JPH10102297A - Barrel for electric treatment and plating method using the same - Google Patents

Barrel for electric treatment and plating method using the same

Info

Publication number
JPH10102297A
JPH10102297A JP25798396A JP25798396A JPH10102297A JP H10102297 A JPH10102297 A JP H10102297A JP 25798396 A JP25798396 A JP 25798396A JP 25798396 A JP25798396 A JP 25798396A JP H10102297 A JPH10102297 A JP H10102297A
Authority
JP
Japan
Prior art keywords
barrel
partition
work
current
conductive bar
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP25798396A
Other languages
Japanese (ja)
Inventor
Susumu Nishiwaki
進 西脇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Renesas Semiconductor Manufacturing Co Ltd
Kansai Nippon Electric Co Ltd
Original Assignee
Renesas Semiconductor Manufacturing Co Ltd
Kansai Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Renesas Semiconductor Manufacturing Co Ltd, Kansai Nippon Electric Co Ltd filed Critical Renesas Semiconductor Manufacturing Co Ltd
Priority to JP25798396A priority Critical patent/JPH10102297A/en
Publication of JPH10102297A publication Critical patent/JPH10102297A/en
Withdrawn legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To enable periodic pulse energization as well without requiring an excessive power source by providing the inside surface of a rotary barrel for an electrochemical treatment with an insulative partition which comes into contact with an energizing bar and gradually decreasing the quantity of the works to be treated on this partition by rotation of a barrel. SOLUTION: The conductive bar 6 is arranged on the inside surface of the rotary barrel 1 in a treating vessel 9 contg. a treating liquid 8 and the partition 3 consisting of an insulating material is disposed between the same and the inside surface of the barrel 1. The many small-sized works 7 to be treated which are supplied into the barrel fall into the bottom of the barrel 1 from above the partition 3 as the barrel 1 rotates. The quantity of the works 7 to be subjected to the energization treatment between outside electrodes 5 from the center bar 6 on the partition 3 decrease as the barrel rotates. The electrochemical treatment, such as electric polishing, is executed even with a power source of a small capacity. The periodic energization to the works 7 is made possible by continuing the rotation. The easy execution of the pulse plating, etc., by the rotation of the barrel is made possible without requiring special devices.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】この発明は、電気処理を行な
う電気処理用バレルに係る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electric processing barrel for performing electric processing.

【0002】[0002]

【従来の技術】電気化学処理用バレルは、図5(a)、
(b)に示すようにバレル本体10を支持する支持構体
20と、回転させる回転駆動機構70と処理液80を収
容した処理液槽90内の外部電極50と導電性の丸棒形
状のバレル内電極60をセンターに有するバレル本体1
0と電源(図示せず)から成り、電極間に電流を流し、
バレル本体10を回転させることにより、バレル内電極
60と電気的に接続したワークの表面に電気化学的な反
応を生じさせ、表面の光沢研磨、エッチング、脱脂、め
っきなどの処理を行うものである。
2. Description of the Related Art A barrel for electrochemical treatment is shown in FIG.
As shown in (b), a support structure 20 for supporting the barrel main body 10, an external electrode 50 in a processing liquid tank 90 containing a rotation driving mechanism 70 and a processing liquid 80 for rotation, and a conductive round rod-shaped barrel. Barrel main body 1 having electrode 60 at center
0 and a power supply (not shown).
By rotating the barrel main body 10, an electrochemical reaction is caused on the surface of the work electrically connected to the in-barrel electrode 60, and the surface is polished, etched, degreased, and plated. .

【0003】従来のバレルによる処理方法は、形状の細
かいワークを一度に多量に処理することに特徴がある
が、電気バレルの場合はワークの量に見合う電流を供給
しようとすると、その要求される電流量が非常に大きく
なり、電源の規模の大きいものが必要とされるので、電
流密度の高い設定が必要とされる用途には電気処理用バ
レルはあまり適用されていなかった。また電気めっき法
のなかに、めっきの特性を向上させたり高速めっきを行
う目的で、電流を断続的に流すパルスめっき法という技
術があるが、これを行なうにも複雑な高価な電源を用意
する必要があり電気処理用バレルの適用は少なかった。
The conventional processing method using a barrel is characterized by processing a large number of workpieces at once, but in the case of an electric barrel, it is required to supply a current corresponding to the amount of the workpiece. Since the amount of current becomes very large and a large-scale power source is required, the barrel for electric processing has not been widely applied to applications requiring a high current density setting. Among the electroplating methods, there is a technique called a pulse plating method in which a current is intermittently applied for the purpose of improving plating characteristics or performing high-speed plating. However, a complicated and expensive power supply is required to perform this. It was necessary and the application of the barrel for electric treatment was few.

