JPH10170715A - Production of resin black matrix, resin black matrix produced by the method, liquid crystal color filter having the black matrix, and liquid crystal panel using the color filter - Google Patents

Abstract

PROBLEM TO BE SOLVED: To produce a resin black matrix high in precision and high in reliability at a low cost, by patterning a photosensitive resin layer by exposure and development through a photomask and heating the substrate to color the patterned photosensitive resin layer into black. SOLUTION: A photosensitive resin, into which a heat-sensitive material 3, which develops a black color by heat, is preliminarily added, is applied on a light-transmitting substrate 1, and if necessary, the resin is prebaked to form a photosensitive resin layer 2. The photosensitive resin layer 2 is patterned into a desired pattern. When a positive or negative photosensitive resin is used, the resin is also exposed through a photomask 4. Then the substrate 1 is heated. Thereby, the heat-sensitive material 3 in the photosensitive resin layer 2 reacts to color the photosensitive resin layer having a desired pattern into black, while the photosensitive resin layer 2 is post-baked to terminate the reaction. Thus, the resin black matrix having good pattern accuracy is formed on the light-transmitting substrate 1.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a black matrix in a color filter used for a color liquid crystal display used in a color television, a personal computer, a pachinko game board, and the like. Production method and a resin black matrix produced by the method, further, a liquid crystal color filter provided with the resin black matrix,
And a liquid crystal panel including the color filter.

[0002]

2. Description of the Related Art In recent years, with the development of personal computers, especially portable personal computers, the demand for liquid crystal displays, especially color liquid crystal displays, has been increasing. However, for further widespread use, it is necessary to reduce the cost of the color liquid crystal display. In particular, there is an increasing demand for the cost reduction of the black matrix of the color filter which accounts for a large proportion of the cost in the color liquid crystal display. . Conventionally, various methods have been tried to satisfy the above requirements while satisfying the required characteristics of the black matrix, such as light-shielding properties and low reflectivity, but a method for producing a black matrix that still satisfies all the required properties has been attempted. Has not been established. Hereinafter, a method for manufacturing each conventional black matrix will be described.

The current mainstream method is to form a black matrix having a desired pattern by depositing chromium metal on a light-transmitting substrate and then pattern-etching the chromium metal layer into a desired shape using a photoresist. Is what you do. The black matrix obtained by this method is thin and has a high light-shielding property, but has a drawback that the reflectance is high because of the use of chromium metal. In order to compensate for this drawback, a method has been developed in which a multilayer film made of chromium oxide and metallic chromium is formed and the multilayer film is pattern-etched. As a result, the reflectivity can be reduced. However, in this method, since vapor deposition is performed a plurality of times, there is a problem that the manufacturing cost is increased. Further, there is a problem that the use of chromium itself is not preferable in terms of environmental protection.

[0004] Recently, in order to compensate for these drawbacks, development of a resin black matrix using a resin as a material has been advanced.
Hereinafter, a typical method of manufacturing a resin black matrix which has been conventionally performed will be described.

[0005] The most commonly used method for producing a first resin black matrix is to pattern a negative resist in which a pigment (organic or inorganic) is added in advance by a usual photolithography process to obtain a black resist having a desired shape. Get the matrix. In this method, since the patterning of the material having the light-shielding property is performed in the photolithography process, there is a problem that the patterning accuracy of a fine portion (eg, a pixel edge portion) is poor. This is because, in this method, since the material for forming the resin black matrix itself has a light shielding property, the transmittance of active energy rays such as ultraviolet rays has a gradient in the vertical direction of the film, and the energy given to the material is Causes a difference in the depth direction of the material. For example, if the material is OD3, an energy difference of about 1000: 1 occurs between the upper part and the lower part of the film surface. That is, since the reaction rate of the reaction in the film generated by the active energy ray is not constant in the material, a portion where the exposure and development are performed under appropriate conditions and a portion where the exposure and development are not performed are formed. As a result, the patterning accuracy is deteriorated. Further, since a pigment or the like is dispersed in the resin as a method for making the photosensitive resin black, there is a problem that the pigment or the like is mixed into the pixel.

In a second method of manufacturing a resin black matrix, a black material such as polyimide in which a black pigment is dispersed is applied to the entire surface of a substrate, and then patterned by a photoresist to obtain a desired shape. Form a matrix. The black matrix obtained by this method is excellent in that the patterning accuracy is good and the black material can be selected widely, but the coating and drying steps are performed twice for the black material and the photoresist. Therefore, there are still problems in terms of process shortening and manufacturing cost as compared with the first method.

The third method of manufacturing a resin black matrix is a lift-off method, in which a black material is lifted off using a photoresist to form a black matrix. Like the second method, the lift-off method has a wide range of choices of black material, and has the advantage that the resin black matrix itself can be thinned by using graphite having a planar structure. The precision is lower than that of photolithographic etching, and the number of steps is very large, so that the yield is low and a problem in terms of manufacturing cost remains.

[0008]

SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide a black matrix which satisfies various characteristics required for the black matrix, such as light-shielding properties and low reflectance, and has no problem in terms of environmental protection. A manufacturing method for providing a pattern with high precision (high resolution) and at a low cost by reducing the process (low cost), a resin black matrix manufactured by the method, a highly reliable color filter having the resin black matrix, A liquid crystal panel using the same is provided.

[0009]

The above objects can be achieved by the present invention described below. That is, the present invention provides a method for forming a photosensitive resin layer on a light-transmitting substrate by using a photosensitive resin to which a heat-sensitive material that becomes black when heated is added in advance, and then exposing and developing through a photomask. To pattern the photosensitive resin layer into a desired shape,
Thereafter, a method for producing a resin black matrix, characterized in that the photosensitive resin layer patterned by heating the substrate is colored black, and a resin black matrix produced by the method, comprising the resin black matrix A liquid crystal color filter and a liquid crystal panel provided with the color filter.

In the method for producing a resin black matrix according to the present invention, first, a black matrix forming material to which a heat-sensitive material which develops a black color by applying heat to a photosensitive resin is previously added is added. use. Then, this photosensitive resin is applied to a light-transmitting substrate to form a photosensitive resin layer, and then irradiated with ultraviolet rays via a photomask having a desired shape pattern to form a black matrix pattern. In the present invention, at this stage, the internally-added heat-sensitive material is in an unreacted state and is not black, so unlike the case of the first method described above, the photosensitive resin has a light-shielding property. And the same patterning accuracy as in the case of a general resist is guaranteed. After the patterning is completed, the substrate on which the black matrix pattern is formed is heated to react the heat-sensitive material to color the photosensitive resin layer black, thereby producing a resin black matrix having a high-definition pattern. Make it possible. The resin black matrix of the present invention manufactured in this manner can be provided at a low cost because the manufacturing process is shortened, and further, various characteristics required for the black matrix, such as light-shielding properties and low reflectance, are provided. Are satisfied, and there is no problem in terms of environmental protection.
Because the black matrix pattern is manufactured with high accuracy,
When used for a liquid crystal panel, a high-resolution image can be provided.

[0011]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail with reference to the drawings. FIG. 1 shows a method for producing a resin black matrix of the present invention. As the light-transmitting substrate 1 used in the method for producing a resin black matrix of the present invention, a glass substrate is generally used, but a transparent plastic plate such as polyethylene terephthalate or polycarbonate can also be used. When used as a material, the material is not particularly limited as long as it has necessary characteristics such as light transmittance and strength.

The production procedure of the method for producing a resin black matrix of the present invention will be described below. First, a photosensitive resin in which a heat-sensitive material 3 which develops black color by heat is previously applied to the light-transmitting substrate 1 made of the above-described material is applied, and if necessary, the heat-sensitive material is applied. Is prebaked at a temperature at which no reaction occurs to form a photosensitive resin layer 2 (see FIG. 1A).

The heat-sensitive material 3 which develops black color used at this time is a material which turns black by changing the geometrical structure, dipole moment, charge state, etc. of the chemical substance used as the material depending on the temperature, or A material in which a heat-sensitive material containing a color former and a heat-sensitive material containing a color developer are allowed to coexist in an unreacted state and heated to cause the two to react to form a black color is used. As a method for causing the color former and the developer to coexist in an unreacted state, it is preferable that each of them is encapsulated in heat-sensitive microcapsules.
In this way, at the stage of patterning the black matrix, the coloring agent and the developing agent do not react with each other, so that the black matrix is not blackened and has no light-shielding property, so that the patterning accuracy is guaranteed. Then, if heat is applied after the pattern is accurately formed, the microcapsules are melted and broken by the heat, etc., and the color former and the developer contained in the microcapsules flow out, and both react to black. Color develops. As a result, a black matrix with high pattern accuracy can be formed.

In the present invention, the following colorants are preferably used in this case. (1) Triarylmethane compounds, (2) diphenylmethane compounds, (3) xanthene compounds, (4) thiazine compounds, (5) spiropyran compounds. Among these, (1) triarylmethane-based and (3) xanthene-based color formers, which give a high color density, are preferred. Specific examples include crystal violet red lactone, 3-diethylamino-6
-Chloro-7- (β-ethoxyethylamino) fluoran, 3-diethylamino-6-methyl-7-anilinofluoran, 3-triethylamino-6-methyl-7-anilinofluoran, 3-cyclohexylamino- 6-methyl-7-anilinofluoran, 3-diethylamino-
7-o-chloroanilinofluoran, phenolphthalein, tetrabromophenol blue, 4,5,6,7-
There are tetrabrophenolphthalein, eosin, etc.
These may be used alone or as a mixture.

As the color developing agent, phenol compounds, organic acids or metal salts thereof, oxybenzoic acid esters, acid clay, inorganic and organic ammonium salts, organic amines, thiazoles, pyrroles, pyridines and the like are used.
As specific examples, 4,4′-isopropylidene-diphenol (bisphenol A), p-tert-butylphenol, 2,4-dinitrophenol, 3,4-dichlorophenol, 4,4′-thiobis (6-tert-butyl) -Butyl-m-cresol) sulfonyldiphenol, p-te
rt-butylphenol-formalin condensate, phthalic acid, phthalic anhydride, maleic acid, benzoic acid, o-toluic acid, salicylic acid, 3-tert-octylsalicylic acid and its zinc, lead, aluminum salts, nickel salts, p-
Ethyl oxybenzoate, butyl p-oxybenzoate, ammonium acetate, tricyclohexylamine, 1,2-
Diphenyl-4,4-dimethyl-2-imidazoline, morpholinium trichloroacetate, 2-amino-benzothiazole and the like. As the microcapsules for containing these, for example, polyvinyl alcohol, glycerin, gelatin, wax, trimethylolpropane acrylate and the like are used.

These materials used in the present invention include, for example, at least a specified temperature, for example, at least 10 ° C. higher than a pre-bake temperature (generally around 80 to 100 ° C.) of a general photosensitive resin material, and a post-bake temperature ( Generally, 2
When the microcapsules are heated to a temperature within a range of 10 ° C. or lower (for example, about 100 ° C.), for example, a temperature of 100 to 180 ° C., the microcapsules are broken and a color forming reaction is started by the contained material. It is preferable to appropriately select each material so that the photosensitive resin is colored black. In the present invention, the color developed by heat is optimally a single black color.However, if necessary, each color of red, blue and green, or each color of cyan, magenta and yellow is mixed to produce a black color. May be formed.

The photosensitive material 3 having the above-described functions.
Is previously added to the photosensitive resin, and the photosensitive resin is dispersed and present in the photosensitive resin layer 2 by, for example, coating the photosensitive resin on a light transmitting substrate. As the photosensitive resin material for forming the photosensitive resin layer 2, any material that satisfies various characteristics such as transparency, heat resistance, and strength as a black matrix can be used. Even if it is a negative type resin where the light irradiation part cures,
Any resin may be used. Specifically, for example, a commercially available positive resist such as a diazonaphthoquinone-novolak resin or a negative resist such as a cyclized polyisoprene-bisazide can be used as it is.

In the present invention, the method of applying the photosensitive resin on the light-transmitting substrate when forming the photosensitive resin layer 2 on the light-transmitting substrate 1 is not particularly limited.
Conventionally known methods such as spin coating, roll coating, bar coating, spray coating, and dip coating can be used.

In the method for producing a resin black matrix of the present invention, a photosensitive resin is applied on the light-transmitting substrate 1 by the above-described means to form the photosensitive resin layer 2, and then the photosensitive resin layer 2 is formed. Is patterned into a desired shape. Exposure is performed via the photomask 4, as shown in FIG. 1B, regardless of whether a positive or negative photosensitive resin is used. Thereafter, development and rinsing are performed to form the photosensitive resin layer 2 into a desired pattern shape (FIG. 1C).
reference).

Thereafter, the photosensitive resin layer 2 formed above is formed.
The substrate having the desired pattern shape is heated. As a result, the heat-sensitive material 3 in the photosensitive resin layer 2 reacts,
As shown in (d), at the same time that the photosensitive resin layer having the desired pattern shape is blackened, the photosensitive resin layer is post-baked to complete the reaction, and the light transmitting substrate 1
A resin black matrix with high pattern accuracy is formed on the top. As a heat treatment method that can be used in this case, a conventionally known means such as an oven and a hot plate can be used.

When a color filter for a liquid crystal of the present invention is formed using the resin black matrix of the present invention produced as described above, a pixel portion is formed as follows. As a method of coloring a pixel portion used in the present invention, a resin layer (resin black matrix) that has already been formed is used.
The color filter is not particularly limited as long as it does not affect the characteristics and satisfies the required characteristics as a color filter. For example, various methods such as a conventionally known dyeing method, a pigment dispersion method, and a printing method can be used. In the present invention, however, in view of the characteristics of the obtained color filter and the production cost, the ink jet method is used. A method of arranging a coloring material between resin black matrices by discharging ink using the above method is effective (hereinafter, this method is referred to as an inkjet method). Hereinafter, a method for forming a pixel portion using an inkjet method will be described.

First, after the substrate having the resin black matrix formed by the above method as shown in FIG. 1 is washed, as shown in FIG.
In addition, an ink-absorbing composition having an effect of reducing ink absorbability by light irradiation or light irradiation and heat treatment is applied to the entire surface of the substrate to form the composition layer 6. The ink-absorbing composition used at this time contains, for example, at least (A) a copolymer of a vinyl monomer and (B) two kinds of compounds (A) and (B) of a photopolymerization initiator. Compositions. That is, when a film is formed from the composition, it becomes a continuous film having excellent water-absorptivity and a light-transmitting property, and the film has sufficient hydrophilicity, and is irradiated with light or irradiated with light or heat-treated. It is possible to reduce the absorbency later. Compositions that can be used in the present invention are not limited to those listed above,
There is no particular limitation as long as a film having the above-described characteristics can be formed.

In the present invention, the method for forming such a composition layer 6 by applying such an ink-absorbing composition onto a substrate is not particularly limited, and the photosensitive layer 1 is exposed on the substrate 1 during the production of a resin black matrix. For example, a method such as spin coating and roll coating can be used in the same manner as when the photosensitive resin layer 2 is formed by applying a conductive resin. Next, after the layer 6 made of the ink-absorbing composition is provided on the substrate as described above, as shown in FIG. Exposure is performed through the mask 4 having the above formula (2) to reduce the ink absorbency of the portion of the ink absorbing composition layer 6 formed on the black matrix 5. The partial light irradiating means used at this time is not particularly limited as long as it can reduce the ink absorbency of the ink absorbent composition, such as UV, DeepUV, and EB. Also, as a method of heat treatment,
For example, means using an oven, a hot plate or the like can be used. The conditions of the heat treatment are as follows.
The heating time at 80 ° C. is preferably about 10 seconds to 20 minutes.

Next, for example, as shown in FIG.
Using the inkjet recording device head 7, the unexposed portion, that is, the pixel forming portion where the ink absorbency is not reduced, is sequentially colored in red, blue, and green, and then, if necessary, the ink is dried. Perform processing. In this case, as the ink used to color the pixel forming portion, both dye-based and pigment-based inks can be used, and either a liquid ink or a solid ink is used. I can do it. Further, as an ink jet recording method, a bubble jet type using an electrothermal converter as an energy generating element, a piezo jet type using a piezoelectric element, or a spark provided near the front end of a solid ink in a nozzle and a printing material. It is possible to use a dry jet type or the like that discharges ink by generating arc discharge between the electrodes. If these ink jet recording methods are used, the coloring area and the coloring pattern can be arbitrarily set.

Next, as shown in FIG. 2D, a protective layer 8 is formed on the formed colored pattern as needed.
As the protective layer formed at this time, a film made of a photo-curing type resin material, a thermosetting type resin material and a photo-heat type resin material, or an inorganic film formed by a method such as vapor deposition or sputtering, etc. Can be used. As the protective film 8, any material can be used as long as it has sufficient transparency when used as a color filter and can withstand the subsequent ITO forming process, alignment film forming process, and the like.

