JPH10142806A - Pattern forming method by reflective hologram - Google Patents

Abstract

PROBLEM TO BE SOLVED: To form a plane or stereoscopic pattern finer than a conventional one on a substrate through the use of a hologram, because an extra fine pattern can not be formed, in lithography using a transmission hologram, due to difficulty to make a transmission hologram dry plate fine. SOLUTION: A reflective hologram 1 is used as a hologram dry plate. The reflective hologram 1 which is backed/held with a Si-substrate, etc., is irradiated with laser beams, X-rays and electron beams, to form a pattern by using a hologram reproduced image by the reflected waves of the laser beams, X-rays and electron beams. The hologram 1 is of a reflective type, so that the hologram 1 is more excellent in physical strength than the transmission hologram and further, even if the sticking of dust and a physical defect in the hologram occur somewhat, the reproduction of the pattern does not have any trouble. Moreover, a three-dimensional structure can be formed in combination with a CVD technique.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a pattern drawing method using light and an electron beam using a hologram.

[0002]

2. Description of the Related Art As one method of ultra-fine lithography in the manufacture of VLSI, there are a stepper technique and a pattern transfer technique using a hologram.

[0003] The conventional stepper technique is an optical exposure for transferring a pattern by bringing a mask into contact with a substrate coated with a resist. In conventional lithography using the stepper technique, a complicated adjustment operation of the lens is required because many lenses are used in the optical system to emit a parallel light beam. Further, there is a problem that even a single “dust” adhering to the mask forms a fatal transfer pattern defect.

On the other hand, as a conventional pattern transfer technique using a hologram, there is a pattern forming method using a transmission type hologram as shown in FIGS. A hologram is a recording of interference fringes caused by interference between an object wave and a reference wave. The hologram is calculated by calculating this interference fringe pattern and directly drawing it on a translucent film-like object using an electronic drawing device. Is done. This hologram is called a computer generated hologram (CGH). In the case of a transmission hologram, for example, interference fringes are recorded on a SIN membrane film, and actually, in the case of a binary CGH, holes are formed in the SIN membrane film as shown in FIG.

FIG. 12 shows a configuration diagram of a pattern forming apparatus using a transmission hologram. By irradiating a laser beam from the laser transmitter 4 to the transmission hologram 5 on which the desired pattern shape produced as described above is recorded and transmitting the hologram, a wavefront corresponding to the pattern can be reproduced. it can. In the case of FIG. 12, a reproduced image of the pattern is formed and transferred on the substrate surface on which the pattern is to be formed.

In the pattern transfer technique using a hologram,
Since a complicated lens system is not required for reproducing the hologram, the adjustment operation is easier than lithography using a stepper. Further, since the pattern can be transferred in a non-contact manner, there is a feature that it is hard to be affected by dust which is a problem in the stepper technique.

Further, in the stepper technique, if any part is damaged like an exposure mask, the pattern in that part is completely lost. In contrast, in holography, an object (corresponding to a desired pattern shape) is irradiated with light, and light reflected from the object is dispersed and recorded as phase information over the entire surface of the hologram dry plate. in this way,
Since the pattern information is dispersedly recorded over the entire surface of the hologram dry plate, for example, even if half of the hologram dry plate is lost, the contrast and the S / N ratio are deteriorated due to lack of information, but the original object is reproduced. Can do it. The pattern transfer technique using a hologram is characterized in that even if a slight physical defect occurs in the hologram dry plate, a fatal defect rarely occurs in the reproduced image and the pattern is strong against the defect.

Further, in the stepper technique using the reduction optical system, the pattern resolution is determined by the lens aberration used in the reduction optical system. On the other hand, hologram reproduction has a great feature that aberration is eliminated when reproduction is performed with the same optical system as when recording, and the final pattern resolution is determined by the wavelength in pattern transfer technology using holograms. . Therefore, in lithography using a hologram, a high-resolution pattern at the wavelength limit can be formed with an optical system simpler than the sputtering technique.

As another feature of lithography using holography, according to CGH (computer generated hologram), even if there is no actual object, information from object light arranged in a virtual three-dimensional array can be obtained by using a computer. The hologram can be focused on not only the X and Y coordinates on the hologram reproduction surface but also the Z direction perpendicular to the reproduction surface, and the three-dimensional structure can be formed at one time. is there. In other words, surface relief type 3
A dimensional pattern can be formed collectively.

