JPH10105919A - Thin film magnetic head - Google Patents
Thin film magnetic headInfo
- Publication number
- JPH10105919A JPH10105919A JP25488696A JP25488696A JPH10105919A JP H10105919 A JPH10105919 A JP H10105919A JP 25488696 A JP25488696 A JP 25488696A JP 25488696 A JP25488696 A JP 25488696A JP H10105919 A JPH10105919 A JP H10105919A
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- Japan
- Prior art keywords
- magnetic pole
- magnetic
- pole
- film
- magnetic head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、薄膜磁気ヘッドに
関し、特に薄膜磁気ヘッドにおける磁極の構成および材
料に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a thin-film magnetic head, and more particularly to a structure and a material of a magnetic pole in the thin-film magnetic head.
【０００２】[0002]
【従来の技術】従来の薄膜磁気ヘッドは、図３に示すよ
うに、Ａｌ2 Ｏ3 −ＴｉＣ基板１上にスパッタリング
法，フォトリソグラフィー技術、めっき法等によりＡｌ
2 Ｏ3 絶縁層２を形成し、下部磁極３を形成後、ギャッ
プ膜４を成膜し、有機絶縁膜５ａ〜５ｄ，コイル導体６
ａ〜６ｃを交互に積層し、次いで、上部磁極７，Ａｌ2
Ｏ3 保護膜１０を順次積層する。ここ下部磁極３および
上部磁極７には軟磁性体である１６〜２０ｗｔ％のＦｅ
組成からなるＮｉＦｅ（以下、８２ＮｉＦｅという）が
最もよく用いられている（例えば、特開平１−３１７２
１５号公報）。 2. Description of the Related Art As shown in FIG. 3, a conventional thin film magnetic head is formed on an Al 2 O 3 —TiC substrate 1 by sputtering, photolithography, plating or the like.
After forming the 2 O 3 insulating layer 2 and the lower magnetic pole 3, the gap film 4 is formed, and the organic insulating films 5 a to 5 d and the coil conductor 6 are formed.
a to 6c are alternately laminated, and then the upper magnetic pole 7, Al 2
O 3 protective films 10 are sequentially laminated. The lower magnetic pole 3 and the upper magnetic pole 7 have a soft magnetic material of 16 to 20 wt% of Fe.
NiFe having a composition (hereinafter, referred to as 82NiFe) is most often used (for example, Japanese Patent Laid-Open No. 1-3172).
No. 15).
【０００３】[0003]
【発明が解決しようとする課題】上述した従来の薄膜磁
気ヘッドは、上部磁極および下部磁極に８２ＮｉＦｅ膜
を用いているが、高密度記録を行うために磁気記録媒体
の保持力（Ｈｃ）を高くすると、記録時に書き込み電流
をさらに増加し、ギャップ部から発生する磁界強度（Ｈ
ｘ）を増加させる必要がある。The above-mentioned conventional thin film magnetic head uses an 82NiFe film for the upper magnetic pole and the lower magnetic pole. However, in order to perform high-density recording, the magnetic recording medium has a high holding force (Hc). Then, the write current further increases during recording, and the magnetic field intensity (H
x) needs to be increased.
【０００４】しかし、必要以上に書き込み電流を増加す
ると、８２ＮｉＦｅ膜が過飽和してしまい、Ｈｘは増加
するものの媒体保持力での磁界勾配が極端に低下するた
め、磁気記録媒体上に記録した磁化遷移長が長くなり、
隣接ビットとの区別が困難となる。これにより、再生時
にはオバーライト（Ｏ／Ｗ）特性の劣化，半値幅（ＰＷ
50）の増大，再生出力の低下などを引き起し、高密度記
録を行う場合に十分な記録・再生能力が得られないとい
う欠点がある。However, if the write current is increased more than necessary, the 82NiFe film becomes oversaturated, and although Hx increases, the magnetic field gradient due to the medium holding force decreases extremely. Therefore, the magnetization transition recorded on the magnetic recording medium is reduced. The length is longer,
It is difficult to distinguish between adjacent bits. As a result, at the time of reproduction, the overwrite (O / W) characteristic is degraded and the half width (PW
Increase of 50), the reproduction output decreases and the cause, there is a disadvantage that sufficient recording and reproducing capability obtained when performing high-density recording.
