JPH10146799A - Manufacture of trimming die - Google Patents

Abstract

PROBLEM TO BE SOLVED: To easily, inexpensively and reliably manufacture a trimming die by performing first etching processing on a metallic plate on which first resist patterns are formed, forming wide second resist patterns to cover formed projecting parts, and performing second etching processing on the metallic plate on which the second resist patterns are formed. SOLUTION: First resist patterns 3 corresponding to a shape of a blade part 2 to be formed, are made on a metallic plate 1. Next, etching processing is performed on a metallic plate 1 on which the first resist patterns 3 are formed by using an etching liquid such as ferric chloride, and projecting parts 4 having a prescribed height are formed in a place on which the resist patterns 3 are made. Next, wide second resist patterns 5 to cover these are formed with the formed projecting parts 4 as the center. Next, etching processing is performed on the metallic plate 1 on which the second resist patterns 5 are made, and the blade part 2 having a prescribed height is formed. Next, the resist patterns 5 are removed from a top part of the formed blade part 2 by a resist separating agent, and a trimming die 10 can be obtained.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a cutting die, and more particularly, to a method for manufacturing a cutting die used for manufacturing a label or the like.

[0002]

BACKGROUND OF THE INVENTION Conventionally, a label sheet for sticking to various products and products, and a label of a predetermined size and shape from a sheet-like long material such as paper, cloth, film, etc. have been manufactured. Then, a punching process is performed on a long laminated material obtained by laminating a sheet-shaped long material, an adhesive and a release sheet, and a method of punching a sheet-shaped long material with an adhesive into a predetermined shape and size is performed. Is coming. As a method for this punching, there is a method of punching to a required size with a punching die that moves up and down, or a thin plate-like punching die having a required blade portion wound around a magnet roll and fixed, and using this, There is known a rotary printing method and the like in which punching is performed selectively.

[0003] Usually, these blanking dies are manufactured by the following method. (1) A method of engraving a support base in a pattern punching pattern and inserting a ribbon-like blade into the engraved groove to produce a punching die. (2) A method in which a resist film is formed on a substrate using a photosensitive material, and a punching die is manufactured by etching.

[0004] However, in the case of the former (1), since the sculpture is made on the support, the artisan element is probably strong.
Not everyone can do it. For this reason, its manufacture is very time-consuming and expensive. According to the latter method (2), on the other hand, it is possible to manufacture more efficiently and at a low price. However, since the blade is formed by the etching method, a sharper blade is obtained. Then
Since the image of the resist film must be thinned, and as a result, the blade has a thin blade shape as a whole, it is difficult to withstand the pressure during punching, and the punching is likely to be defective.
Conversely, if the image is made thicker, the cutting edge will not be sharp, and the commercial value of the label product will be reduced.

In order to solve such a problem, for example, Japanese Patent Application Laid-Open No. 5-318399 discloses a method in which a first resist film is formed by applying or sticking a photosensitive material to a base material and baking a certain pattern. Developing, further applying or sticking a photosensitive material thereon, baking a second resist film thicker and centering on the pattern (first resist film) and developing to form a double resist film, After performing side etching (first etching) of the second resist film portion, only the second resist film is selectively removed, and subsequently, the remaining first resist film portion is subjected to side etching (second etching). Is disclosed.

However, the present inventors have found that the following problems also exist in this method. That is, after the end of the first etching, only the second resist film is removed, and the first resist film corresponding to the blade shape remains on the base material. However, it is attempted to physically remove only the second resist film. Then, the first resist film is also peeled off together. Therefore, in practice, the first resist film and the second resist film are formed with different resist solutions, respectively, and the first resist film and the second resist film are formed using the difference in solubility of the respective resist films in a solvent (stripping agent). (2) Separation from the resist film is performed. In this case, two types of resist solutions and two types of stripping agents are required, and the process becomes complicated.

