueous solution of an alkali such as caustic soda can be used. When an alkaline aqueous solution such as caustic soda is used for the degreasing treatment, dirt and oxide film that cannot be removed by the above degreasing treatment alone can also be removed. When an alkaline aqueous solution such as caustic soda is used for the degreasing treatment, smut is formed on the surface of the support. In this case, the smut is immersed in an acid such as phosphoric acid, nitric acid, sulfuric acid, chromic acid, or a mixed acid thereof and desmutted. Preferably, a treatment is applied.

【0012】次に本発明の感光性平版印刷版の支持体の
製造における粗面化処理について説明する。
Next, the surface roughening treatment in the production of the photosensitive lithographic printing plate support of the present invention will be described.

【0013】本発明においては、塩酸水溶液中での電解
粗面化処理を前提条件とする。
In the present invention, it is assumed that electrolytic surface roughening treatment in an aqueous hydrochloric acid solution is a precondition.

【0014】塩酸水溶液中での電解条件は特に規定はな
いが、例えば塩酸の濃度が1〜10wt%、液温5〜5
0℃、電流密度20〜100A/dm2、電気量100
〜800C/dm2の範囲で行うことが好ましい。
The electrolysis conditions in the aqueous hydrochloric acid solution are not particularly limited. For example, the concentration of hydrochloric acid is 1 to 10% by weight, and the liquid temperature is 5 to 5%.
0 ° C., current density 20 to 100 A / dm 2 , electric quantity 100
It is preferable to carry out in the range of -800 C / dm 2 .

【0015】そして、上記塩酸水溶液による電解粗面化
処理を行った後には酸又は塩基による化学的な処理を行
う。この目的は、電解粗面化処理でできた表面に残存し
ているスマット等を取り除くためである。
After performing the electrolytic surface roughening treatment with the hydrochloric acid aqueous solution, a chemical treatment with an acid or a base is performed. The purpose is to remove smut and the like remaining on the surface formed by the electrolytic surface roughening treatment.

【0016】酸としては、例えば硫酸、過硫酸、弗酸、
燐酸、硝酸、塩酸等が含まれ、塩基としては、例えば、
水酸化ナトリウム、水酸化カリウム等が含まれる。これ
らの中でもアルカリの水溶液を用いるのが好ましい。上
記処理をアルカリの水溶液で行った場合、支持体の表面
にはスマットが生成するので、この場合には、燐酸、硝
酸、硫酸、クロム酸等の酸、或いはそれらの混酸に浸漬
しデスマット処理を施すことが好ましい。
Examples of the acid include sulfuric acid, persulfuric acid, hydrofluoric acid,
Phosphoric acid, nitric acid, hydrochloric acid, etc. are included, and as the base, for example,
Sodium hydroxide, potassium hydroxide and the like are included. Among these, it is preferable to use an aqueous alkali solution. When the above treatment is performed with an aqueous alkali solution, smut is formed on the surface of the support. In this case, the substrate is immersed in an acid such as phosphoric acid, nitric acid, sulfuric acid, chromic acid, or a mixed acid thereof to be desmutted. It is preferable to apply.

【0017】陽極酸化は従来よりこの分野で行われてい
る手法で行う事ができる。具体的には、硫酸、りん酸、
クロム酸、しゅう酸、スルファミン酸或いはこれらの2
種以上を組み合わせ、水溶液中でアルミニウムに直流電
流を流してアルミニウム支持体表面に陽極酸化皮膜を形
成させる。陽極酸化の条件は使用される電解液によって
種々変化するが、一般的には電解液の濃度が1〜50w
t%、液温5〜50℃、電流密度2〜10A/dm2
電圧5〜50V、電解時間1〜100秒の範囲で0.5
〜5g/m2の酸化皮膜量とするのが適当である。ま
た、これらの陽極酸化処理で硫酸、りん酸の電解液を用
いる手法が一般的である。
The anodic oxidation can be performed by a method conventionally used in this field. Specifically, sulfuric acid, phosphoric acid,
Chromic acid, oxalic acid, sulfamic acid or their two
A combination of the above species is used, and a direct current is applied to aluminum in an aqueous solution to form an anodized film on the surface of the aluminum support. Anodizing conditions vary depending on the electrolytic solution used, but generally, the concentration of the electrolytic solution is 1 to 50 watts.
t%, liquid temperature 5 to 50 ° C., current density 2 to 10 A / dm 2 ,
Voltage 5 to 50 V, electrolysis time 1 to 100 seconds in a range of 0.5
It is appropriate to set the amount of the oxide film to 55 g / m 2 . In addition, a technique of using an electrolytic solution of sulfuric acid or phosphoric acid in these anodizing treatments is generally used.

【0018】続いて本発明の特徴であるアルミニウム陽
極酸化皮膜上に行う親水化処理について説明する。
Next, the hydrophilizing treatment performed on the aluminum anodic oxide film, which is a feature of the present invention, will be described.

【0019】本発明の効果を達成するためには カルボン酸塩水溶液による親水化処理を行う前又は
後に、SiO2/M2O(Mはアルカリ金属を表す)のモ
ル比が3.0〜4.0、アルカリ金属ケイ酸塩の濃度が
0,05〜0.5wt%である金属ケイ酸塩水溶液によ
る親水化処理を行うこと、カルボン酸塩水溶液による
親水化処理を行い、次いで親水性高分子水溶液による親
水化処理を行うことが必要である。
In order to achieve the effects of the present invention, the molar ratio of SiO 2 / M 2 O (M represents an alkali metal) is 3.0 to 4 before or after the hydrophilization treatment with an aqueous carboxylate solution. 0.0, a hydrophilization treatment with an aqueous metal silicate solution having an alkali metal silicate concentration of 0.05 to 0.5 wt%, a hydrophilization treatment with a carboxylate aqueous solution, and then a hydrophilic polymer It is necessary to perform a hydrophilization treatment with an aqueous solution.

