JPH10123522A - Substrate for liquid crystal display element - Google Patents

Substrate for liquid crystal display element

Info

Publication number
JPH10123522A
JPH10123522A JP8277812A JP27781296A JPH10123522A JP H10123522 A JPH10123522 A JP H10123522A JP 8277812 A JP8277812 A JP 8277812A JP 27781296 A JP27781296 A JP 27781296A JP H10123522 A JPH10123522 A JP H10123522A
Authority
JP
Japan
Prior art keywords
liquid crystal
film
substrate
crystal display
oriented
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8277812A
Other languages
Japanese (ja)
Inventor
Toshimasa Eguchi
敏正 江口
Hisashi Ito
寿 伊東
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP8277812A priority Critical patent/JPH10123522A/en
Publication of JPH10123522A publication Critical patent/JPH10123522A/en
Pending legal-status Critical Current

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  • Surface Treatment Of Optical Elements (AREA)
  • Liquid Crystal (AREA)

Abstract

PROBLEM TO BE SOLVED: To improve transmittance and to obtain a bright liquid crystal display element by forming oriented films to film thicknesses of specific values and providing these oriented films with an antireflection effect. SOLUTION: The oriented film is formed by printing the surface of a glass substrate with a liquid crystal orienting agent which is a polyimide soln. and calcining the substrate. The film thickness D of the oriented film is controlled by adjusting the printing conditions of the orienting agent. The oriented film is provided with the antireflection effect by forming the oriented film in such a manner that its film thickness D holds the relation λ/4n×0.9<=D<=λ/4n×1.1 with respect to the wavelength λdesired to be prevented of refractive index and the refractive index (n) of the oriented film and attains <=1000 angstrom. More preferably, the relation is λ/4n×0.95<=D<=λ/4n×1.05 and the case D=λ/4 holds is most preferable. The prevention of the refection is no longer possible if the film thickness D of the oriented film is λ/4n×0.9>D or D>λ/4n×1.1.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は液晶表示素子に使用
する基板に関するものであり、さらに詳しくは透過率を
向上し明るい液晶表示素子が得られる液晶表示素子用基
板に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate used for a liquid crystal display device, and more particularly to a substrate for a liquid crystal display device capable of improving transmittance and obtaining a bright liquid crystal display device.

【0002】[0002]

【従来の技術】現在、液晶表示素子は、薄型ディスプレ
イとして広範囲に用いられてきている。一般的に用いら
れている液晶表示素子は、ツイステッドネマティック(T
N)方式とスーパーツイステッドネマティック(STN)方式
であるが、これらの液晶表示素子を作製する場合には特
公昭62−38689号公報に示されるように透明電極
付き基板に挟まれた液晶を基板に対して一定方向に配向
させる配向膜を基板最表面に形成することが必要であ
る。 配向膜は、透明電極の内側に形成されるため、液
晶にかかる電圧を考慮した場合には薄いほうが好ましい
とされるが、製造工程上、むらの無い薄膜を得ることも
難しいため、現実的には400〜1000オングストローム程
度に任意の膜厚に形成されている。
2. Description of the Related Art At present, liquid crystal display devices have been widely used as thin displays. A commonly used liquid crystal display device is a twisted nematic (T
N) method and super twisted nematic (STN) method.When these liquid crystal display elements are manufactured, as shown in JP-B-62-38689, a liquid crystal sandwiched between substrates with transparent electrodes is used as a substrate. On the other hand, it is necessary to form an alignment film for orienting in a certain direction on the outermost surface of the substrate. Since the alignment film is formed inside the transparent electrode, it is said that it is preferable that the alignment film is thinner in consideration of the voltage applied to the liquid crystal. Is formed to an arbitrary thickness of about 400 to 1000 angstroms.