【０００５】本発明の目的は、高密度記録における書き
込み・読み込み時の性能向上をはかった薄膜磁気ヘッド
を提供することにある。It is an object of the present invention to provide a thin-film magnetic head which improves the performance at the time of writing / reading in high-density recording.
【０００６】[0006]
【課題を解決するための手段】本発明の薄膜磁気ヘッド
は、基板上に下部磁極，ギャップ層，導体コイルおよび
上部磁極を順次積層してなる薄膜磁気ヘッドにおいて、
前記上部磁極は異種材料からなる上部先端磁極と上部後
端磁極とから構成され、それらの磁極が浮上面に露出
し、かつ磁気的に結合していることを特徴とする。According to the present invention, there is provided a thin-film magnetic head comprising: a lower magnetic pole, a gap layer, a conductor coil, and an upper magnetic pole sequentially laminated on a substrate;
The upper magnetic pole is composed of an upper front magnetic pole and an upper rear magnetic pole made of different materials, and these magnetic poles are exposed on the air bearing surface and are magnetically coupled.
【０００７】そして、前記上部先端磁極の長さをＬ、前
記上部先端磁極の膜厚をｔ、前記下部磁極の膜厚をｔ1
としたとき、２μｍ≦Ｌ≦５μｍ、かつｔ＝ｔ1 ±０．
５μｍであることを特徴とする。The length of the upper tip magnetic pole is L, the thickness of the upper tip magnetic pole is t, and the thickness of the lower magnetic pole is t 1.
2 μm ≦ L ≦ 5 μm and t = t 1 ± 0.
The thickness is 5 μm.
【０００８】また、前記上部先端磁極は、高飽和磁束密
度（Ｂｓ）の磁性材料からなることを特徴とし、この高
飽和磁束密度（Ｂｓ）の磁性材料が、５２〜５７ｗｔ％
のＦｅ組成を有するＮｉＦｅ（４５ＮｉＦｅ）もしくは
ＦｅＴａＮであってもよい。本発明の薄膜磁気ヘッド
は、上部磁極の先端部に高Ｂｓ材料を用いることによ
り、よりも大きな書き込み電流を流しても磁極先端部で
過飽和することはない。Further, the upper tip magnetic pole is made of a magnetic material having a high saturation magnetic flux density (Bs), and the magnetic material having a high saturation magnetic flux density (Bs) is 52 to 57 wt%.
NiFe (45NiFe) or FeTaN having the following Fe composition: In the thin-film magnetic head of the present invention, by using a high Bs material at the tip of the upper magnetic pole, supersaturation does not occur at the tip of the magnetic pole even when a larger write current is applied.
【０００９】[0009]
【発明の実施の形態】次に、本発明について図面を参照
して説明する。Next, the present invention will be described with reference to the drawings.
【００１０】図１は、本発明の薄膜磁気ヘッドの一実施
の形態を示す断面図である。図１を参照すると、まず、
スライダ材料となるＡｌ2 Ｏ3 −ＴｉＣ基板１の表面
に、スパッタリング法を用いて電磁変換素子をＡｌ2 Ｏ
3 −ＴｉＣ基板から絶縁するためのＡｌ2 Ｏ3 絶縁膜２
を形成し、この基板上にスパッタリング法，フォトリソ
グラフィー技術，電気めっき法によって下部磁極３を形
成する。FIG. 1 is a sectional view showing an embodiment of a thin film magnetic head according to the present invention. Referring to FIG. 1, first,
On the surface of an Al 2 O 3 —TiC substrate 1 serving as a slider material, an electromagnetic transducer was formed by sputtering using an Al 2 O 3
Al 2 O 3 insulating film 2 for insulating from 3- TiC substrate
Is formed, and the lower magnetic pole 3 is formed on the substrate by sputtering, photolithography, and electroplating.