[0010] An application example of forming a three-dimensional structure using a hologram will be introduced. For example, when the cross section of a Fresnel zone plate (a concentric diffraction grating) is formed as a triangular saw blade, it is theoretically predicted that the diffraction efficiency will be close to 100. Lithography is used to form the shape of this triangular saw blade, and two steps can be made in one lithography. Lithography must be performed. Conventionally, a Fresnelson plate having a four-step and eight-step structure has been obtained by electron beam exposure in two and four lithography steps, respectively. If a three-dimensional hologram is used to form such a pattern, it can be formed collectively in a single lithography step.

At present, the production of VLSIs requires the formation of ultra-fine patterns on the order of sub-micrometers, and the light sources used therein are gradually shortened to G-rays and I-rays. The formation of a pattern with an ultraviolet laser using a method has been discussed.

[0012]

In the conventional pattern formation by holography, a transmission type hologram dry plate is used as shown in FIG. However, in the conventional pattern forming method using a transmission hologram, it is difficult to miniaturize a hologram dry plate for the following reasons.
There is a possibility that it will not be possible to cope with the manufacture of VLSI, for which pattern formation is expected to be further miniaturized in the future.

Accordingly, an object of the present invention is to solve the above-mentioned problems and to provide a method capable of forming a finer pattern than a conventional pattern forming method using a transmission hologram.

After explaining the holography technique in general, the reason why it is difficult to miniaturize the transmission type hologram dry plate will be described.

In pattern formation by holography, the minimum resolution depends on the size of the hologram dry plate and the wavelength of the light source used. The resolution δX is given by the formula of the lens optical system shown in the following equation (1).

ΔX = λL / D (1) δX is the resolution, λ is the wavelength, L is the distance between the hologram and the lens, and D is the diameter of the hologram. Since there is a limit to the size of the hologram that can be used, the pattern resolution ultimately depends on the wavelength.

The diffracted light in holography includes a zero-order light and a high-order diffracted light that pass directly without diffracting the hologram. Usually, the zero-order light does not include phase information, so that the pattern of the pattern is not included. The reproduction is not performed, and the reproduction of the pattern is performed with the higher-order diffracted light. It is for this reason that an off-axis optical arrangement (a state in which components such as lenses, holograms, and screens are not arranged on one optical axis) is adopted in hologram reproduction. Except for the zero-order light in which the pattern is not reproduced, the optical arrangement when reproducing with high-order light in which the pattern is reproduced is off-axis.

In the case of holograms, in the case of light, an object light and a reference light interfere with each other, and the light is exposed on a glass substrate and used as a hologram. Phase) and intensity information of the light emitted by the light source and the Fourier transform of the shape of the object (pattern). Therefore, there are two methods of obtaining the transmission function by calculation and realizing it on an appropriate film. is there. The latter is called a computer generated hologram (CGH). According to the latter method, it can be artificially created by calculation. In 1967, a binary computer-generated hologram by a computer was presented. Since then, the digital first transfer (DFFT) method has been improved, a high-quality reproduced image can be formed, and a three-dimensional pattern can be formed using a computer-generated hologram.

A hologram synthesized by such a computer records optical information from a virtual object, in particular, phase information as 0 or 1 information on the hologram. As shown in FIG. 13, the transmission hologram divides its information recording surface into a finite number of cells, and for example, 1 is set to 100%
In the transmission hole (corresponding to one cell), 0 corresponds to 100% opacity (corresponding to one cell), and holes are actually formed in the hologram, and these holes are phased from the virtual object. -It is formed according to the strength information. Each opening or closing is a cell.

Here, when trying to increase the resolution of the pattern, it is necessary to shorten the wavelength according to equation (1). That is, the currently used KrF, ArF
In microfabrication exceeding the wavelength of an excimer laser, for example, it is effective to use an X-ray or an electron beam having a shorter wavelength as a light source for lithography.

In the holographic pattern forming method with high resolution, any light source may be used as long as it has good coherence and good wave characteristics. For example, a material wave (de Broglie wave) of an electron beam emitted by field emission
Can be used. The wavelength of an electron beam of 100 keV is 0.03 angstroms, and an example in which a grating is formed by a biprism (a type of hologram) using this electron beam was applied in 1995 by Applied Physics Letter (Appl. Phys. Lett. 66 (19
95) p. 1560), Vol. 66, p. 1560.