【0003】一方、液晶表示素子は、光が透過する場合
と不透過または散乱する場合を電気的に制御する表示素
子であるので、光が透過する状態での透過率は高いほど
好ましい。液晶表示素子全体の透過率を向上させるため
には、各構成材料の透過率を向上させることと界面での
反射を低減させることが効果的である。現在、構成材料
の透過率の向上や基板と偏光板の間の反射率の低減、表
示素子最外部の反射率の低減は行われているが、基板内
面については配向膜上にさらに別の反射防止膜を形成す
ることはできないために反射防止は行われていない。
On the other hand, a liquid crystal display element is a display element for electrically controlling the case where light is transmitted and the case where light is not transmitted or scattered. Therefore, it is preferable that the transmittance in a state where light is transmitted is higher. In order to improve the transmittance of the entire liquid crystal display element, it is effective to improve the transmittance of each constituent material and to reduce reflection at the interface. At present, the transmittance of the constituent materials has been improved, the reflectance between the substrate and the polarizing plate has been reduced, and the reflectance of the outermost display element has been reduced. Cannot be formed, so that antireflection is not performed.

【0004】[0004]

【発明が解決しようとする課題】本発明は、上記のよう
な問題点を解決し、透過率を向上し明るい液晶表示素子
が得られる液晶表示素子用基板を提供するものである。
SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems and to provide a liquid crystal display element substrate capable of improving transmittance and obtaining a bright liquid crystal display element.

【0005】[0005]

【課題を解決するための手段】本発明は、配向膜の膜厚
Dが、反射を防止したい波長λ、及び配向膜の屈折率n
に対して式(1)の関係が成り立ち、かつ、1000オング
ストローム以下であることにより配向膜に反射防止作用
を持たせた液晶表示素子用基板である。 λ/4n × 0.9 ≦ D ≦ λ/4n × 1.1 (1)
According to the present invention, the film thickness D of the alignment film is such that the wavelength .lambda.
This is a substrate for a liquid crystal display device in which the relationship of the formula (1) is satisfied and the orientation film has an anti-reflection effect by being less than 1000 angstroms. λ / 4n × 0.9 ≦ D ≦ λ / 4n × 1.1 (1)

【0006】配向膜に反射防止作用を持たせることは、
配向膜の屈折率nを測定し、反射を防止したい光の波長
λに対し、配向膜の膜厚Dを式(1)の関係になるよう
に制御することにより可能である。 λ/4n × 0.9 ≦ D ≦ λ/4n × 1.1 (1) また、好ましくは、 λ/4n × 0.95 ≦ D ≦ λ/4n × 1.05 (2) であり、(3)式の関係が成り立つ場合が最も好まし
い。 D = λ/4n (3) 配向膜の膜厚Dが、λ/4n × 0.9 > D であるか、又
は D > λ/4n × 1.1 であると、反射を防止するこ
とができなくなる。また、配向膜の膜厚が厚すぎると、
液晶にかかる電圧が低くなってしまうため、膜厚は1000
オングストローム以下であることが好ましい。
Making the alignment film have an antireflection effect is as follows.
This is possible by measuring the refractive index n of the alignment film and controlling the film thickness D of the alignment film so as to satisfy the relationship of equation (1) with respect to the wavelength λ of the light whose reflection is to be prevented. λ / 4n × 0.9 ≦ D ≦ λ / 4n × 1.1 (1) Further, preferably, λ / 4n × 0.95 ≦ D ≦ λ / 4n × 1.05 (2), and the relationship of the expression (3) may be satisfied. Most preferred. D = λ / 4n (3) If the film thickness D of the alignment film is λ / 4n × 0.9> D or D> λ / 4n × 1.1, reflection cannot be prevented. Also, if the thickness of the alignment film is too thick,
The film thickness is 1000
It is preferably equal to or less than Å.