[0007]

SUMMARY OF THE INVENTION The present invention has been made in order to solve the above-mentioned problems, and has been made in order to make it possible to more easily, inexpensively, and more reliably produce a die for a label or the like. The purpose of the present invention is to provide a manufacturing method.

[0008]

SUMMARY OF THE INVENTION According to a method of manufacturing a punching die according to the present invention, a first resist pattern corresponding to a shape of a blade portion is formed on a metal plate, and a first etching is performed on the metal plate on which the first resist pattern is formed. Processing, forming a wide second resist pattern covering the formed convex portion, and performing a second etching process on the metal plate on which the second resist pattern is formed.

In another manufacturing method according to the present invention, a first resist pattern having a narrow width corresponding to the shape of a blade portion and a predetermined portion of a peripheral edge of a blade portion forming portion are formed on a metal plate with a resist solution. A first etching process is performed on the metal plate on which the first resist pattern is formed, and a wide second resist pattern covering the formed convex portion is formed, thereby forming the second resist pattern. Characterized in that the metal plate is subjected to a second etching process.

[0010]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a method for manufacturing a blanking die 10 according to the present invention will be specifically described with reference to the drawings.

In the method of manufacturing a blanking die according to the present invention, as shown in FIG. 1, first, a first resist pattern 3 corresponding to the shape of a blade 2 to be formed is formed on a metal plate 1. As the metal plate 1, a steel plate such as carbon steel, stainless steel, tempered steel, and alloy steel is used without any particular limitation. Of these, steel plates such as carbon steel and stainless steel are usually used. The thickness of the metal plate 1 is not particularly limited, but preferably has an appropriate flexibility when the punching die is used by attaching it to a magnet roller or the like, and has an appropriate rigidity when used as a flatbed cutter. Is preferred. When used as a flatbed cutter, it can be reinforced with a metal plate or a synthetic resin plate having appropriate rigidity.

In order to form the first resist pattern 3 on the metal plate 1, various conventionally known methods can be adopted. Conditions vary depending on the type of steel plate to be etched, the type of etchant, the temperature, the concentration (specific gravity), the etching time, and the like, but the width of the first resist pattern is the height of the projections 4 formed by the first etching It is set as a guide for That is, assuming that the height of the protrusion 4 formed by the first etching is H ₁ and the width of the first resist pattern is W ₁ , 0.7H ₁ ≦ W ₁ ≦ 1.4.
H ₁ , preferably in the range of 0.8H ₁ ≦ W ₁ ≦ 1.2H ₁ . The width W ₁ of such a first resist pattern is
Generally, 30 to 400 μm, preferably 50 to 20 μm
0 μm.

Next, the metal plate 1 on which the first resist pattern 3 has been formed is subjected to an etching process (first etching step), and a convex portion 4 having a predetermined height is formed at the position where the resist pattern 3 has been formed. As the etching solution, various conventionally known etching solutions such as ferric chloride, hydrochloric acid, nitric acid, or a mixture thereof can be used. The etching time varies depending on the type of the etching solution, but is usually 5 to 60 minutes.

Next, if necessary, the first resist pattern 3 is removed from the top of the projection 4 formed as described above using a resist stripping agent such as an alkaline mixed solution.
If the first resist pattern 3 is removed, a second resist pattern 5 described later can be formed with a more uniform thickness.

After the first resist pattern 3 is removed, a finish etching may be performed in advance at this stage to form a sharp cutting edge. Next, a wide second resist pattern 5 covering the convex portion 4 formed as described above and covering the same is formed. Second resist pattern 5
Is prepared in the same manner as the first resist pattern 3 described above.
Conventionally known various methods can be adopted.

