JPH10142589A - Production of optical substrate - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a process for producing an optical substrate capable of preventing the incidence of unnecessary light. SOLUTION: A high-refractive index transparent adhesive 4 is applied on a glass substrate and after a stamper S is pressed thereto from above, this adhesive is temporally cured. The stamper S is thereafter removed and the high-refractive index transparent adhesive 4 is normally cured to form a microlens array part MR. A black mask is formed on at least its periphery. Cover glass is stuck to the high-refractive index transparent adhesive 4 via other translucent adhesive having the refractive index different from the refractive index of the high-refractive index transparent adhesive 4 constituted with at least the microlens array part MR. The cover glass or substrate glass is formed to a prescribed thickness.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a method for manufacturing an optical substrate for forming a lens array on a substrate glass.

[0002]

2. Description of the Related Art In recent years, a liquid crystal display device having a microlens for obtaining a light-condensing effect on an incident side (a substrate on the opposite side) for improving luminance is applied. As described in Japanese Patent Publication No. 6-42126, a glass etching method, a stamp method, and the like have been considered to form the microlenses.

[0003] Among them, the stamp method is widely applied because of its excellent mass productivity. In the stamp method, first, a microlens array of a photoresist is formed by photolithography technology, and a convex shape of the microlens is formed by heating reflow. Next, a metal film such as nickel is applied on the convex shape by electroless plating, and a mold is transferred with a resin and a support to form a stamper.

Then, a stamper is pressed against the high-refractive-index transparent resin applied on the base glass, and the shape of the stamper is transferred to the high-refractive-index transparent resin to form a microlens array. The resin is sealed with a cover glass having a predetermined thickness to form a transparent electrode.

[0005]

However, when a microlens array is formed by such a stamper, if a region where a lens effect cannot be obtained is formed between the lens portions, unnecessary regions are formed from the region. Light enters and causes color mixture (color unevenness). Furthermore, since the substrate on which the microlens array is formed is transparent, the alignment and alignment with the liquid crystal drive substrate (TFT substrate), and the alignment by dicing and scribe division are inaccurate, and the contrast due to the decrease in the degree of polarization is reduced. This causes a problem that the luminance cannot be improved due to the reduction or the reduction of the lens effect.

[0006]

SUMMARY OF THE INVENTION The present invention is a method for manufacturing an optical substrate which has been made to solve such a problem.
That is, the present invention provides a step of applying a photoresist on a base, performing photolithography and reflow on the photoresist to form a plurality of convex portions serving as a lens array portion, and forming a metal layer on the photoresist. A step of attaching and attaching a support base to the metal layer via an adhesive, and peeling the metal layer from the base together with the support base to form a stamper having a plurality of recesses in which a plurality of protrusions are inverted by the metal layer. And applying a translucent adhesive on the substrate glass, pressing a concave portion formed of a metal layer of the stamper from above the translucent adhesive, and temporarily curing the translucent adhesive. The stamper is removed, the translucent adhesive is fully cured, and the convex portion formed by transferring the shape of the concave portion formed of the metal layer of the stamper to the translucent adhesive is used as a lens array portion, and at least Len A step of forming a light-shielding film around the array portion, and at least a translucent adhesive having a refractive index different from that of the translucent adhesive to the translucent adhesive constituting the lens array portion. And bonding the cover glass through the cover glass and the cover glass or the substrate glass to a predetermined thickness.

Further, after the stamper is formed, light is shielded at a position around the lens array portion on the substrate glass and at a position between the respective convex portions of the plurality of convex portions of the lens array portion. A step of forming a film, applying a light-transmitting adhesive on the substrate glass and the light-shielding film, and aligning and pressing the concave portion formed of the metal layer of the stamper from above the light-transmitting adhesive, Temporarily curing the light-transmitting adhesive, removing the stamper, fully curing the light-transmitting adhesive, and transferring the shape of the recess formed by the metal layer of the stamper to the light-transmitting adhesive. A step of forming the convex portion as the lens array portion, and at least providing the light-transmitting adhesive constituting the lens array portion with another light-transmitting adhesive having a refractive index different from that of the light-transmitting adhesive. And attach the cover glass,
A method of manufacturing a cover glass or a substrate glass to a predetermined thickness.

