JPH10115901A - Photographic developing processor - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a photographic developing processor capable of easily judging whether or not the performance of processing liquid in a developing processing means (developing unit) is within the control extent, without using a control strip. SOLUTION: A reference pattern exposure unit 4 for exposing a reference pattern on a photographic paper P is installed at the preceding stage of a developing unit 2, and prior to the developing processing, the reference pattern is exposed on the photographic paper P. The photographic paper P with the exposed reference pattern is developed by the developing unit 2 and carried to a measuring unit 5. In the measuring unit 5, the density of the reference pattern image developed by applying the developing processing is measured as a performance value, then, the measured value is imparted to a control unit. In the control unit, the performance value (the density of the reference pattern image) is compared with a performance reference value stored by a memory so as to judge whether or not the processing liquid is within the control extent.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photographic processing apparatus for developing a photosensitive material such as photographic paper or a negative film by a developing means, and in particular, whether the performance of a processing solution in the developing means is within a control range. The present invention relates to a technique for determining whether or not to perform the determination.

[0002]

2. Description of the Related Art In a photographic processing apparatus, it is necessary to check at appropriate times, for example, once a day, whether or not a processing solution stored in a developing means (developing unit) has a predetermined performance. is there. Therefore, conventionally, such a check is performed using a reference-exposed photosensitive material called a control strip. That is, the control strip is placed in a box called a const holder in a dark room, and is developed by being put into a developing unit. Then, the density of an image appearing on the photosensitive material by the developing processing is measured by a densitometer, and the processing is performed. The performance of the liquid was confirmed.

[0003]

However, the control strip is expensive, and it is necessary to maintain the performance of the processing solution on a daily basis, even if absolute measurement of the performance of the processing solution is required, such as when a photographic processing apparatus is newly installed. The problem is that it is too expensive to use for management.

[0004] In addition, the control strip must be kept refrigerated in order to prevent its change over time, and it is necessary to return to normal temperature when used.
In addition, each time the performance of the processing solution is checked, the control strip is placed in the const holder as described above,
It must be set in the developing unit. For these,
Checking the performance of the processing solution using the control strip requires a great deal of time and is a cause of a reduction in work efficiency.

SUMMARY OF THE INVENTION The present invention has been made in view of the above-described problems, and is intended to determine whether or not the performance of a processing solution in a developing means (developing unit) can be easily controlled without using a control strip. It is an object of the present invention to provide a photographic processing apparatus capable of determining whether or not the processing has been performed.

[0006]

According to the present invention, there is provided a photographic development processing apparatus for developing a photosensitive material by a development processing means, and in order to achieve the above object, prior to the development processing by the development processing means. A reference pattern exposure unit for exposing a reference pattern to the photosensitive material, and a performance of a processing liquid in the development processing unit from a reference pattern image corresponding to the reference pattern appearing on the photosensitive material by the development processing by the development processing unit. Measuring means for measuring the performance value shown;
A control unit that stores a performance reference value of the processing liquid in advance and compares the performance value measured by the measurement unit with the performance reference value to determine whether the processing liquid is within a management range. And

In the present invention, the reference pattern exposing means exposes the photosensitive material to a reference pattern, and develops the photosensitive material to form a reference pattern image. And
After the measuring unit measures a performance value indicating the performance of the processing liquid from the reference pattern image, the performance value is compared with the performance reference value to determine whether the processing liquid is within the management range.

According to a second aspect of the present invention, the measuring means measures the density of the reference pattern image as the performance value.

According to the present invention, the density of the reference pattern image appearing on the photosensitive material by the development processing is measured as a performance value by the measuring means.

According to a third aspect of the present invention, the reference pattern exposure means includes a light source unit for irradiating the photosensitive material with a plurality of light beams having different wavelength ranges.

According to the present invention, a plurality of light beams having different wavelength ranges are irradiated on the photosensitive material, and the exposure processing of the reference pattern is performed.