The width of the second resist pattern 5 is set as a measure of the height of the finally obtained cutting blade 2. That is, assuming that the height of the cutting blade 2 finally formed after the second etching is H ₂ and the width of the second resist pattern is W ₂ , 0.7H ₂ ≦ W ₂ ≦
1.4H ₂ , preferably 0.8H ₂ ≦ W ₂ ≦ 1.2H ₂
In the range. Further, the width W of the first resist pattern
₁ and the width W ₂ of the second resist pattern (W ₁ /
W ₂₎ is preferably 1 / 1.2 to 1/5, particularly preferably 1 / 1.4 to 1/3. The width W ₂ of such a second resist pattern is typically, 40～2000Myu
m, preferably 70 to 1000 μm. The second
As will be described later, the resist pattern 5 is formed by applying a resist solution on the metal plate after the first etching so as to cover the convex portion 4, drying the resist solution, and exposing and developing it from above using a negative mask. Is the second resist pattern 5
The width is preferably controlled because it is easy to control, but is not limited to this. For example, a resist agent is directly applied and formed on the projections 4 or a resist film having a certain width is attached on the projections 4 from the beginning. Alternatively, the second resist pattern 5 can be formed.

Next, the metal plate 1 on which the second resist pattern 5 has been formed is subjected to an etching process (second etching step) to form the blade portion 2 having a predetermined height. Etchant,
The etching time and the like are the same as described above, and are appropriately selected from conventionally known conditions, but the second etching time is usually 5 to 60 minutes.

Next, the resist pattern 5 is removed from the top of the blade portion 2 formed as described above using a resist stripping agent such as an alkaline mixed solution, so that the punching die 10 is removed.
Is obtained.

Thereafter, if necessary, finish etching may be performed. The etching time in the finish etching step varies depending on the type of the etching solution, but is usually 0.1.
5 to 10 minutes. By such finish etching,
The step of the blade part 2 is eliminated or the top of the blade part becomes sharp,
A punching die 10 having a blade portion with more excellent punching workability is obtained.

Next, another example of a method for manufacturing a punching die according to the present invention will be described with reference to FIGS. First, a resist solution is applied on the metal plate 1 to form a resist film 3 'having a uniform thickness.

As described above, carbon steel and stainless steel having high strength and abrasion resistance are particularly preferable as the metal plate. The thickness of the metal plate is preferably from 300 μm to 5 mm, particularly preferably from 400 μm to 3 mm.

As the resist liquid, a conventionally known resist liquid is used without any limitation, and may be a negative type or a positive type. 2 to 4, a negative resist will be described as an example. A well-known method such as a spray method or a roll coating method can be adopted as a method of applying the resist liquid. After the resist liquid is applied, the resist film is dried to form a resist film 3 ′.

The thickness of the resist film 3 'is preferably 5 to 5.
It is 100 μm, particularly preferably 8 to 50 μm. Next, the first negative mask 6 is placed on the resist film 3 '. In the first negative mask 6, a light transmitting portion 2 'corresponding to the shape of the blade portion 2 to be formed and a light transmitting portion 7' corresponding to the shape of the alignment mark 7 are formed.

Then, when exposed and developed according to a conventional method,
An alignment mark 7 is formed in a narrow first resist pattern 3 corresponding to a target shape of the blade portion 2 and a predetermined position on the periphery of the blade portion forming portion. The line width and the like of the first resist pattern 3 are as described above.

Next, if necessary, a protective sheet 8 is provided on the periphery of the metal plate 1 to protect the alignment mark 7.
Is attached. The protective sheet 8 is provided with a pressure-sensitive adhesive layer on a base material such as paper or film. In particular, it is preferable to use a transparent film base material to facilitate identification of the alignment mark 7. In this case, it is preferable to use a removable type adhesive.

After the first resist pattern 3 is formed on the metal plate 1 in this manner, etching is performed by spraying or dipping an etching solution (first etching process). The type of the etching solution used, the etching time, and the like are as described above. By such an operation, the convex portion 4 having a sharp cutting edge is formed on the metal plate 1.

Next, if necessary, the resist pattern 3 is removed from the top of the projection 4 formed as described above using a resist stripping agent such as an alkaline mixed solution. As described above, if the first resist pattern 3 is removed, the second resist pattern 5 can be formed to have a more uniform thickness. Is preferably removed.