In order to diffract such short-wavelength light, it is necessary to form a hologram pattern of about that wavelength. In recent years, the development of ultrafine pattern forming technology by electron beam exposure has been remarkable, and it is possible to form a pattern on the order of 0.02 microns, and to form a fine hologram in response to a shorter wavelength of a light source.

However, at the same time, when the size of the cell constituting the transmission hologram is reduced to several tens of nanometers, the distance between the holes formed in the hologram becomes very small. It becomes very difficult to form and maintain

In the transmission type hologram, there is a problem that a part which cannot be formed occurs depending on the arrangement of the pattern. Normal,
A CGH (computer hologram) pattern is represented by a two-dimensional spatial frequency cell (m, n) with a number corresponding to the number of pixels (X, Y) of the virtual object. Each (m, n) has phase information obtained by Fourier transform. After quantizing this complex information, this complex number is represented by a subcell. In the expression by the subcells, a so-called floating subcell pattern in which the pattern of the transmission holes cannot be held between adjacent cells occurs, and a hologram cannot be formed.

Therefore, it is difficult to miniaturize a transmission type hologram dry plate, and there is a problem that an extremely fine pattern cannot be formed by lithography using a transmission type hologram.

[0026]

SUMMARY OF THE INVENTION In order to solve the above-mentioned problems, the present invention is directed to forming a two-dimensional or three-dimensional pattern by using a reflection hologram instead of a transmission hologram as a hologram dry plate. Features.

The present invention is characterized in that a reflection type hologram is created by computer synthesis based on an arbitrary pattern, a light source is irradiated on the hologram, and a pattern is formed using a reproduced image by a reflected wave from the hologram. This is a pattern forming method using a reflection hologram.

A substrate on which a pattern is to be formed is disposed at a position where a reproduced image by a reflection hologram is formed, and a resist for forming a pattern corresponding to the reproduced image by reacting with a light source by a reflected wave from the hologram. It is characterized in that a material is applied on the substrate.

Alternatively, a substrate on which a pattern is to be formed is arranged at a position where a reproduced image formed by a reflection hologram is formed, and a reactant with the light source to form a deposit near the substrate.
A pattern forming method is characterized in that a pattern corresponding to the reproduced image is formed on the substrate by introducing a VD gas.

It is preferable that a reflection type hologram be coated with a metal material having a sufficiently low transmittance to the light source because the reflection efficiency is improved.

As the light source, for example, laser light, X-ray,
A coherent electron beam or the like can be used.

Further, in the method for forming a three-dimensional pattern according to the present invention, the reflection hologram is divided into a plurality of two-dimensional patterns by cutting an arbitrary three-dimensional pattern on planes parallel to each other, and the object in each two-dimensional pattern is decomposed. It is produced by computer synthesis based on the phase and intensity information of the light and the distance between each two-dimensional pattern, irradiates a reflection type hologram with the light source, and a reproduced image reflected by the reflection type hologram is formed by each of the above two types.
This is a pattern forming method using a reflection hologram, wherein the focal length is different for each dimensional pattern.

In the reflection type hologram dry plate, irregularities corresponding to a binary hologram pattern created by CGH, or a hologram recording surface created by opening and closing holes are lined and held by a glass substrate or a Si substrate. Therefore, it is easy to form a pattern having a high aperture ratio that cannot be formed with a transmission type hologram dry plate, and it is easy to form a fine hologram dry plate with a reflection type hologram dry plate, so that a finer pattern can be formed.

[0034]

DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of a pattern forming method according to the present invention will be described.

(First Embodiment of the Present Invention) FIG. 1 shows an example of a basic arrangement of an apparatus used in the present invention. First, a case where laser light is used as a light source for irradiating the hologram 1 will be described.

In FIG. 1, laser light (wavelength 419 nm) emitted from an Ar laser light source reaches the reflection hologram 1 through a beam expander and a collimator on the way. Of the light reflected by the reflection type hologram, the zero-order light is removed from the optical system by the aperture existing in the beam line path, and only the high-order light contributing to hologram reproduction passes through the lens 3 and is coated with an optical resist. The pattern is reproduced and formed on the formation substrate 2. Lens 3
Is used for focusing, and the size of a focused pattern can be changed by using lenses having different focal lengths.

Next, an embodiment of a method for producing the reflection type hologram dry plate 1 will be described with reference to FIGS. The virtual pattern on the computer is "NEC" as shown in Fig. 2.
Character.

