JPH10123118A - Ultra-pure-water manufacturing device - Google Patents
Ultra-pure-water manufacturing deviceInfo
- Publication number
- JPH10123118A JPH10123118A JP27943496A JP27943496A JPH10123118A JP H10123118 A JPH10123118 A JP H10123118A JP 27943496 A JP27943496 A JP 27943496A JP 27943496 A JP27943496 A JP 27943496A JP H10123118 A JPH10123118 A JP H10123118A
- Authority
- JP
- Japan
- Prior art keywords
- amount
- water
- toc
- ion exchange
- oxidizer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Treatment Of Water By Ion Exchange (AREA)
- Physical Water Treatments (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は超純水製造装置に係
り、特に、紫外線（ＵＶ）酸化装置とイオン交換塔とを
備える超純水製造装置において、ＵＶ酸化装置のＵＶ照
射量の制御を行うことでＴＯＣの分解除去を効率的に行
えるようにした超純水製造装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus for producing ultrapure water, and more particularly to an apparatus for producing ultrapure water having an ultraviolet (UV) oxidizer and an ion exchange tower, which controls the amount of UV irradiation of the UV oxidizer. The present invention relates to an ultrapure water production apparatus capable of efficiently decomposing and removing TOC.
【０００２】[0002]
【従来の技術】河川水、工業用水、水道水などの原水か
ら、半導体製造工程等で使用される超純水を製造する場
合の一般的な製造システムは、前処理工程、一次純水製
造工程及び二次純水製造工程（サブシステム）からな
る。2. Description of the Related Art A general production system for producing ultrapure water used in a semiconductor production process or the like from raw water such as river water, industrial water, or tap water includes a pretreatment process and a primary pure water production process. And a secondary pure water production process (subsystem).
【０００３】ＵＶ酸化装置は、水中の有機物を酸化分解
するために、このような超純水製造システムにおける一
次純水製造工程、二次純水製造工程に適用されている。
また、イオン交換塔は、アニオン交換樹脂及び／又はカ
チオン交換樹脂が充填されたもので、水中のイオン性物
質を除去するために、一次純水製造工程及び二次純水製
造工程のＵＶ酸化装置の後段に設置されている。[0003] The UV oxidizer is applied to a primary pure water production process and a secondary pure water production process in such an ultrapure water production system in order to oxidatively decompose organic substances in water.
Further, the ion exchange tower is filled with an anion exchange resin and / or a cation exchange resin. In order to remove ionic substances in water, a UV oxidizer in a primary pure water production step and a secondary pure water production step is used. It is installed after.
【０００４】従来の超純水製造システムでは、ＵＶ酸化
装置の流入水（入口水）のＴＯＣ濃度の最大含有量を設
定し、この設定したＴＯＣ含有量（以下「最大ＴＯＣ設
定濃度」と称す。）の酸化分解除去に必要な量のＯＨラ
ジカルを発生させるＵＶ照射量を固定値として発生する
ＵＶ酸化装置が設置されている。即ち、従来では、流入
水のＴＯＣ濃度の変動に関らず、常に最大ＴＯＣ設定濃
度のＴＯＣを酸化分解除去し得るＵＶを照射すること
で、ＵＶ酸化後のＴＯＣの残留を防止している。[0004] In the conventional ultrapure water production system, the maximum TOC content of the inflow water (inlet water) of the UV oxidizer is set, and this set TOC content (hereinafter referred to as "maximum TOC set concentration"). A UV oxidizing apparatus that generates a fixed amount of UV irradiation that generates an amount of OH radicals necessary for the oxidative decomposition and removal is installed. That is, conventionally, regardless of the fluctuation of the TOC concentration of the inflow water, the residual TOC after the UV oxidation is prevented by irradiating UV that can oxidatively decompose and remove the TOC having the maximum TOC set concentration.
【０００５】[0005]
【発明が解決しようとする課題】従来の超純水製造シス
テムでは、ＵＶ酸化後のＴＯＣの残留を防止するため
に、ＵＶ酸化装置のＵＶ照射量が最大ＴＯＣ設定濃度に
対応した、高い値に固定されているが、このようなＵＶ
酸化装置では、最大ＴＯＣ設定濃度より低ＴＯＣ濃度の
水が流入した場合、必要以上のＵＶが照射されることと
なり、ＵＶコストが高くつく上に、次のような問題があ
ることが本発明者らの検討により見出された。In the conventional ultrapure water production system, in order to prevent TOC from remaining after UV oxidation, the UV irradiation amount of the UV oxidizer is set to a high value corresponding to the maximum TOC set concentration. Fixed, but such UV
In the oxidizing apparatus, when water having a TOC concentration lower than the maximum TOC setting concentration flows in, the UV is irradiated more than necessary, which increases the UV cost and has the following problems. They have been found by these studies.
【０００６】即ち、ＵＶ酸化装置の流入水中のＴＯＣ濃
度が最大ＴＯＣ設定濃度より低い場合、ＴＯＣのＵＶ酸
化分解に使われなかった余剰のＯＨラジカルがＤＯ（溶
存酸素）成分となって処理水中に残留する。これは、余
剰のＯＨラジカルから過酸化水素が生成し、これがＵＶ
酸化装置の後段のイオン交換塔のイオン交換樹脂、特に
アニオン交換樹脂と接触すると、酸素を生成するためで
あると推定される。That is, when the TOC concentration in the inflow water of the UV oxidizer is lower than the maximum TOC set concentration, excess OH radicals not used for the UV oxidative decomposition of TOC become DO (dissolved oxygen) components in the treated water. Remains. This is because hydrogen peroxide is generated from excess OH radicals,
It is presumed that this is due to the generation of oxygen when contacting with an ion exchange resin, particularly an anion exchange resin, of an ion exchange tower at the latter stage of the oxidizing apparatus.