After forming the stamper, a step of applying a low melting point glass paste on the substrate glass and pressing a concave portion formed of a metal layer of the stamper from above the low melting point glass paste; A step of removing the stamper to form a lens array in a state in which a convex portion formed by transferring the shape of the concave portion constituted by the layer to the low-melting glass paste and forming the low-melting glass paste into a dry gel and vitrify; And a step of forming a light-shielding film at least around the lens array portion, and attaching a cover glass to at least the lens array portion via a translucent adhesive having a refractive index different from that of the low-melting glass paste, Making the glass or the substrate glass a predetermined thickness.

After the above-described stamper is formed, light is shielded at positions around the positions of the lens array on the substrate glass and between the protrusions of the plurality of protrusions of the lens array. A step of forming a film, a step of applying a low-melting glass paste on the substrate glass and the light-shielding film, and aligning and pressing a concave portion formed of a metal layer of the stamper from above the low-melting glass paste; The stamper is removed to form a lens array in a state in which the shape of the concave portion formed by the metal layer is transferred to the low-melting glass paste, and the low-melting glass paste is dried, gelled, and vitrified. And bonding a cover glass to at least the lens array portion with a translucent adhesive having a refractive index different from that of the low-melting glass paste. It is also the-glass or the method of manufacturing an optical substrate comprising a step of the substrate glass to a predetermined thickness.

In the method of manufacturing an optical substrate according to the present invention, since a light-shielding film is formed around a lens array formed by a stamper and between each of a plurality of projections forming the lens array, a lens is formed. Light that is going to pass through other than the array section can be blocked by the light shielding film.

[0011]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the method for manufacturing an optical substrate according to the present invention will be described below with reference to the drawings. First, a method for manufacturing a stamper will be described based on the schematic sectional views of FIGS. First, as shown in FIG. 1A, a photoresist PR having a thickness of, for example, 30 μm is applied on the base glass 1 (6 inches in diameter) by spin coating.

Next, as shown in FIG. 1 (b), the photoresist PR is patterned by photolithography, heated and reflowed to form a portion MR 'corresponding to the microlens array portion and an alignment mark portion. A portion AM ′ is formed. At this time, a portion (not shown) corresponding to the scribe line portion may be formed at the same time.

Next, as shown in FIG. 1C, a metal film M made of nickel, for example, having a thickness of about 1 μm is applied on the photoresist PR by electroless plating.

Subsequently, as shown in FIG. 2A, a support 2 is attached on the metal film M via an adhesive B made of an ultraviolet irradiation curing type or the like. In the case where the adhesive B is of an ultraviolet irradiation curing type, a glass plate such as borosilicate glass which can sufficiently transmit ultraviolet light is used as the support 2.

After irradiating a predetermined amount of ultraviolet light through the support table 2 to cure the adhesive B, the metal film M and the support table 2 are combined with the base glass as shown in FIG. A stamper S is formed by peeling the stamper S from the stamper S. As a result, the shape of the metal film M of the stamper S becomes a transfer of the shape of the photoresist PR. Since the metal film M uses nickel by electroless plating, the metal film M has low adhesion to the photoresist PR, and can be easily peeled off from the photoresist PR together with the support 2. The stamper S can be used many times as a master.

Next, a method of forming a microlens array portion and the like using the stamper S will be described. 3 and 4 are schematic sectional views illustrating the first embodiment. First, FIG.
As shown in FIG. 2A, an epoxy-based or acrylic-based high-refractive-index transparent adhesive 4 (refractive index: 1.
6-1.7) is applied by spin coating to a thickness of about 30 μm. The high-refractive-index transparent adhesive 4 is preferably of an ultraviolet irradiation + thermosetting type, but may be an ultraviolet irradiation curing type or a thermosetting type. The substrate glass 3 is preferably made of the same material as a cover glass described later.