FIG. 3 shows a flowchart of a process for producing a reflection type CGH. As shown in FIG. 3, first, a random phase was given to the character in FIG. 2, and the Fourier transform was performed to obtain phase information on the hologram surface. This phase information is quantized into an 81-gradation complex space to obtain a binary CGH.
It was a hologram.

Further, iterative Fourier transform processing may be performed on this CGH hologram to optimize a reproduced image by simulation. FIG. 4 shows a part of the binary hologram pattern calculated in this way.

In this embodiment, the CGH hologram pattern calculated by the above iterative method is
Exposure to MA (polymethyl methacrylate) resist,
A reflection hologram was formed by depositing a metal such as Ag, Au, or Al and then forming a hologram pattern by lift-off. FIG. 5 shows a configuration diagram of the reflection type hologram dry plate.

Depending on the arrangement of the holes (openings), the appearance of a pattern part completely floating in the air is conceivable. However, in the reflection type hologram dry plate, the hologram is backed and held by a substrate (Si substrate) and is reproduced using light reflected on the hologram dry plate. , The pattern can be reproduced. Therefore, according to the present invention, the hologram dry plate can be miniaturized regardless of the pattern shape, and a pattern finer than a reflection hologram can be formed.

The reproduced light reflected by the hologram dry plate is
A substrate 2 coated with an optical resist was prepared at a position where a reproduced image was formed by condensing with the lens 3 of FIG. 1, and a pattern was reproduced on the substrate 2 to form a pattern. As a result, formation of a favorable micron-order resist pattern was confirmed. The resist on the substrate 2 is a negative resist or a positive resist that reacts with the hologram reproduction light, and the hologram pattern used is the one inverted from the other.

(Embodiment 2) Next, an embodiment of the present invention using an electron beam as a hologram reproducing system will be described. FIG. 6 shows a configuration diagram of an electron beam hologram device using a reflection type optical system using a field emission type electron gun.

Electrons obtained by cold field emission are characterized by their narrow energy width and good coherence. Electrons extracted from the cold cathode at about 5 keV are supplied to a condenser lens, a deflection electrode,
The reflection hologram 1 is radiated through the objective lens.

In the condenser lens, the amount of current is controlled.
The deflection electrode adjusts the direction of the electron beam in the X-axis and Y-axis directions. The objective lens adjusts the collimation of the electron beam incident on the hologram 1 and the beam spot shape (stigma), and has a function of finally adjusting the electron beam incident on the hologram.

When the reflection hologram 1 is irradiated with an electron beam, a retarding potential for decelerating the electron beam is applied to the surface of the hologram 1, and the wavelength of the electron wave is controlled by the retarding potential. In the present embodiment, a deceleration potential of about 4.0 to 4.9 keV is used,
An electron beam having an energy of 1 keV to 1 keV was used. In this case, the wavelength of the electrons is about 0.3 to 1 Å.

The electrons reflected by the hologram 1 are converged by the lens 3 and drawn as a hologram reproduction pattern on the substrate 2 coated with a positive electron beam resist.
The reflection hologram used in the present embodiment has a size of one CGH cell of 20 nm as in the case of laser light.
A hologram pattern of a negative resist was formed on a Si substrate, and Si was etched by about 20 nm by dry etching. According to the present embodiment, a hologram reproduced image by the reflected electron beam can be formed as a pattern on the positive type electron beam resist.

(Third Embodiment of the Present Invention) Next, a third embodiment of the present invention using a radiation X-ray by coherent SOR (Synchrotron Orbital Radiation) as a light source will be described. What is coherent here?
It indicates that the X-ray wave is coherent, which means that the wavelengths are uniform and that the wavefront is at least as large as the hologram dry plate.

FIG. 7 shows a configuration diagram of a hologram device using a reflection type optical system using X-rays (wavelength: 20 nm to 1 nm) irradiated from an SOR source. The wavelength of the white X-rays emitted from the SOR is selected by a grating, and after passing through a slit, the white hologram is irradiated on the reflection hologram 1.

The hologram used in the present embodiment is similar to the hologram for the electron beam, except that a Si substrate on which irregularities are formed corresponding to the CGH hologram pattern is manufactured, and then a W surface is formed on the Si surface in order to increase the reflectance. (Tungsten) coated was used. Other than tungsten,
It is sufficient that the material has a sufficiently low transmittance to X-rays, and the order of coating is not limited to the above.
It may be before the etching. The reflectivity strongly depends on the X-ray wavelength. For example, in a region where the SOR wavelength coincides with the characteristic X-ray wavelength of the reflective film metal, the reflectivity decreases conversely. A metal film can be used as a reflection film.