【００１１】このメッキ浴には、Ｎ．Ｃ．Ａｎｄｅｒｓ
ｏｎ ａｎｄ Ｃ．Ｒ．Ｇｒｏｖｅｒ．Ｊｒ．，Ｕ．
Ｓ．Ｐａｔｅｎｔ ４，２７９，７０７（１９８１）に
記載のＬＣＤ−Ｂ浴を一部改良したものを使用し、１６
〜２０ｗｔ％のＦｅ組成を有するＮｉＦｅ（８２ＮｉＦ
ｅ）を用いた。The plating bath contains N.I. C. Anders
on and C.I. R. Grover. Jr. , U.S.
S. A modified version of the LCD-B bath described in Patent 4,279,707 (1981) was used.
NiFe (82NiF) having an Fe composition of ２０20 wt%
e) was used.
【００１２】次に、スパッタリング法により、外部磁界
を発生させるための非磁性のギャップ膜４（例えば、Ａ
ｌ2 Ｏ3 膜等）を形成し、下部磁極３と上部後端磁極７
ｂの接続部に対応する部分をイオンミリング法により除
去し、フォトリソグラフィー技術にてパターニングした
フォトレジストをハードベーク（焼成）して有機絶縁膜
５ａを形成しフォトリソグラフィー技術，スパッタリン
グ法，電気メッキ法によりコイル導体６ａを形成する。
そして、フォトリソグラフィー技術にてパターニングし
たフォトレジストをハードベークして有機絶縁膜５ｂを
形成する。Next, a non-magnetic gap film 4 (for example, A
l 2 O 3 film, etc.), and the lower magnetic pole 3 and the upper rear magnetic pole 7 are formed.
The portion corresponding to the connection portion b is removed by ion milling, and a photoresist patterned by photolithography is hard baked (baked) to form an organic insulating film 5a. Photolithography, sputtering, electroplating Thereby, the coil conductor 6a is formed.
Then, the photoresist patterned by the photolithography technique is hard baked to form the organic insulating film 5b.
【００１３】次に、フォトリソグラフィー技術によりレ
ジストフレームを形成した後、電気メッキ法によって上
部先端磁極７ａを形成する。この上部先端磁極７ａの材
料には高Ｂｓ磁性材料を用いた。本実施例では、高Ｂｓ
磁性材料として５２〜５７ｗｔ％のＦｅ組成を有するＮ
ｉＦｅ膜（４５ＮｉＦｅ）を用いた。このとき、上部先
端磁極７ａの長さＬはスライダ浮上面１０から２〜５μ
ｍの範囲内とし、また、上部先端磁極７ａの膜厚ｔは下
部磁極３膜厚ｔ1 ±０．５μｍとした。Next, after a resist frame is formed by photolithography, an upper tip magnetic pole 7a is formed by electroplating. A high Bs magnetic material was used for the material of the upper tip magnetic pole 7a. In this embodiment, the high Bs
N having a Fe composition of 52 to 57 wt% as a magnetic material
An iFe film (45NiFe) was used. At this time, the length L of the upper tip magnetic pole 7a is 2 to 5 μm from the slider flying surface 10.
m, and the thickness t of the upper tip magnetic pole 7a was set to the lower pole 3 thickness t1 ± 0.5 μm.
【００１４】続いて、フォトリソグラフィー技術，スパ
ッタリング法，電気メッキ法により、有機絶縁膜５ａ〜
５ｄとコイル導体６ａ〜６ｃとを所定の層数になるまで
繰り返し形成する。本実施例の場合は３層に形成した。Subsequently, the organic insulating films 5a to 5a are formed by photolithography, sputtering, and electroplating.
5d and the coil conductors 6a to 6c are repeatedly formed until a predetermined number of layers are formed. In the case of the present embodiment, it was formed in three layers.
【００１５】さらに、フォトリソグラフィー技術、電気
メッキ法により上部後端磁極７ｂを上部先端磁極７ａを
すべて覆い、かつ、上部後端磁極７ｂの後部が下部磁極
３に接合されるように形成する。そして、上部後端磁極
７ｂには８２ＮｉＦｅを用い、最後にＡｌ2 Ｏ3 保護膜
９により全体を覆って薄膜磁気ヘッドが完成する。Further, the upper rear end magnetic pole 7b is formed by photolithography and electroplating so as to cover the entire upper front end magnetic pole 7a, and the rear part of the upper rear end magnetic pole 7b is joined to the lower magnetic pole 3. Then, 82NiFe is used for the upper rear end magnetic pole 7b, and the whole is finally covered with the Al 2 O 3 protective film 9 to complete the thin film magnetic head.