【0004】[0004]

【発明が解決しようとする課題】大電流の流せる規模の
大きな電源やパルス電流を発生させることのできる複雑
な電源がなくとも多量の処理とパルスめっきができる電
気処理用バレルを提供する。
SUMMARY OF THE INVENTION An object of the present invention is to provide an electric processing barrel capable of performing a large amount of processing and pulse plating without a large power supply capable of flowing a large current or a complicated power supply capable of generating a pulse current.

【0005】[0005]

【課題を解決するための手段】上記課題を解決するため
に、本発明はワークを収納し、導電性のバーを介してワ
ークに電流を供給することにより、ワークの電気化学処
理を行なう電気処理用バレルであって、絶縁材料よりな
る仕切を前記導電性のバーからバレル本体内側面に渡し
て設け、バレル本体を回転させ前記仕切表面上にのった
ワークの一部を前記仕切裏面側にこぼし、仕切表面上に
残ったワークが前記導電性バーから電流の供給を受ける
ようにし、こぼれたワークは導電性バーから電流の供給
を受けるのを遮断されるようにして導電性のバーからの
電流の供給を受けるワークの量を電流値に対して最適値
とする電気処理用バレルを提供する。
SUMMARY OF THE INVENTION In order to solve the above-mentioned problems, the present invention relates to an electric processing for accommodating a work and supplying an electric current to the work through a conductive bar to perform an electrochemical treatment of the work. A partition made of an insulating material is provided from the conductive bar to the inside surface of the barrel main body, and a part of the work on the partition surface is rotated by rotating the barrel main body to the partition back side. The spilled work remaining on the partition surface is supplied with electric current from the conductive bar, and the spilled work is cut off from being supplied with electric current from the conductive bar. Provided is a barrel for electric processing in which an amount of a work to be supplied with an electric current is set to an optimum value for a current value.

【0006】また、前記導電性バーが前記バレル本体の
回転中心となるセンターバーである電気処理用バレルを
提供する。また、前記仕切りは前記導電性バーを把持し
て設けられ、この仕切の導電性バー把持部は、前記導電
性バーが、前記仕切の表面側では露出し、仕切表面上に
のったワークが導電性バーから電流の供給を受けるよう
にし前記仕切の裏面側では前記把持部により被覆され、
こぼれたワークが導電性バーから電流の供給を受けるの
を遮断するようにした電気処理用バレルを提供する。
Further, the present invention provides an electric processing barrel in which the conductive bar is a center bar serving as a rotation center of the barrel main body. In addition, the partition is provided by gripping the conductive bar, and the conductive bar grip portion of the partition is such that the conductive bar is exposed on the surface side of the partition, and a work mounted on the partition surface is provided. On the back side of the partition to receive the current supply from the conductive bar is covered by the grip portion,
Provided is an electric processing barrel adapted to block a spilled work from being supplied with electric current from a conductive bar.

【0007】また、前記電気処理用バレル本体の回転に
よりワークに供給する電流を周期的に変化させて、ワー
クにパルスめっきを施すめっきの方法を提供する。ま
た、前記電気処理用バレル本体の回転数を変化させて、
前記ワークに供給される電流のパルス周期を変化させる
パルスめっきの方法を提供する。
Another object of the present invention is to provide a plating method in which a current supplied to a work is periodically changed by rotation of the electric processing barrel body to perform pulse plating on the work. Further, by changing the rotation speed of the barrel for electric processing,
A pulse plating method for changing a pulse period of a current supplied to the work is provided.