The X-ray reflected and diffracted by the reflection hologram 1 is converged and projected on a substrate 2 coated with an X-ray positive resist through a zone plate. Also in the present embodiment, a hologram reproduced image by reflected X-rays could be formed as a pattern on a positive type X-ray resist.

(Embodiment 4 of the Present Invention) Next, an embodiment of a three-dimensional pattern forming method according to the present invention will be described. In pattern formation using a hologram, it is a great feature that a three-dimensional pattern is obtained as a reproduction pattern. A method for creating a three-dimensional pattern according to the present invention will be described with reference to FIGS.

FIG. 8A shows an example of a three-dimensional pattern.
Consider a surface relief type pattern as shown in FIG. Break this three-dimensional pattern into several two-dimensional patterns,
From the bottom side, A, B, C,...
(A)). That is, the three-dimensional object is treated as a polymer of two-dimensional planes A, B, C,... Separated by a distance δh in the z direction.

Since the surfaces A, B, and C are considered to be two-dimensional holograms having different focal lengths and pattern shapes, in the hologram calculation, the result of the two-dimensional Fourier transform from each two-dimensional surface is calculated as δh. By combining in consideration of the distance, a hologram representing a three-dimensional pattern can be produced. The reflection hologram obtained in this manner has a shape that is apparently the same as a normal two-dimensional hologram, as shown in FIG.

The reflection type hologram is irradiated with, for example, light, and the light reflected by the hologram forms a pattern reproduction image on the three-dimensional pattern forming substrate. Fig. 9 (a) on the substrate
As shown in (1), reproduction is performed at a distance δh in the z direction corresponding to the A, B, and C planes. Since the result of the two-dimensional Fourier transform is synthesized in consideration of the distance of δh at the time of CGH formation, the focal point of the A plane is a position δh away from the substrate, and
The convergence of light is weak on the plane and the C plane. In addition, the information on the surface B is focused at a position 2δh away from the substrate, and A
The convergence of light is weak on the plane and the C plane.

A CVD (chemical vapor deposition) gas, which reacts with the reproduction light to generate a deposit, is introduced in the vicinity of the position where the reproduced image is formed (pattern forming substrate). If the ratio of the light intensity at the focal position to the light intensity at the position outside the focal position is greater than the threshold value of the reaction energy of the CVD, the information on the A-plane will be obtained only in the vicinity of the A-plane reproducing position. Decomposition occurs and is deposited on the substrate. Similarly, the CVD reaction occurs on the B and C surfaces only in the vicinity of each reproduction position. In this manner, according to the present invention, the three-dimensional pattern of FIG. 8A can be collectively formed by CVD as shown in FIG. 9B.

FIG. 10 shows a configuration example of an apparatus for forming a three-dimensional image. The light reflected by the reflection hologram 1 is guided into a vacuum CVD chamber via a view port. The viewport is a glass window on the vacuum device that separates the vacuum from the atmosphere.

A reproduced image is projected on the substrate in the vacuum chamber, and at the same time, a CVD gas is introduced toward the substrate surface. In the present embodiment, styrene gas is used as a CVD gas, and 3% of styrene decomposition products (mainly carbon) is used.
A three-dimensional object was formed. According to the present embodiment, a Fresnel zone plate having a triangular saw blade shape in cross section is shown in FIG.
The three-dimensional structure of the surface relief type as shown in (a) can be easily and collectively formed by one hologram.

Although the above three-dimensional pattern is formed by one hologram, there is a method in which two-dimensional holograms corresponding to A, B, and C are used and are sequentially reproduced from the A surface (FIG. 11). . The hologram information of each of the surfaces A, B, and C is calculated, and the hologram information is sequentially reproduced from the surface A.
The height is increased by the deposits resulting from the decomposition (FIG. 11B), and the upper surface thereof becomes the focal plane at the time of the next B-plane reproduction. Here, the b-side is reproduced (deposited) (FIG. 11C), and the C-side is sequentially reproduced (FIG. 11C).
By depositing (d)), a three-dimensional structure can be formed.