【００１６】次に、本発明の薄膜磁気ヘッドの動作につ
いて説明する。Next, the operation of the thin-film magnetic head of the present invention will be described.
【００１７】図１を参照すると、まず、コイル導体６に
電流を流すことによって発生する磁束を下部磁極３，上
部先端磁極７ａ，上部後端磁極７ｂに誘導し、ギャップ
膜４を介して上部先端磁極７ａと下部磁極３が対向する
部分より外部磁場を発生させ、磁気記録媒体（図示せ
ず）を磁化することにより情報を記録する。このとき、
磁気記録媒体に記録される磁化パターンは、磁界強度
（Ｈ）と上部磁極側から発生する磁界分布の影響を受け
る。Referring to FIG. 1, first, a magnetic flux generated by flowing a current through the coil conductor 6 is guided to the lower magnetic pole 3, the upper tip magnetic pole 7a, and the upper rear end magnetic pole 7b. An external magnetic field is generated from a portion where the magnetic pole 7a and the lower magnetic pole 3 face each other, and information is recorded by magnetizing a magnetic recording medium (not shown). At this time,
The magnetization pattern recorded on the magnetic recording medium is affected by the magnetic field strength (H) and the magnetic field distribution generated from the upper magnetic pole side.
【００１８】本実施例では、ギャップ膜４に隣接した上
部先端磁極７ａには、８２ＮｉＦｅよりも飽和磁束密度
（Ｂｓ）の高い磁性材料として４５ＮｉＦｅを用いてい
る。このため、上部先端磁極７ａの飽和が抑えられ、図
４（ａ）に示すように、本発明の薄膜磁気ヘッドのギャ
ップ近傍における磁界分布は、図４（ｂ）に示す従来の
薄膜磁気ヘッドのギャップ近傍における磁界分布に比較
して強い磁界強度（Ｈ）が得られ磁界勾配が鋭化する。
従って、より高保磁力（Ｈｃ）の磁気記録媒体でも飽和
記録を行うことができる。In this embodiment, 45NiFe is used for the upper tip magnetic pole 7a adjacent to the gap film 4 as a magnetic material having a higher saturation magnetic flux density (Bs) than 82NiFe. Therefore, the saturation of the upper tip magnetic pole 7a is suppressed, and as shown in FIG. 4A, the magnetic field distribution near the gap of the thin film magnetic head of the present invention is smaller than that of the conventional thin film magnetic head shown in FIG. As compared with the magnetic field distribution near the gap, a strong magnetic field strength (H) is obtained, and the magnetic field gradient is sharpened.
Therefore, saturation recording can be performed even with a magnetic recording medium having a higher coercive force (Hc).
【００１９】次に、本発明の別の実施の形態について図
面を参照して説明する。Next, another embodiment of the present invention will be described with reference to the drawings.
【００２０】図２は、本発明の薄膜磁気ヘッドの別の実
施の形態を示す断面図である。図２を参照すると、本実
施例では、上部先端磁極７ａに高Ｂｓ磁性材料のＦｅＴ
ａＮを用いている。上述した実施例（第１の実施例）の
場合と同様に、下部磁極３までを形成する。次いで、ポ
ールハイトを形成するためのＡｌ2 Ｏ3 絶縁膜をスパッ
タリングし、フォトリソグラフィー技術にてフォトレジ
ストをパターニングし、イオンミリング法によりＡｌ2
Ｏ3 絶縁膜８を形成し、ギャップ膜４をスパッタリング
により形成する。FIG. 2 is a sectional view showing another embodiment of the thin-film magnetic head of the present invention. Referring to FIG. 2, in the present embodiment, a high Bs magnetic material FeT
aN is used. As in the case of the above-described embodiment (first embodiment), up to the lower magnetic pole 3 is formed. Then sputtered Al 2 O 3 insulating film for forming a pole height, a photoresist is patterned by a photolithographic technique, Al 2 by ion milling
The O 3 insulating film 8 is formed, and the gap film 4 is formed by sputtering.