Next, as shown in FIG. 3B, the stamper S prepared in the above-described process is pressed against the high-refractive-index transparent adhesive 4, and the shape of the metal film M is transferred to the substrate glass. 3 is irradiated with ultraviolet light (for example, 3000 to 5
000 mJ / cm ² ) and temporarily cured. When the high refractive index transparent adhesive 4 is of a thermosetting type, it is prebaked by predetermined heating (about 120 ° C. for about 1 hour) and temporarily cured.

Next, the stamper S is peeled off in a state where the high-refractive-index transparent adhesive 4 is temporarily cured to form a shape as shown in FIG. 3C, and heated at 180 ° C. for about 1 hour to obtain a high refractive index. The transparent adhesive 4 is fully cured. As a result, the micro lens array part MR and the alignment mark part AM are formed by the high refractive index transparent adhesive 4. In order to improve the removability of the stamper S, the surface of the metal film M of the stamper S may be coated with a fluorine-based or silicone-based thin film.

Next, as shown in FIG. 4A, a black mask BM is formed around the micro lens array MR and around the alignment mark AM. To form the black mask BM, first, the entire surface of the high-refractive-index transparent adhesive 4 is spin-coated with a photoresist in which carbon is mixed or a black pigment is dispersed, and the microlens array part MR and the alignment mark part are exposed by mask exposure and development. After the portions other than AM are left, they are fixed by post-baking. The black mask BM is desirably formed so as to have an optical density of 3.0 or more and no pinhole.

Next, as shown in FIG. 4B, a low-refractive-index transparent adhesive 5 (refractive index: 1.34 to 1.4) of fluorine-based or fluorine-based epoxy or fluorine-based acrylic is applied. The cover glass G is attached via this. As the cover glass G, crystallized glass, borosilicate glass, aluminosilicate glass, quartz glass, or the like having a low coefficient of thermal expansion is used. The cover glass G having a refractive index of about 1.46 to 1.52 is used.

Then, as shown in FIG. 4 (c), the cover glass G is polished on one side (hereinafter, polishing includes optical polishing) until it reaches a predetermined thickness t. In performing this one-side polishing, in the present embodiment, the thickness of the cover glass G is measured using the black mask BM, and finishing is performed with high accuracy. Note that so-called double-side polishing may be performed in which both the cover glass G and the substrate glass are simultaneously polished so that the cover glass G has a predetermined thickness t. Therefore, it is necessary to increase the thickness of both the cover glass G and the substrate glass by the thickness to be polished on both sides.

Here, the focal length f of the lens portion R is f =
It is represented by (r / Δn) × n. Note that r: radius of curvature of the lens portion R, Δn: difference in refractive index, and n: high refractive index. Therefore, for example, when r = 25 μm and Δn = 1.6 (high refractive index) −1.38 (low refractive index), the focal length f of the lens is 182 μm, and the thickness t of the cover glass G is about 150 μm. That's all I need to do.

Then, a transparent electrode is placed on the cover glass G.
A certain ITO6 (In_TwoO_Three+ SnO _Two) By spatter
It is formed on the entire surface with a thickness of 130 to 150 nm. In addition, ITO6
IXO (In_TwoO_Three+ ZnO-based)
good.

As shown in FIG. 12A, a low-refractive-index transparent adhesive 5 (refractive index: 1.34 to 1.4) is applied, and a cover glass G is adhered through the adhesive. Then, the substrate glass 3 is polished on one side as shown in FIG.
6 may be formed. At this time, the same double-side polishing may be performed.

Next, a second embodiment will be described with reference to the schematic sectional view of FIG. The second embodiment is characterized mainly in that a black mask BM is also provided between the lens units R. That is, the process is the same as that of the first embodiment until the lens portion R and the like are formed by the high refractive index transparent adhesive 4 by pressing the stamper. In the second embodiment, as shown in FIG. In photolithography when forming the mask BM, the mask BM is left around the lens portions R as well as between the lens portions R. At this time, it is desirable that the black mask BM has an optical density of 3.0 or more and has no pinhole.