【0020】本発明の親水化処理に用いられるカルボン
酸塩は以下の構造式(I)〜(III)を有する化合物
である。
The carboxylate used in the hydrophilization treatment of the present invention is a compound having the following structural formulas (I) to (III).

【0021】(I) (RCOO)nZ (II) R2COO−Z−OOCR3 又は (III) R4(COO)2Z 但し、R1、R2、R3はそれぞれ同一でも異なっていて
もよい水素又は1〜10個の炭素原子を有する脂肪族
基、脂環式又は芳香族基を表し、R4は炭素数0〜10
個の脂肪族基、脂環式又は芳香族基の2価の基である。
(I) (R 1 COO) n Z (II) R 2 COO-Z-OOCR 3 or (III) R 4 (COO) 2 Z where R 1 , R 2 and R 3 are the same or different. Represents hydrogen or an aliphatic group having 1 to 10 carbon atoms, an alicyclic or aromatic group, and R 4 has 0 to 10 carbon atoms.
Aliphatic groups, alicyclic or aromatic groups.

【0022】Zは水素イオン、NH4イオン、Ia族金
属イオンもしくはIIa族、VIIa族、VIII族、IIb族又
はIVb族金属から選ばれる1価又は2価のイオンであ
る。そして、nは1又は2の整数を表す。
Z is a hydrogen ion, NH 4 ion, Group Ia metal ion or monovalent or divalent ion selected from Group IIa, VIIa, VIII, IIb or IVb metal. And n represents the integer of 1 or 2.

【0023】好ましくは、以下の構造式を有する化合物
の少なくとも1つを含む親水性化合物である。
Preferably, it is a hydrophilic compound containing at least one compound having the following structural formula.

【0024】[0024]

【化1】 Embedded image

【0025】但し、R1、R2、R3はそれぞれ同一でも
異なってもよい水素又は1〜10個の炭素数を有する脂
肪族、脂環式又は芳香族基である。
However, R 1 , R 2 and R 3 are each the same or different hydrogen or an aliphatic, alicyclic or aromatic group having 1 to 10 carbon atoms.

【0026】R4は脂肪族、脂環式又は芳香族化合物か
ら誘導される2価の基であり、X1はNH4イオン又はア
ルカリ金属イオンから選ばれ(但し、X2、X3が同時に
水素であることはない)、そしてYはIIa族、VIIa
族、VII族、IIb族又はIVb族金属から選ばれる2価の
金属イオンである。
R 4 is a divalent group derived from an aliphatic, alicyclic or aromatic compound, and X 1 is selected from NH 4 ions or alkali metal ions (provided that X 2 and X 3 are simultaneously And cannot be hydrogen), and Y is group IIa, VIIa
It is a divalent metal ion selected from metals of Group IV, VII, IIb or IVb.

【0027】これらの化合物のうち本発明で用いられる
有用な化合物は、ギ酸アンモニウム、ギ酸ナトリウム、
ギ酸カリウム、ギ酸リチウム、ギ酸カルシウム、ギ酸バ
リウム、ギ酸マグネシウム、ギ酸亜鉛、ギ酸マンガン、
ギ酸ニッケル、ギ酸ストロンチウム、ギ酸鉛、酢酸アン
モニウム、酢酸ナトリウム、酢酸カリウム、酢酸リチウ
ム、酢酸カルシウム、酢酸バリウム、酢酸マグネシウ
ム、酢酸亜鉛、酢酸ニッケル、酢酸ストロンチウム、酢
酸鉛、プロピオン酸アンモニウム、プロピオン酸ナトリ
ウム、プロピオン酸カリウム、プロピオン酸リチウム、
プロピオン酸カルシウム、プロピオン酸バリウム、プロ
ピオン酸マグネシウム、プロピオン酸亜鉛、プロピオン
酸マンガン、プロピオン酸ニッケル、プロピオン酸スト
ロンチウム、プロピオン酸鉛、酪酸アンモニウム、酪酸
ナトリウム、酪酸カリウム、酪酸リチウム、酪酸カルシ
ウム、酪酸バリウム、酪酸マグネシウム、酪酸亜鉛、酪
酸マンガン、酪酸ニッケル、酪酸ストロンチウム、酪酸
鉛、蓚酸アンモニウム、蓚酸ナトリウム、蓚酸カリウ
ム、蓚酸リチウム、蓚酸カルシウム、蓚酸バリウム、蓚
酸マグネシウム、蓚酸亜鉛、蓚酸マンガン、蓚酸ニッケ
ル、蓚酸ストロンチウム、蓚酸鉛、マロン酸アンモニウ
ム、マロン酸ナトリウム、マロン酸カリウム、マロン酸
リチウム、マロン酸バリウム、マロン酸カルシウム、マ
ロン酸ニッケル、マロン酸マグネシウム、マロン酸マン
ガン、マロン酸亜鉛、マロン酸ストロンチウム、マロン
酸鉛、コハク酸アンモニウム、コハク酸ナトリウム、コ
ハク酸カリウム、コハク酸リチウム、コハク酸カルシウ
ム、コハク酸バリウム、コハク酸マグネシウム、コハク
酸亜鉛、コハク酸マンガン、コハク酸ニッケル、コハク
酸ストロンチウム、コハク鉛、グルタル酸アンモニウ
ム、グルタル酸ナトリウム、グルタル酸カリウム、グル
タル酸リチウム、グルタル酸カルシウム、グルタル酸バ
リウム、グルタル酸マグネシウム、グルタル酸亜鉛、グ
ルタル酸マンガン、グルタル酸ニッケル、グルタル酸ス
トロンチウム、グルタル酸鉛、フタル酸アンモニウム、
フタル酸ナトリウム、フタル酸カリウム、フタル酸リチ
ウム、フタル酸カルシウム、フタル酸バリウム、フタル
酸マグネシウム、フタル酸亜鉛、フタル酸マンガン、フ
タル酸ニッケル、フタル酸ストロンチウム、フタル酸鉛
などである。
Among these compounds, useful compounds used in the present invention include ammonium formate, sodium formate,
Potassium formate, lithium formate, calcium formate, barium formate, magnesium formate, zinc formate, manganese formate,
Nickel formate, strontium formate, lead formate, ammonium acetate, sodium acetate, potassium acetate, lithium acetate, calcium acetate, barium acetate, magnesium acetate, zinc acetate, nickel acetate, strontium acetate, lead acetate, ammonium propionate, sodium propionate, Potassium propionate, lithium propionate,
Calcium propionate, barium propionate, magnesium propionate, zinc propionate, manganese propionate, nickel propionate, strontium propionate, lead propionate, ammonium butyrate, sodium butyrate, potassium butyrate, lithium butyrate, calcium butyrate, barium butyrate, Magnesium butyrate, zinc butyrate, manganese butyrate, nickel butyrate, strontium butyrate, lead butyrate, ammonium oxalate, sodium oxalate, potassium oxalate, lithium oxalate, calcium oxalate, barium oxalate, magnesium oxalate, zinc oxalate, manganese oxalate, nickel oxalate, strontium oxalate , Lead oxalate, ammonium malonate, sodium malonate, potassium malonate, lithium malonate, barium malonate, calcium malonate, nickel malonate, Magnesium phosphate, manganese malonate, zinc malonate, strontium malonate, lead malonate, ammonium succinate, sodium succinate, potassium succinate, lithium succinate, calcium succinate, barium succinate, magnesium succinate, succinic acid Zinc, manganese succinate, nickel succinate, strontium succinate, lead succinate, ammonium glutarate, sodium glutarate, potassium glutarate, lithium glutarate, calcium glutarate, barium glutarate, magnesium glutarate, zinc glutarate, glutar Manganese acid, nickel glutarate, strontium glutarate, lead glutarate, ammonium phthalate,
Examples include sodium phthalate, potassium phthalate, lithium phthalate, calcium phthalate, barium phthalate, magnesium phthalate, zinc phthalate, manganese phthalate, nickel phthalate, strontium phthalate, lead phthalate, and the like.

