JPH10171100A - Production of mask protective device - Google Patents
Production of mask protective deviceInfo
- Publication number
- JPH10171100A JPH10171100A JP33555996A JP33555996A JPH10171100A JP H10171100 A JPH10171100 A JP H10171100A JP 33555996 A JP33555996 A JP 33555996A JP 33555996 A JP33555996 A JP 33555996A JP H10171100 A JPH10171100 A JP H10171100A
- Authority
- JP
- Japan
- Prior art keywords
- face
- cut end
- chips
- cutting
- adhesive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
Description
【0001】[0001]
【発明が属する技術分野】本発明は、集積回路の製造工
程におけるフォトリソグラフィ工程で用いられるマスク
やレチクル(以下「マスク」という)上に塵埃等が付着
するのを防止する目的で用いられ、マスクパターンを囲
う大きさのペリクル枠と、該枠の一側端面に張設される
透明な薄膜とよりなるマスク保護装置の製造方法に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mask and a reticle (hereinafter, referred to as a "mask") used in a photolithography process in an integrated circuit manufacturing process. The present invention relates to a method for manufacturing a mask protection device including a pellicle frame having a size surrounding a pattern and a transparent thin film stretched on one end surface of the frame.
【0002】[0002]
【従来技術】マスク保護装置は通常、スピンコート法、
溶液中に浸漬させて引き上げる引上げ法等によってガラ
ス基板上に製膜したニトロセルロースやエチルセルロー
ス等の有機質の薄膜を図1に示すように、ペリクル枠1
よりサイズが大きな仮枠2に一旦取り、ついで接着剤を
塗布したペリクル枠1の一側端面に仮枠2を降下させる
ことによって押し当てゝ接着したのち、ペリクル枠1の
エッジよりはみ出る薄膜3を切断することによって得ら
れる。薄膜3の切断方法には、ナイフによって切断する
方法、レーザ光によって切断する方法、熱によって切断
する方法等があるが、多くは溶媒によって切断する方
法、すなわち図示するように、注射針状の針5の先端を
枠外側のエッジに接触ないし接近させ、枠外側のエッジ
に沿わせて移動させながら針5より有機質の薄膜3を溶
解する有機溶媒を抽出することにより行う方法が用いら
れている(特開昭63−191619号)。2. Description of the Related Art A mask protection device is usually formed by a spin coating method,
As shown in FIG. 1, an organic thin film such as nitrocellulose or ethylcellulose formed on a glass substrate by a pulling method of immersing in a solution and pulling up the pellicle frame 1
Once the temporary frame 2 has a larger size, the temporary frame 2 is pressed down by lowering the temporary frame 2 on one end surface of the pellicle frame 1 on which the adhesive is applied. After bonding, the thin film 3 protruding from the edge of the pellicle frame 1 is removed. Obtained by cutting. The method of cutting the thin film 3 includes a method of cutting with a knife, a method of cutting with a laser beam, a method of cutting with heat, and the like. In many cases, a method of cutting with a solvent, that is, as shown in FIG. A method of extracting the organic solvent that dissolves the organic thin film 3 from the needle 5 while moving the tip of 5 in contact with or approaching the outer edge of the frame and moving along the outer edge of the frame has been used ( JP-A-63-191819).
【0003】いづれの方法による場合でも切断端面に切
屑が付着するのは避けられず、マスクへの装着時にこれ
が脱落して発塵の原因となることがある。そこで従来
は、切断端面を溶媒で拭き取って仕上げたり、両面粘着
テープを用いて切屑を除去していたが、切屑を完全に除
去するのは困難であった。[0003] In either case, it is inevitable that chips are attached to the cut end face, and when they are mounted on a mask, they may fall off and cause dust. Therefore, conventionally, the cut end face has been wiped off with a solvent and finished, or chips have been removed using a double-sided adhesive tape. However, it has been difficult to completely remove the chips.
【0004】[0004]
【発明が解決しようとする課題】本発明は、切屑による
発塵を防止することができるマスク保護装置の製造方法
を提供することを目的とする。SUMMARY OF THE INVENTION An object of the present invention is to provide a method of manufacturing a mask protection device capable of preventing dust from being generated by chips.
【0005】[0005]
【課題の解決手段】本発明はそのため、切断後の切断端
面を例えば接着剤、ポリマー溶液等のコーティング剤で
コーティングして固め、切屑が脱落しないようにしたも
のである。すなわち本発明は、基盤上に製膜した有機質
の薄膜を一旦仮枠に取ったのち、ペリクル枠の一側端面
に接着し、ついで枠外側のエッジよりはみ出る薄膜をナ
イフ、レーザ光、熱、溶媒等の切断手段によって切断す
るマスク保護装置の製造方法において、切断手段によっ
て切断後、切断端面に付着する切屑の脱落を防止するた
め切断端面に例えば接着剤やポリマー溶液等のコーティ
ング剤を塗布して覆い固めることを特徴とする。In the present invention, a cut end face after cutting is coated with a coating agent such as an adhesive or a polymer solution and solidified to prevent chips from falling off. That is, according to the present invention, an organic thin film formed on a substrate is once taken into a temporary frame, then adhered to one side end surface of the pellicle frame, and then the thin film protruding from the outer edge of the frame is knife, laser light, heat, solvent In a method of manufacturing a mask protection device that cuts by a cutting means such as, after cutting by the cutting means, a coating agent such as an adhesive or a polymer solution is applied to the cut end face to prevent the chips attached to the cut end face from falling off. It is characterized by covering.
【0006】本発明のコーティング剤で用いる接着剤と
しては、例えば熱硬化型接着剤、UV硬化型接着剤等が
用いられ、ポリマー溶液としては、例えば膜材と同一の
セルロースや塩化ビニルエステル共重合体等が用いられ
る。As the adhesive used in the coating agent of the present invention, for example, a thermosetting adhesive, a UV-curing adhesive or the like is used. As the polymer solution, for example, the same cellulose or vinyl chloride copolymer as the film material is used. Coalescence or the like is used.
【0007】[0007]
【発明の実施の形態】図1に示す方法によって得られた
マスク保護装置の薄膜3の切断端面に接着剤を塗布し、
切断端面を覆い固めた。図2に示す7は固化した接着剤
を示す。DESCRIPTION OF THE PREFERRED EMBODIMENTS An adhesive is applied to a cut end face of a thin film 3 of a mask protection device obtained by the method shown in FIG.
The cut end face was covered and hardened. 2 shown in FIG. 2 indicates a solidified adhesive.
【0008】[0008]
【発明の効果】本発明によれば、切断端面の切屑がコー
ティング剤で覆い固められ、切屑の脱落による発塵を防
止することができる。According to the present invention, the chips on the cut end surface are covered with the coating agent and solidified, and dust generation due to the chips falling off can be prevented.
【図1】仮枠に取った薄膜をペリクル枠に張設後、切断
するときの状態を示す概略断面図。FIG. 1 is a schematic cross-sectional view showing a state in which a thin film taken in a temporary frame is stretched over a pellicle frame and then cut.
【図2】切断端面に接着剤を塗布したマスク保護装置の
要部断面図。FIG. 2 is a cross-sectional view of a main part of a mask protection device in which an adhesive is applied to a cut end surface.
1・・ペリクル枠 2・・仮枠 3・・薄膜 5・・針 7・・接着剤 1. Pellicle frame 2. Temporary frame 3. Thin film 5. Needle 7. Adhesive
Claims (1)
に取ったのち、ペリクル枠の一側端面に接着し、ついで
枠外側のエッジよりはみ出る薄膜をナイフ、レーザ光、
熱、溶媒等の切断手段によって切断するマスク保護装置
の製造方法において、切断手段によって切断後、切断端
面に付着する切屑の脱落を防止するため切断端面にコー
ティング剤を塗布して覆い固めることを特徴とするマス
ク保護装置の製造方法。An organic thin film formed on a substrate is once taken into a temporary frame, then adhered to one end surface of a pellicle frame, and a thin film protruding from an outer edge of the frame is cut with a knife, a laser beam,
In a method of manufacturing a mask protection device that cuts by a cutting means such as heat or a solvent, a coating agent is applied to the cut end face and solidified to prevent chips attached to the cut end face from falling off after cutting by the cutting means. Manufacturing method of a mask protection device.
Priority Applications (9)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33555996A JPH10171100A (en) | 1996-12-16 | 1996-12-16 | Production of mask protective device |
US09/331,015 US6335126B1 (en) | 1996-12-16 | 1997-12-16 | Method of manufacturing a pellicle |
KR1019990704789A KR20000057324A (en) | 1996-12-16 | 1997-12-16 | Method of manufacturing pellicle and pellicle manufacturing jig |
EP97947962A EP0945761B1 (en) | 1996-12-16 | 1997-12-16 | Method of manufacturing a pellicle and pellicle manufacturing trimming jig |
CA002274972A CA2274972A1 (en) | 1996-12-16 | 1997-12-16 | Method of manufacturing pellicle and pellicle manufacturing jig |
MYPI97006049A MY132704A (en) | 1996-12-16 | 1997-12-16 | A method of manufacturing a pellicle and a jig for manufacturing a pellicle |
TW086118957A TW366438B (en) | 1996-12-16 | 1997-12-16 | Process for manufacturing pellicle and jig for manufacturing pellicle |
DE69739840T DE69739840D1 (en) | 1996-12-16 | 1997-12-16 | METHOD FOR PRODUCING A MEMBRANE COVER AND A DEVICE FOR CYCLING THE MEMBRANES USED IN THIS PROCESS |
PCT/JP1997/004640 WO1998027460A1 (en) | 1996-12-16 | 1997-12-16 | Method of manufacturing pellicle and pellicle manufacturing jig |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33555996A JPH10171100A (en) | 1996-12-16 | 1996-12-16 | Production of mask protective device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH10171100A true JPH10171100A (en) | 1998-06-26 |
Family
ID=18289944
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP33555996A Pending JPH10171100A (en) | 1996-12-16 | 1996-12-16 | Production of mask protective device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH10171100A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020166063A (en) * | 2019-03-28 | 2020-10-08 | 三井化学株式会社 | Method for producing pellicle |
-
1996
- 1996-12-16 JP JP33555996A patent/JPH10171100A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020166063A (en) * | 2019-03-28 | 2020-10-08 | 三井化学株式会社 | Method for producing pellicle |
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