Next, as shown in FIG. 5 (b), a low refractive index transparent adhesive 5 (refractive index: 1.34-1.4) of fluorine-based or fluorine-based epoxy or fluorine-based acrylic is applied to a high refractive index transparent adhesive. The cover glass G is applied on the adhesive 4 and the cover glass G is adhered through the adhesive. As the cover glass G, crystallized glass, borosilicate glass, aluminosilicate glass, quartz glass, or the like having a low coefficient of thermal expansion is used. The cover glass G having a refractive index of about 1.46 to 1.52 is used.

Then, as shown in FIG. 5C, the cover glass G is polished on one side until a predetermined thickness t is reached. First
In this embodiment, the thickness of the cover glass G is measured using the black mask BM to perform the polishing with high accuracy, as in the embodiment. At this time, the same double-side polishing may be performed.

Thus, the micro lens array M
The optical substrate on which the black mask BM is formed is completed not only between R and the periphery of the alignment mark part AM, but also between each lens part R constituting the microlens array part MR.
When this optical substrate is used as a counter substrate facing a liquid crystal driving substrate of a liquid crystal display device, after the above one-side polishing, ITO6 (In ₂ O ₃ + S
nO ₂ ) is formed on the entire surface with a thickness of 130 to 150 nm. IXO (In ₂ O ₃ + ZnO) is used instead of ITO6.
System) may be used.

Further, as shown in FIG. 13 (a), a low-refractive-index transparent adhesive 5 (refractive index: 1.34 to 1.4) is applied, and a cover glass G is pasted through the adhesive. Then, the substrate glass 3 is polished on one side, as shown in FIG.
6 may be formed. At this time, the same double-side polishing may be performed.

Next, a third embodiment will be described with reference to the schematic sectional views of FIGS. The third embodiment is characterized mainly in that a black mask BM is provided before forming a microlens array portion.

That is, first, as shown in FIG.
A black mask B is provided around the position where the lens portions R are formed on the substrate glass 3 and at a position between the lens portions R.
Form M. In order to form the black mask BM, first, a photoresist mixed with carbon or dispersed with black pigment is spin-coated on the entire surface of the substrate glass 3, and portions other than the microlens array portion MR and the alignment mark portion AM are exposed by mask exposure and development. After leaving, it is fixed by post baking. At this time, it is desirable that the black mask BM has an optical density of 3.0 or more and has no pinhole.

Next, as shown in FIG. 6B, an epoxy or acrylic high refractive index transparent adhesive 4 having a thickness of about 30 μm is applied on the substrate glass 3 and the black mask BM by spin coating. The high-refractive-index transparent adhesive 4 is preferably of an ultraviolet irradiation + thermosetting type, but may be an ultraviolet irradiation curing type or a thermosetting type.

Next, as shown in FIG. 6C, the stamper S prepared in the above-described process and the alignment mark of the black mask BM are aligned and pressed against the high refractive index transparent adhesive 4. The shape of the metal film M is transferred, and ultraviolet light is irradiated from the substrate glass 3 (for example, 3000).
５5000 mJ / cm ² ) and temporarily cured. When the high refractive index transparent adhesive 4 is of a thermosetting type, it is prebaked by predetermined heating (about 120 ° C. for about 1 hour) and temporarily cured.

Next, the stamper S is peeled off in a state where the high-refractive-index transparent adhesive 4 has been temporarily cured to form a shape as shown in FIG. The transparent adhesive 4 is fully cured. As a result, the micro lens array part MR and the alignment mark part AM are formed by the high refractive index transparent adhesive 4. Further, a black mask BM is provided between the periphery of the micro lens array portion MR and the alignment mark portion AM and between the lens portions R.
Is embedded.

Next, as shown in FIG. 7B, a low-refractive-index transparent adhesive 5 (refractive index: 1.34 to 1.4) of fluorine-based or fluorine-based epoxy or fluorine-based acrylic is applied. The cover glass G is attached via this. As the cover glass G, crystallized glass, borosilicate glass, aluminosilicate glass, quartz glass, or the like having a low coefficient of thermal expansion is used. The cover glass G having a refractive index of about 1.46 to 1.52 is used.