According to a fourth aspect of the present invention, the reference pattern exposure means includes a light measurement section for receiving the plurality of lights emitted from the light source section and detecting respective light intensities, and the control section controls the light measurement section. The light amount in each wavelength range irradiated on the photosensitive material is adjusted based on the light intensity detected by the section.

In the present invention, the light intensity of the light from the light source unit is detected by the photometric unit, and the amount of exposure to the photosensitive material in each wavelength range is adjusted based on the light intensity, so that the reference pattern is formed with the desired light amount. Exposed.

According to a fifth aspect of the present invention, the light source section includes a white light source, a plurality of interference filters that transmit only light in a specific wavelength range different from each other, and a plurality of the interference filters that are switched to switch the plurality of interference filters. An interference filter switching unit that selectively emits the emitted light toward the photosensitive material for each wavelength range.

According to the present invention, by switching the interference filters, light in specific wavelength ranges different from each other can be obtained.

According to a sixth aspect of the present invention, the light source unit includes a plurality of light emitting elements that emit light in different wavelength ranges.

In the present invention, the plurality of light emitting elements emit light in different wavelength ranges, respectively, and expose the photosensitive material with the reference pattern.

According to a seventh aspect of the present invention, the light source unit includes a plurality of cold cathode fluorescent lamps or hot cathode fluorescent lamps that emit light in different wavelength ranges.

According to the present invention, a plurality of fluorescent lamps emit light in different wavelength ranges to expose a photosensitive material with a reference pattern.

In the invention according to claim 8, the control means adjusts the exposure amount on the photosensitive material by changing the light intensity of the light emitted from the light source section.

According to a ninth aspect of the present invention, the amount of exposure to the photosensitive material is adjusted by changing the lighting time of the light source section by the control means.

According to the eighth and ninth aspects of the present invention, the light intensity or the lighting time (ie, the irradiation time on the photosensitive material)
Is adjusted, the exposure amount on the photosensitive material is adjusted.

According to a tenth aspect of the present invention, the reference pattern exposing means is configured to maintain the ambient temperature of at least one of the photosensitive material conveyed in the reference pattern exposing means, the light source unit and the photometric unit within a predetermined range. It is configured to further include a key portion.

According to an eleventh aspect of the present invention, the ambient temperature of the photometric section is set to a reference temperature of any one of 18 to 45 ° C. by the temperature control section and is set within a fluctuation range of 1.56 ° C. I am holding it down.

According to a twelfth aspect of the present invention, the ambient temperature of the photosensitive material conveyed through the reference pattern exposure means is set to any one of 18 to 45 ° C. as a reference temperature by the temperature control section. .43 ° C.

According to the tenth, eleventh and twelfth aspects of the present invention, the temperature control unit adjusts the temperature of the photosensitive material conveyed in the reference pattern exposure means, the light source unit and the photometric unit, and adjusts the temperature of the photosensitive material. The accuracy of checking whether or not the processing liquid is within the management range is improved by eliminating the influence of temperature changes in the material, the light source unit, and the photometric unit.

[0027]

FIG. 1 is a schematic diagram showing one embodiment of a photographic processing apparatus according to the present invention.
FIG. 2 is a diagram illustrating an electrical configuration of the photographic processing apparatus of FIG. 1. This photographic processing apparatus is an apparatus that exposes an image of a negative film on a color photographic paper P by a normal print exposure unit 1, develops the image by a developing unit 2, and cuts the image one by one by a cutter unit 3. Further, in this photographic development processing apparatus, in order to check the performance of the processing liquid in the development unit 2, a reference pattern exposure unit 4 is provided in a stage preceding the development unit 2, and printing is performed in a stage subsequent to the cutter unit 3 as described later. A measurement unit 5 for measuring the density of the reference pattern image appearing on the paper P is further provided. Hereinafter, the configuration of each unit will be described focusing on the configuration of the reference pattern exposure unit 4 and the measurement unit 5.