【0028】上記のような親水性化合物を、濃度0.0
01〜10wt%、温度30℃〜95℃の水溶液として
アルミニウム支持体の浸漬に用いる。浸漬時間は1〜6
0秒の範囲が適当である。
The above hydrophilic compound is added at a concentration of 0.0
It is used for immersion of an aluminum support as an aqueous solution having a temperature of 30 to 95 ° C. at a temperature of 01 to 10% by weight. Immersion time is 1-6
A range of 0 seconds is appropriate.

【0029】カルボン酸塩水溶液の親水化処理の前又は
後に、SiO2/M2O(Mはアルカリ金属を表す)のモ
ル比が3.0〜4.0、アルカリ金属ケイ酸塩の濃度が
0.05〜0.5wt%であるアルカリ金属ケイ酸塩水
溶液による親水化処理の浸漬条件は、例えば、25℃で
のpHが9〜12であるアルカリ金属ケイ酸塩水溶液
に、20〜60℃で1〜90秒間浸漬するのが好まし
い。アルカリ金属ケイ酸塩としては、ケイ酸ナトリウ
ム、ケイ酸カリウムなどが使用される。また、pHを調
整するために水酸化物を微量添加しても良い。
Before or after the hydrophilization treatment of the carboxylate aqueous solution, the molar ratio of SiO 2 / M 2 O (M represents an alkali metal) is 3.0 to 4.0, and the concentration of the alkali metal silicate is The immersion conditions for the hydrophilization treatment with the aqueous alkali metal silicate solution of 0.05 to 0.5 wt% are, for example, the following: an alkali metal silicate aqueous solution having a pH of 9 to 12 at 25 ° C. For 1 to 90 seconds. As the alkali metal silicate, sodium silicate, potassium silicate and the like are used. Also, a small amount of hydroxide may be added to adjust the pH.

【0030】カルボン酸塩水溶液による親水化処理後に
行う親水性高分子水溶液による親水化処理に用いられる
親水性高分子は、水又は水を主体とする溶剤に溶解し、
かつ皮膜形成能を有するものから選ばれる。
The hydrophilic polymer used for the hydrophilic treatment with the aqueous hydrophilic polymer solution after the hydrophilic treatment with the aqueous carboxylate solution is dissolved in water or a solvent mainly composed of water,
In addition, it is selected from those having a film forming ability.