Then, as shown in FIG. 7 (c), the cover glass G is polished on one side until it has a predetermined thickness t. In this one-side polishing, similarly to the first embodiment, the thickness of the cover glass G is measured by using the black mask BM, and finishing is performed with high accuracy. At this time, the same double-side polishing may be performed.

Thus, an optical substrate in which the black mask BM is embedded in the high-refractive-index transparent adhesive 4 constituting the microlens array MR is completed.

Next, as shown in FIG. 7D, a transparent electrode of ITO 6 (In ₂ O ₃ + S
nO ₂ ) is formed on the entire surface with a thickness of 130 to 150 nm by sputtering. Note that IXO (In ₂ O ₃ +
ZnO-based) may be used.

Further, as shown in FIG. 14A, a low-refractive-index transparent adhesive 5 (refractive index: 1.34 to 1.4) is applied, and a cover glass G is adhered via this. Then, the substrate glass 3 is polished on one side as shown in FIG. 14B without polishing the cover glass G on one side.
6 may be formed. At this time, the same double-side polishing may be performed.

The formation of the ITO 6 and the subsequent steps are common to the first and second embodiments described above. That is, in the case of the third embodiment, I
After the TO6 is formed, as shown in the schematic cross-sectional view of FIG. 8, an alignment film 11 is formed on the optical substrate 10 (opposite substrate) manufactured in the above-described process, a rubbing process is performed, and the alignment mark part AM is used. Then, dicing is performed, and after cleaning, a sealant (not shown) is applied. On the other hand, the TFT substrate 2
Then, a rubbing process is performed on the alignment film 21 and diced using an alignment mark, and after cleaning, a common agent (not shown) is applied. Then, both are superposed using the alignment mark of each substrate.

At this time, as shown in FIGS. 9A and 9B, an alignment mark portion AM formed using a black mask BM on the optical substrate 10 side (see FIG. 9A) and a TFT substrate 20-side alignment mark part am
(See FIG. 9B).
(Refer to (a)), high-precision overlay is performed at a predetermined gap. Next, liquid crystal C is injected and sealed between the optical substrate 10 and the TFT substrate 20, and the liquid crystal C is aligned by heat treatment to complete the liquid crystal display device.

When the optical substrate 10 and the TFT substrate 20 are overlapped, the drive circuit section of the TFT substrate 20 is shielded from light by the black mask BM of the optical substrate 10. Further, the periphery of the opening is also shielded from light by the black mask BM.

FIG. 10 is a schematic plan view for explaining the black mask BM provided between the lens portions R. When the lens portion R has such a hexagon, the black mask BM is formed along the contour.

FIG. 11 is a schematic sectional view for explaining the state of light shielding by the black mask BM between the lens portions R. In other words, the lens unit R can perform a predetermined focusing on the incident light, and the mixed color light to enter from between the lens units R is blocked by the black mask BM formed between the lens units R. Color mixing can be prevented.

The assembled state in the case of the second embodiment is as shown in the schematic sectional view of FIG. That is, in the assembled state in the case of the second embodiment, the arrangement of the black mask BM is different from that in the assembled state in the third embodiment shown in FIG.

In any of the embodiments described above, when forming the microlens array MR,
Although the example using the high-refractive-index transparent adhesive 4 is shown, a low-melting-point glass paste for high-refractive-index and high-transmittance may be used instead of the high-refractive-index transparent adhesive 4.

In this case, a lead oxide type low melting point glass paste is applied instead of the high refractive index transparent adhesive 4 shown in FIG. As the lead oxide-based low-melting glass paste, a paste prepared by adjusting a lead oxide powder with a binder such as ethyl cellulose to a paste viscosity of 100 to 120 (kcps) is used. Print. As the substrate glass 3, soda glass, aluminosilicate glass, borosilicate glass, or the like having a small difference in thermal expansion coefficient from lead-based glass is used.

Next, the stamper S shown in FIG. 3B is pressed from above the low melting point glass paste to transfer the shape.
Drying is performed with the stamper S removed to form a patterned dry gel film. At this time, depending on the viscosity of the low-melting glass paste and the shape of the microlens, the stamper S may be removed after prebaking and drying while pressing the stamper S to form a dry gel film. Then, a binder or the like added by the heat treatment is thermally decomposed to form a lead oxide-based glass film. As the heat treatment, baking in air is performed by heating at 410 to 580 ° C. for about 30 to 60 minutes. Although a lead oxide-based glass film is used here, another low-melting glass paste may be used.