【００２１】後工程は、第１の実施例の場合と同様に、
有機絶縁層５（５ａ〜５ｄ），コイル導体６（６ａ〜６
ｃ）を交互に形成し、さらに、上部後端磁極７ｂを形成
する。In the post-process, as in the case of the first embodiment,
Organic insulating layer 5 (5a-5d), coil conductor 6 (6a-6
c) are alternately formed, and further, the upper rear end magnetic pole 7b is formed.
【００２２】ここで、ポールハイトを形成するためにＡ
ｌ2 Ｏ3 絶縁膜８を形成した理由は、ＦｅＴａＮに対し
て磁気異方性を定着させるには、高温処理（例えば、５
００℃程度）が必要であるが、第１の実施例の場合よう
に、有機絶縁膜５ｂを用いてポールハイトを形成する
と、有機絶縁膜５（５ａ〜５ｄ）が高温で劣化すること
による。Here, in order to form the pole height, A
The reason why the l 2 O 3 insulating film 8 is formed is that high-temperature treatment (for example, 5
(Approximately 00 ° C.). However, when the pole height is formed using the organic insulating film 5b as in the first embodiment, the organic insulating film 5 (5a to 5d) deteriorates at a high temperature.
【００２３】[0023]
【発明の効果】以上説明したように、本発明の薄膜磁気
ヘッドは、上部磁極のギャップ隣接部に飽和磁束密度の
高い５２〜５７ｗｔ％のＦｅ組成を有する４５ＮｉＦｅ
を積層するため、書き込み時の能力を向上させることが
できる。As described above, the thin film magnetic head according to the present invention has a high saturation magnetic flux density in the vicinity of the gap of the upper magnetic pole of 45 to 57 wt% having a Fe composition of 52 to 57 wt%.
Are stacked, the writing capability can be improved.
【００２４】また、書き込み時の磁界強度および磁界勾
配を大きくできるため、磁気記録媒体に書き込まれる磁
化パターンの磁化反転領域を減少でき、読み込み時の再
生出力の半値幅（ＰＷ50）が減少し、再生時のリードエ
ラーを抑制できるという効果がある。Further, since the magnetic field strength and the magnetic field gradient at the time of writing can be increased, the magnetization reversal area of the magnetization pattern written on the magnetic recording medium can be reduced, and the half width (PW 50 ) of the reproduction output at the time of reading decreases. There is an effect that a read error at the time of reproduction can be suppressed.
【図１】本発明の薄膜磁気ヘッドの一実施の形態を示す
断面図である。FIG. 1 is a sectional view showing an embodiment of a thin-film magnetic head according to the present invention.
【図２】本発明の薄膜磁気ヘッドの別の実施の形態を示
す断面図である。FIG. 2 is a cross-sectional view showing another embodiment of the thin-film magnetic head of the present invention.
【図３】従来の薄膜磁気ヘッドの一例を示す断面図であ
る。FIG. 3 is a sectional view showing an example of a conventional thin film magnetic head.
【図４】本発明および従来の薄膜磁気ヘッドの磁界分布
を示す模式図である。FIG. 4 is a schematic diagram showing a magnetic field distribution of the present invention and a conventional thin film magnetic head.
１ Ａｌ2 Ｏ3 −ＴｉＣ基板 ２，８ Ａｌ2 Ｏ3 絶縁膜 ３ 下部磁極 ４ ギャップ膜 ５ａ〜５ｄ 有機絶縁膜 ６ａ〜６ｃ コイル導体 ７ 上部磁極 ７ａ ４５ＮｉＦｅ上部先端磁極 ７ｂ ８２ＮｉＦｅ上部後端磁極 ９ Ａｌ2 Ｏ3 保護膜 １０ スライダ浮上面 Ｌ 上部先端磁極の長さ ｔ 上部先端磁極の膜厚 ｔ1 下部磁極の膜厚1 Al 2 O 3 -TiC substrate 2, 8 Al 2 O 3 insulating film 3 lower magnetic pole 4 gap film 5a~5d organic insulating film 6a~6c coil conductor 7 top pole 7a 45NiFe upper tip magnetic pole 7b 82NiFe upper rear pole 9 Al 2 O 3 protective film 10 Slider air bearing surface L Length of upper tip magnetic pole t Film thickness of upper tip magnetic pole t 1 Film thickness of lower magnetic pole
Claims (4)
イルおよび上部磁極を順次積層してなる薄膜磁気ヘッド
において、前記上部磁極は異種材料からなる上部先端磁
極と上部後端磁極とから構成され、それらの磁極が浮上
面に露出し、かつ磁気的に結合していることを特徴とす
る薄膜磁気ヘッド。1. A thin-film magnetic head in which a lower magnetic pole, a gap layer, a conductor coil and an upper magnetic pole are sequentially laminated on a substrate, wherein the upper magnetic pole comprises an upper front magnetic pole and an upper rear magnetic pole made of different materials. Characterized in that their magnetic poles are exposed on the air bearing surface and are magnetically coupled.
先端磁極の膜厚をｔ、前記下部磁極の膜厚をｔ1 とした
とき、 ２μｍ≦Ｌ≦５μｍ かつ ｔ＝ｔ1 ±０．５μｍ であることを特徴とする請求項１記載の薄膜磁気ヘッ
ド。Wherein the length of the upper tip magnetic pole L, and thickness of the upper tip magnetic pole t, when the thickness of the lower magnetic pole was set to t 1, 2μm ≦ L ≦ 5μm and t = t 1 ± 0 2. The thin-film magnetic head according to claim 1, wherein the thickness is 0.5 .mu.m.
（Ｂｓ）の磁性材料からなることを特徴とする請求項１
または２記載の薄膜磁気ヘッド。3. The magnetic head according to claim 1, wherein the upper tip magnetic pole is made of a magnetic material having a high saturation magnetic flux density (Bs).
Or the thin-film magnetic head according to 2.
が、５２〜５７ｗｔ％のＦｅ組成を有するＮｉＦｅ（４
５ＮｉＦｅ）もしくはＦｅＴａＮであることを特徴とす
る請求項１〜３のいずれか１項記載の薄膜磁気ヘッド。4. A magnetic material having a high saturation magnetic flux density (Bs) comprising NiFe (4) having a Fe composition of 52 to 57 wt%.
The thin-film magnetic head according to any one of claims 1 to 3, wherein the thin-film magnetic head is made of 5NiFe) or FeTaN.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25488696A JPH10105919A (en) | 1996-09-26 | 1996-09-26 | Thin film magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25488696A JPH10105919A (en) | 1996-09-26 | 1996-09-26 | Thin film magnetic head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH10105919A true JPH10105919A (en) | 1998-04-24 |
Family
ID=17271211
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25488696A Pending JPH10105919A (en) | 1996-09-26 | 1996-09-26 | Thin film magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH10105919A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6130805A (en) * | 1997-11-19 | 2000-10-10 | Tdk Corporation | Thin film magnetic head having upper pole chip formed over insulating layer |
| US7810226B2 (en) | 2006-03-24 | 2010-10-12 | Tdk Corporation | Method of manufacturing a thin-film magnetic head having an element having a lower layer with a narrower width |
-
1996
- 1996-09-26 JP JP25488696A patent/JPH10105919A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6130805A (en) * | 1997-11-19 | 2000-10-10 | Tdk Corporation | Thin film magnetic head having upper pole chip formed over insulating layer |
| US6609291B1 (en) | 1997-11-19 | 2003-08-26 | Tdk Corporation | Method of manufacturing a thin film magnetic head |
| US7061718B2 (en) | 1997-11-19 | 2006-06-13 | Tdk Corporation | Thin film magnetic head having thin film coil embedded in first insulating layer covered with second insulating layer |
| US7810226B2 (en) | 2006-03-24 | 2010-10-12 | Tdk Corporation | Method of manufacturing a thin-film magnetic head having an element having a lower layer with a narrower width |
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