【0008】[0008]

【発明の実施の形態】以下、この発明について図面を参
照して説明する。図1は本発明の一実施例の電気処理用
バレルの正面断面図である。電気処理用バレルはワーク
7を収容するバレル本体1とバレル本体1を支持する支
持構体2とバレル本体1を回転させる駆動構体4、処理
液8を収容しバレル本体1を収納する処理槽9とからな
り、バレル本体1には中央に導電性のあるセンターバー
6が貫通しており、それを中心にバレル本体1が回転す
るようになっている。バレル本体1の壁面からセンター
バー6にわたって一枚の絶縁材料よりなる仕切3が渡し
てあり、仕切3のセンターバー6側端面は断面から見て
センターバー6の半分を被覆して把持している。このバ
レル本体1は処理液8を満たした処理槽9に浸漬されて
いる。ワークとしては例えば、気密端子、釣り針、ネ
ジ、その他の部品等に適用できる。なお、仕切と導電性
バーないしはバレル本体1の内側面とが必ずしも接触し
ている必要はなく、ワークが導電性バーから電流を供給
されるようなものであればよい。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below with reference to the drawings. FIG. 1 is a front sectional view of an electric processing barrel according to one embodiment of the present invention. The barrel for electric processing includes a barrel main body 1 for accommodating the work 7, a support structure 2 for supporting the barrel main body 1, a driving structure 4 for rotating the barrel main body 1, a processing tank 9 for accommodating the processing liquid 8 and accommodating the barrel main body 1. A conductive center bar 6 penetrates the center of the barrel main body 1, and the barrel main body 1 rotates around the center bar 6. A partition 3 made of one insulating material extends from the wall surface of the barrel body 1 to the center bar 6, and the end face of the partition 3 on the side of the center bar 6 covers and holds half of the center bar 6 when viewed from the cross section. . The barrel body 1 is immersed in a processing tank 9 filled with a processing liquid 8. The work can be applied to, for example, an airtight terminal, a fishing hook, a screw, and other components. The partition does not necessarily need to be in contact with the conductive bar or the inner surface of the barrel main body 1, but may be any as long as the work is supplied with current from the conductive bar.

【0009】図2は図1の側断面図である。この実施例
によれば、バレル本体1を回転させた時、絶縁材料より
なる仕切3上からこぼれたワーク7の一部が仕切3の裏
面側に回っていき、センターバー6からの電流の供給を
受けるのを遮断される。センターバー6と接触し電流が
流れるワーク7の量は回転が進むとともに漸次減少し、
仕切3の表面上に残ったワーク7の総表面積が充分小さ
くなることで、小さな電源でもワーク7にかける電流値
を最適値にすることができる。電解研磨処理の場合はワ
ークの材質によって最適電流値は決まるが、本実施例の
ステンレス鋼の場合は電流密度が30〜500A/dm
2位が適切である。本発明によると通常の電解研磨と異
なって電流のカタヨリによる研磨のムラが少なくなる。
FIG. 2 is a side sectional view of FIG. According to this embodiment, when the barrel main body 1 is rotated, a part of the work 7 spilled from above the partition 3 made of an insulating material turns to the back side of the partition 3, and the current is supplied from the center bar 6. You are blocked from receiving. The amount of the work 7 in contact with the center bar 6 and through which the current flows gradually decreases as the rotation progresses,
Since the total surface area of the work 7 remaining on the surface of the partition 3 is sufficiently small, the current value applied to the work 7 can be set to an optimum value even with a small power supply. In the case of electrolytic polishing, the optimum current value is determined by the material of the work, but in the case of the stainless steel of this embodiment, the current density is 30 to 500 A / dm.
Second place is appropriate. According to the present invention, unlike in normal electrolytic polishing, unevenness in polishing due to current shading is reduced.

【0010】図3で処理状況を説明する。先ず絶縁材料
の仕切3を導電性のセンターバーからバレル本体内面側
に渡して設けたバレル本体1にワーク7を投入し、バレ
ル本体1を矢印の方向に回転させる(a)。この時電極
である導電性のセンターバー6からワーク7にかかる電
流は、ワーク7の量が多く総表面積が大きいので個々の
ワーク7には小さな電流となる(b)。しかし、バレル
本体1の回転を進めるとワーク7が電極側と裏面側にこ
ぼれ落ち導電性のセンターバーからの電流の供給は遮断
される(c)。さらに回転を進めると仕切3上に残るワ
ーク7の量は少なくなり、電流の流れるワーク7の表面
積は小さくなりワーク7には充分大きな電流が流れるこ
とになる(d)。このようにしてバレル本体1の回転を
何度も繰り返すことで最適な高電流印加が研磨条件を厳
格に定めなくとも、極めて容易にワーク全体に均一に行
なわれることになる(e)。
The processing situation will be described with reference to FIG. First, the work 7 is put into the barrel main body 1 provided by passing the partition 3 of the insulating material from the conductive center bar to the inner surface side of the barrel main body, and the barrel main body 1 is rotated in the direction of the arrow (a). At this time, the current applied to the work 7 from the conductive center bar 6 serving as an electrode is a small current for each work 7 because the amount of the work 7 is large and the total surface area is large (b). However, when the rotation of the barrel main body 1 is advanced, the work 7 spills on the electrode side and the back side, and the supply of current from the conductive center bar is cut off (c). When the rotation is further advanced, the amount of the work 7 remaining on the partition 3 decreases, the surface area of the work 7 through which the current flows becomes small, and a sufficiently large current flows through the work 7 (d). By repeating the rotation of the barrel main body 1 many times in this manner, an optimum high current application can be performed very easily and uniformly over the entire work without strictly setting polishing conditions (e).