【0031】本発明で用いられる親水性高分子化合物
は、ポリアクリル酸、ポリアクリルアミド、ポリビニル
アルコール、ポリヒドロキシエチルアクリレート、ポリ
ビニルピロリドンなどのアクリル酸共重合体;ポリエチ
レンイミン、ジアクリルジメチルアルミニウムクロライ
ド、ポリビニルイミダゾリン、ポリアルキルアミノエチ
ルアクリレートなどのマレイン酸共重合体;またポリエ
チレングリコールポリオキシエチレン、ポリプロピレン
グリコール、エチレンジアミン、ヘキサエチレンジアミ
ン、ポリウレタン樹脂、ポリヒドロキシメチル尿素、ポ
リヒドロキシメチルメラミン樹脂、更に変性デンプン、
デキストリン、CMC(カルボキシメチルセルロー
ス)、CEC(カルボキシエチルセルロース)、ヒドロ
キシエチルセルロース、グアーガム、トラガカントガ
ム、アラビアガム、キサンタンガム、アルギン酸ソー
ダ、ゼラチンなどの水溶性高分子が挙げられる。
The hydrophilic polymer compound used in the present invention includes acrylic acid copolymers such as polyacrylic acid, polyacrylamide, polyvinyl alcohol, polyhydroxyethyl acrylate, and polyvinylpyrrolidone; polyethyleneimine, diacryldimethylaluminum chloride, polyvinyl Maleic acid copolymers such as imidazoline and polyalkylaminoethyl acrylate; polyethylene glycol polyoxyethylene, polypropylene glycol, ethylenediamine, hexaethylenediamine, polyurethane resin, polyhydroxymethylurea, polyhydroxymethylmelamine resin, and modified starch;
Water-soluble polymers such as dextrin, CMC (carboxymethylcellulose), CEC (carboxyethylcellulose), hydroxyethylcellulose, guar gum, tragacanth gum, gum arabic, xanthan gum, sodium alginate, and gelatin.

【0032】上記高分子を1wt%以下、好ましくは
0.001〜0.1wt%を含む水溶液を好ましくはp
H9以下、温度30〜95℃、浸漬時間1〜90秒間の
条件で支持体の浸漬に用いる。
An aqueous solution containing 1% by weight or less, preferably 0.001 to 0.1% by weight of the above polymer is preferably p
It is used for immersion of the support under the conditions of H9 or less, a temperature of 30 to 95 ° C, and an immersion time of 1 to 90 seconds.

【0033】本発明に用いられる感光液としては公知の
ポジ型平版印刷版用の感光液を使用することができる。
As the photosensitive liquid used in the present invention, known photosensitive liquids for positive planographic printing plates can be used.

【0034】[0034]

【実施例】以下、実施例により本発明の効果を例証す
る。
EXAMPLES The effects of the present invention will now be illustrated by examples.

【0035】実施例1 厚さ0.3mmのアルミニウム版(材質1050、調質
H16)を、85℃に保たれた10%水酸化ナトリウム
水溶液中に浸漬し、30秒間脱脂処理を行った後水洗し
た。この脱脂したアルミニウム版を、25℃に保たれた
10%硫酸水溶液中に1分間浸漬し、デスマット処理し
た後水洗した。次いでこのアルミニウム版を、1.0%
の塩酸水溶液中において、温度30℃、電流密度60A
/dm2の条件で50Hzの正弦波交流電流により30
秒間電解粗面化した。その後、60℃に保たれた10%
水酸化ナトリウム水溶液中に10秒間浸漬し、次いで2
5℃に保たれた10%硫酸水溶液中に20秒間浸漬し、
デスマット処理した後、水洗した。続いて、20%硫酸
水溶液中で温度35℃、電流密度3A/dm2の条件で
60秒間陽極酸化処理を行った。その後濃度0.05w
t%、温度95℃のシュウ酸ナトリウム水溶液に15秒
間浸漬し第一の親水化処理を行った。10秒間流水で水
洗した後、SiO2/Na2Oのモル比が3.7のケイ酸
ナトリウムを用いて濃度0.2wt%、温度30℃の水
溶液に30秒間浸漬し、第二の親水化処理を行った。1
0秒間の水洗後、80℃で5分間乾燥してアルミニウム
支持体1を得た。
Example 1 An aluminum plate (material: 1050, tempered H16) having a thickness of 0.3 mm was immersed in a 10% aqueous sodium hydroxide solution maintained at 85 ° C., subjected to a degreasing treatment for 30 seconds, and then washed with water. did. The degreased aluminum plate was immersed in a 10% sulfuric acid aqueous solution maintained at 25 ° C. for 1 minute, subjected to desmut treatment, and washed with water. Then, the aluminum plate was added 1.0%
In hydrochloric acid aqueous solution at a temperature of 30 ° C. and a current density of 60 A
/ Dm 2 and 50 Hz sine wave AC current
Electrolytic surface roughening was performed for seconds. Then, 10% kept at 60 ° C
Immerse in sodium hydroxide aqueous solution for 10 seconds, then
Immersed in a 10% sulfuric acid aqueous solution maintained at 5 ° C. for 20 seconds,
After the desmut treatment, it was washed with water. Subsequently, an anodic oxidation treatment was performed in a 20% aqueous sulfuric acid solution at a temperature of 35 ° C. and a current density of 3 A / dm 2 for 60 seconds. After that, concentration 0.05w
The sample was immersed in an aqueous solution of sodium oxalate at a temperature of 95% for 15 seconds to perform a first hydrophilic treatment. After rinsing with running water for 10 seconds, it is immersed for 30 seconds in an aqueous solution having a concentration of 0.2 wt% and a temperature of 30 ° C. for 30 seconds using sodium silicate having a molar ratio of SiO 2 / Na 2 O of 3.7 to form a second hydrophilic treatment. Processing was performed. 1
After washing with water for 0 second and drying at 80 ° C. for 5 minutes, aluminum support 1 was obtained.

【0036】次に、下記組成の感光性組成物塗布液をワ
イヤーバーを用いて塗布し、80℃で2分間乾燥し、感
光性平版印刷版を得た。このとき、感光性組成物塗布液
は乾燥重量として2.0g/m2となるようにした。
Next, a photosensitive composition coating solution having the following composition was applied using a wire bar and dried at 80 ° C. for 2 minutes to obtain a photosensitive lithographic printing plate. At this time, the photosensitive composition coating solution was adjusted to have a dry weight of 2.0 g / m 2 .