The lead oxide glass thus formed has a refractive index of 1.80 to 1.86 and a transmittance of 90 to 92% (20%).
A glass lens thin film having a high refractive index and a high transmittance (when light having a wavelength of 400 nm is transmitted through lead oxide glass having a thickness of ２５25 μm) is obtained.

The steps after the formation of the black mask BM shown in FIG. 4A or FIG. 5A are the same.

As in the third embodiment shown in FIGS. 6 and 7, a black mask B is first placed on the substrate glass 3.
When M is formed, a metal such as chrome (tantalum) is used as the black mask BM. At this time, a metal film such as chromium or tantalum is formed by vapor deposition or sputtering, and a black mask BM having a predetermined pattern is formed by photolithography and etching using resist coating, exposure, development, post-baking, and etching. Preferably, the black mask BM has an optical density of 3.0 or more and has no pinhole.

Thus, a low-melting-point glass paste is applied instead of the high-refractive-index transparent adhesive 4 shown in FIG. 6B, and vitrification by firing after forming a mold with the stamper S shown in FIG. 6C. The black mask B
M can be left.

At this time, the stamper S and the black mask B are also used.
After aligning the alignment mark with M, the stamper S
It is important to transfer the shape of That is, it is necessary to reduce the lens effect and prevent color mixing due to misalignment.

[0054]

As described above, according to the method of manufacturing an optical substrate of the present invention, the following effects can be obtained. That is,
With the stamper, a highly accurate and highly uniform microlens shape can be obtained, and the lens effect can be maximized. In addition, since the thickness of the cover glass can be controlled with high accuracy by single-side polishing or double-side polishing using a light shielding film,
The focal length of the microlens can also be controlled with high precision, which also allows the lens effect to be maximized.

In the case where the lens array portion is formed by the stamper, since a light shielding film is formed at least around the lens array portion, unnecessary light can be prevented from being mixed, and color mixing (uneven color) can be prevented. This can be prevented. In addition, when the optical substrate is superimposed on a driving substrate of a liquid crystal display device to form a liquid crystal display device, fluctuations in TFT characteristics of a driving circuit formed on the driving substrate can be suppressed by blocking unnecessary light with a light shielding film. , And a stable operation can be obtained.

Further, if the alignment mark is formed by using the light shielding film, the optical substrate and the liquid crystal driving substrate can be superposed with high accuracy, and the lens effect can be maximized. Further, dicing division and the like can be performed accurately. In addition, productivity, quality, and yield can be improved by automating overlay and dicing.

Further, by stamping into a low-melting glass paste or the like, drying gelation and vitrification firing, a lens array portion having a higher transmittance and a higher refractive index than a resin can be formed, and the divergence angle of incident light is increased to collect light. Further enhance light efficiency,
A higher-luminance liquid crystal display device can be provided.

It is desirable that the substrate glass, the cover glass, and the liquid crystal driving substrate are made of the same material. However, since the substrate glass and the cover glass are made of the same material, at least the microlens array portion and the cover due to thermal stress and the like are formed. In addition to preventing cracks and chips in the glass, it also suppresses fluctuations in the liquid crystal gap due to Newton ring defects,
Deterioration of display image quality can be prevented.

[Brief description of the drawings]

FIG. 1 is a schematic cross-sectional view (part 1) illustrating a method for manufacturing a stamper.

FIG. 2 is a schematic sectional view (part 2) for explaining a method of manufacturing a stamper.

FIG. 3 is a schematic cross-sectional view illustrating a first embodiment (part 1).
It is.

FIG. 4 is a schematic sectional view illustrating the first embodiment (part 2).
It is.

FIG. 5 is a schematic sectional view illustrating a second embodiment.

FIG. 6 is a schematic cross-sectional view illustrating a third embodiment (part 1).
It is.