The reference pattern exposure unit 4 is used, for example, on a color photographic paper P having a spectral sensitivity characteristic shown in FIG.
It exposes three reference patterns Dmin, LD, HD and Dmax (FIG. 4). The reference pattern Dmin is a stain, and the reference patterns LD and HD are for sensitivity detection, and detect the contrast by (HD-LD). Further, the reference pattern Dmax is for detecting the saturation density. In order to expose the reference patterns Dmin, LD, HD and Dmax onto the color photographic paper P, as will be described later, according to the spectral sensitivity characteristics (red sensitivity, green sensitivity and blue sensitivity) of the color photographic paper P. To
The light intensity and the irradiation time of the R component light, the G component light, and the B component light are appropriately set to adjust the light amount.

In order to irradiate the photographic printing paper P with the R component light, the G component light and the B component light in this manner, in the photographic processing apparatus according to this embodiment, a light source unit for emitting light in different wavelength ranges from each other. 41 are provided. This light source section 41
Includes a white light source that emits white light, for example, a halogen lamp 411, and interference filters 412R, 412G, and 412B that are disposed near the halogen lamp 411 and that have transmission characteristics shown in FIG. These interference filters 412R, 412G, and 412B respectively include only R component light having a wavelength range of 670 to 710 nm, only G component light having a wavelength range of 520 to 560 nm, and B having a wavelength range of 440 to 480 nm. It has the property of transmitting only component light.

As shown in FIG. 2, a white light source driving unit 413 is electrically connected to the halogen lamp 411, and controls the lighting of the halogen lamp 411 according to a control signal from the control unit 6. White light is emitted to the photographic paper P side. Then, only light in the wavelength range corresponding to the interference filter located on the optical axis (not shown) of the reference pattern exposure unit 4 is guided to the photographic paper P side. Note that the switching of the interference filter is performed by the interference filter switching unit 4.
14 (FIG. 2).

Light in a specific wavelength range emitted from the light source unit 41 is irradiated on the photographic paper P while being diffused by the diffusion box 42. An optical sensor (photometric unit) 43, a temperature sensor 441, a heating unit 4
And a temperature control unit 44 including a cooling unit 443. The light intensity of the light applied to the photographic printing paper P is measured by the former (light sensor 43), and the reference is controlled by the latter (temperature control unit 44). The temperature in the pattern exposure unit 4 is adjusted to a temperature range described in a later embodiment to suppress a temperature measurement error or a density measurement error due to a temperature change, and the performance of the processing liquid is within the control range with high accuracy. It is configured to be able to determine whether or not it is.

The photographic paper P on which the four reference patterns Dmin, LD, HD and Dmax have been exposed by the reference pattern exposure unit 4 is transported to the developing unit 2 configured as follows. The developing unit 2 includes a developing tank 21, a bleach-fix tank 22, and a stabilizing tank 23.
23 store different processing liquids. Also,
Replenishment tanks 21a to 23a are provided corresponding to the tanks 21 to 23, respectively. The replenishment cocks 21b to 23b are opened and closed by the replenishment cock drive unit 24 to control the replenishment processing liquid. Is configured to be refillable. The liquid exchange cocks 21c to 23c are connected to the tanks 21 to 23, respectively. The cocks 21c to 23c are controlled to be opened and closed by the liquid exchange cock drive unit 25, so that the processing liquid from each tank is controlled. Emissions are possible. Further, the developing unit 2 is provided with a drying unit 26, which is configured to dry the photographic paper P that has passed through the developing tank 21, the bleach-fix tank 22, and the stabilizing tank 23.

A cutter unit 3 having a pair of cutters 31 is disposed near the exit side of the developing unit 2 configured as described above.
The photographic paper P is cut into print paper of an appropriate size by opening and closing the cutters 31 and 31.

The printing paper conveyed from the cutter unit 3 measures the density of four reference pattern images appearing on the printing paper by the measuring unit 5, and the measured value (density value) indicates the performance of the processing liquid. It is given to the control unit 6 as the performance value shown.

The photographic processing apparatus constructed as described above operates as follows according to a program stored in a memory (not shown) of the control unit 6. Such an operation will be described with reference to FIG.