【0011】図4はこの発明の第二実施例の断面図であ
る。 この実施例は前記第一の実施例の電極である導電
性のあるセンターバーの極性が反対でワーク7にめっき
を施すことを除いては第一の実施例と同様であるため同
一部分には同一参照符号を付してその説明を省略する。
この実施例では、めっきを行う際ワーク7に流れる電流
が、0から充分高い値まで変化するので定電流めっきに
よる分極現象などの悪影響を少なくできるパルスめっき
が、複雑な電源を用意しなくても実現できるという利点
がある。めっきのパルス幅はワークの材質によって異な
るが実施例では3〜5秒が適切であり、回転数は12〜
20回/分であった。なお、めっきの場合も電気研磨処
理と同様にめっき条件を厳格に定めなくとも極めて容易
に最適なパルスめっきを実現できる。また、過電流が少
しでも流れたらまずいめっきの場合には予め仕切上のワ
ークの量と角度を知って過電流になる角度では電流を止
めるようにすればよい。また、それとは反対に最適電流
になる角度の時のみ電流を流すこともできる。
FIG. 4 is a sectional view of a second embodiment of the present invention. This embodiment is the same as the first embodiment except that the polarity of the conductive center bar, which is the electrode of the first embodiment, is opposite and the work 7 is plated. The same reference numerals are given and the description is omitted.
In this embodiment, when plating is performed, the current flowing through the work 7 changes from 0 to a sufficiently high value, so that pulse plating that can reduce adverse effects such as polarization due to constant current plating can be performed without preparing a complicated power supply. There is an advantage that it can be realized. The pulse width of the plating varies depending on the material of the work, but in the embodiment, 3 to 5 seconds is appropriate, and the rotation speed is 12 to
It was 20 times / minute. In the case of plating as well, optimal pulse plating can be realized extremely easily without strictly setting plating conditions as in the case of electropolishing. In addition, in the case of plating that is difficult if any overcurrent flows, the amount and angle of the work on the partition may be known in advance, and the current may be stopped at an angle where the overcurrent occurs. On the contrary, the current can be supplied only when the angle is the optimum current.

【0012】[0012]

【発明の効果】以上説明したように、この発明は仕切上
のワークの量を電流値に対して適性にすることにより、
小さな電力で処理を可能にし、それを繰り返すことで多
数のワークを一度に処理できるという利点がある。また
複雑な電源を用いなくても、パルス電気処理ができ、そ
の周期もバレル本体の回転速度を変えることで任意に設
定することができる。
As described above, according to the present invention, by making the amount of work on the partition appropriate for the current value,
There is an advantage that a large number of workpieces can be processed at once by enabling processing with small power and repeating the processing. Further, pulse electric processing can be performed without using a complicated power supply, and the cycle thereof can be arbitrarily set by changing the rotation speed of the barrel main body.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明の実施例1の正面断面図。FIG. 1 is a front sectional view of a first embodiment of the present invention.

【図2】 本発明の実施例1の側面断面図。FIG. 2 is a side sectional view of the first embodiment of the present invention.

【図3】 本発明のバレル内ワークの状態を示す図。FIG. 3 is a diagram showing a state of a work in a barrel according to the present invention.

【図4】 本発明の実施例2のバレルの断面図。FIG. 4 is a sectional view of a barrel according to a second embodiment of the present invention.

【図5】 従来のバレルの断面図。FIG. 5 is a sectional view of a conventional barrel.

【符号の説明】[Explanation of symbols]

1 バレル本体 3 仕切 3a 把持部 6 導電性バー 7 ワーク 8 処理液 9 処理槽 DESCRIPTION OF SYMBOLS 1 Barrel main body 3 Partition 3a Gripping part 6 Conductive bar 7 Work 8 Processing liquid 9 Processing tank

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】ワークを収納し、導電性バーを介してワー
クに電流を供給することにより、ワークの電気化学処理
を行なう電気処理用バレルであって、絶縁材料よりなる
仕切部材を前記導電性バーからバレル本体内側面に渡し
て設け、バレル本体を回転させ前記仕切表面上にあるワ
ークの一部を前記仕切裏面側に移し、仕切表面上のワー
クが前記導電性バーから電流の供給を受けるようにし、
裏面のワークは導電性バーから電流の供給を受けるのを
遮断されるようにして導電性バーからの電流とワーク量
を電流値に対して最適化とすることを特徴とする電気処
理用バレル。
1. An electric processing barrel for accommodating a work and supplying an electric current to the work through a conductive bar to perform an electrochemical treatment of the work, wherein a partition member made of an insulating material is connected to the conductive member. Provided from the bar to the inside surface of the barrel main body, rotate the barrel main body to move a part of the work on the partition surface to the partition back surface side, and the work on the partition surface receives current supply from the conductive bar So that
A barrel for electrical processing, wherein the work on the back surface is cut off from receiving a current from the conductive bar to optimize the current from the conductive bar and the amount of work with respect to the current value.
【請求項2】前記導電性バーが前記バレル本体の回転中
心となるセンターバーであることを特徴とする請求項1
記載の電気処理用バレル。
2. The apparatus according to claim 1, wherein the conductive bar is a center bar serving as a center of rotation of the barrel body.
A barrel for electrical processing as described.
【請求項3】前記仕切りは前記導電性バーを把持して設
けられ、この仕切の導電性バー把持部は、前記導電性バ
ーが、前記仕切のおもて面側では露出し、仕切おもて面
上にのったワークが導電性バーのこの露出部から電流の
供給を受けるようにし、前記仕切の裏面側では前記把持
部により被覆され、こぼれたワークが導電性バーから電
流の供給を受けるのを遮断するようにした請求項1記載
の電気処理用バレル。
3. The partition is provided by gripping the conductive bar. The conductive bar grip portion of the partition is such that the conductive bar is exposed on the front side of the partition, The work placed on the surface of the partition is supplied with current from the exposed portion of the conductive bar, and the back surface of the partition is covered by the gripping portion, and the spilled work supplies the current from the conductive bar. 2. The barrel for electrical processing according to claim 1, wherein the barrel is blocked from receiving.
【請求項4】前記電気処理用バレルの回転によりワーク
に供給する電流を周期的に変化させて、ワークにパルス
めっきを施すめっき方法。
4. A plating method for performing pulse plating on a work by periodically changing a current supplied to the work by rotating the electric processing barrel.
【請求項5】前記電気処理用バレルの回転数を変化させ
て、前記ワークに供給される電流のパルス周期を変化さ
せるパルスめっき方法。
5. A pulse plating method for changing a pulse period of a current supplied to the workpiece by changing a rotation speed of the barrel for electric processing.
JP25798396A 1996-09-30 1996-09-30 Barrel for electric treatment and plating method using the same Withdrawn JPH10102297A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25798396A JPH10102297A (en) 1996-09-30 1996-09-30 Barrel for electric treatment and plating method using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25798396A JPH10102297A (en) 1996-09-30 1996-09-30 Barrel for electric treatment and plating method using the same

Publications (1)

Publication Number Publication Date
JPH10102297A true JPH10102297A (en) 1998-04-21

Family

ID=17313925

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25798396A Withdrawn JPH10102297A (en) 1996-09-30 1996-09-30 Barrel for electric treatment and plating method using the same

Country Status (1)

Country Link
JP (1) JPH10102297A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004503077A (en) * 2000-03-23 2004-01-29 アトーテヒ ドイッチュラント ゲゼルシャフト ミット ベシュレンクテル ハフツング Processing of circuit carriers with pulsed stimulation
CN104404607A (en) * 2014-12-11 2015-03-11 中国航空工业标准件制造有限责任公司 Electroplating drum applicable to easily-deformed parts

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004503077A (en) * 2000-03-23 2004-01-29 アトーテヒ ドイッチュラント ゲゼルシャフト ミット ベシュレンクテル ハフツング Processing of circuit carriers with pulsed stimulation
CN104404607A (en) * 2014-12-11 2015-03-11 中国航空工业标准件制造有限责任公司 Electroplating drum applicable to easily-deformed parts

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