【０００７】このため、ＴＯＣ濃度が最大ＴＯＣ設定濃
度よりも低い水をＵＶ酸化装置及びイオン交換塔で処理
した場合、イオン交換塔の流出水のＤＯはＵＶ酸化装置
流入水のＤＯよりも高いものとなる。従って、このよう
な場合には、最終処理水の超純水のＤＯも高くなる。For this reason, when water having a TOC concentration lower than the maximum TOC set concentration is treated in the UV oxidizer and the ion exchange tower, the DO of the effluent of the ion exchange tower is higher than the DO of the inflow water of the UV oxidizer. Becomes Therefore, in such a case, the DO of the ultrapure water of the final treatment water also increases.
【０００８】例えば、ＴＯＣ２ｐｐｂ，ＤＯ２ｐｐｂを
含む純水に、この純水１ｍ3 当り０．３ｋＷのＵＶを照
射して混床式イオン交換塔に通水した場合、イオン交換
塔の流出水（出口水）のＤＯは５ｐｐｂに増加する。[0008] For example, TOC2ppb, the pure water containing DO2ppb, if it treated so as to reduce the ion exchange column was irradiated with UV in the pure water 1 m 3 per 0.3 kW, effluent of the ion exchange column (outlet water ) DO increases to 5 ppb.
【０００９】超純水中にＤＯが存在すると、これを半導
体製造工程のウェハ洗浄水として用いた場合、シリコン
ウェハ表面に酸化膜を生じさせるなどの弊害が起きる。When DO is present in ultrapure water, if it is used as wafer cleaning water in a semiconductor manufacturing process, it causes adverse effects such as formation of an oxide film on the surface of a silicon wafer.
【００１０】本発明は上記従来の問題点を解決し、流入
水のＴＯＣ濃度に対して、ＵＶを過不足なく照射して、
ＴＯＣを確実に酸化分解除去すると共に、ＤＯの増加を
防止し、低ＴＯＣ，低ＤＯの超純水を安定に製造するこ
とができる超純水製造装置を提供することを目的とす
る。[0010] The present invention solves the above-mentioned conventional problems, and irradiates the TOC concentration of the inflow water with UV without excess or shortage.
An object of the present invention is to provide an ultrapure water production apparatus capable of reliably removing TOC by oxidative decomposition, preventing an increase in DO, and stably producing ultrapure water with low TOC and low DO.
【００１１】[0011]
【課題を解決するための手段】本発明の超純水製造装置
は、ＵＶ酸化装置とその後段のイオン交換塔とを備えて
なる超純水製造装置において、 イオン交換塔の出口水のＤＯ量の測定 ＵＶ酸化装置の入口水のＤＯ量及びイオン交換塔の
出口水のＤＯ量の測定或いは ＵＶ酸化装置の入口水のＴＯＣ濃度の測定 を行って、この測定結果に基いてＵＶ酸化装置のＵＶ照
射量を制御することを特徴とする。An ultrapure water production apparatus according to the present invention is an ultrapure water production apparatus comprising a UV oxidizing apparatus and a subsequent ion exchange tower. Measurement of the DO amount of the inlet water of the UV oxidizer and the DO amount of the outlet water of the ion exchange tower or the TOC concentration of the inlet water of the UV oxidizer are measured, and based on the measurement results, the UV of the UV oxidizer is measured. It is characterized in that the irradiation amount is controlled.
【００１２】ＵＶ酸化装置におけるＵＶ照射量が一定の
場合、ＵＶ酸化装置入口水のＴＯＣ濃度が下がると図４
に示す如くＴＯＣ分解量も減少する。しかし、ＴＯＣ分
解量（図４中の実線）の減少量はＴＯＣの存在量（図４
中の点線）の減少率より低い。前述の如く、従来のＵＶ
酸化装置では、予め設定したＵＶ酸化装置入口水の最大
ＴＯＣ設定濃度を分解できるようにＵＶ照射量を設定し
ているので、実際のＵＶ酸化装置入口水のＴＯＣ濃度が
最大ＴＯＣ設定濃度より少なくなるとＴＯＣ存在量に対
してＵＶ照射量は過剰になる（図中斜線の部分）。この
過剰な分だけ過酸化水素が発生し、ＤＯ成分が増加す
る。When the UV irradiation amount in the UV oxidizer is constant, when the TOC concentration of the UV oxidizer inlet water decreases, FIG.
As shown in the figure, the TOC decomposition amount also decreases. However, the amount of decrease in the TOC decomposition amount (solid line in FIG. 4) is based on the TOC abundance (FIG. 4).
(Dotted line in the middle). As mentioned above, conventional UV
In the oxidizer, the UV irradiation amount is set so as to be able to decompose the preset maximum TOC concentration of the water at the inlet of the UV oxidizer. Therefore, when the actual TOC concentration of the water at the inlet of the UV oxidizer becomes lower than the maximum TOC set concentration. The amount of UV irradiation becomes excessive with respect to the TOC abundance (hatched portion in the figure). Hydrogen peroxide is generated by the excess amount, and the DO component increases.
【００１３】本発明では、このような場合において、Ｕ
Ｖ照射量を減らしてＴＯＣ分解量が図４の実線位置から
点線位置まで下がるように制御することで、ＵＶの過剰
照射によるＤＯの発生を防止する。In the present invention, in such a case, U
By controlling the amount of TOC decomposition so as to decrease the TOC decomposition amount from the position indicated by the solid line to the position indicated by the dotted line in FIG. 4, generation of DO due to excessive irradiation of UV is prevented.
【００１４】一般に、ＵＶ酸化装置において入口水のＴ
ＯＣ濃度が一定の場合、ＵＶ照射量とＴＯＣ除去量との
間には図２に示す関係がある。この関係は、下記関係式
で示される。Generally, in a UV oxidizer, T
When the OC concentration is constant, there is a relationship shown in FIG. 2 between the UV irradiation amount and the TOC removal amount. This relation is represented by the following relational expression.
【００１５】Ｙ＝ａＸ＋ｂ Ｙ：単位消費電力量当たりＴＯＣ除去量（ｍｇ−ＴＯＣ
／ｋＷ） Ｘ：ＴＯＣ濃度（ｐｐｍ） ａ，ｂ：定数 即ち、ＵＶ酸化装置入口水のＴＯＣ濃度によって単位消
費電力量当たりのＴＯＣ除去量が計算でき、これに基い
て、ＴＯＣの除去に必要なＵＶ照射量（ＵＶ酸化装置へ
の電力量ないし点灯するＵＶランプ数）を求めることが
できる。Y = aX + b Y: TOC removal amount per unit power consumption (mg-TOC)
/ KW) X: TOC concentration (ppm) a, b: constant That is, the TOC removal amount per unit power consumption can be calculated from the TOC concentration of the UV oxidizer inlet water, and based on this, the TOC removal required for TOC removal is performed. The amount of UV irradiation (the amount of power to the UV oxidation device or the number of UV lamps to be turned on) can be obtained.
【００１６】従って、ＵＶ酸化装置入口水のＴＯＣ量の
測定値の増減に基いてＵＶ酸化装置のＵＶ照射量を制御
することで適正なＵＶ照射を行える。Therefore, appropriate UV irradiation can be performed by controlling the amount of UV irradiation of the UV oxidizer based on the increase or decrease of the measured value of the TOC amount of the water at the inlet of the UV oxidizer.
【００１７】また、ＵＶ酸化装置入口水のＴＯＣ濃度一
定の場合、ＵＶ照射量とイオン交換塔出口水のＤＯ量と
の関係は図３に示す通りである。即ち、ＵＶ酸化装置の
ＵＶ照射量がＵＶ酸化装置入口水のＴＯＣ濃度に対して
適正量である場合、或いは、ＵＶ照射量がＵＶ酸化装置
入口水のＴＯＣ濃度に対して不足している場合には、Ｕ
Ｖ酸化装置入口水のＤＯ量とイオン交換塔出口水のＤＯ
量とはほぼ同じ値を示し、ＤＯ量の増加は殆どない。Ｕ
Ｖ酸化装置のＵＶ照射量がＵＶ酸化装置入口水のＴＯＣ
濃度に対して過剰量である場合には、前述の如く、ＵＶ
酸化装置入口水のＤＯ量に対してイオン交換塔出口水の
ＤＯ量の増加が起こる。Further, when the TOC concentration of the water at the inlet of the UV oxidation apparatus is constant, the relationship between the UV irradiation amount and the DO amount of the ion exchange tower outlet water is as shown in FIG. That is, when the UV irradiation amount of the UV oxidizer is appropriate for the TOC concentration of the UV oxidizer inlet water, or when the UV irradiation amount is insufficient for the TOC concentration of the UV oxidizer inlet water. Is U
DO amount of V oxidation equipment inlet water and DO of ion exchange tower outlet water
It shows almost the same value as the amount, and there is almost no increase in the DO amount. U
V oxidizer UV irradiation dose is TOC of UV oxidizer inlet water TOC
If the amount is excessive with respect to the concentration, as described above,
An increase in the DO amount of the ion exchange tower outlet water relative to the DO amount of the oxidizer inlet water occurs.
【００１８】従って、イオン交換塔出口水のＤＯ量の測
定値が増加傾向に移行するときは、ＵＶ酸化装置におけ
るＵＶ照射量が過剰であるから、この増加傾向への移行
点（図３の最適制御点）となるようにＵＶ酸化装置のＵ
Ｖ照射量を制御することで適正なＵＶ照射を行える。Therefore, when the measured value of the DO amount at the outlet of the ion-exchange tower shifts to an increasing tendency, the UV irradiation amount in the UV oxidizer is excessive, and the transition point to this increasing trend (optimum in FIG. 3) Control point)
Appropriate UV irradiation can be performed by controlling the amount of V irradiation.
【００１９】同様に、ＵＶ酸化装置入口水のＤＯ量の測
定値に対してイオン交換塔出口水のＤＯ量の測定値が大
きい場合には、ＵＶ酸化装置におけるＵＶ照射量が過剰
であるから、イオン交換塔出口水のＤＯ量の測定値−Ｕ
Ｖ酸化装置入口水のＤＯ量の測定値＝０から、この差が
正の値に移行する点となるようにＵＶ酸化装置のＵＶ照
射量を制御することで適正なＵＶ照射を行える。Similarly, when the measured value of the DO amount of the ion exchange tower outlet water is larger than the measured value of the DO amount of the UV oxidizer inlet water, the UV irradiation amount in the UV oxidizing device is excessive. Measured value of DO amount of ion exchange tower outlet water-U
Appropriate UV irradiation can be performed by controlling the amount of UV irradiation of the UV oxidizing apparatus so that the measured value of the DO amount at the inlet of the V oxidizing apparatus = 0 at which the difference shifts to a positive value.
【００２０】なお、ＵＶ照射量の制御は、測定値に連動
して連続的に増減するものであっても良く、段階的に変
化させるものであっても良い。また、段階的に変化させ
る場合、２段階に限らず、３段階以上にＵＶ照射量を制
御しても良い。Incidentally, the control of the UV irradiation amount may be continuously increased or decreased in conjunction with the measured value, or may be changed stepwise. In the case of stepwise change, the UV irradiation amount may be controlled not only in two steps but also in three or more steps.
【００２１】また、本発明において、ＵＶ照射量の制御
はＵＶ酸化装置入口水のＴＯＣ濃度とイオン交換塔出口
水のＤＯ量との両測定値に基いて制御しても良い。In the present invention, the amount of UV irradiation may be controlled based on both the measured values of the TOC concentration of the inlet water of the UV oxidizer and the DO amount of the outlet water of the ion exchange tower.
【００２２】[0022]
【発明の実施の形態】以下に図面を参照して本発明の実
施の形態を詳細に説明する。Embodiments of the present invention will be described below in detail with reference to the drawings.
【００２３】図１（ａ）は請求項１の超純水製造装置の
実施の形態を示す系統図であり、ＵＶ酸化装置１にＵＶ
照射量の制御器３を設け、ＵＶ酸化装置１の後段のイオ
ン交換塔２の出口水のＤＯ量をＤＯ計４で測定し、この
測定値に基いてＵＶ酸化装置１のＵＶ照射量を制御する
ようにしたものである。FIG. 1A is a system diagram showing an embodiment of the ultrapure water production apparatus according to the present invention.
The irradiation amount controller 3 is provided, and the DO amount of the outlet water of the ion exchange tower 2 downstream of the UV oxidizing device 1 is measured by the DO meter 4, and the UV irradiation amount of the UV oxidizing device 1 is controlled based on the measured value. It is something to do.
【００２４】図１（ｂ）は請求項２の超純水製造装置の
実施の形態を示す系統図であり、ＵＶ酸化装置１にＵＶ
照射量の制御器３を設け、ＵＶ酸化装置１の入口水のＤ
Ｏ量をＤＯ計５で測定すると共に、後段のイオン交換塔
２の出口水のＤＯ量をＤＯ計４で測定し、これらの測定
値に基いてＵＶ酸化装置１のＵＶ照射量を制御するよう
にしたものである。FIG. 1B is a system diagram showing an embodiment of the ultrapure water production apparatus according to the second aspect.
The irradiation amount controller 3 is provided, and the inlet water D of the UV oxidizing apparatus 1 is
The amount of O is measured by the DO meter 5, and the DO amount of the outlet water of the subsequent ion exchange tower 2 is measured by the DO meter 4, and the UV irradiation amount of the UV oxidizing apparatus 1 is controlled based on these measured values. It was made.
【００２５】図１（ｃ）は請求項３の超純水製造装置の
実施の形態を示す系統図であり、ＵＶ酸化装置１にＵＶ
照射量の制御器３を設け、ＵＶ酸化装置１の入口水のＴ
ＯＣ濃度をＴＯＣ計６で測定し、この測定値に基いてＵ
Ｖ酸化装置１のＵＶ照射量を制御するようにしたもので
ある。FIG. 1 (c) is a system diagram showing an embodiment of the ultrapure water production apparatus according to the third aspect.
An irradiation amount controller 3 is provided, and T of the inlet water of the UV oxidizer 1
The OC concentration was measured with a TOC meter 6, and based on this measurement, U
This is to control the amount of UV irradiation of the V oxidation device 1.
【００２６】図１（ａ）〜（ｃ）において、制御器３で
は、入力されたＤＯ量の測定値又はＴＯＣ濃度の測定値
に基いて適正なＵＶ照射量を演算し、この演算結果に基
いてＵＶ酸化装置１のＵＶ照射量を制御する。1 (a) to 1 (c), the controller 3 calculates an appropriate UV irradiation amount based on the input DO amount measurement value or TOC concentration measurement value, and based on the calculation result. To control the amount of UV irradiation of the UV oxidizer 1.
【００２７】即ち、例えば、図１（ａ）では、ＤＯ計４
から入力されたイオン交換塔２の出口水のＤＯ量の測定
値に基き、この測定値が増加傾向となるまでＵＶ照射量
を増やし、この測定値が増加に転じる直前（図４の最適
制御点）のＵＶ照射となるようにＵＶ酸化装置１のＵＶ
照射量を制御する。That is, for example, in FIG.
Based on the measured value of the DO amount of the outlet water of the ion exchange tower 2 input from the above, the UV irradiation amount is increased until the measured value tends to increase, and immediately before the measured value starts to increase (the optimal control point in FIG. 4). ) UV irradiation of the UV oxidizing apparatus 1
Control the dose.
【００２８】或いは、予めイオン交換塔２の出口水のＤ
Ｏ量の基準値を定めておき、測定値がこの基準値を超え
る場合には、ＵＶ酸化装置１のＵＶ照射量を減らし、測
定値がこの基準値より低い場合にはＵＶ酸化装置１のＵ
Ｖ照射量を増す。Alternatively, the outlet water D of the ion exchange
A reference value of the O amount is set in advance, and when the measured value exceeds the reference value, the UV irradiation amount of the UV oxidizing device 1 is reduced, and when the measured value is lower than the reference value, the UV irradiation amount of the UV oxidizing device 1 is reduced.
Increase V dose.
【００２９】また、図１（ｂ）では、ＤＯ計５から入力
されたＵＶ酸化装置１の入口水のＤＯ量の測定値（以下
「ＤＯ1 」）とＤＯ計４から入力されたイオン交換塔２
の出口水のＤＯ量の測定値（以下「ＤＯ2 」）とを比較
し、ＤＯ2 がＤＯ1 よりも大きくなるまでＵＶ照射量を
増やし、ＤＯ2 ＞ＤＯ1 となる直前のＵＶ照射量となる
ようにＵＶ酸化装置１のＵＶ照射を制御する。In FIG. 1B, the measured value (hereinafter referred to as “DO 1 ”) of the DO amount of the inlet water of the UV oxidizer 1 input from the DO meter 5 and the ion exchange tower input from the DO meter 4 are shown. 2
Compared to DO of the measured values of the outlet water (hereinafter "DO 2"), increasing the UV dose until DO 2 is greater than DO 1, the UV irradiation amount immediately before the DO 2> DO 1 The UV irradiation of the UV oxidizing apparatus 1 is controlled so as to be as follows.
【００３０】或いは、予めイオン交換塔２の出口水のＤ
Ｏ量とＵＶ酸化装置１の入口水のＤＯ量との差の基準値
を定めておき、ＤＯ2 −ＤＯ1 がこの基準値を超える場
合には、ＵＶ酸化装置１のＵＶ照射量を減らし、測定値
がこの基準値より低い場合にはＵＶ酸化装置１のＵＶ照
射量を増す。Alternatively, the water D at the outlet of the ion exchange
A reference value for the difference between the O amount and the DO amount of the inlet water of the UV oxidizing device 1 is defined, and when DO 2 -DO 1 exceeds this reference value, the UV irradiation amount of the UV oxidizing device 1 is reduced, When the measured value is lower than the reference value, the UV irradiation amount of the UV oxidizing apparatus 1 is increased.
【００３１】また、図１（ｃ）では、ＴＯＣ計６から入
力されたＵＶ酸化装置１の入口水のＴＯＣ濃度から、こ
のＴＯＣ量の酸化分解に必要なＵＶ照射量を演算し、こ
の演算されたＵＶ照射量となるようにＵＶ酸化装置１の
ＵＶ照射量を制御する。In FIG. 1C, the UV irradiation amount necessary for the oxidative decomposition of the TOC amount is calculated from the TOC concentration of the inlet water of the UV oxidizing device 1 input from the TOC meter 6, and the calculated value is calculated. The UV irradiation amount of the UV oxidizing apparatus 1 is controlled so as to obtain the UV irradiation amount.
【００３２】或いは、予めＵＶ酸化装置１の入口水のＴ
ＯＣ濃度に対するＵＶ照射量を定めておき、測定値に応
じてこの設定値となるようにＵＶ酸化装置１のＵＶ照射
量を増減する。Alternatively, the T of the inlet water of the UV oxidizer 1
The amount of UV irradiation with respect to the OC concentration is determined, and the amount of UV irradiation of the UV oxidizing apparatus 1 is increased or decreased so as to reach this set value according to the measured value.
【００３３】本発明におけるＵＶ酸化装置のＵＶ照射量
の制御方法としては、例えば、次のような方法が挙げら
れる。As a method of controlling the amount of UV irradiation of the UV oxidizer in the present invention, for example, the following method can be mentioned.
【００３４】（１） 制御器としてＵＶランプ点灯数制
御器を用い、ＵＶランプの点灯数を望ましいＵＶ照射量
に応じて制御する。例えば、１シリンダー当り、任意の
複数（例えば１０本）のＵＶランプを設置したシリンダ
ーを複数個備えたＵＶ酸化装置であれば、点灯するシリ
ンダー数を制御する。(1) A UV lamp lighting number controller is used as a controller, and the lighting number of the UV lamp is controlled according to a desired UV irradiation amount. For example, in the case of a UV oxidizing apparatus provided with a plurality of cylinders provided with an arbitrary plurality (for example, 10) of UV lamps per cylinder, the number of lit cylinders is controlled.
【００３５】（２） 制御器としてＵＶランプ電流制御
器を用い、ＵＶランプの電流値を望ましいＵＶ照射量に
応じて制御する。例えば、特定のいくつかのシリンダー
或いはすべてのシリンダーについて電流値を制御する。(2) A UV lamp current controller is used as a controller, and the current value of the UV lamp is controlled according to a desired UV irradiation amount. For example, the current value is controlled for some specific cylinders or all cylinders.
【００３６】（３） 制御器としてＵＶランプ点灯数制
御器とＵＶランプ電流制御器とを用い、上記（１）と
（２）とを組み合せて望ましいＵＶ照射量に応じて制御
する。例えば、あるシリンダーについては定常電流値で
点灯又は消灯し、他のシリンダーは電流値を増減する。(3) A UV lamp lighting number controller and a UV lamp current controller are used as controllers, and the above (1) and (2) are combined to control according to a desired UV irradiation amount. For example, a certain cylinder is turned on or off at a steady current value, and another cylinder increases or decreases the current value.
【００３７】このような本発明の超純水製造装置は、超
純水製造システムの一次純水製造工程、二次純水製造工
程のいずれにも適用可能であるが、特に、二次純水製造
工程への適用に好適であり、従来の最大ＴＯＣ設定濃度
対応ＵＶ照射による最終処理水の超純水のＤＯ増加を抑
制し、高純度の超純水を安定に製造することが可能とな
る。The apparatus for producing ultrapure water of the present invention can be applied to both the primary pure water production step and the secondary pure water production step of the ultrapure water production system. It is suitable for application to the manufacturing process, and it is possible to suppress the increase in DO of ultrapure water of the final treated water by conventional UV irradiation corresponding to the maximum TOC set concentration, and to stably produce ultrapure water of high purity. .
【００３８】[0038]
【実施例】以下に実施例及び比較例を挙げて本発明をよ
り具体的に説明する。The present invention will be described more specifically below with reference to examples and comparative examples.
【００３９】説明の便宜上、まず、比較例を挙げる。First, a comparative example will be described for convenience of explanation.
【００４０】比較例１ 下記仕様のＵＶ酸化装置及びイオン交換塔を備え、８０
ｍ3 ／Ｈｒの流量で超純水の製造を行っている超純水製
造装置において、ＵＶ酸化装置入口水のＤＯ及びＴＯＣ
濃度とイオン交換塔出口水のＤＯ及びＴＯＣ濃度は表１
に示す通りであり、ＵＶ酸化装置入口水のＴＯＣが５ｐ
ｐｂのときには、イオン交換塔出口水のＤＯの大きな増
加はないものの、ＵＶ酸化装置入口水のＴＯＣが２ｐｐ
ｂと低いときには、イオン交換塔出口水のＴＯＣもそれ
に応じて低くなる反面、ＤＯは５ｐｐｂと４倍以上に増
加していた。Comparative Example 1 A UV oxidizer having the following specifications and an ion exchange tower were provided.
In an ultrapure water production apparatus which produces ultrapure water at a flow rate of m 3 / Hr, DO and TOC of UV oxidizer inlet water are used.
Table 1 shows the concentration and the DO and TOC concentrations of the ion exchange tower outlet water.
The TOC of the UV oxidizer inlet water is 5p
In the case of pb, although the DO of the ion exchange tower outlet water does not increase significantly, the TOC of the UV oxidizer inlet water is 2 pp.
When b was low, TOC at the outlet of the ion exchange tower was correspondingly low, while DO was 5 ppb, which was more than four times higher.
【００４１】ＵＶ酸化装置 消費電力６．２６ｋＷの低圧紫外線酸化装置（ランプ本
数６８本）。日本フォトサイエンス社製；４台イオン交換塔 カチオン交換樹脂：アニオン交換樹脂＝１：１．６（体
積比）の混床式イオン交換塔 UV oxidizer A low-pressure ultraviolet oxidizer with a power consumption of 6.26 kW (68 lamps). Japan PhotoScience Co., Ltd .; 4 ion exchange towers Cation exchange resin: anion exchange resin = 1: 1.6 (volume ratio) mixed bed type ion exchange tower
【００４２】[0042]
【表１】 [Table 1]
【００４３】実施例１ 比較例１において、イオン交換塔出口水のＤＯを測定す
るＤＯ計と、この測定値に基いてＵＶ酸化装置のＵＶ照
射量を制御する制御器とを設け、イオン交換塔出口水の
ＤＯが４．５ｐｐｂを超える場合にはＵＶ酸化装置のＵ
Ｖランプの点灯数を半分にしてＵＶ照射量を０．１５ｋ
Ｗ／ｍ3 −水にしたこと（イオン交換塔出口水のＤＯが
４．５ｐｐｂ以下のときはＵＶ照射量０．３ｋＷ／ｍ3
−水）以外は同様にして運転を行ったところ、表２に示
す通り、低ＴＯＣ水が流入する場合でも、ＤＯの大きな
増加は認められなかった。Example 1 In Comparative Example 1, a DO meter for measuring the DO of the water at the outlet of the ion exchange tower, and a controller for controlling the UV irradiation amount of the UV oxidizer based on the measured value were provided. If the DO of the outlet water exceeds 4.5 ppb, U
Halves the number of V lamps and reduces the UV irradiation to 0.15k
W / m 3 -water (when the DO of the ion exchange tower outlet water is 4.5 ppb or less, the UV irradiation amount is 0.3 kW / m 3.
(Water), the operation was performed in the same manner. As shown in Table 2, no significant increase in DO was observed even when low TOC water flowed.
【００４４】[0044]
【表２】 [Table 2]
【００４５】実施例２ 比較例１において、ＵＶ酸化装置入口水及びイオン交換
塔出口水のＤＯを測定するＤＯ計と、この測定値に基い
てＵＶ酸化装置のＵＶ照射量を制御する制御器とを設
け、ＵＶ酸化装置入口水のＤＯよりもイオン交換塔出口
水のＤＯが２．０ｐｐｂ以上増加した場合にはＵＶ酸化
装置のＵＶランプの点灯数を半分にしてＵＶ照射量を
０．１５ｋＷ／ｍ3 −水にしたこと（イオン交換塔出口
水のＤＯ−ＵＶ酸化装置入口水のＤＯ≦２．０ｐｐｂの
ときはＵＶ照射量０．３ｋＷ／ｍ3 −水）以外は同様に
して運転を行ったところ、表３に示す通り、低ＴＯＣ水
が流入する場合でも、ＤＯの大きな増加は認められなか
った。Example 2 In Comparative Example 1, a DO meter for measuring DO of water at the inlet of the UV oxidizer and water at the outlet of the ion exchange tower, and a controller for controlling the UV irradiation amount of the UV oxidizer based on the measured values When the DO of the ion exchange tower outlet water is increased by 2.0 ppb or more from the DO of the UV oxidizer inlet water, the number of lighting of the UV lamp of the UV oxidizer is halved and the UV irradiation amount is 0.15 kW / m 3 - that the water (UV dose 0.3 kW / m 3 when the DO ≦ 2.0ppb of DO-UV oxidation apparatus inlet water of the ion exchange column outlet water - water) except performing operation in the same manner However, as shown in Table 3, even when low-TOC water flows, a large increase in DO was not observed.
【００４６】[0046]
【表３】 [Table 3]
【００４７】実施例３ 比較例１において、ＵＶ酸化装置入口水のＴＯＣ濃度を
測定するＴＯＣ計と、この測定値に基いてＵＶ酸化装置
のＵＶ照射量を制御する制御器とを設け、ＵＶ酸化装置
入口水のＴＯＣが３ｐｐｂ以下の場合にはＵＶ酸化装置
のＵＶランプの点灯数を半分にしてＵＶ照射量を０．１
５ｋＷ／ｍ3 −水にしたこと（ＵＶ酸化装置入口水のＴ
ＯＣが３ｐｐｂを超えるときはＵＶ照射量０．３ｋＷ／
ｍ3 −水）以外は同様にして運転を行ったところ、表４
に示す通り、低ＴＯＣ水が流入する場合でも、ＤＯの大
きな増加は認められなかった。Example 3 In Comparative Example 1, a TOC meter for measuring the TOC concentration of the water at the inlet of the UV oxidizer and a controller for controlling the UV irradiation amount of the UV oxidizer based on the measured value were provided. When the TOC of the apparatus inlet water is 3 ppb or less, the number of lighting of the UV lamp of the UV oxidizing apparatus is reduced to half and the UV irradiation amount is set to 0.1.
5 kW / m 3 -water (UV oxidizer inlet water T
When OC exceeds 3 ppb, UV irradiation dose 0.3 kW /
m 3 -water).
As shown in the figure, even when low TOC water flows, a large increase in DO was not observed.
【００４８】[0048]
【表４】 [Table 4]
【００４９】[0049]
【発明の効果】以上詳述した通り、本発明の超純水製造
装置によれば、流入水のＴＯＣ濃度の変動に応じて適正
量のＵＶ照射を行えるため、ＵＶの過少照射によるＴＯ
Ｃの残留、或いは、ＵＶの過剰照射によるＤＯの増加を
防止して、低ＴＯＣ，低ＤＯで高純度の超純水を安定か
つ効率的に製造することができる。As described above in detail, according to the ultrapure water production apparatus of the present invention, an appropriate amount of UV irradiation can be performed according to the fluctuation of the TOC concentration of the inflow water.
It is possible to stably and efficiently produce ultrapure water with low TOC, low DO, and high purity by preventing C from remaining or increasing DO due to excessive UV irradiation.
【図１】本発明の超純水製造装置の実施の形態を示す系
統図である。FIG. 1 is a system diagram showing an embodiment of an ultrapure water production apparatus according to the present invention.
【図２】ＵＶ照射量とＴＯＣ除去量との関係を示すグラ
フである。FIG. 2 is a graph showing a relationship between a UV irradiation amount and a TOC removal amount.
【図３】ＵＶ照射量とイオン交換塔出口水ＤＯ量との関
係を示すグラフである。FIG. 3 is a graph showing a relationship between a UV irradiation amount and an ion exchange tower outlet water DO amount.
【図４】ＴＯＣ濃度とＴＯＣ量との関係を示すグラフで
ある。FIG. 4 is a graph showing the relationship between TOC concentration and TOC amount.
１ ＵＶ酸化装置 ２ イオン交換塔 ３ 制御器 ４，５ ＤＯ計 ６ ＴＯＣ計 DESCRIPTION OF SYMBOLS 1 UV oxidation apparatus 2 Ion exchange tower 3 Controller 4, 5 DO meter 6 TOC meter
───────────────────────────────────────────────────── フロントページの続き (72)発明者 伊藤 正義 東京都新宿区西新宿３丁目４番７号 栗田 工業株式会社内 ──────────────────────────────────────────────────続 き Continuation of front page (72) Inventor Masayoshi Ito 3-4-7 Nishi-Shinjuku, Shinjuku-ku, Tokyo Inside Kurita Industry Co., Ltd.
Claims (3)
塔とを備えてなる超純水製造装置において、該イオン交
換塔の出口水の溶存酸素量を測定し、この測定結果に基
いて該紫外線酸化装置の紫外線照射量を制御することを
特徴とする超純水製造装置。In an ultrapure water producing apparatus comprising an ultraviolet oxidizing apparatus and an ion exchange tower at a subsequent stage, the amount of dissolved oxygen in the outlet water of the ion exchange tower is measured. An ultrapure water production apparatus characterized by controlling the amount of ultraviolet irradiation of an oxidizing apparatus.
塔とを備えてなる超純水製造装置において、該紫外線酸
化装置の入口水の溶存酸素量と該イオン交換塔の出口水
の溶存酸素量を測定し、これらの測定結果に基いて該紫
外線酸化装置の紫外線照射量を制御することを特徴とす
る超純水製造装置。2. An ultrapure water production system comprising an ultraviolet oxidizer and a subsequent ion exchange tower, wherein the amount of dissolved oxygen at the inlet water of the ultraviolet oxidizer and the amount of dissolved oxygen at the outlet water of the ion exchanger are provided. The ultrapure water production apparatus characterized in that the ultraviolet irradiation amount of the ultraviolet oxidation apparatus is controlled based on the measurement results.
塔とを備えてなる超純水製造装置において、該紫外線酸
化装置の入口水のＴＯＣ濃度を測定し、この測定結果に
基いて該紫外線酸化装置の紫外線照射量を制御すること
を特徴とする超純水製造装置。3. An ultrapure water producing apparatus comprising an ultraviolet oxidizing apparatus and a subsequent ion exchange tower, measuring the TOC concentration of inlet water of the ultraviolet oxidizing apparatus, and based on the measurement result, measuring the TOC concentration of the ultraviolet oxidizing apparatus. An ultrapure water production apparatus characterized by controlling the amount of ultraviolet irradiation of the apparatus.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27943496A JP3941139B2 (en) | 1996-10-22 | 1996-10-22 | Ultrapure water production equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27943496A JP3941139B2 (en) | 1996-10-22 | 1996-10-22 | Ultrapure water production equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH10123118A true JPH10123118A (en) | 1998-05-15 |
| JP3941139B2 JP3941139B2 (en) | 2007-07-04 |
Family
ID=17611021
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27943496A Expired - Fee Related JP3941139B2 (en) | 1996-10-22 | 1996-10-22 | Ultrapure water production equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3941139B2 (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000302413A (en) * | 1999-04-20 | 2000-10-31 | Kurita Water Ind Ltd | Apparatus for producing ozonous water |
| JP2002205063A (en) * | 2001-01-10 | 2002-07-23 | Nippon Steel Corp | Method for inactivating protozoa |
| US6733661B2 (en) | 2001-03-26 | 2004-05-11 | Renesas Technology Corp. | Ultrapure water producing apparatus |
| JP2006276005A (en) * | 2005-02-22 | 2006-10-12 | Asml Netherlands Bv | Fluid filtration method, fluid filtered by the same, lithographic system, and element-manufacturing method |
| JP2008190753A (en) * | 2007-02-02 | 2008-08-21 | Techno Ryowa Ltd | Air conditioner and pure water production system |
| WO2009122884A1 (en) * | 2008-03-31 | 2009-10-08 | 栗田工業株式会社 | Method for producing pure water and pure water production system |
| WO2016199435A1 (en) * | 2015-06-11 | 2016-12-15 | 野村マイクロ・サイエンス株式会社 | Ultrapure water manufacturing system and ultrapure water manufacturing method |
| WO2021070573A1 (en) * | 2019-10-07 | 2021-04-15 | 栗田工業株式会社 | Toc treatment apparatus and treatment method |
-
1996
- 1996-10-22 JP JP27943496A patent/JP3941139B2/en not_active Expired - Fee Related
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000302413A (en) * | 1999-04-20 | 2000-10-31 | Kurita Water Ind Ltd | Apparatus for producing ozonous water |
| JP2002205063A (en) * | 2001-01-10 | 2002-07-23 | Nippon Steel Corp | Method for inactivating protozoa |
| US6733661B2 (en) | 2001-03-26 | 2004-05-11 | Renesas Technology Corp. | Ultrapure water producing apparatus |
| JP4584847B2 (en) * | 2005-02-22 | 2010-11-24 | エーエスエムエル ネザーランズ ビー．ブイ． | Fluid filtration method, fluid filtered thereby, lithographic apparatus, and device manufacturing method |
| JP2006276005A (en) * | 2005-02-22 | 2006-10-12 | Asml Netherlands Bv | Fluid filtration method, fluid filtered by the same, lithographic system, and element-manufacturing method |
| JP2008190753A (en) * | 2007-02-02 | 2008-08-21 | Techno Ryowa Ltd | Air conditioner and pure water production system |
| WO2009122884A1 (en) * | 2008-03-31 | 2009-10-08 | 栗田工業株式会社 | Method for producing pure water and pure water production system |
| US8480906B2 (en) | 2008-03-31 | 2013-07-09 | Kurita Water Industries Ltd. | Pure water manufacturing method and pure water manufacturing apparatus |
| JP5454468B2 (en) * | 2008-03-31 | 2014-03-26 | 栗田工業株式会社 | Pure water production method and pure water production apparatus |
| KR101390441B1 (en) * | 2008-03-31 | 2014-04-30 | 쿠리타 고교 가부시키가이샤 | Method for producing pure water and pure water production system |
| WO2016199435A1 (en) * | 2015-06-11 | 2016-12-15 | 野村マイクロ・サイエンス株式会社 | Ultrapure water manufacturing system and ultrapure water manufacturing method |
| JP2017000970A (en) * | 2015-06-11 | 2017-01-05 | 野村マイクロ・サイエンス株式会社 | Ultrapure water production system, and ultrapure water production method |
| WO2021070573A1 (en) * | 2019-10-07 | 2021-04-15 | 栗田工業株式会社 | Toc treatment apparatus and treatment method |
| JP2021058845A (en) * | 2019-10-07 | 2021-04-15 | 栗田工業株式会社 | Toc treatment device and treatment method |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3941139B2 (en) | 2007-07-04 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI460136B (en) | Ultraviolet light activated oxidation process for the reduction of organic carbon in semiconductor process water | |
| JP2793100B2 (en) | Pure water production method | |
| JP4932757B2 (en) | Ultrapure water production method and ultrapure water production apparatus | |
| US6991733B2 (en) | Process for removing organics from ultrapure water | |
| WO2021070573A1 (en) | Toc treatment apparatus and treatment method | |
| JP5280038B2 (en) | Ultrapure water production equipment | |
| KR100200535B1 (en) | Process and apparatus for ultraviolet decomposition of waste water containing organic substances | |
| JP3941139B2 (en) | Ultrapure water production equipment | |
| US5523001A (en) | Treatment of electroless plating waste streams | |
| JP5211414B2 (en) | Ultrapure water production equipment | |
| JP4635827B2 (en) | Ultrapure water production method and apparatus | |
| JP4978275B2 (en) | Primary pure water production process water treatment method and apparatus | |
| JP3110034B2 (en) | Method to remove organic matter and dissolved oxygen simultaneously | |
| JP2003126850A (en) | Apparatus and method of treating organic substance- containing water | |
| JPH1157753A (en) | Removing method of toc component and device therefor | |
| JP7513213B2 (en) | Ultrapure water production apparatus and method for operating the ultrapure water production apparatus | |
| JPH0889976A (en) | Method for removing organic matter in water | |
| WO2024057697A1 (en) | Water treatment system and water treatment method | |
| JPH09253639A (en) | Ultrapure water making apparatus | |
| WO2022239314A1 (en) | Pure water production apparatus and pure water production method | |
| WO2024080079A1 (en) | Apparatus for producing pure water | |
| JP2023172164A (en) | water treatment equipment | |
| JP3580648B2 (en) | Ultrapure water production equipment | |
| JP2000051875A (en) | Control of water treatment operation by ozone and ultraviolet rays | |
| JPH09220560A (en) | Ultrapure water making apparatus |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20060523 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20060720 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20070313 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20070326 |
|
| R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100413 Year of fee payment: 3 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110413 Year of fee payment: 4 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120413 Year of fee payment: 5 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130413 Year of fee payment: 6 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140413 Year of fee payment: 7 |
|
| LAPS | Cancellation because of no payment of annual fees |