FIG. 3 is a sectional view of a TFT color liquid crystal panel incorporating the color filter of the present invention. Of course,
The form is not limited to the example shown in FIG.
A color liquid crystal panel is generally formed by combining a color filter substrate and a substrate facing the color filter substrate, and sealing a liquid crystal compound therebetween. As shown in FIG. 3, TF is provided inside one substrate of the liquid crystal panel.
T and transparent pixel electrodes are formed in a matrix. or,
On the other inside, R, at the position facing the pixel electrode,
A color filter is provided so that the G and B color materials are arranged, and a transparent counter electrode (common electrode) is formed on one surface thereof. Further, alignment films are formed in the planes of both substrates, respectively, and these alignment films allow rubbing treatment to align liquid crystal molecules in a certain direction. A polarizing plate is adhered to the outside of each glass substrate, and a liquid crystal compound is filled in the gap (about 2 to 5 μm) between these glass substrates. Further, a combination of a fluorescent lamp (not shown) and a scattering plate (not shown) is generally used as a backlight serving as a light source of a color liquid crystal display. With the above configuration of the color liquid crystal panel,
Color display is performed by using the liquid crystal compound as a shutter for changing the transmittance of backlight.

[0027]

The present invention will be described more specifically below with reference to examples and comparative examples. Example 1 A non-alkali glass plate 7059 having a thickness of 1.1 mm manufactured by Corning was used as a light transmitting substrate. The photosensitive resin (hereinafter, also referred to as a photocurable resin) includes V259- which is an alkali-soluble positive photoresist manufactured by Nippon Steel Chemical Co., Ltd.
PA (trade name) was used. Pre-added in the photocurable resin, as a heat-sensitive material that becomes black when heat is applied,
A thermoplastic resin containing 20 to 30% of a crystal violet lactone or the like as a color developing agent and a thermoplastic resin containing 20 to 30% of an oil-soluble phenol resin or the like as a color developing agent were used. Examples of the thermoplastic resin that can be used at this time include transparent polycarbonate and polyethylene terephthalate. In the present invention, transparent polyethylene terephthalate is used. The concentration of the heat-sensitive material in which the color former or the developer is included in the photosensitive resin is as follows: photosensitive resin: color former-containing heat-sensitive material: developer-containing heat-sensitive material = 2: 1: 1. The heat-sensitive material was used in such a manner as to be sufficiently dispersed in the photosensitive resin.

In this example, a resin black matrix was manufactured as follows. First, after applying the photo-curable resin having the above configuration to the entire surface of the light-transmitting substrate 1,
Pre-baking was performed at 80 ° C. for 3 minutes using a hot plate to form a photocurable resin layer 2 (see FIG. 1A). Next, a photomask 4 having a desired pattern
Exposure was performed. Exposure conditions are i-line 200
Irradiated with 照射 300 mJ. Thereafter, the substrate 1 was placed in an aqueous solution of sodium carbonate, developed, and then rinsed with pure water to form a black matrix pattern made of a photocurable resin as shown in FIG. 1C. Then, the substrate 1
Is heated at 200 ° C. for 30 minutes using a hot plate to post-bake the photo-curable resin and simultaneously dissolve the heat-sensitive microcapsules added to the photo-curable resin and encapsulated therein. The photocurable resin was blackened by reacting the color former and the developer to form a resin black matrix. The film thickness of the formed pattern portion is 1
μm.

Next, a composition was prepared having the following composition and having water-absorptive ink absorptivity, and having reduced ink absorptivity at the light-irradiated portion by light irradiation or light irradiation and heat treatment. 10 parts by weight of 3 copolymers of N-methylolacrylamide, methyl methacrylate, and hydroxyethyl methacrylate (monomer composition ratio: 20:30:50) Triphenylsulfonium trifluoromethylsulfonate (TPS-105, manufactured by Midori Kagaku) 2 parts by weight Then, this composition was applied to the entire surface of the substrate on which the resin black matrix obtained above was formed using a spin coater, prebaked at 60 ° C. for 10 minutes, and subjected to light irradiation and heat treatment. As a result, a composition layer 6 in which the ink absorptivity of the light-irradiated portion was reduced was formed. At this time, the thickness of the composition layer 6 was in the range of 0.5 to 2 μm. Then
The composition layer 6 was exposed through a photomask having a pattern such that the black matrix pattern was exposed, thereby reducing the ink absorbency of the composition layer 6 in the light-irradiated portion.

Next, red, blue and green colors were arranged and colored in the pixel portion by discharging ink using an ink jet recording apparatus, and then baked to form a color filter.
Observation of the thus prepared liquid crystal color filter with an optical microscope and an SEM revealed that no foreign matter such as a black matrix material was mixed into the pixels and that the transfer accuracy of the photomask in the black matrix portion was excellent.

Example 2 A color filter was prepared in the same manner as in Example 1 except that the color former was encapsulated in a microcapsule made of polyvinyl alcohol and the developer was dissolved in a photosensitive resin. It was created. Observation of the obtained color filter with an optical microscope and an SEM revealed that no foreign matter such as a black matrix material was mixed into the pixels, and that the transfer accuracy of the photomask in the black matrix portion was excellent.

Comparative Example 1 A 1.1 mm thick non-alkali glass plate 7059 (trade name) manufactured by Corning Incorporated was used as a light transmitting substrate. As the photosensitive resin (hereinafter, also referred to as a photocurable resin), a black negative photoresist in which alkali-soluble carbon black was dispersed was used. As a method for manufacturing the resin black matrix of this comparative example, first, the photosensitive resin was applied to the entire surface of the light-transmitting substrate by spin coating, and then prebaked at 80 ° C. for 10 minutes on a hot plate. A conductive resin layer was formed. Next, exposure was performed through a photomask 4 having a desired pattern.
Regarding the exposure condition, i-line was irradiated at 300 mJ. Thereafter, the substrate 1 was placed in a TMAH aqueous solution and developed, and then shower rinsed with pure water (1 kg / cm ² ). Finally, post-baking was performed at 200 ° C. for 30 minutes in a circulating hot air dryer. Thus, a resin black matrix was obtained.

Next, as in Example 1, an ink-absorbing composition layer having the same composition and thickness as used in Example 1 was formed on the substrate on which the resin black matrix was formed, and then irradiated with light. After reducing the ink absorbency of the composition layer on the black matrix by heat treatment and, by discharging the ink using an inkjet recording device, red,
The pixel portion was arrayed and colored using blue and green inks, and baked to form a liquid crystal color filter. When the liquid crystal color filter of the present comparative example thus produced was observed with an optical microscope and an SEM, carbon black residues were observed in the pixels. Further, the black matrix pattern had a tapered shape, and the transfer accuracy of the photomask in the black matrix portion was poor.

[0034]

By employing the method for producing a resin black matrix according to the present invention, a high-definition and highly reliable resin black matrix can be produced at low cost.

[Brief description of the drawings]

FIG. 1 is a diagram illustrating a method for producing a resin black matrix of the present invention.

FIG. 2 is a diagram illustrating a case where a liquid crystal color filter of the present invention is manufactured using an inkjet recording method.

FIG. 3 is a cross-sectional view of an example of a liquid crystal panel.

[Explanation of symbols]

 1: glass substrate 2: photosensitive resin layer 3: heat-sensitive material 4: photomask 5: resin black matrix 6: ink-absorbing composition layer 7: inkjet recording device 8: protective layer

(72) Inventor Junichi Sakamoto 3-30-2 Shimomaruko, Ota-ku, Tokyo Inside Canon Inc.

Claims (6)

[Claims] 1. A photosensitive resin layer to which a heat-sensitive material, which turns black when heat is applied, is previously formed on a light-transmitting substrate, and then exposed and developed through a photomask. Forming a photosensitive resin layer in a desired shape, and then heating the substrate to color the patterned photosensitive resin layer black. 2. The resin black according to claim 1, wherein a heat-sensitive material containing a color former and a heat-sensitive material having a color developer coexist in the heat-sensitive material which turns black when heat is applied. Matrix manufacturing method. 3. The method for producing a resin black matrix according to claim 2, wherein the color former and the developer are respectively encapsulated in heat-sensitive microcapsules. 4. A resin black matrix produced by the method for producing a resin black matrix according to claim 1. 5. A color filter for a liquid crystal, comprising the resin black matrix according to claim 4. 6. A liquid crystal panel in which a liquid crystal compound is sealed between a liquid crystal color filter and a substrate facing the color filter, wherein the liquid crystal color filter is the liquid crystal color filter according to claim 5. A liquid crystal panel, comprising: