JPH10162356A - Production of magnetic recording medium and production device thereof - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method and a device for manufacturing a magnetic recording medium by which emission of moisture, adsorbed gases, etc., hindering crystal growth of a of magnetic thin film and lowering orientation property of the magnetic particles from a nonmagnetic supporting body at the time of vapor depositing is prevented. SOLUTION: In the manufacturing device of the magnetic recording medium provided with a vapor deposition room 17 in which the magnetic thin film is formed by vacuum deposition on the nonmagnetic supporting body 25 carried through a transportation route, preliminary treating means 28a to 28e before vapor deposition are disposed for preventing emission of emitted substances from the nonmagnetic supporting body 25 at the time of vacuum vapor depositing.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a method and an apparatus for manufacturing a magnetic recording medium, and more particularly, to a method for manufacturing a magnetic recording medium in which a magnetic thin film to be a magnetic layer is formed on a non-magnetic support by vacuum evaporation. And a manufacturing apparatus.

[0002]

2. Description of the Related Art Conventionally, as a magnetic tape as a magnetic recording medium, a coating type formed by applying and drying a magnetic paint on a non-magnetic support serving as a tape base has been widely used. The magnetic paint is formed by dispersing a powder magnetic material such as an oxide magnetic powder or an alloy magnetic powder in an organic binder such as a vinyl chloride-vinyl acetate copolymer, a polyester resin, a urethane resin, and a polyurethane resin.

In recent years, as the demand for high-density magnetic recording has increased, so-called metal magnetic thin film type magnetic tapes (evaporated tapes) have been proposed and attracted attention. This magnetic tape is made by coating a metal magnetic material such as a Co-Ni alloy, a Co-Cr alloy, or Co-O with a polyester film or the like by plating or vacuum thin film forming means (vacuum vapor deposition method, sputtering method, ion plating method, etc.). It is formed by directly attaching on a non-magnetic support such as a polyamide or polyimide film.

[0004] The metal magnetic thin film type magnetic tape is excellent not only in coercive force and squareness ratio, but also in electromagnetic conversion characteristics at short wavelengths. It has a number of advantages, such as extremely small thickness loss at the time, and the ability to increase the packing density of the magnetic material because there is no need to mix a binder that is a nonmagnetic material in the magnetic layer.

Further, in order to improve the electromagnetic conversion characteristics of this type of magnetic tape and to obtain a larger output, when forming a magnetic layer of the magnetic tape, the magnetic layer is obliquely vapor-deposited. Oblique deposition has been put to practical use.

In the oblique deposition tape, steam is generated by heating and melting a ferromagnetic metal such as Co or Ni or an alloy mainly containing them by an electron gun or the like in a vacuum to form a thin film with the steam. However, the temperature of the alloy at this time is 100
0 ° C or higher. If the non-magnetic support is directly put in such a high-temperature steam atmosphere, the non-magnetic support instantaneously loses heat and melts. In order to prevent this, a method of using a so-called cooling can (cooling drum) cooled to minus several tens of degrees Celsius or less, and performing cooling and vapor deposition while contacting a non-magnetic support with the cooling can is adopted. ing.

[0007]

However, even if the non-magnetic support is cooled by using such a cooling drum, PET and aramid (polyamide) used as the non-magnetic support have a high moisture absorption rate, Moisture or adsorbed gas contained in or adhered to the surface of the non-magnetic support or other impurity particles or foreign matter is released by the heat at the time, and the released substances such as water and adsorbed gas form the magnetic thin film. There is a problem that crystal growth is inhibited and the orientation of magnetic particles is reduced.

The present invention has been made in view of the above circumstances, and it has been found that water, adsorbed gas, etc., which hinder crystal growth of a magnetic thin film or lower the orientation of magnetic particles, can be applied to a non-magnetic support during high-temperature vacuum deposition. It is an object of the present invention to provide a method and an apparatus for manufacturing a magnetic recording medium that is prevented from being released from a magnetic recording medium.

[0009]

In order to achieve the above object, the present invention provides a method for manufacturing a magnetic recording medium in which a magnetic thin film is formed on a non-magnetic support by vacuum deposition, before forming the magnetic thin film. Providing a method for manufacturing a magnetic recording medium, wherein the non-magnetic support is subjected to a pretreatment before vapor deposition in order to prevent a discharge substance from being released from the non-magnetic support during vacuum deposition. I do.

[0010] According to the above structure, the pretreatment performed on the non-magnetic support can prevent the emission from the non-magnetic support during the formation of the magnetic thin film by high-temperature vacuum deposition. In addition, the emission does not hinder the crystal growth of the magnetic thin film or lower the orientation of the magnetic particles.

[0011]

DESCRIPTION OF THE PREFERRED EMBODIMENTS In a preferred embodiment,
In order to realize the method of manufacturing the magnetic recording medium, in a magnetic recording medium manufacturing apparatus including a vacuum deposition unit that forms a magnetic thin film by vacuum deposition on a non-magnetic support that is transported along a transport path, the vacuum deposition unit includes A magnetic recording apparatus comprising: a pre-processing unit before vapor deposition for preventing the discharge of substances from the non-magnetic support during vacuum deposition on the non-magnetic support before being conveyed. An apparatus for manufacturing a medium is provided.

Further, in a preferred embodiment,
The pretreatment means is a heating degassing means for heating the nonmagnetic support before the formation of the magnetic thin film by vapor deposition and releasing gas from the nonmagnetic support.

With this configuration, before forming the magnetic thin film on the non-magnetic support, the non-magnetic support can be heated and degassed to release the gas in advance. Occasionally, the generation of gas, which is a substance released from the nonmagnetic support, can be eliminated or suppressed.

In another preferred embodiment, the pre-processing means forms a thin film covering the non-magnetic support before the formation of the magnetic thin film, and suppresses the release of gas from the non-magnetic support. It is characterized in that it is a membrane means.

According to this configuration, before forming the magnetic thin film on the non-magnetic support, a thin film covering the non-magnetic support can be formed on the non-magnetic support by the film forming means. During the formation of the thin film, the release of gas, which is a release substance from the nonmagnetic support, can be eliminated or suppressed.

Further, in another preferred embodiment, a gas from the outside of the vacuum deposition section is prevented from flowing into the vacuum deposition section at the entrance of the transport path, and the gas is discharged outside the apparatus. A special exhaust chamber is provided for the purpose.

According to this structure, the gas from the outside which is going to flow into the vapor deposition chamber flows into the preliminary exhaust chamber before flowing into the vapor deposition chamber, and the flow is stopped in the preliminary exhaust chamber to be forcibly exhausted to the outside of the apparatus. Therefore, gas from the outside is sufficiently exhausted, no impurity gas is mixed into the deposition chamber, and the degree of vacuum in the deposition chamber is maintained at a predetermined value, so that high-quality and highly reliable deposition processing is performed. .

[0018]

An embodiment of the present invention will be described below with reference to the drawings.

FIG. 1 is a schematic configuration diagram of a continuous winding vacuum evaporation machine according to one embodiment of the present invention. A magnetic recording medium to which the present invention is applied is a metal thin film type magnetic tape (a so-called vapor-deposited tape) in which a metal magnetic thin film is provided as a magnetic layer on a tape-shaped nonmagnetic support (tape substrate) made of a nonmagnetic material.
It is.

As shown in FIG. 1, a continuous winding type vacuum evaporator, which is an apparatus for manufacturing a magnetic recording medium, has a vacuum chamber 10 serving as an apparatus main body. Inside the vacuum chamber 10, a feed roll 11 and a take-up roll 12, both of which rotate at a constant speed in a clockwise direction (see an arrow in the figure), are installed. A cooling drum 13 is arranged on the other side of the room, facing the feed roll 11 and the take-up roll 12 arranged on one side of the room. Between the cooling drum 13 and the bottom wall 10a of the vacuum chamber 10, a bottom partition wall 14 is attached so that the cooling drum 13 can rotate, and between the cooling drum 13 and the side wall 10b of the vacuum chamber 10, the cooling drum 13 rotates. A side partition 15 is mounted where possible. By bottom partition 14 and side partition 15,
The vacuum chamber 10 includes a winding chamber 16 in which a feed roll 11, a winding roll 12, and an upper side of a cooling drum 13 are disposed, and a vapor deposition chamber (vacuum vapor deposition unit) 1 in which a lower side of the cooling drum 13 is disposed.
7 are divided into two spaces.

A preliminary exhaust chamber 19 is formed at the entrance of the vapor deposition chamber 17 on the cooling drum 13 along the tape transport path.
This preliminary exhaust chamber 19 is formed by the side partition 15 and the exhaust chamber partition 18 provided above the side partition 15 at the position of the gap a between the cooling drum 13 and the side wall 10 b of the vacuum chamber 10. The preliminary exhaust chamber 19 is divided into two rooms 19 by a partition wall 20.
a, 19b. Therefore, the preliminary exhaust chamber 19
Two continuous chambers 19a and 19b are interposed between the winding chamber 16 on the side and the vapor deposition chamber 17.

The vacuum chamber 10 has a take-up chamber exhaust port 21 communicating with the take-up chamber 16, a vapor deposition chamber exhaust port 22 communicating with the vapor deposition chamber 17, and a preliminary chamber exhaust port communicating with the preliminary exhaust chamber 19. 23 is opened. These exhaust ports 21, 22, 2
3 is connected to an independent exhaust system (not shown), and using this exhaust system, the winding chamber 16 of the vacuum chamber 10 and the evaporation chamber 1
7. Each of the preliminary exhaust chambers 19 is evacuated to a predetermined degree of vacuum. The ultimate vacuum degree of the preliminary exhaust chamber 19 is set to a low pressure equal to or lower than the ultimate vacuum degree of the vapor deposition chamber 17.

By providing the preliminary exhaust chamber 19 between the winding chamber 16 and the vapor deposition chamber 17 as described above, the inside of the vapor deposition chamber 17 passes through the gap a between the side wall 10b and the cooling drum 13 from the winding chamber 16. The gas in the winding chamber 16, which is about to flow into the evaporation chamber 16, is forcibly exhausted in the preliminary exhaust chamber 19 without flowing into the vapor deposition chamber 17. In this case, the partition wall 2 in the preliminary exhaust chamber 19
0 further effectively stops the gas flow,
Gas inflow into the interior is effectively prevented.

In this case, the winding chamber 16 and the vapor deposition chamber 17
A preliminary evacuation chamber 19 is formed in the narrow gap a between the two, and an independent evacuation device is connected to the preliminary evacuation chamber 19, so that a large vacuum pressure can be obtained with a vacuum pump having a small capacity, and the equipment can be enlarged. It is possible to prevent the inflow of the impurity gas into the vapor deposition chamber 17 with low power consumption without reducing the power consumption.

A non-magnetic support 25 is wound around the feed roll 11. The leading end of the non-magnetic support 25 is fed from the feed roll 11 through the cooling drum 13 to the take-up roll 12.
Is wrapped around. Feed roll 11, winding roll 1
2. The cooling drum 13 is formed in a cylindrical shape having a width substantially equal to the width of the nonmagnetic support 25, and the cooling drum 13 has a diameter larger than the diameter of the feed roll 11 or the take-up roll 12. Have. In addition, a heater 26 that can heat the nonmagnetic support 25 is installed near the feed roll 11.

The cooling drum 13 is installed so as to be rotatable about a central axis as a rotation axis, and is clockwise (see an arrow in the figure).
To rotate at a constant speed. A cooling device (not shown) is provided inside the cooling drum 13, and adhesion preventing plates (not shown) are provided at both ends of the cooling drum 13. With this cooling device, the non-magnetic support 2 contacting the cooling drum 13
5 can be prevented from being deformed due to a rise in temperature.

Above the outer peripheral surface of the cooling drum 13, five sputter cathodes 28a, 28b, 28
c, 28d and 28e are arranged. The sputter cathodes 28 a, 28 b, 28 c, 28 d, and 28 e form a plasma region on the cooling drum 13 using, for example, the deposition-preventing plates at both ends of the cooling drum 13 as anodes. The surface of the support 25 can be plasma-treated. This makes it possible to form a film by sputtering in-line. In such film formation by sputtering, a discharge gas such as argon (Ar) is introduced into the vacuum chamber 10 and the sputtering cathodes 28a, 28b, 2
After attaching the metal target to 8c, 28d, 28e,
A voltage is applied between both electrodes using the deposition-preventing plate 27 as an anode. Copper (Cu), aluminum (A
l), cobalt (Co), nickel (Ni), iron (F
e) etc. can be used. In this case, in particular, when a metal having a low melting point and a high deposition rate, such as copper (Cu) or aluminum (Al), is used, the shape and number of targets can be reduced, and the processing speed is increased to increase the production rate. Can be enhanced. Each of the sputter cathodes 28a, 28b, 28c, 28d, 28e can be used as a bombarded electrode by replacing the electrode.

Guide rolls 29 are provided between the feed roll 11 and the cooling drum 13 and between the cooling drum 13 and the take-up roll 12, respectively. Both guide rolls 29,
29 is the cooling drum 13 where the non-magnetic support 25 is as
Are arranged close to each other so as to be able to follow the outer peripheral surface of. The non-magnetic supports 2 running from the feed roll 11 to the cooling drum 13 and from the cooling drum 13 to the take-up roll 12 by the guide rolls 29, 29, respectively.
5, a predetermined tension is applied to ensure smooth running of the non-magnetic support 25.

Then, the feed roll 11 and the take-up roll 12
Due to the rotation of, the non-magnetic support 25 sequentially fed from the feed roll 11 travels along the outer peripheral surface of the cooling drum 13 and is taken up by the take-up roll 12. That is, a transport path for the non-magnetic support 25 is formed between the feed roll 11 and the take-up roll 12 along the outer peripheral surface of the cooling drum 13.

Below the cooling drum 13 in the vapor deposition chamber 17,
A crucible 30 is provided. The crucible 30 has substantially the same width as the outer peripheral surface of the cooling drum 13, and is filled with a metal magnetic material 31 as an evaporation source. An electron gun 32 for irradiating the crucible 30 is provided on a side wall of the vapor deposition chamber 17. The electron gun 32 irradiates the metal magnetic material 31 in the crucible 30 while the emitted electron beam X scans in the width direction of the cooling drum 13. The electron gun 32 heats and evaporates the metal magnetic material 31 in the crucible 30, and the evaporated metal magnetic material 31 travels at a constant speed on the outer peripheral surface of the cooling drum 13 in the vapor deposition chamber 17. A magnetic layer is formed thereon.

In the vicinity of the cooling drum 13 between the cooling drum 13 and the crucible 30, a shutter 33 is provided.
The shutter 33 has a shape capable of covering a predetermined region of the nonmagnetic support 25 that travels at a constant speed on the outer peripheral surface of the cooling drum 13. By the shutter 33, the evaporated metal magnetic material 31 is obliquely deposited on the non-magnetic support 25 within a predetermined angle range. At the time of vapor deposition, oxygen gas is supplied to the surface of the non-magnetic support 25 to improve magnetic properties, durability and weather resistance. Oxygen gas is supplied to the bottom wall 10 of the vacuum chamber 10.
The gas is supplied through an oxygen gas introduction pipe 34 provided through the a.

In the vacuum deposition, the vacuum chamber 10 is set to, for example, a vacuum degree of 1.
While maintaining the pressure at 10 ^-4 Torr, oxygen gas was supplied from the oxygen gas introduction pipe 34 at a rate of, for example, 250 cc / min.
7 while being introduced. The composition of the ingot used for the evaporation source is, for example, Co90-Ni10 wt%. In this case, the incident angle of the evaporated metal with respect to the nonmagnetic support 25 is, for example, in a range of 45 ° to 90 °. The magnetic layer is deposited on the cooling drum 13 to a thickness of, for example, 200 nm. Therefore, it is transported along the transport path and is
The magnetic thin film is formed on the non-magnetic support 25 through the vacuum evaporation by vacuum evaporation.