In the above embodiment of the present invention,
Although the method of forming a three-dimensional pattern using the method described above was used, a resist material whose reaction was sensitive to light intensity was used, and the light intensity at the focal position and the light at a position outside the focal position were used. If the intensity ratio is so large that it exceeds the threshold value of the reaction energy of the resist material, a three-dimensional pattern can be formed also by the resist material.

[0061]

According to the present invention, since a fine hologram can be formed and held by using a reflection hologram as a hologram, a pattern having a high aperture ratio which cannot be formed by a conventional transmission hologram can be obtained. Formation and
A finer pattern can be formed. Also,
Since the reflection hologram is backed and held by the substrate, it has higher strength than the transmission hologram.

Further, the present invention does not require a complicated lens system for reproducing the hologram, the adjustment operation is easier than the lithography using a stepper, and the pattern can be transferred in a non-contact manner. Even if some physical defect (scratch) occurs on the dry plate, a fatal defect is rarely generated in the reproduced image, and a three-dimensional pattern that can be formed even with a non-existing virtual pattern that is resistant to dirt and scratches is formed. For example, it also has the effects of holographic lithography.

[Brief description of the drawings]

FIG. 1 is a diagram showing one configuration of a reproduction optical device using a reflection hologram of the present invention.

FIG. 2 is a diagram showing an example of an inverted pattern.

FIG. 3 is a manufacturing process diagram of a reflective CGH of the present invention.

FIG. 4 is a diagram showing an example of a binary hologram pattern.

FIG. 5 is a configuration diagram of a reflection type hologram dry plate.

FIG. 6 is a diagram showing one configuration of a reproduction optical system using a reflection hologram of the present invention using an electron beam.

FIG. 7 is a diagram showing one configuration of a reproduction optical system using a reflection hologram of the present invention using SOR / X-rays.

8A is a configuration diagram of a surface relief type three-dimensional structure, and FIG. 8B is a binary hologram thereof.

FIG. 9 is a diagram for explaining the principle of forming a three-dimensional structure according to the present invention.

FIG. 10 is a diagram showing one configuration of a hologram reproducing optical system device used for forming a three-dimensional structure using CVD according to the present invention.

FIG. 11 is a diagram for explaining the principle of forming another three-dimensional structure according to the present invention.

FIG. 12 is a configuration diagram of a conventional reproduction optical system using a transmission hologram.

FIG. 13 is a view for explaining the principle of reproducing a pattern by a conventional transmission hologram.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Reflection hologram 2 Pattern formation board 3 Lens 4 Laser oscillator 5 Transmission hologram

Claims (7)

[Claims] 1. A method of producing a reflection hologram by computer synthesis based on an arbitrary pattern, irradiating the hologram with a light source, and forming a pattern using a reproduced image by a reflected wave from the hologram. Forming method using reflective hologram. 2. A reflection hologram is created by computer synthesis based on an arbitrary pattern, and a light source is irradiated to the hologram to form a reproduced image by a reflected wave from the hologram on a substrate on which a pattern is formed. A pattern corresponding to the reproduced image is formed on the substrate by reacting a resist material applied on the substrate with a light source based on the reflected wave. 3. A reflection hologram is created by computer synthesis based on an arbitrary pattern, and a hologram is irradiated with a light source to form a reproduced image by a reflected wave from the hologram on a substrate on which a pattern is formed. A pattern corresponding to the reconstructed image is formed on the substrate by introducing a CVD gas which reacts with the light source to produce a deposit in the vicinity of the substrate. . 4. The reflection type hologram is coated with a metal material having a sufficiently low transmittance to the light source on the reflection type hologram. A pattern forming method using a reflection hologram. 5. The method according to claim 1, wherein the light source is a laser beam or an X-ray.
5. The pattern forming method using a reflection hologram according to claim 1, wherein the pattern is a coherent electron beam. 6. The pattern forming method using a reflection hologram according to claim 1, wherein the pattern is a two-dimensional or three-dimensional pattern. 7. A method for forming a three-dimensional pattern, wherein the reflection hologram is divided into a plurality of two-dimensional patterns by cutting an arbitrary three-dimensional pattern by planes parallel to each other, and the object light in each two-dimensional pattern is obtained. Is produced by computer synthesis based on the phase and intensity information and the distance between each two-dimensional pattern, irradiates the reflection type hologram with the light source, and the reproduced image reflected by the reflection type hologram forms the two-dimensional pattern. The pattern forming method according to any one of claims 1 to 5, wherein a focal length differs for each pattern.