Next, a resist solution is poured into the recesses of the metal plate 1 thus formed. At this time, the resist solution is poured to a height approximately equal to that of the protective sheet 8. In the drawing, the resist liquid is poured to the height of the protective sheet 8. However, after all, the resist liquid may be filled so as to protect the projections 4, for example, by removing the first resist pattern 3. When the second resist pattern 5 is formed without using the first resist pattern 3
It is sufficient to pour the resist solution until it comes into contact with the substrate. When the resist solution is poured in this way, a second resist film can be formed so as to cover the projections 4.

After that, the resist solution is dried, and a second negative mask 9 is placed thereon. The second negative mask 9 has a shape corresponding to the shape of the blade portion 2 to be formed.
And a mark 7 "corresponding to the shape and position of the alignment mark 7 are formed. Therefore, by overlaying this mark 7 ″ on the alignment mark 7, the second negative mask 9 can be placed without displacement.

After the second negative mask 9 is placed, the substrate is exposed and developed according to a conventional method, and a second resist pattern 5 corresponding to the desired shape of the blade 2 is formed. The second
The line width and the like of the resist pattern 5 are as described above.

After the second resist pattern 5 is formed on the metal plate 1 in this way, etching is performed by spraying or dipping an etching solution (second etching process). The type of the etching solution used, the etching time, and the like are as described above. As a result, during the second etching step, the projections 4 are protected, and the first
The sharpness of the cutting edge formed by etching is maintained. In addition, a sufficient height of the blade can be obtained by the second etching, and the width of the second resist pattern is wide, so that the width of the blade is also wide. Therefore, by the above operation, on the metal plate 1,
A tough blade portion 2 having a sharp edge, a high blade height, and a wide blade width is formed.

Next, the second resist pattern 5 is removed from the top of the blade 2 formed as described above using a resist stripping agent. The metal plate 1 thus obtained is subjected to a finishing etching process as required, so that the blade 2
Is eliminated, the top of the blade portion becomes sharp, and the punching die 10 with more excellent punching workability can be obtained. The etching time in the finish etching step varies depending on the type of the etching solution, but is usually 0.5 to 10 minutes.

The cutting die 10 prepared as described above
Is cut at the portion A in FIG. 4 and used for use.

[0034]

According to the method for manufacturing a cutting die according to the present invention, a cutting die having a sharp edge, a high blade height, a wide blade width and a tough blade portion can be manufactured easily and inexpensively. Can be manufactured reliably.

[0035]

EXAMPLES Hereinafter, the present invention will be described with reference to specific examples, but the present invention is not limited to these examples. In the following examples, the following metal plates, etching machines, and etchants were used. Metal plate: Carbon steel plate (SK steel, 0.4%, manufactured by Nissin Steel Co., Ltd.)
Etching machine: LT-300 (trade name: manufactured by Takano Kikai Seisakusho) Etching solution: ferric chloride solution Etching was performed at a solution temperature of 40 ° C.

[0036]

EXAMPLE 1 A resist film having a thickness of 10 μm was formed on a carbon steel sheet using an acrylic photosensitive resist solution.
Using a negative mask, a first resist pattern with a width of 150 μm was formed. 15 minutes (etching pressure: 1.0 kg / cm ² ) with an etching solution (specific gravity: 43Be ′ (Bome))
Etching was performed. Next, the first resist pattern was removed with a resist stripping agent (trade name: Remover, manufactured by Koyo Chemical Industry Co., Ltd.). As a result, a projection having a height of 150 μm was formed. Thereafter, finish etching (injection pressure: 0.5 kg / cm ² ) was performed for 0.5 minutes with the above-mentioned etching solution to make the cutting edge sharp. Next, after forming a resist film using the same resist solution as above so as to cover the convex portions, a second resist pattern having a width of 300 μm was formed on the convex portions using a second negative mask. The second etching was performed for 20 minutes (injection pressure: 1.0 kg / cm ² ) using the etching solution described above, and then the second resist pattern was removed using the same resist stripping agent. As a result, the blade height was 330 μm,
A die having a 10 μm-wide blade was obtained.