【0007】配向膜には通常ポリイミド、ポリアミド等
の樹脂が用いられるため、その屈折率は、樹脂の構造に
より1.60〜1.75程度の値となる。使用する配向膜の屈折
率はエリプソメーターにより測定することができる。
[0007] Since a resin such as polyimide or polyamide is usually used for the alignment film, its refractive index is about 1.60 to 1.75 depending on the structure of the resin. The refractive index of the alignment film used can be measured by an ellipsometer.

【0008】反射を防止したい波長λには、通常は可視
光のほぼ中央の値である500nmを用いることが好まし
い。ただし、基板材料がある波長域に吸収があり配向膜
により基板その波長域の反射を減らすことにより全体の
透過率を均一にしたい場合には、その波長を用いてDを
算出しても良い。
As the wavelength λ for which reflection is desired to be prevented, it is usually preferable to use 500 nm which is a value substantially at the center of visible light. However, when the substrate material absorbs in a certain wavelength range and it is desired to make the entire transmittance uniform by reducing the reflection in the wavelength range of the substrate by the alignment film, D may be calculated using the wavelength.

【0009】[0009]

【実施例】以下、実施例により詳細を説明するが、本発
明はこれらの実施例によって何等限定されるものではな
い。
The present invention will be described below in detail with reference to examples, but the present invention is not limited to these examples.

【0010】(実施例1)ガラス基板上にポリイミド溶
液である液晶配向剤を印刷して焼成し、配向膜を形成し
た。エリプソメーターにより屈折率を測定したところ1.
65であった。λ = 500nmとすると、式(3)からD = 7
58オングストロームとなるので、配向膜膜厚がそうなる
ように配向剤の印刷条件を調整し、ITO付きガラス基板
(厚さ1.1mm)に配向膜を形成した。この基板の波長40
0, 500, 600nmの透過率を測定したところ、それぞれ97,
98,98%であった。
(Example 1) A liquid crystal aligning agent, which is a polyimide solution, was printed and baked on a glass substrate to form an alignment film. When the refractive index was measured with an ellipsometer 1.
It was 65. If λ = 500 nm, D = 7 from equation (3).
Since the film thickness was 58 Å, the printing conditions of the alignment agent were adjusted so that the film thickness of the alignment film was the same, and the alignment film was formed on a glass substrate with ITO (thickness: 1.1 mm). Wavelength of this substrate 40
When the transmittance at 0, 500, and 600 nm was measured, it was 97, 97, respectively.
98,98%.

【0011】(実施例2)ITO付きガラス基板をITO付き
ポリエーテルスルホンフィルム基板(厚さ0.1mm)に替
えて配向膜を形成した。使用したポリエーテルスルホン
フィルム基板は短波長域(400nm以下)に吸収があった
ので、λ = 400nmとして式(3)から配向膜膜厚D= 60
6オングストロームとなるよう配向膜印刷条件を調整し
て行った。実施例1と同様に、この基板の波長400, 50
0, 600nmの透過率を測定したところ、それぞれ96, 97,
97%であった。
Example 2 An orientation film was formed by replacing a glass substrate with ITO with a polyethersulfone film substrate with ITO (thickness: 0.1 mm). Since the polyethersulfone film substrate used had absorption in a short wavelength region (400 nm or less), the film thickness of the alignment film D = 60
The printing was performed by adjusting the printing conditions of the alignment film so that the thickness became 6 Å. As in the first embodiment, the wavelength of the substrate is 400, 50
When the transmittance at 0,600 nm was measured, 96, 97,
97%.

【0012】(比較例1)配向膜の膜厚を400オングス
トロームとした以外は実施例1と同様に行った。この基
板の波長400, 500, 600nmの透過率を測定したところ、
それぞれ94, 95,95%であった。
(Comparative Example 1) The same procedure as in Example 1 was carried out except that the thickness of the alignment film was changed to 400 Å. When the transmittance of this substrate at wavelengths of 400, 500, and 600 nm was measured,
They were 94, 95 and 95%, respectively.

【0013】(比較例2)配向膜の膜厚を400オングス
トロームとした以外は実施例2と同様に行った。この基
板の波長400, 500, 600nmの透過率を測定したところ、
それぞれ92, 94,95%であった。
(Comparative Example 2) The same procedure as in Example 2 was performed except that the thickness of the alignment film was changed to 400 Å. When the transmittance of this substrate at wavelengths of 400, 500, and 600 nm was measured,
They were 92, 94 and 95%, respectively.

【0014】実施例1および2ではいずれも配向膜付き
基板の状態で98%以上の透過率を示している。
In each of Examples 1 and 2, a transmittance of 98% or more is shown in the state of the substrate with the alignment film.

【0015】比較例1では、実施例1と比較して膜厚を
400オングストロームと薄くしたが、3%透過率が低くな
っている。
In Comparative Example 1, the film thickness was smaller than that in Example 1.
It has been thinned to 400 angstroms, but its 3% transmittance is low.

【0016】比較例2では、実施例2と比較して膜厚を
400オングストロームと薄くしたが、2〜4%透過率が低
くなっている。
In Comparative Example 2, the film thickness was smaller than that in Example 2.
It has been thinned to 400 angstroms, but has a low transmittance of 2-4%.

【0017】液晶表示素子用基板は2枚一組で液晶セル
を形成して使用されるため、実施例と比較例の差は自乗
に拡大されることになり、より差がつく。さらに、一般
の液晶表示素子は偏光板を利用しているため、透過光は
1/2にされるので、ここでも差がひろがることになる。
すなわち、実施例と比較例の差は、本発明がきわめて有
効であることを示している。
Since the liquid crystal display device substrate is used by forming a liquid crystal cell in pairs, the difference between the embodiment and the comparative example is magnified by the square, and the difference is further increased. Furthermore, since a general liquid crystal display element uses a polarizing plate, the transmitted light is
Since it is halved, the difference will spread here as well.
That is, the difference between the example and the comparative example indicates that the present invention is extremely effective.

【発明の効果】本発明の液晶表示素子用基板は、透過率
を向上し明るい液晶表示素子が得られる液晶表示素子用
基板である。
The substrate for a liquid crystal display device of the present invention is a substrate for a liquid crystal display device capable of improving the transmittance and obtaining a bright liquid crystal display device.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 配向膜の膜厚Dが、反射を防止したい波
長λ、及び配向膜の屈折率nに対して式(1)の関係が
成り立ち、かつ、1000オングストローム以下であること
により配向膜に反射防止作用を持たせた液晶表示素子用
基板。 λ/4n × 0.9 ≦ D ≦ λ/4n × 1.1 (1)
1. The relationship of the formula (1) with respect to the wavelength λ at which reflection is to be prevented and the refractive index n of the alignment film is satisfied, and the thickness D of the alignment film is 1000 Å or less. LCD substrate with anti-reflection effect. λ / 4n × 0.9 ≦ D ≦ λ / 4n × 1.1 (1)
JP8277812A 1996-10-21 1996-10-21 Substrate for liquid crystal display element Pending JPH10123522A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8277812A JPH10123522A (en) 1996-10-21 1996-10-21 Substrate for liquid crystal display element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8277812A JPH10123522A (en) 1996-10-21 1996-10-21 Substrate for liquid crystal display element

Publications (1)

Publication Number Publication Date
JPH10123522A true JPH10123522A (en) 1998-05-15

Family

ID=17588616

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8277812A Pending JPH10123522A (en) 1996-10-21 1996-10-21 Substrate for liquid crystal display element

Country Status (1)

Country Link
JP (1) JPH10123522A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9837578B2 (en) 2006-05-08 2017-12-05 Lg Innotek Co., Ltd. Light emitting device having light extraction structure and method for manufacturing the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9837578B2 (en) 2006-05-08 2017-12-05 Lg Innotek Co., Ltd. Light emitting device having light extraction structure and method for manufacturing the same

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