FIG. 7 is a schematic cross-sectional view illustrating a third embodiment (part 2).
It is.

FIG. 8 is a schematic cross-sectional view illustrating an assembled state (part 1).
It is.

FIG. 9 is a schematic plan view illustrating an alignment mark.

FIG. 10 is a schematic plan view illustrating a black mask.

FIG. 11 is a schematic cross-sectional view illustrating light blocking by a black mask.

FIG. 12 is a schematic sectional view illustrating another example of the first embodiment.

FIG. 13 is a schematic sectional view illustrating another example of the second embodiment.

FIG. 14 is a schematic sectional view illustrating another example of the third embodiment.

FIG. 15 is a schematic sectional view (part 2) for explaining an assembled state.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 Base glass 2 Support base 3 Substrate glass 4 High refractive index transparent adhesive 5 Low refractive index transparent adhesive
6 ITO 10 Optical substrate 20 TFT substrate AM Alignment mark part BM Black mask C Liquid crystal G Cover glass MR Micro lens array part PR Photoresist

Claims (22)

[Claims] A step of applying a photoresist on a base, performing photolithography and reflow on the photoresist to form a plurality of projections serving as a lens array, and forming a metal layer on the photoresist. Attaching and attaching a support to the metal layer via an adhesive, peeling off the metal layer from the base together with the support,
Forming a stamper having a concave portion in which the plurality of convex portions are inverted by the metal layer; and applying a light-transmitting adhesive on a substrate glass; and forming the stamper on the light-transmitting adhesive. After pressing the recess formed by the metal layer, temporarily curing the light-transmitting adhesive, removing the stamper, fully curing the light-transmitting adhesive, and fixing the light-transmitting adhesive on the metal layer of the stamper. Forming a convex portion formed by transferring the shape of the formed concave portion to the translucent adhesive as the lens array portion, and forming a light shielding film at least around the lens array portion; and at least the lens array portion The cover glass is bonded to the light-transmitting adhesive having the above structure through another light-transmitting adhesive having a refractive index different from that of the light-transmitting adhesive, and the cover glass or the substrate glass is bonded to the cover glass. The process of making it a given thickness The method for manufacturing an optical substrate, characterized by comprising al. 2. The apparatus according to claim 1, wherein at least the substrate glass and the cover glass are made of the same material.
The manufacturing method of the optical substrate described in the above. 3. The method according to claim 1, wherein when forming the light-shielding film at least around the lens array, the light-shielding film is also formed between a plurality of protrusions constituting the lens array. The manufacturing method of the optical substrate described in the above. 4. The method according to claim 1, wherein the light-shielding film is used to form an alignment mark on the substrate glass.
The manufacturing method of the optical substrate described in the above. 5. The scribe line of the substrate glass using the light shielding film.
The manufacturing method of the optical substrate described in the above. 6. The method according to claim 1, wherein the cover glass or the substrate glass has a predetermined thickness, and a light-transmissive electrode is formed on the cover glass or the substrate glass having the predetermined thickness. The manufacturing method of the optical substrate described in the above. 7. A step of applying a photoresist on a base, performing photolithography and reflow on the photoresist to form a plurality of convex portions serving as a lens array portion, and forming a metal layer on the photoresist. Attaching and attaching a support to the metal layer via an adhesive, peeling off the metal layer from the base together with the support,
Forming a stamper having a concave portion in which the plurality of convex portions are inverted by the metal layer; and forming a plurality of convex portions of the lens array portion around the position to be the lens array portion on the substrate glass. Forming a light-shielding film at a position between the respective convex portions of the portion; applying a light-transmitting adhesive on the substrate glass and the light-shielding film; and forming the stamper on the light-transmitting adhesive. After aligning and pressing the concave portion formed by the metal layer, temporarily curing the light-transmitting adhesive, removing the stamper, fully curing the light-transmitting adhesive, and Forming a convex portion formed by transferring the shape of the concave portion formed by the metal layer to the light-transmitting adhesive as the lens array portion; and at least applying the convex portion formed by the lens array portion to the light-transmitting adhesive. , The refractive index of the translucent adhesive Bonding a cover glass via another translucent adhesive having a different refractive index from that of the cover glass, and making the cover glass or the substrate glass have a predetermined thickness. . 8. The apparatus according to claim 7, wherein at least the substrate glass and the cover glass are made of the same material.