【0037】 ノボラック樹脂(フェノール/m−クレゾール/p−クレゾール のモル比が10/54/36でMwが4000) 6.70g ピロガロールアセトン樹脂(Mw:3000)とo−ナフトキノンジアジド− 5−スルホニルクロリドの縮合物(エステル化率30%) 1.50g ポリエチレングリコール#2000 0.20g ビクトリアピュアブルーBOH(保土ヶ谷化学[株]製) 0.08g 2、4−ビス(トリクロロメチル)−6−(p−メトキシスチリル) −S−トリアジン 0.15g FC−430(住友3M[株]製) 0.03g cis−1,2−シクロヘキサンジカルボン酸 0.02g メチルセロソルブ 100ml 得られた感光性平版印刷版を80cm×60cmに切断
し、光源として4kWメタルハライドランプを使用し、
8mW/cm2、60秒間照射することにより露光し
た。この露光済みの感光性平版印刷版を、市販されてい
る現像液SDR−1(コニカ[株]製)を6倍に希釈、
現像時間40秒、現像温度30℃で現像した。
Novolak resin (phenol / m-cresol / p-cresol molar ratio: 10/54/36, Mw: 4000) 6.70 g pyrogallol acetone resin (Mw: 3000) and o-naphthoquinonediazide-5-sulfonyl chloride 1.50 g Polyethylene glycol # 2000 0.20 g Victoria Pure Blue BOH (manufactured by Hodogaya Chemical Co., Ltd.) 0.08 g 2,4-bis (trichloromethyl) -6- (p- Methoxystyryl) -S-triazine 0.15 g FC-430 (manufactured by Sumitomo 3M Ltd.) 0.03 g cis-1,2-cyclohexanedicarboxylic acid 0.02 g methylcellosolve 100 ml The obtained photosensitive lithographic printing plate was 80 cm × Cut to 60cm, 4kW metal halide light as light source Using a pump
Exposure was performed by irradiating at 8 mW / cm 2 for 60 seconds. The exposed photosensitive lithographic printing plate was diluted 6 times with a commercially available developer SDR-1 (manufactured by Konica Corporation).
Development was performed at a development temperature of 30 ° C. for a development time of 40 seconds.

【0038】支持体1を用いて得られたポジ型平版印刷
版について下記方法でストップ汚れ性、感光体残り性、
消去性、フリンジ汚れ性、スラッジ、耐刷性を評価し
た。
For the positive type lithographic printing plate obtained using the support 1, stop stain property, photoreceptor remaining property,
Erasability, fringe stain, sludge, and printing durability were evaluated.

【0039】(ストップ汚れ性)耐刷性の評価と同様の
条件で印刷を行い、5000枚刷った時点でいったん印
刷機を停止し、1時間放置した後印刷を開始し、発生し
た微点状の汚れを100cm2内の個数で評価した。
(Stop smearing property) Printing was performed under the same conditions as in the evaluation of the printing durability. When the 5000 sheets had been printed, the printing press was stopped once, allowed to stand for 1 hour, and then started printing. Was evaluated by the number within 100 cm 2 .

【0040】(感光体残り性)現像処理後に支持体につ
いて、以下の様に評価を行った。
(Photoreceptor Remaining Property) After the development processing, the support was evaluated as follows.

【0041】 ○:感光体が検出されない(UV測定で基準に対する吸
光度差が0.006以下) △:僅かに感光体が検出される(UV測定で基準に対す
る吸光度差が0.015未満) ×:明らかに感光体が検出される(UV測定で基準に対
する吸光度差が0.015以上) (消去性)画像部に修正液を塗布し、一定時間経過後修
正液を水洗除去する消去作業において、上記経過時間を
10秒間〜60秒間で10秒きざみで変えた場合に何秒
間で画像部の消去が完了するかを測定し、下記の基準で
評価した。
:: No photoconductor is detected (absorbance difference with respect to reference in UV measurement is 0.006 or less) Δ: Slight photoconductor is detected (absorbance difference with reference in UV measurement is less than 0.015) ×: The photoreceptor is clearly detected (absorbance difference with respect to the reference in UV measurement is 0.015 or more). (Erasing property) In the erasing operation of applying the correcting liquid to the image area and washing the correcting liquid with water after a lapse of a certain time, When the elapsed time was changed from 10 seconds to 60 seconds in increments of 10 seconds, the number of seconds required to complete the erasure of the image area was measured, and evaluated according to the following criteria.

【0042】 A:10秒間以内 B:10秒より長く20秒間以内 C:20秒より長く30秒以内 D:30秒間より長い (フリンジ状汚れ)消去液を毛筆に含ませてステップ画
像の上に塗布し、30秒、5分、10分、15分放置後
水で洗い流して、消去部の周りの汚れを、ルーペを用い
て下記の基準で判断した。
A: within 10 seconds B: more than 10 seconds and within 20 seconds C: more than 20 seconds and within 30 seconds D: more than 30 seconds (fringe-like dirt) It was applied, left for 30 seconds, 5 minutes, 10 minutes, and 15 minutes, rinsed with water, and stains around the erased portion were determined using a loupe according to the following criteria.

【0043】 ○:フリンジ状の汚れはみられない △:ルーペを用いるとフリンジ状の汚れが認められる ×:目視でもフリンジ状の汚れが認められる (スラッジ)現像液1リットルに対し、10m2のアル
ミニウム支持体の現像処理を行い、現像液中に発生した
カスの状態を以下の様に判定した。
:: No fringe-like stains are observed. Δ: Fringe-like stains are observed using a loupe. X: Fringe-like stains are visually observed. (Sludge) 10 m 2 of 1 liter of developer The aluminum support was developed, and the state of scum generated in the developer was determined as follows.