[0037]

Example 2 A resist film having a thickness of 12 μm was formed on a carbon steel sheet using the photosensitive resist solution used in Example 1,
A first resist pattern having a width of 150 μm and an alignment mark were formed using a first negative mask having a light-transmitting portion for forming a first resist pattern and a light-transmitting portion (commonly referred to as “register mark”) for forming an alignment mark. . A protective sheet having an acrylic pressure-sensitive adhesive (application thickness: 20 μm) provided on the back surface of a polyethylene terephthalate film (thickness: 50 μm) was stuck on the alignment mark. Next, etchant (specific gravity:
42Be '(Bome)) for 15 minutes (injection pressure 1.0k
g / cm ² ) First etching was performed. Next, the first resist pattern was removed with the resist stripping agent used in Example 1. A photosensitive resist solution (the same as above) was poured into the recesses on the steel plate thus formed up to the height of the protective sheet, and dried to form a resist film. A second negative mask having a mark corresponding to the alignment mark was placed on the resist film, and a second resist pattern having a width of 300 μm was formed. Then, 15
The second etching was performed for a minute (injection pressure of 1.0 kg / cm ² ), and after the second etching was completed, the second resist pattern was removed with the same resist stripping agent. Next, finish etching with the same etchant for 0.5 minute (injection pressure 0.5k
g / cm ² ), blade height 340 μm, blade edge width 12 μm
A cutting die with m blades was obtained.

[0038]

Example 3 A resist film having a thickness of 10 μm was formed on a carbon steel sheet using the photosensitive resist solution used in Example 1,
A first resist pattern having a width of 150 μm and a positioning mark were formed using a first negative mask having a light transmitting portion for forming a first resist pattern and a light transmitting portion for forming a positioning mark. Next, an etching solution (specific gravity: 42.8B)
e '(Bome)) for 18 minutes (injection pressure 1.0 kg / c
m ² ) First etching was performed. After the completion of the first etching, the photosensitive resist solution was poured until the first resist pattern was covered without being removed, and dried to form a resist film. Next, a second negative mask having a mark corresponding to the alignment mark was placed on the resist film, and a second resist pattern having a width of 300 μm was formed. Next, after performing the second etching with the same etching solution for 22 minutes (injection pressure 1.0 kg / cm ² ), the first resist pattern and the second resist pattern were removed with the same resist stripping agent as in Example 1, and the blade was removed. High 35
A punch having a blade having a width of 0 μm and a blade width of 25 μm was obtained.

[Brief description of the drawings]

FIG. 1 is a chart showing a method for manufacturing a punching die according to the present invention.

FIG. 2 is a part of a chart showing another method for manufacturing a blanking die according to the present invention.

FIG. 3 is a part of a chart showing another method for manufacturing a blanking die according to the present invention.

FIG. 4 is a part of a chart showing another method for manufacturing a blanking die according to the present invention.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 ... Metal plate; 2 ... Blade part; 3 ... First resist pattern; 4 ... Convex part; 5 ... Second resist pattern;
7: Alignment mark; 7 "... mark; 8: Protective sheet; 9: Second negative mask; 1
0 ... Die

Claims (2)

[Claims] 1. A first metal plate having a first shape corresponding to a shape of a blade portion.
Forming a resist pattern, performing a first etching process on the metal plate on which the first resist pattern is formed, forming a wide second resist pattern covering the formed convex portion, and forming a metal on which the second resist pattern is formed. A method for manufacturing a punching die, comprising subjecting a plate to a second etching process. 2. A first resist pattern having a narrow width corresponding to the shape of a blade portion and an alignment mark formed at a predetermined position on a peripheral edge of a blade portion forming portion on a metal plate using a resist solution. Performing a first etching process on the metal plate on which is formed, forming a wide second resist pattern covering the formed convex portion, and performing a second etching process on the metal plate on which the second resist pattern is formed. A method of manufacturing a punching die.