Hereinafter, embodiments of the present invention using specific samples will be described.

A sample tape was prepared under the conditions shown in Table 1 by using the continuous winding type vacuum evaporator having the above structure. The sample tape was formed by obliquely depositing a Co—Ni alloy in an oxygen atmosphere on an undercoated non-magnetic support (base) 25, and applying a metal magnetic thin film having a thickness of 0.2 μm as a magnetic layer. Thereafter, a back coat and a top coat were applied, and the tape was cut into a predetermined tape width.

[0035]

[Table 1]

First, in the first to sixth embodiments, before forming a magnetic thin film on the non-magnetic support 25, the non-magnetic support 25 is subjected to sputter deposition as a pretreatment before vapor deposition. A film forming process for forming a thin film covering 25 was performed.
By this film forming process, the non-magnetic support 2 during the formation of the magnetic thin film is formed.
5 can be suppressed from being released.

Table 2 shows the sputtering conditions of Examples 1 to 6. The sputtering electrode used was a DC magnetron system, and the sputtering gas was argon (Ar). However,
In Example 6, the gas amount was adjusted so that argon: oxygen gas = 80: 20. Metal targets are cobalt (Co), aluminum (Al), iron (Fe), copper (C
u), nickel (Ni) or the like is used. Spatter is
Although the film formation rate varies greatly depending on the material to be formed, in this embodiment, the sputtering conditions were adjusted so as to obtain a desired thickness in order to keep the feed rate during vapor deposition constant. The adjustment of the sputtering conditions is performed by adjusting the input power, the cathode and the non-magnetic support 2.
5 is performed by changing the distance (distance between substrates).

In the comparative example, vacuum deposition was performed by a conventional manufacturing method. Argon (Ar) was used as a sputtering gas.

In this case, one room 1 of the preliminary exhaust chamber 19
Table 2 shows the degree of vacuum of 9b. A preliminary exhaust chamber 19 is provided at the entrance of the vapor deposition chamber 17 in the transport path, and the gas from the vapor deposition chamber 17 is prevented from flowing in and the gas is exhausted to the outside of the apparatus. It is sufficiently evacuated, and the degree of vacuum is maintained at a predetermined value.

[0040]

[Table 2]

Next, in Examples 7 to 9, the non-magnetic support 25 was heated as a pretreatment before vapor deposition before forming a magnetic thin film on the non-magnetic support 25. Heat degassing treatment. By this heat degassing treatment, the gas that is emitted from the non-magnetic support 25 during the formation of the magnetic thin film can be released in advance. Further, the nonmagnetic support 25 was subjected to bombardment treatment by introducing, for example, argon gas. The non-magnetic support 25
Can be cleaned to make the surface characteristics radical, and the adhesiveness between the nonmagnetic support 25 and the metal magnetic thin film as the magnetic layer can be enhanced.

In the seventh embodiment, the sputter cathodes 28a, 28
8b, 28c and 28d were changed to heaters for heating, and only the sputter cathode 28e was changed to a bombardment electrode. The heating heater is a plate heater (manufactured by Nippon Electric Heat Instruments Co., Ltd.)
The distance (gap) from the cooling drum 13 was 1 mm at the shortest, and the heater surface temperature was 150 ° C.

In Example 8, the heating heater of Example 7 was changed to a halogen lamp J220V-1000W (made by Ushio Inc.). The input power of the halogen lamp and the distance from the non-magnetic support 25 were appropriately adjusted.

In the ninth embodiment, in addition to the heater for heating in the seventh embodiment, a similar heater 26 installed at the unwinding portion of the non-magnetic support 25 near the feed roll 11 is used.
The degassing from the non-magnetic support 25 at 6 was added.

The bombarding process in the comparative example was performed using only the sputter cathode 28e as a bombardment electrode.