First, the reference pattern Dmin on the photographic paper P,
Before the exposure of LD, HD, and Dmax, the light intensity of the R, G, and B component lights is adjusted. Specifically, the interference filter 41
After the 2R is positioned on the optical axis of the reference pattern exposure unit 4, the reference pattern Dmin, LD, and H are turned on while the halogen lamp 411 is turned on and the light sensor 43 measures the light intensity.
Adjustment is performed so that light intensity required for exposing D and Dmax is obtained (step S1). The same applies to the G and B component lights. Thus, R,
By adjusting the light intensity of the G and B component lights, a predetermined light intensity is always obtained even if the performance of the halogen lamp 411 is deteriorated, and the reference patterns Dmin, LD, HD and Dmax can be exposed.

In step S2, reference patterns Dmin,
The exposure time t is set according to the reference pattern to be exposed among LD, HD and Dmax. In this embodiment, the light intensity is adjusted in advance and the reference pattern D
By changing the exposure time t according to min, LD, HD and Dmax, it is possible to secure an appropriate exposure amount according to each of the reference patterns Dmin, LD, HD and Dmax.

When the setting of the exposure time t is completed, exposure of the reference pattern is started (step S3), and at the next step S4, it is determined whether or not the exposure time has elapsed, and the exposure time set at step S2 is determined. Exposure processing is performed by t.

It is determined "Yes" in step S4.
That is, when a predetermined exposure amount is reached, the halogen lamp 411 is used.
Is turned off, and the exposure process is stopped (step S5), and in step S6, all the reference patterns Dmin,
It is determined whether the exposure process has been completed for LD, HD, and Dmax. Then, while “No” in step S6, that is, while it is determined that the process is not completed, the process returns to step S2, and after setting an exposure time t according to another reference pattern, the exposure process is continued (steps S3 to S5). ).

Thus, the four reference patterns Dmin, L
After exposing D, HD and Dmax to the photographic paper P, the photographic paper P is transported to the developing unit 2 and subjected to a developing process (step S7). Thus, the reference pattern images corresponding to the four reference patterns Dmin, LD, HD, and Dmax are printed on the printing paper P.

Thereafter, the photographic paper P is transported to the measuring unit 5, and the densities of the four reference pattern images are measured as the performance values of the developer (step S8), and the performance standards already stored in the memory of the control unit are measured. It is determined whether the processing liquid in the developing unit 2 is within the management range by comparing with the value (step S9). Here, the performance reference value is a value obtained by installation adjustment performed when a photographic development processing apparatus is newly installed or when the emulsion number of the photographic paper P is changed, and specifically, as follows. I'm asking. That is, after processing the control strip to determine the absolute level of the processing solution performance, exposure, development, and density measurement of the reference patterns Dmin, LD, HD, and Dmax are performed as described above, and The one that asked for the relationship.

When the emulsion number of the photographic paper P changes, the performance reference value may be obtained as follows.

First, the absolute level of the processing solution performance was determined by processing the control strip,
Exposure, development, and density measurement of the reference patterns Dmin, LD, HD, and Dmax are performed as described above, and the relationship with the absolute level is obtained.

Shortly before the photographic paper P is exhausted (in a state where the photographic paper P for exposing the reference pattern remains),
Exposure, development, and density measurement of the reference patterns Dmin, LD, HD, and Dmax, and immediately after the photographic paper P is completed and replaced with new photographic paper, the reference patterns Dmin,
LD, HD, and Dmax are compared with those subjected to exposure, development, and density measurement, and the relationship with the absolute level is sequentially updated to obtain a performance reference value.

As described above, according to the photographic processing apparatus of this embodiment, the exposure, development, and density measurement of the reference pattern images of the four reference patterns Dmin, LD, HD, and Dmax are sequentially performed on the photographic paper P. In addition, it is configured to determine whether the processing liquid in the developing unit 2 is within the management range by comparing the measured value (performance value) with a previously stored performance reference value. The performance of the processing solution in the developing unit can be easily checked without using a control strip.