【0044】 ○:カスが全く生じなかった △:カスが僅かに発生した ×:カスが発生した (耐刷性)得られた平版印刷版を、印刷機(三菱重工業
[株]製DAIYA1Fー1)にかけコート紙、湿し水
(東京インキ[株]製エッチ液SG−51 濃度1.5
%)、インキ(東洋インキ製造[株]製ハイプラスM紅)
を使用して印刷を行い、印刷物の画像部にインキ着肉不
良が現れるか、又は非画像部にインキが付着するまで印
刷を行い、その時の印刷枚数を耐刷性として評価した。
:: No scum was generated at all △: Scum was slightly generated ×: Scum was generated (printing durability) The obtained lithographic printing plate was printed on a printing machine (Mitsubishi Heavy Industries, Ltd.).
Coated paper, dampening solution (etch solution SG-51, Tokyo Ink Co., Ltd., concentration 1.5)
%), Ink (High Plus M Red, manufactured by Toyo Ink Manufacturing Co., Ltd.)
And printing was performed until an ink deposition defect appeared on the image portion of the printed matter or ink adhered to the non-image portion, and the number of printed sheets at that time was evaluated as printing durability.

【0045】評価結果を表1に示す。Table 1 shows the evaluation results.

【0046】実施例2 第一の親水化処理において、濃度0.1wt%、90℃
の酢酸ニッケル水溶液に15秒間浸漬した以外は実施例
1と同様にして支持体2を得た。
Example 2 In the first hydrophilization treatment, a concentration of 0.1 wt% and 90 ° C.
Support 2 was obtained in the same manner as in Example 1 except that the sample was immersed in an aqueous nickel acetate solution for 15 seconds.

【0047】支持体2を用いて得られたポジ型平版印刷
版について実施例1記載の方法でストップ汚れ性、感光
体残り性、消去性、フリンジ汚れ性、スラッジ、耐刷性
を調べたところ、表1に示した結果が得られた。
The positive type lithographic printing plate obtained using the support 2 was examined for stop stain property, photoreceptor residual property, erasability, fringe stain property, sludge, and printing durability by the method described in Example 1. The results shown in Table 1 were obtained.

【0048】実施例3 親水化処理において、ケイ酸ナトリウムによる親水化処
理後にシュウ酸ナトリウムによる親水化処理を行った以
外は実施例1と同様にして支持体3を得た。
Example 3 A support 3 was obtained in the same manner as in Example 1 except that in the hydrophilization treatment, the hydrophilization treatment with sodium silicate was performed after the hydrophilization treatment with sodium silicate.

【0049】支持体3を用いて得られたポジ型平版印刷
版について実施例1記載の評価方法でストップ汚れ性、
感光体残り性、消去性、フリンジ汚れ性、スラッジ、耐
刷性を調べたところ、表1に示した結果が得られた。
The positive lithographic printing plate obtained by using the support 3 was evaluated by the evaluation method described in Example 1 for stopping stain resistance,
When the photoreceptor remaining property, erasability, fringe stain property, sludge, and printing durability were examined, the results shown in Table 1 were obtained.

【0050】比較例1 第二の親水化処理においてSiO2/M2O比が2.5、
濃度1.5wt%のケイ酸ナトリウム水溶液を用いた以
外は実施例1と同様にして支持体4を得た。支持体4を
用いて得られたポジ型平版印刷版について実施例1記載
の評価方法でストップ汚れ性、感光体残り性、消去性、
フリンジ汚れ性、スラッジ、耐刷性を調べたところ、表
1に示した結果が得られた。
Comparative Example 1 In the second hydrophilization treatment, the SiO 2 / M 2 O ratio was 2.5,
A support 4 was obtained in the same manner as in Example 1 except that an aqueous solution of sodium silicate having a concentration of 1.5 wt% was used. The positive lithographic printing plate obtained using the support 4 was evaluated for stop smearing property, photoreceptor remaining property, erasability, and the like by the evaluation method described in Example 1.
When the fringe stain property, sludge, and printing durability were examined, the results shown in Table 1 were obtained.

【0051】比較例2 第二のケイ酸ナトリウム水溶液の親水化処理を行わなか
った以外は実施例1と同様にして支持体5を得た。
Comparative Example 2 A support 5 was obtained in the same manner as in Example 1 except that the second aqueous solution of sodium silicate was not subjected to the hydrophilic treatment.

【0052】支持体5を用いて得られたポジ型平版印刷
版について実施例1記載の評価方法でストップ汚れ性、
感光体残り性、消去性、フリンジ汚れ性、スラッジ、耐
刷性を調べたところ、表1に示した結果が得られた。
The positive lithographic printing plate obtained using the support 5 was evaluated by the evaluation method described in Example 1 for stopping stain resistance,
When the photoreceptor remaining property, erasability, fringe stain property, sludge, and printing durability were examined, the results shown in Table 1 were obtained.

【0053】比較例3 第一、第二の親水化処理を行わなかった以外は実施例1
と同様にして支持体6を得た。支持体6を用いて得られ
たポジ型平版印刷版について実施例1記載の評価方法で
ストップ汚れ性、感光体残り性、消去性、フリンジ汚れ
性、スラッジ、耐刷性を調べたところ、表1に示した結
果が得られた。
Comparative Example 3 Example 1 except that the first and second hydrophilizing treatments were not performed.
In the same manner as in the above, a support 6 was obtained. The positive lithographic printing plate obtained using the support 6 was examined for stop stain property, photoreceptor residual property, erasability, fringe stain property, sludge, and printing durability by the evaluation method described in Example 1. The results shown in FIG.

【0054】比較例4 電解粗面化処理において2.0%の硝酸水溶液を使用
し、温度30℃、電流密度100A/dm2の条件で5
0Hzの正弦波交流電流により60秒間電解を行った以
外は実施例1と同様にして支持体7を得た。
Comparative Example 4 In an electrolytic surface roughening treatment, a 2.0% aqueous nitric acid solution was used at a temperature of 30 ° C. and a current density of 100 A / dm 2.
A support 7 was obtained in the same manner as in Example 1 except that electrolysis was performed for 60 seconds with a sine wave alternating current of 0 Hz.

【0055】支持体7を用いて得られたポジ型平版印刷
版について実施例1記載の評価方法でストップ汚れ性、
感光体残り性、消去性、フリンジ汚れ性、スラッジ、耐
刷性を調べたところ、表1に示した結果が得られた。
The positive lithographic printing plate obtained by using the support 7 was evaluated by the evaluation method described in Example 1 for stopping stain resistance,
When the photoreceptor remaining property, erasability, fringe stain property, sludge, and printing durability were examined, the results shown in Table 1 were obtained.

【0056】[0056]

【表1】 [Table 1]

【0057】表1の結果から本発明の印刷版は何れもス
トップ汚れ性、感光体残り性、消去性、フリンジ汚れ
性、スラッジ、耐刷性に優れていることがわかる。
From the results shown in Table 1, it can be seen that all the printing plates of the present invention are excellent in stop stain property, photoreceptor residual property, erasability, fringe stain property, sludge, and printing durability.

【0058】実施例4 親水化処理において、濃度0.01wt%、95℃のシ
ュウ酸ニッケル水溶液に20秒間浸漬し、続いて濃度
0.01wt%、80℃のデキストリン水溶液に30秒
間浸漬した以外は実施例1と同様にして支持体8を得
た。
Example 4 In the hydrophilization treatment, the substrate was immersed in a nickel oxalate aqueous solution having a concentration of 0.01 wt% and 95 ° C. for 20 seconds, and then immersed in a 0.01 wt% aqueous dextrin solution having a concentration of 80 ° C. for 30 seconds. A support 8 was obtained in the same manner as in Example 1.

【0059】支持体8を用いて得られたポジ型平版印刷
版について実施例1記載の評価方法でストップ汚れ性、
感光体残り性、消去性、フリンジ汚れ性、スラッジ、耐
刷性を調べたところ、表2に示した結果が得られた。
The positive lithographic printing plate obtained by using the support 8 was evaluated by the evaluation method described in Example 1 for stopping stain resistance,
When the photoreceptor remaining property, erasability, fringe stain property, sludge, and printing durability were examined, the results shown in Table 2 were obtained.

【0060】実施例5 第一の親水化処理において、濃度0.05wt%、95
℃の酢酸アンモニウム水溶液に15秒間浸漬し、第二の
親水化処理において濃度0.01wt%、80℃のカル
ボキシメチルセルロース水溶液に15秒間浸漬した以外
は実施例1と同様にして支持体9を得た。
Example 5 In the first hydrophilization treatment, a concentration of 0.05 wt%
Support 9 was obtained in the same manner as in Example 1 except that the substrate was immersed in an aqueous solution of ammonium acetate at 15 ° C. for 15 seconds, and then immersed in an aqueous solution of carboxymethyl cellulose at a concentration of 0.01 wt% and 80 ° C. for 15 seconds in the second hydrophilic treatment. .

【0061】支持体9を用いて得られたポジ型平版印刷
版について実施例1記載の評価方法でストップ汚れ性、
感光体残り性、消去性、フリンジ汚れ性、スラッジ、耐
刷性を調べたところ、表2に示した結果が得られた。
The positive lithographic printing plate obtained by using the support 9 was evaluated for the stop smearing property by the evaluation method described in Example 1.
When the photoreceptor remaining property, erasability, fringe stain property, sludge, and printing durability were examined, the results shown in Table 2 were obtained.

【0062】比較例5 第一の親水化処理において濃度0.05wt%、95℃
の酢酸アンモニウム水溶液に15秒間浸漬し、第二の親
水化処理を行わなかった以外は実施例1と同様にして支
持体10を得た。
Comparative Example 5 In the first hydrophilization treatment, the concentration was 0.05 wt% and the temperature was 95 ° C.
Was immersed in an aqueous solution of ammonium acetate for 15 seconds to obtain a support 10 in the same manner as in Example 1 except that the second hydrophilic treatment was not performed.

【0063】支持体10を用いて得られたポジ型平版印
刷版について実施例1記載の評価方法でストップ汚れ
性、感光体残り性、消去性、フリンジ汚れ性、スラッ
ジ、耐刷性を調べたところ、表2に示した結果が得られ
た。
The positive lithographic printing plate obtained by using the support 10 was evaluated for stop stain property, photoreceptor residual property, erasability, fringe stain property, sludge, and printing durability by the evaluation method described in Example 1. However, the results shown in Table 2 were obtained.

【0064】比較例6 第一の親水化処理を行わなかった以外は実施例4と同様
にして支持体11を得た。
Comparative Example 6 A support 11 was obtained in the same manner as in Example 4 except that the first hydrophilic treatment was not performed.

【0065】支持体11を用いて得られたポジ型平版印
刷版について実施例1記載の評価方法でストップ汚れ
性、感光体残り性、消去性、フリンジ汚れ性、スラッ
ジ、耐刷性を調べたところ、表2に示した結果が得られ
た。
The positive lithographic printing plate obtained by using the support 11 was evaluated for stop stain property, photoreceptor residual property, erasability, fringe stain property, sludge, and printing durability by the evaluation method described in Example 1. However, the results shown in Table 2 were obtained.

【0066】比較例7 電解粗面化処理において2.0%の硝酸水溶液を使用
し、温度30℃、電流密度100A/dm2の条件で5
0Hzの正弦波交流電流により60秒間電解を行った以
外は実施例4と同様にして支持体12を得た。
Comparative Example 7 In the electrolytic surface roughening treatment, a 2.0% aqueous nitric acid solution was used at a temperature of 30 ° C. and a current density of 100 A / dm 2.
A support 12 was obtained in the same manner as in Example 4, except that electrolysis was performed for 60 seconds with a sine wave alternating current of 0 Hz.

【0067】支持体12を用いて得られたポジ型平版印
刷版について実施例1記載の評価方法でストップ汚れ
性、感光体残り性、消去性、フリンジ汚れ性、スラッ
ジ、耐刷性を調べたところ、表2に示した結果が得られ
た。
The positive lithographic printing plate obtained by using the support 12 was evaluated for stop stain property, photoreceptor remaining property, erasability, fringe stain property, sludge, and printing durability by the evaluation method described in Example 1. However, the results shown in Table 2 were obtained.

【0068】[0068]

【表2】 [Table 2]

【0069】表2の結果から本発明の印刷版は何れもス
トップ汚れ性、感光体残り性、消去性、フリンジ汚れ
性、スラッジ、耐刷性に優れていることがわかる。
From the results shown in Table 2, it can be seen that all the printing plates of the present invention are excellent in stop stain property, photoreceptor remaining property, erasability, fringe stain property, sludge, and printing durability.

【0070】[0070]

【発明の効果】本発明により、ストップ汚れ性、感光体
残り性、消去性、フリンジ汚れ、スラッジ、耐刷性を同
時に満足させるポジ型感光性平版印刷版が得られるよう
なポジ型感光性平版印刷版の支持体の製造方法を提供す
ることができた。
According to the present invention, a positive photosensitive lithographic printing plate capable of obtaining a positive photosensitive lithographic printing plate which simultaneously satisfies stop stain property, photoreceptor residual property, erasability, fringe stain, sludge, and printing durability is obtained. A method for producing a printing plate support can be provided.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 塩酸水溶液中での電解粗面化処理、陽極
酸化処理、親水化処理をこの順で施したアルミニウム支
持体上に感光層を設けてなるポジ型感光性平版印刷版の
支持体の製造方法において、該親水化処理が、カルボン
酸塩水溶液による親水化処理を行う前又は後に、SiO
2/M2O(Mはアルカリ金属を表す)のモル比が3.0
〜4.0、アルカリ金属ケイ酸塩濃度が0.05〜0.
5wt%であるアルカリ金属ケイ酸塩水溶液による親水
化処理を行う事を特徴とするポジ型感光性平版印刷版の
支持体の製造方法。
1. A positive photosensitive lithographic printing plate support comprising a photosensitive layer provided on an aluminum support which has been subjected to electrolytic surface roughening treatment, anodic oxidation treatment and hydrophilic treatment in an aqueous hydrochloric acid solution in this order. In the method of producing, before or after performing the hydrophilization treatment with the carboxylate aqueous solution,
The molar ratio of 2 / M 2 O (M represents an alkali metal) is 3.0
-4.0, alkali metal silicate concentration 0.05-0.4.
A method for producing a support for a positive photosensitive lithographic printing plate, characterized by performing a hydrophilization treatment with an aqueous solution of an alkali metal silicate of 5 wt%.
【請求項2】 塩酸水溶液中での電解粗面化処理、陽極
酸化処理、親水化処理をこの順で施したアルミニウム支
持体上に感光層を設けてなるポジ型感光性平版印刷版の
支持体の製造方法において、該親水化処理がカルボン酸
塩水溶液による親水化処理を行い、次いで親水性高分子
水溶液による親水化処理を行う事を特徴とするポジ型感
光性平版印刷版の支持体の製造方法。
2. A positive photosensitive lithographic printing plate support comprising a photosensitive layer provided on an aluminum support which has been subjected to electrolytic surface roughening treatment, anodic oxidation treatment, and hydrophilic treatment in an aqueous hydrochloric acid solution in this order. The method for producing a support for a positive photosensitive lithographic printing plate according to the above method, wherein the hydrophilizing treatment is performed by performing a hydrophilizing treatment with a carboxylate aqueous solution, and then performing a hydrophilizing treatment with a hydrophilic polymer aqueous solution. Method.
JP33577096A 1996-12-16 1996-12-16 Production of base for positive type photosensitive planographic printing plate Pending JPH10171104A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP33577096A JPH10171104A (en) 1996-12-16 1996-12-16 Production of base for positive type photosensitive planographic printing plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33577096A JPH10171104A (en) 1996-12-16 1996-12-16 Production of base for positive type photosensitive planographic printing plate

Publications (1)

Publication Number Publication Date
JPH10171104A true JPH10171104A (en) 1998-06-26

Family

ID=18292267

Family Applications (1)

Application Number Title Priority Date Filing Date
JP33577096A Pending JPH10171104A (en) 1996-12-16 1996-12-16 Production of base for positive type photosensitive planographic printing plate

Country Status (1)

Country Link
JP (1) JPH10171104A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1348570A2 (en) 2002-03-26 2003-10-01 Fuji Photo Film Co., Ltd. Support for lithographic printing plate and presensitized plate and method of producing lithographic printing plate
JP2006251243A (en) * 2005-03-09 2006-09-21 Fuji Photo Film Co Ltd Lithographic printing original plate

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1348570A2 (en) 2002-03-26 2003-10-01 Fuji Photo Film Co., Ltd. Support for lithographic printing plate and presensitized plate and method of producing lithographic printing plate
EP1348570A3 (en) * 2002-03-26 2005-08-24 Fuji Photo Film Co., Ltd. Support for lithographic printing plate and presensitized plate and method of producing lithographic printing plate
US7063935B2 (en) 2002-03-26 2006-06-20 Fuji Photo Film Co., Ltd. Support for lithographic printing plate and presensitized plate and method of producing lithographic printing plate
JP2006251243A (en) * 2005-03-09 2006-09-21 Fuji Photo Film Co Ltd Lithographic printing original plate

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