In this case, one room 1 of the preliminary exhaust chamber 19
Table 3 shows the degree of vacuum of 9b. A preliminary exhaust chamber 19 is provided at the entrance of the vapor deposition chamber 17 on the transfer path, and is used for degassing and bombarding by heating by preventing gas from flowing out of the vapor deposition chamber 17 and exhausting the gas to the outside of the apparatus. The exhausted argon gas is sufficiently exhausted, and the degree of vacuum is maintained at a predetermined value. In addition, compared to the case of Examples 1 to 6 shown in Table 2, a higher degree of vacuum can be maintained because there is no sputtering gas.

[0047]

[Table 3]

Table 4 shows the measurement results of the electromagnetic conversion characteristics of Examples 1 to 9. For the measurement of the electromagnetic conversion characteristics, a modified device of a commercially available device (manufactured by Sony Corporation, EV-S900) was used, and the reproduction output level of Comparative Example 1 was determined as 0 dB. The magnetic properties were measured using a sample vibration type magnetic property measurement device (V
SM) was used. The deterioration of the magnetic properties was measured using a gas corrosion tester at 35 ° C. 9 containing 0.6 ppm of SO ₂ gas.
Magnetic properties after storage in 0% RH atmosphere for 20 hours (φs)
Was determined by the following equation. φs is a measured value before the storage test, and φs ′ is a measured value after the storage test.

Δφs = (φs−φs ′) / φs × 100 (%)

[0050]

[Table 4]

From the measurement results of Examples 1 to 9 shown in Table 4, degassing from the non-magnetic support 25 was positively performed by heating or suppressed to a low level by a coating film, thereby comparing with the comparative example. It can be seen that both the magnetic characteristics and the electromagnetic conversion characteristics of the deposited film are improved. The rust generation rate corresponding to the deterioration amount (Δφs) of the magnetic characteristics (φs) is similarly improved.

As described above, in the continuous winding type vacuum evaporator according to the present invention, the non-magnetic support 25 is heated immediately before the formation of the magnetic thin film by a non-contact or contact heating means such as a heater or heat control. Thus, generation of degassing from the non-magnetic support 25 during formation of the magnetic thin film is prevented.

As a method of forming a thin film for suppressing degassing, there are methods such as PVD or C
VD may be used.

A magnetic thin film is formed as a magnetic layer on the nonmagnetic support 25 by directly applying a ferromagnetic metal material. Any material may be used as long as it is used for For example, Fe, Co, Ni
Ferromagnetic metals such as Fe-Co, Co-Ni, Fe-Co
-Ni, Fe-Cu, Co-Cu, Co-Au, Co-
Pt, Fe-Cr, Co-Cr, Ni-Cr, Fe-C
o-Cr, Co-Ni-Cr, Fe-Co-Ni-Cr
And other ferromagnetic alloys. These may be a single layer film or a multilayer film. Further, for example, the vicinity of the surface of the magnetic layer may be made of an oxide for improving corrosion resistance.

As a means for forming a metal magnetic thin film, there are a sputtering method in which atoms on a target surface are struck by argon ions, and a vacuum evaporation method in which a ferromagnetic material is heated and evaporated under vacuum to deposit on a nonmagnetic support 25. Alternatively, a so-called PVD technique such as an ion plating method in which a ferromagnetic metal material is evaporated during discharge may be used.

Further, a protective film layer may be formed on the ferromagnetic metal material formed on the non-magnetic support 25, and this material is generally used as a protective film for ordinary metal magnetic thin films. Anything may be used as long as it is performed. For example, carbon, CrO ₂ , Al
₂ O ₃ , BN, Co oxide, MgO, SiO ₂ , Si
₃ O ₄ , SiNx, SiC, SiNx-SiO ₂ , Zr
O ₂ , TiO ₂ , TiC and the like can be mentioned. These may be a single film layer, a multilayer film or a composite film with a metal. Of course, the configuration of the magnetic tape according to the present invention is not limited to these, and may be modified without departing from the scope of the present invention, for example, forming a back coat layer as necessary, or using a non-magnetic support. The formation of an undercoat layer or the formation of a layer of a lubricant, a rust inhibitor or the like on the layer 25 does not matter at all. In this case, any conventionally known materials can be used as the nonmagnetic pigment, the resin binder or the lubricant contained in the back coat layer, and the material contained in the rust preventive layer.

As described above, degassing from the non-magnetic support 25 is positively performed by heating before forming the magnetic thin film, or a coating film is formed before forming the magnetic thin film so as to keep it low. Occasionally, degassing does not hinder the crystal growth of the magnetic thin film or lower the orientation of the magnetic particles. Therefore, it is possible to effectively prevent the degree of vacuum at the time of deposition from deteriorating and consequently the magnetic characteristics and the electromagnetic conversion characteristics from deteriorating. Further, since the preliminary exhaust chamber 19 is provided, it is possible to forcibly exhaust the gas which is going to flow from the winding chamber 16 into the vapor deposition chamber 17 through the preliminary exhaust chamber 19.

On the other hand, conventionally, a deposition chamber 1 for forming a metal magnetic thin film as a magnetic layer on a non-magnetic support 25 is generally used.
7 only pays attention to lowering the degree of vacuum, the degree of vacuum at the time of vapor deposition is degraded by the release gas generated from the non-magnetic support 25 or the inert gas used at the time of bombardment. Almost no countermeasures have been taken against deterioration of the electromagnetic conversion characteristics.

Therefore, as in the vapor deposition apparatus of this embodiment, these gases are positively evacuated from the preliminary exhaust chamber and
7, the magnetic properties and the electromagnetic conversion characteristics are not degraded, the orientation of the magnetic thin film is enhanced, and a magnetic recording medium having excellent electromagnetic conversion characteristics can be realized.

Since the heating mechanism for the substrate (nonmagnetic support 25) used in the present invention has a relatively simple structure, it can be easily introduced into existing equipment.

Conventionally, the bombarding process is performed using an oxygen gas. However, when a coating film is formed by sputtering, the bombarding process can be performed using an existing sputtering gas (argon gas). .

[0062]

As described above, according to the method for manufacturing a magnetic recording medium of the present invention, before forming a magnetic thin film, the non-magnetic support is removed from the non-magnetic support during vacuum deposition. The pre-treatment applied to the non-magnetic support to prevent the release of the discharge from the non-magnetic support during the formation of the magnetic thin film is performed to perform the pre-treatment before vapor deposition to prevent the release of the discharge. Can be prevented during deposition,
The emission does not hinder the crystal growth of the magnetic thin film or lower the orientation of the magnetic particles.

Therefore, the magnetic film characteristics such as the orientation and the electromagnetic conversion characteristics of the magnetic thin film can be improved, and a high quality and high characteristic magnetic recording medium can be realized.

In a magnetic recording medium manufacturing apparatus provided with a vacuum deposition section for forming a magnetic thin film by vacuum deposition on a non-magnetic support conveyed along a transport path, the non-magnetic support before being transported to the vacuum deposition section is provided. If the magnetic support is provided with a pre-treatment means before vapor deposition for preventing emission from being released from the non-magnetic support during vacuum vapor deposition, the method for manufacturing a magnetic recording medium can be implemented. The effect can be obtained.

Further, if the pre-processing means is a heating degassing means for heating the non-magnetic support before the formation of the magnetic thin film by vapor deposition and releasing gas from the non-magnetic support, Before the formation of the magnetic thin film on the support, the non-magnetic support can be subjected to a heating degassing treatment for heating the non-magnetic support, so it is an emission from the non-magnetic support when the magnetic thin film is formed. Gas can be released in advance,
The above effects can be obtained.

The pre-processing means may be a film forming means for forming a thin film covering the non-magnetic support before the formation of the magnetic thin film and suppressing the release of gas from the non-magnetic support. For example, before forming the magnetic thin film on the non-magnetic support, a thin film covering the non-magnetic support can be formed on the non-magnetic support by the film forming means. The release of gas, which is a release substance, can be suppressed, and the above-described effects can be obtained.