FIG. 7 is a schematic view showing another embodiment of the photographic development processing apparatus according to the present invention, and FIG. 8 is a view showing an electrical configuration of the photographic development processing apparatus of FIG. The difference between this photographic processing apparatus and the apparatus described above (FIGS. 1 and 2) is the configuration relating to the light source section of the reference pattern exposure unit. Since the other configurations are the same, the same reference numerals are given and the description is omitted.

The light source unit 41 in this photographic processing apparatus
5 includes a red light emitting diode 415R, a green light emitting diode 415G, and a blue light emitting diode 415B, and each of the R-LED driving unit 416R, the G-LED driving unit 416G, and the B-LED driving unit 416B (FIG. 8). Under the control, light having the spectral distribution characteristic shown in FIG. 9 is emitted. That is, by turning on the red light emitting diode 415R, the R component light of 620 to 710 nm is emitted, by turning on the green light emitting diode 415G, the G component light of 510 to 600 nm is emitted, and further by turning on the blue light emitting diode 415B. 620 nm B component light is obtained.

In the photographic processing apparatus having the above-described configuration, the four types of reference patterns Dmin, LD, and LD are applied to the color photographic paper P in the same operation as the above-described apparatus, that is, in the operation procedure shown in the flowchart of FIG. After exposing the HD and Dmax, a development process is performed using a processing solution in the development unit 2 to form four reference pattern images. Further, the density of these reference pattern images is measured sequentially, and the measured values (performance Value) is compared with a performance reference value stored in advance to determine whether or not the processing liquid in the developing unit 2 is within the control range. This has the effect that the performance of the processing liquid in the developing unit can be easily checked.

In this embodiment, the light emitting diodes 415R, 415R and 415R are used to independently obtain the R, G, and B component lights in the red, green, and blue wavelength ranges.
G, 415B, but each light emitting diode 41
Instead of 5R, 415G and 415B, respectively, FIG.
(A) a red light-emitting cold cathode fluorescent lamp having the spectral distribution characteristics shown in FIG. 3 (b), a green light-emitting cold cathode fluorescent lamp having the spectral distribution characteristics shown in FIG. Blue emitting cold cathode fluorescent lamps can be used. Further, red, green and blue light emitting hot cathode fluorescent lamps may be used. When these lamps are used, R component light of 580 to 710 nm as a red wavelength region and G component light of 450 to 650 nm as a green wavelength region are used. B-component light having a wavelength of 400 to 600 nm is further obtained as a blue wavelength region.

As described above, the light source section is composed of a light emitting element such as a light emitting diode or a semiconductor laser which independently emits light in the red, green and blue wavelength ranges, a cold cathode fluorescent lamp or a hot cathode fluorescent lamp. In this case, when exposing each of the four reference patterns Dmin, LD, HD, and Dmax onto the photographic paper P, the light in the red, green, and blue wavelength ranges (the R component light, the G component light, and the B component light) as described above. Instead of sequentially irradiating the component light), these lights (R component light, G component light and B component light) may be simultaneously applied to the photographic paper P, so that the time required for the exposure process can be reduced. .

Although the present invention has been described with reference to the embodiment, the present invention is not limited to the above embodiment. For example, in the above embodiment, after sequentially exposing four reference patterns Dmin, LD, HD and Dmax,
Development processing is performed, but exposure and
Development processing and density measurement may be performed.

In the above embodiment, the light intensity is adjusted in advance, and the exposure time t is changed in accordance with the reference patterns Dmin, LD, HD, and Dmax. Although an appropriate exposure amount is secured according to Dmax, an appropriate exposure amount is secured by setting the exposure time in advance and changing the light intensity according to the reference patterns Dmin, LD, HD and Dmax. You may make it.

Further, in the above-described embodiment, the technique for checking the performance of the processing solution in the photographic processing apparatus for developing the color photographic paper P has been described, but the present invention is not limited to this. Also, it can be applied to a photographic development processing device that develops a color film.When developing a color film, it exposes a reference pattern to a film as a photosensitive material, develops it, and measures the density of the reference pattern image In addition, since the measured value (performance value) is compared with a performance reference value stored in advance to determine whether or not the processing solution that has been subjected to the development processing is within the management range, the details are described in detail above. It is said that the performance of the processing solution in the developing unit can be easily checked without using the control strip, which is the same effect as that of the apparatus that has been used. Effect can be obtained.

[0054]

Next, an embodiment of the present invention will be described. As is well known in the art, the sensitivity characteristics of the optical sensor (photometry unit) 43 and the photosensitive characteristics of the photosensitive material such as the color photographic paper P change depending on the ambient temperature. In addition, the light intensity changes depending on the ambient temperature depending on the type of light source (light emitting diode or cold cathode fluorescent lamp). Therefore, when the ambient temperature changes, an erroneous measurement of the optical sensor 43, an increase or decrease in the exposure amount on the photographic paper P, a change in the light intensity of the light source, and the like occur. You can't do that. For this reason, it is necessary to keep the ambient temperature of the photosensitive material such as the optical sensor 43 and the photographic paper P, and the light source units 41 and 415 alone or collectively. Hereinafter, a description will be given as to which temperature range can be adjusted to prevent the above problem from occurring and to check the performance of the processing liquid with high accuracy.

First, the influence of the ambient temperature when the R component light, G component light and B component light in three wavelength ranges are taken out by the interference filters 412R, 412G and 412B using a halogen lamp as the light source unit 41 and subjected to the reference exposure. It shows about. In this case, when the temperature of the optical sensor 43 changes from 30 ° C. to 45 ° C., the output voltage of the optical sensor 43 (a minute current is generated when light enters the optical sensor 43; therefore, this current value is converted into a voltage. The amplified value) is 1 when measuring the light transmitted through the interference filter 412B.
There is a change of 3.5 mV, and when measuring the light transmitted through the interference filter 412G, there is a change of 25.5 mV,
When the light transmitted through the interference filter 412R was measured, there was a change of 49.5 mV. Further, there was a proportional relationship between the temperature change and the output voltage of the optical sensor 43. That is, when the ambient temperature changes by 1 ° C. in the case of measuring the light transmitted through the interference filter 412B, the output voltage of the optical sensor 43 changes by 0.9 mV, and the interference filter 412G
In the case of the light transmitted through the filter, it changes by 1.7 mV, and in the case of the light transmitted through the interference filter 412R, it changes by 3.3 mV.

Further, the ambient temperature is kept constant, the light intensity is changed by changing the voltage applied to the halogen lamp 411, and the change in the output voltage of the light sensor 43 is 1.4 mV (for the light transmitted through the interference filter 412B). Case) 3.9m
V (in the case of light transmitted through the interference filter 412G),
Even if it was changed to be 6.9 mV (in the case of light transmitted through the interference filter 412R) or less, no change in the density of the reference pattern image was observed.

Therefore, in order to obtain a predetermined reference pattern image density, the ambient temperature of the optical sensor 43 is set to 1.4 (mV) in the case of light transmitted through the interference filter 412B.
/0.9 (mV / ° C) = 1.56 ° C,
In the case of light transmitted through the interference filter 412G, 3.9
(MV) /1.7 (mV / ° C) = 2.92 ° C or less, and 6.9 (mV) /3.3 (mV / ° C) for light transmitted through the interference filter 412R. ) = 2.0
It is necessary to keep each within 9 ° C. That is, in order to obtain a predetermined reference pattern image even when exposed with light in all wavelength ranges, it is necessary to control the ambient temperature of the optical sensor 43 within a range of 1.56 ° C. around the predetermined temperature. is there.

Further, the photographic processing apparatus is 18 to 30 ° C.
It is recommended to be installed in an environment where the exposure unit during operation has a maximum temperature rise of 15 ° C from the ambient temperature.
The predetermined ambient temperature of the optical sensor 43 may be set between 18 and 45 ° C.

Therefore, the ambient temperature of the optical sensor 43 functioning as a photometer is controlled by the temperature controller
Set any temperature of 5 ° C as the reference temperature and 1.5
By controlling the temperature within the fluctuation range of 6 ° C., the influence of the temperature change in the optical sensor 43 can be eliminated, and the performance of the processing liquid can be checked with high accuracy.

Next, the ambient temperature of a photosensitive material such as photographic paper P will be discussed. The temperature of the photographic paper (photosensitive material) P is set to 3
With 0 ° C as the reference temperature, when the temperature was changed up to 45 ° C with an accuracy of ± 0.5 ° C in increments of 5 ° C, the density of the reference pattern image changed by a maximum of 0.07 at a temperature change of 5 ° C. . Also,
When exposure was performed at a constant temperature with an accuracy of ± 0.5 ° C., there was no variation in the density of the reference pattern image. Since the concentration measurement error is about 0.02, 5 ° C./(0.07/0.
02) = 1.43 ° C., in order to obtain a predetermined reference pattern, the peripheral temperature of the photographic paper P should be set at 1.30 ° around the predetermined temperature.
It must be in the range of 43 ° C.

Further, as described above, it is recommended that the photographic processing apparatus be installed in an environment of 18 to 30 ° C., and the temperature of the exposed portion during operation increases by a maximum of 15 ° C. from the ambient temperature. Therefore, the predetermined ambient temperature of the photographic paper P is 18 to 45.
What is necessary is just to set during ゜ C.

Therefore, the ambient temperature of the photographic paper P conveyed in the reference pattern exposure unit 4 is set to any temperature of 18 to 45 ° C. by the temperature control section 44, and 1.43 ° C. By keeping within the fluctuation range of
The effect of the temperature change on the printing paper P can be eliminated, and the performance of the processing liquid can be checked with high accuracy.

[0063]

As described above, according to the first to twelfth aspects of the present invention, the reference pattern is exposed on the photosensitive material by the reference pattern exposure means, and the photosensitive material is subjected to development processing. After the image is formed, the performance value indicating the performance of the processing liquid is measured from the reference pattern image by the measuring unit, and the performance value is compared with the performance reference value to determine whether the processing liquid is within the management range. Therefore, it is possible to easily determine whether or not the performance of the processing solution in the developing means (developing unit) is within the management range without using a control strip.

According to the present invention, the light intensity of the light from the light source unit is detected by the photometric unit, and the exposure amount to the photosensitive material in each wavelength region is adjusted based on the detected light intensity. With this configuration, the reference pattern can be exposed on the photosensitive material with a desired amount of light, and the above determination can be made with high accuracy.

According to the eighth and ninth aspects of the present invention, the control unit controls the light intensity of the light emitted from the light source unit.
Alternatively, since the exposure time to the photosensitive material is adjusted by adjusting the lighting time (that is, the irradiation time to the photosensitive material), the reference pattern can always be exposed at a predetermined exposure time. It can be performed with high accuracy.

According to the tenth, eleventh, and twelfth aspects of the present invention, the temperature of the photosensitive material conveyed through the reference pattern exposure means by the temperature control unit, the ambient temperature of the light source unit, the photometric unit, and the like are adjusted to a certain range. Therefore, the influence of the temperature change in each part can be eliminated, and the above determination can be made with higher accuracy.

[Brief description of the drawings]

FIG. 1 is a schematic diagram showing one embodiment of a photographic development processing apparatus according to the present invention.

FIG. 2 is a diagram showing an electrical configuration of the photographic development processing apparatus of FIG.

FIG. 3 is a diagram illustrating spectral sensitivity characteristics of color photographic paper.

FIG. 4 is a diagram showing a reference pattern used when checking the performance of a processing solution.

FIG. 5 is a diagram illustrating transmission characteristics of an interference filter.

FIG. 6 is a flowchart showing the operation of the photographic processing apparatus of FIG. 1;

FIG. 7 is a schematic view showing another embodiment of the photographic development processing apparatus according to the present invention.

8 is a diagram showing an electrical configuration of the photographic processing apparatus of FIG. 7;

FIG. 9 is a diagram showing a spectrum distribution of red, green and blue light emitting diodes.

FIG. 10 is a diagram showing a spectrum distribution of a cold cathode fluorescent lamp.

[Explanation of symbols]

 2 Developing unit 4 Reference pattern exposure unit 5 Measuring unit 6 Control unit 41 Light source unit 43 Optical sensor 44 Temperature control unit 411 Halogen lamp 412B Interference filter 412G Interference filter 412R Interference filter 414 Interference filter switching unit 415 Light source unit 415B Blue light emitting diode 415G Green Light emitting diode 415R Red light emitting diode 415R Light emitting diode 441 Temperature sensor 442 Heating unit 443 Cooling unit Dmin, LD, HD, Dmax Reference pattern P Color printing paper (photosensitive material) t Exposure time

Claims (12)

[Claims] 1. A photographic development processing apparatus for developing a photosensitive material by a development processing means, comprising: a reference pattern exposure means for exposing a reference pattern to the photosensitive material prior to the development processing by the development processing means; Measuring means for measuring a performance value indicating the performance of the processing solution in the developing means from a reference pattern image corresponding to the reference pattern appearing on the photosensitive material by the developing process; And a control unit for comparing the performance value measured by the measurement unit with the performance reference value to determine whether or not the treatment liquid is within a management range. Development processing equipment. 2. The photographic processing apparatus according to claim 1, wherein said measuring means measures the density of said reference pattern image as said performance value. 3. The photographic development processing apparatus according to claim 1, wherein the reference pattern exposure unit includes a light source unit that irradiates a plurality of lights having different wavelength ranges toward the photosensitive material. . 4. The reference pattern exposure unit includes a photometric unit that receives the plurality of lights emitted from the light source unit and detects respective light intensities, and wherein the control unit is detected by the photometric unit. 4. A photographic processing apparatus according to claim 3, wherein the amount of light in each wavelength range irradiated to the photosensitive material is adjusted based on the light intensity. 5. A light source unit comprising: a white light source; a plurality of interference filters that transmit only light in specific wavelength ranges different from each other; and a plurality of interference filters that switch the plurality of interference filters to emit light from the white light source in a wavelength range. 5. The photographic processing apparatus according to claim 3, further comprising: an interference filter switching unit for selectively irradiating the photosensitive material toward the photosensitive material. 6. The photographic processing apparatus according to claim 3, wherein said light source unit includes a plurality of light-emitting elements that emit light in different wavelength ranges. 7. The photographic processing apparatus according to claim 3, wherein the light source unit includes a plurality of cold cathode fluorescent lamps or hot cathode fluorescent lamps that emit light in different wavelength ranges. 8. The apparatus according to claim 3, wherein said control means adjusts an exposure amount on said photosensitive material by changing a light intensity of light emitted from said light source section. Photographic processing equipment. 9. A photographic processing apparatus according to claim 3, wherein said control means adjusts an exposure amount on said photosensitive material by changing a lighting time of said light source section. . 10. The reference pattern exposure unit further includes a temperature control unit that maintains an ambient temperature of at least one of a photosensitive material conveyed in the reference pattern exposure unit, the light source unit, and the photometric unit in a predetermined range. The photographic development processing apparatus according to any one of claims 4 to 9, wherein: 11. The temperature control unit sets an ambient temperature of the photometric unit to a reference temperature of any one of 18 to 45 ° C.
11. The photographic processing apparatus according to claim 10, wherein the fluctuation is suppressed within a range of 1.56 ° C. 12. The temperature control section adjusts the ambient temperature of the photosensitive material conveyed in the reference pattern exposure means from 18 to 45.
Any temperature of ゜ C as a reference temperature, and 1.43
11. The method according to claim 10, wherein the temperature is controlled to be within a variation range of ゜ C.
A photographic processing apparatus as described in the above.