The manufacturing method of the optical substrate described in the above. 9. The alignment mark of the substrate glass is formed by using the light shielding film.
The manufacturing method of the optical substrate described in the above. 10. The method of manufacturing an optical substrate according to claim 7, wherein a scribe line of the substrate glass is formed using the light shielding film. 11. The method according to claim 7, wherein the cover glass or the substrate glass has a predetermined thickness, and a light-transmissive electrode is formed on the cover glass or the substrate glass having the predetermined thickness. The manufacturing method of the optical substrate described in the above. 12. A step of applying a photoresist on a base, performing photolithography and reflow on the photoresist to form a plurality of convex portions serving as lens array portions, and forming a metal layer on the photoresist. Attaching and attaching a support to the metal layer via an adhesive, peeling off the metal layer from the base together with the support,
A step of forming a stamper having a concave portion in which the plurality of convex portions are inverted by the metal layer; and applying a low melting point glass paste on a substrate glass; and forming the metal layer of the stamper from above the low melting point glass paste. Pressing the concave portion composed of: and forming the convex portion formed by transferring the shape of the concave portion composed of the metal layer of the stamper to the low-melting glass paste, and removing the stamper to form the lens. Forming an array portion, drying and gelling the low-melting glass paste, forming a light-shielding film at least around the lens array portion, and applying the low-melting glass paste to at least the lens array portion. A cover glass is attached via a translucent adhesive having a refractive index different from the refractive index, and the cover glass or the substrate glass is removed. A method for producing an optical substrate. 13. The method according to claim 12, wherein at least the substrate glass and the cover glass are made of the same material. 14. The method according to claim 12, wherein when forming the light-shielding film at least around the lens array portion, the light-shielding film is also formed between a plurality of convex portions constituting the lens array portion. The manufacturing method of the optical substrate described in the above. 15. The method of manufacturing an optical substrate according to claim 12, wherein an alignment mark of the substrate glass is formed using the light shielding film. 16. The method according to claim 12, wherein a scribe line of the substrate glass is formed using the light shielding film. 17. The method according to claim 12, wherein the cover glass or the substrate glass has a predetermined thickness, and a light-transmissive electrode is formed on the cover glass or the substrate glass having the predetermined thickness. The manufacturing method of the optical substrate described in the above. 18. A step of applying a photoresist on a base, performing photolithography and reflow on the photoresist to form a plurality of convex portions serving as lens array portions, and forming a metal layer on the photoresist. Attaching and attaching a support to the metal layer via an adhesive, peeling off the metal layer from the base together with the support,
Forming a stamper having a concave portion in which the plurality of convex portions are inverted by the metal layer; and forming a plurality of convex portions of the lens array portion around the position to be the lens array portion on the substrate glass. Forming a light-shielding film at a position between the respective convex portions of the portion; applying a low-melting glass paste on the substrate glass and the light-shielding film; Aligning and pressing a concave portion formed of a metal layer; and forming the convex portion formed by transferring the shape of the concave portion formed of the metal layer of the stamper to the low-melting glass paste. Removing the low melting point glass paste into a dry gel and vitrify while removing the low melting point glass paste. Bonding a cover glass via a translucent adhesive having a refractive index different from the refractive index of the point glass paste to form the cover glass or the substrate glass into a predetermined thickness. Substrate manufacturing method. 19. The method according to claim 18, wherein at least the substrate glass and the cover glass are made of the same material. 20. The method of manufacturing an optical substrate according to claim 18, wherein an alignment mark of the substrate glass is formed using the light shielding film. 21. The method according to claim 18, wherein a scribe line of the substrate glass is formed using the light shielding film. 22. The method according to claim 18, wherein the cover glass or the substrate glass has a predetermined thickness, and a light-transmissive electrode is formed on the cover glass or the substrate glass having the predetermined thickness. The manufacturing method of the optical substrate described in the above.