Further, at the entrance of the transfer path to the vacuum deposition section, a preliminary exhaust chamber for preventing gas from flowing from outside the vacuum deposition section and discharging the gas to the outside of the apparatus is provided. With this configuration, the gas from the outside that is going to flow into the vapor deposition chamber flows into the preliminary exhaust chamber before flowing into the vapor deposition chamber, the flow is stopped in the preliminary exhaust chamber, and the gas is forcibly exhausted outside the apparatus. Therefore, the gas from the outside is sufficiently exhausted, no impurity gas is mixed into the vapor deposition chamber, and the degree of vacuum in the vapor deposition chamber is maintained at a predetermined value, so that high-quality and highly reliable vapor deposition processing is performed.

In the embodiment, the heat treatment is performed as a degassing method before vapor deposition. However, degassing can be performed by once passing a nonmagnetic support through a vacuum.

[Brief description of the drawings]

FIG. 1 is a schematic configuration diagram of an apparatus for manufacturing a magnetic recording medium according to an embodiment of the present invention.

[Explanation of symbols]

10: vacuum chamber, 11: feed roll, 12: take-up roll,
13: cooling drum, 10a: bottom wall, 10b: side wall, 1
4: bottom partition wall, 15: side partition wall, 16: winding room, 17:
Vapor deposition chamber, 18: exhaust chamber partition, 19: preliminary exhaust chamber, 19
a, 19b: Room, 20: Partition wall, 21: Winding chamber exhaust port, 22: Vaporization chamber exhaust port, 23: Preparatory chamber exhaust port, 25:
Non-magnetic support, 26: heater, 28a, 28b, 2
8c, 28d, 28e: sputter cathode, 29: guide roller, 30: crucible, 31: metallic magnetic material, 32:
Electron gun, 33: shutter, 34: oxygen gas inlet tube.

Claims (7)

[Claims] 1. A method of manufacturing a magnetic recording medium, wherein a magnetic thin film is formed on a non-magnetic support by vacuum deposition, wherein the non-magnetic support is applied to the non-magnetic support during the vacuum deposition before forming the magnetic thin film. A method for manufacturing a magnetic recording medium, comprising performing a preliminary treatment before vapor deposition in order to prevent a discharge substance from being released from a body. 2. The magnetic recording medium according to claim 1, wherein the pretreatment is a heating degassing treatment in which the nonmagnetic support is heated and gas is released from the nonmagnetic support in advance. Manufacturing method. 3. The pre-treatment according to claim 1, wherein the pre-treatment is a film-forming treatment for forming a thin film covering the non-magnetic support to suppress the release of the emission from the non-magnetic support. 2. The method for manufacturing a magnetic recording medium according to item 1. 4. A manufacturing apparatus for a magnetic recording medium having a vacuum deposition section for forming a magnetic thin film by vacuum deposition on a non-magnetic support conveyed along a transport path, wherein the non-magnetic support before transported to the vacuum deposition section is provided. An apparatus for manufacturing a magnetic recording medium, comprising: a pre-treatment means before vapor deposition for preventing a discharge substance from being released from the non-magnetic support during vacuum deposition on the magnetic support. 5. The pretreatment means is a heating degassing means for heating the nonmagnetic support before forming a magnetic thin film by vapor deposition and releasing gas from the nonmagnetic support. 5. The apparatus for manufacturing a magnetic recording medium according to item 4. 6. The pre-processing means is a film forming means for forming a thin film covering the non-magnetic support before the formation of the magnetic thin film to suppress the release of gas from the non-magnetic support. The apparatus for manufacturing a magnetic recording medium according to claim 4. 7. A preliminary exhaust chamber is provided at the entrance of the transfer path to the vacuum deposition section for preventing gas from flowing from outside the vacuum deposition section and discharging the gas to the outside of the apparatus. The apparatus for manufacturing a magnetic recording medium according to any one of claims 4 to 6, wherein: